TWI443708B - - Google Patents
Info
- Publication number
- TWI443708B TWI443708B TW100143519A TW100143519A TWI443708B TW I443708 B TWI443708 B TW I443708B TW 100143519 A TW100143519 A TW 100143519A TW 100143519 A TW100143519 A TW 100143519A TW I443708 B TWI443708 B TW I443708B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110084569.7A CN102737934B (en) | 2011-04-06 | 2011-04-06 | Radio-frequency shielding device for plasma processing reaction chamber |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201241867A TW201241867A (en) | 2012-10-16 |
TWI443708B true TWI443708B (en) | 2014-07-01 |
Family
ID=46993222
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100143519A TW201241867A (en) | 2011-04-06 | 2011-11-28 | Radio frequency shielding fence for plasma process reaction chamber |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN102737934B (en) |
TW (1) | TW201241867A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104576277B (en) * | 2013-10-10 | 2017-02-08 | 中微半导体设备(上海)有限公司 | Plasma processing equipment |
CN105132882B (en) * | 2015-10-20 | 2019-05-14 | 河南卓金光电科技股份有限公司 | A kind of plasma physics face control system |
CN112509901B (en) * | 2020-11-19 | 2022-03-22 | 北京北方华创微电子装备有限公司 | Process chamber and semiconductor process equipment |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005147976A (en) * | 2003-11-19 | 2005-06-09 | Ulvac Japan Ltd | Temperature-measuring apparatus, chuck monitor, and plasma processing device |
US7691243B2 (en) * | 2004-06-22 | 2010-04-06 | Tokyo Electron Limited | Internal antennae for plasma processing with metal plasma |
CN200997756Y (en) * | 2007-01-30 | 2007-12-26 | 北京中石伟业技术有限公司 | Conductive elastic backing strap against electrochemical corrosion |
CN101050307B (en) * | 2007-04-24 | 2010-12-15 | 上海材料研究所 | Current conducting silicon rubber with capability of electromagnetic shielding, and fabricating method |
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2011
- 2011-04-06 CN CN201110084569.7A patent/CN102737934B/en active Active
- 2011-11-28 TW TW100143519A patent/TW201241867A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN102737934B (en) | 2015-04-08 |
CN102737934A (en) | 2012-10-17 |
TW201241867A (en) | 2012-10-16 |