CN1966429B - Mould with multilayer plating film - Google Patents
Mould with multilayer plating film Download PDFInfo
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- CN1966429B CN1966429B CN2005101015679A CN200510101567A CN1966429B CN 1966429 B CN1966429 B CN 1966429B CN 2005101015679 A CN2005101015679 A CN 2005101015679A CN 200510101567 A CN200510101567 A CN 200510101567A CN 1966429 B CN1966429 B CN 1966429B
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- multicoating
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Abstract
The invention relates to a kind of tooting with multilayer plating coats which contains a basal body and many plating coats formed on the basal body. The multilayer coats include a depletion layer, an adamant carbon layer which contains nitrogen, an adamant carbon layer which contains nitrogen and hydrogen as well as an adamant layer which contains hydrogen, the four layers form on the basal body by turns. The multilayer coats in the invention contains various kinds of adamant carbon layers so as to provide superordinary mechanical functions such as high rigidity, low friction and corrosion-proof.
Description
[technical field]
The present invention relates to a kind of mould, particularly a kind of mould with multicoating.
[background technology]
The core of model technology is the making of mould.In the model process, mould need bear bigger molding pressure usually, thereby need consider following points during mfg. moulding die: the release that (1) is good, with avoid reacting with product, adhesion phenomenon; (2) enough hardness and physical strength is to bear the surging force in the model process; (3) wear resistance is in order to moulding product and avoid surperficial scratch.For making mould reach above-mentioned requirements, need usually carry out plated film, so coating technique not only be the gordian technique of Mold Making at die surface, more influence model product yield key just.
For obtaining the more good model product of quality, industry has been made a lot of effort on the coating technique of mould, disclosed a kind of mould of moulded glass product as prior art, be coated with superhard thin film on the mold pressing surface of this mould, this superhard thin film is made up of amorphous carbon and the diamond carbon particulate that is distributed in wherein, and the particle diameter of diamond particle is a nano level.In this mould compression molding process, it is good to be easy to the demoulding, physical strength height, hardness.But the surface smoothness of this mould, wear resistance are still needed and are further improved.
Therefore, be necessary to provide that a kind of surface flatness is good, the better plated film mould of wear resistance.
[summary of the invention]
Below will a kind of mould with multicoating be described with embodiment.
A kind of mould with multicoating, it comprises a substrate, is formed with a transition layer in this substrate successively, a nitrogenous quasi-diamond carbon-coating, one nitrogenous, hydrogen diamond carbon-coating and a hydrogeneous quasi-diamond carbon-coating.
The mould with multicoating of present embodiment, its advantage is: the diamond-like carbon rete that comprises in this multicoating can provide high rigidity, low friction, performance such as corrosion-resistant; Wherein, nitrogenous diamond-like carbon rete can provide good tack, makes each rete combine closely; The outermost layer rete is selected hydrogeneous diamond-like carbon material for use, further reduces skin friction coefficient, improves surface smoothness, and can strengthen the release of mould.
[description of drawings]
Fig. 1 is the structural representation that present embodiment has the mould of multicoating.
Fig. 2 is present embodiment forms multicoating in substrate a setting drawing.
[embodiment]
Below in conjunction with drawings and Examples above-mentioned mould with multicoating is described in further detail.
As shown in Figure 1, a kind of mould 100 with multicoating, it comprises a substrate 10 and is formed at one first rete 11, one second rete 12, a tertiary membrane layer 13, one the 4th rete 14 and one the 5th rete 15 in this substrate 10 successively.The material of this substrate 10 is a stainless steel, as siderochrome carbon alloy, siderochrome molybdenum carbon alloy, siderochrome vanadium molybdenum carbon alloy or siderochrome vanadium silicon molybdenum carbon alloy etc.
This first rete 11 is a nano level tack coat, and its material can be selected from chromium, titanium or chromium titanide, and its thickness range is 1～20 nanometer, is preferably 4～10 nanometers.
This second rete 12 is a nano level middle layer, and its material can be selected from chromium nitride, titanium nitride or titanium nitride chromium, and its thickness range 1～50 nanometer is preferably 4～30 nanometers.
This first rete 11 and second rete 12 are two-layer transition layer, better combine between the diamond-like carbon rete that its purpose is to make follow-up formation and the substrate 10.Substrate 10 is a stainless steel, the carbon that has non-quasi-diamond carbon structure between the diamond-like carbon rete of follow-up formation and the steel base 10 mutually, there are graphite or carbon black at the interface as it, substrate 10 can be poor with diamond-like carbon rete bonding force, therefore, need between substrate 10 and diamond-like carbon rete the bonding force that a transition layer improves its interface be set usually, transition layer can be single or multiple lift, in the present embodiment, transition layer is two-layer i.e. first rete 11 and second rete 12.
Generally, on mould, form general category diamond carbon (a-C) rete, can make the raising of die surface hardness, frictional coefficient reduction, erosion resistance enhancing etc.And after in general category diamond carbon rete, adding nitrogen, protium, can improve its mechanical property greatly, has good tack as nitrogenous diamond-like carbon rete, hydrogeneous diamond-like carbon rete has lower skin friction coefficient, and nitrogenous, hydrogen diamond carbon film layer is the less rete of an internal stress.
In the present embodiment, tertiary membrane layer 13 adopts nitrogenous diamond-like carbon rete, and this rete and second rete 12 and the 4th follow-up rete 14 are combined closely.The 4th rete 14 adopts nitrogenous, hydrogen diamond carbon film layer, and it is the lower diamond-like carbon rete of an internal stress.The outermost layer rete i.e. the 5th rete 15, selects hydrogeneous diamond-like carbon material for use, can further reduce mould 100 skin friction coefficients, improves surface smoothness, and can strengthen the release of mould.These three layers of diamond-like carbon retes are by two-layer transition layer, i.e. first and second rete and substrate 10 combined closely, and the good mechanical property of its each tool, gives mould 100 surperficial excellent comprehensive performances, as high rigidity, lowly rub, corrosion-resistant, release is good etc.
In conjunction with Fig. 2, a sputtering apparatus 4 is provided, this sputtering apparatus 4 has a vacuum-sealing chamber 40, has a base 44 in the chamber 40, and it can rotate freely, and a substrate 10 is arranged on this base 44, and it can rotate with base 44, but also rotation.Position relative with this base 44 in the chamber 40 is provided with a rotatable stationary installation 410, is fixed with a target 41a on it, a target 41b and a target 41c.The material of target 41a can be selected from chromium, titanium or chromium titanide, and the material of target 41b can be selected from chromium nitride, titanium nitride or titanium nitride chromium, and target 41c is a graphite.
The negative pole of radio- frequency power supply 45a, 45b, 45c is connected with target 41a, target 41b, target 41c respectively, and the positive pole of radio- frequency power supply 45a, 45b, 45c all connects substrate 10.The operating frequency of radio- frequency power supply 45a, 45b, 45c is 13.56 MHz.One bias supply 46 is arranged at the two ends of base 44, applies a negative bias on base 44, to quicken the sedimentation velocity of positive ion basad 10.Bias supply 46 can be direct current or AC power, adopts AC power in the present embodiment, and its frequency is 20～800 kilo hertzs, is preferably 40～400 kilo hertzs, and its voltage is-100～-30 volts, is preferably-60～-40 volts.
Because during sputter, chamber 40 domestic demands are filled with working gas, working gas is generally not the rare gas element that the plated film with target, substrate 10 and follow-up formation reacts, and this rare gas element can be selected argon, krypton, xenon or radon for use, selects argon gas here for use.Certainly, according to the needs of rete to be plated, working gas can be the mixed gas of above-mentioned rare gas element and other gas, and for this reason, this chamber 40 is provided with bleeding point 48, one hydrogen input apertures 49,47, one nitrogen input apertures and an argon gas input aperture 50.
The mould 100 that making has multicoating may further comprise the steps:
The first step forms first rete 11 in substrate 10.At first, from bleeding point 47 with chamber 40 vacuum pumpings after, in chamber 40, charge into argon gas from argon gas input aperture 50, open radio-frequency power supply 45a, radio- frequency power supply 45b, 45c all is in closing condition, rotary fixing device 410 or base 44, make target 41a be in the position vertically opposite with substrate 10, glow discharge takes place in target 41a and between as anodic base 44, because can being ionized, argon molecules is positively charged argon ion under radio-frequency power supply 45a effect, under electric field action, argon ion is the accelerated motion of target 41a direction to negative pole, and the surface of constantly clashing into target 41a, and the momentum transfer of argon ion is to target atom, after target atom obtains enough kinetic energy, just break away from the surface of target 41a and be deposited in the substrate 10 and form first rete 11.
In this sputter process, substrate 10 can be carried out rotation, so that more uniform first rete 11 on the substrate 10 surperficial sputters.The control sputter time, making first rete, 11 thickness that are deposited in the substrate 10 is 1～20 nanometer, is preferably 4～10 nanometers.
In second step, on first rete 11, form second rete 12.First rete, 11 principles are similar with forming, the same sputter machine 4 that uses, open radio-frequency power supply 45b, radio-frequency power supply 45a, 45c all are in closing condition, rotary fixing device 410 or base 44, make target 41b be in the position vertically opposite, glow discharge takes place, thereby on first rete 11, form second rete 12 in target 41b and between as anodic base 44 with substrate 10.
In this sputter process, substrate 10 can be carried out rotation, so that more uniform second rete 12 on first rete, the 11 surperficial sputters.The control sputter time, making second rete, 12 thickness that are deposited on first rete 11 is 1～50 nanometer, is preferably 4～30 nanometers.
In the 3rd step, on second rete 12, form tertiary membrane layer 13.First rete, 11 principles are similar with forming, the same sputter machine 4 that uses, difference is: keep under the pressure condition of chamber 40, to chamber 40, import nitrogen from nitrogen input aperture 48, and part argon gas the chamber 40 is extracted out from bleeding point 47, make the mixed gas of final nitrogen and argon gas satisfy condition: the volume ratio of nitrogen in mixed gas is 2～40%, is preferably 5～20%.
Open radio-frequency power supply 45c, radio-frequency power supply 45a, 45b all are in closing condition, rotary fixing device 410 or base 44, make target 41c be in the position vertically opposite with substrate 10, glow discharge takes place in target 41c and between as anodic base 44, thereby form nitrogenous diamond-like carbon film on second rete 12, promptly the tertiary membrane layer 13.
In this sputter process, substrate 10 can be carried out rotation, so that more uniform tertiary membrane layer 13 on second rete, the 12 surperficial sputters.The control sputter time, making tertiary membrane layer 13 thickness is 1～50 nanometer, is preferably 10～30 nanometers.
In the 4th step, on tertiary membrane layer 13, form the 4th rete 14.Tertiary membrane layer 13 principle are similar with forming, the same sputter machine 4 that uses, difference is: keep under the pressure condition of chamber 40, to chamber 40, import hydrogen from hydrogen input aperture 49, and from the mixed gas extraction of bleeding point 47 with part argon gas and nitrogen the chamber 40, make the mixed gas of final nitrogen, hydrogen and argon gas satisfy condition: nitrogen and the hydrogen volume ratio in mixed gas is respectively 2～10%, is preferably 5～15%.
Radio-frequency power supply 45c is in opened condition, radio-frequency power supply 45a, 45b all are in closing condition, promptly, with target 41c as negative electrode, and target 41c is in the position vertically opposite with substrate 10, between target 41c and base 44, carry out glow discharge, thereby on tertiary membrane layer 13, form nitrogenous hydrogen diamond carbon film, i.e. the 4th rete 14.
In this sputter process, substrate 10 can be carried out rotation, so that more uniform the 4th rete 14 on the tertiary membrane layer 13 surperficial sputter.The control sputter time, making the 4th rete 14 thickness is 1～50 nanometer, is preferably 10～30 nanometers.
In the 5th step, on the 4th rete 14, form the 5th rete 15.Tertiary membrane layer 13 principle are similar with forming, the same sputter machine 4 that uses, difference is: keep the pressure of chamber 40 constant, extract out from the mixed gas of bleeding point 47 nitrogen, hydrogen and argon gas to chamber 40, simultaneously, from hydrogen input aperture 49, argon gas input aperture 50 imports the mixed gas of a certain proportion of hydrogen, argon gas to chamber 40, the mixed gas of hydrogen and argon gas satisfies condition in the final chamber 40: the volume ratio of hydrogen in mixed gas is 5～20%.
Radio-frequency power supply 45c is in opened condition, radio-frequency power supply 45a, 45b all are in closing condition, promptly, with target 41c as negative electrode, and target 41c is in the position vertically opposite with substrate 10, between target 41c and base 44, carry out glow discharge, thereby on the 4th rete 14, form hydrogeneous diamond-like carbon film, i.e. the 5th rete 15.
In this sputter process, substrate 10 can be carried out rotation, so that more uniform the 5th rete 15 on the 4th rete 14 surperficial sputters.The control sputter time, making the 5th rete 15 thickness is 1～50 nanometer, is preferably 10～30 nanometers.
In above-mentioned the 4th step and the 5th step, hydrogen can substitute with methane, ethane or other hydrogen-containing gas that can produce hydrogen atom.
Through above-mentioned processing procedure, finally obtain being formed with in the substrate 10 mould 100 of first rete 11, second rete 12, tertiary membrane layer 13, the 4th rete 14 and the 5th rete 15.
The mould with multicoating 100 that present embodiment obtains, its advantage is: the diamond-like carbon rete that comprises in this multicoating can provide high rigidity, low friction, performance such as corrosion-resistant; Wherein, nitrogenous diamond-like carbon rete can provide good tack, makes each rete combine closely; The outermost layer rete is selected hydrogeneous diamond-like carbon material for use, further reduces skin friction coefficient, improves surface smoothness, and can strengthen the release of mould.
Claims (9)
1. mould with multicoating, it comprises a substrate, is disposed with a transition layer in this substrate, a nitrogenous quasi-diamond carbon-coating, nitrogenous and a hydrogen diamond carbon-coating and a hydrogeneous quasi-diamond carbon-coating.
2. the mould with multicoating as claimed in claim 1 is characterized in that, the material of described substrate is siderochrome carbon alloy, siderochrome molybdenum carbon alloy, siderochrome vanadium molybdenum carbon alloy or siderochrome vanadium silicon molybdenum carbon alloy.
3. the mould with multicoating as claimed in claim 1 is characterized in that, described transition layer comprises a tack coat and a middle layer.
4. the mould with multicoating as claimed in claim 3 is characterized in that, the material of described tack coat is chromium, titanium or chromium titanide.
5. the mould with multicoating as claimed in claim 3 is characterized in that, the thickness of described tack coat is 1～20 nanometer.
6. the mould with multicoating as claimed in claim 3 is characterized in that, the material in described middle layer is chromium nitride, titanium nitride or titanium nitride chromium.
7. the mould with multicoating as claimed in claim 3 is characterized in that, the thickness in described middle layer is 1～50 nanometer.
8. the mould with multicoating as claimed in claim 1 is characterized in that, described nitrogenous quasi-diamond carbon-coating, and thickness range nitrogenous and hydrogen diamond carbon-coating and hydrogeneous quasi-diamond carbon-coating is 1～50 nanometer.
9. the mould with multicoating as claimed in claim 8 is characterized in that, described nitrogenous quasi-diamond carbon-coating, and thickness range nitrogenous and hydrogen diamond carbon-coating and hydrogeneous quasi-diamond carbon-coating is 10～30 nanometers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005101015679A CN1966429B (en) | 2005-11-18 | 2005-11-18 | Mould with multilayer plating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005101015679A CN1966429B (en) | 2005-11-18 | 2005-11-18 | Mould with multilayer plating film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1966429A CN1966429A (en) | 2007-05-23 |
| CN1966429B true CN1966429B (en) | 2010-09-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2005101015679A Expired - Fee Related CN1966429B (en) | 2005-11-18 | 2005-11-18 | Mould with multilayer plating film |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102409340A (en) * | 2011-12-04 | 2012-04-11 | 中国航天科技集团公司第五研究院第五一〇研究所 | Wear-resistant material for space |
| US9617654B2 (en) | 2012-12-21 | 2017-04-11 | Exxonmobil Research And Engineering Company | Low friction coatings with improved abrasion and wear properties and methods of making |
| US11364705B2 (en) | 2017-10-17 | 2022-06-21 | Exxonmobil Upstream Research Company | Diamond-like-carbon based friction reducing tapes |
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