TWI378117B - Composite abrasive/polishing pad and method for manufacturing the same - Google Patents

Composite abrasive/polishing pad and method for manufacturing the same Download PDF

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TWI378117B
TWI378117B TW97119890A TW97119890A TWI378117B TW I378117 B TWI378117 B TW I378117B TW 97119890 A TW97119890 A TW 97119890A TW 97119890 A TW97119890 A TW 97119890A TW I378117 B TWI378117 B TW I378117B
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polishing
layer
composite
thermoplastic polymer
elastic buffer
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TW97119890A
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TW200948867A (en
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Hengyi Chen
Jianmin Lin
Chinghui Tseng
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Taiwan Textile Res Inst
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1378117 九、發明說明: 【發明所屬之技術領域】 本發明是有關於-種拋光研磨塾,且特別是有關於 種複合拋光研磨不織布。 【先前技術】1378117 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to a polishing abrasive crucible, and more particularly to a composite polishing abrasive nonwoven fabric. [Prior Art]

加工處理各種工藝品以及高科技產品時,經常會運用 到拋光研磨技術,以產生平滑的表面。上述工藝品例如金 屬、玻璃、寶石、石材、木料或手工藝品;上述高科技產 品例如硬碟、晶圓或玻璃面板。特別是,高科技產品對於 拋光研磨之精細度、穩定度的要求非常高。 進行拋光研磨和/或鏡面處理的方式主要有兩種,第一 種是利用帶有研磨粒子的t體(slurry)搭配研磨基布 (ground fiber)來進行研磨;第二種是利用帶有研磨粒子When processing various crafts and high-tech products, polishing and grinding techniques are often used to produce a smooth surface. The above-mentioned handicrafts such as metal, glass, gemstone, stone, wood or handicraft; the above-mentioned high-tech products such as hard disks, wafers or glass panels. In particular, high-tech products have very high requirements for the fineness and stability of polishing. There are two main ways to perform polishing and/or mirror processing. The first one is to use a slurry with abrasive particles to grind with a ground fiber; the second is to use grinding with a ground. particle

的研磨墊來進行研磨’其中係利用含浸的方式,使得研磨 墊可攜帶研磨粒子。先前技術之研磨基布和/或研磨塾通常 需經過表面切割加工’以便形成溝槽(trench )以容納拋光 研磨過程中產生之碎屑。不論是利用何種方式進行研磨, 研磨基布和/或研磨墊的吸水性、緩衝彈性、壓縮性、财磨 耗性都非常重要,此外研磨的表面精度對於產品的品質更 是關鍵。 【發明内容】 因此’本發明之一方面就是在提供一種複合拋光研磨 不織布之製造方法,用以提供優良的拋光研磨品質。上述 1378117 方法包含形成一耐磨性複合母粒,該耐磨性複合母粒包含 複數個耐磨性粒子以及第一熱塑性高分子;將耐磨性複合 母粒製成拋光研磨層;形成彈性緩衝層,其包含第二熱塑 性高分子;以及接合拋光研磨層與彈性緩衝層。 本發明之另一方面是提供一種複合拋光研磨不織布, 其包含拋光研磨層以及彈性緩衝層。上述拋光研磨層包含 第一熱塑性高分子以及複數個研磨粒子;上述彈性緩衝層 包含第二熱塑性南分子’且位於該拖光研磨層下方。 【實施方式】 實施方式闡明了根據本發明具體實施例之複合拋光研 磨墊及其製造方法。此外,更以多種實驗例來闡明上述複 合拋光研磨墊之各種性質,包括其耐磨耗性、壓縮性、以 及抛光研磨品質。 本發明之一態樣提供了一種複合拋光研磨不織布之製 造方法。上述包含形成一耐磨性複合母粒,該耐磨性複合 母粒包含複數個耐磨性粒子以及第一熱塑性高分子;將耐 磨性複合母粒製成拋光研磨層;形成彈性緩衝層,其包含 第一熱塑性面分子;以及接合拋光研磨層與彈性緩衝層。 上述耐磨性粒子之粒徑大小為約2〇 ηηι至約1 〇〇〇 nm ’在較佳實施例中為約1〇〇 nm至約300 nm。上述耐磨 性粒子可以是α型氧化鋁(α_Α12〇3)、γ型氧化鋁(γ_Αΐ2〇3)、 氧化梦(Si〇2)、氧化鈽(Ce〇2)、碳化矽(SiC)、氧化鍅(Zr〇2)、 單曰a鑽石或多晶鑽石。上述耐磨性粒子佔上述耐磨性複合 母粒之重量百分比為約0 5%至約7%。 ¢: S > 7 1378117 上述第一熱塑性高分子可以是聚酿胺(polyamide )如 耐隆(nylon, PA6);或聚酷(polyester)如聚對苯二甲酸 乙二醋(polyethylene terephthalate,PET )。上述第二熱塑性 咼分子可以是熱塑性聚氨酯(thermoplastic polyurethane, TPU)。 上述抛光研磨層之厚度為約0.1 mm至約2.0 mm,且 上述彈性緩衝層之厚度為約1.〇 mm至約5.0 mm。可利用 點狀或面狀貼合或溶合法,以接合拋光研磨層與彈性緩衝 層。以炫合法進行接合時,適當的壓力為約0.5〜5 kg/cm2, 適舊的溫度為約1 00〜16〇。(0。以貼合法進行接合時,可利用 各種適當的黏著劑或黏著方式,例如雙面膠帶(如,3M公 司生產之3M-467或3M-442 )。 第1圖闡明根據本發明一具體實施例的複合拋光研磨 不織布100的剖面示意圖。複合拋光研磨不織布丨〇〇具有 抛光研磨層104以及彈性緩衝層1〇6。上述拋光研磨層ι〇4 包3第一熱塑性高分子(圖中未繪示)以及複數個研磨粒 子102«上述彈性緩衝層1〇6包含第二熱塑性高分子(圖中 未繪示)’且其位於該拋光研磨層下方。 根據本發明一具體實施例,複合拋光研磨不織布1〇〇 之製造方法如下。將α型氧化鋁粒子1〇2和耐隆粉體進行 混合,以得到混合粉體。其後將上述混合粉體進行混練, 以得到耐磨性複合母粒。接著’利用熔喷法(melt blown) 將上述耐磨性複合母粒製成拋光研磨層104,其厚度為約 〇.5nm至約其中該α型氧化鋁粒子1〇2之粒徑大 小為約100 nm至約300 nm ,且該α型氧化鋁粒子1〇2佔 8 1378117 耐磨性複合母粒的重量百分比如下表丨所示 表1The polishing pad is used for grinding', wherein the impregnation is used so that the polishing pad can carry the abrasive particles. Prior art abrasive base fabrics and/or abrasive rafts typically undergo a surface cut process to form a trench to accommodate debris generated during the polishing process. Regardless of the method used for the grinding, the water absorption, cushioning elasticity, compressibility, and wear resistance of the polishing base fabric and/or the polishing pad are very important, and the surface precision of the grinding is more critical to the quality of the product. SUMMARY OF THE INVENTION Accordingly, one aspect of the present invention is to provide a method of manufacturing a composite polishing non-woven fabric for providing excellent polishing quality. The above method 1378117 comprises forming an abrasion resistant composite masterbatch comprising a plurality of abrasion resistant particles and a first thermoplastic polymer; forming the abrasion resistant composite masterbatch into a polishing layer; forming an elastic buffer a layer comprising a second thermoplastic polymer; and a bonding polishing layer and an elastic buffer layer. Another aspect of the present invention is to provide a composite polishing abrasive nonwoven fabric comprising a polishing abrasive layer and an elastic buffer layer. The polishing layer comprises a first thermoplastic polymer and a plurality of abrasive particles; the elastic buffer layer comprises a second thermoplastic south molecule & is located below the drag polishing layer. [Embodiment] The embodiment clarifies a composite polishing polishing pad and a method of manufacturing the same according to an embodiment of the present invention. In addition, various properties of the above composite polishing pad, including its abrasion resistance, compressibility, and polishing quality, are clarified in various experimental examples. One aspect of the present invention provides a method of making a composite polishing non-woven fabric. The above comprises forming a wear-resistant composite masterbatch comprising a plurality of wear-resistant particles and a first thermoplastic polymer; forming the wear-resistant composite masterbatch into a polishing layer; forming an elastic buffer layer, It comprises a first thermoplastic face molecule; and a bonded polishing layer and an elastic buffer layer. The above-mentioned abrasion resistant particles have a particle size of from about 2 〇 ηηι to about 1 〇〇〇 nm ′ in the preferred embodiment from about 1 〇〇 nm to about 300 nm. The above abrasion resistant particles may be α-type alumina (α_Α12〇3), γ-type alumina (γ_Αΐ2〇3), Oxidation Dream (Si〇2), Cerium oxide (Ce〇2), Tantalum carbide (SiC), oxidation.鍅 (Zr〇2), single 曰a diamond or polycrystalline diamond. The above abrasion resistant particles account for from about 0% by weight to about 7% by weight of the above abrasion resistant composite masterbatch. ¢: S > 7 1378117 The first thermoplastic polymer may be a polyamide such as nylon (PA6); or a polyester such as polyethylene terephthalate (PET). ). The second thermoplastic ruthenium molecule may be a thermoplastic polyurethane (TPU). The polishing abrasive layer has a thickness of from about 0.1 mm to about 2.0 mm, and the elastic buffer layer has a thickness of from about 1. mm to about 5.0 mm. Point or face bonding or dissolution can be utilized to bond the polishing layer to the elastic buffer layer. When bonding in a dazzling manner, a suitable pressure is about 0.5 to 5 kg/cm2, and an appropriate temperature is about 100 to 16 inches. (0. When bonding by bonding method, various appropriate adhesives or adhesive means, such as double-sided tape (for example, 3M-467 or 3M-442 manufactured by 3M Company) can be utilized. Fig. 1 illustrates a specific embodiment according to the present invention. A cross-sectional view of the composite buffing non-woven fabric 100 of the embodiment. The composite buffing non-woven fabric has a polishing abrasive layer 104 and an elastic buffer layer 1〇6. The above-mentioned buffing layer ι4 includes 3 first thermoplastic polymer (not shown) And the plurality of abrasive particles 102 « the elastic buffer layer 1 〇 6 includes a second thermoplastic polymer (not shown) and is located below the polishing layer. According to an embodiment of the invention, the composite polishing The manufacturing method of the non-woven fabric 1 is as follows. The α-type alumina particles 1〇2 and the Nylon powder are mixed to obtain a mixed powder. Thereafter, the mixed powder is kneaded to obtain an abrasion-resistant composite mother. Then, the above abrasion-resistant composite master batch is formed into a polishing layer 104 by a melt blown, and has a thickness of about 〇5 nm to about a large particle diameter of the α-type alumina particle 1〇2.From about 100 nm to about 300 nm, and the α-type aluminum oxide particles by weight 81378117 1〇2 accounting wear composite masterbatch percentages shown in Table 1 below Table Shu

另一方面,利用炫喷法將TPU母粒製成彈性緩衝層 106,其厚度為約lmm至約5mmmM雙面勝帶進行 面狀貼合,以接合拋光研磨層104與彈性緩衝層1〇6,而形 成複合拋光研磨不織布100〇此外,可對拋光研磨層1〇4 進行壓光處理’其係利用滾輪加熱拋光研磨層1〇4,以提升 其表面平整性。 在本發明另一具體實施例中,可在同一生產線中分別 形成拋光研磨層104以及彈性緩衝層1〇6,並將接合上述二 層’而形成複合拋光研磨不織布100。 下文以多種實驗例闡明複合拋光研磨墊100之耐磨耗 性、壓縮性、以及拋光研磨品質。On the other hand, the TPU master batch is made into an elastic buffer layer 106 by a dazzling method, and the thickness thereof is from about 1 mm to about 5 mm mM, and the surface is bonded to the surface of the polishing layer 104 and the elastic buffer layer 1〇6. Further, a composite polishing non-woven fabric 100 is formed. Further, the polishing abrasive layer 1〇4 can be calendered. The polishing layer 1→4 is heated by a roller to improve the surface flatness. In another embodiment of the present invention, the polishing abrasive layer 104 and the elastic buffer layer 1〇6 may be separately formed in the same production line, and the above two layers ' may be joined to form the composite polished abrasive nonwoven fabric 100. The abrasion resistance, compressibility, and polishing quality of the composite polishing pad 100 are exemplified below by various experimental examples.

實驗例I 實驗例I中,測試了上述本發明實施例所製造之複合 抛光研磨不織布100的耐磨耗性。本實驗例中,利用精密 1378117 研磨儀(英國Logitech公司生產之pM5鳩㈣Μ_η6, 型號簡)’在下列參數條件下,進行樣品A、樣品B、樣 品C以及樣品D之耐磨耗測試:ASTMD4〇6〇;砂輪hi8; 重複進行次)。表2列出了各組樣品磨耗前以及磨耗後 之平均重量與平均&失重量,其中每組樣品的樣本數為3。 表2 磨耗前重量 磨耗後重量 損失重量 (g) (g) (me ) 樣品A 31.2842 31.2454 38 8 樣品B 35.6877 35.6597 28 0 樣品C 36.5654 36.5334 31 〇 樣品D 35.3095 35.2450 64.5 、樣uD B為例,可以得知當α型氧化鋁粒子^ 佔耐 • 帛性複合母粒的重量百分比為約3%時,樣品b磨耗前的 平均重量為約35.6877 g,磨耗後的平均重量為約35.6597 §因而可得知樣品8磨耗後的損失重量為約28.0 mg。 再者’由表2可知,上述樣品A_D皆具有良好的耐磨 因而能夠在商業上運用於精密的表面拋光研磨製程 實驗例Π 本實驗例進一步閣明上述本發明實施例所製造之複合 1378117 拋光研磨不織_ UK)的壓縮性。—般而言,壓縮性較佳的 研磨基布和/或研磨墊,可使得拋光後之產品具有較佳表面 之平整度,因此壓縮性的優劣與複合拋光研磨不織布ι〇〇 的品質息息相關。 本實驗例中,利用FlexiForce量測系統(日本nitta a ’出產’型號A201 )’在不同壓縮量(asTM D395 )下, 進行壓縮性測試,並以各樣品所承受之負載相對於其 壓縮量(μιη)作圖。第2A闡明複合拋光研磨不織布ι〇〇 樣品B之壓縮性測試結果;第2B圖闡明本發明實施例之拋 光研磨層104之壓縮性測試結果,其中„型氧化鋁粒子佔 耐磨性複合母粒的重量百分比為約3%。 比較第2A圖以及第2B圖可以發現,當負載同樣為1〇〇 N時,複合拋光研磨不織布1〇〇樣品B之壓縮量為約21〇 μηι,而拋光研磨層1〇4之壓縮量為約35 μηι。也就是說,Experimental Example I In Experimental Example 1, the abrasion resistance of the composite polishing-nonwoven fabric 100 produced in the above-described embodiment of the present invention was tested. In this experimental example, the wear resistance test of sample A, sample B, sample C and sample D was carried out under the following parameters using a precision 1378117 grinder (pM5(R) (4) Μ_η6, manufactured by Logitech, UK): ASTM D4〇 6〇; grinding wheel hi8; repeated times). Table 2 lists the average weight and average & weight loss of each set of samples before and after abrasion, wherein the number of samples per set of samples is 3. Table 2 Weight loss before abrasion weight loss Weight (g) (g) (me) Sample A 31.2842 31.2454 38 8 Sample B 35.6877 35.6597 28 0 Sample C 36.5654 36.5334 31 〇 Sample D 35.3095 35.2450 64.5, sample uD B as an example, It is found that when the weight percentage of the α-type alumina particles is about 3%, the average weight before the abrasion of the sample b is about 35.6877 g, and the average weight after the abrasion is about 35.6597. The loss weight after the sample 8 was found to be abrasion was about 28.0 mg. Furthermore, as can be seen from Table 2, the above samples A_D have good wear resistance and can be used commercially for precision surface polishing processes. This experimental example further clarifies the composite 1378117 polishing manufactured by the above embodiments of the present invention. The non-woven _ UK) is compressed. In general, a highly sturdy base fabric and/or a polishing pad can provide a smooth surface of the polished product, so that the compressibility is closely related to the quality of the composite polishing non-woven fabric. In this experimental example, the FlexiForce measurement system (Japan nitta a 'produced 'Model A201') was tested for compressibility under different compression amounts (asTM D395), and the load on each sample was relative to the amount of compression ( Μιη) Mapping. 2A illustrates the results of the compressibility test of the composite buffed nonwoven ι 〇〇 sample B; and FIG. 2B clarifies the results of the compressibility test of the buffed abrasive layer 104 of the embodiment of the present invention, wherein the „type alumina particles account for the wear resistant composite masterbatch The weight percentage is about 3%. Comparing Fig. 2A and Fig. 2B, it can be found that when the load is also 1 〇〇N, the composite polishing non-woven fabric 1 〇〇 sample B has a compression amount of about 21 〇 μηι, while polishing The compression of layer 1〇4 is about 35 μηι. That is,

二者相較之下,複合拋光研磨不織布1〇〇樣品Β具有較佳 之壓縮性。 實驗例III 本實驗例利用德國HOMMEL TESTER表面粗糙度量測 儀(型號· T4000 ) ’來測試以複合拋光研磨不織布1 〇〇研 磨拋光金屬片之後,金屬片之的表面粗糙度(r〇ughness), 其中量測長度為1 。 表面粗糙度可用以量化物體表面的平滑程度,在本實 驗例中係以中心線平均粗糙度(arithmetic average roughness,Ra)來表示表面粗糙度。Ra係以單位長度内加 1378117 工面之表面起伏的申心線為基準,以測量起伏表面相對於 該中心線之起伏深度,並求取其平均值。 本實驗例中所測試的組別有複合拋光研磨不織布1〇〇 樣品A、樣品B、樣品C以及商用絨毛拋光墊(Logitech Ltd. 生產之 Chemcloths-Polishing Cloths,型號 OCON-352,直 徑12"/300mm) ’其中每一組的樣本數為3。表3闡明上述 各組之測試結果。In contrast, the composite polished non-woven fabric sample has better compressibility. Experimental Example III This experimental example uses the German HOMMEL TESTER surface roughness measuring instrument (model T4000) to test the surface roughness (r〇ughness) of the metal sheet after the composite polishing and polishing non-woven fabric 1 〇〇 grinding and polishing the metal sheet. , where the measurement length is 1. The surface roughness can be used to quantify the smoothness of the surface of the object, and in this experimental example, the surface roughness is expressed by an arithmetic average roughness (Ra). The Ra system is based on the surface line of the surface undulation of the 1378117 work surface per unit length to measure the undulating depth of the undulating surface with respect to the center line, and the average value is obtained. The groups tested in this experimental example were composite polished non-woven fabrics, sample A, sample B, sample C, and commercial fluff polishing pads (Chemcloths-Polishing Cloths, manufactured by Logitech Ltd., model OCON-352, diameter 12"/ 300mm) 'The number of samples in each group is 3. Table 3 illustrates the test results of the above groups.

表3table 3

Ra(nm) 樣本1 樣本2 樣本3 平均值 樣品A 11 12 15 12.7 樣品B 9 10 8 9.0 樣品C 12 14 17 14.3 商用絨毛拋光塾 14 12 17 14.3 由於Ra係表示經研磨拋光之金屬片的表面粗糙度,粗 糙度越小即表示產品之表面平滑度越佳。由表3可以發現, 利用複合拋光研磨不織布100樣品B (也就是其中α型氧 化鋁粒子佔耐磨性複合母粒的重量百分比為約3%者)來進 行研磨拋光,其產品的表面平滑度最佳,也就是樣品Β的 研磨拋光品質較佳。另-方面,不論是樣品A、樣品Β或 樣品C,其研磨拋光品質皆為商業上可接受的品質。 縱上所述可以發現,根據本發明實施例之複合拋光研 12Ra(nm) sample 1 sample 2 sample 3 average sample A 11 12 15 12.7 sample B 9 10 8 9.0 sample C 12 14 17 14.3 commercial fluff polishing 塾 14 12 17 14.3 Since Ra is the surface of the polished and polished metal sheet Roughness, the smaller the roughness, the better the surface smoothness of the product. It can be found from Table 3 that the surface smoothness of the product is obtained by using the composite polishing and polishing non-woven fabric sample B (that is, the α-type alumina particles occupying about 3% by weight of the wear-resistant composite masterbatch). The best, that is, the polishing quality of the sample crucible is better. On the other hand, whether it is sample A, sample Β or sample C, the polishing quality is commercially acceptable. In the above, it can be found that the composite polishing research according to the embodiment of the present invention 12

Claims (1)

511 / Μ年卩月丨叫修正替換頁 公告本 1⑴年丨0月丨6曰修正替換頁 申請專利範圍 1. 一種複合拋光研磨不織布之製造方法包含: (a) 形成一耐磨性複合母粒,該耐磨性複合母粒包含 約0_5 wt%至約7 wt❶/。之複數個耐磨性粒子以及一第一熱塑 性高分子,其中該些耐磨性粒子之粒徑大小為約2〇 nm至 約1000 ηπι,且其係選自由下列物質組成之群組:α型氧化 鋁、γ型氧化鋁、氧化矽、氡化鈽、碳化矽、氧化锆、單晶 鑽石及多晶鑽石’該第一熱塑性高分子為聚醯胺或聚酯; (b) 利用熔喷法將該耐磨性複合母粒製成一拋光研磨 層; (c) 形成一彈性緩衝層,其包含一第二熱塑性高分 子’該第二熱塑性高分子為聚氨酯;以及 ⑷接合該拋光研磨層與該彈性緩衝層,該接合的方 法係為貼合法或熔合法。511 / Μ 卩 丨 修正 修正 替换 替换 公告 1 1 1 1 1 1 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰The wear resistant composite masterbatch comprises from about 0_5 wt% to about 7 wt❶. a plurality of wear resistant particles and a first thermoplastic polymer, wherein the wear resistant particles have a particle size of from about 2 〇 nm to about 1000 ηπι, and are selected from the group consisting of: α type Alumina, γ-type alumina, cerium oxide, cerium lanthanum, cerium carbide, zirconia, single crystal diamond and polycrystalline diamond 'The first thermoplastic polymer is polyamine or polyester; (b) by meltblowing Forming the abrasion resistant composite masterbatch into a polishing layer; (c) forming an elastic buffer layer comprising a second thermoplastic polymer 'the second thermoplastic polymer is polyurethane; and (4) joining the polishing layer with The elastic buffer layer is bonded or melted. 2.如請求項 之粒徑大小為約 1所述之製造方法,其中該些耐磨性粒子 100 nm 至約 300 nm。 其中該拋光研磨層之 厚度 4.如請求 厚度為約1.〇 其中該彈性緩衝層之 mm至約5 〇 nim ° 15 1378117 |。|年|〇月兩日修正替換頁 101年10月16 tj修止替換頁 5. 如請求項1所述之製造方法,更包含將該拋光研磨 層進行壓光處理,以提升該拋光研磨層之表面平整性。 6. —種複合拋光研磨不織布包含: 一拋光研磨層包含一第一熱塑性高分子以及約0.5 wt%至約7 wt%之複數個研磨粒子,其中該第一熱塑性高分 子為聚醯胺或聚酯,該些耐磨性粒子之粒徑大小為約20 nm 至約1000 nm,且其係選自由下列物質組成之群組:α型氧 化IS、γ型氧化铭、氧化石夕、氧化鈽、碳化石夕、氧化錯、單 晶鑽石及多晶鑽石;以及 一彈性緩衝層包含一第二熱塑性高分子,位於該拋光 研磨層下方,該第二熱塑性高分子為聚氨酯,其中該拋光 研磨層以及該彈性緩衝層係利用貼合或熔合的方式接合至 一起。 7. 如請求項6所述之複合拋光研磨不織布,其中該研 磨粒子之粒徑大小為約100 nm至約300 nm。 8. 如請求項6所述之複合拋光研磨不織布,其中該拋 光研磨層之厚度為約0.1 mm至約2.0mm。 9. 如請求項6所述之複合拋光研磨不織布,其中該彈 性緩衝層之厚度為約1.0 mm至約5.0 mm。 162. The method of claim 1, wherein the abrasion resistant particles are from 100 nm to about 300 nm. Wherein the thickness of the polishing layer is 4. If desired, the thickness is about 1. 〇 wherein the elastic buffer layer is from mm to about 5 〇 nim ° 15 1378117 |. The year of the first month of the month, the replacement of the page, the replacement of the page, and the replacement of the page. The manufacturing method of claim 1 further includes calendering the polishing layer to enhance the polishing layer. The surface is flat. 6. A composite polishing abrasive nonwoven fabric comprising: a polishing abrasive layer comprising a first thermoplastic polymer and from about 0.5 wt% to about 7 wt% of a plurality of abrasive particles, wherein the first thermoplastic polymer is polyamine or poly The ester, the abrasion resistant particles have a particle size of from about 20 nm to about 1000 nm, and are selected from the group consisting of α-type oxidized IS, γ-type oxidized, oxidized oxidized cerium, cerium oxide, a carbonized carbide, an oxidized fault, a single crystal diamond, and a polycrystalline diamond; and an elastic buffer layer comprising a second thermoplastic polymer located below the polishing layer, the second thermoplastic polymer being a polyurethane, wherein the polishing layer and The elastic buffer layers are joined together by means of bonding or fusing. 7. The composite buffed nonwoven fabric of claim 6, wherein the abrasive particles have a particle size of from about 100 nm to about 300 nm. 8. The composite buffed nonwoven fabric of claim 6 wherein the polishing abrasive layer has a thickness of from about 0.1 mm to about 2.0 mm. 9. The composite buffed nonwoven fabric of claim 6, wherein the elastic buffer layer has a thickness of from about 1.0 mm to about 5.0 mm. 16
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