TWI392913B - Touch panel - Google Patents
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- TWI392913B TWI392913B TW98118896A TW98118896A TWI392913B TW I392913 B TWI392913 B TW I392913B TW 98118896 A TW98118896 A TW 98118896A TW 98118896 A TW98118896 A TW 98118896A TW I392913 B TWI392913 B TW I392913B
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Description
本發明係有關於一種觸控面板,特別有關於一種觸控面板之訊號讀出線的設置。The present invention relates to a touch panel, and more particularly to the setting of a signal readout line of a touch panel.
傳統的觸控面板可分為電容式感應或電阻式感應,電容式觸控面板是利用偵測手指觸碰面板與感應電極之間產生的電容來判定手指觸碰的位置,而電阻式觸控面板則是利用手指按壓面板,使得觸控面板中按壓感測結構之電極互相接觸而短路,利用感測薄膜電晶體與按壓感測結構電性連接,並藉由訊號讀出線與感測薄膜電晶體連接,以讀取按壓感測訊號,進而判定手指按壓的位置。The conventional touch panel can be divided into a capacitive sensing or a resistive sensing. The capacitive touch panel determines the position of the finger touch by detecting the capacitance generated between the touch panel and the sensing electrode, and the resistive touch The panel presses the panel with a finger, so that the electrodes of the touch sensing structure in the touch panel are short-circuited with each other, and the sensing thin film transistor is electrically connected to the pressing sensing structure, and the signal reading line and the sensing film are used. The transistor is connected to read the pressing sensing signal to determine the position of the finger pressing.
請參閱第1圖,其係顯示傳統的電阻式觸控面板之平面示意圖,其具有複數個次畫素區18,次畫素區18係由兩條相鄰的筆直資料線10與兩條相鄰的筆直掃描線11所定義,每個次畫素區18中具有一個顯示薄膜電晶體12,顯示薄膜電晶體12係與筆直資料線10電性連接。另外,在傳統的電阻式觸控面板中還具有按壓感測結構15,其係電性連接至感測薄膜電晶體16,而觸控面板中同一行的感測薄膜電晶體16係由訊號讀出線14連接,以傳遞感測訊號至積體電路。Please refer to FIG. 1 , which is a plan view showing a conventional resistive touch panel having a plurality of sub-pixel regions 18 , which are composed of two adjacent straight data lines 10 and two phases. The adjacent straight scanning line 11 is defined, and each sub-pixel area 18 has a display film transistor 12, and the display film transistor 12 is electrically connected to the straight data line 10. In addition, the conventional resistive touch panel further has a pressing sensing structure 15 electrically connected to the sensing thin film transistor 16 , and the sensing thin film transistor 16 of the same row in the touch panel is read by the signal The outgoing line 14 is connected to transmit the sensing signal to the integrated circuit.
在傳統的電阻式觸控面板中,訊號讀出線14為直線型(筆直)的導電線(或稱沒有彎曲的導電線),因此顯示薄膜電晶體12受到訊號讀出線14的阻擋,只能設置在資料線10的同一側,無法設置成左右交錯(zigzag)的配置,使得傳統的電阻式觸控面板無法採用點反轉(dot inversion)的驅動方式,無法達到省電的功效。In the conventional resistive touch panel, the signal readout line 14 is a linear (straight) conductive line (or a non-bent conductive line), so that the display film transistor 12 is blocked by the signal readout line 14, Can be set on the same side of the data line 10, can not be set to the left and right staggered (zigzag) configuration, so that the traditional resistive touch panel can not use dot inversion drive mode, can not achieve power saving effect.
因此,業界亟需一種觸控面板,其可以克服上述問題,達到省電的功效。Therefore, there is a need in the industry for a touch panel that can overcome the above problems and achieve power saving effects.
本發明係提供一種觸控面板,具有複數個畫素區,包括:第一基板,第一導電層設置於第一基板上,第一導電層係作為閘極及掃描線;第二導電層設置於第一導電層之上,第二導電層係作為源極和汲極以及資料線,其中資料線與掃描線交錯形成該些畫素區;第三導電層設置於第二導電層之上,第三導電層係作為共用電極;畫素電極設置於第三導電層上,其中畫素電極具有一主要區塊及至少一與該主要區塊電性絕緣的次要區塊,主要區塊位於各畫素區中,次要區塊覆蓋第二導電層之一部份與第三導電層之一部份;以及彎曲的訊號讀出線,其在同一行且相鄰的二個畫素區中具有不同的彎曲方向,其中由上視方向觀之,彎曲的訊號讀出線係由第一、第二及第三導電層與畫素電極之次要區塊互相連接形成,且其中第一導電層經由一第一導通孔與第二導電層電性連接,畫素電極之次要區塊經由第二導通孔分別與第二導電層及第三導電層電性連接。The present invention provides a touch panel having a plurality of pixel regions, including: a first substrate, the first conductive layer is disposed on the first substrate, the first conductive layer serves as a gate and a scan line; and the second conductive layer is disposed Above the first conductive layer, the second conductive layer serves as a source and a drain and a data line, wherein the data line and the scan line are alternately formed to form the pixel regions; and the third conductive layer is disposed on the second conductive layer. The third conductive layer is used as a common electrode; the pixel electrode is disposed on the third conductive layer, wherein the pixel electrode has a main block and at least one secondary block electrically insulated from the main block, and the main block is located In each pixel region, the secondary block covers a portion of the second conductive layer and a portion of the third conductive layer; and a curved signal readout line in the same row and adjacent two pixel regions Having different bending directions, wherein viewed from the upper viewing direction, the curved signal reading line is formed by interconnecting the first, second and third conductive layers with the secondary blocks of the pixel electrodes, and wherein the first The conductive layer is connected to the second conductive layer via a first via hole Connection, the secondary block of the pixel electrode via the second via holes are connected to the second conductive layer and the third layer is electrically conductive.
此外,本發明又提供一種觸控面板,包括:第一基板,第一圖案化導電層設置於第一基板上,其中第一圖案化導電層包含:複數條掃描線延著第一方向排列,複數個串聯的第一導電電極,以及複數個各自獨立的第二導電電極。In addition, the present invention further provides a touch panel, comprising: a first substrate, the first patterned conductive layer is disposed on the first substrate, wherein the first patterned conductive layer comprises: a plurality of scan lines are arranged in a first direction, A plurality of first conductive electrodes connected in series, and a plurality of independent second conductive electrodes.
第二圖案化導電層設置於第一基板上且位於第一圖案化導電層上方,其中第二圖案化導電層包含:複數條資料線延著第二方向排列,與該些掃描線交錯而構成複數個畫素區群組,其中每個畫素區群組至少包含第一畫素區、第二畫素區、第三畫素區及第四畫素區;至少一第一源/汲極對設置於每個畫素區中,且每個源極電性連接於每條資料線;至少一第三導電電極設置於各第一導電電極之上、各第二導電電極之上及第一畫素區中,其中位於各第一導電電極之上的第三導電電極電性連接於各第一導電電極;至少一第一導電線設置於第一畫素區及第三畫素區中,且分別電性連接位於第一畫素區中之第三導電電極及位於各第一導電電極之上的第三導電電極;以及至少一第二源/汲極對設置於第一畫素區,第二源極電性連接於另一畫素區群組中的第一導電線。The second patterned conductive layer is disposed on the first substrate and above the first patterned conductive layer, wherein the second patterned conductive layer comprises: a plurality of data lines are arranged in a second direction, and are interlaced with the scan lines a plurality of pixel group groups, wherein each pixel group includes at least a first pixel region, a second pixel region, a third pixel region, and a fourth pixel region; at least one first source/dippole The pair is disposed in each of the pixel regions, and each source is electrically connected to each of the data lines; at least one third conductive electrode is disposed on each of the first conductive electrodes, above each of the second conductive electrodes, and first In the pixel region, the third conductive electrode located above each of the first conductive electrodes is electrically connected to each of the first conductive electrodes; and the at least one first conductive line is disposed in the first pixel region and the third pixel region. And electrically connecting the third conductive electrode located in the first pixel region and the third conductive electrode located above each of the first conductive electrodes; and the at least one second source/drain pair is disposed in the first pixel region, The second source is electrically connected to the first conductive line in the other pixel group.
第三圖案化導電層設置於第一基板上且位於第二圖案化導電層上方,其中第三圖案化導電層包含:至少一第二導電線平行於該些掃描線其中一條排列,至少一第三導電線覆蓋各資料線的一部份,以及至少一第四導電線設置於第一畫素區中,且覆蓋第二源極的一部份及位於第一畫素區中的第三導電電極的一部份。The third patterned conductive layer is disposed on the first substrate and above the second patterned conductive layer, wherein the third patterned conductive layer comprises: at least one second conductive line is arranged parallel to one of the scan lines, at least one The three conductive lines cover a portion of each of the data lines, and the at least one fourth conductive line is disposed in the first pixel region, and covers a portion of the second source and a third conductive portion located in the first pixel region a part of the electrode.
畫素電極設置於第一基板上,且位於第三圖案化導電層上方,其中畫素電極包含:畫素電極區塊設置於各畫素區中,且與各畫素區中的各第一汲極電性連接;第四導電電極覆蓋且電性連接於第一畫素區中的第三導電電極上及第二源極上;以及第五導電線設置於第二畫素區中的第二導電電極之上,其中該些第一導電電極、第一導電線、第三導電電極、第四導電線與第四導電電極構成一彎曲(ZigZag)的訊號讀出線。The pixel electrode is disposed on the first substrate and above the third patterned conductive layer, wherein the pixel electrode comprises: a pixel electrode block disposed in each pixel region, and each of the first pixels in each pixel region a second electrically conductive electrode is covered and electrically connected to the third conductive electrode and the second source in the first pixel region; and the fifth conductive line is disposed in the second pixel region On the conductive electrode, the first conductive electrode, the first conductive line, the third conductive electrode, the fourth conductive line and the fourth conductive electrode form a ZigZag signal readout line.
為了讓本發明之上述目的、特徵、及優點能更明顯易懂,以下配合所附圖式,作詳細說明如下:In order to make the above objects, features, and advantages of the present invention more comprehensible, the following detailed description is made in conjunction with the accompanying drawings.
本發明提供一種觸控面板,其具有彎曲的訊號讀出線,因此同一條資料線所連接的顯示薄膜電晶體可以利用左右交錯的方式配置,使得觸控面板可採用點反轉(dot inversion)的方式驅動,進而達到省電的目的。The invention provides a touch panel with a curved signal readout line. Therefore, the display thin film transistor connected to the same data line can be configured by using left and right interlacing, so that the touch panel can adopt dot inversion. The way to drive, and thus achieve the purpose of power saving.
請參閱第2圖,其係顯示依據本發明一實施例之觸控面板的平面示意圖。觸控面板具有多個次畫素區28,其係由兩條相鄰的資料線20與兩條相鄰的掃描線40所定義,每一個次畫素區中具有至少一個顯示薄膜電晶體22。第2圖中虛線框住的範圍為一個畫素區群組30,其包含第一畫素區31、第二畫素區32、第三畫素區33及第四畫素區34,觸控面板內具有多個畫素區群組30。在第一畫素區31中具有至少一感測薄膜電晶體26,於同一行的畫素區群組30中之多個感測薄膜電晶體26係利用彎曲(zigzag)的訊號讀出線24連接,此彎曲的訊號讀出線24在同一行且相鄰的兩個畫素區例如畫素區31及33中具有不同的彎曲方向,並且這些不同的彎曲方向在同一行且相鄰的兩個畫素區例如畫素區31及其上方的畫素區中形成S形的形狀,因此可以避開左右交錯配置的顯示薄膜電晶體22,進而可實現點反轉驅動之觸控面板。其中,各個顯示薄膜電晶體22是用以控制各次畫素區28的畫素電極(未標示)之電壓開與關。Please refer to FIG. 2, which is a plan view showing a touch panel according to an embodiment of the invention. The touch panel has a plurality of sub-pixel regions 28 defined by two adjacent data lines 20 and two adjacent scan lines 40, each of which has at least one display film transistor 22 therein. . The range enclosed by the dotted line in FIG. 2 is a pixel area group 30, which includes a first pixel area 31, a second pixel area 32, a third pixel area 33, and a fourth pixel area 34. There are a plurality of pixel group groups 30 in the panel. Having at least one sensing thin film transistor 26 in the first pixel region 31, and a plurality of sensing thin film transistors 26 in the pixel group 30 of the same row utilizing a zigzag signal readout line 24 Connected, the curved signal readout line 24 has different bending directions in the same row and adjacent two pixel regions, such as pixel regions 31 and 33, and these different bending directions are in the same row and adjacent to each other. In the pixel region 31, for example, the pixel region 31 and the pixel region above it form an S-shaped shape, so that the display film transistor 22 in which the left and right sides are alternately arranged can be avoided, and the touch panel driven by dot inversion can be realized. Each of the display film transistors 22 is used to control the voltage on and off of the pixel electrodes (not labeled) of each pixel region 28.
另外,在第二畫素區32中具有至少一按壓感測結構25,其係與右方之另一畫素區群組中的感測薄膜電晶體26連接,尤其是,另一畫素區群組之第一畫素區31中的感測薄膜電晶體26,感測薄膜電晶體26接收來自按壓感測結構25的訊號,並與另一訊號讀出線24電性連接。In addition, there is at least one pressing sensing structure 25 in the second pixel area 32, which is connected to the sensing thin film transistor 26 in the other pixel group on the right side, in particular, another pixel area. The sensing thin film transistor 26 in the first pixel area 31 of the group receives the signal from the pressing sensing structure 25 and is electrically connected to the other signal readout line 24.
由上視方向觀之,此彎曲的訊號讀出線24係由第一導電層(或稱第一圖案化導電層)241、第二導電層(或稱第二圖案化導電層)242、第三導電層(或稱第三圖案化導電層)243及畫素電極(未標示)之次要區塊72互相連接而成。第一導電層241係作為顯示薄膜電晶體22之閘極和感測薄膜電晶體26之閘極以及掃描線40,且顯示薄膜電晶體22之閘極連接至所對應的掃描線40,而感測薄膜電晶體26之閘極連接至所對應的掃描線40。第二導電層24設置於第一導電層241之上,其係作為顯示薄膜電晶體22之源/汲極和感測薄膜電晶體26之源/汲極以及資料線20,且顯示薄膜電晶體22之源/汲極連接至所對應的資料線20,而感測薄膜電晶體26之源/汲極連接至所對應的資料線20。第三導電層243係設置於第二導電層24之上,其係作為共用電極(common electrode),而畫素電極則設置於第三導電層243之上,其具有一主要區塊(未顯示)設置於各次畫素區中,以及一次要區塊72與主要區塊電性絕緣,次要區塊72覆蓋第二導電層242的一部份與第三導電層243的一部份。上述第一導電層241係經由第一導通孔49與第二導電層242電性連接,而畫素電極之次要區塊72則經由第二導通孔62分別與第二導電層242及第三導電層243電性連接。Viewed from the top view, the curved signal readout line 24 is composed of a first conductive layer (or first patterned conductive layer) 241, a second conductive layer (or second patterned conductive layer) 242, A third conductive layer (or third patterned conductive layer) 243 and a minor block 72 of a pixel electrode (not shown) are connected to each other. The first conductive layer 241 functions as a gate of the display film transistor 22 and a gate of the sensing film transistor 26 and the scan line 40, and the gate of the display film transistor 22 is connected to the corresponding scan line 40, and the sense The gate of the thin film transistor 26 is connected to the corresponding scan line 40. The second conductive layer 24 is disposed on the first conductive layer 241 as a source/drain of the thin film transistor 22 and a source/drain of the sensing thin film transistor 26 and the data line 20, and displays the thin film transistor The source/drain of 22 is connected to the corresponding data line 20, and the source/drain of the sensing thin film transistor 26 is connected to the corresponding data line 20. The third conductive layer 243 is disposed on the second conductive layer 24 as a common electrode, and the pixel electrode is disposed on the third conductive layer 243, and has a main block (not shown). It is disposed in each pixel region, and the primary block 72 is electrically insulated from the main block, and the secondary block 72 covers a portion of the second conductive layer 242 and a portion of the third conductive layer 243. The first conductive layer 241 is electrically connected to the second conductive layer 242 via the first via 49, and the secondary block 72 of the pixel electrode is respectively connected to the second conductive layer 242 and the third via the second via 62. The conductive layer 243 is electrically connected.
接著,請參閱第3A至3G圖,其係顯示依據本發明之一實施例,形成觸控面板之畫素區群組30的各製程平面示意圖,其中畫素區群組30包含第一畫素區31、第二畫素區32、第三畫素區33及第四畫素區34。請參閱第3A圖,首先提供第一基板(未顯示),其例如為透明基板(例如:玻璃、石英、其它的材料、或上述之組合。)、非透明基板(例如:晶圓、陶瓷、金屬板、不透光之玻璃、不透光之石英、不透光之聚合物板、其它的材料、或上述之組合。)或軟性基板(例如:聚丙醯酸酯類、聚碳酸酯、聚苯乙烯、聚醯類、聚酯類、其它的材料、或上述之組合。),在第一基板上形成第一圖案化導電層310。第一圖案化導電層310包含複數條掃描線40沿著第一方向X排列,複數個串聯的第一導電電極241,以及複數個各自獨立的第二導電電極46。另外,第一圖案化導電層310還作為顯示薄膜電晶體22之閘極421,以及感測薄膜電晶體26之閘極422。由圖3A可知,第一圖案化導電層310之所包含的元件,是很明白的顯示於圖中的各畫素區位置,而不會有任何的疑問或不能理解的。Next, please refer to FIGS. 3A to 3G, which are schematic diagrams showing process planes of the pixel group 30 of the touch panel according to an embodiment of the present invention, wherein the pixel group 30 includes the first pixel. The area 31, the second pixel area 32, the third pixel area 33, and the fourth pixel area 34. Referring to FIG. 3A, a first substrate (not shown) is first provided, which is, for example, a transparent substrate (eg, glass, quartz, other materials, or a combination thereof), a non-transparent substrate (eg, wafer, ceramic, Metal plate, opaque glass, opaque quartz, opaque polymer plate, other materials, or a combination of the above.) or a flexible substrate (eg, polyacrylic acid ester, polycarbonate, poly A first patterned conductive layer 310 is formed on the first substrate by styrene, polyfluorene, polyester, other materials, or a combination thereof. The first patterned conductive layer 310 includes a plurality of scan lines 40 arranged along the first direction X, a plurality of first conductive electrodes 241 connected in series, and a plurality of independent second conductive electrodes 46. In addition, the first patterned conductive layer 310 also functions as a gate 421 for displaying the thin film transistor 22, and a gate 422 for sensing the thin film transistor 26. As can be seen from FIG. 3A, the elements included in the first patterned conductive layer 310 are clearly shown in the respective pixel regions of the drawing without any doubt or understanding.
請參閱第3B圖,形成半導體層48在顯示薄膜電晶體22的閘極421上,以及在感測薄膜電晶體26的閘極422上。接著,請參閱第3C圖,在串聯的第一導電電極241上形成第一導通孔49。請注意第一導通孔49並非形成於第一導電電極之材質中,請查看後續之第4C圖,就可明白之。Referring to FIG. 3B, the semiconductor layer 48 is formed on the gate 421 of the display film transistor 22, and on the gate 422 of the sensing film transistor 26. Next, referring to FIG. 3C, a first via hole 49 is formed on the first conductive electrode 241 connected in series. Please note that the first via 49 is not formed in the material of the first conductive electrode. Please refer to the following FIG. 4C for a clear understanding.
請參閱第3D圖,形成第二圖案化導電層320在第一基板上,且位於第一圖案化導電層310上方,第二圖案化導電層320包含複數條資料線20沿著第二方向Y排列,與掃描線40交錯,以形成各畫素區31、32、33及34。第二圖案化導電層320還包含第一源/汲極對52設置於每個次畫素區中,且每個第一源/汲極對52電性連接於每條資料線20。此外,第二圖案化導電層320還包含第三導電電極50,設置於各第一導電電極241之上、各第二導電電極46之上,以及第一畫素區31中,其中位於各第一導電電極241之上的第三導電電極50係經由第一導通孔49與各第一導電電極241電性連接。另外,第二圖案化導電層320還包含第一導電線242,設置於第一畫素區31及第三畫素區33中,作為彎曲的訊號連接線24之一部分,其中位於第一畫素區31中的第一導電線242電性連接於第三導電電極50,位於第三畫素區33中的第一導電線242電性連接於位於第一導電電極241之上的第三導電電極50。而且第一導電線242會與某些條掃描線40交錯。第二圖案化導電層320還包含第二源/汲極對54,設置於第一畫素區31中,第二源極電性連接於另一畫素區群組中的第一導電線242。Referring to FIG. 3D, a second patterned conductive layer 320 is formed on the first substrate and above the first patterned conductive layer 310. The second patterned conductive layer 320 includes a plurality of data lines 20 along the second direction. The arrays are interleaved with the scan lines 40 to form respective pixel regions 31, 32, 33 and 34. The second patterned conductive layer 320 further includes a first source/drain pair 52 disposed in each sub-pixel region, and each of the first source/drain pairs 52 is electrically connected to each of the data lines 20. In addition, the second patterned conductive layer 320 further includes a third conductive electrode 50 disposed on each of the first conductive electrodes 241, above each of the second conductive electrodes 46, and in the first pixel region 31, wherein each of the first conductive regions The third conductive electrode 50 above the conductive electrode 241 is electrically connected to each of the first conductive electrodes 241 via the first via 49. In addition, the second patterned conductive layer 320 further includes a first conductive line 242 disposed in the first pixel region 31 and the third pixel region 33 as a part of the curved signal connection line 24, wherein the first pixel is located in the first pixel. The first conductive line 242 in the region 31 is electrically connected to the third conductive electrode 50, and the first conductive line 242 located in the third pixel region 33 is electrically connected to the third conductive electrode located above the first conductive electrode 241. 50. Moreover, the first conductive lines 242 are interleaved with certain scan lines 40. The second patterned conductive layer 320 further includes a second source/drain pair 54 disposed in the first pixel region 31, and the second source is electrically connected to the first conductive line 242 in the other pixel region group. .
請參閱第3E圖,形成第三圖案化導電層330於第一基板之上,且位於第二圖案化導電層320上方,第三圖案化導電層330包含至少一第二導電線60,平行於掃描線40的其中一條排列;至少一第三導電線61,覆蓋各資料線20的一部份;至少一第四導電線243,設置於第一畫素區31中,且覆蓋於第二源極54的一部份,以及覆蓋於位於第一畫素區31中的第三導電電極50的一部份,其作為彎曲的訊號連接線24之一部分。Referring to FIG. 3E, a third patterned conductive layer 330 is formed on the first substrate and above the second patterned conductive layer 320. The third patterned conductive layer 330 includes at least one second conductive line 60, parallel to One of the scan lines 40 is arranged; at least one third conductive line 61 covers a portion of each data line 20; at least one fourth conductive line 243 is disposed in the first pixel area 31 and covers the second source A portion of the pole 54 and a portion of the third conductive electrode 50 that is disposed in the first pixel region 31 serves as a portion of the curved signal connection line 24.
請參閱第3F圖,形成第二導通孔62於各第一汲極52上、第二源/汲極54上、位於第二源極54之上的第四導電線243上、位於第三導電電極50的一部份之上的第四導電線243上,以及位於第一畫素區31中的第三導電電極50上。請注意第二導通孔62並非形成於第一汲極52之材質中、第二源/汲極54之材質中、第四導電線243之材質中及第三導電電極50之材質中,請查看後續之第4A圖與第4D圖,就可明白之。Referring to FIG. 3F, a second via hole 62 is formed on each of the first drain electrodes 52, on the second source/drain 54 and on the fourth conductive line 243 above the second source 54 at the third conductive line. The fourth conductive line 243 over a portion of the electrode 50 and the third conductive electrode 50 in the first pixel region 31. Please note that the second via hole 62 is not formed in the material of the first drain 52, the material of the second source/drain 54 , the material of the fourth conductive line 243 and the material of the third conductive electrode 50, please check The subsequent 4A and 4D diagrams will be understood.
請參閱第3G圖,形成畫素電極340於第一基板上,並位於第三圖案化導電層330上方,畫素電極340包含一畫素電極主要區塊(或稱為畫素電極區塊)70,設置於各次畫素區中,且經由第二導通孔62與各次畫素區中的各第一汲極52電性連接。畫素電極340還包含第四導電電極72,其係為畫素電極340之次要區塊,與畫素電極之主要區塊70電性絕緣。畫素電極340之第四導電電極72覆蓋部份第二源極54上,且經由第二導通孔62與第二源極54電性連接;再者,第四導電電極72覆蓋另一部份該第二源極上方的該第四導電線上。此外,第四導電電極72還覆蓋於第一畫素區31中的部份第三導電電極50上,且經由第二導通孔62與第三導電電極50電性連接。另外,畫素電極340還包括第五導電線74,設置於第二畫素區32中的第二導電電極46之上。必需要說明的是,第五導電線74電性連接於另一畫素區群組之第一畫素區31中的第二汲極,而於同一畫素群組時,第五導電線74並不會電性連接至第一畫素區31中第二源極/汲極。此時,第五導電線74就會與某些資料線20交錯。Referring to FIG. 3G, a pixel electrode 340 is formed on the first substrate and above the third patterned conductive layer 330. The pixel electrode 340 includes a pixel electrode main block (or a pixel electrode block). 70 is disposed in each of the pixel regions, and is electrically connected to each of the first drain electrodes 52 in each of the pixel regions via the second via holes 62. The pixel electrode 340 further includes a fourth conductive electrode 72, which is a secondary block of the pixel electrode 340, and is electrically insulated from the main block 70 of the pixel electrode. The fourth conductive electrode 72 of the pixel electrode 340 covers a portion of the second source 54 and is electrically connected to the second source 54 via the second via 62. Further, the fourth conductive electrode 72 covers the other portion. The fourth conductive line above the second source. In addition, the fourth conductive electrode 72 also covers a portion of the third conductive electrode 50 in the first pixel region 31 and is electrically connected to the third conductive electrode 50 via the second via hole 62. In addition, the pixel electrode 340 further includes a fifth conductive line 74 disposed on the second conductive electrode 46 in the second pixel region 32. It should be noted that the fifth conductive line 74 is electrically connected to the second drain in the first pixel area 31 of the other pixel group, and the fifth conductive line 74 is in the same pixel group. It is not electrically connected to the second source/drain in the first pixel region 31. At this time, the fifth conductive line 74 is interlaced with some of the data lines 20.
上述之第一導電電極241、第一導電線242、第三導電電極50、第四導電線243以及第四導電電極72構成彎曲的訊號讀出線24,並且彎曲的訊號讀出線24在同一行且相鄰的兩個畫素區中具有S形的形狀。The first conductive electrode 241, the first conductive line 242, the third conductive electrode 50, the fourth conductive line 243, and the fourth conductive electrode 72 constitute a curved signal readout line 24, and the curved signal readout lines 24 are in the same The row and adjacent two pixel regions have an S-shaped shape.
雖然第3A至3G圖中未繪出各導電層之間的介電層,然而在第一導電層310與第二導電層之間具有第一介電層43,在第二導電層320與第三導電層330之間具有第二介電層45,且在第三導電層330與畫素電極340之間具有第三介電層47。因此,上述實施例所述之導通孔就是形成或突穿於上述介電層之材質中。Although the dielectric layer between the conductive layers is not depicted in FIGS. 3A to 3G, there is a first dielectric layer 43 between the first conductive layer 310 and the second conductive layer, and a second conductive layer 320 and A third dielectric layer 45 is disposed between the three conductive layers 330, and a third dielectric layer 47 is disposed between the third conductive layer 330 and the pixel electrode 340. Therefore, the via holes described in the above embodiments are formed or protruded through the material of the dielectric layer.
請參閱第4A圖,其係顯示沿著第3G圖中剖面線A-A’之觸控面板的局部剖面示意圖,在此僅繪出第一基板上的結構。首先,在第一基板100上具有第一圖案化導電層421作為顯示薄膜電晶體22之閘極,接著在第一圖案化導電層421上覆蓋第一介電層(或稱為閘極絕緣層)43,然後在第一介電層43上形成半導體層48,半導體層48可包含未摻雜的半導體層482及摻雜的半導體層482。接著,形成第二圖案化導電層52於半導體層48上,作為顯示薄膜電晶體22之第一源/汲極對。接著,在第一源/汲極對52上覆蓋第二介電層45(或稱為保護層),並形成第三介電層47於第二介電層45上,在第二介電層45及第三介電層47中形成第二導通孔62,並形成畫素電極70覆蓋於第三介電層47上及第二導通孔62內,使得第一汲極52與畫素電極70之主要區塊電性連接。再者,本發明以底閘型電晶體為實施方式,但不限於此。於其它實施例中,頂閘型電晶體亦可使用,二者差別於半導體層48形成於第一基板100之順序、閘極形成的順序及介電層之數目。舉例而言,底閘型電晶體先形成第一圖案化導電層421之閘極後,再覆蓋介電層43於第一圖案化導電層421及第一基板100上。然後,再形成半導體層48於閘極上方的介電層43上。頂閘型電晶體先形成半導體層48於第一基板100上,再覆蓋介電層43於半導體層48及第一基板100上。然後,再形成第一圖案化導電層421之閘極於半導體層48上方的介電層43上。於頂閘型電晶體時,為了能夠讓第一圖案化導電層421與第一圖案化導電層421上的第二圖案化導電層不會發生短路,除了第二介電層45與第三介電層47之外,會再覆蓋一額外介電層(或稱為內層介電層,未繪示)於第一圖案化導電層421及基板100上,此時,第一圖案化導電層421上的第二圖案化導電層位於不同水平平面上;或者是,不覆蓋額外介電層,則第一圖案化導電層421之閘極與第二圖案化導電層位於同一水平平面上,但二者相互隔開且絕緣。再依續堆疊所需要的膜層,如:第二圖案化導電層52、第二介電層45、第三圖案化導電層(未繪示於此A’-A剖面圖)、第三介電層47以及畫素電極70。Referring to Fig. 4A, which is a partial cross-sectional view showing the touch panel along section line A-A' in Fig. 3G, only the structure on the first substrate is depicted. First, a first patterned conductive layer 421 is formed on the first substrate 100 as a gate of the display thin film transistor 22, and then a first dielectric layer (or a gate insulating layer) is overlaid on the first patterned conductive layer 421. 43, then a semiconductor layer 48 is formed on the first dielectric layer 43, and the semiconductor layer 48 may include an undoped semiconductor layer 482 and a doped semiconductor layer 482. Next, a second patterned conductive layer 52 is formed on the semiconductor layer 48 as a first source/drain pair of the thin film transistor 22. Next, a second dielectric layer 45 (or a protective layer) is overlaid on the first source/drain pair 52, and a third dielectric layer 47 is formed on the second dielectric layer 45 in the second dielectric layer. The second via hole 62 is formed in the 45 and the third dielectric layer 47, and the pixel electrode 70 is formed on the third dielectric layer 47 and the second via hole 62, so that the first drain 52 and the pixel electrode 70 are formed. The main block is electrically connected. Furthermore, the present invention has a bottom gate type transistor as an embodiment, but is not limited thereto. In other embodiments, a top gate type transistor may also be used, which differs from the order in which the semiconductor layer 48 is formed on the first substrate 100, the order in which the gates are formed, and the number of dielectric layers. For example, after the bottom gate type transistor first forms the gate of the first patterned conductive layer 421, the dielectric layer 43 is overlaid on the first patterned conductive layer 421 and the first substrate 100. Then, a semiconductor layer 48 is formed over the dielectric layer 43 above the gate. The top gate type transistor first forms a semiconductor layer 48 on the first substrate 100, and then covers the dielectric layer 43 on the semiconductor layer 48 and the first substrate 100. Then, the gate of the first patterned conductive layer 421 is further formed on the dielectric layer 43 above the semiconductor layer 48. In the case of the top gate type transistor, in order to prevent the second patterned conductive layer on the first patterned conductive layer 421 and the first patterned conductive layer 421 from being short-circuited, except for the second dielectric layer 45 and the third dielectric layer In addition to the electrical layer 47, an additional dielectric layer (also referred to as an inner dielectric layer, not shown) is overlying the first patterned conductive layer 421 and the substrate 100. At this time, the first patterned conductive layer The second patterned conductive layer on 421 is located on different horizontal planes; or, without covering the additional dielectric layer, the gate of the first patterned conductive layer 421 is on the same horizontal plane as the second patterned conductive layer, but The two are separated and insulated from each other. Further, the required film layers are stacked, such as a second patterned conductive layer 52, a second dielectric layer 45, and a third patterned conductive layer (not shown in this A'-A cross-sectional view), and the third The electric layer 47 and the pixel electrode 70.
請參閱第4B圖,其係顯示沿著第3G圖中剖面線B-B’之觸控面板的局部剖面示意圖。在第一基板100上具有第一介電層(或稱為閘極絕緣層)43,在第一介電層43上具有第二圖案化導電層20作為資料線,並且在第二圖案化導電層20上覆蓋第二介電層(或稱為保護層)45。在第二介電層45上形成第三圖案化導電層之第三導電線61,然後在第三導電線61上覆蓋第三介電層47,並形成畫素電極70之主要區塊於第三介電層47上。Please refer to FIG. 4B, which is a partial cross-sectional view showing the touch panel along section line B-B' in FIG. 3G. Having a first dielectric layer (or referred to as a gate insulating layer) 43 on the first substrate 100, a second patterned conductive layer 20 as a data line on the first dielectric layer 43, and a second patterned conductive The layer 20 is covered with a second dielectric layer (or referred to as a protective layer) 45. Forming a third conductive line 61 of the third patterned conductive layer on the second dielectric layer 45, then covering the third conductive layer 47 on the third conductive line 61, and forming a main block of the pixel electrode 70. On the three dielectric layers 47.
請參閱第4C圖,其係顯示沿著第3G圖中剖面線C-C’之觸控面板的局部剖面示意圖。在第一基板100上具有第一圖案化導電層之第一導電電極241,在第一導電電極241上覆蓋第一介電層(或稱為閘極絕緣層)43,並在第一介電層43中形成第一導通孔49,然後形成第二圖案化導電層之第三導電電極50覆蓋於第一介電層43上及第一導通孔49內,並形成第二介電層(或稱為保護層)45覆蓋第三導電電極50,其中第一圖案化導電層之第一導電電極241經由第一導通孔49與第二圖案化導電層之第三導電電極50電性連接。Referring to Fig. 4C, a partial cross-sectional view of the touch panel along section line C-C' in Fig. 3G is shown. a first conductive electrode 241 having a first patterned conductive layer on the first substrate 100, a first dielectric layer (or referred to as a gate insulating layer) 43 over the first conductive electrode 241, and a first dielectric a first via hole 49 is formed in the layer 43 , and then a third conductive electrode 50 forming a second patterned conductive layer covers the first dielectric layer 43 and the first via hole 49 and forms a second dielectric layer (or The first conductive electrode 241 of the first patterned conductive layer is electrically connected to the third conductive electrode 50 of the second patterned conductive layer via the first via hole 49.
請參閱第4D圖,其係顯示沿著第3G圖中剖面線D-D’之觸控面板的局部剖面示意圖。在第一基板100上具有第一圖案化導電層422,作為感測薄膜電晶體26之閘極,在第一圖案化導電層422上覆蓋第一介電層(或稱為閘極絕緣層)43,然後形成第二圖案化導電層54於第一介電層43上,作為感測薄膜電晶體26之第二源/汲極對,並形成第二介電層(或稱為保護層)45覆蓋第二源/汲極對54。接著,形成第三圖案化導電層之第四導電線243於部分的第二介電層45上,並分別於第二介電層45及第四導電線243中形成第二導通孔62,然後形成畫素電極之第五導電線74覆蓋於第二介電層45和第四導電線243上,以及第二導通孔62內,其中畫素電極之第五導電線74經由第二導通孔62分別與第二圖案化導電層之第二源/汲極對54及第三圖案化導電層之第四導電線243電性連接。Please refer to FIG. 4D, which is a partial cross-sectional view showing the touch panel along the section line D-D' in FIG. 3G. A first patterned conductive layer 422 is disposed on the first substrate 100 as a gate of the sensing thin film transistor 26, and a first dielectric layer (or a gate insulating layer) is covered on the first patterned conductive layer 422. 43, then forming a second patterned conductive layer 54 on the first dielectric layer 43 as a second source/drain pair of the sensing thin film transistor 26 and forming a second dielectric layer (or referred to as a protective layer) 45 covers the second source/drain pair 54. Then, a fourth conductive line 243 of the third patterned conductive layer is formed on a portion of the second dielectric layer 45, and a second via hole 62 is formed in the second dielectric layer 45 and the fourth conductive line 243, respectively. The fifth conductive line 74 forming the pixel electrode covers the second dielectric layer 45 and the fourth conductive line 243, and the second conductive via 62, wherein the fifth conductive line 74 of the pixel electrode passes through the second conductive via 62. The second source/drain pair 54 and the fourth conductive line 243 of the third patterned conductive layer are electrically connected to the second patterned conductive layer.
請參閱第4E圖,其係顯示沿著第3G圖中剖面線E-E’之觸控面板的按壓感測結構25剖面示意圖。在第一基板100上具有第一圖案化導電層之第二導電電極46,在第二導電電極46上覆蓋第一介電層(或稱為閘極絕緣層)43,然後形成第二圖案化導電層之第三導電電極50於第一介電層43上,並在第三導電電極50上覆蓋第二介電層(或稱為保護層)45。上述第一、第二圖案化導電層46和50以及第一、第二介電層43和45構成按壓感測結構25之感測平台101。Please refer to FIG. 4E, which is a cross-sectional view showing the touch sensing structure 25 of the touch panel along the section line E-E' in FIG. 3G. a second conductive electrode 46 having a first patterned conductive layer on the first substrate 100, a first dielectric layer (or referred to as a gate insulating layer) 43 on the second conductive electrode 46, and then forming a second patterning The third conductive electrode 50 of the conductive layer is on the first dielectric layer 43 and covers the second dielectric layer (or referred to as a protective layer) 45 on the third conductive electrode 50. The first and second patterned conductive layers 46 and 50 and the first and second dielectric layers 43 and 45 constitute the sensing platform 101 of the pressing sensing structure 25.
此外,觸控面板還包括第二基板200與第一基板100對向設置,第二基板200例如為玻璃基板,感測間隔物201設置於第二基板200上,其例如為感光性間隔物(photo spacer)。在感測間隔物201上覆蓋有第一透明導電層203,並且在感測平台101上覆蓋有第二透明導電層74,其係為畫素電極之第五導電線,第一及第二透明導電層可為單層或多層結構,其材質包含:銦錫氧化物(ITO)、銦鋅氧化物(IZO)、鋁鋅氧化物(AZO)、鋁錫氧化物(ATO)、銦鍺鋅氧化物(IGZO)、其它合適的材質、或上述之組合,兩者於觸控面板未受到按壓時具有一間距P,並且於觸控面板受到按壓時互相接觸而形成電通路(或稱短路)。此時,觸控面板就已完成,其中,二基板內沒有其它物質。再者,若要形成觸控顯示面板,可將上述之觸控面板外貼於顯示面板之外,其中,顯示面板結構為第一基板具有主動元件矩陣層,包含複數個電晶體,第二基板相對應於第一基板,且上述二基板間具有一間隔以及顯示介質層設置該間隔中。若,將觸控面板搭配顯示面板之製造過程,而形成內整合式觸控顯示面板,則在第一基板100與第二基板200之間還包含一顯示介質層300,可使觸控面板顯示影像。其中,上述顯示介質層之材料,包含非自發光材料(例如:液晶材料、電泳材料、其它合適的材料或上述之組合)、自發光材料(例如:有機發光材料、無機發光材料、其它合適的材料或上述之組合)、其它合適的材料或上述之組合。顯示面板可依顯示介質層之材料包含非自發光面板(例如:液晶顯示面板、三維顯示面板、電泳顯示面板、藍相顯示面板、水平切換顯示面板、垂直配向顯示面板、雙面顯示面板、其它合適的面板或上述之組合)、自發光面板、其它合適的面板或上述之組合。In addition, the touch panel further includes a second substrate 200 disposed opposite to the first substrate 100, the second substrate 200 is, for example, a glass substrate, and the sensing spacer 201 is disposed on the second substrate 200, for example, a photosensitive spacer ( Photo spacer). The sensing spacer 201 is covered with a first transparent conductive layer 203, and the sensing platform 101 is covered with a second transparent conductive layer 74, which is a fifth conductive line of the pixel electrode, the first and second transparent The conductive layer may be a single layer or a multilayer structure, and the material thereof comprises: indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum tin oxide (ATO), indium antimony zinc oxide. The IGZO, other suitable materials, or a combination thereof, has a pitch P when the touch panel is not pressed, and contacts each other to form an electrical path (or short circuit) when the touch panel is pressed. At this point, the touch panel is completed, in which there is no other substance in the two substrates. In addition, if the touch display panel is to be formed, the touch panel may be externally attached to the display panel, wherein the display panel has a first substrate having an active component matrix layer, and includes a plurality of transistors, and the second substrate Corresponding to the first substrate, and a spacing between the two substrates and a display medium layer are disposed in the interval. If the touch panel is combined with the manufacturing process of the display panel to form an integrated touch display panel, a display medium layer 300 is further included between the first substrate 100 and the second substrate 200, so that the touch panel can be displayed. image. The material of the display medium layer comprises a non-self-luminous material (for example, a liquid crystal material, an electrophoretic material, other suitable materials or a combination thereof), a self-luminous material (for example, an organic luminescent material, an inorganic luminescent material, other suitable materials). Materials or combinations thereof, other suitable materials or combinations thereof. The display panel may include non-self-illuminating panels according to the material of the display medium layer (for example: liquid crystal display panel, three-dimensional display panel, electrophoretic display panel, blue phase display panel, horizontal switching display panel, vertical alignment display panel, double-sided display panel, other Suitable panels or combinations thereof, self-illuminating panels, other suitable panels, or combinations thereof.
雖然本發明已揭露較佳實施例如上,然其並非用以限定本發明,任何熟悉此項技藝者,在不脫離本發明之精神和範圍內,當可做些許更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定為準。Although the present invention has been disclosed in its preferred embodiments, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application attached.
10、20...資料線10, 20. . . Data line
11、40...掃描線11, 40. . . Scanning line
12、22...顯示薄膜電晶體12, 22. . . Display thin film transistor
14...訊號讀出線14. . . Signal readout line
15、25...按壓感測結構15,25. . . Press sensing structure
16、26...感測薄膜電晶體16, 26. . . Sense thin film transistor
18、28...次畫素區18, 28. . . Sub-pixel area
24...彎曲的訊號讀出線twenty four. . . Curved signal readout line
30...畫素區群組30. . . Pixel group
31...第一畫素區31. . . First pixel area
32...第二畫素區32. . . Second pixel area
33...第三畫素區33. . . Third pixel area
34...第四畫素區34. . . Fourth pixel area
310...第一圖案化導電層310. . . First patterned conductive layer
241...第一導電電極(第一圖案化導電層)241. . . First conductive electrode (first patterned conductive layer)
46...第二導電電極(第一圖案化導電層)46. . . Second conductive electrode (first patterned conductive layer)
421...顯示薄膜電晶體之閘極(第一圖案化導電層)421. . . Display the gate of the thin film transistor (first patterned conductive layer)
422...感測薄膜電晶體之閘極(第一圖案化導電層)422. . . Sensing the gate of the thin film transistor (first patterned conductive layer)
48...半導體層48. . . Semiconductor layer
49...第一導通孔49. . . First via
320...第二圖案化導電層320. . . Second patterned conductive layer
242...第一導電線(第二圖案化導電層)242. . . First conductive line (second patterned conductive layer)
50...第三導電電極(第二圖案化導電層)50. . . Third conductive electrode (second patterned conductive layer)
52...第一源/汲極對(第二圖案化導電層)52. . . First source/drain pair (second patterned conductive layer)
54...第二源/汲極對(第二圖案化導電層)54. . . Second source/drain pair (second patterned conductive layer)
330...第三圖案化導電層330. . . Third patterned conductive layer
60...第二導電線(第三圖案化導電層)60. . . Second conductive line (third patterned conductive layer)
61...第三導電線(第三圖案化導電層)61. . . Third conductive line (third patterned conductive layer)
243...第四導電線(第三圖案化導電層)243. . . Fourth conductive line (third patterned conductive layer)
62...第二導通孔62. . . Second via
340...畫素電極340. . . Pixel electrode
70...畫素電極之主要區塊70. . . Main block of pixel electrode
72...畫素電極之第四導電電極72. . . Fourth conductive electrode of the pixel electrode
74...畫素電極之第五導電線(第二透明電極層)74. . . Fifth conductive line of the pixel electrode (second transparent electrode layer)
100...第一基板100. . . First substrate
481...未摻雜之半導體層481. . . Undoped semiconductor layer
482...摻雜之半導體層482. . . Doped semiconductor layer
43...第一介電層43. . . First dielectric layer
45...第二介電層45. . . Second dielectric layer
47...第三介電層47. . . Third dielectric layer
200...第二基板200. . . Second substrate
201...感測間隔物201. . . Sense spacer
203...第一透明導電層203. . . First transparent conductive layer
101...感測平台101. . . Sensing platform
300...顯示介直層300. . . Display straight layer
P...間距P. . . spacing
X...第一方向X. . . First direction
Y...第二方向Y. . . Second direction
第1圖係顯示傳統的電阻式觸控面板之平面示意圖。Figure 1 is a schematic plan view showing a conventional resistive touch panel.
第2圖係顯示係顯示依據本發明一實施例之觸控面板的平面示意圖。2 is a plan view showing a touch panel according to an embodiment of the present invention.
第3A至3G圖係顯示依據本發明之一實施例,形成觸控面板之畫素區群組的各製程平面示意圖。3A to 3G are schematic diagrams showing respective process planes for forming a pixel group of a touch panel according to an embodiment of the present invention.
第4A至4E圖係分別顯示沿著第3G圖中剖面線A-A’、B-B’、C-C’、D-D’及E-E’之觸控面板的剖面示意圖。4A to 4E are schematic cross-sectional views showing the touch panels along the hatching lines A-A', B-B', C-C', D-D', and E-E' in the 3G drawing, respectively.
20...資料線20. . . Data line
40...掃描線40. . . Scanning line
22...顯示薄膜電晶體twenty two. . . Display thin film transistor
25...按壓感測結構25. . . Press sensing structure
26...感測薄膜電晶體26. . . Sense thin film transistor
28...次畫素區28. . . Sub-pixel area
24...彎曲的訊號讀出線twenty four. . . Curved signal readout line
30...畫素區群組30. . . Pixel group
31...第一畫素區31. . . First pixel area
32...第二畫素區32. . . Second pixel area
33...第三畫素區33. . . Third pixel area
34...第四畫素區34. . . Fourth pixel area
241...第一導電電極(第一圖案化導電層)241. . . First conductive electrode (first patterned conductive layer)
49...第一導通孔49. . . First via
242...第一導電線(第二圖案化導電層)242. . . First conductive line (second patterned conductive layer)
243...第四導電線(第三圖案化導電層)243. . . Fourth conductive line (third patterned conductive layer)
62...第二導通孔62. . . Second via
72...畫素電極之第四導電電極(次要區塊)72. . . Fourth conductive electrode of the pixel electrode (secondary block)
Claims (14)
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US20070046652A1 (en) * | 2005-08-31 | 2007-03-01 | Shoji Fujii | Touch panel |
CN100389444C (en) * | 2006-04-24 | 2008-05-21 | 友达光电股份有限公司 | Display panel module |
CN101241255A (en) * | 2008-03-18 | 2008-08-13 | 友达光电股份有限公司 | Touch control type panel and touch control type device |
TW200900790A (en) * | 2007-02-28 | 2009-01-01 | Seiko Epson Corp | Liquid crystal device and electronic apparatus |
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US20070046652A1 (en) * | 2005-08-31 | 2007-03-01 | Shoji Fujii | Touch panel |
CN100389444C (en) * | 2006-04-24 | 2008-05-21 | 友达光电股份有限公司 | Display panel module |
TW200900790A (en) * | 2007-02-28 | 2009-01-01 | Seiko Epson Corp | Liquid crystal device and electronic apparatus |
CN101241255A (en) * | 2008-03-18 | 2008-08-13 | 友达光电股份有限公司 | Touch control type panel and touch control type device |
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