TWI346767B - Self referencing heterodyne reflectometer and heterodyne reflectometer for measuring thickness of a target layer deposed on a substrate - Google Patents

Self referencing heterodyne reflectometer and heterodyne reflectometer for measuring thickness of a target layer deposed on a substrate

Info

Publication number
TWI346767B
TWI346767B TW096136037A TW96136037A TWI346767B TW I346767 B TWI346767 B TW I346767B TW 096136037 A TW096136037 A TW 096136037A TW 96136037 A TW96136037 A TW 96136037A TW I346767 B TWI346767 B TW I346767B
Authority
TW
Taiwan
Prior art keywords
heterodyne reflectometer
substrate
target layer
measuring thickness
reflectometer
Prior art date
Application number
TW096136037A
Other languages
English (en)
Other versions
TW200837326A (en
Inventor
Ananth Aiyer Arun
A Meloni Mark
Original Assignee
Verity Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/528,732 external-priority patent/US7589843B2/en
Application filed by Verity Instr Inc filed Critical Verity Instr Inc
Publication of TW200837326A publication Critical patent/TW200837326A/zh
Application granted granted Critical
Publication of TWI346767B publication Critical patent/TWI346767B/zh

Links

TW096136037A 2006-09-27 2007-09-27 Self referencing heterodyne reflectometer and heterodyne reflectometer for measuring thickness of a target layer deposed on a substrate TWI346767B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/528,732 US7589843B2 (en) 2005-09-27 2006-09-27 Self referencing heterodyne reflectometer and method for implementing

Publications (2)

Publication Number Publication Date
TW200837326A TW200837326A (en) 2008-09-16
TWI346767B true TWI346767B (en) 2011-08-11

Family

ID=44839762

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096136037A TWI346767B (en) 2006-09-27 2007-09-27 Self referencing heterodyne reflectometer and heterodyne reflectometer for measuring thickness of a target layer deposed on a substrate

Country Status (1)

Country Link
TW (1) TWI346767B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI786094B (zh) * 2017-03-14 2022-12-11 柏林工業大學 進行時間解析干涉測量方法及裝置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI480513B (zh) * 2009-12-04 2015-04-11 Raydium Semiconductor Corp 光學同調斷層檢測裝置及其運作方法
CN115863204B (zh) * 2023-02-27 2023-06-02 青岛芯康半导体科技有限公司 晶片加工用在线厚度监视和测量方法及系统

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI786094B (zh) * 2017-03-14 2022-12-11 柏林工業大學 進行時間解析干涉測量方法及裝置

Also Published As

Publication number Publication date
TW200837326A (en) 2008-09-16

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