TWI403557B - Resin composition for screen printing - Google Patents

Resin composition for screen printing Download PDF

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TWI403557B
TWI403557B TW96102696A TW96102696A TWI403557B TW I403557 B TWI403557 B TW I403557B TW 96102696 A TW96102696 A TW 96102696A TW 96102696 A TW96102696 A TW 96102696A TW I403557 B TWI403557 B TW I403557B
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screen printing
resin composition
resin
integer
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TW200745263A (en
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Hideki Akiba
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Shinetsu Chemical Co
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Abstract

A resin combination for screen printing is characterized by comprising the following components as essential components: (A) 100 wt. parts of polyamic acid resin containing alkoxylsilicyl represented by the formular (1) (wherein, x is 3-valent organic group, Y is 2-valent organic group, Z is group represented by formula (2), R<1> is alkyl with 1-3 carbon atoms, R<2> is alkyl or alkoxy with 1-3 carbon atoms, a is an integer of 0-4, p is an integer of 1-100, q is an integer of 1-100), (B) 5-350wt. parts of spherical metal oxide fine particles with average particle size of 0.05 to 10 microns; and (C) an effective amount of organic solvent for dissolving the component(A). The invention can provide the resin composition for screen printing with good printing property, impossible cause mesh residual, leak, debubbling degradation, obtain uniform film thickness and excellent resin combination for screen printing having continuous forming property.

Description

網版印刷用樹脂組成物Resin composition for screen printing

本發明關於網版印刷用樹脂組成物。The present invention relates to a resin composition for screen printing.

聚醯亞胺系樹脂係當作耐熱性材料塗覆在半導體表面上,以擔任保護絕緣膜的角色,但是作為在此等保護膜上形成圖案的方法,已知有以清漆狀態旋塗後進行圖案化的方法,或藉由網版印刷塗覆同時進行圖案化的方法等。前者方法例如係將聚酸胺酸的清漆旋塗在晶圓上以形成保護膜後,在其上積層光阻,藉由紫外光曝光及顯像以使感光部分或非感光部分溶解,同時亦溶解下層的保護膜以形成圖案之方法,或使用聚醯亞胺系樹脂本身具有紫外線感應部分的感光性樹脂,藉由紫外光曝光及顯像以使感光部分或非感光部分溶解之方法等。由於在任一情況中皆包含紫外線曝光,程序變煩雜,從程序的縮短化之點來看,亦希望後者的網版印刷法。The polyimide-based resin is applied as a heat-resistant material on the surface of the semiconductor to serve as a protective insulating film. However, as a method of forming a pattern on such a protective film, it is known to perform spin coating in a varnish state. A method of patterning, or a method of simultaneously patterning by screen printing. In the former method, for example, a varnish of polyamic acid is spin-coated on a wafer to form a protective film, and a photoresist is laminated thereon, and the photosensitive portion or the non-photosensitive portion is dissolved by exposure and development by ultraviolet light, and also A method of dissolving a protective film of the lower layer to form a pattern, or a method of using a photosensitive resin having a UV-sensitive portion of a polyimide-based resin itself, and exposing a photosensitive portion or a non-photosensitive portion by ultraviolet light exposure and development. Since ultraviolet light exposure is included in any case, the program becomes cumbersome, and from the viewpoint of shortening the program, the latter screen printing method is also desired.

然而,以往的網版印刷用清漆,在解像度或膜平坦性等方面未必能得到令人滿足的結果。作為其理由之一,可舉出為了維持形狀,在清漆中添加無機填充劑以賦予搖變性,而導致網眼殘留或滲開、脫泡性的惡化等。又,特別可舉出於薄膜形成時,亦有溶劑的快速揮發、缺乏連續成形性等問題。However, conventional varnishes for screen printing may not achieve satisfactory results in terms of resolution, film flatness, and the like. As one of the reasons, in order to maintain the shape, an inorganic filler is added to the varnish to impart shake, and the mesh remains or bleeds, and the defoaming property is deteriorated. Further, in particular, when the film is formed, there are problems such as rapid evaporation of the solvent and lack of continuous moldability.

另一方面,電晶體、二極體、IC、LSI等的半導體元件經常以環氧樹脂等的樹脂材料進行密封,但於以此等樹脂材料來密封半導體元件時,通過該樹脂材料而侵入的水或離子性雜質常常會造成半導體元件的劣化。因此,作為其對策,有提案藉由耐熱性、電氣特性、機械特性優異的聚醯亞胺系樹脂來被覆及保護半導體元件後,以樹脂材料來密封之方法。尤其在最近,封裝係愈來愈小型化,在薄型化的同時,對基板的封裝方法亦以表面封裝方式成為主流,以往的環氧樹脂組成物係不能維特充分的可靠性。而且,由於近年來焊料的無鉛化,故焊料回流溫度被提高到260℃為止,於封裝吸濕後作軟焊時,有發生不合適的情形,如在封裝發生龜裂的問題,或即使沒有發生龜裂也降低耐濕性。於此等用途中,迫切期望開發出與金屬或塑膠材料的黏著性優異之高耐熱的可網版印刷的保護膜。然而,以往的聚醯亞胺樹脂對於銅箔的黏著力係不充分,而且若超過硬化膜的玻璃轉移溫度(Tg),則有樹脂的耐熱性極度降低的問題。On the other hand, a semiconductor element such as a transistor, a diode, an IC, or an LSI is often sealed with a resin material such as an epoxy resin. However, when the semiconductor element is sealed with a resin material or the like, the resin element is invaded by the resin material. Water or ionic impurities often cause deterioration of semiconductor components. Therefore, as a countermeasure against this, there has been proposed a method in which a semiconductor element is coated and protected by a polyimide resin having excellent heat resistance, electrical properties, and mechanical properties, and then sealed with a resin material. In particular, recently, the package system has become smaller and smaller, and the method of packaging the substrate has become the mainstream while the surface is encapsulated. The conventional epoxy resin composition cannot be sufficiently reliable. Moreover, since the solder is not lead-free in recent years, the solder reflow temperature is raised to 260 ° C, and when soldering is performed after moisture absorption in the package, an inappropriate situation occurs, such as a crack in the package, or even if there is no Cracking also reduces moisture resistance. In such applications, it has been strongly desired to develop a highly heat-resistant screen-printable protective film which is excellent in adhesion to a metal or a plastic material. However, the adhesion of the conventional polyimide resin to the copper foil is insufficient, and if it exceeds the glass transition temperature (Tg) of the cured film, the heat resistance of the resin is extremely lowered.

本發明鑒於上述情事,目的為提供網版印刷性良好,不會引起網眼殘留或滲開、脫泡性的惡化等,可得到均勻膜厚,而且連續成形性亦優異的網版印刷用樹脂組成物。In view of the above, it is an object of the present invention to provide a screen printing resin which is excellent in screen printing property, does not cause cell residue or bleeding, deteriorates in defoaming property, and the like, and has a uniform film thickness and excellent continuous moldability. Composition.

又,另一目的為提供與基材及塑膠材料的黏著性優異,有效率地消除半導體封裝的熱應力所致的晶片龜紋或熱降解,給予耐熱性優異的硬化物,於使用半導體密封用環氧樹脂成形材料來密封半導體時作為保護膜材料之有效的網版印刷用樹脂組成物。Further, another object is to provide excellent adhesion to a substrate and a plastic material, to efficiently remove wafer moiré or thermal degradation due to thermal stress of a semiconductor package, and to provide a cured product excellent in heat resistance and used for semiconductor sealing. An epoxy resin molding material is an effective resin composition for screen printing as a protective film material when sealing a semiconductor.

本案發明者為了達成上述目的,進行專心致力的檢討,結果發現含有(A)下述通式(1)所示之含烷氧矽烷基的聚醯胺醯亞胺樹脂、(B)平均粒徑為0.05~10μm的球狀金屬氧化物微粒子、(C)有機溶劑當作必要成分的網版印刷用樹脂組成物,特別是含有上述(A)、(B)、(C)成分及(D)1分子中具有至少2個環氧基的環氧樹脂、(E)硬化促進劑的網版印刷用樹脂組成物係有效的,而完成本發明。In order to achieve the above object, the inventors of the present invention conducted an intensive review and found that (A) an alkoxyalkylene group-containing polyamine oxime imine resin represented by the following formula (1), (B) average particle diameter a resin composition for screen printing which is a spherical metal oxide fine particle of 0.05 to 10 μm and (C) an organic solvent as an essential component, particularly containing the above components (A), (B), (C) and (D) The resin composition for screen printing having an epoxy resin having at least two epoxy groups in one molecule and (E) a curing accelerator is effective, and the present invention has been completed.

即,本發明提供下述所示的網版印刷用樹脂組成物。That is, the present invention provides the resin composition for screen printing shown below.

[1]一種網版印刷用樹脂組成物,其特徵為以下列者當作必要成分:(A)聚醯胺醯亞胺樹脂,其含有下述通式(1)所表示的烷氧矽烷基, (式中,X係3價有機基,Y係2價有機基,Z係 R1 係碳數1~3的烷基、R2 係碳數1~3的烷基或烷氧基,a係0~4的整數,p係1~100的整數,q係1~100的整數):100質量份,(B)平均粒徑為0.05~10μm的球狀金屬氧化物微粒子:5~350質量份,(C)有機溶劑:上述(A)成分的樹脂之溶解有效量。[1] A resin composition for screen printing characterized by having (A) a polyamidoximine resin containing an alkoxyalkyl group represented by the following formula (1); , (wherein X is a trivalent organic group, Y is a divalent organic group, and Z is a Z system. R 1 is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms of R 2 or an alkoxy group, a is an integer of 0 to 4, p is an integer of 1 to 100, and q is 1 to 100. Integer): 100 parts by mass, (B) spherical metal oxide fine particles having an average particle diameter of 0.05 to 10 μm: 5 to 350 parts by mass, (C) organic solvent: a dissolved effective amount of the resin of the above component (A).

[2]一種網版印刷用樹脂組成物,其特徵為含有:(A)聚醯胺醯亞胺樹脂,其含有下述通式(1)所表示的烷氧矽烷基, (式中,X係3價有機基,Y係2價有機基,Z係 R1 係碳數1~3的烷基、R2 係碳數1~3的烷基或烷氧基,a係0~4的整數,p係1~100的整數,q係1~100的整數),(B)平均粒徑為0.05~10μm的球狀金屬氧化物微粒子,(C)有機溶劑,(D)1分子中具有至少2個環氧基的環氧樹脂,(E)硬化促進劑。[2] A resin composition for screen printing comprising: (A) a polyamidoximine resin containing an alkoxyalkyl group represented by the following formula (1); (wherein X is a trivalent organic group, Y is a divalent organic group, and Z is a Z system. R 1 is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms of R 2 or an alkoxy group, a is an integer of 0 to 4, p is an integer of 1 to 100, and q is 1 to 100. (Integer), (B) spherical metal oxide fine particles having an average particle diameter of 0.05 to 10 μm, (C) an organic solvent, (D) an epoxy resin having at least two epoxy groups in one molecule, and (E) hardening promotion Agent.

[3]如[2]記載的網版印刷用樹脂組成物,其中上述(D)成分的環氧樹脂係下述通式(2) (式中,G表示縮水甘油基,R表示氫原子或一價烴基,全部R中的至少1個係一價烴基,n係0或1以上的整數)所示的環氧樹脂。[3] The resin composition for screen printing according to [2], wherein the epoxy resin of the component (D) is a formula (2) (wherein, G represents a glycidyl group, R represents a hydrogen atom or a monovalent hydrocarbon group, and at least one of all R is a monovalent hydrocarbon group, and n is an integer of 0 or 1 or more).

[4]如[1]至[3]項中任一項記載的網版印刷用樹脂組成物,其中上述(B)金屬氧化物微粒子的表面係經矽氮烷類及/或矽烷偶合劑所處理。The resin composition for screen printing according to any one of the above aspects, wherein the surface of the (B) metal oxide fine particles is a decazane and/or a decane coupling agent. deal with.

[5]如[4]記載的網版印刷用樹脂組成物,其中上述矽氮烷類係六甲基二矽氮烷。[5] The resin composition for screen printing according to [4], wherein the decazane is hexamethyldioxane.

[6]如[4]記載的網版印刷用樹脂組成物,其中上述矽烷偶合劑係1種或2種以上之具有從胺基、縮水甘油基、巰基、脲基、羥基、烷氧基、巰基中所選出的活性基之化合物。[6] The resin composition for screen printing according to [4], wherein the decane coupling agent is one or more selected from the group consisting of an amine group, a glycidyl group, a thiol group, a ureido group, a hydroxyl group, an alkoxy group, and A compound selected from the active groups in the thiol group.

[7]如[1]至[6]中任一項記載的網版印刷用樹脂組成物,其中上述(B)成分含有60~100質量%的平均粒徑0.05~10μm之真球狀矽石。The resin composition for screen printing according to any one of the above aspects, wherein the component (B) contains 60 to 100% by mass of a true spherical vermiculite having an average particle diameter of 0.05 to 10 μm. .

[8]如[1]至[7]中任一項記載的網版印刷用樹脂組成物,其中含有沸點200℃以上的有機溶劑當作上述(C)成分。[8] The resin composition for screen printing according to any one of [1] to [7], wherein an organic solvent having a boiling point of 200 ° C or higher is used as the component (C).

依照本發明,可提供網版印刷性良好,不會引起網眼殘留或滲開、脫泡性的惡化等,可得到均勻的膜厚,且連續成形性亦優異的網版印刷用樹脂組成物。According to the present invention, it is possible to provide a resin composition for screen printing which is excellent in screen printing property, does not cause remnulation or bleed out of the mesh, deteriorates in defoaming property, and the like, and has a uniform film thickness and excellent continuous moldability. .

又,可提供與基材及塑膠材料的黏著性優異,有效率地消除半導體封裝的熱應力所致的晶片龜紋或熱降解,給予耐熱性優異的硬化物,於使用半導體密封用環氧樹脂成形材料來密封半導體時作為保護膜材料之有效的網版印刷用樹脂組成物。Moreover, it is excellent in adhesion to a substrate and a plastic material, and can effectively remove wafer moiré or thermal degradation due to thermal stress of a semiconductor package, and provide a cured product excellent in heat resistance, and an epoxy resin for semiconductor sealing is used. An effective resin composition for screen printing which is a protective film material when a molding material is used to seal a semiconductor.

實施發明的最佳形態Best form for implementing the invention

以下對於本發明作更詳細之說明。The invention is described in more detail below.

本發明的必要成分(A)係下述通式(1)所示之含烷氧矽烷基的聚醯胺醯亞胺樹脂。The essential component (A) of the present invention is an alkoxyalkylene group-containing polyamidoximine resin represented by the following formula (1).

(式中,X係3價有機基,Y係2價有機基,Z係 R1 係碳數1~3的烷基、R2 係碳數1~3的烷基或烷氧基,a係0~4的整數,p係1~100的整數,q係1~100的整數)。 (wherein X is a trivalent organic group, Y is a divalent organic group, and Z is a Z system. R 1 is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms of R 2 or an alkoxy group, a is an integer of 0 to 4, p is an integer of 1 to 100, and q is 1 to 100. Integer).

該含烷氧矽烷基的聚醯胺醯亞胺樹脂,係可藉由使在分子末端具有羧基及/或酸酐基的聚醯胺醯亞胺樹脂與含環氧基的烷氧矽烷化合物反應而得。The alkoxyalkylene group-containing polyamidoximine resin can be obtained by reacting a polyamidoquinone imine resin having a carboxyl group and/or an acid anhydride group at a molecular terminal with an epoxy group-containing alkoxysilane compound. Got it.

本發明所用的聚醯胺醯亞胺樹脂,係在分子骨架中具有醯胺基和醯亞胺基,例如可為依照常法使三羧酸與二胺反應而得者,於上述式(1)中,X來自該三羧酸,Y來自二胺。The polyamidoximine resin used in the present invention has a mercaptoamine group and a quinone imine group in the molecular skeleton, and for example, it can be obtained by reacting a tricarboxylic acid with a diamine according to a usual method. In the X, the X is derived from the tricarboxylic acid and Y is derived from the diamine.

作為三羧酸,可舉出偏苯三酸、偏苯三酸酐等。Examples of the tricarboxylic acid include trimellitic acid and trimellitic anhydride.

作為二胺,可舉出對伸苯二胺、間伸苯二胺、4,4’-二胺基二苯基甲烷、4,4’-二胺基二苯基醚、2,2’-雙(4-胺基苯基)丙烷、4,4’-二胺基二苯基碸、4,4’-二胺基二苯基硫化物、1,4-雙(3-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、1,4-雙(對胺基苯基磺醯基)苯、1,4-雙(間胺基苯基磺醯基)苯、1,4-雙(對胺基苯基硫醚)苯、1,4-雙(間胺基苯基硫醚)苯、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[3-甲基-4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[3-氯-4-(4-胺基苯氧基)苯基]丙烷、1,1-雙[4-(4-胺基苯氧基)苯基]乙烷、1,1-雙[3-甲基-4-(4-胺基苯氧基)苯基]乙烷、1,1-雙[3-氯-4-(4-胺基苯氧基)苯基]乙烷、1,1-雙[3,5-二甲基-4-(4-胺基苯氧基)苯基]乙烷、雙[4-(4-胺基苯氧基)苯基]甲烷、雙[3-甲基-4-(4-胺基苯氧基)苯基]甲烷、雙[3-氯-4-(4-胺基苯氧基)苯基]甲烷、雙[3,5-二甲基-4-(4-胺基苯氧基)苯基]甲烷、雙[4-(4-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]全氟丙烷等之含芳香族環的二胺等,較佳為對伸苯二胺、間伸苯二胺、4,4’-二胺基二苯基甲烷、4,4’-二胺基二苯基醚、1,4-雙(3-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[3-甲基-4-(4-胺基苯氧基)苯基]丙烷等。Examples of the diamine include p-phenylenediamine, meta-phenylenediamine, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 2,2'- Bis(4-aminophenyl)propane, 4,4'-diaminodiphenylanthracene, 4,4'-diaminodiphenyl sulfide, 1,4-bis(3-aminophenoxyl) Benzene, 1,4-bis(4-aminophenoxy)benzene, 1,4-bis(p-aminophenylsulfonyl)benzene, 1,4-bis(m-aminophenylsulfonyl) Benzene, 1,4-bis(p-aminophenyl sulfide) benzene, 1,4-bis(m-aminophenyl sulfide) benzene, 2,2-bis[4-(4-aminobenzene) Oxy)phenyl]propane, 2,2-bis[3-methyl-4-(4-aminophenoxy)phenyl]propane, 2,2-bis[3-chloro-4-(4- Aminophenoxy)phenyl]propane, 1,1-bis[4-(4-aminophenoxy)phenyl]ethane, 1,1-bis[3-methyl-4-(4- Aminophenoxy)phenyl]ethane, 1,1-bis[3-chloro-4-(4-aminophenoxy)phenyl]ethane, 1,1-bis[3,5-di Methyl-4-(4-aminophenoxy)phenyl]ethane, bis[4-(4-aminophenoxy)phenyl]methane, bis[3-methyl-4-(4- Aminophenoxy)phenyl]methane, double [3 Chloro-4-(4-aminophenoxy)phenyl]methane, bis[3,5-dimethyl-4-(4-aminophenoxy)phenyl]methane, bis[4-(4 An aromatic ring-containing diamine such as -aminophenoxy)phenyl]anthracene or 2,2-bis[4-(4-aminophenoxy)phenyl]perfluoropropane, etc., preferably Phenylenediamine, m-phenylenediamine, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 1,4-bis(3-aminophenoxyl) Benzene, 1,4-bis(4-aminophenoxy)benzene, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[3- 4--4-(4-aminophenoxy)phenyl]propane and the like.

又,為了賦予對基材的黏著性、柔軟性,亦可使用矽氧烷二胺類當作二胺。具體的地,可舉出下述式(3)~(11)所示者等,但當然不受此等所限定。又,依照所欲,此等二胺化合物可單獨1種地或以2種以上的組合來使用。Moreover, in order to provide adhesiveness and flexibility to a base material, a helium oxide diamine can also be used as a diamine. Specifically, those shown by the following formulas (3) to (11) may be mentioned, but of course, they are not limited thereto. Further, these diamine compounds may be used singly or in combination of two or more kinds as needed.

於上述聚醯胺醯亞胺樹脂的製造方法中,有醯氯法、異氰酸酯法及直接聚合法等,可以使用任一種方法。In the method for producing the polyamidoximine resin, there may be mentioned a method such as a ruthenium chloride method, an isocyanate method, a direct polymerization method, or the like.

上述原料成分的反應比例,必須成為使羧基及/或酸酐基殘存在分子末端的比例,(胺基的莫耳數)/(羧基+酸酐基的莫耳數)=0.80~0.99,較佳為0.85~0.99,若低於0.8,則硬化膜的強韌性、柔軟性會降低,而若超過0.99,則有不能定量地得到充分的末端羧基及/或酸酐基之虞。The reaction ratio of the above-mentioned raw material component must be such a ratio that the carboxyl group and/or the acid anhydride group remain at the molecular terminal, (the molar number of the amine group) / (the molar number of the carboxyl group + the acid anhydride group) = 0.80 to 0.99, preferably When it is less than 0.8, the toughness and flexibility of the cured film may be lowered, and if it exceeds 0.99, sufficient terminal carboxyl group and/or acid anhydride group may not be quantitatively obtained.

聚醯胺醯亞胺樹脂的分子量,作為以GPC為根據的苯乙烯換算之重量平均分子量,較佳係5000~100000。若低於5000,則硬化膜的強韌性、柔軟性會降低,而若超過100000,則有由於高黏度而降低操作性之虞。The molecular weight of the polyamidoximine resin is preferably 5,000 to 100,000 as a weight average molecular weight in terms of styrene in terms of GPC. When it is less than 5,000, the toughness and flexibility of the cured film may be lowered, and if it exceeds 100,000, the workability may be lowered due to high viscosity.

藉由使如此所得到的聚醯胺醯亞胺樹脂之末端羧基及/或酸酐基,與下述式(12) 所示之含環氧基的烷氧矽烷化合物之環氧基進行加成反應,可得到下述式(1) 所示之含烷氧矽烷基的聚醯胺醯亞胺樹脂。By using the terminal carboxyl group and/or the acid anhydride group of the polyamidoximine resin thus obtained, and the following formula (12) The epoxy group of the epoxy group-containing alkoxysilane compound is subjected to an addition reaction to obtain the following formula (1). The alkoxyalkylene group-containing polyamidoximine resin is shown.

再者,於上述式中,X、Y、Z及R1 、R2 、a、p、q係如上述,但p、q各自獨立地係2~100的整數,特佳係3~80的整數,a較佳係0、1、2或3。Further, in the above formula, X, Y, Z and R 1 , R 2 , a, p, and q are as described above, but p and q are each independently an integer of 2 to 100, and particularly preferably 3 to 80. An integer, a is preferably 0, 1, 2 or 3.

此處,上述羧基、酸酐基與環氧基的反應係可依照常法來進行,於上述聚醯胺醯亞胺樹脂的分子鏈兩末端殘存有羧基時,可使對該羧基而言等莫耳以上的環氧基反應,而且於上述聚醯胺醯亞胺樹脂的一末端殘存有羧基,另一末端殘存有酸酐基時,可使對該羧基和酸酐基的合計而言等莫耳以上的環氧基反應。又,反應溫度係30~130℃,反應時間係1~10小時左右,按照需要,較佳為使用N-甲基-2-吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等的溶劑來進行。Here, the reaction between the carboxyl group, the acid anhydride group and the epoxy group can be carried out according to a usual method, and when a carboxyl group remains at both ends of the molecular chain of the polyamidoximine resin, the carboxyl group can be When the epoxy group reacts above the ear and the carboxyl group remains at one end of the polyamidoximine resin and the acid anhydride group remains at the other end, the total of the carboxyl group and the acid anhydride group may be more than the molar amount. The epoxy group reacts. Further, the reaction temperature is 30 to 130 ° C, and the reaction time is about 1 to 10 hours, and if necessary, N-methyl-2-pyrrolidone, N,N-dimethylformamide, and N are preferably used. It is carried out with a solvent such as N-dimethylacetamide.

作為(A)成分,可以使用市售品,市販品例如是Compoceran H900-2、H901-2、H901-2D(荒川化學工業製)等。Commercially available products can be used as the component (A), and the commercial products are, for example, Compoceran H900-2, H901-2, H901-2D (manufactured by Arakawa Chemical Industries Co., Ltd.).

(B)成分係平均粒徑為0.05~10μm的球狀金屬氧化物微粒子。作為該球狀金屬氧化物微粒子,較佳為具有0.7~1.0的華德樂(Wardell)球形度。The component (B) is a spherical metal oxide fine particle having an average particle diameter of 0.05 to 10 μm. The spherical metal oxide fine particles preferably have a Wardell sphericity of 0.7 to 1.0.

此處,所謂的「華德樂球形度」(參照化學工學手冊,丸善株式會社發行),係將粒子的球形度以(與粒子的投影面積相等的圓之直徑)/(在粒子的投影像所外接的最小圓之直徑)所測定的指數,該指數愈接近1.0,則意味愈接近真球體的粒子。本發明的球狀金屬氧化物微粒子之華德樂球形度較佳為0.9~1.0,特佳為0.95~1.0。華德樂球形度若低於0.7,則(B)成分的填充量增大時,組成物的搖變性會增大。Here, the so-called "Hua Duo sphericity" (refer to the Handbook of Chemical Engineering, issued by Maruzen Co., Ltd.) is to spheronize the particle (the diameter of a circle equal to the projected area of the particle) / (the projection of the particle) The index measured by the diameter of the smallest circle attached to it. The closer the index is to 1.0, the closer it is to the particles of the true sphere. The spherical sphericity of the spherical metal oxide fine particles of the present invention is preferably from 0.9 to 1.0, particularly preferably from 0.95 to 1.0. When the sphericity of the Waldorf is less than 0.7, the amount of the component (B) increases, and the shake of the composition increases.

從低搖變性之點看,作為(B)成分,較佳為含有60~100質量%(特佳80~100質量%的真球狀金屬氧化物微粒子之球狀金屬氧化物微粒子。再者,於本說明書中,「真球狀」亦包含華德樂球形度在0.95~1之範圍內的稍微畸變球之概念。From the viewpoint of the low shake, it is preferable that the component (B) contains 60 to 100% by mass (particularly 80 to 100% by mass of spherical spherical metal oxide fine particles of spherical metal oxide fine particles. In this specification, "true spherical" also includes the concept of a slightly distorted sphere with a Hudson sphericity in the range of 0.95~1.

又,「平均粒徑」係意味「體積平均粒徑」,例如(股)堀場製作所製的雷射繞射散射式粒度分布測定裝置(商品名稱:LA910)以自動化方式來測定。In addition, the "average particle diameter" means "volume average particle diameter", and is measured, for example, by a laser diffraction scattering type particle size distribution measuring apparatus (trade name: LA910) manufactured by Shiroshima Seisakusho Co., Ltd., in an automated manner.

球狀金屬氧化物微粒子的平均粒徑較佳為0.05~5μm,更佳為0.1~5μm。又,球狀金屬氧化物微粒子較佳為真球狀金屬氧化物微粒子。The average particle diameter of the spherical metal oxide fine particles is preferably from 0.05 to 5 μm, more preferably from 0.1 to 5 μm. Further, the spherical metal oxide fine particles are preferably true spherical metal oxide fine particles.

球狀金屬氧化物微粒子可為1種金屬的氧化物之微粒子,也可為2種以上的金屬之氧化物(即複合氧化物)的微粒子。作為1種金屬的氧化物之具體例子,可舉出矽、鋁、鎂、鋯、鈦等的金屬之氧化物,如矽石(SiO2 )、氧化鋁(Al2 O3 )、二氧化鈦(TiO2 )、二氧化鋯(ZrO2 )等。作為複合氧化物的具體例子,可舉出上述金屬的複合氧化物,如矽石-氧化鋁複合氧化物、矽石-二氧化鈦複合氧化物、矽石-二氧化鋯複合氧化物、矽石-氧化鎂複合氧化物、氧化鋁-氧化鎂複合氧化物等的二成分系複合氧化物,或矽石-氧化鋁-氧化鎂複合氧化物、矽石-氧化鋁-二氧化鈦複合氧化物、矽石-二氧化鈦-氧化鎂複合氧化物等的三成分系複合氧化物等。於此等球狀金屬氧化物微粒子的例子中,較佳為以球狀、尤其真球狀的矽石微粒子當作主成分(即含有60~100質量%)者。The spherical metal oxide fine particles may be fine particles of one type of metal oxide, or may be fine particles of two or more kinds of metal oxides (that is, composite oxides). Specific examples of the oxide of one kind of metal include oxides of metals such as lanthanum, aluminum, magnesium, zirconium, and titanium, such as vermiculite (SiO 2 ), aluminum oxide (Al 2 O 3 ), and titanium oxide (TiO). 2 ), zirconium dioxide (ZrO 2 ) and the like. Specific examples of the composite oxide include composite oxides of the above metals, such as vermiculite-alumina composite oxide, vermiculite-titanium dioxide composite oxide, vermiculite-zirconia composite oxide, vermiculite-oxidation. Two-component composite oxide such as magnesium composite oxide or alumina-magnesia composite oxide, or vermiculite-alumina-magnesia composite oxide, vermiculite-alumina-titanium dioxide composite oxide, vermiculite-titanium dioxide a three-component composite oxide such as a magnesium oxide composite oxide. In the example of the spherical metal oxide fine particles, it is preferable that the spherical fine particles, particularly the spherical fine particles, have the main component (that is, 60 to 100% by mass).

球狀金屬氧化物微粒子可為任何方式製造者,但較佳為使金屬燃燒而得到的金屬氧化物微粒子。該使金屬燃燒而得到的金屬氧化物微粒子,係可藉由在含載體氣體和氧氣的氣氛中,使矽、鋁、鎂、鋯、鈦等的金屬粉末、調合成模來石組成(3Al2 O3 .2SiO2 ~2Al2 O3 .SiO2 )的鋁粉末和矽粉末、調合成尖晶石組成(MgAl2 O4 )的鎂粉末和鋁粉末、調合成菫青石組成(2MgO.2Al2 O3 .5SiO2 )的鋁粉末和鎂粉末及矽粉末等的金屬粉末混合物燃燒,形成化學焰,在該化學焰中得到目的之矽石、氧化鋁、二氧化鈦、二氧化鋯等的1種金屬之氧化物或複合氧化物的微粒子(尤其超微粒子)。於使此等金屬燃燒而得到的金屬氧化物微粒子之中,較佳為含有球狀、尤其真球狀的矽石微粒子當作主成分(即含有60~100質量%)者。The spherical metal oxide fine particles may be produced by any means, but are preferably metal oxide fine particles obtained by burning a metal. The metal oxide fine particles obtained by burning the metal can be composed of a metal powder of cerium, aluminum, magnesium, zirconium, titanium or the like in an atmosphere containing a carrier gas and oxygen (3Al 2 ). O 3 .2SiO 2 ~2Al 2 O 3 .SiO 2 ) aluminum powder and barium powder, magnesium powder and aluminum powder of spinel composition (MgAl 2 O 4 ), and composition of cordierite (2MgO.2Al 2 The aluminum powder of O 3 .5 SiO 2 ) is burned with a metal powder mixture such as magnesium powder or cerium powder to form a chemical flame, and a metal such as vermiculite, alumina, titania or zirconia is obtained in the chemical flame. Microparticles (especially ultrafine particles) of oxides or composite oxides. Among the metal oxide fine particles obtained by burning these metals, it is preferable to contain spherical or particularly spherical fine particles of the fine particles as a main component (that is, 60 to 100% by mass).

球狀金屬氧化物微粒子未必是經過表面處理者,但較佳為表面經矽氮烷類及/或矽烷偶合劑所處理者。The spherical metal oxide fine particles are not necessarily subjected to surface treatment, but are preferably treated with a surface treated with a decane and/or a decane coupling agent.

上述矽氮烷類,例如是六甲基二矽氮烷(HMDS)、六苯基二矽氮烷等的矽氮烷類、或此等中的2種以上之組合。於此等之中,從抑制矽石的凝聚,使酸性的矽石傾向鹼性,提高對有機物的親和性,提高均勻性,提高對(A)成分的樹脂之安定性等的方面來看,較佳為六甲基二矽氮烷。The decane alkane is, for example, a decazane such as hexamethyldioxane (HMDS) or hexaphenyldioxane or a combination of two or more of these. Among these, from the viewpoint of suppressing the aggregation of the vermiculite, the acidic vermiculite tends to be alkaline, the affinity for the organic substance is improved, the uniformity is improved, and the stability of the resin of the component (A) is improved. Preferred is hexamethyldioxane.

上述矽烷偶合劑,例如是具有從胺基、縮水甘油基、巰基、脲基、羥基及烷氧基所組成族群所選出的至少1種活性基(反應性有機官能基)之化合物,或是其組合(例如烷氧基與其它反應性官能基的組合)。作為矽烷偶合劑的具體例子,可舉出γ-縮水甘油氧基丙基三乙氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷等的環氧官能性基含有有機烷氧矽烷,胺基丙基三乙氧基矽烷、脲基丙基三乙氧基矽烷、N-苯基胺基丙基三甲氧基矽烷等之含胺基官能性基的有機烷氧矽烷,苯基三甲氧基矽烷等的芳基烷氧矽烷、甲基三甲氧基矽烷、十八基三甲氧基矽烷等的烷基烷氧矽烷、乙烯基三甲氧基矽烷、烯丙基三甲氧基矽烷等的烯基烷氧矽烷,γ-巰基丙基三甲氧基矽烷等之含巰基官能性基的有機烷氧矽烷等。The above decane coupling agent is, for example, a compound having at least one reactive group (reactive organic functional group) selected from the group consisting of an amine group, a glycidyl group, a thiol group, a ureido group, a hydroxyl group, and an alkoxy group, or Combination (eg, a combination of an alkoxy group with other reactive functional groups). Specific examples of the decane coupling agent include epoxy functional groups such as γ-glycidoxypropyltriethoxysilane and β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane. An amine group containing an amino alkoxydecane, an aminopropyl triethoxy decane, a ureidopropyl triethoxy decane, an N-phenylaminopropyl trimethoxy decane, or the like An alkyl alkoxy oxane such as oxydecane, phenyltrimethoxydecane, etc., alkyl alkoxydecane, octadecyltrimethoxydecane, etc., vinyltrimethoxydecane, allyltrimethyl An alkenyl alkoxysilane such as an oxoxane or an organoalkyloxane having a mercapto functional group such as γ-mercaptopropyltrimethoxydecane.

再者,作為處理方法,可以採用習知的方法。Further, as a processing method, a conventional method can be employed.

作為球狀金屬氧化物微粒子,市售品例如有ADMATECHS株式會社的Admafine SE系列及SC系列等。Commercially available products include, for example, Admafine SE series and SC series of ADMATECHS Co., Ltd. as the spherical metal oxide fine particles.

(B)成分可單獨1種地使用,亦可以併用2種以上,但(B)成分的配合量,對於100質量份的(A)成分而言,係5~350質量份,較佳係5~300質量份,更佳係10~200質量份。該配合量若比5質量份少,則得不到良好的網版印刷性,而若超過350質量份,則會損害(A)成分的樹脂之本來特長的與基材之黏著性。The component (B) may be used alone or in combination of two or more. The amount of the component (B) is preferably 5 to 350 parts by mass, preferably 5 for 100 parts by mass of the component (A). ~300 parts by mass, more preferably 10 to 200 parts by mass. When the amount is less than 5 parts by mass, good screen printing properties are not obtained, and if it exceeds 350 parts by mass, the inherent adhesion of the resin of the component (A) to the substrate is impaired.

本發明的網版印刷用樹脂組成物,藉由使用本成分的球狀金屬氧化物微粒子,在上述配合量中也可壓低搖變性,所形成的圖案不會引起網眼殘留、滲開、脫泡性的惡化等,可得到均勻的膜厚。In the resin composition for screen printing of the present invention, by using the spherical metal oxide fine particles of the present component, the amount of the above-mentioned compounding amount can be reduced, and the formed pattern does not cause the mesh to remain, bleed or peel off. A uniform film thickness can be obtained by deterioration of foaming property or the like.

再者,作為金屬氧化物粉體,於不損害上述效果的範圍內,可以併用熔融金屬氧化物粉體、金屬氧化物破碎物、煙霧質金屬氧化物(發煙的金屬氧化物)等之非球狀氧化物粉體。非球狀金屬氧化物粉體的併用比例,對於100質量份的(B)成分之球狀金屬氧化物粉體而言,係25質量份以下(0~25質量份),特佳為20質量份以下(0~20質量份)。In addition, as the metal oxide powder, a molten metal oxide powder, a metal oxide fracture product, or a fumed metal oxide (smoke metal oxide) may be used in combination within a range that does not impair the above effects. Spherical oxide powder. The combined ratio of the non-spherical metal oxide powder is 25 parts by mass or less (0 to 25 parts by mass), particularly preferably 20%, per 100 parts by mass of the spherical metal oxide powder of the component (B). The following parts (0 to 20 parts by mass).

於(C)成分的有機溶劑中,可以使用能部分地或完全地溶解(A)成分的樹脂者。作為(C)成分的具體例子,可舉出四氫呋喃、1,4-二烷、環戊酮、環己酮、γ-丁內酯、N-甲基吡咯啶酮、N-乙烯基吡咯啶酮、N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、二甲亞碸、1,3-二甲基-2-咪唑啉酮等,較佳為非質子性極性溶劑,特佳為N-甲基吡咯啶酮、N-乙烯基吡咯啶酮、環己酮、γ-丁內酯及1,3-二甲基-2-咪唑啉酮。Among the organic solvents of the component (C), those which partially or completely dissolve the component (A) can be used. Specific examples of the component (C) include tetrahydrofuran and 1,4-diene. Alkane, cyclopentanone, cyclohexanone, γ-butyrolactone, N-methylpyrrolidone, N-vinylpyrrolidone, N,N-dimethylacetamide, N,N-dimethyl Formamide, dimethyl hydrazine, 1,3-dimethyl-2-imidazolidinone, etc., preferably an aprotic polar solvent, particularly preferably N-methylpyrrolidone, N-vinylpyrrolidine Ketone, cyclohexanone, γ-butyrolactone and 1,3-dimethyl-2-imidazolidinone.

當本發明的組成物所形成的硬化膜為20μm以下的薄膜時,為了不損害網版印刷的連續成形性,特佳係併用沸點200℃以上的有機溶劑。作為沸點200℃以上的有機溶劑,例如可為γ-丁內酯、N-甲基吡咯啶酮、N-乙烯基吡咯啶酮、1,3-二甲基-2-咪唑啉酮。When the cured film formed by the composition of the present invention is a film of 20 μm or less, it is particularly preferable to use an organic solvent having a boiling point of 200 ° C or more in order not to impair the continuous moldability of screen printing. The organic solvent having a boiling point of 200 ° C or higher may be, for example, γ-butyrolactone, N-methylpyrrolidone, N-vinylpyrrolidone or 1,3-dimethyl-2-imidazolidinone.

再者,(C)成分可單獨1種地使用,亦可以併用2種以上。Further, the component (C) may be used alone or in combination of two or more.

(C)成分的配合量係可溶解上述(A)成分的有效量,通常使固體成分量成為10~80質量%之量,特佳係成為20~70質量%之量。The compounding amount of the component (C) is an effective amount for dissolving the component (A), and the amount of the solid component is usually 10 to 80% by mass, particularly preferably 20 to 70% by mass.

於本發明的網版印刷用樹脂組成物中,更可配合(D)環氧樹脂、(E)硬化促進劑。In the resin composition for screen printing of the present invention, (D) an epoxy resin and (E) a curing accelerator may be further blended.

本發明的(D)成分之1分子中具有至少2個環氧基的環氧樹脂係沒有特別的限制,較佳的例子如下述通式(2)所示的環氧樹脂。The epoxy resin having at least two epoxy groups in one molecule of the component (D) of the present invention is not particularly limited, and a preferred example is an epoxy resin represented by the following formula (2).

(式中,G表示縮水甘油基,R表示氫原子或一價烴基,全部R中的至少1個係一價烴基,n係0或1以上的整數)。 (wherein G represents a glycidyl group, R represents a hydrogen atom or a monovalent hydrocarbon group, and at least one of all R is a monovalent hydrocarbon group, and n is 0 or an integer of 1 or more).

此處,作為R所示的一價烴,較佳為碳數1~8、尤其1~6的烷基、芳基等之未取代或取代一價烴基,可舉出甲基、乙基、丙基、丁基、第三丁基、苯基等當作代表者。Here, the monovalent hydrocarbon represented by R is preferably an unsubstituted or substituted monovalent hydrocarbon group such as an alkyl group or an aryl group having 1 to 8 carbon atoms, particularly 1 to 6 carbon atoms, and examples thereof include a methyl group and an ethyl group. A propyl group, a butyl group, a tributyl group, a phenyl group or the like is taken as a representative.

又,於式(2)的環氧樹脂中,n係0或1以上的整數,較佳係0或1~20的整數,尤其0或1~10的整數,式(2)的環氧樹脂亦可為具有不同n值的環氧樹脂之混合物。於此情況下,為了儘可能提高硬化物的玻璃轉移溫度,較佳為選擇具有70質量%以下(較佳60質量%以下)之n為0者,表示平均聚合度的n之平均值在1~3的範圍內之分子量分布的環氧樹脂。此處,若含有比70質量%多之n=0者,則有降低玻璃轉移溫度的情況。Further, in the epoxy resin of the formula (2), n is an integer of 0 or 1 or more, preferably 0 or an integer of 1 to 20, particularly 0 or an integer of 1 to 10, and an epoxy resin of the formula (2). It may also be a mixture of epoxy resins having different values of n. In this case, in order to increase the glass transition temperature of the cured product as much as possible, it is preferable to select that 70% by mass or less (preferably 60% by mass or less) of n is 0, and the average value of n indicating the average degree of polymerization is 1 An epoxy resin having a molecular weight distribution in the range of ~3. Here, when n = 0 is contained more than 70% by mass, the glass transition temperature may be lowered.

作為上述式(2)的環氧樹脂,具體地例如是下述式(13)~(15)。Specific examples of the epoxy resin of the above formula (2) are the following formulas (13) to (15).

(式中,t-Bu表示第三丁基,OG表示 ,n係如上述(以下同樣))。 (where t-Bu represents the third butyl group, OG represents , n is as described above (the same applies hereinafter).

於本發明中,除了上述式(2)的環氧樹脂,亦可適當地組合其它環氧樹脂,例如雙酚A型環氧樹脂、酚醛清漆型環氧樹脂、脂環狀環氧樹脂、縮水甘油型環氧樹脂、或下述式(16)~(18)所示的環氧樹脂。In the present invention, in addition to the epoxy resin of the above formula (2), other epoxy resins such as bisphenol A type epoxy resin, novolac type epoxy resin, grease cyclic epoxy resin, shrinkage may be appropriately combined. A glycerin type epoxy resin or an epoxy resin represented by the following formulas (16) to (18).

再者,可以使用難燃化用的溴化環氧樹脂。作為溴化環氧樹脂,可舉出下述式(19)、(20)。Further, a brominated epoxy resin for flame retardation can be used. Examples of the brominated epoxy resin include the following formulas (19) and (20).

此等環氧樹脂可單獨地或混合2種以上而使用。又,此等環氧樹脂的使用量,對於100質量份之含烷氧矽烷基的聚醯胺醯亞胺樹脂而言,較佳係1~150質量份,更佳係2~100質量份。若低於1質量份,則得不到硬化物對基材的黏著強度,另一方面,若超過150質量份,則有降低硬化物的耐熱性之情況。These epoxy resins can be used singly or in combination of two or more. Further, the amount of the epoxy resin used is preferably 1 to 150 parts by mass, more preferably 2 to 100 parts by mass, per 100 parts by mass of the alkoxyalkylene group-containing polyamidoximine resin. When the amount is less than 1 part by mass, the adhesive strength of the cured product to the substrate is not obtained. On the other hand, when it exceeds 150 parts by mass, the heat resistance of the cured product may be lowered.

於此情況下,上述式(2)的環氧樹脂在環氧樹脂總量中係1~100質量%,特佳係5~100質量%。In this case, the epoxy resin of the above formula (2) is 1 to 100% by mass, particularly preferably 5 to 100% by mass, based on the total amount of the epoxy resin.

本發明的(E)成分之硬化促進劑係沒有特別的限制,但從該含烷氧矽烷基的聚醯胺醯亞胺樹脂與環氧樹脂之反應性高來看,較佳係胺系觸媒。作為胺系觸媒,可配合2-甲基咪唑、2-乙基-4-甲基咪唑、1-氰乙基-2-甲基咪唑、2-苯基-4,5-二羥基甲基咪唑等的咪唑衍生物等,可使用此等中的1種或2種以上。特佳為使用下述式(21)的咪唑化合物,藉由使用該構造的咪唑化合物,可以賦予硬化物的高耐熱化、高耐濕化及高黏著性。The hardening accelerator of the component (E) of the present invention is not particularly limited, but from the viewpoint of high reactivity of the alkoxyalkylene group-containing polyamidoximine resin and the epoxy resin, the amine-based contact is preferred. Media. As an amine-based catalyst, it can be combined with 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-methylimidazole, 2-phenyl-4,5-dihydroxymethyl One or two or more of these may be used as the imidazole derivative such as imidazole. It is particularly preferable to use an imidazole compound of the following formula (21), and by using the imidazole compound having such a structure, it is possible to impart high heat resistance, high moisture resistance, and high adhesion to the cured product.

(式中,Ph表示苯基)。 (wherein, Ph represents a phenyl group).

作為其它硬化促進劑,可以使用膦系觸媒,具體地為三苯膦、三苯基鏻三苯基硼酸酯、四苯基鏻四苯基硼酸酯或下述式(22)所示的化合物。As another hardening accelerator, a phosphine-based catalyst, specifically, triphenylphosphine, triphenylsulfonium triphenyl borate, tetraphenylphosphonium tetraphenyl borate or the following formula (22) can be used. compound of.

(式中,R3 ~R10 例如是氫原子、氟、溴素、碘等的鹵素原子,碳數1~8的烷基、碳數2~8的烯基、碳數2~8的烯基、碳數1~8的烷氧基、三氟甲基、苯基等,全部取代基可為相同或不同)。 (In the formula, R 3 to R 10 are, for example, a halogen atom such as a hydrogen atom, fluorine, bromine or iodine; an alkyl group having 1 to 8 carbon atoms; an alkenyl group having 2 to 8 carbon atoms; and an alkene having 2 to 8 carbon atoms. The base, the alkoxy group having 1 to 8 carbon atoms, a trifluoromethyl group, a phenyl group, etc., all of which may be the same or different).

該(E)成分的硬化促進劑之使用量,對於100質量份之含烷氧矽烷基的聚醯胺醯亞胺樹脂(A)及環氧樹脂(D)的合計量而言,較佳係0.001~20質量份,更佳係0.01~10質量份。若低於0.001質量份,則有不能在短時間內使硬化的情況,而若超過20質量份,則組成物有缺乏保存安定性的情況。The amount of the hardening accelerator of the component (E) is preferably in the total amount of 100 parts by mass of the alkoxyalkyl group-containing polyamidoximine resin (A) and the epoxy resin (D). 0.001 to 20 parts by mass, more preferably 0.01 to 10 parts by mass. When the amount is less than 0.001 part by mass, the curing may not be performed in a short period of time, and if it exceeds 20 parts by mass, the composition may be inferior in storage stability.

於本發明的組成物中,除了上述(A)~(E)成分,在不損害本發明的效果之範圍內,例如可按照目的添加抗氧化劑、熱安定劑、導電性填料、顔料、染料等的著色劑等。In the composition of the present invention, in addition to the above components (A) to (E), for example, an antioxidant, a thermal stabilizer, a conductive filler, a pigment, a dye, or the like may be added according to the purpose, without impairing the effects of the present invention. Coloring agent, etc.

本發明的組成物係可藉由將上述(A)~(C)成分、或(A)~(E)成分、及視情況含有的其它成分,依照常法作混合而調製成。具體地,例如可以使用具備攪拌裝置及加熱裝置的混合研磨機、三支輥、球磨機、行星式混合機等。又,亦可適當地組合2種以上的此等混合裝置而使用。The composition of the present invention can be prepared by mixing the above components (A) to (C), or (A) to (E) components, and optionally other components, according to a usual method. Specifically, for example, a mixing mill equipped with a stirring device and a heating device, a three-roller, a ball mill, a planetary mixer, or the like can be used. Further, two or more types of such mixing devices may be combined as appropriate.

將上述組成物塗佈在矽晶圓等的基體之表面上的方法(網版印刷法)係:首先,以具有所欲圖案的開口部之蒙片來覆蓋基體的表面,將組成物投入刮墨刀部,接著使刮墨刀移動,邊將組成物加壓邊使在蒙片上移動,將組成物填充於該蒙片構件的開口部(填充步驟),然後,拆下蒙片,而在上述基體的表面形成組成物的圖案。如此所形成的組成物之硬化,例如是在室溫(20℃±5℃)~200℃的低溫下階段地(例如1階段或2階段以上的硬化溫度)進行固化,視需要更可在200~350℃的高溫進行固化(後固化)。再者,後固化時間通常係0.1~20小時。A method of applying the above composition to the surface of a substrate such as a tantalum wafer (screen printing method): first, covering the surface of the substrate with a mask having an opening portion having a desired pattern, and putting the composition into the scraping The ink blade portion is then moved by the squeegee, and the composition is pressed to move on the mask, and the composition is filled in the opening portion of the mask member (filling step), and then the mask is removed, and The surface of the above substrate forms a pattern of the composition. The hardening of the composition thus formed is, for example, solidified at a low temperature (for example, one-stage or two-stage hardening temperature) at a low temperature of room temperature (20 ° C ± 5 ° C) to 200 ° C, and may be further 200 as needed. Curing (post-cure) at a high temperature of ~350 °C. Furthermore, the post-cure time is usually 0.1 to 20 hours.

使用本發明的樹脂組成物藉由網版印刷法所形成的圖案,係解像度高,不會引起網眼殘留或滲開、脫泡性的惡化等,可得到均勻的膜厚。又,由於連續成形性亦優異,故可利用於適合於晶圓水準的的半導體元件表面之鈍化膜、保護膜、二極體、電晶體等的接合部之接合保護膜、VLSI的α線遮蔽膜、層間絕緣膜、離子注入光罩等、以及印刷電路板的保形塗層、液晶表面元件的配向膜、玻璃纖維的保護膜、太陽能電池的表面保護膜或混有導電性填充劑的導電性膜等之形成的網版印刷用樹脂組成物之廣泛範圍中。The pattern formed by the screen printing method using the resin composition of the present invention has a high resolution, does not cause residual or bleed of the mesh, and deteriorates the defoaming property, and a uniform film thickness can be obtained. In addition, since it is excellent in continuous moldability, it can be used for a bonding protective film of a bonding film, a protective film, a junction of a diode, a transistor, or the like on a surface of a semiconductor element suitable for wafer level, and α-line shielding of VLSI. Film, interlayer insulating film, ion implantation mask, etc., and conformal coating of printed circuit board, alignment film of liquid crystal surface element, protective film of glass fiber, surface protection film of solar cell or conductive mixed with conductive filler A wide range of resin compositions for screen printing formed by formation of a film or the like.

於使用本發明的網版印刷用樹脂組成物當作上述半導體元件等的保護膜時,藉由網版印刷來塗佈半導體元件及/或引線框,將其加熱硬化,例如可形成厚度0.1~100μm左右的被膜。於上述硬化條件下形成硬化膜後,將半導體密封用環氧樹脂成形材料模型化,可以提高半導體密封用環氧樹脂成形材料與基材(例如Ni、Ag、Cu、Si、SiO2 等的無機基材)之黏著性。如此所得到的半導體裝置在吸濕後的焊料回流中,沒有見到半導體密封用環氧樹脂成形材料的龜裂及與基材(例如Ni、Ag、Cu、Si、SiO2 等的無機基材)的剝離,而為可靠性高者。When the resin composition for screen printing of the present invention is used as a protective film for the above-described semiconductor element or the like, the semiconductor element and/or the lead frame are coated by screen printing, and the film is heat-hardened, for example, to a thickness of 0.1~. A film of about 100 μm. After the cured film is formed under the above-described curing conditions, the epoxy resin molding material for semiconductor sealing is molded, and the epoxy resin molding material for semiconductor sealing and the substrate (for example, inorganic materials such as Ni, Ag, Cu, Si, SiO 2 , etc.) can be improved. Adhesion of the substrate). In the semiconductor device thus obtained, no cracks in the epoxy resin molding material for semiconductor encapsulation and an inorganic substrate such as Ni, Ag, Cu, Si, SiO 2 or the like are observed in the solder reflow after moisture absorption. ) stripping, but for those with high reliability.

[實施例][Examples]

以下,藉由實施例及比較例來詳細說明本發明,惟本發明不受此等所限定。Hereinafter, the present invention will be specifically described by way of Examples and Comparative Examples, but the present invention is not limited thereto.

首先,如下述地,準備網版印刷用樹脂組成物的各成分。First, each component of the resin composition for screen printing was prepared as follows.

網版印刷用樹脂組成物成分Resin composition for screen printing

(a)基礎樹脂樹脂溶液A:調製40%樹脂部分之含烷氧矽烷基的聚醯胺醯亞胺樹脂溶液(Compoceran H900-2:荒川化學工業(股)製)。(a) Base Resin Resin Solution A: A solution of a 40% resin-containing alkoxyalkylene group-containing polyamidoximine resin (Compoceran H900-2: manufactured by Arakawa Chemical Industries Co., Ltd.).

樹脂溶液B:調製40%樹脂部分之含烷氧矽烷基的聚醯胺醯亞胺樹脂溶液(Compoceran H901-2:荒川化學工業(股)製)。Resin solution B: A solution of a 40% resin-containing alkoxyalkylene group-containing polyamidoximine resin (Compoceran H901-2: manufactured by Arakawa Chemical Industries Co., Ltd.).

樹脂溶液C(合成例):於具備攪拌機、溫度計及氮氣置換裝置的燒瓶內,投入32.22克(0.10莫耳)當作四羧酸二酐的3,3’,4,4’-聯苯基四羧酸二酐及35克N-甲基-2-吡咯啶酮,於其中以使反應系的溫度不超過50℃的方式,邊調整邊徐徐滴下由2.49克(0.01莫耳%)當作二胺的1,3-雙(3-胺基丙基)-1,1,3,3-四甲基二矽氧烷及18.02克(0.09莫耳)4,4’-二胺基二苯基醚溶解在20克N-甲基-2-吡咯啶酮中而成的溶液。滴下結束後,再於室溫攪拌12小時,以促進反應,得到黃褐色透明的聚酸胺酸樹脂溶液。此溶液的黏度係250Pa.S,樹脂固體成分係50.1質量%。將其當作樹脂溶液C。Resin solution C (synthesis example): In a flask equipped with a stirrer, a thermometer, and a nitrogen gas replacement device, 32.22 g (0.10 mol) of 3,3',4,4'-biphenyl group as tetracarboxylic dianhydride was charged. Tetracarboxylic dianhydride and 35 g of N-methyl-2-pyrrolidone, in which the temperature of the reaction system is not more than 50 ° C, and the dropwise addition is made up of 2.49 g (0.01 mol%). 1, 3-bis(3-aminopropyl)-1,1,3,3-tetramethyldioxane of diamine and 18.02 g (0.09 mol) of 4,4'-diaminodiphenyl A solution in which the ether was dissolved in 20 g of N-methyl-2-pyrrolidone. After completion of the dropwise addition, the mixture was further stirred at room temperature for 12 hours to promote the reaction to obtain a yellow-brown transparent polyamic acid resin solution. The viscosity of this solution is 250Pa. S, the resin solid content is 50.1% by mass. This was taken as the resin solution C.

[化19](b)環氧樹脂 軟化點:85℃,環氧當量:214(n=0:59質量%,n=1:24質量%,n=2:8質量%,其它:9質量%) 軟化點:79℃、環氧當量:165(n=0:54質量%,n=1:31質量%,n=2:9質量%,其它:6質量%)(3)雙酚A型(Epikote 1001:JER公司製)軟化點:64℃,環氧當量:450(c)硬化促進劑2-甲基-4,5-二羥基甲基咪唑(2PHZ)(d)填充劑(1)真球狀矽石微粒子(Admafine SC2500-SE:(股)ADMATECHS製)平均粒徑0.5μm(2)薰矽石(AEROSILR972:日本AEROSIL(股)製,粒子形狀係無定形)(e)有機溶劑N-甲基-2-吡咯啶酮(NMP)1,3-二甲基-2-咪唑啉酮(DMI)[Chem. 19] (b) Epoxy resin Softening point: 85 ° C, epoxy equivalent: 214 (n = 0: 59 mass%, n = 1: 24 mass%, n = 2: 8 mass%, others: 9 mass%) Softening point: 79 ° C, epoxy equivalent: 165 (n = 0: 54 mass%, n = 1: 31 mass%, n = 2: 9 mass%, others: 6 mass%) (3) bisphenol A type ( Epikote 1001: manufactured by JER) Softening point: 64 ° C, epoxy equivalent: 450 (c) Hardening accelerator 2-methyl-4,5-dihydroxymethylimidazole (2PHZ) (d) filler (1) The globular vermiculite particles (Admafine SC2500-SE: manufactured by ADMATECHS) have an average particle diameter of 0.5 μm (2) oxonite (AEROSILR 972: manufactured by Japan AEROSIL Co., Ltd., particle shape is amorphous) (e) Organic solvent N -methyl-2-pyrrolidone (NMP) 1,3-dimethyl-2-imidazolidinone (DMI)

以成為表1中所示組成(單位係質量份)的方式,均勻混合上述(a)~(e)的成分,得到糊狀樹脂組成物。對於所得到的組成物,進行如下述的評價。表1中顯示結果。The components (a) to (e) described above were uniformly mixed so as to have the composition (unit parts by mass) shown in Table 1, to obtain a paste resin composition. The evaluation of the obtained composition was as follows. The results are shown in Table 1.

評價方法Evaluation method

(a)黏度使用數位黏度計(BROOKFIELD製,商品名稱:DV-II+)來測定23℃的黏度。(a) Viscosity The viscosity at 23 ° C was measured using a digital viscometer (manufactured by BROOKFIELD, trade name: DV-II+).

(b)網版印刷性使用網版印刷機(C.W.PRICE CO.INC.製,商品名稱:MODEL MC212)及網版蒙片(325網眼,乳厚:15μm,網眼厚:35μm)來進行。以蒙片的設置、刮墨刀的組成物之填充、及蒙片的拆下當作1次成形步驟,進行100次的連續成形後,確認圖案形狀的惡化。然後,於烘箱中在100℃暴露0.5小時,接著於250℃暴露4小時以使硬化。對所得到的圖案,觀察網眼、發泡及圖案邊緣的滲開。(b) Screen printing using a screen printing machine (manufactured by CWPRICE CO. INC., trade name: MODEL MC212) and screen mask (325 mesh, milk thickness: 15 μm, mesh thickness: 35 μm) . The provision of the mask, the filling of the composition of the doctor blade, and the removal of the mask were regarded as one molding step, and after 100 consecutive moldings, the deterioration of the pattern shape was confirmed. Then, it was exposed to an oven at 100 ° C for 0.5 hour, followed by exposure at 250 ° C for 4 hours to cause hardening. For the obtained pattern, the bleeding of the mesh, the foam, and the edge of the pattern were observed.

(c)吸濕後的黏著性將樹脂組成物塗佈在表1中所示的各種試樣上,使硬化後,在175℃、6865kPa(70kg/cm2 )、成形時間90秒的條件下,使環氧樹脂組成物(KMC3580CA:信越化學工業(股)製)成形為底面積10mm2 、高度3mm的圓筒形,在180℃使後固化4小時。將其放置在85℃/85%RH的氣氛中168小時,再於260℃的IR回流後,以推拉計來測定成形物與各種試樣的剝離力。(c) Adhesiveness after moisture absorption The resin composition was applied to various samples shown in Table 1, and after hardening, at 175 ° C, 6865 kPa (70 kg/cm 2 ), and a molding time of 90 seconds. An epoxy resin composition (KMC3580CA: manufactured by Shin-Etsu Chemical Co., Ltd.) was molded into a cylindrical shape having a bottom area of 10 mm 2 and a height of 3 mm, and post-cured at 180 ° C for 4 hours. This was placed in an atmosphere of 85 ° C / 85% RH for 168 hours, and after IR reflux at 260 ° C, the peeling force of the molded article and various samples was measured by a push-pull gauge.

(d)熱循環的耐龜裂性於使9.0mm×4.5mm×0.5mm大小的矽晶片接著於14PIN-IC框(42合金),然後塗佈表1中所示的樹脂組成物,使硬化後,於其上使上述環氧樹脂組成物在175℃成形90秒,在180℃後固化4小時後,重複-50℃、30分鐘~180℃、30分鐘的熱循環,測定1,000次循環後的樹脂龜裂發生率。(d) Crack resistance of thermal cycle. A crucible wafer of 9.0 mm × 4.5 mm × 0.5 mm size was attached to a 14PIN-IC frame (42 alloy), and then the resin composition shown in Table 1 was applied to harden. Thereafter, the epoxy resin composition was molded at 175 ° C for 90 seconds, and after curing at 180 ° C for 4 hours, the thermal cycle of -50 ° C, 30 minutes to 180 ° C, and 30 minutes was repeated, and 1,000 cycles were measured. The rate of resin cracking.

由表1可確認:相對於比較例而言,實施例係有黏度降低的傾向,印刷性亦優異。又,吸濕後的黏著性及熱循環的耐龜裂性皆優異。It can be confirmed from Table 1 that the examples have a tendency to lower the viscosity and are excellent in printability as compared with the comparative examples. Further, the adhesion after moisture absorption and the crack resistance of the heat cycle are excellent.

Claims (6)

一種網版印刷用樹脂組成物,其特徵為含有:(A)聚醯胺醯亞胺樹脂,其含有下述通式(1)所示的烷氧矽烷基, (式中,X係3價有機基,Y係2價有機基,Z係 R1 係碳數1~3的烷基、R2 係碳數1~3的烷基或烷氧基,a係0~4的整數,p係1~100的整數,q係1~100的整數),(B)平均粒徑為0.05~10μm的球狀金屬氧化物微粒子,(C)有機溶劑,(D)下述通式(2)表示之環氧樹脂, (式中,G表示縮水甘油基,R表示氫原子或一價烴基,全部R中的至少1個係一價烴基,n係0或1以上的整數),(E)硬化促進劑。A resin composition for screen printing comprising: (A) a polyamidoximine resin containing an alkoxyalkyl group represented by the following formula (1); (wherein X is a trivalent organic group, Y is a divalent organic group, and Z is a Z system. R 1 is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms of R 2 or an alkoxy group, a is an integer of 0 to 4, p is an integer of 1 to 100, and q is 1 to 100. (Integer), (B) spherical metal oxide fine particles having an average particle diameter of 0.05 to 10 μm, (C) an organic solvent, and (D) an epoxy resin represented by the following formula (2). (wherein G represents a glycidyl group, R represents a hydrogen atom or a monovalent hydrocarbon group, at least one of all R is a monovalent hydrocarbon group, n is an integer of 0 or 1 or more), and (E) a curing accelerator. 如申請專利範圍第1項之網版印刷用樹脂組成物,其中上述(B)金屬氧化物微粒子的表面係經矽氮烷類及/或矽烷偶合劑所處理。 The resin composition for screen printing according to the first aspect of the invention, wherein the surface of the (B) metal oxide fine particles is treated with a decane alkane and/or a decane coupling agent. 如申請專利範圍第2項之網版印刷用樹脂組成物,其中上述矽氮烷類係六甲基二矽氮烷。 The resin composition for screen printing according to the second aspect of the invention, wherein the decazane is hexamethyldioxane. 如申請專利範圍第2項之網版印刷用樹脂組成物,其中上述矽烷偶合劑係1種或2種以上之具有從胺基、縮水甘油基、巰基、脲基、羥基、及烷氧基中所選出的活性基之化合物。 The resin composition for screen printing according to the second aspect of the invention, wherein the decane coupling agent is one or more selected from the group consisting of an amine group, a glycidyl group, a thiol group, a urea group, a hydroxyl group, and an alkoxy group. The selected reactive group of compounds. 如申請專利範圍第1至4項中任一項之網版印刷用樹脂組成物,其中上述(B)成分含有60~100質量%的平均粒徑0.05~10μm之真球狀矽石。 The resin composition for screen printing according to any one of claims 1 to 4, wherein the component (B) contains 60 to 100% by mass of a true spherical vermiculite having an average particle diameter of 0.05 to 10 μm. 如申請專利範圍第1至4項中任一項之網版印刷用樹脂組成物,其中含有沸點200℃以上的有機溶劑當作上述(C)成分。The resin composition for screen printing according to any one of claims 1 to 4, wherein an organic solvent having a boiling point of 200 ° C or higher is used as the component (C).
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