TWI414539B - Photosensitive resin composition and light blocking layer using the same - Google Patents

Abstract

The present invention discloses a photosensitive resin composition which comprises the following components: (A) cardo group resin which comprises repetitive units that are respectively represented by a chemical formula 1; (B) active unsaturated compound; (C) pigment; (D) initiating agent and (E) dissolvent. The invention also discloses a color blocking layer which is prepared by the photosensitive resin, wherein, in a chemical formula 1, each substitutional group is same with the structure which is limited in the description.

Description

Photosensitive resin composition and light blocking layer using the same Field of invention

The present disclosure relates to a photosensitive resin composition comprising a cardo-based resin and a light-blocking layer using the composition.

Background of the invention

A liquid crystal display device includes a lower substrate including a light blocking layer, a color filter, and an ITO pixel electrode; an effective circuit component including a liquid crystal layer, a thin film transistor, and a capacitor layer; An upper substrate of an ITO pixel electrode.

The photointerceptor layer blocks uncontrolled light transmission away from a transparent pixel electrode of a substrate and thus avoids contrast reduction due to light transmission through a thin film transistor. The red, green, and blue light-blocking layers transmit white light of a predetermined wavelength and display color.

The photo-barrier layer is generally produced by a pigment dispersion method. The pigment dispersion method comprises coating a transparent substrate with a colorant-containing photopolymerizable composition, exposing to provide a pattern by thermal curing, and removing the unexposed portion with a solvent.

However, when used as a binder resin, a photosensitive polyimide or phenol-based resin is used in the pigment dispersion method to obtain high heat resistance but reduced sensitivity and an organic solvent as a developing solvent. . A photoresist using a single azide compound has low sensitivity and heat resistance and can be affected by oxygen during exposure.

Further, an acryl-based resin has good heat resistance, shrink resistance, chemical resistance, and the like, but has reduced sensitivity, developing properties, and tight contact properties. Since a large amount of black pigment enamel is included to adjust the optical density of a light-blocking layer, sensitivity, developing properties, and tight contact properties may be significantly deteriorated.

Summary of invention

One aspect of the present invention provides a photosensitive resin composition which has excellent sensitivity, developing properties, tight contact properties, heat resistance, shrink resistance, chemical resistance, and push properties.

Another aspect of the present invention provides a light blocking layer produced using the photosensitive resin composition.

According to an aspect of the present invention, there is provided a photosensitive resin composition comprising (A) a resin mainly comprising a repeating unit represented by the following Chemical Formula 1; (B) a reactive unsaturated compound (C) a pigment; (D) a starter; and (E) a solvent.

In Chemical Formula 1, R ³ and R ⁴ are the same or different and is a substituted or unsubstituted hydrogen, halogen, or with a C1 to C20 alkyl, R ¹ and R ² are the same or different, is hydrogen and Or CH ₂ OCH ₂ CR ⁶ R ⁷ R ⁸ (wherein R ⁶ to R ⁸ are the same or different, hydrogen, or substituted or unsubstituted (meth) acrylate), provided that R ¹ is At least one of R ² is CH ₂ OCH ₂ CR ⁶ R ⁷ R ⁸ (wherein R ⁶ to R ⁸ are the same or different, hydrogen, or substituted or unsubstituted (meth) acrylate, and R At least one of ⁶ to R ⁸ is a substituted or unsubstituted (meth) acrylate), Z ¹ is a single bond, O, CO, SO ₂ , CR ⁹ R ¹⁰ , SiR ¹¹ R ¹² (where R ⁹ to R ¹² are the same or different, and are hydrogen or a substituted or unsubstituted C1 to C20 alkyl group, or at least a linking group represented by the following Chemical Formulas 2-1 to 2-11 In one case, Z ² is an acid anhydride residual group or an acid dianhydride residual group, and m ¹ and m ^{2 are} independently an integer ranging from 0 to 4, and n is an integer of 1 to 1000.

In Chemical Formula 2-5, R ^a is hydrogen, ethyl, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH=CH ₂ , or a phenyl group.

The ruthenium-based resin may have a weight average molecular weight of from 1,000 to 50,000 g/mol.

The ruthenium-based resin may include one end represented by the following Chemical Formula 4 based on at least one of the two terminal ends.

In Chemical Formula 4, Z ³ is at least one of the linking groups represented by the following Chemical Formulas 5-1 to 5-7.

In Chemical Formula 5-1, R ^b and R ^c are the same or different and are a hydrogen, substituted or unsubstituted C1 to C20 alkyl group, an ester group, or an ether group.

In Chemical Formula 5-5, R ^d is O, S, NH, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 alkylamino group, or a C2 to C20 acrylamide group.

The photosensitive resin composition may include 1 to 30% by weight of the ruthenium-based resin (A); 1 to 30% by weight of the reactive unsaturated compound (B); and 1 to 30% by weight of the pigment ( C); 0.01 to 10 wt% of the starter (D); and the difference of the solvent (E).

The photosensitive resin composition may further include an acryl-based resin, and the propylene-based resin may include a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer. The first ethylenically unsaturated monomer is a first ethylenically unsaturated monomer of methacrylic acid, maleic acid, itaconic acid, fumaric acid, or the like; and the second ethylenic The unsaturated monomer is styrene, α-methylstyrene, vinyl toluene, vinylbenzyl methyl ether, methyl methacrylate, ethyl methacrylate, butyl methacrylate, methacrylic acid 2- Hydroxyethyl ester, 2-hydroxybutyl methacrylate, benzyl methacrylate, cyclohexyl methacrylate, phenyl methacrylate, 2-aminoethyl methacrylate, 2-dimethyl methacrylate A second ethylenically unsaturated monomer of a combination of aminoethyl ester, vinyl acetate, vinyl benzoate, glycidyl methacrylate, methacrylonitrile, methacrylamide, or the like.

The acryl-based resin may have a weight average molecular weight of about 3,000 to 40,000 g/mol.

The bismuth-based resin and the acryl-based resin may be included in a weight ratio of 99:1 to 30:70.

The initiator may include a photopolymerization initiator, a radical polymerization initiator, or a combination thereof.

The photosensitive resin composition may include 0.01 to 20 parts by weight of the epoxy compound based on 100 parts by weight of the photosensitive resin composition.

According to another aspect of the present invention, a light blocking layer produced using the photosensitive resin composition is provided.

Hereinafter, other specific examples will be described in detail.

The photosensitive resin composition has excellent sensitivity, developing properties, tight contact properties, heat resistance, shrink resistance, chemical resistance, and push-off properties, and can usually be applied to a light barrier layer, and the like.

Simple illustration

1 is a scanning electron microscope image showing a residue of a photosensitive resin composition according to Example 1; and FIG. 2 is a scanning electron microscope image showing photosensitivity according to Comparative Example 3. a residue of the resin composition; Fig. 3 is a scanning electron microscope image showing the residue of the photosensitive resin composition according to Comparative Example 1; and Fig. 4 is a scanning electron microscope image showing The residue of the photosensitive resin composition according to Example 2; FIG. 5 is a scanning electron microscope image showing the pattern forming property of the photosensitive resin composition according to Example 1; and FIG. 6 is a scanning type An electron micrograph showing the pattern forming property of the photosensitive resin composition according to Comparative Example 3; and FIG. 7 is a scanning electron microscope image showing the pattern of the photosensitive resin composition according to Comparative Example 2. Forming properties; Fig. 8 is an optical micrograph showing the pattern size of the photosensitive resin composition according to Example 2; and Fig. 9 is an optical micrograph showing the Example 2 pattern size of the photosensitive resin composition of Comparative Example; 10 optical microscope picture shows a diagram showing the pattern dimension of Example 4 The photosensitive resin composition according to the comparative embodiment.

Detailed description of the preferred embodiment

Illustrative specific examples of the present disclosure will be described in detail below. However, these specific examples are for illustrative purposes only and do not limit the disclosure.

As used herein, when a specific definition is not provided, the term "substituted" means replacing at least one hydrogen with at least one of: halogen (F, Cl, Br, or I), hydroxyl, C1 to C20 alkoxy, nitro, cyano, amine, imino, azide, methionyl, fluorenyl, fluorenylene, carbonyl, amine carbhydryl, thiol, ester, ether, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C30 aryl group, a C3 to C20 naphthenic group a C3 to C20 cycloalkenyl group, a C3 to C20 cycloalkynyl group, a C2 to C20 heterocycloalkyl group, a C2 to C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, a C3 to C30 heteroaryl group, or the like One combination.

As used herein, when a specific definition is not provided, the term "hetero" may mean one of at least one heteroatom selected from the group consisting of N, O, S, and P in a ring system.

As used herein, when a specific definition is not provided, "(meth)acrylate" means both "acrylate" and "methacrylate", and "(meth)acrylic acid" ((meth)acrylic acid)" means "acrylic acid" and "methacrylic acid".

The photosensitive resin composition according to a specific example includes (A) a monoterpene-based resin, (B) a reactive unsaturated compound, (C) a pigment, (D) a starter, and (E) a Solvent.

Hereinafter, each component will be described in detail.

(A) bismuth-based resin

The base-based resin includes a repeating unit represented by the following Chemical Formula 1.

In Chemical Formula 1, R ³ and R ⁴ are the same or different, and are hydrogen, halogen, or a substituted or unsubstituted C1 to C20 alkyl group, and R ¹ and R ² are the same or different, and are hydrogen. Or CH ₂ OCH ₂ CR ⁶ R ⁷ R ⁸ (wherein R ⁶ to R ⁸ are the same or different, hydrogen, or substituted or unsubstituted (meth) acrylate), provided that R ¹ is At least one of R ² is CH ₂ OCH ₂ CR ⁶ R ⁷ R ⁸ (wherein R ⁶ to R ⁸ are the same or different, hydrogen, or substituted or unsubstituted (meth) acrylate, but Provided that at least one of R ⁶ to R ⁸ is a substituted or unsubstituted (meth) acrylate), Z ¹ is a single bond, O, CO, SO ₂ , CR ⁹ R ¹⁰ , SiR ¹¹ R ¹² (wherein R ⁹ to R ¹² are the same or different, and are hydrogen or a substituted or unsubstituted C1 to C20 alkyl group), or a linking group represented by the following Chemical Formulas 2-1 to 2-11 At least one of the groups, Z ² is an acid anhydride residue group or an acid dianhydride residue group.

In Chemical Formula 2-5, R ^a is hydrogen, ethyl, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH=CH ₂ , or a phenyl group.

The ruthenium-based resin may include one, and each of R ¹ and R ² in Chemical Formula 1 is a substituent represented by the following Chemical Formula 3.

The repeating unit represented by the above Chemical Formula 1 includes at least one of (meth) acrylates, particularly six (meth) acrylates at positions R ¹ and R ² . Since the ruthenium-based resin includes six (meth) acrylates per recoating unit, excellent compatibility, developing properties, sensitivity, tight contact properties, and mechanical strength can be achieved, and when it is When applied to a photosensitive resin composition, it is possible to work at a high temperature due to excellent heat resistance and light resistance.

The ruthenium-based resin may include at least one of the ends represented by the following Chemical Formula 4 based on the two terminal ends.

In Chemical Formula 4, Z ³ is at least one of the linking groups represented by the following Chemical Formulas 5-1 to 5-7.

In Chemical Formula 5-1, R ^b and R ^c are the same or different and are a hydrogen, substituted or unsubstituted C1 to C20 alkyl group, an ester group, or an ether group.

In Chemical Formula 5-5, R ^d is O, S, NH, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 alkylamino group, or a C2 to C20 acrylamide group.

Examples of the ruthenium-based resin may include two or more of the following: a fluorine-containing compound such as 9,9'-bis(4-oxiranylmethoxyphenyl)fluorene, and the like; Anhydride compound, for example: pyromellitic dianhydride, naphthalene tetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, pyromellitic dianhydride, cyclotetracarboxylic dianhydride, decanetetracarboxylic acid a dianhydride, tetrahydrofuran tetracarboxylic dianhydride, tetrahydrophthacid anhydride, and the like; a glycol compound such as ethyleneglycol, propylene glycol, polyethylene glycol, and An analog; an alcohol compound such as methanol, ethanol, propanol, n-butanol, cyclohexanol, benzyl alcohol, and the like; a solvent compound such as propylene glycol methyl acetate, N-methylpyrrolidone, and Analog; a phosphorus compound such as triphenylphosphine, and the like; a monoamine or ammonium compound, tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, benzyl Triethylammonium chloride, and the like.

The ruthenium-based resin may have a weight average molecular weight of 1,000 to 50,000 g/mol, particularly a weight average molecular weight of 2,000 to 50,000 g/mol, and more specifically a weight average molecular weight of 2,000 to 20,000 g/mol. When the ruthenium-based resin has a weight average molecular weight within this range, a pattern is formed without residue during the manufacture of a photoresist layer, and a film thickness is not lost during development, resulting in a good picture of.

The ruthenium-based resin may be included in an amount of 1 to 30% by weight, and particularly 2 to 20% by weight based on the total weight of the photosensitive resin composition. When the ruthenium-based resin in this range is included, excellent sensitivity, development properties, heat resistance, light resistance, and tight contact properties can be achieved.

The photosensitive resin composition may further comprise an acrylic resin-based resin in addition to the ruthenium-based resin.

The acryl-based resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable with the first ethylenically unsaturated monomer, and includes at least A resin of a repeating unit mainly composed of an acrylonitrile group.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer comprising at least one carboxyl group. Examples of the monomer include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

The first ethylenically unsaturated monomer may be included in an amount ranging from 5 to 50% by weight, and particularly from 10 to 40% by weight, based on the total amount of the acrylonitrile-based resin.

Examples of the second ethylenically unsaturated monomer may include: an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether, and the like; an unsaturated carboxyl group; Acid ester compounds, for example: methyl methacrylate, ethyl methacrylate, cinnamyl methacrylate, butyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxybutyl methacrylate, methyl Benzyl acrylate, cyclohexyl methacrylate, phenyl methacrylate, and the like; an aminoalkyl ester of an unsaturated carboxylic acid, such as 2-aminoethyl methacrylate, 2- methacrylate Methylaminoethyl ester, and the like; a vinyl carboxylate compound such as vinyl acetate, vinyl benzoate, and the like; an unsaturated carboxylic acid glycidyl ester compound such as glycidyl methacrylate, And analogs; vinyl cyanide compounds such as methacrylonitrile and the like; unsaturated guanamine compounds such as methacrylamide and the like; and the like. They can be used singly or as a mixture of more than two.

Examples of the acryl-based resin may include methacrylic acid/benzyl methacrylate copolymer, methacrylic acid/benzyl methacrylate/styrene copolymer, methacrylic acid/benzyl methacrylate/methyl 2-hydroxyethyl acrylate copolymer, methacrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, and the like, but not limited to them. They may be used singly or as a mixture of two or more.

The propylene sulfhydryl-based resin may have a weight average molecular weight ranging from 3,000 to 150,000 g/mol, particularly 3,000 to 40,000 g/mol, and more specifically 5,000 to 30,000 g/mol. When the propylene fluorenyl-based resin has a weight average molecular weight within this range, the photosensitive resin composition has good physical properties and chemical properties, appropriate viscosity, and close contact property with a substrate. When applied to a light barrier layer.

The acryl-based resin may have an acid value ranging from 30 to 200 mgKOH/g, and particularly an acid value of 50 to 180 mgKOH/g. When the acryl-based resin mainly has an acid value in this range, excellent pixel resolution can be achieved.

When the acryl-based resin is included in the photosensitive resin composition, the bismuth-based resin and the acryl-based resin may have a weight ratio of 99:1 to 1:99. It is present, and in particular in a weight ratio of from 95:5 to 50:50. When the bismuth-based resin and the acryl-based resin-based resin are included in the weight ratio, excellent developing properties and sensitivities are achieved and a light-blocking layer pattern having excellent pattern forming ability can be obtained. Suppresses the production of undercuts.

(B) Reactive unsaturated compounds

The reactive unsaturated compound may be a commonly used monomer or oligomer in a photosensitive resin composition. It may be a monofunctional or polyfunctional methacrylate comprising at least one ethylenically unsaturated double bond.

The reactive unsaturated compound causes sufficient photopolymerization to form a pattern having excellent heat resistance, light resistance, and chemical resistance during the pattern forming process due to the ethylenic unsaturated double bond.

Examples of the reactive unsaturated compound may include ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, and triethylene glycol dimethacrylate. Ester, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, bisphenol A epoxy acrylate, ethylene glycol methyl ether acrylate, trimethylolpropane triacrylate, tripropylene decyl oxyethyl phosphate, and the like.

Commercially available examples of such reactive unsaturated compounds are as follows. Monofunctional methacrylates can include Aronix M- , M- , M- (TOAGOSEI CHEMICAL INDUSTRY CO.,LTD.);KAYARAD TC- TC- (NIPPON KAYAKU CO.,LTD.);V- , V- (OSAKA ORGANIC CHEMICAL IND., LTD.), and the like. Examples of difunctional methacrylates may include Aronix M- , M- , M- (TOAGOSEI CHEMICAL INDUSTRY CO.,LTD.), KAYARAD HX- , R- (NIPPON KAYAKU CO.,LTD.), V- , V- V-335 (OSAKA ORGANIC CHEMICAL IND., LTD.), and the like. Examples of trifunctional methacrylates may include Aronix M- , M- , M- , M- , M- , M- , M- (TOAGOSEI CHEMICAL INDUSTRY CO.,LTD.), KAYARAD , DPCA- , DPCA- , DPCA- , DPCA- (NIPPON KAYAKU CO.,LTD.), V- , V- , V- , V- , V- , V- (Osaka Yuki Kayaku Kogyo Co. Ltd.), and the like. The reactive unsaturated compound may be used singly or as a mixture of two or more.

The reactive unsaturated compound can be treated with an acid anhydride to improve developing properties.

The reactive unsaturated compound may be included in an amount ranging from 1 to 30 wt%, and particularly from 1 to 15 wt%, based on the total amount of the photosensitive resin composition. When a reactive unsaturated compound within this range is included, curing is sufficiently performed during the patterning process at the time of exposure, and reliability, heat resistance, light resistance, and chemical resistance, resolution, and pattern closeness can be achieved. The nature of the contact.

(C) pigment

The pigment may be an organic pigment or an inorganic pigment.

The pigment may include a red pigment, a green pigment, a blue pigment, a yellow pigment, a black pigment, and the like.

Examples of the red pigment include C.I. red pigment 254, C.I. red pigment 255, C.I. red pigment 264, C.I. red pigment 270, C.I. red pigment 272, C.I. red pigment 177, C.I. red pigment 89, and the like. Examples of the green pigment include a halogen-substituted copper indocyanin, such as: C.I. green pigment 36, C.I. green pigment 7, and the like. Examples of the blue pigment include a copper phthalocyanine, for example, CI blue pigment 15:6, CI blue pigment 15, CI blue pigment 15:1, CI blue pigment 15:2, CI blue pigment 15: 3. CI blue pigment 15:4, CI blue pigment 15:5, CI blue pigment 16, and the like. Examples of the yellow pigment include an isoporphyrin pigment such as CI yellow pigment 139, and the like, a quinoline yellow pigment such as CI yellow pigment 138, and the like, a nickel complex pigment such as CI yellow pigment 150. , and the like. Examples of the black pigment include nigrosine black, perylene black, titanium black, carbon black, and the like. The pigment may be used singly or as a mixture of two or more and is not limited to the pigments described above.

Among them, in order to effectively perform light blocking of a light blocking layer, a black pigment may be included. When a black pigment is used, a color correcting agent such as a quinone-based pigment, a quinone-based pigment, a phthalocyanine-based pigment, an azo-based pigment, and the like can also be used.

The photosensitive resin composition may further include a dispersing agent to improve the dispersion of the pigment.

In particular, the pigment may be surface-pretreated with a dispersing agent, or the pigment and the dispersing agent may be added together during the preparation of the photosensitive resin composition.

The dispersing agent may include a nonionic dispersing agent, an anionic dispersing agent, a cationic dispersing agent, and the like. Examples of the dispersant include polyalkylene glycol and esters thereof, polyoxyalkylene, polyhydric alcohol ester alkylene oxide addition product, alcohol alkylene oxide addition product, sulfonate, sulfonate And, but not limited to, carboxylic acid esters, carboxylates, alkylguanamine alkylene oxide addition products, alkylamines, and the like. The dispersing agent may be used singly or as a mixture of two or more.

Commercially available examples of such dispersants are as follows: DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, and the like (BYK); EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100 EFKA-400, EFKA-450, and the like (EFKA chemicals); Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, and the like (Zeneka) Or PB711, PB821, and the like (Ajinomoto).

The dispersant may be included in an amount of 0.01 to 10% by weight based on the total amount of the photosensitive resin composition. When the dispersant in the above range is included, the dispersion of the photosensitive resin composition is improved to cause excellent stability, developing properties, and patterning properties during the production of a photo-resist layer.

The pigment may be included in an amount of 1 to 30% by weight, and particularly 2 to 20% by weight based on the total amount of the photosensitive resin composition. When the pigment in the above range is included, the color reproducibility, the curing ability, and the close contact property of the pattern are excellent.

(D) starter

The initiator may be a photopolymerization initiator, a radical polymerization initiator, or a combination thereof.

The photopolymerization initiator may be an initiator commonly used in a photosensitive resin composition, for example, an acetophenone-based compound, a diphenylketone-based compound, and a thiophene. Ketone (thioxanthone)-based compound, benzoin-based compound, three Main compounds, and the like.

The acetophenone-based compound includes: 2,2'-diethoxyacetophenone, 2,2'-dibutoxyphenethyl copper, 2-hydroxy-2-methylpropiophenone, p-T-butyltrichloroacetophenone, p-t-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinepropan-1-one, 2-benzyl-2-dimethylamino-1-(4-? Phenanthroline phenyl)-butan-1-one, and the like.

The diphenyl ketone-based compound includes diphenyl ketone, benzhydryl benzoate, benzoyl methyl benzoate, 4-phenyl diphenyl ketone, hydroxy diphenyl Ketone, acrylated benzophenone, 4,4'-bis(dimethylamino)diphenyl ketone, 4,4'-bis(diethylamino)diphenyl ketone, 4,4'-Dimethylaminodiphenyl ketone, 4,4'-dichlorodiphenyl ketone, 3,3'-dimethyl-2-methoxydiphenyl ketone, and the like.

Thio Ketone-based compounds including thiophenes Ketone, 2-methylthiazide Ketone, isopropyl thiophene Ketone, 2,4-diethylthio Ketone, 2,4-diisopropylthio Ketone, 2-chlorothiazide Ketones, and the like.

The benzoin-based compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzodimethylketal, and the like.

The three Main compounds include 2,4,6-trichloro-s-three 2-phenyl-4,6-bis(trichloromethyl)-s-three , 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-three , 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-three , 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-three , 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-three 2-biphenyl 4,6-bis(trichloromethyl)-s-three , bis(trichloromethyl)-6-styryl-s-three ,2-(naphthalen-1-yl)-4,6-bis(trichloromethyl)-s-three , 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-s-three 2-4-trichloromethyl (sunflower based)-6-three 2-4-trichloromethyl (4'-methoxystyryl)-6-three , and the like.

The polymerization initiator may further include a carbazole-based compound, a diketone-based compound, a bismuth borate-based compound, a diazo-based compound, a bisimidazole-based compound, and the like.

The radical polymerization initiator may include a peroxide-based compound, an azobis-based compound, and the like.

Examples of the peroxide-based compound include ketone peroxides, for example, methyl ethyl ketone peroxide, cyclohexanone peroxide, methyl cyclohexanone peroxide, acetam peroxide, and the like; Peroxides, for example: isobutyl sulfoxide, 2,4-dichlorobenzamide peroxide, o-methylbenzhydryl peroxide, bis-3,5,5-trimethylhexyl Peroxides, and the like; hydroperoxides, for example: 2,4,4,-trimethylpentyl-2-hydroperoxide, diisopropylbenzene hydroperoxide, hydroperoxide Cumene, tertiary butyrate, and the like; dialkyl peroxides, for example: bisisophenylpropyl peroxide, 2,5-dimethyl-2,5-di ( Tertiary butyl hydroperoxide) hexane, 1,3-bis(tertiary butoxyisopropyl)benzene, n-butyl butyl hydroperoxypivalate, and the like; alkyl peroxyester For example: 2,4,4-trimethylpentylperoxyphenoxyacetate, α-cumyl peroxy neodecanoate, tertiary butyl peroxybenzoate, di- Tert-butyl peroxytrimethyl adipate, and the like; percarbonate, for example : bis-3-methoxybutylperoxydicarbonate, di-2-ethylhexylperoxydicarbonate, bis-4-tributylcyclohexylperoxydicarbonate, diisopropyl Oxydicarbonate, acetamidine cyclohexylsulfonyl peroxide, tertiary butyl peroxyethylene carbonate, and the like.

Examples of the azobis-based compound include 1,1'-azobiscyclohexane-1-carbonitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2 - azobis(2,4-methylisobutyrate), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), α,α'-azo Bis(isobutyronitrile) and 4,4'-azobis(4-cyanovaleric acid), and the like.

Since the initiator absorbs light and amplifies and then transfers energy, it can be used with a photosensitizer to create a chemical reaction.

Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, neopentyl 肆-3-mercaptopropionate, dipentaerythritol dec-3-mercaptopropionate, and the like.

The initiator may be included in an amount of 0.01% by weight to 10% by weight based on the total amount of the photosensitive resin composition, and particularly an amount of 0.1 to 5% by weight. When the initiator in this range is included, sufficient curing is performed at the time of exposure during the patterning process to obtain excellent reliability, heat resistance, light resistance, chemical resistance, resolution, and close contact properties. The transmittance is not deteriorated due to the non-reactive starter.

(E) solvent

The solvent has compatibility with the bismuth-based resin, reactive unsaturated compound, pigment, and initiator, but does not have a reaction therewith.

Examples of the solvent may include alcohols such as methanol, ethanol, and the like; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, tetrahydrofuran, and the like; glycol ethers, For example: ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and the like; acetaminophen acetate, for example: acesulfame acetate, acesulfame acetate, dicetaxel acetate, and the like; Alcohol, for example: methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol methyl ether, diethylene glycol methyl ethyl ether, two Ethylene glycol ethyl ether or the like; propylene glycol alkyl ether acetate, for example: propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, and the like; aromatic hydrocarbons such as toluene, xylene, and the like; ketones, for example : methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-acetone, methyl-n-butanone, methyl-n-pentanone, 2-heptanone, and Analogs; saturated aliphatic monocarboxylic acid alkyl esters, for example: ethyl acetate, n-butyl acetate, isobutyl acetate, and the like; lactate esters, for example: lactate A , ethyl lactate, and the like; alkyloxy acetate, such as: methyloxyacetate, ethyloxyacetate, butyloxyacetate, and the like; alkylalkane Oxyacetic acid esters, for example, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, and the like; 3-oxygen 3-oxy propionate alkylesters, such as methyl 3-oxypropionate, ethyl 3-oxypropionate, and the like; alkyl 3-alkoxypropionate, for example: Methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, and the like; 2-oxypropionic acid Alkyl esters, for example: methyl 2-oxypropionate, ethyl 2-oxypropionate, 2-oxy propionic acid propyl, and the like; 2-alkoxy Alkyl propionate, for example: methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, methyl 2-ethoxypropionate, and the like 2-oxy-2-methylpropionate, for example: methyl 2-oxy-2-methylpropanoate, 2-oxy-2-methylpropane Ethyl ethyl ester, and the like; alkoxy monoalkyl monocarboxylic acid alkyl ester of 2-alkoxy-2-methylpropionic acid alkyl group, for example: methyl 2-methoxy-2-methylpropionate, Ethyl 2-ethoxy-2-methylpropanoate, and the like; esters, for example: ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, 2 Methyl hydroxy-3-methylbutanoate, and the like; a series of ketonate esters such as ethyl pyruvate, and the like. Further, the following high boiling solvents may be further added: N-methylformamide, N,N-dimethylformamide, N-methylformamide, N-methylacetamide, N, N- Dimethylacetamide, N-methylpyrrolidone, dimethyl hydrazine, benzyl ethyl ether, dihexyl ether, acetamidine, isophorone, caproic acid, octanoic acid, 1-octanol, 1-nonanol , benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, cyanoacetate, and the like .

Considering compatibility and reactivity, glycol ethers such as ethylene glycol monoethyl ether, and the like; ethylene glycol alkyl ether acetates such as ethyl acesulfame acetate, and the like; esters such as 2- Ethyl hydroxypropionate, and the like; carbitol, such as diethylene glycol monomethyl ether, and the like; propylene glycol alkyl ether acetate, such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate , and the like.

The solvent is used as a difference, and particularly 20 to 95% by weight based on the total amount of the photosensitive resin composition. When the solvent in this range is included, the photosensitive resin composition may have an appropriate viscosity to cause an improvement in workability of a light barrier layer.

(F) Other additives

The photosensitive resin composition may further include an epoxy compound to improve the close contact property with a substrate.

Examples of the epoxy compound include a novolac epoxy compound, a tetramethylbiphenyl epoxy compound, a bisphenol A epoxy compound, an alicyclic epoxy compound, or a combination thereof.

The epoxy compound may be included in an amount of 0.01 to 5 parts by weight, and particularly 0.1 to 5 parts by weight, based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound in the above range is included, tight contact properties, heat resistance, and chemical resistance can be improved.

The photosensitive resin composition may further include a decane coupling agent having a reactive substituent such as a carboxyl group, a methacryl oxime group, an isocyanate group, an epoxy group, and the like to improve adhesion to a substrate.

Examples of the decane coupling agent include trimethoxy sulfonyl benzoic acid, γ-methoxy propyl trimethoxy decane, vinyl triethoxy decane, vinyl trimethoxy decane, and γ-isocyanatopropyl three. Ethoxy decane, γ-glycidyloxypropyl trimethoxy decane, β-(3,4-ethoxycyclohexyl)ethyltrimethoxydecane, and the like. They may be used singly or as a mixture of two or more.

The decane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the decane coupling agent in the above range is included, the close contact properties, storage properties, and the like are improved.

The photosensitive resin composition may further include a surfactant 俾 to improve coating properties and suppress spots.

Examples of the surfactant may include a fluorine-based surfactant, for example, BM- , and BM- (BM Chemie Inc.); MEGAFACE F , F , F With F DAINIPPON INK KAGAKU KOGYO CO.,LTD.);FULORAD FC- , FULORAD FC- , FULORAD FC- With FULORADFC- (SUMITOMO 3M CO., LTD.); SURFLON S- , SURFLON S- , SURFLON S- , SURFLON S- With SURFLON S- (ASAHI GLASS CO., LTD.); and SH- , SH- , SH- , SZ- With SF- , and the like (TORAY SILICONE CO., LTD.).

The surfactant may be included in an amount of 0.001 to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When a surfactant in this range is included, coating uniformity can be ensured without staining, and the wetting property of a glass substrate is improved.

The photosensitive resin composition may further contain other additives, for example, an antioxidant, a stabilizer, and the like in a predetermined amount, when they lower the properties.

According to another specific example, a light-blocking layer produced using the photosensitive resin composition is provided. The light blocking layer can be manufactured as follows.

(1) Application and film formation

The aforementioned photosensitive resin composition is coated to have a desired thickness using a spin coating method or a slit coating method, a roll coating method, a screen printing method, an applicator method, and the like. For example, a thickness ranging from 0.5 to 25 μm is used to perform a predetermined pretreatment on one of the substrates. The coated substrate is then heated at a temperature ranging from 70 to 110 ° C for 1 to 10 minutes to remove a solvent.

(2) Exposure

The resulting film is irradiated with active rays of 190 to 500 nm after placing a mask having a predetermined shape to form a desired pattern. The radiation is performed by using a light source such as a mercury lamp having a low pressure, a high pressure, or an ultrahigh pressure, a metal halide lamp, an argon laser, and the like. However, it is possible to use an X-ray, an electron beam, and the like, depending on the situation.

When a high pressure mercury lamp is used, the exposure process uses, for example, a light dose of 500 mJ/cm ² or less (with a 365 nm sensor). However, the light dose may vary depending on the kind of each component of the photosensitive resin composition, the combination ratio thereof, and the thickness of a dry film.

(3) Development

After the exposure process, an aqueous alkaline solution is used to develop the exposed film by forming an image pattern by dissolving and removing unnecessary portions other than the exposed portion.

The developing solution may be an organic solvent type and an alkaline developing type. Organic solvent-based solutions can cause environmental pollution and damage to the human body. Therefore, an alkaline developing type solution may be preferred in terms of environment. According to a specific example, an aqueous alkaline solution is used as a developing solution, which is environmentally friendly. The alkaline aqueous solution neutralizes the carboxylic acid present in the main resin and thus dissolves the ruthenium-based resin.

(4) Post processing

The developed image pattern can be heated again or irradiated by an active ray and the like for curing, to achieve excellent quality, heat resistance, photoresist resistance, tight contact properties, crack resistance, chemical resistance, High strength, storage stability, and the like.

Thus, the aforementioned photosensitive resin composition can bring about an excellent insulating and optical density required for a light-blocking layer.

In the following, the invention is explained in more detail with reference to the examples. However, these are exemplary embodiments of the invention and are non-limiting.

Preparation Example 1: Preparation of ruthenium-based resin

(1) 29.8 g of pentaerythritol triacrylate (Sigma-Aldrich Co.) and 35.43 g of propylene glycol methyl acetate (Daicel Chemical Industries Ltd.) were placed in a reactor and heated to 50 °C. Next, 6.8 g of sodium ethoxide (Sigma-Aldrich Co.) was added thereto in small amounts, and 9.3 g of epichlorohydrine (Sigma-Aldrich Co.) was added thereto for 30 minutes. . The mixture was heated to 80 ° C, and maintained at the same temperature for 3 hours and then filtered to synthesize a compound represented by the following Chemical Formula 6-1.

(2) 35 g of 9,9'-bis(4-hydroxyphenyl)fluoro (Hearchem Co., Ltd.), 141.6 g of the compound represented by the above Chemical Formula 5-1, and 0.23 g of benzyltriethyl Ammonium chloride (Daejung Chemicals & Metals Co., Ltd.), and 0.23 g of triphenylphosphine (Sigma-Aldrich Co.) were placed in a reactor and connected, heating was increased to 90 ° C and maintained at the same The temperature was 12 hours to synthesize a compound represented by the following Chemical Formula 6-2.

(3) 30 g of the compound represented by the above Chemical Formula 6-2, 2.1 g of biphenyltetracarboxylic dianhydride (Mitsubishi Gas Chemical Co., Ltd.), and 1.1 g of tetrahydrophthic anhydride (tetrahydrophth) Anhydride) (Sigma-Aldrich Co.) was placed in a reactor. The mixture was heated to 120 ° C and maintained at the same temperature for 2 hours to synthesize a compound represented by the following Chemical Formula 6-3 (weight average molecular weight of 5,400 g/mol).

Preparation Example 2: Preparation of Red Pigment Dispersion

15 g of CI Red Pigment 254 (Ciba-Geigy Ltd.), 4 g of DISPERBYK-163 (BYK Additives & Instruments), 3 g of acrylate/benzyl methacrylate copolymer (Miwon Commercial Co, Ltd., NPR 8000), and 78 g of propylene glycol methyl acetate was mixed in a reactor. The mixture was prepared by dispersing using a paint shaker (Asada Iron Works Co., Ltd.) for 12 hours to prepare a red pigment dispersion solution.

Preparation Example 3: Preparation of black pigment dispersion

15 g of carbon black (Cabot Co.), 4 g of DISPERBYK-163 (BYK Additives & Instruments), 3 g of acrylic acid/benzyl methacrylate copolymer (NPR8000, Miwon Commercial Co, Ltd.), and 78 g of propylene glycol methyl b The acetate is placed in a reactor. The mixture was prepared by dispersing using a paint shaker (Asada Iron Works Co., Ltd.) for 12 hours to prepare a black pigment dispersion solution.

Examples 1 and 2 and Comparative Examples 1 to 4: Preparation of photosensitive resin composition

Each of the photosensitive resin compositions according to Examples 1 and 2 and Comparative Examples 1 to 4 was prepared to include the following components as provided in Table 1 below.

In particular, an initiator is dissolved in a solvent. The solution was stirred at room temperature for 2 hours. Then, a binder resin and a reactive unsaturated compound are added to the solution. The mixture was stirred at room temperature for 2 hours. Then, the red pigment dispersion solution according to Preparation Example 1 or the black pigment dispersion solution according to Preparation Example 2 and a decane coupling agent were added to the reactant. The resulting mixture was stirred at room temperature for 1 hour. Next, the product was filtered 3 times to remove impurities to prepare a photosensitive resin composition.

(A) Adhesive resin

(A-1) The compound represented by Chemical Formula 6-3 according to Preparation Example 1 was used as a monoterpene-based resin.

(A-2) A acrylic acid/benzyl methacrylate copolymer (NPR8000, Miwon Commercial Co., Ltd.) was used as a resin mainly composed of an acrylonitrile group.

(A-3) As for the main resin, V259ME manufactured by Nippon Steel Chemical Co. was used.

(B) Reactive unsaturated compounds

Dipentaerythritol hexaacrylate was used.

(C) Pigment dispersion solution

(C-1) The red pigment dispersion solution according to Preparation Example 2 was used. Here, a pigment solid is included in an amount of 15% by weight based on the total amount of the red pigment dispersion solution.

(C-2) The black pigment dispersion solution according to Preparation Example 3 was used. Here, a pigment solid is included in an amount of 15% by weight based on the total amount of the black pigment dispersion solution.

(D) starter

IRGACURE OXE02 manufactured by Ciba Geigy Ltd. was used.

(E) solvent

Propylene glycol methyl ether acetate was used.

(F) Additives

As the monodecane coupling agent, γ-glycidoxypropyltrimethoxydecane (S-510, Chisso Co.) was used.

The mark * indicates the amount of a pigment solid based on the total amount of one (C-1) red pigment dispersion solution or one (C-2) black pigment dispersion solution.

Assessment 1: Developing properties

Each of the photosensitive resin compositions according to Examples 1 and 2 and Comparative Examples 1 to 4 was coated with a spin coater (KDNS, K-Spin 8) to a thickness of 0.8 μm on a single wafer (LG Siltron) and then exposed to an exposure device (Nikon, I10C) for 350 ms. Incidentally, when the exposed product was developed by using a developing device (SSP-200, SVS Corp.) with a 0.2 wt% aqueous solution of tetramethylammonium hydroxide (TMAH), the developing property was evaluated by a reference for the time difference. When the aqueous solution is coated and when the coated film begins to be developed. The results are provided in Table 2 below.

<Development property evaluation>

○: less than 20 seconds

△: more than 20 seconds and less than 30 seconds

×: more than 30 seconds

Assessment 2: Residues

Each photosensitive resin composition according to Example 1, Comparative Example 1, and Comparative Example 3 was coated with a spin coater (K-Spin 8, KDNS Inc.) to a thickness of 0.8 μm on a wafer. LG Siltron Inc. and exposure with an exposure device (I10C, Nikon Co.) lasted 350 ms. Next, the exposed film was developed by using a developing device (SSP-200, SVS Corp.) with a 0.2 wt% aqueous solution of tetramethylammonium hydroxide (TMAH) to form a pattern. Next, the pattern was examined by using a CD scanning electron microscope analyzer (8100XP, KLA-Tencor Co.) to evaluate whether it had a residue. The results are provided in Table 2 below. Further, the developed film was evaluated by scanning electron micrographs of the CDs in Figs. 1 to 3 by examining whether it had a residue.

1 is a scanning electron micrograph showing a residue of a photosensitive resin composition according to Example 1, and FIG. 2 is a scanning electron showing a residue of a photosensitive resin composition according to Comparative Example 3. The micrograph, and Fig. 3 is a scanning electron micrograph showing the residue of the photosensitive resin composition according to Comparative Example 1.

<Residue Evaluation>

○: a smooth pattern as shown in Figure 1

△: a small amount of residue as shown in Fig. 2

×: a large amount of residue as shown in Fig. 3

Referring to Figures 1 to 3, the photosensitive resin composition according to Example 1 has a smooth surface without any residue. The photosensitive resin composition according to Comparative Examples 1 and 3 had a residue.

Assessment 3: Pattern Formation Properties

The photosensitive resin compositions according to Examples 1 and 2 and Comparative Examples 1 to 4 were coated with a spin coater to be 1.5 μm higher than a glass substrate, and a pattern mask and a pattern were used. An exposure device (USHIO Inc.) was used to expose light to 45 mJ/cm ² . The coated glass was developed in an aqueous solution diluted with 1 wt% potassium hydroxide at 23 ° C for 1 minute and then rinsed with pure water for 1 minute. The 1.5 um-height pattern was heated in a 220 ° C oven for curing for 30 minutes. The cured pattern was inspected for shape using a scanning electron microscope. The results are provided in Table 2 below and Figures 4 to 7.

4 is a scanning electron micrograph showing the pattern formation property of the photosensitive resin composition according to Example 2, and FIG. 5 is a scanning diagram showing the pattern formation property of the photosensitive resin composition according to Example 1. Electron micrograph, Fig. 6 is a scanning electron micrograph showing the pattern forming property of the photosensitive resin composition according to Comparative Example 3, and Fig. 7 is a photosensitive resin composition showing Comparative Example 2. Scanning electron micrograph of the pattern forming properties.

<pattern formation properties>

◎: excellent pattern forming properties as shown in Fig. 4

○: good pattern forming properties as shown in Fig. 5

△: poor pattern formation properties as shown in Fig. 6

×: no pattern as shown in Fig. 7

Referring to Figures 4 to 7, the photosensitive resin compositions according to Examples 1 and 2 formed an excellent pattern, however, the films according to Comparative Examples 2 and 3 did not have a good pattern.

Assessment 4: Assessment of the properties of fine line pattern formation

The photosensitive resin composition according to Example 2 and Comparative Examples 2 and 4 was used to form a pattern under the same conditions used for pattern forming properties. The pattern was examined using an optical microscope to evaluate its minimum size. The results are provided in Table 2 below and Figures 8 to 10.

Fig. 8 is a scanning electron micrograph showing the pattern size of the photosensitive resin composition according to Example 2, and Fig. 9 is an optical micrograph showing the pattern size of the photosensitive resin composition according to Comparative Example 2. And Fig. 10 is an optical micrograph showing the pattern size of the photosensitive resin composition according to Comparative Example 4.

Referring to Figures 8 to 10, the photosensitive resin composition according to Example 2 had a minimum pattern size of 7 μm, whereas the patterns according to Comparative Examples 2 and 4 had a minimum pattern size of 9 μm.

Referring to Table 2 and Figures 1 to 10, the photosensitive resin composition prepared using the ruthenium-based resin according to Examples 1 and 2 exhibited excellent development properties, residues, and pattern formation properties as compared with According to Comparative Examples 1 and 2, the acryl-based resin was prepared, and the structures according to Comparative Examples 3 and 4 having the same structure as the ruthenium-based resin used in Examples 1 and 2 were used. The bismuth-based resin is prepared.

Although the present disclosure has been described in what is considered as a practical illustrative embodiment, it is understood that the invention is not limited to the specific examples disclosed, but rather, the scope and scope of the accompanying claims Various modifications and equivalent configurations within. The foregoing specific examples are illustrative but not limiting in any way.

Figure 1 is a scanning electron microscope image showing the residue of the photosensitive resin composition according to Example 1;

Figure 2 is a scanning electron microscope image showing the residue of the photosensitive resin composition according to Comparative Example 3;

Figure 3 is a scanning electron microscope image showing the residue of the photosensitive resin composition according to Comparative Example 1;

Figure 4 is a scanning electron microscope image showing the residue of the photosensitive resin composition according to Example 2;

Figure 5 is a scanning electron microscope image showing the pattern forming properties of the photosensitive resin composition according to Example 1;

Fig. 6 is a scanning electron microscope image showing the pattern forming property of the photosensitive resin composition according to Comparative Example 3;

Figure 7 is a scanning electron microscope image showing the pattern forming properties of the photosensitive resin composition according to Comparative Example 2;

Figure 8 is an optical micrograph showing the pattern size of the photosensitive resin composition according to Example 2;

Figure 9 is an optical micrograph showing the pattern size of the photosensitive resin composition according to Comparative Example 2;

Fig. 10 is an optical micrograph showing the pattern size of the photosensitive resin composition according to Comparative Example 4.

Claims (11)

A photosensitive resin composition comprising: (A) a cardo-based resin containing a repeating unit represented by the following Chemical Formula 1; (B) a reactive unsaturated compound; (C) a pigment; (D) an initiator; and (E) a solvent: Wherein, in Chemical Formula 1, R ³ and R ⁴ are the same or different, and are hydrogen, halogen, or a substituted or unsubstituted C1 to C20 alkyl group, and R ¹ and R ² are the same or different, and Is hydrogen or CH ₂ OCH ₂ CR ⁶ R ⁷ R ⁸ , wherein R ⁶ to R ⁸ are substituted or unsubstituted (meth) acrylate, provided that at least one of R ¹ and R ² is CH ₂ OCH ₂ CR ⁶ R ⁷ R ⁸ , wherein R ⁶ to R ⁸ are substituted or unsubstituted (meth) acrylate, Z ¹ is a single bond, O, CO, SO ₂ , CR ⁹ R ¹⁰ , SiR ¹¹ R ¹² (wherein R ⁹ to R ¹² are the same or different, and are hydrogen or a substituted or unsubstituted C1 to C20 alkyl group), or are the following chemical formulas 2-1 to 2 At least one of the linking groups represented by -11, Z ² is an acid anhydride residual group or an acid dianhydride residual group, m ¹ and m ^{2 are} independently an integer ranging from 0 to 4, and n is from 1 to 1000 Integer, [Chemical Formula 2-5] Wherein, in Chemical Formula 2-5, R ^a is hydrogen, ethyl, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH=CH ₂ , or phenyl, The photosensitive resin composition of claim 1, wherein the bismuth-based resin has a weight average molecular weight of 1,000 to 50,000 g/mol. The photosensitive resin composition of claim 1, wherein the bismuth-based resin comprises one end represented by the following Chemical Formula 4 based on at least one of two ends: Wherein, in Chemical Formula 4, Z ³ is at least one of the linking groups represented by the following Chemical Formulas 5-1 to 5-7: [Chemical Formula 5-1] Wherein, in Chemical Formula 5-1, R ^b and R ^c are the same or different, and are a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, an ester group, or an ether group. Wherein, in Chemical Formula 5-5, R ^d is O, S, NH, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 alkylamino group, or a C2 to C20 acrylamide group, The photosensitive resin composition of claim 1, wherein the photosensitive resin composition contains 1 to 30% by weight of the ruthenium-based resin (A); and 1 to 30% by weight of the reactive unsaturated Compound (B); 1 to 30 wt% of the pigment (C); 0.01 to 10 wt% of the initiator (D); and the solvent (E). The photosensitive resin composition of claim 1, wherein the photosensitive resin composition further comprises an acrylic resin-based resin. The photosensitive resin composition of claim 5, wherein the acryl-based resin comprises a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer, the first ethylene Unsaturated single a first ethylenically unsaturated monomer which is a combination of methacrylic acid, maleic acid, itaconic acid, fumaric acid, or the like; and the second ethylenically unsaturated monomer is styrene, alpha -methylstyrene, vinyl toluene, vinylbenzyl methyl ether, methyl methacrylate, ethyl methacrylate, butyl methacrylate, 2-hydroxyethyl methacrylate, methacrylic acid 2- Hydroxybutyl ester, benzyl methacrylate, cyclohexyl methacrylate, phenyl methacrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl methacrylate, vinyl acetate, A second ethylenically unsaturated monomer of vinyl benzoate, glycidyl methacrylate, methacrylonitrile, methacrylamide, or a combination thereof. The photosensitive resin composition of claim 5, wherein the acryl-based resin has a weight average molecular weight of 3,000 to 40,000 g/mol. The photosensitive resin composition of claim 5, wherein the bismuth-based resin and the acryl-based resin are included in a weight ratio of from 99:1 to 30:70. The photosensitive resin composition of claim 1, wherein the initiator comprises a photopolymerization initiator, a radical polymerization initiator, or a combination thereof. The photosensitive resin composition of claim 1, wherein the photosensitive resin composition contains 0.01 to 20 parts by weight of the epoxy compound based on 100 parts by weight of the photosensitive resin composition. A light-blocking layer produced by using the photosensitive resin composition according to any one of claims 1 to 10.