TWI366482B - Apparatus and methods for ambient air abatement of electronic device manufacturing effluent - Google Patents

Apparatus and methods for ambient air abatement of electronic device manufacturing effluent

Info

Publication number
TWI366482B
TWI366482B TW097136109A TW97136109A TWI366482B TW I366482 B TWI366482 B TW I366482B TW 097136109 A TW097136109 A TW 097136109A TW 97136109 A TW97136109 A TW 97136109A TW I366482 B TWI366482 B TW I366482B
Authority
TW
Taiwan
Prior art keywords
methods
electronic device
ambient air
device manufacturing
manufacturing effluent
Prior art date
Application number
TW097136109A
Other languages
Chinese (zh)
Other versions
TW200932341A (en
Inventor
Mark W Curry
Barry Page
Shaun W Crawford
Robbert Vermeulen
William D Pyzel
Youssef Loldj
Rene T Correa
Daniel S Brown
Allen Fox
Original Assignee
Bht Services Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/053,480 external-priority patent/US8003067B2/en
Application filed by Bht Services Pte Ltd filed Critical Bht Services Pte Ltd
Publication of TW200932341A publication Critical patent/TW200932341A/en
Application granted granted Critical
Publication of TWI366482B publication Critical patent/TWI366482B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/54Nitrogen compounds
    • B01D53/56Nitrogen oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/40Nitrogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/02Other waste gases
    • B01D2258/0216Other waste gases from CVD treatment or semi-conductor manufacturing
TW097136109A 2007-09-20 2008-09-19 Apparatus and methods for ambient air abatement of electronic device manufacturing effluent TWI366482B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97397707P 2007-09-20 2007-09-20
US12/053,480 US8003067B2 (en) 2007-09-20 2008-03-21 Apparatus and methods for ambient air abatement of electronic manufacturing effluent

Publications (2)

Publication Number Publication Date
TW200932341A TW200932341A (en) 2009-08-01
TWI366482B true TWI366482B (en) 2012-06-21

Family

ID=42369384

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097136109A TWI366482B (en) 2007-09-20 2008-09-19 Apparatus and methods for ambient air abatement of electronic device manufacturing effluent

Country Status (4)

Country Link
JP (1) JP2010540212A (en)
KR (1) KR20100072274A (en)
CN (1) CN101801505B (en)
TW (1) TWI366482B (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100481256B1 (en) * 1998-12-15 2005-04-11 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 Apparatus and method for point-of-use treatment of effluent gas streams
US7569193B2 (en) * 2003-12-19 2009-08-04 Applied Materials, Inc. Apparatus and method for controlled combustion of gaseous pollutants
JP4177782B2 (en) * 2004-04-05 2008-11-05 大陽日酸株式会社 Combustion exhaust gas treatment equipment
FR2881209B1 (en) * 2005-01-21 2015-04-24 Snecma Moteurs GAS INCINERATOR INSTALLED ON A LIQUEFIED GAS TRANSPORT VESSEL
GB0509944D0 (en) * 2005-05-16 2005-06-22 Boc Group Plc Gas combustion apparatus
JP2007232308A (en) * 2006-03-02 2007-09-13 Toshiba Matsushita Display Technology Co Ltd Gas treating apparatus

Also Published As

Publication number Publication date
JP2010540212A (en) 2010-12-24
KR20100072274A (en) 2010-06-30
CN101801505B (en) 2013-06-12
CN101801505A (en) 2010-08-11
TW200932341A (en) 2009-08-01

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