1360662 100年11月.30日梭正替換頁 六、發明說明： 【發明所屬之技術領域】 ' [0001] 本發明涉及一種抗反射膜，尤其涉及一種寬頻帶抗反射 膜及具有該寬頻帶抗反射膜之光學元件。 【先前技術】 [0002] 目前，大多用於相機等成像裝置上之光學元件，如透鏡 、棱鏡等，為防止光線穿過時入射光線之光量衰減，均 在透鏡、棱鏡等光學元件之入射面或出射面上形成抗反 射膜。 | [0003] 目前之光學元件上之抗反射膜一般都是針對可見光區域 進行設計的，對於與可見光波長較相近之紅外光及紫外 光之抗反射性能一般不好。然而，所述紅外光或紫外光 往往會對光學元件之光學性能產生相當大之不良影響， 例如，如果在相機等裝置上使用這種光學元件，則會出 現色調上產生微小變化等問題。 【發明内容】1360662 November, 30th, 100th, the following is a replacement page. Description of the Invention: [Technical Field] [0001] The present invention relates to an anti-reflection film, and more particularly to a broadband anti-reflection film and having the broadband anti-reflection film Optical element of the reflective film. [Prior Art] [0002] At present, most of optical components used in imaging devices such as cameras, such as lenses, prisms, etc., are used to prevent the amount of incident light from attenuating when light passes through, and are incident on the incident surface of optical elements such as lenses and prisms. An anti-reflection film is formed on the exit surface. [0003] The antireflection film on the current optical components is generally designed for the visible light region, and the antireflection performance of infrared light and ultraviolet light which are similar to the visible light wavelength is generally not good. However, the infrared light or the ultraviolet light tends to have a considerable adverse effect on the optical performance of the optical element. For example, if such an optical element is used on a device such as a camera, problems such as slight changes in hue may occur. [Summary of the Invention]
[00043 有鑒於此，有必要提供一種寬頻帶抗反射膜及具有該寬 I 頻帶抗反射膜之光學元件。 [0005] —種寬頻帶抗反射膜，其包括沿光學元件表面依次形成 的一底層、一拓寬層及一頂層。所述底層為膜厚為 0. 95-1. 05d之中間折射率材料層。所述頂層為膜厚為 0.95-1. 05d之低折射率材料層。所述拓寬層包括沿底層 向頂層方向依次形成的第一膜層、第二膜層、第三膜層 、第四膜層及第五膜層。所述第一膜層為膜厚為 0. 3U-0. 343d之高折射率材料層。所述第二膜層為膜厚 096137476 表單编號A0101 第4頁/共14頁 1003444304-0 1360662 [0006]In view of the above, it is necessary to provide a broadband anti-reflection film and an optical element having the wide I-band anti-reflection film. A wideband antireflection film comprising a bottom layer, a widened layer and a top layer formed in sequence along the surface of the optical element. The intermediate layer is an intermediate refractive index material layer having a film thickness of from 0.95 to 1.05. The top layer is a low refractive index material layer having a film thickness of 0.95-1. 05d. The widening layer includes a first film layer, a second film layer, a third film layer, a fourth film layer, and a fifth film layer which are sequentially formed in the top layer direction along the bottom layer. The first film layer is a high refractive index material layer having a film thickness of 0.30-0.343d. The second film layer is a film thickness 096137476 Form No. A0101 Page 4 of 14 1003444304-0 1360662 [0006]
[0007] 100年.11月30日按正替換頁 為0. 147-0. 1 63d之低折射率材料層。所述第三膜層為膜 厚為1.56卜1. 725d之高折射率材料層。所述第四膜層為 膜厚為0. 21 0-0. 232d之低折射率材料層。所述第五膜層 為膜厚為0.32卜0.355d之高折射率材料層。所述d =λ /(4η)，其中又為入射光之波長，η表示對應膜層之折射 率。 一種光學元件，其包括一基材及形成在所述基材至少一 表面上之寬頻帶抗反射膜。所述寬頻帶抗反射膜包括沿 光學元件基材表面依次形成的一底層、一拓寬層及一頂 層。所述底層為膜厚為0. 95-1. 05d之中間折射率材料層 。所述頂層為膜厚為0. 95-1. 05d之低折射率材料層。所 述拓寬層包括沿底層向頂層方向依次形成的第一膜層、 第二膜層、第三膜層、第四膜層及第五膜層。所述第一 膜層為膜厚為0. 3U-0. 343d之高折射率材料層。所述第 二膜層為膜厚為0. 147-0. 1 63d之低折射率材料層。所述 第三膜層為膜厚為1. 561-1. 725d之高折射率材料層。所 述第四膜層為膜厚為0.210-0.232d之低折射率材料層。 所述第五膜層為膜厚為0. 321-0. 355d之高折射率材料層 。所述d =λ/(4η)，其中又為入射光之波長，η表示對 應膜層之折射率。 所述寬頻帶抗反射膜在400-1 OOOnm之波長範圍均具有較 好之抗反射性能，其反射率大多低於1%。從而使得具有 所述寬頻帶抗反射膜之光學元件在與可見光波長較相近 之紅外光及紫外光區之抗反射性能都能得到很大提高， 從而可避免由此產生之相應問題。 096137476 表單編號A0101 第5頁/共14頁 1003444304-0 1360662 [0008] [0009] [0010] [0011] [0012] [0013] [0014] 096137476 100年11月.30日修正替換頁 【實施方式】 下面將結合附圖，對本發明作進一步之詳細說明β 明參閱圖1，為本發明貫施例提供之一種光學元件， 所述光學元件100包括一個基材20及形成在所述基材20一 個表面上之一個見頻帶抗反射膜1〇 ^所述光學元件具 體可為透鏡、棱鏡等光學元件。 所述基材20之材料可為玻璃或塑膠等。可以理解，所述 基材20被光線穿過之各表面均可形成一個寬頻帶抗反射 膜10，例如透鏡其可在其兩表面均形成一個寬頻帶抗反 鲁 射膜10，以提高該透鏡之光透射率。 所述寬頻帶抗反射膜1〇包括沿所述基材2〇表面依次形成 的一底層11、一拓寬層12及一頂層13。 所述底層11由中間折射率材料組成，其膜厚為 〇.95-l.〇5d，所述d =λ/(4η)，其中；I為入射光之波 長，η表示對應膜層之折射率β優選地，所述底層η之膜 厚為Id，所述λ為500-700nm，本實施例中，所述λ φ = 60〇nm。所述中間折射率材料之折射率為i 6_丨7。所 述中間折射率材料可為三氧化二鋁等。 所述頂層13由低折射率材料組成，為膜厚為〇 95_丨〇5d 。優選地，所述頂層13之膜厚為1(1。所述低折射率材料 之折射率為1. 35-1. 46。所述低折射率材料可選自二敦 化鎮、-氧化;6》等材料中之-種或幾種之混合。 所述拓％層12包括沿底層11㈣層13方向依次形成的第 一膜層12卜第二膜層122、第三膜層123、第四膜層124 第6頁/共14頁 表單編號A0101 1003444304-0 1360662[0007] 100 years. November 30th according to the replacement page is 0. 147-0. 1 63d low refractive index material layer. The third film layer is a high refractive index material layer having a film thickness of 1.56 and 1.725d. The fourth film layer is a low refractive index material layer having a film thickness of 0. 21 0-0. 232d. The fifth film layer is a high refractive index material layer having a film thickness of 0.32b and 0.355d. The d = λ / (4η), which is again the wavelength of the incident light, and η represents the refractive index of the corresponding film layer. An optical component comprising a substrate and a broadband anti-reflective film formed on at least one surface of the substrate. The broadband anti-reflection film includes a bottom layer, a widened layer and a top layer which are sequentially formed along the surface of the optical element substrate. The intermediate layer is an intermediate refractive index material layer having a film thickness of 0.95 - 1.05d. The low-refractive-index material layer having a film thickness of 0.95-1. 05d. The widening layer includes a first film layer, a second film layer, a third film layer, a fourth film layer, and a fifth film layer which are sequentially formed in the top layer direction along the bottom layer. The first film layer is a high refractive index material layer having a film thickness of 0.3 U-0. 343d. The second film layer is a low refractive index material layer having a film thickness of 0.147-0. The third film layer is a high refractive index material layer having a film thickness of 1.561-1. 725d. The fourth film layer is a low refractive index material layer having a film thickness of 0.210 to 0.232 d. The 355d high refractive index material layer is a film thickness of 0. 321-0. The d = λ / (4η), which is again the wavelength of the incident light, and η represents the refractive index of the corresponding film layer. The broadband anti-reflection film has excellent anti-reflection properties in the wavelength range of 400-1 OOOnm, and its reflectance is mostly less than 1%. Therefore, the optical element having the broadband anti-reflection film can greatly improve the anti-reflection performance of the infrared light and the ultraviolet light region which are close to the visible light wavelength, thereby avoiding the corresponding problem. 096137476 Form No. A0101 Page 5 of 14 1003444304-0 1360662 [0009] [0009] [0011] [0014] [0014] 096137476 November, 30, 100 revised replacement page [embodiment The present invention will be further described in detail with reference to the accompanying drawings. FIG. 1 is an optical component according to an embodiment of the present invention. The optical component 100 includes a substrate 20 and is formed on the substrate 20. One of the surface-band anti-reflection films may be an optical element such as a lens or a prism. The material of the substrate 20 may be glass or plastic or the like. It can be understood that the substrate 20 can form a broadband anti-reflection film 10 by the surfaces through which the light passes, for example, a lens can form a broadband anti-reflective film 10 on both surfaces thereof to enhance the lens. Light transmittance. The broadband anti-reflection film 1 includes a bottom layer 11 , a wide layer 12 and a top layer 13 which are sequentially formed along the surface of the substrate 2 . The bottom layer 11 is composed of an intermediate refractive index material having a film thickness of 95.95-l.〇5d, wherein d = λ/(4η), where I is the wavelength of the incident light, and η is the refractive index of the corresponding film layer. Rate β Preferably, the film thickness of the underlayer η is Id, and the λ is 500-700 nm. In the present embodiment, the λ φ = 60 〇 nm. The refractive index of the intermediate refractive index material is i 6 —丨7. The intermediate refractive index material may be aluminum oxide or the like. The top layer 13 is composed of a low refractive index material having a film thickness of 〇 95_丨〇 5d. Preferably, the film thickness of the top layer 13 is 1 (1). The refractive index of the low refractive index material is 1.35-1. 46. The low refractive index material may be selected from the town of Di Dunhua, - oxidation; a mixture of one or more of the materials, etc. The top layer 12 includes a first film layer 12, a second film layer 122, a third film layer 123, and a fourth film which are sequentially formed along the layer of the bottom layer 11 (four) layer 13. Layer 124 Page 6 of 14 Form No. A0101 1003444304-0 1360662
100年.11月.30日修正替換頁 及第五膜層125。所述第一膜層121為膜厚為 0. 31 1-0. 343d之高折射率材料層，所述第二膜層122為 膜厚為0. 147-0. 1 63d之低折射率材料層，所述第三膜層 123為膜厚為1. 561-1. 725d之高折射率材料層，所述第 四膜層124為膜厚為0. 21 0-0. 232d之低折射率材料層， 所述第五膜層125為膜厚為0. 32卜0. 355d之高折射率材 料層。優選地，所述第一膜層121、第二膜層122、第三 膜層123、第四膜層124及第五膜層125之膜厚依次為 0. 327d，0. 155d，1. 643d，0. 221d，0. 338d。所述低 折射率材料層之折射率為1. 35-1. 46。所述低折射率材 料可選自二氟化鎂、二氧化矽等材料中之一種或幾種之 混合。所述高折射率材料之折射率為2. 0-2. 3。所述高折 射率材料可選自二氧化鈦、五氧化二钽‘及五氧化二鈮等 中之一種或幾種之混合。所述高折射率材料、中間折射 率材料及低折射率材料用於表明該三類折射率材料之間 之折射率高低之相對關係。 [0015] 下面以具體實施例來詳細說明本發明之寬頻帶抗反射膜 10。表1為具體實施中寬頻帶抗反射膜10之結構表。其中 d =又/(4n)，其中又=600nm，η表示對應膜層之折射率 [0016]表 1 膜層材料 膜層厚度（d) 底層 三氧化二鋁 1 第一膜層 二氧化鈦 0. 327 第二膜層 二氧化矽 0.155 表單编號Α0101 第7頁/共14頁 1003444304-0 096137476 r-^〜__ 100年.11月30日修正替换頁 笫三骐層 ---一 二氧化鈦 1. 643 第四膜層 — 第五膜層 ~~~—__ —氧化發 0. 221 二氧化鈦 0. 338 頂層 二氧化矽 1 月參閱圖2，為所述滿足表丨條件之寬頻帶抗反射膜1〇之 反射率特性曲線圖。其中橫坐標表示波長，縱坐標表示 反射率。由圖2中可看出，所述寬頻帶抗反射膜10在 4〇〇-i〇〇〇nra之波長範圍均具有較好之抗反射性能，其反 射率均低於1 %。從而使得具有所述寬頻帶抗反射膜1〇之 光學元件100在與可見光波長較相近之紅外光及紫外光區 之抗反射性能都能得到很大提高，從而可避免由此產生 之相應問題β例如，在相機等裝置内採用之光學元件出 現色調上產生變化等問題。 [0018] ^ 1 ^上所述，本發明符合發明專利要件，爰依法提出專利 申π。惟，以上所述者僅為本發明之較佳實施方式，本 發明之範圍並不以上述實施方式為限，舉凡熟悉本案技 藝之人士援依本發明之精神所作之等效修飾或變化，皆 應涵蓋於以下申請專利範圍内。 【圖式簡單說明】 [19] 圖1是本發明實施例提供之一種光學元件示意圖。 [0020] 圖2是本發明實施例提供之一種寬頻帶抗反射膜之反射率 特性曲線圖。 【主要元件符號說明】 [0021] 光學元件：1〇〇 096137476 表單編號Α0101 第8頁/共14頁 1003444304-0 1360662 [0022] [0023] [0024] [0025] [0026] [0027] [0028]The replacement page and the fifth film layer 125 are corrected on the 100th, November, and 30th. 147-0. 1 63d low refractive index material, the first film layer 121 is a film having a thickness of 0. 31 1-0. 343d of the high refractive index material layer, the second film layer 122 is a film thickness of 0. 147-0. The second film layer 123 is a high refractive index material layer having a film thickness of 1.561-1. 725d, and the fourth film layer 124 has a film thickness of 0. 21 0-0. The layer of the high refractive index material having a film thickness of 0.32 0. 355d. 327d,0. 155d,1. 643d The film thickness of the first film layer 121, the second film layer 122, the third film layer 123, the fourth film layer 124, and the fifth film layer 125 is 0. 327d, 0. 155d, 1. 643d , 0. 221d, 0. 338d. The refractive index of the low refractive index material layer is 1.35-1.46. The low refractive index material may be selected from a mixture of one or more of magnesium difluoride, cerium oxide and the like. 0-2. 3. The refractive index of the high refractive index material is 2. 0-2. The high refractive index material may be selected from a mixture of one or more of titanium dioxide, tantalum pentoxide & bismuth pentoxide. The high refractive index material, the intermediate refractive index material, and the low refractive index material are used to indicate the relative relationship between the refractive index of the three types of refractive index materials. [0015] Hereinafter, the broadband anti-reflection film 10 of the present invention will be described in detail by way of specific embodiments. Table 1 is a structural table of the broadband anti-reflection film 10 in the specific embodiment. Where d = again / (4n), where = 600nm, η represents the refractive index of the corresponding film layer [0016] Table 1 film layer material layer thickness (d) bottom layer of aluminum oxide 1 first layer of titanium dioxide 0. 327 The second film layer of cerium oxide 0.155 Form No. 101 0101 Page 7 / Total 14 pages 1003444304-0 096137476 r-^~__ 100 years. November 30th revised replacement page 笫 three layers --- one titanium dioxide 1. 643 The fourth film layer - the fifth film layer ~~~___ - oxidized hair 0. 221 titanium dioxide 0. 338 top layer cerium oxide January, see Figure 2, for the wide-band anti-reflection film that meets the conditions of the table Reflectance characteristic curve. The abscissa indicates the wavelength and the ordinate indicates the reflectance. As can be seen from Fig. 2, the broadband anti-reflection film 10 has good anti-reflection properties in the wavelength range of 4 〇〇-i〇〇〇nra, and the reflectance is less than 1%. Therefore, the optical element 100 having the broadband anti-reflection film 1 都能 can greatly improve the anti-reflection performance of the infrared light and the ultraviolet light region which are close to the visible light wavelength, thereby avoiding the corresponding problem caused by the β. For example, an optical element used in a device such as a camera has a problem such as a change in color tone. [0018] ^ 1 ^ above, the present invention meets the requirements of the invention patent, and patents are filed according to law. However, the above description is only the preferred embodiment of the present invention, and the scope of the present invention is not limited to the above-described embodiments, and equivalent modifications or variations made by those skilled in the art in light of the spirit of the present invention are It should be covered by the following patent application. BRIEF DESCRIPTION OF THE DRAWINGS [19] FIG. 1 is a schematic view of an optical element according to an embodiment of the present invention. 2 is a graph showing reflectance characteristics of a broadband anti-reflection film according to an embodiment of the present invention. [Major component symbol description] [0021] Optical component: 1〇〇096137476 Form number Α0101 Page 8/14 pages 1003444304-0 1360662 [0023] [0024] [0025] [0027] [0028] ]
[0029] [0030] [0031] 抗反射膜：10 基材：20 底層：11 拓寬層：12 頂層：13 第一膜層：121 第二膜層：122 第三膜層：123 第四膜層：124 第五膜層：125 100年.11月· 30日按正替換頁 096137476 表單編號A0101 第9頁/共14頁 1003444304-0[0030] [0031] Antireflection film: 10 Substrate: 20 Underlayer: 11 Broadening layer: 12 Top layer: 13 First film layer: 121 Second film layer: 122 Third film layer: 123 Fourth film layer :124 Fifth film: 125 100 years. November, 30th, please replace page 096137476 Form number A0101 Page 9 / Total 14 pages 1003444304-0