TWI400344B - Vacuum barrel and vacuum deposition machine for vacuum plating machine - Google Patents

Description

Vacuum barrel plating machine and vapor deposition device for vacuum barrel plating machine

The present invention relates to a vacuum barrel plating machine, and more particularly to a vacuum barrel plating machine utilizing cathode arc evaporation.

As shown in FIG. 1 , a conventional vacuum barrel plating machine has a hollow body 11 , a material to be plated 10 disposed in the cavity 11 , and a target body 12 spaced apart from the wall surface of the cavity 11 . a set of corresponding cooling water channel units 13 disposed in the target body 12, a pair of insulating pads 14 corresponding between the target body 12 and the wall surface of the cavity 11 , and a lead installed in the cavity 11 Arc 15 .

The inside of the cavity 11 is in a vacuum state, and the outside of the cavity 11 is in a normal pressure state, and the target body 12 has a cathode portion 121 located in the cavity 11, and an anode located outside the cavity 11. The insulating pad 14 is configured to isolate the cathode portion 121 from the anode portion 122. In addition, the vacuum barrel plating machine further has a corresponding cathode portion 121 disposed on the target body 12 and is available for the arc runner 15 A cathode target 16 for performing discharge arcing and a magnetron 17 corresponding to the anode portion 122 of the target body 12 are provided.

According to the above design, when the energized arc-trigger 15 is brought into contact with the cathode target 16, an arc spot is also generated, and the magnetic field generated by the magnetron 17 causes the magnetic lines of force to be distributed on the surface of the cathode target 16 for guiding The trajectory of the arc point is induced, so that the cathode target 16 can be uniformly evaporated and then coated on the object to be plated 10.

However, since the cathode target 16 is a columnar metal material, the area of the arc ignition by the arc runner 15 is limited, in order to enlarge the object to be plated 10 The coating area is usually designed by using a multi-arc target as shown in FIG. 2, and a plurality of cathode targets 16 are arranged in a straight line or in a circular manner on the wall surface of the cavity 11, although a multi-arc target The design of the source can increase the number of cathode targets 16 to expand the evaporation range. However, the space inside the cavity 11 is limited, and it is difficult to place a large number of cathode targets 16, and each cathode target 16 needs to be extra. Installing the corresponding target 12, the cooling water path unit 13, the arc starter 15, and the magnetron 17 and the like, relatively increasing the complexity of the internal components of the vacuum barreling machine, and for subsequent installation, disassembly and maintenance, Inconvenience caused by maintenance.

Accordingly, it is an object of the present invention to provide a vacuum barrel plating machine that reduces the volume of the chamber and shortens the vacuum pumping time.

Further, another object of the present invention is to provide a vapor deposition apparatus having a simplified structure.

In detail, the vacuum barrel plating machine comprises an evaporation chamber having an evaporation space, an arc starter disposed in the evaporation space and capable of generating an arc, and an evaporation device disposed in the evaporation chamber.

The vapor deposition device includes a base disposed on the vapor deposition chamber, a cavity seat connected to the base and housed in the evaporation space of the vapor deposition chamber, and a flat plate shape and embedded in the The target on the cavity seat.

Wherein, the cavity seat defines an atmospheric space in a normal pressure state; the target body has a cathode portion exposed in the vapor deposition space of the vapor deposition chamber and provided for a target material, and a cathode portion An anode portion in the opposite direction and located in the atmospheric space, and the arc runner can be in corresponding contact with the target.

The utility model has the advantages that the cavity seat of the vapor deposition device is installed in the vapor deposition chamber, and the flat target body is embedded in the cavity seat, thereby not only improving the coating on the cathode portion The area of the target expands the evaporation range, which eliminates the design of the multi-arc target and simplifies the subsequent disassembly and maintenance.

The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments of the invention.

Before the present invention is described in detail, it is noted that in the following description, like elements are denoted by the same reference numerals.

Referring to FIG. 3, a first preferred embodiment of the vacuum barrel plating machine of the present invention comprises a vapor deposition chamber 3 having a vapor deposition space 30 in a vacuum state, and is disposed in the vapor deposition space 30 and can generate an electric arc. The arc runner 4 and a vapor deposition device 2 detachably disposed in the vapor deposition chamber 3.

Wherein, the vapor deposition chamber 3 has a cabin 31, a hatch 32 that can close the cabin 31, and a slide rail 33 disposed under the cabin 31 for sliding the hatch 32 to abut, the steaming The plating device 2 is disposed on the door 32 and interlocked with the door 32, and the cabin 31 and the door 32 jointly define an evaporation space 30, and the arc runner 4 is driven by a connecting rod. Its installation location and range of activities are more flexible.

The vapor deposition device 2 includes a base 21 locked to the hatch 32 of the vapor deposition chamber 3, and a cavity connected to the base 21 and housed in the vapor deposition space 30 of the vapor deposition chamber 3. The seat 22 is substantially flat and embedded in the cavity seat 22 The upper target 23, a target 24 located in the vapor deposition space 30, a cooling water path unit 25 disposed in the target 23, and a magnetron unit 26 disposed on the target 23.

The cavity seat 22 defines an atmospheric space 220 in a normal pressure state, and the target body 23 has a cathode portion 231 exposed in the vapor deposition space 30 of the vapor deposition chamber 3, and a cathode portion An anode portion 232 located in the opposite direction and located in the atmospheric space 220; the target member 24 is disposed on the cathode portion 231 of the target body 23, and the magnetron unit 26 is disposed on the anode portion 232 of the target body 23 and located at the anode portion 232 of the target body 23 In the atmospheric space 220, the arc runner 4 of the vacuum barreling machine can be in corresponding contact with the target 24.

According to the above structure, when the object to be plated 51 is to be coated, a voltage is applied to the arc runner 4, and the surface of the target 24 is momentarily contacted to leave, so that an arc spot is generated on the surface of the target 24 (not shown). The arc point can be stably present on the surface of the target 24 in a vacuum, and the magnetic field of the target 24 is generated by the magnetic field design of the magnetic control unit 26, so that the arc point moves along the magnetic field trajectory, thereby achieving The effect of uniformly evaporating the target 24 is further evaporated on the object to be plated 51, wherein the magnetic control unit 26 can be used to adjust the magnetic field range, including the magnetic pole to the surface distance adjustment of the target 24, and the magnetic pole cover area. Adjustment and so on.

Moreover, since the door 32 is linearly slidable on the slide rail 33, the door 32 is allowed to be close to or away from the cabin 31 (as shown in FIG. 4) for convenient installation on the door 32. The upper vapor deposition device 2 performs maintenance and maintenance work after the door 32 is opened.

In this embodiment, the current used for vapor deposition of the target 24 is higher, exceeding More than 80 amps, the target 23 is made of a pure copper-based metal with a high electrical conductivity to reduce impedance and stabilize the arc.

According to the above design, the area of the target body 23 is larger and flatter than that of the conventional target body, and the cavity seat 22 having the atmospheric space 220 is installed in the vapor deposition chamber 3, which not only improves the coverage. The area of the target 24 disposed in the cathode portion 231 is used to expand the evaporation range, and the design of the conventional multi-arc target source can be eliminated, and the problems of subsequent disassembly and maintenance can be simplified.

Furthermore, since the target body 23 is not mounted on the vapor deposition chamber 3, and the area of the target body 23 is large, it is not necessary to increase the number of the target bodies 23, and the corresponding cooling water path unit is added. 25, the arc starter 4, and the magnetron unit 26 and other components, so the vacuum barrel plating machine of the present invention can effectively reduce the vapor deposition space 30 of the vapor deposition chamber 3 without adding additional components, Shorten the time for vacuum pumping.

Referring to Figures 5 and 6, a second preferred embodiment of the vacuum barrel plating machine of the present invention is substantially the same as the first preferred embodiment, and includes an evaporation device 2, an evaporation chamber 3, and an introduction. Arc 4 .

The difference is that the vapor deposition chamber 3 has a cabin 31, a hatch 32 that can close the cabin 31, and the vapor deposition device 2 is disposed on the cabin 31 opposite to the hatch 32. And it is accommodated in the vapor deposition space 30 of the vapor deposition chamber 3, that is, the second preferred embodiment is another embodiment of the vacuum barrel plating machine of the present invention, which provides different options for the user.

Referring to Figures 7 and 8, a third preferred embodiment of the vacuum barrel plating machine of the present invention is substantially the same as the previous embodiment, and includes an evaporation device 2, an evaporation chamber 3, and an arc runner 4. .

The vacuum barreling machine further includes a drum 5 which is hollow and is rotatably disposed in the vapor deposition space 30 of the vapor deposition chamber 3 with respect to the vapor deposition device 2, and the steaming The cavity seat 22 of the plating apparatus 2, the target body 23, the target material 24, the cooling water path unit 25, and the magnetron unit 26 are all located in the drum 5.

In this embodiment, the drum 5 has a cylindrical design, and at least one object to be plated 51 is placed in the drum 5 and fixed inside the drum 5 so that the object to be plated 51 can rotate with the drum 5 Moving (as shown in FIG. 9) and being vapor-deposited by the target 24; in addition, the drum 5 may also be of a hexagonal or other polygonal design, and when the object to be plated 51 is placed in the drum 5, the The plating material 51 rolls in the drum 5 for a long time and is vapor-deposited by the target material 24 to achieve uniform stirring, thereby obtaining relatively stable coating properties.

By the design of the drum 5, the object to be plated 51 is placed directly in the drum 5 without the need of loading and unloading, and a larger number of objects to be plated 51 can be placed in the drum 5. The effect of batch mass production can effectively save time and improve work efficiency, and, by the rotation of the drum 5, the effect of uniform coating can be achieved, thereby obtaining relatively stable coating properties.

As described above, in the vacuum barrel plating machine of the present invention, by inserting the flat target body 23 on the cavity holder 22, not only the area of the target member 24 coated on the cathode portion 231 can be increased, but the vapor deposition range can be expanded. Moreover, the design of the conventional multi-arc target source can be eliminated, and the problems of subsequent disassembly and maintenance can be simplified. Furthermore, by placing the object to be plated 51 directly in the drum 5, it is unnecessary to carry out loading and unloading. The operation can effectively save time and improve work efficiency, and, by the rotation of the drum 5, the effect of uniform coating is achieved, thereby obtaining stability. The coating properties are indeed capable of achieving the object of the present invention.

The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.

2‧‧‧Vapor deposition unit

21‧‧‧Base

22‧‧‧ cavity seat

220‧‧‧Atmospheric space

23‧‧‧ Target

231‧‧‧ Cathode

232‧‧‧Anode

24‧‧‧ Target

25‧‧‧Cooling waterway unit

26‧‧‧Magnetic control unit

3‧‧‧vapor plating compartment

30‧‧‧vapor deposition space

31‧‧‧ cabin

32‧‧‧hatch

33‧‧‧Slide rails

4‧‧‧ Arc starter

5‧‧‧Roller

51‧‧‧Battery to be plated

Figure 1 is a cross-sectional view showing a conventional vacuum barrel plating machine; Figure 2 is a cross-sectional view showing another conventional vacuum barrel plating machine; Figure 3 is a cross-sectional view showing a first preferred embodiment of the evaporation apparatus of the present invention; Figure 4 is a cross-sectional view for assistance in explaining the opening of the door of Figure 3; Figure 5 is a cross-sectional view showing a second preferred embodiment of the vapor deposition device of the present invention; Figure 6 is a cross-sectional view of the door opening of Figure 5 Figure 7 is a transverse cross-sectional view showing a third preferred embodiment of the vacuum barrel plating machine of the present invention; Figure 8 is a longitudinal cross-sectional view for assisting the description of the vacuum barreling machine of Figure 7; and Figure 9 is a A longitudinal sectional view showing the state after the rotation of the drum of the third preferred embodiment.

2‧‧‧Vapor deposition unit

21‧‧‧Base

22‧‧‧ cavity seat

220‧‧‧Atmospheric space

23‧‧‧ Target

231‧‧‧ Cathode

232‧‧‧Anode

24‧‧‧ Target

25‧‧‧Cooling waterway unit

26‧‧‧Magnetic control unit

3‧‧‧vapor plating compartment

30‧‧‧vapor deposition space

31‧‧‧ cabin

32‧‧‧hatch

33‧‧‧Slide rails

4‧‧‧ Arc starter

5‧‧‧Roller

Claims (11)

An evaporation device is disposed in a vapor deposition chamber of a vacuum barrel plating machine, the evaporation chamber has an evaporation space, the evaporation device comprises: a base disposed on the evaporation chamber; a cavity seat Connected to the susceptor and housed in the evaporation space of the vapor deposition chamber, and the cavity seat defines an atmospheric space in a normal pressure state; a target body is generally flat and embedded in the cavity a cathode portion having a vapor deposition space exposed in the vapor deposition chamber and covering a target, and an anode portion opposite to the cathode portion and located in the atmosphere; and a magnetic portion The control unit is disposed on the anode portion of the target body and located in the atmospheric space. The vapor deposition device according to claim 1, wherein the vapor deposition device is detachably disposed in the vapor deposition chamber of the vacuum barrel machine. The vapor deposition device according to claim 1 or 2, further comprising a cooling water passage unit provided in the target body. A vacuum barrel plating machine, comprising: a vapor deposition chamber having an evaporation space; an arc starter disposed in the evaporation space and capable of generating an arc; and an evaporation device comprising a base disposed on the a vapor chamber, a cavity seat connected to the base and housed in the evaporation space of the vapor deposition chamber, and the cavity seat defines an atmospheric space in a normal pressure state. a target body having a flat shape and being embedded in the cavity holder, and having a cathode portion exposed in the vapor deposition space of the vapor deposition chamber and covering a target, and a cathode opposite to the cathode portion An anode portion oriented in the atmosphere, wherein the arc runner is in corresponding contact with the target. The vacuum barrel plating machine according to claim 4, wherein the vapor deposition device is detachably disposed in the vapor deposition chamber of the vacuum barrel machine. The vacuum barrel plating machine according to claim 4 or 5, wherein the vapor deposition apparatus further comprises a cooling water passage unit provided in the target body. The vacuum barrel plating machine according to claim 6, wherein the vapor deposition apparatus further comprises a magnetron unit disposed on the anode portion of the target body and located in the atmospheric space. The vacuum barrel plating machine according to claim 7, further comprising a drum which is substantially hollow and rotatably disposed in the vapor deposition space of the vapor deposition chamber relative to the vapor deposition device. The vacuum barrel plating machine of claim 8, wherein the vapor deposition chamber has a cabin and a door that encloses the cabin. The vacuum barrel plating machine according to claim 9, wherein the vapor deposition device is disposed on the door and interlocked with the door. The vacuum barrel plating machine according to claim 9, wherein the vapor deposition device is disposed on a cabin opposite to the hatch.