TWI437684B - Power transistor device with electrostatic discharge protection and low dropout regulator using same - Google Patents
Power transistor device with electrostatic discharge protection and low dropout regulator using same Download PDFInfo
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Description
本發明係有關一種具有靜電防護之功率電晶體元件與使用該功率電晶體元件之低壓差穩壓器,其中為該功率電晶體元件提供了靜電放電路徑。The present invention relates to a power transistor component having electrostatic protection and a low dropout regulator using the power transistor component, wherein an electrostatic discharge path is provided for the power transistor component.
第1圖顯示先前技術的低壓差穩壓器示意圖,低壓差穩壓器(low dropout regulator,LDO) 100為一種線性穩壓器,用以將輸入電壓Vin轉換為輸出電壓Vout,其基本結構如圖所示,包含誤差放大電路10以及功率電晶體元件20,誤差放大電路10接收輸出電壓取樣訊號,輸出電壓取樣訊號係輸出電壓與接地電位之間,具有串聯電阻R1與R2,擷取R2上的分壓作為輸出電壓取樣訊號。誤差放大電路10比較輸出電壓取樣訊號與參考訊號Vref,並將比較結果放大輸出至功率電晶體元件20中PMOSFET之閘極,以控制源極與汲極間之導通程度,也就是輸入電壓Vin與輸出電壓Vout間之轉換參數。功率電晶體元件20中PMOSFET之結構剖面圖如第2圖所示,從剖面圖視之,PMOSFET位於P型基板(P-sub) 21上,於上表面以下形成相鄰之高壓N型井區(NW) 23以及高壓P型井區(PW) 24;並於兩井區中形成複數淺溝槽絕緣區(shallow trench isolation,STI) 25、N+本體極26、P+源極27、以及P+汲極29;以及於上表面以上形成閘極28。Figure 1 shows a schematic diagram of a prior art low dropout regulator. The low dropout regulator (LDO) 100 is a linear regulator that converts the input voltage Vin into an output voltage Vout. The basic structure is as follows. The figure shows an error amplifying circuit 10 and a power transistor element 20. The error amplifying circuit 10 receives an output voltage sampling signal, and the output voltage sampling signal is between the output voltage and the ground potential, and has series resistors R1 and R2, which are taken on R2. The partial voltage is used as the output voltage sampling signal. The error amplifying circuit 10 compares the output voltage sampling signal with the reference signal Vref, and amplifies the comparison result to the gate of the PMOSFET in the power transistor element 20 to control the conduction between the source and the drain, that is, the input voltage Vin and Conversion parameter between output voltages Vout. The cross-sectional view of the PMOSFET in the power transistor element 20 is shown in Fig. 2. From the cross-sectional view, the PMOSFET is located on the P-substrate (P-sub) 21, and adjacent high-pressure N-type well regions are formed below the upper surface. (NW) 23 and high-pressure P-type well (PW) 24; and forming a plurality of shallow trench isolation (STI) 25, N+ body pole 26, P+ source 27, and P+汲 in the two well regions a pole 29; and a gate 28 formed above the upper surface.
請繼續參閱第1圖及第2圖,功率電晶體元件20之輸出端為接觸墊1,其可能接觸到人體,或於應用及測試環境中接觸到各種電場,因而可能會累積電荷而產生靜電壓或直接接觸到高靜電壓,當靜電壓高於功率電晶體元件20所能容忍的範圍時會經由放電路徑放電,其中一個可能的放電路徑如第2圖中之虛線所示,如此將造成電路的操作錯誤或是嚴重損壞元件。Continuing to refer to Figures 1 and 2, the output of the power transistor component 20 is the contact pad 1, which may come into contact with the human body or contact various electric fields in the application and test environment, and thus may accumulate charge and generate static electricity. The voltage or direct contact with the high static voltage, when the static voltage is higher than the range that the power transistor element 20 can tolerate, is discharged through the discharge path, one of which may be as shown by the broken line in FIG. 2, which will cause Operation of the circuit is incorrect or the component is seriously damaged.
有鑑於此,本發明即針對上述先前技術之不足,提出一種具有靜電防護之功率電晶體元件與低壓差穩壓器。In view of the above, the present invention is directed to the above-mentioned deficiencies of the prior art, and provides a power transistor element and a low-dropout voltage regulator with electrostatic protection.
本發明目的之一在提供一種具有靜電防護之功率電晶體元件。One of the objects of the present invention is to provide a power transistor element having electrostatic protection.
本發明的另一目的在提供一種使用上述功率電晶體元件而具有靜電防護之低壓差穩壓器。Another object of the present invention is to provide a low dropout voltage regulator having electrostatic protection using the above power transistor elements.
為達上述之目的,就其中一個觀點言,本發明提供了一種具有靜電防護之功率電晶體元件,包含:PMOSFET,其源極與汲極分別電連接於一電壓輸入端與一電壓輸出端;以及靜電防護元件,與該電壓輸入端以及該電壓輸出端電連接,並提供一靜電放電路徑,使輸出端之靜電壓可經由此靜電放電路徑放電,以防護該PMOSFET;其中,該電壓輸出端係一接觸墊,可供電連接至一負載電路。In order to achieve the above object, the present invention provides a power transistor component with electrostatic protection, comprising: a PMOSFET having a source and a drain electrically connected to a voltage input terminal and a voltage output terminal, respectively; And an electrostatic protection component electrically connected to the voltage input terminal and the voltage output terminal, and providing an electrostatic discharge path through which the static voltage of the output terminal can be discharged to protect the PMOSFET; wherein the voltage output terminal A contact pad that can be powered to a load circuit.
上述具有靜電防護之功率電晶體元件中,該靜電防護元件可更包含一深N型井區(deep N-well,deep NW)或一N型埋層(N-type buried layer,NBL)。In the above-mentioned electrostatic protection power transistor component, the electrostatic protection component may further comprise a deep N-well (deep NW) or an N-type buried layer (NBL).
在其中一種實施型態中,該靜電防護元件可包含一NPN電晶體,其射極(emitter)與集極(collector)分別與該電壓輸出端及電壓輸入端電連接,基極受控於該電壓輸出端。In one embodiment, the ESD protection element may include an NPN transistor, an emitter and a collector are electrically connected to the voltage output end and the voltage input end, respectively, and the base is controlled by the Voltage output.
在另一種實施型態中,該靜電防護元件可包含一N型金屬氧化物半導體(N-type metal oxide semiconductor,NMOS)場效電晶體,其汲極(drain)與源極(source)分別與該電壓輸出端及電壓輸入端電連接,閘極接地或受控於該電壓輸出端。In another embodiment, the ESD protection element may comprise an N-type metal oxide semiconductor (NMOS) field effect transistor with a drain and a source respectively The voltage output terminal and the voltage input terminal are electrically connected, and the gate is grounded or controlled by the voltage output terminal.
在又一種實施型態中,該靜電防護元件可包含一矽控整流器(silicon controlled rectifier,SCR),其陰極(cathode)與陽極(anode)分別與該電壓輸出端及電壓輸入端電連接,閘極受控於該電壓輸出端。In another embodiment, the ESD protection component may include a silicon controlled rectifier (SCR), and a cathode and an anode are electrically connected to the voltage output terminal and the voltage input terminal respectively. The pole is controlled by this voltage output.
就另一個觀點言,本發明提供了一種提供一種具有靜電防護之低壓差穩壓器,用以將一輸入端之輸入電壓轉換為一輸出端之輸出電壓,該具有靜電防護之低壓差穩壓器包含:一誤差放大電路,根據一輸出電壓取樣訊號與一參考訊號,產生一誤差放大訊號,其中,該輸出電壓取樣訊號係取樣自該輸出電壓;以及一功率電晶體元件,包括:PMOSFET,其源極與汲極分別電連接於該輸入端與該輸出端;以及靜電防護元件,與該輸入端以及該輸出端電連接,並提供一靜電放電路徑,使輸出端之靜電壓可經由此靜電放電路徑放電,以防護該P型金屬氧化物半導體場效電晶體;其中,該輸出端係一接觸墊,可供電連接至一負載電路。In another aspect, the present invention provides a low-dropout voltage regulator with electrostatic protection for converting an input voltage of an input terminal into an output voltage of an output terminal, the low-voltage voltage regulator with electrostatic protection. The device includes: an error amplifying circuit, generating an error amplification signal according to an output voltage sampling signal and a reference signal, wherein the output voltage sampling signal is sampled from the output voltage; and a power transistor component, including: a PMOSFET, The source and the drain are electrically connected to the input end and the output end respectively; and the ESD protection component is electrically connected to the input end and the output end, and provides an electrostatic discharge path, so that the static voltage at the output end can be passed through The electrostatic discharge path is discharged to protect the P-type metal oxide semiconductor field effect transistor; wherein the output end is a contact pad, and the power supply is connected to a load circuit.
上述具有靜電防護之低壓差穩壓器中,該靜電防護元件可更包含一深N型井區或一N型埋層。In the above-mentioned electrostatic protection low-dropout voltage regulator, the static protection component may further comprise a deep N-type well region or an N-type buried layer.
上述具有靜電防護之低壓差穩壓器中,該靜電防護元件可包含一NPN電晶體,其射極與集極分別與該輸出端及輸入端電連接,基極受控於該輸出端。In the above-mentioned electrostatic protection low-dropout voltage regulator, the static protection component may comprise an NPN transistor, the emitter and the collector being electrically connected to the output terminal and the input terminal, respectively, and the base is controlled by the output terminal.
上述具有靜電防護之低壓差穩壓器中,該靜電防護元件可包含一N型金屬氧化物半導體場效電晶體,其汲極與源極分別與該輸出端及輸入端電連接,閘極接地或受控於該輸出端。In the above-mentioned electrostatic protection low-dropout voltage regulator, the static protection component may comprise an N-type metal oxide semiconductor field effect transistor, wherein the drain and the source are electrically connected to the output terminal and the input terminal, respectively, and the gate is grounded. Or controlled by the output.
上述具有靜電防護之低壓差穩壓器中,該靜電防護元件可包含一矽控整流器,其陰極與陽極分別與該輸出端及輸入端電連接,閘極受控於該輸出端。In the above-mentioned electrostatic protection low-dropout voltage regulator, the static protection component may include a voltage-controlled rectifier, and the cathode and the anode are electrically connected to the output terminal and the input terminal, respectively, and the gate is controlled by the output terminal.
底下藉由具體實施例詳加說明,當更容易瞭解本發明之目的、技術內容、特點及其所達成之功效。The purpose, technical content, features and effects achieved by the present invention will be more readily understood by the detailed description of the embodiments.
本發明的主要技術思想是利用N型通道元件形成放電路徑,以去除P型功率電晶體的靜電問題。The main technical idea of the present invention is to form a discharge path using an N-type channel element to remove the electrostatic problem of the P-type power transistor.
請參閱第3圖與第4圖,顯示本發明的第一實施例。如第3圖所示,LDO 200包含誤差放大電路10與功率電晶體元件30,與先前技術不同的是,功率電晶體元件30除了包括PMOSFET之外,另包含一個靜電防護元件2。PMOSFET的源極與汲極分別電連接於電壓輸入端Vin與電壓輸出端Vout;在本實施例中,靜電防護元件2包括一個NPN雙極接面電晶體(bipolar junction transistor,BJT),其射極(emitter)31與集極(collector)32分別與電壓輸出端Vout及電壓輸入端Vin電連接,其基極(base)亦受控於電壓輸出端Vout,當電壓輸出端Vout的接觸墊1接觸到靜電壓時,可經由靜電防護元件NPNBJT之集極到射極之路徑放電,以保護PMOSFET。Referring to Figures 3 and 4, a first embodiment of the present invention is shown. As shown in FIG. 3, the LDO 200 includes an error amplifying circuit 10 and a power transistor element 30. Unlike the prior art, the power transistor element 30 includes an electrostatic protection element 2 in addition to the PMOSFET. The source and the drain of the PMOSFET are electrically connected to the voltage input terminal Vin and the voltage output terminal Vout, respectively. In this embodiment, the electrostatic protection component 2 includes an NPN bipolar junction transistor (BJT). The emitter 31 and the collector 32 are electrically connected to the voltage output terminal Vout and the voltage input terminal Vin, respectively, and the base thereof is also controlled by the voltage output terminal Vout. When the voltage output terminal Vout is in contact with the pad 1 When the static voltage is applied, it can be discharged through the collector-to-emitter path of the static protection element NPNBJT to protect the PMOSFET.
請繼續參閱第4圖,顯示第一實施例中,功率電晶體元件30之剖面圖。其中,相較於先前技術,本實施例更包含深N型井區(deep NW)或N型埋層(NBL) 22,其形成於P型基板21與高壓N型井區及高壓P型井區24之間,以隔離功率電晶體元件30與P型基板21;另外,NPNBJT之N+型射極31、N+型集極32、及P+型基極分別如本圖中所示。第4圖亦顯示NPNBJT與電阻之符號,以表示其剖面圖中各區域所代表的電路關係。另外,帶有箭號之虛線代表當接觸墊1接觸到靜電壓時的放電路徑,因NPNBJT另提供了靜電壓的放電路徑,因此不會對PMOSFET造成功能上的影響與結構上的損壞。Referring to Figure 4, a cross-sectional view of the power transistor component 30 in the first embodiment is shown. Wherein, compared with the prior art, the embodiment further includes a deep N-type well region (deep NW) or an N-type buried layer (NBL) 22, which is formed on the P-type substrate 21 and the high-pressure N-type well region and the high-pressure P-type well Between the regions 24, the power transistor element 30 and the P-type substrate 21 are isolated; in addition, the N+-type emitter 31, the N+-type collector 32, and the P+-type base of the NPNBJT are respectively shown in the figure. Figure 4 also shows the symbols of NPNBJT and resistors to show the circuit relationships represented by the various regions in the cross-section. In addition, the dotted line with an arrow represents the discharge path when the contact pad 1 is exposed to the static voltage. Since the NPNBJT additionally provides a static voltage discharge path, it does not cause functional influence and structural damage to the PMOSFET.
第5圖與第6圖顯示本發明的第二實施例。如圖所示,LDO 300包含誤差放大電路10與功率電晶體元件40,功率電晶體元件40包括PMOSFET和靜電防護元件2。在本實施例中,靜電防護元件2包括一個NMOSFET,其汲極(drain)42與源極(source)43分別與電壓輸出端Vout及電壓輸入端Vin電連接,其閘極(gate)44亦受控於電壓輸出端Vout,當電壓輸出端Vout的接觸墊1接觸到靜電壓時,可經由靜電防護元件NMOSFET之寄生NPNBJT提供由汲極42到源極43之路徑放電,以保護PMOSFET。Figures 5 and 6 show a second embodiment of the present invention. As shown, the LDO 300 includes an error amplifying circuit 10 and a power transistor element 40, which includes a PMOSFET and an ESD element 2. In this embodiment, the ESD protection device 2 includes an NMOSFET, and a drain 42 and a source 43 are electrically connected to the voltage output terminal Vout and the voltage input terminal Vin, respectively, and the gate 44 thereof is also Controlled by the voltage output terminal Vout, when the contact pad 1 of the voltage output terminal Vout contacts the static voltage, the path from the drain 42 to the source 43 can be discharged via the parasitic NPNBJT of the static protection element NMOSFET to protect the PMOSFET.
請繼續參閱第6圖,顯示第二實施例中,功率電晶體40之剖面圖。其中,深N型井區或N型埋層22,其形成於P型基板21與高壓N型井區及高壓P型井區24之間,以隔離功率電晶體元件40與P型基板21;另外,NMOSFET之N+型汲極42、N+型源極43、及閘極44,分別如本圖中所示。第6圖亦顯示出NMOSFET之寄生NPNBJT,表示其剖面圖中各區域所代表的電路關係。另外,帶有箭號之虛線代表當接觸墊1接觸到靜電壓時的放電路徑,因NMOSFET之寄生NPNBJT另提供了靜電壓的放電路徑,因此不會對PMOSFET造成功能上的影響與結構上的損壞。Referring to Figure 6, a cross-sectional view of the power transistor 40 in the second embodiment is shown. Wherein, a deep N-type well region or an N-type buried layer 22 is formed between the P-type substrate 21 and the high-pressure N-type well region and the high-voltage P-type well region 24 to isolate the power transistor element 40 and the P-type substrate 21; In addition, the N+ type drain electrode 42, the N+ type source electrode 43, and the gate electrode 44 of the NMOSFET are respectively as shown in the figure. Figure 6 also shows the parasitic NPNBJT of the NMOSFET, showing the circuit relationships represented by the various regions in the cross-sectional view. In addition, the dotted line with the arrow represents the discharge path when the contact pad 1 is exposed to the static voltage. Since the parasitic NPNBJT of the NMOSFET provides a discharge path of the static voltage, it does not cause a functional influence on the PMOSFET and the structural damage.
第7圖與第8圖顯示本發明的第三實施例。如圖所示,LDO 400包含誤差放大電路10與功率電晶體元件50,功率電晶體元件50包括PMOSFET和靜電防護元件2。在本實施例中,靜電防護元件2包括一個NMOSFET,其汲極(drain)52與源極(source)53分別與電壓輸出端Vout及電壓輸入端Vin電連接,其閘極(gate)54則電連接至接地電位,當電壓輸出端Vout的接觸墊1接觸到靜電壓時,可經由靜電防護元件NMOSFET之寄生NPNBJT提供由汲極52到源極53之路徑放電,以保護PMOSFET。Fig. 7 and Fig. 8 show a third embodiment of the present invention. As shown, the LDO 400 includes an error amplifying circuit 10 and a power transistor element 50, and the power transistor element 50 includes a PMOSFET and an ESD element 2. In this embodiment, the ESD protection device 2 includes an NMOSFET having a drain 52 and a source 53 electrically connected to the voltage output terminal Vout and the voltage input terminal Vin, respectively, and the gate 54 thereof. Electrically connected to the ground potential, when the contact pad 1 of the voltage output terminal Vout contacts the static voltage, the path from the drain 52 to the source 53 can be discharged via the parasitic NPNBJT of the static protection element NMOSFET to protect the PMOSFET.
請繼續參閱第8圖,顯示第三實施例中,功率電晶體50之剖面圖。其中,深N型井區或N型埋層22,其形成於P型基板21與高壓N型井區及高壓P型井區24之間,以隔離功率電晶體元件60與P型基板21;另外,NMOSFET之N+型汲極52、N+型源極53、及閘極54,分別如本圖中所示。第8圖亦顯示出NMOSFET之寄生NPNBJT,表示其剖面圖中各區域所代表的電路關係。另外,帶有箭號之虛線代表當接觸墊1接觸到靜電壓時的放電路徑,因NMOSFET之寄生NPNBJT另提供了靜電壓的放電路徑,因此不會對PMOSFET造成功能上的影響與結構上的損壞。Referring to Figure 8, a cross-sectional view of the power transistor 50 in the third embodiment is shown. The deep N-type well region or the N-type buried layer 22 is formed between the P-type substrate 21 and the high-pressure N-type well region and the high-voltage P-type well region 24 to isolate the power transistor element 60 and the P-type substrate 21; In addition, the N+ type drain 52, the N+ type source 53, and the gate 54 of the NMOSFET are as shown in the figure, respectively. Figure 8 also shows the parasitic NPNBJT of the NMOSFET, showing the circuit relationships represented by the various regions in the cross-sectional view. In addition, the dotted line with the arrow represents the discharge path when the contact pad 1 is exposed to the static voltage. Since the parasitic NPNBJT of the NMOSFET provides a discharge path of the static voltage, it does not cause a functional influence on the PMOSFET and the structural damage.
第9圖與第10圖顯示本發明的第四實施例。如圖所示,LDO 500包含誤差放大電路10與功率電晶體元件60,功率電晶體元件60包括PMOSFET和靜電防護元件2。在本實施例中,靜電防護元件2包括一個矽控整流器(silicon controlled rectifier,SCR),其陰極(cathode)62與陽極(anode)63分別與電壓輸出端Vout及電壓輸入端Vin電連接,其閘極(gate)亦串聯一電阻後電連接至電壓輸出端Vout,當電壓輸出端Vout的接觸墊1接觸到靜電壓時,可經由靜電防護元件SCR之陰極62到陽極63之路徑放電,以保護PMOSFET。Fig. 9 and Fig. 10 show a fourth embodiment of the present invention. As shown, the LDO 500 includes an error amplifying circuit 10 and a power transistor element 60, which includes a PMOSFET and an ESD element 2. In this embodiment, the ESD protection device 2 includes a silicon controlled rectifier (SCR), and a cathode 62 and an anode 63 are electrically connected to the voltage output terminal Vout and the voltage input terminal Vin, respectively. The gate is also connected in series with a resistor and electrically connected to the voltage output terminal Vout. When the contact pad 1 of the voltage output terminal Vout contacts the static voltage, the gate can be discharged through the path of the cathode 62 to the anode 63 of the electrostatic protection element SCR. Protect the PMOSFET.
請繼續參閱第10圖,顯示第四實施例中,功率電晶體60之剖面圖。其中,深N型井區或N型埋層22,其形成於P型基板21與高壓N型井區及高壓P型井區24之間,以隔離功率電晶體元件50與P型基板21;另外,SCR之陰極62、陽極63、及閘極,分別如本圖中所示。第10圖亦顯示SCR之BJT組成符號,表示其剖面圖中各區域所代表的電路關係。另外,帶有箭號之虛線代表當接觸墊1接觸到靜電壓時的放電路徑,因SCR之陰極62到陽極63另提供了靜電壓的放電路徑,因此不會對PMOSFET造成功能上的影響與結構上的損壞。Referring to FIG. 10, a cross-sectional view of the power transistor 60 in the fourth embodiment is shown. Wherein, a deep N-type well region or an N-type buried layer 22 is formed between the P-type substrate 21 and the high-pressure N-type well region and the high-voltage P-type well region 24 to isolate the power transistor element 50 and the P-type substrate 21; In addition, the cathode 62, the anode 63, and the gate of the SCR are respectively as shown in the figure. Figure 10 also shows the BJT composition symbol of the SCR, indicating the circuit relationship represented by each region in the cross-sectional view. In addition, the dotted line with an arrow represents the discharge path when the contact pad 1 is exposed to the static voltage. Since the cathode 62 to the anode 63 of the SCR further provides a static voltage discharge path, it does not have a functional influence on the PMOSFET. Structural damage.
第11圖顯示功率電晶體元件30的另一種實施例,與第4圖不同的是,其PMOSFET與NPNBJT以STI 25以及高壓N型井區23與高壓P型井區24隔開。11 shows another embodiment of power transistor component 30. Unlike FIG. 4, its PMOSFET and NPNBJT are separated from high voltage P-well region 24 by STI 25 and high pressure N-well region 23.
第12圖顯示功率電晶體元件40的另一種實施例,與第6圖不同的是,其PMOSFET與NMOS以STI 25以及高壓N型井區23與高壓P型井區24隔開。Figure 12 shows another embodiment of a power transistor component 40. Unlike Figure 6, its PMOSFET and NMOS are separated from the high voltage P-well region 24 by the STI 25 and the high voltage N-well region 23.
第8圖之功率電晶體元件50亦可改為與第12圖類似的半導體結構,如第13圖。The power transistor element 50 of Fig. 8 can also be changed to a semiconductor structure similar to that of Fig. 12, as shown in Fig. 13.
第14圖顯示功率電晶體元件60的另一種實施例,與第10圖不同的是,其PMOSFET與SCR以STI 25以及高壓N型井區23與高壓P型井區24隔開。Figure 14 shows another embodiment of a power transistor component 60, which differs from FIG. 10 in that its PMOSFET and SCR are separated from the high voltage P-well region 24 by STI 25 and high pressure N-well region 23.
以上已針對較佳實施例來說明本發明,唯以上所述者,僅係為使熟悉本技術者易於了解本發明的內容而已,並非用來限定本發明之權利範圍。在本發明之相同精神下,熟悉本技術者可以思及各種等效變化。例如,在所示各實施例電路中,可插入不影響訊號主要意義的元件,如其他開關等;淺溝槽絕緣區可以改換為局部矽氧化區等等。凡此種種,皆可根據本發明的教示類推而得,因此,本發明的範圍應涵蓋上述及其他所有等效變化。The present invention has been described with reference to the preferred embodiments thereof, and the present invention is not intended to limit the scope of the present invention. In the same spirit of the invention, various equivalent changes can be conceived by those skilled in the art. For example, in the circuits of the various embodiments shown, components that do not affect the primary meaning of the signal, such as other switches, may be inserted; the shallow trench isolation region may be changed to a partial germanium oxide region or the like. All such modifications may be made in accordance with the teachings of the present invention, and the scope of the present invention should be construed to cover the above and other equivalents.
1...接觸墊1. . . Contact pad
10...誤差放大電路10. . . Error amplifier circuit
20,30,40,50,60...功率電晶體元件20, 30, 40, 50, 60. . . Power transistor component
21...P型基板twenty one. . . P-type substrate
22...深N型井區或N型埋層twenty two. . . Deep N-type well or N-type buried layer
23...高壓N型井區twenty three. . . High pressure N-type well area
24...高壓P型井區twenty four. . . High pressure P type well area
25...淺溝槽絕緣區25. . . Shallow trench insulation
26...本體極26. . . Body pole
27...源極27. . . Source
28...閘極28. . . Gate
29...汲極29. . . Bungee
31...射極31. . . Emitter
32...集極32. . . Collector
42,52...汲極42,52. . . Bungee
23‧‧‧高壓N型井區23‧‧‧High pressure N-well area
24‧‧‧高壓P型井區24‧‧‧High pressure P-well area
25‧‧‧淺溝槽絕緣區25‧‧‧Shallow trench insulation zone
26‧‧‧本體極26‧‧‧ body pole
27‧‧‧源極27‧‧‧ source
28‧‧‧閘極28‧‧‧ gate
29‧‧‧汲極29‧‧‧汲polar
31‧‧‧射極31‧‧‧ emitter
32‧‧‧集極32‧‧‧ Collector
42,52‧‧‧汲極42,52‧‧‧汲
43,53‧‧‧源極43,53‧‧‧ source
44,54‧‧‧閘極44,54‧‧‧ gate
62‧‧‧陰極62‧‧‧ cathode
63‧‧‧陽極63‧‧‧Anode
R1,R2‧‧‧電阻R1, R2‧‧‧ resistance
Vin‧‧‧輸入電壓Vin‧‧‧Input voltage
Vout‧‧‧輸出電壓Vout‧‧‧ output voltage
Vref‧‧‧參考訊號Vref‧‧‧ reference signal
100,200,300,400,500‧‧‧低壓差穩壓器100,200,300,400,500‧‧‧ Low dropout regulator
第1圖示出先前技術的低壓差穩壓器示意圖。Figure 1 shows a schematic diagram of a prior art low dropout regulator.
第2圖示出第1圖之功率電晶體元件20結構之剖面示意圖。Fig. 2 is a schematic cross-sectional view showing the structure of the power transistor element 20 of Fig. 1.
第3圖與第4圖顯示本發明的第一實施例。3 and 4 show a first embodiment of the present invention.
第5圖與第6圖顯示本發明的第二實施例。Figures 5 and 6 show a second embodiment of the present invention.
第7圖與第8圖顯示本發明的第三實施例。Fig. 7 and Fig. 8 show a third embodiment of the present invention.
第9圖與第10圖顯示本發明的第四實施例。Fig. 9 and Fig. 10 show a fourth embodiment of the present invention.
第11圖顯示功率電晶體元件30的另一種實施例。Figure 11 shows another embodiment of a power transistor component 30.
第12圖顯示功率電晶體元件40的另一種實施例。Figure 12 shows another embodiment of a power transistor component 40.
第13圖顯示功率電晶體元件50的另一種實施例。Figure 13 shows another embodiment of a power transistor component 50.
第14圖顯示功率電晶體元件60的另一種實施例。Figure 14 shows another embodiment of a power transistor component 60.
1...接觸墊1. . . Contact pad
21...P型基板twenty one. . . P-type substrate
22...深N型井區或N型埋層twenty two. . . Deep N-type well or N-type buried layer
23...高壓N型井區twenty three. . . High pressure N-type well area
24...高壓P型井區twenty four. . . High pressure P type well area
25...淺溝槽絕緣區25. . . Shallow trench insulation
26...本體極26. . . Body pole
27...源極27. . . Source
28...閘極28. . . Gate
31...射極31. . . Emitter
32...集極32. . . Collector
Vin...輸入電壓Vin. . . Input voltage
Vout...輸出電壓Vout. . . The output voltage
Claims (8)
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