1356919 九、發明說明： 【發明所屬之技術領域】 . 本發明係關於一種彩色濾光片，尤指一種適用於噴墨 製程之彩色濾光片。 5 【先前技術】 隨著液晶顯示器的需求成長，彩色濾光片的需求亦隨 • 之增加。因此，降低彩色濾光片製造成本，成了刻不容2 的課題。 ° 1〇 彩色濾光片的設計需要高色彩純度、高透明度、高對 -比等特性，習知的彩色濾光層塗佈方法有四種，分別為染 色法（Dyeing)、顏料分散法（pigmem Dispersi〇n) '電鍍沉積 法（Electro-Deposition)、以及印刷法（printing)。然而，上述 這些方法不僅製程複雜、製程設備昂貴外，而且彩色濾光 15片的尺寸亦有限制。此外，製程與尺寸增加時，彩色濾光 片良率將隨之下降，因而造成本提高。 為解決#色濾光片製程的習知問題，近年來發展出喷 墨法（Ink-Jet)。噴墨法具有許多優越的特點，如使用小巧的 设備、減少製程時間、以及減低墨水消耗量。然而，在利 20 .用噴墨法製造彩色濾光片期間，當彩色墨滴喷入黑色矩陣 的夂畫素區（sub-pixel) af，容易因彩色墨水的高液滴擴散 此力，發生墨水溢流現象，因而造成混色以及顏色分佈不 均，並影響色彩對比度，此即色偏現象。 1356919 ，為消拜色偏現象，習知的方法係藉由黃光微影製程製 程形成擋牆，以加深晝素區容納墨水的空間，以防止墨水 溢流。然而，此種做法不但製程繁複，而且對於防止色偏 的效果亦不明顯。另一方面，除了擋牆法以外’另一習知 5的方法為形成疏墨層於黑色矩陣上，以防止色偏發生。惟 此種方法僅依賴疏墨層的作用，亦無法有效阻止墨水溢 流，製造的出彩色遽光片仍然有色偏，對於良率的提高效 果有限。 綜上所述，彩色濾光片製程中，混色的彩色遽層為急 10待改善的課題。尤其是喷墨法製程中，部份墨水溢流越過 黑色矩陣，造成色偏，更是刻不容緩的課題，尚待解決。 【發明内容】 本發明提供一種彩色濾光片及其製造方法，其特徵在 15於，儲墨槽搭配疏墨層之設計，能有效抑制有色墨水溢流， 進而防止彩色濃光片之色偏。因此，本發明之製造方法有 別於習知技術中利用擋牆法，或僅依賴疏墨層抑制有色墨 水溢流。 本發明彩色濾光片包含：基板、黑色矩陣以及疏墨層。 20 更明確地說’黑色矩陣係設置於基板上，而且每一黑色矩 陣具有至少一儲墨槽；疏墨層係設置於黑色矩陣上且暴露 出儲墨槽。其特徵在於，儲墨槽可容納溢流之有色墨水。 本發明之彩色濾光片可用於液晶顯示器中。 1356919 本發明彩色濾光片之製造方法包含步驟：提供基板、 形成黑色矩陣、形成儲墨槽、以及形成疏墨層。更明確地 說，本發明之製造方法包含步驟：提供基板；形成黑色矩 陣於基板上，且黑色矩陣可定義出次晝素區；形成至少一 5儲墨槽於每一黑色矩陣上；以及形成疏墨層於黑色矩陣上 且暴露出儲墨槽。其中，以有色墨水形成濾光層於次畫素 區中。本發明彩色濾光片之製造方法更包含形成濾光層的 步驟。更明確地說，本發明之製造方法更包含步驟：形成濾 光層於每一次晝素區中。 10 本發明之黑色矩陣態樣不限。較佳為，本發明之黑色 矩陣係為陣列排列。此外，本發明之黑色矩陣材質不限。 較佳為’本發明之黑色矩陣包含金屬或樹脂。本發明之黑 色矩陣功能不限。較佳為’本發明之黑色矩陣可定義多個 次晝素區。再者，本發明之彩色濾光片包括元件不限。較 15 佳為’本發明之彩色濾光片更包括一濾光層；更佳為，本 發明之彩色濾光片更包括一設置於上述次晝素區中之滤光 層。 本發明之儲墨槽形成位置不限。較佳為，本發明之儲 墨槽形成於黑色矩陣上。此外，本發明之儲墨槽尺寸不限。 20 較佳為，本發明之儲墨槽寬度為黑色矩陣寬度之40%至 60% »而且，本發明之儲墨槽底部形狀不限。較佳為，本發 明之儲墨槽之底部橫戴面係為鋸齒狀或平面。 本發明之疏墨層形成位置不限。較佳為，本發明之疏 墨層形成於黑色矩陣上’且暴露儲墨槽。此外，本發明之 7 1356919 疏墨層外形不限。較佳為’本發明之疏墨層具有至少—斜 邊。更佳為’本發明之疏墨層具有梯形之橫截面。再者， 本發明之疏墨層之材料不限》較佳為，本發明之疏墨層之 材料至少包含一酯類化合物以及一含矽混合物。 ίο 15 本發明之濾光層與疏墨層之間接觸角不限。較佳為， 本發明之慮光層與疏墨層之間的接觸角介於4〇度至％ 度。更佳為，本發明之濾光層與疏墨層之間的接觸角介於 60度至90度。此外，本發明之濾光層與基板之間接觸角不 限。較佳為，本發明之濾光層與基板之間的接觸角介於〇 度至50度。另外，本發明之基板態樣不限。較佳為，本發 明之基板係-透明基板。更佳& ’本發明之基板係一玻璃。 本發明形成滤光層之方法不限。較佳為，本發明形成 濾光層之方法包含噴墨法。此外，本發明形成儲墨槽之方 法不限。㈣為’本發明形絲錢之方法包含雷射或立 光微影製程。更佳為，前述黃光微影製程係利用半色調二 罩曝光㈣f-t_exposure)。另一方面，本發明形成疏墨層 之方法不限。較佳為，本發明形成疏墨層 印法或黃光微影製程。 々〜用轉 【實施方式】 以下係藉由特定的且體每# y …U… 例說明本發明之實施 式，熟1此技藝之人式可由本說明書所 了解本發明之其他優點與功效 内A易 ^ ^ ^ ^月亦可藉由其他不 的具體實靶例加以施行或應用， 尽說明書中的各項細節 20 5 在不恃離本發明之精神下進行各1356919 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to a color filter, and more particularly to a color filter suitable for use in an ink jet process. 5 [Prior Art] As the demand for liquid crystal displays grows, so does the demand for color filters. Therefore, reducing the manufacturing cost of color filters has become an issue that cannot be avoided. ° 1 〇 color filter design requires high color purity, high transparency, high contrast - ratio, etc. There are four kinds of conventional color filter coating methods, respectively, Dyeing, pigment dispersion method ( Pigmem Dispersi〇n) 'Electro-Deposition, and printing. However, these methods are not only complicated in process, but also expensive in process equipment, and the size of the color filter 15 is also limited. In addition, as the process and size increase, the color filter yield will decrease, resulting in an increase. In order to solve the conventional problem of the #color filter process, the inkjet method (Ink-Jet) has been developed in recent years. Inkjet methods have many advantages, such as the use of compact equipment, reduced process time, and reduced ink consumption. However, in the production of the color filter by the ink jet method, when the color ink droplet is sprayed into the sub-pixel af of the black matrix, it is easy to diffuse the force due to the high droplet of the color ink, which occurs. The phenomenon of ink overflow causes color mixing and uneven color distribution, and affects color contrast, which is the color shift phenomenon. 1356919, in order to eliminate the color shift phenomenon, the conventional method is to form a retaining wall by a yellow light lithography process to deepen the space for accommodating ink in the halogen region to prevent ink overflow. However, this practice is not only complicated, but also has an obvious effect on preventing color shift. On the other hand, in addition to the retaining wall method, another conventional method is to form an ink repellent layer on a black matrix to prevent color shift from occurring. However, this method relies only on the action of the ink-repellent layer, and it does not effectively prevent the ink from overflowing. The color-developed color-coated light sheet is still colored and has a limited effect on the yield improvement. In summary, in the color filter process, the mixed color enamel layer is an urgent problem to be improved. Especially in the inkjet process, some ink overflows over the black matrix, causing color shift, which is an urgent task that needs to be solved. SUMMARY OF THE INVENTION The present invention provides a color filter and a method of fabricating the same, characterized in that the ink reservoir is designed to match the ink repellent layer, which can effectively suppress the overflow of the colored ink, thereby preventing the color shift of the color diffuser. . Therefore, the manufacturing method of the present invention is different from the conventional technique in that the retaining wall method is used, or only the ink repellent layer is relied upon to suppress the overflow of the colored ink. The color filter of the present invention comprises: a substrate, a black matrix, and an ink repellent layer. More specifically, the 'black matrix system is disposed on the substrate, and each black matrix has at least one ink reservoir; the ink repellent layer is disposed on the black matrix and exposes the ink reservoir. It is characterized in that the ink storage tank can accommodate the overflow colored ink. The color filter of the present invention can be used in a liquid crystal display. 1356919 The method of manufacturing a color filter of the present invention comprises the steps of: providing a substrate, forming a black matrix, forming an ink reservoir, and forming an ink repellent layer. More specifically, the manufacturing method of the present invention comprises the steps of: providing a substrate; forming a black matrix on the substrate, and the black matrix defines a sub-tenoxine region; forming at least one 5 ink reservoir on each black matrix; and forming The ink repellent layer is on the black matrix and exposes the ink reservoir. Among them, a filter layer is formed in the sub-pixel region with a colored ink. The method of producing a color filter of the present invention further comprises the step of forming a filter layer. More specifically, the manufacturing method of the present invention further comprises the step of forming a filter layer in each of the halogen regions. 10 The black matrix aspect of the present invention is not limited. Preferably, the black matrix of the present invention is in an array arrangement. Further, the black matrix material of the present invention is not limited. Preferably, the black matrix of the present invention comprises a metal or a resin. The black matrix function of the present invention is not limited. Preferably, the black matrix of the present invention defines a plurality of sub-decibation regions. Furthermore, the color filter of the present invention includes no components. More preferably, the color filter of the present invention further comprises a filter layer; more preferably, the color filter of the present invention further comprises a filter layer disposed in the sub-tenoxine region. The ink tank forming position of the present invention is not limited. Preferably, the ink reservoir of the present invention is formed on a black matrix. Further, the ink tank of the present invention is not limited in size. Preferably, the ink reservoir of the present invention has a width of 40% to 60% of the width of the black matrix. Further, the shape of the bottom of the ink reservoir of the present invention is not limited. Preferably, the bottom cross-face of the ink reservoir of the present invention is serrated or planar. The ink repellent layer forming position of the present invention is not limited. Preferably, the ink repellent layer of the present invention is formed on a black matrix' and exposes the ink reservoir. Further, the shape of the 7 1356919 ink repellent layer of the present invention is not limited. Preferably, the ink repellent layer of the present invention has at least a beveled edge. More preferably, the ink repellent layer of the present invention has a trapezoidal cross section. Further, the material of the ink repellent layer of the present invention is not limited. Preferably, the material of the ink repellent layer of the present invention contains at least an ester compound and a cerium-containing mixture. Ίο 15 The contact angle between the filter layer and the ink repellent layer of the present invention is not limited. Preferably, the contact angle between the light-imparting layer of the present invention and the ink repellent layer is between 4 and 10 degrees. More preferably, the contact angle between the filter layer of the present invention and the ink repellent layer is from 60 to 90 degrees. Further, the contact angle between the filter layer of the present invention and the substrate is not limited. Preferably, the contact angle between the filter layer of the present invention and the substrate is between 50 and 50 degrees. Further, the substrate aspect of the present invention is not limited. Preferably, the substrate of the present invention is a transparent substrate. More preferably &> The substrate of the present invention is a glass. The method of forming a filter layer of the present invention is not limited. Preferably, the method of forming a filter layer of the present invention comprises an ink jet method. Further, the method of forming the ink tank of the present invention is not limited. (4) The method of the invention of the invention includes a laser or a lithography process. More preferably, the aforementioned yellow light lithography process utilizes a halftone hood exposure (four) f-t_exposure). On the other hand, the method of forming the ink repellent layer of the present invention is not limited. Preferably, the present invention forms an ink repellent or yellow lithography process. 々 用 用 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施A 易 ^ ^ ^ ^ month can also be implemented or applied by other specific target examples, and the details in the specification are 20 5 without departing from the spirit of the present invention.
.-10 15 可基於不同觀點與應用 種修飾與變更。 實施例1 流程之剖1圖考^至圖5,係為本發明之彩色遽光片製造 實施例中，圖1所示，提供—基板u。在本 ^ 板11之材質係為玻璃。 上、日1如圖2所不’形成多數個黑色矩陣12於基板11 二=色矩陣12以陣列方式排列成形，如圖6所示， 矩陣12陣列之俯視圖。同時，黑色矩陣12陣列定 ^夕個顯露出部分基板之次晝素區山。此外，本發明之 …色矩陣12可為樹脂或金屬，而在本實 12係為樹脂。 …邑矩丨早 接著，如圖3所示，形成儲墨槽15於黑色矩陣12上， 以容納溢流出來的墨水，進而防止形成色偏。在本實施例 中’係以雷射形成儲墨槽15’且儲墨肖15 χ度為黑色矩陣 12寬度之40%至60%。接下來，如圖4所示，形成一疏墨 層Η於黑色矩陣12上且暴露出儲墨槽15。其中，疏墨層 14可以轉印法或黃光微影製程形成，而於本實施例中，疏 墨層14則係以轉印法形成，且疏墨層14之材料包含醋類 化合物以及含矽混合物。 最後，如圖5所示，以至少一有色墨水形成一濾光層 13b於次畫素區13a中，進而完成本實施例之彩色濾光片， 其包含：一基板11、多數個黑色矩陣12以及一疏墨層14。 其中，每一該些黑色矩陣12具有至少一儲墨槽15，而且黑 20 1356919 - 色矩陣12係以陣列方式排列形成於基板11上。同時，黑 色矩陣12陣列定義出多個顯露出部分基板之次畫素區 13a。此外’彩色濾光片更包含一濾光層nb，且濾光層1讣 係設置於該些次晝素區13a中。其中，濾光層13b係由至 5 少一有色墨水形成於該些次畫素區13a中。另一方面，疏 墨層14形成於黑色矩陣12上，且與有色墨水極性相斥， 而儲墨槽15則可容納溢流之有色墨水，如此便可有效抑制 有色墨水溢流。在本實施例中，形成濾光層13b之方法係 籲 喷墨法。此外’濾光層13b與疏墨層14之間的接觸角係介 • 10 於60度至90度；濾光層13b與基板11之間的接觸角係介 於〇度至50度。 由於習知濾光片之噴墨法製程期間，墨水會溢流越過 黑色矩陣’因而容易造成色偏，因此本發明提供儲墨槽15 結合疏墨層14的設計，俾能阻止墨水溢流，防止色偏發生。 15 實施例2 本實施例之彩色濾光片結構與實施例1大致相同，但 鲁 本實施例之儲墨槽15之底部橫截面係為錯齒狀，如圖7所 示。其製造方法與實施例1不同之處在於，本實施例形成 儲墨槽15之方法係利用半色調光罩曝光（half_t〇ne 20 exposure) ’直接在製作黑色矩陣12時，同步製作儲墨槽 15，以簡化製程。 實施例3 本貫施例之办色遽光片結構與實施例1大致相同，但 本實施例之疏墨層14具有至少一斜邊，如圖8所示。其製 10 1356919 - 造方法與實施例1不同之處在於，本實施例之疏墨層14 < 形成係利用黃光微影製程。 • 實施例4 • 本實施例之彩色濾光片結構與實施例1大致相同，但 5 本實施例之疏墨層14具有梯形橫截面。如圖9所示，其製 造方法與實施例1不同之處在於，本實施例之疏墨層14之 形成係利用黃光微影製程。 综上所述，本發明提供一種彩色濾光片及其製造方 籲 法，其中儲墨槽搭配疏墨層之設計，能有效抑制有色墨水 10 溢流’進而防止彩色濾光片之色偏。 上述實施例僅係為了方便說明而舉例而已，本發明所 主張之權利範圍自應以申請專利範圍所述為準，而非僅限 於上述實施例。 15 【圖式簡單說明】 圖1〜5係本發明一較佳實施例之彩色濾光片製造流程之剖 • 視圖。 圖6係本發明—較佳實施例之黑色矩陣之俯視圖。 圖7係本發明肖佳實施例之黑色矩陣之剖視圖。 20圖8係本發明-較佳實施例之黑色矩陣之剖視圖。 圖9係本發明-較佳實施例之黑色矩陣之剖視圖。 【主要元件符號說明】 1356919 11 基板 12 黑色矩陣 13a 次畫素區 13b 濾光層 14 疏墨層 15 儲墨槽 12.-10 15 Modifications and changes can be made based on different perspectives and applications. Embodiment 1 Flowchart 1 to FIG. 5 is a manufacturing example of a color light-emitting sheet of the present invention. As shown in FIG. 1, a substrate u is provided. The material of this board 11 is glass. The upper and the outer 1 are formed as shown in Fig. 2. A plurality of black matrices 12 are formed on the substrate 11 and the color matrix 12 is arranged in an array. As shown in Fig. 6, a top view of the matrix 12 array is shown. At the same time, the array of black matrix 12 is fixed to reveal a part of the sub-segment area of the substrate. Further, the color matrix 12 of the present invention may be a resin or a metal, and the present invention is a resin. Next, as shown in Fig. 3, an ink reservoir 15 is formed on the black matrix 12 to accommodate the overflowed ink, thereby preventing color shift. In the present embodiment, the ink reservoir 15' is formed by laser irradiation and the ink absorbing 15 is 40% to 60% of the width of the black matrix 12. Next, as shown in Fig. 4, an ink repellent layer is formed on the black matrix 12 and the ink reservoir 15 is exposed. The ink repellent layer 14 can be formed by a transfer method or a yellow photolithography process. In the embodiment, the ink repellent layer 14 is formed by a transfer method, and the material of the ink repellent layer 14 comprises an vinegar compound and a cerium-containing mixture. . Finally, as shown in FIG. 5, a filter layer 13b is formed in the sub-pixel region 13a with at least one colored ink, thereby completing the color filter of the embodiment, comprising: a substrate 11, a plurality of black matrices 12 And an ink repellent layer 14. Each of the black matrices 12 has at least one ink storage tank 15, and the black 20 1356919 - color matrix 12 is arranged on the substrate 11 in an array. At the same time, the black matrix 12 array defines a plurality of sub-pixel regions 13a which expose portions of the substrate. Further, the color filter further includes a filter layer nb, and the filter layer 1 is disposed in the plurality of sub-halogen regions 13a. The filter layer 13b is formed in the sub-pixel regions 13a by up to five colored inks. On the other hand, the ink repellent layer 14 is formed on the black matrix 12 and repels the polarity of the colored ink, and the ink reservoir 15 can accommodate the overflow colored ink, so that the overflow of the colored ink can be effectively suppressed. In the present embodiment, the method of forming the filter layer 13b is an ink jet method. Further, the contact angle between the filter layer 13b and the ink repellent layer 14 is 10 to 60 degrees; the contact angle between the filter layer 13b and the substrate 11 is from 50 to 50 degrees. Since the ink overflows over the black matrix during the ink jet process of the conventional filter, the color eccentricity is easily caused. Therefore, the present invention provides a design in which the ink reservoir 15 is combined with the ink repellent layer 14 to prevent ink overflow. Prevent color shifts from occurring. 15 Embodiment 2 The color filter structure of this embodiment is substantially the same as that of Embodiment 1, but the bottom cross section of the ink reservoir 15 of the embodiment of the present embodiment is in the form of a wrong tooth, as shown in Fig. 7. The manufacturing method differs from that of the first embodiment in that the method of forming the ink storage tank 15 in the present embodiment utilizes a halftone mask exposure (half_t〇ne 20 exposure) to directly create an ink reservoir when the black matrix 12 is fabricated. 15, to simplify the process. Embodiment 3 The structure of the color light-emitting sheet of the present embodiment is substantially the same as that of Embodiment 1, but the ink-repellent layer 14 of the present embodiment has at least one oblique side as shown in FIG. The method of manufacturing 10 1356919 - the difference between the method and the embodiment 1 is that the ink repellent layer 14 of the present embodiment utilizes a yellow light lithography process. • Embodiment 4 • The color filter structure of this embodiment is substantially the same as that of Embodiment 1, but the ink repellent layer 14 of this embodiment has a trapezoidal cross section. As shown in Fig. 9, the manufacturing method is different from that of the first embodiment in that the formation of the ink repellent layer 14 of the present embodiment utilizes a yellow lithography process. In summary, the present invention provides a color filter and a manufacturing method thereof, wherein the design of the ink storage tank and the ink repellent layer can effectively suppress the overflow of the colored ink 10 to prevent color shift of the color filter. The above-described embodiments are merely examples for the convenience of the description, and the scope of the claims is intended to be limited by the scope of the claims. 15 BRIEF DESCRIPTION OF THE DRAWINGS Figures 1 to 5 are cross-sectional views of a color filter manufacturing process in accordance with a preferred embodiment of the present invention. Figure 6 is a top plan view of a black matrix of the preferred embodiment of the present invention. Figure 7 is a cross-sectional view of the black matrix of the Xiaojia embodiment of the present invention. 20 is a cross-sectional view of a black matrix of the preferred embodiment of the present invention. Figure 9 is a cross-sectional view of a black matrix of the preferred embodiment of the present invention. [Main component symbol description] 1356919 11 Substrate 12 Black matrix 13a sub-pixel area 13b Filter layer 14 Toluene layer 15 Ink tank 12