TWI368114B - Cleaning liquid and cleaning method - Google Patents
Cleaning liquid and cleaning methodInfo
- Publication number
- TWI368114B TWI368114B TW095140274A TW95140274A TWI368114B TW I368114 B TWI368114 B TW I368114B TW 095140274 A TW095140274 A TW 095140274A TW 95140274 A TW95140274 A TW 95140274A TW I368114 B TWI368114 B TW I368114B
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaning
- liquid
- cleaning liquid
- cleaning method
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title 2
- 239000007788 liquid Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5022—Organic solvents containing oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Emergency Medicine (AREA)
- Plasma & Fusion (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005317540A JP2007123775A (ja) | 2005-10-31 | 2005-10-31 | 洗浄液および洗浄方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200731028A TW200731028A (en) | 2007-08-16 |
TWI368114B true TWI368114B (en) | 2012-07-11 |
Family
ID=38005695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095140274A TWI368114B (en) | 2005-10-31 | 2006-10-31 | Cleaning liquid and cleaning method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2007123775A (zh) |
TW (1) | TWI368114B (zh) |
WO (1) | WO2007052544A1 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI245163B (en) | 2003-08-29 | 2005-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
JP5036996B2 (ja) | 2005-10-31 | 2012-09-26 | 東京応化工業株式会社 | 洗浄液および洗浄方法 |
TWI413155B (zh) * | 2005-11-22 | 2013-10-21 | Tokyo Ohka Kogyo Co Ltd | 光微影蝕刻用洗淨液及使用其之曝光裝置之洗淨方法 |
JP2009141050A (ja) * | 2007-12-05 | 2009-06-25 | Tokyo Ohka Kogyo Co Ltd | 洗浄液及び洗浄方法 |
NL2003421A (en) * | 2008-10-21 | 2010-04-22 | Asml Netherlands Bv | Lithographic apparatus and a method of removing contamination. |
KR102396007B1 (ko) * | 2012-07-19 | 2022-05-10 | 닛산 가가쿠 가부시키가이샤 | 반도체용 세정액 및 이것을 이용한 세정방법 |
CN103756400B (zh) * | 2014-01-10 | 2015-01-28 | 戴新育 | 一种毛笔快速清洗液 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4423559B2 (ja) * | 2002-12-03 | 2010-03-03 | 株式会社ニコン | 汚染物質除去方法 |
EP2172809B1 (en) * | 2003-04-11 | 2018-11-07 | Nikon Corporation | Cleanup method for optics in an immersion lithography apparatus, and corresponding immersion lithography apparatus |
JP2005072404A (ja) * | 2003-08-27 | 2005-03-17 | Sony Corp | 露光装置および半導体装置の製造方法 |
JP4305095B2 (ja) * | 2003-08-29 | 2009-07-29 | 株式会社ニコン | 光学部品の洗浄機構を搭載した液浸投影露光装置及び液浸光学部品洗浄方法 |
JP2005223030A (ja) * | 2004-02-04 | 2005-08-18 | Mitsubishi Gas Chem Co Inc | 半導体基体の洗浄剤とその洗浄方法 |
US20050205108A1 (en) * | 2004-03-16 | 2005-09-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system for immersion lithography lens cleaning |
US7362412B2 (en) * | 2004-11-18 | 2008-04-22 | International Business Machines Corporation | Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system |
-
2005
- 2005-10-31 JP JP2005317540A patent/JP2007123775A/ja active Pending
-
2006
- 2006-10-27 WO PCT/JP2006/321475 patent/WO2007052544A1/ja active Application Filing
- 2006-10-31 TW TW095140274A patent/TWI368114B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2007052544A1 (ja) | 2007-05-10 |
JP2007123775A (ja) | 2007-05-17 |
TW200731028A (en) | 2007-08-16 |
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