TWI413156B - Resist liquid supply and recovery system and method of recovering resist liquid - Google Patents

Abstract

A resist liquid supply recovery system and a resist liquid recovering method for increasing recycle rate are provided to collect the resist liquid at low cost and increase the collection of the resist liquid. A resist liquid supply recovery system comprises a resist solution spreading apparatus, a supply and recovery vessel(1) of the designated capacity, the feeding line, and a recovery pipe(253). A recovery vessel is used in two or more ways as the purpose of supplying the resist liquid to the resist solution spreading apparatus and the purpose of collecting the resist liquid in which use is finished from the resist solution spreading apparatus. The feeding line is used during the supply of the resist liquid. The recovery pipe is used during the collection of the resist liquid.

Description

Photoresist supply recovery system and photoresist liquid recovery method

The present invention relates to a used recovery system and a recovery method for a photoresist liquid, and more particularly to a system and method for supplying a photoresist liquid to a facility having a photoresist liquid application device, and The used photoresist solution after the coating is recovered for reuse or the like.

In a manufacturing process such as a semiconductor or a liquid crystal panel, a lithography technique in which a photoresist is applied onto a substrate to be exposed and developed is performed. With the increase in size of liquid crystal panels and the like in recent years, the substrate used has also been developed in a large-scale direction, and thus the amount of use of the photoresist liquid has also increased. Representative coating methods include a spin coat method and a die coat (slit coat) method.

When the photoresist is applied to the substrate, an excess amount of the photoresist is required to be applied in an amount larger than the actual amount of the photoresist, so that the remaining used photoresist is often generated. In particular, when the spin coating method is used, the used photoresist liquid can not be ignored. Therefore, in terms of economics and environmental considerations, the industry expects to recycle and reuse it effectively.

As for the recovery and reuse of the above-mentioned photoresist liquid, there are known recovery apparatuses of Patent Documents 1 and 2 below. This system is equipped with a recovery and regeneration device in the photoresist coating device itself, and the photoresist is reused by adjusting the viscosity and filtering the filter.

In addition, in addition to the above, a large-scale recycling production line is provided in a facility including a plurality of photoresist liquid application devices, so that the used photoresist liquid from a plurality of coating devices is collectively recovered into a storage tank or the like. And return it to the photoresist manufacturer and reuse it in the photoresist manufacturer.

On the other hand, the supply of photoresist to users such as semiconductor manufacturers or LCD panel manufacturers is usually started by photoresist manufacturers. In this case, for example, a small-sized dedicated container having a predetermined capacity as described in Patent Document 3 is used. The dedicated container has a double structure and is composed of a small rigid container and an inner bag formed of a flexible material that can be detachably attached to the inside of the rigid container. Such a special container can be directly connected to the user's production line, and the operation is simple, and the risk of foreign matter being mixed into the photoresist liquid is small, so it has become the mainstream. The above-mentioned dedicated container is used as a so-called recyclable container, that is, it is delivered to the user in a state in which the inner bag is filled with the photoresist, and is directly connected to a production line of a coating device or the like by the user, and is used. After the inner bag is an empty bag, it is directly recovered and sent back to the photoresist manufacturer or the like, and after being cleaned or the like, the photoresist is filled again.

[Patent Document 1] Japanese Patent Laid-Open No. Hei 9-34121

[Patent Document 2] Japanese Patent Laid-Open No. Hei 11-245226

[Patent Document 3] Japanese Patent Laid-Open No. Hei 6-100087

The photoresist liquid recovery system of Patent Document 1 or 2 is basically considered to be reused by the user. At this time, the quality management of the reused photoresist liquid must be carried out on the user side, so that it is difficult to stably perform the above-described quality management in terms of users who are not familiar with the photoresist liquid.

Further, a method of collectively recovering used photoresist from a plurality of coating devices into a storage tank or the like and returning it to a photoresist manufacturer must provide a recycling device for the user, and thus exists The problem of burden and management burden on newly generated devices.

Further, the special container of Patent Document 3 is a container for supplying a photoresist, and it is not assumed that the used photoresist or the like is filled after the completion of the discharge, and thus it cannot be directly used as a recovery container.

The inventors of the present invention conducted intensive studies to solve the above problems, and as a result, found that a recyclable container previously used as a dedicated container for supplying a photoresist liquid is also used as a recovery container for a photoresist liquid, and is used as a supply and supply. The above problem can be solved by recycling the container, thereby completing the present invention.

That is, the photoresist liquid supply and recovery system of the present invention includes: a photoresist liquid application device; a supply/recovery container having a predetermined capacity, which is also used for the purpose of supplying a photoresist liquid to the photoresist liquid application device, and The photoresist liquid application device collects the used photoresist liquid; the supply pipe is used when the photoresist is supplied, and can be connected to the supply and recovery container in an airtight state; and the recovery pipe is When the above-mentioned used photoresist liquid is recovered, it can be connected to the above-mentioned supply and recovery container in an airtight state.

Further, in the method for recovering a photoresist liquid of the present invention, a dedicated container having a predetermined capacity is used, a photoresist liquid is supplied from a photoresist supply facility to a photoresist liquid use facility, and the above-mentioned dedicated container is also used as a photoresist liquid recovery container. It is used to recover the photoresist used in the above-mentioned photoresist liquid use facility.

The present invention is characterized in that a container previously used as a supply-dedicated container for a photoresist liquid is used as a supply-and-recovery container. In view of this aspect, it can also be said that the present invention provides a new method for recovering a photoresist solution, and finds a new use for the purpose of recycling a conventional supply-dedicated container.

According to the present invention, an existing photoresist liquid supply system using a recyclable container can be directly utilized. Therefore, there is no need to set up special recycling equipment or reuse equipment on the user side. Therefore, there is a high degree of freedom in terms of equipment for the user. Specifically, the present invention can be effectively utilized in the case where the photoresist liquid recovery apparatus cannot be provided spatially due to the arrangement of the production line of the conventional photoresist liquid coating apparatus.

Moreover, since the conventional photoresist liquid supply system can be directly used for recovery, the used photoresist liquid from a plurality of coating devices is collectively recovered into a storage tank or the like, and returned to the photoresist. Compared with the existing methods of liquid manufacturers, the recycling costs and labor can be greatly reduced.

Further, in the present invention, the term "available as a photoresist liquid recovery container" for a dedicated container means that a dedicated container can be used for both supply and recovery. Therefore, the supply operation and the recovery operation are not required to be similar in time. That is, it is within the scope of the present invention as long as it is a dedicated container for supply and then used as a recovery container. Further, in the case of the photoresist liquid application apparatus, even when the supply container is used in a container having a different type or capacity than the recovery container, the supply container is finally used somewhere in the photoresist use facility. It is still within the scope of the invention to make a recovery container.

According to the present invention, the recovery efficiency of the photoresist can be greatly improved as compared with the prior art, the photoresist can be recovered at a low cost, and the reuse rate can be improved.

Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. Fig. 1 is a front view showing an example of the present invention, and Fig. 2 is a longitudinal sectional view showing an embodiment of a dedicated container (supply and recovery container), and Fig. 3 is an enlarged view showing an opening portion of Fig. 2; Fig. 4 is a cross-sectional exploded view showing the opening portion of Fig. 2, and Fig. 5 is a view showing a state in which the packaging bag attached to the discharge port is housed in the outer container, Fig. 5(a) A partial perspective view showing a state in which the packaging bag attached to the discharge port is inserted into the outer container, and FIG. 5(b) is a partial perspective view showing a state in which the packaging bag attached to the discharge port is accommodated in the outer container, and FIG. 6 shows A schematic diagram of an example of a photoresist liquid recovery system.

<special container>

First, a dedicated container 1 as a supply and recovery container in the present invention will be described. As shown in FIGS. 2 to 4, the dedicated container 1 includes a packaging bag 10 that is attached to the discharge port and has flexibility, and an outer container 20 having an opening 24 and a cylindrical joint bracket 30. It is held in the opening portion 24; the liquid discharge tube 40 is inserted into the tubular portion 32 of the joint bracket 30; and the annular first cover 50 is screwed (screwed) to the opening portion 24 for injection. The discharge port 11 and the joint bracket 30 are held on the opening portion 24; and the second cover 60 has a bushing 62 projecting inward.

The package 10 which is attached to the discharge port has an injection discharge port 11 which is opened to inject a liquid, and a package main body 12 for filling the photoresist. The injection discharge port 11 is composed of an injection discharge port attachment portion 111 and an injection discharge port engagement portion 112 connected to one end of the injection discharge port attachment portion 111. As shown in Fig. 4, the injection discharge port 11 is provided by The discharge port mounting portion 111 is injected and heat-sealed to the package body 12.

The outer container 20 supports the injection discharge port 11 by the opening portion 24, and can accommodate the packaging bag 10 that is attached to the discharge port. Then, as shown in FIG. 5, the packaging bag 10 which is attached to the discharge port is housed in the outer container 20 as an inner bag. As described above, the special container 1 is a double container, and the outer container 20 can be used repeatedly, and a new packaging bag 10 that is attached to the discharge port can be used each time.

As shown in Fig. 2, the outer container 20 preferably uses a steel container in which the bottom plate 21, the side wall 22, and the top plate 23 of the center bulge are formed, and the opening portion 24 is formed in a substantially central portion of the top plate 23. An external thread 24a is formed on the outer peripheral surface of the opening portion 24 (see Fig. 3). Further, by providing a pair of grip portions 25 (see FIG. 5) at a position above the top plate 23 of the side wall 22, the conveyance can be facilitated. The outer container 20 is exemplified by a rigid container made of paper such as metal, synthetic resin, or corrugated cardboard, but is not particularly limited thereto.

As shown in Fig. 4, on the other hand, the flange portion 112b is formed on the opening side of the injection discharge port 11 of the packaging bag 10 which is attached to the discharge port, and the step is provided on the inner wall of the opening portion 24 by the above. The flange portion 112b is locked to the step, and the injection discharge port 11 is supported by the opening portion 24.

The joint used in the photoresist liquid supply step S20 described below includes a cylindrical joint bracket 30 and a liquid discharge pipe 40 (see FIG. 3 or FIG. 4). In the third or fourth figure, the joint bracket 30 is held in the opening portion 24. Further, the joint bracket 30 has a substantially cylindrical base portion 31 on one end side and a tubular portion 32 on the other end side. Further, the joint bracket 30 has a second through hole 33 penetrating from one end side to the other end side. The socket portion 31 is swelled from the cylindrical bottom surface of the joint bracket 30. The tubular portion 32 is fitted to the first through hole 111a of the injection discharge port 11 (see FIGS. 3 and 4).

In the third or fourth drawing, the one end side of the liquid discharge pipe 40 has a flange portion 41 which is in close contact with the top surface 311 of the socket portion 31 of the joint bracket 30. Further, the other end side of the discharge pipe 40 is inserted into the second through hole 33 of the joint bracket 30. The liquid discharge pipe 40 has a fluid passage 42 extending from one end to the other end, and the liquid in the packaging bag 10 attached to the discharge port can be discharged by the fluid passage 42 (refer to Fig. 2).

The outer diameter of the joint bracket 30 is slightly smaller than the inner diameter of the injection discharge port 11, and the joint bracket 30 is fitted to the injection discharge port 11 that is supported by the opening 24 (see Fig. 3). A flange 34 having an outer diameter slightly smaller than the inner diameter of the opening 24 is provided on one end side of the joint bracket 30, and the flange 34 supports the O-ring and seals the opening 24 (see Fig. 3 or Fig. 4).

The first cover 50 is fastened to the opening 24, whereby the joint bracket 30 and the injection discharge port 11 are held together in the opening portion 24 (see Fig. 3). A predetermined gap is provided between the bottom outer wall of the joint bracket 30 and the bottom inner wall of the tubular portion 112a of the injection discharge port 11 (see FIGS. 3 and 4).

In Fig. 4, the tubular portion 32 is provided to protrude from the bottom of the joint bracket 30 to fit the tubular portion 32 to the first through hole 111a of the injection discharge port 11. The O-ring is supported inside the first through hole 111a of the injection discharge port 11, and the O-ring is in close contact with the outer circumference of the tubular portion 32, thereby sealing the gas (not shown) in the packaging bag 10 attached to the discharge port. . The second through hole 33 penetrates from the upper end of the stem portion 31 to the lower end of the tubular portion 32, and the liquid outlet tube 40 is inserted into the second through hole 33 (see FIGS. 3 and 4). A gap is provided between the inner wall of the second through hole 33 and the outer wall of the liquid discharge pipe 40 so that the gas in the packaging bag 10 attached to the discharge port can be ventilated to the plurality of second openings 43 (see FIGS. 3 and 4). Figure).

The joint includes: a first air venting means for venting gas from the inside of the outer container 20 to the opening portion 24; and a second venting means for venting gas from the inside of the packaging bag 10 that is attached to the discharge port to the opening portion 24 And a second cover 60 that seals the opening portion 24. The first ventilation means has a plurality of first openings 35 of the joint bracket 30. The plurality of first openings 35 communicate from the periphery of the tubular portion 32 to the top surface 311 of the stem portion 31. The second ventilation means has a plurality of second openings 43. The plurality of second openings 43 are provided in the flange portion 41 of the discharge pipe 40, and the opening portion 24 communicates with the inside of the second through hole 33 of the joint bracket 30 (see FIGS. 3 and 4).

Moreover, when the second cover 60 is mounted, the joint prevents any one of the liquid and the gas from flowing out of the opening 24. Further, when the second cover 60 is removed, the gas in the outer container 20 and the gas in the package 10 attached to the discharge port are respectively subjected to the first ventilation before the liquid in the discharge pipe 40 is discharged from the opening portion 24. The means and the second ventilation means leak out of the opening 24.

The first opening 35 may be provided between the tubular portion 32 and the stem portion 31 from a slit extending from the periphery of the tubular portion 32 to the top surface 311 of the stem portion 31. The first opening 35 substantially communicates the gap provided between the joint bracket 30 and the injection discharge port 11 with the atmosphere (see FIGS. 3 and 4).

As shown in FIG. 3, the second opening 43 is formed in the through hole of the flange portion 41 of the liquid discharge pipe 40, and penetrates from the upper surface of the flange portion 41 to the periphery of the liquid discharge pipe 40. In Fig. 3, the O-ring is supported on the lower surface of the flange portion 41, and the second through hole 33 is sealed by adhering the O-ring to the top surface 311 of the stem portion 31. Further, the second opening 43 substantially communicates the gap between the inner wall of the second through hole 33 and the outer wall of the liquid discharge pipe 40 with the atmosphere (see FIGS. 3 and 4). As described above, the gap allows the gas to be vented to the internal space of the package 10 which is noted in the discharge port.

As shown in FIG. 3 or FIG. 4, the joint includes a first cover 50 that is screwed to the opening 24 of the outer container 20, and a second cover 60 that is screwed to the first cover 50. The first cover 50 has a fourth opening 52 having a size substantially equal to the outer dimension of the joint bracket 30 in a concentric shape on a metal or synthetic resin cover main body 51, and the cover main body 51 is formed on the inner side surface. The internal thread that is screwed to the outer surface of the opening portion 24 of the outer container 20 is formed with an external thread on the outer side surface. The joint bracket 30 is held by screwing and fastening the first cover 50 to the opening portion 24.

The second cover 60 is provided with a cover main body 61 and a bushing 62. The cover main body 61 is screwed to the first cover 50 provided on the opening 24, and has a light blocking property. The bushing 62 faces the cover main body 61. The interior is convex and has corrosion resistance. The bushing 62 includes an O-ring 63 that is in close contact with the surface of the flange portion 41 to seal the ventilation from the fluid passage 42.

The cover main body 61 is made of metal or synthetic resin, and is provided with an internal thread that is screwed to the first cover 50 on the inner circumference of the cover main body 61. When the second cover 60 has been tightened, the inner wall of the cover main body 61 abuts against the top surface 311 of the joint bracket 30. The cover main body 61 has a light-shielding property so that the medicine contained in the packaging bag 10 attached to the discharge port does not chemically change. Since the bushing 62 is likely to be in contact with the medicine contained in the packaging bag 10 which is attached to the discharge port, the bushing 62 is preferably made of a synthetic resin having corrosion resistance, and one end side of the bushing 62 is provided. The cover body 61 is press-fitted into the cover body 61 to integrate the bushing 62 with the cover body 61 (see FIGS. 3 and 4). The other end side of the bushing 62 protrudes toward the inside of the cap body 61, and supports the O-ring 63 at the front end face. The O-ring 63 is in close contact with the surface of the flange portion 41, and it is also possible to prevent any of the liquid and the gas from the fluid passage 42 from flowing out.

Further, not less than one vent hole 64 is provided on the side circumference of the cap body 61, and if the screwing with the first cap 50 is released, the outer container is before the liquid discharge opening portion 24 in the discharge pipe 40. The gas in the inside of the bag 20 and the gas in the packaging bag 10 which is attached to the discharge port are leaked to the outside of the opening portion 24 by the first ventilation means and the second ventilation means (see Fig. 3 or Fig. 4). As described above, the vent hole 64 is provided on the side periphery of the cap body 61, whereby when the second cap 60 is loosened, the adhesion of the O-ring 63 to the surface of the flange portion 41 is released, so that at least a plurality of second The gas in the opening 43 is discharged from the vent hole 64 to the outside. Further, it is possible to prevent the liquid in the discharge pipe 40 from being ejected.

<Photoresist filling step S10>

Hereinafter, an example of the present invention using the above-described dedicated container 1 will be described in accordance with the step diagram shown in Fig. 1. First, the photoresist liquid produced in the photoresist liquid supply facility 100 provided by the photoresist manufacturer or the like is filled in the dedicated container 1 by the photoresist filling step S10. Further, the photoresist liquid supply facility 100 is not necessarily required to be filled in a dedicated container, and the photoresist manufacturing apparatus is not necessarily required. That is, the concept of the photoresist liquid supply facility 100 also includes a relay base for supplying a photoresist to the user.

In the photoresist filling step S10, the dedicated container 1 is inserted into the outer container 20 from the opening 24 of the outer container 20 as shown in Fig. 5, as shown in Fig. 5(a), and as shown in Fig. 5. As shown in (b), the injection discharge port 11 is attached to the opening portion 24 of the outer container 20. At this time, the opening portion 24 of the outer container 20 has a convex shape that is shorter than the size of the height in the height direction of the injection/discharge port engaging portion 112, and the flange portion 112b of FIG. 4 abuts on the opening portion 24 The upper end of the step on the inner side surface is thereby supported by the package 10 attached to the discharge port in the outer container 20.

In this state, first, the packaging bag 10 which is attached to the discharge port is expanded by introducing nitrogen gas or compressed air from the first through hole 111a. Next, a filling tube (not shown) for filling the photoresist liquid is inserted into the first through hole 111a, and a predetermined amount of the photoresist liquid is filled through the filling tube. Thereby, the sealing system can be used to fill the photoresist without pollution.

Then, the joint bracket 30 is inserted into the injection discharge port 11, and then, the first cover 50 is screwed to the opening portion 24 to fix the injection discharge port 11 and the joint bracket 30, and the package 10 attached to the discharge port is supported. Then, the tube 44 of the liquid outlet tube 40 is inserted into the second through hole 33 of the joint bracket 30 to mount the liquid outlet tube 40, and then the second cover 60 is screwed to the first cover 50 to seal the liquid outlet tube 40. The top surface is to cover the opening portion 24. Thereby, the dedicated container 1 is sealed in the state in which the opening portion 24 and the discharge port 11 are sealed.

<Photoresist supply step S20>

Next, the dedicated container 1 is transported from the photoresist supply facility 100 to the photoresist liquid use facility 200 of the user. In the above-described photoresist liquid use facility 200, one or a plurality of photoresist liquid coating devices such as a spin coater or a slit coater are used, and each of the photoresist liquid application devices is exclusively used by a substantially sealed system. The container 1 is connected to the supply pipe via a supply joint or the like to perform a supply operation of the photoresist. The supply joint is not particularly limited as long as it can maintain the closed system, and a previously known joint can be used.

Further, when the connection is made, in the second or third drawing, when the second cover 60 is removed, the gas in the outer container 20 and the inflow and discharge are arranged before the liquid discharge opening portion 24 in the discharge pipe 40. The gas in the outlet packaging bag 10 leaks out of the opening 24 by the first ventilation means and the second ventilation means, so that the liquid in the discharge pipe 40 can be prevented from being discharged outside the opening 24. That is, in the joint, the liquid in the liquid discharge pipe 40, the gas in the outer container 20, and the gas in the packaging bag 10 attached to the discharge port are individually sealed by the second cover 60. When the second cover 60 is removed, the pressure in the discharge pipe 40, the pressure in the outer container 20, and the pressure in the package 10 attached to the discharge port immediately coincide with the atmospheric pressure, thereby preventing the liquid in the discharge pipe 40. It is discharged to the outside of the opening portion 24.

As described above, when the photoresist liquid is used, that is, when the photoresist liquid is ejected, the photoresist liquid can be ejected from the injection discharge port 11 by the discharge pipe 40. Thereby, the photoresist liquid in the packaging bag 10 which is attached to the discharge port is taken out, and the above-mentioned packaging bag 10 which is attached to the discharge port is used as a used container which is almost empty. When the discharge of the photoresist is completed, the supply joint is removed and the discharge pipe 40 is pulled out, and the opening 24 is sealed by the second cover 60. Furthermore, the packaging bag 10, which is attached to the discharge port at this time, is finally in a contracted state after the photoresist is removed.

<Photoresist recovery step S30>

The present invention is characterized in that the dedicated container 1 (used container) after the above-mentioned photoresist is removed is not directly returned to the photoresist manufacturer, but is used again in the photoresist recovery step. That is, the used container is used as a recovery container in the photoresist liquid recovery step S30. The interval between them is appropriately set depending on the number of used containers and the operation state of the photoresist coating device. That is, in the first drawing, for convenience of explanation, the photoresist liquid recovery step S30 will be described after the photoresist liquid supply step S20. However, in the actual photoresist liquid coating apparatus, S20 and S30 are simultaneously arranged in parallel. The used photoresist is supplied to the used container produced in step S20 and used in the current photoresist liquid recovery step S30. Hereinafter, the recycling operation will be described.

An example of the photoresist liquid recovery system shown in Fig. 6 is composed of the following members: a rotary coater 250 as an example of a photoresist coating device, and a recovery pipe 253 for recycling to be disposed in spin coating. The used photoresist 252 generated in the recovery tank 251 around the rotating portion of the machine 250; the recovery pump 254, which is disposed in the recovery pipe 253; the above-mentioned used container, that is, the dedicated container 1, is connected a switching valve 259 corresponding to the switching means of the present invention, which branches from the middle of the recovery pipe 253, and a pipe 255 which branches from the switching valve 259 and extends from the recovery pipe 253; and the cleaning liquid A recovery tank 256 is connected to the front end of the pipe 255.

First, after the second cover 60, which is a used container, that is, the dedicated container 1, is removed, a recovery tube (not shown) for recovering the photoresist is attached. The structure of the recovery pipe constituting the recovery joint can be closely inserted into the second through hole 33 of the joint bracket 30, similarly to the above-described liquid discharge pipe 40. The recovery pipe 253 is connected to the recovery pipe through a closed system.

When the spin coater 250 is operated, the photoresist is applied by the coating portion 258 on the substrate 257. The photoresist liquid is diffused to the surroundings by the centrifugal force, and the remaining used photoresist liquid 252 is accumulated in the recovery tank 251. Here, the recovery pump 254 is operated, whereby the used photoresist liquid 252 is recovered to the dedicated container 1 via the recovery pipe 253. That is, in the packaging bag 10 in which the dedicated container 1 is attached to the discharge port, the used photoresist liquid 252 is again filled.

Further, as described above, the packaging bag 10 which is attached to the discharge port at the start of the recovery operation is in a contracted state by the step of ejecting in the photoresist supply step S20, and the capacity of the bag is not made only by refilling. Fully restored. Therefore, the fillable capacity (recoverable capacity) at this time is smaller than the capacity of the photoresist supply step S20 in which the packaging bag 10 which is attached to the discharge port is expanded by nitrogen or air in advance. However, since the amount of the actual coating of the photoresist and the amount of the used photoresist that has been used have been reduced, the photoresist of the coating device can be fully recovered and supplied to the coating device by using a dedicated container of the same capacity. A used amount of photoresist that is equivalent to the amount of liquid.

In addition, the switching valve 259 and the cleaning liquid recovery tank 256 are used to wash the recovery pipe 253 by a diluent or the like, and the recovery liquid is supplied to the cleaning liquid recovery tank 256 side during the predetermined cleaning operation. Thereby, it is possible to effectively prevent contamination other than the photoresist from entering the dedicated container 1.

After the completion of the predetermined amount of recovery, the recovery pipe is removed from the dedicated container 1, and the discharge pipe 40 is again inserted and the second cover 60 is attached to seal. This is sent back to the photoresist supply facility 100 of a photoresist manufacturer or the like. Thereby, the dedicated container 1 functions as a supply and collection container to help improve the recovery efficiency. Further, the photoresist liquid recovery step S30 is preferably performed in units of the photoresist liquid application apparatus in the same manner as the photoresist liquid supply step S20.

<Composition confirmation step S40>

The refilled dedicated container 1 is returned to the photoresist supply facility 100, and a composition confirmation step S40 is performed in the receiving phase. The above steps are steps for confirming the composition, type, and the like of the photoresist liquid for each dedicated container to avoid contamination of various photoresist liquids from a plurality of different photo resist liquid use facilities 200. The confirmation method (composition confirmation means) is not particularly limited, and examples thereof include a method of measuring the concentration or the type using infrared rays or near-infrared spectroscopy.

<Reuse step S50>

Then, by using the same method as the photoresist supply step S20, the used photoresist is removed, and the photoresist is reused in the reuse step S50. The method and means for recycling are not particularly limited, and previously known methods and means can be used. Furthermore, the self-contained container 1 after the end of the ejection is removed, and the packaging bag 10 attached to the discharge port is removed and discarded. After the outer container 20 is washed, a new package 10, which is attached to the discharge port, is installed for the photoresist filling step S10.

As described above, according to the present invention, the recovery efficiency of the photoresist can be greatly improved, the recovery cost can be reduced, and the reuse ratio of the photoresist can be improved.

1. . . Special container

10. . . Note the bag into the discharge

11. . . Injection outlet

12. . . Bag body

20. . . External container

twenty one. . . Bottom plate

twenty two. . . Side wall

twenty three. . . roof

twenty four. . . Opening

24a. . . External thread

25. . . Handle

30. . . Connector bracket

31. . . Tube seat

32. . . Tube

33. . . Second through hole

34. . . Flange

35. . . First opening

40. . . Liquid outlet tube

41. . . Flange

42. . . Fluid channel

43. . . Second opening

44. . . tube

50. . . First cover

51. . . Cover body

52. . . Fourth opening

60. . . Second cover

61. . . Cover body

62. . . bushing

63. . . O-ring

64. . . Vent

100. . . Photoresist supply facility

111. . . Injection port outlet installation

111a. . . First through hole

112. . . Injection into the outlet buckle

112a. . . Cylindrical part

112b. . . Flange

200. . . Photoresist use facility

250. . . Rotary coater

251. . . Recycling tank

252. . . Used photoresist

253. . . Recycling piping

254. . . Recovery pump

255. . . Piping

256. . . Cleaning solution recovery tank

257. . . Substrate

258. . . Coating department

259. . . Switching valve

311. . . Top surface

S10. . . Photoresist filling step

S20. . . Photoresist supply step

S30. . . Photoresist recovery step

S40. . . Composition confirmation step

S50. . . Reuse step

Fig. 1 is a flow chart showing an example of the present invention.

Fig. 2 is a longitudinal sectional view showing an embodiment of a dedicated container (supply and recovery container).

Fig. 3 is an enlarged cross-sectional view showing the opening portion of Fig. 2 in an enlarged manner.

Fig. 4 is a cross-sectional exploded assembly view of the opening portion of Fig. 2;

Fig. 5 is a view showing a state in which the packaging bag attached to the discharge port is housed in the outer container, and Fig. 5(a) is a partial perspective view showing a state in which the packaging bag attached to the discharge port is inserted into the outer container. Fig. (b) is a partial perspective view showing a state in which the outer bag is housed in the packaging bag attached to the discharge port.

Fig. 6 is a schematic view showing an example of a photoresist liquid recovery system.

1. . . Special container

250. . . Rotary coater

251. . . Recycling tank

252. . . Used photoresist

253. . . Recycling piping

254. . . Recovery pump

255. . . Piping

256. . . Cleaning solution recovery tank

257. . . Substrate

258. . . Coating department

259. . . Switching valve

Claims (10)

A photoresist liquid supply and recovery system comprising: a photoresist liquid application device; a supply and recovery container having a predetermined capacity, which is also used for supplying a photoresist liquid to the photoresist liquid application device, and from the photoresist liquid The coating device collects the used photoresist liquid; the supply pipe is used when the photoresist is supplied, and can be connected to the supply and recovery container in an airtight state; and the recovery pipe is used for recycling the above-mentioned used When the photoresist is used, it can be connected to the supply and recovery container in an airtight state, and the supply and collection container is a double container composed of an outer container and a packaging bag attached to the discharge port, and the outer container has an opening. The packaging bag that is attached to the discharge port is used as the inner bag of the outer container, and is formed by joining the injection discharge port to the main body of the packaging bag. The packaging bag main body can be housed in the outer container, and the injection discharge port can be detached. In the opening of the outer container, a supply joint for connecting the supply pipe is attached to the injection discharge port at the time of the supply. Installation for recovery joint connecting the recovery pipe of the recovery. The photoresist liquid supply recovery system according to claim 1, wherein the recovery pipe is connected to a recovery pump for recovering the used photoresist or piping cleaning liquid. The photoresist liquid supply and recovery system according to claim 1 or 2, wherein the recovery pipe is connected to a cleaning liquid recovery tank for recovering a solution containing the pipe cleaning liquid, and is provided for the supply. And means for switching between the recovery container and the cleaning liquid recovery tank. The photoresist liquid supply and recovery system according to claim 1, wherein the composition confirmation means for analyzing the composition of the used photoresist after the recovery is provided. The photoresist liquid supply and recovery system according to the first aspect of the invention, comprising the recycling means for recycling the used photoresist after the recovery. A method for recovering a photoresist liquid, which uses a special container of a predetermined capacity, supplies a photoresist liquid from a photoresist supply facility to a photoresist liquid use facility, and also uses the above-mentioned special container as a photoresist liquid recovery container for recycling the above The photoresist is used in a photoresist used in a facility. The special container is a double container composed of an outer container and a package attached to the discharge port. The outer container has an opening, and the above-mentioned package is attached to the discharge port. The inner bag used as the outer container is formed by joining the injection discharge port to the packaging bag main body, the packaging bag main body can be housed in the outer container, and the injection discharge port can be detachably attached to the opening of the outer container. The above-mentioned injection discharge port is installed at the time of the above supply to connect the above supply A supply joint for the piping is provided with a recovery joint for connecting the above-mentioned recovery piping at the time of the above-mentioned recovery. The method for recovering a photoresist according to claim 6, wherein the used photoresist is reused after the above recovery. The method for recovering a photoresist according to claim 6, wherein the photoresist use facility is provided with a photoresist coating device, and the photoresist is applied to the photoresist by a substantially sealing system. The cloth device supplies a supply operation of the photoresist liquid and a recovery operation of the above-described used photoresist liquid from the photoresist liquid application device. The method for recovering a photoresist according to claim 8, wherein the supply operation and the recovery operation are performed in units of the photoresist coating apparatus. The method for recovering a photoresist according to claim 8, wherein the special container is a double container composed of an outer container having an opening and an inner bag of the outer container, and is self-filled in the supplying operation. The inner bag of the photoresist liquid is supplied to the photoresist liquid application device, and in the above-mentioned recovery operation, the inner bag after the supply operation of the substantially empty bag is refilled with the used Photoresist.