TWI441731B - Optical film and its use and manufacturing method - Google Patents

Optical film and its use and manufacturing method Download PDF

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TWI441731B
TWI441731B TW096124745A TW96124745A TWI441731B TW I441731 B TWI441731 B TW I441731B TW 096124745 A TW096124745 A TW 096124745A TW 96124745 A TW96124745 A TW 96124745A TW I441731 B TWI441731 B TW I441731B
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film
optical film
antistatic
based resin
antistatic layer
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TW096124745A
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Chinese (zh)
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TW200810923A (en
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Naoki Sugiyama
Yosuke Fukuse
Masayuki Sekiguchi
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Jsr Corp
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/02Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
    • B29C55/04Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00634Production of filters
    • B29D11/00644Production of filters polarizing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/06Coating with compositions not containing macromolecular substances
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers

Description

光學薄膜及其用途以及製造方法Optical film and use thereof and method of manufacture

本發明係關於具有防靜電能之光學薄膜、該光學薄膜之用途及製造方法。更詳係為本發明係關於,原冰片烯系樹脂薄膜上形成防靜電層之適用於偏光板等用途的具有防靜電能之光學薄膜、及其用途、以及製造方法。The present invention relates to an optical film having antistatic energy, use of the optical film, and a method of manufacturing the same. More specifically, the present invention relates to an optical film having an antistatic property suitable for use in a polarizing plate or the like on an original borneol-based resin film, an antistatic layer, an application thereof, and a production method.

使用於液晶顯示器等之偏光板(偏光薄膜)一般係由透明性優良之基板(光學薄膜)、與偏光膜(偏光子)所形成。又,該偏光板亦可由賦予光學薄膜經延伸並於透過光賦予相位差之功能的薄膜(相位差薄膜)、與偏光膜所形成。A polarizing plate (polarizing film) used for a liquid crystal display or the like is generally formed of a substrate (optical film) having excellent transparency and a polarizing film (polarizer). Further, the polarizing plate may be formed of a film (retardation film) which imparts a function of imparting a phase difference to the optical film and which is extended by the transmitted light, and a polarizing film.

過去,作為偏光板之基板或相位差薄膜所使用的光學薄膜,可使用聚碳酸酯薄膜、聚酯薄膜、聚乙醯纖維素(TAC)薄膜等,但使用聚碳酸酯薄膜或聚酯薄膜之偏光板,其光彈性係數過大,會因微小應力之變化等而使賦予透過光之相位差產生變化。又,聚乙醯纖維素(TAC)薄膜因耐熱性過低,且吸水性過高,故使用此之偏光板會依使用環境而容易產生變形,亦有著容易產生光學性變化之問題。In the past, as the optical film used for the substrate of the polarizing plate or the retardation film, a polycarbonate film, a polyester film, a polyethylene terephthalate (TAC) film, or the like can be used, but a polycarbonate film or a polyester film is used. In the polarizing plate, the photoelastic coefficient is too large, and the phase difference imparted to the transmitted light changes due to a change in minute stress or the like. Further, since the polyethylene terephthalate (TAC) film is too low in heat resistance and has excessive water absorbency, the polarizing plate used therein is liable to be deformed depending on the use environment, and has a problem that optical change is likely to occur.

然而,原冰片烯系樹脂因透明性、耐熱性、耐藥品性等優良,故作為各種光學零件之材料而受到重視,特別適用於光學薄膜用途上。因此,專利文獻1中揭示,於偏光膜將原冰片烯系樹脂薄片作為保護層並層合的偏光薄膜。如此偏光薄膜因具有優良的耐水性、耐濕性、耐熱性、透明性、對於黏著材之耐久性等,而期待可利用於液晶顯示器等用途上。However, since the norbornene-based resin is excellent in transparency, heat resistance, chemical resistance, and the like, it is considered as a material for various optical components, and is particularly suitable for use in optical films. For this reason, Patent Document 1 discloses a polarizing film in which an original borneol-based resin sheet is used as a protective layer and laminated on a polarizing film. Such a polarizing film is expected to be used for applications such as liquid crystal displays because of its excellent water resistance, moisture resistance, heat resistance, transparency, durability to an adhesive, and the like.

然而,原冰片烯系樹脂與其他樹脂原料因接著性較為差,使用原冰片烯樹脂薄膜之偏光板較難製造以外,長期使用下會產生剝落之問題。However, the original norbornene-based resin and other resin raw materials are inferior in adhesion, and the polarizing plate using the original borneol resin film is difficult to manufacture, and there is a problem that peeling occurs due to long-term use.

又,原冰片烯樹脂因吸水性低而容易產生靜電,原冰片烯系樹脂製之光學薄膜作為薄膜輥時容易密著,且即使放出薄膜輥亦有產生剝離靜電之情況,容易吸附自環境之異物,與其他原料之層合時,具有異物由層間取出之問題。例如,將原冰片烯系樹脂製薄膜與聚乙烯醇(PVA)製偏光子層合後製造出偏光板時,若存在混入之異物時,該部分會成為點狀缺陷,所得之偏光板使用於顯示器等時,會有產生亮點之問題。In addition, the original borneol resin is easy to generate static electricity due to low water absorption, and the optical film made of the original borneol-based resin is easily adhered as a film roll, and even if the film roll is released, static electricity is peeled off, and it is easily adsorbed from the environment. When foreign matter is laminated with other raw materials, there is a problem that foreign matter is taken out between the layers. For example, when a polarizing plate made of a polyvinylidene-based resin film and a polyvinyl alcohol (PVA) are laminated to produce a polarizing plate, if a foreign matter is mixed, the portion becomes a point defect, and the obtained polarizing plate is used for When there is a display, etc., there will be a problem of bright spots.

作為防止層合時之靜電的方法,有人提出與原冰片烯系樹脂製之薄膜進行層合的其他原料之間所使用的接著劑作為防靜電型之方法被提出,但該方法中接著劑之接著性有時會過弱,又無法減低放出薄膜輥時的剝離靜電等,故可望原冰片烯系樹脂製薄膜自體之靜電。As a method of preventing static electricity at the time of lamination, it has been proposed to use an adhesive used between other raw materials laminated with a film made of an original borneol-based resin as an antistatic type, but in the method, an adhesive is used. The subsequent nature may be too weak, and the peeling static electricity or the like when the film roll is released may not be reduced. Therefore, it is expected that the film of the original borneol-based resin is self-static.

然而,將具有相位差之原冰片烯系樹脂薄膜貼合於PVA等偏光子之偏光板,原冰片烯系樹脂薄膜自體為低吸濕性且硬度亦優良,作為保護薄膜時可發揮其功能,故無須進一步貼合偏光板之保護薄膜,可簡化步驟下,因層合數較少而具有容易確保透明性之優點。However, the original borneol-based resin film having a phase difference is bonded to a polarizing plate such as PVA, and the original borneol-based resin film is low in hygroscopicity and excellent in hardness, and functions as a protective film. Therefore, it is not necessary to further conform to the protective film of the polarizing plate, and the advantage of being easy to ensure transparency due to the small number of laminations can be simplified.

將如此偏光板貼合於液晶面板上組合液晶顯示器時,貼合面上預先設置黏著材層與保護其之活性(living)薄膜,貼合時剝開活性(living)薄膜後接著偏光板與液晶面板之方法,其因步驟簡便而被採用。When the polarizing plate is bonded to the liquid crystal panel and the liquid crystal display is combined, the adhesive layer and the living film for protecting it are provided in advance on the bonding surface, and the living film is peeled off after bonding, followed by the polarizing plate and the liquid crystal. The method of the panel is adopted because of the simplicity of the steps.

然而,剝開偏光板上之活性(living)薄膜時,因會產生剝離靜電,製造後所得之液晶顯示器成帶電狀態,若非經静置之除電後無法檢查製品,產生生產效率變差的問題。However, when the living film on the polarizing plate is peeled off, the static electricity is peeled off, and the liquid crystal display obtained after the production is in a charged state. If the product cannot be inspected after the static electricity is removed, the production efficiency is deteriorated.

因此,靜電充分被抑制的原冰片烯系樹脂製之光學薄膜的產生受到期待。Therefore, generation of an optical film made of a raw borneol-based resin in which static electricity is sufficiently suppressed is expected.

作為防止薄膜等靜電的技術,雖可考慮薄膜上使用防靜電劑,但界面活性劑等之過去防靜電劑,若使用多量時,有時會阻礙接著性,又防靜電劑因係低分子量,經摩擦、溶解、外漏等會產生防靜電劑脫落而降低防靜電效果之問題。As a technique for preventing static electricity such as a film, an antistatic agent is used for the film. However, when a large amount of the antistatic agent such as a surfactant is used, the adhesion may be inhibited, and the antistatic agent may have a low molecular weight. Friction, dissolution, leakage, etc. may cause the antistatic agent to fall off and reduce the antistatic effect.

本發明者有鑑於如此狀況而進行詳細研究結果,發現表面具有由含有特定丙烯酸系樹脂及硬化劑之防靜電塗層材所形成之防靜電層之原冰片烯系樹脂薄膜,其具有充分防靜電能之同時,亦可長期間發揮防靜電能,而完成本發明。The inventors of the present invention conducted detailed investigation results in view of such a situation, and found that the surface has an original borneol-based resin film having an antistatic layer formed of an antistatic coating material containing a specific acrylic resin and a curing agent, which has sufficient antistatic properties. At the same time, the present invention can be completed by exerting antistatic energy for a long period of time.

[專利文獻1]特開平6-51117號公報[Patent Document 1] JP-A-6-51117

本發明係以提供與偏光膜之接著性優良,且透明性、耐熱性、耐藥品性等特性優良,長時間下亦可維持優良防靜電能之原冰片烯系樹脂製的光學薄膜及其製造方法、長期使用下亦不容易產生剝離、變形等具有較高信頼性,且該製造步驟中,使用較少摻入自環境之異物的該光學薄膜的偏光板、以及使用該偏光板之液晶顯示器作為課題。The present invention provides an optical film made of a raw borneol-based resin which is excellent in adhesion to a polarizing film and excellent in properties such as transparency, heat resistance, and chemical resistance, and which can maintain excellent antistatic performance for a long period of time and its production. The method and the long-term use are also less prone to peeling, deformation, etc., and the polarizing plate of the optical film having less foreign matter incorporated into the environment, and the liquid crystal display using the polarizing plate As a subject.

本發明的光學薄膜為,層合(A)原冰片烯系樹脂薄膜、與(B)含有(b1)側鏈具有下述式(i)所示4級銨鹽之丙烯酸系樹脂、與(b2)聚乙烯亞胺及/或聚羥基鏈烷聚縮水甘油醚所成硬化劑之防靜電塗層材所形成的防靜電層所成者為特徵。The optical film of the present invention is obtained by laminating (A) a raw borneol-based resin film and (B) an acrylic resin having a (b1) side chain having a 4-stage ammonium salt represented by the following formula (i), and (b2) The antistatic layer formed by the antistatic coating material of the curing agent of polyethyleneimine and/or polyhydroxyalkane polyglycidyl ether is characterized.

-COO-Q1 -N(Q2 )a Xb ………(i)(式(i)中,Q1 為碳數1~6的2價烴基,Q2 為碳數1~3的1價烴基,X為氯原子、氟原子或-Q3 -SO4 (但,Q3 為單鍵、伸甲基或伸乙基),a及b為1或2之整數(但,a+b=3)。Q2 、Q3 及X為複數個存在時,各可為相同或相異)。-COO-Q 1 -N(Q 2 ) a X b (i) (in the formula (i), Q 1 is a divalent hydrocarbon group having 1 to 6 carbon atoms, and Q 2 is 1 having a carbon number of 1 to 3 a hydrocarbon group, X is a chlorine atom, a fluorine atom or -Q 3 -SO 4 (however, Q 3 is a single bond, a methyl group or an ethyl group), and a and b are integers of 1 or 2 (however, a+b=3) When Q 2 , Q 3 and X are plural, each may be the same or different).

如此本發明之光學薄膜為,防靜電塗層材中更含有填充物時為佳。Thus, the optical film of the present invention is preferably one in which the antistatic coating material further contains a filler.

又,本發明的光學薄膜為,防靜電層側之表面電阻值為1×106 ~1×1012 Ω/□之範圍為佳。Further, the optical film of the present invention preferably has a surface resistance value of from 1 × 10 6 to 1 × 10 12 Ω/□ on the side of the antistatic layer.

本發明的光學薄膜為,以JIS K6768所規定的方法為準所測定之防靜電層側表面的潤濕性為50~70mN/m之範圍時為佳。The optical film of the present invention is preferably in the range of 50 to 70 mN/m in terms of the wettability of the surface of the antistatic layer measured in accordance with the method specified in JIS K6768.

本發明的光學薄膜為,丙烯酸系樹脂(b1)為含有來自具有脂環式骨架之(甲基)丙烯酸酯的結構單位為佳。In the optical film of the present invention, the acrylic resin (b1) is preferably a structural unit containing a (meth) acrylate having an alicyclic skeleton.

本發明的光學薄膜為,原冰片烯系樹脂薄膜(A)、與防靜電層(B)之波長589nm的折射率差為0.1以下時為佳。In the optical film of the present invention, the difference between the refractive index of the original borneol-based resin film (A) and the antistatic layer (B) at a wavelength of 589 nm is preferably 0.1 or less.

本發明的光學薄膜為,防靜電層(B)中,金屬原子含有量為0.1重量%以下,鹵素原子含有量為1重量%以下時為佳。In the optical film of the present invention, in the antistatic layer (B), the metal atom content is 0.1% by weight or less, and the halogen atom content is preferably 1% by weight or less.

本發明的光學薄膜為,以JIS K7113所規定的方法為準測定時,室溫中原冰片烯系樹脂薄膜(A)的拉伸彈性率E1與防靜電層(B)之拉伸彈性率E2為E1>E2之關係時為佳。In the optical film of the present invention, the tensile modulus E1 of the norbornene-based resin film (A) and the tensile modulus E2 of the antistatic layer (B) at room temperature are measured in accordance with the method specified in JIS K7113. The relationship between E1 and E2 is better.

本發明的光學薄膜為,原冰片烯系樹脂薄膜(A)為預先延伸之薄膜時為佳,本發明的相位差薄膜係由如此本發明的光學薄膜所成。In the optical film of the present invention, the original borneol-based resin film (A) is preferably a film which is stretched in advance, and the phase difference film of the present invention is formed from the optical film of the present invention.

又,本發明的相位差薄膜係以由延伸上述本發明之光學薄膜所得為特徵。Further, the retardation film of the present invention is characterized by being obtained by extending the optical film of the present invention.

本發明的偏光板係以使用本發明的光學薄膜及相位差薄膜的至少一種為特徵。The polarizing plate of the present invention is characterized by using at least one of the optical film and the retardation film of the present invention.

如此本發明的偏光板為,將本發明的相位差薄膜,使用接著劑或黏著劑,接著於偏光膜上所得之偏光板,依據JIS K7113所測定之原冰片烯系樹脂薄膜(A)之拉伸彈性率E1與防靜電層(B)之拉伸彈性率E2與接著劑或黏著劑的拉伸彈性率E3為E1>E2>E3之關係為特徵。In the polarizing plate of the present invention, the retardation film of the present invention is obtained by using an adhesive or an adhesive, followed by a polarizing plate obtained on the polarizing film, and the original borneol-based resin film (A) is measured in accordance with JIS K7113. The tensile modulus E1 and the tensile modulus E2 of the antistatic layer (B) and the tensile modulus E3 of the adhesive or the adhesive are characterized by a relationship of E1 > E2 > E3.

本發明的偏光板為,將前述光學薄膜或相位差薄膜之防靜電層側,使用接著劑或黏著劑,接著於偏光膜而得到為佳。The polarizing plate of the present invention is preferably obtained by using an adhesive or an adhesive on the side of the antistatic layer of the optical film or the retardation film, followed by a polarizing film.

本發明的液晶顯示器係以使用前述本發明的偏光板為特徵。The liquid crystal display of the present invention is characterized by using the polarizing plate of the present invention described above.

本發明的光學薄膜之製造方法為,側鏈上具有下述式(i)所示4級銨鹽之丙烯酸系樹脂(b1)、與含有聚乙烯亞胺及/或聚羥基鏈烷聚縮水甘油醚所成硬化劑(b2)之防靜電塗層材塗佈於原冰片烯系樹脂薄膜(A)上,乾燥後形成防靜電層(B)為特徵。The method for producing an optical film of the present invention comprises an acrylic resin (b1) having a 4-grade ammonium salt represented by the following formula (i) in a side chain, and a polyethylene glycol and/or a polyhydroxyalkane polyglycidol. The antistatic coating material of the hardener (b2) formed by ether is applied onto the original borneol-based resin film (A), and is dried to form an antistatic layer (B).

-COO-Q1 -N(Q2 )a Xb ………(i)(式(i)中、Q1 為碳數1~6的2價烴基,Q2 為碳數1~3的1價烴基,X為氯原子、氟原子或-Q3 -SO4 (但,Q3 為單鍵、伸甲基或伸乙基)。a及b為1或2之整數(但,a+b=3)。Q2 、Q3 及X為複數個存在時,各可為相同或相異)。-COO-Q 1 -N(Q 2 ) a X b (i) (in the formula (i), Q 1 is a divalent hydrocarbon group having 1 to 6 carbon atoms, and Q 2 is 1 having a carbon number of 1 to 3 a valence hydrocarbon group, X is a chlorine atom, a fluorine atom or -Q 3 -SO 4 (however, Q 3 is a single bond, a methyl group or an ethyl group). a and b are integers of 1 or 2 (however, a+b=3 When Q 2 , Q 3 and X are plural, each may be the same or different).

如此本發明的光學薄膜之製造方法中,塗佈防靜電塗層材之面的原冰片烯系樹脂薄膜之平均表面粗糙度(Ra)為0.3~2.0nm之範圍時為佳。In the method for producing an optical film of the present invention, it is preferred that the norbornene-based resin film coated on the surface of the antistatic coating material has an average surface roughness (Ra) of 0.3 to 2.0 nm.

本發明的光學薄膜之製造方法中,塗佈防靜電塗層材之面的原冰片烯系樹脂薄膜(A)之JIS K6768所規定的方法為準測定之表面潤濕性為50~70mN/m之範圍時為佳。In the method for producing an optical film of the present invention, the method specified in JIS K6768 of the original borneol-based resin film (A) coated with the surface of the antistatic coating material is a surface wettability of 50 to 70 mN/m. The range is better.

本發明的光學薄膜之製造方法中,丙烯酸系樹脂(b1)為含有具有來自脂環式骨架之(甲基)丙烯酸酯的結構單位者為佳。In the method for producing an optical film of the present invention, the acrylic resin (b1) is preferably a structural unit containing a (meth) acrylate derived from an alicyclic skeleton.

本發明的光學薄膜之製造方法中,防靜電塗層材為水系塗層材者為佳。又,防靜電塗層材更含有填充物時為佳。In the method for producing an optical film of the present invention, the antistatic coating material is preferably a water-based coating material. Moreover, it is preferable that the antistatic coating material further contains a filler.

本發明的光學薄膜之製造方法中,將塗佈的防靜電塗層材之乾燥,藉由具有1)80℃以下之一次乾燥步驟、與2)超過原冰片烯系樹脂薄膜(A)的玻璃轉移溫度(Tg)-30℃之溫度下的二次乾燥步驟之多階段式乾燥步驟進行為佳。如此本發明之光學薄膜的製造方法中,二次乾燥步驟中進行薄膜之延伸為佳。In the method for producing an optical film of the present invention, the applied antistatic coating material is dried by a drying step having 1) 80 ° C or less and 2) glass exceeding the original borneol resin film (A). The multi-stage drying step of the secondary drying step at a temperature of the transfer temperature (Tg) of -30 ° C is preferably carried out. In the method for producing an optical film of the present invention, it is preferred to carry out the stretching of the film in the secondary drying step.

本發明的光學薄膜之製造方法中,丙烯酸系樹脂(b1)中鹵素原子含有量為1重量%以下者為佳。In the method for producing an optical film of the present invention, the content of the halogen atom in the acrylic resin (b1) is preferably 1% by weight or less.

本發明可提供與偏光膜等其他原料所成的光學材料之接著性優良,且透明性、耐熱性、耐藥品性等特性亦優良,長時間下可維持優良的防靜電能,耐久性亦優良的原冰片烯系樹脂製之光學薄膜及其製造方法、具有長期使用下不易產生剝離、變形等較高信頼性,且該製造步驟中,使用不會摻入自環境的異物之該光學薄膜的偏光板、以及使用該偏光板之液晶顯示器。The present invention provides excellent adhesion to an optical material such as a polarizing film and the like, and is excellent in properties such as transparency, heat resistance, and chemical resistance, and can maintain excellent antistatic performance for a long period of time and excellent durability. The optical film made of the original borneol-based resin and the method for producing the same have high signalability such as peeling and deformation in a long-term use, and in the manufacturing step, the optical film which does not incorporate foreign matter from the environment is used. A polarizing plate, and a liquid crystal display using the polarizing plate.

以下,對本發明做具體説明。Hereinafter, the present invention will be specifically described.

<<光學薄膜>><<Optical film>>

本發明的光學薄膜為,原冰片烯系樹脂薄膜(A)之至少一面上層合防靜電層(B),其為具有防靜電能之光學薄膜。In the optical film of the present invention, an antistatic layer (B) is laminated on at least one surface of the original borneol-based resin film (A), which is an optical film having antistatic properties.

(A)原冰片烯系樹脂薄膜構成本發明所使用的原冰片烯系樹脂薄膜(A)之原冰片烯系樹脂為,聚合或共聚合(以下亦稱為(共)聚合)含有至少1種的具有原冰片烯骨架之化合物(以下亦稱為原冰片烯系化合物)的單體或單體組成物,視必要經氫化而得之樹脂。(A) The original borneol-based resin film of the original borneol-based resin film (A) used in the present invention contains at least one kind of polymerization or copolymerization (hereinafter also referred to as (co)polymerization). A monomer or a monomer composition of a compound having a norbornene skeleton (hereinafter also referred to as a norbornene-based compound), which is obtained by hydrogenation if necessary.

<單體>作為構成單體或單體組成物之原冰片烯系化合物,並無特別限定者,例如可舉出下述式(1)所示原冰片烯系化合物。<Monomer> The raw borneol compound which is a constituent monomer or a monomer composition is not particularly limited, and examples thereof include a norbornene-based compound represented by the following formula (1).

[式(1)中,R1 ~R4 各獨立表示氫原子;鹵素原子;含有氧、氮、硫或矽可具有連結基之取代或非取代的碳原子數1~15之烴基或其他1價有機基。其中,R1 與R2 或R3 與R4 相互結合可形成伸烷基形成,R1 與R2 、R3 與R4 或R2 與R3 相互結合可形成碳環或複素環(這些碳環或複素環可為單環結構、或其他環經縮合可形成多環結構。)。所形成之碳環或複素環可為芳香環、或可為非芳香環。又,x表示0~3之整數,y表示0或1]。 [In the formula (1), R 1 to R 4 each independently represent a hydrogen atom; a halogen atom; a substituted or unsubstituted hydrocarbon group having 1 to 15 carbon atoms or the like containing oxygen, nitrogen, sulfur or hydrazine; The price is organic. Wherein R 1 and R 2 or R 3 and R 4 are bonded to each other to form an alkylene group Forming, R 1 and R 2 , R 3 and R 4 or R 2 and R 3 are bonded to each other to form a carbocyclic or complex ring (the carbocyclic or complex ring may be a single ring structure, or other rings may be condensed to form a polycyclic ring). structure.). The carbocyclic or complex ring formed may be an aromatic ring or may be a non-aromatic ring. Also, x represents an integer from 0 to 3, and y represents 0 or 1].

作為上述一般式(1)所示原冰片烯系化合物之具體例,例如可例舉出以下所示化合物,但未限定於這些例示者。Specific examples of the ornidylene-based compound represented by the above general formula (1) include, for example, the following compounds, but are not limited to these examples.

雙環〔2.2.1〕庚-2-烯(原冰片烯)、5-甲基-雙環〔2.2.1〕庚-2-烯、5-乙基-雙環〔2.2.1〕庚-2-烯、5-環己基-雙環〔2.2.1〕庚-2-烯、5-苯基-雙環〔2.2.1〕庚-2-烯、5-(4-聯苯基)-雙環〔2.2.1〕庚-2-烯、5-甲氧基羰基-雙環〔2.2.1〕庚-2-烯、5-苯氧基羰基-雙環〔2.2.1〕庚-2-烯、5-苯氧基乙基羰基-雙環〔2.2.1〕庚-2-烯、5-苯基羰基氧基-雙環〔2.2.1〕庚-2-烯、5-甲基-5-甲氧基羰基-雙環〔2.2.1〕庚-2-烯、5-甲基-5-苯氧基羰基-雙環〔2.2.1〕庚-2-烯、5-甲基-5-苯氧基乙基羰基-雙環〔2.2.1〕庚-2-烯、5-乙烯-雙環〔2.2.1〕庚-2-烯、5-亞乙基-雙環〔2.2.1〕庚-2-烯、5,5-二甲基-雙環〔2.2.1〕庚-2-烯、5,6-二甲基-雙環〔2.2.1〕庚-2-烯、5-氟-雙環〔2.2.1〕庚-2-烯、5-氯-雙環〔2.2.1〕庚-2-烯、5-溴-雙環〔2.2.1〕庚-2-烯、5,6-二氟-雙環〔2.2.1〕庚-2-烯、5,6-二氯-雙環〔2.2.1〕庚-2-烯、5,6-二溴-雙環〔2.2.1〕庚-2-烯、5-羥基-雙環〔2.2.1〕庚-2-烯、5-羥基乙基-雙環〔2.2.1〕庚-2-烯、5-氰基-雙環〔2.2.1〕庚-2-烯、5-胺基-雙環〔2.2.1〕庚-2-烯、三環〔4.3.0.12,5 〕癸-3-烯、三環〔4.4.0.12,5 〕十一烷-3-烯、7-甲基-三環〔4.3.0.12,5 〕癸-3-烯、7-乙基-三環〔4.3.0.12,5 〕癸-3-烯、7-環己基-三環〔4.3.0.12,5 〕癸-3-烯、7-苯基-三環〔4.3.0.12,5 〕癸-3-烯、7-(4-聯苯基)-三環〔4.3.0.12,5 〕癸-3-烯、7,8-二甲基-三環〔4.3.0.12,5 〕癸-3-烯、7,8,9-三甲基-三環〔4.3.0.12,5 〕癸-3-烯、8-甲基-三環〔4.4.0.12,5 〕十一烷-3-烯、8-苯基-三環〔4.4.0.12,5 〕十一烷-3-烯、7-氟-三環〔4.3.0.12,5 〕癸-3-烯、7-氯-三環〔4.3.0.12,5 〕癸-3-烯、7-溴-三環〔4.3.0.12,5 〕癸-3-烯、7,8-二氯-三環〔4.3.0.12,5 〕癸-3-烯、7,8,9-三氯-三環〔4.3.0.12,5 〕癸-3-烯、7-氯甲基-三環〔4.3.0.12,5 〕癸-3-烯、7-二氯甲基-三環〔4.3.0.12,5 〕癸-3-烯、7-三氯甲基-三環〔4.3.0.12,5 〕癸-3-烯、7-羥基-三環〔4.3.0.12,5 〕癸-3-烯、7-氰基-三環〔4.3.0.12,5 〕癸-3-烯、7-胺基-三環〔4.3.0.12,5 〕癸-3-烯、四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、五環〔7.4.0.12,5 .18,11 .07,12 〕十五烷-3-烯、六環〔8.4.0.12,5 .17,14 .19,12 .08,13 〕十七烷-3-烯、8-甲基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-乙基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-環己基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-苯基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-(4-聯苯基)-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-甲氧基羰基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-苯氧基羰基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-苯氧基乙基羰基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-苯基羰基氧基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-甲基-8-甲氧基羰基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-甲基-8-苯氧基羰基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-甲基-8-苯氧基乙基羰基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-乙烯-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-亞乙基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8,8-二甲基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8,9-二甲基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-氟-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-氯-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-溴-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8,8-二氯-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8,9-二氯-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8,8,9,9-四氯-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-羥基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-羥基乙基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-甲基-8-羥基乙基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-氰基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯、8-胺基-四環〔4.4.0.12,5 .17,10 〕月桂-3-烯。Bicyclo [2.2.1] hept-2-ene (formylbornene), 5-methyl-bicyclo[2.2.1]hept-2-ene, 5-ethyl-bicyclo[2.2.1]hept-2-ene , 5-cyclohexyl-bicyclo[2.2.1]hept-2-ene, 5-phenyl-bicyclo[2.2.1]hept-2-ene, 5-(4-biphenyl)-bicyclo[2.2.1 ???hept-2-ene, 5-methoxycarbonyl-bicyclo[2.2.1]hept-2-ene, 5-phenoxycarbonyl-bicyclo[2.2.1]hept-2-ene, 5-phenoxy Ethylcarbonyl-bicyclo[2.2.1]hept-2-ene, 5-phenylcarbonyloxy-bicyclo[2.2.1]hept-2-ene, 5-methyl-5-methoxycarbonyl-bicyclo[ 2.2.1] Hept-2-ene, 5-methyl-5-phenoxycarbonyl-bicyclo[2.2.1]hept-2-ene, 5-methyl-5-phenoxyethylcarbonyl-bicyclo[ 2.2.1] Hept-2-ene, 5-ethylene-bicyclo[2.2.1]hept-2-ene, 5-ethylidene-bicyclo[2.2.1]hept-2-ene, 5,5-dimethyl -bicyclo[2.2.1]hept-2-ene, 5,6-dimethyl-bicyclo[2.2.1]hept-2-ene, 5-fluoro-bicyclo[2.2.1]hept-2-ene, 5-chloro-bicyclo[2.2.1]g 2-ene, 5-bromo-bicyclo[2.2.1]hept-2-ene, 5,6-difluoro-bicyclo[2.2.1]hept-2-ene, 5,6-dichloro-bicyclo[2.2 .1]hept-2-ene, 5,6-dibromo-bicyclo[2.2.1]hept-2-ene, 5-hydroxy-bicyclo[2.2.1]hept-2-ene, 5-hydroxyethyl- Bicyclo[2.2.1]hept-2-ene, 5-cyano-bicyclo[2.2.1]hept-2-ene, 5-amino-bicyclo[2.2.1]hept-2-ene, tricyclo[4.3 .0.1 2,5 〕Indol-3-ene, tricyclo[4.4.0.1 2,5 ]undec-1-ene, 7-methyl-tricyclo[4.3.0.1 2,5 ]non-3-ene , 7-ethyl-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7-cyclohexyl-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7-phenyl-tricyclic [4.3.0.1 2,5 ] Indole-3-ene, 7-(4-biphenylyl)-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7,8-dimethyl-tricyclic [4.3.0.1 2,5 ] Indole-3-ene, 7,8,9-trimethyl-tricyclo[4.3.0.1 2,5 ]non-3-ene, 8-methyl-tricyclo[4.4. 0.1 2,5] undecane-3-ene, 8-phenyl - tricyclo [4.4.0.1 2,5] undecane-3-ene, 7-fluoro - Ring [4.3.0.1 2,5] dec-3-ene, 7-chloro - tricyclo [4.3.0.1 2,5] dec-3-ene, 7-bromo - tricyclo [4.3.0.1 2,5] dec 3-ene, 7,8-dichloro-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7,8,9-trichloro-tricyclo[4.3.0.1 2,5 ]癸-3 - alkene, 7-chloromethyl-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7-dichloromethyl-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7- Trichloromethyl-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7-hydroxy-tricyclo[4.3.0.1 2,5 ]non-3-ene, 7-cyano-tricyclo[4.3 .0.1 2,5 〕Indol-3-ene, 7-Amino-tricyclo[4.3.0.1 2,5 ]Indol-3-ene, Tetracycline [4.4.0.1 2,5 .1 7,10 ] Laurel - 3- ene, pentacyclo [7.4.0.1 2,5 .1 8,11 .0 7,12] pentadecyl-3-ene, hexacyclo [8.4.0.1 2,5 .1 7,14 .1 9, 12 .0 8,13 】 heptadecan-3-ene, 8-methyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]lauro-3-ene, 8-ethyl-tetracyclo[4.4 .0.1 2,5 .1 7,10 〕 Laurel-3-ene, 8-cyclohexyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-phenyl-tetracyclic [4.4.0.1 2,5 .1 7 , 10 〕 Laurel-3-ene, 8-(4-biphenyl)-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-methoxycarbonyl-tetracycline 4.4.0.1 2,5 .1 7,10 〕 Laurel-3-ene, 8-phenoxycarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-phenoxy Ethyl ethyl carbonyl-tetracyclo [4.4.0.1 2,5 .1 7,10 ] lauryl-3-ene, 8-phenylcarbonyloxy-tetracyclo [4.4.0.1 2,5 .1 7,10 ] laurel 3-ene, 8-methyl-8-methoxycarbonyl-tetracyclo [4.4.0.1 2,5 .1 7,10 ] lauryl-3-ene, 8-methyl-8-phenoxycarbonyl- Tetracycline [4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-methyl-8-phenoxyethylcarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-ethylene-tetracyclo[4.4.0.1 2,5 .1 7,10 ]lauro-3-ene, 8-ethylene-tetracyclo[4.4.0.1 2,5 .1 7, 10 ] Laurel-3-ene, 8,8-dimethyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8,9-dimethyl-tetracyclo[4.4. 0.1 2,5 .1 7,10] lauryl-3-ene, 8-fluoro - tetracyclo [4.4.0.1 2,5 .1 7,10] lauryl-3-ene, 8- - tetracyclo [4.4.0.1 2,5 .1 7,10] lauryl-3-ene, 8-bromo - tetracyclo [4.4.0.1 2,5 .1 7,10] lauryl-3-ene, 8,8 -Dichloro-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8,9-dichloro-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3 -ene, 8,8,9,9-tetrachloro-tetracyclo[4.4.0.1 2,5 .1 7,10 ]lauro-3-ene, 8-hydroxy-tetracyclo[4.4.0.1 2,5 .1 7,10 〕 Laurel-3-ene, 8-hydroxyethyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-methyl-8-hydroxyethyl-tetracyclic [4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-cyano-tetracyclo[4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene, 8-amino- Tetracycline [4.4.0.1 2,5 .1 7,10 ] Laurel-3-ene.

且,這些原冰片烯系化合物可單獨使用1種、或並用2種以上。Further, these ortho-ene ene-based compounds may be used alone or in combination of two or more.

構成單體或單體組成物之原冰片烯化合物的種類及量,可依據所得之原冰片烯系樹脂所要求的特性做適宜選擇。The type and amount of the raw borneol compound constituting the monomer or monomer composition can be appropriately selected depending on the properties required of the obtained raw borneol-based resin.

本發明中,彼等中,使用具有該分子內含有至少1個選自氧原子、氮原子、硫原子或矽原子之原子的結構(以下亦稱為「極性結構」)之化合物,因與其他原料之接著性或密著性優良故較佳。特別為前述式(1)中,R1 及R3 為氫原子或碳數1~3的烴基,較佳為氫原子、或甲基,R2 或R4 中任一為具有極性結構之基,他為氫原子或碳數1~3的烴基之化合物因樹脂之吸水(濕)性較低故較佳。且,具有極性結構之基為下述式(2)所示基之原冰片烯系化合物,因較容易得到所得之樹脂的耐熱性與吸水(濕)性之平衡性,故較佳。In the present invention, a compound having a structure (hereinafter also referred to as "polar structure") having at least one atom selected from an oxygen atom, a nitrogen atom, a sulfur atom or a ruthenium atom in the molecule is used, and It is preferred that the raw material has excellent adhesion or adhesion. In particular, in the above formula (1), R 1 and R 3 are a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms, preferably a hydrogen atom or a methyl group, and any of R 2 or R 4 is a group having a polar structure. The compound which is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms is preferred because the water absorption (wet) property of the resin is low. Further, the orogenic borneol-based compound having a group having a polar structure and having a group represented by the following formula (2) is preferred because it is easy to obtain a balance between heat resistance and water absorption (wet) of the obtained resin.

-(CH2 )Z COOR………(2)(式(2)中,R表示取代或非取代之碳原子數1~15的烴基,Z表示0或1~10的整數)。-(CH 2 ) Z COOR (2) (In the formula (2), R represents a substituted or unsubstituted hydrocarbon group having 1 to 15 carbon atoms, and Z represents 0 or an integer of 1 to 10).

前述式(2)中,Z的值越小,所得之(共)聚合物或其氫化物之玻璃轉移溫度越高,而耐熱性較優良,故z為0或1~3為整數為佳,且z為0之單體由容易合成的觀點來看較佳。又,前述式(2)中,R的碳數越多,所得之(共)聚合物或其氫化物之吸水(濕)性會有降低的傾向,但亦有玻璃轉移溫度降低之傾向,由保持耐熱性之觀點來看,以碳數1~10之烴基為佳,特別以碳數1~6之烴基為佳。In the above formula (2), the smaller the value of Z, the higher the glass transition temperature of the obtained (co)polymer or its hydride, and the better the heat resistance, so it is preferable that z is 0 or 1 to 3 is an integer. The monomer having z of 0 is preferred from the viewpoint of easy synthesis. Further, in the above formula (2), the higher the carbon number of R, the lower the water absorption (wet) property of the obtained (co)polymer or the hydride thereof, but the glass transition temperature tends to decrease. From the viewpoint of maintaining heat resistance, a hydrocarbon group having 1 to 10 carbon atoms is preferred, and a hydrocarbon group having 1 to 6 carbon atoms is particularly preferred.

且,前述式(1)中,前述式(2)所示基所結合之碳原子上結合碳數1~3之烷基,特別為結合甲基時,由耐熱性與吸水(濕)性之平衡觀點來看為佳。且,前述式(1)中,x為0或1,y為0之化合物,其由反應性較高,高產率下得到聚合物,又得到耐熱性較高之聚合物氫化物,更以工業上容易得到的觀點來看為佳。Further, in the above formula (1), the carbon atom to which the group represented by the formula (2) is bonded is bonded to the alkyl group having 1 to 3 carbon atoms, particularly when heat is bonded to the water, and the water is absorbed (wet). It is better to balance the point of view. Further, in the above formula (1), a compound wherein x is 0 or 1, and y is 0, which has a high reactivity, a polymer obtained at a high yield, and a polymer hydride having high heat resistance, and further industrial It is better to have an easy-to-obtain view.

欲得到本發明所使用的原冰片烯系樹脂,以不損害本發明之效果的範圍下,可將與前述原冰片烯系化合物可共聚合之單體含於單體組成物中進行聚合。作為可共聚合之單體,例如可舉出環丁烯、環戊烯、環庚烯、環辛烯、環月桂烯等環狀烯烴、或1,4-環辛二烯、二環戊二烯、環月桂三烯等非共軛環狀多烯。In order to obtain the ornidylene-based resin to be used in the present invention, a monomer copolymerizable with the above-mentioned ortho-ene-based compound can be polymerized in a monomer composition in a range that does not impair the effects of the present invention. Examples of the copolymerizable monomer include cyclic olefins such as cyclobutene, cyclopentene, cycloheptene, cyclooctene, and cyclolaurene, or 1,4-cyclooctadiene and dicyclopentane. A non-conjugated cyclic polyene such as an alkene or a cyclolaurotriene.

這些可共聚合之單體可單獨使用1種或並用2種以上。These copolymerizable monomers may be used alone or in combination of two or more.

<(共)聚合方法>構成本發明所使用的原冰片烯系樹脂薄膜(A)之原冰片烯系樹脂為,將前述單體或單體組成物(共)聚合後,視必要可再經氫化而製造。作為(共)聚合之方法,並無特別限定,但可舉出將前述單體或單體組成物進行開環聚合或加成聚合之方法。<(co)polymerization method> The raw borneol-based resin constituting the original borneol-based resin film (A) used in the present invention is obtained by (co)polymerizing the monomer or monomer composition, and if necessary, Manufactured by hydrogenation. The method of (co)polymerization is not particularly limited, and examples thereof include a method of subjecting the monomer or the monomer composition to ring-opening polymerization or addition polymerization.

A.開環聚合藉由開環聚合之(共)聚合物的製造,對於原冰片烯系化合物可藉由公知開環聚合反應進行,將含有前述原冰片烯系化合物之單體組成物使用聚合觸媒、聚合反應用溶劑、及視必要使用分子量調節劑,使其開環聚合後製造。A. Ring-opening polymerization The production of a (co)polymer by ring-opening polymerization can be carried out by a known ring-opening polymerization reaction for a raw borneol-based compound, and polymerization of a monomer composition containing the aforementioned norbornene-based compound. The catalyst, the solvent for polymerization, and, if necessary, a molecular weight modifier, are produced by ring-opening polymerization.

.開環聚合觸媒本發明中,單體組成物之(共)聚合藉由開環(共)聚合反應進行時,一般為易位觸媒存在下進行。. Ring-opening polymerization catalyst In the present invention, when the (co)polymerization of the monomer composition is carried out by ring-opening (co)polymerization, it is generally carried out in the presence of a metathesis catalyst.

該易位觸媒為,(A)至少1種選自具有W、Mo及Re之化合物的化合物(以下亦稱為化合物(A))、(B)具有Deming之周期表IA族元素(例如Li、Na、K等)、IIA族元素(例如、Mg、Ca等)、IIB族元素(例如、Zn、Cd、Hg等)、IIIA族元素(例如、B、Al等)、IVA族元素(例如、Si、Sn、Pb等)、或IVB族元素(例如、Ti、Zr等)之化合物、與至少1種選自具有至少1個該元素與碳之結合或該元素與氫之結合的化合物之化合物(以下亦稱為化合物(B))之組合所成的觸媒。又,欲提高觸媒之活性,可為再添加後述添加劑(C)者。The metathesis catalyst is (A) at least one compound selected from the group consisting of compounds having W, Mo, and Re (hereinafter also referred to as compound (A)), and (B) a group IA element having a Deming period (for example, Li). , Na, K, etc.), Group IIA elements (eg, Mg, Ca, etc.), Group IIB elements (eg, Zn, Cd, Hg, etc.), Group IIIA elements (eg, B, Al, etc.), Group IVA elements (eg a compound of Si, Sn, Pb, or the like, or a group IVB element (for example, Ti, Zr, etc.), and at least one compound selected from the group consisting of a compound having at least one bond of the element and carbon or a bond of the element and hydrogen. A catalyst formed by a combination of a compound (hereinafter also referred to as a compound (B)). Further, in order to increase the activity of the catalyst, the additive (C) described later may be further added.

作為化合物(A),可舉出W、Mo或Re之鹵化物、氧基鹵化物、烷氧基鹵化物、烷氧化物、羧酸鹽、(氧基)乙醯丙烯酸酯、羰基錯體、乙腈錯體、氫化物錯體、及其衍生物、或這些組合,但以W及Mo之化合物,特別為這些鹵化物、氧基鹵化物及烷氧基鹵化物於聚合活性、實用性的觀點來看為佳。又,藉由反應可使用生成前述化合物之2種以上化合物的混合物。且,這些化合物可藉由適當錯合化劑,例如藉由P(C6 H5 )5 、C5 H5 N等而進行錯合化。Examples of the compound (A) include a halide of W, Mo or Re, an oxyhalide, an alkoxy halide, an alkoxide, a carboxylate, an (oxy)acetone acrylate, a carbonyl complex, An acetonitrile complex, a hydride complex, and derivatives thereof, or a combination thereof, but a compound of W and Mo, particularly a halide, an oxyhalide and an alkoxy halide, in terms of polymerization activity and practicality It is better to look at it. Further, a mixture of two or more kinds of compounds which form the above compounds can be used by the reaction. Further, these compounds can be cleaved by a suitable deactivating agent, for example, by P(C 6 H 5 ) 5 , C 5 H 5 N or the like.

作為化合物(A)之具體例子,可舉出WCl6 、WCl5 、WCl4 、WBr6 、WF6 、WI6 、MoCl5 、MoCl4 、MoCl3 、ReCl3 、WOCl4 、MoOCl3 、ReOCl3 、ReOBr3 、W(OC6 H5 )6 、WCl2 (OC6 H5 )4 、Mo(OC2 H5 )2 Cl3 、Mo(OC2 H5 )5 、MoO2 (acac)2 、W(OCOR)5 、W(OC2 H5 )2 Cl3 、W(CO)6 、Mo(CO)6 、Re2 (CO)10 、ReOBr3 .P(C6 H5 )3 、WCl5 .P(C6 H5 )3 、WCl6 .C5 H5 N、W(CO)5 .P(C6 H5 )3 、W(CO)3 .(CH3 CN)3 等。又,前述化合物之中,作為特佳之化合物可舉出MoCl5 、Mo(OC2 H5 )2 Cl3 、WCl6 、W(OC2 H5 )2 Cl3 等。Specific examples of the compound (A) include WCl 6 , WCl 5 , WCl 4 , WBr 6 , WF 6 , WI 6 , MoCl 5 , MoCl 4 , MoCl 3 , ReCl 3 , WOCl 4 , MoOCl 3 , and ReOCl 3 . , ReOBr 3 , W(OC 6 H 5 ) 6 , WCl 2 (OC 6 H 5 ) 4 , Mo(OC 2 H 5 ) 2 Cl 3 , Mo(OC 2 H 5 ) 5 , MoO 2 (acac) 2 , W(OCOR) 5 , W(OC 2 H 5 ) 2 Cl 3 , W(CO) 6 , Mo(CO) 6 , Re 2 (CO) 10 , ReOBr 3 . P(C 6 H 5 ) 3 , WCl 5 . P(C 6 H 5 ) 3 , WCl 6 . C 5 H 5 N, W(CO) 5 . P(C 6 H 5 ) 3 , W(CO) 3 . (CH 3 CN) 3 and so on. Further, among the above compounds, particularly preferred are MoCl 5 , Mo(OC 2 H 5 ) 2 Cl 3 , WCl 6 , W(OC 2 H 5 ) 2 Cl 3 and the like.

作為化合物(B)之具體例子,可舉出n-C4 H5 Li、n-C5 H11 Na、C5 H5 Na、CH3 MgI、C2 H5 MgBr、CH3 MgBr、n-C3 H7 MgCl、(C6 H5 )3 Al、t-C4 H9 MgCl、CH2 =CHCH2 MgCl、(C2 H5 )2 Zn、(C2 H5 )2 Cd、CaZn(C2 H5 )4 、(CH3 )3 B、(C2 H5 )3 B、(n-C4 H9 )3 B、(CH3 )3 Al、(CH3 )2 AlCl、(CH3 )3 Al2 Cl3 、CH3 AlCl2 、(C2 H5 )3 Al、LiAl(C2 H5 )2 、(C2 H5 )3 Al-O(C2 H5 )2 、(C2 H5 )2 AlCl、C2 H5 AlCl2 、(C2 H5 )2 AlH、(iso-C4 H9 )2 AlH、(C2 H5 )2 AlOC2 H5 、(iso-C4 H9 )3 Al、(C2 H5 )3 Al2 Cl3 、(CH3 )4 Ga、(CH3 )4 Sn、(n-C4 H9 )Sn、(C2 H5 )3 SiH、(n-C6 H13 )3 Al、(n-C4 H17 )3 Al、LiH、NaH、B2 H6 、NaBH4 、AlH3 、LiAlH4 、BiH4 及TiH4 等。又,可使用藉由反應所產生的這些化合物之2種以上的化合物之混合物。作為這些較佳例,可舉出(CH3 )3 Al、(CH3 )2 AlCl、(CH3 )3 Al2 Cl3 、CH3 AlCl2 、(C2 H5 )3 Al、(C2 H5 )2 AlCl、(C2 H5 )1.5 AlCl1.5 、C2 H5 AlCl2 、(C2 H5 )2 AlH、(C2 H5 )2 AlOC2 H5 、(C2 H5 )2 AlCN、(C3 H7 )3 Al、(iso-C4 H9 )3 Al、(iso-C4 H9 )2 AlH、(C6 H13 )3 Al、(C8 H17 )3 Al、(C6 H5 )5 Al等。Specific examples of the compound (B) include n-C 4 H 5 Li, n-C 5 H 11 Na, C 5 H 5 Na, CH 3 MgI, C 2 H 5 MgBr, CH 3 MgBr, n-. C 3 H 7 MgCl, (C 6 H 5 ) 3 Al, t-C 4 H 9 MgCl, CH 2 =CHCH 2 MgCl, (C 2 H 5 ) 2 Zn, (C 2 H 5 ) 2 Cd, CaZn ( C 2 H 5 ) 4 , (CH 3 ) 3 B, (C 2 H 5 ) 3 B, (n-C 4 H 9 ) 3 B, (CH 3 ) 3 Al, (CH 3 ) 2 AlCl, (CH 3 ) 3 Al 2 Cl 3 , CH 3 AlCl 2 , (C 2 H 5 ) 3 Al, LiAl(C 2 H 5 ) 2 , (C 2 H 5 ) 3 Al-O(C 2 H 5 ) 2 , ( C 2 H 5 ) 2 AlCl, C 2 H 5 AlCl 2 , (C 2 H 5 ) 2 AlH, (iso-C 4 H 9 ) 2 AlH, (C 2 H 5 ) 2 AlOC 2 H 5 , (iso- C 4 H 9 ) 3 Al, (C 2 H 5 ) 3 Al 2 Cl 3 , (CH 3 ) 4 Ga, (CH 3 ) 4 Sn, (n-C 4 H 9 )Sn, (C 2 H 5 ) 3 SiH, (n-C 6 H 13 ) 3 Al, (n-C 4 H 17 ) 3 Al, LiH, NaH, B 2 H 6 , NaBH 4 , AlH 3 , LiAlH 4 , BiH 4 and TiH 4 . Further, a mixture of two or more kinds of these compounds which are produced by the reaction can be used. As such a preferable example, (CH 3 ) 3 Al, (CH 3 ) 2 AlCl, (CH 3 ) 3 Al 2 Cl 3 , CH 3 AlCl 2 , (C 2 H 5 ) 3 Al, (C 2 H 5 ) 2 AlCl, (C 2 H 5 ) 1.5 AlCl 1.5 , C 2 H 5 AlCl 2 , (C 2 H 5 ) 2 AlH, (C 2 H 5 ) 2 AlOC 2 H 5 , (C 2 H 5 ) 2 AlCN, (C 3 H 7 ) 3 Al, (iso-C 4 H 9 ) 3 Al, (iso-C 4 H 9 ) 2 AlH, (C 6 H 13 ) 3 Al, (C 8 H 17 ) 3 Al, (C 6 H 5 ) 5 Al, and the like.

作為可與前述化合物(A)及化合物(B)同時使用的添加劑(C),可使用醇類、醛類、酮類、胺類等,例如可舉出以下之(1)~(9)例子。As the additive (C) which can be used together with the compound (A) and the compound (B), an alcohol, an aldehyde, a ketone, an amine or the like can be used, and examples thereof include the following (1) to (9). .

(1)單體硼、BF3 、BCl3 、B(O-n-C4 H9 )3 、(C2 H5 O3 )2 、BF、B2 O3 、H3 BO3 等硼之非有機金屬化合物、Si(OC2 H5 )4 等矽之非有機金屬化合物;(2)醇類、過氧化氫類及過氧化物類;(3)水;(4)氧;(5)醛及酮等羰基化合物及其聚合物;(6)環氧乙烷、環氧氯丙烷(epichlorohydrin)、氧雜環丁烷等環狀醚類;(7)N,N-二乙基甲醯胺、N,N-二甲基乙醯胺等醯胺類、苯胺、嗎啉、哌啶等胺類及偶氮苯等之偶氮化合物;(8)N-亞硝基二甲基胺、N-亞硝基二苯基胺等N-亞硝基化合物;(9)含有三氯甲烷、N-氯琥珀酸亞胺、苯基亞磺醯基氯化物等S-Cl或N-Cl基之化合物。(1) Boron, such as boron, BF 3 , BCl 3 , B(O-n-C 4 H 9 ) 3 , (C 2 H 5 O 3 ) 2 , BF, B 2 O 3 , H 3 BO 3 Non-organometallic compounds, non-organometallic compounds such as Si(OC 2 H 5 ) 4 ; (2) alcohols, hydrogen peroxides and peroxides; (3) water; (4) oxygen; (5) a carbonyl compound such as an aldehyde or a ketone and a polymer thereof; (6) a cyclic ether such as ethylene oxide, epichlorohydrin or oxetane; (7) N,N-diethylformamidine An amine such as an amine or an amine such as N,N-dimethylacetamide, an amine such as aniline, morpholine or piperidine or an azo compound such as azobenzene; (8) N-nitrosodimethylamine; An N-nitroso compound such as N-nitrosodiphenylamine; (9) an S-Cl or N-Cl group such as chloroform, N-chlorosuccinimide or phenylsulfinyl chloride Compound.

易位觸媒的使用量為,與前述化合物(A)聚合所得之全單體的莫耳比(化合物:全單體)一般為滿足1:500~1:50,000,較佳為滿足1:1,000~1:10,000之量。The amount of the metathesis catalyst used is such that the molar ratio of the total monomer obtained by polymerizing the compound (A) (compound: all monomer) is generally from 1:500 to 1:50,000, preferably 1:1,000. ~1: 10,000.

化合物(A)與化合物(B)之比例(化合物(A):化合物(B))以金屬原子比為1:1~1:50,較佳為1:2~1:30。The ratio of the compound (A) to the compound (B) (the compound (A): the compound (B)) has a metal atomic ratio of 1:1 to 1:50, preferably 1:2 to 1:30.

化合物(A)與化合物(C)之比例(化合物(C):化合物(A))以莫耳比為0.005:1~15:1,較佳為0.05:1~7:1。The ratio of the compound (A) to the compound (C) (the compound (C): the compound (A)) has a molar ratio of 0.005:1 to 15:1, preferably 0.05:1 to 7:1.

.聚合溶劑作為開環聚合反應中所使用的溶劑,聚合中所使用的單體組成物或觸媒等不會因溶解而使觸媒失活,又僅為溶解生成之開環聚合物者即可,並無特別限定,例如可舉出戊烷、己烷、庚烷、辛烷、壬烷、癸烷等鏈烷類;環己烷、環庚烷、環辛烷、萘烷、原菠烷等環鏈烷類;苯、甲苯、二甲苯、乙基苯、枯烯等芳香族烴;氯丁烷、溴己烷、二氯甲烷、二氯乙烷、六伸甲基二溴化物、氯仿、四氯乙烯等鹵化鏈烷;氯苯等鹵化芳基化合物;乙酸乙基、乙酸n-丁基、乙酸iso-丁基、丙酸甲基、二甲氧基乙烷等飽和羧酸酯類;二丁基醚、四氫呋喃、二甲氧基乙烷等醚類等。這些可單獨或混合2種以上使用。如此溶劑為,作為構成分子量調節劑溶液之溶劑、使用於溶解前述原冰片烯系化合物、共聚合性單體及/或易位觸媒之溶劑使用。. The polymerization solvent is used as a solvent used in the ring-opening polymerization reaction, and the monomer composition or catalyst used in the polymerization is not deactivated by dissolution, and only the ring-opening polymer formed by dissolution can be used. It is not particularly limited, and examples thereof include alkanes such as pentane, hexane, heptane, octane, decane, and decane; cyclohexane, cycloheptane, cyclooctane, decalin, and raw spinel. Isocyclic alkanes; aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene, cumene; chlorobutane, bromohexane, dichloromethane, dichloroethane, hexamethylene dibromide, chloroform Halogenated alkane such as tetrachloroethylene; halogenated aryl compound such as chlorobenzene; saturated carboxylic acid ester such as ethyl acetate, n-butyl acetate, iso-butyl acetate, methyl propionate, dimethoxyethane An ether such as dibutyl ether, tetrahydrofuran or dimethoxyethane. These can be used individually or in mixture of 2 or more types. The solvent is used as a solvent constituting the molecular weight modifier solution and a solvent for dissolving the original borneol compound, the copolymerizable monomer, and/or the metathesis catalyst.

溶劑之使用量,溶劑與使用聚合之單體組成物的重量比(溶劑:單體組成物)一般為1:1~10:1,較佳為1:1~5:1之量為佳。The amount of the solvent used, the weight ratio of the solvent to the monomer composition to be polymerized (solvent: monomer composition) is usually from 1:1 to 10:1, preferably from 1:1 to 5:1.

.分子量調節劑所得之開環聚合物的分子量,可藉由聚合溫度、觸媒之種類、溶劑之種類做調節,但可藉由分子量調節劑於反應系之共存而做調節。. The molecular weight of the ring-opening polymer obtained by the molecular weight modifier can be adjusted by the polymerization temperature, the type of the catalyst, and the type of the solvent, but can be adjusted by the coexistence of the molecular weight modifier in the reaction system.

作為較佳的分子量調節劑,例如可舉出乙烯、丙烯、1-丁烯、1-戊烯、1-己烯、1-庚烯、1-辛烯、1-壬烯、1-癸烯等α-烯烴類及苯乙烯、4-甲基苯乙烯、2-甲基苯乙烯、4-乙基苯乙烯,其中以1-丁烯、1-己烯為特佳。這些分子量調節劑可單獨使用、或混合2種以上使用。Preferred examples of the molecular weight modifier include ethylene, propylene, 1-butene, 1-pentene, 1-hexene, 1-heptene, 1-octene, 1-decene, 1-decene. Such as α-olefins and styrene, 4-methylstyrene, 2-methylstyrene, 4-ethylstyrene, with 1-butene and 1-hexene being particularly preferred. These molecular weight modifiers can be used alone or in combination of two or more.

分子量調節劑之使用量,對於使用於開環聚合反應之單體1莫耳而言,一般為0.005~0.6莫耳,較佳為0.01~0.5莫耳。The amount of the molecular weight modifier used is generally from 0.005 to 0.6 mol, preferably from 0.01 to 0.5 mol, for the monomer 1 mole used in the ring-opening polymerization.

.其他開環聚合條件前述開環聚合物可由前述原冰片烯系化合物單獨下、或前述原冰片烯系化合物與共聚合性單體進行開環聚合而得到,但聚丁二烯、聚異丁烯等共軛二烯化合物、苯乙烯-丁二烯共聚合物、乙烯-非共軛二烯共聚合物、聚原冰片烯等、主鏈上含有2個以上的碳-碳間雙鍵之不飽和烴系聚合物等存在下將含有原冰片烯系化合物之單體組成物進行開環聚合。. Other ring-opening polymerization conditions The ring-opening polymer can be obtained by ring-opening polymerization of the above-mentioned ortho-ene-based compound alone or the above-mentioned ortho-ene-based compound and a copolymerizable monomer, but a total of polybutadiene, polyisobutylene, and the like. a conjugated diene compound, a styrene-butadiene copolymer, an ethylene-nonconjugated diene copolymer, a polynorbornene, or the like, and an unsaturated hydrocarbon having two or more carbon-carbon double bonds in its main chain The monomer composition containing a norbornene-based compound is subjected to ring-opening polymerization in the presence of a polymer or the like.

.氫化藉由前述開環聚合反應所得之聚合物,於該分子中具有烯烴性不飽和鍵。又,前述加成聚合反應中,聚合物可為該分子中具有烯烴性不飽和鍵的情況。如此聚合物分子中存在烯烴性不飽和鍵時,相關之烯烴性不飽和鍵為經時性地著色或成為凝膠化等劣化之原因,故進行該烯烴性不飽和鍵轉換為飽和鍵之氫化反應為佳。. The polymer obtained by the above ring-opening polymerization is hydrogenated, and has an olefinic unsaturated bond in the molecule. Further, in the above-mentioned addition polymerization reaction, the polymer may have an olefinic unsaturated bond in the molecule. When an olefinic unsaturated bond is present in the polymer molecule, the related olefinic unsaturated bond is caused by deterioration over time or gelation, so that the olefinic unsaturated bond is converted into a hydrogenation of a saturated bond. The reaction is better.

氫化反應為,可進行一般方法,即具有烯烴性不飽和鍵之聚合物的溶液中添加公知的氫化觸媒,於此常壓~300氣壓,較佳為3~200氣壓之氫氣於0~200℃、較佳為20~180℃下作用而進行。The hydrogenation reaction is carried out by adding a known hydrogenation catalyst to a solution of a polymer having an olefinic unsaturated bond, wherein the atmospheric pressure is -300 atmospheres, preferably 3 to 200 atmospheres of hydrogen at 0 to 200. It is carried out at a temperature of ° C, preferably 20 to 180 ° C.

氫化聚合物之氫化率為500MHz、1 H-NMR下所測定之值一般為50%以上,70%以上為佳,較佳為90%以上,特佳為98%以上,最佳為99%以上。氫化率越高,越能成為對於熱或光之安定性優良者,作為成形體使用時,因經過長時間亦可得到安定之特性故較佳。The hydrogenation ratio of the hydrogenated polymer is 500 MHz, and the value measured under 1 H-NMR is generally 50% or more, preferably 70% or more, preferably 90% or more, particularly preferably 98% or more, and most preferably 99% or more. . The higher the hydrogenation rate, the better the stability to heat or light. When used as a molded article, it is preferable because it can obtain stable properties over a long period of time.

且,前述方法所得之聚合物為該分子內具有芳香族基時,相關芳香族基不會成為經時性著色或凝膠化等劣化的原因,反而可對機械性特性或光學特性賦予有利之作用,對於相關芳香族基並非必須進行氫化。Further, when the polymer obtained by the above method has an aromatic group in the molecule, the related aromatic group does not cause deterioration such as time-lapse coloration or gelation, and it is advantageous in terms of mechanical properties or optical properties. The role does not necessarily require hydrogenation for the relevant aromatic groups.

作為氫化觸媒,可使用一般烯烴性化合物之氫化反應所使用者。作為該氫化觸媒可舉出不均一系觸媒及均一系觸媒。As the hydrogenation catalyst, a user of a hydrogenation reaction of a general olefinic compound can be used. As the hydrogenation catalyst, a heterogeneous catalyst and a homogeneous catalyst are exemplified.

作為不均一系觸媒可舉出鈀、白金、鎳、銠、釕等貴金屬觸媒物質,可舉出載持於碳、二氧化矽、氧化鋁、二氧化鈦等載體之固體觸媒。作為均一系觸媒可舉出環烷基鎳/三乙基鋁、鎳乙醯丙酮酸鹽/三乙基鋁、辛烯酸鈷/n-丁基鋰、二氯二茂鈦/二乙基單氯化鋁、乙酸銠、氯參(三苯基膦)銠、二氯參(三苯基膦)釕、氯氫羰基參(三苯基膦)釕、二氯羰基參(三苯基膦)釕等。觸媒的形態可為粉末或粒狀。Examples of the heterogeneous catalyst include noble metal catalyst materials such as palladium, platinum, nickel, rhodium, and ruthenium, and examples thereof include a solid catalyst supported on a carrier such as carbon, cerium oxide, alumina, or titania. Examples of the homogeneous catalyst include cycloalkyl nickel/triethyl aluminum, nickel acetonitrile pyruvate/triethyl aluminum, cobalt octylate/n-butyl lithium, and dichlorotitanium dichloride/diethyl. Monochloroaluminum, barium acetate, chloroform (triphenylphosphine) ruthenium, dichlorostilbene (triphenylphosphine) ruthenium, chlorohydrocarbonyl carbonyl (triphenylphosphine) ruthenium, dichlorocarbonyl ginseng (triphenylphosphine) )钌. The form of the catalyst can be powder or granular.

這些氫化觸媒,一般開環聚合物與氫化觸媒之重量比(開環聚合物:氫化觸媒)為使用1:1×10-6 ~1:2×10-3 之比例。These hydrogenation catalysts, generally in a weight ratio of a ring-opening polymer to a hydrogenation catalyst (open-loop polymer: hydrogenation catalyst), are used in a ratio of 1:1 × 10 -6 to 1:2 × 10 -3 .

B.加成聚合藉由加成(共)聚合之聚合物的製造為,對於原冰片烯系化合物可藉由公知加成聚合反應進行,將含有前述原冰片烯系化合物之單體組成物使用聚合觸媒、視必要使用聚合反應用溶劑、及視必要使用分子量調節劑,藉由加成聚合而製造出。B. Addition Polymerization The production of a polymer obtained by addition (co)polymerization is carried out by a known addition polymerization reaction to a raw borneol-based compound, and a monomer composition containing the above-mentioned ortho-ene-based compound is used. The polymerization catalyst is produced by addition polymerization using a solvent for polymerization reaction and, if necessary, a molecular weight modifier.

.加成聚合觸媒作為加成聚合之聚合觸媒,例如可舉出下述(1)~(3)所舉之鈀、鎳、鈷、鈦及鋯等單一觸媒或多成分系觸媒,但本發明所使用的聚合觸媒並未限定於此。. The addition polymerization catalyst is a polymerization catalyst for addition polymerization, and examples thereof include a single catalyst or a multi-component catalyst such as palladium, nickel, cobalt, titanium, or zirconium as described in the following (1) to (3). However, the polymerization catalyst used in the present invention is not limited thereto.

(1)單一觸媒系[Pd(CH3 CN)4 ][BF4 ]2 、[Pd(PhCN)4 ][SbF6 ] [(η3 -巴豆基)Pd(環辛-1,5-二烯)][PF6 ]、[(η3 -巴豆基)Ni(環辛-1,5-二烯)][B(3,5-(CF3 )2 C6 F3 )4 ]、[(η3 -巴豆基)Ni(環辛-1,5-二烯)][PF6 ]、[(η3 -allyl)Ni(環辛-1,5-二烯)][B(C6 F5 )4 ]、[(η3 -巴豆基)Ni(環辛-1,5-二烯)][SbF6 ]、甲苯.Ni(C6 F5 )2 、苯.Ni(C6 F5 )2 、三甲基苯.Ni(C6 F5 )2 、乙醚(ethylether).Ni(C6 F5 )2 等。(1) Single catalyst system [Pd(CH 3 CN) 4 ][BF 4 ] 2 , [Pd(PhCN) 4 ][SbF 6 ] [(η 3 - Crotonyl) Pd (cycloxin-1,5- Diene)][PF 6 ], [(η 3 -crotyl)Ni(cyclooctane-1,5-diene)][B(3,5-(CF 3 ) 2 C 6 F 3 ) 4 ], [(η 3 - Crotonyl) Ni (cyclooctane-1,5-diene)][PF 6 ], [(η 3 -allyl)Ni(cyclooctane-1,5-diene)][B(C 6 F 5 ) 4 ], [(η 3 - Crotonyl) Ni (cyclooctane-1,5-diene)] [SbF 6 ], toluene. Ni(C 6 F 5 ) 2 , benzene. Ni(C 6 F 5 ) 2 , trimethylbenzene. Ni(C 6 F 5 ) 2 , diethyl ether (ethylether). Ni(C 6 F 5 ) 2 and the like.

(2)多成分系觸媒系可舉出具有σ或σ,π結合之鈀錯體與有機鋁或超強酸鹽之組合、二-μ-氯-雙(6-甲氧基雙環[2.2.1]庚-2-烯-endo-5 σ,2 π)Pd、與選自甲基二氧化鈦(簡稱為MAO)、AgSbF6 或AgBF4 之化合物的組合、[(η3 -芳基)PdCl]2 、與AgSbF6 或AgBF4 的組合、[(環辛-1,5-二烯)Pd(CH3 )Cl]與PPh3 與NaB[3,5-(CF3 )2 C6 H3 ]4 之組合等。(2) The multi-component catalyst system may be a combination of a palladium complex having a σ or σ, π bond with an organoaluminum or a super acid salt, and a di-μ-chloro-bis(6-methoxybicyclo[2.2 .1]hept-2-ene-endo-5 σ,2 π)Pd, in combination with a compound selected from methyl titanium dioxide (MAO), AgSbF 6 or AgBF 4 , [(η 3 -aryl) PdCl 2 , in combination with AgSbF 6 or AgBF 4 , [(cyclooctyl-1,5-diene) Pd(CH 3 )Cl] and PPh 3 with NaB[3,5-(CF 3 ) 2 C 6 H 3 ] 4 combinations, etc.

(3)多成分觸媒系(I)選自鎳化合物、鈷化合物、鈦化合物或鋯化合物之過渡金屬化合物、(II)選自超強酸、路易氏酸及離子性硼化合物之化合物、(III)有機鋁化合物之3成分所組合成。(3) a multicomponent catalyst system (I) is selected from the group consisting of a nickel compound, a cobalt compound, a transition metal compound of a titanium compound or a zirconium compound, (II) a compound selected from the group consisting of super acid, Lewis acid and ionic boron compound, (III) The three components of the organoaluminum compound are combined.

(I)過渡金屬化合物之例子(I-1)鎳化合物、鈷化合物之例子:選自鎳或鈷的有機羧酸鹽、有機亞磷酸鹽、有機磷酸鹽、有機磺酸鹽、β-二酮化合物等之化合物;例如可舉出己烷酸鎳、環烷基鎳、環烷基鈷、油酸鎳、月桂烷酸鎳、月桂烷酸鈷、新癸烷酸鈷、二丁基亞磷酸鎳、二丁基磷酸鎳、二辛基磷酸鎳、磷酸二丁基酯的鹽、月桂基苯磺酸鎳、p-甲苯磺酸鎳、雙(乙醯丙酮酸鹽)鎳、雙(乙基乙醯乙酸鹽)鎳等。(I) Examples of transition metal compounds (I-1) Examples of nickel compounds and cobalt compounds: organic carboxylates selected from nickel or cobalt, organic phosphites, organic phosphates, organic sulfonates, β-diketones a compound such as a compound; for example, nickel hexanoate, cycloalkyl nickel, cycloalkyl cobalt, nickel oleate, nickel laurate, cobalt laurate, cobalt neodecanoate, nickel dibutyl phosphite , dibutyl nickel phosphate, nickel dioctyl phosphate, salt of dibutyl phosphate, nickel lauryl benzene sulfonate, nickel p-toluene sulfonate, nickel bis(acetyl acetonate), double (ethyl ethyl醯acetate) nickel and the like.

前述鎳的機羧酸鹽以氟化銻酸、四氟化硼酸、三氟乙酸、六氟化丙酮等超強酸進行改性之化合物。The above-mentioned organic carboxylate of nickel is a compound modified with a super acid such as fluorinated acid, tetrafluoroboric acid, trifluoroacetic acid or hexafluoroacetic acid.

鎳的二烯或三烯烴配位錯體;例如二氯(1,5-環辛二烯)鎳、[(η3 -丁烯基)(1,5-環辛二烯)鎳]六氟磷酸鹽、及其四氟硼酸鹽、肆[3,5-雙(三氟甲基)]硼酸鹽錯體、(1,5,9-環月桂三烯)鎳、雙(原菠二烯)鎳、雙(1,5-環辛二烯)鎳等鎳錯體。Nickel diene or triolefin coordination dislocation; for example, dichloro(1,5-cyclooctadiene)nickel, [(η 3 -butenyl)(1,5-cyclooctadiene)nickel]hexafluoro Phosphate, its tetrafluoroborate, bismuth [3,5-bis(trifluoromethyl)]borate complex, (1,5,9-cyclolauric triene) nickel, bis (original spinadiene) A nickel complex such as nickel or bis(1,5-cyclooctadiene) nickel.

於鎳具有P、N、O等原子之配位子配位所成之錯體;例如雙(三苯基膦)二氯化鎳、雙(三苯基膦)鎳二溴化物、雙(三苯基膦)鈷二溴化物、雙[三(2-甲基苯基)膦]二氯化鎳、雙[三(4-甲基苯基)膦]二氯化鎳、雙[N-(3-t-丁基亞柳基)苯基胺基酸鹽]鎳、Ni[PhC(O)CH](Ph)、Ni(OC(C6 H4 )PPh)(H)(PCy3 )、Ni[OC(O)(C6 H4 )P](H)(PPh3 )、雙(1,5-環辛二烯)鎳與PhC(O)CH=PPh3 與之反應物、[2,6-(i-Pr)2 C6 H3 N=CHC6 H3 (O)(Anth)](Ph)(PPh3 )Ni等鎳錯體(其中,Anth表示9-蒽基、Ph表示苯基、Cy表示環己基之簡稱)。a complex formed by the coordination of a ligand having a P, N, O atom such as nickel; for example, bis(triphenylphosphine)nickel dichloride, bis(triphenylphosphine)nickel dibromide, bis (three) Phenylphosphine)cobalt dibromide, bis[tris(2-methylphenyl)phosphine]nickel dichloride, bis[tris(4-methylphenyl)phosphine]nickel dichloride, bis[N-( 3-t-butyl sulfinyl) phenylamino acid salt] nickel, Ni[PhC(O)CH](Ph), Ni(OC(C 6 H 4 )PPh)(H)(PCy 3 ), Ni[OC(O)(C 6 H 4 )P](H)(PPh 3 ), bis(1,5-cyclooctadiene) nickel and PhC(O)CH=PPh 3 with reactants, [2 , 6-(i-Pr) 2 C 6 H 3 N=CHC 6 H 3 (O)(Anth)](Ph)(PPh 3 )Ni and other nickel complexes (wherein Anth represents 9-fluorenyl, Ph represents Phenyl and Cy represent the abbreviation of cyclohexyl).

(I-2)鈦、鋯化合物之例子:[t-BuNSiMe(Me4 Cp)]TiCl2 、(Me4 Cp)(O-iPr2 C6 H3 )2 TiCl、(Me4 Cp)TiCl3 、(Me4 Cp)Ti(OBu)3 、[t-BuNSiMe2 Flu]TiMe2 、[t-BuNSiMe2 Flu]TiCl2 、Et(Ind)2 ZrCl2 、Ph2 C(Ind)(Cp)ZrCl2 、iPr(Cp)(Flu)ZrCl2 、iPr(3-tert-But-Cp)(Ind)ZrCl2 、iPr(Cp)(Ind)ZrCl2 、Me2 Si(Ind)2 ZrCl2 、Cp2 ZrCl2 、(Cp表示Cyclopentadienl之簡稱、Ind為Indenyl簡稱、Flu為Fluorenyl之簡稱)等。(I-2) Examples of titanium and zirconium compounds: [t-BuNSiMe(Me 4 Cp)]TiCl 2 , (Me 4 Cp)(O-iPr 2 C 6 H 3 ) 2 TiCl, (Me 4 Cp)TiCl 3 , (Me 4 Cp)Ti(OBu) 3 , [t-BuNSiMe 2 Flu]TiMe 2 , [t-BuNSiMe 2 Flu]TiCl 2 , Et(Ind) 2 ZrCl 2 , Ph 2 C(Ind)(Cp)ZrCl 2 , iPr(Cp)(Flu)ZrCl 2 , iPr(3-tert-But-Cp)(Ind)ZrCl 2 , iPr(Cp)(Ind)ZrCl 2 , Me 2 Si(Ind) 2 ZrCl 2 , Cp 2 ZrCl 2 , (Cp represents short for Cyclopentadienl, Ind is abbreviated as Indenyl, and Flu is abbreviated as Fluorenyl).

(II)超強酸、路易氏酸及離子性硼化合物的例子:作為超強酸,例如可舉出六氟銻酸、六氟磷酸、六氟砒酸、三氟乙酸、氟硫酸、三氟甲磺酸、四氟硼酸、肆(五氟苯基)硼酸、肆[3,5-雙(三氟甲基)苯基]硼酸、p-甲苯磺酸、五氟丙酸等、作為路易氏氧化合物,例如可舉出三氟化硼與醚、胺、酚等之錯體、三氟化鋁之醚、胺、酚等錯體、參(五氟苯基)硼烷、參[3,5-雙(三氟甲基)苯基]硼烷、等硼化合物、三鹽化鋁、三溴化鋁、乙基二氯化鋁、乙基倍半氯化鋁、二乙基鋁氟化物、三(五氟苯基)鋁等鋁化合物、六氟丙酮、六氯丙酮、四氯苯醌、六氟甲基乙基酮等顯示路易氏酸性之有機鹵化合物,其他亦可舉出四氯化鈦、五氟銻等顯示路易氏酸性之化合物等、作為離子性硼化合物,例如可舉出三苯基碳鎓肆(五氟苯基)硼酸鹽、三苯基碳鎓肆〔3,5-雙(三氟甲基)苯基〕硼酸鹽、三苯基碳鎓肆(2,4,6-三氟苯基)硼酸鹽、三苯基碳鎓四苯基硼酸鹽、三丁基銨肆(五氟苯基)硼酸鹽、N,N-二甲基苯銨肆(五氟苯基)硼酸鹽、N,N-二乙基苯銨肆(五氟苯基)硼酸鹽、N,N-二苯基苯銨肆(五氟苯基)硼酸鹽等。(II) Examples of super acid, Lewis acid and ionic boron compound: Examples of the super acid include hexafluoroantimonic acid, hexafluorophosphoric acid, hexafluoroantimonic acid, trifluoroacetic acid, fluorosulfuric acid, and trifluoromethanesulfonic acid. , tetrafluoroboric acid, hydrazine (pentafluorophenyl)boronic acid, hydrazine [3,5-bis(trifluoromethyl)phenyl]boronic acid, p-toluenesulfonic acid, pentafluoropropionic acid, etc., as a Lewis oxide compound, Examples thereof include a complex of boron trifluoride with an ether, an amine, a phenol, an ether of aluminum trifluoride, a complex of an amine or a phenol, a quinone (pentafluorophenyl) borane, and a ginseng [3,5-double. (Trifluoromethyl)phenyl]borane, boron compound, aluminum trisallate, aluminum tribromide, ethyl aluminum dichloride, ethyl aluminum sesquichloride, diethyl aluminum fluoride, three ( An aluminum compound such as pentafluorophenyl)aluminum, an organic halogen compound such as hexafluoroacetone, hexachloroacetone, tetrachlorophenyl hydrazine or hexafluoromethyl ethyl ketone which exhibits Lewis acidity, and others may also be titanium tetrachloride. Examples of the ionic boron compound such as pentafluoroindole and the like which exhibit a Lewis acid compound, and examples thereof include triphenylcarbonium (pentafluorophenyl) borate and triphenylcarbenium [3,5-bis ( Trifluoromethyl)benzene 】 borate, triphenylcarbenium (2,4,6-trifluorophenyl)borate, triphenylcarbonium tetraphenylborate, tributylammonium quinone (pentafluorophenyl) borate, N,N-dimethylanilinium quinone (pentafluorophenyl)borate, N,N-diethylanilinium quinone (pentafluorophenyl)borate, N,N-diphenylanilinium oxime (five Fluorophenyl) borate and the like.

(III)之有機鋁化合物的例子:可使用甲基二氧化鈦、乙基二氧化鈦、丁基二氧化鈦等烷基二氧化鈦化合物、三甲基鋁、三乙基鋁、三異丁基鋁、二異丁基鋁氫化物、二乙基氯化鋁、二乙基氟化鋁、乙基倍半氯化鋁、乙基二氯化鋁等烷基鋁化合物及鹵化烷基鋁化合物、或前述烷基二氧化鈦化合物與前述烷基鋁化合物之混合物等。An example of the organoaluminum compound of (III): an alkyltitanium compound such as methyltitanium dioxide, ethyltitanium dioxide or butyltitanium dioxide, trimethylaluminum, triethylaluminum, triisobutylaluminum, diisobutylaluminum may be used. An alkyl aluminum compound such as hydride, diethyl aluminum chloride, diethyl aluminum fluoride, ethyl aluminum sesquichloride or ethyl aluminum dichloride; and an alkyl aluminum halide compound or the above alkyl titanium oxide compound and a mixture of the aforementioned alkyl aluminum compounds, and the like.

這些觸媒成分,例如可使用以下範圍之使用量。These catalyst components can be used, for example, in the following ranges.

鎳化合物、鈀化合物、鈷化合物、鈦化合物及鋯化合物等過渡金屬化合物對於單體1莫耳而言,為0.02~100mmol原子;有機鋁化合物對於過渡金屬化合物1莫耳原子而言,為1~5,000莫耳;又非共軛二烯、路易氏酸、離子性硼化合物對於過渡金屬化合物之1莫耳原子而言,為0~100莫耳程度。The transition metal compound such as a nickel compound, a palladium compound, a cobalt compound, a titanium compound, and a zirconium compound is 0.02 to 100 mmol atoms for the monomer 1 mole; and the organoaluminum compound is 1 to the transition metal compound 1 molar atom. 5,000 mol; and the non-conjugated diene, the Lewis acid, and the ionic boron compound are 0 to 100 m to the 1 mol atom of the transition metal compound.

.加成聚合溶劑作為加成聚合反應中所使用的溶劑,溶解使用於聚合之單體組成物或觸媒等時不會使觸媒失活,且可溶解所生成之加成聚合物即刻,並無特別限定,例如可舉出選自環己烷、環戊烷、甲基環戊烷等脂環式烴溶劑、己烷、庚烷、辛烷等脂肪族烴溶劑、甲苯、苯、二甲苯、均三甲苯等芳香族烴溶劑、二氯甲烷、1,2-二氯乙烷、1,1-二氯乙烷、四氯乙烷、氯苯、二氯苯等鹵化烴溶劑等之溶劑。這些可單獨使用、或混合2種以上使用。. The addition polymerization solvent is used as a solvent used in the addition polymerization reaction, and is dissolved in a monomer composition or a catalyst for polymerization, so that the catalyst is not deactivated, and the formed addition polymer can be dissolved immediately, and The alicyclic hydrocarbon solvent selected from the group consisting of cyclohexane, cyclopentane, and methylcyclopentane, and an aliphatic hydrocarbon solvent such as hexane, heptane, and octane, toluene, benzene, and xylene are exemplified. a solvent such as an aromatic hydrocarbon solvent such as mesitylene, a halogenated hydrocarbon solvent such as dichloromethane, 1,2-dichloroethane, 1,1-dichloroethane, tetrachloroethane, chlorobenzene or dichlorobenzene; . These can be used individually or in mixture of 2 or more types.

.分子量調節劑本發明中,製造之原冰片烯系加成聚合物的分子量之調節,可添加作為分子量調節劑之氫或α-烯烴於聚合系內而進行。所生成之原冰片烯系加成聚合物的分子量為所添加之分子量調節劑越多則越低。. Molecular Weight Modifier In the present invention, the molecular weight of the produced norbornene-based addition polymer can be adjusted by adding hydrogen or an α-olefin as a molecular weight modifier to the polymerization system. The molecular weight of the produced orniolene-based addition polymer is lower as the amount of the molecular weight modifier added is increased.

<原冰片烯系樹脂之性狀>本發明所使用的原冰片烯系樹脂中固有黏度[η]inh 較佳為0.2~2.0dl/g,更佳為0.35~1.0dl/g,特佳為0.4~0.85dl/g,由凝膠滲透色譜(GPC)測定之聚苯乙烯換算之數平均分子量(Mn)中,較佳為5000~100萬,更佳為1萬~50萬、特佳為1.5萬~25萬,重量平均分子量(Mw)為1萬~200萬,更佳為2萬~100萬,特佳為3萬~50萬者。若固有黏度[η]inh 、數平均分子量及重量平均分子量為上述範圍時,原冰片烯系樹脂會成為機械性強度優良者,可得到較難破損之原冰片烯系樹脂薄膜。<Proper properties of the original borneol-based resin> The intrinsic viscosity [η] inh of the ortho-ene based resin used in the present invention is preferably 0.2 to 2.0 dl/g, more preferably 0.35 to 1.0 dl/g, and particularly preferably 0.4. ~0.85 dl / g, the number average molecular weight (Mn) in terms of polystyrene measured by gel permeation chromatography (GPC) is preferably 5,000 to 1,000,000, more preferably 10,000 to 500,000, and particularly preferably 1.5. 10,000 to 250,000, the weight average molecular weight (Mw) is 10,000 to 2 million, more preferably 20,000 to 1 million, and particularly good is 30,000 to 500,000. When the intrinsic viscosity [η] inh , the number average molecular weight, and the weight average molecular weight are in the above range, the original norbornene-based resin is excellent in mechanical strength, and an orthorhombic resin film which is hard to be broken can be obtained.

前述原冰片烯系樹脂之玻璃轉移溫度(Tg)中,一般為100℃以上,較佳為120℃以上,更佳為150℃以上。Tg為上述範圍內時,原冰片烯系樹脂薄膜之加工性會優良之同時,可得到本發明之光學薄膜的安定特性。The glass transition temperature (Tg) of the raw borneol-based resin is usually 100 ° C or higher, preferably 120 ° C or higher, and more preferably 150 ° C or higher. When Tg is in the above range, the processability of the original borneol-based resin film is excellent, and the stability characteristics of the optical film of the present invention can be obtained.

又,原冰片烯系樹脂之飽和吸水率為1重量%以下,較佳為0.01~0.8重量%,更佳為0.1~0.5重量%。飽和吸水率若超過1重量%時,相關樹脂所得之薄膜會因所使用之環境而會產生經時性吸水(濕)變形等耐久性問題。另一方面,未達0.01重量%時,可能於接著性產生問題。又,飽和吸水率若於上述範圍內時,,特別作為偏光板使用時,會因耐久安定性而表現優良特性。且,前述飽和吸水率為,依據ASTM D570,23℃之水中浸漬1星期而測定其增加重量所得之值。Further, the saturated water absorption of the original borneol-based resin is 1% by weight or less, preferably 0.01 to 0.8% by weight, more preferably 0.1 to 0.5% by weight. When the saturated water absorption ratio exceeds 1% by weight, the film obtained by the related resin may have durability problems such as temporal water absorption (wet) deformation due to the environment to be used. On the other hand, when it is less than 0.01% by weight, there may be a problem in adhesion. Further, when the saturated water absorption ratio is within the above range, when used as a polarizing plate in particular, it exhibits excellent properties due to durability stability. Further, the saturated water absorption rate is a value obtained by measuring the weight gain according to ASTM D570, immersed in water at 23 ° C for one week.

<原冰片烯系樹脂之其他成分>本發明中,以不損害本發明之效果的範圍下,原冰片烯系樹脂中可再添加抗氧化劑、紫外線吸收劑等添加劑。<Other components of the original borneol-based resin> In the present invention, an additive such as an antioxidant or an ultraviolet absorber may be further added to the original borneol-based resin in a range that does not impair the effects of the present invention.

作為抗氧化劑,例如可舉出2,6-二-t-丁基-4-甲基酚、2,2’-二氧基-3,3’-二-t-丁基-5,5’-二甲基二苯基甲烷、肆〔伸甲基-3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯〕甲烷等。Examples of the antioxidant include 2,6-di-t-butyl-4-methylphenol and 2,2'-dioxy-3,3'-di-t-butyl-5,5'. - dimethyldiphenylmethane, hydrazine [methyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate] methane, and the like.

作為紫外線吸收劑,例如可舉出2,4-二羥基二苯甲酮、2-羥基-4-甲氧基二苯甲酮等。又,藉由後述之溶液鑄造法製造出原冰片烯系樹脂薄膜(A)時,藉由添加塗平劑或消泡劑可容易地製造出樹脂薄膜。Examples of the ultraviolet absorber include 2,4-dihydroxybenzophenone and 2-hydroxy-4-methoxybenzophenone. Moreover, when the original borneol-based resin film (A) is produced by a solution casting method to be described later, a resin film can be easily produced by adding a coating agent or an antifoaming agent.

且,這些添加劑可於製造本發明所使用的原冰片烯系樹脂薄膜(A)時,與原冰片烯系樹脂等同時混合、或可於製造原冰片烯系樹脂時添加而做預先調配。又,添加量可依據所望特性做適宜選擇,但對於原冰片烯系樹脂100重量份而言,一般為0.01~5.0重量份,較佳為0.05~2.0重量份。In addition, when the raw borneol-based resin film (A) used in the present invention is produced, it may be mixed with an original borneol-based resin or the like, or may be added in advance when the original borneol-based resin is produced. Further, the amount of addition may be appropriately selected depending on the desired characteristics, but it is usually 0.01 to 5.0 parts by weight, preferably 0.05 to 2.0 parts by weight, per 100 parts by weight of the original borneol-based resin.

<原冰片烯系樹脂薄膜(A)之製造>本發明所使用的原冰片烯系樹脂薄膜(A)為,將原冰片烯系樹脂藉由直接熔融成形,或藉由溶解於溶劑後鑄造(溶劑鑄造成形)之方法而做適當成形。<Production of the original borneol-based resin film (A)> The norbornene-based resin film (A) used in the present invention is obtained by directly melt-molding the original borneol-based resin or by dissolving in a solvent ( Forming by solvent casting method.

.熔融成形本發明所使用的原冰片烯系樹脂薄膜(A)為,可將含有原冰片烯系樹脂、或原冰片烯系樹脂與上述添加劑之樹脂組成物經熔融成形而製造。作為熔融成形方法,例如可舉出射出成形、熔融押出成形或吹氣成形等。. Melt-forming The original borneol-based resin film (A) used in the present invention can be produced by melt-molding a resin composition containing a norbornene-based resin or a norbornene-based resin and the above additives. Examples of the melt molding method include injection molding, melt extrusion molding, and air blowing molding.

.溶劑鑄造本發明所使用的原冰片烯系樹脂薄膜(A)為,將原冰片烯系樹脂溶解於溶劑之液狀樹脂組成物於適當基材上進行鑄造後除去溶劑而製造出。例如於鋼帶、鋼桶或聚酯薄膜等基材上,塗佈上述液狀樹脂組成物後乾燥溶劑後,自基材剝離塗膜,且依所需自基材剝離塗膜後再進行乾燥而得到原冰片烯系樹脂薄膜(A)。. Solvent casting The original borneol-based resin film (A) used in the present invention is produced by casting a liquid resin composition in which a raw borneol-based resin is dissolved in a solvent, casting it on a suitable substrate, and removing the solvent. For example, after coating the liquid resin composition on a substrate such as a steel strip, a steel drum or a polyester film, the solvent is dried, the coating film is peeled off from the substrate, and the coating film is peeled off from the substrate as needed, followed by drying. The original borneol-based resin film (A) was obtained.

前述方法所得之原冰片烯系樹脂薄膜(A)中的残留溶劑量儘可能少為佳,一般3重量%以下,較佳為1重量%以下,更佳為0.5重量%以下。残留溶劑量若超過3重量%時,經時性地薄膜會變形或特性變化而無法發揮所望的功能。The amount of residual solvent in the original borneol-based resin film (A) obtained by the above method is preferably as small as possible, and is usually 3% by weight or less, preferably 1% by weight or less, more preferably 0.5% by weight or less. When the amount of the residual solvent exceeds 3% by weight, the film may be deformed or the properties may change over time, and the desired function may not be exhibited.

.表面處理本發明所使用的原冰片烯系樹脂薄膜(A)為,光透過性一般為80%以上,較佳為85%以上,更佳為90%以上。. Surface Treatment The original borneol-based resin film (A) used in the present invention has a light transmittance of generally 80% or more, preferably 85% or more, more preferably 90% or more.

又,本發明所使用的原冰片烯系樹脂薄膜(A)亦可係以提高與後述防靜電層(B)之接著性為目的而施予表面處理者。作為該表面處理,可舉出等離子處理、電暈處理、鹼處理、等離子塗佈處理等。In addition, the original borneol-based resin film (A) used in the present invention may be applied to a surface treatment agent for the purpose of improving adhesion to an antistatic layer (B) to be described later. Examples of the surface treatment include plasma treatment, corona treatment, alkali treatment, plasma coating treatment, and the like.

使用電暈處理時,可強固原冰片烯系樹脂薄膜(A)與防靜電層(B)之密著。作為此時的電暈處理條件,電暈放電電子之照射量為1~1000W/m2 /min時較佳,為10~100W/m2 /min時更佳。藉此若照射量過低時,有時無法得到充分表面改質效果,又藉此若照射量過高時,處理效果恐怕無法到達原冰片烯系樹脂薄膜(A)之內部、或原冰片烯系樹脂薄膜(A)本身恐怕會變質。又,電暈處理不僅施予設置防靜電層(B)之面,亦可施予其反面。When the corona treatment is used, the original borneol-based resin film (A) and the antistatic layer (B) can be adhered to each other. The corona treatment condition at this time is preferably 1 to 1000 W/m 2 /min, and more preferably 10 to 100 W/m 2 /min. Therefore, when the irradiation amount is too low, a sufficient surface modification effect may not be obtained, and if the irradiation amount is too high, the treatment effect may not reach the inside of the original borneol-based resin film (A) or the original borneol. The resin film (A) itself may be deteriorated. Further, the corona treatment is applied not only to the surface on which the antistatic layer (B) is provided but also to the reverse side.

.延伸處理本發明所使用的原冰片烯系樹脂薄膜(A),可為未延伸之薄膜,亦可為經延伸之薄膜。又,本發明所使用的原冰片烯系樹脂薄膜(A)可僅由原冰片烯系樹脂層所成之薄膜、又可為原冰片烯系樹脂層與聚乙烯等他原料所成之層的複合薄膜。本發明所使用的原冰片烯系樹脂薄膜(A)與其他原料之複合薄膜時,至少一方的表面為原冰片烯系樹脂層時較佳,原冰片烯系樹脂層上設置防靜電層(B)為佳。. The original borneol-based resin film (A) used in the present invention may be an unstretched film or an extended film. In addition, the original borneol-based resin film (A) used in the present invention may be a film made of only the original borneol-based resin layer, or may be a layer of a raw material such as an original borneol-based resin layer and polyethylene. Composite film. When the composite film of the original borneol-based resin film (A) and the other raw material used in the present invention is at least one surface of the original borneol-based resin layer, the anti-static layer is provided on the original borneol-based resin layer. ) is better.

特別為本發明之光學薄膜為具有相位差之薄膜時,使用預先加熱延伸處理未延伸之原冰片烯系樹脂薄膜所得之原冰片烯系樹脂薄膜(A),該表面上可設置防靜電層(B)。如此方法中,可於原冰片烯系樹脂薄膜(A)上施予表面處理時,延伸前的原冰片烯系樹脂薄膜上施予表面處理,再調製出加熱延伸之原冰片烯系樹脂薄膜(A),又,可將未延伸之原冰片烯系樹脂薄膜經加熱延伸後,施予表面處理調製出原冰片烯系樹脂薄膜(A)。又,亦可將未延伸薄膜之原冰片烯系樹脂薄膜(A)上視必要施予表面處理,設置防靜電層(B),其後藉由加熱延伸,做成具有相位差之光學薄膜。此時由光學薄膜之生產性或所得特性之安定性等的觀點來看,未延伸薄膜之原冰片烯系樹脂薄膜(A)上施予表面處理後設置防靜電層(B)後,進行加熱延伸為佳。In particular, when the optical film of the present invention is a film having a phase difference, the original borneol-based resin film (A) obtained by preheating and stretching the unstretched original borneol-based resin film may be used, and an antistatic layer may be provided on the surface ( B). In such a method, when the surface treatment is applied to the original borneol-based resin film (A), the original borneol-based resin film before stretching is subjected to a surface treatment, and a heat-extended raw borneol-based resin film is prepared ( A) Further, the unstretched original borneol-based resin film may be subjected to a surface treatment to prepare an ortho-ene ene resin film (A) by heating and stretching. Further, the original borneol-based resin film (A) of the unstretched film may be subjected to surface treatment as necessary, and an antistatic layer (B) may be provided, and then heated and stretched to form an optical film having a phase difference. In this case, the original film of the unstretched film (A) is subjected to a surface treatment after the production of the optical film or the stability of the obtained properties, and the antistatic layer (B) is provided, followed by heating. Extension is better.

作為延伸處理之方法,防靜電層(B)可經層合、或將未延伸之原冰片烯系樹脂薄膜使用一軸延伸或二軸延伸方法。As a method of the elongation treatment, the antistatic layer (B) may be laminated, or the unstretched ornidyl resin film may be subjected to a one-axis extension or a biaxial stretching method.

進行一軸延伸處理時,延伸速度(歪速度)一般為1~5,000%/分鐘。較佳為50~1,000%/分鐘,更佳為100~1,000%/分鐘。When the one-axis stretching process is performed, the stretching speed (歪 speed) is generally 1 to 5,000%/min. It is preferably 50 to 1,000%/min, more preferably 100 to 1,000%/min.

進行二軸延伸處理法時,可利用同時進行往二方向的延伸處理之方法、或經一軸延伸處理後往該延伸處理之延伸方向相異的方向進行延伸處理之方法。此時,2的延伸軸之交叉角度,取決於目的之光學薄膜所要求的特性,並無特別限定,一般為120~60度之範圍。又,延伸速度於各延伸方向中可為相同、或相異,一般為1~5,000%/分鐘,較佳為50~1,000%/分鐘,更佳為100~1,000%/分鐘,特佳為100~500%/分鐘。When the biaxial stretching treatment method is performed, a method of performing the stretching treatment in the two directions at the same time or a method of performing the stretching treatment in the direction in which the extending direction of the stretching treatment is different after the one-axis stretching treatment is performed may be employed. At this time, the angle of intersection of the extension axes of 2 is not particularly limited depending on the characteristics required for the intended optical film, and is generally in the range of 120 to 60 degrees. Further, the stretching speed may be the same or different in each extending direction, and is generally 1 to 5,000%/min, preferably 50 to 1,000%/min, more preferably 100 to 1,000%/min, and particularly preferably 100. ~500% / minute.

延伸處理溫度並無特別限定,但以使用的原冰片烯系樹脂之玻璃轉移溫度(Tg)作為基準時,一般為Tg±30℃,較佳為Tg±15℃,更佳為Tg-5~Tg+15℃之範圍。延伸處理溫度設定於上述範圍內時,可抑制所得之延伸薄膜所產生的相位差不均,又折射率楕円體之控制成為容易,延伸處理亦可安定下進行,故較佳。The stretching treatment temperature is not particularly limited, but is generally Tg ± 30 ° C, preferably Tg ± 15 ° C, more preferably Tg - 5 °, based on the glass transition temperature (Tg) of the original borneol-based resin to be used. Tg + 15 ° C range. When the stretching treatment temperature is set within the above range, the phase difference unevenness caused by the obtained stretched film can be suppressed, and the control of the refractive index element can be easily performed, and the stretching treatment can be carried out stably, which is preferable.

延伸倍率取決於目的之光學薄膜所要求之特性,並無特別限定,一般為1.01~10倍,較佳為1.03~5倍,更佳為1.03~3倍。延伸倍率若超過上述範圍時,所得之延伸薄膜的相位差之控制變得困難。經延伸處理之薄膜可直接冷卻,或於Tg-20℃~Tg之溫度環境下至少10秒以上,較佳為30秒~60分鐘,更佳為保持1~60分鐘後再冷卻。藉此,透過光的相位差或尺寸等的經時性變化較為少,可到安定之相位差薄膜。The stretching ratio is not particularly limited depending on the characteristics required for the intended optical film, and is generally 1.01 to 10 times, preferably 1.03 to 5 times, more preferably 1.03 to 3 times. When the stretching ratio exceeds the above range, control of the phase difference of the obtained stretched film becomes difficult. The stretched film can be directly cooled, or at a temperature of from Tg-20 ° C to Tg for at least 10 seconds, preferably from 30 seconds to 60 minutes, more preferably for 1 to 60 minutes, and then cooled. Thereby, the change in the phase difference of the transmitted light, the size, and the like are relatively small, and the retardation film can be stabilized.

如上述,施予延伸處理的薄膜為,藉由延伸處理之分子經配向的結果,會對於透過光賦予相位差,或該相位差可藉由延伸倍率、延伸溫度或薄膜的厚度等控制。As described above, the film subjected to the stretching treatment is such that, by the alignment of the molecules subjected to the stretching treatment, a phase difference is imparted to the transmitted light, or the phase difference can be controlled by the stretching ratio, the stretching temperature, the thickness of the film, and the like.

本發明所使用的原冰片烯系樹脂薄膜(A),其厚度並未特別限定,但一般為5~500μm,較佳為10~150μm,更佳為20~100μm程度。薄膜的厚度若過薄時,會有強度不足之現象,又若過厚時,相位差會過高,又會有透明性、外觀性降低的情況。本發明所使用的原冰片烯系樹脂薄膜(A)為原冰片烯系樹脂層與其他原料所成之層的複合薄膜時,該原冰片烯系樹脂層之厚度一般為5~500μm,較佳為10~150μm程度。The thickness of the norbornene-based resin film (A) used in the present invention is not particularly limited, but is generally 5 to 500 μm, preferably 10 to 150 μm, more preferably 20 to 100 μm. If the thickness of the film is too thin, the strength may be insufficient, and if it is too thick, the phase difference may be too high, and the transparency and the appearance may be lowered. When the original borneol-based resin film (A) used in the present invention is a composite film of a layer of an original borneol-based resin layer and another raw material, the thickness of the original borneol-based resin layer is usually 5 to 500 μm, preferably. It is about 10~150μm.

又,構成作為相位差薄膜所使用的光學薄膜的原冰片烯系樹脂薄膜(A)之厚度,並無特別限定,一般為5~500μm,較佳為10~150μm,更佳為20~100μm程度。薄膜的厚度或過薄或過厚時,處理時會有破斷的現象故不佳。Further, the thickness of the original borneol-based resin film (A) constituting the optical film used as the retardation film is not particularly limited, but is usually 5 to 500 μm, preferably 10 to 150 μm, more preferably 20 to 100 μm. . When the thickness of the film is too thin or too thick, it may be broken during handling, which is not preferable.

本發明所使用的原冰片烯系樹脂薄膜(A)為,藉由前述表面處理等層合防靜電層(B)之面的表面潤濕性可為50~70mN/m,較佳為55~70mN/m。該潤濕性可依據JIS K6768所記載之方法進行測定。顯示如此潤濕性時,會使原冰片烯系樹脂薄膜(A)與防靜電層(B)之密著性提高故較佳。The original borneol-based resin film (A) used in the present invention has a surface wettability of 50 to 70 mN/m, preferably 55 to 5, of the surface of the antistatic layer (B) laminated by the surface treatment or the like. 70mN/m. This wettability can be measured in accordance with the method described in JIS K6768. When such wettability is exhibited, the adhesion between the original borneol-based resin film (A) and the antistatic layer (B) is improved, which is preferable.

又,本發明所使用的原冰片烯系樹脂薄膜(A)為,設置防靜電層(B)之側的平均表面粗糙度(Ra)為0.3~2.0nm,較佳為0.4~1.8nm之範圍。防靜電層側的表面粗糙度於此範圍時,可顯示優良平滑性、優良光學透明性,且防靜電層與原冰片烯系樹脂薄膜之密著性優良,故較佳。Further, the norbornene-based resin film (A) used in the present invention has an average surface roughness (Ra) of 0.3 to 2.0 nm, preferably 0.4 to 1.8 nm, on the side where the antistatic layer (B) is provided. . When the surface roughness of the antistatic layer side is in this range, excellent smoothness and excellent optical transparency can be exhibited, and the adhesion between the antistatic layer and the original borneol resin film is excellent, which is preferable.

防靜電層(B)本發明之防靜電層(B)為,(b1)側鏈具有特定4級銨鹽之丙烯酸系樹脂、與(b2)含有聚乙烯亞胺及/或聚羥基鏈烷聚縮水甘油醚所成之硬化劑的防靜電塗層材所形成。Antistatic layer (B) The antistatic layer (B) of the present invention is (b1) an acrylic resin having a specific grade 4 ammonium salt in a side chain, and (b2) a polyethyleneimine and/or a polyhydroxyalkane-containing polymer. An antistatic coating material of a hardener made of glycidyl ether is formed.

<丙烯酸系樹脂(b1)>構成防靜電塗層材之丙烯酸系樹脂(b1)為,側鏈具有下述式(i)所示4級銨鹽之丙烯酸系樹脂。<Acrylic Resin (b1)> The acrylic resin (b1) constituting the antistatic coating material is an acrylic resin having a 4-stage ammonium salt represented by the following formula (i) in a side chain.

-COO-Q1 -N(Q2 )a Xb ………(i)(式(i)中,Q1 為碳數1~6的2價烴基,Q2 為碳數1~3的1價烴基,X為氯原子、氟原子或-Q3 -SO4 (但,Q3 為單鍵、伸甲基或伸乙基。),a及b為1或2之整數(但,a+b=3)。Q2 、Q3 及X為複數個存在時,各可為相同或相異)。-COO-Q 1 -N(Q 2 ) a X b (i) (in the formula (i), Q 1 is a divalent hydrocarbon group having 1 to 6 carbon atoms, and Q 2 is 1 having a carbon number of 1 to 3 A valence hydrocarbon group, X is a chlorine atom, a fluorine atom or -Q 3 -SO 4 (however, Q 3 is a single bond, a methyl group or an ethyl group), and a and b are integers of 1 or 2 (however, a+b= 3) When Q 2 , Q 3 and X are plural, they may be the same or different.

如此丙烯酸系樹脂(b1)為,共聚合(1)末端具有-COOH基之單體、(2)具有4級銨鹽基之單體、(3)其他單體所得者。The acrylic resin (b1) is obtained by copolymerizing (1) a monomer having a -COOH group at the terminal, (2) a monomer having a 4-stage ammonium salt group, and (3) another monomer.

末端具有-COOH基之單體(1)以全單體中1~20mol%之範圍下使用為佳,作為單體(1),例如可舉出(甲基)丙烯酸、丙烯醯基氧基醚琥珀酸、苯二酸、(甲基)六氫苯二酸等。且,本說明書之「(甲基)丙烯基」表示丙烯基或甲基丙烯基。The monomer (1) having a -COOH group at the terminal is preferably used in the range of 1 to 20 mol% in the total monomer, and as the monomer (1), for example, (meth)acrylic acid or acrylonitrile oxide ether is exemplified. Succinic acid, phthalic acid, (meth) hexahydrophthalic acid, and the like. Further, the "(meth)acrylyl group" in the present specification means a propenyl group or a methacryl group.

具有4級銨鹽基之單體(2)為,以全單體中10~40mol%之範圍下使用為佳,作為單體(2),例如可舉出二甲基胺基醚丙烯酸酯4氧化物(含有作為對離子之氯化物等鹵素、硫酸鹽、磺酸鹽、烷基磺酸鹽等陰離子)等。本發明所使用的丙烯酸系樹脂(b1),較佳為鹵素原子的含有量為1重量%以下,較佳為0.5重量%以下,具有4級銨鹽基之單體(2)作為對離子時未含鹵素時為較佳。The monomer (2) having a quaternary ammonium salt group is preferably used in the range of 10 to 40 mol% in the total monomer, and as the monomer (2), for example, dimethylaminoether acrylate 4 is exemplified. An oxide (containing an anion such as a halogen such as a counter ion chloride, a sulfate, a sulfonate or an alkylsulfonate). The acrylic resin (b1) used in the present invention preferably has a halogen atom content of 1% by weight or less, preferably 0.5% by weight or less, and a monomer having a 4-stage ammonium salt group (2) as a counter ion. It is preferred when it is not halogen.

其他單體(3)以全單體中8~80mol%之範圍下使用為佳,作為單體(3),例如可舉出烷基(甲基)丙烯酸酯、具有脂環式骨架之(甲基)丙烯酸酯、苯乙烯、乙酸乙烯、鹵化乙烯、烯烴等乙烯衍生物等。其中作為單體(3)以烷基(甲基)丙烯酸酯、具有脂環式骨架之(甲基)丙烯酸酯為佳,具有脂環式骨架之(甲基)丙烯酸酯為較佳。又,烷基(甲基)丙烯酸酯與具有脂環式骨架之(甲基)丙烯酸酯並用時為特佳。The other monomer (3) is preferably used in the range of 8 to 80 mol% in the total monomer, and examples of the monomer (3) include an alkyl (meth) acrylate and an alicyclic skeleton (A). An ethylene derivative such as acrylate, styrene, vinyl acetate, vinyl halide or olefin. Among them, as the monomer (3), an alkyl (meth) acrylate or a (meth) acrylate having an alicyclic skeleton is preferred, and a (meth) acrylate having an alicyclic skeleton is preferred. Further, it is particularly preferable that the alkyl (meth) acrylate is used in combination with the (meth) acrylate having an alicyclic skeleton.

具有脂環式骨架之(甲基)丙烯酸酯的含有量為全單體中10~30mol%時為較佳。具有脂環式骨架之(甲基)丙烯酸酯,例如可舉出環己基(甲基)丙烯酸酯、二環戊基(甲基)丙烯酸酯、二環戊烯基(甲基)丙烯酸酯、二環戊烯基氧基乙基(甲基)丙烯酸酯、異冰片基(甲基)丙烯酸酯等。如此具有脂環式骨架之(甲基)丙烯酸酯含於單體中所得之丙烯酸系樹脂(b1)含有來自具有脂環式骨架之(甲基)丙烯酸酯之結構單位,藉此可成為與原冰片烯系樹脂薄膜(A)之密著性較優良者故較佳。The content of the (meth) acrylate having an alicyclic skeleton is preferably 10 to 30 mol% based on the total monomer. Examples of the (meth) acrylate having an alicyclic skeleton include cyclohexyl (meth) acrylate, dicyclopentyl (meth) acrylate, dicyclopentenyl (meth) acrylate, and Cyclopentenyloxyethyl (meth) acrylate, isobornyl (meth) acrylate, and the like. The acrylic resin (b1) obtained by containing the (meth) acrylate having an alicyclic skeleton in a monomer contains a structural unit derived from a (meth) acrylate having an alicyclic skeleton, whereby The bornene-based resin film (A) is preferred because it has excellent adhesion.

本發明所使用的丙烯酸系樹脂(b1)為,共聚合這些單體所成之單體組成物而得之交聯性共聚合物,其側鏈上具有前述式(i)所示4級銨鹽。The acrylic resin (b1) used in the present invention is a crosslinkable copolymer obtained by copolymerizing a monomer composition of these monomers, and has a 4-stage ammonium represented by the above formula (i) in a side chain. salt.

<硬化劑(b2)>本發明所使用的硬化劑(b2)為聚乙烯亞胺及/或聚羥基鏈烷聚縮水甘油醚所成。<Hardener (b2)> The curing agent (b2) used in the present invention is a polyethyleneimine and/or a polyhydroxyalkane polyglycidyl ether.

作為聚乙烯亞胺,使用數平均分子量為300~70,000之聚乙烯亞胺為佳。聚乙烯亞胺一般為直鏈狀者,但亦可具有支鏈者。作為聚乙烯亞胺,例如可用日本觸媒(股)製之商品名「EPOMIN」等販賣品。As the polyethyleneimine, a polyethyleneimine having a number average molecular weight of 300 to 70,000 is preferably used. Polyethyleneimine is generally linear, but may also have a branch. As the polyethyleneimine, for example, a product such as "EPOMIN" manufactured by Nippon Shokubai Co., Ltd. can be used.

聚羥基鏈烷聚縮水甘油醚為具有下述構成單位(m)及(n)之高分子化合物,分子量為500~5,000,較佳為1,000~2,000者。The polyhydroxyalkane polyglycidyl ether is a polymer compound having the following structural units (m) and (n), and has a molecular weight of 500 to 5,000, preferably 1,000 to 2,000.

本發明中,作為硬化劑(b2)可單獨使用聚乙烯亞胺或聚羥基鏈烷聚縮水甘油醚,或組合量兩者使用,較佳為組合兩者使用。組合聚乙烯亞胺與聚羥基鏈烷聚縮水甘油醚使用時,對於羥基鏈烷聚縮水甘油醚100重量份而言,作為聚乙烯亞胺之混合比率為10~100重量份時為佳。In the present invention, as the curing agent (b2), polyethyleneimine or polyhydroxyalkane polyglycidyl ether may be used alone or in combination of two or more, and it is preferred to use both in combination. When the polyethyleneimine and the polyhydroxyalkane polyglycidyl ether are used in combination, it is preferred that the mixture ratio of the polyethyleneimine is 10 to 100 parts by weight based on 100 parts by weight of the hydroxyalkane polyglycidyl ether.

硬化劑(b2)的使用量,對於丙烯酸系樹脂(b1)100重量份時,較佳為1~30重量份,更佳為3~15重量份程度的量。The amount of the curing agent (b2) to be used is preferably from 1 to 30 parts by weight, more preferably from 3 to 15 parts by weight, per 100 parts by weight of the acrylic resin (b1).

<防靜電塗層材>本發明中,使用含有上述丙烯酸系樹脂(b1)、與硬化劑(b2)之防靜電塗層材,原冰片烯系樹脂薄膜(A)上設置防靜電層(B)。<Antistatic coating material> In the present invention, an antistatic coating material containing the acrylic resin (b1) and the curing agent (b2) is used, and an antistatic layer (B) is provided on the original borneol resin film (A). ).

本發明所使用的防靜電塗層材為,含有上述丙烯酸系樹脂(b1)與硬化劑(b2)。防靜電塗層材中丙烯酸系樹脂(b1)與硬化劑(b2)之比例為,對於丙烯酸系樹脂(b1)100重量份而言,硬化劑(b2)為1~30重量份,較佳為3~15重量份程度之比例。The antistatic coating material used in the present invention contains the acrylic resin (b1) and the curing agent (b2). The ratio of the acrylic resin (b1) to the curing agent (b2) in the antistatic coating material is preferably from 1 to 30 parts by weight, preferably from 1 to 30 parts by weight, per 100 parts by weight of the acrylic resin (b1). The ratio of 3 to 15 parts by weight.

本發明所使用的防靜電塗層材中可再添加交聯劑、黏著賦予劑、抗氧化劑、著色劑、紫外線吸收劑、光安定劑、有機矽烷偶合劑、熱聚合禁止劑、塗平劑、界面活性劑、保存安定劑、可塑劑、滑劑、填充物、老化防止劑、潤濕性改良劑、塗面改良劑等。The antistatic coating material used in the invention may further comprise a crosslinking agent, an adhesion-imparting agent, an antioxidant, a coloring agent, an ultraviolet absorber, a light stabilizer, an organic decane coupling agent, a thermal polymerization inhibiting agent, a coating agent, Surfactant, storage stabilizer, plasticizer, slip agent, filler, aging inhibitor, wettability improver, coating improver, and the like.

本發明所使用的防靜電塗層材為含有前述丙烯酸系樹脂(b1)及硬化劑(b2)以外,更含有具有脂環式骨架之環氧基樹脂為佳。作為該環氧基樹脂,例如可舉出(3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸酯、2-(3,4-環氧基環己基-5,5-螺-3,4-環氧基)環己烷-間-二噁烷、雙(3,4-環氧基環己基甲基)己二酸酯、乙烯環己烯氧化物、4-乙烯環氧基環己烷、雙(3,4-環氧基-6-甲基環己基甲基)己二酸酯、3,4-環氧基-6-甲基環己基-3’,4’-環氧基-6’-甲基環己烷羧酸酯、伸甲基雙(3,4-環氧基環己烷)、二環戊二烯二環氧化物、乙二醇之二(3,4-環氧基環己基甲基)醚、伸乙基雙(3,4-環氧基環己烷羧酸酯)、環氧基化四苯甲基醇、內酯改性3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸酯、內酯改性環氧基化四氫苯甲基醇、環己烯氧化物、氫化雙酚A二環氧丙醚、氫化雙酚F二環氧丙醚、氫化雙酚AD二環氧丙醚等脂環式環氧基化合物類)等。The antistatic coating material used in the present invention is preferably an epoxy resin having an alicyclic skeleton in addition to the acrylic resin (b1) and the curing agent (b2). Examples of the epoxy resin include (3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, 2-(3,4-epoxy group). Cyclohexyl-5,5-spiro-3,4-epoxy)cyclohexane-m-dioxane, bis(3,4-epoxycyclohexylmethyl)adipate, ethylene cyclohexene Oxide, 4-vinyl epoxycyclohexane, bis(3,4-epoxy-6-methylcyclohexylmethyl)adipate, 3,4-epoxy-6-methyl ring Hexyl-3',4'-epoxy-6'-methylcyclohexanecarboxylate, methyl bis(3,4-epoxycyclohexane), dicyclopentadiene diepoxide Ethylene glycol bis(3,4-epoxycyclohexylmethyl)ether, ethyl bis(3,4-epoxycyclohexanecarboxylate), epoxylated tetratyl alcohol , lactone modified 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexane carboxylate, lactone modified epoxylated tetrahydrobenzyl alcohol, cyclohexyl An olefin oxide, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, hydrogenated bisphenol AD diglycidyl ether or the like, and the like.

防靜電塗層材為含有環氧基樹脂時,該含有量為對於前述丙烯酸系樹脂(b1)100重量份而言為1~30重量份程度時較佳。When the antistatic coating material is an epoxy group-containing resin, the content is preferably from 1 to 30 parts by weight based on 100 parts by weight of the acrylic resin (b1).

又,本發明所使用的防靜電塗層材更含有具有環氧基之交聯劑(以下亦稱為「環氧基系交聯劑」)時較佳,特別作為硬化劑(b2)僅使用聚乙烯亞胺時,可再使用環氧基系交聯劑為佳。本發明所使用的環氧基系交聯劑為,分子內至少具有1個環氧基者即可,並無特別限定。作為如此環氧基系交聯劑,例如可舉出雙酚型環氧基化合物、漆用酚醛型環氧基化合物、脂環式環氧基化合物、脂肪族環氧基化合物、芳香族環氧基化合物、環氧丙基胺型環氧基化合物、鹵化環氧基化合物等。Moreover, it is preferable that the antistatic coating material used in the present invention further contains a crosslinking agent having an epoxy group (hereinafter also referred to as "epoxy crosslinking agent"), and is particularly useful as a curing agent (b2). In the case of polyethyleneimine, an epoxy group-based crosslinking agent may be further used. The epoxy group-based crosslinking agent used in the present invention is not particularly limited as long as it has at least one epoxy group in the molecule. Examples of the epoxy group-based crosslinking agent include a bisphenol type epoxy compound, a phenolic epoxy group for lacquer, an alicyclic epoxy compound, an aliphatic epoxy compound, and an aromatic epoxy. A base compound, a glycidylamine type epoxy compound, a halogenated epoxy compound, or the like.

具體可舉出雙酚A二環氧丙醚、雙酚F二環氧丙醚、雙酚S二環氧丙醚等雙酚型環氧基化合物;酚漆用酚醛型環氧基化合物、甲酚漆用酚醛型環氧基化合物等漆用酚醛型環氧基化合物;3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸酯、2-(3,4-環氧基環己基-5,5-螺-3,4-環氧基)環己烷-間-二噁烷、雙(3,4-環氧基環己基甲基)己二酸酯、乙烯環己烯氧化物、4-乙烯環氧基環己烷、雙(3,4-環氧基-6-甲基環己基甲基)己二酸酯、3,4-環氧基-6-甲基環己基-3’,4’-環氧基-6’-甲基環己烷羧酸酯、伸甲基雙(3,4-環氧基環己烷)、二環戊二烯二環氧化物、乙二醇之二(3,4-環氧基環己基甲基)醚、伸乙基雙(3,4-環氧基環己烷羧酸酯)、環氧基化四苯甲基醇、內酯改性3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸酯、內酯改性環氧基化四氫苯甲基醇、環己烯氧化物、氫化雙酚A二環氧丙醚、氫化雙酚F二環氧丙醚、氫化雙酚AD二環氧丙醚等脂環式環氧基化合物類;1,4-丁二醇二環氧丙醚、1,6-己二醇二環氧丙醚、甘油三環氧丙醚、三羥甲基丙烷三環氧丙醚、聚乙二醇二環氧丙醚等脂肪族環氧基化合物;溴化雙酚A二環氧丙醚、溴化雙酚F二環氧丙醚、溴化雙酚S二環氧丙醚等鹵化環氧基化合物;四環氧丙基胺基苯基甲烷等環氧丙基胺型環氧基化合物。Specific examples thereof include bisphenol type epoxy compounds such as bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, and bisphenol S diglycidyl ether; and phenolic epoxy compounds for phenol paint, A A phenolic epoxy compound for lacquer type epoxy resin, etc.; 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, 2-( 3,4-Epoxycyclohexyl-5,5-spiro-3,4-epoxy)cyclohexane-m-dioxane, bis(3,4-epoxycyclohexylmethyl)hexane Acid ester, ethylene cyclohexene oxide, 4-ethylene epoxy cyclohexane, bis(3,4-epoxy-6-methylcyclohexylmethyl) adipate, 3,4-epoxy -6-methylcyclohexyl-3',4'-epoxy-6'-methylcyclohexanecarboxylate, methyl bis(3,4-epoxycyclohexane), bicyclic Pentadiene diepoxide, ethylene glycol bis(3,4-epoxycyclohexylmethyl)ether, ethyl bis(3,4-epoxycyclohexanecarboxylate), epoxy Modified tetrabenzyl alcohol, lactone modified 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexane carboxylate, lactone modified epoxylated tetrahydrogen benzene An alicyclic epoxy compound such as a base alcohol, a cyclohexene oxide, a hydrogenated bisphenol A diglycidyl ether, a hydrogenated bisphenol F diglycidyl ether, or a hydrogenated bisphenol AD diglycidyl ether; 4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene glycol diepoxypropyl An aliphatic epoxy compound such as an ether; a halogenated epoxy compound such as brominated bisphenol A diglycidyl ether, brominated bisphenol F diglycidyl ether or brominated bisphenol S diglycidyl ether; An epoxypropylamine type epoxy compound such as oxypropylaminophenylmethane.

以上環氧基系交聯劑中,以聚乙二醇二環氧丙醚為特佳。Among the above epoxy group-based crosslinking agents, polyethylene glycol diglycidyl ether is particularly preferred.

又,上述化合物以外,可舉出聚乙二醇二環氧丙醚、聚丙二醇二環氧丙醚類;於乙二醇、丙二醇、甘油等脂肪族多價醇上加成1種或2種以上環氧化物後所得之聚醚聚醇之聚縮水甘油醚類;脂肪族長鏈二鹽基酸的二環氧丙基酯類;脂肪族高級醇的單環氧丙醚類;酚、甲酚、丁基酚或加成這些環氧化物後所得之聚醚醇之單環氧丙醚類;高級脂肪酸的環氧丙基酯類;環氧基化大豆油、環氧基硬脂酸丁基、環氧基硬脂酸辛酯、環氧基化亞麻仁油等。Further, examples of the compound include polyethylene glycol diglycidyl ether and polypropylene glycol diglycidyl ether; and one or two kinds of aliphatic polyvalent alcohols such as ethylene glycol, propylene glycol and glycerin are added. Polyglycidyl ethers of polyether polyols obtained from the above epoxides; diepoxypropyl esters of aliphatic long chain dibasic acids; monoglycidyl ethers of aliphatic higher alcohols; phenol, cresol , butyl phenol or a monoglycidyl ether of a polyether alcohol obtained by adding these epoxides; a glycidyl ester of a higher fatty acid; an epoxidized soybean oil, an butyl stearyl stearate , octyl epoxy stearate, epoxidized linseed oil, and the like.

又,亦可使用預先以適當範圍下聚合1種或2種以上的這些化合物所得的環氧基樹脂。Further, an epoxy resin obtained by polymerizing one or two or more kinds of these compounds in an appropriate range in advance may also be used.

且,作為本發明所使用的環氧基系化合物,可舉出共軛二烯系單體之聚合物、共軛二烯系單體與具有乙烯性不飽和鍵基之化合物的共聚合物、二烯系單體與具有乙烯性不飽和鍵性基之化合物的共聚合物、天然橡膠等(共)聚合物經環氧基化之化合物。Further, examples of the epoxy group-based compound to be used in the present invention include a polymer of a conjugated diene monomer, a copolymer of a conjugated diene monomer and a compound having an ethylenically unsaturated bond group, and A compound obtained by epoxidizing a copolymer of a diene monomer and a compound having an ethylenically unsaturated bond group, or a (co)polymer such as natural rubber.

防靜電塗層材中這些環氧基系交聯劑之含有量,對於丙烯酸系樹脂(b1)100重量份而言為1~30重量份為佳,較佳為3~20重量份。The content of the epoxy group-based crosslinking agent in the antistatic coating material is preferably from 1 to 30 parts by weight, preferably from 3 to 20 parts by weight, per 100 parts by weight of the acrylic resin (b1).

又,本發明所使用的防靜電塗層材為,欲防止具有防靜電層(B)之本發明的光學薄膜彼此重疊時所產生的結塊,含有填充物時為佳。防靜電塗層材因含有填充物,可控制防靜電層(B)之表面特性。此目的下可添加於防靜電塗層材之填充物的種類並無特別限定,可為無機粒子或有機粒子、或這些混合體。一般由粒子之均一性來看使用有機粒子為佳。Further, the antistatic coating material used in the present invention is preferably agglomerated when the optical film of the present invention having the antistatic layer (B) is prevented from overlapping each other, and is preferably contained when a filler is contained. The antistatic coating material can control the surface characteristics of the antistatic layer (B) because it contains a filler. The type of the filler which can be added to the antistatic coating material for this purpose is not particularly limited, and may be inorganic particles or organic particles or a mixture thereof. It is generally preferred to use organic particles from the viewpoint of particle uniformity.

例如,無機粒子可使用氧化鈦、氧化鋯、氧化鋅、氧化鋁、氧化矽(二氧化矽粒子)、氧化錫,其中由粒子之均一性與光透過性之面來看,使用氧化矽(二氧化矽粒子)為佳。又,有機粒子為例如可使用聚苯乙烯系之樹脂顆粒(beads)或丙烯酸樹脂系之顆粒(丙烯酸粒子)等。其中由光透過性之面來看使用丙烯酸樹脂系顆粒(丙烯酸粒子)為佳,又由粒子均一性或材料選擇性廣之觀點來看使用聚苯乙烯系樹脂顆粒(聚苯乙烯粒子)為佳。這些有機粒子並無特別限定,較佳為使用三次元交聯之粒子。又,粒子表面例如可由羧基或胺基、羥基等進行改性,或以防靜電塗層材之安定性或以防靜電層之均一性等面來看,使用這些表面經改性之粒子為佳。For example, titanium oxide, zirconium oxide, zinc oxide, aluminum oxide, cerium oxide (cerium oxide particles), or tin oxide can be used as the inorganic particles, and cerium oxide is used from the viewpoint of uniformity and light permeability of the particles. Cerium oxide particles are preferred. Further, as the organic particles, for example, polystyrene-based resin particles or acrylic resin particles (acrylic particles) can be used. Among them, acrylic resin particles (acrylic particles) are preferred from the viewpoint of light permeability, and polystyrene resin particles (polystyrene particles) are preferred from the viewpoint of particle uniformity or material selectivity. . These organic particles are not particularly limited, and it is preferred to use three-dimensionally crosslinked particles. Further, the surface of the particles may be modified, for example, by a carboxyl group, an amine group, a hydroxyl group, or the like, or the surface of the surface may be modified by the stability of the antistatic coating material or the uniformity of the antistatic layer. .

又,防靜電塗層材基材之折射率與添加之填充物的折射率有著較大差時,因會產生光之散亂,故填充物之折射率盡可能接近防靜電層(B)之基材的折射率為佳。作為如此的填充物,具體可適用如二氧化矽粒子、丙烯酸粒子之折射率為1.5前後的填充物。Moreover, when the refractive index of the antistatic coating material substrate and the refractive index of the added filler are largely different, the refractive index of the filler is as close as possible to the base of the antistatic layer (B). The refractive index of the material is good. As such a filler, for example, a filler such as cerium oxide particles or acrylic particles having a refractive index of 1.5 or so can be suitably used.

欲控制防靜電層(B)的表面特性,填充物之粒徑可配合防靜電層(B)的乾燥膜厚而做選擇,一般為防靜電層(B)之乾燥膜厚的0.05~2倍,較佳為0.1~1倍程度。又,該填充物所成之結塊防止材的粒徑為,一般使用平均粒徑為0.05~0.50μm之範圍者為佳。此時平均粒徑為0.05~0.10μm之範圍的粒子對粒子全體而言含有50~99wt%為佳,更佳為含有70~90wt%下使用。又,平均粒徑為0.10~0.50μm之範圍的粒子對粒子全體而言含有50~1wt%為佳,更佳為含有30~10wt%下使用。To control the surface characteristics of the antistatic layer (B), the particle size of the filler can be selected in combination with the dry film thickness of the antistatic layer (B), generally 0.05 to 2 times the dry film thickness of the antistatic layer (B). Preferably, it is 0.1 to 1 times. Further, the particle size of the agglomerate preventing material formed by the filler is preferably a range in which the average particle diameter is 0.05 to 0.50 μm. In this case, the particles having an average particle diameter of 0.05 to 0.10 μm are preferably 50 to 99% by weight, more preferably 70 to 90% by weight, based on the entire particles. Further, the particles having an average particle diameter in the range of 0.10 to 0.50 μm are preferably 50 to 1% by weight, more preferably 30 to 10% by weight, based on the entire particles.

又,填充物之添加量亦無特別限定,但對於除去溶劑之防靜電塗層材全量而言以0.1~20重量%為佳。又,自該填充物所成之結塊防止材的配合比率為,本發明的防靜電層(B)中,一般為體積分率下0.1~20%,較佳為0.1~10%、更佳為0.1~5%。該粒子之配合比率若未達0.1%未滿時,難以得到結塊防止效果,另一方面,20%以上時,光之透過性會產生劣化。Further, the amount of the filler to be added is not particularly limited, but it is preferably 0.1 to 20% by weight based on the total amount of the antistatic coating material from which the solvent is removed. Moreover, the compounding ratio of the agglomerate preventing material formed from the filler is generally 0.1 to 20%, preferably 0.1 to 10%, more preferably in the antistatic layer (B) of the present invention. It is 0.1~5%. When the blending ratio of the particles is less than 0.1%, it is difficult to obtain an agglomeration preventing effect. On the other hand, when the blending ratio is 20% or more, light permeability is deteriorated.

本發明所使用的防靜電塗層材以溶解或分散於溶劑之狀態下,以塗佈於原冰片烯系樹脂薄膜(A)上之形態為佳,水系塗層材時,即,乳化劑型之塗層材時為佳。防靜電塗層材為水系塗層材時,原冰片烯系樹脂薄膜(A)上上塗佈防靜電塗層材,形成防靜電層(B)時,因不會使原冰片烯系樹脂薄膜(A)的表面變質或劣化,故較佳。The antistatic coating material used in the present invention is preferably applied to the original borneol-based resin film (A) in a state of being dissolved or dispersed in a solvent, and in the case of a water-based coating material, that is, an emulsifier type It is better when coating materials. When the antistatic coating material is a water-based coating material, the original borneol-based resin film (A) is coated with an antistatic coating material to form an antistatic layer (B), and the original borneol-based resin film is not formed. It is preferred that the surface of (A) is deteriorated or deteriorated.

水系塗層材時的防靜電塗層材之濃度取決於塗佈方法等,但一般對於含有水之防靜電塗層材全量而言,含有固體成分0.5~20重量%程度者為佳。The concentration of the antistatic coating material in the case of the water-based coating material depends on the coating method, etc., but generally, the total amount of the antistatic coating material containing water is preferably from 0.5 to 20% by weight based on the solid content.

另外,作為光學薄膜被要求必須滿足防靜電層(B)的表面平滑性,作為溶劑或分散媒可並用2種以上者為佳。In addition, it is required to satisfy the surface smoothness of the antistatic layer (B) as an optical film, and it is preferable to use two or more types as a solvent or a dispersion medium.

具體於水系塗層材的情況時,欲提高防靜電層(B)之平滑性,可以任何比率混合於水中且比水之沸點高,並可併用水溶性之溶劑為佳。作為如此溶劑,可具體舉出γ-丁內酯、二乙二醇單乙基醚乙酸酯、二甲基乙醯胺、N-甲基吡咯烷酮、三乙二醇單甲基醚及三乙二醇二甲基醚等。這些溶劑與水之混合比對於水100重量份而言以0.1~50重量份為佳,1~10重量份為較佳。0.1重量份以下時無法得到溶劑之添加效果,若50重量份以上時生產性有顯著劣化之情況。In the case of the water-based coating material, in order to improve the smoothness of the antistatic layer (B), it may be mixed in water at any ratio and is higher than the boiling point of water, and a water-soluble solvent may be used in combination. Specific examples of such a solvent include γ-butyrolactone, diethylene glycol monoethyl ether acetate, dimethylacetamide, N-methylpyrrolidone, triethylene glycol monomethyl ether, and triethyl ethane. Glycol dimethyl ether and the like. The mixing ratio of these solvents to water is preferably from 0.1 to 50 parts by weight, preferably from 1 to 10 parts by weight, per 100 parts by weight of water. When the amount is 0.1 part by weight or less, the effect of adding a solvent is not obtained, and when it is 50 parts by weight or more, the productivity is remarkably deteriorated.

作為如此溶劑之沸點,150℃以上為佳,200℃以上為更佳。The boiling point of such a solvent is preferably 150 ° C or more, more preferably 200 ° C or more.

<防靜電層(B)之形成>本發明之防靜電層(B)一般可將上述防靜電塗層材塗佈於原冰片烯系樹脂薄膜(A)上,經乾燥後形成為佳。此時,相關防靜電層(B)可為原冰片烯系樹脂薄膜(A)的單面或雙面,並無特別限定。<Formation of Antistatic Layer (B)> The antistatic layer (B) of the present invention can be generally applied to the original borneol-based resin film (A) and formed after drying. In this case, the relevant antistatic layer (B) may be one side or both sides of the original borneol-based resin film (A), and is not particularly limited.

作為防靜電塗層材之塗佈方法,並無特別限定,例如可使用旋轉塗佈、線圈塗佈、棒塗佈、輥塗佈、刮塗、簾式塗佈、網版印刷、凹版塗佈、反向塗佈、噴霧塗佈、雙輥筒塗佈、噴墨塗佈等各種方法。The coating method of the antistatic coating material is not particularly limited, and for example, spin coating, coil coating, bar coating, roll coating, blade coating, curtain coating, screen printing, gravure coating can be used. Various methods such as reverse coating, spray coating, double roll coating, and inkjet coating.

經塗佈之防靜電塗層材的乾燥可以一階段進行。The drying of the coated antistatic coating material can be carried out in one stage.

其為進行具有1)80℃以下之一次乾燥步驟、與2)超過原冰片烯系樹脂薄膜(A)之玻璃轉移溫度(Tg)-30℃的溫度,較佳為超過原冰片烯系樹脂薄膜(A)之玻璃轉移溫度(Tg)的溫度下之二次乾燥步驟之多階段式乾燥步驟為佳,藉由該一次乾燥步驟及二次乾燥步驟的二階段式乾燥步驟進行為佳。超過原冰片烯系樹脂薄膜(A)之玻璃轉移溫度的溫度下進行二次乾燥步驟時,可提高所得之光學薄膜狀的防靜電層(B)之強度,故較佳。It is a temperature at which the drying step is 1) 80 ° C or less, and 2) the glass transition temperature (Tg) of the original borneol resin film (A) is -30 ° C, preferably more than the original borneol resin film. Preferably, the multi-stage drying step of the secondary drying step at the temperature of the glass transition temperature (Tg) of (A) is preferably carried out by the two-stage drying step of the primary drying step and the secondary drying step. When the secondary drying step is carried out at a temperature exceeding the glass transition temperature of the original borneol resin film (A), the strength of the obtained optical film-like antistatic layer (B) can be improved, which is preferable.

欲防止一次乾燥步驟中,原冰片烯系樹脂薄膜(A)之輥捲取時的結塊,預先於單面上貼合保護薄膜時,該反面上防靜電塗層材無須剝離保護薄膜下可進行塗佈、乾燥為佳,此時的乾燥溫度有鑑於保護薄膜之耐熱性以80℃以下進行乾燥為佳。In order to prevent agglomeration of the roll of the original borneol-based resin film (A) during the first drying step, when the protective film is bonded to one surface in advance, the anti-static coating material on the reverse surface does not need to be peeled off under the protective film. It is preferable to apply and dry, and it is preferable that the drying temperature at this time is dried at 80 ° C or lower in view of the heat resistance of the protective film.

二次乾燥為視需要而進行,但藉由利用原冰片烯系樹脂薄膜(A)之延伸時的加熱,可積極地提高防靜電塗佈層之強度。The secondary drying is performed as needed, but the strength of the antistatic coating layer can be positively increased by heating by extension of the original borneol-based resin film (A).

防靜電塗層材為水系塗層材,其乾燥以1)80℃以下之一次乾燥步驟、與2)超過原冰片烯系樹脂薄膜之玻璃轉移溫度(Tg)-30℃之溫度下進行之二次乾燥步驟之二段階進行時,一次乾燥所得之防靜電層的溶劑量為0.1~5重量%,二次乾燥之防靜電層之溶劑量為0.01~1重量%為佳。The antistatic coating material is a water-based coating material, and the drying thereof is performed at a temperature of 1) at 80 ° C or less, and 2) at a temperature exceeding a glass transition temperature (Tg) of -30 ° C of the original borneol resin film. When the second step of the secondary drying step is carried out, the solvent amount of the antistatic layer obtained by one drying is 0.1 to 5% by weight, and the solvent amount of the secondary drying antistatic layer is preferably 0.01 to 1% by weight.

本發明中,製造具有相位差之光學薄膜時等,製造延伸薄膜之光學薄膜時,於預先延伸之原冰片烯系樹脂薄膜(A)上可設置防靜電層(B),但未延伸之原冰片烯系樹脂薄膜(A)上,塗佈防靜電塗層材,進行於80℃以下的一次乾燥步驟後,於超過原冰片烯系樹脂薄膜之玻璃轉移溫度(Tg)-30℃的溫度下之二次乾燥步驟中,進行薄膜之延伸亦佳。製造延伸薄膜之光學薄膜時,薄膜的延伸於二次乾燥步驟中進行時,延伸時的加熱與乾燥之加熱無須另外進行,故熱效率優良且較為經濟之同時,原冰片烯系薄膜(A)之相關熱程序較為少,較難導致品質劣化而較佳。薄膜的延伸於二次乾燥步驟中時,二次乾燥步驟之溫度為超過原冰片烯系樹脂薄膜之玻璃轉移溫度(Tg)±30℃之範圍時為佳,原冰片烯系樹脂薄膜(A)之玻璃轉移溫度(Tg)±15℃之範圍時為較佳。In the present invention, when an optical film having a phase difference is produced, and an optical film of the stretched film is produced, an antistatic layer (B) may be provided on the pre-stretched original borneol-based resin film (A), but the original is not extended. The bornene-based resin film (A) is coated with an antistatic coating material, and after being subjected to a single drying step at 80 ° C or lower, at a temperature exceeding the glass transition temperature (Tg) of -30 ° C of the original borneol resin film. In the second drying step, the film extension is also preferred. When the optical film of the stretched film is produced, when the film is stretched in the secondary drying step, heating for heating and drying during stretching does not need to be performed separately, so that the thermal efficiency is excellent and economical, and the original borneol film (A) is There are fewer related thermal procedures, and it is more difficult to cause quality deterioration. When the film is extended in the secondary drying step, the temperature of the secondary drying step is preferably in the range of the glass transition temperature (Tg) of the original borneol resin film (Tg) ± 30 ° C, and the original borneol resin film (A) A glass transition temperature (Tg) of ±15 ° C is preferred.

二次乾燥步驟中所進行的薄膜之延伸條件為,僅對原冰片烯系樹脂薄膜(A)施予延伸之與上述條件相同。The film is extended in the secondary drying step so that the original borneol-based resin film (A) is stretched only in the same manner as described above.

<防靜電層(B)>本發明之防靜電層(B)之厚度並無特別限定,但一般為0.01~5μm,較佳為0.05~4μm,更佳為0.1~3μm程度。防靜電層(B)的厚度為0.01μm以上時,光學薄膜具有充分防靜電能故較佳。又,防靜電層(B)之厚度以原冰片烯系樹脂薄膜(A)之厚度為100時,一般為0.01~0.5,較佳為0.05~0.3程度之比的厚度為佳。防靜電層(B)的厚度若過小時,無法得到充分的防靜電能,又若過大時,會有光線透過率降低、或使用接著劑於最後塗佈時,會溶解防靜電層而成為白濁現象。<Antistatic layer (B)> The thickness of the antistatic layer (B) of the present invention is not particularly limited, but is generally 0.01 to 5 μm, preferably 0.05 to 4 μm, and more preferably 0.1 to 3 μm. When the thickness of the antistatic layer (B) is 0.01 μm or more, the optical film preferably has sufficient antistatic property. Further, when the thickness of the anti-static layer (B) is 100 or less, the thickness of the original borneol-based resin film (A) is preferably 0.01 to 0.5, preferably 0.05 to 0.3. If the thickness of the antistatic layer (B) is too small, sufficient antistatic energy cannot be obtained, and if it is too large, the light transmittance may be lowered, or when the adhesive is applied to the final coating, the antistatic layer may be dissolved and become cloudy. phenomenon.

本發明之防靜電層(B)中全光線透過率一般為80%以上,較佳為90%以上為佳。The total light transmittance in the antistatic layer (B) of the present invention is generally 80% or more, preferably 90% or more.

如此具有防靜電層(B)之光學薄膜為,即使將防靜電層(B)僅設置於原冰片烯系樹脂薄膜(A)之一面時,不僅於具有防靜電層(B)之側,於反面亦可顯示防靜電能。When the antistatic layer (B) is provided only on one side of the original borneol-based resin film (A), the optical film having the antistatic layer (B) is not only on the side having the antistatic layer (B) but also The anti-static energy can also be displayed on the reverse side.

又,本發明之防靜電層(B)的室溫(23℃)50RH%下飽和吸水率,較佳為0.1~90wt%,更佳為1~50wt%,特佳為1~20wt%。上述條件下的飽和吸水率為本範圍時,可容易得到安定之表面電阻值、或作為使用本發明之光學薄膜所得的偏光板時之安定特性。Further, the antistatic layer (B) of the present invention has a saturated water absorption at room temperature (23 ° C) of 50 RH%, preferably 0.1 to 90% by weight, more preferably 1 to 50% by weight, particularly preferably 1 to 20% by weight. When the saturated water absorption ratio under the above conditions is in the above range, it is possible to easily obtain a stable surface resistance value or a stability property when used as a polarizing plate obtained by using the optical film of the present invention.

防靜電層(B)為,金屬原子含有量為0.1重量%以下,較佳為0.05重量%以下之範圍,又鹵素原子含有量為1重量%以下,較佳為0.5重量%以下之範圍。於如此範圍時,可防止塗佈路徑的污染、及對於併用之材料的金屬、鹵素的轉移。The antistatic layer (B) has a metal atom content of 0.1% by weight or less, preferably 0.05% by weight or less, and a halogen atom content of 1% by weight or less, preferably 0.5% by weight or less. In such a range, contamination of the coating path and transfer of metals and halogens to the materials used in combination can be prevented.

具有防靜電層之光學薄膜具有本發明之防靜電層的光學薄膜為具有上述原冰片烯系樹脂薄膜層(A)、與防靜電層(B)。Optical film having an antistatic layer The optical film having the antistatic layer of the present invention has the above-mentioned original borneol-based resin film layer (A) and an antistatic layer (B).

本發明的光學薄膜為顯示充分防靜電能,一般防靜電層側之表面電阻值為1×106 ~1×1012 Ω/□,較佳為1×108 ~1×1011 Ω/□之範圍。光學薄膜的表面電阻值僅於該範圍內時,取出輥狀光學薄膜時,或剝離保護薄片時際等剝離靜電可忽略,故較佳。The optical film of the present invention exhibits sufficient antistatic property, and the surface resistivity of the general antistatic layer side is 1 × 10 6 to 1 × 10 12 Ω / □, preferably 1 × 10 8 to 1 × 10 11 Ω / □. The scope. When the surface resistance value of the optical film is within this range, it is preferable to take out the roll-shaped optical film or to peel off the static electricity when the protective sheet is peeled off.

本發明的光學薄膜為,藉由具有含具有防靜電能之丙烯酸系樹脂(b1)之防靜電層(B),與使用界面活性劑等過去防靜電劑時做比較,防靜電層(B)與原冰片烯系樹脂薄膜(A)可強固地結合,使防靜電劑之剝離或脫落變少,防靜電能可長期間安定地保持,具有優良耐久性。The optical film of the present invention is an antistatic layer (B) which is provided by an antistatic layer (B) having an acrylic resin (b1) having antistatic property and a conventional antistatic agent such as a surfactant. It is strongly bonded to the original borneol-based resin film (A) to reduce peeling or peeling of the antistatic agent, and the antistatic property can be stably maintained for a long period of time, and has excellent durability.

本發明的光學薄膜為,原冰片烯系樹脂薄膜(A)與防靜電層(B)於波長(589)nm之折射率差為0.1以下,較佳為0.05以下。In the optical film of the present invention, the refractive index difference between the norbornene-based resin film (A) and the antistatic layer (B) at a wavelength (589) nm is 0.1 or less, preferably 0.05 or less.

本發明的光學薄膜為,藉由前述電暈放電處理等表面處理可使防靜電層側的表面潤濕性成50~70mN/m,較佳為55~70mN/m。該潤濕性可依據JIS K6768所記載的方法為準進行測定。本發明的光學薄膜顯示如此潤濕性時,與其他原料層合時的接著性或黏著性優良,故可適用於製造偏光板時等,形成層合體的各種用途上。In the optical film of the present invention, the surface wettability on the side of the antistatic layer can be 50 to 70 mN/m, preferably 55 to 70 mN/m, by surface treatment such as corona discharge treatment. This wettability can be measured in accordance with the method described in JIS K6768. When the optical film of the present invention exhibits such wettability, it is excellent in adhesion or adhesion when laminated with other raw materials, and thus can be suitably used in various applications for forming a laminate when a polarizing plate is produced.

本發明之光學薄膜因其具有優良接著性故除偏光板用途以外,亦可作為附有棒塗佈之薄膜、反射防止膜付薄膜、透明導電膜付薄膜、防止紅外線.紫外線之薄膜等透明基材使用。又,防靜電層(B)可為存在於原冰片烯系樹脂薄膜(A)之單面者、或存在於雙面。The optical film of the present invention can be used as a film with a bar coating, a film for preventing reflection film, a film for a transparent conductive film, and preventing infrared rays because of its excellent adhesion. It is used as a transparent substrate such as a film of ultraviolet rays. Further, the antistatic layer (B) may be present on one side of the original borneol-based resin film (A) or on both sides.

<相位差薄膜>本發明的光學薄膜為,使用預先延伸之原冰片烯系樹脂薄膜(A)製造時,或於未延伸得原冰片烯系樹脂薄膜(A)上形成防靜電層(B)時的乾燥步驟中進行延伸得到時、或於未延伸之原冰片烯系樹脂薄膜(A)上設置防靜電層(B),其後進行延伸得到時等,其為延伸薄膜的情況時,一般表現相位差,可作為相位差薄膜使用。<Retardation film> The optical film of the present invention is formed by using a pre-stretched original borneol resin film (A) or an antistatic layer (B) on the unstretched original borneol resin film (A). When the stretching is carried out in the drying step, or the anti-static layer (B) is provided on the unstretched original borneol-based resin film (A), and then extended, or the like, when it is a stretched film, it is generally It exhibits a phase difference and can be used as a retardation film.

作為本發明之相位差薄膜的相位差,並無特別限定,作為面內相位差,一般為0~300nm,更佳為5~150nm,作為厚度方向之相位差,一般為5~500nm,更佳為80~300nm。The phase difference of the retardation film of the present invention is not particularly limited, and is generally 0 to 300 nm, more preferably 5 to 150 nm, and is preferably 5 to 500 nm in the thickness direction, and is preferably 5 to 500 nm. It is 80~300nm.

偏光板具有相位差之本發明的光學薄膜,即本發明的相位差薄膜為,可與偏光膜(偏光子)層合後成為偏光板。與偏光膜之層合為,介著公知接著劑進行為佳。本發明的光學薄膜為,因具有優良耐濕性及耐水性,即使將使用此所得之本發明的偏光板使用於具有PVA等吸濕性之偏光膜時,無須另外設置保護層,可使偏光板進行薄膜化,賦予輕量化之同時,介由薄膜化可抑制透明性之降低,且藉由減少層合數可減少材料之成本,進而簡化製造步驟。本發明的偏光板可使用具有充分防靜電性能之本發明的光學薄膜而製造時,可防止因静電所引起的異物吸附,可容易地防止製造步驟裝中異物的混入,故可得到實質上無點狀缺陷等高品質。The optical film of the present invention having a phase difference of the polarizing plate, that is, the retardation film of the present invention is formed by laminating with a polarizing film (polarizer) to form a polarizing plate. The lamination with the polarizing film is preferably carried out via a known adhesive. The optical film of the present invention has excellent moisture resistance and water resistance, and even when the polarizing plate of the present invention obtained by using the present invention is used for a polarizing film having hygroscopicity such as PVA, it is possible to provide polarizing without separately providing a protective layer. The film is thinned to impart weight reduction, and the reduction in transparency can be suppressed by thinning, and the cost of the material can be reduced by reducing the number of laminations, thereby simplifying the manufacturing steps. When the polarizing plate of the present invention can be produced by using the optical film of the present invention having sufficient antistatic property, foreign matter adsorption due to static electricity can be prevented, and the incorporation of foreign matter in the manufacturing step can be easily prevented, so that substantially High quality without point defects.

<偏光膜>構成本發明的偏光板之偏光膜,作為偏光膜之功能,即僅具有將入射光分為彼此直行之2個偏光成分,使其僅通過其中一方,吸收或分散另一成分之作用之任意者即可,並無特別限定。作為本發明所使用的偏光膜,例如可舉出聚乙烯醇(以下簡稱為PVA).碘系偏光膜、PVA系薄膜上使二色性染料吸著配向之PVA.染料系偏光膜,又藉由PVA系薄膜引發脫水反應,或藉由聚氯化乙烯薄膜之脫鹽酸反應形成多烯之多烯系偏光膜、分子內含有陽離子基之改性PVA所成之PVA系薄膜的表面及/或內部具有二色性染料之偏光膜等。其中較佳為PVA.碘系偏光膜。<Polarizing film> A polarizing film constituting the polarizing plate of the present invention functions as a polarizing film, that is, only two polarizing components that divide incident light into two straight lines, and pass through one of them to absorb or disperse another component. Any one of the functions is not particularly limited. Examples of the polarizing film used in the present invention include polyvinyl alcohol (hereinafter abbreviated as PVA). PVA on the iodine-based polarizing film and PVA-based film to align the dichroic dye. a dye-based polarizing film, a PVA formed by a PVA-based film, or a PVA formed by a polyethylene film dehydrochlorination reaction to form a polyene polyene polarizing film or a modified PVA having a cationic group in the molecule. A polarizing film having a dichroic dye on the surface and/or inside of the film. Among them, PVA is preferred. Iodine-based polarizing film.

又,本發明所使用的偏光膜之製造方法並無特別限定。例如可舉出於PVA系薄膜上延伸後吸附碘離子之方法、將PVA系薄膜介由二色性染料進行染色後延伸之方法、PVA系薄膜經延伸後以二色性染料染色之方法、將二色性染料於PVA系薄膜印刷後延伸之方法、PVA系薄膜經延伸後印刷二色性染料之方法等公知方法。更具體為將碘溶解於碘化鉀溶液,至做出高次碘離子,將該離子吸附於PVA薄膜上並延伸,其次於1~4%硼酸水溶液中並於水浴溫度30~40℃下進行浸漬製造出偏光膜之方法、或與PVA薄膜同様地經硼酸處理後往一軸方向以3~7倍程度延伸,於0.05~5%之二色性染料水溶液中以水浴溫度30~40℃下進行浸漬並吸附染料,於80~100℃下乾燥並熱固定後製造偏光膜之方法等。Moreover, the method for producing the polarizing film used in the present invention is not particularly limited. For example, a method of adsorbing iodide ions after stretching on a PVA-based film, a method of dyeing a PVA-based film by dyeing with a dichroic dye, and a method of dyeing a PVA-based film by a dichroic dye after stretching may be mentioned. A known method such as a method in which a dichroic dye is stretched after printing on a PVA-based film, or a method in which a PVA-based film is stretched and a dichroic dye is printed. More specifically, the iodine is dissolved in the potassium iodide solution to make high-order iodide ions, and the ions are adsorbed on the PVA film and extended, followed by immersion in a 1-4% boric acid aqueous solution at a water bath temperature of 30-40 ° C. The method of polarizing the film, or the same as that of the PVA film, is carried out by boric acid treatment, and is extended by 3 to 7 times in one axis direction, and is impregnated in a 0.05 to 5% dichroic dye aqueous solution at a water bath temperature of 30 to 40 ° C and A method of producing a polarizing film by drying a dye at 80 to 100 ° C and thermally fixing it.

本發明所使用的偏光膜,並無特別限定,一般為10~50μm,較佳為15~45μm程度之厚度為佳。The polarizing film used in the present invention is not particularly limited, and is generally preferably 10 to 50 μm, preferably 15 to 45 μm.

這些偏光膜可直接使用於本發明之偏光薄膜的製造上,使用於與接著劑層銜接的面上進行電暈放電處理、等離子處理。These polarizing films can be directly used in the production of the polarizing film of the present invention, and are used for corona discharge treatment and plasma treatment on the surface to which the adhesive layer is bonded.

<接著劑層>本發明的偏光板為,具有上述之相位差的本發明之光學薄膜、與偏光膜介著接著劑層接著而製造。構成本發明之偏光板的接著劑層為,塗佈接著劑所得之層。其中所謂的接著劑中含有水性接著劑、溶劑型接著劑、二液硬化型接著劑、紫外線硬化型接著劑、感壓性接著劑(黏著劑)等。其中使用水性接著劑為佳,特別以使用聚乙烯醇系之水性接著劑為較佳。<Adhesive Layer> The polarizing plate of the present invention is produced by adhering the optical film of the present invention having the above-described phase difference to the polarizing film via an adhesive layer. The adhesive layer constituting the polarizing plate of the present invention is a layer obtained by applying an adhesive. Among these, the adhesive includes an aqueous adhesive, a solvent-based adhesive, a two-liquid curing adhesive, an ultraviolet curing adhesive, and a pressure-sensitive adhesive (adhesive). Among them, an aqueous binder is preferably used, and a polyvinyl alcohol-based aqueous binder is particularly preferable.

作為聚乙烯醇系之水性接著劑,除部分皂化聚乙烯醇、完全皂化聚乙烯醇以外,亦可舉出將如羧基改性聚乙烯醇或乙醯乙醯基改性聚乙烯醇之改性聚乙烯醇等聚乙烯醇系聚合物溶解或分散於水中所成之水系分散體。該聚乙烯醇系聚合物之聚合度,由對水性接著劑的黏度較佳之觀點來看,以均聚合度500~2000程度者為佳。且這些聚乙烯醇系聚合物作為主成分之接著劑作為交聯成分,亦可含有具有反應如異氰酸酯基之羥基所得之官能基的成分。又,聚乙烯醇系接著劑為一般溶解於水中後使用,但欲提高對被塗佈體之潤濕性,可少量添加如醇、酮類之對水之溶解性優良的溶劑為佳。As the polyvinyl alcohol-based aqueous adhesive, in addition to the partially saponified polyvinyl alcohol and the fully saponified polyvinyl alcohol, modification of a polyvinyl alcohol modified with a carboxyl group or a vinyl acetate-modified polyvinyl alcohol may be mentioned. An aqueous dispersion in which a polyvinyl alcohol polymer such as polyvinyl alcohol is dissolved or dispersed in water. The degree of polymerization of the polyvinyl alcohol-based polymer is preferably from a viewpoint of a degree of polymerization of from 500 to 2,000 in terms of a viscosity of the aqueous binder. Further, these polyvinyl alcohol-based polymers are used as a crosslinking agent as a main component, and may contain a component having a functional group obtained by reacting a hydroxyl group such as an isocyanate group. Further, the polyvinyl alcohol-based adhesive is generally used after being dissolved in water. However, in order to improve the wettability to the object to be coated, a solvent having excellent solubility in water such as an alcohol or a ketone may be added in a small amount.

溶劑型接著劑可舉出將合成橡膠、合成樹脂等溶解於有機溶劑之接著劑。The solvent-based adhesive may be an adhesive that dissolves a synthetic rubber, a synthetic resin, or the like in an organic solvent.

作為二液硬化型接著劑,可舉出環氧基型二液硬化型接著劑等。The two-liquid curing type adhesive agent may, for example, be an epoxy-based two-liquid curing type adhesive.

作為感壓性接著劑,例如可舉出天然橡膠、合成橡膠.彈性體、氯化乙烯/乙酸乙烯共聚合物、聚乙烯烷基醚、聚丙烯酸酯、改性聚烯烴系樹脂系感壓性接著劑等,這些中添加異氰酸酯等硬化劑之硬化型感壓性接著劑,特別為聚烯烴泡沫或聚酯薄膜之接著等所使用的感壓性接著劑為佳。Examples of the pressure-sensitive adhesive include natural rubber and synthetic rubber. Elastomer, chlorinated ethylene/vinyl acetate copolymer, polyvinyl alkyl ether, polyacrylate, modified polyolefin resin, pressure-sensitive adhesive, etc., and hardening type pressure-sensitive property of adding a curing agent such as isocyanate The pressure-sensitive adhesive used in the subsequent step, particularly for the polyolefin foam or the polyester film, is preferably used.

又,做為其他接著劑,可使用聚乙烯或聚丙烯等接著等所使用的接著劑之任一種。例如,混合聚尿烷系樹脂溶液與聚異氰酸酯樹脂溶液之乾燥層合用接著劑、苯乙烯丁二烯橡膠系接著劑、環氧基系二液硬化型接著劑、紫外線硬化型之丙烯酸系接著劑,例如可使用環氧基樹脂與多硫醇之二液所成者,環氧基樹脂與聚醯胺之二液所成者等,特別以溶劑型接著劑、環氧基系二液硬化型接著劑且為透明者為佳。Further, as the other adhesive, any of the adhesives used, such as polyethylene or polypropylene, may be used. For example, a dry laminating adhesive for a polyurethane-based resin solution and a polyisocyanate resin solution, a styrene-butadiene rubber-based adhesive, an epoxy-based two-liquid curing adhesive, and an ultraviolet curable acrylic adhesive For example, a two-liquid solution of an epoxy resin and a polythiol, a two-layer solution of an epoxy resin and a polyamine can be used, and a solvent-based adhesive or an epoxy-based two-liquid curing type is particularly used. It is preferred that the agent is transparent and transparent.

本發明中之接著劑層之厚度並無特別限定,其中以50μm以下之薄膜為佳。又,本發明中之接著劑層的光透過性較佳為80%以上,特佳為90%以上。The thickness of the adhesive layer in the present invention is not particularly limited, and a film of 50 μm or less is preferred. Moreover, the light transmittance of the adhesive layer in the present invention is preferably 80% or more, and particularly preferably 90% or more.

本發明中之接著層的拉伸彈性率E3、前述的原冰片烯系樹脂薄膜(A)之拉伸彈性率E1、與防靜電層(B)之拉伸彈性率E2之間成E1>E2>E3的關係時,可成為偏光板之耐久性優良者故較佳。In the present invention, the tensile modulus E3 of the adhesive layer, the tensile modulus E1 of the raw norbornene-based resin film (A), and the tensile modulus E2 of the antistatic layer (B) are E1>E2. In the case of the relationship of E3, it is preferable that the durability of the polarizing plate is excellent.

<偏光板之製造方法>本發明之偏光板為,具有相位差之本發明的光學薄膜、接著劑層及偏光膜經層合所成者。通常接著劑層係於本發明的光學薄膜之防靜電層側形成。即,本發明之偏光板為將上述本發明之相位差薄膜的防靜電層側,使用接著劑或黏著劑接著於偏光膜而製造為佳。如此可提高本發明的光學薄膜與偏光膜之接著強度。另一方面,將接著劑層設置於防靜電層側之反面,或層合於雙面作為防靜電層之本發明的光學薄膜之單面上亦可。如此可更安定地控制其他零件側的表面電阻值,例如於液晶胞介著黏著劑進行貼時,會使靜電量降低故較佳。。<Method for Producing Polarizing Plate> The polarizing plate of the present invention is obtained by laminating an optical film, an adhesive layer and a polarizing film of the present invention having a phase difference. Usually, an adhesive layer is formed on the side of the antistatic layer of the optical film of the present invention. In other words, the polarizing plate of the present invention is preferably produced by using the adhesive or the adhesive on the antistatic layer side of the retardation film of the present invention. Thus, the adhesion strength between the optical film of the present invention and the polarizing film can be improved. On the other hand, the adhesive layer may be provided on the reverse side of the antistatic layer side, or may be laminated on one surface of the optical film of the present invention having an antistatic layer on both sides. In this way, the surface resistance value on the other component side can be more stably controlled. For example, when the liquid crystal cell is attached via the adhesive, the amount of static electricity is lowered, which is preferable. .

作為如此本發明之偏光板的製造方法,預先於原冰片烯系樹脂薄膜(A)之表面上設置塗佈上述防靜電塗層材之防靜電層(B),進行適當乾燥及延伸後,介著接著劑而接著光學薄膜之防靜電層側表面為佳。In the method for producing a polarizing plate of the present invention, the antistatic layer (B) coated with the antistatic coating material is provided on the surface of the original borneol resin film (A) in advance, and after being appropriately dried and extended, It is preferred that the adhesive is applied to the side surface of the antistatic layer of the optical film.

作為接著偏光膜與本發明之光學薄膜的具體方法,雖取決於偏光膜、防靜電塗層材及接著劑之種類,但偏光膜表面或光學薄膜之防靜電層側表面上塗佈接著劑,將光學薄膜或偏光膜於此重疊後並壓著而進行。As a specific method of the polarizing film and the optical film of the present invention, depending on the type of the polarizing film, the antistatic coating material, and the adhesive, the surface of the polarizing film or the surface of the antistatic layer of the optical film is coated with an adhesive. The optical film or the polarizing film is superposed thereon and pressed.

其中,作為壓著條件,例如可於18~25℃的環境下以1 k g/cm2 程度之加壓條件下進行。In this case, the pressing conditions can be carried out, for example, under a pressure of about 1 kg/cm 2 in an environment of 18 to 25 ° C.

又,具有防靜電層之本發明的光學薄膜為,存在於偏光膜之單面上者為佳,亦可存在於雙面上。Further, the optical film of the present invention having an antistatic layer is preferably present on one side of the polarizing film, and may be present on both sides.

如此有關本發明之偏光板為具有良好偏光功能,原冰片烯系樹脂薄膜(A)與偏光膜強固接著者,且耐熱性、耐藥品性等特性亦優良,即使長期使用亦不易產生剝離、變形、相位差變化等,而具有較高信頼性,優良耐久性。The polarizing plate of the present invention has a good polarizing function, and the original borneol-based resin film (A) and the polarizing film are strongly bonded, and are excellent in heat resistance and chemical resistance, and are not easily peeled or deformed even after long-term use. , phase difference change, etc., and has high reliability and excellent durability.

對於密著性,原冰片烯樹脂薄膜與偏光膜間並無剝離,僅產生材料破壞者為佳。In the adhesion, the original borneol resin film and the polarizing film are not peeled off, and it is preferable that only the material is broken.

如此本發明之偏光板可利用於各種顯示器用途上,特別適用於形成液晶顯示器之用途上。本發明的相位差板為實質上未有點狀缺陷等之高品質者,故使用此所得之本發明液晶顯示器,於大畫面時亦可為不具有亮點等缺陷之高品質者。又,液晶顯示器之製造,一般為將具有黏著層與保護該黏著層之剝離薄膜的相位差板,接著於剝離薄膜經剝離之顯示器表面上而進行,於薄膜剝離時亦可充分地防止靜電的產生,故亦可防止接著於相位差板時的異物混入,且所得之液晶顯示器因未有靜電產生,而可製造後馬上進行品質檢査,故其製造效率亦優良。Thus, the polarizing plate of the present invention can be utilized for various display applications, and is particularly suitable for use in forming a liquid crystal display. Since the phase difference plate of the present invention is of a high quality which is substantially free from defects such as defects, the liquid crystal display of the present invention obtained by using the present invention can be a high quality without defects such as bright spots in a large screen. Further, the liquid crystal display is generally produced by a phase difference plate having an adhesive layer and a release film for protecting the adhesive layer, and then is applied to the surface of the display on which the release film is peeled off, and can sufficiently prevent static electricity when the film is peeled off. When it is produced, it is possible to prevent the foreign matter from entering the phase difference plate, and the obtained liquid crystal display can be subjected to quality inspection immediately after the production because no static electricity is generated, so that the manufacturing efficiency is also excellent.

[實施例][Examples]

以下對於本發明之具體實施例做説明,但本發明並非限定於這些實施例者。且,以下的「份」若無特別說明時表示「重量份」。The specific embodiments of the present invention are described below, but the present invention is not limited to the embodiments. In addition, the following "parts" means "parts by weight" unless otherwise specified.

又,表面電阻值、耐水性、拉伸強度、玻璃轉移溫度、全光線透過率、霧值、偏光度、透過光之相位差、接著性、耐濕試驗、乾熱試驗藉由下述方法測定出。Further, the surface resistance value, water resistance, tensile strength, glass transition temperature, total light transmittance, haze value, degree of polarization, phase difference of transmitted light, adhesion, moisture resistance test, dry heat test were measured by the following methods Out.

〔表面電阻值〕依據JIS K7194,使用表面電阻值使用三菱化學(股)製之羅雷斯達GP進行測定。[Surface resistance value] According to JIS K7194, the surface resistance value was measured using a Lorez GP manufactured by Mitsubishi Chemical Corporation.

〔密著性〕使用JIS Z1522所規定的黏著帶,依據JIS K5400,密著性於25格之棋盤剝離帶試驗中進行評估,表示残膜率。[Adhesiveness] The adhesive tape specified in JIS Z1522 was used, and the adhesion was evaluated in a checkerboard test of 25 grids in accordance with JIS K5400, and the residual film ratio was shown.

〔耐水性〕室溫下,介著外套面含有水之棉布載持100g的錘(對外套面之接觸面積3cm2 ),進行5次往返後使錘滑下,外套面之外觀由目視觀察,以以下基準進行判定。[Water resistance] At room temperature, a cotton cloth containing water on the outer surface of the jacket was loaded with a hammer of 100 g (contact area of the outer surface of the outer surface of 3 cm 2 ), and the hammer was slid down five times, and the appearance of the outer surface was visually observed. The judgment is made based on the following criteria.

A:無外觀變化B:產生1~數根之傷C:產生無數之傷A: No appearance change B: 1 to several root injuries C: Innumerable injuries

〔拉伸彈性率〕依據JIS K7127,於室溫之拉伸彈性率使用autograph AGS-Jseries((股)島津製作所製)進行測定。[Tensile modulus] According to JIS K7127, the tensile modulus at room temperature was measured using an autograph AGS-Jseries (manufactured by Shimadzu Corporation).

〔玻璃轉移溫度(Tg)〕依據JIS K7121,玻璃轉移溫度使用Seiko Instruments公司製的差示掃描熱量計(DSC),於氮環境下昇溫速度為20℃/分鐘之條件下測定玻璃轉移溫度(以下亦稱為「Tg」)。[Glass transfer temperature (Tg)] The glass transition temperature was measured in accordance with JIS K7121, using a differential scanning calorimeter (DSC) manufactured by Seiko Instruments Co., Ltd. under a nitrogen atmosphere at a temperature increase rate of 20 ° C /min. Also known as "Tg").

〔全光線透過率、霧值〕依據JIS K7105,將全光線透過率使用Suga試驗機公司製之霧值測定機「HGM-2DP型」,測定全光線透過率及霧值。[Total Light Transmittance and Haze Value] The total light transmittance and the haze value were measured using a haze value measuring machine "HGM-2DP type" manufactured by Suga Test Instruments Co., Ltd. according to JIS K7105.

〔偏光度〕使用王子計測機器(股)製的「KOBRA-21ADH/PR」測定波長547.7nm之偏光度。[Polarization degree] The degree of polarization at a wavelength of 547.7 nm was measured using "KOBRA-21ADH/PR" manufactured by Oji Scientific Instruments Co., Ltd.

〔透過光之相位差〕使用王子計測機器(股)製的「KOBRA-21ADH」,以波長480nm、550nm、590nm、630nm、750nm進行測定,對於該波長以外的部分,以前述波長之相位差值為準使用Cauchy分散式算出。[KOBRA-21ADH" manufactured by Oji Scientific Instruments Co., Ltd., measured at wavelengths of 480 nm, 550 nm, 590 nm, 630 nm, and 750 nm, and the phase difference of the wavelengths of the wavelengths other than the wavelength It is calculated using the Cauchy dispersion formula.

〔接著性(偏光子與保護薄膜之接著性)〕依據JIS K6854,偏光子與保護薄膜貼合後,使用Instron公司製的萬能材料試驗機3366進行90°撕裂強度試驗(peel test),測定剝離強度。且將材料破壞及薄膜間剝離之產生程度以目視觀察。[Adhesiveness (adhesion of polarizer and protective film)] According to JIS K6854, a polarizer is bonded to a protective film, and a 90° tear strength test (peel test) is performed using a universal material testing machine 3366 manufactured by Instron. Peel strength. Moreover, the degree of destruction of the material and peeling between the films was visually observed.

〔表面粗糙度〕使用原子間力顯微鏡Nano ScopeIIIa(Digital Instrument公司製),測定出表面粗糙度Ra(算術平均高度)。[Surface roughness] The surface roughness Ra (arithmetic mean height) was measured using an atomic force microscope Nano Scope IIIa (manufactured by Digital Instrument Co., Ltd.).

〔濕潤張力〕依據JIS K6768,使用濕潤張力試驗用混合液(和光純藥工業(股)製)進行評估。[Wet tension] According to JIS K6768, the mixture for wet tension test (manufactured by Wako Pure Chemical Industries, Ltd.) was used for evaluation.

〔薄膜捲取性〕重疊2片切出A4尺寸的薄膜,以橡膠輥壓著後靜置,其後將上面之薄膜於水平方向以速度1m/分鐘脫離時的移動容易度與薄膜表面之擦傷的有無以下述水準作評估。[Film take-up property] Two sheets of A4 size film were cut out, and the film was pressed with a rubber roller, and then allowed to stand, and then the film was scratched at a speed of 1 m/min in the horizontal direction and the surface of the film was scratched. Whether or not the assessment is based on the following criteria.

A:容易移動薄膜,移動後之薄膜表面無傷痕。A: It is easy to move the film, and the surface of the film after moving is free from scratches.

B:稍重觸感移動薄膜,移動後之薄膜表面稍有傷痕。B: The touch film is slightly touched, and the surface of the film after moving is slightly scratched.

C:薄膜結塊而無法順利地移動,移動後之薄膜表面有多傷痕。C: The film agglomerates and cannot move smoothly, and the surface of the film after moving has many scratches.

合成例1備有攪拌機、溫度計及單體添加幫浦之內容積2L的分離式燒瓶中,裝入離子交換水150份、反應性乳化劑「艾迪卡力亞索比SE-10N」(旭電化工業(股)製)2份、與過硫酸銨0.5份,將氣相份於15分鐘內由氮氣體取代後昇溫至80℃。其次,離子交換水50份、甲基丙烯酸6份、具有四級銨基之甲基丙烯酸酯的MOETAS(MRC unitec(股)製)47部、甲基丙烯酸甲酯20份、甲基丙烯酸乙酯26份、與反應性乳化劑「艾迪卡力亞索比SE-10N」1份於另一容器中混合攪拌後調製出預乳化物,所得之預乳化物分3小時連續地滴入前述分離式燒瓶中。且於預乳化物滴下期間導入氮氣,燒瓶內之溫度保持於80℃。滴下終了後,將反應系昇溫至90℃再繼續反應2小時。其次,將該系統降溫至25℃後,滴入5%之氨水,將pH調整至8,其次加入離子交換水,得到固體成分濃度25%乳化劑型(乳化劑粒子之平均粒子徑:0.06μm)的塗佈劑之乳化劑1。Synthesis Example 1 A separator flask equipped with a stirrer, a thermometer, and a monomer-added 2L internal volume was charged with 150 parts of ion-exchanged water and a reactive emulsifier "Edikari Soby SE-10N" (Asahi) 2 parts of the electrochemical industry (manufactured by the company), with 0.5 parts of ammonium persulfate, the gas phase was replaced by a nitrogen gas in 15 minutes, and then the temperature was raised to 80 °C. Next, 50 parts of ion-exchanged water, 6 parts of methacrylic acid, 47 parts of MOETAS (manufactured by MRC unitec), 20 parts of methyl methacrylate, and ethyl methacrylate having a quaternary ammonium group methacrylate. 26 parts and one part of the reactive emulsifier "Edikari Sobi SE-10N" were mixed and stirred in another container to prepare a pre-emulsified product, and the obtained pre-emulsified product was continuously dropped into the above-mentioned separation for 3 hours. In a flask. Nitrogen gas was introduced during the dropwise addition of the pre-emulsion, and the temperature in the flask was maintained at 80 °C. After the completion of the dropwise addition, the reaction system was heated to 90 ° C and the reaction was continued for 2 hours. Next, after the system was cooled to 25 ° C, 5% ammonia water was added dropwise, the pH was adjusted to 8, and then ion-exchanged water was added to obtain a solid content concentration of 25% emulsifier type (average particle diameter of emulsifier particles: 0.06 μm). Emulsifier 1 for the coating agent.

合成例2取代甲基丙烯酸乙酯26份加入異冰片基丙烯酸酯26份以外,其他與合成例1同様操作下得到乳化劑2。Synthesis Example 2 An emulsifier 2 was obtained in the same manner as in Synthesis Example 1 except that 26 parts of ethyl methacrylate was added to 26 parts of isobornyl acrylate.

調製例1~2合成例所得之乳化劑1(調製例1)或乳化劑2(調製例2)8部、離子交換水120.7部、EPOMINP-1000((股)日本觸媒製)1部、與聚甘油聚縮水甘油醚0.3部以此順序下加入,室溫中攪拌10分鐘,各得到防靜電塗料1、及防靜電塗料2。藉由XRF測定各進行該防靜電塗料1、2之元素分析,得到鹵素含有量各為0.5wt%、0.5wt%,金屬含有量各為0.01wt%、0.01wt%。The emulsifier 1 (Preparation Example 1), the emulsifier 2 (Preparation Example 2), the ion-exchange water 120.7, and the EPOMINP-1000 (manufactured by Nippon Shokubai Co., Ltd.) obtained in the synthesis examples 1 to 2 were prepared. 0.3 parts of polyglycerol polyglycidyl ether were added in this order, and stirred at room temperature for 10 minutes to obtain an antistatic coating 1 and an antistatic coating 2, respectively. The elemental analysis of the antistatic coatings 1 and 2 was carried out by XRF measurement to obtain a halogen content of 0.5 wt% and 0.5 wt%, respectively, and the metal contents were 0.01 wt% and 0.01 wt%, respectively.

將防靜電塗料1及2各塗佈於玻璃基板上塗佈,100℃下進行120分鐘乾燥後剝離,得到30μm厚之薄膜,測定室溫中之拉伸彈性率,得到皆為0.8GPa。Each of the antistatic coatings 1 and 2 was applied onto a glass substrate, dried at 100 ° C for 120 minutes, and then peeled off to obtain a film having a thickness of 30 μm, and the tensile modulus at room temperature was measured to obtain 0.8 GPa.

另外,將防靜電塗料1、及防靜電塗料2之折射率以Abbe折射率計進行測定後,得到皆為1.50。Further, the refractive indices of the antistatic coating material 1 and the antistatic coating material 2 were measured by an Abbe refractometer, and both were obtained at 1.50.

調製例3將平均聚合度1,700之完全皂化聚乙烯醇溶解於水終至3重量%,得到聚乙烯醇系接著劑。所得之聚乙烯醇系接著劑經濃縮並使濃度成10重量%,塗佈於玻璃基板上,於100℃下進行120分鐘乾燥後剝離,得到30μm厚之薄膜,測定室溫中之拉伸彈性率後得到0.4GPa。Preparation Example 3 A fully saponified polyvinyl alcohol having an average degree of polymerization of 1,700 was dissolved in water to 3% by weight to obtain a polyvinyl alcohol-based adhesive. The obtained polyvinyl alcohol-based adhesive was concentrated and made to have a concentration of 10% by weight, coated on a glass substrate, dried at 100 ° C for 120 minutes, and then peeled off to obtain a film having a thickness of 30 μm, and the tensile elasticity at room temperature was measured. After the rate, 0.4 GPa is obtained.

調製例4反應容器中裝入蒸餾水250份,該反應容器中添加丙烯酸丁基90份、2-羥基乙基甲基丙烯酸酯8份、二乙烯苯2份、與油酸鉀0.1份後,將該系統以鐵福隆(註冊商標)製之攪拌翼進行攪拌並分散處理。其後,該反應容器內以氮取代後,該系統昇溫至50℃,添加過硫酸鉀0.2份,並開始聚合。聚合開始後2小時後,聚合反應系中再添加過硫酸鉀0.1份後,該系統昇溫至80℃,經1小時繼續進行聚合反應而得到聚合物分散液。In Preparation Example 4, 250 parts of distilled water was placed in a reaction vessel, and 90 parts of butyl acrylate, 8 parts of 2-hydroxyethyl methacrylate, 2 parts of divinylbenzene, and 0.1 parts of potassium oleate were added to the reaction container. This system was stirred and dispersed by a stirring blade made of Teflon (registered trademark). Thereafter, after the inside of the reaction vessel was replaced with nitrogen, the system was heated to 50 ° C, 0.2 parts of potassium persulfate was added, and polymerization was started. Two hours after the start of the polymerization, 0.1 part of potassium persulfate was further added to the polymerization reaction system, and the system was heated to 80 ° C, and polymerization was continued for 1 hour to obtain a polymer dispersion.

其次,使用蒸餾器將聚合物分散液濃縮至固體成分濃度為70重量%,得到由丙烯酸酯系聚合物之水系分散體所成的水系感壓性接著劑(具有極性基之感壓性接著劑)。Next, the polymer dispersion was concentrated to a solid concentration of 70% by weight using a distiller to obtain a water-based pressure-sensitive adhesive (aqueous pressure-sensitive adhesive having a polar group) composed of an aqueous dispersion of an acrylate polymer. ).

調製例5~6合成例所得之乳化劑1(調製例5)或乳化劑2(調製例6)8份,作為填充物,將調製例5中為平均粒徑0.10μm對於全體粒子量而言以90wt%含有,且平均粒徑0.30μm對於全體粒子量而言以10wt%含有之聚苯乙烯系真球粒子(折射率1.59),以及將調製例6中平均粒徑0.10μm對於全體粒子量而言以80wt%含有,且平均粒徑0.30μm對全體粒子量而言以20wt%含有的丙烯酸系真球粒子(折射率1.51),於形成防靜電層時使用各體積分率至10%之量,以離子交換水120.7份、EPOMINP-1000((股)日本觸媒製)1份、聚甘油聚縮水甘油醚0.3份之順序加入,室溫下進行10分鐘攪拌,得到各防靜電塗料3、及防靜電塗料4。以XRF測定各進行該防靜電塗料3、4之元素分析,鹵素含有量各為0.5wt%、0.5wt%,金屬含有量各為0.01wt%、0.01wt%。8 parts of the emulsifier 1 (Preparation Example 5) or the emulsifier 2 (Preparation Example 6) obtained in the synthesis examples 5 to 6 were prepared, and the average particle diameter of 0.10 μm in the preparation example 5 was used as a filler. Polystyrene-based true spherical particles (refractive index: 1.59) contained in an amount of 10% by weight based on the total particle diameter of 90% by weight, and an average particle diameter of 0.10 μm in Preparation Example 6 for the total amount of particles In the case of 80% by weight, the average particle diameter of 0.30 μm is 20% by weight of the total amount of the acrylic-based true spherical particles (refractive index of 1.51), and when the antistatic layer is formed, each volume fraction is used up to 10%. The amount is 120.7 parts of ion-exchanged water, 1 part of EPOMINP-1000 (manufactured by Nippon Shokubai Co., Ltd.), and 0.3 parts of polyglycerol polyglycidyl ether are added in this order, and stirred at room temperature for 10 minutes to obtain each antistatic coating 3 And antistatic coating 4. The elemental analysis of the antistatic coatings 3 and 4 was carried out by XRF measurement, and the halogen contents were each 0.5 wt% and 0.5 wt%, and the metal contents were 0.01 wt% and 0.01 wt%, respectively.

將防靜電塗料3及4塗佈於各玻璃基板上,100℃下進行120分鐘乾燥後剝離後得到30μm厚之薄膜,測定室溫中的拉伸彈性率後得到皆為0.8GPa。The antistatic coatings 3 and 4 were applied onto each of the glass substrates, dried at 100 ° C for 120 minutes, and then peeled off to obtain a film having a thickness of 30 μm. The tensile modulus at room temperature was measured to be 0.8 GPa.

另外,防靜電塗料3、及防靜電塗料4之折射率以Abbe折射率計進行測定後,得到皆為1.50。Further, the refractive indices of the antistatic coating 3 and the antistatic coating 4 were measured by an Abbe refractometer, and both were obtained at 1.50.

〔實施例1~10〕[Examples 1 to 10]

作為原冰片烯系樹脂薄膜使用任一之ARTON FLYL100(JSR(股)製)或ZEONOR ZF14-100(日本zeon(股)製),於塗佈防靜電塗料前之原冰片烯系樹脂薄膜上,於大氣中進行與不進行50W.min/m2 之電暈放電處理之各情況下,將防靜電塗料1~4以濕潤膜厚6微米之塗佈棒進行塗佈,於110℃進行3分鐘乾燥,得到薄膜1~10。且對於各實施例,所使用的原冰片烯系樹脂薄膜之種類、電暈處理之有無、及所使用的防靜電塗料之種類如表1或表2所示。Any one of the original borneol-based resin film is made of ARTON FLYL100 (manufactured by JSR Co., Ltd.) or ZEONOR ZF14-100 (manufactured by Japan Zeon Co., Ltd.) on the original borneol-based resin film before the application of the antistatic coating. Conducted in the atmosphere with and without 50W. In each case of the corona discharge treatment of min/m 2 , the antistatic coatings 1 to 4 were applied with a coating bar having a wet film thickness of 6 μm, and dried at 110 ° C for 3 minutes to obtain films 1 to 10. Further, in each of the examples, the type of the original borneol-based resin film to be used, the presence or absence of corona treatment, and the type of the antistatic coating to be used are shown in Table 1 or Table 2.

且對於ARTON FLYL100及ZEONOR ZF14-100,各室溫下測定其拉伸彈性率後得到皆為1GPa。For ARTON FLYL100 and ZEONOR ZF14-100, the tensile modulus at room temperature was measured to be 1 GPa.

且,塗佈電暈處理後之防靜電塗料前之薄膜表面粗糙度Ra(nm)與濕潤張力(mN/m)如表1及表2所示。又,塗佈防靜電塗料,乾燥後之防靜電薄膜的評估結果亦歸納於表1及表2所示。又,對於實施例1、9及10(薄膜1、9、10),亦進行霧值與薄膜捲取性之評估,結果如表2所示。Further, the surface roughness Ra (nm) and the wet tension (mN/m) of the film before the application of the antistatic coating after corona treatment are shown in Tables 1 and 2. Further, the evaluation results of the antistatic coating after application of the antistatic coating are also shown in Tables 1 and 2. Further, with respect to Examples 1, 9, and 10 (films 1, 9, and 10), evaluation of haze value and film take-up property was also carried out, and the results are shown in Table 2.

〔比較例1,2〕[Comparative Examples 1, 2]

取代防靜電塗料2使用醯胺甜菜鹼的2重量%水溶液、或聚乙二醇之2重量%水溶液以外,其他與實施例2同様地各得到薄膜A、及薄膜B。薄膜A及薄膜B之評估結果如表3所示。A film A and a film B were obtained in the same manner as in Example 2 except that the antistatic coating 2 was used in an aqueous solution of 2% by weight of guanamine betaine or a 2% by weight aqueous solution of polyethylene glycol. The evaluation results of Film A and Film B are shown in Table 3.

薄膜A為表面電阻值較低,顯示充分防靜電能,但防靜電層之密著性與耐水性較不佳。Film A has a low surface resistance value and exhibits sufficient antistatic properties, but the adhesion and water resistance of the antistatic layer are poor.

另一方面,薄膜B雖顯示充分之密著性與耐水性的性能,但表面電阻值較高,其防靜電能為不佳。On the other hand, although the film B exhibits sufficient adhesion and water resistance, the surface resistance value is high, and the antistatic property is not good.

〔實施例11〕[Example 11]

作為原冰片烯系樹脂薄膜使用ARTON FLYL100(JSR(股)製),於塗佈防靜電塗料前之原冰片烯系樹脂薄膜上,大氣中不進行50W.min/m2 之電暈放電處理,防靜電塗料2以濕潤膜厚6微米之塗佈棒進行塗佈,75℃下進行1分鐘乾燥,得到薄膜11。且,ARTON FLYL100之玻璃轉移溫度為165℃。ARTON FLYL100 (manufactured by JSR Co., Ltd.) was used as the original borneol-based resin film, and the original borneol-based resin film before the application of the antistatic coating was not subjected to 50 W in the atmosphere. For the corona discharge treatment of min/m 2 , the antistatic coating 2 was applied by a coating bar having a wet film thickness of 6 μm, and dried at 75 ° C for 1 minute to obtain a film 11 . Moreover, the glass transition temperature of ARTON FLYL100 is 165 °C.

將薄膜11於強制攪拌式乾燥機中150℃下進行3分鐘加熱,得到薄膜11-1。The film 11 was heated in a forced stirring dryer at 150 ° C for 3 minutes to obtain a film 11-1.

又,薄膜11於拉幅器內以Tg+15℃(180℃)加熱,以延伸速度300%/分鐘下望薄膜面內方向之縱方向延伸1.3倍後,往薄膜面內方向之横方向延伸1.8倍後,於Tg-20℃(145℃)環境下,該狀態保持1分鐘下進行冷卻,更冷卻至室溫,由拉幅器內取出後,隨著薄膜延伸之二次乾燥後得到薄膜11-2。Further, the film 11 is heated at Tg+15° C. (180° C.) in a tenter, and is extended by a width of 300%/min to extend 1.3 times in the longitudinal direction of the in-plane direction of the film, and then extended 1.8 times in the lateral direction of the film in-plane direction. Thereafter, in a Tg-20 ° C (145 ° C) environment, the state is kept under cooling for 1 minute, and further cooled to room temperature. After being taken out from the tenter, the film is obtained by secondary drying after the film is stretched. 2.

另一方面,將ARTON FLYL100於拉幅器內以Tg+15℃(180℃)加熱,以延伸速度300%/分鐘下往薄膜面內方向之縱方向延伸1.3倍後,往薄膜面內方向之横方向延伸1.8倍後,Tg-20℃(145℃)之環境下,該狀態保持1分鐘下進行冷卻,更冷卻至室溫,由拉幅器內取出後得到相位差薄膜1。該相位差薄膜1與實施例1同様下進行電暈放電處理,經防靜電塗料2之塗佈.乾燥後所得之薄膜作為薄膜11-3。On the other hand, ARTON FLYL100 was heated at Tg+15°C (180°C) in a tenter, and extended at a stretching speed of 300%/min in the longitudinal direction of the in-plane direction of the film by 1.3 times, and then in the lateral direction of the film in-plane direction. After extending 1.8 times, in a Tg-20 ° C (145 ° C) environment, the state was kept under cooling for 1 minute, and further cooled to room temperature, and taken out from the tenter to obtain a retardation film 1. The retardation film 1 was subjected to corona discharge treatment in the same manner as in Example 1, and coated by the antistatic coating 2. The film obtained after drying was used as the film 11-3.

對於所得之各薄膜,進行實施例2之評估項目以及面內相位差(@ 550nm)、厚度方向相位差(@ 550nm)、薄膜厚度之測定或評估,結果如表4所示。For each of the obtained films, the evaluation items of Example 2 and the in-plane phase difference (@ 550 nm), the thickness direction phase difference (@ 550 nm), and the film thickness were measured or evaluated. The results are shown in Table 4.

〔實施例12〕[Example 12]

作為原冰片烯系樹脂薄膜使用ZEONOR ZF14-100(日本zeon(股)製),於塗佈防靜電塗料前的原冰片烯系樹脂薄膜上,大氣中不進行50W.min/m2 之電暈放電處理,將防靜電塗料2以濕潤膜厚6微米之塗佈棒進行塗佈,於75℃中進行1分鐘乾燥,得到薄膜12。且ZEONOR ZF14-100之玻璃轉移溫度為140℃。ZEONOR ZF14-100 (manufactured by Japan Zeon Co., Ltd.) was used as the original borneol-based resin film, and the original borneol-based resin film before the application of the antistatic coating was not subjected to 50 W in the atmosphere. For the corona discharge treatment of min/m 2 , the antistatic coating 2 was applied with a coating bar having a wet film thickness of 6 μm, and dried at 75 ° C for 1 minute to obtain a film 12 . And the glass transition temperature of ZEONOR ZF14-100 is 140 °C.

薄膜12於強制攪拌式乾燥機中125℃下進行3分鐘加熱,得到薄膜12-1。The film 12 was heated in a forced stirring dryer at 125 ° C for 3 minutes to obtain a film 12-1.

又,薄膜12於拉幅器內中以Tg+15℃(155℃)加熱,於延伸速度300%/分鐘下往薄膜面內方向之縱方向延伸1.3倍後,往薄膜面內方向之横方向延伸1.8倍,其後於Tg-20℃(125℃)之環境下,該狀態下保持1分鐘下冷卻,更冷卻至室溫,由拉幅器內取出後,隨著薄膜延伸之二次乾燥後得到薄膜12-2。Further, the film 12 was heated at Tg + 15 ° C (155 ° C) in a tenter, and extended 1.3 times in the longitudinal direction of the in-plane direction of the film at an elongation speed of 300%/min, and then extended in the lateral direction of the film in-plane direction. Then, in the environment of Tg-20 ° C (125 ° C), it is kept in this state for 1 minute, cooled to room temperature, taken out from the tenter, and then obtained after the film is stretched twice. Film 12-2.

另一方面,將ZEONOR ZF14-100於拉幅器內,以Tg+15℃(155℃)加熱,以延伸速度300%/分鐘往薄膜面內方向之縱方向延伸1.3倍後,往薄膜面內方向之横方向延伸1.8倍,其後,於Tg-20℃(125℃)的環境下,該狀態保持1分鐘下冷卻,更冷卻至室溫,由拉幅器內取出後得到相位差薄膜2。該相位差薄膜2與實施例1同様地進行電暈放電處理,經防靜電塗料2之塗佈.乾燥後所得之薄膜作為薄膜12-3。On the other hand, the ZEONOR ZF14-100 was heated in a tenter at Tg+15°C (155°C), extended at a stretching speed of 300%/min in the longitudinal direction of the in-plane direction of the film by 1.3 times, and then inward in the direction of the film. It was extended 1.8 times in the horizontal direction, and thereafter, it was cooled in the state of Tg-20 ° C (125 ° C) for 1 minute, cooled to room temperature, and taken out from the tenter to obtain a retardation film 2. The retardation film 2 is subjected to corona discharge treatment in the same manner as in the first embodiment, and is coated by the antistatic coating 2. The film obtained after drying was used as the film 12-3.

對於所得之各薄膜,進行實施例2之評估項目以及面內相位差(@ 550nm)、厚度方向相位差(@ 550nm)、薄膜厚度之測定或評估,結果如表4所示。For each of the obtained films, the evaluation items of Example 2 and the in-plane phase difference (@ 550 nm), the thickness direction phase difference (@ 550 nm), and the film thickness were measured or evaluated. The results are shown in Table 4.

〔實施例13〕[Example 13]

將聚乙烯醇(以下,簡稱為「PVA」)於碘濃度為0.03重量%,碘化鉀濃度為0.5重量%之水溶液所成的溫度30℃之染色浴中進行延伸倍率3倍之前延伸加工後,硼酸濃度為5重量%,碘化鉀濃度為8重量%之水溶液所成的溫度55℃之交聯浴中,進行延伸倍率2倍之後延伸加工,經乾燥處理後得到偏光膜(以下亦稱為「偏光子」)。Polyvinyl alcohol (hereinafter abbreviated as "PVA") is subjected to stretching treatment in a dye bath at a temperature of 30 ° C in an aqueous solution having an iodine concentration of 0.03% by weight and a potassium iodide concentration of 0.5% by weight. In a crosslinking bath having a concentration of 5% by weight and an aqueous solution having a potassium iodide concentration of 8% by weight at a temperature of 55 ° C, the stretching ratio was doubled and then extended, and after drying, a polarizing film was obtained (hereinafter also referred to as "polarizer". ").

其次,偏光子之雙面上,使用調製例3所得之聚乙烯醇系接著劑,接著成薄膜2與薄膜11-2挾持偏光子,而得到偏光板1。此時塗佈防靜電塗料之面與薄膜2、薄膜11-2同時配置於偏光子側。Next, on the both sides of the polarizer, the polyvinyl alcohol-based adhesive obtained in Preparation Example 3 was used, and then the film 2 and the film 11-2 were held by a polarizer to obtain a polarizing plate 1. At this time, the surface on which the antistatic coating is applied is disposed on the polarizer side simultaneously with the film 2 and the film 11-2.

同様地取代薄膜2與薄膜11-2,使用薄膜11-3得到偏光板2。The film 2 and the film 11-2 were replaced in the same manner, and the polarizing plate 2 was obtained using the film 11-3.

所得之偏光板1及2之透過率皆為44.0%、偏光度為99.9%。The obtained polarizing plates 1 and 2 had a transmittance of 44.0% and a degree of polarization of 99.9%.

所得之偏光板1及2之接著性進行評估後得知,無產生偏光子與相位差薄膜間之剝離,僅產生材料破壞。此時的剝離強度於90°撕裂強度試驗(peel test)下為6.0N/25mm。When the adhesion of the obtained polarizing plates 1 and 2 was evaluated, it was found that no peeling between the polarizing film and the retardation film occurred, and only material destruction occurred. The peel strength at this time was 6.0 N/25 mm under a 90° peel strength test.

〔實施例14〕[Example 14]

取代薄膜2使用薄膜6,取代薄膜11-2使用薄膜12-2或薄膜12-3以外,與實施例13同様下得到偏光板3、及偏光板4。The film 6 was used instead of the film 2, and the polarizing plate 3 and the polarizing plate 4 were obtained in the same manner as in Example 13 except that the film 12-2 or the film 12-3 was used instead of the film 11-2.

所得之偏光板3及4之透過率皆為44.0%,偏光度為99.9%。The obtained polarizing plates 3 and 4 had a transmittance of 44.0% and a degree of polarization of 99.9%.

對所得之偏光板3及4之接著性進行評估後得知,未產生偏光子與相位差薄膜間之剝離,僅產生材料破壞。此時的剝離強度以90°撕裂強度試驗(peel test)下為4.9N/25mm。Evaluation of the adhesion between the obtained polarizing plates 3 and 4 revealed that no peeling between the polarizer and the retardation film occurred, and only material destruction occurred. The peel strength at this time was 4.9 N/25 mm under a 90° peel strength test.

又,將未塗佈防靜電塗料之薄膜2、薄膜11-2之面亦同時配置於偏光子側以外,進行與實施例13同様操作,得到偏光板5。In addition, the surface of the film 2 and the film 11-2 to which the antistatic coating was not applied was simultaneously disposed on the side of the polarizer, and the same operation as in Example 13 was carried out to obtain a polarizing plate 5.

將所得之偏光版5的接著性進行評估後得知,偏光子與相位差薄膜間之剝離容易產生。此時的剝離強度以90°撕裂強度試驗(peel test)下為0.3N/25mm。When the adhesion of the obtained polarizing plate 5 was evaluated, it was found that peeling between the polarizer and the retardation film easily occurred. The peel strength at this time was 0.3 N/25 mm under a 90° peel strength test.

〔實施例15〕[Example 15]

欲評估上述偏光板1之特性,於乾淨環境下,剝離販賣的液晶電視機之液晶面板的觀察者側上所貼付之偏光板及相位差薄膜,以上述偏光板1,使薄膜11-2側成為面板側,使用以調製例4所調製之水系感壓性接著劑,貼付於液晶面板之前面(觀察者側)所得之液晶面板1取代。To evaluate the characteristics of the polarizing plate 1 described above, the polarizing plate and the retardation film attached to the viewer side of the liquid crystal panel of the commercially available liquid crystal television are peeled off in a clean environment, and the polarizing plate 1 is used to make the film 11-2 side. On the panel side, a water-based pressure-sensitive adhesive prepared in Preparation Example 4 was used, and the liquid crystal panel 1 obtained by attaching it to the front surface (observer side) of the liquid crystal panel was replaced.

該液晶面板1即使於面板開燈,亦不會觀察到點狀缺陷。The liquid crystal panel 1 does not observe dot defects even when the panel is turned on.

又,該液晶面板1即使於60℃、相對濕度90%之環境下放置1000小時後,並無觀察到面板之外觀變化、及自偏光板之面板的剝離或自偏光子之薄膜的剝離。Further, even after the liquid crystal panel 1 was left in an environment of 60 ° C and a relative humidity of 90% for 1,000 hours, no change in the appearance of the panel, peeling of the panel from the polarizing plate, or peeling of the film from the polarizer was observed.

另外,該液晶面板1於80℃之環境下放置1000小時後,並無觀察到面板之外觀變化、及自偏光板之面板的剝離或自偏光子之薄膜的剝離。Further, after the liquid crystal panel 1 was allowed to stand in an environment of 80 ° C for 1,000 hours, no change in the appearance of the panel, peeling of the panel from the polarizing plate, or peeling of the film from the polarizer was observed.

〔實施例16〕[Example 16]

使用對於塗料2之100重量份而言添加三乙二醇單甲基醚(沸點249℃)3重量份之塗料以外,其他與實施例2同様下得到薄膜16。A film 16 was obtained in the same manner as in Example 2, except that a coating of 3 parts by weight of triethylene glycol monomethyl ether (boiling point: 249 ° C) was added to 100 parts by weight of the coating material 2.

薄膜2中,使用鹵素燈,透明性以目視確認時,雖稍有觀察到白濁現象,但與薄膜16之同様條件下,透明性以目視確認時,完全無觀察到白濁現象。In the film 2, a halogen lamp was used, and when the transparency was visually confirmed, a white turbidity phenomenon was slightly observed. However, when the transparency was visually confirmed under the same conditions as the film 16, no white turbidity was observed at all.

[產業上可利用性][Industrial availability]

本發明之光學薄膜為,可適用於液晶顯示器等顯示器用途上,特別適用於偏光板之用途上,除此以外,因其具有優良接著性,作為偏光板用途以外,亦可作為附有硬外套之薄膜、附有反射防止膜之薄膜、附有透明導電膜之薄膜、防赤外.紫外線之薄膜、各種保護薄膜等透明基材使用。The optical film of the present invention is applicable to display applications such as liquid crystal displays, and is particularly suitable for use in a polarizing plate. In addition, it has excellent adhesion, and can be used as a polarizing plate as a polarizing plate. The film, the film with the anti-reflection film, the film with the transparent conductive film, and the anti-red. It is used as a transparent substrate such as an ultraviolet film or various protective films.

Claims (27)

一種光學薄膜,其特徵為層合(A)原冰片烯系樹脂薄膜、與(B)含有(b1)於側鏈上具有下述式(i)所示4級銨鹽之丙烯酸系樹脂、與(b2)聚乙烯亞胺及/或聚羥基鏈烷聚縮水甘油醚所成的硬化劑之防靜電塗層材所形成的防靜電層所成者;-COO-Q1 -N(Q2 )a Xb ………(i)(式(i)中,Q1 為碳數1~6之2價烴基,Q2 為碳數1~3之1價烴基,X為氯原子、氟原子或-Q3 -SO4 (但,Q3 為單鍵、伸甲基或伸乙基),a及b為1或2之整數(但,a+b=3);Q2 、Q3 及X為複數個存在時,各可為相同或相異)。An optical film characterized by laminating (A) a raw borneol-based resin film and (B) an acrylic resin containing (b1) a 4-stage ammonium salt represented by the following formula (i) on a side chain, and (b2) an antistatic layer formed of an antistatic coating material of a hardening agent made of polyethyleneimine and/or polyhydroxyalkane polyglycidyl ether; -COO-Q 1 -N(Q 2 ) a X b (i) (in the formula (i), Q 1 is a divalent hydrocarbon group having 1 to 6 carbon atoms, Q 2 is a monovalent hydrocarbon group having 1 to 3 carbon atoms, and X is a chlorine atom or a fluorine atom or -Q 3 -SO 4 (however, Q 3 is a single bond, a methyl group or an ethyl group), a and b are integers of 1 or 2 (however, a+b=3); Q 2 , Q 3 and X are plural When they exist, they can be the same or different. 如申請專利範圍第1項之光學薄膜,其中防靜電塗層材更含有填充物。The optical film of claim 1, wherein the antistatic coating material further comprises a filler. 如申請專利範圍第1項之光學薄膜,其中防靜電層側之表面電阻值為1×106 ~1×1012 Ω/□之範圍。The optical film of claim 1, wherein the surface resistivity of the antistatic layer side is in the range of 1 × 10 6 to 1 × 10 12 Ω / □. 如申請專利範圍第1項之光學薄膜,其中以JIS K6768所規定之方法為準所測定之防靜電層側表面的潤濕性為50~70mN/m之範圍。The optical film of claim 1, wherein the wettability of the surface of the antistatic layer measured by the method specified in JIS K6768 is in the range of 50 to 70 mN/m. 如申請專利範圍第1項之光學薄膜,其中丙烯酸系樹脂(b1)為含有來自具有脂環式骨架之(甲基)丙烯酸酯的結構單位者。The optical film of claim 1, wherein the acrylic resin (b1) is a structural unit containing a (meth) acrylate derived from an alicyclic skeleton. 如申請專利範圍第1項之光學薄膜,其中原冰片烯系樹脂薄膜(A)、與防靜電層(B)於波長589nm之折射率差為0.1以下。The optical film according to claim 1, wherein the difference between the refractive index of the norbornene-based resin film (A) and the antistatic layer (B) at a wavelength of 589 nm is 0.1 or less. 如申請專利範圍第1項之光學薄膜,其中防靜電層(B)中之金屬原子含有量為0.1重量%以下,鹵素原子含有量為1重量%以下。The optical film of claim 1, wherein the antistatic layer (B) has a metal atom content of 0.1% by weight or less and a halogen atom content of 1% by weight or less. 如申請專利範圍第1項之光學薄膜,其中以JIS K7113所規定之方法為準所測定的於室溫中之原冰片烯系樹脂薄膜(A)的拉伸彈性率E1與防靜電層(B)之拉伸彈性率E2為E1>E2之關係。An optical film according to the first aspect of the invention, wherein the tensile modulus E1 and the antistatic layer (B) of the raw norbornene resin film (A) at room temperature, which are determined by the method specified in JIS K7113, are used. The tensile modulus E2 is a relationship of E1>E2. 如申請專利範圍第1項之光學薄膜,其中原冰片烯系樹脂薄膜(A)為預先經延伸之薄膜。The optical film of claim 1, wherein the raw borneol-based resin film (A) is a previously stretched film. 一種相位差薄膜,其特徵為由如申請專利範圍第9項之光學薄膜所成者。A retardation film characterized by being made of an optical film as in claim 9 of the patent application. 一種相位差薄膜,其特徵為延伸如申請專利範圍第1項之光學薄膜所得者。A retardation film characterized by being obtained by extending an optical film as in claim 1 of the patent application. 一種偏光板,其特徵為使用至少1種的如申請專利範圍第1項之光學薄膜。A polarizing plate characterized by using at least one optical film as in the first aspect of the patent application. 如申請專利範圍第12項之偏光板,其中使用接著劑或黏著劑將光學薄膜的防靜電層側接著於偏光膜而得者。The polarizing plate of claim 12, wherein an antistatic layer of the optical film is attached to the polarizing film by using an adhesive or an adhesive. 一種偏光板,其特徵為使用至少1種之如申請專利範圍第10項或第11項之相位差薄膜。A polarizing plate characterized by using at least one retardation film as in claim 10 or 11 of the patent application. 如申請專利範圍第14項之偏光板,其中使用接著劑或黏著劑將相位差薄膜的防靜電層側接著於偏光膜而得者。The polarizing plate of claim 14, wherein the antistatic layer of the retardation film is attached to the polarizing film by using an adhesive or an adhesive. 如申請專利範圍第15項之偏光板,其中以JIS K7113為準所測定的原冰片烯系樹脂薄膜(A)的拉伸彈性率E1、防靜電層(B)的拉伸彈性率E2與接著劑或黏著劑的拉伸彈性率E3為E1>E2>E3之關係。The polarizing plate of claim 15 wherein the tensile modulus E1 of the original borneol-based resin film (A) and the tensile modulus E2 of the antistatic layer (B) are measured in accordance with JIS K7113. The tensile modulus E3 of the agent or the adhesive is in the relationship of E1>E2>E3. 一種液晶顯示器,其特徵為使用如申請專利範圍第12項之偏光板。A liquid crystal display characterized by using a polarizing plate as in claim 12 of the patent application. 一種液晶顯示器,其特徵為使用如申請專利範圍第14項之偏光板。A liquid crystal display characterized by using a polarizing plate as in claim 14 of the patent application. 一種光學薄膜的製造方法,其特徵為將含有於側鏈具有下述式(i)所示4級銨鹽之丙烯酸系樹脂(b1)、與聚乙烯亞胺及/或聚羥基鏈烷聚縮水甘油醚所成硬化劑(b2)之防靜電塗層材,塗佈於原冰片烯系樹脂薄膜(A)上後乾燥而形成防靜電層(B);-COO-Q1 -N(Q2 )a Xb ………(i)(式(i)中,Q1 為碳數1~6之2價烴基,Q2 為碳數1~3之1價烴基,X為氯原子、氟原子或-Q3 -SO4 (但,Q3 為單鍵、伸甲基或伸乙基),a及b為1或2之整數(但,a+b=3);Q2 、Q3 及X為複數個存在時,各可為相同或相異)。A method for producing an optical film characterized by comprising an acrylic resin (b1) having a 4-stage ammonium salt represented by the following formula (i) in a side chain, and polycondensation with polyethyleneimine and/or polyhydroxyalkane The antistatic coating material of the hardener (b2) which is a glyceryl ether is applied onto the original borneol resin film (A) and dried to form an antistatic layer (B); -COO-Q 1 -N (Q 2 a X b (i) (in the formula (i), Q 1 is a divalent hydrocarbon group having 1 to 6 carbon atoms, Q 2 is a monovalent hydrocarbon group having 1 to 3 carbon atoms, and X is a chlorine atom or a fluorine atom. Or -Q 3 -SO 4 (however, Q 3 is a single bond, a methyl group or an ethyl group), a and b are integers of 1 or 2 (however, a+b=3); Q 2 , Q 3 and X are When plural are present, each may be the same or different). 如申請專利範圍第19項之光學薄膜的製造方法,其中塗佈防靜電塗層材的面之原冰片烯系樹脂薄膜(A)的平均表面粗糙度(Ra)為0.3~2.0nm之範圍。The method for producing an optical film according to claim 19, wherein the surface of the original borneol-based resin film (A) coated with the antistatic coating material has an average surface roughness (Ra) of 0.3 to 2.0 nm. 如申請專利範圍第19項之光學薄膜的製造方法,其中塗佈防靜電塗層材的面之原冰片烯系樹脂薄膜(A)以JIS K6768所規定的方法為準所測定之表面潤濕性為50~70mN/m之範圍。The method for producing an optical film according to claim 19, wherein the surface of the original borneol-based resin film (A) coated with the antistatic coating material is measured by the method specified in JIS K6768. It is in the range of 50 to 70 mN/m. 如申請專利範圍第19項之光學薄膜的製造方法,其中丙烯酸系樹脂(b1)為含有來自具有脂環式骨架之(甲基)丙烯酸酯之結構單位者。The method for producing an optical film according to claim 19, wherein the acrylic resin (b1) is a structural unit containing a (meth) acrylate derived from an alicyclic skeleton. 如申請專利範圍第19項之光學薄膜的製造方法,其中防靜電塗層材為水系塗層材。The method for producing an optical film according to claim 19, wherein the antistatic coating material is a water-based coating material. 如申請專利範圍第19項之光學薄膜的製造方法,其中防靜電塗層材更含有填充物。The method for producing an optical film according to claim 19, wherein the antistatic coating material further contains a filler. 如申請專利範圍第19項之光學薄膜的製造方法,其中將經塗佈之防靜電塗層材的乾燥係藉由具有1)80℃以下之一次乾燥步驟、與2)超過原冰片烯系樹脂薄膜(A)之玻璃轉移溫度(Tg)-30℃之溫度下的二次乾燥步驟之多階段式乾燥步驟進行。The method for producing an optical film according to claim 19, wherein the dried antistatic coating material is dried by having a drying step of 1) at 80 ° C or less, and 2) exceeding the original borneol resin. The multi-stage drying step of the secondary drying step of the film (A) at a glass transition temperature (Tg) of -30 ° C is carried out. 如申請專利範圍第25項之光學薄膜的製造方法,其中二次乾燥步驟中進行薄膜之延伸。The method for producing an optical film according to claim 25, wherein the stretching of the film is performed in the secondary drying step. 如申請專利範圍第19項之光學薄膜的製造方法,其中丙烯酸系樹脂(b1)中鹵素原子含有量為1重量%以下。The method for producing an optical film according to claim 19, wherein the acrylic resin (b1) has a halogen atom content of 1% by weight or less.
TW096124745A 2006-07-12 2007-07-06 Optical film and its use and manufacturing method TWI441731B (en)

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