TWI401111B - Purification process using microchannel devices - Google Patents

Purification process using microchannel devices Download PDF

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TWI401111B
TWI401111B TW097125850A TW97125850A TWI401111B TW I401111 B TWI401111 B TW I401111B TW 097125850 A TW097125850 A TW 097125850A TW 97125850 A TW97125850 A TW 97125850A TW I401111 B TWI401111 B TW I401111B
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compound
microchannel
purity
microchannel device
impurity
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TW200904507A (en
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Francis Joseph Lipiecki
Stephen Gerard Maroldo
Deodatta Vinayak Shenai-Khatkhate
Robert A Ware
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Rohm & Haas
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/14Fractional distillation or use of a fractionation or rectification column
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00Products made by additive manufacturing

Description

使用微通道裝置之純化製程Purification process using a microchannel device

本申請案根據35 U.S.C.§119(e)主張2007年7月20日申請之美國臨時專利申請案第60/961,370號及2008年2月12日申請之美國臨時專利申請案第61,065,473號之優先權。The present application claims priority to U.S. Provisional Patent Application No. 60/961,370, filed on Jul. 20, 2007, and U.S. Provisional Patent Application No. 61,065,473, filed on Feb. 12, 2008. .

本發明係有關自具有等於或小於1.2相對揮發度之化合物中移除雜質以形成超高純度化合物之方法。The present invention relates to a process for removing impurities from a compound having a relative volatility of equal to or less than 1.2 to form an ultrahigh purity compound.

對於用來作為材料加工與應用之進料、中間體、溶劑或最終產品的超高純度化合物仍有許多未滿足的需求。如本文中所使用者,超高純度係定義為從10-10 重量%(l ppt)的下限至0.01重量%(100 ppm)的上限範圍之純度。這些化合物包括,但不限於包括單體的可蒸餾有機物、用於例如高效液相層析法(HPLC)等層析應用的溶劑、可昇華固體、電子化學品及分析試劑。There are still many unmet needs for ultra high purity compounds used as feeds, intermediates, solvents or final products for material processing and application. As used herein, ultra high purity is defined as a purity ranging from a lower limit of 10 to 10 % by weight (1 ppt) to an upper limit of 0.01% by weight (100 ppm). These compounds include, but are not limited to, distillable organics including monomers, solvents for chromatographic applications such as high performance liquid chromatography (HPLC), sublimable solids, electronic chemicals, and analytical reagents.

使化合物純化的傳統方法包括蒸餾、結晶、萃取吸收、加成物純化、質量選擇性超高速離心,以及與蒸餾結合的化學處理。這些方法及其他相關方法(例如美國專利公開案第2006/0016215A1號所揭示的蒸餾法),由於期望化合物和雜質具有相近沸騰性質或具有低相對揮發度,以及低雜質濃度與質傳(mass transfer)驅動力,因此經常會受到限制。具有等於或小於1.2的低相對揮發度α(α=雜質蒸氣壓/期望化合物蒸氣壓)之化合物特別難藉由利用氣/液平衡的 分級製程來純化,因此使得超高純度物質無法藉由傳統方法獲得。再者,利用傳統方法可達到的純度通常會有經濟上的限制。因雜質與化合物之物理及/或化學性質所導致令人無法接受的產量損失、輸入能量或製程循環時間會由於過高的資金成本和操作成本而限制可得到的純度。Conventional methods for purifying compounds include distillation, crystallization, extraction absorption, adduct purification, mass selective ultracentrifugation, and chemical treatment combined with distillation. These and other related methods (e.g., the distillation process disclosed in U.S. Patent Publication No. 2006/0016215 A1), because of the desired similar boiling or low relative volatility of the compound and impurities, as well as low impurity concentration and mass transfer (mass transfer) ) The driving force is therefore often limited. Compounds having a low relative volatility α (α = impurity vapor pressure / desired compound vapor pressure) equal to or less than 1.2 are particularly difficult to utilize by utilizing gas/liquid equilibrium The classification process is used for purification, thus making ultra-high purity materials impossible to obtain by conventional methods. Moreover, the purity that can be achieved using conventional methods is often economically limited. Unacceptable yield losses, input energy, or process cycle times due to impurities and physical and/or chemical properties of the compound can limit the purity available due to excessive capital costs and operating costs.

例如可使用芬斯克公式(Fenske Equation),根據成分的相對揮發度(α)與期望純度,來估算蒸餾所需的最小平衡級數。為了移除問題最大、沸點相近的雜質(α<1.2),級數或理論板相當高度(HETP)可能超過50、100,或甚至200,即使用目前最先進的填充物(HETP=0.05至0.20 m)可能也需要>10米的塔高。這種尺寸的塔從大量編製化合物以用於許多應用來看,會造成放大困難與可操作性的挑戰及安全性的顧慮。For example, the Fenske Equation can be used to estimate the minimum equilibrium level required for distillation based on the relative volatility (α) of the component and the desired purity. In order to remove the most problematic impurities with similar boiling points (α<1.2), the number of stages or theoretical plate equivalent height (HETP) may exceed 50, 100, or even 200, using the most advanced fillers currently available (HETP=0.05 to 0.20) m) It may also require a tower height of >10 meters. Towers of this size can be challenged by a large number of compounds for many applications, posing challenges and safety challenges and safety concerns.

因此,仍需要能純化含有具等於或小於1.2相對揮發度之雜質的化合物之更經濟有效的製程。Thus, there remains a need for a more cost effective process for purifying compounds containing impurities having a relative volatility of 1.2 or less.

本發明藉由提出微通道裝置與已知純化技術結合的優勢以符合前述需求。微通道裝置係提供製程條件的較佳控制、提高的安全性,以及由實驗室開發到商業生產的上市速度。這些裝置對於純化試劑、溶劑、中間體或最終產品極為有用。微通道技術所提供之觀測到的優勢基礎,係來自形成於裝置內之能使相與相之間具有高交換率的小尺寸及高表面積。典型而言,為1至1000微米的微通道結構尺寸係藉由提升毛細管和界面現象的重要性,及減少熱傳和 質傳的距離來達到提高純化的效果。這些裝置中優異的熱傳和質傳係提供相與相之間的高交換率,以及更有效純化級的較佳溫度控制,或較小的理論板相當高度(HETP),藉此能在固定的純化裝置幾何形狀中提供更多級以達到較高純度。再者,由於熱交換的較佳整合使能量效率提高,因此具有降低資本密集度和降低操作成本的優勢。微通道裝置可進一步藉由「通道數目放大」或僅多次重複單一通道,而不必藉由隨比例增加而增大反應器容器尺寸的習知放大法就能夠使生產放大,能在不損失效能而且不需要傳統製程放大研究的情況下,以大幅節省時間和成本的方式來滿足市場的需求。The present invention meets the aforementioned needs by presenting the advantages of combining microchannel devices with known purification techniques. Microchannel devices provide better control of process conditions, increased safety, and speed to market from laboratory development to commercial production. These devices are extremely useful for purifying reagents, solvents, intermediates or end products. The observed advantages provided by microchannel technology are based on the small size and high surface area that can be formed in the device to enable high exchange rates between phases. Typically, microchannel structure sizes from 1 to 1000 microns are important by enhancing capillary and interface phenomena, and reducing heat transfer and The distance of mass transfer is used to improve the purification effect. The excellent heat transfer and mass transfer in these devices provides a high exchange rate between phases, as well as better temperature control for more efficient purification stages, or a smaller theoretical plate height (HETP), which allows for fixation More stages are provided in the purification device geometry to achieve higher purity. Furthermore, since the better integration of heat exchange increases energy efficiency, it has the advantage of reducing capital intensity and reducing operating costs. The microchannel device can further amplify the production without any loss of performance by "encoding the number of channels" or repeating a single channel only a plurality of times without having to increase the size of the reactor vessel by increasing the ratio. Moreover, in the case of traditional process amplification studies, the market demand can be met in a manner that saves time and cost.

本發明係提供製備超高純度化合物之方法,其包括:在至少一個微通道裝置內,將至少一種雜質化合物與至少一種目標化合物分離;其中該至少一種目標化合物與至少一種雜質化合物具有等於或小於1.2的相對揮發度;再者,其中該至少一種目標化合物具有99.99%的結果純度。The present invention provides a method of preparing an ultrahigh purity compound, comprising: separating at least one impurity compound from at least one target compound in at least one microchannel device; wherein the at least one target compound and the at least one impurity compound have equal to or less than The relative volatility of 1.2; further wherein the at least one target compound has a result purity of 99.99%.

如本文中所使用者,「微通道裝置」係表示具有三維結構(流體流動通道或空間),垂直於流動的尺寸典型為0.1至5,000微米,更具體而言為介於10至1,000微米的微結構化裝置(通常為上述裝置,但不排除其他的微結構化裝置)。As used herein, a "microchannel device" is meant to have a three-dimensional structure (fluid flow channel or space) that is typically 0.1 to 5,000 microns, more specifically between 10 and 1,000 microns, perpendicular to the flow. Structured devices (usually the above devices, but other microstructured devices are not excluded).

本發明之微通道裝置有各種製造技術和結構材料。若干結構材料包括,但不限於金屬、聚合物、矽、陶瓷和玻 璃。下表1說明各種微通道裝置可用的若干製造技術: The microchannel device of the present invention has a variety of fabrication techniques and structural materials. Several structural materials include, but are not limited to, metals, polymers, tantalum, ceramics, and glass. Table 1 below illustrates several manufacturing techniques available for various microchannel devices:

本發明之微通道裝置視需要可含有毛細(wick)結構。該毛細結構有助於增加界面交換面積,並且將液相和蒸氣相保持在裝置的不相連區域內,使降低效能的逆向混合減到最少。該毛細結構可以是熟習此項技術者目前已知的任何類型者。本發明之微通道裝置可具有自小於5 cm至小於0.25 cm範圍的HETP。在某些情況下,微通道裝置的HETP小於0.05 cm。The microchannel device of the present invention may optionally contain a wick structure. The capillary structure helps to increase the interfacial exchange area and maintains the liquid phase and vapor phase in the unconnected regions of the device, minimizing reverse mixing of reduced performance. The capillary structure can be of any type currently known to those skilled in the art. The microchannel device of the present invention can have HETP ranging from less than 5 cm to less than 0.25 cm. In some cases, the microchannel device has a HETP of less than 0.05 cm.

由於會增加熱傳和質傳,因此上述的微通道裝置是有用的。藉由構成微通道裝置並且加以操作的結構或方式來提高熱傳和質傳。光滑的通道壁有助於提高熱傳和質傳。例如溝槽、紋理和圖形等通道壁上的其他構造特徵也有助於提高裝置的熱傳和質傳,使裝置更有效率。包含至少一 種目標化合物與至少一種雜質化合物(具有相對揮發度等於或小於1.2)的任何物質可藉由使試樣物質進料通過微通道裝置而加以分離。如本文中所使用者,「目標化合物」為可試圖在純化後得到預定純度的任何化合物。如本文中所使用者,「雜質化合物」係表示與目標化合物組合而希望與目標化合物分離的任何物質。於本發明中,至少一種目標化合物將會與至少一種雜質分離。本發明之目的是將至少一種雜質化合物與至少一種目標化合物分離,使結果目標化合物具有至少99.9999%、至少99.999%、或至少99.99%的純度。可單獨使用微通道裝置或將這些裝置與其他已知的純化技術合併使用來達到此純度。The microchannel device described above is useful because it increases heat transfer and mass transfer. Heat transfer and mass transfer are enhanced by the structure or manner that constitutes the microchannel device and operates. Smooth channel walls help improve heat transfer and quality. Other structural features on the channel walls, such as grooves, textures, and graphics, also contribute to improved heat transfer and mass transfer of the device, making the device more efficient. Contains at least one Any substance of the target compound and at least one impurity compound (having a relative volatility of equal to or less than 1.2) can be separated by feeding the sample material through a microchannel device. As used herein, a "target compound" is any compound that can be attempted to give a predetermined purity after purification. As used herein, "impurity compound" means any substance that is desired to be separated from a target compound in combination with a target compound. In the present invention, at least one target compound will be separated from at least one impurity. It is an object of the present invention to separate at least one impurity compound from at least one target compound such that the resulting target compound has a purity of at least 99.9999%, at least 99.999%, or at least 99.99%. Microchannel devices can be used alone or in combination with other known purification techniques to achieve this purity.

微通道裝置可單獨使用或與其他已知的純化技術一併使用。其中一類的技術為例如藉由變溫吸附將加成物純化的吸附純化或化學純化。選擇性吸附劑,或者例如胺、膦或醚等形成加成物的路易斯鹼可擔載在微通道表面上,以提供與含雜質流接觸的極高交換面積。其他的微通道可供熱傳流體流動,以達到裝置之精確的溫度控制,而在吸附和脫附步驟之間有效地調節和循環。微通道裝置可以和例如使用離子液體作為純化劑的化學純化製程一併使用。為了說明起見,藉由使含有雜質的有機金屬化合物與離子液體混合,加熱所得混合物,接著分離並單離出超純有機金屬化合物,來純化有機金屬化合物。此方法可和微通道裝置一併使用,以大幅減少存在於目標有機金屬化合物中的金屬性、有機和有機金屬雜質。這種組合方法能得到比使 用習知純化製程所得到者具有更少含矽雜質量的有機金屬化合物,以達到半導體工業所要求的嚴格純度標準(所有雜質<10 ppb)。The microchannel device can be used alone or in combination with other known purification techniques. One type of technique is, for example, adsorption purification or chemical purification in which the adduct is purified by temperature swing adsorption. A selective adsorbent, or a Lewis base, such as an amine, phosphine or ether, which forms an adduct, can be supported on the surface of the microchannel to provide an extremely high exchange area in contact with the impurity-containing stream. Other microchannels allow the heat transfer fluid to flow to achieve precise temperature control of the device while effectively regulating and cycling between the adsorption and desorption steps. The microchannel device can be used in conjunction with, for example, a chemical purification process using an ionic liquid as a purifying agent. For the sake of explanation, the organometallic compound is purified by mixing an organometallic compound containing an impurity with an ionic liquid, heating the resulting mixture, and then separating and separating the ultrapure organometallic compound. This method can be used in conjunction with microchannel devices to substantially reduce metallic, organic, and organometallic impurities present in the target organometallic compound. This combination method can get the ratio Those obtained by conventional purification processes have less organometallic compounds containing noisy qualities to meet the stringent purity standards required by the semiconductor industry (all impurities <10 ppb).

離子液體通常是在低溫下為液體且具有熔點低於100℃的鹽類。許多離子液體在室溫下仍為液體,因此稱為室溫離子液體。離子液體係完全由離子所組成,典型而言,是由大量的有機陽離子和無機陰離子所組成。由於這些化合物中的高庫侖力,因此離子液體實際上並沒有蒸氣壓。Ionic liquids are generally liquids that are liquid at low temperatures and have a melting point below 100 °C. Many ionic liquids are still liquid at room temperature and are therefore referred to as room temperature ionic liquids. The ionic liquid system consists entirely of ions, typically consisting of a large number of organic cations and inorganic anions. Due to the high Coulomb force in these compounds, the ionic liquid does not actually have a vapor pressure.

任何適當的離子液體均可用於本發明。用於離子液體中的例示陽離子包括,但不限於如以下第I-IV型所分別表示的烴基銨陽離子、烴基鏻陽離子、烴基吡啶鎓陽離子及二烴基咪唑鎓陽離子。可用於本發明之離子液體的例示陰離子包括,但不限於氯金屬酸根陰離子;氟硼酸根陰離子,例如四氟硼酸根陰離子與經烴基取代的氟硼酸根陰離子;及氟磷酸根陰離子,例如六氟磷酸根陰離子;與經烴基取代的氟磷酸根陰離子。氯金屬酸根陰離子的實例包括,但不限於氯鋁酸根陰離子,例如四氯鋁酸根陰離子與氯三烷基鋁酸根陰離子;氯鎵酸根陰離子,例如氯三甲基鎵酸根陰離子與四氯鎵酸根陰離子;及氯銦酸根陰離子,例如四氯銦酸根陰離子與氯三甲基銦酸根陰離子。Any suitable ionic liquid can be used in the present invention. Exemplary cations for use in ionic liquids include, but are not limited to, hydrocarbyl ammonium cations, hydrocarbyl phosphonium cations, hydrocarbyl pyridinium cations, and dihydrocarbylimidazolium cations, respectively, as set forth in Types I-IV below. Exemplary anions useful in the ionic liquids of the present invention include, but are not limited to, chlorometalate anions; fluoroborate anions such as tetrafluoroborate anions and hydrocarbyl-substituted fluoroborate anions; and fluorophosphate anions such as hexafluoro a phosphate anion; a fluorophosphate anion substituted with a hydrocarbyl group. Examples of chlorometalate anions include, but are not limited to, chloroaluminate anions such as tetrachloroaluminate anion and chlorotrialkylaluminate anion; chlorogallate anions such as chlorotrimethylgallate anion and tetrachlorogallate anion And a chloroborate anion such as a tetrachloroinlate anion and a chlorotrimethylinthate anion.

在上述第I-IV型的式中,R=H、(Cl -C10 )烷基,例如甲基、乙基、丙基、丁基、戊基、己基和辛基;芳烷基,例如苄基;烯基,例如烯丙基;芳基,例如苯基;或二(C1 -C6 )烷基胺基(C1 -C10 )烷基,例如二甲基胺基甲基、二甲基胺基乙基、二甲基胺基丙基和二乙基胺基丙基;及X為鹵化物,例如氯化物。各R基可為相同或或相異者。In the above formula I-IV, R = H, (C l - C 10 ) alkyl, such as methyl, ethyl, propyl, butyl, pentyl, hexyl and octyl; aralkyl, For example, benzyl; alkenyl, such as allyl; aryl, such as phenyl; or di(C 1 -C 6 )alkylamino (C 1 -C 10 )alkyl, such as dimethylaminomethyl , dimethylaminoethyl, dimethylaminopropyl and diethylaminopropyl; and X is a halide such as a chloride. Each R group can be the same or different.

以微通道裝置技術為基礎的其他純化製程,例如蒸餾、汽提、萃取和吸附係提供欲得到超高純度產品(ppm、ppb、ppt)所需的增強熱傳和質傳。此外,這些純化製程還提供欲解決使具有相似沸點(相對揮發度,0.8<α<1.2)的流體混合物純化至高純度之問題所需的輸送級增強作用。有利的操作條件包括使液相中一種或一種以上的流體成分,可以經由相變化變成蒸氣態,或變成吸附劑上之吸附態的溫度和壓力。此操作條件可包括-25℃至250℃的溫度,及0.1 pa至10 MPa的壓力。進料雜質量的範圍可由1 ppm至高達流體混合物之10重量%或甚至是50重量%。Other purification processes based on microchannel device technology, such as distillation, stripping, extraction, and adsorption systems, provide enhanced heat transfer and mass transfer required to achieve ultra high purity products (ppm, ppb, ppt). In addition, these purification processes provide the transport level enhancement required to address the problem of purifying a fluid mixture having a similar boiling point (relative volatility, 0.8 < α < 1.2) to high purity. Advantageous operating conditions include the ability to cause one or more fluid components in the liquid phase to change to a vapor state via a phase change, or to a temperature and pressure in an adsorbed state on the adsorbent. This operating condition may include a temperature of -25 ° C to 250 ° C and a pressure of 0.1 pa to 10 MPa. The feed impurity amount can range from 1 ppm up to 10% by weight of the fluid mixture or even 50% by weight.

微通道裝置可用來純化各種化合物。本發明之化合物的雜質典型而言具有小於1.5的相對揮發度,因此難以藉由傳統蒸餾法進行純化。更佳而言,化合物中雜質的相對 揮發度包括α1.2。可蒸餾有機物(例如單體等)可用於合成需要超高純度以達到食品、藥物或人體保健應用的嚴格產品要求之高價值應用的聚合物。這些應用可包括藥物傳輸用醫藥裝置、人體保健診斷、人體可植入裝置,及純化/製造生物、醫藥或營養食品化合物用的離子交換樹脂。獲得超高純度聚合物產品的其中一種方法是減少起始單體中的雜質。Microchannel devices can be used to purify various compounds. The impurities of the compounds of the present invention typically have a relative volatility of less than 1.5 and are therefore difficult to purify by conventional distillation methods. More preferably, the relative volatility of the impurities in the compound includes alpha 1.2. Distillable organics (e.g., monomers, etc.) can be used to synthesize polymers that require ultra high purity to achieve high value applications for stringent product requirements in food, pharmaceutical or human health applications. These applications may include medical devices for drug delivery, human health diagnostics, human implantable devices, and ion exchange resins for purifying/manufacturing biological, pharmaceutical or nutraceutical compounds. One way to obtain ultra high purity polymer products is to reduce impurities in the starting monomers.

高純度單體的其他應用包括製造低揮發性有機物含量(VOC)的丙烯酸乳膠漆。特別是製造衍生自丙烯酸丁酯的低VOC塗料時,需要將移除單體中沸點相近的雜質作為減少最終產品中殘留VOCs的一種方法。低VOC塗料的特徵為含有100 ppm或更少的揮發性雜質量。其中一種特別困擾之沸點相近的雜質為二丁醚(bpt=140℃),其沸點與丙烯酸丁酯(bpt=145℃)接近而且具有α=1.20的相對揮發度。利用目前的傳統蒸餾塔純化丙烯酸丁酯需要高資本投資與高操作成本。本發明之方法能以更有效率及更高成本效益的方式來製造更純的產品。Other applications for high purity monomers include the manufacture of low volatile organic content (VOC) acrylic latex paints. In particular, when manufacturing a low VOC coating derived from butyl acrylate, it is necessary to remove impurities having similar boiling points in the monomer as a method of reducing residual VOCs in the final product. Low VOC coatings are characterized by a volatile impurity amount of 100 ppm or less. One of the particularly troublesome impurities with similar boiling points is dibutyl ether (bpt = 140 ° C), which has a boiling point close to that of butyl acrylate (bpt = 145 ° C) and a relative volatility of α = 1.20. Purification of butyl acrylate using current conventional distillation columns requires high capital investment and high operating costs. The method of the present invention enables a more pure product to be produced in a more efficient and cost effective manner.

超高純度單體在製造用於包括微影技術和光電子學等應用的特用聚合物上特別有用。在某些情況下,必須移除某一單體的光學異構物以得到期望的聚合物性質。Ultra high purity monomers are particularly useful in the manufacture of specialty polymers for applications including lithography and optoelectronics. In some cases, the optical isomer of a certain monomer must be removed to give the desired polymer properties.

再者,電子材料應中所使用的超高純度單體和溶劑可包括各種有機化學品,例如經取代之丙烯酸酯類和甲基丙烯酸酯類、丙酮、甲基第三丁基醚(MTBE)、丙二醇一甲基醚乙酸酯(PGMEA)、環己酮和二甲基甲醯胺(DMF)。這些 單體和溶劑係用於製造積體電路之矽晶片製造的光刻聚合物和輔助產品。電腦晶片製造商在製造過程中也使用各種溶劑、螫合劑和清洗液作為蝕刻後殘留物去除劑來清洗矽晶-圓。超高純度的產品規格係決定高純度物質在晶片加工各個方面的用途。Furthermore, the ultrahigh purity monomers and solvents used in the electronic materials may include various organic chemicals such as substituted acrylates and methacrylates, acetone, methyl tertiary butyl ether (MTBE). , propylene glycol monomethyl ether acetate (PGMEA), cyclohexanone and dimethylformamide (DMF). These ones Monomers and solvents are lithographic polymers and ancillary products used in the manufacture of wafers for integrated circuits. Computer chip manufacturers also use a variety of solvents, chelating agents, and cleaning solutions as cleaning residue removers to clean the twins during the manufacturing process. Ultra-high purity product specifications determine the use of high purity materials in all aspects of wafer processing.

微通道裝置可進一步與一種或一種以上的其他純化製程結合,以形成能略過溶解度或氣液平衡之組成障礙或熱力學障礙,或無法得到高純度產品的混合式純化製程。這些製程包括,但不限於萃取蒸餾、共沸蒸餾、萃取結晶、膜滲透/膜蒸餾、逆滲透/逆相蒸餾、反應蒸餾、催化蒸餾、汽提蒸餾及熟習此項技術者已知的其他混合式純化製程。The microchannel device can be further combined with one or more other purification processes to form a hybrid purification process that overcomes compositional or thermodynamic barriers to solubility or gas-liquid equilibrium, or that does not provide high purity products. These processes include, but are not limited to, extractive distillation, azeotropic distillation, extraction crystallization, membrane permeation/membrane distillation, reverse osmosis/reverse phase distillation, reactive distillation, catalytic distillation, stripping distillation, and other mixing known to those skilled in the art. Purification process.

在萃取蒸餾中,進料成分的相對揮發度會由於下列而改變:添加溶劑或其他添加液流,使其選擇性地與至少一種成分相互作用,提高至少一種成分之相對揮發度並且能夠更容易地分離和純化。溶劑的選擇會影響期望產物回收成為塔頂產物或塔底產物。溶劑的選擇係由欲純化之化合物的性質決定,其範圍可包括例如水、有機烴類和離子液體等物質。添加溶劑典型而言係於分離式溶劑回收塔內回收,然後再循環至萃取蒸餾塔。微通道裝置可用於萃取蒸餾塔、溶劑回收塔或用於這兩者。微通道裝置所提供較高的分離效率(較低的HETP)可以有助於克服較高循環比所得到純度的限制,較高循環比會降低習知塔內萃取溶劑的濃度和效率。In extractive distillation, the relative volatility of the feed components will vary due to the addition of a solvent or other addition stream that selectively interacts with at least one component to increase the relative volatility of at least one component and can be easier. Ground separation and purification. The choice of solvent will affect the recovery of the desired product into an overhead product or a bottoms product. The choice of solvent is determined by the nature of the compound to be purified, and may include, for example, water, organic hydrocarbons, and ionic liquids. The solvent to be added is typically recovered in a separate solvent recovery column and then recycled to the extractive distillation column. The microchannel device can be used in an extractive distillation column, a solvent recovery column, or both. The higher separation efficiency (lower HETP) provided by the microchannel device can help to overcome the limitation of the purity obtained by the higher cycle ratio, which lowers the concentration and efficiency of the extraction solvent in the conventional column.

在共沸蒸餾中,添加溶劑以產生或改變一種或一種以 上進料成分的組成夾點(pinch point)。將第一塔中生成為塔頂或塔底產物的共沸物送至第二塔,在第二塔中藉由添加溶劑破壞共沸物,將期望的純化後液流回收成為濃縮產物。進一步處理經混合溶劑/進料流,使溶劑回收與再循環至第二(共沸蒸餾)塔,並且去除第一塔中的副產物/雜質。In azeotropic distillation, a solvent is added to produce or change one or one The composition of the upper feed component is the pinch point. The azeotrope produced in the first column as a top or bottom product is sent to a second column where the desired purified stream is recovered as a concentrated product by the addition of a solvent to destroy the azeotrope. The mixed solvent/feed stream is further processed, the solvent is recovered and recycled to the second (azeotropic distillation) column, and by-products/impurities in the first column are removed.

在萃取結晶製程中,添加溶劑以改變兩種或兩種以上溶質的相對溶解度來影響結晶製程。可包括能防止形成純相的組成共熔物之改變,或是能防止純物質容易因調整溫度而分離之對溫度不敏感的溶解度曲線。利用蒸餾使溶劑回收.與再循環來影響溶解行為。高效率微通道蒸餾係提供能確保於再循環中存在高純度溶劑的唯一方法,有助於提高結晶製程的效率並減少與溶劑液流有關的流動和成本。In the extraction crystallization process, a solvent is added to change the relative solubility of two or more solute to affect the crystallization process. It may include a change in the constituent eutectic which prevents the formation of a pure phase, or a temperature-insensitive solubility curve which prevents the pure substance from being easily separated by adjusting the temperature. The solvent is recovered by distillation and recycled to affect the dissolution behavior. High efficiency microchannel distillation provides the only means of ensuring the presence of high purity solvents in the recycle, helping to increase the efficiency of the crystallization process and reduce the flow and cost associated with solvent flow.

在膜及/或逆滲透蒸餾的混合式純化系統中,使蒸餾塔與膜分離裝置連接,以提高純化製程的效率。於一具體實例中,進料流可先經由膜處理,使進料流濃縮並縮小下游蒸餾塔的尺寸。於第二具體實例中,可將蒸餾塔的產物輸送至膜裝置,以進行二次純化或研磨步驟。In a mixed purification system for membrane and/or reverse osmosis distillation, a distillation column is coupled to a membrane separation unit to increase the efficiency of the purification process. In one embodiment, the feed stream can be first treated through a membrane to concentrate the feed stream and reduce the size of the downstream distillation column. In a second embodiment, the product of the distillation column can be passed to a membrane unit for a secondary purification or milling step.

Claims (9)

一種製備超高純度化合物之方法,其包括:在至少一個微通道裝置內,將至少一種雜質化合物與至少一種目標化合物分離;其中該至少一種目標化合物與至少一種雜質化合物具有小於或等於1.2的相對揮發度;該至少一個微通道裝置具有介於0.0001毫米(mm)至小於0.01毫米之間之垂直於該至少一種目標化合物與該至少一種雜質化合物之流的尺寸;再者,其中該至少一種目標化合物具有99.99%的結果純度。 A method of preparing an ultra-high purity compound, comprising: separating at least one impurity compound from at least one target compound in at least one microchannel device; wherein the at least one target compound and the at least one impurity compound have a relative value less than or equal to 1.2 Volatility; the at least one microchannel device having a size between 0.0001 millimeters (mm) and less than 0.01 mm perpendicular to a flow of the at least one target compound and the at least one impurity compound; further wherein the at least one target The compound has a result purity of 99.99%. 如申請專利範圍第1項之方法,其中該至少一個微通道裝置為微通道蒸餾裝置。 The method of claim 1, wherein the at least one microchannel device is a microchannel distillation device. 如申請專利範圍第1項之方法,其中在至少一個微通道裝置內的純化係藉由變溫吸附來進行。 The method of claim 1, wherein the purifying in the at least one microchannel device is performed by temperature swing adsorption. 如申請專利範圍第1項之方法,進一步包括至少一個含有毛細結構的微通道裝置。 The method of claim 1, further comprising at least one microchannel device comprising a capillary structure. 如申請專利範圍第1項之方法,其中該微通道裝置具有小於5 cm的理論板相當高度(HETP)。 The method of claim 1, wherein the microchannel device has a theoretical plate equivalent height (HETP) of less than 5 cm. 如申請專利範圍第1項之方法,其中使該至少一種雜質的量降低至小於100 ppm之該至少一種目標化合物與該至少一種雜質化合物的總量。 The method of claim 1, wherein the amount of the at least one impurity is reduced to less than 100 ppm of the total amount of the at least one target compound and the at least one impurity compound. 如申請專利範圍第1項之方法,其中該至少一個微通道裝置係與選自蒸餾、汽提、萃取和吸附之至少一種其他 純化製程合併使用。 The method of claim 1, wherein the at least one microchannel device is at least one other selected from the group consisting of distillation, stripping, extraction, and adsorption. The purification process is used in combination. 如申請專利範圍第1項之方法,其中具有99.99%之結果純度的目標化合物係用於電子材料應用上。 The method of claim 1, wherein the target compound having a purity of 99.99% is used for electronic material applications. 如申請專利範圍第7項之方法,其中具有99.99%之結果純度的目標化合物係用於電子材料應用上。 The method of claim 7, wherein the target compound having a purity of 99.99% is used for electronic material applications.
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