TWI437019B - Method for manufacturing dicyclopentadienes-denaturalized phenol - Google Patents

Method for manufacturing dicyclopentadienes-denaturalized phenol Download PDF

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TWI437019B
TWI437019B TW97138836A TW97138836A TWI437019B TW I437019 B TWI437019 B TW I437019B TW 97138836 A TW97138836 A TW 97138836A TW 97138836 A TW97138836 A TW 97138836A TW I437019 B TWI437019 B TW I437019B
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phenol resin
acid catalyst
modified phenol
dicyclopentadiene
zeolite
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TW200925174A (en
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Takemura Kazuya
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Jfe Chemical Corp
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Description

二環戊二烯類改質酚樹脂之製造方法Method for producing dicyclopentadiene-modified phenol resin

本發明係關於使酚類與二環戊二烯類進行反應而製造酚樹脂的方法。The present invention relates to a method for producing a phenol resin by reacting a phenol with a dicyclopentadiene.

由酚類與二環戊二烯類進行反應而獲得的酚樹脂(以下亦稱為二環戊二烯類改質酚樹脂或改質酚樹脂),係可有用地使用作為流動性與吸濕性優異的環氧樹脂原料,將該酚樹脂施行環氧化而得的環氧樹脂係可使用作為半導體密封劑或印刷佈線基板用積層板的材料。A phenol resin obtained by reacting a phenol with a dicyclopentadiene (hereinafter also referred to as a dicyclopentadiene-modified phenol resin or a modified phenol resin) can be usefully used as fluidity and moisture absorption. An epoxy resin which is excellent in the properties of the epoxy resin which is obtained by epoxidizing the phenol resin can be used as a material for a semiconductor encapsulant or a laminate for a printed wiring board.

二環戊二烯類改質酚樹脂係將酚類與二環戊二烯類(以下亦稱DCPD類)與酸觸媒一起施行加熱而進行製造。酸觸媒係有如:三氟化硼、三氟化硼.酚錯合物、三氟化硼.醚錯合物等。酸觸媒係待反應結束後,使用鹼性的觸媒中和劑進行中和而去活化。此係為了防止若反應結束後仍有酸觸媒殘留,在後續之將未反應酚施行蒸餾除去的步驟中會使反應過度進行。The dicyclopentadiene-based modified phenol resin is produced by heating a phenol and a dicyclopentadiene (hereinafter also referred to as DCPD) together with an acid catalyst. Acid catalysts such as: boron trifluoride, boron trifluoride. Phenol complex, boron trifluoride. Ether complexes and the like. The acid catalyst is deactivated by neutralization using an alkaline catalyst neutralizer after the reaction is completed. In order to prevent the acid catalyst from remaining after the completion of the reaction, the reaction may be excessively carried out in the subsequent step of subjecting the unreacted phenol to distillation.

將酸觸媒中和後的反應生成液係可分類為:由中和劑與酸觸媒殘渣構成的固形份、以及含有未反應酚類與二環戊二烯類改質酚樹脂的濾液。將濾液施行減壓蒸餾,將未反應酚類蒸餾除去,再將二環戊二烯類改質酚樹脂回收。The reaction product liquid after the neutralization of the acid catalyst can be classified into a solid portion composed of a neutralizing agent and an acid catalyst residue, and a filtrate containing an unreacted phenol and a dicyclopentadiene-modified phenol resin. The filtrate was subjected to vacuum distillation, and the unreacted phenols were distilled off, and the dicyclopentadiene-modified phenol resin was recovered.

當將二環戊二烯類改質酚樹脂使用作為半導體密封劑或積層板的材料時,因為有造成電絕緣性等降低的可能性,因而當進行改質酚樹脂製造之際,必需將反應生成液中的酚類、雜質充分地去除。特別係必需將源自酸觸媒的硼化合物與氟化合物,最好去除至25ppm以下,尤以22ppm以下為佳。然而,因為硼化合物與氟化合物的一部分會溶解於酚類中,即使施行過濾,仍有殘留於反應生成液中的問題發生。When a dicyclopentadiene-based modified phenol resin is used as a material for a semiconductor encapsulant or a laminate, since there is a possibility that electrical insulation or the like is lowered, it is necessary to carry out the reaction when the modified phenol resin is produced. The phenols and impurities in the formation liquid are sufficiently removed. In particular, it is necessary to remove the boron compound derived from the acid catalyst and the fluorine compound, preferably to 25 ppm or less, particularly preferably 22 ppm or less. However, since a part of the boron compound and the fluorine compound are dissolved in the phenol, even if filtration is performed, there is a problem that remains in the reaction product liquid.

習知,在上述改質酚樹脂之製造時,觸媒中和劑係使用碳酸鈣或氫氧化鈉。此種觸媒中和劑無法將硼化合物與氟化合物吸附,導致在反應生成液中容易殘留硼化合物與氟化合物。相對於此,在日本專利第3028385號中提案將水滑石類使用於觸媒中和劑中。水滑石類係具有將酸觸媒中和的效果,且會吸附硼化合物與氟化合物,因而可減少反應生成液中的雜質。然而,在半導體密封劑、印刷佈線基板用積層板用途中,係要求更進一步的雜質削減,利用水滑石類施行酸觸媒的中和時,會發生雜質之削減仍嫌不足的問題。Conventionally, in the production of the above modified phenol resin, the catalyst neutralizing agent uses calcium carbonate or sodium hydroxide. Such a catalyst neutralizing agent cannot adsorb a boron compound and a fluorine compound, and a boron compound and a fluorine compound are likely to remain in the reaction product liquid. On the other hand, it is proposed in Japanese Patent No. 3028385 to use hydrotalcites in a catalyst neutralizer. The hydrotalcite type has an effect of neutralizing an acid catalyst, and adsorbs a boron compound and a fluorine compound, thereby reducing impurities in the reaction product liquid. However, in the use of a laminate for a semiconductor encapsulant or a printed wiring board, further reduction of impurities is required, and when the hydrotalcite is used for neutralization of an acid catalyst, there is a problem that the reduction of impurities is insufficient.

再者,在日本專利特開平11-199659號公報中提案:將酸觸媒利用氫氧化鈣等無機鹼施行中和而去活化後,於所獲得之反應生成液中添加含有吸附水的粉體(例如活性白土、酸性白土、活性碳等),再將經中和所生成的錯合物施行水解,而獲得硼化合物與氟化合物之含有量少之改質酚樹脂的方法。但是,該方法係有粉體中的吸附水溶解於未反應酚中的問題。因而,待反應結束後,於從改質酚樹脂所蒸餾回收的過剩酚中,係成為含有水分。其結果,當使用該回收酚進行下一次的改質酚樹脂製造時,部分的酸觸媒因水分而去活化,導致反應效率降低、改質酚樹脂特性降低的問題發生。In the Japanese Patent Publication No. Hei 11-199659, it is proposed to add a powder containing adsorbed water to the obtained reaction product solution by neutralizing and deactivating the acid catalyst with an inorganic base such as calcium hydroxide. (for example, activated clay, acid clay, activated carbon, etc.), and a method of hydrolyzing the complex formed by neutralization to obtain a modified phenol resin having a small content of a boron compound and a fluorine compound. However, this method has a problem that the adsorbed water in the powder is dissolved in the unreacted phenol. Therefore, after the completion of the reaction, the excess phenol distilled from the modified phenol resin contains moisture. As a result, when the next modified phenol resin is produced by using the recovered phenol, part of the acid catalyst is deactivated by moisture, resulting in a problem that the reaction efficiency is lowered and the characteristics of the modified phenol resin are lowered.

本發明之目的在於提供將雜質含有量減少至能使用作為半導體密封劑、印刷佈線基板用積層板之原始材料(raw material)程度的二環戊二烯類改質酚樹脂之製造方法。An object of the present invention is to provide a method for producing a dicyclopentadiene-based modified phenol resin which can reduce the amount of impurities to a level which can be used as a semiconductor sealant or a raw material for a laminate for a printed wiring board.

本發明係關於二環戊二烯類改質酚樹脂之製造方法,其包括有:將酚類及二環戊二烯類作為反應原料並在酸觸媒存在下進行反應,而製造二環戊二烯類改質酚樹脂的反應步驟(I);以及在依該反應步驟(I)所獲得之反應生成液中添加鹼性化合物及沸石,而將該酸觸媒去活化的酸觸媒去活化步驟(II)。The present invention relates to a method for producing a dicyclopentadiene-based modified phenol resin, which comprises: using a phenol and a dicyclopentadiene as a reaction raw material and reacting in the presence of an acid catalyst to produce a dicyclopentane a reaction step (I) of a diene-modified phenol resin; and an acid catalyst for deactivating the acid catalyst by adding a basic compound and a zeolite to the reaction product obtained in the reaction step (I) Activation step (II).

本發明的二環戊二烯類改質酚樹脂之製造方法,最好包括有:從依上述酸觸媒去活化步驟(II)所獲得之反應生成液中將上述沸石、酸觸媒及未反應原料除去,而獲得二環戊二烯類改質酚樹脂的樹脂回收步驟(III)。The method for producing a dicyclopentadiene-based modified phenol resin of the present invention preferably comprises: the above-mentioned zeolite, acid catalyst and not from the reaction product obtained by the above-mentioned acid catalyst deactivation step (II) The reaction raw material is removed to obtain a resin recovery step (III) of the dicyclopentadiene-based modified phenol resin.

以下針對本發明之實施形態進行詳細說明,惟該等僅為本發明實施形態之一例,本發明當然不侷限於該等內容。The embodiments of the present invention are described in detail below, but these are merely examples of the embodiments of the present invention, and the present invention is of course not limited to the contents.

本發明所使用的酚類並無特別的限制,最佳可舉出例如:酚、鄰甲酚、間甲酚、對甲酚、2,6-二甲苯酚或該等的混合物。其中,從樹脂的特性與經濟性的觀點而言,最好為酚。The phenol used in the present invention is not particularly limited, and examples thereof include phenol, o-cresol, m-cresol, p-cresol, 2,6-xylenol or a mixture thereof. Among them, phenol is preferred from the viewpoint of properties and economy of the resin.

本發明所使用的DCPD類亦無特別的限制,最好為二環戊二烯(以下亦稱DCPD)或由至少1個烷基或乙烯基取代的二環戊二烯或該等的混合物。烷基係為甲基、乙基等。其中,從樹脂的特性與取得容易度的觀點而言,最好使用二環戊二烯。The DCPD used in the present invention is also not particularly limited, and is preferably dicyclopentadiene (hereinafter also referred to as DCPD) or dicyclopentadiene substituted with at least one alkyl group or vinyl group or a mixture thereof. The alkyl group is a methyl group, an ethyl group or the like. Among them, dicyclopentadiene is preferably used from the viewpoint of the properties of the resin and the ease of availability.

當使酚類與DCPD類進行反應時,藉由調整其進料莫耳比(酚類/DCPD類),便可調節所獲得之改質酚樹脂的軟化點。即,若增加酚類的進料莫耳比,則改質酚樹脂的軟化點便降低,反之,若減少酚類的進料莫耳比,則改質酚樹脂的軟化點便上升。為能製得具有工業上有意義的軟化點(70~150℃,最好為80~140℃)的改質酚樹脂,進料莫耳比最好設為1/1~15/1,尤以2/1~10/1為佳。When the phenols are reacted with the DCPD type, the softening point of the obtained modified phenol resin can be adjusted by adjusting the feed molar ratio (phenol/DCPD type). That is, when the feed molar ratio of the phenol is increased, the softening point of the modified phenol resin is lowered, whereas if the feed molar ratio of the phenol is decreased, the softening point of the modified phenol resin is increased. In order to obtain a modified phenolic resin having an industrially meaningful softening point (70 to 150 ° C, preferably 80 to 140 ° C), the feed molar ratio is preferably set to 1/1 to 15/1, especially 2/1~10/1 is better.

在使酚類與DCPD類進行反應之際所使用的酸觸媒,係可舉例如:三氟化硼、三氟化硼‧酚錯合物、三氟化硼‧醚錯合物等。其中,最好為處置容易且每單位觸媒量的改質酚樹脂之產率大之三氟化硼‧酚錯合物。酸觸媒的使用量係當三氟化硼‧酚錯合物的情況,為DCPD類每100質量份使用0.1~20質量份,最好為0.5~10質量份。The acid catalyst to be used for the reaction between the phenols and the DCPDs may, for example, be boron trifluoride, boron trifluoride ‧ phenol complex, boron trifluoride ‧ ether complex or the like. Among them, a boron trifluoride ‧ phenol complex which is easy to handle and has a large yield of a modified phenol resin per unit amount of the catalyst is preferable. The amount of the acid catalyst used is, in the case of a boron trifluoride ‧ phenol complex, 0.1 to 20 parts by mass, preferably 0.5 to 10 parts by mass per 100 parts by mass of the DCPD.

酚類與DCPD類的反應溫度係依照酸觸媒的種類而異,當三氟化硼‧酚錯合物的情況,係設為20~170℃,最好為50~150℃。The reaction temperature of the phenols and the DCPDs varies depending on the type of the acid catalyst, and in the case of the boron trifluoride ‧ phenol complex, it is set to 20 to 170 ° C, preferably 50 to 150 ° C.

該反應最好在水分儘可能少的狀態下實施,最好在100質量ppm以下。The reaction is preferably carried out in a state where the amount of water is as small as possible, and is preferably 100 ppm by mass or less.

當反應生成物的黏度上升停滯,則中止加熱,施行反應生成物中的酸觸媒之去活化。該酸觸媒的去活化係在反應生成物中添加鹼性化合物及沸石,在10~150℃(最好為30~90℃)下施行10分~10小時(最好為20分~5小時)的加熱攪拌。鹼性化合物及沸石的添加係可同時實施,亦可依個別步驟實施。酸觸媒去活化的結束係利用例如溶解於甲基異丁酮中,並在該溶液中添加水且施行攪拌,再測定水層的pH便可進行確認。When the viscosity rise of the reaction product is stagnant, the heating is stopped, and the acid catalyst in the reaction product is deactivated. The deactivation of the acid catalyst adds a basic compound and zeolite to the reaction product, and is carried out at 10 to 150 ° C (preferably 30 to 90 ° C) for 10 minutes to 10 hours (preferably 20 minutes to 5 hours). Heating and stirring. The addition of the basic compound and the zeolite can be carried out simultaneously or in individual steps. The end of the activation of the acid catalyst is confirmed by, for example, dissolving in methyl isobutyl ketone, adding water to the solution, stirring, and measuring the pH of the aqueous layer.

在酸觸媒去活化步驟中所使用的沸石係主成分為鹼金屬或鹼土族金屬的鋁矽酸鹽,具有依M2 /nO‧Al2 O3 /xSiO2 /yH2 O(式中,M表示金屬離子,n表示原子價,x、y表示整數)所示組成,例如Na12 [(AlO2 )12 (SiO2 )12 ]‧27H2 O(4A型)或Na86 [(AlO2 )86 (SiO2 )106 ]‧276H2 O(13X型)等組成的吸附劑。The main component of the zeolite used in the acid catalyst deactivation step is an alkali metal or alkaline earth metal aluminosilicate having M 2 /nO‧Al 2 O 3 /xSiO 2 /yH 2 O (wherein M represents a metal ion, n represents the valence of the atom, and x, y represents an integer), such as Na 12 [(AlO 2 ) 12 (SiO 2 ) 12 ]‧27H 2 O (type 4A) or Na 86 [(AlO 2 An adsorbent having a composition of 86 (SiO 2 ) 106 ]‧276H 2 O (type 13X).

沸石係將在酸觸媒中和時所生成的酸觸媒殘渣、硼化合物、氟化合物、鹼(土族)金屬等雜質充分地予以吸附,提升反應生成液的純度。沸石之所以可充分吸附該等雜質的理由,係因沸石中具有無數細孔,侵入該細孔內部的雜質會被細孔內部的內壁所吸附。The zeolite system sufficiently adsorbs impurities such as an acid catalyst residue, a boron compound, a fluorine compound, and an alkali (earth) metal which are formed during the neutralization of the acid catalyst, thereby increasing the purity of the reaction product. The reason why zeolite can sufficiently adsorb these impurities is that the zeolite has numerous pores, and impurities that intrude into the pores are adsorbed by the inner wall of the pores.

在酸觸媒去活化步驟中所使用之沸石的平均細孔徑並無特別的限制,最好設定為1~20(0.1~2nm),尤以5~15(0.5~1.5nm)為佳,硼化合物與氟化合物的吸附能力可較優異。該沸石的比表面積並無特別的限制,係設定為500~1500m2 /g,尤以700~1300m2 /g為佳。The average pore diameter of the zeolite used in the acid catalyst deactivation step is not particularly limited, and is preferably set to 1 to 20 (0.1~2nm), especially 5~15 (0.5 to 1.5 nm) is preferred, and the adsorption ability of the boron compound and the fluorine compound can be excellent. The specific surface area of the zeolite is not particularly limited, and is preferably 500 to 1,500 m 2 /g, particularly preferably 700 to 1300 m 2 /g.

該沸石的粒徑、形狀亦均無特別的限制,當粉末狀的情況,平均粒徑為1~150μm,尤以5~100μm為佳,當粒狀的情況,平均粒徑最好為0.5~4mm。若粒徑超越上限值,會有硼化合物、氟化合物的吸附性降低之情況,若粒徑較小於下限值,則有過濾速度降低的情況,因而最好避免。The particle size and shape of the zeolite are also not particularly limited. In the case of a powder, the average particle diameter is 1 to 150 μm, preferably 5 to 100 μm, and in the case of granular, the average particle diameter is preferably 0.5 to 0.5. 4mm. When the particle diameter exceeds the upper limit, the adsorptivity of the boron compound or the fluorine compound may be lowered. When the particle diameter is smaller than the lower limit value, the filtration rate may be lowered, and thus it is preferable to avoid it.

從可有效率地將硼化合物與氟化合物吸附之觀點以及兼顧過濾性的觀點而言,最好平均粒徑為1~100μm(尤以10~50μm為佳)的粉末狀沸石。若平均粒徑超過上述上限值,會有硼化合物、氟化合物的吸附性降低之情況,若平均粒徑小於上述下限值,則有過濾速度降低的情況,因而最好避免。From the viewpoint of efficiently adsorbing the boron compound and the fluorine compound, and from the viewpoint of both the filterability, the powdery zeolite having an average particle diameter of 1 to 100 μm (preferably 10 to 50 μm is preferable) is preferable. When the average particle diameter exceeds the above upper limit, the adsorptivity of the boron compound or the fluorine compound may be lowered. When the average particle diameter is less than the above lower limit value, the filtration rate may be lowered, and thus it is preferable to avoid it.

沸石係內部具有細孔的吸附劑,例如4A型的細孔徑係約0.35nm,可通過有效直徑達0.4nm的分子。An adsorbent having pores inside the zeolite system, for example, a pore size of the type 4A is about 0.35 nm, and can pass a molecule having an effective diameter of 0.4 nm.

該沸石的使用量係鹼性化合物每100質量份使用10~1000質量份,最好為50~500質量份。The amount of the zeolite used is 10 to 1000 parts by mass, preferably 50 to 500 parts by mass per 100 parts by mass of the basic compound.

沸石之製造方法並無特別的限制,可舉出從試劑進行製造的方法、從天然礦物進行製造的方法等。作為從試劑進行製造的方法,係可為以矽酸鈉、鋁酸鈉作為起始原料的方法。從天然礦物進行製造的方法,係可舉出從酸性白土、高嶺土、真珠石、長石等進行製造的方法。例如將高嶺土礦物施行煅燒而形成雜高嶺土(metakaolin),經提高反應性之後再添加氫氧化鈉的方法,或者將高嶺土、火山玻璃施行磨碎,經破壞結晶結構之後再添加氫氧化鈉的方法等。The method for producing the zeolite is not particularly limited, and examples thereof include a method of producing from a reagent, a method of producing from a natural mineral, and the like. As a method of producing from a reagent, a method using sodium citrate or sodium aluminate as a starting material can be used. A method of producing from natural minerals is a method of producing from acid white clay, kaolin, nacre, feldspar, or the like. For example, calcination of kaolin minerals to form metakaolin, addition of sodium hydroxide by increasing reactivity, or grinding of kaolin and volcanic glass, addition of sodium hydroxide after destruction of crystal structure, etc. .

在酸觸媒去活化步驟中所使用的鹼性化合物並無特別的限制,最好為如:氫氧化鈉、氫氧化鉀、氫氧化鈣、碳酸鈣、碳酸氫鈉、碳酸氫鉀、氨等,尤以氫氧化鈣為佳。鹼性化合物的添加量並無特別的限制,相對於酸觸媒1質量份係添加1~10質量倍,最好為2~5質量倍。若鹼性化合物的添加量超過該上限量,則過濾時間變得過久,改質酚樹脂的生產性降低。反之,若鹼性化合物的添加量少於該下限量,則有酸觸媒的去活化不足之問題發生。The basic compound used in the acid catalyst deactivation step is not particularly limited, and is preferably, for example, sodium hydroxide, potassium hydroxide, calcium hydroxide, calcium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, ammonia, or the like. Especially calcium hydroxide is preferred. The amount of the basic compound to be added is not particularly limited, and is 1 to 10 times by mass, preferably 2 to 5 times by mass, based on 1 part by mass of the acid catalyst. When the amount of the basic compound added exceeds the upper limit amount, the filtration time becomes too long, and the productivity of the modified phenol resin is lowered. On the other hand, if the amount of the basic compound added is less than the lower limit amount, there is a problem that the deactivation of the acid catalyst is insufficient.

將酸觸媒去活化的反應生成物,係利用蒸餾、過濾等固液分離手段,分類為液體與固形份,最好採行過濾,因為較為簡便。該過濾的方法、條件並無特別的限制,過濾最好係為減壓過濾或加壓過濾。過濾溫度係室溫~150℃,最好為70~130℃。The reaction product to be activated by the acid catalyst is classified into a liquid and a solid by means of solid-liquid separation means such as distillation or filtration, and it is preferable to carry out filtration because it is relatively simple. The method and conditions for the filtration are not particularly limited, and the filtration is preferably vacuum filtration or pressure filtration. The filtration temperature is from room temperature to 150 ° C, preferably from 70 to 130 ° C.

過濾殘渣係改質酚樹脂,經回收並使用作為各種用途的原始材料。經回收的改質酚樹脂係軟化點70~150℃,最好為80~140℃,PH為5.0~9.0,最好為6.0~8.0,硼化合物與氟化合物含有量分別在25質量ppm以下,最好為22質量ppm以下,可在未施行特別處理、精製的情況下,適當地使用作為半導體密封劑、印刷佈線基板用積層板等的材料。The residue is a modified phenol resin which is recovered and used as a raw material for various purposes. The recovered modified phenol resin has a softening point of 70 to 150 ° C, preferably 80 to 140 ° C, a pH of 5.0 to 9.0, preferably 6.0 to 8.0, and a boron compound and a fluorine compound content of 25 ppm by mass or less, respectively. It is preferably 22 mass ppm or less, and a material such as a semiconductor sealant or a laminate for a printed wiring board can be suitably used without performing special treatment or purification.

濾液係經蒸餾,並回收未反應的酚。該蒸餾係可在加壓下或常壓下、減壓下實施,但最好為減壓蒸餾。蒸餾溫度係100~300℃,最好為150~270℃,尤以170~250℃為佳。The filtrate is distilled and unreacted phenol is recovered. This distillation can be carried out under reduced pressure or under normal pressure under reduced pressure, but it is preferably distilled under reduced pressure. The distillation temperature is 100 to 300 ° C, preferably 150 to 270 ° C, preferably 170 to 250 ° C.

另外,該回收酚的純度為90質量%以上,可再利用於下一次的改質酚樹脂製造。Further, the purity of the recovered phenol is 90% by mass or more, and can be reused for the production of the next modified phenol resin.

以下,利用實施例針對本發明進行更詳盡的說明。Hereinafter, the present invention will be described in more detail by way of examples.

另外,反應生成液的pH係將約0.5g之生成液溶解於20cm3 的甲基異丁酮中,添加20cm3 之水並充分攪拌。經攪拌後,靜置30分鐘,再利用PH儀測定水層的pH。Further, the pH of the reaction product was about 0.5 g of the formation liquid dissolved in 20 cm 3 of methyl isobutyl ketone, and 20 cm 3 of water was added thereto, followed by thorough stirring. After stirring, it was allowed to stand for 30 minutes, and the pH of the aqueous layer was measured by a pH meter.

二環戊二烯類改質酚樹脂的軟化點係使用環球式軟化點測定裝置(MEITECH公司製,25D5-ASP-MG型),於甘油浴中,依5℃/分的升溫速度進行測定。The softening point of the dicyclopentadiene-based modified phenol resin was measured using a ring and ball softening point measuring apparatus (manufactured by MEITECH Co., Ltd., model 25D5-ASP-MG) at a temperature elevation rate of 5 ° C /min.

二環戊二烯類改質酚樹脂的硼化合物及氟化合物之含有量,係使用原子吸光裝置[島津製作所(股)製,型號AA-6200],利用原子吸光法進行測定。The content of the boron compound and the fluorine compound in the dicyclopentadiene-based modified phenol resin was measured by an atomic absorption method using an atomic absorption device [manufactured by Shimadzu Corporation, model AA-6200].

(實施例1)(Example 1)

在具備有攪拌裝置、溫度計、回流裝置、非活性氣體導入管及油浴的反應容器(可分離式燒瓶:1L)中,進料入市售酚278g(=2.9mol),並加熱至80℃。待加熱結束後,添加三氟化硼‧酚錯合物2.5g,進一步升溫至140℃,將DCPD100g(=0.76mol)歷時2小時徐緩添加而進行反應。待添加結束後,添加氫氧化鈣7.5g與沸石[和光純藥(股)製,合成沸石F9,粉末,細孔徑9(9nm),平均粒徑7μm(200篩目通過物),比表面積1100m2 /g]2.5g,攪拌30分鐘,將酸觸媒中和而去活化。待攪拌結束後,將反應生成液過濾。將濾液升溫至220℃,施行減壓蒸餾,而將未反應的酚183g蒸餾除去。In a reaction vessel (separable flask: 1 L) equipped with a stirring device, a thermometer, a reflux device, an inert gas introduction tube, and an oil bath, 278 g (=2.9 mol) of a commercially available phenol was charged and heated to 80 °C. After completion of the heating, 2.5 g of boron trifluoride ‧ phenol complex was added, and the temperature was further raised to 140 ° C, and 100 g of DCPD (=0.76 mol) was slowly added for 2 hours to carry out a reaction. After the addition is completed, 7.5 g of calcium hydroxide and zeolite (manufactured by Wako Pure Chemical Industries, Ltd.), synthetic zeolite F9, powder, pore size 9 are added. (9 nm), an average particle diameter of 7 μm (200 mesh passage), a specific surface area of 1,100 m 2 / g, and 2.5 g, stirred for 30 minutes, neutralized by acid catalyst and deactivated. After the completion of the stirring, the reaction product liquid was filtered. The filtrate was heated to 220 ° C, and distillation under reduced pressure was carried out, and 183 g of unreacted phenol was distilled off.

蒸餾殘渣(=酚樹脂A)產量係195g。測定酚樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。The distillation residue (=phenol resin A) yield was 195 g. The softening point, pH, boron content, and fluorine content of the phenol resin were measured, and the results are shown in Table 1.

(實施例2)(Example 2)

除在實施例1中,取代酚而改為使用鄰甲酚之外,其餘均重複實施例1的步驟。測定所獲得樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。The procedure of Example 1 was repeated except that in Example 1, the substitution of phenol instead of o-cresol was used. The softening point, pH, boron content, and fluorine content of the obtained resin were measured, and the results are shown in Table 1.

(實施例3)(Example 3)

除在實施例1中,取代酚而改為使用2,6-二甲苯酚之外,其餘均重複實施例1的步驟。測定所獲得樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。The procedure of Example 1 was repeated except that in Example 1, the substitution of phenol was followed by the use of 2,6-xylenol. The softening point, pH, boron content, and fluorine content of the obtained resin were measured, and the results are shown in Table 1.

(實施例4)(Example 4)

除在實施例1中,取代沸石[和光純藥(股)製,合成沸石F9,粉末,細孔徑9(9nm),平均粒徑7μm(200篩目通過物),比表面積1100m2 /g],改為使用沸石[和光純藥(股)製,合成沸石A3,粉末,細孔徑3(3nm),平均粒徑7μm(200篩目通過物),比表面積1000m2 /g]2.5g之外,其餘均重複實施例1的步驟。測定改質酚樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。In addition to the zeolite 1, [Compound Pure Chemicals (stock), synthetic zeolite F9, powder, pore size 9 (9 nm), an average particle diameter of 7 μm (200 mesh passage), a specific surface area of 1100 m 2 /g], and the use of zeolite [Wako Pure Chemicals Co., Ltd., synthesis of zeolite A3, powder, pore size 3 The procedure of Example 1 was repeated except that (3 nm), an average particle diameter of 7 μm (200 mesh passage), and a specific surface area of 1000 m 2 / g] of 2.5 g. The softening point, pH, boron content, and fluorine content of the modified phenol resin were measured, and the results are shown in Table 1.

(實施例5)(Example 5)

除在實施例1中,取代氫氧化鈣7.5g而改為使用氫氧化鈉7.5g之外,其餘均重複實施例1的步驟。測定改質酚樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。The procedure of Example 1 was repeated except that in Example 1, the substitution of 7.5 g of calcium hydroxide and 7.5 g of sodium hydroxide was used. The softening point, pH, boron content, and fluorine content of the modified phenol resin were measured, and the results are shown in Table 1.

(比較例1)(Comparative Example 1)

除在實施例1中,取代氫氧化鈣7.5g與沸石2.5g而改為使用氫氧化鈣10g之外,其餘均重複實施例1的步驟。測定改質酚樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。The procedure of Example 1 was repeated except that in Example 1, 7.5 g of calcium hydroxide was replaced with 2.5 g of zeolite and 10 g of calcium hydroxide was used instead. The softening point, pH, boron content, and fluorine content of the modified phenol resin were measured, and the results are shown in Table 1.

(比較例2)(Comparative Example 2)

除在實施例1中,取代氫氧化鈣7.5g與沸石2.5g而改為使用水滑石10g之外,其餘均重複實施例1的步驟。測定改質酚樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。The procedure of Example 1 was repeated except that in Example 1, 7.5 g of calcium hydroxide was replaced with 2.5 g of zeolite and 10 g of hydrotalcite was used instead. The softening point, pH, boron content, and fluorine content of the modified phenol resin were measured, and the results are shown in Table 1.

(比較例3)(Comparative Example 3)

除在實施例1中,取代沸石2.5g而改為使用活性白土[東新化成(股)製,活性白土E,比表面積約200m2 /g,水分量5質量%]2.5g之外,其餘均重複實施例1的步驟。測定改質酚樹脂的軟化點、pH、硼含有量及氟含有量,結果如表1所示。Except that in Example 1, instead of 2.5 g of zeolite, the activated clay (manufactured by Tosho Kasei Co., Ltd., activated clay E, specific surface area of about 200 m 2 /g, water content of 5% by mass) of 2.5 g was used instead. The procedure of Example 1 was repeated. The softening point, pH, boron content, and fluorine content of the modified phenol resin were measured, and the results are shown in Table 1.

(產業上之可利用性)(industrial availability)

根據本發明之製造方法,可獲得具有通用為半導體密封劑、印刷佈線基板用積層板等原料之軟化點與雜質含有量的二環戊二烯類改質酚樹脂。即,將依照本發明方法所製得之改質酚樹脂施行環氧化而獲得的化合物,係屬於電氣特性優異,可有效使用為半導體密封劑、印刷佈線基板用積層板等的原料。According to the production method of the present invention, a dicyclopentadiene-modified phenol resin having a softening point and an impurity content of a raw material such as a semiconductor encapsulant or a laminate for a printed wiring board can be obtained. In other words, the compound obtained by epoxidizing the modified phenol resin obtained by the method of the present invention is excellent in electrical properties, and can be effectively used as a raw material for a semiconductor sealant or a laminate for a printed wiring board.

Claims (2)

一種二環戊二烯類改質酚樹脂之製造方法,其特徵為具有:將酚類及二環戊二烯類作為反應原料並在酸觸媒之存在下進行反應,而製造二環戊二烯類改質酚樹脂的反應步驟(I);以及在依該反應步驟(I)所獲得之反應生成液中添加鹼性化合物及平均細孔徑1~20Å之沸石,而將該酸觸媒去活化的酸觸媒去活化步驟(II)。 A method for producing a dicyclopentadiene-based modified phenol resin, which comprises reacting a phenol and a dicyclopentadiene as a reaction raw material in the presence of an acid catalyst to produce a dicyclopentane a reaction step (I) of the olefin-modified phenol resin; and a basic compound and an average pore diameter of 1 to 20 Å of zeolite are added to the reaction product obtained in the reaction step (I), and the acid catalyst is removed. The activated acid catalyst deactivates step (II). 如申請專利範圍第1項之二環戊二烯類改質酚樹脂之製造方法,係具有:從依上述酸觸媒去活化步驟(II)所獲得之反應生成液中,將上述沸石、酸觸媒及未反應原料除去,而獲得二環戊二烯類改質酚樹脂的樹脂回收步驟(III)。The method for producing a cyclopentadiene-based modified phenol resin according to the first aspect of the patent application is characterized in that the zeolite or acid is obtained from the reaction product obtained by the above-mentioned acid catalyst deactivation step (II). The catalyst and the unreacted raw material are removed to obtain a resin recovery step (III) of the dicyclopentadiene-based modified phenol resin.
TW97138836A 2007-10-12 2008-10-09 Method for manufacturing dicyclopentadienes-denaturalized phenol TWI437019B (en)

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