TWI430285B - Plasma electric generation system - Google Patents
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E30/00—Energy generation of nuclear origin
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Description
本發明係大致上關於電漿物理之領域,且尤指用於約束電漿以致能核熔合及用於轉換自熔合產物的能量至電力之方法及裝置。The present invention relates generally to the field of plasma physics, and more particularly to methods and apparatus for constraining plasma to enable nuclear fusion and for converting energy from fusion products to electricity.
熔合係二個輕的核子為藉由其而結合以形成一較重者之過程。熔合過程係釋放形式為快速移動粒子之極大量的能量。因為原子核子係正電荷-歸因於其包含之質子-具有一排斥靜電或庫侖(Coulomb)力於其間。針對於熔合之二個核子,此排斥障壁係必須克服,其發生在當二個核子係結合為足夠接近,於其中,短範圍的核子力量係成為足夠強以克服庫侖力且熔合核子。針對於核子以克服庫侖障壁所必要的能量係由其熱能量所提供,其必須為極高。舉例而言,若溫度係至少為104 eV之規模-概略為對應於凱氏(絕對)100百萬度,熔合速率係可察覺。一熔合反應之速率係溫度之一函數,且由其稱為反應度(reactivity)之一量所描述。舉例而言,一D-T反應之反應度係具有一寬廣的峰值於30 keV與100 keV之間。The fusion of two light nuclei is a process by which they combine to form a heavier one. The fusion process is in the form of a very large amount of energy that rapidly moves the particles. Because the positive charge of the atomic nucleus - due to the protons it contains - has a repulsive electrostatic or Coulomb force in between. For the two nuclei that fuse, this repellent barrier must be overcome, which occurs when the two nuclei are combined close enough, in which a short range of nuclear forces becomes strong enough to overcome the Coulomb force and fuse the nuclei. The energy necessary to overcome the Coulomb barrier by the nucleus is provided by its thermal energy, which must be extremely high. For example, if the temperature is at least 10 4 eV scale - roughly corresponding to Kjeldahl (absolute) 100 million degrees, the fusion rate is detectable. The rate of a fusion reaction is a function of temperature and is described by one of its quantities called reactivity. For example, the reactivity of a D-T reaction has a broad peak between 30 keV and 100 keV.
典型的熔合反應係包括:D-D → He3 (0.8 MeV)+n (2.5 MeV),D+T → α(3.6 MeV)+n (14.1 MeV),D+He3 → α(3.7 MeV)+p (14.7 MeV),andp +B1 1 → 3α(8.7 MeV),Typical fusing reactions include: D-D → He 3 (0.8 MeV) + n (2.5 MeV), D+T → α (3.6 MeV) + n (14.1 MeV), D + He 3 → α (3.7 MeV) + p (14.7 MeV), and p + B 1 1 → 3α (8.7 MeV),
其中,D係指氘(deuterium),T係指氚(tritium),α係指一氦核子,n係指一中子,p係指一質子,He係指氦,且B1 1 係指硼-11。於各個方程式之括號中的數字係指熔合產物之動能。Among them, D is deuterium, T is tritium, α is a nucleus, n is a neutron, p is a proton, He is a sputum, and B 1 1 is boron. -11. The numbers in parentheses in the equations refer to the kinetic energy of the fused product.
上列的前二個反應-D-D與D-T反應-係中子式(neutronic),意指其熔合產物的能量之大多數者係由快速的中子所載有。中子反應之缺點係在於:(1)快速的中子之通量係產生諸多問題,包括反應器壁之結構損壞以及針對於大多數的構成材料之高階的放射性;及(2)快速的中子之能量係藉由轉換其熱能至電能而收集,其為極不具有效率(小於30%)。中子反應之優點係在於:(1)其反應度峰值係於一相當低的溫度;及(2)歸因於輻射之其損耗係相當低,因為氘與氚之原子序係1。The first two reactions listed above - D-D and D-T - are neutronic, meaning that the majority of the energy of the fused product is contained by fast neutrons. The disadvantages of neutron reactions are: (1) rapid neutron fluxes cause a number of problems, including structural damage to the reactor walls and high-order radioactivity for most constituent materials; and (2) fast medium The energy of the sub-unit is collected by converting its thermal energy to electrical energy, which is extremely inefficient (less than 30%). The advantages of the neutron reaction are: (1) the peak of its reactivity is at a relatively low temperature; and (2) its loss due to radiation is relatively low because of the atomic sequence of 氘 and 氚.
於其他二個方程式之反應物-D-He3 與p-B1 1 -係稱為先進(advanced)的燃料。替代於產生快速的中子,如同於中子反應,其熔合產物係帶電荷的粒子。先進燃料之一個優點係在於:其產生較少許多的中子且因此為較不患於與其關聯之缺點。於D-He3 之情形,一些快速的中子係由二次反應所產生,但是此等中子係考量僅為熔合產物之能量的約10%。該種p-B1 1 反應係無快速的中子,雖然產生其為由二次反應所造成之一些慢速的中子,但是產生較少許多的問題。先進燃料之另一個優點係在於:其熔合產物係包含帶電荷的粒子,其動能係可直接為轉換至電力。藉著一種適當的直接能量轉換過程,先進燃料之熔合產物的能量係可為以一高效率而收集,可能為超過90%。The reactants of the other two equations - D-He 3 and p-B 1 1 - are called advanced fuels. Instead of producing fast neutrons, as in the neutron reaction, the fused product is charged particles. One advantage of advanced fuels is that they produce fewer neutrons and are therefore less susceptible to the disadvantages associated therewith. In the case of D-He 3 , some fast neutrons are produced by secondary reactions, but these neutrons consider only about 10% of the energy of the fused product. This p-B 1 1 reaction system has no fast neutrons, although it produces some slow neutrons caused by the secondary reaction, but produces fewer problems. Another advantage of advanced fuels is that their fused products contain charged particles whose kinetic energy can be directly converted to electricity. With a suitable direct energy conversion process, the energy of the fusion products of advanced fuels can be collected with a high efficiency, possibly over 90%.
先進燃料亦具有缺點。舉例而言,先進燃料之原子序係較高(針對於He3 為2且針對於B1 1 為5)。因此,其輻射損失係相較於中子反應而為較大。此外,較為困難許多以致使先進燃料為熔合。其峰值的反應性係於較高許多之溫度而發生且並未達到如同D-T的反應性之高。引起藉著先進燃料之一熔合反應係因此需要的是:其成為至一較高能量狀態,於其之反應性為顯著。是以,先進燃料係必須為約束於一較長時間週期,其中,其可成為至適當的熔合條件。Advanced fuels also have shortcomings. For example, the advanced fuel has a higher atomic sequence (2 for He 3 and 5 for B 1 1 ). Therefore, its radiation loss is larger than that of the neutron reaction. In addition, it is much more difficult to fuse advanced fuels. The reactivity of its peak occurs at a much higher temperature and does not reach the high reactivity as D-T. What is required to fuse the reaction system by one of the advanced fuels is that it becomes a higher energy state, and the reactivity thereof is remarkable. Therefore, the advanced fuel system must be constrained for a longer period of time, where it can be to the appropriate fusion conditions.
針對於一電漿之約束(containment)時間係△t=r2 /D,其中,r係一最小電漿尺寸且D係一擴散係數。擴散係數之典型值係Dc =ai 2 /τi e ,其中,ai 係離子迴轉半徑且τi e 係離子-電子碰撞時間。根據典型擴散係數之擴散係稱為典型的遷移(transport)。歸因於短波長的不穩定度之博姆(Bohm)擴散係數為DB =(1/16)ai 2 Ωi ,其中,Ωi 係離子迴轉頻率。根據此關係式之擴散係稱為異常(anomalous)的遷移。針對於熔合條件,DB /DC =(1/16)Ωi τi e 108 ,異常的遷移係相較於典型遷移者而造成較短許多的約束時間。此關係為決定於一熔合反應器之一電漿必須為多大,藉由該要求為在於:針對於一給定量的電漿之約束時間係必須為相較於針對於電漿具有一核子熔合反應之時間而為較長。因此,典型的遷移條件係較為期望於一熔合反應器,允許較小的初始電漿。The containment time for a plasma is Δt=r 2 /D, where r is a minimum plasma size and D is a diffusion coefficient. A typical value of the diffusion coefficient is D c = a i 2 /τ i e , where a i is the ion radius of gyration and τ i e is the ion-electron collision time. A diffusion system based on a typical diffusion coefficient is referred to as a typical transport. The Bohm diffusion coefficient attributed to the instability of the short wavelength is D B = (1/16) a i 2 Ω i , where Ω i is the ion gyration frequency. The diffusion according to this relationship is called an anomalous migration. For the fusion condition, D B /D C =(1/16)Ω i τ i e 10 8 , an abnormal migration system results in a much shorter constraint time than a typical migrant. This relationship is determined by how large the plasma must be in one of the fusion reactors, by the requirement that the constraint time for a given amount of plasma must be one nuclear fusion reaction with respect to the plasma. The time is longer. Therefore, typical migration conditions are more desirable for a fusion reactor, allowing for a smaller initial plasma.
於關於電漿之環狀約束的早期實驗,一約束時間△t r 2 /D B 係觀察。於最近四十年的進展係已經提高約束時間至△t 1000r 2 /D B 。一個現存的熔合反應器概念係托卡瑪克(Tokamak)。過去三十年來,熔合嘗試係已經針對於運用D-T燃料之Tokamak反應器。此等嘗試係已經達成於國際熱核子實驗反應器(ITER,International Thermonuclear Experimental Reactor)。關於Tokamak之近來的實驗係建議的是:典型的遷移△t r 2 /D C 係可能,其中,最小的電漿尺寸係可降低自公尺至公分。此等實驗係涉及於高能的束(50至100 keV)之注入,以加熱電漿至10至30 keV之溫度。參閱:W.Heidbrink & G.J.Sadler,34Nuclear Fusion 535(1994)。於此等實驗之高能的束離子係觀察為減慢且典型式擴散,而熱電漿係持續為異常快速擴散。針對於此之理由係在於:高能的束離子係具有一大的旋轉半徑,如此,且為不靈敏於其相較於離子旋轉半徑為短之波長(λ<a i )的變動。短波長的變動係傾向為平均於一循環且因此為刪除。然而,電子係具有一較小許多的旋轉半徑,故其響應於變動且為異常遷移。In the early experiments on the ring constraint of plasma, a constraint time Δ t r 2 / D B system observation. Department of progress in the last forty years has been to improve the confinement time △ t 1000 r 2 / D B . An existing fusion reactor concept is Tokamak. For the past three decades, fusion attempts have been directed to the Tokamak reactor using D-T fuel. Such attempts have been made in the International Thermonuclear Experimental Reactor (ITER). The recent experimental research on Tokamak suggests: typical migration Δ t The r 2 / D C system is possible, where the smallest plasma size can be reduced from metric to centimeters. These experiments involve the injection of a high energy beam (50 to 100 keV) to heat the plasma to a temperature of 10 to 30 keV. See: W. Heidbrink & GJ Sadler, 34 Nuclear Fusion 535 (1994). The high energy beam systems of these experiments were observed to be slow and typical diffusion, while the thermoplasma continued to diffuse rapidly. The reason for this is that the high-energy beam ion system has a large radius of rotation, and is therefore insensitive to variations in the wavelength (λ < a i ) which is shorter than the ion rotation radius. Short-wavelength variations tend to average on one cycle and are therefore deleted. However, the electronics have a much smaller radius of rotation, so they respond to changes and are abnormally migrating.
因為異常的遷移,電漿之最小尺寸係必須為至少2.8公尺。歸因於此尺寸,ITER係建立為高30公尺及直徑30公尺。此係其為可行之最小的D-T Tokamak型式反應器。針對於先進燃料,諸如:D-He3 與p-B1 1 ,Tokamak型式反應器係將必須為較大許多,因為針對於一燃料為具有一核子反應之時間係較長許多。運用D-T燃料之一Tokamak型式反應器係具有另外的問題在於:熔合產物能量之大多數者係由14 MeV中子所載有,其致使輻射損壞且為歸因於中子通量而引起反應度於幾乎所有構成材料。此外,其能量之轉換至電力係必須為藉由一熱過程,其效率為不超過30%。Because of the abnormal migration, the minimum size of the plasma must be at least 2.8 meters. Due to this size, the ITER is built to be 30 meters high and 30 meters in diameter. This is the smallest D-T Tokamak type reactor that is feasible. For advanced fuels such as D-He 3 and p-B 1 1 , the Tokamak type reactor system will have to be much larger because the time to have a nuclear reaction for a fuel is much longer. Another problem with the use of D-T fuel, the Tokamak type reactor, is that the majority of the energy of the fused product is carried by the 14 MeV neutron, which causes radiation damage and is caused by neutron flux. The degree of reaction is almost all of the constituent materials. In addition, the conversion of its energy to the power system must be by a thermal process with an efficiency of no more than 30%.
另一個提出的反應器架構係一種碰撞束反應器。於一碰撞束反應器中,一背景電漿係藉由離子束所轟擊。諸束係包含其具有相較於熱電漿為較大許多之能量的離子。產生有用的熔合反應於此型式之反應器係已經為不可行,因為背景電漿係使得離子束為減速。種種的提議係已經提出以降低此問題且使得核子反應數目為最大化。Another proposed reactor architecture is a collision beam reactor. In a collision beam reactor, a background plasma is bombarded by an ion beam. The bundles comprise ions having a much greater energy than the thermoplasm. It has become infeasible to produce a useful fusion reaction for this type of reactor system because the background plasma system causes the ion beam to decelerate. Various proposals have been made to reduce this problem and maximize the number of nuclear reactions.
舉例而言,Jassby等人之美國專利第4,065,351號係揭示一種方法,其產生逆向串流的碰撞束之氘核(deuteron)與氚核(tritron)於一種環狀(toroidal)約束系統。於Jassby等人之美國專利第4,057,462號,電磁能量係注入以抵消於一個離子物種之整體平衡電漿制動(drag)效應。環狀約束系統係識別為一種Tokamak。於Rostoker之美國專利第4,894,199號,氘與氚之束係以相同的平均速度而注入且捕獲於一Tokamak、鏡(mirror)、或場反轉架構(FRC,field reversed configuration)。低密度的冷背景電漿係存在為針對於捕獲束之單獨目的。諸束係因為其具有高溫而反應,且減速係主要由其伴隨注入離子之電子而引起。電子係由離子所加熱,於此情形,減速係最小化。For example, U.S. Patent No. 4,065,351 to the name of the U.S. Pat. In U.S. Patent No. 4,057,462 to Jassby et al., electromagnetic energy is injected to counteract the overall equilibrium plasma drag effect of an ionic species. The annular restraint system is identified as a Tokamak. U.S. Patent No. 4,894,199 to Rostoker, the bismuth and bismuth bundles are injected at the same average speed and captured in a Tokamak, mirror, or field reversed configuration (FRC). Low density cold background plasma is present for the sole purpose of capturing the beam. The bundles react because of their high temperature, and the deceleration system is mainly caused by electrons accompanying the injection of ions. The electron system is heated by ions, in which case the deceleration system is minimized.
然而,於此等裝置之任一者的一平衡電場係並未擔當任何任務。甚者,並無企圖以降低或甚至是考慮異常遷移。However, a balanced electric field system of any of these devices does not perform any task. In fact, there is no attempt to reduce or even consider an abnormal migration.
其他的專利係考慮離子之靜電約束(confinement),且於某些情形係考慮電子之磁性約束。此等專利係包括:Farnsworth之美國專利第3,258,402號、與Farnsworth之美國專利第3,386,883號,其揭示離子之靜電約束與電子之慣性約束;Hirsch等人之美國專利第3,530,036號、與Hirsch等人之美國專利第3,530,497號,類似於Farnsworth者;Limpaecher之美國專利第4,233,537號,其揭示離子之靜電約束與電子之磁性約束,藉著多極尖端(cusp)反射壁;及,Bussard之美國專利第4,826,646號,其為類似於Limpaecher者且涉及點尖端。此等專利係均未考慮電子之靜電約束與離子之磁性約束。雖然已經存在於離子之靜電約束的諸多研究計畫,其當離子具有針對於一熔合反應器所需的密度而均未成功於建立所需的靜電場。最後,上述引證專利係均未論述一種場反轉架構(FRC)磁性拓撲。Other patents consider the electrostatic confinement of ions and, in some cases, the magnetic constraints of electrons. These patents include: U.S. Patent No. 3,258,402 to Farnsworth, and U.S. Patent No. 3,386,883 to Farnsworth, which disclose the electrostatic confinement of ions and the inertial constraints of electrons; U.S. Patent No. 3,530,036 to Hirsch et al., and Hirsch et al. U.S. Patent No. 3, 530, 497, to the name of Farnsworth; U.S. Patent No. 4,233, 537 to the disclosure of the disclosure of the disclosure of U.S. Pat. No., which is similar to the Limpaecher and involves a point tip. None of these patents considers the electrostatic constraints of electrons and the magnetic constraints of ions. Although many research projects have existed on the electrostatic constraints of ions, they have not succeeded in establishing the required electrostatic field when the ions have the density required for a fusion reactor. Finally, none of the above cited patents discusses a field reversal architecture (FRC) magnetic topology.
場反轉架構(FRC)係於約為西元1960年在Naval研究實驗室而偶然發現於角向箍縮(theta pinch)實驗期間。一種典型FRC拓撲係說明於第3與5圖,其中,內部磁場係反轉方向,且於一FRC之粒子軌道係顯示於第6與9圖。關於FRC,諸多的研究程式係已經支援於美國與日本。關於自西元1960至1988年之FRC研究的理論與實驗之一總括概觀論文係存在,參閱:M.Tuszewski,28 Nuclear Fusion 2033,(1988)。關於FRC發展之一詳細報告係描述於西元1996年之研究與針對於未來研究之建議,參閱:L.C.Steinhauer等人,30 Fusion Technology 116(1996)。迄今,於FRC實驗,FRC係已經藉著角向箍縮方法而形成。此種形成方法之結果係在於:離子與電子係各自為載有一半的電流,其係造成於電漿之一可忽略的靜電場且無靜電約束。於此等FRC之離子與電子係磁性約束。於幾乎所有FRC實驗,異常遷移係已經作為前提,參閱:例如Tuszewski論文於第2072頁之段落1.5.2的開頭。The Field Inversion Architecture (FRC) was accidentally discovered during the experiment of the angle pinch (theta pinch) at the Naval Research Laboratory in about 1960. A typical FRC topology is illustrated in Figures 3 and 5, in which the internal magnetic field is reversed and the particle orbital system in an FRC is shown in Figures 6 and 9. Regarding FRC, many research programs have been supported in the United States and Japan. A general overview of the theory and experimentation of FRC research from 1960 to 1988. See: M. Tuszewski, 28 Nuclear Fusion 2033, (1988). A detailed report on the development of FRC is described in the 1996 study and recommendations for future research, see: L.C. Steinhauer et al., 30 Fusion Technology 116 (1996). So far, in the FRC experiment, the FRC system has been formed by the angular pinch method. The result of this method of formation is that the ions and electrons are each carrying half of the current, which is caused by a negligible electrostatic field in the plasma and is free of static confinement. The ions and electrons of these FRCs are magnetically constrained. For almost all FRC experiments, anomalous migration has been a prerequisite, see, for example, the Tuszewski paper at the beginning of paragraph 1.5.2 of page 2072.
因此,意欲提出一種具有一約束系統與一能量轉換系統之熔合系統,約束系統係傾向以實質為降低或消除離子與電子之異常遷移,且能量轉換系統係以高效率而轉換熔合產物之能量至電力。Therefore, it is intended to propose a fusion system having a restraint system and an energy conversion system, the restraint system tends to substantially reduce or eliminate the abnormal migration of ions and electrons, and the energy conversion system converts the energy of the fusion product with high efficiency to electric power.
本發明係針對於利於控制熔合於具有一種場反轉拓撲之一磁場及熔合產物能量至電力之直接轉換的一種系統。於本文稱為一電漿電力產生(PEG,plasma-electric power generation)系統之該種系統係較佳包括一熔合反應器,其具有傾向以實質為降低或消除離子與電子之異常遷移之一約束系統。此外,該PEG系統係包括其耦接至該反應器之一能量轉換系統,其為以高效率而直接轉換熔合產物能量至電力。The present invention is directed to a system that facilitates control of direct conversion of a magnetic field having one field reversal topology and fused product energy to electrical power. Such a system, referred to herein as a plasma-electric power generation (PEG) system, preferably includes a fusion reactor that has a tendency to substantially reduce or eliminate one of the abnormal migration of ions and electrons. system. In addition, the PEG system includes an energy conversion system coupled to the reactor that directly converts the fused product energy to electricity with high efficiency.
於一個實施例中,針對於離子與電子之異常遷移係傾向為實質降低或消除。離子之異常遷移係傾向為藉由磁性約束該等離子於場反轉架構(FRC)之一磁場而避免。針對於電子,能量之異常遷移係藉由調整一外部施加的磁場以發展一強的電場而避免,強的電場係靜電約束電子於一深電位井。結果,可運用於此種約束裝置與處理之熔合燃料電漿係不限於中子燃料,而且有利為包括先進或無中子(aneutronic)的燃料。針對於無中子燃料,熔合反應能量係幾乎為整體於電荷粒子之形式,即:高能(energetic)的離子,其可為操縱於一磁場且為取決於燃料而引起少或無放射性。In one embodiment, the abnormal migration system for ions and electrons tends to be substantially reduced or eliminated. The anomalous migration of ions tends to be avoided by magnetically confining the plasma to one of the field reversal architectures (FRC). For electrons, the abnormal migration of energy is avoided by adjusting an externally applied magnetic field to develop a strong electric field that electrostatically confines electrons to a deep potential well. As a result, the fused fuel plasma that can be used in such restraining devices and processes is not limited to neutron fuels, but is advantageously comprised of advanced or aneutronic fuels. For neutron-free fuels, the fusion reaction energy is almost entirely in the form of charged particles, ie, energetic ions, which can be manipulated to a magnetic field and cause little or no radioactivity depending on the fuel.
於一個較佳實施例中,一種熔合反應器之電漿約束系統係包含:一室;一磁場產生器,用於施加於其為實質沿著一主軸之一方向的一磁場;及一環狀電漿層,其包含一循環的離子束。環狀電漿束層之離子係實質為磁性約束於該室之內的軌道,且電子係實質為約束於一靜電能量井。於一個較佳實施例中,該磁場產生器係包括一電流線圈。較佳而言,該磁場產生器係更包括其靠近該室之二端的鏡式(mirror)線圈,其提高於該室之二端的施加磁場之大小。該種系統亦包含一或多個束注入器,用於注入中性化的離子束至該磁場,其中,該束係歸因於由磁場所引起的力量而進入一軌道。於一個較佳實施例中,該種系統係形成其具有場反轉架構(FRC)之拓撲的一磁場。In a preferred embodiment, a plasma confinement reactor of a fusion reactor comprises: a chamber; a magnetic field generator for applying a magnetic field in a direction substantially along one of the major axes; and a ring A plasma layer comprising a circulating ion beam. The ion system of the annular plasma beam layer is substantially magnetically constrained within the orbit of the chamber, and the electron system is substantially confined to an electrostatic energy well. In a preferred embodiment, the magnetic field generator includes a current coil. Preferably, the magnetic field generator further includes a mirror coil adjacent the two ends of the chamber, which increases the magnitude of the applied magnetic field at both ends of the chamber. The system also includes one or more beam injectors for injecting a neutralized ion beam into the magnetic field, wherein the beam system enters an orbit due to forces caused by the magnetic field. In a preferred embodiment, the system forms a magnetic field having a topology of a field inversion architecture (FRC).
於另一個較佳實施例中,一種替代的室係設置,其防止方位角(azimuthal)影像電流之形成於室壁之一中央區域且致能磁通為於一快速期間而穿透該室。主要為由不銹鋼所組成以提供結構的強度與良好的真空特性之該室係包括於室壁之軸向的絕緣斷流器,其延伸為沿著幾乎為該室之整個長度。較佳而言,具有其彼此分開為約120度之三個斷流器。該等斷流器係包括其形成於室壁1311一槽或間隙。包含較佳為一陶瓷或類似者之一種絕緣材料的一插入物係插入至諸槽或間隙。於該室之內部,一金屬罩蓋(shroud)係覆蓋該插入物。於該室之外側,插入物係附接至一密封面板,其較佳為由玻璃纖維或類似者所形成,其藉由一O形環密封(seal)與室壁之不銹鋼的表面而形成一真空障壁。In another preferred embodiment, an alternative chamber arrangement prevents azimuthal image current from being formed in a central region of the chamber wall and enabling magnetic flux to penetrate the chamber for a fast period of time. The chamber, which is primarily comprised of stainless steel to provide structural strength and good vacuum characteristics, includes an axially interrupted current interrupter in the axial direction of the chamber wall that extends along substantially the entire length of the chamber. Preferably, there are three current interrupters that are separated from each other by about 120 degrees. The current interrupters include a slot or gap formed in the chamber wall 1311. An insert comprising an insulating material, preferably a ceramic or the like, is inserted into the grooves or gaps. Inside the chamber, a metal shroud covers the insert. On the outside of the chamber, the insert is attached to a sealing panel, preferably formed of fiberglass or the like, which is formed by an O-ring seal and the surface of the stainless steel of the chamber wall. Vacuum barrier.
於又一個較佳實施例,一種感應電漿源係可安裝於該室之內且包括一衝擊線圈組件,較佳為一單匝衝擊線圈,其較佳為由一高電壓(約5至15 kV)電源(未顯示)所饋電。諸如氫氣(或其他適當的氣體熔合燃料)之中性氣體係經由一拉伐爾(Laval)噴嘴且透過直接氣體饋線而引入至電漿源。一旦氣體係發散自該噴嘴且分佈其本身於該衝擊線圈之線圈繞組的表面,該等繞組係激能。於低電感的衝擊線圈之超快速的電流與磁通上升(ramp-up)係導致於氣體之內的一極高電場,其引起所形成電漿之分解、離子化、與隨後的排出自該衝擊線圈的表面而朝向該室的中央或中間平面。In another preferred embodiment, an inductive plasma source can be mounted in the chamber and includes an impact coil assembly, preferably a single-turn impact coil, preferably from a high voltage (about 5 to 15). kV) Power (not shown) is fed. A neutral gas system such as hydrogen (or other suitable gas fused fuel) is introduced to the plasma source via a Laval nozzle and through a direct gas feed. Once the gas system diverges from the nozzle and distributes itself to the surface of the coil winding of the impact coil, the windings are energized. The ultra-fast current and flux-up of the low-inductance impact coil results in a very high electric field within the gas that causes decomposition, ionization, and subsequent discharge of the formed plasma. The surface of the impact coil faces the central or intermediate plane of the chamber.
於再一個較佳實施例中,一RF驅動器係包含一四極的迴旋加速器,其位在於該室之內且具有四個方位角對稱的電極及於其間的間隙。四極迴旋加速器係產生一電位波,其旋轉於如同離子之方位角速度的相同方向而為於一較大的速度。適當的速度之離子係可為捕獲於此波,且為週期性反射。此過程係增大燃料離子之動量與能量,且此增大係傳遞至其為並未由碰撞所捕獲之燃料離子。In still another preferred embodiment, an RF driver includes a quadrupole cyclotron positioned within the chamber and having four azimuthal symmetrical electrodes and a gap therebetween. A quadrupole cyclotron produces a potential wave that rotates in the same direction as the azimuthal angular velocity of the ions to a greater velocity. An ion system of appropriate velocity can capture this wave and be periodically reflected. This process increases the momentum and energy of the fuel ions, and this increase is transmitted to the fuel ions that are not captured by the collision.
於另一個實施例中,一種直接能量轉換系統係運用以直接轉換該熔合產物之動能至電力,藉由減速其通過電磁場之帶電荷的粒子。有利的是,本發明之直接能量轉換系統係具有效率、粒子能量容許度與電子式能力,以轉換約為5 MHz的熔合輸出功率之頻率與相位而匹配一外部的60赫茲功率柵極(power grid)之頻率。In another embodiment, a direct energy conversion system is utilized to directly convert the kinetic energy of the fused product to electrical power by decelerating the charged particles passing through the electromagnetic field. Advantageously, the direct energy conversion system of the present invention has efficiency, particle energy tolerance, and electronic capability to convert the frequency and phase of the fused output power of approximately 5 MHz to match an external 60 Hz power gate (power The frequency of the grid).
於一個較佳實施例中,該能量轉換系統係包含耦接至該熔合反應器的相對端之一逆向迴旋加速器轉換器(ICC,inverse cyclotron converter)。該種ICC係具有一中空圓柱狀的幾何結構,其形成自多個(較佳為四或多個)相等的半圓柱形之電極且具有延伸於其間之小的直線間隙。於操作時,一振盪的電位係以交替方式而施加至諸個電極。於ICC之內的電場E係具有一多極的結構且消失於對稱軸並隨著半徑而線性增大;峰值為於間隙。In a preferred embodiment, the energy conversion system includes an inverse cyclotron converter (ICC) coupled to an opposite end of the fusion reactor. The ICC system has a hollow cylindrical geometry formed from a plurality of (preferably four or more) equal semi-cylindrical electrodes and having a small linear gap extending therebetween. In operation, an oscillating potential is applied to the electrodes in an alternating manner. The electric field E within the ICC has a multi-pole structure and disappears from the axis of symmetry and increases linearly with radius; the peak is at the gap.
此外,該ICC係包括一磁場產生器,用於施加一均勻的單方向磁場於為實質相反於該熔合反應器之約束系統的施加磁場之一方向。於更為遠離熔合反應器電力核心之一端,該ICC係包括一離子收集器。於電力核心與ICC之間者係一對稱磁性尖端(cusp),其中,該約束系統之磁場係合併於該ICC之磁場。一環狀的電子收集器係定位於磁性尖端且電氣耦接至離子收集器。In addition, the ICC system includes a magnetic field generator for applying a uniform unidirectional magnetic field in a direction that is substantially opposite to the applied magnetic field of the restraint system of the fusion reactor. Further away from one end of the fusion reactor power core, the ICC system includes an ion collector. Between the power core and the ICC is a symmetric magnetic tip (cusp), wherein the magnetic field of the constrained system is incorporated into the magnetic field of the ICC. An annular electron collector is positioned at the magnetic tip and electrically coupled to the ion collector.
於又一個較佳實施例中,產物核子與電荷中性化的電子係以一密度自該反應器電力核心之二端而顯現為環狀束,於其中,磁性尖端係歸因於其能量差異而分離電子與離子。電子係依循磁場線至電子收集器且離子係通過該尖端,於其中,離子軌跡係修正以依循其沿著ICC的長度之一實質為螺旋狀的路徑。能量係隨著離子為螺旋通過其為連接至一共振電路之電極而移除自該等離子。垂直的能量之損耗係針對於其初始為循環接近電極(於其的電場為最強)之最高能量的離子而傾向為最大。In yet another preferred embodiment, the product nucleus and the charge-neutralized electron system appear as a circular bundle at a density from both ends of the reactor power core, wherein the magnetic tip is attributed to its energy difference And separate electrons and ions. The electrons follow the magnetic field lines to the electron collector and the ions pass through the tip where the ion trajectory is modified to follow a substantially helical path along one of the lengths of the ICC. The energy system is removed from the plasma as it is a helix through which it is connected to an electrode of a resonant circuit. The loss of vertical energy tends to be maximal for ions that are initially the highest energy of the circulating proximity electrode (where the electric field is the strongest).
本發明之其他的觀點與特點係考量其連同於伴隨圖式之下文的說明而將成為顯明。Other aspects and features of the present invention will be apparent from the description of the accompanying drawings.
如於圖式所示,本發明之一種電漿電力產生(PEG)系統係較佳為包括其耦接至一種直接能量轉換系統之一碰撞束熔合反應器(CBFR,colliding beam fusion reactor)。如上所述,一種理想的熔合反應器係解決針對於離子與電子之異常遷移的問題。針對於本文所指出之異常遷移的問題之解決方式係利用一種約束系統,其具有一種場反轉架構(FRC)之一磁場。離子之異常遷移係藉由於FRC之磁性約束而避免,俾使大多數的離子係具有大、非緩漸(non-adiabatic)的軌道,使得其為不靈敏於其致使緩漸的離子之異常遷移的短波長變動。尤其,磁場為消失於其之FRC的一區域之存在係使得可能具有其包含大多數為非緩漸的離子之一電漿。針對於電子,能量之異常遷移係藉由調整外部施加的磁場以發展一強的電場而避免,將其靜電約束於一深電位井。As shown in the drawings, a plasma power generation (PEG) system of the present invention preferably includes a CBFR (colliding beam fusion reactor) coupled to a direct energy conversion system. As mentioned above, an ideal fusion reactor solves the problem of abnormal migration of ions and electrons. A solution to the problem of abnormal migration as noted herein is to utilize a constrained system having a magnetic field of one of the field inversion architectures (FRC). The anomalous migration of ions is avoided by the magnetic constraints of FRC, which causes most ion systems to have large, non-adiabatic orbitals, making them non-sensitive to the abnormal migration of ions. Short wavelength variation. In particular, the presence of a magnetic field in a region of the FRC that disappears therefrom makes it possible to have a plasma containing one of the most non-gradual ions. For electrons, the abnormal migration of energy is avoided by adjusting the externally applied magnetic field to develop a strong electric field, and confining its static electricity to a deep potential well.
可運用於此種約束裝置與處理的熔合燃料電漿係不限於中子燃料,諸如:氘-氘(D-D,Deuterium-Deuterium)或氘-氚(D-T,Deuterium-Tritium),而且亦有利為包括先進或無中子的燃料,諸如:氘-氦3 (D-He3 ,Deuterium-helium-3)或氫-硼1 1 (p-B1 1 ,hydrogen-Boron-11)。(針對於先進的燃料之一論述,參閱:R.Feldbacher & M.Heindler,Nuclear Instruments and Methods in Physics Research ,A271(1988)JJ-64(North Holland Amsterdam)。)針對於該等無中子的燃料,熔合反應能量係幾乎整體為帶電荷的粒子之形式,即:高能的離子,其可操縱於一磁場且取決於燃料而引起少或無放射性。D-He3 反應係產生一H離子與一He4 離子以及18.2 MeV能量,而p-B1 1 反應係產生三個He4 離子與8.7 MeV能量。基於針對於其利用無中子燃料的一熔合裝置之理論模型化,輸出能量轉換效率係可高為如約90%,舉例而言,如由K.Yoshikawa,T.Noma與Y.Yamamoto所述於Fusion Technology,19,870(1991)。該等效率係顯著增進針對於無中子燃料之期望於可擴充(1-1000 MW)、微型、低成本的架構。The fused fuel plasma that can be used in such restraining devices and processes is not limited to neutron fuels, such as: D-D, Deuterium-Deuterium or D-T, Deuterium-Tritium, and also advantageously include advanced fuels or no neutrons, such as: deuterium - helium 3 (D-He 3, deuterium -helium-3) or hydrogen - boron 1 1 (p-B 1 1 , hydrogen-boron-11). (For a discussion of advanced fuels, see: R. Feldbacher & M. Heindler, Nuclear Instruments and Methods in Physics Research , A271 (1988) JJ-64 (North Holland Amsterdam).) for such neutronless The fuel, fusion reaction energy is almost entirely in the form of charged particles, ie high energy ions that can be manipulated in a magnetic field and that cause little or no radioactivity depending on the fuel. The D-He 3 reaction produces one H ion and one He 4 ion and 18.2 MeV energy, while the p-B 1 1 reaction produces three He 4 ions and 8.7 MeV energy. Based on theoretical modeling of a fusion device utilizing neutron-free fuel, the output energy conversion efficiency can be as high as about 90%, for example, as described by K. Yoshikawa, T. Noma, and Y. Yamamoto. In Fusion Technology, 19, 870 (1991). These efficiencies significantly increase the desire for scalable (1-1000 MW), micro, low cost architectures for neutron-free fuels.
於本發明之一種直接能量轉換處理,熔合產物之帶電荷的粒子係可為減速且其動能為直接轉換至電力。有利的是,本發明之直接能量轉換系統係具有效率、粒子能量的容許度與電子式能力,以轉換約5 MHz的熔合輸出功率之頻率與相位而匹配一外部的60赫茲功率柵極之頻率。In a direct energy conversion process of the present invention, the charged particle system of the fused product can be decelerated and its kinetic energy is directly converted to electricity. Advantageously, the direct energy conversion system of the present invention has efficiency, particle energy tolerance, and electronic capability to convert the frequency and phase of the fused output power of about 5 MHz to match the frequency of an external 60 Hz power gate. .
第1圖係說明根據本發明之一種約束系統300的一個較佳實施例。約束系統300係包含一室壁305,於其係界定一約束室310。較佳而言,室310係形狀為圓柱形,且具有沿著該室310之中心的主軸315。針對於此約束系統300之應用至一熔合反應器,於室310之內必要建立一真空或接近真空。定位於室310之內的一貝他加速器(betatron)磁通線圈320係同心於主軸315。貝他加速器磁通線圈320係包含一電流承載媒介,其為適以指引電流於一長線圈,如圖所示,其較佳為包含多個單獨線圈之平行繞組,且最佳為約四個單獨線圈之平行繞組,以形成一長線圈。熟悉此技藝人士係將理解的是:通過貝他加速器磁通線圈320之電流係將造成於該貝他加速器磁通線圈320之內側的一磁場,實質為於主軸315之方向。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 illustrates a preferred embodiment of a restraint system 300 in accordance with the present invention. The restraint system 300 includes a chamber wall 305 that defines a restraint chamber 310. Preferably, the chamber 310 is cylindrical in shape and has a major axis 315 along the center of the chamber 310. For the application of the restraint system 300 to a fusion reactor, a vacuum or near vacuum must be established within the chamber 310. A betatron flux coil 320 positioned within chamber 310 is concentric with spindle 315. The beta accelerator flux coil 320 comprises a current carrying medium adapted to direct current to a long coil, as shown, preferably comprising parallel windings of a plurality of individual coils, and preferably about four The parallel windings of the individual coils form a long coil. It will be understood by those skilled in the art that the current through the beta accelerator flux coil 320 will cause a magnetic field inside the beta accelerator flux coil 320 to be substantially in the direction of the spindle 315.
一外線圈325係繞於室壁305之外側。外線圈325係產生一相當固定的磁場,其具有實質為平行於主軸315之磁通。此磁場係方位角為對稱。歸因於外線圈325之磁場為固定且平行於軸315之近似者係最為有效於遠離室310之二端。於室310之各端係一鏡式(mirror)線圈310。鏡式線圈310係適以產生於室310之內側的一增大磁場於各端,因而朝內彎曲於各端的磁場線。(參閱第3與5圖。)如所解說,磁場線之此朝內彎曲係有助於約束電漿335於室310之內的一約束區域(概括為於鏡式線圈330之間),藉由驅使其為遠離將漏出約束系統300之二端。鏡式線圈330係可適以產生一增大的磁場於二端,藉由習知於此技藝之種種的方法,包括:增大於鏡式線圈330之繞組的數目、增大通過鏡式線圈330之電流、或重疊鏡式線圈330與外線圈325。An outer coil 325 is wound around the outer side of the chamber wall 305. The outer coil 325 produces a relatively fixed magnetic field having a magnetic flux substantially parallel to the main axis 315. This magnetic field has an azimuth of symmetry. The approximated magnetic field due to the outer coil 325 being fixed and parallel to the axis 315 is most effective away from the two ends of the chamber 310. At each end of the chamber 310 is a mirror coil 310. The mirror coil 310 is adapted to generate an increasing magnetic field on the inner side of the chamber 310 at each end, thereby bending the magnetic field lines at each end inward. (See Figures 3 and 5.) As illustrated, the inward bending of the magnetic field lines helps confine the constrained regions of the plasma 335 within the chamber 310 (summarized between the mirror coils 330). Driven away from it will leak out of the two ends of the restraint system 300. The mirror coil 330 is adapted to generate an increased magnetic field at both ends, by various methods of the art, including: increasing the number of windings of the mirror coil 330, increasing through the mirror coil 330 The current, or overlapping mirror coil 330 and outer coil 325.
外線圈325與鏡式線圈310係顯示於第1圖為實施在室壁305之外側;然而,其可為在室壁305之內側。假使室壁305係由諸如金屬之一種傳導材料所構成,可為有利以置放線圈325、330於室壁305之內側,因為針對於磁場擴散通過壁305所耗費的時間係可能為相當大且因而致使該系統300為遲緩反應。同理,室310係可為一中空圓柱之形狀,室壁305係形成一長的環狀圓環。於該種情形,貝他加速器磁通線圈320係可實施在環狀圓環之中央的室壁305之外側。較佳而言,形成該環狀圓環之中央的內壁係可包含一非傳導的材料,諸如:玻璃。如將成為顯明,室310係必須為充分的尺寸與形狀以允許循環的電漿束或層335於一給定的半徑而旋轉為繞於主軸315。The outer coil 325 and the mirror coil 310 are shown on the outer side of the chamber wall 305 in Fig. 1; however, they may be on the inner side of the chamber wall 305. If the chamber wall 305 is constructed of a conductive material such as metal, it may be advantageous to place the coils 325, 330 on the inside of the chamber wall 305, as the time it takes for the magnetic field to diffuse through the wall 305 may be quite large and This causes the system 300 to be a slow response. Similarly, the chamber 310 can be in the shape of a hollow cylinder, and the chamber wall 305 forms a long annular ring. In this case, the beta accelerator flux coil 320 can be implemented on the outside of the chamber wall 305 at the center of the annular ring. Preferably, the inner wall forming the center of the annular ring may comprise a non-conductive material such as glass. As will be apparent, chamber 310 must be of sufficient size and shape to allow the circulating plasma beam or layer 335 to rotate about a major axis 315 at a given radius.
室壁305係可由其具有高導磁性之一種材料所構成,諸如:鋼。於該種情形,歸因於該材料之感應的逆電流,室壁305係有助於保持磁通為免於漏出該室310,即:將其“壓制(compressing)”。若室壁為由具有低導磁性之一種材料所作成,諸如:有機玻璃(plexiglass),則用於約束磁通之另一個裝置係將為必要。於該種情形,一系列之閉迴路、扁平的金屬環係可為提供。於此技藝為習稱作磁通限定器(delimiter)之此等環係將為提供於外線圈325之內而在循環電漿束335之外側。再者,此等磁通限定器係可為被動式或主動式,其中,主動式磁通限定器係將為藉著一預定的電流而驅動,以更為促使磁通之約束於室310之內。或者是,外線圈325其本身係可作為磁通限定器。The chamber wall 305 can be constructed of a material that has high magnetic permeability, such as steel. In this case, the chamber wall 305 helps to keep the magnetic flux from leaking out of the chamber 310 due to the induced reverse current of the material, i.e., "compressing" it. If the chamber wall is made of a material having low magnetic permeability, such as plexiglass, another device for constraining the magnetic flux would be necessary. In this case, a series of closed loop, flat metal ring systems can be provided. Such a ring system, known in the art as a flux limiter, will be provided within outer coil 325 on the outside of circulating plasma beam 335. Furthermore, the flux limiters can be passive or active, wherein the active flux limiter will be driven by a predetermined current to further confine the flux to the chamber 310. . Alternatively, the outer coil 325 itself may act as a flux limiter.
如更為詳細解說於後文,包含帶電荷的粒子之一循環電漿束335係可藉由其歸因於外線圈325之磁場所引起的勞倫茲力(Lorentz force)而約束於室310之內。如此,於電漿束335之離子係磁性約束於自外線圈325的磁通線之大的貝他加速器軌道,其為平行於主軸315。一或多個注入埠340係亦為提供以加入電漿離子至於室310之循環電漿束335。於一個較佳實施例,注入埠340係適以注入一離子束於該循環電漿束335為約束於其之自該主軸315的大約相同徑向位置(即:約於下述之一零位(null)表面)。再者,注入埠340係適以注入其為正切至且為於約束電漿束335之貝他加速器軌道的方向之離子束350(參閱第17圖)。As explained in more detail below, one of the charged plasma beams 335 containing the charged particles can be bound to the chamber 310 by its Lorentz force due to the magnetic field of the outer coil 325. within. As such, the ion system at the plasma beam 335 is magnetically constrained to the beta accelerator track that is large from the flux line of the outer coil 325, which is parallel to the major axis 315. One or more injection ports 340 are also provided with a circulating plasma beam 335 that is added to the plasma ions to chamber 310. In a preferred embodiment, the implant 340 is adapted to implant an ion beam into the circulating plasma beam 335 at about the same radial position from the spindle 315 (ie, about one of the following zero positions). (null) surface). Further, the implant 340 is adapted to inject an ion beam 350 that is tangential to and constrains the direction of the beta accelerator track of the plasma beam 335 (see Figure 17).
一或多個背景電漿源345係亦設置為用於注入一雲狀之非高能(non-energetic)的電漿至室310。於一個較佳實施例中,背景電漿源345係適以指引電漿335為朝向室310之軸向的中心。已經得知的是:以此方式指引電漿係有助於較佳約束電漿335且導致一較高密度之電漿335於室310之內的約束區域。One or more background plasma sources 345 are also provided for injecting a cloud of non-energetic plasma into chamber 310. In a preferred embodiment, the background plasma source 345 is adapted to direct the plasma 335 to the center of the axial direction of the chamber 310. It has been known that directing the plasma system in this manner helps to better constrain the plasma 335 and results in a higher density plasma 335 within the confinement region within the chamber 310.
如上所述,一CBFR之約束系統的應用,必要為建立一真空或接近真空於該室之內側。由於介於中性者與電漿燃料之間的相互作用(濺射、電荷交換)係總是呈現一能量損耗途徑,限制於該反應器室之剩餘的密度係重要。甚者,由於不良抽真空之室所造成的雜質係將導致污染於操作期間之副反應,且由於系統係必須燃燒此等剩餘者而將汲取一過量的能量於起始期間。As mentioned above, the application of a CBFR restraint system necessitates establishing a vacuum or near vacuum on the inside of the chamber. Since the interaction between the neutral and the plasma fuel (sputtering, charge exchange) always presents an energy loss path, the remaining density limited to the reactor chamber is important. Moreover, impurities due to poor vacuuming chambers will cause contamination of side reactions during operation, and an excess of energy will be drawn during the initial period as the system must burn the remainder.
欲達成一良好階層的真空,通常為涉及不銹鋼的室與埠以及低除氣(outgassing)材料之運用。以金屬之情形而論,良好的真空性質係進而為匹配於良好的結構特性。然而,諸如不銹鋼與類似者之傳導材料係呈現相關於其電氣性質之種種問題。雖然此等負面效應係均為連結,其顯現於不同的方式。於最為負面的特性係:透過室壁的磁場之遲緩的擴散、於表面的電荷之累積、系統對於暫態訊號的響應時間之徹底變更以及其影響期望的磁性拓撲之於表面的影像電流之形成。不具有此等不期望的特定且表面良好的真空性質之材料係絕緣體,諸如:陶瓷、玻璃、石英、及一較低程度的碳纖維。關於此等材料之主要問題係結構的整合性以及針對於意外損壞之潛在性。諸如陶瓷之不良的加工能力之製造問題係更進一步的限制。To achieve a good class of vacuum, it is usually the use of chambers and crucibles involving stainless steel and low outgassing materials. In the case of metals, good vacuum properties are in turn matched to good structural properties. However, conductive materials such as stainless steel and the like present various problems associated with their electrical properties. Although these negative effects are all linked, they appear in different ways. The most negative characteristics are: the slow diffusion of the magnetic field through the chamber wall, the accumulation of charge on the surface, the complete change of the response time of the system to the transient signal, and the formation of the image current that affects the desired magnetic topology on the surface. . Materials that do not have such undesired specific and well-surfaced vacuum properties are insulators such as ceramic, glass, quartz, and a lower degree of carbon fiber. The main problem with these materials is the structural integrity and potential for accidental damage. Manufacturing problems such as poor processing capabilities of ceramics are further limiting.
於一個實施例中,如於第2A、2B、2C、與2D圖所繪出,一種替代的室1310係提出以使得此等問題為最小。CBFR之室1310係較佳為主要由一種金屬所組成,較佳為不銹鋼或類似者,以提供結構的強度與良好的真空性質。然而,室1310之圓柱壁1311係包括於該壁1311之軸向的絕緣斷流器(break)1360,其延伸沿著幾乎為室1310之整個長度且於室1310之中央部分或CBFR之電力核心區域。較佳而言,如於第2B圖所繪出,具有彼此分開為約120度之三個斷流器1360。如於第2C圖所繪出,斷流器1360係包括於室1310之壁1311的一槽或間隙1362及其形成於槽1362之周邊的一密封溝或座1369。一O形環密封1367係收納於溝1369。如於第2D圖所繪出,槽1362係延伸幾乎為室1310之整個長度而保留充分的不銹材料以形成其靠近二端之壁1311的一方位角連續部分,以提供結構的整體性且允許良好品質的真空座於二端。針對於改良結構整體性與防止向內破裂(implosion),如於第2A圖所繪出,室1310係較佳為包括複數組之部分方位角的肋部1370,其為整體形成於室壁1311或藉由焊接或類似者而耦接至室壁1311之表面。In one embodiment, as depicted in Figures 2A, 2B, 2C, and 2D, an alternative chamber 1310 is proposed to minimize such problems. The CBFR chamber 1310 is preferably comprised primarily of a metal, preferably stainless steel or the like, to provide structural strength and good vacuum properties. However, the cylindrical wall 1311 of the chamber 1310 includes an insulating break 1360 in the axial direction of the wall 1311 that extends along the entire length of the chamber 1310 and in the central portion of the chamber 1310 or the power core of the CBFR. region. Preferably, as depicted in Figure 2B, there are three current interrupters 1360 separated from each other by about 120 degrees. As depicted in FIG. 2C, the current interrupter 1360 includes a slot or gap 1362 in the wall 1311 of the chamber 1310 and a sealing groove or seat 1369 formed in the periphery of the slot 1362. An O-ring seal 1367 is received in the groove 1369. As depicted in FIG. 2D, the groove 1362 extends substantially the entire length of the chamber 1310 while retaining sufficient stainless material to form an azimuthal continuous portion of the wall 1311 adjacent the ends thereof to provide structural integrity and Allow a good quality vacuum to sit on both ends. For improving structural integrity and preventing inward rupture, as depicted in FIG. 2A, chamber 1310 is preferably a rib 1370 comprising a plurality of azimuthal angles of a complex array that is integrally formed on chamber wall 1311. Or coupled to the surface of the chamber wall 1311 by welding or the like.
如於第2C圖所繪出,間隙1362係填充由陶瓷材料所形成之一插入物1364。插入物1364係稍微延伸至室1310之內部且為由一金屬罩蓋1366而覆蓋於內側,以防止自循環電漿束的主要電漿離子與陶瓷材料之碰撞的次要電漿發射。於室1310之外側,插入物1364係附接至一密封面板1365,其藉由一O形環密封1367與室壁1311之一不銹鋼的表面而形成一真空障壁。欲保持期望的真空性質,密封面板1365係較佳為由一基板所形成,較佳為玻璃纖維或類似者,其較為可撓且建立與O形環密封1367之一較為緊密的密封,相較於一陶瓷材料所將為者,尤其是當向內的壓力為稍微變形該室1310。As depicted in Figure 2C, the gap 1362 is filled with an insert 1364 formed of a ceramic material. The insert 1364 extends slightly into the interior of the chamber 1310 and is covered on the inside by a metal cover 1366 to prevent secondary plasma emission from the collision of the primary plasma ions of the circulating plasma beam with the ceramic material. On the outside of the chamber 1310, the insert 1364 is attached to a sealing panel 1365 which forms a vacuum barrier by an O-ring seal 1367 and a stainless steel surface of the chamber wall 1311. To maintain the desired vacuum properties, the sealing panel 1365 is preferably formed from a substrate, preferably fiberglass or the like, which is relatively flexible and provides a relatively tight seal with one of the O-ring seals 1367. This will be the case for a ceramic material, especially when the inward pressure is slightly deformed by the chamber 1310.
於槽1362之內側的插入物或陶瓷絕緣體1364係較佳防止電流為跨於間隙1362,且因此防止方位角影像電流之形成於室壁1311。影像電流係楞次定律(Lenz’s Law)之一明示,其為自然傾向以抵制於磁通之任何變化:舉例而言,於一FRC之形成期間而發生於磁通線圈1320之磁通變化,如後所述。若不具有槽1362於室1310之圓柱壁1311,於磁通線圈1320之變化的磁通係引起一相等且相反感應式的感應電流以形成於不銹鋼的壁1311,藉以抵消於室1310之內側的磁通變化。儘管感應的影像電流係相較於其施加至磁通線圈1320之電流而將為較弱(歸因於感應損耗),影像電流係傾向為強烈降低於室1310之內的施加或約束磁場,其當未指明時而傾向為負面影響磁場拓撲且變更於室1310之內側的約束特性。槽1362之存在係防止方位角影像電流為形成於壁1311而朝向室1310的中間平面且遠離室1310的二端之於壁1311的方位角連續部分。可為由室壁1311所承載朝向中間平面而遠離室1310的二端之僅有影像電流係極弱的電流,其流通為平行於槽1362之縱軸。該等電流係不具有影響於FRC之軸向的磁性約束場,由於縱向通過室壁1311之影像電流所產生的磁性影像場係僅呈現徑向與方位角的分量。於靠近室1310的二端之壁1311的方位角連續傳導部分所形成之方位角影像電流係傾向為並未負面影響及/或變更於室1310之內側的約束特性,由於此鄰近處之磁性的拓撲係對於電漿之約束為不重要。The insert or ceramic insulator 1364 on the inside of the slot 1362 preferably prevents current from flowing across the gap 1362 and thus prevents azimuthal image current from forming on the chamber wall 1311. One of the image current systems Lenz's Law states that it is a natural tendency to resist any change in magnetic flux: for example, a change in the magnetic flux that occurs in the flux coil 1320 during the formation of an FRC, such as Said later. Without the slot 1362 in the cylindrical wall 1311 of the chamber 1310, the varying magnetic flux at the flux coil 1320 causes an equal and opposite inductive induced current to form on the wall 1311 of the stainless steel, thereby counteracting the inside of the chamber 1310. Flux changes. Although the induced image current will be weaker (due to inductive losses) than the current applied to the flux coil 1320, the image current tends to be strongly reduced or applied to the chamber 1310. When not specified, it tends to be a constraint characteristic that negatively affects the magnetic field topology and changes to the inside of the chamber 1310. The presence of the slot 1362 prevents the azimuth image current from being a continuous portion of the azimuth angle formed on the wall 1311 toward the median plane of the chamber 1310 and away from the two ends of the chamber 1310 to the wall 1311. The only image current that is carried by the chamber wall 1311 toward the intermediate plane and away from the two ends of the chamber 1310 is extremely weak, and the current flows parallel to the longitudinal axis of the slot 1362. The current systems do not have a magnetic confinement field that affects the axial direction of the FRC, since the magnetic image field generated by the image current flowing longitudinally through the chamber wall 1311 exhibits only radial and azimuthal components. The azimuthal image current system formed by the azimuthal continuous conducting portion of the wall 1311 near the two ends of the chamber 1310 tends to have a confinement characteristic that does not adversely affect and/or is altered to the inside of the chamber 1310 due to the magnetic properties of the adjacent portion. The topology is not important for the constraints of the plasma.
除了防止方位角影像電流之形成於室壁1311,槽1362係提供針對於自場線圈1325與鏡式線圈1330的磁通之一途徑以於一快速的期間而穿透該室1310。結果,槽1362係致能所施加磁場之毫秒階層的微調與反饋控制。In addition to preventing azimuthal image current from being formed in chamber wall 1311, slot 1362 provides one of the fluxes for self-field coil 1325 and mirror coil 1330 to penetrate chamber 1310 for a rapid period of time. As a result, slot 1362 is a fine-tuning and feedback control that enables the millisecond level of the applied magnetic field.
第3圖係顯示一種場反轉架構(FRC)70之磁場。系統係具有關於其軸78之圓柱的對稱性。於該FRC中,具有磁場線之二個區域:開放區域80與閉合區域82。分割該二個區域之表面係稱為分界面84。該FRC係形成磁場為消失於其之一圓柱零位表面86。於該FRC之中央部分88,磁場係並未可察覺為改變於軸向方向。於末端90處,磁場係可察覺為改變於軸向方向。沿著中心軸78之磁場係反轉於FRC之方向,其導致於場反轉架構(FRC)之術語“反轉”。Figure 3 shows the magnetic field of a field reversal architecture (FRC) 70. The system has symmetry about the cylinder of its axis 78. In the FRC, there are two regions of magnetic field lines: an open region 80 and a closed region 82. The surface that divides the two regions is referred to as interface 84. The FRC system forms a magnetic field that disappears from one of the cylindrical zero surface 86. In the central portion 88 of the FRC, the magnetic field system is not noticeable to change in the axial direction. At the end 90, the magnetic field is perceived to change in the axial direction. The magnetic field along the central axis 78 is reversed in the direction of the FRC, which results in the term "reverse" of the field inversion architecture (FRC).
於第4A圖,於零位表面94之外側的磁場係於一第一方向96。於零位表面94之內側的磁場係於相反於第一方向之一第二方向98。若一離子係移動於方向100,作用於其之勞倫茲力30係指向朝向零位表面94。此係藉由應用右手法則而容易理解。針對於其移動於反磁(diamagnetic)方向102之粒子,勞倫茲力係總是指向朝向零位表面94。此種現象係導致其稱為貝他加速器軌道之一種粒子軌道,其將描述於後文。In FIG. 4A, the magnetic field on the outer side of the zero surface 94 is in a first direction 96. The magnetic field on the inside of the zero surface 94 is in a second direction 98 opposite one of the first directions. If an ion system moves in direction 100, the Lorentz force 30 acting on it is directed toward the zero surface 94. This is easy to understand by applying the right-hand rule. For particles that move in the diamagnetic direction 102, the Lorentz force is always directed toward the zero surface 94. This phenomenon results in a particle orbit known as the beta accelerator track, which will be described later.
第4B圖係顯示其移動於逆向反磁方向104之一離子。於此情形之勞倫茲力係指向為遠離零位表面94。此種現象係導致其稱為一漂移軌道之一種型式的軌道而將描述於後文。針對於離子之反磁方向係針對於電子之逆向反磁方向,且反之亦然。Figure 4B shows one of the ions moving in the reverse diamagnetic direction 104. The Lorentz force in this case is directed away from the zero surface 94. This phenomenon is caused by a type of track called a drift orbit and will be described later. The diamagnetic direction for the ions is directed to the reverse diamagnetic direction of the electrons, and vice versa.
第5圖係顯示一環狀的電漿層106,其為旋轉於離子之反磁方向102。該環狀者106係位在環繞於零位表面86。由環狀電漿層106所建立之磁場108係結合於一外部施加的磁場110而形成其具有FRC拓撲(該拓撲為顯示於第3圖)之一磁場。Figure 5 shows an annular plasma layer 106 that is rotated in the diamagnetic direction 102 of the ions. The ring 106 is positioned around the zero surface 86. The magnetic field 108 established by the annular plasma layer 106 is coupled to an externally applied magnetic field 110 to form a magnetic field having an FRC topology (which is shown in Figure 3).
形成電漿層106之離子束係具有一溫度;因此,離子之速度係形成一馬克士威(Maxwell)分佈於其旋轉於離子束之平均角速度的一框架(frame)。於不同速度的離子之間的碰撞係導致熔合反應。針對於此理由,電漿束層或電力核心106係稱為一種碰撞束系統。The ion beam system forming the plasma layer 106 has a temperature; therefore, the velocity of the ions forms a frame in which Maxwell is distributed over the average angular velocity of the ion beam. Collisions between ions at different velocities result in a fusion reaction. For this reason, the plasma beam layer or power core 106 is referred to as a collision beam system.
第6圖係顯示於一種碰撞束系統之主要型式的離子軌道,其稱為一貝他加速器軌道112。一貝他加速器軌道112係可表示為其中心於零位圓114之一正弦波。如上所述,於零位圓114之磁場係消失。軌道112之平面係垂直於FRC之軸78。於此軌道112之離子係自一起始點116而移動於其反磁方向102。於一貝他加速器軌道之一離子係具有二個運動:於徑向方向(垂直於零位圓114)之一振盪、以及沿著零位圓114之一平移。Figure 6 is a diagram showing the main type of ion trajectory of a collision beam system, referred to as a beta accelerator track 112. A beta accelerator track 112 can be represented as a sine wave centered on one of the zero circles 114. As described above, the magnetic field at the zero circle 114 disappears. The plane of the track 112 is perpendicular to the axis 78 of the FRC. The ions of this track 112 move from a starting point 116 to their diamagnetic direction 102. The ion system of one of the beta accelerator rails has two motions: oscillating in one of the radial directions (perpendicular to the zero circle 114) and translation along one of the zero circles 114.
第7A圖係於一FRC之磁場118的圖表。該圖表之水平軸係代表自FRC軸78之距離(以公分為單位)。該磁場之單位係千高斯。如圖所繪,磁場118係消失於零位圓半徑120。Figure 7A is a diagram of a magnetic field 118 of an FRC. The horizontal axis of the graph represents the distance (in centimeters) from the FRC axis 78. The unit of the magnetic field is kilogauss. As depicted, the magnetic field 118 disappears from the zero circle radius 120.
如於第7B圖所示,移動接近零位圓之一粒子係將看出指向遠離零位表面86的磁場之一梯度126。在零位圓之外側的磁場係於一第一方向122,而在零位圓之內側的磁場係於相反於第一方向之一第二方向124。一梯度漂移之方向係由叉乘積×▽B 所給定,其中,▽B 係磁場之梯度;因此,藉由應用右手法則而可為理解的是:梯度漂移之方向為於逆向反磁(counterdiamagnetic)的方向,無論該離子為於零位圓128之外側或內側。As shown in FIG. 7B, moving one particle system near the zero circle will see a gradient 126 of the magnetic field pointing away from the zero surface 86. The magnetic field on the outer side of the zero circle is in a first direction 122, and the magnetic field on the inner side of the zero circle is in a second direction 124 opposite one of the first directions. Cross product ×▽ B is given, where ▽ B is the gradient of the magnetic field; therefore, by applying the right-hand rule, it can be understood that the direction of the gradient drift is in the direction of the counterdiamagnetic, regardless of whether the ion is The zero circle 128 is outside or inside.
第8A圖係於一FRC之電場130的圖表。該圖表之水平軸係代表自FRC軸78之距離(以公分為單位)。該電場之單位係伏特/公分。如圖所繪,電場130係消失接近於零位圓半徑120。Figure 8A is a diagram of an electric field 130 of an FRC. The horizontal axis of the graph represents the distance (in centimeters) from the FRC axis 78. The unit of the electric field is volts/cm. As depicted, the electric field 130 disappears close to the zero circle radius 120.
如於第8B圖所示,針對於離子之電場係解除約束;其指向於遠離零位表面86之方向132、134。如前,磁場係於零位表面86之內側與外側的相反方向122、124。藉由應用右手法則而可為理解的是:×漂移之方向為於反磁方向102,無論該離子為於零位表面136之外側或內側。As shown in FIG. 8B, the electric field for the ions is unconstrained; it is directed away from the direction 132, 134 of the zero surface 86. As before, the magnetic field is in the opposite direction 122, 124 between the inside and the outside of the zero surface 86. It can be understood by applying the right-hand rule: × The direction of the drift is in the diamagnetic direction 102, whether the ion is on the outside or inside of the zero surface 136.
第9A與9B圖係顯示於一FRC之另一型式的常見軌道,其稱為一漂移軌道138。漂移軌道138係可於零位表面114之外側,如於第9A圖所示,或於其內側,如於第9B圖所示。若×漂移係支配,漂移軌道138係旋轉於反磁方向,或是若梯度漂移係支配,則為於逆向反磁方向。於第9A與9B圖所示之漂移軌道138係自起始點116而旋轉於反磁方向102。Figures 9A and 9B are diagrams showing another type of common track of an FRC, which is referred to as a drift track 138. The drift track 138 can be on the outer side of the zero surface 114, as shown in Figure 9A, or on the inside thereof, as shown in Figure 9B. If × The drift system dominates, the drift track 138 rotates in the diamagnetic direction, or if the gradient drift dominates, it is in the reverse diamagnetic direction. The drift track 138 shown in Figures 9A and 9B is rotated from the starting point 116 in the diamagnetic direction 102.
如於第9C圖所示,一漂移軌道係可視為滾動於一相對較大圓之一小圓。小圓142係旋轉繞於意義上之其軸144。其亦為以方向102而滾動於大圓146。點140係將追蹤於空間之一路徑,類似於138。As shown in Figure 9C, a drift track can be viewed as a small circle that rolls over a relatively large circle. The small circle 142 is rotated about its axis 144 in the sense. It also scrolls in the direction 102 to the great circle 146. Point 140 will track one of the paths in space, similar to 138.
第10A與10B圖係顯示於一FRC 151之二端的勞倫茲力之方向。於第10A圖,一離子係顯示為於反磁方向102之一速度148而移動於一磁場150。應用右手法則而可理解的是:勞倫茲力152係傾向以將離子為推回至閉合的場線之區域。因此,於此情形,勞倫茲力152係約束離子。於第10B圖,一離子係顯示為於逆向反磁方向之一速度148而移動於一磁場150。應用右手法則而可理解的是:勞倫茲力152係傾向以將離子為推動至開放的場線之區域。因此,於此情形,勞倫茲力152係解除約束離子。Figures 10A and 10B are shown in the direction of the Lorentz force at the end of a FRC 151. In FIG. 10A, an ion system is shown moving to a magnetic field 150 at a velocity 148 in the diamagnetic direction 102. It is understandable to apply the right-hand rule that the Lorentz force 152 system tends to push the ions back to the area of the closed field line. Therefore, in this case, the Lorentz force 152 is a constraining ion. In Fig. 10B, an ion system is shown moving to a magnetic field 150 at a speed 148 in the reverse diamagnetic direction. It is understandable to apply the right-hand rule that the Lorentz force 152 system tends to push ions to the region of the open field line. Therefore, in this case, the Lorentz force 152 system releases the restraining ions.
一電漿層106(參閱第5圖)係可形成於一FRC,藉由以離子之反磁方向102而注入高能的離子束為環繞於零位表面86。(形成FRC與電漿環之不同方法的詳細論述係如後。)於循環的電漿層106,大多數的離子係具有貝他加速器軌道112(參閱第6圖)係高能且為非緩漸;因此為不靈敏於其引起異常遷移之短波長的變動。A plasma layer 106 (see FIG. 5) can be formed in an FRC that surrounds the zero surface 86 by implanting a high energy ion beam in the diamagnetic direction 102 of the ion. (The detailed discussion of the different methods of forming the FRC and the plasma ring is as follows.) In the circulating plasma layer 106, most of the ion systems have a beta accelerator track 112 (see Figure 6) that is high energy and non-slow. Therefore, it is not sensitive to the short wavelength variation that causes abnormal migration.
於其形成於一FRC且在平衡條件之下的一電漿層106,動量不滅原理係採用於離子的角速度ω i
與電子的角速度ω e
之間的一關係。該關係為:
因為電漿層106係藉由注入離子束至FRC而形成,離子的角速度ω i
係藉由該束之注入的動能Wi
所決定,動能Wi
係給定為:
針對於束之一固定注入速度(ωi
),施加的磁場B0
係可調整以使得不同諸值之ωe
為可得到。如將顯示,調整外部的磁場B0
亦導致不同諸值之電場於電漿層之內側。本發明之此特徵係說明於第11A與11B圖。第11A圖係顯示針對於相同的注入速度ωi
=1.35×107
s- 1
而且針對於三個不同值的施加磁場B0
所得到之電場(單位為於伏特/公分)的三個曲線圖:
於上列表格之ωe 的諸值係根據式(1)所決定。可為理解的是:於式(1)之ωe >0係意指Ω0 >ωi ,使得電子為旋轉於其逆向反磁方向。第11B圖係顯示針對於相同組之諸值的B0 與ωe 之電位(以伏特為單位)。於第11A與11B圖之水平軸係代表自該FRC軸78之距離,以單位為公分而顯示於該圖表。該電場與電位係強烈取決於ωe 。The values of ω e in the upper list are determined according to equation (1). It can be understood that ω e >0 in equation (1) means Ω 0 >ω i such that the electrons are rotated in their reverse diamagnetic directions. Figure 11B shows the potential (in volts) for B 0 and ω e for the values of the same group. The horizontal axis of Figures 11A and 11B represents the distance from the FRC axis 78 and is shown in the chart in centimeters. The electric field and potential are strongly dependent on ω e .
以上結果係可於簡單物理基礎而解說。當離子係旋轉於反磁方向,離子係藉由勞倫茲力而磁性約束。此係顯示於第4A圖。針對於其旋轉於如同離子之相同方向的電子,勞倫茲力係於相反的方向,使得電子係將未為約束。電子係離開該電漿,且結果是過剩之正電荷為建立。此係設定一電場,其防止其他的電子為離開該電漿。於平衡時,此電場之方向與大小係由於動量不滅原理而決定。The above results can be explained on a simple physical basis. When the ion system rotates in the diamagnetic direction, the ion system is magnetically constrained by the Lorentz force. This is shown in Figure 4A. For the electrons that rotate in the same direction as the ions, the Lorentz force is in the opposite direction, so that the electron system will not be constrained. The electrons leave the plasma and the result is an excess of positive charge. This sets an electric field that prevents other electrons from leaving the plasma. At equilibrium, the direction and magnitude of this electric field is determined by the principle of momentum immortality.
靜電場係擔任於電子與離子的遷移之一個非常重要的任務。是以,本發明之一個重要層面係在於:一強的靜電場係建立於電漿層106之內側,此靜電場之大小係由其可為容易調整之施加磁場B0 的值而控制。The electrostatic field is a very important task in the migration of electrons and ions. Therefore, an important aspect of the present invention is that a strong electrostatic field is established inside the plasma layer 106, and the size of the electrostatic field is controlled by the value of the applied magnetic field B 0 which can be easily adjusted.
如所解說,若ωe >0,靜電場係約束針對於電子。如於第11B圖所示,該井之深度係可藉著調整所施加的磁場B0 而增大。除了接近零位圓之一極窄區域之外,電子係恆為具有一小的迴轉半徑。因此,電子係以異常快速的擴散速率而響應於短波長的變動。此擴散係於一旦熔合反應發生而實際為助於維持電位井。更高的能量之熔合產物離子係離開電漿。欲維持電荷準中性(quasi-neutrality),熔合產物係必須藉著其以將電子為自該電漿而拉出,主要為自該電漿層之表面而取得電子。於電漿表面之電子的密度係極低,且藉著熔合產物而離開電漿之電子係必須為取代;否則,電位井係將消失。As illustrated, if ω e >0, the electrostatic field constraints are directed to electrons. As shown in FIG. 11B in the first, the depth of the well system can be adjusted by the applied magnetic field B 0 increases. In addition to being close to a very narrow region of the zero circle, the electron system always has a small radius of gyration. Therefore, the electron system responds to short wavelength variations with an abnormally fast diffusion rate. This diffusion is actually to help maintain the potential well once the fusion reaction occurs. The higher energy fusion product ions leave the plasma. In order to maintain the charge quasi-neutrality, the fusion product must be pulled from it by the electrons, mainly from the surface of the plasma layer. The density of electrons on the surface of the plasma is extremely low, and the electron system that leaves the plasma by fusion of the product must be replaced; otherwise, the potential well system will disappear.
第12圖係顯示電子之一種馬克士威分佈162。僅有自該馬克士威分佈的尾部160之極為高能的電子係可到達該電漿之表面且藉著熔合離子而離開。分佈162之尾部160係因此為藉由其接近零位表面之高密度區域的電子-電子碰撞而連續建立。高能的電子係仍具有一小的迴轉半徑,使得異常擴散係允許其為足夠快速到達表面以順應於離去的熔合產物離子。高能的電子係損耗其能量而升高該電位井且藉著極少的能量而離開。雖然電子係可迅速跨越磁場,歸因於異常遷移,異常的能量損耗係傾向為避免,因為極少的能量為遷移。Figure 12 shows a Maxwell distribution 162 of electrons. Only the extremely high energy electrons from the tail 160 of the Maxwell distribution can reach the surface of the plasma and exit by the fused ions. The tail portion 160 of the distribution 162 is thus continuously established by its electron-electron collision near the high density region of the zero surface. The high energy electron system still has a small radius of gyration such that the anomalous diffusion system allows it to reach the surface quickly enough to conform to the leaving fusion product ions. High-energy electrons lose their energy and raise the potential well and leave with very little energy. Although the electron system can quickly cross the magnetic field, due to abnormal migration, abnormal energy loss tends to be avoided because very little energy is migration.
電位井之另一個結果係針對於電子之一強冷卻機構,其為類似於蒸發冷卻。舉例而言,針對於蒸發水,必須為供應蒸發之潛在的熱量。此熱量係由剩餘的液態水與環繞的媒體所供應,其接著為較快於熱遷移過程可替代能量而迅速熱化至一較低溫度。同理,針對於電子,電位井深度係等效於蒸發化之水的潛在熱量。電子係供應其藉由熱化過程以升高該電位井所需的能量,熱化過程係再次供應該馬克士威尾部之能量,使得電子為可逸出。熱化過程係因此造成一較低的電子溫度,由於其為相較於任何加熱過程而較快許多。因為於電子與質子之間的大量差異,自質子之能量轉移時間係相較於電子熱化時間而較小為約1800倍。此冷卻機構亦降低電子之輻射損耗。此係針對於先進的燃料而尤其為重要,於其中,輻射損耗係由於具有大於1的一原子序Z(即:Z>1)之燃料離子而加強。Another result of the potential well is directed to a strong cooling mechanism for electrons, which is similar to evaporative cooling. For example, for evaporating water, it must be the potential heat to supply evaporation. This heat is supplied by the remaining liquid water and surrounding media, which in turn rapidly heats up to a lower temperature faster than the alternative energy of the thermal migration process. Similarly, for electrons, the potential well depth is equivalent to the potential heat of the evaporated water. The electron system supplies its energy required to raise the potential well by a heating process, which again supplies the energy of the Maxwell tail to make the electrons escapable. The heating process thus results in a lower electron temperature since it is much faster than any heating process. Because of the large difference between electrons and protons, the energy transfer time from protons is about 1800 times smaller than the electron heating time. This cooling mechanism also reduces the radiation loss of electrons. This is especially important for advanced fuels in which the radiation loss is enhanced by fuel ions having an atomic sequence Z (i.e., Z > 1) greater than one.
靜電場亦為影響離子遷移。於電漿層106之大多數的粒子軌道係貝他加速器軌道112。大角度的碰撞(即:具有散射角度為於90度與180度之間的碰撞)係可改變一貝他加速器軌道至一漂移軌道。如上所述,漂移軌道之旋轉的方向係由介於×漂移與梯度漂移之間的競爭所決定。若×漂移係支配,漂移軌道係旋轉於反磁方向。若梯度漂移係支配,漂移軌道係旋轉於逆向反磁方向。此係顯示於第13A與13B圖。第13A圖係顯示自一貝他加速器軌道至漂移軌道的轉變,歸因於一180°之碰撞,其發生於點172。漂移軌道係持續為旋轉於反磁方向,因為×漂移係支配。第13B圖係顯示另一個180°之碰撞,但是於此例之靜電場係弱且梯度漂移係支配。漂移軌道係因此為旋轉於逆向反磁方向。The electrostatic field also affects ion migration. The majority of the particle orbitals of the plasma layer 106 are the beta accelerator track 112. Large angle collisions (ie, collisions with a scattering angle between 90 and 180 degrees) can change a beta accelerator orbit to a drift orbit. As mentioned above, the direction of rotation of the drift orbit is determined by × The competition between drift and gradient drift is determined. If × The drift system dominates, and the drift track rotates in the diamagnetic direction. If the gradient drift dominates, the drift orbit is rotated in the reverse diamagnetic direction. This is shown in Figures 13A and 13B. Figure 13A shows the transition from a beta accelerator track to a drift orbit, which occurs at point 172 due to a 180° collision. The drifting orbital system continues to rotate in the opposite direction because × The drift system dominates. Figure 13B shows another 180° collision, but the electrostatic field in this example is weak and the gradient drift dominates. The drifting orbital system is thus rotated in the reverse diamagnetic direction.
漂移軌道之旋轉方向係決定是否其為約束。移動於一漂移軌道之粒子係亦將具有平行於FRC軸之一速度。粒子為行進自FRC之一端至另一端(如為其平行動作之結果)所耗費的時間係稱為過渡時間;因此,漂移軌道係於過渡時間之規模的一時間而到達FRC之一端。如關連於第10A圖所示,於FRC之二端的勞倫茲力係僅為約束針對於其旋轉於反磁方向之漂移軌道。因此,在一過渡時間之後,於其旋轉於逆向反磁方向之漂移軌道的離子係損耗。The direction of rotation of the drift orbit determines whether it is a constraint. The particle system moving in a drift orbit will also have a velocity parallel to the FRC axis. The time it takes for a particle to travel from one end of the FRC to the other (as a result of its parallel action) is referred to as the transition time; therefore, the drift track is at one of the scales of the transition time and reaches one end of the FRC. As shown in Figure 10A, the Lorentz force at the two ends of the FRC is only a constraint for the drift orbit of its rotation in the diamagnetic direction. Thus, after a transition time, the ion system losses in the drift orbit of its rotation in the reverse diamagnetic direction.
此現象係考量針對於離子之損耗機構,其預期為存在於所有的FRC實驗。實際上,於此等實驗,離子係載有一半的電流且電子係載有另一半者。於此等條件,在電漿之內側的電場係可忽略,且梯度漂移係恆為支配×漂移。因此,由大角度碰撞所產生的所有漂移軌道係在一過渡時間之後而損耗。此等實驗係報告其相較於由典型擴散估計所預測之彼等者為快速的離子擴散速率。This phenomenon is a consideration of the loss mechanism for ions, which is expected to exist in all FRC experiments. In fact, in these experiments, the ion system carries half the current and the electron system carries the other half. Under these conditions, the electric field inside the plasma is negligible, and the gradient drift is always dominant. × drift. Therefore, all drift trajectories generated by large angle collisions are lost after a transition time. These experiments report that they are fast ion diffusion rates compared to those predicted by typical diffusion estimates.
若是具有一強的靜電場,×漂移係支配梯度漂移,且漂移軌道係旋轉於反磁方向。此係上述關連於第13A圖而顯示。當此等軌道係到達FRC之二端,其為由勞倫茲力而反射回到閉合場線的區域;因此,其維持為約束於系統。If it has a strong electrostatic field, × The drift system dominates the gradient drift and the drift orbit is rotated in the diamagnetic direction. This is shown above in relation to Figure 13A. When these orbital systems reach the two ends of the FRC, they are areas that are reflected back to the closed field line by the Lorentz force; therefore, they remain constrained to the system.
於碰撞束系統之靜電場係可為足夠強,使得×漂移係支配梯度漂移。因此,該系統之靜電場係藉由免除此離子損耗機構(其為類似於一鏡裝置之一損耗錐者(cone))而將避免離子遷移。The electrostatic field system of the collision beam system can be strong enough to × The drift system dominates the gradient drift. Thus, the electrostatic field of the system will avoid ion migration by eliminating this ion loss mechanism, which is a loss cone similar to a mirror device.
離子擴散之另一個層面係可為藉由考慮於貝他加速器軌道的小角度、電子-離子碰撞之效應而理解。第14A圖係顯示一貝他加速器軌道112;第14B圖係顯示相同的軌道112於小角度的電子-離子碰撞為考慮者174;第14C圖係顯示第14B圖之軌道於隨後其為一因數10之較長的一時間者176;且,第14D圖係顯示第14B圖之軌道於隨後其為一因數20之較長的一時間者178。可看出的是:貝他加速器軌道之拓撲係並未歸因於小角度、電子-離子碰撞而改變;然而,其徑向振盪之振幅係隨著時間而增長。實際上,於第14A至14D圖所顯示之軌道係隨著時間而增大,其指出典型的擴散。Another dimension of ion diffusion can be understood by considering the effects of small angles, electron-ion collisions of the beta accelerator track. Figure 14A shows a beta accelerator track 112; Figure 14B shows the same track 112 at a small angle of electron-ion collision as the considerr 174; Figure 14C shows the track of Figure 14B followed by a factor The longer one of time 10 is 176; and, the 14D picture shows the track of Figure 14B at which it is a longer time 178 of a factor of 20. It can be seen that the topology of the beta accelerator track is not changed due to small angles, electron-ion collisions; however, the amplitude of its radial oscillations increases with time. In fact, the orbital system shown in Figures 14A through 14D increases over time, indicating a typical diffusion.
運用以構成一FRC之習用的程序係主要運用角向箍縮-場反轉程序。於此習用方法中,一偏壓磁場係由環繞一中性氣體背部填充室之外部線圈所施加。一旦此係已經發生,氣體係離子化且偏壓磁場係封存於電漿。其次,於外部線圈之電流係迅速反轉且相反方位的磁場線係連接於先前封存線以形成FRC之閉合的拓撲(參閱第3圖)。此構成過程係主要憑經驗且幾乎不存在任何機構以控制FRC之構成。結果,該種方法係具有不佳的複製性且無調整能力。The program used to form an FRC is mainly an angular pinch-field inversion procedure. In this conventional method, a bias magnetic field is applied by an outer coil surrounding a neutral gas back filling chamber. Once this has occurred, the gas system is ionized and the bias magnetic field is sealed in the plasma. Second, the current in the outer coil is rapidly reversed and the oppositely oriented magnetic field lines are connected to the previous sealing line to form a closed topology of the FRC (see Figure 3). This process is primarily based on experience and there is almost no mechanism to control the composition of the FRC. As a result, this method has poor reproducibility and no adjustment ability.
反之,本發明之FRC構成方法係允許充足控制且提供一更為透明及可複製的過程。實際上,由本發明之方法所構成的FRC係可調整且其形狀以及其他性質係可直接受到由外場線圈325所施加的磁場之操縱而影響。藉由本發明之方法的FRC構成係以詳述於上文之方式而亦造成電場與電位井之形成。甚者,本發明之方法係可易於延伸以加速FRC至反應器階層參數與高能量燃料電流,且係有利為致能離子之典型的約束。再者,該技術係可運用於一微型裝置且極為強健以及容易實施-針對於反應器系統之所有高度期望的特徵。Conversely, the FRC construction method of the present invention allows for adequate control and provides a more transparent and replicable process. In fact, the FRC constructed by the method of the present invention is adjustable and its shape and other properties are directly affected by the manipulation of the magnetic field applied by the outer field coil 325. The FRC composition by the method of the present invention also results in the formation of electric fields and potential wells in a manner detailed above. Moreover, the method of the present invention can be readily extended to accelerate FRC to reactor stratification parameters and high energy fuel currents, and is advantageously a typical constraint for enabling ions. Moreover, the technology can be applied to a micro device and is extremely robust and easy to implement - for all highly desirable features of the reactor system.
於本發明之方法,FRC構成係關於循環電漿束335。可理解的是:循環電漿束335(因為其為電流)係建立一角向(poloidal)磁場,如同於一環形電線之一電流所將為者。於循環電漿束335之內側,感應之磁性自我場係相反於其歸因於外線圈325之外部施加磁場。於電漿束335之外側,磁性自我場係如同施加磁場之相同方向。當電漿離子電流係充分大,自我場係克服施加磁場,且磁場係反轉於循環電漿束335之內側,因而構成FRC拓撲,如於第3與5圖所示。In the method of the present invention, the FRC is structured with respect to the circulating plasma beam 335. It will be appreciated that the circulating plasma beam 335 (because it is a current) establishes a poroidal magnetic field, as would be the case for a current in a looped wire. Inside the circulating plasma beam 335, the induced magnetic self-field is opposite to its externally applied magnetic field due to the outer coil 325. On the outside of the plasma beam 335, the magnetic self-field is in the same direction as the applied magnetic field. When the plasma ion current system is sufficiently large, the self-field system overcomes the applied magnetic field and the magnetic field is reversed to the inside of the circulating plasma beam 335, thus forming an FRC topology, as shown in Figures 3 and 5.
針對於場反轉之必要條件係可藉著一種簡單的模型而估計。考慮主要半徑r0
與次要半徑a
<<r 0
之一環所載有的一電流IP
。於該環之中央的磁場(垂直該環)係B p
=2πI P
/(cr o
)。假設:該環電流I P
=N p e
(Ω0
/2π)係由具有一角速度Ω0
之NP
個離子所載有。針對其循環於半徑r 0
=V 0
/Ω0
之單一個離子,Ω0
=eB 0
/m i c
係針對於一外部磁場B0
之迴旋加速器頻率。假設V0
係該束離子之平均速度。場反轉係定義為:
上述之構成一FRC於約束系統300的一種較佳方法係於本文稱為組合式束/貝他加速器構成技術。此方式係結合低能量之電漿離子束以及運用貝他加速器磁通線圈320之貝他加速器加速。One preferred method of constructing a FRC in the restraint system 300 is referred to herein as a combined beam/beta accelerator construction technique. This approach is combined with a low energy plasma ion beam and a beta accelerator using a beta accelerator flux coil 320.
於此方法之第一個步驟係運用背景電漿源345以注入一實質環形雲狀層之背景電漿於室310。外線圈325係產生一磁場於室310之內側,以磁化該背景線圈。於短區間,低能量的離子束係透過注入埠340且實質為橫向於室310之內的外部施加磁場而注入至室310。如上所述,離子束係藉由此磁場以大的貝他加速器軌道而捕獲於室310之內。離子束係可藉由一離子加速器所產生,諸如其包含一離子二極體與一馬克斯(Marx)產生器之一加速器(參閱:R.B.Miller,An Introduction to the Physics of Intense Charged Particle Beams ,(1982))。如熟悉此技藝人士所可理解,施加的磁場係將加諸一勞倫茲力(Lorentz force)於注入的離子束,一旦離子束為進入室310;然而,期望的是:束係未偏轉,且因而未進入一貝他加速器軌道,直到該離子束為到達循環電漿束335。欲解決此問題,離子束係與電子中性化,且如於第15圖所示,當離子束350係指向通過一適當的磁場,諸如:於室310之內的單向施加磁場,正電荷的離子與負電荷的電子係分離。離子束350係因此獲得其歸因於磁場之一電氣自我極化。此磁場亦可藉由例如一永久磁鐵或藉由一電磁鐵所產生沿著離子束之路徑。當隨後為引入至約束室310,造成的電場係平衡於束粒子之磁力,允許離子束以漂移為未偏轉。第16圖係顯示離子束350如其接觸電漿335之正面圖。如圖所繪,自電漿335之電子係行進沿著磁場線而進出該束350,其因而耗損該束之電氣極化。當該束係不再為電氣極化,該束係加入其繞於主軸315之一貝他加速器軌道的循環電漿束335,如於第1圖所示(亦參閱第5圖)。The first step in this method utilizes a background plasma source 345 to inject a background plasma of a substantially annular cloud layer into chamber 310. The outer coil 325 generates a magnetic field inside the chamber 310 to magnetize the background coil. In the short interval, the low energy ion beam is injected into the chamber 310 through the implanted crucible 340 and substantially externally applied to the magnetic field within the chamber 310. As described above, the ion beam is captured within the chamber 310 by the magnetic field with a large beta accelerator track. The ion beam system can be generated by an ion accelerator, such as an accelerator comprising an ion diode and a Marx generator (see: RBMiller, An Introduction to the Physics of Intense Charged Particle Beams , (1982) ). As will be understood by those skilled in the art, the applied magnetic field will apply a Lorentz force to the implanted ion beam once the ion beam is entering the chamber 310; however, it is desirable that the beam system is undeflected, And thus does not enter a beta accelerator track until the ion beam reaches the circulating plasma beam 335. To solve this problem, the ion beam system is electron neutralized, and as shown in Fig. 15, when the ion beam 350 is directed through a suitable magnetic field, such as a unidirectional applied magnetic field within chamber 310, a positive charge The ions are separated from the negatively charged electrons. The ion beam 350 thus obtains its electrical self-polarization due to one of the magnetic fields. The magnetic field can also be generated along the path of the ion beam by, for example, a permanent magnet or by an electromagnet. When subsequently introduced into the confinement chamber 310, the resulting electric field is balanced by the magnetic force of the beam particles, allowing the ion beam to drift undeflected. Figure 16 shows a front view of ion beam 350 as it contacts plasma 335. As depicted, the electrons from the plasma 335 travel along the magnetic field lines into and out of the beam 350, which thus depletes the electrical polarization of the beam. When the beam is no longer electrically polarized, the beam is added to its circulating plasma beam 335 which is wound around one of the spindles 315, as shown in Figure 1 (see also Figure 5).
當電漿束335係行進於其貝他加速器軌道,移動離子係包含一電流,其接著引起一角向的磁性自我場。欲產生FRC拓撲於室310之內,必須提高電漿束335之速度,因而增大電漿束335所引起之磁性自我場的大小。當磁性自我場係足夠大,於電漿束335之內的軸315之徑向距離處的磁場方向係反轉,導致一FRC(參閱第3與5圖)。可理解的是:欲維持於貝他加速器軌道之循環電漿束335的徑向距離,必須隨著循環電漿束335增大速度而提高自外線圈325之施加的磁場。一控制系統係因此設置以維持一適當的施加磁場,其為由通過外線圈325之電流所指定。或者,一第二外線圈係可運用以提供另外的施加磁場,其為需要以隨著電漿束為加速而維持電漿束的軌道之半徑。When the plasma beam 335 is traveling in its beta accelerator orbit, the mobile ion system contains a current that then causes an angular magnetic self field. To create an FRC topology within chamber 310, the velocity of the plasma beam 335 must be increased, thereby increasing the magnitude of the magnetic self field caused by the plasma beam 335. When the magnetic self-field is large enough, the direction of the magnetic field at the radial distance of the axis 315 within the plasma beam 335 is reversed, resulting in an FRC (see Figures 3 and 5). It will be appreciated that the radial distance of the circulating plasma beam 335 to be maintained in the beta accelerator track must increase the applied magnetic field from the outer coil 325 as the circulating plasma beam 335 increases in velocity. A control system is therefore arranged to maintain a suitable applied magnetic field as specified by the current through the outer coil 325. Alternatively, a second outer coil can be utilized to provide an additional applied magnetic field that is the radius of the track that is required to maintain the plasma beam as the plasma beam is accelerated.
欲提高循環電漿束335於其軌道之速度,貝他加速器磁通線圈320係設置。參考第17圖,可為理解的是:藉由安培定律,提高其通過貝他加速器磁通線圈320之一電流係感應於室310之內側的一方位角電場E。於電漿束335之正電荷的離子係由此感應的電場而加速,導致如上所述之場反轉。當其為如上所述而中性化及極化之離子束350係加至循環的電漿束335,電漿束335係去極化該離子束。To increase the speed of the circulating plasma beam 335 in its orbit, the beta accelerator flux coil 320 is placed. Referring to Fig. 17, it can be understood that an azimuthal electric field E induced in the inner side of the chamber 310 by the current system of the beta accelerator flux coil 320 is increased by Ampere's law. The positively charged ions of the plasma beam 335 are accelerated by the induced electric field, resulting in a field reversal as described above. When it is neutralized and polarized, the ion beam 350 is applied to the circulating plasma beam 335 as described above, and the plasma beam 335 depolarizes the ion beam.
針對於場反轉,循環的電漿束335係較佳為加速至約100 eV之一旋轉能量,且較佳為於約75 eV至125 eV之一範圍。欲達到熔合相關條件,循環的電漿束335係較佳為加速至約200 keV且較佳為於約100 keV至3.3 MeV之一範圍。For field reversal, the circulating plasma beam 335 is preferably accelerated to a rotational energy of about 100 eV, and preferably in the range of about 75 eV to 125 eV. To achieve fusion-related conditions, the recycled plasma beam 335 is preferably accelerated to about 200 keV and preferably in the range of about 100 keV to 3.3 MeV.
FRC構成係利用組合式束/貝他加速器構成技術而成功展示。組合式束/貝他加速器構成技術係實驗式實行於其為直徑1m且長度1.5m之一室,運用高達500G之一外部施加的磁場、由高達5kG之貝他加速器磁通線圈320所感應的旋轉電漿之一磁場、以及1.2×10- 5 托之一真空。於實驗中,背景電漿係具有101 3 cm- 3 之一密度,且離子束係一中性化的氫束,其具有1.2×101 3 cm- 3 之一密度、2×107 cm/s之一速度、與約為20μs(於半高度)之一脈衝長度。場反轉係被觀察。The FRC structure was successfully demonstrated using a combined beam/beta accelerator construction technique. The combined beam/beta accelerator architecture is experimentally implemented in a chamber of 1 m in diameter and 1.5 m in length, using an externally applied magnetic field of up to 500 G, induced by a beta accelerator flux coil 320 up to 5 kG. one plasma rotating magnetic field, and 1.2 × 10 - 5 Torr vacuum one. In the experiment, the background plasma system having 10 1 3 cm - one of the three density and the ion beam neutralization system a hydrogen bundle having 1.2 × 10 1 3 cm - 3 density one, 2 × 10 7 cm /s one of the speeds, with a pulse length of approximately 20 μs (at half height). The field reversal system was observed.
構成FRC於約束系統300之另一種較佳方法係於本文稱為貝他加速器構成技術。此種技術係基於直接驅動貝他加速器感應電流以加速一循環電漿束335,運用貝他加速器磁通線圈320。此種技術之一較佳實施例係運用於第1圖所繪之約束系統300,除了低能量的離子束之注入為不必要。Another preferred method of constructing the FRC in the restraint system 300 is referred to herein as a beta accelerator construction technique. This technique is based on directly driving the beta accelerator to induce current to accelerate a cycle of plasma beam 335, using a beta accelerator flux coil 320. One preferred embodiment of such a technique is applied to the restraint system 300 depicted in Figure 1, except that low energy ion beam implantation is not necessary.
如所指出,於貝他加速器構成技術之主要構件係貝他加速器磁通線圈320,其安裝於室310之中央且為沿著室310之軸線。歸因於其分離的平行繞組架構,線圈320係呈現極低的電感,且當耦接至一適當的電源而具有低LC時間常數,其致能於磁通線圈320的電流之迅速上升。As indicated, the main component of the beta-accelerator construction technique is the beta accelerator flux coil 320, which is mounted in the center of the chamber 310 and along the axis of the chamber 310. Due to its separate parallel winding architecture, coil 320 exhibits a very low inductance and, when coupled to a suitable power supply, has a low LC time constant that enables a rapid rise in current to flux coil 320.
較佳而言,FRC之構成係藉由激能外場線圈325、330而開始。此係提供接近二端之一軸向導引場以及徑向磁場分量,以軸向約束其注入室310之電漿。一旦充分的磁場係建立,背景電漿源345係自其本身的電源供應器而激能。自噴槍所發出的電漿係串流沿著軸向導引場且歸因於溫度而稍微展開。隨著電漿為到達室310之中間平面,一連續、軸向延伸、環形層之冷、緩慢移動的電漿係建立。Preferably, the FRC is structured by energizing the outer field coils 325, 330. This provides an axially directed field near the two ends and a radial magnetic field component to axially constrain the plasma of its injection chamber 310. Once a sufficient magnetic field is established, the background plasma source 345 is energized from its own power supply. The plasma stream emanating from the lance is directed along the axial direction and spreads slightly due to temperature. As the plasma reaches the mid-plane of the chamber 310, a continuous, axially extending, cold, slowly moving plasma system of the annular layer is established.
於此時,貝他加速器磁通線圈320係激能。於線圈320之迅速上升的電流係致使於線圈內部之一快速變化的軸向磁通。由於感應效應,於軸向磁通之此迅速增大係致使一方位角電場E(參閱第18圖)之產生,其為普及於磁通線圈之空間。藉由馬克士威方程式,此電場E係直接為正比於線圈內側之磁通強度變化,即:一較快的貝他加速器線圈電流升高係將導致一較強的電場。At this time, the beta accelerator flux coil 320 is energized. The rapidly rising current at coil 320 results in a rapidly changing axial flux in one of the coils. Due to the inductive effect, this rapid increase in axial flux causes the generation of an azimuthal electric field E (see Fig. 18) which is popular in the space of the flux coil. With Maxwell's equation, this electric field E is directly proportional to the change in magnetic flux strength inside the coil, ie, a faster booster coil current rise will result in a stronger electric field.
感應式建立的電場E係耦合至於電漿之帶電荷的粒子且引起一有質動力(ponderomotive force),其加速於環形電漿層之粒子。由於其較小質量,電子係經歷加速之最初的物種。由此過程所形成之初始電流係因此為主要歸因於電子。然而,充分的加速時間(約為數百微秒)係將最終亦導致離子電流。參考第18圖,此電場E係加速電子與離子於相反的方向。一旦二個物種係均到達其終端速度,電流係約為由離子與電子所相等載有。The inductively established electric field E is coupled to the charged particles of the plasma and causes a ponderomotive force that accelerates to the particles of the toroidal plasma layer. Due to its small mass, the electronics undergo accelerated initial species. The initial current system formed by this process is therefore primarily attributed to electrons. However, a sufficient acceleration time (approximately a few hundred microseconds) will eventually result in an ionic current. Referring to Fig. 18, this electric field E accelerates electrons and ions in opposite directions. Once both species reach their terminal velocity, the current system is approximately loaded by ions and electrons.
如上所述,由旋轉的電漿所載有之電流係引起一自我(self)磁場。當於電漿層之電流所產生的自我磁場係成為可相較於外場線圈325、330之施加的磁場,實際FRC拓撲之產生係開始。於此時,磁性的再次連接係發生且初始的外部產生磁場之開放場線係開始閉合且形成FRC磁通表面(參閱第3與5圖)。As mentioned above, the current contained by the rotating plasma causes a self magnetic field. When the self-magnetic field generated by the current in the plasma layer becomes a magnetic field that can be applied compared to the external field coils 325, 330, the generation of the actual FRC topology begins. At this point, the magnetic reconnection occurs and the initial open field line of the externally generated magnetic field begins to close and form the FRC flux surface (see Figures 3 and 5).
由此種方法所建立之基本FRC係呈現微量磁場與粒子能量,其典型為並非於反應器相關操作參數。然而,感應式電氣加速場係將持續,只要於貝他加速器磁通線圈320之電流係繼續增加於一快速的速率。此過程之效應係在於:FRC之能量與總磁場強度係繼續成長。此過程之範圍係因此主要由磁通線圈電源供應器所限制,由於電流之持續的遞送係需要一大量的能量儲存庫。然而,重要的是直接加速該系統至反應器相關條件。The basic FRC system established by this method exhibits a small amount of magnetic field and particle energy, which is typically not a reactor related operational parameter. However, the inductive electrical acceleration field will continue as long as the current system at the beta accelerator flux coil 320 continues to increase at a fast rate. The effect of this process is that the energy and total magnetic field strength of the FRC continue to grow. The scope of this process is therefore primarily limited by the flux coil power supply, which requires a large energy reservoir due to the continuous delivery of current. However, it is important to directly accelerate the system to reactor related conditions.
針對於場反轉,循環的電漿束335係較佳為加速至約100 eV之一旋轉能量,且較佳為於約75 eV至125 eV之一範圍。欲達到熔合相關條件,循環的電漿束335係較佳為加速至約200 keV且較佳為於約100 keV至3.3 MeV之一範圍。當離子束係加至循環的電漿束335,如上所述,電漿束335係去極化該離子束。For field reversal, the circulating plasma beam 335 is preferably accelerated to a rotational energy of about 100 eV, and preferably in the range of about 75 eV to 125 eV. To achieve fusion-related conditions, the recycled plasma beam 335 is preferably accelerated to about 200 keV and preferably in the range of about 100 keV to 3.3 MeV. When an ion beam system is applied to the circulating plasma beam 335, as described above, the plasma beam 335 depolarizes the ion beam.
利用貝他加速器構成技術之FRC構成係成功展示於下列的參數階層:.真空室尺寸:約為直徑1公尺,長度為1.5公尺.貝他加速器線圈半徑:10公分.電漿軌道半徑:20公分.產生於真空室之平均外部磁場係高達100高斯,且具有150微秒之一上升週期與2比1之一反射比。(來源:外線圈與貝他加速器線圈。).背景電漿(實質為氫氣)係由約101 3 cm- 3 之平均密度、小於10 eV之運動(kinetic)溫度所描述其特徵。.該種架構之連續操作期間(lifetime)係由其儲存於實驗之總能量所限制,且概括為約30微秒。The FRC component system using the beta accelerator construction technology was successfully demonstrated in the following parameter hierarchy: Vacuum chamber size: about 1 meter in diameter and 1.5 meters in length. Beta accelerator coil radius: 10 cm. Plasma track radius: 20 cm. The average external magnetic field generated in the vacuum chamber is up to 100 Gauss and has a rise period of 150 microseconds and a reflectance ratio of 2 to 1. (Source: outer coil and beta accelerator coil.). BACKGROUND plasma (substantial hydrogen) -based of from about 10 1 3 cm - average density of less than 10 eV of motion (Kinetic) characterized in temperature is described. . The continuous operation of this architecture is limited by the total energy stored in the experiment and is summarized as approximately 30 microseconds.
實驗係藉由首先注入一背景電漿層所進行,藉著以一環狀方式而安裝於室內側之二組同軸電纜噴槍。8個噴槍之各個集合係安裝於二個鏡式線圈組件之一者。噴槍係方位角間隔於等距方式且偏移為相對於另一組。此配置係允許噴槍為同時觸發且因此產生一環狀電漿層。The experiment was carried out by first injecting a background plasma layer by means of a two-group coaxial cable gun mounted on the indoor side in an annular manner. Each of the eight spray guns is mounted to one of the two mirror coil assemblies. The spray gun azimuth is spaced equidistant and offset relative to the other set. This configuration allows the gun to be triggered simultaneously and thus produces a layer of annular plasma.
於此層之建立時,貝他加速器磁通線圈係激能。升高於貝他加速器線圈繞組之電流係致使於線圈內側之磁通的增大,引起其捲曲繞於貝他加速器線圈之一方位角電場。於貝他加速器磁通線圈之快速上升且高的電流係產生一強的電場,其加速環形電漿層且因而感應可觀的電流。充分強的電漿電流係產生一磁性自我場,其改變外部供應場且致使場反轉架構之產生。關於B點(B-dot)迴路之詳細測量係識別為FRC之範圍、強度與持續期間。At the time of the establishment of this layer, the beta accelerator flux coil is energized. The current that rises above the windings of the beta accelerator coil causes an increase in the magnetic flux inside the coil, causing it to curl around an azimuthal electric field of the beta accelerator coil. The rapidly rising and high current of the beta flux flux coil produces a strong electric field that accelerates the annular plasma layer and thus induces a significant current. A sufficiently strong plasma current produces a magnetic self field that changes the external supply field and causes the field reversal architecture to occur. The detailed measurement of the B-dot loop is identified as the range, intensity, and duration of the FRC.
典型資料之一個實例係由於第19圖之B點探測訊號的軌跡所顯示。資料曲線A係代表於實驗室的軸向中間平面(自各個端板的75公分)及於15公分的一徑向位置之磁場的軸向分量之絕對強度。資料曲線B係代表於室軸向中間平面及於30公分的一徑向位置之磁場的軸向分量之絕對強度。因此,曲線A的資料組係指出於燃料電漿層之內側(於貝他加速器線圈與電漿之間)的磁場強度,而曲線B的資料組係描繪於燃料電漿層之外側的磁場強度。該資料係明確指出的是:內部磁場係反轉方位(為負)於約23與47微秒之間,而外部磁場係保持為正,即,並未反轉方位。反轉之時間係由於貝他加速器線圈之電流的升高而限制。一旦峰值電流係達到於貝他加速器線圈,於燃料電漿層之感應的電流係開始減小且FRC係迅速衰減。迄今,FRC之壽命係由可儲存於實驗者之能量所限制。關於注入與捕獲實驗,系統係可升級以提供較長的FRC壽命及加速至反應器相關參數。An example of a typical data is shown by the trajectory of the B-point detection signal of Figure 19. The data curve A represents the absolute strength of the axial intermediate plane of the laboratory (75 cm from each end plate) and the axial component of the magnetic field at a radial position of 15 cm. The data curve B represents the absolute intensity of the axial component of the magnetic field at the axial center plane of the chamber and at a radial position of 30 cm. Therefore, the data set of curve A indicates the magnetic field strength on the inner side of the fuel plasma layer (between the beta accelerator coil and the plasma), while the data set of curve B is the magnetic field strength depicted on the outer side of the fuel plasma layer. . The data clearly indicates that the internal magnetic field is reversed (negative) between about 23 and 47 microseconds, while the external magnetic field remains positive, ie, the orientation is not reversed. The time of reversal is limited by the increase in current of the beta accelerator coil. Once the peak current system reaches the beta accelerator coil, the induced current current at the fuel plasma layer begins to decrease and the FRC system decays rapidly. To date, the life of the FRC has been limited by the energy that can be stored by the experimenter. For injection and capture experiments, the system can be upgraded to provide longer FRC lifetimes and accelerate to reactor related parameters.
總之,此種技術係不僅是產生一緊密FRC,而且其亦為強健及直接以實施。最為重要而言,由此種方法所產生之基本FRC係可易於加速至任何期望階層的旋轉能量與磁場強度。此係針對於高能量的燃料束之熔合應用與典型約束而為決定性。In short, this technology is not only to produce a tight FRC, but also to be robust and straightforward to implement. Most importantly, the basic FRC system produced by this method can be easily accelerated to the rotational energy and magnetic field strength of any desired level. This is decisive for the fusion application of high energy fuel bundles with typical constraints.
上述之貝他加速器以及束/貝他加速器FRC構成技術係均為仰賴於經由磁通線圈320而傳遞能量至一背景電漿。類似一變壓器,磁通線圈係實行變壓器之一次側繞組的任務,而電漿係作用為二次側繞組。針對於此感應系統以有效率運作,必要的是:電漿係一良好導體。The above-described beta accelerator and beam/beta accelerator FRC technology are all based on the transfer of energy to a background plasma via the flux coil 320. Similar to a transformer, the flux coil performs the task of the primary winding of the transformer, and the plasma acts as the secondary winding. In order for this induction system to operate efficiently, it is necessary that the plasma is a good conductor.
相反於典型導體(諸如:金屬),一電漿係隨著其溫度升高而成為較低電阻性且因此為較高導電性。尤其,電漿電子之溫度係擔任重要的任務且以相當大程度而決定其為電子-離子碰撞之一函數的耗散。本質上,耗散係歸因於其為由電子-離子碰撞所引起之電阻:若碰撞頻率為愈高,則電阻率係愈高。此係歸因於電漿之中的收集現象,於其中,庫侖碰撞的橫截面係篩選。碰撞頻率(連續碰撞為發生於其之速率)係本質為密度、篩選的庫侖散射橫截面、與碰撞/散射的電荷之熱(或平均)速度,即:v c =nσv。藉由定義,v係比例於,σ係正比於v4 或因此正比於T- 2 。因此,碰撞頻率v c 係正比於nT- 3 / 2 。電阻率係由於η=v c m/ne2 而相關於碰撞頻率。是以,電阻率係正比於T- 3 / 2 且顯然無關於密度-此為以下事實之一直接結果:即使電荷載體之數目係隨著密度而增大,散射中心之數目係同樣為增大。因此,較高的溫度係導致較高的電漿導電性與較少的耗散損失。In contrast to typical conductors (such as metals), a plasma system becomes less resistive as its temperature increases and is therefore more conductive. In particular, the temperature of the plasma electrons is an important task and is determined to a considerable extent as a function of one of the electron-ion collisions. Essentially, the dissipation is due to its resistance caused by electron-ion collisions: the higher the collision frequency, the higher the resistivity. This is due to the collection phenomenon in the plasma, in which the cross section of the Coulomb collision is screened. The collision frequency (the continuous collision is the rate at which it occurs) is essentially the density, the Coulomb scattering cross section of the screening, and the thermal (or average) velocity of the collision/scattering charge, ie: v c =nσv. By definition, v is proportional to The σ system is proportional to v 4 or is therefore proportional to T - 2 . Therefore, the collision frequency v c is proportional to nT - 3 / 2 . The resistivity is related to the collision frequency due to η = v c m/ne 2 . Therefore, the resistivity is proportional to T - 3 / 2 and obviously has no density - this is a direct result of one of the following facts: even if the number of charge carriers increases with density, the number of scattering centers is also increased. . Therefore, higher temperatures result in higher plasma conductivity and less dissipation losses.
欲達成其關於約束於一FRC之較佳的性能,一熱電漿係因此極為期望。以PEG系統而論,增高的電子溫度係導致改良的FRC作業起始(電漿成為一較佳的導體,於電漿與磁通線圈之間的感應耦接為較佳)、較佳的電流維持(降低的電漿電阻率係導致較少的摩擦/耗散損失且因此為較少的電流損失)、以及較高的磁場強度(電流愈強,則自我場為愈大)。於初始電漿形成期間且在磁通線圈為銜接之前的適當電子溫度係將導致磁通線圈至電漿之較佳的耦接(其有利為傾向以降低方位角的影像電流之形成於室壁)。此係依次將造成增強的貝他加速器加速(較小的電阻率係導致自磁通線圈至電漿的能量之較佳的感應轉移)及電漿加熱(由旋轉電流所代表之傳遞方向能量的一些者係將熱化且轉變為隨機能量-終於導致由磁通線圈之電漿的加熱),其將因此增加離子-電子碰撞時間(歸因於較高的溫度),降低耗散(較小的電阻率)且終於允許較高的FRC場之達成(較高的電流係導致較強的場)。To achieve its preferred properties constrained to an FRC, a thermo-electric plasma system is therefore highly desirable. In the case of the PEG system, the increased electron temperature results in an improved FRC start (the plasma becomes a better conductor, the inductive coupling between the plasma and the flux coil is preferred), the preferred current Maintenance (reduced plasma resistivity results in less friction/dissipation loss and therefore less current loss), and higher magnetic field strength (the stronger the current, the greater the self-field). The proper electronic temperature during the initial plasma formation and before the flux coil is engaged will result in a better coupling of the flux coil to the plasma (which is advantageous to reduce the azimuthal image current formed on the chamber wall) ). This system in turn will cause an enhanced beta accelerator acceleration (smaller resistivity results in better inductive transfer of energy from the flux coil to the plasma) and plasma heating (transfer direction energy represented by the rotating current) Some will heat up and convert to random energy - which ultimately leads to heating of the plasma by the flux coil), which will therefore increase the ion-electron collision time (due to higher temperatures) and reduce dissipation (less The resistivity) and finally allows for a higher FRC field to be achieved (higher currents result in stronger fields).
欲達成較佳的初始電漿溫度,一種感應電漿源係提出。如於第20A、20B、與20C圖所繪出,感應電漿源1010係可安裝於室310之內而約為於磁通線圈320之末端,且包括一單匝的衝擊線圈組件1030,其較佳為由一高電壓(約5至15 kV)電源(未顯示)所饋電。諸如氫氣(或其他適當的氣體熔合燃料)之中性氣體係經由一拉伐爾(Laval)噴嘴1020且透過直接氣體饋線而引入至電漿源1010。氣流係較佳為由諸組之超快速的噴氣(puff)閥所控制以產生一清潔的衝擊前端。一旦氣體係發散自該噴嘴1020且分佈其本身於衝擊線圈1030之線圈繞組1040的表面,繞組1040係激能。於低電感的衝擊線圈1030之超快速的電流與磁通上升(ramp-up)係導致於氣體之內的一極高電場,其引起所形成電漿之分解、離子化、與隨後的排出自該衝擊線圈1030的表面而朝向該室310的中央。To achieve a better initial plasma temperature, an inductive plasma source is proposed. As depicted in FIGS. 20A, 20B, and 20C, the inductive plasma source 1010 can be mounted within the chamber 310 at approximately the end of the flux coil 320 and includes a single turn of the impact coil assembly 1030. Preferably, it is fed by a high voltage (about 5 to 15 kV) power source (not shown). A neutral gas system, such as hydrogen (or other suitable gas fused fuel), is introduced to the plasma source 1010 via a Laval nozzle 1020 and through a direct gas feed. The airflow system is preferably controlled by groups of ultra-fast puff valves to create a clean impact front end. Once the gas system diverges from the nozzle 1020 and distributes itself to the surface of the coil winding 1040 of the impact coil 1030, the winding 1040 is energized. The ultra-fast current and flux-up of the low-inductance impact coil 1030 results in a very high electric field within the gas that causes decomposition, ionization, and subsequent discharge of the formed plasma. The surface of the impact coil 1030 faces the center of the chamber 310.
於一個較佳實施例中,衝擊線圈1030係包含一環狀碟形的本體1032,其為由形成於其外周邊之一外環1034與形成於其內周邊之一環狀轂1036所限定。環1034與轂1036係軸向延伸為超過其形成一敞開頂部環狀通道1035的邊緣之本體1032的表面。本體1032、環1034與轂1036係較佳為透過其具有良好的真空性質與低的除氣性質之一種適當的非傳導材料之單體式模製結構而形成,該種材料係諸如:玻璃、有機玻璃(plexiglass)、硼矽酸耐熱(pyrex)、石英、陶瓷、或類似者。In a preferred embodiment, the impact coil 1030 includes an annular dish-shaped body 1032 defined by an outer ring 1034 formed on an outer periphery thereof and an annular hub 1036 formed on an inner periphery thereof. The ring 1034 and the hub 1036 extend axially beyond the surface of the body 1032 that forms the edge of an open top annular channel 1035. The body 1032, the ring 1034 and the hub 1036 are preferably formed by a single molded structure of a suitable non-conductive material having good vacuum properties and low outgassing properties, such as: glass, Plexiglass, pyrexic acid, pyrex, quartz, ceramic, or the like.
一多段式的罩蓋1012係較佳為耦接至衝擊線圈1030之環1034以限制所產生的電漿為免於迅速漂移。罩蓋1012之各段1014係包括複數個軸向延伸的指部1016。各段1014之末端係包括一安裝托架1015。A multi-segment cover 1012 is preferably coupled to the ring 1034 of the impact coil 1030 to limit the generated plasma from rapid drift. Each segment 1014 of the cover 1012 includes a plurality of axially extending fingers 1016. The end of each segment 1014 includes a mounting bracket 1015.
線圈繞組1040係較佳為運用環氧或一些其他的黏著劑而為固定至線圈本體1032之表面於通道1035。欲得到衝擊線圈1030之快速的電磁特性,儘可能保持其電感為低係重要。此係藉由運用儘可能少匝於線圈繞組1040、以及建立線圈繞組1040為平行繞製之多股(strand)的接線1042而達成。於一個範例的實施例中,線圈繞組1040係包含24個平行股的接線1042,其各者係施行一個迴路。接線1042之各者係起始於其為位在分開15度於本體1032的外周邊之進入點1044,且終止在僅有一個軸環繞匝於本體1032的內徑之退出點1046之後。因此,線圈繞組1040係覆蓋於通道1035的內與外邊緣之間的整個面積。較佳而言,群組之諸股1042係連接至相同的電容儲存單元(bank)。概括而言,電力係可饋送至來自相同的電容儲存單元之所有諸股1042,或是如同於一個範例的實施例,8個群組之3股1042係各自為一起連接且由二個分離的電容儲存單元之一者所共同饋電。The coil winding 1040 is preferably secured to the surface of the coil body 1032 by a channel 1035 using epoxy or some other adhesive. To obtain the fast electromagnetic characteristics of the impact coil 1030, it is important to keep its inductance as low as possible. This is achieved by using as many as possible strand windings 1040 and establishing coil windings 1040 as parallel wound strands 1042. In an exemplary embodiment, coil winding 1040 is a 24104 parallel stranded wiring 1042, each of which performs a loop. Each of the wires 1042 begins at an entry point 1044 that is positioned 15 degrees apart from the outer periphery of the body 1032 and terminates after an exit point 1046 having only one axis that wraps around the inner diameter of the body 1032. Thus, coil winding 1040 covers the entire area between the inner and outer edges of channel 1035. Preferably, the shares 1042 of the group are connected to the same capacitor storage unit. In summary, the power system can be fed to all of the strands 1042 from the same capacitor storage unit, or as in an exemplary embodiment, the three strands of the 10 groups of 1042 are each connected together and separated by two One of the capacitor storage units is fed together.
一環狀碟形的噴嘴本體1022係耦接於其內周邊至轂1036以形成該拉伐爾噴嘴1020。面對轂1036之噴嘴本體1022的表面1024係具有一膨脹式(expanding)中段輪廓,其界定於表面1024與轂1036的端面1037之間的一環狀氣腔(gas plenum)1025。相鄰於噴嘴本體1022之外周邊,該表面1024係具有一收縮膨脹式(contracting-expanding)輪廓,其界定於表面1024與轂1036的端面1037之間的一方位角延伸拉伐爾式噴嘴出口1023。An annular dish-shaped nozzle body 1022 is coupled to its inner periphery to the hub 1036 to form the Laval nozzle 1020. The surface 1024 of the nozzle body 1022 facing the hub 1036 has an expanding mid-section profile defined by an annular gas plenum 1025 between the surface 1024 and the end face 1037 of the hub 1036. Adjacent to the outer periphery of the nozzle body 1022, the surface 1024 has a contracting-expanding profile defined by an azimuthal extension of the Laval nozzle exit between the surface 1024 and the end face 1037 of the hub 1036. 1023.
附接至轂1036之相反側係一閥座環1050以及其形成於環1050之外端面的數個閥座1054。閥座1054係對準於其形成為通過轂1036之氣體饋送通道1052。Attached to the opposite side of the hub 1036 is a valve seat ring 1050 and a plurality of valve seats 1054 formed at the outer end faces of the ring 1050. The valve seat 1054 is aligned with a gas feed passage 1052 that is formed through the hub 1036.
於操作時,中性的氣體係透過於閥座1054之超快速的噴氣閥而饋送至其延伸通過轂1036之氣體通道1052。因為噴嘴出口1023之緊縮部分,氣體係傾向為在發散自噴嘴1020之前而饋送及填充該環狀氣腔1025。一旦氣體係發散自該噴嘴1020且分佈其本身於衝擊線圈1030之線圈繞組1040的表面,繞組1040係激能。於低電感的衝擊線圈1030之超快速的電流與磁通上升係導致於該氣體之內的一極高電場,其引起所形成電漿之分解、離子化、與隨後的排出自該衝擊線圈1030的表面而朝向該室310的中央。In operation, a neutral gas system is fed through its ultra-fast jet valve of valve seat 1054 to its gas passage 1052 that extends through hub 1036. Because of the constricted portion of the nozzle outlet 1023, the gas system tends to feed and fill the annular gas chamber 1025 before it is diverged from the nozzle 1020. Once the gas system diverges from the nozzle 1020 and distributes itself to the surface of the coil winding 1040 of the impact coil 1030, the winding 1040 is energized. The ultra-fast current and flux rise of the low inductance impact coil 1030 results in a very high electric field within the gas that causes decomposition, ionization, and subsequent discharge of the formed plasma from the impact coil 1030. The surface faces the center of the chamber 310.
電流上升(ramp-up)係較佳為同步化於其意圖為一起觸發之所有的諸股1042或群組的諸股1042。可能且潛在為有利之另一個選項係欲觸發不同群組的諸股於不同時間。一延遲係可慎重為設於銜接不同群組的諸股1042之間,以觸發不同群組的諸股於不同時間。當觸發不同群組的諸股於不同時間,重要為群組諸股以使得該配置係方位角對稱且提供線圈繞組1040的表面之充分覆蓋以電流承載接線1042於任何給定電力脈衝。以此方式,可能建立至少二個連續而獨特的電漿脈衝。於脈衝之間的延遲係由多少中性氣體為可利用而限制。實際上,可能為個別觸發該等脈衝於約5與600微秒之間。The current ramp-up is preferably synchronized to the strands 1042 of all of the strands 1042 or groups that it is intended to trigger together. Another option that may be and potentially beneficial is to trigger different groups of shares at different times. A delay can be carefully placed between the shares 1042 that are connected to different groups to trigger different groups of shares at different times. When triggering the different groups of shares at different times, it is important that the groups are symmetrical such that the configuration is azimuthally symmetric and provides sufficient coverage of the surface of the coil winding 1040 to carry the wiring 1042 to any given power pulse. In this way, it is possible to establish at least two consecutive and unique plasma pulses. The delay between pulses is limited by how much neutral gas is available. In fact, it may be possible to individually trigger the pulses between about 5 and 600 microseconds.
實際上,輸入操作參數係較佳為如後:充電電壓:約10至25 kV分離(split)供應電流:透過組合的所有繞組之高達約50 kA總電流脈衝/上升時間:高達約2微秒氣體壓力:約-20至50 psi氣腔(plenum)尺寸:每個閥為約0.5至1 cm3 ,即:每發射(shot)為約4至8 cm3 總氣體容積In practice, the input operating parameters are preferably as follows: Charging voltage: about 10 to 25 kV split supply current: up to about 50 kA total current pulse/rise time through all combined windings: up to about 2 microseconds Gas pressure: about -20 to 50 psi plenum size: about 0.5 to 1 cm 3 per valve, ie about 4 to 8 cm 3 total gas volume per shot
於一個範例的實施例,輸入操作參數係如後:充電電壓:12至17 kV分離供應,即:自-12至+12 kV電流:每群組之3股為2至4.5 kA,即:透過組合的所有繞組之16至36 kA總電流脈衝/上升時間:1至1.5微秒氣體壓力:-15至30 psi氣腔尺寸:每個閥為0.5至1 cm3 ,即:每發射為4至8 cm3 總氣體容積In an exemplary embodiment, the input operating parameters are as follows: charging voltage: 12 to 17 kV separated supply, ie: from -12 to +12 kV current: 3 to 4 kA per group, ie: through combination 16 to 36 kA total current pulse/rise time for all windings: 1 to 1.5 microseconds Gas pressure: -15 to 30 psi Air chamber size: 0.5 to 1 cm 3 per valve, ie 4 to 8 per emission Cm 3 total gas volume
由其運用上述參數之感應電漿源1010的此種操作方法所建立之電漿係具有以下的優越特性:密度~4x101 3 cm- 3 溫度~10-20 eV環狀規模~直徑40-50 cm軸向漂移速度~5-10 eVBy using this method of operating parameters of the inductive plasma source 1010 is above the established plasma-based has the following advantageous characteristics: density ~ 4x10 1 3 cm - 3 Temperature ~ scale ~ 10-20 eV diameter annular 40-50 Cm axial drift speed ~5-10 eV
歸因於源1010之形狀與方位,顯現的電漿之形狀係環狀且具有其傾向為等於形成FRC之旋轉電漿環的一直徑。於一PEG目前系統,二個該種感應電漿源1010係較佳為置放於室310之各個軸向端且較佳為並行觸發。該二個形成的電漿分佈係軸向漂移為朝向室310之中央,於其為形成環狀層之電漿,接著為由磁通線圈320所加速,如上所述。Due to the shape and orientation of the source 1010, the appearing plasma is annular in shape and has a tendency to be equal to a diameter of the rotating plasma ring forming the FRC. In the present system of PEG, two such inductive plasma sources 1010 are preferably placed at respective axial ends of chamber 310 and are preferably triggered in parallel. The two formed plasma distributions are axially drifted toward the center of the chamber 310, which is the plasma forming the annular layer, followed by acceleration by the flux coil 320, as described above.
稱為一rotomak之一種RF電流驅動器係已經運用於FRC,於其中,電流係主要為由電子所承載。由二個相位的天線所產生之一旋轉徑向磁場係涉及。電子係磁性化且固著至旋轉磁場線。此係維持電流而直到離子與電子之庫侖碰撞係引起離子為加速且降低該電流。然而,rotomak係不適用於無限期維持該電流,但是其已經成功為針對於毫秒。An RF current driver called a rotomak has been used in FRC, in which the current system is mainly carried by electrons. One of the rotating radial magnetic fields produced by the two phase antennas is involved. The electrons are magnetized and fixed to the rotating magnetic field lines. This maintains current until the Coulomb collision of ions with electrons causes the ions to accelerate and reduce the current. However, the rotomak system is not suitable for maintaining this current indefinitely, but it has been successful for milliseconds.
於本系統之FRC,電流係主要由其為於貝他加速器軌道之離子所承載,該等軌道係將未固著至旋轉磁場線。大軌道的離子係重要為針對於穩定性與典型的擴散。取代於天線,電極係運用為如同於迴旋加速器,且離子係由一靜電波所驅動。問題係完全為靜電,因為RF之頻率係小於10百萬周波(Megacycle),使得該波長(30 m)係相較於任何尺度之電漿而較長許多。靜電場係相較於電磁波而可更為容易穿透FRC電漿。In the FRC of the system, the current system is mainly carried by ions that are in the orbit of the beta accelerator, and the orbital systems will not be fixed to the rotating magnetic field lines. The ion system of the large orbit is important for stability and typical diffusion. Instead of the antenna, the electrode system is used as a cyclotron, and the ion system is driven by an electrostatic wave. The problem is completely static, because the frequency of the RF is less than 10 million cycles (Megacycle), making this wavelength (30 m) much longer than plasma of any size. The electrostatic field can penetrate the FRC plasma more easily than electromagnetic waves.
由諸個電極所產生的靜電波係設計以其為接近於離子或電子的平均方位角速度之一速度而行進。若該波係行進為較快於離子之平均速度,則將加速其且因而補償歸因於離子-電子碰撞之制動(drag)。然而,電子係由於與離子之庫侖碰撞而加速。於此情形,該波係必須具有其較慢於電子平均速度之一速度且電子係將加速該波。平均電子速度係小於平均離子速度,使得電子係必須為驅動於二個不同的頻率。較高的頻率係將為針對於離子,且能量係必須為由外部的電路所供應。針對於電子,能量係可為引取於較低的頻率。The electrostatic wave system produced by the electrodes is designed to travel at a speed close to the average azimuthal velocity of the ions or electrons. If the wave travels faster than the average velocity of the ions, it will accelerate and thus compensate for the drag due to ion-electron collisions. However, the electron system is accelerated by collision with the Coulomb of ions. In this case, the wave system must have a speed that is slower than the average speed of the electrons and the electron system will accelerate the wave. The average electron velocity is less than the average ion velocity such that the electronics must be driven at two different frequencies. The higher frequency will be for the ions and the energy system must be supplied by an external circuit. For electrons, the energy system can be drawn at a lower frequency.
一種四極RF驅動系統係顯示於第21A與21B圖。如圖所繪,RF驅動系統係包含一個四極迴旋加速器1110,其位在於室310之內且具有四個方位角對稱的電極1112以及於其間的間隙1114。四極迴旋加速器1110係產生一電位波,其旋轉於如同離子的方位角速度之相同方向而為於一較大的速度。適當速度之離子係可為捕獲於此波,且為週期性反射。此過程係增大燃料離子之動量與能量,且此增大係傳遞至其為並未由碰撞所捕獲之燃料離子。自該燃料電漿335之燃料離子係可藉由注入中性者於任何便利的速度而取代。A quadrupole RF drive system is shown in Figures 21A and 21B. As depicted, the RF drive system includes a quadrupole cyclotron 1110 located within chamber 310 and having four azimuthal symmetrical electrodes 1112 with a gap 1114 therebetween. The quadrupole cyclotron 1110 generates a potential wave that rotates in the same direction as the azimuthal angular velocity of the ions to a greater velocity. An ion system of appropriate velocity can capture this wave and be periodically reflected. This process increases the momentum and energy of the fuel ions, and this increase is transmitted to the fuel ions that are not captured by the collision. The fuel ion from the fuel plasma 335 can be replaced by injecting a neutral at any convenient rate.
欲驅動電流之一種替代及補充的方法係於該電極系統而增加附加的磁場線圈1116,其定位為關於磁通線圈325與四極迴旋加速器1110,且其為驅動於迴旋加速器電極1112之頻率的一半者。然而,提出於下文的論述係專用以說明僅有電極之形式者(不具有磁場線圈1116)。An alternative and complementary method of driving current is to add to the electrode system an additional field coil 1116 positioned relative to the flux coil 325 and the quadrupole cyclotron 1110 and which is half the frequency of the cyclotron electrode 1112. By. However, the discussion presented below is specific to illustrate the form of electrodes only (without magnetic field coil 1116).
於第21C圖,電極係說明針對於2個電極與4個電極。In Figure 21C, the electrode system is described for 2 electrodes and 4 electrodes.
藉由其具有指出的施加電壓之電極所建立的電位係針對於空間r<rb
之真空而指示於第21C圖。表示式係針對於最低階的諧波。其為藉由求解以下的拉普拉斯(Laplace)方程式而得到:
由於Φ(r,θ,t)係於θ為週期性而具有一週期為2π,其可展開於一傅立葉級數(Fourier series),即:
於方位角方向之波速度係±ω/(2l -1),使得較高階的諧波係具有一較小的相位速度與振幅。此等註解係應用於第21C圖之二個情形。頻率ω係將為接近於ωi ,即:針對於FRC之一剛性轉子平衡的離子之旋轉頻率。因此,針對於l =1, ω i 。針對於l =2, ω i /3,且波振幅係將實質為較低;考慮僅有最低階的諧波係因此為一良好的近似。Wave velocity system in azimuthal direction ±ω/(2 l -1), so that higher order harmonics have a smaller phase velocity and amplitude. These annotations are applied to the two cases of Figure 21C. The frequency ω will be close to ω i , ie the rotational frequency of the ions balanced for one of the rigid rotors of the FRC. Therefore, for l =1, ω i . For l = 2, ω i /3, and the wave amplitude will be substantially lower; consider only the lowest order harmonic system and therefore a good approximation.
電漿之響應係可由一介電張量(tensor)所描述。電場係產生電漿電流,其根據電荷不滅方程式而產生電荷分離:
淨結果係在於該拉普拉斯方程式為由下式所取代:
假設ω
=2ω i
+△ω
,使得波 ω
/2=ω i
+△ω
/2係稍為較快於離子。標準的剛性轉子分佈函數係針對於離子而假設:
有關之約化的分佈函數係:
由四極迴旋加速器所產生之靜電波的波速度係v w
=rω
/2=rω i
-△v w
。相較於波而移動較快之離子係反射,若
此係具有類似於朗道阻尼(Landau damping)之形式,但是其非為物理相同,因為朗道阻尼(成長)係一線性現象而此係明顯為非線性。由於
當v w
-rω i
=△v w v i
(即:離子熱速度),轉移至離子之功率係:
欲簡化該積分,Φ0 (r)係由Φ0 (r0 )所取代,即:於峰值密度之值,其為波振幅之一下限。To simplify the integration, Φ 0 (r) is replaced by Φ 0 (r 0 ), ie, the value of the peak density, which is the lower limit of the wave amplitude.
F(r)之詳細計算係指出:波振幅Φ0 (r0 )係小於其為2V0 的最大間隙電壓之約為10的一因數。此係將決定此種RF驅動器方法之限制。V0 係將由其可為承受之最大間隙電壓所限制,針對於一1公分的間隙係可能約為10千伏特。The detailed calculation of F(r) indicates that the wave amplitude Φ 0 (r 0 ) is less than a factor of about 10 which is the maximum gap voltage of 2V 0 . This will determine the limitations of this RF driver approach. The V 0 system will be limited by the maximum gap voltage it can withstand, and the gap system for a 1 cm portion may be approximately 10 kV.
針對於電流驅動器,一功率Pi
係必須為轉移至於頻率ωi
之離子,且一功率Pe
係必須為轉移至於頻率ωe
之電子。此係將補償於電子與離子之間的庫侖相互作用,其係降低離子速率而提高電子速率。(不存在功率轉移時,庫侖碰撞係將導致針對於電子與離子之相同速率且無電流)。欲維持電子與離子之平衡的平均電場係給定為:2πr 0
〈E θ
〉=IR
(27)其中,係電流/單位長度,且
針對於再度供應燃料於RF驅動器,燃料係可為以熔合時間t F 1
=1/n 1
〈σv
〉1
與t F 2
=1/n 2
〈σv
〉2
所給定的速率而取代任何能量;n1
與n2
係電漿離子密度且<συ>係反應性。大小係將為秒數。注入的中性者(以取代其燃燒且消失之燃料離子)係將於規模為毫秒之時間(針對於視模為101 5
cm- 3
之反應器密度)而迅速離子化且歸因於庫侖碰撞而加速為高達平均離子速度。然而,此係需要至<E θ
>之一附加者及至功率轉移之一附加者,以維持一穩態。該附加者為:
該功率係可提供電流驅動及重新供應燃料而未超過10千伏特/公分之最大間隙電壓振幅。考慮頻率係將為1百萬赫茲且磁場係將為規模100千高斯,並無擊穿係將為預期。針對於電流驅動及重新供應燃料所必須轉移之功率係類似於任何的電流驅動方法。然而,多年來,於1-10百萬赫茲之RF技術係已經為一種建立的高效率技術。運用電極以取代天線之所述的方法係具有一顯著的優點,因為針對於場穿透之條件係相較於電磁波而更為放寬。因此,此種方法係將具有關於循環功率與效率之優點。The power system provides current drive and refueling without exceeding a maximum gap voltage amplitude of 10 kV/cm. Considering that the frequency system will be 1 megahertz and the magnetic field system will be 100 kilogauss in size, no breakdown will be expected. The power that must be transferred for current drive and refueling is similar to any current drive method. However, over the years, RF technology at 1-10 megahertz has been an established high efficiency technology. The method of using electrodes to replace the antenna has a significant advantage because the conditions for field penetration are more relaxed than electromagnetic waves. Therefore, this method will have advantages with respect to cycle power and efficiency.
顯著而言,用於形成一FRC於上述的一約束系統300或類似者之此二種技術係可造成具有適用以引起核子熔合於其之電漿。尤其是,由此等方法所形成之FRC係可加速至任何期望階層之旋轉能量與磁場強度。此係針對於熔合應用與高能量燃料束之典型約束而為重要。因此,於約束系統300係成為可能捕獲及約束高能量的電漿束於充分的時間週期以引起於其之一熔合反應。Significantly, the two techniques used to form a FRC in a constraining system 300 or the like described above can result in a plasma having a suitability to cause the nucleus to fuse thereto. In particular, the FRC system formed by such methods can accelerate the rotational energy and magnetic field strength to any desired level. This is important for the typical constraints of fusion applications and high energy fuel bundles. Thus, it is possible for the restraint system 300 to capture and constrain the high energy plasma beam for a sufficient period of time to cause one of its fusion reactions.
欲配合熔合,由此等方法所形成之FRC係較佳為藉由貝他加速器加速而加速至適當階層之旋轉能量與磁場強度。然而,熔合係針對於進行之任何的反應而傾向為需要一特定組之物理條件。此外,欲達成燃料之有效率的燃燒且得到一確實能量平衡,燃料係必須保持於此狀態為實質未改變於延長時間週期。此係重要,由於高動能溫度及/或能量係描述一熔合相關狀態之特徵。因此,此狀態之產生係需要能量之可觀的輸入,其僅若大部分燃料為經過熔合而可為恢復。結果,燃料之約束時間係必須相較於其燃燒時間而為較長。此係導致一確實能量平衡且因此為淨能量輸出。In order to cooperate with fusion, the FRC system formed by such methods is preferably accelerated to a suitable level of rotational energy and magnetic field strength by acceleration by a beta accelerator. However, the fusion system tends to require a specific set of physical conditions for any reaction to be performed. In addition, in order to achieve efficient combustion of the fuel and to achieve a true energy balance, the fuel system must remain in this state for substantially no change over an extended period of time. This is important because high kinetic energy temperatures and/or energy systems characterize a fusion-related state. Therefore, the generation of this state requires a considerable input of energy that can be recovered only if most of the fuel is fused. As a result, the constraint time of the fuel must be longer than its combustion time. This results in a true energy balance and is therefore a net energy output.
本發明之一個顯著優點係在於:本文所述之約束系統與電漿係能夠為長的約束時間,即,其超過燃料燃燒時間之約束時間。因此,針對於熔合之一個典型狀態係由下列的物理條件(其傾向為基於燃料與操作模式而變化)而描述其特徵:平均離子溫度:於約30至230 keV之一範圍且較佳為於約80至230 keV之一範圍。A significant advantage of the present invention is that the restraint system and the plasma system described herein can be of long constraint time, i.e., it exceeds the constraint time of fuel burn time. Thus, a typical state for fusion is characterized by the following physical conditions, which tend to vary based on fuel and mode of operation: average ion temperature: in the range of about 30 to 230 keV and preferably A range of about 80 to 230 keV.
平均電子溫度:於約30至100 keV之一範圍且較佳為於約80至100 keV之一範圍。The average electron temperature is in the range of about 30 to 100 keV and preferably in the range of about 80 to 100 keV.
燃料束(注入的離子束與環繞的電漿束)之同調(coherent)的能量:於約100 keV至3.3 MeV之一範圍且較佳為於約300 keV至3.3 MeV之一範圍。The coherent energy of the fuel beam (injected ion beam and surrounding plasma beam) is in the range of about 100 keV to 3.3 MeV and preferably in the range of about 300 keV to 3.3 MeV.
總磁場:於約47.5至120 kG之一範圍且較佳為於約95至120 kG之一範圍(藉著於約2.5至15 kG之一範圍且較佳為於約5至15 kG之一範圍的外部施加場)。The total magnetic field: in the range of about 47.5 to 120 kG and preferably in the range of about 95 to 120 kG (by one of about 2.5 to 15 kG and preferably about 5 to 15 kG) External application field).
典型約束時間:大於燃料燃燒時間且較佳為於約10至100秒之一範圍。Typical constraint time: greater than the fuel burn time and preferably in the range of from about 10 to 100 seconds.
燃料離子密度:於約101 4 至小於101 6 cm- 3 之一範圍且較佳為於約101 4 至101 5 cm- 3 之一範圍。Fuel ion density: in about 1014 to less than 10 1 6 cm - 3 and preferably one of a range of about 1014 to 10 1 5 cm - one 3 range.
總熔合功率:較佳為於約50至450 kW/cm之一範圍(室長度之每公分的功率)。Total fusion power: preferably in the range of about 50 to 450 kW/cm (power per division of chamber length).
欲順應上述的熔合狀態,FRC係較佳為加速至同調旋轉能量之一階層,其較佳為於約100 keV至3.3 MeV之一範圍且更佳為於約300 keV至3.3 MeV之一範圍,且FRC係較佳為加速至磁場強度之一階層,其較佳為於約45至120 kG之一範圍且更佳為於約90至115 kG之一範圍。於此等階層,如上所述而為中性化及極化之高能量的離子束係可注入至FRC且捕獲以形成一電漿束層,其中,電漿束離子係磁性約束且電漿束電子係靜電約束。In order to comply with the above-described fusion state, the FRC system is preferably accelerated to one of the levels of coherent rotational energy, preferably in the range of about 100 keV to 3.3 MeV and more preferably in the range of about 300 keV to 3.3 MeV. Preferably, the FRC system is accelerated to a level of magnetic field strength, preferably in the range of from about 45 to 120 kG and more preferably in the range of from about 90 to 115 kG. At these levels, a high energy ion beam system that is neutralized and polarized as described above can be injected into the FRC and captured to form a plasma beam layer, wherein the plasma beam ion is magnetically constrained and the plasma beam is Electrostatics are electrostatically constrained.
較佳而言,電子溫度係保持儘實際可能為低,以降低韌致輻射(bremsstrahlung radiation)之量,其否則係將導致輻射能量損耗。本發明之靜電能量井係提供其達成此舉之一種有效方式。Preferably, the electronic temperature is kept as low as practical to reduce the amount of bremsstrahlung radiation, which would otherwise result in loss of radiant energy. The electrostatic energy well system of the present invention provides an effective way to achieve this.
離子溫度係較佳為保持於其提供有效率的燃燒(burn-up)之一階層,由於熔合橫截面係離子溫度之一函數。燃料離子束之高的直接能量係必要以提供如同論述於此申請案之典型的遷移。此亦使得於燃料電漿之不穩定性的效應為最小。磁場係一致於束旋轉能量。其部分為由電漿束(自我場)所建立且依次提供支援與力量以保持電漿束於期望的軌道。The ion temperature is preferably maintained at one of the levels of the burn-up that it provides for efficiency, due to the melting cross-section being a function of ion temperature. The high direct energy of the fuel ion beam is necessary to provide a typical migration as discussed in this application. This also minimizes the effects of instability of the fuel plasma. The magnetic field is consistent with the beam rotation energy. Part of it is established by the plasma beam (self-field) and in turn provides support and power to keep the plasma beam in the desired orbit.
熔合產物係產生於電力核心且主要為接近於零位表面86,自其,產物係藉由擴散而顯現為朝向分界面84(參閱第3與5圖)。此係歸因於關於電子之碰撞(由於關於離子之碰撞係未改變質量中心且因此並未引起其改變場線)。因為其高動能的能量(熔合產物離子係具有相較於燃料離子之較高許多的能量),熔合產物係可為易於跨越分界面84。一旦其為超過分界面84,其可離開沿著開放場線80,假設其經歷自離子對離子碰撞之散射。雖然此碰撞過程係並未導致擴散,其可改變離子速度向量之方向,俾使其指向為平行於磁場。此等開放場線80係連接該核心之FRC拓撲與其提供於FRC拓撲之外側的均勻施加場。產物離子係顯現於不同的場線,其依循一能量分佈。有利而言,產物離子與電荷-中性化電子係顯現其形式為自燃料電漿的二端之旋轉環狀束。舉例而言,針對於一p-B1 1 反應之一種50MW設計,此等束係將具有約為50公分之半徑與約為10公分之厚度。於分界面84之外側所得到的強磁場(典型為約100kG),產物離子係具有迴轉半徑之一關聯分佈,其針對於大多數的高能產物離子而為變化自約1公分之一最小值至約3公分之一最大值。The fused product is produced in the power core and is primarily near the zero surface 86 from which the product appears to be directed toward the interface 84 by diffusion (see Figures 3 and 5). This is due to the collision with respect to electrons (since the collision center with respect to ions does not change the center of mass and therefore does not cause it to change the field line). Because of its high kinetic energy (the fused product ion system has a much higher energy than the fuel ion), the fused product can be easily spanned across the interface 84. Once it is beyond the interface 84, it can exit along the open field line 80, assuming it experiences scattering from ion-to-ion collisions. Although this collision process does not result in diffusion, it can change the direction of the ion velocity vector so that it is directed parallel to the magnetic field. These open field lines 80 are connected to the core's FRC topology and to the uniform applied field provided on the outside of the FRC topology. The product ion system appears on different field lines, which follow an energy distribution. Advantageously, the product ions and the charge-neutralized electrons exhibit a rotating annular bundle in the form of two ends from the fuel plasma. For example, for a 50 MW design of a p-B 1 1 reaction, the beam systems will have a radius of about 50 cm and a thickness of about 10 cm. The strong magnetic field (typically about 100 kG) obtained on the outside of the interface 84, the product ion system has an associated distribution of the radius of gyration, which varies from about 1 cm to a minimum for most high energy product ions. A maximum of about 3 cm.
初始,產物離子係具有其描述為M(v p a r )2 與M(v p e r p )2 之縱向以及旋轉的能量,v p e r p 係關聯於繞於其作為軌道中心的一場線之旋轉的方位角速度。由於場線係在其離開FRC拓撲之後為散開,旋轉能量係傾向為減小而總能量係維持固定。此係產物離子之磁性動量的緩漸不變性(adiabatic invariance)之結果。眾所週知於此技藝的是:軌道繞行於一磁場之帶電荷粒子係具有關聯於其動作之一磁性動量。以粒子為移動沿著一緩慢變化的磁場而論,亦存在由M(v p e r p )2 /B所描述的動作之一緩漸不變性。軌道繞行於其個別的場線之產物離子係具有一磁性動量與關聯於其動作之該種緩漸不變性。由於B係以約為10之一因數而減小(由場線之展開而指出),推論的是:v p e r p 係將同樣以約為3.2而減小。因此,當產物離子為到達均勻的場區域,其旋轉能量係將為小於其總能量之5%;換言之,幾乎所有的能量係於縱向的分量。Initially, the product ion system has its description as M( v p a r ) 2 with The longitudinal direction of M( v p e r p ) 2 and the energy of rotation, v p e r p , are related to the azimuthal angular velocity about the rotation of a field line around it as the center of the orbit. Since the field line is spread after it leaves the FRC topology, the rotational energy system tends to decrease while the total energy system remains fixed. This is the result of the adiabatic invariance of the magnetic momentum of the product ions. It is well known in the art that a charged particle system orbiting a magnetic field has a magnetic momentum associated with one of its actions. Moving with particles along a slowly changing magnetic field also exists One of the actions described by M( v p e r p ) 2 /B is gradually invariant. The product ion system that orbits its individual field lines has a magnetic momentum and this gradual invariance associated with its action. Since the B-system is reduced by a factor of about 10 (as indicated by the spread of the field lines), it is inferred that: v p e r p will also decrease by about 3.2. Thus, when the product ions are in a uniform field region, their rotational energy system will be less than 5% of their total energy; in other words, almost all of the energy is in the longitudinal component.
本發明之直接能量轉換系統係包含於第22A與22B圖所示之一逆向迴旋加速器轉換器(ICC)420,其為耦接至一碰撞束熔合反應器(CBFR)410之一(部分顯示)電力核心436以形成一電漿電力產生系統400。一第二ICC(未顯示)係可為對稱配置至CBFR 410之左側。一磁性尖端486係位在於CBFR 410與ICC 420之間,且當CBFR 410與ICC 420係合併時而為形成。The direct energy conversion system of the present invention is included in one of the reverse cyclotron converters (ICC) 420 shown in FIGS. 22A and 22B, which is coupled to one of the collision beam fusion reactors (CBFR) 410 (partial display). Power core 436 is formed to form a plasma power generation system 400. A second ICC (not shown) may be symmetrically configured to the left of CBFR 410. A magnetic tip 486 is located between CBFR 410 and ICC 420 and is formed when CBFR 410 is combined with ICC 420.
在詳細說明ICC 420與其操作之前,一種典型的迴旋加速器之概論係提出。於習用的迴旋加速器,具有垂直於一磁場之速度的高能離子係旋轉於圓形方式。高能離子之軌道半徑係由磁場強度與其電荷對質量比而決定,且隨著能量而增大。然而,離子之旋轉頻率係無關於其能量。此事實係已經利用於迴旋加速器之設計。Before describing ICC 420 and its operation in detail, an overview of a typical cyclotron is presented. In conventional cyclotrons, a high energy ion system having a velocity perpendicular to a magnetic field is rotated in a circular manner. The orbital radius of a high-energy ion is determined by the strength of the magnetic field and its charge-to-mass ratio, and increases with energy. However, the rotational frequency of the ions is irrelevant to its energy. This fact has been exploited in the design of cyclotrons.
參考第24A圖,一種習用的迴旋加速器700係包括二個鏡像C形的電極710,形成其為置放於一均勻磁場720之鏡像D形的腔部,磁場720係具有其垂直於對稱性之電極平面(即:頁面)的場線。一振盪電位係施加於C形的電極之間(參閱第21B圖)。離子I係發射自其置放於迴旋加速器700之中央的一源。磁場720係調整以使得離子之旋轉頻率為匹配該電位與關聯的電場之旋轉頻率。若一離子I係以如同電場之相同方向而跨越於C形的電極710之間的間隙730,則其為加速。藉由加速該離子I,其能量與軌道半徑係增大。當該離子係已經行進一半圓的弧形(未經歷於能量之增大),其再次為跨越該間隙。此時,於C形的電極710之間的電場係已經逆轉方向。離子I係再次為加速,且其能量係進而增大。此過程係每當該離子為跨越間隙730而重複,假若其旋轉頻率係持續為匹配該振盪電場之旋轉頻率(參閱第24C圖)。另一方面,當電場為於相反的方向,若一粒子係跨越間隙730,則其將為減速且返回至中央之源。僅有其具有垂直於磁場720的初始速度且於振盪電場的適當相位而跨越間隙730之粒子係將加速。因此,適當的相位匹配係針對於加速為非常重要。Referring to Figure 24A, a conventional cyclotron 700 includes two mirrored C-shaped electrodes 710 formed as mirrored D-shaped cavities placed in a uniform magnetic field 720 having a perpendicular to symmetry. The field line of the electrode plane (ie: page). An oscillating potential is applied between the C-shaped electrodes (see Figure 21B). The ion I is emitted from a source placed in the center of the cyclotron 700. The magnetic field 720 is adjusted such that the rotational frequency of the ions is the rotational frequency that matches the potential and the associated electric field. If an ion I straddles the gap 730 between the C-shaped electrodes 710 in the same direction as the electric field, it is accelerated. By accelerating the ion I, its energy and orbital radius are increased. When the ion system has traveled a half circle arc (not experiencing an increase in energy), it again spans the gap. At this time, the electric field between the C-shaped electrodes 710 has reversed the direction. The ion I system is accelerated again, and its energy system is further increased. This process is repeated each time the ion crosses the gap 730, provided that its rotational frequency continues to match the rotational frequency of the oscillating electric field (see Figure 24C). On the other hand, when the electric field is in the opposite direction, if a particle system spans the gap 730, it will decelerate and return to the central source. Only the particle system having an initial velocity perpendicular to the magnetic field 720 and crossing the gap 730 at the appropriate phase of the oscillating electric field will accelerate. Therefore, proper phase matching is very important for acceleration.
原則上,一迴旋加速器係可運用以自一筆狀束之相等高能的離子而引取動能。藉著迴旋加速器之離子的減速而不具有能量引取係已經針對於質子而觀察,如由Bloch與Jeffries所述(Phys.Rev.80,305(1950))。離子係可注入至腔部,俾使其成為相對於振盪場之一減速狀態。所有的離子係將接著為逆向於第24A圖所示的加速離子之軌跡T。由於離子係歸因於相互作用於電場而減速,其動能係轉變為於該迴旋加速器為其部分者之電路的振盪電能。直接轉換至電能係將達成且傾向為具有極高的效率而發生。In principle, a cyclotron system can be used to extract kinetic energy from ions of equal high energy from a bundle of beams. The deceleration of the ions by the cyclotron without the energy draw has been observed for protons, as described by Bloch and Jeffries (Phys. Rev. 80, 305 (1950)). The ion system can be injected into the cavity, causing it to decelerate relative to one of the oscillating fields. All of the ion systems will then follow the trajectory T of the accelerated ions as shown in Fig. 24A. Since the ion system is decelerated due to interaction with the electric field, its kinetic energy is converted into oscillating electrical energy of the circuit in which the cyclotron is part of it. Direct conversion to electrical energy will be achieved and tends to occur with extremely high efficiency.
實際上,一離子束之離子係將為以所有可能的相位而進入該迴旋加速器。除非變動的相位係補償於迴旋加速器之設計,一半的離子係將加速而另一半的離子係將減速。結果,最大的轉換效率係將有效為50%。甚者,上述之環狀的熔合產物離子束係針對於習用的迴旋加速器為一不適合的幾何性。In fact, the ion system of an ion beam will enter the cyclotron in all possible phases. Unless the varying phase is compensated for the cyclotron design, half of the ion system will accelerate and the other half of the ion system will decelerate. As a result, the maximum conversion efficiency will be effective at 50%. Moreover, the above-described annular fusion product ion beam system is an unsuitable geometry for conventional cyclotrons.
如更為詳述於後文,本發明之ICC係順應其退出熔合反應器電力核心之FRC的熔合產物束之環狀特徵、於該束的離子之隨機相對相位、與其能量之散佈。As will be described in more detail below, the ICC of the present invention conforms to the annular character of the fused product bundle exiting the FRC of the fusion reactor power core, the random relative phase of the ions of the beam, and the dispersion of its energy.
參考回到第22A圖,CBFR 410之一電力核心436的一部分者係圖示於左側,其中,一電漿燃料核心435係約束於一FRC 470,其係部分歸因於由外側的場線圈425所施加之一磁場而形成。FRC 470係包括閉合場線482、一分界面484、與開放場線480,如上所述,其決定熔合產物之環狀束437的性質。開放場線480係延伸為遠離該電力核心436而朝向磁性尖端486。如上所述,熔合產物係以其包含高能的離子與電荷中性化的電子之一環狀束437之形式而顯現自該電力核心436為沿著開放場線480。Referring back to FIG. 22A, a portion of one of CBFR 410 power cores 436 is shown on the left side, wherein a plasma fuel core 435 is constrained to an FRC 470, which is partially attributed to the field coil 425 from the outside. It is formed by applying a magnetic field. The FRC 470 includes a closed field line 482, a sub-interface 484, and an open field line 480, which, as described above, determines the properties of the annular bundle 437 of the fused product. The open field line 480 extends away from the power core 436 toward the magnetic tip 486. As noted above, the fused product emerges from the power core 436 along the open field line 480 in the form of an annular bundle 437 of electrons containing high energy ions and charge neutralization.
ICC 420之幾何性係類似於其具有長度為約五公尺之一中空的圓柱。較佳而言,具有小、直立的間隙497之四或多個相等、半圓柱形的電極494係構成圓柱表面。於操作,一振盪電位係以一種交替方式而施加至電極494。於轉換器之內的電場E係具有一四極結構,如於第22B圖所示之端視圖而指出。電場E係消失於對稱軸且為隨著半徑而線性增大;峰值係於間隙497。The geometry of ICC 420 is similar to a cylinder having a hollow length of about five meters. Preferably, four or more equal, semi-cylindrical electrodes 494 having small, upstanding gaps 497 form a cylindrical surface. In operation, an oscillating potential is applied to electrode 494 in an alternating manner. The electric field E within the converter has a quadrupole structure as indicated in the end view shown in Figure 22B. The electric field E disappears from the axis of symmetry and increases linearly with radius; the peak is at gap 497.
此外,ICC 420係包括外側的場線圈488以形成均勻的磁場於ICC的中空圓柱幾何結構之內。因為電流係以相反於其流通過CBFR場線圈425的電流方向之一方向而流通過ICC場線圈488,於ICC 420之場線496係以相反於CBFR 410之開放場線480的方向之一方向而行進。於最遠離自CBFR 410之電力核心436的一端,ICC 420係包括一離子收集器492。In addition, ICC 420 includes an outer field coil 488 to form a uniform magnetic field within the hollow cylindrical geometry of the ICC. Because the current flows through the ICC field coil 488 in a direction opposite to the direction of current flow through the CBFR field coil 425, the field line 496 at ICC 420 is in a direction opposite to the direction of the open field line 480 of the CBFR 410. And marching. At one end of the power core 436 that is furthest from the CBFR 410, the ICC 420 includes an ion collector 492.
於CBFR 410與ICC 420之間係一對稱的磁性尖端486,其中,CBFR 410之開放場線480係合併於ICC 420之場線496。一環狀的電子收集器490係定位於磁性尖端486且為電氣耦接至離子收集器492。如下文所論述,磁性尖端486之磁場係轉換束437之軸向速度至其具有高效率之一旋轉速度。第22C圖係說明於轉換器420之內的一種典型離子軌道422。A symmetrical magnetic tip 486 is formed between CBFR 410 and ICC 420, wherein open field line 480 of CBFR 410 is incorporated in field line 496 of ICC 420. An annular electron collector 490 is positioned at the magnetic tip 486 and is electrically coupled to the ion collector 492. As discussed below, the magnetic field of the magnetic tip 486 converts the axial velocity of the beam 437 to one of its rotational speeds with high efficiency. Figure 22C illustrates a typical ion track 422 within converter 420.
CBFR 410係具有一圓柱的對稱性。於其中央者係熔合電力核心436且一熔合電漿核心435係約束於熔合反應為進行於其之一FRC 470磁場拓撲。如所指出,產物核子與電荷中性化電子係顯現為自該燃料電漿435的二端之環狀束437。舉例而言,針對於一p-B1 1 反應之一種50 MW設計,此等束係將具有約為50公分之一半徑與約為10公分之一厚度。環狀束係具有一密度n107 -108 cm3 。針對於該密度,磁性尖端486係分開電子與離子。電子係依循磁場線至電子收集器490且離子係通過尖端486,於其中,離子軌跡係修正以依循沿著ICC 420的長度之一實質為螺旋形的路徑。能量係隨著離子為螺旋通過其連接至一共振電路(未顯示)之電極494而移除自離子。垂直能量之損耗係針對於初始循環接近電極494之最高能量的離子而為最大,於電極494之處的電場係最強。The CBFR 410 series has a cylindrical symmetry. The central portion of the fusion power core 436 and a fused plasma core 435 are constrained to the fusion reaction to proceed to one of the FRC 470 magnetic field topologies. As indicated, the product nucleus and the charge-neutralized electron system appear as an annular bundle 437 from both ends of the fuel plasma 435. For example, for a 50 MW design of a p-B 1 1 reaction, the beam systems will have a radius of about 50 cm and a thickness of about 10 cm. Annular beam system has a density n 10 7 -10 8 cm 3 . For this density, the magnetic tip 486 separates electrons and ions. The electrons follow the magnetic field lines to the electron collector 490 and the ions pass through the tip 486 where the ion trajectory is modified to follow a substantially helical path along one of the lengths of the ICC 420. The energy system is self-ionized as the ions are helically connected through their electrodes 494 to a resonant circuit (not shown). The loss of vertical energy is greatest for ions that are initially circulating close to the highest energy of electrode 494, and the electric field at electrode 494 is the strongest.
離子係藉著大約等於初始的總能量之旋轉能量而到達磁性尖端486,即:Mv p 2 Mv 0 2
。當離子到達磁性尖端486,存在離子能量與離子初始半徑r0
之一分佈。然而,初始半徑r0
係傾向為大約正比於初始速度v0
。徑向的磁場與徑向的束速度係產生於方位角方向之一勞倫茲力。於尖端486之磁場係未改變粒子能量而是轉換初始的軸向速度vp 0
至一剩餘軸向速度vz
與一方位角速度v⊥
,其中,v0 2
=vz 2
+v⊥ 2
。方位角速度v⊥
之值係可為決定自正則(canonical)動量不滅原理:
一束離子係進入尖端486之左手側,藉著B z
=B 0
,vz
=v0
,v⊥
=0及r
=r 0
。束離子係顯現於尖端486之右手側,藉著r
=r 0
,B z
=-B 0
,v⊥
=qB 0 r 0
/Mc
及:
為了離子為通過尖端486,有效離子迴轉半徑係必須為大於於半徑r0 之尖端486的寬度。以一因數10而降低軸向速度係相當為實驗可行,使得剩餘的軸向能量係將為以一因數100而降低。然後,99%離子能量係將轉換至旋轉能量。離子束係具有針對於v0 與r0 的諸值之一分佈。然而,因為r0 係正比於v0 ,如同為由基於FRC的反應器之性質所先前指出,針對於所有的離子之轉換至旋轉能量的效率係傾向為99%。In order for the ions through the tip 486, the effective ionic radius of gyration r width must be based of the tip 486 is greater than 0 in radius. Reducing the axial velocity by a factor of 10 is quite experimentally feasible, so that the remaining axial energy system will be reduced by a factor of 100. Then, the 99% ion energy system will switch to rotational energy. The ion beam system has a distribution for one of the values of v 0 and r 0 . However, since r 0 is proportional to v 0 , as previously indicated by the nature of the FRC-based reactor, the efficiency for the conversion of all ions to rotational energy tends to be 99%.
如於第22B圖所繪出,本發明之ICC 420的對稱電極結構係較佳為包括四個電極494。一種儲能(tank)電路(未顯示)係連接至電極結構494,使得瞬間的電壓與電場係如圖所示。該電壓與儲能電路係振盪於一頻率ω=Ω0 。於間隙497之方位角的電場E係說明於第22B與25圖。第25圖係說明於諸個電極494之間的間隙497之電場與隨著其旋轉於角速度Ω0 的一離子所遭受之場。顯明的是:於一完整的旋轉,粒子係將以初始相位所決定之一順序而交替式遭受加速與減速。除了方位角的電場Eθ ,亦存在一徑向的電場Er 。方位角的電場Eθ 係於尖端497為最大且隨著半徑減小而減小。第22圖係假設粒子旋轉為維持一固定半徑。因為於電場之梯度,減速係將一直支配於加速。加速相位係使得離子半徑為增大,俾使當離子係接著遭遇一減速的電場時,離子半徑係將為較大。減速相位係支配而無關於離子之初始相位,因為方位角的電場Eθ 之徑向梯度係一直為正。結果,能量轉換效率係並未歸因於關聯於習用的迴旋加速器之初始相位問題而受限於50%。徑向的電場Er 係亦為重要。其亦振盪且產生於徑向方向之一淨效應,其返回束軌跡至原始的半徑而具有垂直於軸之平面的零速度,如同於第22C圖。As depicted in FIG. 22B, the symmetric electrode structure of ICC 420 of the present invention preferably includes four electrodes 494. A tank circuit (not shown) is coupled to electrode structure 494 such that the instantaneous voltage and electric field are as shown. The voltage and the energy storage circuit oscillate at a frequency ω = Ω 0 . The electric field E at the azimuth angle of the gap 497 is illustrated in Figures 22B and 25. Figure 25 illustrates the electric field of the gap 497 between the electrodes 494 and the field it is subjected to as it rotates at an angular velocity Ω 0 . It is obvious that in a complete rotation, the particle system will alternately accelerate and decelerate in the order determined by the initial phase. In addition to the azimuthal electric field E θ , there is also a radial electric field E r . The azimuthal electric field E θ is greatest at the tip 497 and decreases as the radius decreases. Figure 22 assumes that the particles rotate to maintain a fixed radius. Because of the gradient of the electric field, the deceleration system will always dominate the acceleration. Accelerating the phase system increases the ionic radius so that the ionic radius will be larger when the ion system subsequently encounters a decelerating electric field. The deceleration phase dominates without regard to the initial phase of the ion, since the radial gradient of the azimuthal electric field E θ is always positive. As a result, the energy conversion efficiency is not limited to 50% due to the initial phase problem associated with conventional cyclotrons. The radial electric field Er is also important. It also oscillates and produces a net effect in one of the radial directions that returns the beam trajectory to the original radius with zero velocity perpendicular to the plane of the axis, as in Figure 22C.
離子為藉其一直減速之過程係類似於強聚焦之原理,其為現代加速器之一個本質的特徵,如於美國專利第2,736,799號所述。一正(聚焦)透鏡與負(散焦)透鏡之組合係正,若磁場係具有一正的梯度。一強聚焦四極成對透鏡係說明於第26圖。第一透鏡係聚焦於x方向而散焦於y方向。第二透鏡係類似而x與y性質為互換。磁場係消失於對稱軸且具有一正的徑向梯度。針對於通過二個透鏡之一離子束之淨結果係無關於通過順序而聚焦於所有方向。The process by which ions are decelerated all the time is similar to the principle of strong focusing, which is an essential feature of modern accelerators, as described in U.S. Patent No. 2,736,799. The combination of a positive (focus) lens and a negative (defocus) lens is positive if the magnetic field has a positive gradient. A strong focus quadrupole paired lens system is illustrated in Figure 26. The first lens system is focused in the x direction and defocused in the y direction. The second lens is similar and the x and y properties are interchangeable. The magnetic field system disappears from the axis of symmetry and has a positive radial gradient. The net result for the ion beam passing through one of the two lenses is focused on all directions without ordering.
類似的結果係已經報告為針對於其通過一共振腔部之一束,該腔部係含有一強的軸向磁場且為操作於TE1 1 1 模式(參閱:Yoshikawa等人之參考文獻)。此裝置係稱為一種peniotron。於TE1 1 1 模式,共振腔部係具有駐波,其中,電場係具有四極的對稱性。該等結果係定性為類似於本文所述的一些結果。定量的差異係存在於:共振腔部係尺寸為較大許多(10公尺長),且操作於較高許多之頻率(155 MHz)與磁場(10 T)。來自高頻波之能量取出係需要一種矽整流二極體天線(rectenna)。該束之能量的頻譜係降低轉換之效率。二種的離子之存在係一個更為嚴重的問題,但轉換之效率係適用於其產生15 MeV質子之一種D-He3 反應器。Similar results have been reported for a beam passing through a resonant cavity that contains a strong axial magnetic field and is operated in the TE 1 1 1 mode (see: Yoshikawa et al.). This device is called a peniotron. In the TE 1 1 1 mode, the resonant cavity has a standing wave, wherein the electric field has a quadrupole symmetry. These results are qualitatively similar to some of the results described herein. Quantitative differences exist in that the cavity size is much larger (10 meters long) and operates at much higher frequencies (155 MHz) and magnetic fields (10 T). An energy extraction system from a high frequency wave requires a rectifying diode antenna. The spectrum of the energy of the beam reduces the efficiency of the conversion. The presence of the two ions is a more serious problem, but the efficiency of the conversion is suitable for a D-He 3 reactor that produces 15 MeV protons.
針對於ICC 420的一粒子之單一粒子軌道422係說明於第22C圖。此結果係藉由電腦模擬而得到,且一類似的結果係針對於peniotron而得到。進入於某個半徑r0 之一離子係螺旋行進朝向ICC之長度且在喪失初始的旋轉能量之後係收斂至於相同半徑r0 之一圓的一點。初始條件係非對稱;最終的狀態係反映此非對稱性,但其為無關於初始相位,使得所有的粒子係減速。於ICC的離子收集器端之束係同樣為環形且為類似的尺寸。軸向的速度係將減小為一因數10而且密度係對應為增大。針對於單一粒子,99%之一引出效率係可行。然而,種種的因素(諸如:在其進入轉換器之前的環形束之垂直旋轉能量)係可降低此效率為約5%。電力引出係將為於約1-10 MHz且較佳為約5-10 MHz,於轉換效率之額外的降低係歸因於功率調節以連接至一功率柵極。A single particle orbit 422 for a particle of ICC 420 is illustrated in Figure 22C. This result was obtained by computer simulation and a similar result was obtained for peniotron. One of the ions entering a certain radius r 0 spirals toward the length of the ICC and converges to a point of one of the same radius r 0 after losing the initial rotational energy. The initial conditions are asymmetrical; the final state reflects this asymmetry, but it is irrelevant to the initial phase, causing all particle systems to slow down. The bundle at the ion collector end of the ICC is also annular and of similar size. The axial velocity will be reduced to a factor of 10 and the density is correspondingly increased. For single particles, one of 99% extraction efficiency is feasible. However, various factors, such as the vertical rotational energy of the toroidal beam before it enters the converter, can reduce this efficiency by about 5%. The power take-off will be about 1-10 MHz and preferably about 5-10 MHz, with an additional reduction in conversion efficiency due to power conditioning to connect to a power grid.
如於第23A與23B圖所顯示,於ICC 420之電極結構494的替代實施例係可包括二個對稱的半圓形電極及/或其漸縮為朝向離子收集器492之漸縮(tapered)的電極494。As shown in Figures 23A and 23B, an alternate embodiment of electrode structure 494 at ICC 420 can include two symmetric semi-circular electrodes and/or they taper to taper toward ion collector 492. Electrode 494.
於ICC 420的主要磁場之內側的離子動態之調整係可運用二個輔助線圈組500與510而實施,如於第27A與27B圖所示。二個線圈組500與510係涉及相鄰的導體且具有反向的電流,使得磁場係具有一短範圍。如為示意說明於第27A圖,一磁場梯度係將改變離子旋轉頻率與相位。如為示意說明於第27B圖,一多極的磁場係將產生聚束作用(bunching),如同於一線性加速器。The adjustment of the ion dynamics inside the main magnetic field of ICC 420 can be implemented using two auxiliary coil sets 500 and 510, as shown in Figures 27A and 27B. The two coil sets 500 and 510 relate to adjacent conductors and have opposite currents such that the magnetic field system has a short range. As illustrated schematically in Figure 27A, a magnetic field gradient will change the ion rotation frequency and phase. As illustrated schematically in Figure 27B, a multipole magnetic field will produce bunching, as in a linear accelerator.
第28圖係說明一種100百萬瓦(MW)的反應器。剖示的產生器係說明一種熔合電力核心區域,其具有施加一均勻磁場之超導線圈以及用於形成具有場反轉拓撲的一磁場之一磁通線圈。熔合電力核心區域之相鄰的相對端係ICC能量轉換器,用於熔合產物的動能之直接轉換至電力。針對於該種反應器之支援設備係說明於第29圖。Figure 28 illustrates a 100 megawatt (MW) reactor. The generator of the illustration illustrates a fused power core region having a superconducting coil that applies a uniform magnetic field and a magnetic flux coil for forming a magnetic field having a field inversion topology. The adjacent opposite end ICC energy converters of the fused power core region are used to directly convert the kinetic energy of the fused product to electrical power. The supporting equipment for such a reactor is described in Fig. 29.
第30圖係說明一種電漿推力(thrust)推進系統800。該系統係包括一FRC電力核心836,於其為容納一熔合燃料核心835且自其二端之熔合產物為顯現於一環形束837之形式。一ICC能量轉換器820係耦接至電力核心的一端。一磁性噴嘴850係定位為相鄰於電力核心的另一端。環形束837之熔合產物係流出自該熔合電力核心的一端而沿著場線至用於能量轉換之ICC,且流出自該電力核心的另一端而沿著場線為出自針對於推力T之噴嘴。Figure 30 illustrates a plasma thrust propulsion system 800. The system includes an FRC power core 836 for receiving a fused fuel core 835 and the fused product from its ends is in the form of an annular bundle 837. An ICC energy converter 820 is coupled to one end of the power core. A magnetic nozzle 850 is positioned adjacent to the other end of the power core. The fusion product of the annular bundle 837 flows out from one end of the fused power core along the field line to the ICC for energy conversion, and flows out from the other end of the power core and along the field line from the nozzle for the thrust T .
儘管本發明係容許種種的修改及替代的形式,其一個特定實例係已經顯示於圖式且詳細說明於本文。然而,應為瞭解的是:本發明係不受限於所揭示的特別形式,反之,本發明係涵蓋其歸屬於隨附申請專利範圍之精神與範疇內的所有修改、等效者、與替代者。While the invention is susceptible to various modifications and alternative forms, a particular embodiment thereof is shown in the drawings. However, it should be understood that the invention is not to be limited to the particulars disclosed, but the invention is intended to cover all modifications, equivalents, and alternatives in the spirit and scope of the scope of the appended claims. By.
1...電容器組1. . . Capacitor bank
2...低溫設備2. . . Cryogenic equipment
3...加速器3. . . accelerator
4...加速器4. . . accelerator
5...真空泵5. . . Vacuum pump
6A...鋰或鈉鉀合金槽電磁泵與熱交換器6A. . . Lithium or sodium potassium alloy tank electromagnetic pump and heat exchanger
6B...蒸汽渦輪機與發電機6B. . . Steam turbine and generator
7...整流器7. . . Rectifier
8...變流器8. . . Converter
9...反應器輪廓9. . . Reactor profile
30...勞倫茲力30. . . Lorentz force
70...場反轉架構(FRC)70. . . Field Inversion Architecture (FRC)
78...中心軸(FRC軸)78. . . Center axis (FRC axis)
80...開放區域(場線)80. . . Open area (field line)
82...閉合區域82. . . Closed area
84...分界面84. . . Interface
86...零位表面86. . . Zero surface
88...FRC 70之中央部分88. . . Central part of the FRC 70
90...末端90. . . End
94...零位表面94. . . Zero surface
96...第一方向96. . . First direction
98...第二方向98. . . Second direction
100...離子移動方向100. . . Ion movement direction
102...反磁方向102. . . Antimagnetic direction
104...逆向反磁方向104. . . Reverse diamagnetic direction
106...電漿層106. . . Plasma layer
108、110...磁場108, 110. . . magnetic field
112...貝他加速器軌道112. . . Beta accelerator track
114...零位圓(表面)114. . . Zero circle (surface)
116...起始點116. . . Starting point
118...磁場118. . . magnetic field
120...零位圓半徑120. . . Zero circle radius
122...第一方向122. . . First direction
124...第二方向124. . . Second direction
126...梯度126. . . gradient
128...零位圓128. . . Zero circle
130...電場130. . . electric field
132、134...遠離零位表面86之方向132, 134. . . Far from the zero surface 86
136...零位表面136. . . Zero surface
138...漂移軌道138. . . Drift orbit
140...點140. . . point
142...小圓142. . . Small circle
144...旋轉144. . . Rotate
146...大圓146. . . Great circle
148...速度148. . . speed
150...磁場150. . . magnetic field
151...場反轉架構(FRC)151. . . Field Inversion Architecture (FRC)
152...勞倫茲力152. . . Lorentz force
154、156、158...曲線圖154, 156, 158. . . Graph
160...馬克士威分佈162之尾部160. . . The tail of the Maxwell distribution 162
162...馬克士威分佈162. . . Maxwell distribution
172...碰撞點172. . . Collision point
174...軌道(第14B圖)174. . . Track (Fig. 14B)
176...軌道(第14C圖)176. . . Track (Fig. 14C)
178...軌道(第14D圖)178. . . Track (Fig. 14D)
300...約束系統300. . . Constraint system
305...室壁305. . . Wall
310...約束室310. . . Constraint room
315...主軸315. . . Spindle
320...貝他加速器磁通線圈320. . . Beta accelerator flux coil
325...外線圈325. . . Outer coil
330...鏡式線圈330. . . Mirror coil
335...燃料電漿(束)335. . . Fuel plasma (bundle)
340...注入埠340. . . Injection
345...電漿源345. . . Plasma source
350...離子束350. . . Ion beam
400...電漿電力產生系統400. . . Plasma power generation system
410...碰撞束熔合反應器(CBFR)410. . . Collision beam fusion reactor (CBFR)
420...逆向迴旋加速器轉換器(ICC)420. . . Reverse cyclotron converter (ICC)
422...離子軌道422. . . Ion orbit
425...CBFR場線圈425. . . CBFR field coil
435...電漿燃料核心435. . . Plasma fuel core
436...電力核心436. . . Power core
437...環狀束437. . . Ring bundle
470...場反轉架構(FRC)470. . . Field Inversion Architecture (FRC)
480...開放場線480. . . Open field line
482...閉合場線482. . . Closed field line
484...分界面484. . . Interface
486...磁性尖端486. . . Magnetic tip
488...ICC場線圈488. . . ICC field coil
490...電子收集器490. . . Electronic collector
492...離子收集器492. . . Ion collector
494...電極494. . . electrode
496...場線496. . . Field line
497...間隙497. . . gap
500、510...輔助線圈組500, 510. . . Auxiliary coil set
700...迴旋加速器700. . . Cyclotron
710...電極710. . . electrode
720...磁場720. . . magnetic field
730...間隙730. . . gap
800...電漿推力推進系統800. . . Plasma thrust propulsion system
820...ICC能量轉換器820. . . ICC energy converter
835...熔合燃料核心835. . . Fusion fuel core
836...FRC電力核心836. . . FRC power core
837...環形束837. . . Ring bundle
850...磁性噴嘴850. . . Magnetic nozzle
1010...感應電漿源1010. . . Induction plasma source
1012...罩蓋1012. . . Cover
1014...段1014. . . segment
1015...安裝托架1015. . . Mounting bracket
1016...指部1016. . . Finger
1020...拉伐爾噴嘴1020. . . Laval nozzle
1022...噴嘴本體1022. . . Nozzle body
1023...噴嘴出口1023. . . Nozzle outlet
1024...表面1024. . . surface
1025...氣腔1025. . . Air cavity
1030...衝擊線圈組件1030. . . Impact coil assembly
1032...線圈本體1032. . . Coil body
1034...外環1034. . . Outer ring
1035...通道1035. . . aisle
1036...轂1036. . . hub
1037...端面1037. . . End face
1040...線圈繞組1040. . . Coil winding
1042...接線(股)1042. . . Wiring
1044...進入點1044. . . Entry point
1046...退出點1046. . . Exit point
1050...閥座環1050. . . Seat ring
1052...氣體通道1052. . . Gas passage
1054...閥座1054. . . Seat
1110...四極迴旋加速器1110. . . Quadrupole cyclotron
1112...電極1112. . . electrode
1114...間隙1114. . . gap
1116...磁場線圈1116. . . Magnetic field coil
1310...室1310. . . room
1311...室壁1311. . . Wall
1320...磁通線圈1320. . . Flux coil
1325...場線圈1325. . . Field coil
1330...鏡式線圈1330. . . Mirror coil
1360...斷流器1360. . . Current interrupter
1362...槽或間隙1362. . . Slot or gap
1364...插入物1364. . . Insert
1365...密封面板1365. . . Sealed panel
1366...金屬罩蓋1366. . . Metal cover
1367...O形環密封1367. . . O-ring seal
1369...溝或座1369. . . Ditch or seat
1370...肋部1370. . . Rib
較佳實施例係藉由舉例且非作為限制而說明於伴隨的圖式之諸圖,其中,相同的參考符號係指出相同的構件。The preferred embodiments are illustrated by way of example and not by way of limitation.
第1圖係顯示一個範例的約束室之部分視圖。Figure 1 shows a partial view of an example constrained chamber.
第2A圖係顯示另一個範例的約束室之部分視圖。Figure 2A shows a partial view of another example of a constraining chamber.
第2B圖係顯示沿著於第2A圖的線2B-2B之部分剖面圖。Figure 2B shows a partial cross-sectional view along line 2B-2B of Figure 2A.
第2C圖係顯示沿著於第2B圖的線2C之詳細視圖。Figure 2C shows a detailed view along line 2C of Figure 2B.
第2D圖係顯示沿著於第2B圖的線2D-2D之部分剖面圖。The 2D drawing shows a partial cross-sectional view along line 2D-2D of Fig. 2B.
第3圖係顯示一種FRC之磁場。Figure 3 shows the magnetic field of an FRC.
第4A與4B圖係分別顯示於一FRC之反磁與逆向反磁的方向。Figures 4A and 4B are shown in the direction of the diamagnetic and reverse diamagnetic directions of an FRC, respectively.
第5圖係顯示一種碰撞束系統。Figure 5 shows a collision beam system.
第6圖係顯示一種貝他加速器軌道。Figure 6 shows a beta accelerator track.
第7A與7B圖係分別顯示於一FRC之磁場與梯度漂移的方向。Figures 7A and 7B show the direction of the magnetic field and gradient drift of an FRC, respectively.
第8A與8B圖係分別顯示於一FRC之電場與×漂移的方向。Figures 8A and 8B show the electric field of an FRC, respectively. × The direction of the drift.
第9A、9B與9C圖係分別顯示離子漂移軌道。The 9A, 9B, and 9C diagrams show ion drift trajectories, respectively.
第10A與10B圖係顯示於一FRC之末端的勞倫茲力。Figures 10A and 10B show the Lorentz force at the end of an FRC.
第11A與11B圖係顯示於碰撞束系統之電場與電位的調整。Figures 11A and 11B show the adjustment of the electric field and potential of the collision beam system.
第12圖係顯示一種馬克士威分佈。Figure 12 shows a Maxwell distribution.
第13A與13B圖係顯示其歸因於大角度的離子-離子碰撞之自貝他加速器軌道至漂移軌道的轉變。Figures 13A and 13B show the transition from the beta accelerator track to the drift orbit due to a large angle of ion-ion collision.
第14圖係顯示當小角度的電子-離子碰撞為考慮時之A、B、C、與D貝他加速器軌道。Figure 14 shows the A, B, C, and D beta accelerator orbits when small angles of electron-ion collisions are considered.
第15圖係顯示當其為電氣極化時一中性化的離子束。Figure 15 shows a neutralized ion beam when it is electrically polarized.
第16圖係顯示當其接觸於一約束室之中的電漿時一中性化的離子束之正面圖。Figure 16 is a front elevational view of a neutralized ion beam as it contacts the plasma in a confinement chamber.
第17圖係顯示根據一種起始程序之一個較佳實施例的一種約束室之端視圖。Figure 17 is an end elevational view of a constraining chamber in accordance with a preferred embodiment of a starting procedure.
第18圖係顯示根據一種起始程序之另一個較佳實施例的一種約束室之端視圖。Figure 18 is an end elevational view of a constraining chamber in accordance with another preferred embodiment of a starting procedure.
第19圖係顯示B點探測器之軌跡,指出一FRC之構成。Figure 19 shows the trajectory of the point B detector, indicating the composition of an FRC.
第20A圖係顯示可安裝於一室之內的一種感應電漿源之視圖。Figure 20A shows a view of an inductive plasma source that can be mounted within a chamber.
第20B與20C圖係顯示該種感應電漿源之部分視圖。Figures 20B and 20C show partial views of such an inductive plasma source.
第21A與21B圖係顯示一種RF驅動系統之部分視圖。Figures 21A and 21B show a partial view of an RF drive system.
第21C圖係顯示二極與四極架構之示意圖。Figure 21C shows a schematic diagram of a two-pole and four-pole architecture.
第22A圖係顯示一部分的電漿電力產生系統,包含其耦接至一反向迴旋加速器直接能量轉換器之一碰撞束熔合反應器。Figure 22A shows a portion of a plasma power generation system including a crash beam fusion reactor coupled to one of the reverse cyclotron direct energy converters.
第22B圖係顯示於第19A圖的反向迴旋加速器轉換器之端視圖。Figure 22B is an end view of the inverse cyclotron converter shown in Figure 19A.
第22C圖係顯示於反向迴旋加速器轉換器的離子之一軌道。Figure 22C shows one of the orbits of the ions shown in the inverse cyclotron converter.
第23A圖係顯示一部分的電漿電力產生系統,包含其耦接至反向迴旋加速器轉換器的另一個實施例之一碰撞束熔合反應器。Figure 23A shows a portion of a plasma power generation system including a collision beam fusion reactor coupled to another embodiment of a reverse cyclotron converter.
第23B圖係顯示於第20A圖的反向迴旋加速器轉換器之端視圖。Figure 23B is an end view of the inverse cyclotron converter shown in Figure 20A.
第24A圖係顯示於一種習用的迴旋加速器之內側的一粒子軌道。Figure 24A shows a particle trajectory on the inside of a conventional cyclotron.
第24B圖係顯示一振盪電場。Figure 24B shows an oscillating electric field.
第24C圖係顯示一加速的粒子之改變能量。Figure 24C shows the altered energy of an accelerated particle.
第25圖係顯示於其為由具有角速度的一離子所遭受之ICC的電極之間的間隙之一方位角電場。Figure 25 is an azimuthal electric field showing the gap between the electrodes of the ICC which is suffered by an ion having an angular velocity.
第26圖係顯示一聚焦四極的雙合透鏡。Figure 26 shows a focused quadrupole doublet.
第27A與27B圖係顯示輔助的磁場線圈系統。Figures 27A and 27B show an auxiliary magnetic field coil system.
第28圖係顯示一100 MW反應器。Figure 28 shows a 100 MW reactor.
第29圖係顯示反應器支援設備。Figure 29 shows the reactor support equipment.
第30圖係顯示一種電漿推力推進系統。Figure 30 shows a plasma thrust propulsion system.
300...約束系統300. . . Constraint system
305...室壁305. . . Wall
310...約束室310. . . Constraint room
315...主軸315. . . Spindle
320...貝他加速器磁通線圈320. . . Beta accelerator flux coil
325...外線圈325. . . Outer coil
330...鏡式線圈330. . . Mirror coil
335...電漿335. . . Plasma
340...注入埠340. . . Injection
345...電漿源345. . . Plasma source
Claims (47)
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US65973805P | 2005-03-07 | 2005-03-07 | |
US65976705P | 2005-03-07 | 2005-03-07 | |
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TWI820023B (en) * | 2018-05-10 | 2023-11-01 | 開曼群島商阿爾發環國際有限公司 | Helium generator and method producing helium-3 |
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CN103026802B (en) * | 2010-07-12 | 2015-06-24 | 三菱电机株式会社 | Drift tube linear accelerator |
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2006
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- 2006-03-07 MY MYPI20060961A patent/MY154771A/en unknown
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TWI820023B (en) * | 2018-05-10 | 2023-11-01 | 開曼群島商阿爾發環國際有限公司 | Helium generator and method producing helium-3 |
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MY154771A (en) | 2015-07-15 |
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