TWI443708B - - Google Patents

Info

Publication number
TWI443708B
TWI443708B TW100143519A TW100143519A TWI443708B TW I443708 B TWI443708 B TW I443708B TW 100143519 A TW100143519 A TW 100143519A TW 100143519 A TW100143519 A TW 100143519A TW I443708 B TWI443708 B TW I443708B
Authority
TW
Taiwan
Application number
TW100143519A
Other languages
Chinese (zh)
Other versions
TW201241867A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW201241867A publication Critical patent/TW201241867A/en
Application granted granted Critical
Publication of TWI443708B publication Critical patent/TWI443708B/zh

Links

TW100143519A 2011-04-06 2011-11-28 Radio frequency shielding fence for plasma process reaction chamber TW201241867A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201110084569.7A CN102737934B (en) 2011-04-06 2011-04-06 Radio-frequency shielding device for plasma processing reaction chamber

Publications (2)

Publication Number Publication Date
TW201241867A TW201241867A (en) 2012-10-16
TWI443708B true TWI443708B (en) 2014-07-01

Family

ID=46993222

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100143519A TW201241867A (en) 2011-04-06 2011-11-28 Radio frequency shielding fence for plasma process reaction chamber

Country Status (2)

Country Link
CN (1) CN102737934B (en)
TW (1) TW201241867A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104576277B (en) * 2013-10-10 2017-02-08 中微半导体设备(上海)有限公司 Plasma processing equipment
CN105132882B (en) * 2015-10-20 2019-05-14 河南卓金光电科技股份有限公司 A kind of plasma physics face control system
CN112509901B (en) * 2020-11-19 2022-03-22 北京北方华创微电子装备有限公司 Process chamber and semiconductor process equipment

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005147976A (en) * 2003-11-19 2005-06-09 Ulvac Japan Ltd Temperature-measuring apparatus, chuck monitor, and plasma processing device
US7691243B2 (en) * 2004-06-22 2010-04-06 Tokyo Electron Limited Internal antennae for plasma processing with metal plasma
CN200997756Y (en) * 2007-01-30 2007-12-26 北京中石伟业技术有限公司 Conductive elastic backing strap against electrochemical corrosion
CN101050307B (en) * 2007-04-24 2010-12-15 上海材料研究所 Current conducting silicon rubber with capability of electromagnetic shielding, and fabricating method

Also Published As

Publication number Publication date
CN102737934B (en) 2015-04-08
CN102737934A (en) 2012-10-17
TW201241867A (en) 2012-10-16

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