七 、指定代表圖： 广)本案指定代表圖為：第（—）圖 ϋ本代棚之元件符簡單說明- 表面 外表面 成型模具 10 22 32 99 光學鏡片 薄膜 導引部份 20 30 40 ^案右有彳b學式時’請揭*最能顯*發明特徵的化學 九、發明說明： 【發明所屬之技術領域】 #用H诚於絲鏡片成賴具及製造該模具之方法，尤指一種 法。胥'"之光學鏡片成型模具，以及製造該光學鏡片模具之濺鍍方 【先前技術】 且雇ί學多光學系統中不可或缺之關鍵零組件，其應用層_ 干 表面質量對於光學鏡片之整雜能好壞具有關鍵性 <影響作用。 由於生^規模，生產重複性，光學鏡片之S產多採用模具製造。 光學鏡片之模具t最為核心之部分為模具之模仁部分模仁部分用於成 型光學鏡#，賴仁部分之好壞直接f彡響光學制之表面性能。 由於生產絲鏡片的模具使用辭高，模具模仁成型表面在多次合 模/開模過程中，以及與成型產品接觸之過程中極易壞損。而壞損之模具 模仁若不及時更換，則會影響成型光學鏡4之質量H模具製造成 本高昂，經常更換模具模仁無疑會增加產品成本。 【發明内容】 有#於此’有必要提供—種使用壽命長之光學鏡片成型模具。 同理’有必要提供-種製造上述成型模具之方法。 … 1330203VII. Designated representative map: Guang) The representative representative figure of this case is: (-) Figure ϋ The singular element of the shed is a simple description - Surface outer surface forming mold 10 22 32 99 Optical lens film guiding part 20 30 40 ^ When there is a 右b-style on the right, 'please uncover the chemistry that best describes the characteristics of the invention. IX. Invention: [Technical field of invention] #H is used to make a mold and manufacture the mold, especially A method.胥'" optical lens forming mold, and the sputtering method for manufacturing the optical lens mold [previous technology] and employs key components that are indispensable in the optical system, the application layer _ dry surface quality for optical lenses The quality of the complex can have a critical & impact effect. Due to the scale of production and the repeatability of production, the S production of optical lenses is mostly made by mold. The core part of the optical lens mold t is the mold part of the mold part of the mold part is used to form the optical mirror #, the quality of the Lai Ren part directly f 彡 光学 optical surface performance. Due to the high use of the mold for the production of the wire lens, the molding surface of the mold mold is easily damaged during the multiple molding/opening process and the contact with the molded product. If the mold of the damaged mold is not replaced in time, it will affect the quality of the forming optical mirror 4. The manufacturing cost of the mold is high, and the frequent replacement of the mold mold will undoubtedly increase the product cost. SUMMARY OF THE INVENTION It is necessary to provide a long-life optical lens forming mold. Similarly, it is necessary to provide a method of manufacturing the above-mentioned molding die. ... 1330203
一種光學鏡片成型模具，包括成型部分和導引部分，該成型部分用 於成型光學鏡片之形狀，該導引部分引導模具之開模和合模運動。該成 型部分的成型表面上具有-層薄膜，該薄膜為亂氏⑽才質製成，其中χ 的摩爾百分〜10%，y的賴百分比為5%〜魁。該雜的表面具 有與光學鏡片表面相反之形狀。 ^ 一種製造光學鏡片成型模具之方法，包括以下步驟：將SiC靶材和 作為基材賴減型部分分雛於冑獄電電場兩端，獅定於密封腔 體内；對該密封腔體抽氣，使其真空度達到5χι〇 7托以上；向密封腔體 内輸入麟纽及反應氣體；開啟高微電電場對使sic姆和模具成 型部分以13.56兆赫茲的頻率放電。 '、 與習知技術相比，所述成型模具採用SiCHxNy薄膜，該薄膜與模具 成型表面附著緊密，且易與光學鏡片分離。該薄麟護模具的成型表 面，增加其使用壽命。通過上絲财法製造生產效率高，且形成薄^ 膜層緻密、附著能力強。 、 【實施方式】 為了延長光學鏡片成賴具之使用壽命、節約其製造成本並改善 光學鏡片之產品性能’通常光學鏡#模具模仁表面會另外鍍上—層^ 膜。好的鑛膜不僅能增加模具使用壽命’還可強化模具表面質量 高產品表面性能。 鍍膜材料的選擇條件較為苛刻，鍵膜材料至少需滿足兩個條件 -，锻膜需無仁材料之間具有良好_，社薄膜與勒 離；第二，舰材料與待成型的光學鏡片之間易於分離，即離形性; 避免，膜與成型後的光學鏡U著，從而損壞光學鏡片表面或破制 第-圖所示為用於成型光學鏡片2〇的成型模具99之剖面圖。 模具99包括成型部分（未標示）和導引部分4G，成型部分用於塑^ 鏡片20的外形，而導引部分4〇主要用於引導模具的開模/合模運動^ 實施方式巾，成_分減具的斯為了獅模⑽之表面 使用壽命，模仁峨型表面（未標示）上鍍有_層薄膜3〇，該薄動 5 1330203 外表面32具有與光學鏡片20的表面22相反的外形。薄膜3〇是模具中直接 與光學鏡片20接觸的部分，也是直接影響光學鏡片2〇的性能的主要因 素。 眾所周知，大部分光學鏡片20成型模具99的模仁1〇為硬質碳化鎢 (WC)材質製成，而光學鏡片20則由玻璃（Si〇2)材質製成。所以， 光學鏡片20模具模仁10的鍍膜30材料需與碳化鎢之間具有良好的粘著 性’且易於與玻璃分離。An optical lens molding die comprising a molding portion for guiding a shape of an optical lens, and a guiding portion for guiding the mold opening and clamping movement of the mold. The molded portion has a -layer film formed on the molding surface, and the film is made of a random powder (10), wherein the mole percentage of χ is 10%, and the percentage of y is 5% to KS. The miscellaneous surface has a shape opposite to that of the optical lens surface. ^ A method for manufacturing an optical lens forming mold, comprising the steps of: dividing a SiC target and a substrate as a substrate to a two-stage electric electric field; the lion is set in the sealed cavity; and the sealed cavity is pumped The gas is brought to a vacuum of 5 χ 〇 7 Torr or more; the lining and the reaction gas are input into the sealed chamber; and the high micro electric field is turned on to discharge the sic and the molded portion at a frequency of 13.56 MHz. Compared with the prior art, the molding die adopts a SiCHxNy film which is closely attached to the molding surface of the mold and is easily separated from the optical lens. The thin surface of the thin mold protects the mold to increase its service life. Through the silk production method, the production efficiency is high, and the formation of the thin film layer is dense and the adhesion ability is strong. [Embodiment] In order to prolong the service life of the optical lens, save its manufacturing cost and improve the product performance of the optical lens, the surface of the mold lens is usually additionally coated with a film. Good mineral film not only increases mold life, but also enhances mold surface quality and high product surface properties. The selection conditions of the coating material are more demanding, and the bonding material must meet at least two conditions - the forged film needs to have good 无 between the materials, the film and the separation; the second, between the ship material and the optical lens to be formed It is easy to separate, that is, it is off-line; avoiding, the film and the formed optical mirror U, thereby damaging the surface of the optical lens or breaking the cross-sectional view of the molding die 99 for molding the optical lens 2'. The mold 99 includes a molding portion (not shown) and a guiding portion 4G, the molding portion is used to mold the outer shape of the lens 20, and the guiding portion 4 is mainly used to guide the mold opening/closing movement of the mold. For the surface life of the lion mold (10), the surface of the mold core (not shown) is plated with a _ layer film 3 〇, the thin surface 5 1330203 outer surface 32 has the opposite surface 22 of the optical lens 20 The shape. The film 3 is the portion of the mold that is in direct contact with the optical lens 20, and is also a major factor directly affecting the performance of the optical lens. As is well known, most of the optical lens 20 molding die 99 has a mold core 1 made of a hard tungsten carbide (WC) material, and the optical lens 20 is made of a glass (Si 2 ) material. Therefore, the material of the plating film 30 of the optical lens 20 of the mold core 10 needs to have good adhesion with tungsten carbide and is easily separated from the glass.
SiCHxNy (其中X的摩爾百分比為2%〜1〇%，y的摩爾百分比為 5%〜30%)為一種與WC具有近似熱延展係數之硬質絕緣材料，且沉氏、 與Si〇2之熱延展係數相差較大，容易與之分離。所以，SiCHxNy為一種 很好的光學鏡片模具模仁1〇的鍍膜材料。另外，SiCHxNy也是一種硬度 高的耐磨材料，這也可達到提到模具模仁1〇的使用壽命的目的。其相關 參數可參下表：SiCHxNy (wherein the molar percentage of X is 2% to 1%, and the mole percentage of y is 5% to 30%) is a hard insulating material having a similar thermal expansion coefficient with WC, and the heat of Shenshi and Si〇2 The elongation coefficients differ greatly and are easily separated from them. Therefore, SiCHxNy is a good coating material for optical lens molds. In addition, SiCHxNy is also a high-hardness wear-resistant material, which can also achieve the purpose of mentioning the service life of the mold die. The relevant parameters can be referred to the following table:
SiCHxNy、WC及Si02之熱延展係數Thermal expansion coefficient of SiCHxNy, WC and SiO2
SiCHxNv WC Si02 25-500°C 4.63X10·6 4.42X10'6 19.35X10'6 25-1000〇C 5.12X10·6 4.84X10·6 〜4.92X10·6 14.58X10·6 基於對加工產品的要求，模具鍍膜技術成為改善模具品質的重要制 私。由於SiCHxNy為絕緣材料’不易製備，故需採用射頻反應濺鍍工藝 來沉積SiCHxNy薄膜30於模具模仁1〇上。 如第二圖所示’濺鍍裝置1〇〇具有一高頻放電電場1，該高頻放電電 場1的一高頻電源11的一端通過一匹配網路12與置於密封腔體3内的靶 極4相連’密封腔體3内與該靶極4相對的基體5和高頻電源u的另一端同 時接地。 密封腔體3具有一抽氣系統6和一進氣系統7。抽氣系統6用於抽取密 封腔體3内的空氣或其他雜質氣體’使密封腔體3内成為真空。進氣系統 7用於向密封腔體3内充入濺鍍氣體和反應氣體，該濺鍍氣體在電場作用 下易產生電離’且不易與靶極4或基體5發生化學反應。通常，進氣系統 7充入密封腔體3内的濺鍍氣體為惰性氣體，惰性氣體在電場作用下易發 6 1330203 特性穩定’不易錄極4或基體5發生反應。SiCHxNv WC Si02 25-500°C 4.63X10·6 4.42X10'6 19.35X10'6 25-1000〇C 5.12X10·6 4.84X10·6 ~4.92X10·6 14.58X10·6 Based on the requirements of processed products, mold Coating technology has become an important technology for improving the quality of molds. Since SiCHxNy is an insulating material, it is difficult to prepare. Therefore, a radio frequency reactive sputtering process is required to deposit the SiCHxNy film 30 on the mold core. As shown in the second figure, the sputtering device 1 has a high-frequency discharge electric field 1, and one end of a high-frequency power source 11 of the high-frequency discharge electric field 1 passes through a matching network 12 and is placed in the sealed cavity 3. The target 4 is connected to the inside of the sealed cavity 3 opposite to the target 4 and the other end of the high-frequency power supply u is simultaneously grounded. The sealed chamber 3 has an extraction system 6 and an intake system 7. The pumping system 6 is for extracting air or other impurity gas in the sealed chamber 3 to make the inside of the sealed chamber 3 a vacuum. The air intake system 7 is for charging the sealing chamber 3 with a sputtering gas and a reaction gas which are easily ionized by an electric field and are less likely to chemically react with the target 4 or the substrate 5. Generally, the sputtering gas filled into the sealed cavity 3 of the intake system 7 is an inert gas, and the inert gas is easily generated by an electric field. 6 1330203 The characteristic is stable 'There is no reaction of the recording electrode 4 or the substrate 5.
(Ar)作為濺鍍氣體。 A# 在貝際衣i^SiCHxNy薄膜3〇的工藝中，採用SiC作為麟乾極4的靶 材42並將其固疋於與匹配網路12相連的背姻*上。$時，將模具模仁作 為基體5的紐52亚將其m定於舰的失座％上。進龄、統7除通入惰性 氣體外’還加入反應_H2(或邮紅阳和①。為降錄極4的溫度， 在背襯44處可設置一冷卻系統8抑制靶極4過熱。(Ar) as a sputtering gas. A# In the process of the bismuth i^SiCHxNy film 3 ,, SiC is used as the target 42 of the lining pole 4 and is fixed to the mate* connected to the matching network 12. At the time of $, the mold mold core is used as the base 52 of the base 5 to set its m on the lost seat of the ship. In addition to the inert gas, the reaction _H2 is added to the reaction. The temperature is lowered. The cooling system 8 is provided at the backing 44 to suppress overheating of the target 4.
SiCHxNy薄膜的濺鍍工藝主要包括以下幾個步驟： (1)將SC乾材似和作為基材&的模具模仁分別固定於背襯糾和失 座54上； (2) 打開抽氣系統6 ’待密封腔體3内的真空度達到5乂1〇_7托（T〇rr) 後關閉抽氣系統6; (3) 打開進氣系統7向密封腔體3内輸入濺鍍氣體及反應氣體； (4) 開啟高頻放電電場i，以1356兆赫茲（ΜΗζ)的頻率放電使 SiC靶材42發生濺鍍，並與從進氣系統7進入的反應氣體發生化學反應生 成SiCHxNjJi沉積於作為基枯52的模具模彳二表面、.； (5) 當基材52表面沉積的siCHxNy厚度達到1〇〇〜1〇〇〇奈米（nm)後， 關閉南頻放電電場1。 由於射頻濺鍍工藝之賤鍍速率高，且濺鍍後形成的薄膜膜層緻密、 附著能力強。故，通過上述濺鍍工藝製造SiCHxNy薄膜生產效率高，製 成之SiCHxNy薄膜膜層緻密’且與作為基材52的模具模仁之間附著緊密。 【圖式簡單說明】 ” 第一圖係光學鏡片成型模具之剖視圖。 第二圖係濺鍍裝置之示意圖。 【主要元件符號說明】 南頻放電電場 1 密封腔體 3 乾極 4 基體 5 抽氣糸統 6 進氣系統 7 冷卻系統 8 模仁 10 1¾頻電源 11 匹配網路 12 7 133.0203 光學鏡片 20 薄膜 30 導引部份 40 背襯 44 夾座 54 濺鍍裝置 100 表面 22 外表面 32 靶材 42 基材 52 成型模具 99 8The sputtering process of the SiCHxNy film mainly includes the following steps: (1) fixing the SC dry material and the mold mold core as the substrate & respectively to the backing correction and loss of the seat 54; (2) opening the suction system 6 'The vacuum in the cavity 3 to be sealed reaches 5乂1〇_7 Torr (T〇rr) and the pumping system 6 is closed; (3) the intake system 7 is opened to input the sputtering gas into the sealed cavity 3 and (4) Turning on the high-frequency discharge electric field i, discharging at a frequency of 1356 megahertz (ΜΗζ) causes the SiC target 42 to be sputtered, and chemically reacts with the reaction gas entering from the intake system 7 to form SiCHxNjJi deposited on As the mold surface of the base 52, the surface of the mold is closed. (5) When the thickness of the siCHxNy deposited on the surface of the substrate 52 reaches 1 〇〇 to 1 〇〇〇 nanometer (nm), the south frequency discharge electric field 1 is turned off. Due to the high plating rate of the RF sputtering process, the thin film layer formed after sputtering is dense and has strong adhesion. Therefore, the SiCrxNy film produced by the above sputtering process has high production efficiency, and the formed SiCHxNy film layer is densely adhered to and adhered to the mold die as the substrate 52. The first picture is a cross-sectional view of the optical lens forming mold. The second picture is a schematic diagram of the sputtering device. [Main component symbol description] South frequency discharge electric field 1 sealed cavity 3 dry electrode 4 base 5 pumping糸6 Intake System 7 Cooling System 8 Mold 10 10⁄4 Frequency Power Supply 11 Matching Network 12 7 133.0203 Optical Lens 20 Film 30 Guide Part 40 Backing 44 Clamping 54 Sputtering Device 100 Surface 22 Outer Surface 32 Target 42 Substrate 52 Molding Mold 99 8