TWI344928B - Mask packing box and selection method of packing box material therefor - Google Patents
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1344928 勢 》 • 九、發明說明: 【發明所屬之技術領域】 本心月/歩及種光罩基底及光罩或標線片(Reticle)等半導體 製程之圖罩封裝用封裝盒及該封裝盒材料之選擇方法尤其是其 結構可以在使用捲帶進行封裝時減少盒内空氣移動分子污染的封 裝盒及其材料選擇方法。 该方法係一把空氣移動分子污染(AMC)的濃度控制在每單位 ♦體積5PPm以下的狀態,可以把單個或多個圖罩安全地加以包裝、 保官及搬運的圖罩用封裝盒及該封裝盒材料之選擇方法。 【先前技術】 隨着料體積體電路的高積體化,圖樣大小從n〇nm、9〇舰、 65nm —直到45nm等,其尺寸日漸呈現袖珍化的趨勢。 為了實現上述臨界尺寸(CD: Critical Dimension),需要使用高 參性能光罩(Photomask) ’為了製造高性能光罩,作為其原材料的光 罩基底(Blankmask)曰益突顯了其重要性。 - 一般來說,上述光罩基底從無塵室(Cleanroom)裡製程一直到 • 光罩製程為止’因保管與搬運的需要而被保存在封裳盒内。 為了在上述保管期間繼續維持光罩基底的高品質,不能因為 車輛運輸㈣脑、錢運輸巾賴力與氣溫變鱗外部衝擊及 環·化而_魏人上述縣幼,減少縣罩基底形成 致命缺陷的光罩基底封裝盒材料本身之污染物質。 5 封裝盒材料本身所發生的污染物質太多時,就會出現下列各 種問題。 首先’從光罩基底侧面看時,封裝盒材料發生的ΝΗ4+、α-、 F、Ν02·、Ν〇3-及s〇42-之類的離子雜質;含有苯、甲苯,苯乙稀, 乙苯,丁基化羥基曱苯(BHT)等芳香族碳化氫化合物的揮發性有 機化合物(VQC,Volatile Oganie Compound);含S各種金屬雜質1344928 势》 九 发明 发明 发明 发明 发明 发明 发明 发明 发明 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 The method of selecting the material, in particular, the package and the material selection method thereof, which can reduce the molecular pollution of air movement in the case when the package is used for packaging. The method is characterized in that a concentration of air moving molecular pollution (AMC) is controlled to be less than 5 ppm per unit volume, and a single or a plurality of masks can be safely packaged, secured and transported, and a packaging box for the mask. The method of selecting the material of the package. [Prior Art] With the high integration of the material volume circuit, the size of the pattern is from n〇nm, 9〇, 65nm to 45nm, etc., and its size is increasingly pocketed. In order to achieve the above critical dimension (CD: Critical Dimension), it is necessary to use a high-performance photomask (Photomask). In order to manufacture a high-performance photomask, the benefits of the mask mask as a raw material highlight its importance. - Generally, the mask base is stored in the clean room from the Cleanroom to the • Mask process. In order to continue to maintain the high quality of the reticle base during the above-mentioned storage period, it is not possible to transport the vehicle (4) brain, money transport towel, and the temperature and scale of the external impact and ringing. Contaminant material of the defective reticle base package material itself. 5 When there is too much pollutant in the package material itself, the following problems occur. First of all, when viewed from the side of the reticle base, ionic impurities such as ΝΗ4+, α-, F, Ν02·, Ν〇3- and s〇42- occur in the package material; containing benzene, toluene, styrene, B Volatile organic compound (VQC, Volatile Oganie Compound) of aromatic hydrocarbon compounds such as benzene, butylated hydroxybenzene (BHT);
Airborne Molecular Contamination) 與增幅型阻劑的成份進行結合,將引起增幅型阻劑壽命減少、靈 敏度降低之_增幅型阻麟性變化,進而降低光罩基底的特性。 此外,將是光罩基底成品的透明基板或者在透明基板上塗上 鉻膜的半成品加賴管後,再於透板上形祕縣者在絡膜 上塗布阻劑時,也能造成嚴重的問題。 把透明基板保管在空氣鶴分子污染财的封裝盒並形成絡 膜時,鉻膜與透明基板之間的減力將減弱或者空氣移動分子污 染物被吸附在透明基板上而出現缺陷,進而造成鉻膜不良。 把鉻膜保管在封裝盒後進行阻繼布作鱗,鉻膜的空氣移 動分子污染物被吸附在鉻膜表面而引起不均勻的表面能量變化, 無法在整體鉻膜表面上形成均勻_接力,進而造成缺陷。 如果使用增幅型_進行塗布,將在形成阻細樣時由於阻 劑殘留膜(Residue)的存在而造成嚴重缺陷。 然後在光糊©在查看時’將使肖遭受空氣飾分子污染物 1344928 / 鮮的光罩基錢树光_叔Μ •貼料鮮_,職上述«朗各觀對增加光罩的污 染情形。上述製針的污染與光罩基縣麵污㈣加重污染程 度,具有保護膜(Pellicle)的光單,即標線片(Retide)將在半導體製 程中的光微影製程歧原本不該存在的缺陷,上述缺陷被稱域 長性缺陷或霧狀(haze)缺陷。 上述缺陷轉生朗是光罩絲上存在的各種軒雜質、含 有揮發性械化合_线義分子污祕、以及驗半導體光 微影製程的193nm或248nm曝光波長雷射能量所引起的缺陷。上 述缺陷將對標線片造成致命缺陷,縮短標線片的壽命並降低半導 體的製造良率。 上述工氣移動分子污染所造成的缺陷不僅對光罩基底、光罩 及標線片有影響’還對晶圓保管容器、用於光微影術的步輯准 B 儀(stepper)及掃描儀造成嚴重問題。 除了上述以外’由於上述封褒盒的結構問題而在光罩基底的 存放過私中因人為操作失誤而造成的刮痕或粒子(p論⑹ 也會對光罩製造過程引起嚴重問題。 ,而且’上述封震盒把光罩基底裳進盒裡後,在蓋與機體之間 形成份離的部位使用捲帶進行密封。 <·••疋’現有域盒即使卿捲帶對光罩基底盒進行密封作業, 也會因為結構性的問題而無法完善地密封,導致外部空氣或雜質 1344928 進光罩基底封裝盒内部並造成光罩基底的污染現象。 如同封裝盒的空氣移動分子污染所造成關題—樣,適用於 封裝I密封作業祕帶所生成的空氣鑛分子污染也會 問題。 【發明内容】 為了解決上述問題,本發明的目的如下。 1 使用可以阻止外部空氣進入封裝盒内部的密封棒,避免 外部粒子進入内部,在光罩基底的移動或保管過程中不 會降低其品質,有助於製造品質良好的光罩。 2.把光罩基底裝入封裝倉後移動的過程中,光罩基底不會 進行移動,儘量減少了光罩基底與封裝盒之間的摩擦所 生成之粒子,可以有效地維持光罩基底的優異品質。 3·在本發明的封裝材料選擇方法中,可以使用 ATD-GC/MS及1C分析方法分析光罩基底封裳材料的 Outgas濃度,有助於選擇適合增幅型阻劑且不影響透 明基板與鉻膜表面特性的光罩基底封裝盒材料。 透過上述ATD-GC/MS、1C分析方法及pcd過程選擇 適合增幅型阻劑的光罩基底封裝材料並製成封裝盒後’ 將其適用於光罩基底的保管及搬運等作業時,可以製造 出Mas、MBs、MCs及MDs等AMC濃度較低的光罩 基底之封裝盒。 8 1344928 • 5·使用上述封裝盒’可以在光罩基底的保管與搬運過程中 料光罩基底H ’有利於高品f鮮的製造,進而 製造出適用於光罩或標線>URetide)用狱盒時不會發 生成長性缺陷的高品質光罩。 爲了實現上述目的,本發明的光罩封裝盒包括蓋、本體、卡 E及墊’本發明的鮮封裝盒内部可以承似㈣半導體製程用 圖罩,上述卡®呈上部開放的近似矩形狀,可以承載多個上述圖 •罩,上述本體呈上部開放的近似矩形狀,可以承載具有多個圖罩 的卡E並加簡定,具有可以在制捲帶進行密封健是進一步 提高密封程度_娜;上魅把上述_定在上述蓋内部後, 再與固定了上述卡匣的上述本體進行結合。 上述卡E具有上·放型結構,包括機體,由可以承載圖軍 的承載空間部與_組成;以及底面,與上述_成—體延伸並 可以支持所承載的鮮。沿着上述卡伽牆及其對向内牆 配置光罩基底槽,可以把光罩基底置於上述承載空間部的内部^ _ 加以承載,在上述卡g的機體⑽之上部侧面配置了往下延伸一 •定歸的卡防止條’上述计變形社條可从幅減少上 述卡E成料的變觀象’使上述卡g與本體結合時容易結合並 固定;上述卡_底面外㈣有卡E導執,可財上述切與本 體結合時儘量減少上述卡匣的移動。 上述本體呈上部開放型結構’包括機體,由可財载上述卡 9 1344928 • ㈣承載空m卩與⑽組成;以及底面,與上勒牆成—體延伸 並可以支持所承_卡®。為m止上述本體在成型時出現變形, 在上述内牆内側面配置了本體變形防止條;^了在上述本體與上 述卡E結合時方便其結合,在上述底面的上部形成了本體内側導 執’·上述本體内牆的外側面形成了本體鎖,可以和蓋的蓋鎖進行 結合併防止上述封裝盒分離;上述密封棒沿着上述内牆的外側面 並呈水付向配置’可以在雜合健後使用辭騎密封作業 •時進-步提高其密封性:上述底面的外側具有本體外側導執,沿 着垂直方向積層多個上述封I盒時,可與蓋上的蓋導執進行結合 以利於積層作業。 此外’上缝包括:墊HJ定槽,位於其兩端,可以把上述塾 結合/固定到上述蓋的墊固定架上;圖罩側面支持架與圖罩側面固 定部’可以支持並蚊上述鮮基底,面;較持架,在上述 墊與上述蓋結合的情形下再與上述本體進行結合時,可以針對施 •加在上述墊上的施力而增強其承受能力。 上述盍包括:多個料軌’位於上面外側,可以在上述光罩 基底盒的積層作業中提高其便利性;錢定架,位於上述蓋内部, 可以固定上述墊’·蓋變形防止條,可以在上述蓋的成型過程中儘 量減少上述蓋的變形;蓋鎖’位於上述蓋的側面,可以結合上述 本體與上述蓋。 【實施方式】 下面結合附圖對本發明的内容及實施例做進一步說明。首先, 1344928 * * .說明結構方面的特徵。圖1係卡Ε與本體結合之概略立體圖;圖 2a到2e係光罩基底封裝盒的卡邮崎)之概略立體圖;圖如 到3d係光罩基底封裝盒的本體(B〇dy)之概略立體圖;圖如到如 係光罩基底封裝盒的·_οη)之概略立體圖;圖5a到兄係本 發明只施例的光罩基底封裝盒的蓋之概略立體圖。 然而,本發明之申請專利範圍不限於下述實施例。譬如,本 說明書把封裝盒裡承載關罩限定為光罩基紐進行了說明但 •是下述封裝盒不僅適用於光罩基底,也可以適用於光罩、標線片一 _咖、晶圓及透明基板等需要在保管過程中防止其污毕的半導 體製_元件之承似絲騎。當然,鱗可以對縣盒組成 物之尺寸與形狀進行各種變化。 首先,結合圖1到圖3對本發明的卡匡與本體進行說明。 如圖i到圖2所示,卡E 300呈上部開放型結構,包括機體 310’由可以承載光罩基底的承載空間部3ιι與内牆祀组成.以 及底面汹’與上述内牆312成一體延伸並可以支持所承載的光罩 基底。 為了把多個光罩基底置於上述承载空間部3ιι的内部並加以 承載’沿着卡Μ 300的-側内牆及其對向内牆配置圖罩槽%。 在上述卡H 3⑻的機體内牆312之上部側面配置了 1少兩個 往下延伸-定距離的切變形防止條32,上述切變形防止條% 可以大幅減少上述卡E 成科的變形現象,使上述奸· 1344928 與本體結合時容易結合並固定。 上述卡匣的底面320外側具有多個卡匣導軌31,可以在上述 卡匣300與本體結合時儘量減少上述卡匣3〇〇的移動。 如圖1與圖3a到3d所示,本體2〇〇具有上部開放型結構, 包括機體210 ’由可以承載卡£ 3〇〇的承載空間部211與内牆犯 組成;以及底面220,與上述内牆212成一體延伸並可以支持所承 載的卡匣300。 為了防止上述本體200在成型時出現變形,在上述内牆22〇 内侧面的垂直方向配置本體變形防止條2〇。為了在上述本^ 2〇〇 與上述卡S 300結合時方便其結合,在上述底面的上部形成了本 體内側導軌21,上述本體200内牆的外側面形成了本體鎖22,可 以和蓋的蓋舰行結合伽止上述封裝盒分離。此時,為了提高 其與上述蓋之間的結合力,可以修改本體鎖的數值。 上述被封棒23可以在盒結合作業後進行的捲帶密封作業中進 :步提高其密雜。為了提高捲帶寬度的輕及密封功能,可以 增加或減少上述密封棒的寬度。 上述底面的外侧具有可以和蓋上的蓋導執進行結合的本體外 侧導軌24 ’輕着垂直方向獅多虹述_対賴高作 利性。 如圖4a到4d所示,塾400的尾端具有塾固定槽4〇,可以把 上述塾結合峨到蓋上的錢找。鱗,上雜卿f 40數量 12 不限於兩個,為了提高翻定功能,可以形成多健固定槽4〇。 此外’還包括:目罩側面支持架^與圖罩側面固定部42,可 以支持並固麵承载的上述圖罩之側面;墊支持架C,當上述塾 4〇〇結合在上述蓋陳態τ與上縣體進行結合時,可崎對施加 在上述墊上的施力而增強其承受能力。 如圖5a到5d所示,蓋⑽的上面具村以在多個上述圖罩 盒的積層作業中提高其便利性的多個蓋導執1〇,上述蓋的内部則 具有可以固定上述墊的墊固定架13。 此外’還應該包括蓋變形防止條n,可以在上述蓋丨⑻的成 型過程中儘量減少上職的變形。上述蓋i⑻_面具有蓋鎖Η, 可以在上述讀與上述蓋進行結合時大幅提高其結合力。此時, 考慮到鮮大小或雜上的差異,蓋的整體大小可以根據圖 罩大小而變化,尤其是蓋鎖12可以為了提高結合性而修改其尺寸。 為了使上述蓋防止光阻劑(ph〇t〇resist)被曝光㈣鍵)並允許 查看其内部_容物’上述蓋應使科透明色。此時,上述蓋的 顏色應使5GGnnmT波長的光之透射雜於·。 下面簡單说明具有上述結構的本發明封襄盒之結合過程。 如圖6所示’上述光罩基底61被裝入固定在上述本體内部的 切内。如圖7所示,附在上述墊上的上述蓋與收納了多個圖罩 、述本體進行I。合時,上述光罩基底將被收納在封裝盒娜裡。 如圖8所示,在收納了上述群基底的封裝盒上,把捲帶62貼到 13 上述本體上的密封棒及細—定部位,即可完成圖罩的密封作業, 把用於⑨封製㈣上述縣盒加轉f或移純, 罩基底之聽秘。 & ^ Λ 如别所述’上述實施例中把多個光罩基絲人光罩封裝盒裡 時只接顧罩的邊緣(edge)部位,儘量減少光罩基底與封裝盒:間 的接觸部位,因此最大限度地減少了鮮基底的損傷並降:了粒 子發生量。 把光罩基底裝入封裝盒後使用捲帶進行密封作業時,把本體 上的密封棒也-起輯帶包住,因此密娜度非料好,可以避 免外部空⑽紅,進祕止了外部粒子進人盒内部。 本體内部的本體變形防止條與卡S上的卡_騎止條可以 儘量減少本難卡E成麟__度,大幅增加本體與卡_ 合時的結合力並使卡_定在本體⑽,可以在计收納圖軍時 儘量減少卡匣的運動,㈣大幅減少鮮基底的内部移動。 透過蓋上的蓋鎖與配置在蓋上的塾大幅降低圖罩内部的移 動’極大限度地減少了由鮮基底與封裝盒之間的摩擦所生成的 粒子。 下面針對本發明封裝材料之特徵做進一步說明,該封裝材料 可以極大限度地減少由上述封裝盒構舶容所造成的空氣移動分 子污染。 首先,適用於上述封裝盒的蓋、本體、卡匣及墊等組成要素 之樹脂是導電性高分子物質或其表面電阻介於1G1到_ Ω/口。 適用於上述封裝盒之龍的空氣移動分子㈣濃度應低於 5ppmv ° 光罩基底關裝盒、光罩用封裝盒、晶闕封裝盒及封襄盒 密封用捲帶所域邮氣移動分子污染(AMQ之濃度應維持在每 早位體積低於5ppm的程度。 上述封裝盒所生成的空氣移動分子污染物質包括酸基性分子 (MAs= Molecular Acids)、鹽基性分子(MBs: Molecular Bases)、可 凝結分子(MCs: Molecular Condensables)及雜質分子(MDs : Molecular Dopants)。 上述封裝盒的材料是由聚苯乙烯(Polystyrene)、丙烯腈-笨乙浠 (AS : Acrylonitrile Styrene)、苯乙烯-氯化聚乙烯-丙烯(ACS : Acrylonitrile Chlorinated Polyethylene Styrene)、聚丙稀 (Polypropylene; PP)、烯烴(Olefin)、聚乙烯(Polyethylene; PE)、 聚碳酸酯(Polycarbonate ; PC)、發泡聚苯乙烯(Expanded Polystyrene; EPS)、發泡聚丙烯(EPP: Expanded Polypropylene)、 聚對笨二甲酸二醇醋(PBT: Polybutylene Terephthalate)、丙烯腈-丁二稀-苯乙稀(ABS: Acrylonitrile Butadiene Styrene)、聚氯乙稀 (PVC: Polyvinyl Chloride)、聚偏二氯乙烯(PVDC: Polyvinyldene Chloride)、亞克力(Acrylic)、聚乙烯對苯二曱酸酯(PET : Polyethylene Terephthalate)、抗靜電聚乙稀對苯二甲酸醋(APET: 1344928Airborne Molecular Contamination), combined with the composition of the amplified resist, will result in a decrease in the lifetime of the amplified resist and a decrease in sensitivity, which will reduce the characteristics of the reticle substrate. In addition, it will be a transparent substrate of the finished reticle substrate or a semi-finished galvanized tube coated with a chrome film on the transparent substrate, and then it can cause serious problems when the coating agent on the permeable plate is coated with a resist on the lapped film. . When the transparent substrate is stored in a package box of air crane molecular pollution and a film is formed, the force reduction between the chromium film and the transparent substrate is weakened or the air moving molecular contaminants are adsorbed on the transparent substrate to cause defects, thereby causing chromium Bad membrane. After the chromium film is stored in the package, the film is blocked, and the air-moving molecular pollutants of the chromium film are adsorbed on the surface of the chromium film to cause uneven surface energy changes, and a uniform _ relay cannot be formed on the surface of the entire chrome film. In turn, it causes defects. If the use of the amplitude-type coating is carried out, serious defects will be caused due to the presence of the resist residual film (Residue) in the formation of the barrier sample. Then in the light paste © when viewing 'will make Xiao suffer from air decoration molecular pollutants 1344928 / fresh reticle base money tree light _ uncle Μ 贴 贴 贴 贴 贴 贴 职 职 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述 上述. The pollution of the above-mentioned needles and the pollution of the reticle base county (4) increase the degree of pollution, and the light sheet with the protective film (Pellicle), that is, the reticle film (Retide) will not exist in the photolithography process in the semiconductor process. Defects, the above defects are referred to as domain length defects or haze defects. The above-mentioned defect reincarnation is a defect caused by various x-ray impurities present on the mask yarn, containing the volatile mechanical compounding, and the 193 nm or 248 nm exposure wavelength laser energy of the semiconductor photolithography process. The above defects will cause fatal defects to the reticle, shorten the life of the reticle and reduce the manufacturing yield of the semiconductor. The above-mentioned defects caused by the movement of the mobile gas molecules not only affect the reticle base, the reticle and the reticle, but also the wafer storage container, the stepper for the photolithography, and the scanner. Cause serious problems. In addition to the above, 'scratches or particles caused by human error in the storage of the reticle base due to the structural problems of the above-mentioned sealing box (p) (6) may also cause serious problems in the reticle manufacturing process. 'The above-mentioned sealed box puts the base of the reticle into the box, and seals the part between the cover and the body with a tape. < lt;·••疋's existing field box even if the tape is attached to the reticle base The sealing operation of the cartridge may also fail to be perfectly sealed due to structural problems, resulting in external air or impurities 1344928 entering the inside of the reticle base package and causing contamination of the reticle substrate. Regarding the title, the air mineral molecular pollution generated by the sealing tape for the package I can also be problematic. SUMMARY OF THE INVENTION In order to solve the above problems, the object of the present invention is as follows: 1 Use to prevent outside air from entering the inside of the package. The sealing rod prevents external particles from entering the interior, and does not degrade its quality during the movement or storage of the reticle base, contributing to good manufacturing quality. The reticle 2. The reticle substrate does not move during the movement of the reticle substrate into the package, and the particles generated by the friction between the reticle substrate and the package are minimized, which can be effectively maintained. Excellent quality of the mask base. 3. In the method of selecting the packaging material of the present invention, the Outgas concentration of the mask base material can be analyzed by using ATD-GC/MS and 1C analysis methods, which is helpful for selecting an appropriate type of resist. The reticle base package material does not affect the surface characteristics of the transparent substrate and the chrome film. After the above-mentioned ATD-GC/MS, 1C analysis method and pcd process are selected, the reticle base package material suitable for the amplitude-increasing resist is selected and made into a package box. When it is applied to the storage and transportation of the mask base, it is possible to manufacture a package of a mask base having a low AMC concentration such as Mas, MBs, MCs, and MDs. 8 1344928 • 5· Using the above package can be used in In the process of storage and transportation of the mask base, the reticle base H' is advantageous for the manufacture of high-quality products, and further produces a high defect that does not occur in the use of a retort or a retort for the Uretide. Quality mask. In order to achieve the above object, the photomask encapsulation box of the present invention comprises a cover, a body, a card E and a pad. The inside of the fresh package of the present invention can be similar to the (4) semiconductor process mask, and the card® has an approximately rectangular shape with an upper opening. The utility model can carry a plurality of the above-mentioned figures and covers, the above-mentioned body has an approximately rectangular shape with an upper open portion, can carry a card E having a plurality of masks and is simplified, and has a sealing function in the winding tape to further improve the sealing degree. After the above-mentioned _ is placed inside the cover, the upper body is coupled to the main body to which the cassette is fixed. The card E has an upper and a lower type structure, and includes a body, which is composed of a bearing space portion and a _ which can carry the figure army; and a bottom surface which extends with the above-mentioned body and can support the carried fresh. The reticle base groove is disposed along the card wall and the opposite inner wall, and the reticle base can be placed inside the bearing space portion, and the upper side of the body (10) of the card g is disposed downward. Extending the card settlement bar of the above-mentioned method, the above-mentioned card deformation strip can reduce the above-mentioned card E material from changing the image, and the card g is easy to be combined and fixed when the card g is combined with the body; the card_outside (four) has a card E guide, you can minimize the movement of the above mentioned cassette when combined with the body. The upper body has an upper open structure ‘including a body, which is composed of the above-mentioned card 9 1344928 • (4) carrying empty m卩 and (10); and a bottom surface extending integrally with the upper wall and supporting the _ card®. In order to prevent the body from being deformed during molding, a body deformation preventing strip is disposed on the inner side surface of the inner wall; and the body is conveniently combined with the card E, and the inner side guide is formed on the upper portion of the bottom surface. 'The above-mentioned inner wall of the inner wall forms a body lock, which can be combined with the cover lock of the cover to prevent the above-mentioned package from being separated; the sealing rod is disposed along the outer side of the inner wall and is in a water-paying configuration. After the joint use, the seal is used to seal the work. The seal is improved by the step-by-step method: the outer side of the bottom surface has a body outer guide, and when a plurality of the above-mentioned packs are stacked in the vertical direction, the cover can be guided with the cover. Combined to facilitate the lamination work. In addition, the upper seam includes: a pad HJ fixed groove at both ends thereof, which can be combined/fixed to the pad holder of the above cover; the side support frame of the cover and the side fixing portion of the cover can support the mosquito The substrate, the surface, and the holder, when the pad is combined with the cover, can be combined with the body to enhance the bearing capacity of the pad. The above-mentioned crucible includes: a plurality of tracks 'located on the outer side of the upper side, which can improve the convenience in the laminating operation of the reticle base case; the money fixing frame is located inside the cover, and the pad '· cover deformation preventing strip can be fixed, and The deformation of the cover is minimized during the molding process of the cover; the cover lock 'is located on the side of the cover, and the body and the cover may be combined. [Embodiment] The contents and embodiments of the present invention will be further described below with reference to the accompanying drawings. First, 1344928 * * . Explains the structural aspects. 1 is a schematic perspective view showing a combination of a cassette and a body; FIGS. 2a to 2e are schematic perspective views of a card stencil of a reticle base package; and FIG. 3 is a schematic view of a body of a 3D reticle base package (B〇dy). 3A is a schematic perspective view of a cover of a reticle base package of the present invention. FIG. 5a is a schematic perspective view of a cover of a reticle base package of the present invention. However, the scope of the patent application of the present invention is not limited to the following embodiments. For example, this manual defines the carrier cover in the package as a reticle base. However, the following package is not only suitable for the reticle substrate, but also for the reticle, the reticle, the wafer, and the wafer. And a transparent substrate or the like, which is required to prevent the contamination of the semiconductor device during the storage process. Of course, scales can make various changes to the size and shape of the county box composition. First, the cassette and the body of the present invention will be described with reference to Figs. 1 to 3. As shown in FIG. 2 to FIG. 2, the card E 300 has an upper open structure, and the body 310' is composed of a bearing space portion 3 ιι which can carry the reticle base and the inner wall ., and the bottom surface 汹 is integrated with the inner wall 312. Extends and can support the reticle substrate carried. In order to place a plurality of reticle substrates inside the above-mentioned load-bearing space portion 3, and to carry ‘the inner wall of the side wall of the cassette 300 and its facing inner wall are arranged with the cover groove %. On the upper side surface of the inner wall 312 of the card H 3 (8), there are arranged two less than a fixed distance-cutting deformation preventing strip 32, and the above-mentioned cutting deformation preventing strip % can greatly reduce the deformation phenomenon of the above-mentioned card E. It is easy to combine and fix the above-mentioned traits 1344928 when combined with the body. The outer side of the bottom surface 320 of the cassette has a plurality of cassette guides 31, which can minimize the movement of the cassettes 3 when the cassette 300 is coupled to the body. As shown in FIG. 1 and FIGS. 3a to 3d, the body 2 has an upper open structure, and the body 210' is composed of a bearing space portion 211 capable of carrying a card and an inner wall; and a bottom surface 220, and the above The inner wall 212 extends integrally and can support the cassette 300 carried. In order to prevent deformation of the main body 200 during molding, the main body deformation preventing strip 2 is disposed in the vertical direction of the inner side surface of the inner wall 22A. In order to facilitate the combination of the above-mentioned card and the card S 300, the inner side rail 21 is formed on the upper portion of the bottom surface, and the outer side surface of the inner wall of the body 200 forms the body lock 22, which can be covered with the cover. The ship line combines with the gantry to separate the above package. At this time, in order to increase the bonding force with the above cover, the value of the body lock can be modified. The above-mentioned sealed rod 23 can be stepped up in the tape sealing operation performed after the cartridge joining operation to increase the density. In order to increase the lightness and sealing function of the tape width, the width of the above sealing bar can be increased or decreased. The outer side of the bottom surface has a body side rail 24 ′ which can be combined with the lid guide on the cover, and the vertical direction of the lion is high. As shown in Figs. 4a to 4d, the end of the crucible 400 has a crucible fixing groove 4, which can be used to combine the above-mentioned crucibles with the money. Scale, the number of the upper miscellaneous f 40 is not limited to two, in order to improve the turning function, a multi-fixing groove 4 can be formed. In addition, the method further includes: a cover side support frame and a cover side fixing portion 42, which can support the side surface of the above-mentioned cover which is carried by the solid surface; the pad support frame C, when the above-mentioned 塾4〇〇 is combined with the cover τ When combined with the upper body, it can enhance the bearing capacity by applying force to the pad. As shown in FIGS. 5a to 5d, the upper mask village of the cover (10) has a plurality of cover guides for improving the convenience in the lamination operation of the plurality of the cover boxes, and the inside of the cover has a cover for fixing the pads. Pad holder 13. In addition, the cover deformation preventing strip n should be included, and the deformation of the upper position can be minimized during the molding process of the above-mentioned cover (8). The lid i(8)_ surface has a lid lock, and the joint force can be greatly improved when the above reading is combined with the lid. At this time, considering the difference in the size or the miscellaneous size, the overall size of the cover may vary depending on the size of the cover, and in particular, the cover lock 12 may be modified in size in order to improve the bonding. In order to prevent the above-mentioned cover from being exposed to the photoresist (four) key and to allow viewing of its internal contents, the above cover should be transparent. At this time, the color of the above-mentioned cover should be such that the transmission of light of a wavelength of 5 GGn nm is mixed. The bonding process of the present invention having the above structure will be briefly described below. As shown in Fig. 6, the above-mentioned mask substrate 61 is housed in a cut fixed to the inside of the body. As shown in Fig. 7, the cover attached to the pad is placed in a plurality of masks and the body is placed to perform I. At the same time, the above-mentioned reticle base will be stored in the package box. As shown in FIG. 8, on the package box in which the group base is accommodated, the tape 62 is attached to the sealing rod and the thin-fixed portion of the body, and the sealing operation of the mask is completed. System (4) The above county box is added to f or pure, and the base of the cover is secret. & ^ Λ As described above, in the above embodiment, when multiple reticle base reticle encapsulation boxes are used, only the edge portion of the hood is received, and the contact between the reticle substrate and the package is minimized. The location, thus minimizing damage to the fresh substrate and reducing the amount of particles generated. When the reticle base is placed in the package and the tape is used for sealing work, the sealing rod on the main body is also wrapped up, so the density is not good, and the outer space (10) red can be avoided. The external particles enter the inside of the box. The body deformation preventing strip inside the body and the card on the card S_riding the bar can minimize the difficulty of the card E into a __ degree, greatly increasing the bonding force between the body and the card _ and making the card _ in the body (10), It is possible to minimize the movement of the cassette during the storage of the figure, and (4) to greatly reduce the internal movement of the fresh substrate. The movement of the inside of the mask is greatly reduced by the lid lock on the lid and the crucible disposed on the lid, which greatly reduces the particles generated by the friction between the fresh substrate and the package. Further description will be made on the characteristics of the encapsulating material of the present invention, which can greatly reduce the air mobile molecular pollution caused by the above-mentioned package. First, the resin suitable for the components such as the lid, the body, the cassette, and the mat of the above-mentioned package is a conductive polymer substance or its surface resistance is 1 G1 to _ Ω / port. The air moving molecules (4) suitable for the above packaged box should be less than 5ppmv °. The mask base box, the mask package, the wafer package and the sealing tape are sealed. (The concentration of AMQ should be maintained at a level of less than 5 ppm per morning. The air-moving molecular pollutants generated by the above package include acid-based molecules (MAs = Molecular Acids) and salt-based molecules (MBs: Molecular Bases). , condensable molecules (MCs: Molecular Condensables) and impurity molecules (MDs: Molecular Dopants). The above package is made of polystyrene, acrylonitrile-stirrene, styrene- ACS: Acrylonitrile Chlorinated Polyethylene Styrene, Polypropylene (PP), Olefin (Olefin), Polyethylene (PE), Polycarbonate (PC), Expanded Polystyrene (Expanded Polystyrene; EPS), expanded polypropylene (EPP: Expanded Polypropylene), polybutylene terephthalate (PBT), acrylonitrile-butadiene-styrene ( ABS: Acrylonitrile Butadiene Styrene), PVC: Polyvinyl Chloride, PVDC: Polyvinyldene Chloride, Acrylic, Polyethylene Terephthalate Antistatic polyethylene terephthalate vinegar (APET: 1344928
Antistatic Polyethylene Terephthalate)、曰本 KUREHA 公司的 B AYON係列所組成的群中選擇一種或兩種以上物質後加以混合 而成的高分子合成樹脂。此時,上述高分子合成樹脂可以選擇性 地進行抗氧化及抗靜電處理。 在上述封裝盒中所發生的空氣移動分子污染物中,含氮(N)的 污染物質或芳香族碳化氫化合物的總量維持在每單位體積低於 5ppm的程度。 此時,上述芳香族碳化氫化合物是由苯(Benzene)、甲苯 (Toluene)、苯乙烯(Styrene)、乙苯(Ethylbenzene)、鄰二曱苯 (o-Xylene)、間二甲苯(m-Xyiene)、對二甲苯(p-Xyiene)、丙基笨 (n-Propylbenzene)、異丙苯(Isopropylbenzene)、1,2,4-三甲基苯 (1,2,4-Trimethylbenzene)、1,3,5-三甲基苯(l,3,5-Trimeth-ylbenzene) 、鄰乙基甲笨(o-ethyltoluene)、間乙基曱苯(m-ethyltoluene)、間-二 乙基苯(o-diethylbenzene)、笨-間-二乙基苯(mdiethylbenzene)、二乙 基苯(p-diethylbenzene)、正丁基苯(n-butylbenzene)及丁基化經基甲 笨(BHT: Butylated Hydroxy Toluene)戶斤組成的群中選擇一種或兩 種以上物質後加以混合而成的。 在上述封裝盒中所發生的空氣移動分子污染物中,在硫化合 物、乙醇類、乙醛類、酮類、脂肪酸類,酯類、胺類、脂肪族飽和 碳化氫類、脂肪族不飽和碳化氫類、氯與氯化合物及芳香族碳化 氫類中選擇一種或兩種以上物質混合後的濃度維持在每單位體積 16 1344928 低於5ppm的程度。 在上述封裝盒中所發生的空氣移動分子污染物中,在Li+、 Na、NH4+、K+、Mg+、Ca+、F-、Cl-、N〇2、Br' NO3、PO42 及SO42-中選擇一種或兩種以上物質混合後的濃度維持在每單位 體積低於5ppm的程度。 在封裝光罩基底時構成光罩基底的阻劑膜是由增幅型阻劑、 光阻劑及電子束阻劑組成的。如前所述,本發明的蓋、本體、卡 S及墊所使用的樹脂(resin)通常使用PP、PC、PE、HDPE、LDPE、 PET、〇lefin、BAY0N series、ABS、及 Acryl 等材料,此時,所 適用樹脂的空氣移動分子污染之濃度應低於5ppmv。 為了防止粒子或雜質受靜電影響而吸附在所適用的樹脂上, 應選擇導電性高分子材料或面電阻(sheet resistance)介於1〇卜1〇13 Ω/Ο範圍的樹脂。 為了儘量減少污染物質而使用上述選定的封裝材料時,就能 維持所承載圖罩的特性。 下面說明本發明的光罩基底封裴盒材料之選擇方法。 選擇方法如下:步驟一,選擇可以從溫度、濕度、壓力、光、 熱及波長科领物理•化學變化巾絲鮮基底的封裝盒材料 ,步驟一,使用氣相層析儀/質譜儀: Gas Chromatograph/Mass Spectr〇meter)及離子層析儀(ic : hAntistatic Polyethylene Terephthalate) A polymer synthetic resin obtained by mixing one or two or more substances from the group consisting of KUREHA's B AYON series. In this case, the above polymer synthetic resin can be selectively subjected to oxidation resistance and antistatic treatment. In the air moving molecular contaminants occurring in the above package, the total amount of nitrogen (N)-containing pollutants or aromatic hydrocarbon compounds is maintained at a level of less than 5 ppm per unit volume. In this case, the above aromatic hydrocarbon compound is composed of Benzene, Toluene, Styrene, Ethylbenzene, o-Xylene, and m-Xyiene. ), p-Xyiene, n-Propylbenzene, Isopropylbenzene, 1,2,4-Trimethylbenzene, 1,3 ,5-Trimeth-ylbenzene, o-ethyltoluene, m-ethyltoluene, m-ethylbenzene (o- Diethylbenzene), mdiethylbenzene, p-diethylbenzene, n-butylbenzene, and butylated hydroxy Toluene One or two or more substances are selected from the group consisting of jin and mixed. Among the air moving molecular pollutants occurring in the above package, sulfur compounds, alcohols, aldehydes, ketones, fatty acids, esters, amines, aliphatic saturated hydrocarbons, aliphatic unsaturated carbonization The concentration of one or more selected from the group consisting of hydrogen, chlorine, chlorine compounds and aromatic hydrocarbons is maintained at a level of less than 5 ppm per unit volume of 16 1344928. Among the air moving molecular pollutants occurring in the above package, one of Li+, Na, NH4+, K+, Mg+, Ca+, F-, Cl-, N〇2, Br'NO3, PO42 and SO42- is selected or The concentration after mixing two or more substances is maintained to a level of less than 5 ppm per unit volume. The resist film constituting the reticle base when the reticle substrate is packaged is composed of an amplification resist, a photoresist, and an electron beam resist. As described above, the resin used for the lid, the body, the card S and the mat of the present invention is usually made of PP, PC, PE, HDPE, LDPE, PET, 〇lefin, BAY0N series, ABS, and Acryl. At this time, the concentration of air moving molecular contamination of the applied resin should be less than 5 ppmv. In order to prevent particles or impurities from being adsorbed on the applicable resin by the influence of static electricity, a conductive polymer material or a resin having a sheet resistance of 1 〇 13 Ω/Ο should be selected. In order to minimize the pollutants and use the above selected packaging materials, the characteristics of the carried mask can be maintained. Next, a method of selecting a mask base sealing material of the present invention will be described. The selection method is as follows: Step one, select the package material which can be used for the physical and chemical change of the silk fresh base from temperature, humidity, pressure, light, heat and wavelength. Step one, use gas chromatograph/mass spectrometer: Gas Chromatograph/Mass Spectr〇meter) and ion chromatograph (ic : h
Chro喊卿h)分析以奴㈣㈣祕f ;⑽使用上述氣 17 相層析儀/質麵進行分㈣,污__採樣方法和在吹氣捕 捉(P&T· Purge and Trap)、自動熱脫附(勘杨matic ThermaiChro shouted qing h) analysis of slaves (four) (four) secret f; (10) using the above gas 17 phase chromatograph / texture to divide (four), sewage __ sampling method and in the air capture (P & T · Purge and Trap), automatic heat Desorption (Jian Yang matic Thermai
Des〇lpti〇n) ^^^(TD: Thermal Desorption)^ Tl.^(Headspace) 中選擇一種以上的方法後進行採樣。 使用上述氣相層析儀/f譜儀進行分析時,先把分析對象材料 的樣本裝人㈣的瓶裡後,在f溫或·以下的溫度進行敎處 m 〇 .、 使用上述離子層析儀進行分析時,先把分析對象材料的樣本 與超純水-域人㈣的餘後,在23。门⑽。⑶溫度下進行孰 處理。 μ 明 下面針對本發明的光罩基底封裝材料之選擇方法做進一 步說 首先,準備封裝盒之材料’該封裝盒包括蓋·、本體、 卡H 3〇0及塾4〇〇 ’可以收納含有阻劑膜(未圖示)的光罩基底。 上述封裳金500的材料主要使用高分子合成樹脂上述高分 ^合成樹脂可以包括聚苯乙稀、丙齡苯乙烯、丙烯腈·氯化聚乙 晞-苯乙烯塑料、聚丙稀、烯烴、聚乙烯、聚碳酸醋、發泡聚苯乙 烯毛泡聚丙烯、聚對苯二甲酸二醇醋、丙稀猜-丁二稀-苯乙稀、 4乙稀、聚偏二氯乙烯、亞克力、聚乙騎苯二甲酸g旨、抗靜 電聚乙稀對苯二甲酸醋、日本KUREHA公司的ΒΑγ〇Ν係列等。 此時’上述高分子合成概可崎擇性地進行抗氧化及抗靜電處 1344928 理。 此日守’上述封裝盒應該選擇可以從溫度、濕度、壓力、光、 熱及波長等料的物理•化學變化巾保護光罩基底的材料。更具 體地《兒’封裝材料應該選擇可以包裳光罩基底的乙烯(却)、金屬 及合成樹脂特料。為了防止承載鮮基底_部及其外部出現 空氣流動’上述魏材料使躲合㈣A賴法。上述封裝材料 還可以把影響光阻劑(Photoresist)的波長加以反射或吸收。 然後,利用氣相層析儀/質譜儀及離子層析儀分析上述選定材 料的污染物質。 使用上述層析/質譜儀進行分析時,污染物質的採樣可以在吹 氣捕捉、自動熱脫附、熱脫附及頂空法中選擇一種或兩種以上的 方法後進行。 上述污染物質指的是世界半導體設備材料協會(SEMI:Des〇lpti〇n) ^^^(TD: Thermal Desorption)^ Tl.^(Headspace) Select one or more methods and then sample. When the analysis is carried out using the above gas chromatograph/f spectrometer, the sample of the analysis target material is first placed in a bottle of (4), and then the temperature at f temperature or below is carried out at a temperature of m 〇. When the instrument is analyzed, first sample the material of the analysis object and the ultrapure water-domain person (four) after the remainder, at 23. Door (10). (3) 孰 treatment at temperature. The following is a description of the method for selecting the reticle base encapsulating material of the present invention. First, the material of the package is prepared. The package includes a cover, a body, and a card H 3 〇 0 and 塾 4 〇〇 ' A mask substrate of a film (not shown). The material of the above-mentioned Fengshangjin 500 mainly uses a polymer synthetic resin. The above high-score synthetic resin may include polystyrene, butyl styrene, acrylonitrile, chlorinated polyethylene-styrene plastic, polypropylene, olefin, poly Ethylene, polycarbonate, expanded polystyrene foam, polybutylene terephthalate, propylene guess-butadiene-styrene, 4 ethylene, polyvinylidene chloride, acrylic, poly B. phthalic acid, antistatic polyethylene phthalic acid vinegar, Japan KUREHA ΒΑ 〇Ν 〇Ν series. At this time, the above-mentioned polymer synthesis can be carried out in an anti-oxidation and antistatic place. The above-mentioned package should be selected to protect the material of the reticle substrate from physical/chemical change towels of temperature, humidity, pressure, light, heat and wavelength. More specifically, the "child" packaging material should be selected from the vinyl (but), metal and synthetic resin materials that can be used to cover the base of the mask. In order to prevent the occurrence of air flow in the fresh base _ part and its exterior, the above-mentioned Wei material makes it easy to escape (4) A. The above encapsulating material can also reflect or absorb the wavelength that affects the photoresist. Then, the contaminants of the selected materials were analyzed by a gas chromatograph/mass spectrometer and an ion chromatograph. When the above chromatographic/mass spectrometer is used for the analysis, the sampling of the pollutants can be carried out by selecting one or two or more methods in the air blowing trap, the automatic thermal desorption, the thermal desorption, and the headspace method. The above pollutants refer to the World Semiconductor Equipment Materials Association (SEMI:
Semiconductor Equipment and Materials International)之 SEMI F21-951所定義的空氣分子污染,AMC的分類包括酸基性分子 (Mas: Molecular Acids)、鹽基性分子(MBs: Molecular Bases)、可 凝結分子(MCs: Molecular Condensables)及雜質分子(mds :Air Equipment Contamination as defined by SEMI F21-951 by Semiconductor Equipment and Materials International, AMC classification includes: Mas: Molecular Acids, Salt-Based Molecular Bases (MBs: Molecular Bases), Condensable Molecules (MCs: Molecular Condensables) and impurity molecules (mds:
Molecular Dopants)。透過上述1C法分析上述分析對象材料時,把 它放進可以收納樣本的密封瓶裡後加入超純水,然後在23°c~3〇〇 C的溫度範圍内進行熱處理並使污染物質從超純水中脫離出來。 對於透過上述過程清除了離子雜質的超純水,使用IC分析器分析 19 離伟質、。鱗’如果把樣核物髓,可灿整個樣本放 進在封瓶裡,也可以把樣本分割成所需大小後放進密封瓶裡。 使用上述層析/質譜儀進行分析時,把分析對象材料的樣本放 進密封瓶裡後,在23。门⑻。⑶溫度關_行熱處理。埶處理 完畢後’使时附管之類紅具吸附密封瓶裡的揮發性有機化合 物。使用熱脫附裝置使吸附了揮發性有機化合物的吸附管⑽e) 裡的揮發性有航合物麟,紐使用Gc/Ms裝置分析揮發性有 機化合物。和1C樣本-樣,可灿整個樣本放進密趣裡,也可 以把樣本分割成所需大小後放進密封瓶裡。 經過上述過程後’就能選定適用於封裝盒的材料。 下面對光罩基底封裝盒材料之選擇方法的一實施例進行說 明。 本實施例的分析材料包括PP、PC、ABS、pvc、〇lefin、PE、 PET、EPP 及 Acrylic。 首先,在進行離子雜質分析作業之前,先進行下列前處理。 把各樣本裁減成lcmxlcmxl mm大小的矩形小塊,把5g的分析樣 本放進具有250ml容量的分析瓶裡,然後把2〇ml的超純水填入分 析瓶内。使用高壓滅菌器(autoclave)對填入了 2〇ml超純水的分析 瓶在120°C溫度下加熱20分鐘。使用1C儀器對加熱後清除了離子 的超純水進行分析。 分析揮發性有機化合物時,和1C分析法一樣,把樣本裁減成 1344928 lcmxlcmxl mm大小的矩形小塊’把5g的分析樣本放進具有250ml 谷量的分析瓶裡’然後使用鍋爐(〇ven)在85。〇溫度下加熱6〇分鐘。 使用真空粟把加熱瓶裡的揮發性有機化合物吸附到吸附管 (Tube)上。使用熱脫附裝置把吸附在吸附管上的揮發性有機化合物 加以熱脫附’絲 GOMS裝置分析揮發性錢化合物。此時, 以正十六烷(hexadecane)為基準進行了定量分板。Molecular Dopants). When the above-mentioned analysis target material is analyzed by the above 1C method, it is placed in a sealed bottle in which the sample can be stored, and then ultrapure water is added, and then heat treatment is performed in a temperature range of 23 ° C to 3 ° C to make the pollutants super Get rid of pure water. For the ultrapure water from which the ionic impurities were removed by the above process, an IC analyzer was used to analyze the ultrafine water. Scales If the core of the sample is placed in the sealed bottle, the sample can be divided into the required size and placed in a sealed bottle. When the analysis is carried out using the above chromatograph/mass spectrometer, a sample of the material to be analyzed is placed in a sealed bottle, at 23. Door (8). (3) Temperature off _ line heat treatment. After the treatment, the red plastic in the sealed bottle is adsorbed in a red tube. The volatility in the adsorption tube (10)e) to which the volatile organic compound was adsorbed was determined by using a thermal desorption device, and the volatile organic compound was analyzed using a Gc/Ms apparatus. In the same sample as the 1C sample, the entire sample can be placed in the secret, or the sample can be divided into the required size and placed in a sealed bottle. After the above process, the material suitable for the package can be selected. An embodiment of a method of selecting a material for a reticle base package will now be described. The analytical materials of this example include PP, PC, ABS, pvc, 〇lefin, PE, PET, EPP, and Acrylic. First, perform the following pre-treatment before performing the ion impurity analysis. Each sample was cut into rectangular pieces of lcmxlcmxl mm size, and 5 g of the analysis sample was placed in an analysis bottle having a capacity of 250 ml, and then 2 ml of ultrapure water was filled into the analysis bottle. An analytical flask filled with 2 〇 ml of ultrapure water was heated at 120 ° C for 20 minutes using an autoclave. The ultrapure water from which ions were removed after heating was analyzed using a 1C instrument. When analyzing volatile organic compounds, as in the 1C analysis, the sample was cut into rectangular pieces of 1344928 lcm x lcm x l mm 'put the 5 g sample into the analysis bottle with 250 ml of grain' and then use the boiler (〇ven) 85. Heat at 〇 for 6 〇 minutes. The volatile organic compounds in the heating flask are adsorbed onto the adsorption tube using vacuum millet. The volatile organic compounds adsorbed on the adsorption tube were thermally desorbed using a thermal desorption device to analyze the volatile money compounds. At this time, the quantitative fractionation was carried out based on hexadecane.
(表1) 陽離子分析結果 (單位:ppmv) F- Cl- N〇2- NO PP 0.8 1.2 0.0 ----- 0.6 PC 0.0 0.4 0.2 0.0 ABS 0.7 13 02 ---- 0.4 PVC 0.5 0.8 0.4 0.0 Olefin 0.1 0.6 0.0 ---— 0.0 PE 0.7 0.3 0.4 PET 0.1 0.0 0.0 o.l (表2)陰離子分析結果 一 P〇42- S〇42- Total 0.7 1.7 5.2 0.0 0.3 0.9 0.0 0.9 3.5 0.4 0.7 3.0 0.4 0.3 1.4 0.2 0.7 2.4 0.0 0.2 0.4 21 1344928 (單位:ppmv) Aromatic Hydrocarbon 其它 總voc —pp 1.5 2.3 3.8 PC 0.3 0.5 0.8 ABS 2.7 3.5 6.2 PVC 1.5 1 2.5 Olefin 0.5 0.9 1.4 PE 0.7 1.4 2.1 PET 0.8 1.5 2.3(Table 1) Results of cation analysis (unit: ppmv) F- Cl- N〇2- NO PP 0.8 1.2 0.0 ----- 0.6 PC 0.0 0.4 0.2 0.0 ABS 0.7 13 02 ---- 0.4 PVC 0.5 0.8 0.4 0.0 Olefin 0.1 0.6 0.0 ---— 0.0 PE 0.7 0.3 0.4 PET 0.1 0.0 0.0 ol (Table 2) Anion analysis results - P〇42- S〇42- Total 0.7 1.7 5.2 0.0 0.3 0.9 0.0 0.9 3.5 0.4 0.7 3.0 0.4 0.3 1.4 0.2 0.7 2.4 0.0 0.2 0.4 21 1344928 (unit: ppmv) Aromatic Hydrocarbon Other total voc — pp 1.5 2.3 3.8 PC 0.3 0.5 0.8 ABS 2.7 3.5 6.2 PVC 1.5 1 2.5 Olefin 0.5 0.9 1.4 PE 0.7 1.4 2.1 PET 0.8 1.5 2.3
(表3)揮發性有機化合物分析結果 (單位:ppmv) PP 空氣移動分子污染濃度 15.4(Table 3) Analysis results of volatile organic compounds (unit: ppmv) PP Air mobile molecular pollution concentration 15.4
(表4)空氣移動分子污染濃度 述表表2及表3分別是陽離子、陰離子及揮發性有機化 合物的分析結果’圖9是的揮發性有機化合物分析細〇細 分出了表1、表2及表3的結果值相加之後的空氣移動 七種盒的各 22 1344928 蓋、本體、卡匣及墊一律使用了同一材料。 在光罩基底封裝盒裡保管增幅型阻劑3個月後,針對增幅型 阻劑進行了性能評估。 性能評估結果’使用空氣移動分子污染濃度低於5PPnw的 PC、Olefin及PET製成的光罩絲封裝盒,其增㈣賴的性能 並沒有降低。 然而,使用空氣移動分子污染濃度高於5ppmv的pp、ABS、 PVC及PE製成的封裝盒,保管在盒裡面的增幅型阻劑出現了靈 敏度降低及存在殘留阻劑陌之類的性能降低現象,尤其*NH4+、 Cl、F、Ν〇2·及 SO42—的離子雜質與 Hydr_b()n(Table 4) Air Molecular Contamination Concentration Tables 2 and 3 are the results of analysis of cations, anions and volatile organic compounds respectively. Figure 9 shows the analysis of volatile organic compounds subdivided into Tables 1 and 2 and The air after the result values of Table 3 are added to move each of the seven boxes of the 1 1 134 928 cover, body, cassette and mat are all the same material. The performance of the amplified resist was evaluated after storing the amplified resist for 3 months in the reticle-based package. Performance Evaluation Results 'The performance of the reticle package made of PC, Olefin, and PET using air moving molecular contamination concentrations below 5PPnw did not decrease. However, using a package made of pp, ABS, PVC, and PE with air moving molecular contamination concentration higher than 5 ppmv, the amplification type resist stored in the box exhibits a decrease in sensitivity and a performance degradation phenomenon such as residual resist. , especially *NH4+, Cl, F, Ν〇2· and SO42- ionic impurities and Hydr_b()n
Compound的檢測值較大的PP、PVC及ABS封裝盒,其性能降低 的比較嚴重。 從上述結果中可知,使用空氣移動分子污染濃度低於5ppmv 的材料製成的光罩基底封裝盒,即使保管了 3個月,也能維持光 罩基底的品質;然而,使用空氣移動分子污染濃度高於5?1)11^的 材料製成的光罩基底封裝盒,光罩基底的品質降低幅度彳艮大。 本實施例只針對可以容納5枚的光罩基底封裝盒做了說明, 但是本發明不受光罩基底數量的影響,也能適用於光罩基底的包 裝用封裝盒。 如圖10a到10b所示,不僅是光罩基底封裝盒,適用於光罩 或標線片(Reticle)的保管/包裝/搬運用容器也能透過上述分析方法 23 1344928 選擇出不發生成長性缺陷的材料,也同樣適用於保管晶_封裝 盒。 上述情形,囉翻於鮮基底、鮮及細縣 業用捲帶。 雖然本發明已_上述之較佳實補與關詳細揭示,然其 並非用以限定本發明,凡熟習此—發明者,在不脫離本發明之技 術精神和專利申請範圍内,可作為各種變動及修改,因此本發明 之保護範圍當視作_之巾請專利範圍所界定者為準。^ 如前所述’本發明的封裝盒使用了可以阻止外部空氣流入封卜 裝盒内部的㈣棒’可以避免外雜子進人其内部,在鮮基底/ ; 的移動或保管1½中不會降低其品質,有助於製造品質良好的光: 罩。 把光軍基底裝入封裝盒後移動的過程中,光罩基底不會進行 移動’儘量減少了光|基底與封裝盒之間的摩擦所生成之粒子, 可以有效地維持光罩基底的優異品質。 在本發明的封装材料選擇方法中,可以使用ATD_GC/MS及 刀析方法刀析光罩基底封裝材料的〇utgas漠度,有助於選擇適 合增幅型阻劑且不影響透明基板與鉻膜表面特性的光罩基底封裝 盒材料。 透過上述ATD-GC/MS、1C分析方法及PCD過程選擇適合增 中田i阻劑的光罩基底封裝材料並製成封裝盒後,將其適用於光罩 24 1344928 基底的保管及搬運等作業時’可以製造出Mas、MBs、MCs&MDs 荨AMC濃度較低的光罩基底之封裝盒。 使用上述封裝盒,可以在光罩基底的保管與搬運過程中維持 光罩基底的品質,有利於高品質光罩的製造。 適用於光罩或標線片(Reticle)用封裝盒時,可以製造出不會發 生成長性缺陷的高品質光罩。 【圖式簡單說明】 圓1係卡匣與本體結合之概略立體圖。 圖2a到2e係光罩基底封裝盒的卡匣(Cassette)之概略立體圖。 圖3a到3d係光罩基底封裝盒的本體(Bocjy)之概略立體圖。 圖4a到4d係光罩基底封裝盒的墊(Cushi〇n)之概略立體圖。 圖5a到5d縣㈣實_的鮮基朗裝麵蓋德略立體圖, 圖6係本實施例的光罩基底置於卡匣内時的立體圖。 圖7係光罩基底被封裝在光罩基底封裝盒内部時的投影圖。 圖8係把光罩基底封制光罩基底雜盒後使祕帶使用加以密 封之概略立體圖。 圖9係本發明的ATD_GC/MS峰值圖及檢測出的主要物質圖。 圖l〇a係使用本發明所選定㈣製成触罩或標線片用封裝各之 照片。 ⑽ 圓封裴盒之照片。 蓋變形防止條 圖l〇b係使用本發明所選定材料製成的晶 【主要元件符號說明】 10 蓋導軌 11 25 1344928 12 蓋鎖 20 本體變形防止條 22 本體鎖 24 本體外側導軌 31 卡匣導轨 40 墊固定槽 42 圖罩側面固定部 61 光罩基底 100 蓋 300 卡匣 210、 310機體 212、 312内牆 500 封裝盒 13 墊固定架 21 本體内側導軌 23 密封棒 30 光罩基底槽 32 卡匣變形防止條 41 圖罩側面支持架 43 墊支持架 62 捲帶 200 本體 400 墊 211 ' 311 承載空間 220、 320底面PP, PVC and ABS packages with large detection values of Compound have a severe performance degradation. It can be seen from the above results that the reticle base package made of a material having a moving molecular concentration of less than 5 ppmv can maintain the quality of the reticle base even after being stored for three months; however, using air to move the molecular contamination concentration The reticle base package made of a material higher than 5?1)11^ has a large reduction in the quality of the reticle substrate. This embodiment has been described only for a reticle base package which can accommodate five pieces, but the present invention can be applied to a package for a reticle base without being affected by the number of reticle substrates. As shown in Figs. 10a to 10b, not only the reticle base package, but also the storage/packaging/transport container for the reticle or the reticle can be selected to have no growth defects through the above analysis method 23 1344928. The material is also suitable for the storage of the crystal_package box. In the above situation, it is turned over in fresh base, fresh and fine county tape. While the present invention has been described in detail above, it is not intended to limit the invention, and it is understood that the invention may be variously modified without departing from the spirit of the invention and the scope of the patent application. And the modifications, therefore, the scope of protection of the present invention is defined as the scope defined by the scope of the patent. ^ As mentioned above, the package of the present invention uses a (four) rod which can prevent outside air from flowing into the interior of the sealing box, so that the foreign matter can be prevented from entering the interior of the package, and the movement or storage of the fresh substrate/; Reducing its quality helps to produce good quality light: hood. During the movement of the light armor substrate into the package, the reticle substrate does not move. 'The particles generated by the friction between the light and the substrate are minimized, and the excellent quality of the reticle substrate can be effectively maintained. . In the method for selecting a packaging material of the present invention, the 〇utgas inversion of the reticle base encapsulating material can be analyzed by using ATD_GC/MS and a knife-analysis method, which is helpful for selecting a suitable resisting agent and not affecting the surface of the transparent substrate and the chrome film. Features of the reticle base package material. Through the above ATD-GC/MS, 1C analysis method and PCD process, the reticle base encapsulant suitable for Zengzhong i resist is selected and packaged, and then applied to the storage and handling of the reticle 24 1344928 substrate. It is possible to manufacture a package of reticle substrates with lower concentrations of Mas, MBs, MCs & MDs 荨 AMC. By using the above-described package, the quality of the mask base can be maintained during storage and handling of the reticle substrate, which is advantageous for the manufacture of high-quality reticle. When used in a reticle or Reticle package, it is possible to produce a high-quality reticle that does not cause long defects. [Simple diagram of the diagram] A schematic perspective view of the circle 1 series card and the body. 2a to 2e are schematic perspective views of a cassette of a reticle base package. 3a to 3d are schematic perspective views of a body (Bocjy) of a reticle base package. 4a to 4d are schematic perspective views of a mat (Cushi〇n) of a reticle base package. Fig. 5a to Fig. 5d are perspective views of the fresh base of the county (four), and Fig. 6 is a perspective view of the base of the reticle of the embodiment when placed in the cassette. Figure 7 is a projection view of the reticle substrate when it is packaged inside the reticle base package. Fig. 8 is a schematic perspective view showing the mask base sealed with a mask base and sealed with a secret tape. Figure 9 is a graph of the ATD_GC/MS peak of the present invention and the detected main substance. Figure 10a is a photograph of a package for use in a cap or reticle selected using the invention (iv). (10) Photo of the round box. Cover deformation preventing bar Figure l〇b is a crystal made using the material selected by the present invention [Main component symbol description] 10 Cover rail 11 25 1344928 12 Cover lock 20 Body deformation preventing strip 22 Body lock 24 Main body outer rail 31 Card guide Rail 40 pad fixing groove 42 cover side fixing portion 61 mask base 100 cover 300 cassette 210, 310 body 212, 312 inner wall 500 package 13 pad holder 21 body inner rail 23 sealing rod 30 mask base groove 32 card匣 deformation prevention strip 41 hood side support frame 43 pad support frame 62 tape 200 body 400 pad 211 ' 311 bearing space 220, 320 bottom surface
2626
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