TWI366482B - Apparatus and methods for ambient air abatement of electronic device manufacturing effluent - Google Patents
Apparatus and methods for ambient air abatement of electronic device manufacturing effluentInfo
- Publication number
- TWI366482B TWI366482B TW097136109A TW97136109A TWI366482B TW I366482 B TWI366482 B TW I366482B TW 097136109 A TW097136109 A TW 097136109A TW 97136109 A TW97136109 A TW 97136109A TW I366482 B TWI366482 B TW I366482B
- Authority
- TW
- Taiwan
- Prior art keywords
- methods
- electronic device
- ambient air
- device manufacturing
- manufacturing effluent
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/40—Nitrogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US97397707P | 2007-09-20 | 2007-09-20 | |
US12/053,480 US8003067B2 (en) | 2007-09-20 | 2008-03-21 | Apparatus and methods for ambient air abatement of electronic manufacturing effluent |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200932341A TW200932341A (en) | 2009-08-01 |
TWI366482B true TWI366482B (en) | 2012-06-21 |
Family
ID=42369384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW097136109A TWI366482B (en) | 2007-09-20 | 2008-09-19 | Apparatus and methods for ambient air abatement of electronic device manufacturing effluent |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2010540212A (en) |
KR (1) | KR20100072274A (en) |
CN (1) | CN101801505B (en) |
TW (1) | TWI366482B (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100481256B1 (en) * | 1998-12-15 | 2005-04-11 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | Apparatus and method for point-of-use treatment of effluent gas streams |
US7569193B2 (en) * | 2003-12-19 | 2009-08-04 | Applied Materials, Inc. | Apparatus and method for controlled combustion of gaseous pollutants |
JP4177782B2 (en) * | 2004-04-05 | 2008-11-05 | 大陽日酸株式会社 | Combustion exhaust gas treatment equipment |
FR2881209B1 (en) * | 2005-01-21 | 2015-04-24 | Snecma Moteurs | GAS INCINERATOR INSTALLED ON A LIQUEFIED GAS TRANSPORT VESSEL |
GB0509944D0 (en) * | 2005-05-16 | 2005-06-22 | Boc Group Plc | Gas combustion apparatus |
JP2007232308A (en) * | 2006-03-02 | 2007-09-13 | Toshiba Matsushita Display Technology Co Ltd | Gas treating apparatus |
-
2008
- 2008-09-19 CN CN2008801087537A patent/CN101801505B/en active Active
- 2008-09-19 TW TW097136109A patent/TWI366482B/en active
- 2008-09-19 KR KR1020107008634A patent/KR20100072274A/en not_active Application Discontinuation
- 2008-09-19 JP JP2010526014A patent/JP2010540212A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2010540212A (en) | 2010-12-24 |
KR20100072274A (en) | 2010-06-30 |
CN101801505B (en) | 2013-06-12 |
CN101801505A (en) | 2010-08-11 |
TW200932341A (en) | 2009-08-01 |
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