TWI411699B - Solar thermal selective absorbers and fabrication methods thereof - Google Patents

Solar thermal selective absorbers and fabrication methods thereof Download PDF

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TWI411699B
TWI411699B TW097147797A TW97147797A TWI411699B TW I411699 B TWI411699 B TW I411699B TW 097147797 A TW097147797 A TW 097147797A TW 97147797 A TW97147797 A TW 97147797A TW I411699 B TWI411699 B TW I411699B
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film
substrate
layer
metal
ceramic composite
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TW201022461A (en
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Rei Cheng Juang
Yung Chin Yeh
Shiau Wei Chang
Wen Chieh Chen
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Ind Tech Res Inst
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Abstract

Solar thermal selective absorbers and fabrication methods thereof are presented. The fabrication method of the solar thermal selective absorber includes providing a substrate in a vacuum deposition chamber. A metal is sputtered simultaneous injection a reactive gas to deposit a single-layered cermet layer on the substrate, wherein the single-layered cermet layer selectively absorbs visible light and reflects infrared light.

Description

太陽能選擇性吸收膜及其製造方法Solar selective absorbing film and method of manufacturing same

本發明係有關於一種太陽能選擇性吸收膜及其製造方法,特別有關於一種具高選擇比的單層太陽能選擇性吸收膜及其製造方法。The present invention relates to a solar selective absorbing film and a method of manufacturing the same, and more particularly to a single-layer solar selective absorbing film having a high selectivity and a method of manufacturing the same.

雙陶瓷合金層結構應用於太陽能選擇性吸收膜的研究開發始於1990年代。雙陶瓷合金層結構,例如金屬-氮化鋁(M-AlN)和金屬-氧化鋁(M-Al2 O3 ),傳統上是使用一種雙靶材直流電磁控管電漿濺鍍技術(two-target DC magnetron plasma sputtering technology)來製備,應用於太陽能選擇性吸收膜,可得到非常高的光熱轉換效率。The research and development of the dual ceramic alloy layer structure applied to the solar selective absorbing film began in the 1990s. Dual ceramic alloy layer structures, such as metal-aluminum nitride (M-AlN) and metal-alumina (M-Al 2 O 3 ), traditionally use a dual target DC electromagnetic tube plasma sputtering technique (two -target DC magnetron plasma sputtering technology), which is applied to solar selective absorption film, can obtain very high photothermal conversion efficiency.

傳統之選擇性吸收膜製程大部份是利用雙靶材濺鍍產生的複合膜,例如以不鏽鋼與鋁的雙靶材製程,製作陶瓷金屬膜(Cermet)做為選擇性吸收膜。適當的金屬陶瓷複合膜厚度與金屬分率,可在太陽能輻射區域表現出高吸收而對熱輻射(紅外線區域)表現出高度反射性。該複合物沈積在對紅外線反射的金屬基材上可以形成太陽能選擇性吸收膜。Most of the conventional selective absorption film processes are composite films produced by double target sputtering, such as a stainless steel and aluminum double target process, and a ceramic metal film (Cermet) is used as a selective absorption film. A suitable cermet composite film thickness and metal fraction can exhibit high absorption in the solar radiation region and high reflectivity in the heat radiation (infrared region). The composite is deposited on a metal substrate that is reflective to infrared light to form a solar selective absorbing film.

第1圖係顯示傳統多層選擇性吸收膜結構製作於金屬基材的剖面示意圖。於第1圖中,傳統多層選擇性吸收膜結構110-130以雙或多靶材濺鍍方式形成於金屬基材100上。吸收膜結構130-110具漸進式的的光學特性,亦即各層的折射率(n)、消光係數(k)、膜厚(d)均不同。欲達到對太陽能輻射區域具高吸收性而對熱輻射(紅外線區域)具高度反射性的選擇性,習知技術需仰賴多層陶瓷金屬膜(Cermet)結構,方能達到所欲的特性。再者,多層陶瓷金屬膜(Cermet)需依賴多靶多腔體製程,耗費製造資源及成本。Figure 1 is a schematic cross-sectional view showing a conventional multilayer selective absorbing film structure fabricated on a metal substrate. In Fig. 1, a conventional multilayer selective absorbing film structure 110-130 is formed on a metal substrate 100 by double or multiple target sputtering. The absorbing film structures 130-110 have progressive optical properties, that is, the refractive indices (n), extinction coefficients (k), and film thicknesses (d) of the respective layers are different. In order to achieve high absorbivity to solar radiation areas and highly reflective selectivity to thermal radiation (infrared regions), conventional techniques rely on a multilayer ceramic metal film (Cermet) structure to achieve desired characteristics. Furthermore, the multi-layer ceramic metal film (Cermet) relies on a multi-target multi-cavity process, which consumes manufacturing resources and costs.

近年來,業界已開始研究開發單靶材濺鍍選擇性吸收膜。雖然單靶材製程優於雙靶材製程,如節省機台設置空間及成本,但在單靶材製程下,單一靶須同時分擔傳統雙靶的金屬層及陶瓷層兩種膜層,在氣氛及功率的控制上較雙靶製程要求要更精確,也因此增加其鍍膜的穩定控制困難性。In recent years, the industry has begun to research and develop a single target sputtering selective absorption film. Although the single target process is superior to the double target process, such as saving the space and cost of the machine, in the single target process, the single target must simultaneously share the two layers of the traditional double target metal layer and the ceramic layer. The control of the power and the requirements of the dual target process are more precise, and thus the stability control of the coating is increased.

本發明之實施例提供一種太陽能選擇性吸收膜的製造方法,包括:提供一基材於一真空濺鍍腔體中;以及濺鍍一金屬同時通入一氣體,以形成一單層金屬-陶瓷複合膜於該基材上;其中該單層金屬-陶瓷複合膜具有吸收可見光且反射紅外光的性質。Embodiments of the present invention provide a method of fabricating a solar selective absorbing film, comprising: providing a substrate in a vacuum sputtering chamber; and sputtering a metal while introducing a gas to form a single layer of metal-ceramic A composite film is on the substrate; wherein the single-layer metal-ceramic composite film has a property of absorbing visible light and reflecting infrared light.

本發明之實施例另提供一種太陽能選擇性吸收膜,包括:一基材;以及一單層金屬-陶瓷複合膜於該基材上;其中該單層金屬-陶瓷複合膜具有吸收可見光且反射紅外光的性質。An embodiment of the present invention further provides a solar selective absorbing film comprising: a substrate; and a single-layer metal-ceramic composite film on the substrate; wherein the single-layer metal-ceramic composite film has absorption of visible light and reflects infrared The nature of light.

為使本發明能更明顯易懂,下文特舉實施例,並配合所附圖式,作詳細說明如下:In order to make the invention more apparent, the following detailed description of the embodiments and the accompanying drawings are as follows:

以下以各實施例詳細說明並伴隨著圖式說明之範例,做為本發明之參考依據。在圖式或說明書描述中,相似或相同之部分皆使用相同之圖號。且在圖式中,實施例之形狀或是厚度可擴大,並以簡化或是方便標示。再者,圖式中各元件之部分將以分別描述說明之,值得注意的是,圖中未繪示或描述之元件,為所屬技術領域中具有通常知識者所知的形式,另外,特定之實施例僅為揭示本發明使用之特定方式,其並非用以限定本發明。The following is a detailed description of the embodiments and examples accompanying the drawings, which are the basis of the present invention. In the drawings or the description of the specification, the same drawing numbers are used for similar or identical parts. In the drawings, the shape or thickness of the embodiment may be expanded and simplified or conveniently indicated. In addition, the components of the drawings will be described separately, and it is noted that the components not shown or described in the drawings are known to those of ordinary skill in the art, and in particular, The examples are merely illustrative of specific ways of using the invention and are not intended to limit the invention.

本發明之實施例提出一種製備單層陶瓷-金屬結構及方法,作為太陽能選擇性吸收膜,經過光學模擬預先計算該單層吸收膜最適當的光學常數,包括折射率(n)、消光係數(k)、膜厚(d),亦即模擬計算出單層陶金吸收膜所需的金屬含量與鍍膜厚度。Embodiments of the present invention provide a single-layer ceramic-metal structure and method for use as a solar selective absorbing film, and optically simulate the most appropriate optical constant of the single-layer absorbing film, including refractive index (n) and extinction coefficient ( k), film thickness (d), that is, the metal content and coating thickness required for the calculation of the single-layer ceramic gold absorbing film.

第2A-2C圖係顯示根據本發明之一實施例的太陽能選擇性吸收膜製造方法的剖面示意圖。請參閱第2A圖,首先提供一基材200於一真空單靶材濺鍍腔體中,濺鍍一金屬同時通入一氣體,以形成一單層金屬-陶瓷複合膜210於該基材200上。該單層金屬-陶瓷複合膜具有吸收可見光且反射紅外光的性質。2A-2C is a schematic cross-sectional view showing a method of fabricating a solar selective absorbing film according to an embodiment of the present invention. Referring to FIG. 2A, a substrate 200 is first provided in a vacuum single target sputtering chamber, and a metal is sputtered while a gas is introduced to form a single-layer metal-ceramic composite film 210 on the substrate 200. on. The single-layer metal-ceramic composite film has a property of absorbing visible light and reflecting infrared light.

請參閱第2B圖,在經過自然大氣下曝曬L,利用高金屬分率的吸收膜表面之金屬原子與大氣中的氧原子形成氧化物薄層215。應注意的是,該氧化物薄層215亦為一光學薄膜,經匹配設計可有效減少太陽光的反射率,達抗反射效果,亦提升選擇性吸收膜的吸收效能。並該氧化物之材料特性具有抗腐蝕特性,亦即防止氧原子的氧化擴散,可達到吸收膜與大氣的阻隔效果,對產品在日光下曝曬有性能穩定、抗老化之特性。Referring to FIG. 2B, after exposure to L under natural atmosphere, a thin layer 215 of oxide is formed by metal atoms on the surface of the absorption film having a high metal fraction and oxygen atoms in the atmosphere. It should be noted that the oxide thin layer 215 is also an optical film, and the matched design can effectively reduce the reflectance of sunlight, achieve anti-reflection effect, and improve the absorption efficiency of the selective absorption film. The material properties of the oxide have anti-corrosion properties, that is, prevent oxidation diffusion of oxygen atoms, and can achieve the barrier effect of the absorption film and the atmosphere, and have stable performance and anti-aging properties for the product to be exposed to sunlight.

本發明另一實施例樣態為提供一種單一金屬靶材,利用真空濺鍍法製作太陽能選擇性吸收膜。在真空濺鍍製程中,以鋁金屬靶材為例子,調整特定氣氛及功率即可使電漿轟擊出鋁金屬原子,被擊出之鋁原子在與通入之反應氣體(氮氣)產生反應,並沉積於基板上形成金屬-陶瓷複合膜,即陶金膜(cermet film)。此陶金膜對太陽光有很好的吸收效果。根據本發明之一實施例,利用高金屬分率的陶金膜來進行自然表面氧化,來自然形成一層氧化物薄膜。該氧化物薄膜可作為抗反射層,同時增加入射光的通量,提升吸收膜的吸收率。Another embodiment of the present invention provides a single metal target for producing a solar selective absorbing film by vacuum sputtering. In the vacuum sputtering process, taking an aluminum metal target as an example, the specific atmosphere and power can be adjusted to cause the plasma to bombard the aluminum metal atoms, and the aluminum atoms that are struck are reacted with the reaction gas (nitrogen) that is introduced. And deposited on the substrate to form a metal-ceramic composite film, that is, a cermet film. This pottery film has a good absorption effect on sunlight. According to an embodiment of the present invention, a natural metal surface oxidation is performed using a high metal fraction ceramic gold film to naturally form an oxide film. The oxide film can be used as an antireflection layer while increasing the flux of incident light and increasing the absorption rate of the absorption film.

應注意的是,本發明實施例的太陽能選擇性吸收膜製作方法,僅需要單一金屬材質靶材與單一氣氛下進行,並且經光學薄膜設計,只需濺鍍單一層吸收膜,並自然曝曬形成抗反射效果,無須經過高溫熱處理,可降低真空濺鍍製程的操作成本與提升連續濺鍍製程的量產能力。It should be noted that the solar selective absorbing film manufacturing method of the embodiment of the present invention only needs a single metal material target and a single atmosphere, and through the optical film design, only a single layer of absorbing film is sputtered and formed by natural exposure. The anti-reflection effect eliminates the need for high-temperature heat treatment, which reduces the operating cost of the vacuum sputtering process and increases the mass production capability of the continuous sputtering process.

相較於習知技術,本發明之實施例將雙靶減為單靶。更明確地說,以單金屬靶,例如鋁(Al)靶、鈦(Ti)靶或其他金屬做為濺鍍靶材,在氮反應氣氛下,利用真空濺鍍製作太陽能選擇性吸收膜。根據本發明另一實施例,利用反應性濺鍍法製備太陽能選擇性吸收膜。Embodiments of the present invention reduce dual targets to single targets as compared to conventional techniques. More specifically, a single metal target such as an aluminum (Al) target, a titanium (Ti) target or other metal is used as a sputtering target, and a solar selective absorbing film is formed by vacuum sputtering in a nitrogen reaction atmosphere. According to another embodiment of the present invention, a solar selective absorbing film is prepared by reactive sputtering.

再者,本發明實施例藉由光學模擬計算,控制特定反應濺鍍參數,如濺鍍功率、濺鍍反應氣氛濃度、濺鍍時間,製備出特定光學常數之膜層,使太陽能選擇性吸收膜僅需濺鍍單一層吸收膜,即可所欲的光學效能。該吸收膜層為陶瓷-金屬之薄膜結構,在可見光與近紅外光波段有高吸收,在遠紅外波段有高反射。經過自然曝曬,利用大氣中的氧原子來進行吸收膜表面的氧化,表面形成一層氧化物薄膜。該氧化物薄層亦為一光學薄膜,可有效減少太陽光的反射率,及提升選擇性吸收膜的吸收效能。並該氧化物之材料特性具有抗腐蝕特性,亦即防止氧原子的氧化擴散,可達到吸收膜與大氣的阻隔效果,對產品在日光下曝曬有性能穩定、抗老化之特性。Furthermore, the embodiment of the present invention controls a specific reaction sputtering parameter, such as sputtering power, sputtering reaction atmosphere concentration, and sputtering time, to prepare a film layer with a specific optical constant to obtain a solar selective absorption film by optical simulation calculation. It is only necessary to sputter a single layer of absorbing film to achieve the desired optical performance. The absorbing film layer is a ceramic-metal film structure, which has high absorption in the visible light and near-infrared light bands and high reflection in the far infrared band. After natural exposure, the oxygen atoms in the atmosphere are used to oxidize the surface of the absorption film, and an oxide film is formed on the surface. The thin oxide layer is also an optical film, which can effectively reduce the reflectance of sunlight and enhance the absorption efficiency of the selective absorption film. The material properties of the oxide have anti-corrosion properties, that is, prevent oxidation diffusion of oxygen atoms, and can achieve the barrier effect of the absorption film and the atmosphere, and have stable performance and anti-aging properties for the product to be exposed to sunlight.

光學模擬Optical simulation

第3圖係顯示本發明實施例的光學模擬步驟,並對應以第2A-2C圖實施的流程示意圖。首先利用在不同氮化程度下的單層膜(陶金層吸收膜)之光學常數來模擬最適之光學特性,即有較低的反射率(步驟330)。接著,附加一層氧化層來模擬吸收膜經大氣曝曬氧化時所產生之氧化層,即進行雙層膜匹配(步驟320)。最後,模擬計算單層吸收膜與附加氧化層之選擇性吸收膜效能(吸收率),如步驟330所示。Figure 3 is a flow chart showing the optical simulation steps of the embodiment of the present invention and corresponding to the implementation of the second embodiment A-2C. First, the optical constants of the single layer film (the gold layer absorbing film) at different nitriding degrees are used to simulate the optimum optical characteristics, that is, the lower reflectance (step 330). Next, an oxide layer is added to simulate the oxide layer produced when the absorbing film is oxidized by atmospheric exposure, that is, double layer film matching is performed (step 320). Finally, the selective absorption film efficacy (absorption rate) of the single-layered absorber film and the additional oxide layer is simulated, as shown in step 330.

有鑑於此,本發明各實施例僅需濺鍍單層吸收膜,故光學模擬中呈現不同氮化程度與不同膜厚度之單層膜。表1係顯示模擬背景是以鋁靶(Al)為靶材基礎,在不同N2 濃度氣氛(3-12%)下進行反應性濺鍍。由此可形成不同氮化程度之一系列的陶瓷-金屬單層膜,並分析其光學特性,包括反射率(Reflectance,%)。除了模擬不同金屬分率的單層膜,同時也模擬不同膜厚下(30-120nm)的結果。因為,不同的膜厚會產生不同的光學干涉效果,而產生特定的光學特性影響,如反射率與截止波長位置等。在表1的模擬結果中,當氮氣濃度為7.5%且膜厚達90nm時,有較低的反射率。即在單層的吸收膜特性中,有較高的吸收率。In view of this, the embodiments of the present invention only need to sputter a single layer of the absorption film, so that a single layer film having different degrees of nitriding and different film thicknesses is exhibited in the optical simulation. Table 1 shows that the simulated background is based on an aluminum target (Al) and reactive sputtering is performed under different N 2 concentration atmospheres (3-12%). Thereby, a ceramic-metal monolayer film of a series of different degrees of nitridation can be formed, and its optical characteristics, including reflectance (%), can be analyzed. In addition to simulating single-layer films with different metal fractions, the results at different film thicknesses (30-120 nm) were also simulated. Because different film thicknesses produce different optical interference effects, which produce specific optical characteristics such as reflectance and cutoff wavelength position. In the simulation results of Table 1, when the nitrogen concentration was 7.5% and the film thickness was 90 nm, there was a low reflectance. That is, in the characteristics of the single layer of the absorption film, there is a high absorption rate.

步驟一:改變大範圍(30-120nm)之膜厚以尋找較佳之膜厚,並找出較合適薄膜之金屬分率。模擬具最佳性能的Al/AlN-Al2 O3 做為選擇性吸收膜,其吸收率如表1所示,其中氧化層是以氧化鋁作為氧化層。Step 1: Change the film thickness over a wide range (30-120 nm) to find a better film thickness and find the metal fraction of the appropriate film. The Al/AlN-Al 2 O 3 with the best performance was simulated as a selective absorption film, and the absorption rate thereof is shown in Table 1, wherein the oxide layer was made of alumina as an oxide layer.

步驟二:比較不同膜厚下之反射率,並找出較合適的薄膜厚度。根據表1的模擬結果顯示,薄膜於氮氣氛率7.5%及薄膜厚度90nm時具有最低之反射率,故於膜厚90nm附近小範圍尋找最佳之薄膜厚度,如表2所示,根據模擬結果顯示為95nm。Step 2: Compare the reflectance at different film thicknesses and find a suitable film thickness. According to the simulation results in Table 1, the film has the lowest reflectance at a nitrogen atmosphere rate of 7.5% and a film thickness of 90 nm, so the optimum film thickness is found in a small range near the film thickness of 90 nm, as shown in Table 2, according to the simulation results. Displayed as 95nm.

步驟三:比較不同金屬分率之薄膜於膜厚95nm下之單層及雙層之吸收率。因為第二層膜厚之限制,且其作用為“抗反射”效果,故第二層膜對吸收率僅些微貢獻。若能突破氧化層的膜厚限制,則有利於達到更佳的抗反射效果。表3列出單、雙層膜吸收率之比較差異。單層鋁陶金膜其厚度為95nm,第二層氧化鋁膜其厚度20nm。該結果顯示,實施例的模擬組別中,C組有較佳的結果顯示,吸收率可達0.8。Step 3: Comparing the absorption rates of the single layer and the double layer of the film with different metal fractions at a film thickness of 95 nm. Because of the limitation of the thickness of the second layer and its effect as an "anti-reflection" effect, the second film contributes only slightly to the absorption rate. If it can break through the film thickness limit of the oxide layer, it will help to achieve better anti-reflection effect. Table 3 shows the difference in the absorption rates of the single and double membranes. The single-layer aluminum ceramic gold film has a thickness of 95 nm, and the second aluminum oxide film has a thickness of 20 nm. The results show that among the simulation groups of the examples, the C group has better results showing that the absorption rate can reach 0.8.

第4與5圖分別顯示根據本發明實施例在不同氮化程度下的單、雙層膜的反射光譜示意圖,其中單層膜為不同金屬分率之鋁陶金單層膜,雙層膜分別為第一層的鋁陶金膜及第二層的氧化鋁膜。請參閱第4與5圖,分別比對樣品編號40a-40f和50a-50f,可發現C組別(40c和50c)之反射率較低且截止波長發生在較長波長之位置1400nm,故其吸收率也較佳。在後續的研究中可以利用不同氮化氣氛濃度與不同膜厚來進行匹配,找出截止波長發生在1600nm位置的單層吸收膜。4 and 5 respectively show schematic diagrams of reflection spectra of single and double-layer films under different nitridation degrees according to an embodiment of the present invention, wherein the single-layer film is an aluminum-ceramic single-layer film with different metal fractions, and the double-layer film is respectively It is a first layer of aluminum ceramic film and a second layer of aluminum oxide film. Referring to Figures 4 and 5, comparing sample numbers 40a-40f and 50a-50f, respectively, it can be found that the reflectance of Group C (40c and 50c) is low and the cutoff wavelength occurs at a position of 1400 nm at a longer wavelength, so The absorption rate is also preferred. In subsequent studies, different nitriding atmosphere concentrations and different film thicknesses can be used to match, and a single-layer absorbing film with a cutoff wavelength of 1600 nm is found.

比較第4與5圖中效果最好的C組別,將其重新繪製如第6圖所示。其中,於單、雙層膜反射率中,第二層膜有往長波長方向移動,且整體反射率都有下降的趨勢,故雙層膜之吸收率0.8較單層膜吸收率0.75來的高。因此,在本發明實施例中,以選擇適合的單層吸收膜即可達到高的吸收率0.75,並該單層吸收膜具有選擇性特性,在可見光與近紅外光區有高吸收,並在遠紅外光區有反射特性。當經放置於大氣中自然加熱氧化,自然形成一薄層氧化膜,則可達抗反射效果,並提升選擇性吸收膜之吸收效能。目前的實施例模擬中,除了具選擇性的特性以外,吸收率可達0.8。Compare the best C group in Figures 4 and 5 and redraw it as shown in Figure 6. Among them, in the single and double-layer film reflectivity, the second film has a tendency to move in the long wavelength direction, and the overall reflectance tends to decrease, so the absorption rate of the double film is 0.8% than that of the single layer film. high. Therefore, in the embodiment of the present invention, a high absorption rate of 0.75 can be achieved by selecting a suitable single-layer absorption film, and the single-layer absorption film has selective characteristics, and has high absorption in the visible light and near-infrared light regions, and The far infrared light zone has a reflective property. When it is naturally heated and oxidized by being placed in the atmosphere, a thin oxide film is naturally formed, which can achieve an anti-reflection effect and enhance the absorption efficiency of the selective absorption film. In the current embodiment simulation, in addition to the selective characteristics, the absorption rate can reach 0.8.

濺鍍製備Sputter preparation

濺鍍實驗製備一系列不同氮化程度之陶金薄膜,並同時了解單層選擇性吸收膜之性能,及實際進行曝曬,分析其氧化(老化)之情形。首先鍍製金屬鋁膜12片,做為Al基板,在每一不同氣氛濺鍍條件下,放入2片Al基板和1片玻璃基板。濺鍍完成後,將Al基板上之薄膜進行反射率、放射率、吸收率之量測。將鍍於玻璃基板之薄膜以橢圓儀分析光學常數及膜厚。表4為鍍膜實驗之參數,濺鍍壓力約為2mtorr,Ar流量固定為40sccm,氮氣流量為0-4sccm,濺鍍功率為150W,鍍製10分鐘。Sputtering experiments were carried out to prepare a series of ceramic gold films with different nitriding degrees. At the same time, the properties of single-layer selective absorbing films were observed, and the actual exposure was carried out to analyze the oxidation (aging). First, 12 pieces of metal aluminum film were plated as an Al substrate, and two Al substrates and one glass substrate were placed under each different atmosphere sputtering conditions. After the sputtering is completed, the film on the Al substrate is measured for reflectance, emissivity, and absorptivity. The film on the glass substrate was analyzed for optical constants and film thickness by an ellipsometer. Table 4 shows the parameters of the coating experiment. The sputtering pressure is about 2 mtorr, the Ar flow rate is fixed at 40 sccm, the nitrogen flow rate is 0-4 sccm, the sputtering power is 150 W, and plating is performed for 10 minutes.

根據陶金鋁膜之顏色外觀,兩組膜之鍍製條件完全相同僅基板不同,分別為陶金鋁膜鍍製於金屬鋁膜上,和陶金鋁膜鍍製於透明玻璃基材上。在通入氮氣之後薄膜則不似純鋁膜為銀色而呈現褐色。According to the color appearance of the ceramic gold film, the plating conditions of the two films are completely the same, only the substrate is different, respectively, the ceramic gold film is plated on the metal aluminum film, and the ceramic gold film is plated on the transparent glass substrate. The film does not appear to be brown in color as the pure aluminum film is silver after the introduction of nitrogen.

第7圖顯示陶金鋁膜鍍於金屬鋁膜上之反射光譜(實心),以及放置15天後薄膜之反射光譜(空心),以樣品編號A3、A4具有較佳之吸收率,又因為A3之截止波長位置較長,故吸收率較高為0.771。第8圖係顯示陶金鋁膜鍍於透明玻璃基材上之穿透光譜(實心),以及放置15天後薄膜之穿透光譜(空心)。由第7和8圖中的結果得知,薄膜放置15天後其穿透率及反射率皆有變化,顯示薄膜表面或是薄膜結構已產生變化,故其吸收率及放射率也有所改變,如表5所示。吸收率皆有小幅度的增加,A3試片之吸收率更高達0.785,唯獨A4試片之吸收率下降,由第7圖的反射圖譜即可發現是因為放置15天後其反射圖譜有上升趨勢所致。在放射率部分變動不大,皆為1%幅度之變化,且均在0.1以下。Figure 7 shows the reflection spectrum (solid) of the gold-plated aluminum film on the metal aluminum film, and the reflection spectrum (hollow) of the film after 15 days of standing, with the better absorption rate of sample numbers A3 and A4, and because of A3 The cutoff wavelength is longer, so the absorption rate is higher at 0.771. Figure 8 shows the penetration spectrum (solid) of a gold-plated aluminum film on a transparent glass substrate, and the breakthrough spectrum (hollow) of the film after 15 days of placement. From the results in Figures 7 and 8, it is known that the transmittance and reflectance of the film change after 15 days of standing, indicating that the surface of the film or the structure of the film has changed, so the absorption rate and emissivity also change. As shown in Table 5. The absorption rate has a small increase, and the absorption rate of the A3 test piece is as high as 0.785. The absorption rate of the A4 test piece decreases only. The reflection spectrum of Fig. 7 can be found because the reflection spectrum of the A3 test piece has risen after 15 days. Caused by trends. There was little change in the emissivity, and all of them were 1% amplitude change, and both were below 0.1.

以上之模擬與實際鍍膜之實施例,都驗證了單層吸收膜經曝曬後,可提高吸收膜之吸收率效能。未來,若將實際鍍膜搭配光學模擬設計,將可製備更關鍵之合適單膜層,使吸收率(α)達0.8以上。The above examples of simulation and actual coating have verified that the absorption efficiency of the absorption film can be improved after the single-layer absorption film is exposed to sunlight. In the future, if the actual coating is combined with an optical simulation design, a more suitable single membrane layer can be prepared to achieve an absorption rate (α) of 0.8 or more.

本發明雖以較佳實施例揭露如上,然其並非用以限定本發明的範圍,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可做些許的更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。The present invention has been disclosed in the above preferred embodiments, and is not intended to limit the scope of the present invention. Any one of ordinary skill in the art can make a few changes without departing from the spirit and scope of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.

習知部分(第1圖)Conventional part (Figure 1)

100...金屬基材100. . . Metal substrate

110-130...多層吸收膜結構110-130. . . Multilayer absorbent film structure

本案部分(第2A ~8圖) Part of this case ( Figures 2A - 8)

200...基材200. . . Substrate

210...單層金屬-陶瓷複合膜210. . . Single layer metal-ceramic composite film

215...氧化物薄層215. . . Thin oxide layer

310-330...光學模擬步驟310-330. . . Optical simulation step

L...自然大氣下曝曬L. . . Exposure to the natural atmosphere

40a-40f和50a-50f...樣品編號40a-40f and 50a-50f. . . Sample serial number

第1圖係顯示傳統多層選擇性吸收膜結構製作於金屬基材的剖面示意圖。Figure 1 is a schematic cross-sectional view showing a conventional multilayer selective absorbing film structure fabricated on a metal substrate.

第2A-2C圖係顯示根據本發明之一實施例的太陽能選擇性吸收膜製造方法的剖面示意圖。2A-2C is a schematic cross-sectional view showing a method of fabricating a solar selective absorbing film according to an embodiment of the present invention.

第3圖係顯示本發明實施例的光學模擬步驟,並對應以第2A-2C圖實施的流程示意圖。Figure 3 is a flow chart showing the optical simulation steps of the embodiment of the present invention and corresponding to the implementation of the second embodiment A-2C.

第4與5圖分別顯示根據本發明實施例在不同氮化程度下的單、雙層膜的反射光譜示意圖,其中單層膜為不同金屬分率之鋁陶金單層膜,雙層膜分別為第一層的鋁陶金膜及第二層的氧化鋁膜。4 and 5 respectively show schematic diagrams of reflection spectra of single and double-layer films under different nitridation degrees according to an embodiment of the present invention, wherein the single-layer film is an aluminum-ceramic single-layer film with different metal fractions, and the double-layer film is respectively It is a first layer of aluminum ceramic film and a second layer of aluminum oxide film.

第6圖係顯示比較第4與5圖中效果最好的C組,並重新繪製的反射光譜示意圖。Figure 6 is a schematic diagram showing the reflection spectra of the best-performing Group C in Figures 4 and 5 and redrawing.

第7圖顯示陶金鋁膜鍍於金屬鋁膜上之反射光譜(實心),以及放置15天後薄膜之反射光譜(空心)。Fig. 7 shows the reflection spectrum (solid) of the gold-plated aluminum film on the metal aluminum film, and the reflection spectrum (hollow) of the film after 15 days of standing.

第8圖係顯示陶金鋁膜鍍於透明玻璃基材上之穿透光譜(實心),以及放置15天後薄膜之穿透光譜(空心)。Figure 8 shows the penetration spectrum (solid) of a gold-plated aluminum film on a transparent glass substrate, and the breakthrough spectrum (hollow) of the film after 15 days of placement.

200...基材200. . . Substrate

210...單層金屬-陶瓷複合膜210. . . Single layer metal-ceramic composite film

L...自然大氣下曝曬L. . . Exposure to the natural atmosphere

Claims (10)

一種太陽能選擇性吸收膜的製造方法,包括:提供一基材於一真空濺鍍腔體中;以及濺鍍一金屬同時通入一氣體,以形成一單層金屬-陶瓷複合膜於該基材上;放置具有該單層金屬-陶瓷複合膜的該基板於大氣中,以形成一氧化層於該單層金屬-陶瓷複合膜的表面,其中該單層金屬-陶瓷複合膜具有吸收可見光且反射紅外光的性質。 A method for manufacturing a solar selective absorbing film, comprising: providing a substrate in a vacuum sputtering chamber; and sputtering a metal while introducing a gas to form a single-layer metal-ceramic composite film on the substrate Laying the substrate with the single-layer metal-ceramic composite film in the atmosphere to form an oxide layer on the surface of the single-layer metal-ceramic composite film, wherein the single-layer metal-ceramic composite film has absorption of visible light and reflection The nature of infrared light. 如申請專利範圍第1項所述之太陽能選擇性吸收膜的製造方法,其中該基材包括銅或鋁金屬基板,或者玻璃基板。 The method for producing a solar selective absorbing film according to claim 1, wherein the substrate comprises a copper or aluminum metal substrate, or a glass substrate. 如申請專利範圍第1項所述之太陽能選擇性吸收膜的製造方法,其中通入該氣體包括氮氣和氬氣,其氮氣/氬氣比率大抵介於0%-10%。 The method for producing a solar selective absorbing film according to claim 1, wherein the gas is introduced into the gas comprising nitrogen gas and argon gas, and the nitrogen/argon ratio is substantially between 0% and 10%. 如申請專利範圍第1項所述之太陽能選擇性吸收膜的製造方法,其中該單層金屬-陶瓷複合膜包括Al/AlN-Al2 O3 選擇性吸收膜。The method for producing a solar selective absorbing film according to claim 1, wherein the single-layer metal-ceramic composite film comprises an Al/AlN-Al 2 O 3 selective absorbing film. 如申請專利範圍第1項所述之太陽能選擇性吸收膜的製造方法,其中該單層金屬-陶瓷複合膜的折射率(n)範圍大體為2-3.5、消光係數(k)的範圍大體為0.5-3,以及膜厚(d)的範圍大體為60-120nm。 The method for producing a solar selective absorbing film according to claim 1, wherein the single-layer metal-ceramic composite film has a refractive index (n) in a range of substantially 2-3.5, and an extinction coefficient (k) is substantially in the range of The range of 0.5-3, and film thickness (d) is generally 60-120 nm. 一種太陽能選擇性吸收膜,包括:一基材;一單層金屬-陶瓷複合膜於該基材上;以及 一原生氧化層於該單層金屬-陶瓷複合膜的表面,其中該單層金屬-陶瓷複合膜具有吸收可見光且反射紅外光的性質。 A solar selective absorbing film comprising: a substrate; a single-layer metal-ceramic composite film on the substrate; A primary oxide layer is on the surface of the single-layer metal-ceramic composite film, wherein the single-layer metal-ceramic composite film has a property of absorbing visible light and reflecting infrared light. 如申請專利範圍第6項所述之太陽能選擇性吸收膜,其中該基材包括銅或鋁金屬基板,或者玻璃基板。 The solar selective absorbing film of claim 6, wherein the substrate comprises a copper or aluminum metal substrate, or a glass substrate. 如申請專利範圍第6項所述之太陽能選擇性吸收膜,其中該單層金屬-陶瓷複合膜為單一均質結構。 The solar selective absorbing film according to claim 6, wherein the single-layer metal-ceramic composite film has a single homogeneous structure. 如申請專利範圍第6項所述之太陽能選擇性吸收膜,其中該單層金屬-陶瓷複合膜包括Al/AlN-Al2 O3 選擇性吸收膜。The solar selective absorbing film according to claim 6, wherein the single-layer metal-ceramic composite film comprises an Al/AlN-Al 2 O 3 selective absorbing film. 如申請專利範圍第6項所述之太陽能選擇性吸收膜,其中該單層金屬-陶瓷複合膜的折射率(n)範圍大體為2-3.5、消光係數(k)的範圍大體為0.5-3,以及膜厚(d)的範圍大體為60-120nm。The solar selective absorbing film according to claim 6, wherein the single-layer metal-ceramic composite film has a refractive index (n) ranging from 2 to 3.5 and an extinction coefficient (k) of substantially 0.5-3. And the film thickness (d) is generally in the range of 60-120 nm.
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