TWI412828B - Display panel - Google Patents
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- TWI412828B TWI412828B TW099125386A TW99125386A TWI412828B TW I412828 B TWI412828 B TW I412828B TW 099125386 A TW099125386 A TW 099125386A TW 99125386 A TW99125386 A TW 99125386A TW I412828 B TWI412828 B TW I412828B
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Geometry (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
Description
本發明是有關於一種顯示面板,且特別是有關於一種液晶顯示面板。 The present invention relates to a display panel, and more particularly to a liquid crystal display panel.
目前市場對於薄膜電晶體液晶顯示器(TFT-LCD)皆朝向高對比(contrast ratio)、無灰階反轉(gray scale inversion)、高亮度(brightness)、高色飽和度(color saturation)、快速反應(response)以及廣視角(viewing angle)等方向發展。目前常見的廣視角技術包括:扭轉向列型液晶(TN)加上廣視角膜(wide viewing film)、共平面切換式(In-Plane Switching,IPS)液晶顯示器、邊際場切換式(Fringe Field Switching,FFS)液晶顯示器與多域垂直配向式(Multi-domain Vertical Alignment,MVA)液晶顯示器。 Currently, the market for thin film transistor liquid crystal displays (TFT-LCDs) is oriented toward high contrast ratio, gray scale inversion, high brightness, high color saturation, and fast response. (response) and a wide viewing angle (viewing angle) and other directions. Commonly used wide viewing angle technologies include: twisted nematic liquid crystal (TN) plus wide viewing film, In-Plane Switching (IPS) liquid crystal display, and marginal field switching (Fringe Field Switching) , FFS) liquid crystal display and Multi-domain Vertical Alignment (MVA) liquid crystal display.
對於IPS液晶顯示器以及FFS液晶顯示器來說,通常是由主動陣列基板、設置於主動陣列基板之上之彩色濾光基板、以及設置於主動陣列基板與彩色濾光基板之間之液晶層所構成。其中,主動陣列基板由一主動陣列設置於第一基板(亦稱為第一基材)內表面上所構成,且主動陣列包含多個畫素電極及共用電極。而彩色濾光基板由一彩色濾光圖案設置於第二基板(亦稱為第二基材)內表面上所構成。因為,當使用者的手指碰觸到顯示面板時造成顯示面板內部的電場改變而影響顯示品質,因此,需要在彩色濾 光基板的外表面另外形成一層透光導電層(亦稱為額外的透光導電層)。即另外形成一層透光導電層於第二基板之外表面上,此外表面係與彩色濾光圖案其設置於第二基板之內表面為不同表面,以避免手指碰觸到顯示面板時造成顯示面板內部的電場改變而影響顯示品質。然而,此透光導電層往往會使顯示面板的穿透度下降。 The IPS liquid crystal display and the FFS liquid crystal display are generally composed of an active array substrate, a color filter substrate disposed on the active array substrate, and a liquid crystal layer disposed between the active array substrate and the color filter substrate. The active array substrate is formed by an active array disposed on an inner surface of the first substrate (also referred to as a first substrate), and the active array includes a plurality of pixel electrodes and a common electrode. The color filter substrate is formed by a color filter pattern disposed on the inner surface of the second substrate (also referred to as a second substrate). Because when the user's finger touches the display panel, the electric field inside the display panel changes and the display quality is affected. Therefore, color filtering is required. A light-transmissive conductive layer (also referred to as an additional light-transmitting conductive layer) is additionally formed on the outer surface of the light substrate. That is, a light-transmissive conductive layer is additionally formed on the outer surface of the second substrate, and the surface is different from the color filter pattern on the inner surface of the second substrate to prevent the display panel from being touched by the finger. The internal electric field changes to affect the display quality. However, this light-transmitting conductive layer tends to lower the transmittance of the display panel.
本發明提供一種顯示面板,其可以不需要在彩色濾光基板的外表面另外設置透光導電層,因此可避免顯示面板的穿透度下降。 The present invention provides a display panel which can eliminate the need to separately provide a light-transmitting conductive layer on the outer surface of the color filter substrate, thereby avoiding a decrease in the transmittance of the display panel.
本發明提出一種顯示面板,其包括第一基板、位於第一基板對向的第二基板以及位於第一基板與第二基板之間的顯示介質。第一基板上包括設置有掃描線、資料線以及與掃描線及資料線電性連接的主動元件。第二基板上包括設置有共用電極層、覆蓋共用電極層的絕緣層、位於絕緣層上的畫素電極以及位於絕緣層上的接觸結構,其中接觸結構與畫素電極電性連接並且與位於第一基板上之主動元件電性連接。 The present invention provides a display panel including a first substrate, a second substrate opposite the first substrate, and a display medium between the first substrate and the second substrate. The first substrate includes an active component provided with a scan line, a data line, and an electrical connection with the scan line and the data line. The second substrate includes a common electrode layer, an insulating layer covering the common electrode layer, a pixel electrode on the insulating layer, and a contact structure on the insulating layer, wherein the contact structure is electrically connected to the pixel electrode and is located at the The active components on a substrate are electrically connected.
本發明提出一種顯示面板,其包括第一基板、位於第一基板對向的第二基板以及位於第一基板與第二基板之間的顯示介質。第一基板上包括設置有掃描線、資料線以及與掃描線及資料線電性連接的主動元件。第二基板包括設置有畫素電極、與畫素電極電性連接並且與位於第一基板 上之主動元件電性連接的接觸結構以及與畫素電極交錯設置的共用電極。 The present invention provides a display panel including a first substrate, a second substrate opposite the first substrate, and a display medium between the first substrate and the second substrate. The first substrate includes an active component provided with a scan line, a data line, and an electrical connection with the scan line and the data line. The second substrate includes a pixel electrode, is electrically connected to the pixel electrode, and is located on the first substrate A contact structure electrically connected to the active device and a common electrode interleaved with the pixel electrodes.
基於上述,本發明將顯示面板中的畫素電極以及共用電極層(共用電極)設置在第二基板上。因此當手指碰觸到顯示面板(即第二基板)時不會造成顯示面板內部的電場改變。因此,本發明不需另外在第二基板的外表面形成透光導電層,因而可以避免顯示面板的穿透度下降。 Based on the above, the present invention sets the pixel electrode and the common electrode layer (common electrode) in the display panel on the second substrate. Therefore, when the finger touches the display panel (ie, the second substrate), the electric field inside the display panel is not changed. Therefore, the present invention does not need to additionally form a light-transmitting conductive layer on the outer surface of the second substrate, so that the decrease in the transmittance of the display panel can be avoided.
為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the present invention will be more apparent from the following description.
圖1是根據本發明之一實施例之顯示面板的剖面示意圖。圖2A是圖1所示之顯示面板的第一基板的上視圖。圖2B是圖1所示之顯示面板的第二基板的上視圖。請參照圖1、圖2A以及圖2B,本實施例之顯示面板包括第一基板100、第二基板130以及顯示介質150,其中顯示介質130為於第一基板100與第二基板130之間,其可包括液晶分子、電泳顯示介質、或是其它可適用的介質。在本發明下列實施例中的顯示介質係以液晶分子當作範例,但不限於此。再者,在本發明下列實施例中的液晶分子,較佳地,係以可被水平電場轉動或切換的液晶分子或者是可被橫向電場轉動或切換的液晶分子為範例,但不限於此。 1 is a schematic cross-sectional view of a display panel in accordance with an embodiment of the present invention. 2A is a top view of the first substrate of the display panel shown in FIG. 1. 2B is a top view of the second substrate of the display panel shown in FIG. 1. Referring to FIG. 1 , FIG. 2A and FIG. 2B , the display panel of the present embodiment includes a first substrate 100 , a second substrate 130 , and a display medium 150 . The display medium 130 is between the first substrate 100 and the second substrate 130 . It may include liquid crystal molecules, electrophoretic display media, or other suitable media. The display medium in the following embodiments of the present invention is exemplified by liquid crystal molecules, but is not limited thereto. Further, the liquid crystal molecules in the following embodiments of the present invention are preferably exemplified by liquid crystal molecules which can be rotated or switched by a horizontal electric field or liquid crystal molecules which can be rotated or switched by a lateral electric field, but are not limited thereto.
值得一提的是,為了清楚說明本發明,圖2A與圖2B僅繪示出顯示面板中的其中一個畫素結構為例來說明。此 領域技術人員應當可以瞭解,顯示面板是由多個陣列排列的畫素結構(又稱為畫素陣列)所構成。換言之,顯示面板之第一基板上的畫素陣列結構例如是如圖10A所示,其是由多個如圖2A所示之畫素結構所構成。顯示面板之第二基板上的畫素陣列結構例如是如圖10B所示,其是由多個如圖2B所示之畫素結構所構成。在以下針對圖2A與圖2B之說明主要是以單一個畫素結構來作詳細說明,然亦可同時參照圖10A以及圖10B來瞭解本發明所主張之顯示面板。 It is to be noted that, in order to clearly illustrate the present invention, FIG. 2A and FIG. 2B only illustrate one of the pixel structures in the display panel as an example. this It should be understood by those skilled in the art that the display panel is composed of a plurality of arrayed pixel structures (also referred to as pixel arrays). In other words, the pixel array structure on the first substrate of the display panel is, for example, as shown in Fig. 10A, which is composed of a plurality of pixel structures as shown in Fig. 2A. The pixel array structure on the second substrate of the display panel is, for example, as shown in Fig. 10B, which is composed of a plurality of pixel structures as shown in Fig. 2B. The description of FIG. 2A and FIG. 2B is mainly described in detail with a single pixel structure. However, the display panel claimed in the present invention can be understood by referring to FIG. 10A and FIG. 10B at the same time.
第一基板100包括基材101、掃描線SL、資料線DL、主動元件T。基材101(亦可稱為第一基材)之材質可為玻璃、石英、有機聚合物、或是不透光/反射材料(例如:導電材料、晶圓、陶瓷、或其它可適用的材料)、或是其它可適用的材料。 The first substrate 100 includes a substrate 101, a scanning line SL, a data line DL, and an active device T. The material of the substrate 101 (also referred to as the first substrate) may be glass, quartz, organic polymer, or an opaque/reflective material (eg, conductive material, wafer, ceramic, or other applicable material). ) or other applicable materials.
掃描線SL與資料線DL設置於基材101上,且掃描線SL與資料線DL彼此交錯設置。換言之,資料線DL的延伸方向與掃描線SL的延伸方向不平行,較佳的是,資料線DL的延伸方向與掃描線SL的延伸方向垂直。另外,掃描線SL與資料線DL屬於不同的膜層。基於導電性的考量,掃描線SL與資料線DL一般是使用金屬材料。然,本發明不限於此,根據其他實施例,掃描線SL與資料線DL也可以使用其他導電材料(例如:合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物、或其它合適的材料)、或是金屬材料與其它導材料的堆疊層。 The scan line SL and the data line DL are disposed on the substrate 101, and the scan line SL and the data line DL are alternately arranged with each other. In other words, the extending direction of the data line DL is not parallel to the extending direction of the scanning line SL. Preferably, the extending direction of the data line DL is perpendicular to the extending direction of the scanning line SL. In addition, the scan line SL and the data line DL belong to different film layers. Based on the conductivity considerations, the scan line SL and the data line DL are generally made of a metal material. However, the present invention is not limited thereto. According to other embodiments, other conductive materials may be used for the scan line SL and the data line DL (for example, an alloy, a nitride of a metal material, an oxide of a metal material, an oxynitride of a metal material, Or other suitable material), or a stacked layer of metal material and other conductive materials.
主動元件T例如是底部閘極型薄膜電晶體,其包括閘極G、通道C、源極S以及汲極D。閘極G與掃描線SL電性連接。通道C位於閘極G的上方。此外,閘極與通道C之間更包括設置有一層絕緣層102,其又可稱為閘極絕緣層。源極S以及汲極D位於通道C的上方,且源極S與資料線DL電性連接。再者,在主動元件T上更覆蓋有一層保護層104。根據另一實施例,主動元件T也可以是頂部閘極型薄膜電晶體,即閘極G位於通道C的上方。 The active device T is, for example, a bottom gate type thin film transistor including a gate G, a channel C, a source S, and a drain D. The gate G is electrically connected to the scan line SL. Channel C is located above gate G. In addition, the gate and the channel C further include an insulating layer 102, which may also be referred to as a gate insulating layer. The source S and the drain D are located above the channel C, and the source S is electrically connected to the data line DL. Furthermore, the active element T is further covered with a protective layer 104. According to another embodiment, the active device T can also be a top gate type thin film transistor, that is, the gate G is located above the channel C.
根據本實施例,在主動元件T上方的保護層104上可更設置有一層導電層106a且在保護層104中可更設置有導電層106b。導電層106a、106b的材質例如是金屬或是金屬氧化物。導電層106a覆蓋主動元件T可以遮蔽主動元件T於操作時所產生的光電效應。而導電層106b是位於保護層104中以與主動元件T的汲極D電性連接。再者,導電層106b可選擇性地與導電層106a電性連接與否。在本實施例導電層106b並未與導電層106a電性連接為範例,但不限於此。在本發明中,導電層106a、106b並非必要構件,因此在其他實施例中可以省略導電層106a、106b的製作。 According to the embodiment, a conductive layer 106a may be further disposed on the protective layer 104 above the active device T and a conductive layer 106b may be further disposed in the protective layer 104. The material of the conductive layers 106a and 106b is, for example, a metal or a metal oxide. The conductive layer 106a covering the active device T can shield the photoelectric effect generated by the active device T during operation. The conductive layer 106b is located in the protective layer 104 to be electrically connected to the drain D of the active device T. Moreover, the conductive layer 106b can be selectively electrically connected to the conductive layer 106a. In the present embodiment, the conductive layer 106b is not electrically connected to the conductive layer 106a as an example, but is not limited thereto. In the present invention, the conductive layers 106a, 106b are not essential components, so fabrication of the conductive layers 106a, 106b may be omitted in other embodiments.
第二基板130設置在第一基板100的對向,其包括基材(亦可稱為第二基材)110、共用電極層116、絕緣層118、畫素電極120以及接觸結構124。基材110之材質可為玻璃、石英、有機聚合物、或其它合適的材料。 The second substrate 130 is disposed opposite to the first substrate 100 and includes a substrate (also referred to as a second substrate) 110 , a common electrode layer 116 , an insulating layer 118 , a pixel electrode 120 , and a contact structure 124 . The material of the substrate 110 may be glass, quartz, an organic polymer, or other suitable material.
根據本發明之一實施例,第二基板130包括更包括彩 色濾光圖案112a、遮光圖案112b以及平坦層114。彩色濾光圖案112a以及遮光圖案112b設置在基材110上以構成一彩色濾光陣列。對於一個畫素結構來說,其彩色濾光圖案112a可為紅色、綠色與藍色三種顏色之任一。遮光圖案112b可為金屬材料或是黑色樹脂材料,其又可稱為黑矩陣。平坦層114覆蓋彩色濾光圖案112a以及遮光圖案112b。較佳地,平坦層114為一層未圖案化的膜層,但不以此為限。其中,平坦層114之材料包含無機材料(例如:氧化矽、氮化矽、氮氧化矽、其它合適的材料、或上述至少二種材料的堆疊層)、有機材料(例如:聚酯類(PET)、聚烯類、聚丙醯類、聚碳酸酯類、聚環氧烷類、聚苯烯類、聚醚類、聚酮類、聚醇類、聚醛類、或其它合適的材料、或上述之組合)、或其它合適的材料、或上述之組合。 According to an embodiment of the invention, the second substrate 130 includes more colors The color filter pattern 112a, the light shielding pattern 112b, and the flat layer 114. The color filter pattern 112a and the light shielding pattern 112b are disposed on the substrate 110 to constitute a color filter array. For a pixel structure, the color filter pattern 112a may be any of three colors of red, green, and blue. The light shielding pattern 112b may be a metal material or a black resin material, which may also be referred to as a black matrix. The flat layer 114 covers the color filter pattern 112a and the light blocking pattern 112b. Preferably, the flat layer 114 is an unpatterned film layer, but is not limited thereto. Wherein, the material of the flat layer 114 comprises an inorganic material (for example: cerium oxide, cerium nitride, cerium oxynitride, other suitable materials, or a stacked layer of at least two materials mentioned above), an organic material (for example: polyester (PET) ), polyenes, polypropylenes, polycarbonates, polyalkylene oxides, polyphenylenes, polyethers, polyketones, polyalcohols, polyaldehydes, or other suitable materials, or Combination), or other suitable material, or a combination of the above.
共用電極層116設置在平坦層114上。共用電極層116為一層未圖案化的膜層,因此其是全面地覆蓋在基材110(平坦層114)上。共用電極層116為透明導電層,其材質包括金屬氧化物,例如是銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、或其它合適的氧化物、或者是上述至少二者之堆疊層。此外,共用電極層116是電性連接至共用電壓(common voltage),因此共用電極層116又可稱為參考電極。再者,共用電極層116會傳遞共用訊號,例如:共用電位,但不限於此。 The common electrode layer 116 is disposed on the flat layer 114. The common electrode layer 116 is a layer of unpatterned film, so it is entirely covered on the substrate 110 (flat layer 114). The common electrode layer 116 is a transparent conductive layer, and the material thereof includes a metal oxide such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, or other suitable oxide. Or a stacked layer of at least two of the above. In addition, the common electrode layer 116 is electrically connected to a common voltage, and thus the common electrode layer 116 may be referred to as a reference electrode. Furthermore, the common electrode layer 116 transmits a common signal, for example, a common potential, but is not limited thereto.
絕緣層118覆蓋共用電極層116。絕緣層118的材料包含無機材料(例如:氧化矽、氮化矽、氮氧化矽、其它合 適的材料、或上述至少二種材料的堆疊層)、有機材料(例如:)、或其它合適的材料、或上述之組合。 The insulating layer 118 covers the common electrode layer 116. The material of the insulating layer 118 comprises an inorganic material (for example: cerium oxide, cerium nitride, cerium oxynitride, other combinations) Suitable materials, or stacked layers of at least two of the above materials, organic materials (eg,), or other suitable materials, or combinations thereof.
畫素電極120形成在絕緣層118上。根據本實施例,畫素電極120具分支狀圖案,如圖2B所示。更詳細來說,畫素電極120的內部具有多個平行排列的細長開口120a,以暴露出以下的絕緣層118。畫素電極120可為透明導電材料,其包括金屬氧化物,例如是銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、或其它合適的氧化物、或者是上述至少二者之堆疊層。此外,如圖10B所示,各個畫素結構中之畫素電極120是彼此分離的。 The pixel electrode 120 is formed on the insulating layer 118. According to the present embodiment, the pixel electrode 120 has a branched pattern as shown in FIG. 2B. In more detail, the inside of the pixel electrode 120 has a plurality of elongated openings 120a arranged in parallel to expose the following insulating layer 118. The pixel electrode 120 can be a transparent conductive material including a metal oxide such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, or other suitable oxide. Or a stacked layer of at least two of the above. Further, as shown in FIG. 10B, the pixel electrodes 120 in the respective pixel structures are separated from each other.
接觸結構124位於絕緣層118上,且接觸結構124與畫素電極120電性連接並且與第一基板上130之主動元件T電性連接。在圖1及圖2A與圖2B的實施例中,接觸結構124是由絕緣間隙物122與覆蓋絕緣間隙物122的畫素電極120所構成。而且,接觸結構124與第一基板100上的導電層106b電性接觸,以使第二基板130上的畫素電極120與第一基板100上的主動元件T電性連接。當然,根據其他實施例,倘若第一基板100上不設置導電層106b,那麼接觸結構124是直接與第一基板100上的主動元件T電性連接,以使第二基板130上的畫素電極120與第一基板100上的主動元件T電性連接。 The contact structure 124 is located on the insulating layer 118, and the contact structure 124 is electrically connected to the pixel electrode 120 and electrically connected to the active device T of the first substrate 130. In the embodiment of FIGS. 1 and 2A and 2B, the contact structure 124 is formed of an insulating spacer 122 and a pixel electrode 120 covering the insulating spacer 122. Moreover, the contact structure 124 is in electrical contact with the conductive layer 106b on the first substrate 100 to electrically connect the pixel electrode 120 on the second substrate 130 with the active device T on the first substrate 100. Of course, according to other embodiments, if the conductive layer 106b is not disposed on the first substrate 100, the contact structure 124 is directly electrically connected to the active device T on the first substrate 100, so that the pixel electrode on the second substrate 130 is The 120 is electrically connected to the active device T on the first substrate 100.
值得一提的是,如圖10B所示,在第二基板之每一個畫素結構中都分別設置有一個絕緣間隙物122,且每一畫素電極120覆蓋對應的絕緣間隙物122,以使第二基板上 的各畫素電極120與對應的主動元件T電性連接。 It is to be noted that, as shown in FIG. 10B, an insulating spacer 122 is disposed in each of the pixel structures of the second substrate, and each of the pixel electrodes 120 covers the corresponding insulating spacer 122 so that On the second substrate Each of the pixel electrodes 120 is electrically connected to the corresponding active device T.
如同以上所述,本發明是將畫素電極120設置在第二基板130上,且利用接觸結構124將主動元件T與畫素電極120電性連接。因此經由主動元件T的驅動訊號(例如:畫素電位,但不限於此)便可透過接觸結構124而傳遞至第二基板130上的畫素電極120,進而操控位於畫素電極120上的顯示介質150。而由於共用電極層116以及畫素電極120都是設置在第二基板130上。因此當手指碰觸到顯示面板(第二基板130的外表面)時就不會造成顯示面板內部的電場改變。因此,本發明不需另外在第二基板130的外表面形成透光導電層,因而可以避免顯示面板的穿透度下降的問題。此外,因共用電極層116是設置在第二基板130上,因此共用電極層116就不會與第一基板100上的掃描線SL及資料線DL產生耦合效應而影響掃描線SL及資料線DL上的訊號傳遞。 As described above, in the present invention, the pixel electrode 120 is disposed on the second substrate 130, and the active device T is electrically connected to the pixel electrode 120 by using the contact structure 124. Therefore, the driving signal (for example, the pixel potential, but not limited thereto) via the active device T can be transmitted to the pixel electrode 120 on the second substrate 130 through the contact structure 124, thereby controlling the display on the pixel electrode 120. Medium 150. The common electrode layer 116 and the pixel electrode 120 are both disposed on the second substrate 130. Therefore, when the finger touches the display panel (the outer surface of the second substrate 130), the electric field inside the display panel is not changed. Therefore, the present invention does not need to additionally form a light-transmitting conductive layer on the outer surface of the second substrate 130, so that the problem of a decrease in the transmittance of the display panel can be avoided. In addition, since the common electrode layer 116 is disposed on the second substrate 130, the common electrode layer 116 does not have a coupling effect with the scan lines SL and the data lines DL on the first substrate 100, thereby affecting the scan lines SL and the data lines DL. Signal transmission on.
圖3是根據本發明之另一實施例之顯示面板的剖面示意圖。請參照圖3,圖3之實施例與圖1之實施例相似,因此相同的元件以相同的符號表示,且不再重複贅述。圖3之實施例與圖1之實施例不同之處在於,在第一基板100上的主動元件T(薄膜電晶體),其源極S與汲極D的材質包括金屬或是金屬氧化物。由於源極S與汲極D的材質包括金屬或是金屬氧化物(例如是銦錫氧化物或是銦鋅氧化物),因此此實施例可以省去保護層的製作,也就是不再主動元件T上覆蓋保護層,而使主動元件T裸露出來。而接 觸結構124是直接與裸露出來的主動元件T的汲極D電性接觸。 3 is a cross-sectional view of a display panel in accordance with another embodiment of the present invention. Referring to FIG. 3, the embodiment of FIG. 3 is similar to the embodiment of FIG. 1. Therefore, the same components are denoted by the same reference numerals and the description thereof will not be repeated. The embodiment of FIG. 3 differs from the embodiment of FIG. 1 in that the active device T (thin film transistor) on the first substrate 100 has a source S and a drain D material including a metal or a metal oxide. Since the material of the source S and the drain D includes a metal or a metal oxide (for example, indium tin oxide or indium zinc oxide), this embodiment can omit the fabrication of the protective layer, that is, no active components. The protective layer is covered on the T, and the active device T is exposed. And pick up The contact structure 124 is in direct electrical contact with the exposed drain D of the active device T.
圖4是根據本發明之另一實施例之顯示面板的剖面示意圖。請參照圖4,圖4之實施例與圖1及圖3之實施例相似,因此相同的元件以相同的符號表示,且不再重複贅述。圖4之實施例與圖1及圖3之實施例不同之處在於,第一基板100上更包括一或多個堆疊圖案140(圖式中僅畫出一個,但不限於此,可以二個以上),且主動元件T的汲極D覆蓋堆疊圖案140,而且堆疊圖案140是對應第二基板130上之接觸結構124設置。堆疊圖案140可以是單一膜層或是多層膜層,且堆疊圖案140也可以是多個具有不同尺寸的圖案。由於堆疊圖案140可將主動元件T的汲極D墊高,因此可以增加主動元件T的汲極D與接觸結構124之間的導電效果。本實施例中,較佳地,堆疊圖案140之電位為浮置(floating)為範例。 4 is a cross-sectional view of a display panel in accordance with another embodiment of the present invention. Referring to FIG. 4, the embodiment of FIG. 4 is similar to the embodiment of FIG. 1 and FIG. 3, and therefore the same components are denoted by the same reference numerals and the description thereof will not be repeated. The embodiment of FIG. 4 is different from the embodiment of FIG. 1 and FIG. 3 in that the first substrate 100 further includes one or more stacked patterns 140 (only one is drawn in the drawing, but is not limited thereto, and may be two Above), and the drain D of the active device T covers the stacked pattern 140, and the stacked pattern 140 is disposed corresponding to the contact structure 124 on the second substrate 130. The stacked pattern 140 may be a single film layer or a multilayer film layer, and the stacked pattern 140 may also be a plurality of patterns having different sizes. Since the stack pattern 140 can pad the drain D of the active device T, the conductive effect between the drain D of the active device T and the contact structure 124 can be increased. In this embodiment, preferably, the potential of the stacked pattern 140 is floating.
在上述數個實施例中,接觸結構124是由絕緣間隙物122與覆蓋絕緣間隙物122的畫素電極120所構成,但本發明不限於此。根據其他的實施例,接觸結構可以還可以是其他種變化。請參照圖9A至圖9D,在圖9A中所繪示的接觸結構124是由絕緣間隙物122與覆蓋絕緣間隙物122的畫素電極120所構成。圖9B所示的接觸結構127是由絕緣間隙物122與覆蓋絕緣間隙物122的導電材料層123所構成,其中絕緣間隙物122設置在畫素電極120上,且導電材料層123覆蓋絕緣間隙物122並與畫素電極120 電性連接。在此,導電材料層123可以使用與畫素電極120相同或是不相同的材料。基於導電性的考量,導電材料層123較佳的是使用金屬材料,其例如是採用掃描線或是與資料線相同的材料。此外,圖9C所示的接觸結構127是由絕緣間隙物122與覆蓋絕緣間隙物122的導電材料層123所構成,其中絕緣間隙物122不直接設置在畫素電極120上,而覆蓋在絕緣間隙物122表面的導電材料層123會與畫素電極120電性連接。再者,圖9D所示的接觸結構是由單純的導電間隙物121構成。值得一提的是,圖9B至圖9D中所繪示的接觸結構可以應用於圖1、圖3以及圖4的顯示面板中,也就是可將圖9B至圖9D中所繪示的接觸結構取代圖1、圖3以及圖4中的接觸結構124。 In the above several embodiments, the contact structure 124 is composed of the insulating spacer 122 and the pixel electrode 120 covering the insulating spacer 122, but the invention is not limited thereto. According to other embodiments, the contact structure may also be other variations. Referring to FIG. 9A to FIG. 9D , the contact structure 124 illustrated in FIG. 9A is composed of an insulating spacer 122 and a pixel electrode 120 covering the insulating spacer 122 . The contact structure 127 shown in FIG. 9B is composed of an insulating spacer 122 and a conductive material layer 123 covering the insulating spacer 122, wherein the insulating spacer 122 is disposed on the pixel electrode 120, and the conductive material layer 123 covers the insulating spacer 122 and the pixel electrode 120 Electrical connection. Here, the conductive material layer 123 may use the same or different material as the pixel electrode 120. The conductive material layer 123 is preferably made of a metal material based on conductivity considerations, for example, using a scanning line or the same material as the data line. In addition, the contact structure 127 shown in FIG. 9C is composed of an insulating spacer 122 and a conductive material layer 123 covering the insulating spacer 122, wherein the insulating spacer 122 is not directly disposed on the pixel electrode 120 but covered in the insulating gap. The conductive material layer 123 on the surface of the object 122 is electrically connected to the pixel electrode 120. Furthermore, the contact structure shown in FIG. 9D is composed of a simple conductive spacer 121. It is worth mentioning that the contact structure illustrated in FIG. 9B to FIG. 9D can be applied to the display panels of FIGS. 1 , 3 and 4 , that is, the contact structure illustrated in FIGS. 9B to 9D can be used. Instead of the contact structure 124 in Figures 1, 3 and 4.
上述幾個實施例之顯示面板又可稱為邊際場切換式(Fringe Field Switching,FFS)顯示面板或者是超級邊際場切換式(Advanced Fringe Filed Switching,AFFS)。而本發明將畫素電極設置在第二基板上,且利用接觸結構將主動元件與畫素電極電性連接的方式也可以應用於共平面切換式(In-Plane Switching,IPS)顯示面板、超級共平面切換式顯示面板(Super-In Plane Switching,S-IPS)、超先進共平面切換式顯示面板(Advanced Super In-Plane Switching,AS-IPS)。 The display panel of the above embodiments may also be referred to as a Fringe Field Switching (FFS) display panel or an Advanced Fringe Filed Switching (AFFS). In the present invention, the pixel electrode is disposed on the second substrate, and the manner in which the active component and the pixel electrode are electrically connected by using the contact structure can also be applied to an In-Plane Switching (IPS) display panel and a super Super-In Plane Switching (S-IPS) and Advanced Super In-Plane Switching (AS-IPS).
圖5是根據本發明之另一實施例之顯示面板的剖面示意圖。圖6A是圖5所示之顯示面板的第一基板的上視圖。圖6B是圖5所示之顯示面板的第二基板的上視圖。請參 照圖5、圖6A以及圖6B,圖5(即圖6A與圖6B)之實施例與圖1(即圖2A與圖2B)之實施例相似,因此相同的元件以相同的符號表示,且不再重複贅述。 Figure 5 is a cross-sectional view of a display panel in accordance with another embodiment of the present invention. FIG. 6A is a top view of the first substrate of the display panel shown in FIG. 5. FIG. 6B is a top view of the second substrate of the display panel shown in FIG. 5. Please refer to 5, FIG. 6A and FIG. 6B, the embodiment of FIG. 5 (ie, FIGS. 6A and 6B) is similar to the embodiment of FIG. 1 (ie, FIG. 2A and FIG. 2B), and thus the same elements are denoted by the same reference numerals, and The details are not repeated.
同樣地,為了清楚說明本發明,圖6A與圖6B僅繪示出顯示面板中的其中一個畫素結構為例來說明。此領域技術人員應當可以瞭解,顯示面板是由多個陣列排列的畫素結構(又稱為畫素陣列)所構成。換言之,此實施例之顯示面板之第一基板上的畫素陣列結構例如是如圖11A所示,其是由多個如圖6A所示之畫素結構所構成。顯示面板之第二基板上的畫素陣列結構例如是如圖11B所示,其是由多個如圖6B所示之畫素結構所構成。在以下針對圖6A與圖6B之說明主要是以單一個畫素結構來作詳細說明,然亦可同時參照圖11A以及圖11B來瞭解本發明所主張之顯示面板。 Similarly, in order to clearly illustrate the present invention, FIGS. 6A and 6B illustrate only one of the pixel structures in the display panel as an example. It should be understood by those skilled in the art that the display panel is composed of a plurality of arrayed pixel structures (also referred to as pixel arrays). In other words, the pixel array structure on the first substrate of the display panel of this embodiment is, for example, as shown in Fig. 11A, which is composed of a plurality of pixel structures as shown in Fig. 6A. The pixel array structure on the second substrate of the display panel is, for example, as shown in Fig. 11B, which is composed of a plurality of pixel structures as shown in Fig. 6B. The description of FIG. 6A and FIG. 6B is mainly described in detail with a single pixel structure. However, the display panel claimed in the present invention can be understood by referring to FIGS. 11A and 11B at the same time.
圖5(即圖6A與圖6B)之實施例與圖1(即圖2A與圖2B)之實施例不同之處在於,第二基板132包括基材110、畫素電極126、共用電極125以及接觸結構128。類似地,根據本發明之一實施例,第二基板132可更包括彩色濾光圖案112a、遮光圖案112b以及平坦層114。 The embodiment of FIG. 5 (ie, FIG. 6A and FIG. 6B) differs from the embodiment of FIG. 1 (ie, FIG. 2A and FIG. 2B) in that the second substrate 132 includes a substrate 110, a pixel electrode 126, a common electrode 125, and Contact structure 128. Similarly, according to an embodiment of the present invention, the second substrate 132 may further include a color filter pattern 112a, a light shielding pattern 112b, and a flat layer 114.
在本實施例中,畫素電極126與共用電極125分別具有分支狀圖案,如圖6B所示,畫素電極126與共用電極125兩者彼此交錯設置。換言之,畫素電極126與共用電極125之間具有細長開口125a以使彼此電性絕緣。此外,每一畫素結構的共用電極125都是電性連接至同一個共用 電壓。另外,畫素電極126與共用電極125可為透明導電材料,其包括金屬氧化物,例如是銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、或其它合適的氧化物、或者是上述至少二者之堆疊層。 In the present embodiment, the pixel electrode 126 and the common electrode 125 have a branched pattern, respectively, and as shown in FIG. 6B, the pixel electrode 126 and the common electrode 125 are alternately arranged with each other. In other words, there is an elongated opening 125a between the pixel electrode 126 and the common electrode 125 to electrically insulate each other. In addition, the common electrode 125 of each pixel structure is electrically connected to the same common Voltage. In addition, the pixel electrode 126 and the common electrode 125 may be transparent conductive materials including metal oxides such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, Or other suitable oxide, or a stacked layer of at least two of the foregoing.
值得一提的是,如圖11B所示,各個畫素結構中之畫素電極126是彼此分離的。而每一列之畫素結構中之共用電極125則可以彼此連接在一起,或是透過其他方式而電性連接在一起。 It is worth mentioning that, as shown in Fig. 11B, the pixel electrodes 126 in the respective pixel structures are separated from each other. The common electrodes 125 in the pixel structure of each column may be connected to each other or electrically connected by other means.
同樣地,接觸結構128與畫素電極126電性連接並且與第一基板上100之主動元件T電性連接。在圖5的實施例中,接觸結構128是由絕緣間隙物122與覆蓋絕緣間隙物122的畫素電極126所構成。而且,接觸結構128與第一基板100上的導電層106b電性接觸,以使第二基板132上的畫素電極120與第一基板100上的主動元件T電性連接。 Similarly, the contact structure 128 is electrically connected to the pixel electrode 126 and electrically connected to the active device T of the first substrate 100. In the embodiment of FIG. 5, the contact structure 128 is comprised of an insulating spacer 122 and a pixel electrode 126 that covers the insulating spacer 122. Moreover, the contact structure 128 is in electrical contact with the conductive layer 106b on the first substrate 100 to electrically connect the pixel electrode 120 on the second substrate 132 with the active device T on the first substrate 100.
類似地,如圖11B所示,在第二基板之每一個畫素結構中都分別設置有一個絕緣間隙物122,且每一畫素電極126覆蓋對應的絕緣間隙物122,以使第二基板上的各畫素電極126與對應的主動元件T電性連接。 Similarly, as shown in FIG. 11B, an insulating spacer 122 is disposed in each of the pixel structures of the second substrate, and each of the pixel electrodes 126 covers the corresponding insulating spacer 122 to make the second substrate. Each of the pixel electrodes 126 is electrically connected to the corresponding active device T.
再者,導電層106b可選擇性地與導電層106a電性連接與否。在本實施例導電層106b並未與導電層106a電性連接為範例,但不限於此。當然,倘若第一基板100上不設置導電層106b,那麼接觸結構128是直接與第一基板100上的主動元件T電性連接,以使第二基板132上的畫素電 極126與第一基板100上的主動元件T電性連接。 Moreover, the conductive layer 106b can be selectively electrically connected to the conductive layer 106a. In the present embodiment, the conductive layer 106b is not electrically connected to the conductive layer 106a as an example, but is not limited thereto. Of course, if the conductive layer 106b is not disposed on the first substrate 100, the contact structure 128 is directly electrically connected to the active device T on the first substrate 100, so that the pixel on the second substrate 132 is electrically charged. The pole 126 is electrically connected to the active device T on the first substrate 100.
如同以上所述,本發明是將畫素電極126設置在第二基板132上,且利用接觸結構128將主動元件T與畫素電極126電性連接。因此經由主動元件T的驅動訊號(例如:畫素電位,但不限於此)便可透過接觸結構128而傳遞至第二基板132上的畫素電極126,進而操控位於畫素電極126上的顯示介質150。而由於共用電極125以及畫素電極126都是設置在第二基板132上。因此當手指碰觸到顯示面板(第二基板132的外表面)時就不會造成顯示面板內部的電場改變。因此,本發明不需另外在第二基板132的外表面形成透光導電層,因而可以避免顯示面板的穿透度下降的問題。此外,因共用電極125是設置在第二基板132上,因此共用電極125不會與第一基板100上的掃描線SL及資料線DL產生耦合效應而影響掃描線SL及資料線DL上的訊號傳遞。 As described above, in the present invention, the pixel electrode 126 is disposed on the second substrate 132, and the active device T is electrically connected to the pixel electrode 126 by the contact structure 128. Therefore, the driving signal (for example, the pixel potential, but not limited thereto) via the active device T can be transmitted to the pixel electrode 126 on the second substrate 132 through the contact structure 128, thereby controlling the display on the pixel electrode 126. Medium 150. The common electrode 125 and the pixel electrode 126 are both disposed on the second substrate 132. Therefore, when the finger touches the display panel (the outer surface of the second substrate 132), the electric field inside the display panel is not changed. Therefore, the present invention does not need to additionally form a light-transmitting conductive layer on the outer surface of the second substrate 132, so that the problem of a decrease in the transmittance of the display panel can be avoided. In addition, since the common electrode 125 is disposed on the second substrate 132, the common electrode 125 does not have a coupling effect with the scan line SL and the data line DL on the first substrate 100, and affects the signals on the scan line SL and the data line DL. transfer.
圖7是根據本發明之另一實施例之顯示面板的剖面示意圖。請參照圖7,圖7之實施例與圖5之實施例相似,因此相同的元件以相同的符號表示,且不再重複贅述。圖7之實施例與圖5之實施例不同之處在於,在第一基板100上的主動元件T(薄膜電晶體),其源極S與汲極D的材質包括金屬或是金屬氧化物。由於源極S與汲極D的材質包括抗氧化金屬或是金屬氧化物(例如是銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、或其它合適的氧化物、或者是上述至少二者之堆疊層),因此此實 施例可以省去保護層的製作,也就是不再主動元件T上覆蓋保護層,而使主動元件T裸露出來。而接觸結構128是直接與裸露出來的主動元件T的汲極D電性連接。 Figure 7 is a cross-sectional view of a display panel in accordance with another embodiment of the present invention. Referring to FIG. 7, the embodiment of FIG. 7 is similar to the embodiment of FIG. 5, and therefore the same components are denoted by the same reference numerals and the description thereof will not be repeated. The embodiment of FIG. 7 differs from the embodiment of FIG. 5 in that the active device T (thin film transistor) on the first substrate 100 has a source S and a drain D material including a metal or a metal oxide. Since the source S and the drain D are made of an anti-oxidation metal or a metal oxide (for example, indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, or the like). a suitable oxide, or a stacked layer of at least two of the above, The embodiment can omit the fabrication of the protective layer, that is, the active device T is no longer exposed on the active device T, and the active device T is exposed. The contact structure 128 is directly electrically connected to the drain D of the exposed active device T.
圖8是根據本發明之另一實施例之顯示面板的剖面示意圖。請參照圖8,圖8之實施例與圖5之實施例相似,因此相同的元件以相同的符號表示,且不再重複贅述。圖8之實施例與圖5之實施例不同之處在於,第一基板100上更包括一或多個堆疊圖案140(圖式中僅畫出一個),且主動元件T的汲極D覆蓋堆疊圖案140,而且堆疊圖案140是對應第二基板130上之接觸結構124設置。堆疊圖案140可以是單一膜層或是多層膜層,且堆疊圖案140也可以是多個具有不同尺寸的圖案。堆疊圖案140由於將主動元件T的汲極D墊高,因此可以增加主動元件T的汲極D與接觸結構128之間的導電效果。 Figure 8 is a cross-sectional view of a display panel in accordance with another embodiment of the present invention. Referring to FIG. 8, the embodiment of FIG. 8 is similar to the embodiment of FIG. 5, and therefore the same components are denoted by the same reference numerals and the description thereof will not be repeated. The embodiment of FIG. 8 is different from the embodiment of FIG. 5 in that the first substrate 100 further includes one or more stacked patterns 140 (only one is drawn in the drawing), and the drain D of the active device T covers the stack. The pattern 140 and the stacked pattern 140 are disposed corresponding to the contact structure 124 on the second substrate 130. The stacked pattern 140 may be a single film layer or a multilayer film layer, and the stacked pattern 140 may also be a plurality of patterns having different sizes. The stacked pattern 140 can increase the conductive effect between the drain D of the active device T and the contact structure 128 by padding the drain D of the active device T.
類似地,在上述數個實施例中,接觸結構128是由絕緣間隙物122與覆蓋絕緣間隙物122的畫素電極126所構成,但本發明不限於此。根據其他的實施例,如圖9B所示,接觸結構127可以是由絕緣間隙物122與覆蓋絕緣間隙物122的導電材料層123所構成,其中絕緣間隙物122設置在畫素電極120上,且導電材料層123覆蓋絕緣間隙物122並與畫素電極120電性連接。在此,導電材料層123可以使用與畫素電極120相同或是不相同的材料。基於導電性的考量,導電材料層123較佳的是使用金屬材料,其例如是採用掃描線或是與資料線相同的材料。此外,如圖 9C所示,接觸結構127是由絕緣間隙物122與覆蓋絕緣間隙物122的導電材料層123所構成,其中絕緣間隙物122不直接設置在畫素電極120上,而覆蓋在絕緣間隙物122表面的導電材料層123會與畫素電極120電性連接。再者,如圖9D所示,接觸結構也可以是由單純的導電間隙物121構成。上述圖9B至圖9D的接觸結構可以應用於圖5、圖7以及圖8的顯示面板中。 Similarly, in the above several embodiments, the contact structure 128 is composed of the insulating spacer 122 and the pixel electrode 126 covering the insulating spacer 122, but the invention is not limited thereto. According to other embodiments, as shown in FIG. 9B, the contact structure 127 may be composed of an insulating spacer 122 and a conductive material layer 123 covering the insulating spacer 122, wherein the insulating spacer 122 is disposed on the pixel electrode 120, and The conductive material layer 123 covers the insulating spacer 122 and is electrically connected to the pixel electrode 120. Here, the conductive material layer 123 may use the same or different material as the pixel electrode 120. The conductive material layer 123 is preferably made of a metal material based on conductivity considerations, for example, using a scanning line or the same material as the data line. In addition, as shown As shown in FIG. 9C, the contact structure 127 is composed of an insulating spacer 122 and a conductive material layer 123 covering the insulating spacer 122, wherein the insulating spacer 122 is not directly disposed on the pixel electrode 120 but covers the surface of the insulating spacer 122. The conductive material layer 123 is electrically connected to the pixel electrode 120. Further, as shown in FIG. 9D, the contact structure may be composed of a simple conductive spacer 121. The contact structure of FIGS. 9B to 9D described above can be applied to the display panels of FIGS. 5, 7, and 8.
再者,本發明上述實施例(例如:圖1、圖3、圖4、圖5、圖7、圖8)至少其中一者中,彩色濾光圖案112a是設置於基材110上為較佳範例,但不限於此。於第一變形實施例中,彩色濾光圖案112a可選擇性的設置於基材101上。其中彩色濾光圖案112a可選擇性位於主動元件T之上,可稱為彩色濾光圖案112a位於主動層之上(color filter on array,COA)或者彩色濾光圖案112a可選擇性位於主動元件T之下可稱為彩色濾光圖案112a位於主動層之下(array on color filter,AOC)。 Furthermore, in at least one of the above embodiments (eg, FIG. 1, FIG. 3, FIG. 4, FIG. 5, FIG. 7, FIG. 8), the color filter pattern 112a is preferably disposed on the substrate 110. Examples, but not limited to this. In the first modified embodiment, the color filter pattern 112a is selectively disposed on the substrate 101. The color filter pattern 112a may be selectively located on the active device T. The color filter pattern 112a may be located on the active layer (COA) or the color filter pattern 112a may be selectively located on the active device T. The color filter pattern 112a may be referred to as an array on color filter (AOC).
此外,本發明上述實施例(例如:圖1、圖3、圖4、圖5、圖7、圖8)至少其中一者中,遮光圖案112b是設置於基材110上為較佳範例,但不限於此。於第二變形實施例中,遮光圖案112b可選擇性的設置於基材101上,即遮光圖案112b設置於主動元件T之上,可稱為黑色矩陣位於主動層之上(black matrix on array,BOA)。 In addition, in at least one of the above embodiments of the present invention (for example, FIG. 1, FIG. 3, FIG. 4, FIG. 5, FIG. 7, FIG. 8), the light-shielding pattern 112b is preferably disposed on the substrate 110, but Not limited to this. In the second modified embodiment, the light-shielding pattern 112b is selectively disposed on the substrate 101, that is, the light-shielding pattern 112b is disposed on the active device T, and the black matrix is located on the active layer (black matrix on array, BOA).
另外,依照上述二個變形實施例設計方式外,在第三變形例中,當遮光圖案112b與彩色濾光圖112a一起設置 於基材101之上時,基材110上的平坦層114可選擇性地移除。此時,共同電極116就會直接形成於基材110上。 Further, in addition to the design of the above two modified embodiments, in the third modification, when the light blocking pattern 112b is provided together with the color filter 112a When over the substrate 101, the planar layer 114 on the substrate 110 can be selectively removed. At this time, the common electrode 116 is directly formed on the substrate 110.
綜上所述,由於本發明將顯示面板中的畫素電極以及共用電極層(共用電極)設置在第二基板上。當手指碰觸到顯示面板時不會造成顯示面板內部的電場改變。因此,本發明不需另外在第二基板的外表面形成透光導電層,因而可以避免顯示面板的穿透度下降。 In summary, the present invention places the pixel electrode and the common electrode layer (common electrode) in the display panel on the second substrate. When the finger touches the display panel, it does not cause an electric field change inside the display panel. Therefore, the present invention does not need to additionally form a light-transmitting conductive layer on the outer surface of the second substrate, so that the decrease in the transmittance of the display panel can be avoided.
此外,因顯示面板中的共用電極層(共用電極)是設置在第二基板上,因此共用電極層(共用電極)就不會與第一基板上的掃描線及資料線產生耦合效應而影響掃描線及資料線上的訊號傳遞。這樣一來,也可以降低共用電極層(共用電極)的負載(loading)。 In addition, since the common electrode layer (common electrode) in the display panel is disposed on the second substrate, the common electrode layer (common electrode) does not have a coupling effect with the scan line and the data line on the first substrate, thereby affecting the scanning. Signal transmission on the line and data line. In this way, the load of the common electrode layer (common electrode) can also be reduced.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.
100‧‧‧第一基板 100‧‧‧First substrate
101、110‧‧‧基材 101,110‧‧‧Substrate
102‧‧‧絕緣層 102‧‧‧Insulation
104‧‧‧保護層 104‧‧‧Protective layer
106a、106b‧‧‧導電層 106a, 106b‧‧‧ conductive layer
112a‧‧‧彩色濾光圖案 112a‧‧‧Color filter pattern
112b‧‧‧遮光圖案 112b‧‧‧ shading pattern
114‧‧‧平坦層 114‧‧‧flat layer
116‧‧‧共用電極層 116‧‧‧Common electrode layer
118‧‧‧絕緣層 118‧‧‧Insulation
120、126‧‧‧畫素電極 120, 126‧‧‧ pixel electrodes
120a、125a‧‧‧細長開口 120a, 125a‧‧‧ elongated opening
121‧‧‧導電間隙物 121‧‧‧ Conductive spacers
122‧‧‧絕緣間隙物 122‧‧‧Insulation spacers
123‧‧‧導電材料層 123‧‧‧ Conductive material layer
124、127、128‧‧‧接觸結構 124, 127, 128‧‧‧ contact structure
125‧‧‧共用電極 125‧‧‧Common electrode
130‧‧‧第二基板 130‧‧‧second substrate
140‧‧‧堆疊圖案 140‧‧‧Stack pattern
150‧‧‧顯示介質 150‧‧‧Display media
T‧‧‧主動元件 T‧‧‧ active components
G‧‧‧閘極 G‧‧‧ gate
C‧‧‧通道 C‧‧‧ channel
S‧‧‧源極 S‧‧‧ source
D‧‧‧汲極 D‧‧‧汲
SL‧‧‧掃描線 SL‧‧‧ scan line
DL‧‧‧資料線 DL‧‧‧ data line
圖1是根據本發明之一實施例之顯示面板的剖面示意圖。 1 is a schematic cross-sectional view of a display panel in accordance with an embodiment of the present invention.
圖2A是圖1所示之顯示面板的第一基板的上視圖。 2A is a top view of the first substrate of the display panel shown in FIG. 1.
圖2B是圖1所示之顯示面板的第二基板的上視圖。 2B is a top view of the second substrate of the display panel shown in FIG. 1.
圖3及圖4是根據本發明之其他實施例之顯示面板的剖面示意圖。 3 and 4 are schematic cross-sectional views of a display panel in accordance with other embodiments of the present invention.
圖5是根據本發明之另一實施例之顯示面板的剖面示意圖。 Figure 5 is a cross-sectional view of a display panel in accordance with another embodiment of the present invention.
圖6A是圖5所示之顯示面板的第一基板的上視圖。 FIG. 6A is a top view of the first substrate of the display panel shown in FIG. 5. FIG.
圖6B是圖5所示之顯示面板的第二基板的上視圖。 6B is a top view of the second substrate of the display panel shown in FIG. 5.
圖7及圖8是根據本發明之其他實施例之顯示面板的剖面示意圖。 7 and 8 are schematic cross-sectional views of a display panel in accordance with other embodiments of the present invention.
圖9A至圖9D是根據本發明之實施例的接觸結構的示意圖。 9A-9D are schematic views of a contact structure in accordance with an embodiment of the present invention.
圖10A是圖1所示之顯示面板的第一基板的畫素陣列之上視圖。 10A is a top view of a pixel array of a first substrate of the display panel shown in FIG. 1.
圖10B是圖1所示之顯示面板的第二基板的的畫素陣列之上視圖。 10B is a top view of a pixel array of the second substrate of the display panel shown in FIG. 1.
圖11A是圖5所示之顯示面板的第一基板的畫素陣列之上視圖。 11A is a top view of a pixel array of a first substrate of the display panel shown in FIG. 5.
圖11B是圖5所示之顯示面板的第二基板的的畫素陣列之上視圖。 11B is a top view of a pixel array of the second substrate of the display panel shown in FIG. 5.
100‧‧‧第一基板 100‧‧‧First substrate
101、110‧‧‧基板 101, 110‧‧‧ substrate
102‧‧‧絕緣層 102‧‧‧Insulation
104‧‧‧保護層 104‧‧‧Protective layer
106a、106b‧‧‧導電層 106a, 106b‧‧‧ conductive layer
112a‧‧‧彩色濾光圖案 112a‧‧‧Color filter pattern
112b‧‧‧遮光圖案 112b‧‧‧ shading pattern
114‧‧‧平坦層 114‧‧‧flat layer
116‧‧‧共用電極層 116‧‧‧Common electrode layer
118‧‧‧絕緣層 118‧‧‧Insulation
120‧‧‧畫素電極 120‧‧‧pixel electrodes
122‧‧‧絕緣間隙物 122‧‧‧Insulation spacers
124‧‧‧接觸結構 124‧‧‧Contact structure
130‧‧‧第二基板 130‧‧‧second substrate
150‧‧‧顯示介質 150‧‧‧Display media
T‧‧‧主動元件 T‧‧‧ active components
G‧‧‧閘極 G‧‧‧ gate
C‧‧‧通道 C‧‧‧ channel
S‧‧‧源極 S‧‧‧ source
D‧‧‧汲極 D‧‧‧汲
Claims (22)
Priority Applications (2)
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TW099125386A TWI412828B (en) | 2010-05-31 | 2010-07-30 | Display panel |
US12/858,443 US8143622B2 (en) | 2010-05-31 | 2010-08-18 | Display panel |
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TW99117434 | 2010-05-31 | ||
TW099125386A TWI412828B (en) | 2010-05-31 | 2010-07-30 | Display panel |
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TW (1) | TWI412828B (en) |
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TWI408449B (en) * | 2009-11-03 | 2013-09-11 | Wintek Corp | Liquid crystal display panel |
TWI446531B (en) | 2011-05-17 | 2014-07-21 | Au Optronics Corp | Pixel structure and electrical bridging structure |
CN102621757B (en) * | 2012-04-06 | 2014-07-02 | 友达光电(苏州)有限公司 | Pixel structure and display panel |
TWI628498B (en) | 2012-07-13 | 2018-07-01 | 群康科技(深圳)有限公司 | Display device and display panel |
CN102790012A (en) * | 2012-07-20 | 2012-11-21 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof as well as display equipment |
TWI581149B (en) * | 2015-11-02 | 2017-05-01 | 友達光電股份有限公司 | Touch display panel |
JP6726025B2 (en) * | 2016-05-10 | 2020-07-22 | 株式会社ジャパンディスプレイ | Substrate for display device and display device |
JP2018092088A (en) * | 2016-12-07 | 2018-06-14 | セイコーエプソン株式会社 | Electrophoretic device, electronic apparatus, and method for manufacturing electrophoretic device |
US10281786B2 (en) * | 2017-04-20 | 2019-05-07 | A.U. Vista, Inc. | Display device using low capacitance bus lines having gate lines and data lines on different substrates |
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TW200639548A (en) * | 2005-05-11 | 2006-11-16 | Toppoly Optoelectronics Corp | A liquid crystal display device |
TW200734732A (en) * | 2006-03-15 | 2007-09-16 | Quanta Display Inc | Display panel having repair lines and signal lines disposed at different substrate |
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KR100482468B1 (en) * | 2000-10-10 | 2005-04-14 | 비오이 하이디스 테크놀로지 주식회사 | Fringe field switching mode lcd |
KR100482469B1 (en) | 2000-11-25 | 2005-04-14 | 비오이 하이디스 테크놀로지 주식회사 | Method for fabricating liquid crystal display for preventing cross talk |
US7924385B2 (en) * | 2007-11-26 | 2011-04-12 | Au Optronics Corporation | Wide viewing angle liquid crystal display comprising at least one floating electrode in locations directly facing a corresponding one or more pixel electrodes thereby inducing an electric field in the liquid crystal layer |
KR101641535B1 (en) * | 2009-06-01 | 2016-07-22 | 삼성디스플레이 주식회사 | Method of manufacturing a liquid crystal display panel and liquid crystal display panel |
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TW200639548A (en) * | 2005-05-11 | 2006-11-16 | Toppoly Optoelectronics Corp | A liquid crystal display device |
TW200734732A (en) * | 2006-03-15 | 2007-09-16 | Quanta Display Inc | Display panel having repair lines and signal lines disposed at different substrate |
TW200826012A (en) * | 2006-12-07 | 2008-06-16 | Tpo Displays Corp | Image display system |
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TW201142419A (en) | 2011-12-01 |
US20110291094A1 (en) | 2011-12-01 |
US8143622B2 (en) | 2012-03-27 |
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