TWI398410B - Method for producing copper oxide from solution containing copper ions - Google Patents

Method for producing copper oxide from solution containing copper ions Download PDF

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TWI398410B
TWI398410B TW99100982A TW99100982A TWI398410B TW I398410 B TWI398410 B TW I398410B TW 99100982 A TW99100982 A TW 99100982A TW 99100982 A TW99100982 A TW 99100982A TW I398410 B TWI398410 B TW I398410B
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copper
containing solution
precipitate
copper oxide
oxide
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TW201124344A (en
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Te Hsin Chiang
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Te Hsin Chiang
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由含銅溶液中產生氧化銅Producing copper oxide from copper-containing solution

本發明係關於一種由含銅溶液中產生氧化銅之方法,特別是一種從電路板製程中之蝕刻廢液及微蝕刻廢液產生氧化銅之方法。The present invention relates to a method for producing copper oxide from a copper-containing solution, and more particularly to a method for producing copper oxide from an etching waste liquid and a micro-etching waste liquid in a circuit board process.

在印刷電路板製程中,會產生許多含銅廢液,比如各種蝕刻製程中產生之蝕刻廢液。若能將此含銅廢液進行回收及將銅或銅化物還原出來加以利用,除可大量節省成本外,亦可減少對環境之污染。In the printed circuit board process, a lot of copper-containing waste liquid is produced, such as etching waste liquid generated in various etching processes. If the copper-containing waste liquid can be recovered and the copper or copper compound can be reduced and used, the environmental pollution can be reduced in addition to a large amount of cost.

在其中一先前技術中,係利用溶液在不同pH值下,會產生金屬離子之化合物沉澱之原理。舉例來說,鎘離子(Cd2+ )在溶液之pH值為9.8以上、鉻離子(Cr3+ )在溶液之pH值為6.5至9.2間、鎳離子(Ni2+ )在溶液之pH值為9.3以上、鋅離子(Zn2+ )在溶液之pH值為8.3至10.5、鐵離子(Fe3+ )在溶液之pH值為3.5以上、亞鐵離子(Fe2+ )在溶液之pH值為9.0以上、鉛離子(Pb2+ )在溶液之pH值為9.5以上、鋁離子(Al3+ )在溶液之pH值為5.8至8.6時會產生各自的金屬化合物沉澱。In one of the prior art, the principle of precipitation of a metal ion compound is produced by using a solution at different pH values. For example, the cadmium ion (Cd 2+ ) has a pH of 9.8 or higher in the solution, the chromium ion (Cr 3+ ) has a pH of 6.5 to 9.2 in the solution, and the nickel ion (Ni 2+ ) in the pH of the solution. 9.3 or more, the pH of the zinc ion (Zn 2+ ) in the solution is 8.3 to 10.5, the pH of the iron ion (Fe 3+ ) in the solution is 3.5 or more, and the pH of the ferrous ion (Fe 2+ ) in the solution When it is 9.0 or more, the lead ion (Pb 2+ ) has a pH of 9.5 or more in the solution, and the aluminum ion (Al 3+ ) has a pH of 5.8 to 8.6 in the solution, which causes precipitation of the respective metal compound.

其中銅離子(Cu2+ )在pH值為7.5時,可產生鹼式氯化銅(CuCl2 ‧3Cu(OH)2 )、氫氧化銅(Cu(OH)2 )及氧化銅(CuO)等混合物沉澱;且當pH值升到12.5時,鹼式氯化銅會形成氫氧化銅及氧化銅。Among them, copper ions (Cu 2+ ) can produce basic copper chloride (CuCl 2 ‧3Cu(OH) 2 ), copper hydroxide (Cu(OH) 2 ) and copper oxide (CuO) at a pH of 7.5. The mixture precipitates; and when the pH rises to 12.5, the basic copper chloride forms copper hydroxide and copper oxide.

在此先前技術中,係直接對含銅廢液加液鹼及加熱,使含銅廢液之pH值升到12.5,如此可得到氫氧化銅及氧化銅沉澱;接下來以壓濾機進行壓濾4至6小時,再加熱烘烤3至4小時,使氫氧化銅脫水得到氧化銅。In this prior art, the liquid copper is directly added to the copper-containing waste liquid and heated to raise the pH of the copper-containing waste liquid to 12.5, so that copper hydroxide and copper oxide can be precipitated; Filtration was carried out for 4 to 6 hours, and then baked by heating for 3 to 4 hours to dehydrate the copper hydroxide to obtain copper oxide.

然而在含銅廢液之pH值升到12.5時,除了得到氫氧化銅及氧化銅之化合物混合沉澱外,亦會使其餘非銅之金屬離子形成各自之混合物沉澱。舉例來說,非銅之金屬離子可能來自在電路板電鍍銅箔製程中,光澤劑中的添加劑,如砷(As)、銻(Te)及鉍(Bi);或是對銅箔進行粗化處理時所用的藥劑如鉻(Cr)、鈷(Co)、鎳(Ni)或鋅(Zn)等。在進行印刷電路板之蝕刻製程時,上述之金屬亦會溶入含銅廢液中形成雜質。However, when the pH of the copper-containing waste liquid rises to 12.5, in addition to the mixed precipitation of the copper hydroxide and copper oxide compounds, the remaining non-copper metal ions are precipitated into a mixture of the respective mixtures. For example, non-copper metal ions may come from soldering copper foil processes, additives in gloss agents such as arsenic (As), tellurium (Te) and bismuth (Bi); or roughening copper foil The agent used in the treatment is, for example, chromium (Cr), cobalt (Co), nickel (Ni) or zinc (Zn). In the etching process of the printed circuit board, the above metal is also dissolved in the copper-containing waste liquid to form impurities.

由於含水的氫氧化銅具有黏性,在壓濾機進行壓濾之步驟後得到的氫氧化銅及氧化銅之混合物極具黏性之塊狀物,不易處理。在烘烤之步驟中,其目的係在使氫氧化銅脫水形成氧化銅,但因在烘烤時,難以將熱能傳導至氫氧化銅及氧化銅之混合物中心,僅能使部份氫氧化銅脫水形成氧化銅。此先前技術不但耗時,所得到的氧化銅之銅含量亦僅有35%左右。Since the aqueous copper hydroxide is viscous, the mixture of copper hydroxide and copper oxide obtained after the pressure filtration step of the filter press is extremely viscous and is difficult to handle. In the baking step, the purpose is to dehydrate the copper hydroxide to form copper oxide, but it is difficult to conduct the heat energy to the center of the mixture of copper hydroxide and copper oxide during baking, and only a part of the copper hydroxide can be made. Dehydration to form copper oxide. This prior art is not only time consuming, but the copper content of the obtained copper oxide is also only about 35%.

在另一先前技術中,係使用水浴法,係將已酸鹼中和的含銅廢液在熱交換管外循環6小時,熱交換管係以高溫蒸氣間接加熱,可使氫氧化銅脫水形成氧化銅,再經板框壓濾機進行壓濾,再進行一次烘烤,可得到銅含量約近70%的氧化銅,然而此先前技術仍然相當耗時。In another prior art, a water bath method is used in which an acid-base neutralized copper-containing waste liquid is circulated outside the heat exchange tube for 6 hours, and the heat exchange tube is indirectly heated by high-temperature steam to dehydrate the copper hydroxide. The copper oxide is subjected to pressure filtration through a plate and frame filter press and then baked once to obtain copper oxide having a copper content of approximately 70%. However, this prior art is still quite time consuming.

因此,有必要提供一種由含銅廢液中產生氧化銅之方法,以改善上述所存在的問題。Therefore, it is necessary to provide a method for producing copper oxide from a copper-containing waste liquid to improve the above problems.

本發明之主要目的係在提供一種由含銅溶液中產生氧化銅之方法,以得到高純度之氧化銅。SUMMARY OF THE INVENTION A primary object of the present invention is to provide a method for producing copper oxide from a copper-containing solution to obtain high-purity copper oxide.

本發明之由含銅溶液中產生氧化銅之方法包括下列步驟:取得含銅溶液;調整含銅溶液之pH值以形成具有第一pH值之第一含銅溶液及含鐵沉澱物;調整第一含銅溶液之第一pH值以形成具有第二pH值之第二含銅溶液及第一含銅沉澱物;將第一含銅沉澱物形成具有第三pH值之第三含銅溶液及第二含銅沉澱物;以及分離第三含銅溶液及第二含銅沉澱物,其中第二含銅沉澱物包括氧化銅。The method for producing copper oxide from a copper-containing solution of the present invention comprises the steps of: obtaining a copper-containing solution; adjusting a pH of the copper-containing solution to form a first copper-containing solution having a first pH value and an iron-containing precipitate; a first pH value of the copper-containing solution to form a second copper-containing solution having a second pH value and a first copper-containing precipitate; forming the first copper-containing precipitate into a third copper-containing solution having a third pH value and a second copper-containing precipitate; and separating the third copper-containing solution and the second copper-containing precipitate, wherein the second copper-containing precipitate comprises copper oxide.

在本發明之一實施例中,第一pH值係實質上介於3至6;第二pH值係實質上介於7至8.5;且第三pH值係實質上介於11至13.5。In one embodiment of the invention, the first pH is substantially between 3 and 6; the second pH is substantially between 7 and 8.5; and the third pH is substantially between 11 and 13.5.

為讓本發明之上述和其它目的、特徵和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下。The above and other objects, features and advantages of the present invention will become more <RTIgt;

請先參考圖1係本發明之由含銅溶液中產生氧化銅之方法之一實施例之步驟流程圖。Please refer to FIG. 1 for a flow chart of the steps of an embodiment of the method for producing copper oxide from a copper-containing solution of the present invention.

如圖1所示,本發明首先進行步驟S701,取得含銅溶液。As shown in Fig. 1, the present invention first proceeds to step S701 to obtain a copper-containing solution.

在本發明之一實施例中,含銅溶液係蝕刻製程中產生之蝕刻廢液或微蝕刻廢液,但本發明不以此為限,任何含銅離子(Cu2+ )之溶液亦可使用本發明之由含銅溶液中產生氧化銅之方法得到氧化銅(CuO)。In one embodiment of the present invention, the copper-containing solution is an etching waste liquid or a micro-etching waste liquid generated in an etching process, but the invention is not limited thereto, and any solution containing copper ions (Cu 2+ ) may also be used. Copper oxide (CuO) is obtained by the method of producing copper oxide in a copper-containing solution of the present invention.

接著進行步驟S702,調整含銅溶液之pH值以形成具有第一pH值之第一含銅溶液及含鐵沉澱物。Next, in step S702, the pH of the copper-containing solution is adjusted to form a first copper-containing solution having a first pH value and an iron-containing precipitate.

步驟S702,調整含銅溶液之pH值至第一pH值。由於含銅溶液係酸性,在本步驟中加入鹼性物質以將含銅溶液之pH值增加至第一pH值。在本發明之一實施例中,鹼性物質係氫氧化鈉(NaOH)水溶液,第一pH值係實質上介於3至6之間,但本發明不以此為限。在較佳之一實施例中,第一pH值係實質上為3.5。當含銅溶液之第一pH值在上述範圍內時,含銅溶液中之鐵離子(Fe3+ )會形成鐵化物沉澱,藉此可移除含銅溶液之鐵離子。In step S702, the pH of the copper-containing solution is adjusted to a first pH value. Since the copper-containing solution is acidic, a basic substance is added in this step to increase the pH of the copper-containing solution to the first pH. In an embodiment of the present invention, the alkaline substance is an aqueous solution of sodium hydroxide (NaOH), and the first pH is substantially between 3 and 6, but the invention is not limited thereto. In a preferred embodiment, the first pH is substantially 3.5. When the first pH of the copper-containing solution is within the above range, the iron ions (Fe 3+ ) in the copper-containing solution form a precipitate of iron, whereby the iron ions of the copper-containing solution can be removed.

在本發明之一實施例中,步驟S702可細分為步驟S7021~S7023,說明如下。In an embodiment of the present invention, step S702 may be subdivided into steps S7021 to S7023, as explained below.

步驟S7021,加入電荷增強劑至含銅溶液。In step S7021, a charge enhancer is added to the copper-containing solution.

步驟S7022,加入高分子凝集劑至含銅溶液。In step S7022, a polymer flocculating agent is added to the copper-containing solution.

在本發明之一實施例中,步驟S7021及步驟S7022皆為加強鐵離子形成鐵化物在含銅溶液中沉澱。在本發明之一實施例中,電荷增強劑係聚氯化鋁(Poly Aluminum Chloride,PAC),高分子凝集劑係二丙酮醇(Diacetone Alcohol,DAA),但本發明不以此為限。在本發明之一實施例中,鐵化物係氫氧化鐵(Fe(OH)3 ),但本發明不以此為限。In an embodiment of the invention, both step S7021 and step S7022 are for strengthening iron ions to form ferrite precipitated in the copper-containing solution. In one embodiment of the present invention, the charge enhancer is Poly Aluminum Chloride (PAC), and the polymer aggregating agent is Diacetone Alcohol (DAA), but the invention is not limited thereto. In one embodiment of the invention, the iron is iron (Fe(OH) 3 ), but the invention is not limited thereto.

接著進行步驟S7023,分離含銅溶液及含鐵沉澱物,以得到實質上不含鐵離子之具有第一pH值之第一含銅溶液。Next, in step S7023, the copper-containing solution and the iron-containing precipitate are separated to obtain a first copper-containing solution having a first pH value substantially free of iron ions.

接著進行步驟S703,加入活性碳至第一含銅溶液中並在充分接觸反應後移除活性碳。Next, in step S703, activated carbon is added to the first copper-containing solution and the activated carbon is removed after sufficient contact reaction.

在步驟S703中,加入活性碳至第一含銅溶液中,使充分接觸反應之,藉此使第一含銅溶液中之有機物吸附至活性碳中,之後移除活性碳,去除第一含銅溶液中之有機物。在本發明之一實施例中,活性碳係粉狀活性碳,充分接觸反應之時間係實質上為1小時,但本發明不以此為限。在本發明之一實施例中,移除活性碳之方式可為抽氣過濾,但本發明不以此為限。In step S703, activated carbon is added to the first copper-containing solution to sufficiently contact the reaction, thereby adsorbing the organic matter in the first copper-containing solution into the activated carbon, and then removing the activated carbon to remove the first copper-containing solution. Organic matter in solution. In one embodiment of the present invention, the active carbon-based powdered activated carbon has a period of sufficient contact with the reaction for substantially one hour, but the invention is not limited thereto. In an embodiment of the present invention, the method of removing activated carbon may be suction filtration, but the invention is not limited thereto.

接著進行步驟S704,調整第一含銅溶液之第一pH值以形成具有第二pH值之第二含銅溶液及第一含銅沉澱物。Next, in step S704, the first pH value of the first copper-containing solution is adjusted to form a second copper-containing solution having a second pH value and a first copper-containing precipitate.

在步驟S704中,加入鹼性物質至第一含銅溶液,增加第一含銅溶液之第一pH值,形成具有第二pH值之第二含銅溶液及第一含銅沉澱物。在本發明之一實施例中,第二pH值係實質上介於7至8.5之間,但本發明不以此為限。在更佳之一實施例中,第二pH值係實質上為8。其中,第二含銅溶液在第二pH值之條件下,銅離子會形成銅化物沉澱。In step S704, a basic substance is added to the first copper-containing solution, and the first pH value of the first copper-containing solution is increased to form a second copper-containing solution having a second pH value and a first copper-containing precipitate. In an embodiment of the invention, the second pH is substantially between 7 and 8.5, but the invention is not limited thereto. In a more preferred embodiment, the second pH is substantially 8. Wherein, the copper-containing solution forms a copper precipitate at the second pH condition.

在本發明之一實施例中,第一含銅沉澱物包括鹼式氯化銅(CuCl2 ‧3Cu(OH)2 )、氫氧化銅(Cu(OH)2 )、氧化銅及其它銅化合物,但本發明不以此為限。In an embodiment of the invention, the first copper-containing precipitate comprises basic copper chloride (CuCl 2 ‧3Cu(OH) 2 ), copper hydroxide (Cu(OH) 2 ), copper oxide and other copper compounds, However, the invention is not limited thereto.

接著進行步驟S705,分離第二含銅溶液及第一含銅沉澱物,並移除第二含銅溶液。Next, in step S705, the second copper-containing solution and the first copper-containing precipitate are separated, and the second copper-containing solution is removed.

在本發明之一實施例中,移除第二含銅溶液之方法可使用離心分離法將第二含銅溶液及第一含銅沉澱物分離,僅留下第一含銅沉澱物,但本發明不以此為限。In an embodiment of the present invention, the method of removing the second copper-containing solution may separate the second copper-containing solution and the first copper-containing precipitate by centrifugation, leaving only the first copper-containing precipitate, but The invention is not limited to this.

接著進行步驟S706,將第一含銅沉澱物水洗並移除第一含銅沉澱物之水分。Next, in step S706, the first copper-containing precipitate is washed with water and the moisture of the first copper-containing precipitate is removed.

在本發明之一實施例中,將第一含銅沉澱物水洗後再以離心分離法將第一含銅沉澱物所含之水分分離。In one embodiment of the invention, the first copper-containing precipitate is washed with water and then the water contained in the first copper-containing precipitate is separated by centrifugation.

接著進行步驟S707,將第一含銅沉澱物形成具有第三pH值之第三含銅溶液及第二含銅沉澱物。Next, in step S707, the first copper-containing precipitate is formed into a third copper-containing solution having a third pH value and a second copper-containing precipitate.

在步驟S707中,先將第一含銅沉澱物加至純水,再加入鹼性溶液以增加第一含銅沉澱物溶液之pH值,使第一含銅沉澱物溶液形成具有第三pH值之第三含銅溶液及第二含銅沉澱物。在本發明之一實施例中第三pH值係實質上介於11至13.5之間,但本發明不以此為限。在更佳之一實施例中,第三pH值係實質上為12。在本發明之一實施例中,第二含銅沉澱物包括氫氧化銅及氧化銅。In step S707, the first copper-containing precipitate is first added to the pure water, and then the alkaline solution is added to increase the pH of the first copper-containing precipitate solution, so that the first copper-containing precipitate solution forms a third pH. The third copper-containing solution and the second copper-containing precipitate. In one embodiment of the invention, the third pH is substantially between 11 and 13.5, but the invention is not limited thereto. In a more preferred embodiment, the third pH is substantially 12. In an embodiment of the invention, the second copper-containing precipitate comprises copper hydroxide and copper oxide.

須注意的是,第三含銅溶液在第三pH值之條件下,第一含銅沉澱物中之鹼式氯化銅會形成氫氧化銅、氧化銅及氯化鈉(NaCl)。It should be noted that the basic copper chloride in the first copper-containing precipitate forms copper hydroxide, copper oxide and sodium chloride (NaCl) under the third pH condition of the third copper-containing solution.

接著進行步驟S708,分離第三含銅溶液及第二含銅沉澱物。Next, in step S708, the third copper-containing solution and the second copper-containing precipitate are separated.

在本發明之一實施例中,分離第三含銅溶液及第二含銅沉澱物之方法可使用離心分離機將第三含銅溶液及第二含銅沉澱物分離,僅留下第二含銅沉澱物,但本發明不以此為限。In one embodiment of the present invention, the method of separating the third copper-containing solution and the second copper-containing precipitate may separate the third copper-containing solution and the second copper-containing precipitate using a centrifugal separator, leaving only the second Copper precipitate, but the invention is not limited thereto.

接著進行步驟S709,將第二含銅沉澱物水洗並移除第二含銅沉澱物之水分。Next, in step S709, the second copper-containing precipitate is washed with water and the moisture of the second copper-containing precipitate is removed.

在本發明之一實施例中,將第三含銅沉澱物水洗後再以離心分離機將第三含銅沉澱物所含之水分分離。In one embodiment of the invention, the third copper-containing precipitate is washed with water and then the water contained in the third copper-containing precipitate is separated by a centrifugal separator.

接著進行步驟S710,微波加熱第三含銅沉澱物以得到粗製氧化銅。Next, in step S710, the third copper-containing precipitate is heated by microwave to obtain crude copper oxide.

在步驟S710中,微波(microwave)可深度進入第二含銅沉澱物使第二含銅沉澱物之氫氧化銅脫水形成氧化銅;藉此,第二含銅沉澱物可形成純度高之粗製氧化銅,其銅含量可達80%以上。In step S710, a microwave can deeply enter the second copper-containing precipitate to dehydrate the copper hydroxide of the second copper-containing precipitate to form copper oxide; thereby, the second copper-containing precipitate can form a high purity crude oxidation. Copper, its copper content can reach more than 80%.

接著進行步驟S711,粉碎粗製氧化銅並形成氧化銅粉末。Next, in step S711, the crude copper oxide is pulverized to form a copper oxide powder.

在步驟S711中,使用粉碎機將粗製氧化銅進行粉碎,以得到氧化銅粉末。在本發明之一實施例中,粉碎機具有集塵器可降低粉塵對外界之污染,且氧化銅粉末之粒徑係實質上介於100目(mesh)至250目(mesh)之間,但本發明不以此為限。In step S711, the crude copper oxide is pulverized using a pulverizer to obtain copper oxide powder. In an embodiment of the present invention, the pulverizer has a dust collector to reduce dust pollution to the outside, and the particle size of the copper oxide powder is substantially between 100 mesh and 250 mesh, but The invention is not limited thereto.

接著進行步驟S712,將氧化銅粉末置於純水中並進行超音波清洗。Next, in step S712, the copper oxide powder is placed in pure water and subjected to ultrasonic cleaning.

在步驟S712中,使用超音波清洗之另一目的係可使氧化銅粉末在被清洗時,可再形成較細之氧化銅粉末。In the step S712, another purpose of using ultrasonic cleaning is to re-form the fine copper oxide powder when the copper oxide powder is washed.

接著進行步驟S713,將氧化銅粉末移除水分。Next, in step S713, the copper oxide powder is removed from moisture.

在步驟S713中,將氧化銅粉末移除水分之方法可使用離心脫水機使氧化銅粉末去除水分,或以低碳數醇類清洗氧化銅粉末以去除氧化銅粉末所含之水分,但本發明不以此為限。舉例來說,將氧化銅粉末移除水分之方法可混用離心脫水機及低碳數醇類。In step S713, the method of removing moisture from the copper oxide powder may use a centrifugal dehydrator to remove moisture from the copper oxide powder, or wash the copper oxide powder with a low carbon number alcohol to remove moisture contained in the copper oxide powder, but the present invention Not limited to this. For example, a method of removing moisture from copper oxide powder may be mixed with a centrifugal dehydrator and a low carbon number alcohol.

在本發明之一實施例中,低碳數醇類係甲醇(CH3 OH),但本發明不以此為限。在本發明之一實施例中,氧化銅粉末在經低碳數醇類清洗後,可再將氧化銅粉末進行微波加熱,以移除殘留之低碳數醇類及水分。In one embodiment of the invention, the lower carbon number is methanol (CH 3 OH), but the invention is not limited thereto. In one embodiment of the present invention, after the copper oxide powder is washed with a low carbon number alcohol, the copper oxide powder may be further heated by microwave to remove residual low carbon number alcohols and moisture.

以下將說明使用本發明之由含銅溶液中產生氧化銅之方法之一實施例。An example of a method of producing copper oxide from a copper-containing solution using the present invention will be described below.

所使用之含銅溶液係氯化銅蝕刻廢液,其體積為500毫升(ml);鹼性溶液為40%之氫氧化鈉溶液。調整含銅溶液之pH值至第一pH值時,係加入196毫升(ml)之鹼性溶液至含銅溶液形成第一含銅溶液,其第一pH值實際為3.5。接著加入粉狀活性碳至第一含銅溶液,持續攪拌1小時後以抽氣過濾將粉狀活性碳及含鐵沉澱物移除。The copper-containing solution used was a copper chloride etching waste liquid having a volume of 500 ml (ml); and the alkaline solution was a 40% sodium hydroxide solution. When the pH of the copper-containing solution was adjusted to the first pH value, a basic solution of 196 ml (ml) was added to the copper-containing solution to form a first copper-containing solution, the first pH value of which was actually 3.5. Next, powdered activated carbon was added to the first copper-containing solution, and stirring was continued for 1 hour, and then the powdery activated carbon and the iron-containing precipitate were removed by suction filtration.

調整第一含銅溶液之pH值至第二pH值時,係加入50毫升(ml)之鹼性溶液至第一含銅溶液形成第二含銅溶液及第一含銅沉澱物,第二含銅溶液之第二pH值實際為8.02。將第一含銅沉澱物取出並水洗後,加入1000毫升(ml)之純水形成第一含銅沉澱物混合溶液,接著加入13毫升(ml)之鹼性溶液至第一含銅沉澱物混合溶液形成具有第三pH值之第三含銅溶液及第二含銅沉澱物,第三含銅溶液之第三pH值實際為11.52。Adjusting the pH value of the first copper-containing solution to the second pH value, adding 50 ml (ml) of the alkaline solution to the first copper-containing solution to form the second copper-containing solution and the first copper-containing precipitate, the second The second pH of the copper solution was actually 8.02. After the first copper-containing precipitate is taken out and washed with water, 1000 ml (ml) of pure water is added to form a first copper-containing precipitate mixed solution, followed by adding 13 ml (ml) of the alkaline solution to the first copper-containing precipitate to be mixed. The solution forms a third copper-containing solution having a third pH and a second copper-containing precipitate, and the third pH of the third copper-containing solution is actually 11.52.

取出第二含銅沉澱物並水洗,水洗後之第二含銅沉澱物之(乾)重量為95克(g)。接著進行微波加熱,微波之功率為350W,時間為30分鐘,可得到粗製氧化銅。接著粉碎粗製氧化銅並形成氧化銅粉末,並進行超音波清洗,得到之氧化銅粉末之(乾)重量為95.44克(g)。The second copper-containing precipitate was taken out and washed with water, and the (dry) weight of the second copper-containing precipitate after washing was 95 g (g). Then, microwave heating was carried out, and the power of the microwave was 350 W for 30 minutes to obtain crude copper oxide. Next, the crude copper oxide was pulverized to form a copper oxide powder, and subjected to ultrasonic cleaning to obtain a (dry) weight of the copper oxide powder of 95.44 g (g).

接著使用甲醇進行對氧化銅粉末之脫水,甲醇之體積為200毫升(ml),之後進行微波加熱15分鐘。最終可得到氧化銅粉末之重量為88.25克(g),其中銅含量可高達82.6%。The copper oxide powder was then dehydrated using methanol in a volume of 200 ml (ml), followed by microwave heating for 15 minutes. The weight of the copper oxide powder is finally obtained to be 88.25 g (g), wherein the copper content can be as high as 82.6%.

綜上所陳,本發明無論就目的、手段及功效,在在均顯示其迥異於習知技術之特徵,懇請 貴審查委員明察,早日賜准專利,俾嘉惠社會,實感德便。惟應注意的是,上述諸多實施例僅係為了便於說明而舉例而已,本發明所主張之權利範圍自應以申請專利範圍所述為準,而非僅限於上述實施例。To sum up, the present invention, regardless of its purpose, means and efficacy, shows its distinctive features of the prior art. You are requested to review the examination and express the patent as soon as possible. It should be noted that the various embodiments described above are merely illustrative for ease of explanation, and the scope of the invention is intended to be limited by the scope of the claims.

圖1係本發明之由含銅溶液中產生氧化銅之方法之步驟流程圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a flow chart showing the steps of a method for producing copper oxide from a copper-containing solution of the present invention.

Claims (11)

一種由含銅溶液中產生氧化銅之方法,包括下列步驟:取得該含銅溶液;調整該含銅溶液之一pH值以形成具有一第一pH值之一第一含銅溶液,其中在該第一pH值之條件下,該含銅溶液之一鐵離子(Fe3+ )係形成一含鐵沉澱物以進行分離。調整該第一含銅溶液之該第一pH值以形成具有一第二pH值之一第二含銅溶液及一第一含銅沉澱物,其中該第二pH值係實質上介於7至8.5;將該第一含銅沉澱物形成具有一第三pH值之一第三含銅溶液及一第二含銅沉澱物;以及分離該第三含銅溶液及該第二含銅沉澱物,其中該第二含銅沉澱物包括氧化銅(CuO)。A method for producing copper oxide from a copper-containing solution, comprising the steps of: obtaining the copper-containing solution; adjusting a pH of one of the copper-containing solutions to form a first copper-containing solution having a first pH value, wherein Under the condition of the first pH, one of the copper-containing solutions, iron ions (Fe 3+ ), forms an iron-containing precipitate for separation. Adjusting the first pH of the first copper-containing solution to form a second copper-containing solution having a second pH and a first copper-containing precipitate, wherein the second pH is substantially between 7 and 8.5; forming the first copper-containing precipitate into a third copper-containing solution having a third pH value and a second copper-containing precipitate; and separating the third copper-containing solution and the second copper-containing precipitate, Wherein the second copper-containing precipitate comprises copper oxide (CuO). 如申請專利範圍第1項所述之由含銅溶液中產生氧化銅之方法,其中該第一pH值係實質上介於3至6。 A method of producing copper oxide from a copper-containing solution as described in claim 1, wherein the first pH is substantially between 3 and 6. 如申請專利範圍第2項所述之由含銅溶液中產生氧化銅之方法,其中該第三pH值係實質上介於11至13.5。 A method of producing copper oxide from a copper-containing solution as described in claim 2, wherein the third pH is substantially between 11 and 13.5. 如申請專利範圍第1或2項所述之由含銅溶液中產生氧化銅之方法,其中在調整該含銅溶液之pH值以形成具有該第一pH值之該第一含銅溶液之步驟中,更包括下列步驟:加入一電荷增強劑至該一含銅溶液;加入一高分子凝集劑至該含銅溶液;以及過濾該含銅溶液。 The method for producing copper oxide from a copper-containing solution according to claim 1 or 2, wherein the step of adjusting the pH of the copper-containing solution to form the first copper-containing solution having the first pH value The method further comprises the steps of: adding a charge enhancer to the copper-containing solution; adding a polymer aggregating agent to the copper-containing solution; and filtering the copper-containing solution. 如申請專利範圍第4項所述之由含銅溶液中產生氧化銅之方法,其中在過濾該含銅溶液以移除該鐵化物並形成具有該第一pH值之該第一含銅溶液之步驟後,更包括下列步驟:加入一活性碳至該第一含銅溶液中並在充分接觸反應後移除該活性碳。 A method for producing copper oxide from a copper-containing solution as described in claim 4, wherein the copper-containing solution is filtered to remove the iron compound and form the first copper-containing solution having the first pH value. After the step, the method further comprises the steps of: adding an activated carbon to the first copper-containing solution and removing the activated carbon after sufficient contact reaction. 如申請專利範圍第1或2項所述之由含銅溶液中產生氧化銅之方法,其中該第一含銅沉澱物包括鹼式氯化銅(CuCl2 .3Cu(OH)2 )、氫氧化銅(Cu(OH)3 )、氧化銅或其它銅化合物。A method for producing copper oxide from a copper-containing solution according to claim 1 or 2, wherein the first copper-containing precipitate comprises basic copper chloride (CuCl 2 .3Cu(OH) 2 ), and hydroxide Copper (Cu(OH) 3 ), copper oxide or other copper compound. 如申請專利範圍第1項所述之由含銅溶液中產生氧化銅之方法,其中在調整該第一含銅溶液之該第一pH值以形成具有該第二pH值之該第二含銅溶液及該第一含銅沉澱物之步驟後,更包括下列步驟:分離該第二含銅溶液及該第一含銅沉澱物,並移除該第二含銅溶液;以及將該第一含銅沉澱物水洗後再移除該第一含銅沉澱物之水分。 The method for producing copper oxide from a copper-containing solution according to claim 1, wherein the first pH value of the first copper-containing solution is adjusted to form the second copper-containing material having the second pH value; After the step of the solution and the first copper-containing precipitate, the method further comprises the steps of: separating the second copper-containing solution and the first copper-containing precipitate, and removing the second copper-containing solution; and removing the first The copper precipitate is washed with water to remove the moisture of the first copper-containing precipitate. 如申請專利範圍第1或7項所述之由含銅溶液中產生氧化銅之方法,其中該第二含銅沉澱物更包括氫氧化銅,且在分離該第三含銅溶液及該第二含銅沉澱物之步驟後,更包括下列步驟:將該第二含銅沉澱物水洗後再移除該第二含銅沉澱物之水分;以及微波加熱該第二含銅沉澱物以得到一粗製氧化銅。 The method for producing copper oxide from a copper-containing solution according to claim 1 or 7, wherein the second copper-containing precipitate further comprises copper hydroxide, and separating the third copper-containing solution and the second After the step of containing the copper precipitate, the method further comprises the steps of: removing the water of the second copper-containing precipitate after washing the second copper-containing precipitate; and heating the second copper-containing precipitate by microwave to obtain a crude Copper oxide. 如申請專利範圍第8項所述之由含銅溶液中產生氧化銅之方法,其中在微波加熱該第二含銅沉澱物以得到該粗製氧化銅之步驟後,更包括下列步驟:粉碎該粗製氧化銅以形成一氧化銅粉末,其中該氧化銅粉末之粒徑係實質上介於100目(mesh)至250目(mesh)之間;將該氧化銅粉末置於水中並進行超音波清洗;以及將該氧化銅粉末移除水分。 The method for producing copper oxide from a copper-containing solution according to claim 8, wherein after the step of heating the second copper-containing precipitate in the microwave to obtain the crude copper oxide, the method further comprises the steps of: pulverizing the crude Copper oxide to form a copper oxide powder, wherein the copper oxide powder has a particle size substantially between 100 mesh and 250 mesh; the copper oxide powder is placed in water and subjected to ultrasonic cleaning; And removing the copper oxide powder from moisture. 如申請專利範圍第9項所述之由含銅溶液中產生氧化銅之方法,其中在將該氧化銅粉末移除水分之步驟中,係使用一離心分離機使該氧化銅粉末去除水分或以一低碳數醇類充分接觸反應該氧化銅粉末並再分離以去除該氧化銅粉末所含之水分。 A method for producing copper oxide from a copper-containing solution according to claim 9, wherein in the step of removing moisture from the copper oxide powder, the copper oxide powder is removed by using a centrifugal separator or A low carbon number alcohol is sufficiently contacted to react the copper oxide powder and further separated to remove moisture contained in the copper oxide powder. 如申請專利範圍第1項所述之由含銅溶液中產生氧化銅之方法,其中該含銅溶液係一電路板製程中之一蝕刻廢液及一微蝕刻廢液。 The method for producing copper oxide from a copper-containing solution according to the first aspect of the invention, wherein the copper-containing solution is one of an etching waste liquid and a micro-etching waste liquid in a circuit board process.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62270417A (en) * 1986-05-16 1987-11-24 Akimitsu Yabusaki Method for treating solution containing cuprammonium solution
JPH05319825A (en) * 1992-05-25 1993-12-03 Nippon Kagaku Sangyo Kk Production of cuprous oxide
CN101357809A (en) * 2007-08-02 2009-02-04 蔡敏行 Zero sludge and resource handling arrangement and recovery method of heavy metal waste water
TW200906737A (en) * 2007-08-07 2009-02-16 Trinity Resources Technology Holding Inc Recycling method for copper resource in process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62270417A (en) * 1986-05-16 1987-11-24 Akimitsu Yabusaki Method for treating solution containing cuprammonium solution
JPH05319825A (en) * 1992-05-25 1993-12-03 Nippon Kagaku Sangyo Kk Production of cuprous oxide
CN101357809A (en) * 2007-08-02 2009-02-04 蔡敏行 Zero sludge and resource handling arrangement and recovery method of heavy metal waste water
TW200906737A (en) * 2007-08-07 2009-02-16 Trinity Resources Technology Holding Inc Recycling method for copper resource in process

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