TWI409360B - A coating device - Google Patents

Abstract

A coating device includes an atomization apparatus and a deposition apparatus. The atomization apparatus is adapted for atomizing precursor solution. The deposition apparatus is configured for spraying the atomized precursor solution to a surface of a substrate to form a film. The atomization apparatus includes a vessel, a vibration-transmitting film and a vibrating element. The vibration-transmitting film divides the vessel into a first space and a second space. The first space is filled with vibration-transmitting liquid. The second space is used for filling precursor solution. The vibrating element is arranged in the first space and is adapted for producing vibration. The vibration can be transmitted to the precursor solution by the vibration-transmitting liquid and the vibration-transmitting film, and atomize the precursor solution.

Description

Film preparation device

The invention relates to a film preparation device, in particular to a film preparation device which can save a precursor solution and prolong the service life of the atomization generator.

Semiconductor thin films have a wide range of applications in electronic devices, solar cells, functional materials, and photoelectrochemical hydrogen production. At present, the commonly used semiconductor thin film materials are prepared by chemical vapor deposition (CVD), magnetron sputtering, sol-gel method and spray pyrolysis, and the sol-gel method is a popular preparation method. First, it has the advantages of low growth temperature, large deposition area, fast growth rate, and easy process control. The spray pyrolysis method is a method for preparing a compound semiconductor film which has been gradually developed in recent years. This method has good orientation and epitaxy compared with the sol-gel method, and has low cost and does not require multiple coatings. A common spray pyrolysis technique atomizes the precursor solution before coating, and then carries the atomized precursor solution to be coated onto the surface of the heated substrate to form a film. Commonly used precursor solution atomization methods include high-speed centrifugal atomization, pressure atomization, airflow atomization, and ultrasonic atomization.

A conventional ultrasonic atomizing device includes a container, an atomizing generator (usually a piezoelectric vibrating piece) located inside the container, and a liquid level controller mounted on the atomizing generator. The container is filled with a precursor solution. During operation, due to the high frequency oscillation of the electron, the atomization generator resonates at a high frequency to break up the molecular structure of the precursor solution to generate a droplet. Using the atomizing device when added to the container If the precursor solution level is too low, the atomizer will be damaged by high frequency vibration and will not be cooled in time. In order to protect the atomization generator, a liquid level controller is installed thereon, and the liquid level in the container must exceed the height of the liquid level controller, and the atomization device can work. However, since the atomization generator is in direct contact with the precursor solution to be atomized, the precursor solution may corrode the atomization generator to shorten the life of the atomization generator.

In view of this, it is necessary to provide a film preparation apparatus which can save a precursor solution and prolong the life of the atomizer.

A film preparation apparatus includes an atomization device and a thin film deposition device. The atomizing device is used to atomize the precursor solution. The thin film deposition apparatus is for spraying a precursor solution before atomization onto a surface of a substrate to form a thin film. The atomizing device includes a container, a vibration transmitting film, and a vibration element. The vibration transmission film divides the container into a first housing portion and a second housing portion. The first housing portion is filled with a vibration transmitting liquid. The second receiving portion is used to fill the precursor solution. The vibrating element is located at the first receiving portion for generating vibration, and the vibration is transmitted to the precursor solution by the vibration transmitting liquid and the vibration transmitting film, thereby atomizing the precursor solution.

Compared with the prior art, the atomization device of the above film preparation device has the following advantages: First, the vibration transfer liquid and the vibration transmission film transmit vibration to the precursor solution to atomize the precursor solution without the precursor solution and vibration. The component is in direct contact to prolong the service life of the vibrating component; secondly, the film preparation device does not limit the capacity of the precursor solution contained in the atomization device. The volume can be atomized and coated on the surface of the substrate by adding a small amount of the precursor solution.

The embodiments of the present invention will be further described in detail below with reference to the accompanying drawings.

Please refer to FIG. 1 , which is a thin film preparation apparatus 100 for atomizing a precursor solution to coat a surface of a substrate. The film preparation apparatus 100 includes an atomization device 10 and a thin film deposition device 20.

The atomizing device 10 is used to atomize the precursor solution. Referring to FIG. 1, the atomizing device 10 includes a container 11, a vibration transmitting film 12, and a vibrating member 13.

The vibration transmission film 12 divides the container 11 into a first housing portion 14 and a second housing portion 15. The first housing portion 14 is filled with the vibration transmitting liquid 16. The vibration transmitting liquid 16 can propagate vibration, such as ultrasonic waves. In the present technical solution, in order to prevent the vibration element 13 from being corroded, the vibration transmitting liquid 16 may be liquid organic matter such as methanol, ethanol, acetone or water.

The second housing portion 15 is for filling the precursor solution. The second receiving portion 15 includes a top end 15a away from the first receiving portion 14 and a bottom end 15b adjacent to the vibration transmitting film 12, and the top end 15a is smaller in size than the bottom end 15b. The second housing portion 15 has an air inlet 17 and a liquid inlet 18 near the bottom end 15b. The air inlet 17 is configured to fill the second housing portion 15 with a carrier gas for carrying the atomized solution solution to the surface of the substrate. The carrier gas may be an inert gas such as nitrogen or argon. The inlet port 18 is for adding a precursor solution to the second receiving portion 15 to supplement the precursor solution after the atomization. Preferably, the distance between the liquid inlet 18 and the liquid surface of the body solution before filling the second receiving portion 15 is 3 cm to 8cm.

The vibrating element 13 is located in the first accommodating portion 14 for generating vibration, and the vibration is sequentially transmitted through the vibration transmitting liquid 16 and the vibration transmitting film 12 to the body solution filled in the second accommodating portion 15, thereby causing the precursor solution to be fogged. Chemical. The vibration transmission film 12 is a film layer that can transmit vibration. In the present embodiment, the vibration transmission film 12 is a polyethylene film. The vibrating member 13 may be a piezoelectric vibrating piece, and the vibration generated may be ultrasonic waves.

Preferably, when the second receiving portion 15 of the container 11 is made of a transparent material, the atomizing device 10 may include an infrared detecting device opposite to the second receiving portion 15 for detecting the droplets of the precursor solution after being atomized. Diameter size.

It can be understood that the atomizing device 10 seals the vibration transmitting liquid 16 in the first accommodating portion 14 by the vibration transmitting film 12, so that the first accommodating portion 14 of the atomizing device 10 provided by the technical solution does not need to be provided with a liquid level controller. It is only necessary to charge the first accommodating portion 14 with a sufficient amount of the vibration transmitting liquid 16 to ensure that the vibrating member 13 is not damaged by heat.

The thin film deposition apparatus 20 includes a duct 21, a heating stage 22, and a shower head 23. The heating stage 22 is used to carry and heat the substrate. The showerhead 23 is opposed to the heating stage 22 for ejecting the atomized precursor solution onto the heated substrate surface. The spray head 23 includes an opposite connection end 24 and a discharge end 25, and the connection end 24 is connected to the conduit 21, and the discharge end 25 is sized larger than the connection end 24. Preferably, in order to prevent the aerosol from entering the atmosphere and polluting the environment, the heating station 22 and the spray head 23 may be disposed in a sealed deposition chamber, which collects and treats the exhaust gas. The conduit 21 is used to connect the atomizing device 10 and the spray head 23 to transfer the precursor solution to the spray head 23 after atomization by the atomizing device 10. Specifically, the catheter 21 It is in communication with the second housing portion 15 of the atomizing device 10.

Referring to FIG. 2 , the method for using the film preparation apparatus 100 on the surface of the substrate 200 by ultrasonic spray pyrolysis is exemplified below. The method may include the following steps: First, preparing the precursor solution 300 and adding the second container. In section 15. 100 ml of a methanol solution of 0.001 mol/L of tris(pentane-2,4-dione) hydrazine is disposed, and the precursor solution 300 is added from the liquid inlet 18 to the second housing portion 15, specifically, the precursor The body solution 300 is carried on the vibration transmission film 12 while being in contact with the inner wall of the bottom end 15b of the second housing portion 15.

In the second step, the substrate 200 is provided and placed on the heating stage 22. The heating stage 22 is energized to heat the substrate 200. The substrate 200 can be glass, tantalum wafer or ceramic. In this embodiment, the substrate 200 is heated to 300 °C.

In the third step, the precursor solution 300 is atomized. Specifically, the vibrating element 13 generates ultrasonic waves, and the ultrasonic waves are transmitted to the precursor solution 300 by the vibration transmitting liquid 16 and the vibration transmitting film 12, thereby atomizing the precursor solution 300.

In the fourth step, the second accommodating portion 15 is filled with a carrier gas to carry the atomized precursor solution to the surface of the heated substrate 200 to form a film.

The carrier gas is filled into the second housing portion 15 from the air inlet port 17. In the present embodiment, the air inlet 17 is located 5 cm above the liquid level of the precursor solution 300. The carrier gas and the atomization solution 300 form an aerosol before the atomization. Since the size of the tip end 15a of the second housing portion 15 is smaller than the size of the bottom end 15b, the flow rate of the gas mist reaching the tip end 15a is increased. The gas mist having a larger flow rate passes through the conduit 21 in sequence, and is ejected by the nozzle 23, since the size of the ejection end 5 of the nozzle 23 is larger than the connection end. At the size of 24, the flow rate is reduced when the aerosol reaches the ejection end 25, so that the aerosol ejection is stable. A bright black ruthenium film can be obtained on the surface of the substrate 200 by maintaining the spray state for 30-60 minutes. The obtained ruthenium film is subjected to high temperature annealing to obtain a ruthenium oxide film. Referring to FIG. 3, an SEM photograph of the ruthenium oxide film obtained in the embodiment of the present invention is shown.

Compared with the prior art, the atomizing device 10 of the above-mentioned film preparing apparatus 100 has the following advantages: first, by transmitting the vibration to the precursor solution 300 by the vibration transmitting liquid 16, the vibration transmitting film 12 to atomize the precursor solution 300, The precursor solution 300 is not required to be in direct contact with the vibrating member 13 to prolong the service life of the vibrating member 13. Second, the thin film preparation device 100 does not limit the volume of the precursor solution 300 contained in the atomizing device 10, and only needs to be added. A small amount of the precursor solution 300 can be atomized and coated on the surface of the substrate.

In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

Film preparation equipment ‧‧100

Atomizing device ‧‧10

Thin film deposition equipment ‧‧20

Container ‧‧11

Vibration transfer film ‧‧12

Vibration element ‧‧‧13

First Containment Department ‧‧14

Second Containment Department ‧‧15

Top ‧‧15a

Bottom ‧‧15b

Vibration transfer liquid ‧‧16

Air inlet ‧‧17

Inlet ‧‧‧18

Catheter ‧‧21

Heating station ‧‧22

Nozzle ‧‧23

Connection ‧‧‧24

Spout ‧‧‧25

Substrate ‧‧200

Precursor solution ‧‧‧300

FIG. 1 is a schematic structural view of a film preparing apparatus according to an embodiment of the present invention.

2 is a schematic view showing the preparation of a ruthenium film using the film preparation apparatus provided by the embodiment of the present invention.

3 is a film preparation apparatus provided by an embodiment of the present invention. Scanning electron microscope (SEM) photograph of a ruthenium oxide film.

Film preparation equipment ‧‧100

Container ‧‧11

Vibration transfer film ‧‧12

Vibration element ‧‧‧13

First Containment Department ‧‧14

Second Containment Department ‧‧15

Top ‧‧15a

Bottom ‧‧15b

Vibration transfer liquid ‧‧16

Air inlet ‧‧17

Inlet ‧‧‧18

Catheter ‧‧21

Heating station ‧‧22

Nozzle ‧‧23

Substrate ‧‧200

Precursor solution ‧‧‧300

Claims (10)

A film preparation apparatus comprising an atomization device for atomizing a precursor solution, and a thin film deposition device for spraying a precursor solution after atomization onto a surface of a substrate to form a film, The improvement is that the atomization device includes a container, a vibration transmission film, and a vibration element, and the vibration transmission film divides the container into a first receiving portion and a second receiving portion, the first receiving portion is filled with a vibration transmitting liquid, and the second receiving portion is filled The portion is used to fill the precursor solution, and the vibrating element is located at the first receiving portion for generating vibration, and the vibration is transmitted to the precursor solution through the vibration transmitting liquid and the vibration transmitting film, thereby atomizing the precursor solution. The film preparation device of claim 1, wherein the second receiving portion includes a distal end away from the vibration transmitting film and a bottom end adjacent to the vibration transmitting film, the tip having a size smaller than a size of the bottom end. The film preparation device of claim 1, wherein the second receiving portion has a liquid inlet and an air inlet, and the liquid inlet is configured to add a precursor solution to the second receiving portion, the air inlet The second receiving portion is filled with a carrier gas to carry the atomized solution before the atomization to the surface of the substrate. The film preparation device according to claim 3, wherein the air inlet is spaced from the liquid surface of the body solution before filling the second housing portion by a distance of 3 cm to 8 cm. The film preparation device of claim 1, wherein the atomization device further comprises an infrared detection device for detecting a diameter of the droplet after the atomization of the precursor solution. The film preparation device according to claim 1, wherein the film preparation device The thin film deposition apparatus includes a heating table and a shower head disposed opposite to each other, the heating stage is configured to carry and heat the substrate, and the spray head is in communication with the second receiving portion for ejecting the atomized precursor solution on the surface of the substrate. The film preparation device of claim 6, wherein the film deposition device further comprises a conduit for communicating the second receiving portion and the showerhead. The film preparation apparatus according to claim 1, wherein the vibration transmission film is a polyethylene film. The film preparation device according to claim 1, wherein the vibration element is a piezoelectric vibrating piece, and the vibration is ultrasonic. The film preparation device according to claim 1, wherein the vibration transmission liquid is water, methanol, ethanol or acetone.