TWI418277B - Method for producing a circuit board - Google Patents

Method for producing a circuit board Download PDF

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Publication number
TWI418277B
TWI418277B TW099113492A TW99113492A TWI418277B TW I418277 B TWI418277 B TW I418277B TW 099113492 A TW099113492 A TW 099113492A TW 99113492 A TW99113492 A TW 99113492A TW I418277 B TWI418277 B TW I418277B
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Taiwan
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solder
core body
solder particles
adhesive layer
circuit board
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TW099113492A
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Chinese (zh)
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TW201112902A (en
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Takashi Shoji
Takekazu Sakai
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Showa Denko Kk
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3431Leadless components
    • H05K3/3436Leadless components having an array of bottom contacts, e.g. pad grid array or ball grid array components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3485Applying solder paste, slurry or powder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10227Other objects, e.g. metallic pieces
    • H05K2201/10234Metallic balls
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10613Details of electrical connections of non-printed components, e.g. special leads
    • H05K2201/10621Components characterised by their electrical contacts
    • H05K2201/10674Flip chip
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/04Soldering or other types of metallurgic bonding
    • H05K2203/0425Solder powder or solder coated metal powder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/04Soldering or other types of metallurgic bonding
    • H05K2203/043Reflowing of solder coated conductors, not during connection of components, e.g. reflowing solder paste
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/122Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124Heterocyclic organic compounds, e.g. azole, furan
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452Solder masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3489Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913Assembling to base an electrical component, e.g., capacitor, etc.
    • Y10T29/49146Assembling to base an electrical component, e.g., capacitor, etc. with encapsulating, e.g., potting, etc.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Wire Bonding (AREA)

Description

電路基板之製造方法Circuit board manufacturing method

本發明係關於電路基板之製造方法。The present invention relates to a method of manufacturing a circuit board.

近年來,作為形成電子電路之手段,廣泛採用在塑膠基板、陶瓷基板或塗覆有塑膠等而成之絕緣性基板上設置電路圖型,於其上焊錫接合IC元件、半導體晶片、電阻或電容等電子零件之方法。In recent years, as a means of forming an electronic circuit, a circuit pattern is widely used on a plastic substrate, a ceramic substrate, or an insulating substrate coated with plastic, and a solder-bonded IC device, a semiconductor wafer, a resistor, a capacitor, etc. are mounted thereon. The method of electronic parts.

其中,將電子零件之導線端子接合於電路圖型之特定部分之方法一般係依序進行下列步驟而進行:在基板上之導電性電路電極表面預先形成焊錫薄層之步驟;在焊錫薄層上印刷焊錫膏或助焊劑之步驟;將特定電子零件定位載置之步驟;使焊錫薄層或焊錫薄層及焊錫膏回焊使焊錫熔融、凝固之步驟。Wherein, the method of bonding the wire terminal of the electronic component to a specific portion of the circuit pattern is generally performed in the following steps: a step of forming a solder thin layer on the surface of the conductive circuit electrode on the substrate; printing on the solder thin layer a step of solder paste or flux; a step of positioning a specific electronic component; and a step of soldering or solidifying the solder thin layer or the solder thin layer and the solder paste.

又,最近隨著電子製品或電路基板之小型化,而要求電子零件之微間距化(Fine pitch)。至於該等電子零件已知有例如0.3mm間距之QFP(Quad Flat Package,四周平面封裝)、CSP(Chip Size Package,晶片尺寸封裝)、0.15mm間距之FC(Flip Chip,覆晶)、BGA構造之LSI晶片等。又,將電子零件搭載於電路基板上之方法已知有將形成於電子零件上之焊錫凸塊與形成於電路基板上之焊錫凸塊重疊並回焊之方法。該方法中,要求可對應於電子零件微細間距之精細圖型形狀之焊錫凸塊。Further, recently, with the miniaturization of electronic products or circuit boards, the fine pitch of electronic components has been demanded. As for these electronic parts, for example, a QFP (Quad Flat Package) of 0.3 mm pitch, a CSP (Chip Size Package), a Flip Chip (Flip Chip) of 0.15 mm pitch, and a BGA structure are known. LSI wafers, etc. Further, a method of mounting an electronic component on a circuit board is known in which a solder bump formed on an electronic component is overlapped with a solder bump formed on a circuit board and reflowed. In this method, a solder bump which can correspond to a fine pattern shape of fine pitch of an electronic component is required.

又,於電路基板上形成焊錫凸塊之方法已知有電鍍法、無電解電鍍法、印刷焊錫粉末之糊膏並經回焊之方法等。然而,藉由無電解電鍍法之焊錫凸塊之製造方法難以使焊錫層變厚,又,藉由電鍍法之焊錫凸塊之製造方法難以於複雜的電路上流過電鍍用之電流。又,藉印刷焊錫膏之方法難以對應於微細間距圖型。基於該等情況,作為形成具有一定且一致高度之焊錫凸塊之方法,已使用有在電路上附著焊錫球之方法。Further, a method of forming a solder bump on a circuit board is known as a plating method, an electroless plating method, a method of printing a paste of a solder powder, and a method of reflow soldering. However, it is difficult to make the solder layer thick by the manufacturing method of the solder bump by the electroless plating method, and it is difficult to apply a current for plating to a complicated circuit by the method of manufacturing the solder bump by the plating method. Moreover, it is difficult to correspond to the fine pitch pattern by the method of printing solder paste. Based on these conditions, as a method of forming solder bumps having a certain and uniform height, a method of attaching solder balls to a circuit has been used.

至於將焊錫球附著於電路上之方法已知有使賦予黏著性之化合物反應而在電路基板之導電性電路電極表面上賦予黏著性,同時將焊錫粉末附著在該黏著部之方法。隨後,藉由加熱電路基板,形成焊錫凸塊(專利文獻1)。再者,作為應用該方法者,亦開發出在必要部分僅附著一個焊錫粉末粒子之技術(參照專利文獻2)。As a method of attaching a solder ball to an electric circuit, there is known a method in which a compound which imparts adhesiveness is reacted to impart adhesiveness to the surface of a conductive circuit electrode of a circuit board, and solder powder is adhered to the adhesive portion. Subsequently, solder bumps are formed by heating the circuit substrate (Patent Document 1). In addition, as a method of applying this method, a technique of attaching only one solder powder particle to a necessary portion has been developed (see Patent Document 2).

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]特開平7-7244號公報[Patent Document 1] JP-A-7-7244

[專利文獻2]特開2008-41803號公報[Patent Document 2] JP-A-2008-41803

然而,於如BGA構造之焊錫凸塊之高度高之情況,藉由回焊使晶片與電路基板連接時,容易使熔融之焊錫凸塊崩塌。且,晶片不均勻地沉入,而有以傾斜狀態接合之問題。However, when the height of the solder bumps such as the BGA structure is high, when the wafer is connected to the circuit board by reflow, the molten solder bumps are easily collapsed. Moreover, the wafer sinks unevenly and has a problem of being joined in an inclined state.

相對於此目前係使用使高熔點之焊錫球一旦在高溫下熔融而形成焊錫凸塊後,利用比其熔點低之焊錫連接之方法。其他,亦已知有使用銲錫電鍍銅等金屬之球(銅核焊錫球)之方法。藉由配置銅核焊錫球一旦熔融時形成焊錫凸塊,搭載電子零件後藉由回焊,使核體成為隔離件,可使電子零件與電路基板間保持一定距離。In contrast to this, a method in which a solder ball having a high melting point is melted at a high temperature to form a solder bump is used, and a solder having a lower melting point is used. Others, a method of using a solder to plate a metal ball such as copper (copper core solder ball) is also known. By arranging the copper core solder balls to form solder bumps when they are melted, the electronic components are mounted and then the core body is used as a spacer by reflowing, so that a certain distance can be maintained between the electronic components and the circuit board.

然而高熔點焊錫,其材料受到限制,目前使用含高濃度鉛之組成者。又,至於高熔點焊錫目前實用化者為含如95%或80%鉛之鉛濃度高者,而有由鉛之同位素釋出之α射線造成LSI等之誤動作之原因之嚴重問題。因此,要求完全無鉛之高熔點焊錫。However, high melting point solders are limited in their materials and are currently used in high concentration lead compositions. In addition, as for the high-melting-point solder, it is a serious problem that the lead concentration of lead containing 95% or 80% of lead is high, and the α-ray released by the isotope of lead causes malfunction of LSI or the like. Therefore, a completely lead-free high melting point solder is required.

又,使用銅核焊錫球之方法在使焊錫均勻附著在銅核之球上有技術上之困難,且有製造成本顯著較高之問題。因此,無法達到廣泛使用。Moreover, the method of using a copper core solder ball is technically difficult to uniformly attach the solder to the ball of the copper core, and there is a problem that the manufacturing cost is remarkably high. Therefore, it is not possible to achieve widespread use.

本發明係鑑於上述問題而完成者,其目的係提供一種可不傾斜地使電子零件接合且可簡化步驟之電路基板之製造方法。The present invention has been made in view of the above problems, and an object thereof is to provide a method of manufacturing a circuit board which can be joined without slanting and which can simplify the steps.

本發明者為解決上述課題而積極努力檢討之結果,因而完成本發明。亦即本發明為下述者。The present inventors have made active efforts to review the results in order to solve the above problems, and have completed the present invention. That is, the present invention is as follows.

[1]一種電路基板之製造方法,其特徵為具備於電路基板上之端子部表面上塗佈第一賦予黏著性之化合物而形成第一黏著層之步驟,使核體附著於前述端子部之前述第一黏著層上之步驟,於前述核體表面上塗佈第二賦予黏著性之化合物而形成第二黏著層之步驟,使第一焊錫粒子附著於前述核體表面之前述第二黏著層上之步驟,及使前述第一焊錫粒子熔融,於前述核體表面上形成焊錫層之步驟。[1] A method of manufacturing a circuit board, comprising the step of applying a first adhesion-promoting compound to a surface of a terminal portion on a circuit board to form a first adhesive layer, and attaching the core body to the terminal portion. a step of coating the second adhesive layer on the surface of the core body to form a second adhesive layer on the surface of the core body, and attaching the first solder particles to the second adhesive layer on the surface of the core body And the step of melting the first solder particles to form a solder layer on the surface of the core body.

[2]如[1]所述之電路基板之製造方法,其具備下列步驟而成:於前述端子部之表面上塗佈前述第一賦予黏著性之化合物而形成前述第一黏著層之步驟,透過前述第二黏著層,使表面上附著有前述第一焊錫粒子而成之附著第一焊錫粒子之核體附著於前述第一黏著層上之步驟,及使前述第一焊錫粒子熔融,於前述核體表面上形成前述焊錫層之步驟。[2] The method for producing a circuit board according to [1], comprising the steps of: applying the first adhesion-imparting compound to the surface of the terminal portion to form the first adhesive layer, a step of adhering the first solder particles to the first adhesive layer by adhering the first solder particles to the first adhesive layer through the second adhesive layer, and melting the first solder particles The step of forming the aforementioned solder layer on the surface of the core.

[3]如[1]所述之電路基板之製造方法,其中於使前述第一焊錫粒子附著於前述第二黏著層上之步驟之後,具有透過前述第一黏著層使前述第二焊錫粒子附著於前述端子部表面上之步驟,且形成前述焊錫層之步驟之際,前述第一焊錫粒子與前述第二焊錫粒子同時熔融。[3] The method of manufacturing a circuit board according to [1], wherein after the step of attaching the first solder particles to the second adhesive layer, the second solder particles are adhered through the first adhesive layer In the step of forming the solder layer on the surface of the terminal portion, the first solder particles and the second solder particles are simultaneously melted.

[4]如[1]所述之電路基板之製造方法,其中在將前述核體附著於前述第一黏著層上之步驟與形成前述第二黏著層之步驟之間,具有透過前述第一黏著層使前述第二焊錫粒子附著於前述端子部表面上之步驟,且形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述第二焊錫粒子同時熔融。[4] The method of manufacturing a circuit board according to [1], wherein the step of attaching the core body to the first adhesive layer and the step of forming the second adhesive layer have a first adhesion The layer attaches the second solder particles to the surface of the terminal portion, and when the step of forming the solder layer is performed, the first solder particles and the second solder particles are simultaneously melted.

[5]如[1]所述之電路基板之製造方法,其中形成前述第一黏著層之步驟之前,具有使前述第二焊錫粒子附著於前述端子部表面上之步驟,且形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述第二焊錫粒子同時熔融。[5] The method of manufacturing a circuit board according to [1], wherein the step of forming the first adhesive layer has a step of attaching the second solder particles to a surface of the terminal portion, and forming the solder layer In the step, the first solder particles and the second solder particles are simultaneously melted.

[6]如[1]所述之電路基板之製造方法,其中具備下列步驟:使前述第二焊錫粒子附著於前述端子部表面上之步驟,使前述第二焊錫粒子熔解,於前述端子部表面上形成焊錫被膜之步驟,及透過前述焊錫被膜於前述端子部表面上塗佈第一賦予黏著性之化合物而形成第一黏著層之步驟,且,形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述焊錫被膜同時熔融。[6] The method of manufacturing a circuit board according to [1], wherein the second solder particles are adhered to the surface of the terminal portion, and the second solder particles are melted on the surface of the terminal portion. a step of forming a solder film thereon, and a step of forming a first adhesive layer by applying a first adhesion-promoting compound to the surface of the terminal portion through the solder film, and forming the solder layer A solder particle is simultaneously melted with the solder film.

[7]如[1]所述之電路基板之製造方法,其中具備下列步驟:利用電鍍法於前述端子部表面上形成焊錫被膜之步驟,及透過前述焊錫被膜於前述端子部表面上塗佈第一賦予黏著性之化合物而形成第一黏著層之步驟,且,形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述焊錫被膜同時熔融。[7] The method for producing a circuit board according to [1], comprising the steps of: forming a solder film on the surface of the terminal portion by a plating method; and applying the solder film to the surface of the terminal portion through the solder film A step of forming a first adhesive layer by applying an adhesive compound, and simultaneously forming the solder layer, the first solder particles and the solder film are simultaneously melted.

[8]如[3]所述之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為1μm以上且為前述第一焊錫粒子之平均粒徑之0.4倍以下。[8] The method of manufacturing a circuit board according to [3], wherein the second solder particles have an average particle diameter of 1 μm or more and 0.4 times or less the average particle diameter of the first solder particles.

[9]如[4]或[5]所述之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為1μm以上且為前述核體之平均粒徑之0.5倍以下,且比前述第一焊錫粒子小。The method of manufacturing a circuit board according to the above aspect, wherein the second solder particles have an average particle diameter of 1 μm or more and 0.5 times or less the average particle diameter of the core body, and are more than the foregoing. The first solder particles are small.

[10]如[9]所述之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為5~10μm。[10] The method for producing a circuit board according to [9], wherein the second solder particles have an average particle diameter of 5 to 10 μm.

[11]如[6]所述之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為1μm以上且為前述端子部之直徑之1/3以下。[11] The method of manufacturing a circuit board according to [6], wherein the second solder particles have an average particle diameter of 1 μm or more and 1/3 or less of a diameter of the terminal portion.

[12]如[7]所述之電路基板之製造方法,其中以3μm左右之厚度形成前述之焊錫被膜。[12] The method of manufacturing a circuit board according to [7], wherein the solder film is formed to have a thickness of about 3 μm.

[13]如[1]、[3]至[12]之任一項所述之電路基板之製造方法,其係將具有前述第一黏著層之前述電路基板浸漬於包含前述核體之分散液中,使前述核體附著於前述第一黏著層上。The method of manufacturing a circuit board according to any one of the aspects of the present invention, wherein the circuit board having the first adhesive layer is immersed in a dispersion containing the core body The core body is attached to the first adhesive layer.

[14]如[2]所述之電路基板之製造方法,其係將具有前述第一黏著層之前述電路基板浸漬於包含前述附著第一焊錫粒子之核體之分散液中,使前述附著第一焊錫粒子之核體附著於前述第一黏著層上。[14] The method of manufacturing a circuit board according to [2], wherein the circuit board having the first adhesive layer is immersed in a dispersion containing the core body to which the first solder particles are attached, and the adhesion is performed. A core body of a solder particle is attached to the first adhesive layer.

[15]如[1]、[3]至[13]之任一項所述之電路基板之製造方法,其係將附著有具有前述第二黏著層之前述核體之前述電路基板浸漬於包含前述第一焊錫粒子之前述分散液中,使前述第一焊錫粒子附著於前述核體表面上。The method of manufacturing a circuit board according to any one of the aspects of the present invention, wherein the circuit board to which the core body having the second adhesive layer is adhered is immersed in the circuit board. In the dispersion liquid of the first solder particles, the first solder particles are attached to the surface of the core body.

[16]如[2]或[14]所述之電路基板之製造方法,其係將具有前述第二黏著層之前述核體浸漬於包含前述第一焊錫粒子之分散液中,使前述第一焊錫粒子附著於前述第二黏著層上,形成前述附著第一焊錫粒子之核體。[16] The method of manufacturing a circuit board according to [2], wherein the core body having the second adhesive layer is immersed in a dispersion liquid containing the first solder particles, and the first Solder particles are attached to the second adhesive layer to form the core body to which the first solder particles are attached.

[17]如[1]至[16]中任一項所述之電路基板之製造方法,其係使用金屬球作為前述核體。[17] The method of manufacturing a circuit board according to any one of [1] to [16], wherein a metal ball is used as the core body.

[18]如[1]至[17]中任一項所述之電路基板之製造方法,其中前述核體係由銅所構成。[18] The method of manufacturing a circuit board according to any one of [1] to [17] wherein the core system is made of copper.

[19]如[1]至[18]所述之電路基板之製造方法,其中形成前述第一黏著層之步驟中,在前述電路基板上形成具有使前述端子部露出之開口部之絕緣層之後,形成前述第一黏著層。[19] The method of manufacturing a circuit board according to [1], wherein, in the step of forming the first adhesive layer, after forming an insulating layer having an opening portion exposing the terminal portion on the circuit substrate Forming the aforementioned first adhesive layer.

依據本發明之製造方法,由於係將核體附著於端子部之後,透過第二黏著層使第一焊錫粒子附著於核體上,進而使第一焊錫粒子加熱熔融而於核體表面上形成焊錫層,因此相較於利用以電鍍等於表面上形成焊錫層之附著焊錫之核體之情況,可大幅簡化步驟。又,由於安裝電子零件等時核體成為隔離件,故可不使電子零件姿勢傾斜之下進行安裝。According to the manufacturing method of the present invention, after the core body is adhered to the terminal portion, the first solder particles are adhered to the core body through the second adhesive layer, and the first solder particles are heated and melted to form solder on the surface of the core body. The layer is thus substantially simplified in comparison to the case of using a core body which is plated to adhere to the solder layer on the surface of the solder layer. Further, since the core body serves as a spacer when the electronic component or the like is mounted, the electronic component can be mounted without tilting the posture.

又,依據本發明之製造方法,由於係使附著第一焊錫之核體附著於端子部之後,使第一焊錫粒子加熱熔融而在核體表面上形成焊錫層,故與利用以電鍍等在表面形成焊錫層之附著焊錫之核體之情況相較,可大幅簡化步驟。且,由於安裝電子零件等時核體成為隔離件,故可不使電子零件姿勢傾斜之下進行安裝。Moreover, according to the manufacturing method of the present invention, after the core body to which the first solder adheres is attached to the terminal portion, the first solder particles are heated and melted to form a solder layer on the surface of the core body, so that the surface is formed by plating or the like. The step of forming the core of the solder layer to which the solder is attached can be greatly simplified. Further, since the core body becomes a spacer when the electronic component or the like is mounted, the electronic component can be mounted without tilting the posture.

由上述,依據本發明,可提供一種可在不傾斜之下接合搭載零件且可簡化步驟之電路基板之製造方法。As described above, according to the present invention, it is possible to provide a method of manufacturing a circuit board which can join a mounted component without tilting and which can simplify the steps.

(第一實施形態)(First embodiment)

以下針對本發明之第一實施形態之電路基板之製造方法,參考圖式加以說明。圖1及圖2為說明本實施形態之電路基板之製造方法之步驟圖。Hereinafter, a method of manufacturing the circuit board according to the first embodiment of the present invention will be described with reference to the drawings. 1 and 2 are process diagrams for explaining a method of manufacturing a circuit board of the embodiment.

本實施形態之電路基板之製造方法係由下列步驟概略構成:於電路基板1之端子部2上形成第一黏著層5之步驟,使核體11附著於第一黏著層5上之步驟,使第一焊錫粒子14附著於核體11表面上之步驟,及使第一焊錫粒子14熔融而形成焊錫層15之步驟。The method of manufacturing the circuit board of the present embodiment is roughly constituted by the steps of forming the first adhesive layer 5 on the terminal portion 2 of the circuit board 1 and attaching the core body 11 to the first adhesive layer 5, thereby making the method of manufacturing the circuit board. The first solder particles 14 are attached to the surface of the core body 11 and the first solder particles 14 are melted to form the solder layer 15.

以下針對各步驟之較佳形態詳細敘述。The preferred embodiments of each step are described in detail below.

作為本發明對象之電路基板1可例示為在塑膠基板、塑膠膜基板、玻璃布基板、紙基質環氧樹脂基板、陶瓷基板等之上層合金屬板而成之基板,或者於金屬基材上被覆塑膠或陶瓷等而成之絕緣基板上使用金屬等導電性物質形成電路圖型而成之單面電路基板、兩面電路基板、多層電路基板或撓性電路基板等。其他,亦可適用IC基板、電容、電阻、線圈、可變電阻、對偶管、晶圓等。The circuit board 1 to which the present invention is applied can be exemplified by laminating a metal plate on a plastic substrate, a plastic film substrate, a glass cloth substrate, a paper matrix epoxy substrate, a ceramic substrate, or the like, or coating the metal substrate. A single-sided circuit board, a double-sided circuit board, a multilayer circuit board, a flexible circuit board, or the like formed by forming a circuit pattern using a conductive material such as a metal on an insulating substrate made of a plastic or a ceramic. Others can also be applied to IC substrates, capacitors, resistors, coils, variable resistors, dual tubes, wafers, and the like.

圖1(a)為顯示本實施形態中所用之電路基板1之剖面圖。電路基板1可例示為例如陶瓷基板。Fig. 1(a) is a cross-sectional view showing the circuit board 1 used in the embodiment. The circuit board 1 can be exemplified as a ceramic substrate, for example.

電路基板1之一面1a上形成有例如由銅或銅合金所構成之電路圖型(端子部2)。以下針對於端子部2之表面4上形成第一黏著層5之步驟加以說明。A circuit pattern (terminal portion 2) made of, for example, copper or a copper alloy is formed on one surface 1a of the circuit board 1. The step of forming the first adhesive layer 5 on the surface 4 of the terminal portion 2 will be described below.

首先,如圖1(b)所示,預先以抗蝕劑(絕緣層)3圍繞端子部2之周圍,形成開口部6。具體而言係在電路基板1上之上面1a之整面上形成抗蝕層3,經曝光、顯像,藉此使抗蝕層3硬化,形成開口部6。開口部6成為使端子部2露出之構成。又,開口部6之直徑F係配合核體11之粒徑D適宜設定。First, as shown in FIG. 1(b), the opening portion 6 is formed in advance around the terminal portion 2 with a resist (insulating layer) 3. Specifically, the resist layer 3 is formed on the entire surface of the upper surface 1a of the circuit board 1, and is exposed and developed, whereby the resist layer 3 is cured to form the opening portion 6. The opening portion 6 has a configuration in which the terminal portion 2 is exposed. Further, the diameter F of the opening portion 6 and the particle diameter D of the core body 11 are appropriately set.

抗蝕層3可使用電路基板之製造中一般使用之絕緣性抗蝕劑。抗蝕層3若為在後述賦予第一黏著層5之步驟中具有不賦予黏著性之性質者,則其材料並無限制。As the resist layer 3, an insulating resist generally used in the manufacture of a circuit board can be used. When the resist layer 3 has a property of not providing adhesiveness in the step of providing the first adhesive layer 5 to be described later, the material is not limited.

又,端子部2之材料可使用銅或銅合金,但本發明並不限於此,若為於後述步驟中藉由賦予黏著性之物質獲得黏著性之導電性物質即可,使用其他者亦無妨。該等物質可例示為例如含有閃蒸(Flash)金、Ni、Sn、Ni-Au、Pd、Ag、焊錫合金等之物質。Further, the material of the terminal portion 2 may be copper or a copper alloy. However, the present invention is not limited thereto, and any conductive material which is adhesively obtained by imparting an adhesive property to a later-described step may be used. . These materials are exemplified by, for example, those containing flash gold, Ni, Sn, Ni-Au, Pd, Ag, solder alloy, and the like.

又,開口部6之深度H(端子部2之表面4與抗蝕層3上面之段差)係配合核體11之粒徑D適當設定。該段差H較好小於核體11之粒徑D。段差H大於粒徑D時,由於無法正常形成凸塊16故較不佳。段差H若為於後述步驟中藉由黏著力保持核體不脫落,則就電極表面比抗蝕層表面高之H為負的範圍亦可。然而,若考慮步驟之作業性及核體之機能,則較好為1μm以上、粒徑D之二分之一以下之範圍。藉由使段差H落在該範圍內,於後述步驟中,可安定地防止核體11脫落,同時可形成充分高之焊錫凸塊16。開口部6較好為圓形,但亦可取代為橢圓形、四角形。Further, the depth H of the opening portion 6 (the difference between the surface 4 of the terminal portion 2 and the upper surface of the resist layer 3) is appropriately set in accordance with the particle diameter D of the core body 11. The step difference H is preferably smaller than the particle diameter D of the core body 11. When the step difference H is larger than the particle diameter D, it is less preferable because the bumps 16 cannot be formed normally. If the step H is such that the core body does not fall off by the adhesive force in the later-described step, the surface of the electrode which is higher than the surface of the resist layer may have a negative range. However, in consideration of the workability of the step and the function of the core body, it is preferably in the range of 1 μm or more and one-half or less of the particle diameter D. By causing the step difference H to fall within the range, in the later-described step, the core body 11 can be prevented from falling off and a sufficiently high solder bump 16 can be formed. The opening portion 6 is preferably circular, but may be replaced by an elliptical shape or a quadrangular shape.

接著,如圖1(c)所示,形成第一黏著層5。首先,將以下所示之第一賦予黏著性之化合物中之至少一種或兩種以上溶解於水或酸性水中,且較好調整成pH3~4左右之微酸性。藉此形成黏著性溶液。接著,將電路基板1浸漬於黏著性溶液中,或者將黏著性溶液塗佈於電路基板1上,藉此於端子部2之表面4上形成第一黏著層5。Next, as shown in FIG. 1(c), the first adhesive layer 5 is formed. First, at least one or two or more of the first adhesion-imparting compounds shown below are dissolved in water or acidic water, and are preferably adjusted to have a slightly acidic pH of about 3 to 4. Thereby an adhesive solution is formed. Next, the first adhesive layer 5 is formed on the surface 4 of the terminal portion 2 by immersing the circuit board 1 in an adhesive solution or applying an adhesive solution on the circuit board 1.

此處,第一賦予黏著性之化合物可使用萘并三唑系衍生物、苯并三唑系衍生物、咪唑系衍生物、苯并咪唑系衍生物、巰基苯并噻唑系衍生物及苯并噻唑硫基脂肪酸等。該等賦予黏著性之化合物對於銅之作用效果尤其強,但亦可賦予其他導電性物質黏著性。Here, as the first adhesion-imparting compound, a naphthotriazole derivative, a benzotriazole derivative, an imidazole derivative, a benzimidazole derivative, a mercaptobenzothiazole derivative, and a benzo can be used. Thiazolyl fatty acids and the like. These adhesion-imparting compounds are particularly effective against copper, but can also impart adhesion to other conductive materials.

又,本發明中較好使用之苯并三唑系衍生物係以通式(1)表示。Further, the benzotriazole derivative which is preferably used in the present invention is represented by the formula (1).

【化1】【化1】

其中,式(1)中,R1~R4獨立為氫原子、碳數1~16(較好為5~16)之烷基、烷氧基、F、Br、Cl、I、氰基、胺基或OH基。In the formula (1), R1 to R4 are independently a hydrogen atom, an alkyl group having 1 to 16 carbon atoms (preferably 5 to 16), an alkoxy group, F, Br, Cl, I, a cyano group or an amine group. Or OH group.

又,本發明中較好使用之萘并三唑系衍生物係以通式(2)表示。Further, the naphthotriazole derivative which is preferably used in the present invention is represented by the formula (2).

【化2】[Chemical 2]

其中,式(2)中,R5~R10獨立為氫原子、碳數1~16(較好為5~16)之烷基、烷氧基、F、Br、Cl、I、氰基、胺基或OH基。Wherein, in the formula (2), R5 to R10 are independently a hydrogen atom, an alkyl group having 1 to 16 carbon atoms (preferably 5 to 16), an alkoxy group, F, Br, Cl, I, a cyano group or an amine group. Or OH group.

再者,本發明中較好使用之咪唑系衍生物係以通式(3)表示。Further, the imidazole-based derivative which is preferably used in the present invention is represented by the formula (3).

【化3】[化3]

其中,式(3)中,R11、R12獨立為氫原子、碳數1~16(較好為5~16)之烷基、烷氧基、F、Br、Cl、I、氰基、胺基或OH基。In the formula (3), R11 and R12 are independently a hydrogen atom, an alkyl group having 1 to 16 carbon atoms (preferably 5 to 16), an alkoxy group, F, Br, Cl, I, a cyano group or an amine group. Or OH group.

又另外,本發明中較好使用之苯并咪唑系衍生物係以通式(4)表示。Further, the benzimidazole-based derivative which is preferably used in the present invention is represented by the formula (4).

【化4】【化4】

其中,式(4)中,R13~R17獨立為氫原子、碳數1~16(較好為5~16)之烷基、烷氧基、F、Br、Cl、I、氰基、胺基或OH基。In the formula (4), R13 to R17 are independently a hydrogen atom, an alkyl group having 1 to 16 carbon atoms (preferably 5 to 16), an alkoxy group, F, Br, Cl, I, a cyano group or an amine group. Or OH group.

又,本發明中較好使用之巰基苯并噻唑系衍生物係以通式(5)表示。Further, the mercaptobenzothiazole-based derivative which is preferably used in the present invention is represented by the formula (5).

【化5】【化5】

其中,式(5)中,R18~R21獨立為氫原子、碳數1~16(較好為5~16)之烷基、烷氧基、F、Br、Cl、I、氰基、胺基或OH基。In the formula (5), R18 to R21 are independently a hydrogen atom, an alkyl group having 1 to 16 carbon atoms (preferably 5 to 16), an alkoxy group, F, Br, Cl, I, a cyano group or an amine group. Or OH group.

再者,本發明中較好使用之苯并噻唑硫脂肪酸系衍生物係以通式(6)表示。Further, the benzothiazole sulfur fatty acid derivative which is preferably used in the present invention is represented by the formula (6).

【化6】【化6】

其中,式(6)中,R22~R26獨立為氫原子、碳數1~16(較好為1或2)之烷基、烷氧基、F、Br、Cl、I、氰基、胺基或OH基。Wherein, in the formula (6), R22 to R26 are independently a hydrogen atom, an alkyl group having 1 to 16 carbon atoms (preferably 1 or 2), an alkoxy group, F, Br, Cl, I, a cyano group or an amine group. Or OH group.

該等化合物中,以通式(1)表示之苯并三唑系衍生物中,R1~R4一般而言碳數愈多黏著性愈強。Among these compounds, in the benzotriazole-based derivative represented by the formula (1), R1 to R4 generally have a higher carbon number and more adhesiveness.

又,以通式(3)及通式(4)表示之咪唑系衍生物及苯并咪唑系衍生物之R11~R17中,一般而言也是碳數愈多黏著性愈強。Further, in the case of the imidazole-based derivative represented by the general formula (3) and the general formula (4) and the benzimidazole-based derivative R11 to R17, generally, the more the carbon number, the stronger the adhesion.

再者,以通式(6)表示之苯并噻唑硫脂肪酸系衍生物中,R22~R26較好為碳數1或2。Further, in the benzothiazole sulfur fatty acid derivative represented by the formula (6), R22 to R26 are preferably a carbon number of 1 or 2.

又,黏著性溶液之pH調整中使用之物質可列舉為鹽酸、硫酸、硝酸、磷酸等無機酸。又有機酸可使用甲酸、乳酸、乙酸、丙酸、蘋果酸、草酸、丙二酸、琥珀酸、酒石酸等。Further, examples of the substance used for pH adjustment of the adhesive solution include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid. Further, for the organic acid, formic acid, lactic acid, acetic acid, propionic acid, malic acid, oxalic acid, malonic acid, succinic acid, tartaric acid or the like can be used.

黏著性溶液中第一賦予黏著性之化合物濃度並無特別限制,但依據溶解性、使用狀況適當調整即可,最好相對於黏著性溶液整體為0.05質量%~20質量%之範圍內。藉由使第一賦予黏著性之化合物濃度落在該範圍內,可賦予端子部2充分之黏著性。另一方面,相對於黏著性溶液整體小於0.05質量%時,無法賦予充分黏著性,又,相對於黏著性溶液整體超過20質量%時,由於會消耗多量之賦予黏著性之化合物,成為無效率故不佳。The concentration of the first adhesion-imparting compound in the adhesive solution is not particularly limited, but may be appropriately adjusted depending on the solubility and the use condition, and is preferably in the range of 0.05% by mass to 20% by mass based on the total amount of the adhesive solution. By setting the concentration of the first adhesion-imparting compound within this range, the terminal portion 2 can be sufficiently adhered. On the other hand, when the total amount of the adhesive solution is less than 0.05% by mass, sufficient adhesion cannot be provided, and when the total amount of the adhesive solution exceeds 20% by mass, a large amount of the adhesive-imparting compound is consumed, resulting in inefficiency. It is not good.

於端子部2上賦予黏著性時之處理溫度較好比室溫稍高。據此,可使第一黏著層5之形成速度、形成量成為充分者。又,最適處理溫度隨著賦予黏著性化合物濃度與端子部2之材料金屬種類等而不同,但通常處於30℃~60℃之範圍較佳。又,以使黏著性溶液之浸漬時間在5秒~5分鐘之範圍內,調整其他條件較佳。The treatment temperature at the time of imparting adhesion to the terminal portion 2 is preferably slightly higher than the room temperature. According to this, the formation speed and the amount of formation of the first adhesive layer 5 can be made sufficient. Further, the optimum treatment temperature differs depending on the concentration of the adhesive compound to be applied and the type of the material metal of the terminal portion 2, but is preferably in the range of 30 ° C to 60 ° C. Further, it is preferable to adjust the other conditions so that the immersion time of the adhesive solution is in the range of 5 seconds to 5 minutes.

另外,黏著性溶液中,較好共存50~1000ppm之離子銅。藉由使銅離子以該範圍之量共存,可提高第一黏著層5之形成速度、形成量等之形成效率。Further, in the adhesive solution, it is preferable to coexist 50 to 1000 ppm of ionic copper. By causing copper ions to coexist in the above range, the formation efficiency of the first adhesive layer 5, the formation amount, and the like can be improved.

本實施形態之黏著層之形成方法並非僅對電路基板之端子部,亦可有效的使用作為LSI本身連接用焊錫凸塊部份,亦即,具有BGA之LSI晶片或CSP(晶片尺寸封裝)、LSI等之凸塊形成手段。又,該等當然包含於本發明之焊錫電路基板中。The method of forming the adhesive layer of the present embodiment is not limited to the terminal portion of the circuit board, and can be effectively used as a solder bump portion for connection of the LSI itself, that is, an LSI wafer or a CSP (wafer size package) having a BGA. A bump forming means such as LSI. Moreover, these are of course included in the solder circuit board of the present invention.

接著,如圖1(d)所示,透過第一黏著層5將核體11附著於端子部2上。對該方法說明於下。此時,使核體11附著於第一黏著層5上之方法有在空氣中或惰性氛圍中將核體11直接供給至第一黏著層5上之方法,或使核體11分散於分散液41中成為漿料狀態,將該漿料供給於第一黏著層5之方法。Next, as shown in FIG. 1(d), the core body 11 is adhered to the terminal portion 2 through the first adhesive layer 5. This method is described below. At this time, the method of attaching the core body 11 to the first adhesive layer 5 is a method of directly supplying the core body 11 to the first adhesive layer 5 in air or an inert atmosphere, or dispersing the core body 11 in the dispersion liquid. In the case where the slurry is in the state of 41, the slurry is supplied to the first adhesive layer 5.

首先針對在空氣中、惰性氣體氛圍中使核體11附著之方法加以說明。首先,將核體11投入充滿空氣或惰性氣體之容器內。接著,於容器內設置形成至第一黏著層5為止之電路基板1。接著,使容器傾斜或振動,使第一黏著層5與核體11接觸。藉此,使核體11附著於第一黏著層5上。First, a method of attaching the core body 11 in an air or an inert gas atmosphere will be described. First, the core body 11 is placed in a container filled with air or an inert gas. Next, the circuit board 1 formed up to the first adhesive layer 5 is provided in the container. Next, the container is tilted or vibrated to bring the first adhesive layer 5 into contact with the core body 11. Thereby, the core body 11 is attached to the first adhesive layer 5.

接著,說明在液體中使核體11附著之方法。首先,如圖3所示,將水等分散液41注入容器40內,進而將核體11添加於分散液41中。接著,將容器40傾斜使分散液41與核體11靠向一方,使電路基板1以不與分散液41與核體11接觸之方式設置於容器內。隨後,藉由使容器40左右晃動,使分散液41中之第一黏著層5與核體11接觸。藉此,使核體11附著於第一黏著層5上。Next, a method of attaching the core body 11 to the liquid will be described. First, as shown in FIG. 3, a dispersion liquid 41 such as water is injected into the container 40, and the core body 11 is further added to the dispersion liquid 41. Next, the container 40 is tilted so that the dispersion liquid 41 and the core body 11 are opposed to each other, and the circuit board 1 is placed in the container so as not to come into contact with the core body 11 with the dispersion liquid 41. Subsequently, the first adhesive layer 5 in the dispersion 41 is brought into contact with the core body 11 by shaking the container 40 to the left and right. Thereby, the core body 11 is attached to the first adhesive layer 5.

如此,藉由在液體中附著核體11,核體11由於靜電而附著於沒有黏著性之部分,可防止核體11因靜電而凝聚。因此,使用該方法於微細間距之電路基板或使用微粉時特別好。又,使核體11附著之方法並不限於在液體中附著之方法,依據核體11大小等條件於各步驟中獨立採用合適方法亦無妨。As described above, by attaching the core body 11 to the liquid, the core body 11 adheres to the non-adhesive portion due to static electricity, and the core body 11 can be prevented from agglomerating due to static electricity. Therefore, it is particularly preferable to use this method for a fine pitch circuit board or when using fine powder. Further, the method of attaching the core body 11 is not limited to the method of adhering to the liquid, and it is also possible to independently adopt an appropriate method in each step depending on the size of the core body 11 or the like.

又,核體11之材質最好為銅,但若是具有比第一焊錫粒子14之熔點高之熔點,且藉由第二賦予黏著性之化合物獲得黏著性之物質則使用其他者亦無妨。該等物質除銅以外,可例示為例如含有Ni、Sn、Ni-Au、Au-Sn、Au-Si之合金等之物質。Further, the material of the core body 11 is preferably copper. However, if it has a melting point higher than the melting point of the first solder particles 14, and the adhesive property is obtained by the second adhesive property, the other may be used. These materials may be, for example, a material containing an alloy of Ni, Sn, Ni-Au, Au-Sn, or Au-Si, in addition to copper.

又,核體11之平均粒徑D較好依據附著之端子部2之大小適宜選擇,但最好在20μm~200μm之範圍內。Further, the average particle diameter D of the core body 11 is preferably selected depending on the size of the terminal portion 2 to be attached, but is preferably in the range of 20 μm to 200 μm.

接著,如圖1(e)所示形成第二黏著層13。Next, a second adhesive layer 13 is formed as shown in FIG. 1(e).

第二黏著層13之形成方法可直接使用第一黏著層5之形成方法,使用與第一賦予黏著性化合物相同之化合物作為第二賦予黏著性之化合物,且,可在與第一黏著層5之形成方法相同之條件下形成。亦即將電路基板1浸漬於與第一賦予黏著性之化合物同樣調整之化合物(第二賦予黏著性之化合物)之黏著性溶液中,或者藉由塗佈,以被覆核體11表面12之方式形成第二黏著層13。The method of forming the second adhesive layer 13 can directly use the method of forming the first adhesive layer 5, using the same compound as the first adhesive-imparting compound as the second adhesive-imparting compound, and can be in the same manner as the first adhesive layer 5. The formation method is the same under the same conditions. In other words, the circuit board 1 is immersed in an adhesive solution of a compound (second adhesion-imparting compound) adjusted in the same manner as the first adhesive-imparting compound, or formed by coating the surface 12 of the core body 11 by coating. The second adhesive layer 13.

接著,如圖1(f)所示,透過第二黏著層13使第一焊錫粒子14附著於核體11之表面12上。針對該方法說明於下。Next, as shown in FIG. 1(f), the first solder particles 14 are adhered to the surface 12 of the core body 11 through the second adhesive layer 13. This method is described below.

使第一焊錫粒子14附著於第二黏著層13上之方法有在空氣中或惰性氛圍中將第一焊錫粒子14直接供給於第二黏著層13上之方法,或將第一焊錫粒子14分散於分散液41中成為漿料狀態,將該漿料供給於第二黏著層13上之方法等。The method of attaching the first solder particles 14 to the second adhesive layer 13 is to directly supply the first solder particles 14 to the second adhesive layer 13 in air or an inert atmosphere, or to disperse the first solder particles 14. A method in which the dispersion liquid 41 is in a slurry state, and the slurry is supplied onto the second adhesive layer 13 or the like.

首先,針對在惰性氣體氛圍中使第一焊錫粒子14附著之方法加以說明。首先,將第一焊錫粒子14倒入充滿空氣或惰性氣體之容器內。接著,於容器內設置形成至第二黏著層13為止之電路基板1。接著,將容器傾斜或振動,使第二黏著層13與第一焊錫粒子14接觸。藉此,使第一焊錫粒子14附著於第二黏著層13上。First, a method of attaching the first solder particles 14 in an inert gas atmosphere will be described. First, the first solder particles 14 are poured into a container filled with air or an inert gas. Next, the circuit board 1 formed up to the second adhesive layer 13 is provided in the container. Next, the container is tilted or vibrated to bring the second adhesive layer 13 into contact with the first solder particles 14. Thereby, the first solder particles 14 are attached to the second adhesive layer 13.

接著,說明在液體中附著第一焊錫粒子14之方法。首先,如圖3所示,將水等分散液41注入容器40內,再將第一焊錫粒子14添加於分散液41中。接著,將容器40傾斜使分散液41與第一焊錫粒子14靠向一邊,使電路基板1以不與分散液41與第一焊錫粒子14接觸之方式設置於容器內。隨後,藉由使容器40左右晃動,使分散液41中之第二黏著層13與第一焊錫粒子14接觸。藉此,使第一焊錫粒子14附著於第二黏著層13上。Next, a method of attaching the first solder particles 14 to the liquid will be described. First, as shown in FIG. 3, a dispersion liquid 41 such as water is injected into the container 40, and the first solder particles 14 are added to the dispersion liquid 41. Next, the container 40 is tilted so that the dispersion liquid 41 and the first solder particles 14 are turned to one side, and the circuit board 1 is placed in the container so as not to be in contact with the first solder particles 14 . Subsequently, the second adhesive layer 13 in the dispersion 41 is brought into contact with the first solder particles 14 by shaking the container 40 to the left and right. Thereby, the first solder particles 14 are attached to the second adhesive layer 13.

又,附著第一焊錫粒子14之方法並不限於在液體中附著之方法,依據第一焊錫粒子14之大小、條件於各步驟中獨立採用合適方法亦無妨。Further, the method of attaching the first solder particles 14 is not limited to the method of adhering to the liquid, and it is also possible to independently adopt a suitable method in each step depending on the size and conditions of the first solder particles 14.

又,第一焊錫粒子14係使用粒徑比焊錫凸塊20或核體11小者。第一焊錫粒子14之粒徑E係對應於核體11之粒徑D,以一粒核體11上附著複數個第一焊錫粒子14之方式適宜設定亦可。亦即,第一焊錫粒子14之平均粒徑E較好為1μm以上且比核體11之平均粒徑D之二分之一小。藉由使第一焊錫粒子14之粒徑E落在該範圍內,可於一粒核體11上附著複數個第一焊錫粒子14。另一方面,第一焊錫粒子14之粒徑E小於1μm時,由於焊錫量不足故較不佳。又,第一焊錫粒子14之粒徑E為核體11之平均粒徑D之二分之一以上時,一粒核體11上無法附著足夠數量之第一焊錫粒子14而不佳。Further, the first solder particles 14 are smaller in particle diameter than the solder bumps 20 or the core bodies 11. The particle diameter E of the first solder particles 14 corresponds to the particle diameter D of the core body 11, and may be appropriately set so that a plurality of first solder particles 14 are attached to one core body 11. That is, the average particle diameter E of the first solder particles 14 is preferably 1 μm or more and smaller than one-half of the average particle diameter D of the core body 11. By causing the particle diameter E of the first solder particles 14 to fall within the range, a plurality of first solder particles 14 can be attached to one core body 11. On the other hand, when the particle diameter E of the first solder particles 14 is less than 1 μm, the amount of solder is insufficient, which is not preferable. When the particle diameter E of the first solder particles 14 is more than one-half of the average particle diameter D of the core body 11, it is not preferable to attach a sufficient number of the first solder particles 14 to the single core body 11.

又,第一焊錫粒子14之金屬組成列舉為例如Sn-Pb系、Sn-Pb-Ag系、Sn-Pb-Bi系、Sn-Pb-Bi-Ag系、Sn-Pb-Cd系。又就最近之產業廢棄物中排除Pb之觀點而言,較好為不含Pb之Sn-In系、Sn-Bi系、In-Ag系、In-Bi系、Sn-Zn系、Sn-Ag系、Sn-Cu系、Sn-Sb系、Sn-Au系、Sn-Bi-Ag-Cu系、Sn-Ge系、Sn-Bi-Cu系、Sn-Cu-Sb-Ag系、Sn-Ag-Zn系、Sn-Cu-Ag系、Sn-Bi-Sb系、Sn-Bi-Sb-Zn系、Sn-Bi-Cu-Zn系、Sn-Ag-Sb系、Sn-Ag-Sb-Zn系、Sn-Ag-Cu-Zn系、Sn-Zn-Bi系。Further, the metal composition of the first solder particles 14 is, for example, a Sn-Pb system, a Sn-Pb-Ag system, a Sn-Pb-Bi system, a Sn-Pb-Bi-Ag system, or a Sn-Pb-Cd system. Further, in view of the recent exclusion of Pb from industrial waste, it is preferably a Sn-In system, a Sn-Bi system, an In-Ag system, an In-Bi system, a Sn-Zn system, or a Sn-Ag which do not contain Pb. , Sn-Cu, Sn-Sb, Sn-Au, Sn-Bi-Ag-Cu, Sn-Ge, Sn-Bi-Cu, Sn-Cu-Sb-Ag, Sn-Ag -Zn system, Sn-Cu-Ag system, Sn-Bi-Sb system, Sn-Bi-Sb-Zn system, Sn-Bi-Cu-Zn system, Sn-Ag-Sb system, Sn-Ag-Sb-Zn System, Sn-Ag-Cu-Zn system, Sn-Zn-Bi system.

上述金屬組成之具體例以Sn為63質量%、Pb為37質量%之共晶焊錫(以下表示為63Sn/37Pb)為中心,列舉為62Sn/36Pb/2Ag、62.6Sn/37Pb/0.4Ag、60Sn/40Pb、50Sn/50Pb、30Sn/70Pb、25Sn/75Pb、10Sn/88Pb/2Ag、46Sn/8Bi/46Pb、57Sn/3Bi/40Pb、42Sn/42Pb/14Bi/2Ag、45Sn/40Pb/15Bi、50Sn/32Pb/18Cd、48Sn/52In、43Sn/57Bi、97In/3Ag、58Sn/42In、95In/5Bi、60Sn/40Bi、91Sn/9Zn、96.5Sn/3.5Ag、99.3Sn/0.7Cu、95Sn/5Sb、20Sn/80Au、90Sn/10Ag、90Sn/7.5Bi/2Ag/0.5Cu、97Sn/3Cu、99Sn/1Ge、92Sn/7.5Bi/0.5Cu、97Sn/2Cu/0.8Sb/0.2Ag、95.5Sn/3.5Ag/1Zn、95.5Sn/4Cu/0.5Ag、52Sn/45Bi/3Sb、51Sn/45Bi/3Sb/1Zn、85Sn/10Bi/5Sb、84Sn/10Bi/5Sb/1Zn、88.2Sn/10Bi/0.8Cu/1Zn、89Sn/4Ag/7Sb、88Sn/4Ag/7Sb/1Zn、98Sn/1Ag/1Sb、97Sn/1Ag/1Sb/1Zn、91.2Sn/2Ag/0.8Cu/6Zn、89Sn/8Zn/3Bi、86Sn/8Zn/6Bi、89.1Sn/2Ag/0.9Cu/8Zn等。又,本實施形態之第一焊錫粒子14為混合兩種類以上之不同組成之第一焊錫粒子者亦無妨。Specific examples of the metal composition are eutectic solders having a Sn content of 63% by mass and a Pb of 37% by mass (hereinafter referred to as 63Sn/37Pb), and are listed as 62Sn/36Pb/2Ag, 62.6Sn/37Pb/0.4Ag, 60Sn. /40Pb, 50Sn/50Pb, 30Sn/70Pb, 25Sn/75Pb, 10Sn/88Pb/2Ag, 46Sn/8Bi/46Pb, 57Sn/3Bi/40Pb, 42Sn/42Pb/14Bi/2Ag, 45Sn/40Pb/15Bi, 50Sn/32Pb /18Cd, 48Sn/52In, 43Sn/57Bi, 97In/3Ag, 58Sn/42In, 95In/5Bi, 60Sn/40Bi, 91Sn/9Zn, 96.5Sn/3.5Ag, 99.3Sn/0.7Cu, 95Sn/5Sb, 20Sn/80Au , 90Sn/10Ag, 90Sn/7.5Bi/2Ag/0.5Cu, 97Sn/3Cu, 99Sn/1Ge, 92Sn/7.5Bi/0.5Cu, 97Sn/2Cu/0.8Sb/0.2Ag, 95.5Sn/3.5Ag/1Zn, 95.5 Sn/4Cu/0.5Ag, 52Sn/45Bi/3Sb, 51Sn/45Bi/3Sb/1Zn, 85Sn/10Bi/5Sb, 84Sn/10Bi/5Sb/1Zn, 88.2Sn/10Bi/0.8Cu/1Zn, 89Sn/4Ag/7Sb , 88Sn/4Ag/7Sb/1Zn, 98Sn/1Ag/1Sb, 97Sn/1Ag/1Sb/1Zn, 91.2Sn/2Ag/0.8Cu/6Zn, 89Sn/8Zn/3Bi, 86Sn/8Zn/6Bi, 89.1Sn/2Ag/ 0.9Cu/8Zn, etc. Further, the first solder particles 14 of the present embodiment may be a mixture of two or more types of first solder particles having different compositions.

接著,進行核體11及第一焊錫粒子14之固定附著。所謂固定附著係在端子部2與第一焊錫粒子14之間,使端子部2之構成材料擴散至第一焊錫粒子14側之反應。藉由進行該反應,使核體11及第一焊錫粒子14分別相互固定。固定附著之溫度較好在焊錫熔點之-50℃至+50℃之範圍內,更好在-30℃至+30℃之範圍內。固定附著溫度在該範圍內時,第一焊錫粒子14不熔融,或者即使假定內部熔解,因表面存在之氧化膜之效果亦不會熔融流出。因此,可直接維持第一焊錫粒子14之形狀而進行固定附著。Next, the core body 11 and the first solder particles 14 are fixedly attached. The fixed adhesion is a reaction between the terminal portion 2 and the first solder particles 14 to diffuse the constituent material of the terminal portion 2 to the side of the first solder particles 14 . By performing this reaction, the core body 11 and the first solder particles 14 are fixed to each other. The temperature at which the adhesion is fixed is preferably in the range of -50 ° C to +50 ° C of the melting point of the solder, more preferably in the range of -30 ° C to + 30 ° C. When the fixed adhesion temperature is within this range, the first solder particles 14 are not melted, or even if the internal melting is assumed, the effect of the oxide film existing on the surface does not melt out. Therefore, the shape of the first solder particles 14 can be directly maintained and fixedly attached.

隨後,將水溶性助焊劑塗佈於電路基板1上。水溶性助焊劑可使用例如特開2004-282062號公報中所述之助焊劑。藉由使用水溶性助焊劑,可去除第一焊錫粒子14之表面及端子部2之表面4之氧化膜。Subsequently, a water-soluble flux is applied onto the circuit substrate 1. As the water-soluble flux, for example, a flux described in JP-A-2004-282062 can be used. The surface of the first solder particles 14 and the oxide film on the surface 4 of the terminal portion 2 can be removed by using a water-soluble flux.

接著,如圖2(a)所示進行回焊步驟,形成焊錫凸塊16。針對該方法說明於下。Next, as shown in FIG. 2(a), a reflow step is performed to form solder bumps 16. This method is described below.

首先,將電路基板1乾燥後,進行回焊步驟,使第一焊錫粒子14熔融。此時之加熱溫度較好為200℃~300℃之範圍,最好為熔點加上10℃~50℃。藉由以該等溫度加熱,可使第一焊錫粒子14之熔融焊錫與端子部2之表面4或核體11之表面12充分反應,形成擴散層。First, after the circuit board 1 is dried, a reflow step is performed to melt the first solder particles 14. The heating temperature at this time is preferably in the range of 200 ° C to 300 ° C, preferably in the range of 10 ° C to 50 ° C. By heating at these temperatures, the molten solder of the first solder particles 14 can be sufficiently reacted with the surface 4 of the terminal portion 2 or the surface 12 of the core body 11 to form a diffusion layer.

據此,第一焊錫粒子14熔融並行經核體11表面12整體上。因此,端子部2與核體11強固地連接,又所搭載之電子零件22與核體11安定地連接。該回焊步驟之後,水洗電路基板1去除殘留之助焊劑。藉此,在端子部2上形成焊錫凸塊16。Accordingly, the first solder particles 14 are fused in parallel through the entire surface 12 of the core body 11. Therefore, the terminal portion 2 is strongly connected to the core body 11, and the electronic component 22 mounted thereon is stably connected to the core body 11. After the reflow step, the circuit board 1 is washed to remove residual flux. Thereby, the solder bumps 16 are formed on the terminal portion 2.

接著,如圖2(b)~圖2(d)所示,將電子零件22安裝於電路基板1上。針對其方法說明於下。Next, as shown in FIGS. 2(b) to 2(d), the electronic component 22 is mounted on the circuit board 1. The method for this is explained below.

首先,如圖2(b)所示,將端子部24對準焊錫凸塊16之位置,將電子零件22配置於電路基板1。電子零件22係由電子零件本體23與端子部24概略構成。電子零件本體23之一面側上設置端子部24,且於端子部24表面形成電鍍部25。First, as shown in FIG. 2(b), the terminal portion 24 is aligned with the position of the solder bump 16, and the electronic component 22 is placed on the circuit board 1. The electronic component 22 is roughly configured by the electronic component body 23 and the terminal portion 24. The terminal portion 24 is provided on one surface side of the electronic component body 23, and a plating portion 25 is formed on the surface of the terminal portion 24.

接著,將電子零件22搭載於電路基板1上,使電鍍部25與焊錫層15接觸。該狀態示於圖2(c)。接著,如圖2(d)所示進行回焊步驟,使焊錫層15熔融,使端子部24與端子部2焊錫接合。藉此,將電子零件22安裝於電路基板1上。Next, the electronic component 22 is mounted on the circuit board 1 to bring the plating portion 25 into contact with the solder layer 15. This state is shown in Fig. 2(c). Next, as shown in FIG. 2(d), a reflow step is performed to melt the solder layer 15, and the terminal portion 24 and the terminal portion 2 are solder-bonded. Thereby, the electronic component 22 is mounted on the circuit board 1.

依據本實施形態之電路基板1之製造方法,藉由核體11成為隔離件,可使電子零件22與電路基板1之距離保持一定。因此,可解決所搭載之電子零件22在電路基板1上不均勻沉入之問題,使相對於端子部2之高度為一定,可獲得信賴性高之電路基板1。又,由於透過第二黏著層13將第一焊錫粒子14附著於核體11上,故不使用昂貴之銅核焊錫球即可完成。因此,可實現低成本化與步驟之簡化。又,由於沒有必要使用包含高濃度鉛之高熔點焊錫,故可解決因Pb同位素發出之α射線造成之誤動作之問題。又,本實施形態之製造方法為適於細微電路基板之方法,可提供積體度高且信賴性高之電子設備。According to the method of manufacturing the circuit board 1 of the present embodiment, the distance between the electronic component 22 and the circuit board 1 can be kept constant by using the core body 11 as a spacer. Therefore, the problem that the mounted electronic component 22 is unevenly deposited on the circuit board 1 can be solved, and the height of the terminal portion 2 can be made constant, and the circuit board 1 having high reliability can be obtained. Further, since the first solder particles 14 are adhered to the core body 11 through the second adhesive layer 13, the expensive copper core solder balls are not used. Therefore, cost reduction and simplification of steps can be achieved. Further, since it is not necessary to use a high melting point solder containing a high concentration of lead, it is possible to solve the problem of malfunction caused by the alpha ray emitted from the Pb isotope. Further, the manufacturing method of the present embodiment is a method suitable for a fine circuit substrate, and can provide an electronic device having a high degree of integration and high reliability.

又,於電路基板1上形成具有開口部6之抗蝕層3後,由於形成黏著層5,故在端子部2以外之部分不形成第一黏著層5。藉此,可使核體11選擇性附著於端子部2上。又,由於開口部6內附著核體11,故即使在第一黏著層5之黏著力弱之情況,亦可防止核體11脫落至開口部6以外。藉此,可使核體11確實地附著於全部端子部2上。Further, after the resist layer 3 having the opening portion 6 is formed on the circuit board 1, since the adhesive layer 5 is formed, the first adhesive layer 5 is not formed in portions other than the terminal portion 2. Thereby, the core body 11 can be selectively attached to the terminal portion 2. Further, since the core body 11 is attached to the opening portion 6, even when the adhesion force of the first adhesive layer 5 is weak, the core body 11 can be prevented from falling out of the opening portion 6. Thereby, the core body 11 can be surely attached to all of the terminal portions 2.

另外,包含核體11之分散液41中,藉由使核體11附著於第一黏著層5上,可使核體11對於各端子部2之附著量均勻。藉此例如亦可對於一個端子部2確實附著一個核體11。Further, in the dispersion liquid 41 including the core body 11, by attaching the core body 11 to the first pressure-sensitive adhesive layer 5, the adhesion amount of the core body 11 to each of the terminal portions 2 can be made uniform. Thereby, for example, one core body 11 can be surely attached to one terminal portion 2.

又,包含第一焊錫粒子14之分散液41中,藉由使第一焊錫粒子14附著於第二黏著層13上,可使第一焊錫粒子14對於各核體11之附著量均勻。Further, in the dispersion liquid 41 including the first solder particles 14, by attaching the first solder particles 14 to the second adhesive layer 13, the amount of adhesion of the first solder particles 14 to the respective core bodies 11 can be made uniform.

另外,藉由使用金屬球作為核體11,可確保電子零件22與端子部2之導通。尤其,核體11由銅構成時,可確保導通同時可易於形成第二黏著層13。Further, by using the metal ball as the core body 11, the conduction between the electronic component 22 and the terminal portion 2 can be ensured. In particular, when the core body 11 is made of copper, the second adhesive layer 13 can be easily formed while ensuring conduction.

(第二實施形態)(Second embodiment)

以下就本發明第二實施形態之電路基板1之製造方法參照圖式加以說明。Hereinafter, a method of manufacturing the circuit board 1 according to the second embodiment of the present invention will be described with reference to the drawings.

本實施形態與第一實施形態不同點為透過第二黏著層13使第一焊錫粒子14附著於核體11表面12上之後,如圖4(g)所示,使第二焊錫粒子114附著於第一黏著層5上。以下說明其細節。This embodiment is different from the first embodiment in that after the first solder particles 14 are adhered to the surface 12 of the core body 11 through the second adhesive layer 13, the second solder particles 114 are attached to the second solder particles 114 as shown in Fig. 4(g). On the first adhesive layer 5. The details are explained below.

首先,如圖4(a)~(f)所示,透過第二黏著層13使第一焊錫粒子14附著於核體11之表面12上。至目前為止之步驟由於與第一實施形態相同,故省略其細節之說明。First, as shown in FIGS. 4(a) to 4(f), the first solder particles 14 are adhered to the surface 12 of the core body 11 through the second adhesive layer 13. Since the steps up to now are the same as those in the first embodiment, the detailed description thereof will be omitted.

接著,如圖4(g)所示,使第二焊錫粒子114附著於第一黏著層5上。附著之方法由於與先前所述之核體11之附著方法相同,故省略其細節之說明。此時,第二焊錫粒子114之平均粒徑宜為1μm以上且為第一焊錫粒子14之平均粒徑E之0.4倍以下。藉由使第二焊錫粒子114之粒徑落在該範圍內,可使充分量之第二焊錫粒子114進入第一焊錫粒子14與第一黏著層5之間。Next, as shown in FIG. 4(g), the second solder particles 114 are attached to the first adhesive layer 5. The method of attachment is the same as the method of attaching the core body 11 described above, and the detailed description thereof will be omitted. At this time, the average particle diameter of the second solder particles 114 is preferably 1 μm or more and 0.4 times or less the average particle diameter E of the first solder particles 14 . By causing the particle diameter of the second solder particles 114 to fall within the range, a sufficient amount of the second solder particles 114 can enter between the first solder particles 14 and the first adhesive layer 5.

另一方面,第二焊錫粒子114之粒徑若小於1μm,則隨後之回焊步驟中,熔融之焊錫無法充分行經核體11與端子部2之間。又,第二焊錫粒子114之粒徑若超過第一焊錫粒子14之平均粒徑E之0.4倍,則隨後之回焊步驟中,由於熔融之焊錫大量行經核體11與端子部2之間或第二焊錫粒子無法進入特定位置,故後述之焊錫凸塊16之大小產生不均而不佳。On the other hand, if the particle diameter of the second solder particles 114 is less than 1 μm, the molten solder cannot sufficiently pass between the core body 11 and the terminal portion 2 in the subsequent reflow step. Further, if the particle diameter of the second solder particles 114 exceeds 0.4 times the average particle diameter E of the first solder particles 14, in the subsequent reflow step, a large amount of molten solder passes between the core body 11 and the terminal portion 2 or Since the second solder particles cannot enter a specific position, the size of the solder bumps 16 to be described later is not uniform.

接著,進行核體11、第一焊錫粒子14及第二焊錫粒子114之固定附著。隨後,藉由回焊使第一焊錫粒子14與第二焊錫粒子114同時熔融而形成焊錫層15。隨後,藉由進行與第一實施形態相同之步驟,製造本實施形態之電路基板1。Next, the core body 11, the first solder particles 14 and the second solder particles 114 are fixedly attached. Subsequently, the first solder particles 14 and the second solder particles 114 are simultaneously melted by reflow to form the solder layer 15. Subsequently, the circuit board 1 of the present embodiment is manufactured by performing the same steps as those of the first embodiment.

依據本實施形態之電路基板1之製造方法,透過第二黏著層13使第一焊錫粒子14附著於核體11表面12上之後,透過第一黏著層5使比第一焊錫粒子14小之第二焊錫粒子114附著於端子部2。藉此,可使第二焊錫粒子114進入核體11與端子部2間之間隙內。因此,在回焊步驟中可使核體11與端子部2確實連接。According to the method of manufacturing the circuit board 1 of the present embodiment, after the first solder particles 14 are adhered to the surface 12 of the core body 11 through the second adhesive layer 13, the first solder layer 5 is transmitted through the first adhesive layer 5 to be smaller than the first solder particles 14. The second solder particles 114 are attached to the terminal portion 2. Thereby, the second solder particles 114 can be made to enter the gap between the core body 11 and the terminal portion 2. Therefore, the core body 11 and the terminal portion 2 can be surely connected in the reflow step.

(第三實施形態)(Third embodiment)

以下針對本發明第三實施形態之電路基板1之製造方法參照圖式加以說明。Hereinafter, a method of manufacturing the circuit board 1 according to the third embodiment of the present invention will be described with reference to the drawings.

本實施形態與第一實施形態之不同點為於透過第一黏著層5使核體11附著於端子部2上之後,如圖5(e)所示,使第二焊錫粒子114附著於第一黏著層5上。以下說明其細節。This embodiment differs from the first embodiment in that after the core body 11 is adhered to the terminal portion 2 through the first adhesive layer 5, the second solder particles 114 are attached to the first electrode as shown in FIG. 5(e). Adhesive layer 5 on. The details are explained below.

首先,如圖5(a)~(d)所示,使核體11附著於第一黏著層5。至目前為止之步驟由於與第一實施形態相同,故省略其細節之說明。First, as shown in FIGS. 5(a) to (d), the core body 11 is attached to the first adhesive layer 5. Since the steps up to now are the same as those in the first embodiment, the detailed description thereof will be omitted.

接著,如圖5(e)所示,使第二焊錫粒子114附著於第一黏著層5。附著方法由於與先前所述之核體11之附著方法相同,故省略其細節之說明。Next, as shown in FIG. 5(e), the second solder particles 114 are attached to the first adhesive layer 5. Since the attachment method is the same as the method of attaching the core body 11 described above, the detailed description thereof will be omitted.

此時,第二焊錫粒子114之平均粒徑宜為1μm以上且為核體11之平均粒徑D之0.5倍以下,且比第一焊錫粒子14之平均粒徑E小,再者,較好在5~10μm之範圍內。藉由使第二焊錫粒子114之粒徑落在該範圍內,可使充分量之第二焊錫粒子114進入第一焊錫粒子14與第一黏著層5之間。In this case, the average particle diameter of the second solder particles 114 is preferably 1 μm or more and 0.5 times or less the average particle diameter D of the core body 11 and smaller than the average particle diameter E of the first solder particles 14 . In the range of 5~10μm. By causing the particle diameter of the second solder particles 114 to fall within the range, a sufficient amount of the second solder particles 114 can enter between the first solder particles 14 and the first adhesive layer 5.

又,此時,不同粒徑之第二焊錫粒子114亦可對第一黏著層5以每一粒徑分開附著。據此,可以第二焊錫粒子114均勻覆蓋第一黏著層5。Further, at this time, the second solder particles 114 having different particle diameters may be attached to the first adhesive layer 5 at a respective particle diameter. Accordingly, the second solder particles 114 can uniformly cover the first adhesive layer 5.

另一方面,第二焊錫粒子114之粒徑小於1μm時,隨後之回焊步驟中,熔融之焊錫無法充分行經核體11與端子部2之間。又,第二焊錫粒子114之粒徑超過第一焊錫粒子14之平均粒徑E之0.5倍時,隨後之回焊步驟中,由於熔融之焊錫大量行經核體11與端子部2之間,故後述焊錫凸塊16之大小產生不均而不佳。On the other hand, when the particle diameter of the second solder particles 114 is less than 1 μm, the molten solder cannot sufficiently pass between the core body 11 and the terminal portion 2 in the subsequent reflow step. Further, when the particle diameter of the second solder particles 114 exceeds 0.5 times the average particle diameter E of the first solder particles 14, in the subsequent reflow step, since a large amount of molten solder passes between the core body 11 and the terminal portion 2, The size of the solder bumps 16 described later is not uniform.

接著,如圖5(f)所示,以被覆核體11及第二焊錫粒子114之方式,形成第二黏著層13。此處之第二黏著層13之形成方法由於與第一實施形態之第二黏著層13之形成方法相同,故此處省略其詳細說明。Next, as shown in FIG. 5(f), the second adhesive layer 13 is formed so as to cover the core body 11 and the second solder particles 114. The method of forming the second adhesive layer 13 here is the same as the method of forming the second adhesive layer 13 of the first embodiment, and thus detailed description thereof is omitted here.

接著,如圖5(g)所示,透過第二黏著層13使第一焊錫粒子14附著於核體11之表面12上。Next, as shown in FIG. 5(g), the first solder particles 14 are adhered to the surface 12 of the core body 11 through the second adhesive layer 13.

接著,進行核體11、第一焊錫粒子14及第二焊錫粒子114之固定附著。隨後,藉由回焊使第一焊錫粒子14與第二焊錫粒子114同時熔融而形成焊錫層15。隨後,藉由進行與第一實施形態相同之步驟,製造本實施形態之電路基板1。Next, the core body 11, the first solder particles 14 and the second solder particles 114 are fixedly attached. Subsequently, the first solder particles 14 and the second solder particles 114 are simultaneously melted by reflow to form the solder layer 15. Subsequently, the circuit board 1 of the present embodiment is manufactured by performing the same steps as those of the first embodiment.

依據本實施形態之電路基板1之製造方法,透過第一黏著層5使核體11附著於端子部2上之後,使比第一焊錫粒子14小之第二焊錫粒子114附著於端子部2上。據此,可使第二焊錫粒子114進入核體11與端子部2間之間隙內。又,該步驟由於於固定附著步驟使第二焊錫粒子114彼此固定附著,故可使第二焊錫粒子114全部安定地附著在端子部2上。因此,在回焊步驟中可使核體11與端子部2更確實連接。According to the method of manufacturing the circuit board 1 of the present embodiment, after the core body 11 is adhered to the terminal portion 2 through the first adhesive layer 5, the second solder particles 114 smaller than the first solder particles 14 are attached to the terminal portion 2 . Thereby, the second solder particles 114 can be made to enter the gap between the core body 11 and the terminal portion 2. Further, in this step, since the second solder particles 114 are fixedly attached to each other in the fixing and attaching step, the second solder particles 114 can be stably adhered to the terminal portion 2. Therefore, the core body 11 and the terminal portion 2 can be more reliably connected in the reflow step.

(第四實施形態)(Fourth embodiment)

以下針對本發明第四實施形態之電路基板1之製造方法參照圖式加以說明。Hereinafter, a method of manufacturing the circuit board 1 according to the fourth embodiment of the present invention will be described with reference to the drawings.

本實施形態係如圖6(c)所示,與第一實施形態之不同點為使第二焊錫粒子114附著於端子部2之上後,依序形成第一黏著層5、核體11、第二黏著層13。以下說明其細節。This embodiment is different from the first embodiment in that the second solder particles 114 are adhered to the terminal portion 2, and the first adhesive layer 5 and the core body 11 are sequentially formed, as shown in FIG. 6(c). The second adhesive layer 13. The details are explained below.

首先,如圖6(a)~(b)所示,使端子部2開口。目前為止之步驟由於與第一實施形態相同,故省略其細節之說明。接著,如圖6(c)所示,於端子部2之表面4上形成未圖示之黏著部。接著,透過黏著部以被覆端子部2的表面4之方式附著第二焊錫粒子114。First, as shown in FIGS. 6(a) to 6(b), the terminal portion 2 is opened. Since the steps up to now are the same as those in the first embodiment, the detailed description thereof will be omitted. Next, as shown in FIG. 6(c), an adhesive portion (not shown) is formed on the surface 4 of the terminal portion 2. Next, the second solder particles 114 are attached to the surface 4 of the terminal portion 2 through the adhesive portion.

此時,第二焊錫粒子114之平均粒徑宜為1μm以上且為核體11之平均粒徑D之0.5倍以下,且比第一焊錫粒子14之平均粒徑E小,再者較好在5~10μm之範圍內。藉由使第二焊錫粒子114之粒徑落在該範圍內,可使充分量之第二焊錫粒子114進入第一焊錫粒子14與第一黏著層5之間。又,藉由使第二焊錫粒子114之粒徑落在該範圍內,可以均勻大小形成後述之焊錫凸塊16。In this case, the average particle diameter of the second solder particles 114 is preferably 1 μm or more and 0.5 times or less the average particle diameter D of the core body 11 and smaller than the average particle diameter E of the first solder particles 14 . Within the range of 5~10μm. By causing the particle diameter of the second solder particles 114 to fall within the range, a sufficient amount of the second solder particles 114 can enter between the first solder particles 14 and the first adhesive layer 5. Further, by setting the particle diameter of the second solder particles 114 within the range, the solder bumps 16 to be described later can be formed in a uniform size.

另一方面,第二焊錫粒子114之粒徑若小於1μm,則隨後之回焊步驟中,熔融之焊錫未充分行經核體11與端子部2之間。又,第二焊錫粒子114之粒徑超過第一焊錫粒子14之平均粒徑E之0.5倍時,隨後之回焊步驟中,由於熔融之焊錫大量行經核體11與端子部2之間,故後述焊錫凸塊16之大小產生不均而不佳。On the other hand, if the particle diameter of the second solder particles 114 is less than 1 μm, the molten solder does not sufficiently pass between the core body 11 and the terminal portion 2 in the subsequent reflow step. Further, when the particle diameter of the second solder particles 114 exceeds 0.5 times the average particle diameter E of the first solder particles 14, in the subsequent reflow step, since a large amount of molten solder passes between the core body 11 and the terminal portion 2, The size of the solder bumps 16 described later is not uniform.

接著,如圖6(d)所示,以被覆端子部2之表面4及第二焊錫粒子114之方式,形成第一黏著層5。第一黏著層5之形成方法由於與第一實施形態相同,故此處省略其詳細說明。Next, as shown in FIG. 6(d), the first adhesive layer 5 is formed so as to cover the surface 4 of the terminal portion 2 and the second solder particles 114. Since the method of forming the first adhesive layer 5 is the same as that of the first embodiment, a detailed description thereof will be omitted.

隨後,如圖6(e)所示透過第一黏著層5使核體11附著於端子部2上之後,如圖6(f)所示以被覆核體11之方式,形成第二黏著層13。隨後,如圖6(g)所示,透過第二黏著層13使第一焊錫粒子14附著於核體11之表面12。該等步驟由於與第一實施形態相同,故此處省略其細節。Subsequently, after the core body 11 is attached to the terminal portion 2 through the first adhesive layer 5 as shown in FIG. 6(e), the second adhesive layer 13 is formed as shown in FIG. 6(f) by coating the core body 11. . Subsequently, as shown in FIG. 6(g), the first solder particles 14 are adhered to the surface 12 of the core body 11 through the second adhesive layer 13. Since these steps are the same as those of the first embodiment, the details thereof are omitted here.

接著,進行核體11、第一焊錫粒子14及第二焊錫粒子114之固定附著。隨後,藉由回焊使第一焊錫粒子14與第二焊錫粒子114同時熔融而形成焊錫層15。隨後,藉由進行與第一實施形態相同之步驟,製造本實施形態之電路基板1。Next, the core body 11, the first solder particles 14 and the second solder particles 114 are fixedly attached. Subsequently, the first solder particles 14 and the second solder particles 114 are simultaneously melted by reflow to form the solder layer 15. Subsequently, the circuit board 1 of the present embodiment is manufactured by performing the same steps as those of the first embodiment.

依據本實施形態之電路基板1之製造方法,由於第二焊錫粒子114上配置核體11,故以固定附著步驟可強固地固定附著第二焊錫粒子114與核體11。因此,可防止回焊時核體11之脫落。又,由於回焊時可使熔解之第二焊錫粒子114確實行經核體11與端子部2之間,故可確實地連接核體11與端子部2。According to the method of manufacturing the circuit board 1 of the present embodiment, since the core body 11 is placed on the second solder particles 114, the second solder particles 114 and the core body 11 can be firmly fixed by the fixed adhesion step. Therefore, the falling off of the core body 11 at the time of reflow can be prevented. Further, since the melted second solder particles 114 are surely passed between the core body 11 and the terminal portion 2 during the reflow, the core body 11 and the terminal portion 2 can be reliably connected.

(第五實施形態)(Fifth Embodiment)

以下針對本發明第五實施形態之電路基板1之製造方法參照圖式加以說明。Hereinafter, a method of manufacturing the circuit board 1 according to the fifth embodiment of the present invention will be described with reference to the drawings.

本實施形態,如圖7(c)所示,與第一實施形態之不同點為使第二焊錫粒子114附著於端子部2上之後,回焊第二焊錫粒子114而形成焊錫被膜114a,且依序形成第一黏著層5、核體11、第二黏著層13。以下說明其細節。In the present embodiment, as shown in FIG. 7(c), unlike the first embodiment, after the second solder particles 114 are adhered to the terminal portion 2, the second solder particles 114 are reflowed to form the solder film 114a. The first adhesive layer 5, the core body 11, and the second adhesive layer 13 are sequentially formed. The details are explained below.

首先,如圖7(a)~(b)所示,使端子部2開口。目前為止之步驟由於與第一實施形態相同,故省略其細節說明。接著,於端子部2之表面4上形成未圖示之黏著部。接著,透過黏著部以被覆端子部2的表面4之方式附著第二焊錫粒子114。該狀態示於圖7(c)。First, as shown in FIGS. 7(a) to 7(b), the terminal portion 2 is opened. Since the steps up to now are the same as those in the first embodiment, the detailed description thereof will be omitted. Next, an adhesive portion (not shown) is formed on the surface 4 of the terminal portion 2. Next, the second solder particles 114 are attached to the surface 4 of the terminal portion 2 through the adhesive portion. This state is shown in Fig. 7(c).

此時,第二焊錫粒子114之平均粒徑較好為1μm以上且為端子部2之直徑F之1/3以下。藉由使第二焊錫粒子114之粒徑落在該範圍內,在隨後之回焊步驟中,可形成表面充分平坦之被膜114a。At this time, the average particle diameter of the second solder particles 114 is preferably 1 μm or more and 1/3 or less of the diameter F of the terminal portion 2 . By making the particle diameter of the second solder particles 114 fall within the range, in the subsequent reflow step, the film 114a having a sufficiently flat surface can be formed.

另一方面,第二焊錫粒子114之粒徑若小於1μm,則隨後之回焊步驟中,熔融之焊錫無法充分行經核體11與端子部2之間。又,第二焊錫粒子114之粒徑超過端子部2之直徑F之1/3時,隨後之回焊步驟中,形成表面成凸狀膨脹之焊錫被膜114a。因此,於隨後之步驟,難以附著核體11故不佳。On the other hand, if the particle diameter of the second solder particles 114 is less than 1 μm, the molten solder cannot sufficiently pass between the core body 11 and the terminal portion 2 in the subsequent reflow step. Further, when the particle diameter of the second solder particles 114 exceeds 1/3 of the diameter F of the terminal portion 2, the solder film 114a having a convex surface is formed in the subsequent reflow step. Therefore, in the subsequent steps, it is difficult to attach the core body 11 and it is not preferable.

接著,如圖7(d)所示,回焊第二焊錫粒子114。據此,以被覆端子部2的表面4之方式形成焊錫被膜114a。Next, as shown in FIG. 7(d), the second solder particles 114 are reflowed. Thereby, the solder film 114a is formed so as to cover the surface 4 of the terminal part 2.

此時,焊錫被膜114a並不限於前述之Super Just Fit(使透過黏著部附著之焊錫粉末回焊之方法),以電鍍法形成亦無妨。又,以電鍍法形成焊錫被膜114a時,可使焊錫被膜114a厚度成為3μm左右。為了安定地獲得本實施形態之固定附著步驟中固定附著性之改善,較好為0.5μm以上。再者,若為1μm以上,可進行更安定之固定附著故而較佳。又,厚度上限雖對於固定附著步驟中之固定附著性無直接影響,但就經濟面而言以10μm以下較佳。依據該方法,可以均勻厚度形成焊錫被膜114a,故可以均勻高度形成焊錫凸塊16。At this time, the solder film 114a is not limited to the above-described Super Just Fit (a method of reflowing the solder powder adhered to the adhesive portion), and may be formed by electroplating. When the solder film 114a is formed by electroplating, the thickness of the solder film 114a can be set to about 3 μm. In order to stably obtain the improvement of the fixing adhesion in the fixing and attaching step of the present embodiment, it is preferably 0.5 μm or more. Further, in the case of 1 μm or more, it is preferable to carry out a more stable fixation. Further, although the upper limit of the thickness does not directly affect the fixing adhesion in the fixing and attaching step, it is preferably 10 μm or less in terms of an economical surface. According to this method, the solder film 114a can be formed with a uniform thickness, so that the solder bumps 16 can be formed at a uniform height.

接著,如圖7(e)所示,以被覆焊錫被膜114a之方式形成第一黏著層5,接著,透過第一黏著層5及焊錫被膜114a使核體11附著於端子部2上。第一黏著層5之形成方法由於與第一實施形態相同,故此處省略其細節。Next, as shown in FIG. 7(e), the first adhesive layer 5 is formed so as to cover the solder film 114a, and then the core body 11 is adhered to the terminal portion 2 through the first adhesive layer 5 and the solder film 114a. Since the method of forming the first adhesive layer 5 is the same as that of the first embodiment, the details thereof are omitted here.

隨後,如圖7(e)所示,透過第一黏著層5使核體11附著於端子部2上之後,如圖7(f)所示,以被覆核體11之方式,形成第二黏著層13。隨後,如圖7(g)所示,透過第二黏著層13使第一焊錫粒子14附著於核體11之表面12上。該等步驟由於與第一實施形態相同,故此處省略其細節。Subsequently, as shown in FIG. 7(e), after the core body 11 is adhered to the terminal portion 2 through the first adhesive layer 5, as shown in FIG. 7(f), the second adhesive is formed so as to cover the core body 11. Layer 13. Subsequently, as shown in FIG. 7(g), the first solder particles 14 are adhered to the surface 12 of the core body 11 through the second adhesive layer 13. Since these steps are the same as those of the first embodiment, the details thereof are omitted here.

接著,進行核體11、第一焊錫粒子14及第二焊錫粒子114之固定附著。隨後,藉由回焊使第一焊錫粒子14與焊錫被膜114a同時熔融而形成焊錫層15。隨後,藉由進行與第一實施形態相同之步驟,製造本實施形態之電路基板1。Next, the core body 11, the first solder particles 14 and the second solder particles 114 are fixedly attached. Subsequently, the first solder particles 14 and the solder film 114a are simultaneously melted by reflow to form the solder layer 15. Subsequently, the circuit board 1 of the present embodiment is manufactured by performing the same steps as those of the first embodiment.

依據本實施形態之電路基板1之製造方法,由於在焊錫被膜114a上配置核體11,故以固定附著步驟可強固地固定附著焊錫被膜114a與核體11。因此,可防止回焊時核體11之脫落。又,由於回焊時可使熔解之焊錫被膜114a確實行經核體11與端子部2之間,故可確實地連接核體11與端子部2。According to the method of manufacturing the circuit board 1 of the present embodiment, since the core body 11 is placed on the solder film 114a, the solder film 114a and the core body 11 can be firmly fixed by the fixed adhesion step. Therefore, the falling off of the core body 11 at the time of reflow can be prevented. Further, since the molten solder film 114a can surely pass between the core body 11 and the terminal portion 2 during the reflow, the core body 11 and the terminal portion 2 can be reliably connected.

該等製造方法均可防止核體11之脫落,同時有提高良率之效果。選擇該製造方法由於依據步驟而有電路基板承受之熱經歷不同,故較好依據使用之電路基板之種類、形狀、電極尺寸等適當選擇。These manufacturing methods can prevent the core body 11 from falling off and have an effect of improving the yield. The manufacturing method is selected such that the thermal history of the circuit substrate is different depending on the steps, and therefore it is preferably selected depending on the type, shape, electrode size, and the like of the circuit substrate to be used.

(第六實施形態)(Sixth embodiment)

以下針對本發明第六實施形態之電路基板1之製造方法參照圖式加以說明。本實施形態與第一實施形態不同之點為本發明步驟中,預先形成附著第一焊錫粒子之核體30後,將附著第一焊錫粒子之核體30附著於第一黏著層5上。因此,以下說明僅說明該部分,省略對全體步驟之說明。Hereinafter, a method of manufacturing the circuit board 1 according to the sixth embodiment of the present invention will be described with reference to the drawings. The present embodiment differs from the first embodiment in that, in the step of the present invention, the core body 30 to which the first solder particles are attached is formed in advance, and then the core body 30 to which the first solder particles are attached is attached to the first adhesive layer 5. Therefore, the following description will only explain the part, and the description of the entire steps will be omitted.

首先,使用第二賦予黏著性之化合物對核體11的表面12賦予黏著性,形成第二黏著層13。接著,在空氣中、惰性氣體氛圍中、或者包含第一焊錫粒子14之分散液41中,使第一焊錫粒子14附著於第二黏著層13上,形成如圖8(a)所示之附著第一焊錫粒子之核體30。該附著第一焊錫粒子之核體30係由核體11的表面12上形成之第二黏著層13及透過第二黏著層13附著於核體11之表面12上之第一焊錫粒子14構成。First, adhesion is applied to the surface 12 of the core body 11 by using the second adhesion-imparting compound to form the second adhesive layer 13. Next, in the air, in an inert gas atmosphere, or in the dispersion 41 containing the first solder particles 14, the first solder particles 14 are adhered to the second adhesive layer 13 to form an adhesion as shown in Fig. 8(a). The core body 30 of the first solder particles. The core body 30 to which the first solder particles are attached is composed of a second adhesive layer 13 formed on the surface 12 of the core body 11 and first solder particles 14 which are adhered to the surface 12 of the core body 11 through the second adhesive layer 13.

本實施形態中,於核體11表面12上形成第二黏著層13之步驟較好在空氣中進行,使第一焊錫粒子14附著於第二黏著層13上之步驟較好在分散液41中進行。In the present embodiment, the step of forming the second adhesive layer 13 on the surface 12 of the core body 11 is preferably performed in the air, and the step of attaching the first solder particles 14 to the second adhesive layer 13 is preferably in the dispersion 41. get on.

接著,與第一實施形態之圖1(a)~圖1(c)所示之步驟同樣,以被覆電路基板1之端子部2表面之方式形成第一黏著層5。接著,如圖8(b)所示,使預先形成之附著第一焊錫粒子之核體30附著於第一黏著層5上。該方法說明於下。Next, similarly to the steps shown in FIGS. 1(a) to 1(c) of the first embodiment, the first adhesive layer 5 is formed so as to cover the surface of the terminal portion 2 of the circuit board 1. Next, as shown in FIG. 8(b), the core body 30 to which the first solder particles are attached, which is formed in advance, is attached to the first adhesive layer 5. This method is described below.

首先,針對在空氣中、惰性氣體氛圍中附著第一焊錫粒子之核體30加以說明。首先,將附著第一焊錫粒子之核體30投入充滿空氣或惰性氣體之容器內。接著,於容器內設置形成至第一黏著層5為止之電路基板1。接著,將容器傾斜或振動,使第一黏著層5與附著第一焊錫粒子之核體30接觸。藉此,使附著第一焊錫粒子之核體30附著於第一黏著層5上。First, the core body 30 to which the first solder particles are attached in an air or an inert gas atmosphere will be described. First, the core body 30 to which the first solder particles are attached is placed in a container filled with air or an inert gas. Next, the circuit board 1 formed up to the first adhesive layer 5 is provided in the container. Next, the container is tilted or vibrated to bring the first adhesive layer 5 into contact with the core body 30 to which the first solder particles are attached. Thereby, the core body 30 to which the first solder particles are attached is attached to the first adhesive layer 5.

接著,說明在液體中使附著第一焊錫粒子之核體30附著之方法。首先,如圖3所示,將水等分散液41注入容器40內,再將附著第一焊錫粒子之核體30添加於分散液41中。接著,將容器40傾斜使分散液41與附著第一焊錫粒子之核體30靠向一邊,使電路基板1以不與分散液41及附著第一焊錫粒子之核體30接觸之方式設置於容器內。隨後,藉由使容器40左右晃動,使分散液41中之第一黏著層5與附著第一焊錫粒子之核體30接觸。據此,使附著第一焊錫粒子之核體30附著於第一黏著層5上。Next, a method of attaching the core body 30 to which the first solder particles are attached in the liquid will be described. First, as shown in FIG. 3, a dispersion liquid 41 such as water is injected into the container 40, and the core body 30 to which the first solder particles are attached is added to the dispersion liquid 41. Next, the container 40 is tilted so that the dispersion liquid 41 and the core body 30 to which the first solder particles are attached are placed one side, and the circuit board 1 is placed on the container so as not to be in contact with the dispersion liquid 41 and the core body 30 to which the first solder particles are attached. Inside. Subsequently, the first adhesive layer 5 in the dispersion 41 is brought into contact with the core body 30 to which the first solder particles are attached by shaking the container 40 to the left and right. Thereby, the core body 30 to which the first solder particles are attached is attached to the first adhesive layer 5.

隨後,與第一實施形態之圖2(a)~圖2(d)所示之步驟相同,使第一焊錫粒子14熔融,於核體11表面12上形成焊錫層15。隨後,將電子零件22安裝於電路基板1上。Subsequently, similarly to the steps shown in Figs. 2(a) to 2(d) of the first embodiment, the first solder particles 14 are melted, and the solder layer 15 is formed on the surface 12 of the core body 11. Subsequently, the electronic component 22 is mounted on the circuit substrate 1.

依據本實施形態之製造方法,除與第一實施形態之情況相同之效果以外,獲得下述效果。According to the manufacturing method of the present embodiment, in addition to the effects similar to those in the first embodiment, the following effects are obtained.

亦即,依據本實施形態之電路基板1之製造方法,使附著第一焊錫粒子之核體30附著於端子部2之後,使第一焊錫粒子14加熱熔融。藉此可在核體11之表面12上形成焊錫層15,相較於使用表面以焊錫電鍍之附焊錫之核體之情況,可使步驟大幅簡化。In other words, in the method of manufacturing the circuit board 1 of the present embodiment, after the core body 30 to which the first solder particles are attached is attached to the terminal portion 2, the first solder particles 14 are heated and melted. Thereby, the solder layer 15 can be formed on the surface 12 of the core body 11, and the steps can be greatly simplified as compared with the case where the surface is solder-plated with a solder-coated core.

另外,由於安裝電子零件22時核體11成為隔離件,故可在不使電子零件22之姿勢傾斜下安裝電子零件。Further, since the core body 11 serves as a spacer when the electronic component 22 is mounted, the electronic component can be mounted without tilting the posture of the electronic component 22.

另外,由於在電路基板1上形成具有開口部6之抗蝕層3之後形成第一黏著層5,故端子部2以外之部分未形成第一黏著層5。據此,可使附著第一焊錫粒子之核體30選擇性附著於端子部2上。又,由於使附著第一焊錫粒子之核體30附著於開口部6內,故即使於第一黏著層5之黏著力弱之情況,仍可防止附著第一焊錫粒子之核體30脫落到開口部6之外。據此,可使附著第一焊錫粒子之核體30確實附著於全部端子部2上。Further, since the first adhesive layer 5 is formed after the resist layer 3 having the opening portion 6 is formed on the circuit board 1, the first adhesive layer 5 is not formed in portions other than the terminal portion 2. Thereby, the core body 30 to which the first solder particles are attached can be selectively attached to the terminal portion 2. Further, since the core body 30 to which the first solder particles are attached is attached to the opening portion 6, even when the adhesion force of the first adhesive layer 5 is weak, the core body 30 to which the first solder particles are attached can be prevented from falling off to the opening. Outside the Ministry 6. Thereby, the core body 30 to which the first solder particles are attached can be surely attached to all of the terminal portions 2.

又,包含附著第一焊錫粒子之核體30之分散液41中,藉由使附著第一焊錫粒子之核體30附著於第一黏著層5上,可使附著第一焊錫粒子之核體30對各端子部2之附著量均勻。據此,亦可確實地對一個端子部2附著一個附著第一焊錫粒子之核體30。Further, in the dispersion 41 including the core body 30 to which the first solder particles are attached, the core body 30 to which the first solder particles are attached is adhered to the first adhesive layer 5, whereby the core body 30 to which the first solder particles are attached can be attached. The amount of adhesion to each terminal portion 2 is uniform. According to this, it is also possible to reliably attach one core body 30 to which the first solder particles are attached to one terminal portion 2.

又,包含第一焊錫粒子14之分散液41中,藉由使第一焊錫粒子14附著於第二黏著層13上,可使第一焊錫粒子14對於各核體11之附著量均勻。又,相較於核體表面上以電鍍等形成焊錫層之情況相比,可大幅簡化步驟。Further, in the dispersion liquid 41 including the first solder particles 14, by attaching the first solder particles 14 to the second adhesive layer 13, the amount of adhesion of the first solder particles 14 to the respective core bodies 11 can be made uniform. Further, the step can be greatly simplified as compared with the case where a solder layer is formed by plating or the like on the surface of the core body.

[實施例][Examples]

以下利用實施例說明本發明,但本發明並不受限於該等實施例。The invention is illustrated by the following examples, but the invention is not limited to the examples.

(實施例1)(Example 1)

首先,準備粒徑50μm之純Cu製球體作為核體11。接著,準備配置約1000個由直徑80μm之銅所構成之端子部2之電路基板1,使用慣用之光微影術,形成厚度20μm之絕緣性抗蝕層3。藉此,形成露出端子部2之構成之直徑80μm之圓狀開口部6。接著,準備通式(3)之R12之烷基為C11 H23 、R11為氫原子之咪唑系化合物之2質量%水溶液作為包含第一賦予黏著性之化合物之黏著性溶液,以乙酸將pH調整成約4。接著將該黏著性溶液加溫至40℃,將由鹽酸水溶液前處理之電路基板1浸漬於其中3分鐘,以覆蓋端子部2之表面4之方式形成第一黏著層5。First, a pure Cu sphere having a particle diameter of 50 μm was prepared as the core body 11. Next, a circuit board 1 of about 1000 terminal portions 2 made of copper having a diameter of 80 μm was prepared, and an insulating resist layer 3 having a thickness of 20 μm was formed by conventional photolithography. Thereby, a circular opening portion 6 having a diameter of 80 μm which is configured to expose the terminal portion 2 is formed. Next, a 2% by mass aqueous solution of an imidazole compound in which the alkyl group of R12 of the formula (3) is C 11 H 23 and R11 is a hydrogen atom is prepared as an adhesive solution containing the first adhesion-imparting compound, and the pH is adjusted with acetic acid. Adjust to about 4. Then, the adhesive solution was heated to 40 ° C, and the circuit substrate 1 pretreated with an aqueous hydrochloric acid solution was immersed therein for 3 minutes to form the first adhesive layer 5 so as to cover the surface 4 of the terminal portion 2.

接著,準備內部尺寸為200mm×120mm×150mm大小之粒子附著裝置。又,該粒子附著裝置中,設置具有投入口之容器40,成為可使電路基板1以水平方向投入之構成。接著,於容器40中投入水1600ml與約400g之由銅組成之平均粒徑50μm之核體11。接著,使焊錫粒子附著裝置傾斜,使水與核體11靠向容器40內之一邊後,以不接觸核體11之方式將電路基板1投入容器40內。隨後,使容器40左右30°晃動30~60秒,藉此透過第一黏著層5使核體11附著於電路基板1上。此時,晃動週期為10秒/次。Next, a particle attachment device having an internal size of 200 mm × 120 mm × 150 mm was prepared. Further, in the particle adhering device, the container 40 having the inlet port is provided, and the circuit board 1 can be placed in the horizontal direction. Next, 1600 ml of water and about 400 g of a core body 11 composed of copper and having an average particle diameter of 50 μm were placed in the vessel 40. Next, the solder particle adhesion device is tilted, and the water and the core body 11 are placed against one side of the container 40, and then the circuit board 1 is placed in the container 40 so as not to contact the core body 11. Subsequently, the container 40 is shaken left and right by 30° for 30 to 60 seconds, whereby the core body 11 is attached to the circuit board 1 through the first adhesive layer 5. At this time, the shaking period is 10 seconds/time.

隨後,自裝置取出電路基板1,以純水輕輕洗淨後,使電路基板1乾燥。Subsequently, the circuit board 1 is taken out from the apparatus, washed gently with pure water, and the circuit board 1 is dried.

接著,再度使用上述賦予黏著性之化合物溶液,於核體11之表面12上形成第二黏著層13。Next, the second adhesive layer 13 is formed on the surface 12 of the core body 11 by using the above-mentioned adhesive compound solution.

接著,於上述焊錫粒子附著裝置中投入1600ml之水及400g之以96.5Sn/3.5Ag之組成之平均粒徑10μm之第一焊錫粒子14。接著,將焊錫粒子附著裝置傾斜,使水與第一焊錫粒子14靠向容器40內之一邊後,以不接觸到第一焊錫粒子14之方式將電路基板1投入容器內。隨後,使容器40左右30°晃動30~60秒,藉此透過第二黏著層13使第一焊錫粒子14附著於核體11上。此時,晃動週期為5秒/次。Next, 1600 ml of water and 400 g of the first solder particles 14 having an average particle diameter of 10 μm of a composition of 96.5 Sn/3.5 Ag were placed in the solder particle adhering device. Next, the solder particle adhering device is tilted, and the water and the first solder particles 14 are placed against one side of the container 40, and then the circuit board 1 is placed in the container so as not to contact the first solder particles 14. Subsequently, the container 40 is shaken left and right by 30° for 30 to 60 seconds, whereby the first solder particles 14 are adhered to the core body 11 through the second adhesive layer 13. At this time, the shaking period is 5 seconds/time.

隨後,自裝置取出電路基板1,以純水輕輕洗淨後,使電路基板1乾燥。Subsequently, the circuit board 1 is taken out from the apparatus, washed gently with pure water, and the circuit board 1 is dried.

接著,將電路基板1置入180℃烘箱中加熱20分鐘,使核體11及第一焊錫粒子14固定附著。接著,將助焊劑噴佈塗佈於電路基板1之表面上,將電路基板1投入回焊爐中3分鐘,在240℃之氮氣氛圍氣中加熱,在端子部2上形成高約53μm之焊錫凸塊16。Next, the circuit board 1 was placed in an oven at 180 ° C and heated for 20 minutes to fix the core body 11 and the first solder particles 14 to each other. Next, a flux spray was applied onto the surface of the circuit board 1, and the circuit board 1 was placed in a reflow furnace for 3 minutes, and heated in a nitrogen atmosphere at 240 ° C to form a solder having a height of about 53 μm on the terminal portion 2. Bump 16.

結果,焊錫凸塊16之高度偏差以標準差表示為1.5μm,與核體11之粒徑偏差為相同程度。又,未發現未附著有焊錫凸塊16之端子部2。As a result, the height deviation of the solder bumps 16 is represented by a standard deviation of 1.5 μm, which is the same as the particle diameter deviation of the core body 11. Further, the terminal portion 2 to which the solder bumps 16 were not attached was not found.

(實施例2)(Example 2)

除使核體11之粒徑為50μm,使第一焊錫粒子14之粒徑為20μm以外,其餘條件與實施例1相同,進行至使第一焊錫粒子14附著於核體11之前之步驟。The conditions before the first solder particles 14 were attached to the core body 11 were carried out in the same manner as in Example 1 except that the particle diameter of the core body 11 was 50 μm and the particle diameter of the first solder particles 14 was 20 μm.

隨後,藉由同樣之步驟,透過第二黏著層13使粒徑10μm之第二焊錫粒子114於水中附著於端子部2上。Subsequently, by the same procedure, the second solder particles 114 having a particle diameter of 10 μm are adhered to the terminal portion 2 in the water through the second adhesive layer 13.

隨後,與實施例1同樣進行洗淨、乾燥、回焊,製造焊錫凸塊16。Subsequently, the solder bumps 16 were produced by washing, drying, and reflowing in the same manner as in the first embodiment.

(實施例3)(Example 3)

與實施例1同樣使核體11之粒徑為50μm,進行至使核體11附著於第一黏著層5之前之步驟。In the same manner as in the first embodiment, the particle size of the core body 11 was 50 μm, and the step of attaching the core body 11 to the first pressure-sensitive adhesive layer 5 was carried out.

隨後,在大氣中使粒徑5μm之第二焊錫粒子114附著於第一黏著層5。隨後,除使第一焊錫粒子14之粒徑為20μm以外,其餘條件與實施例1相同,於水中將第一焊錫粒子14附著於核體11上。Subsequently, the second solder particles 114 having a particle diameter of 5 μm are attached to the first adhesive layer 5 in the atmosphere. Subsequently, the first solder particles 14 were adhered to the core body 11 in water except that the particle diameter of the first solder particles 14 was 20 μm.

隨後,與實施例1同樣進行洗淨、乾燥、回焊,製造焊錫凸塊16。Subsequently, the solder bumps 16 were produced by washing, drying, and reflowing in the same manner as in the first embodiment.

(實施例4)(Example 4)

與實施例1同樣,形成使端子部2露出之構成之抗蝕層3以及開口部6後,透過黏著部以被覆端子部2的表面4之方式,附著粒徑10μm之第二焊錫粒子114。隨後,除使核體11之粒徑為50μm,使第一焊錫粒子14之粒徑為20μm以外,其餘條件與實施例1相同,製造焊錫凸塊16。In the same manner as in the first embodiment, the resist layer 3 and the opening portion 6 in which the terminal portion 2 is exposed are formed, and then the second solder particles 114 having a particle diameter of 10 μm are adhered to the surface 4 of the terminal portion 2 through the adhesive portion. Subsequently, the solder bumps 16 were produced in the same manner as in Example 1 except that the particle diameter of the core body 11 was 50 μm and the particle diameter of the first solder particles 14 was 20 μm.

(實施例5)(Example 5)

與實施例1同樣,形成使端子部2露出之構成之抗蝕層3及開口部6之後,透過黏著部以被覆端子部2的表面4之方式,附著粒徑10μm之第二焊錫粒子114。隨後,除使核體11之粒徑為50μm,使第一焊錫粒子14之粒徑為20μm以外,其餘條件與實施例1相同,製造焊錫凸塊16。In the same manner as in the first embodiment, the resist layer 3 and the opening portion 6 in which the terminal portion 2 is exposed are formed, and then the second solder particles 114 having a particle diameter of 10 μm are adhered to the surface 4 of the terminal portion 2 through the adhesive portion. Subsequently, the solder bumps 16 were produced in the same manner as in Example 1 except that the particle diameter of the core body 11 was 50 μm and the particle diameter of the first solder particles 14 was 20 μm.

(實施例6)(Example 6)

與實施例1同樣,形成使端子部2露出之構成之抗蝕層3及開口部6之後,藉由無電解電鍍,以被覆端子部2之方式形成厚度3μm之錫合金鍍層。隨後,除使核體11之粒徑為50μm,使第一焊錫粒子14之粒徑為20μm以外,其餘條件與實施例1相同,製造焊錫凸塊16。In the same manner as in the first embodiment, after forming the resist layer 3 and the opening portion 6 in which the terminal portion 2 is exposed, a tin alloy plating layer having a thickness of 3 μm is formed by coating the terminal portion 2 by electroless plating. Subsequently, the solder bumps 16 were produced in the same manner as in Example 1 except that the particle diameter of the core body 11 was 50 μm and the particle diameter of the first solder particles 14 was 20 μm.

實施例2至實施例6之結果,任一焊錫凸塊16之結果,可知任一固定附著步驟、回焊步驟中之核體11均脫落,且未發現未附著有焊錫凸塊16之端子部2。As a result of the second embodiment to the sixth embodiment, as a result of any of the solder bumps 16, it is understood that the core body 11 in any of the fixed adhesion step and the reflow step is peeled off, and the terminal portion to which the solder bump 16 is not attached is not found. 2.

[產業上之可能利用性][Industry possible use]

以該方法形成之焊錫凸塊可在未使用含有大量鉛之高熔點焊錫下形成,達到無鉛化,同時亦可解決因來自Pb同位素之α射線誤動作之問題。又,由於並未使用昂貴之銅核焊錫球而製作核中具有核體之焊錫凸塊,故可以低成本解決焊錫凸塊之高度不均之問題,以及搭載晶片之際之回焊時晶片下沉之問題。本方法為適合細微電路基板之方法,可提供高積體度且信賴性高之電子設備。The solder bump formed by the method can be formed without using a high melting point solder containing a large amount of lead to achieve lead-free, and can also solve the problem of malfunction due to the alpha ray from the Pb isotope. Moreover, since the solder bumps having the core body in the core are not produced by using the expensive copper core solder balls, the problem of uneven height of the solder bumps can be solved at a low cost, and the wafers are reflowed at the time of mounting the wafers. The problem of sinking. The method is a method suitable for a fine circuit substrate, and can provide an electronic device with high integration and high reliability.

1...電路基板1. . . Circuit substrate

1a...電路基板上面1a. . . Above the circuit board

2...端子部2. . . Terminal part

3...抗蝕層3. . . Resist layer

4...端子部表面4. . . Terminal surface

5...第一黏著層5. . . First adhesive layer

6...開口部6. . . Opening

11...核體11. . . Nuclear body

12...核體表面12. . . Nuclear surface

13...第二黏著層13. . . Second adhesive layer

14...第一焊錫粒子14. . . First solder particle

15...焊錫層15. . . Solder layer

16、20...焊錫凸塊16, 20. . . Solder bump

22...電子零件twenty two. . . Electronic parts

23...電子零件本體twenty three. . . Electronic component body

24...電子零件之端子部twenty four. . . Terminal part of electronic parts

25...電鍍層25. . . Plating

30...附著第一焊錫粒子之核體30. . . a core body to which the first solder particles are attached

40...容器40. . . container

41...分散液41. . . Dispersions

114...第二焊錫粒子114. . . Second solder particle

114a...焊錫被膜114a. . . Solder film

圖1為說明本發明第一實施形態之電路基板之製造步驟之步驟圖。Fig. 1 is a flow chart for explaining a manufacturing procedure of a circuit board according to a first embodiment of the present invention.

圖2為說明本發明第一實施形態之電路基板之製造步驟之步驟圖。Fig. 2 is a flow chart showing the steps of manufacturing the circuit board according to the first embodiment of the present invention.

圖3為說明附著第一焊錫粒子之步驟之模式圖。Fig. 3 is a schematic view showing the step of attaching the first solder particles.

圖4為說明本發明第二實施形態之電路基板之製造步驟之步驟圖。Fig. 4 is a flow chart for explaining a manufacturing procedure of a circuit board according to a second embodiment of the present invention.

圖5為說明本發明第三實施形態之電路基板之製造步驟之步驟圖。Fig. 5 is a flow chart for explaining a manufacturing procedure of a circuit board according to a third embodiment of the present invention.

圖6為說明本發明第四實施形態之電路基板之製造步驟之步驟圖。Fig. 6 is a flow chart for explaining a manufacturing procedure of a circuit board according to a fourth embodiment of the present invention.

圖7為說明本發明第五實施形態之電路基板之製造步驟之步驟圖。Fig. 7 is a flow chart for explaining a manufacturing procedure of a circuit board according to a fifth embodiment of the present invention.

圖8為說明本發明第六實施形態之電路基板之製造步驟之步驟圖。Fig. 8 is a flow chart for explaining a manufacturing procedure of a circuit board according to a sixth embodiment of the present invention.

1...電路基板1. . . Circuit substrate

1a...電路基板上面1a. . . Above the circuit board

2...端子部2. . . Terminal part

3...抗蝕層3. . . Resist layer

4...端子部表面4. . . Terminal surface

5...第一黏著層5. . . First adhesive layer

6...開口部6. . . Opening

11...核體11. . . Nuclear body

12...核體表面12. . . Nuclear surface

13...第二黏著層13. . . Second adhesive layer

14...第一焊錫粒子14. . . First solder particle

Claims (18)

一種電路基板之製造方法,其特徵為具備:於電路基板之端子部表面上塗佈第一賦予黏著性之化合物而形成第一黏著層之步驟,使核體附著於前述端子部之前述第一黏著層上之步驟,於前述核體表面上塗佈第二賦予黏著性之化合物而形成第二黏著層之步驟,使第一焊錫粒子附著於前述核體表面之前述第二黏著層上之步驟,及使前述第一焊錫粒子熔融,於前述核體表面上形成焊錫層之步驟。A method of manufacturing a circuit board, comprising: coating a first adhesive layer on a surface of a terminal portion of a circuit board to form a first adhesive layer, and attaching the core body to the first portion of the terminal portion a step of adhering a second adhesion-promoting compound to the surface of the core body to form a second adhesive layer, and attaching the first solder particles to the second adhesive layer on the surface of the core body And a step of melting the first solder particles to form a solder layer on the surface of the core body. 如申請專利範圍第1項之電路基板之製造方法,其具備下列步驟而成:於前述端子部表面上塗佈前述第一賦予黏著性之化合物而形成前述第一黏著層之步驟,透過前述第二黏著層,使表面上附著有前述第一焊錫粒子而成之附著第一焊錫粒子之核體附著於前述第一黏著層上之步驟,及使前述第一焊錫粒子熔融,於前述核體表面上形成前述焊錫層之步驟。The method of manufacturing a circuit board according to the first aspect of the invention, comprising the steps of: applying the first adhesion-imparting compound to the surface of the terminal portion to form the first adhesive layer, and transmitting the first a second adhesive layer, wherein a core body to which the first solder particles are attached to the surface and adhered to the first solder layer is adhered to the first adhesive layer, and the first solder particles are melted on the surface of the core body The step of forming the aforementioned solder layer is performed. 如申請專利範圍第1項之電路基板之製造方法,其中於使前述第一焊錫粒子附著於前述第二黏著層上之步驟之後,具有透過前述第一黏著層使前述第二焊錫粒子附著於前述端子部表面上之步驟,且形成前述焊錫層之步驟之際,前述第一焊錫粒子與前述第二焊錫粒子同時熔融。The method of manufacturing a circuit board according to claim 1, wherein after the step of attaching the first solder particles to the second adhesive layer, the second solder particles are adhered to the first adhesive layer. When the step of forming the solder layer is performed on the surface of the terminal portion, the first solder particles and the second solder particles are simultaneously melted. 如申請專利範圍第1項之電路基板之製造方法,其中在將前述核體附著於前述第一黏著層上之步驟與形成前述第二黏著層之步驟之間,具有透過前述第一黏著層使前述第二焊錫粒子附著於前述端子部表面上之步驟,且形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述第二焊錫粒子同時熔融。The method of manufacturing a circuit board according to the first aspect of the invention, wherein the step of attaching the core body to the first adhesive layer and the step of forming the second adhesive layer have a first adhesive layer The second solder particles are adhered to the surface of the terminal portion, and when the solder layer is formed, the first solder particles and the second solder particles are simultaneously melted. 如申請專利範圍第1項之電路基板之製造方法,其中形成前述第一黏著層之步驟之前,具有使前述第二焊錫粒子附著於前述端子部表面上之步驟,且形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述第二焊錫粒子同時熔融。The method of manufacturing a circuit board according to claim 1, wherein the step of forming the first adhesive layer has a step of attaching the second solder particles to a surface of the terminal portion, and forming the solder layer The first solder particles and the second solder particles are simultaneously melted. 如申請專利範圍第1項之電路基板之製造方法,其中具備下列步驟:使前述第二焊錫粒子附著於前述端子部表面上之步驟,使前述第二焊錫粒子熔解,於前述端子部表面上形成焊錫被膜之步驟,及透過前述焊錫被膜於前述端子部表面上塗佈第一賦予黏著性之化合物而形成第一黏著層之步驟,且,形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述焊錫被膜同時熔融。The method of manufacturing a circuit board according to claim 1, further comprising the step of: adhering the second solder particles to a surface of the terminal portion, and melting the second solder particles to form a surface of the terminal portion a step of forming a solder film by applying a first adhesion-promoting compound to the surface of the terminal portion through the solder film to form a first adhesive layer, and forming the solder layer to form the first solder The particles are simultaneously melted with the aforementioned solder film. 如申請專利範圍第1項之電路基板之製造方法,其中具備下列步驟:利用電鍍法於前述端子部表面上形成焊錫被膜之步驟,及透過前述焊錫被膜於前述端子部表面上塗佈第一賦予黏著性之化合物而形成第一黏著層之步驟,且,形成前述焊錫層之步驟之際,使前述第一焊錫粒子與前述焊錫被膜同時熔融。The method of manufacturing a circuit board according to claim 1, further comprising the steps of: forming a solder film on the surface of the terminal portion by electroplating, and applying a first pass to the surface of the terminal portion through the solder film; The step of forming the first adhesive layer by the adhesive compound, and simultaneously forming the solder layer, the first solder particles and the solder film are simultaneously melted. 如申請專利範圍第3項之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為1μm以上且為前述第一焊錫粒子之平均粒徑之0.4倍以下。The method of manufacturing a circuit board according to claim 3, wherein the second solder particles have an average particle diameter of 1 μm or more and 0.4 times or less the average particle diameter of the first solder particles. 如申請專利範圍第4或5項之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為1μm以上且為前述核體之平均粒徑之0.5倍以下,且較前述第一焊錫粒子為小。The method of manufacturing a circuit board according to claim 4, wherein the second solder particles have an average particle diameter of 1 μm or more and 0.5 times or less the average particle diameter of the core body, and are higher than the first solder particles. Small. 如申請專利範圍第9項之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為5~10μm。The method of manufacturing a circuit board according to claim 9, wherein the second solder particles have an average particle diameter of 5 to 10 μm. 如申請專利範圍第6項之電路基板之製造方法,其中前述第二焊錫粒子之平均粒徑為1μm以上且為前述端子部之直徑之1/3以下。The method of manufacturing a circuit board according to the sixth aspect of the invention, wherein the second solder particles have an average particle diameter of 1 μm or more and 1/3 or less of a diameter of the terminal portion. 如申請專利範圍第1項之電路基板之製造方法,其係將具有前述第一黏著層之前述電路基板浸漬於包含前述核體之分散液中,使前述核體附著於前述第一黏著層上。The method of manufacturing a circuit board according to the first aspect of the invention, wherein the circuit board having the first adhesive layer is immersed in a dispersion liquid containing the core body, and the core body is attached to the first adhesive layer. . 如申請專利範圍第2項之電路基板之製造方法,其係將具有前述第一黏著層之前述電路基板浸漬於包含前述附著第一焊錫粒子之核體之分散液中,使前述附著第一焊錫粒子之核體附著於前述第一黏著層上。The method of manufacturing a circuit board according to claim 2, wherein the circuit board having the first adhesive layer is immersed in a dispersion containing the core body to which the first solder particles are attached, and the first solder is attached. The core body of the particle is attached to the first adhesive layer. 如申請專利範圍第1項之電路基板之製造方法,其係將附著有具有前述第二黏著層之前述核體之前述電路基板浸漬於包含前述第一焊錫粒子之前述分散液中,使前述第一焊錫粒子附著於前述核體表面上。The method of manufacturing a circuit board according to the first aspect of the invention, wherein the circuit board to which the core body having the second adhesive layer is adhered is immersed in the dispersion liquid containing the first solder particles, and the A solder particle is attached to the surface of the core body. 如申請專利範圍第2項之電路基板之製造方法,其係將具有前述第二黏著層之前述核體浸漬於包含前述第一焊錫粒子之分散液中,使前述第一焊錫粒子附著於前述第二黏著層上,形成前述附著第一焊錫粒子之核體。The method of manufacturing a circuit board according to the second aspect of the invention, wherein the core body having the second adhesive layer is immersed in a dispersion liquid containing the first solder particles, and the first solder particles are attached to the first On the second adhesive layer, the core body to which the first solder particles are attached is formed. 如申請專利範圍第1項之電路基板之製造方法,其係使用金屬球作為前述核體。A method of manufacturing a circuit board according to claim 1, wherein a metal ball is used as the core body. 如申請專利範圍第1項之電路基板之製造方法,其中前述核體係由銅所構成。The method of manufacturing a circuit board according to claim 1, wherein the core system is made of copper. 如申請專利範圍第1項之電路基板之製造方法,其中形成前述第一黏著層之步驟中,在前述電路基板上形成具有使前述端子部露出之開口部之絕緣層之後,形成前述第一黏著層。In the method of manufacturing a circuit board according to the first aspect of the invention, in the step of forming the first adhesive layer, the first adhesive layer is formed on the circuit substrate by forming an insulating layer having an opening portion through which the terminal portion is exposed. 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