TWI410184B - - Google Patents
Info
- Publication number
- TWI410184B TWI410184B TW99120423A TW99120423A TWI410184B TW I410184 B TWI410184 B TW I410184B TW 99120423 A TW99120423 A TW 99120423A TW 99120423 A TW99120423 A TW 99120423A TW I410184 B TWI410184 B TW I410184B
- Authority
- TW
- Taiwan
- Prior art keywords
- board
- cathode
- backboard
- unit
- frame
- Prior art date
Links
Abstract
A high-density electrode device for plasma surface treatment includes an anode unit, a cathode unit, an insulation board, and a cooling loop. The anode unit includes a backboard and a side-frame board connected to the front side of the backboard. The cathode unit includes a cathode board installed on the front side of the backboard and accommodated in the side-frame board. The insulation board is laminated between the backboard and the cathode board. The cooling loop is installed in the cathode unit. The directions of the cathode board towards the back and the side are blocked by the anode unit backboard and the side-frame board; therefore, the plasma generated by the cathode board is concentrated towards the front, improving the effectiveness and productivity.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW99120423A TW201101937A (en) | 2010-06-23 | 2010-06-23 | High-density electrode device for plasma surface treatment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW99120423A TW201101937A (en) | 2010-06-23 | 2010-06-23 | High-density electrode device for plasma surface treatment |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201101937A TW201101937A (en) | 2011-01-01 |
TWI410184B true TWI410184B (en) | 2013-09-21 |
Family
ID=44837171
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW99120423A TW201101937A (en) | 2010-06-23 | 2010-06-23 | High-density electrode device for plasma surface treatment |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW201101937A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200732505A (en) * | 2005-11-25 | 2007-09-01 | Sharp Kk | Plasma processing apparatus and plasma processing method |
TW200943364A (en) * | 2008-04-03 | 2009-10-16 | Tes Co Ltd | Plasma processing apparatus |
TW201010519A (en) * | 2008-08-21 | 2010-03-01 | Atomic Energy Council | RF hollow cathode plasma generator |
-
2010
- 2010-06-23 TW TW99120423A patent/TW201101937A/en unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200732505A (en) * | 2005-11-25 | 2007-09-01 | Sharp Kk | Plasma processing apparatus and plasma processing method |
TW200943364A (en) * | 2008-04-03 | 2009-10-16 | Tes Co Ltd | Plasma processing apparatus |
TW201010519A (en) * | 2008-08-21 | 2010-03-01 | Atomic Energy Council | RF hollow cathode plasma generator |
Also Published As
Publication number | Publication date |
---|---|
TW201101937A (en) | 2011-01-01 |
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