TWI416571B - Field emission cathode device and field emission display - Google Patents

Field emission cathode device and field emission display Download PDF

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TWI416571B
TWI416571B TW99145133A TW99145133A TWI416571B TW I416571 B TWI416571 B TW I416571B TW 99145133 A TW99145133 A TW 99145133A TW 99145133 A TW99145133 A TW 99145133A TW I416571 B TWI416571 B TW I416571B
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opening
cathode
electrode
disposed
field emission
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TW99145133A
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TW201227787A (en
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Jie Tang
Bing-Chu Du
Shou-Shan Fan
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Hon Hai Prec Ind Co Ltd
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Abstract

The present invention relates to a field emission cathode device. The field emission cathode device includes a cathode substrate, a gate, a first dielectric layer, a cathode, and an electron emission layer. The gate is located on a surface of the cathode substrate. The first dielectric layer is located on a surface of the gate and defines a first opening. The cathode is spaced from the gate via the first dielectric layer and defines a second opening in alignment with the first opening to expose the gate. The electron emission layer is located on a surface of the cathode and near the second opening. A field emission display using the field emission cathode device is also related.

Description

場發射陰極裝置及場發射顯示器 Field emission cathode device and field emission display

本發明涉及一種場發射陰極裝置及場發射顯示器,尤其涉及一種背柵結構的場發射陰極裝置及場發射顯示器。 The invention relates to a field emission cathode device and a field emission display, in particular to a field emission cathode device and a field emission display with a back gate structure.

場發射顯示器係繼陰極射線管(CRT)顯示器和液晶(LCD)顯示器之後,最具發展潛力的下一代新興技術。相對於先前的顯示器,場發射顯示器具有顯示效果好、視角大、功耗小以及體積小等優點,尤其係基於奈米碳管的場發射顯示器,近年來越來越受到重視。 Field emission displays are the next generation of emerging technologies with the most potential after cathode ray tube (CRT) displays and liquid crystal (LCD) displays. Compared with the previous display, the field emission display has the advantages of good display effect, large viewing angle, low power consumption and small volume, especially the field emission display based on carbon nanotubes, which has received more and more attention in recent years.

一般而言,場發射顯示器的結構可分為二極型和三極型。所謂二極型即包括有陽極和陰極的場發射結構,這種結構由於需要施加高電壓,而且均勻性以及電子發射難以控制,驅動電路成本高,基本上不適合高解析度顯示器的實際應用。三極型結構則係在二極型基礎上改進,增加柵極來控制電子發射,可實現在較低電壓條件下發出電子,而且電子發射容易通過柵極來精確控制。而根據柵極設置位置的不同,三極型場發射顯示器又可分為正柵結構和背柵結構兩種。其中,背柵結構的場發射顯示器由於工藝簡單,製備成本較低而備受關注。 In general, the structure of a field emission display can be divided into a two-pole type and a three-pole type. The so-called two-pole type includes a field emission structure having an anode and a cathode. This structure is difficult to control due to the need to apply a high voltage, and the uniformity and electron emission are difficult to control, and the driving circuit is high in cost, and is basically unsuitable for the practical application of the high-resolution display. The triode structure is improved on the basis of the dipole type. The gate is added to control the electron emission, and electrons can be emitted under a lower voltage condition, and the electron emission is easily controlled by the gate. According to the position of the gate, the three-pole field emission display can be divided into two types: a positive gate structure and a back gate structure. Among them, the field emission display of the back gate structure has attracted much attention due to the simple process and low preparation cost.

請參閱圖9和圖10,先前技術提供一種背柵結構的場發射顯示器30,其包括一下基板304,一設置於下基板304表面的柵極層308,一設置於柵極層308表面的隔離層310,一設置於隔離層310表面陰極層312,一設置於陰極層312表面的電子發射層316,一上基板302,一設置於上基板302表面的陽極層320以及設置於陽極層320表面的螢光層322。所述上基板302與下基板304之間定義一真空空間306,以收容其他元件。所述電子發射層316與螢光層322相對設置。所述電子發射層316通常為一圓形奈米碳管漿料層。 Referring to FIG. 9 and FIG. 10, the prior art provides a field emission display 30 of a back gate structure including a lower substrate 304, a gate layer 308 disposed on the surface of the lower substrate 304, and an isolation disposed on the surface of the gate layer 308. The layer 310 is disposed on the surface of the isolation layer 310, the cathode layer 312, an electron emission layer 316 disposed on the surface of the cathode layer 312, an upper substrate 302, an anode layer 320 disposed on the surface of the upper substrate 302, and a surface disposed on the anode layer 320. Fluorescent layer 322. A vacuum space 306 is defined between the upper substrate 302 and the lower substrate 304 to accommodate other components. The electron emission layer 316 is disposed opposite to the phosphor layer 322. The electron emission layer 316 is typically a circular carbon nanotube slurry layer.

然而,先前技術中的背柵結構的場發射顯示器30工作時,柵極層308產生的電場只能從陰極層312的四周滲透到電子發射層316表面。故,電子發射層316主要靠邊緣發射電子324,從而造成像素點的發光不均勻,產生如圖6所示的圓環形顯示效果。 However, when the field emission display 30 of the back gate structure of the prior art operates, the electric field generated by the gate layer 308 can only penetrate from the periphery of the cathode layer 312 to the surface of the electron emission layer 316. Therefore, the electron emission layer 316 mainly emits electrons 324 by the edges, thereby causing uneven illumination of the pixel dots, resulting in a circular display effect as shown in FIG.

有鑒於此,提供一種像素點均勻發光的背柵結構的場發射陰極裝置以及場發射顯示器實為必要。 In view of the above, it is necessary to provide a field emission cathode device and a field emission display having a back gate structure in which pixels are uniformly illuminated.

一種場發射陰極裝置,包括:一陰極基板;一柵極電極設置於該陰極基板的表面;一第一絕緣層設置於所述柵極電極的表面;一陰極電極通過所述第一絕緣層與所述柵極電極間隔設置;以及一陰極發射層設置於所述陰極電極表面,其中:所述第一絕緣層設置有一第一開孔,所述陰極電極設置有一第二開孔,所述第一開孔與第二開孔對應設置且相互連通,使所述柵極電極對應該開孔位置的表面暴露,所述陰極發射層僅設置於所述陰極電極靠近所 述第二開孔位置的表面。 A field emission cathode device comprising: a cathode substrate; a gate electrode disposed on a surface of the cathode substrate; a first insulating layer disposed on a surface of the gate electrode; and a cathode electrode passing through the first insulating layer The gate electrode is disposed at intervals; and a cathode emission layer is disposed on the surface of the cathode electrode, wherein: the first insulation layer is provided with a first opening, and the cathode electrode is provided with a second opening, An opening corresponding to the second opening and communicating with each other to expose the surface of the gate electrode to the opening position, the cathode emitting layer being disposed only adjacent to the cathode electrode The surface of the second opening position.

一種場發射顯示器,其包括:一陰極基板;複數個柵極電極相互平行且間隔設置於該陰極基板的一表面;複數個陰極電極相互平行且間隔設置,該複數個陰極電極與複數個柵極電極異面交叉設置,所述柵極電極與陰極電極的交叉區域定義一像素區域,且所述陰極電極與每個像素區域相對應處定義一第二開孔;一第一絕緣層設置於所述複數個柵極電極與複數個陰極電極之間,且該第一絕緣層與每個像素區域相對應處定義一第一開孔與第二開孔連通,所述柵極電極對應所述第一開孔與第二開孔位置的表面暴露;一第二絕緣層設置於所述複數個陰極電極表面,且與每個像素區域相對應處定義一第五開孔,該第五開孔的內徑大於所述第二開孔的內徑,使陰極電極靠近第二開孔位置的部分表面暴露;複數個環形陰極發射層分別與所述陰極電極的第二開孔對應設置,且設置於所述陰極電極暴露的表面靠近第二開孔的位置;一聚焦電極設置於所述第二絕緣層表面,且與每個像素區域相對應處定義一第四開孔與第五開孔連通;一陽極基板與所述陰極基板相對且間隔設置,所述陽極基板與陰極基板之間定義一真空空間;一陽極電極設置於所述陽極基板與陰極基板相對的表面;以及複數個螢光粉層設置於陽極電極表面,且與複數個環形陰極發射層一一對應設置。 A field emission display comprising: a cathode substrate; a plurality of gate electrodes are parallel to each other and spaced apart from a surface of the cathode substrate; a plurality of cathode electrodes are parallel and spaced apart from each other, the plurality of cathode electrodes and a plurality of gates The electrodes are disposed at different intersections, the intersection area of the gate electrode and the cathode electrode defines a pixel area, and the cathode electrode defines a second opening corresponding to each pixel area; a first insulating layer is disposed at the Between the plurality of gate electrodes and the plurality of cathode electrodes, and the first insulating layer defines a first opening corresponding to each of the pixel regions and the second opening, wherein the gate electrode corresponds to the first a surface of the first opening and the second opening is exposed; a second insulating layer is disposed on the surface of the plurality of cathode electrodes, and a fifth opening is defined corresponding to each of the pixel regions, the fifth opening The inner diameter is larger than the inner diameter of the second opening, and the surface of the portion of the cathode electrode adjacent to the second opening is exposed; the plurality of annular cathode emitting layers respectively correspond to the second opening of the cathode electrode And disposed at a position where the exposed surface of the cathode electrode is close to the second opening; a focusing electrode is disposed on the surface of the second insulating layer, and a fourth opening and a portion are defined corresponding to each pixel region a five-hole connection; an anode substrate is opposite to the cathode substrate and spaced apart, a vacuum space is defined between the anode substrate and the cathode substrate; an anode electrode is disposed on a surface of the anode substrate opposite to the cathode substrate; The phosphor powder layer is disposed on the surface of the anode electrode and is disposed in one-to-one correspondence with the plurality of ring cathode emission layers.

與先前技術相比,由於所述第一絕緣層設置有一第一開孔,所述陰極電極設置有一第二開孔,所述第一開孔與第二開孔對應設置且相互連通,使所述柵極電極對應該開孔位置的表面暴露,所述 陰極發射層僅設置於所述陰極電極靠近所述第二開孔位置的表面,故,柵極電極的電場可通過陰極電極的第二開孔滲透到陰極發射層表面,以使環形陰極發射層發射電子,從而得到發光均勻的圓形像素點。 Compared with the prior art, since the first insulating layer is provided with a first opening, the cathode electrode is provided with a second opening, and the first opening and the second opening are correspondingly disposed and communicate with each other. The gate electrode is exposed to a surface of the opening position, The cathode emitting layer is disposed only on the surface of the cathode electrode near the second opening position, so that the electric field of the gate electrode can penetrate the surface of the cathode emitting layer through the second opening of the cathode electrode to make the ring cathode emitting layer The electrons are emitted to obtain circular pixels with uniform illumination.

10,20‧‧‧場發射顯示器 10,20‧‧‧ field emission display

100,200‧‧‧場發射陰極裝置 100,200‧‧‧ field emission cathode device

102,202‧‧‧陽極基板 102,202‧‧‧Anode substrate

104,204‧‧‧陰極基板 104,204‧‧‧Cathode substrate

106,206‧‧‧真空空間 106,206‧‧‧vacuum space

108,208‧‧‧柵極電極 108,208‧‧‧gate electrode

110,210‧‧‧第一絕緣層 110,210‧‧‧first insulation

1102,2102‧‧‧第一開孔 1102, 2102‧‧‧ first opening

112,212‧‧‧陰極電極 112,212‧‧‧Cathode electrode

1122,2122‧‧‧第二開孔 1122, 2122‧‧‧ second opening

114,214‧‧‧第二絕緣層 114,214‧‧‧Second insulation

1142‧‧‧第五開孔 1142‧‧‧5th opening

116,216‧‧‧陰極發射層 116,216‧‧‧ cathode emission layer

1162‧‧‧第三開孔 1162‧‧‧3rd opening

118,218‧‧‧聚焦電極 118,218‧‧‧focus electrode

1182,2182‧‧‧第四開孔 1182, 2182‧‧‧ fourth opening

120,220‧‧‧陽極電極 120,220‧‧‧Anode electrode

122,222‧‧‧螢光粉層 122, 222‧‧‧Fluorescent powder layer

124‧‧‧電子束 124‧‧‧Electron beam

126‧‧‧二次電子發射層 126‧‧‧ secondary electron emission layer

2104‧‧‧第七開孔 2104‧‧‧ seventh opening

2124‧‧‧第六開孔 2124‧‧‧6th opening

2126‧‧‧第二部分 2126‧‧‧Part II

2127‧‧‧連接部 2127‧‧‧Connecting Department

2128‧‧‧第一部分 2128‧‧‧Part 1

30‧‧‧場發射顯示器 30‧‧‧ Field emission display

302‧‧‧上基板 302‧‧‧Upper substrate

304‧‧‧下基板 304‧‧‧lower substrate

306‧‧‧真空空間 306‧‧‧vacuum space

308‧‧‧柵極層 308‧‧‧Gate layer

310‧‧‧隔離層 310‧‧‧Isolation

312‧‧‧陰極層 312‧‧‧ cathode layer

316‧‧‧電子發射層 316‧‧‧electron emission layer

320‧‧‧陽極層 320‧‧‧anode layer

322‧‧‧螢光層 322‧‧‧Fluorescent layer

324‧‧‧電子 324‧‧‧Electronics

圖1為本發明第一實施例提供的場發射顯示器的像素單元的結構示意圖。 FIG. 1 is a schematic structural diagram of a pixel unit of a field emission display according to a first embodiment of the present invention.

圖2為本發明第一實施例提供的場發射顯示器的陰極發射層與陰極電極的位置關係示意圖。 2 is a schematic diagram showing the positional relationship between a cathode emission layer and a cathode electrode of a field emission display according to a first embodiment of the present invention.

圖3為本發明第一實施例提供的場發射顯示器的立體結構示意圖。 FIG. 3 is a schematic perspective structural view of a field emission display according to a first embodiment of the present invention.

圖4為本發明第一實施例提供的場發射顯示器的顯示效果示意圖。 FIG. 4 is a schematic diagram showing the display effect of the field emission display according to the first embodiment of the present invention.

圖5為本發明第二實施例提供的場發射顯示器的像素單元的結構示意圖。 FIG. 5 is a schematic structural diagram of a pixel unit of a field emission display according to a second embodiment of the present invention.

圖6至8為本發明第二實施例提供的場發射顯示器的陰極電極的結構示意圖。 6 to 8 are schematic structural views of a cathode electrode of a field emission display according to a second embodiment of the present invention.

圖9為先前技術中的場發射顯示器的結構示意圖。 9 is a schematic structural view of a field emission display in the prior art.

圖10為先前技術中的場發射顯示器的顯示效果示意圖。 Fig. 10 is a view showing the display effect of the field emission display in the prior art.

以下將結合附圖詳細說明本發明實施例提供的場發射陰極裝置及 場發射顯示器。所述場發射顯示器可包括一個或複數個像素單元。以下先以一個像素單元為例進行說明,再介紹採用複數個像素單元的場發射顯示器。 The field emission cathode device provided by the embodiment of the present invention will be described in detail below with reference to the accompanying drawings. Field emission display. The field emission display can include one or a plurality of pixel units. The following takes a pixel unit as an example for description, and then introduces a field emission display using a plurality of pixel units.

請參閱圖1,本發明第一實施例提供一種場發射顯示器10,其包括一陰極基板104,一柵極電極108,一第一絕緣層110,一陰極電極112,一陰極發射層116,一聚焦電極118,一陽極基板102,一陽極電極120,以及一螢光粉層122。其中,所述陰極基板104,柵極電極108,第一絕緣層110,陰極電極112,陰極發射層116,聚焦電極118構成該場發射顯示器10的場發射陰極裝置100。 Referring to FIG. 1 , a first embodiment of the present invention provides a field emission display 10 including a cathode substrate 104 , a gate electrode 108 , a first insulating layer 110 , a cathode electrode 112 , and a cathode emitting layer 116 . The focusing electrode 118, an anode substrate 102, an anode electrode 120, and a phosphor layer 122. The cathode substrate 104, the gate electrode 108, the first insulating layer 110, the cathode electrode 112, the cathode emission layer 116, and the focusing electrode 118 constitute the field emission cathode device 100 of the field emission display 10.

所述陽極基板102與所述陰極基板104相對且間隔設置。所述陽極基板102與陰極基板104之間定義一真空空間106以收容所述柵極電極108,第一絕緣層110,陰極電極112,陰極發射層116,聚焦電極118,陽極電極120,和螢光粉層122。所述柵極電極108設置於陰極基板104相對於陽極基板102的一表面。所述第一絕緣層110設置於所述柵極電極108遠離陰極基板104的一表面,且該第一絕緣層110定義一第一開孔1102,以使柵極電極108在對應所述第一開孔1102的位置暴露,並面對所述陽極基板102設置。所述陰極電極112設置於所述第一絕緣層110遠離所述陰極基板104的一表面,並通過所述第一絕緣層110與所述柵極電極108間隔設置,且該陰極電極112定義一與所述第一開孔1102連通的第二開孔1122。所述陰極發射層116設置於陰極電極112遠離所述陰極基板104的一表面,且與陰極電極112電連接。優選地,所述陰極發射層116僅設置於所述陰極電極112表面靠近第二開孔1122的位置。 The anode substrate 102 is opposed to the cathode substrate 104 and spaced apart from each other. A vacuum space 106 is defined between the anode substrate 102 and the cathode substrate 104 to receive the gate electrode 108, the first insulating layer 110, the cathode electrode 112, the cathode emission layer 116, the focusing electrode 118, the anode electrode 120, and the fluorescent Light powder layer 122. The gate electrode 108 is disposed on a surface of the cathode substrate 104 relative to the anode substrate 102. The first insulating layer 110 is disposed on a surface of the gate electrode 108 away from the cathode substrate 104, and the first insulating layer 110 defines a first opening 1102, so that the gate electrode 108 corresponds to the first The position of the opening 1102 is exposed and disposed facing the anode substrate 102. The cathode electrode 112 is disposed on a surface of the first insulating layer 110 away from the cathode substrate 104, and is spaced apart from the gate electrode 108 by the first insulating layer 110, and the cathode electrode 112 defines a a second opening 1122 that communicates with the first opening 1102. The cathode emission layer 116 is disposed on a surface of the cathode electrode 112 away from the cathode substrate 104 and is electrically connected to the cathode electrode 112. Preferably, the cathode emission layer 116 is disposed only at a position where the surface of the cathode electrode 112 is close to the second opening 1122.

所述陰極發射層116定義一與第二開孔1122連通的第三開孔1162。所述陽極電極120設置於所述陽極基板102相對於陰極基板104的表面。所述螢光粉層122設置於陽極電極120表面。所述聚焦電極118設置於陰極電極112與陽極電極120之間,且定義一第四開孔1182,以使部分陰極電極112與陰極發射層116暴露。 The cathode emission layer 116 defines a third opening 1162 that communicates with the second opening 1122. The anode electrode 120 is disposed on a surface of the anode substrate 102 with respect to the cathode substrate 104. The phosphor layer 122 is disposed on the surface of the anode electrode 120. The focusing electrode 118 is disposed between the cathode electrode 112 and the anode electrode 120, and defines a fourth opening 1182 to expose a portion of the cathode electrode 112 and the cathode emission layer 116.

所述陰極基板104的材料可為矽、玻璃、陶瓷、塑膠或聚合物。所述陰極基板104的形狀與厚度不限,可根據實際需要選擇。優選地,所述陰極基板104的形狀為正方形或矩形。本實施例中,所述陰極基板104為一正方形玻璃板。 The material of the cathode substrate 104 may be tantalum, glass, ceramic, plastic or polymer. The shape and thickness of the cathode substrate 104 are not limited, and may be selected according to actual needs. Preferably, the shape of the cathode substrate 104 is square or rectangular. In this embodiment, the cathode substrate 104 is a square glass plate.

所述柵極電極108為一導電層,且其厚度和大小可根據實際需要選擇。所述柵極電極108可僅設置於陰極基板104通過第一開孔1102暴露的表面,也可延伸至第一絕緣層110與陰極基板104之間。所述柵極電極108與第一開孔1102對應的位置還可具有一突起結構(圖未示),以降低開啟電壓。所述柵極電極108的材料可為單質金屬、金屬合金、氧化銦錫或導電漿料等。可理解,當陰極基板104為矽片時,該柵極電極108可為一矽摻雜層。本實施例中,所述柵極電極108為一厚度為20微米的鋁膜。該鋁膜通過磁控濺射法沈積於陰極基板104表面。 The gate electrode 108 is a conductive layer, and its thickness and size can be selected according to actual needs. The gate electrode 108 may be disposed only on a surface of the cathode substrate 104 exposed through the first opening 1102 or may extend between the first insulating layer 110 and the cathode substrate 104. The position of the gate electrode 108 corresponding to the first opening 1102 may also have a protruding structure (not shown) to lower the turn-on voltage. The material of the gate electrode 108 may be an elemental metal, a metal alloy, indium tin oxide or a conductive paste or the like. It can be understood that when the cathode substrate 104 is a ruthenium, the gate electrode 108 can be an erbium doped layer. In this embodiment, the gate electrode 108 is an aluminum film having a thickness of 20 micrometers. The aluminum film is deposited on the surface of the cathode substrate 104 by magnetron sputtering.

所述第一絕緣層110設置於所述陰極電極112與柵極電極108之間,用於使所述陰極電極112與柵極電極108之間電性絕緣。所述第一絕緣層110的材料可為樹脂、厚膜曝光膠、玻璃、陶瓷、絕緣氧化物或上述材料的混合物等。所述絕緣氧化物包括二氧化矽、三氧化二鋁或氧化鉍等,所述第一絕緣層110的厚度和形狀可根 據實際需要選擇。所述第一絕緣層110可直接設置於陰極基板104表面,也可設置於柵極電極108表面。所述第一絕緣層110為一具有通孔的層狀結構,且該通孔定義為所述第一開孔1102。可理解,如果第一絕緣層110沒有開孔,而陰極電極112具有開孔時,所述陰極發射層116發射的向柵極電極108方向運動的少數電子會在第一絕緣層110表面積累,從而影響柵極電極108的電場分佈。而所述第一開孔1102可使陰極發射層116發射的向柵極電極108方向運動的少數電子達到柵極電極108,並通過柵極電極108導走。本實施例中,所述第一絕緣層110為一厚度為100微米的光刻膠設置於玻璃板表面,且其定義有一圓形通孔作為第一開孔1102。所述柵極電極108設置於所述第一絕緣層110與陰極基板104並將第一開孔1102覆蓋。 The first insulating layer 110 is disposed between the cathode electrode 112 and the gate electrode 108 for electrically insulating the cathode electrode 112 from the gate electrode 108. The material of the first insulating layer 110 may be a resin, a thick film exposure glue, glass, ceramic, an insulating oxide or a mixture of the above materials, or the like. The insulating oxide includes cerium oxide, aluminum oxide or cerium oxide, and the like, and the thickness and shape of the first insulating layer 110 may be According to actual needs. The first insulating layer 110 may be disposed directly on the surface of the cathode substrate 104 or on the surface of the gate electrode 108. The first insulating layer 110 is a layered structure having a through hole, and the through hole is defined as the first opening 1102. It can be understood that if the first insulating layer 110 has no opening and the cathode electrode 112 has an opening, a small amount of electrons emitted by the cathode emitting layer 116 in the direction of the gate electrode 108 may accumulate on the surface of the first insulating layer 110. Thereby, the electric field distribution of the gate electrode 108 is affected. The first opening 1102 can cause a small amount of electrons emitted by the cathode emission layer 116 to move toward the gate electrode 108 to reach the gate electrode 108 and be guided away by the gate electrode 108. In this embodiment, the first insulating layer 110 is a photoresist having a thickness of 100 micrometers disposed on the surface of the glass plate, and defines a circular through hole as the first opening 1102. The gate electrode 108 is disposed on the first insulating layer 110 and the cathode substrate 104 and covers the first opening 1102.

所述陰極電極112設置於第一絕緣層110遠離陰極基板104的表面。所述陰極電極112為一導電層,其材料可為單質金屬、金屬合金、氧化銦錫(ITO)或導電漿料等。所述陰極電極112的厚度和大小可根據實際需要選擇。具體地,所述陰極電極112可為一具有通孔的層狀結構,且該通孔定義所述第二開孔1122。所述第二開孔1122與第一開孔1102對應設置且相互連通。優選地,所述第二開孔1122與第一開孔1102同軸設置且具有相同的孔徑。由於所述陰極電極112具有第二開孔1122,故,所述柵極電極108產生的電場可通過第一開孔1102和第二開孔1122滲透到陰極發射層116表面,並使陰極發射層116發射電子。本實施例中,所述陰極電極112為一鋁導電層,且具有一圓形通孔作為第二開孔1122。 The cathode electrode 112 is disposed on a surface of the first insulating layer 110 away from the cathode substrate 104. The cathode electrode 112 is a conductive layer, and the material thereof may be an elemental metal, a metal alloy, indium tin oxide (ITO) or a conductive paste. The thickness and size of the cathode electrode 112 can be selected according to actual needs. Specifically, the cathode electrode 112 may be a layered structure having a through hole, and the through hole defines the second opening 1122. The second opening 1122 is disposed corresponding to the first opening 1102 and communicates with each other. Preferably, the second opening 1122 is coaxially disposed with the first opening 1102 and has the same aperture. Since the cathode electrode 112 has the second opening 1122, the electric field generated by the gate electrode 108 can penetrate the surface of the cathode emission layer 116 through the first opening 1102 and the second opening 1122, and the cathode emission layer 116 emits electrons. In this embodiment, the cathode electrode 112 is an aluminum conductive layer and has a circular through hole as the second opening 1122.

請進一步參見圖2,所述陰極發射層116僅設置於所述陰極電極112靠近第二開孔1122位置的表面,且所述陰極發射層116為一環形結構,其定義一第三開孔1162。所述陰極發射層116僅設置於陰極電極112面對陽極電極120且通過第四開孔1182暴露的表面。所述陰極發射層116可設置於陰極電極112通過第四開孔1182暴露的部分表面或暴露的全部表面。優選地,所述陰極發射層116為一圓環形。所述第三開孔1162與上述第二開孔1122與第一開孔1102對應設置且相互連通,優選地,所述第三開孔1162與上述第二開孔1122以及第一開孔1102的孔徑相同,即第三開孔1162的孔壁與上述第二開孔1122以及第一開孔1102的孔壁平齊。可理解,由於陰極發射層116靠近第二開孔1122設置,故,柵極電極108產生的電場可通過第二開孔1122滲透到陰極發射層116的整個表面,從而使得整個陰極發射層116發射電子。 Referring to FIG. 2, the cathode emission layer 116 is disposed only on the surface of the cathode electrode 112 near the second opening 1122, and the cathode emission layer 116 is an annular structure defining a third opening 1162. . The cathode emission layer 116 is disposed only on a surface of the cathode electrode 112 that faces the anode electrode 120 and is exposed through the fourth opening 1182. The cathode emission layer 116 may be disposed on a portion of the surface or exposed surface of the cathode electrode 112 exposed through the fourth opening 1182. Preferably, the cathode emission layer 116 is a circular ring. The third opening 1162 and the second opening 1122 are corresponding to the first opening 1102 and communicate with each other. Preferably, the third opening 1162 and the second opening 1122 and the first opening 1102 are The hole diameter is the same, that is, the hole wall of the third opening 1162 is flush with the hole wall of the second opening 1122 and the first opening 1102. It can be understood that since the cathode emission layer 116 is disposed close to the second opening 1122, the electric field generated by the gate electrode 108 can penetrate through the second opening 1122 to the entire surface of the cathode emission layer 116, so that the entire cathode emission layer 116 is emitted. electronic.

所述陰極發射層116包括複數個電子發射體,如奈米碳管、奈米碳纖維、或矽奈米線等。進一步,所述陰極發射層116的表面可進一步設置一層抗離子轟擊材料以提高其穩定性和壽命。所述抗離子轟擊材料可選擇為碳化鋯、碳化鉿及六硼化鑭等中的一種或複數種。本實施例中,所述陰極發射層116為一環形奈米碳管漿料層。所述奈米碳管漿料包括奈米碳管、低熔點玻璃粉以及有機載體。其中,有機載體在烘烤過程中蒸發,低熔點玻璃粉在烘烤過程中熔化並將奈米碳管固定於陰極電極112表面。 The cathode emission layer 116 includes a plurality of electron emitters such as a carbon nanotube, a carbon fiber, or a nanowire. Further, the surface of the cathode emission layer 116 may further be provided with an anti-ion bombardment material to improve its stability and life. The anti-ion bombardment material may be selected from one or a plurality of zirconium carbide, tantalum carbide, and lanthanum hexaboride. In this embodiment, the cathode emission layer 116 is a circular carbon nanotube slurry layer. The carbon nanotube slurry includes a carbon nanotube, a low melting glass powder, and an organic vehicle. Wherein, the organic carrier evaporates during the baking process, the low-melting glass frit melts during the baking process, and the carbon nanotubes are fixed to the surface of the cathode electrode 112.

所述聚焦電極118可為金屬柵網或導電層。所述聚焦電極118設置於陰極電極112與陽極電極120之間,且定義一第四開孔1182,以 使陰極電極112靠近第二開孔1122的部分表面通過第四開孔1182暴露。所述聚焦電極118可通過一第二絕緣層114與陰極電極112間隔設置並電性絕緣。所述第二絕緣層114的材料與所述第一絕緣層110相同,其厚度和形狀可根據實際需要選擇。所述第二絕緣層114設置於陰極電極112遠離所述陰極基板104的表面。所述第二絕緣層114定義一與第四開孔1182相通的第五開孔1142以使所述部分陰極電極112靠近第二開孔1122的部分表面暴露,從而使得所述陰極發射層116暴露並直接面對所述陽極基板102設置。本實施例中,所述第四開孔1182與第五開孔1142同軸設置且孔徑相同。可理解,當所述聚焦電極118為具有自支撐的金屬柵網時,所述聚焦電極118也可懸空設置於陰極電極112與陽極電極120之間。所述聚焦電極118的材料可為金屬、合金、氧化銦錫(ITO)或導電漿料等。所述聚焦電極118的厚度和大小可根據實際需要選擇。所述聚焦電極118用來彙聚所述陰極發射層116發射的電子。 The focusing electrode 118 can be a metal grid or a conductive layer. The focusing electrode 118 is disposed between the cathode electrode 112 and the anode electrode 120, and defines a fourth opening 1182 to A portion of the surface of the cathode electrode 112 adjacent to the second opening 1122 is exposed through the fourth opening 1182. The focusing electrode 118 may be spaced apart from the cathode electrode 112 by a second insulating layer 114 and electrically insulated. The material of the second insulating layer 114 is the same as that of the first insulating layer 110, and the thickness and shape thereof can be selected according to actual needs. The second insulating layer 114 is disposed on a surface of the cathode electrode 112 away from the cathode substrate 104. The second insulating layer 114 defines a fifth opening 1142 communicating with the fourth opening 1182 to expose a portion of the surface of the portion of the cathode electrode 112 adjacent to the second opening 1122, thereby exposing the cathode emitting layer 116. And directly facing the anode substrate 102. In this embodiment, the fourth opening 1182 is coaxial with the fifth opening 1142 and has the same aperture. It can be understood that when the focusing electrode 118 is a self-supporting metal grid, the focusing electrode 118 can also be suspended between the cathode electrode 112 and the anode electrode 120. The material of the focusing electrode 118 may be a metal, an alloy, indium tin oxide (ITO) or a conductive paste or the like. The thickness and size of the focusing electrode 118 can be selected according to actual needs. The focusing electrode 118 is used to concentrate electrons emitted by the cathode emission layer 116.

所述陽極基板102為一透明基板,其形狀與厚度不限,可根據實際需要選擇。優選地,所述陽極基板102的形狀為正方形或矩形。所述陽極基板102和陰極基板104之間可通過絕緣條(圖未示)縫接以定義所述真空空間106。本實施例中,所述陽極基板102為一正方形玻璃板。 The anode substrate 102 is a transparent substrate, and its shape and thickness are not limited, and may be selected according to actual needs. Preferably, the shape of the anode substrate 102 is square or rectangular. The vacuum substrate 106 may be defined by an insulating strip (not shown) between the anode substrate 102 and the cathode substrate 104. In this embodiment, the anode substrate 102 is a square glass plate.

所述陽極電極120為一透明導電層,如:奈米碳管膜,氧化銦錫薄膜或鋁膜。所述陽極電極120的形狀與厚度不限,可根據實際需要選擇。本實施例中,所述陽極電極120為一厚度100微米的氧 化銦錫薄膜。 The anode electrode 120 is a transparent conductive layer such as a carbon nanotube film, an indium tin oxide film or an aluminum film. The shape and thickness of the anode electrode 120 are not limited, and may be selected according to actual needs. In this embodiment, the anode electrode 120 is an oxygen having a thickness of 100 micrometers. Indium tin film.

所述螢光粉層122可設置於陽極電極120遠離陽極基板102的表面或設置於陽極電極120與陽極基板102之間。所述螢光粉層122的形狀與厚度不限,可根據實際需要選擇。優選地,所述螢光粉層122的形狀為圓形,且其半徑大於等於所述陰極發射層116的內半徑小於等於所述陰極發射層116的外半徑。本實施例中,所述螢光粉層122為圓形,且其半徑等於所述陰極發射層116的外半徑。 The phosphor layer 122 may be disposed on a surface of the anode electrode 120 away from the anode substrate 102 or between the anode electrode 120 and the anode substrate 102. The shape and thickness of the phosphor layer 122 are not limited, and may be selected according to actual needs. Preferably, the phosphor layer 122 has a circular shape and a radius greater than or equal to an inner radius of the cathode emission layer 116 that is less than or equal to an outer radius of the cathode emission layer 116. In this embodiment, the phosphor layer 122 is circular and has a radius equal to an outer radius of the cathode emission layer 116.

所述場發射顯示器10工作時,所述陰極電極112接零電位(接地),所述柵極電極108施加一正電壓V1,所述陽極電極120施加一正電壓V2,所述聚焦電極118施加一負電壓V3。所述柵極電極108的工作電壓V1為10伏特~100伏特,所述陽極電極120的工作電壓V2為500伏特~5000伏特,所述聚焦電極118的工作電壓V3為負5伏特~負50伏特。所述柵極電極108產生的電場可通過第二開孔1122滲透到陰極發射層116表面,並使陰極發射層116發射電子。所述電子在陽極電極120的電場力作用下射向陽極電極120並形成電子束124。由於所述聚焦電極118施加一負電壓,該負電壓對電子具有排斥作用,從而起到彙聚電子束124的作用。 When the field emission display 10 is in operation, the cathode electrode 112 is connected to a zero potential (ground), the gate electrode 108 is applied with a positive voltage V1, the anode electrode 120 is applied with a positive voltage V2, and the focusing electrode 118 is applied. A negative voltage V3. The operating voltage V1 of the gate electrode 108 is 10 volts to 100 volts, the operating voltage V2 of the anode electrode 120 is 500 volts to 5000 volts, and the operating voltage V3 of the focusing electrode 118 is negative 5 volts to minus 50 volts. . The electric field generated by the gate electrode 108 can penetrate the surface of the cathode emission layer 116 through the second opening 1122, and cause the cathode emission layer 116 to emit electrons. The electrons are directed toward the anode electrode 120 under the electric field force of the anode electrode 120 and form an electron beam 124. Since the focus electrode 118 applies a negative voltage, the negative voltage has a repulsive effect on the electrons, thereby functioning to concentrate the electron beam 124.

進一步,所述場發射顯示器10還可包括一二次電子發射層126以提高場發射陰極裝置100的電子發射效率。所述二次電子發射層126設置於第一開孔1102內的柵極電極108表面。所述二次電子發射層126的材料包括氧化鎂(MgO)、氧化鈹(BeO)、氟化鎂(MgF2)、氟化鈹(BeF2)、氧化銫(CsO)以及氧化鋇(BaO)中的一種或幾種,其厚度和大小可根據實際需要選擇。所述二次電 子發射層126可通過塗敷、電子束蒸發、熱蒸發或磁控濺射等方法形成於柵極電極108的表面。可理解,所述二次電子發射層126的表面還可形成有凹凸結構以增加二次電子發射層126的面積,可提高二次電子發射效率。本實施例中,所述二次電子發射層126為一厚度為約5微米的氧化鋇層。 Further, the field emission display 10 may further include a secondary electron emission layer 126 to increase the electron emission efficiency of the field emission cathode device 100. The secondary electron emission layer 126 is disposed on the surface of the gate electrode 108 in the first opening 1102. The material of the secondary electron emission layer 126 includes magnesium oxide (MgO), beryllium oxide (BeO), magnesium fluoride (MgF 2 ), beryllium fluoride (BeF 2 ), antimony oxide (CsO), and barium oxide (BaO). One or several of them, the thickness and size can be selected according to actual needs. The secondary electron emission layer 126 may be formed on the surface of the gate electrode 108 by coating, electron beam evaporation, thermal evaporation, or magnetron sputtering. It is understood that the surface of the secondary electron emission layer 126 may also be formed with a concavo-convex structure to increase the area of the secondary electron emission layer 126, and the secondary electron emission efficiency may be improved. In this embodiment, the secondary electron emission layer 126 is a ruthenium oxide layer having a thickness of about 5 μm.

請進一步參閱圖3,本發明第一實施例進一步介紹包括多像素單元的場發射顯示器10的實現方式。具體地,所述場發射顯示器10包括一共用的陰極基板104,複數個條形柵極電極108,一共用的第一絕緣層110,複數個條形陰極電極112,複數個圓環形陰極發射層116,一共用的聚焦電極118,一共用的陽極基板102,一共用的陽極電極120,以及複數個圓形螢光粉層122。 With further reference to FIG. 3, a first embodiment of the present invention further describes an implementation of a field emission display 10 that includes a multi-pixel unit. Specifically, the field emission display 10 includes a common cathode substrate 104, a plurality of strip gate electrodes 108, a common first insulating layer 110, a plurality of strip cathode electrodes 112, and a plurality of circular cathode emitters. Layer 116, a common focusing electrode 118, a common anode substrate 102, a common anode electrode 120, and a plurality of circular phosphor layers 122.

所述複數個條形柵極電極108平行且等間隔設置於所述陰極基板104的表面。所述複數個條形陰極電極112平行且等間隔設置,且該複數個條形陰極電極112與複數個條形柵極電極108異面垂直且交叉設置。所述柵極電極108與陰極電極112的交叉區域定義一像素區域。所述陰極電極112與像素區域相對應處定義一第二開孔1122。所述第一絕緣層110設置於所述複數個柵極電極108與所述複數個陰極電極112之間,且該第一絕緣層110與像素區域相對應處定義複數個第一開孔1102。可理解,所述第一絕緣層110也可為複數個間隔設置的絕緣條,優選地,絕緣條的形狀與條形柵極電極108或條形陰極電極112的形狀相同。所述第一開孔1102與第二開孔1122對應且相通設置,以使柵極電極108暴露。所述第二絕緣層114設置於所述複數個條形陰極電極112表面,且與像素區 域一一對應定義複數個第五開孔1142,以使陰極發射層116部分暴露。可理解,所述第二絕緣層114也可為複數個間隔設置的絕緣條,優選地,絕緣條的形狀與條形陰極電極112的形狀相同。所述複數個圓環形陰極發射層116與像素區域一一對應設置,且每個圓環形陰極發射層116設置於陰極電極112通過第五開孔1142暴露的表面。所述圓環形陰極發射層116的第三開孔1162與第二開孔1122對應且相通設置。所述聚焦電極118設置於第二絕緣層114表面,且定義複數個與第五開孔1142對應的第四開孔1182。所述聚焦電極118可為一具有複數個第四開孔1182整體導電層,或複數個間隔設置且具有第四開孔1182的導電條。所述陽極電極120為一設置於陽極基板102表面的一整層透明導電層。所述複數個圓形形螢光粉層122設置於陽極電極120表面,且與像素區域一一對應設置或與陰極發射層116一一對應設置。進一步,所述複數個圓形形螢光粉層122之間還可設置黑色矩陣以提高場發射顯示器10的對比度。 The plurality of strip gate electrodes 108 are disposed in parallel and equally spaced on the surface of the cathode substrate 104. The plurality of strip-shaped cathode electrodes 112 are disposed in parallel and at equal intervals, and the plurality of strip-shaped cathode electrodes 112 are disposed perpendicular to and perpendicular to the plurality of strip-shaped gate electrodes 108. The intersection area of the gate electrode 108 and the cathode electrode 112 defines a pixel area. The cathode electrode 112 defines a second opening 1122 corresponding to the pixel area. The first insulating layer 110 is disposed between the plurality of gate electrodes 108 and the plurality of cathode electrodes 112, and the first insulating layer 110 defines a plurality of first openings 1102 corresponding to the pixel regions. It can be understood that the first insulating layer 110 can also be a plurality of spaced apart insulating strips. Preferably, the insulating strips have the same shape as the strip gate electrodes 108 or the strip cathode electrodes 112. The first opening 1102 is corresponding to and in communication with the second opening 1122 to expose the gate electrode 108. The second insulating layer 114 is disposed on the surface of the plurality of strip cathode electrodes 112, and the pixel region The fields correspond one-to-one to define a plurality of fifth openings 1142 to partially expose the cathode emission layer 116. It can be understood that the second insulating layer 114 can also be a plurality of spaced apart insulating strips. Preferably, the insulating strips have the same shape as the strip-shaped cathode electrodes 112. The plurality of annular cathode emitting layers 116 are disposed in one-to-one correspondence with the pixel regions, and each of the annular cathode emitting layers 116 is disposed on a surface of the cathode electrode 112 exposed through the fifth opening 1142. The third opening 1162 of the annular cathode emitting layer 116 is corresponding to and in communication with the second opening 1122. The focusing electrode 118 is disposed on the surface of the second insulating layer 114 and defines a plurality of fourth openings 1182 corresponding to the fifth opening 1142. The focusing electrode 118 can be an integral conductive layer having a plurality of fourth openings 1182, or a plurality of conductive strips disposed at intervals and having a fourth opening 1182. The anode electrode 120 is an entire transparent conductive layer disposed on the surface of the anode substrate 102. The plurality of circular shaped phosphor layers 122 are disposed on the surface of the anode electrode 120 and are disposed in one-to-one correspondence with the pixel regions or in one-to-one correspondence with the cathode emission layer 116. Further, a black matrix may be disposed between the plurality of circular shaped phosphor layers 122 to increase the contrast of the field emission display 10.

請參閱圖4,為本發明第二實施例的場發射顯示器10的顯示效果。本發明實施例採用圓環形陰極發射層116,可得到發光均勻的圓形像素點。 Please refer to FIG. 4, which shows the display effect of the field emission display 10 of the second embodiment of the present invention. In the embodiment of the invention, a circular cathode emitting layer 116 is used, and circular pixels with uniform illumination can be obtained.

請參閱圖5,本發明第二實施例提供一種場發射顯示器20,其包括一陰極基板204,一柵極電極208,一第一絕緣層210,一陰極電極212,一陰極發射層216,一第二絕緣層214,一聚焦電極218,一陽極基板202,一陽極電極220,以及一螢光粉層222。其中,所述陰極基板204,柵極電極208,第一絕緣層210,陰極電極 212,陰極發射層216,聚焦電極218構成該場發射顯示器20的場發射陰極裝置200。本發明第二實施例提供的場發射顯示器20與本發明第一實施例提供一種場發射顯示器10的結構基本相同,其區別在於所述陰極電極212進一步定義一個或複數個環繞第二開孔2122的第六開孔2124。 Referring to FIG. 5, a second embodiment of the present invention provides a field emission display 20 including a cathode substrate 204, a gate electrode 208, a first insulating layer 210, a cathode electrode 212, and a cathode emitting layer 216. The second insulating layer 214, a focusing electrode 218, an anode substrate 202, an anode electrode 220, and a phosphor layer 222. Wherein, the cathode substrate 204, the gate electrode 208, the first insulating layer 210, and the cathode electrode 212, cathode emission layer 216, focusing electrode 218 constitute field emission cathode device 200 of field emission display 20. The field emission display 20 provided by the second embodiment of the present invention is substantially the same as the first embodiment of the present invention. The difference is that the cathode electrode 212 further defines one or more surrounding second openings 2122. The sixth opening 2124.

請進一步參閱圖6至8,所述第六開孔2124將第二開孔2122基本環繞。所述第六開孔2124將所述陰極電極212分成間隔設置的一第一部分2128和一第二部分2126。所述第一部分2128設置於第二絕緣層214與第一絕緣層210之間。所述第二部分2126設置於陰極發射層216與第一絕緣層210之間。所述陰極發射層216僅設置於第二部分2126表面。所述第二開孔2122由第二部分2126定義。所述第一部分2128和第二部分2126之間通過至少一連接部2127連接,以實現電導通。所述第六開孔2124的形狀不限,可根據第二開孔2122的形狀選擇。當第二開孔2122為圓形時,所述第六開孔2124可為一如圖6所示的環形開孔、兩個如圖7所示的半環形開孔、或複數個如圖8所示的弧形開孔。可理解,當第二開孔2122為方形時,所述第六開孔2124可為與方形第二開孔2122的四邊平行的長條形開孔。本實施例中,所述第二開孔2122為圓形,所述第六開孔2124為四個圍繞第二開孔2122的弧形開孔,且相鄰兩個第六開孔2124之間的部分為連接部2127。所述第六開孔2124的內徑大於等於所述陰極發射層216的外徑,所述第六開孔2124的外徑小於等於所述第四開孔2182的孔徑。優選地,所述第六開孔2124的內徑等於所述陰極發射層216的外徑,所述第六開孔2124的外徑等 於所述第四開孔2182的孔徑。可理解,所述第六開孔2124可使得柵極電極208的電場從第六開孔2124滲透到所述陰極發射層216的表面,從而提高陰極發射層216的電子發射效率。 With further reference to FIGS. 6-8, the sixth opening 2124 substantially surrounds the second opening 2122. The sixth opening 2124 divides the cathode electrode 212 into a first portion 2128 and a second portion 2126 which are disposed at intervals. The first portion 2128 is disposed between the second insulating layer 214 and the first insulating layer 210. The second portion 2126 is disposed between the cathode emission layer 216 and the first insulating layer 210. The cathode emission layer 216 is disposed only on the surface of the second portion 2126. The second opening 2122 is defined by the second portion 2126. The first portion 2128 and the second portion 2126 are connected by at least one connecting portion 2127 to achieve electrical conduction. The shape of the sixth opening 2124 is not limited and may be selected according to the shape of the second opening 2122. When the second opening 2122 is circular, the sixth opening 2124 may be an annular opening as shown in FIG. 6, two semi-annular openings as shown in FIG. 7, or a plurality of FIG. The curved opening shown. It can be understood that when the second opening 2122 is square, the sixth opening 2124 can be an elongated opening parallel to the four sides of the square second opening 2122. In this embodiment, the second opening 2122 is circular, and the sixth opening 2124 is four arc-shaped openings surrounding the second opening 2122, and between the two adjacent sixth openings 2124 The portion is the connection portion 2127. The inner diameter of the sixth opening 2124 is greater than or equal to the outer diameter of the cathode emission layer 216, and the outer diameter of the sixth opening 2124 is less than or equal to the aperture of the fourth opening 2182. Preferably, the inner diameter of the sixth opening 2124 is equal to the outer diameter of the cathode emission layer 216, the outer diameter of the sixth opening 2124, and the like. The aperture of the fourth opening 2182. It can be understood that the sixth opening 2124 can cause the electric field of the gate electrode 208 to penetrate from the sixth opening 2124 to the surface of the cathode emission layer 216, thereby improving the electron emission efficiency of the cathode emission layer 216.

進一步,所述第一絕緣層210還可定義一個或複數個與第六開孔2124對應的第七開孔2104。所述第七開孔2104將第一開孔2102基本環繞。所述柵極電極208對應該第七開孔2104與第六開孔2124的位置的部分表面暴露,從而使得使陰極發射層216發射的向柵極電極208方向運動的少數電子達到柵極電極208,並通過柵極電極208導走。 Further, the first insulating layer 210 may further define one or a plurality of seventh openings 2104 corresponding to the sixth openings 2124. The seventh opening 2104 substantially surrounds the first opening 2102. The gate electrode 208 is exposed to a portion of the surface of the position of the seventh opening 2104 and the sixth opening 2124 such that a small amount of electrons emitted by the cathode emission layer 216 in the direction of the gate electrode 208 reaches the gate electrode 208. And is guided away by the gate electrode 208.

所述場發射顯示器10具有以下優點:第一,所述第一絕緣層設置有一第一開孔,所述陰極電極設置有一第二開孔,所述第一開孔與第二開孔對應設置且相互連通,使所述柵極電極對應該開孔位置的表面暴露,所述陰極發射層僅設置於所述陰極電極靠近所述第二開孔位置的表面,故,柵極電極的電場可通過陰極電極的第二開孔滲透到陰極發射層表面,以使環形陰極發射層發射電子,從而得到發光均勻的圓形像素點。而且陰極發射層發射的向柵極電極電極方向運動的電子可達到柵極電極,並通過柵極電極導走,從而避免在第一絕緣層表面積累電荷,影響柵極電極的電場分佈。第二,通過在第一開孔內的柵極電極表面設置二次電子發射層,可提高場發射陰極裝置的電子發射效率。第三,所述陰極電極定義一個或複數個環繞第二開孔的第六開孔,使得柵極電極的電場從第六開孔滲透到所述陰極發射層的表面,從而提高陰極發射層的電子發射效率。 The field emission display 10 has the following advantages: first, the first insulating layer is provided with a first opening, the cathode electrode is provided with a second opening, and the first opening is corresponding to the second opening And communicating with each other to expose the surface of the gate electrode to the surface of the opening, the cathode emitting layer is disposed only on a surface of the cathode electrode adjacent to the second opening, so that the electric field of the gate electrode can be The second opening of the cathode electrode penetrates into the surface of the cathode emission layer to cause the ring cathode emission layer to emit electrons, thereby obtaining circular pixels having uniform light emission. Moreover, electrons emitted from the cathode emissive layer in the direction of the gate electrode can reach the gate electrode and be guided away by the gate electrode, thereby avoiding accumulation of charges on the surface of the first insulating layer and affecting the electric field distribution of the gate electrode. Second, by providing a secondary electron emission layer on the surface of the gate electrode in the first opening, the electron emission efficiency of the field emission cathode device can be improved. Third, the cathode electrode defines one or a plurality of sixth openings surrounding the second opening such that an electric field of the gate electrode penetrates from the sixth opening to the surface of the cathode emission layer, thereby improving the cathode emission layer. Electron emission efficiency.

綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施例,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

10‧‧‧場發射顯示器 10‧‧‧ field emission display

100‧‧‧場發射陰極裝置 100‧‧ ‧ field emission cathode device

102‧‧‧陽極基板 102‧‧‧Anode substrate

104‧‧‧陰極基板 104‧‧‧Cathode substrate

106‧‧‧真空空間 106‧‧‧vacuum space

108‧‧‧柵極電極 108‧‧‧Gate electrode

110‧‧‧第一絕緣層 110‧‧‧First insulation

1102‧‧‧第一開孔 1102‧‧‧First opening

112‧‧‧陰極電極 112‧‧‧Cathode electrode

1122‧‧‧第二開孔 1122‧‧‧Second opening

114‧‧‧第二絕緣層 114‧‧‧Second insulation

1142‧‧‧第五開孔 1142‧‧‧5th opening

116‧‧‧陰極發射層 116‧‧‧ Cathode emission layer

1162‧‧‧第三開孔 1162‧‧‧3rd opening

118‧‧‧聚焦電極 118‧‧‧Focus electrode

1182‧‧‧第四開孔 1182‧‧‧4th opening

120‧‧‧陽極電極 120‧‧‧Anode electrode

122‧‧‧螢光粉層 122‧‧‧Fluorescent powder layer

124‧‧‧電子束 124‧‧‧Electron beam

126‧‧‧二次電子發射層 126‧‧‧ secondary electron emission layer

Claims (12)

一種場發射陰極裝置,包括:一陰極基板;一柵極電極設置於該陰極基板的表面;一第一絕緣層設置於所述柵極電極的表面;一陰極電極通過所述第一絕緣層與所述柵極電極間隔設置;以及一陰極發射層設置於所述陰極電極表面,其改良在於:所述第一絕緣層設置有一第一開孔,所述陰極電極設置有一第二開孔,所述第一開孔與第二開孔對應設置且相互連通,使所述柵極電極對應該開孔位置的表面暴露,所述陰極發射層僅設置於所述陰極電極靠近所述第二開孔位置的表面,且所述陰極電極進一步定義一個或複數個環繞該第二開孔的第六開孔。 A field emission cathode device comprising: a cathode substrate; a gate electrode disposed on a surface of the cathode substrate; a first insulating layer disposed on a surface of the gate electrode; and a cathode electrode passing through the first insulating layer The gate electrode is disposed at intervals; and a cathode emission layer is disposed on the surface of the cathode electrode, wherein the first insulating layer is provided with a first opening, and the cathode electrode is provided with a second opening. The first opening is disposed corresponding to the second opening and communicates with each other to expose the surface of the gate electrode to the opening position, and the cathode emission layer is disposed only on the cathode electrode adjacent to the second opening a surface of the location, and the cathode electrode further defines one or a plurality of sixth openings surrounding the second opening. 如請求項第1項所述的場發射陰極裝置,其中,所述陰極發射層為環形,且該陰極發射層定義一第三開孔與所述第二開孔、第一開孔對應設置且相互連通。 The field emission cathode device of claim 1, wherein the cathode emission layer is annular, and the cathode emission layer defines a third opening corresponding to the second opening and the first opening. Connected to each other. 如請求項第2項所述的場發射陰極裝置,其中,所述第一開孔、第二開孔、第三開孔同軸設置且具有相同的內徑。 The field emission cathode device of claim 2, wherein the first opening, the second opening, and the third opening are coaxially disposed and have the same inner diameter. 如請求項第1項所述的場發射陰極裝置,其中,所述第一絕緣層進一步定義有一個或複數個環繞第一開孔的第七開孔,且所述第七開孔與第六開孔對應設置且相互連通。 The field emission cathode device of claim 1, wherein the first insulating layer is further defined with one or a plurality of seventh openings surrounding the first opening, and the seventh opening and the sixth opening The openings are correspondingly arranged and connected to each other. 如請求項第4項所述的場發射陰極裝置,其中,所述第二開孔為圓形,所述第六開孔為一環形開孔、兩個半環形開孔或複數個弧 形開孔。 The field emission cathode device of claim 4, wherein the second opening is circular, and the sixth opening is an annular opening, two semi-annular openings or a plurality of arcs Shape the hole. 如請求項第5項所述的場發射陰極裝置,其中,所述第六開孔的內徑大於等於所述陰極發射層的外徑。 The field emission cathode device of claim 5, wherein the sixth opening has an inner diameter greater than or equal to an outer diameter of the cathode emission layer. 如請求項第4項所述的場發射陰極裝置,其中,進一步包括一聚焦電極與所述陰極電極間隔設置,該聚焦電極定義一第四開孔與上述第二開孔對應設置,該第四開孔的內徑大於所述第六開孔的外徑,使所述柵極電極對應該第七開孔與第六開孔的位置的部分表面暴露。 The field emission cathode device of claim 4, further comprising a focusing electrode spaced apart from the cathode electrode, the focusing electrode defining a fourth opening corresponding to the second opening, the fourth The inner diameter of the opening is larger than the outer diameter of the sixth opening to expose a portion of the surface of the gate electrode corresponding to the position of the seventh opening and the sixth opening. 如請求項第7項所述的場發射陰極裝置,其中,所述陰極電極通過第四開孔部分暴露,所述陰極發射層僅設置於所述陰極電極通過第四開孔暴露的部分表面。 The field emission cathode device of claim 7, wherein the cathode electrode is exposed through the fourth opening portion, and the cathode emission layer is disposed only on a portion of the surface of the cathode electrode exposed through the fourth opening. 如請求項第1項所述的場發射陰極裝置,其中,進一步包括一二次電子發射層設置於所述第一開孔內的柵極電極表面。 The field emission cathode device of claim 1, further comprising a secondary electron emission layer disposed on the surface of the gate electrode in the first opening. 一種場發射顯示器,其包括:一陰極基板;複數個柵極電極相互平行且間隔設置於該陰極基板的一表面;複數個陰極電極相互平行且間隔設置,該複數個陰極電極與複數個柵極電極異面交叉設置,所述柵極電極與陰極電極的交叉區域定義一像素區域,且所述陰極電極與每個像素區域相對應處定義一第二開孔,所述陰極電極進一步定義一個或複數個環繞該第二開孔的第六開孔;一第一絕緣層設置於所述複數個柵極電極與複數個陰極電極之間,且該第一絕緣層與每個像素區域相對應處定義一第一開孔與第二開孔連通,所述柵極電極對應所述第一開孔與第二開孔位置的 表面暴露;一第二絕緣層設置於所述複數個陰極電極表面,且與每個像素區域相對應處定義一第五開孔,該第五開孔的內徑大於所述第二開孔的內徑,使陰極電極靠近第二開孔位置的部分表面暴露;複數個環形陰極發射層分別與所述陰極電極的第二開孔對應設置,且設置於所述陰極電極暴露的表面靠近第二開孔的位置;一聚焦電極設置於所述第二絕緣層表面,且與每個像素區域相對應處定義一第四開孔與第五開孔連通;一陽極基板與所述陰極基板相對且間隔設置,所述陽極基板與陰極基板之間定義一真空空間;一陽極電極設置於所述陽極基板與陰極基板相對的表面;以及複數個螢光粉層設置於陽極電極表面,且與複數個環形陰極發射層一一對應設置。 A field emission display comprising: a cathode substrate; a plurality of gate electrodes are parallel to each other and spaced apart from a surface of the cathode substrate; a plurality of cathode electrodes are parallel and spaced apart from each other, the plurality of cathode electrodes and a plurality of gates The electrodes are disposed at opposite sides, the intersection area of the gate electrode and the cathode electrode defines a pixel area, and the cathode electrode defines a second opening corresponding to each pixel area, and the cathode electrode further defines one or a plurality of sixth openings surrounding the second opening; a first insulating layer is disposed between the plurality of gate electrodes and the plurality of cathode electrodes, and the first insulating layer corresponds to each of the pixel regions Defining a first opening in communication with the second opening, the gate electrode corresponding to the first opening and the second opening a second insulating layer is disposed on the surface of the plurality of cathode electrodes, and a fifth opening is defined corresponding to each of the pixel regions, and an inner diameter of the fifth opening is larger than the second opening The inner diameter is exposed to a portion of the surface of the cathode electrode adjacent to the second opening; the plurality of annular cathode emitting layers are respectively disposed corresponding to the second opening of the cathode electrode, and the exposed surface of the cathode electrode is adjacent to the second a position of the opening; a focusing electrode is disposed on the surface of the second insulating layer, and a fourth opening is connected to the fifth opening corresponding to each pixel region; an anode substrate is opposite to the cathode substrate a vacuum space is defined between the anode substrate and the cathode substrate; an anode electrode is disposed on a surface of the anode substrate opposite to the cathode substrate; and a plurality of phosphor layers are disposed on the surface of the anode electrode, and a plurality of The ring cathode emitting layers are arranged one by one. 如請求項第10項所述的場發射顯示器,其中,所述第一絕緣層進一步定義有一個或複數個環繞第一開孔的第七開孔,且所述第七開孔與第六開孔對應設置且相互連通。 The field emission display of claim 10, wherein the first insulating layer is further defined with one or a plurality of seventh openings surrounding the first opening, and the seventh opening and the sixth opening The holes are correspondingly arranged and communicate with each other. 如請求項第11項所述的場發射顯示器,其中,所述第六開孔僅設置於陰極電極通過第五開孔暴露的位置。 The field emission display of claim 11, wherein the sixth opening is disposed only at a position where the cathode electrode is exposed through the fifth opening.
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TW200616000A (en) * 2004-11-12 2006-05-16 Hon Hai Prec Ind Co Ltd Field emission cathode and field emission device using same

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US20050258729A1 (en) * 2004-05-22 2005-11-24 Han In-Taek Field emission display (FED) and method of manufacture thereof
TW200616000A (en) * 2004-11-12 2006-05-16 Hon Hai Prec Ind Co Ltd Field emission cathode and field emission device using same

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