13292.17 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種液晶(LiquidCrystal)面板結構特別是有 關於種採用間隔牆(duai spacer waU)設計之矽基液晶㈣砲 • 咖如鲁灿咖’ LCoS)顯示面板結構及其製造方法，而具有較 '小單一晶片面積、可減少膠寬尺寸及液晶損失、無需預留液晶注 入口（配合滴下注入技術)以及無需在矽基板上喷灑球狀間隔體等 諸多優點。 • 【先前技術】 石夕基液晶微顯示器是反射式矽基液晶投影機(reflective LC〇s projector)與背投影電視(rear_pr〇jecti〇nteievisi〇n)的關鍵技術。 LCoS微顯示器最大之優點在於可大幅降低面板生產成本、體積 小，並且具有高解析度以及低功率。其與一般薄膜電晶體·液晶顯 •示器(thin film transistor-liquid crystal display，TFT-LCD)不同的是， TFT-LCD上下兩面皆是以玻璃作為基底(substrate)，但LC〇s僅有 - 上面採用玻璃’底下的基底則是以半導體材料矽為主，因此，LC〇s 製程其實疋結合LCD與半導體互補式金氧半導體(compiementary metal-〇xide semiconductor，CMOS)製程的技術。 請參考第1圖及第2圖，其中第1圖繪示的是習知矽基液晶顯 示面板10之上視圖，第2圖則是第1圖中的矽基液晶顯示面板1〇 沿著切線之剖面示意圖。如第1圖及第2圖所示，習知矽基液 6 1329217 面㈣咐—料㈣，其_主祕域】4内設置有 ? 陣列狀排列之晝素電極(圖未示）、-玻璃前板〗6平行設 ;夕月板12上方’―液晶層18填充於石夕背板η與玻璃前板％ b 1此外在石夕月板12與玻璃前板16之間另有複數個球型間 隔體22。其中’背板丨2包含有複數個细半導體餘製作之金 氧半導體_狀件，用來驅動各晝素電極，而树背板12的較 長邊上，通常設有複數個金屬接合墊(bondingp_22。 為了要得到缺的顯不品質，液晶層18的厚度，或稱間隙㈣ gap) ’即透明導電紐與半導縣糊之咖，必得要精準地控制 在固疋值。而習知液晶顯示面板裝置的製程，為了要維持間隙， 通吊會在上下兩基板間置入塑性珠㈣咖bead)或玻璃珠做為球 '型間隔體22。因此，間隙大小就由球型間隔體的直徑來決定。在 習知製程中，球型間隔體22係以喷觀spray)之方式均句分散在石夕 •背板12上’但若喷紐呈現不均勻分佈，在球型間隔體群聚之處， 顯示品質就會明顯下降，且也可能導致基板的間隙大小不一致。 此外，使用塑性珠或玻璃珠做為間隔體的方式，成本亦較高昂。 此外’習知矽基液晶顯示面板10之作法係先在矽背板12的主 動區域14周圍塗上膠框20，其膠框寬度設計尺寸約為2〇〇〇微米 (μπι)左右’形成膠框20時需預留液晶注入口(圖未示），該液晶注 入口的見度約為500微米左右’因此’習知碎基液晶顯示面板 之面積較大。再者，習知石夕基液晶顯示面板10之作法在後續真空 13292.17 吸注液晶時，通常會流失掉部分的液晶，這些流失焯的液晶無法回收使用， 此亦是面板成本不能降低的原因之一。且，在注入液晶之後，液晶有可能 與接觸到的膠框20反應，造成液晶的污染或變質。 由上可知’習知發基液晶顯示面板10之結構與作法皆未碟完 善，而仍有進一步改善進步的空間，本發明之目的即在將LC〇s 顯示器製程進一步整合，有效提高產率，降低生產成本。 【發明内容】 因此，本發明之主要目的在於提供一種石夕基液晶顯示面板的新 穎結構以及製作方法，以解決上述習知技藝的問題。 • . . , 根據本發日月之較佳實施例’本發明披露一種液晶面板，包含有 —第基板’其上具有-顯示主動區域；—内間隔牆，設於該第 —基板之該顯示主動區域的厢；—外間_，設於該第一基板 ^之該内間隔牆的-外側，且與該内間隔牆之間形成一封膠溝 槽’其中該内間隔牆與該外間隔牆之高度約略相等；一封膠，塗 2韻膠錢内；—第二基板，由該_隔牆與該外間隔牆所 复:’並與該__ ’使該第—基板與該第二基板封合固接， 二中該第-基板、該第二基板與該_隔牆㈣—腔室；以及一 夜晶層，狀注人技術充填於該腔室令。 本發明另-較佳實施侧披露_種液晶面板的製造方法，其包 13292.17 含有以下之步驟： 提供-第-基板，其上形成有—顯示主動區域； 於該第-基板的表面上以化學氣相沈積方法形成一介電層； 利用微影以及姓刻製程，敍除部分該介電層，暴露出該顯示主 -動區域’並於_衫動區域之關形成高度鱗之-内間隔牆 .以及一外間隔牆’且該内間隔牆與該外間隔牆之間為一封膠溝槽； 於該封膠溝槽内塗佈一封膠； _ 進行一滴人注人(0_哪，製程，於該__之内點入 數滴液晶， 於。亥第I板之上覆蓋-第二基板，使該第二基板接觸該封 膠，且該帛二基板齡該_隔糾及賴崎獲得支樓；以及 固化(curing)該封膠。 為了使貴審Μ員能更進-步了解本發明之特徵及技術内 •容’請參閱以下有關本發明之詳細說明與附圖。然而所附圖式僅 供參考與s兒明用’並非用來對本發明加以限制者。 【實施方式】 請參閱第3圖以及第4圖，其中第3圖繪示的是本發明較佳實 施例之石夕基液晶顯示面板50上視圖’第4圖則是第3圖中本發明 石夕基液晶顯示面板50沿著切線Π-ΙΙ之剖面示意圖。本發明石夕基液 晶顯示面板50包含有一石夕背板52，其顯示主動區域(display active -regi〇n)54内設置有複數個呈陣列狀排列之晝素電極(圖未示）、一玻 13292.17 璃前板56平行設置於砍背板52上方，一液晶層58填充於矽背板 52與玻璃前板56之間。其t，矽背板52包含有複數個利用標準 半導體製程製作之金氧半導體(MOS)元件，用來驅動各畫素電極。 本發明之主要技術特徵在於矽背板52的主動區域54周圍作雙 間隔牆(‘丨spacer wall)設計，其中内間隔牆(如^ spacer _丨)62 與外間隔牆(〇1^^&〇£^沾)64.的高度約略相等，且内間隔牆62 #與外間隔牆64之間為一溝槽(groove)66，可用來容納封膠7〇，並 增加矽背板52與封膠70的接觸面積。内間隔牆62與外間隔牆64 分別具有一平坦的上表面62a與64a。此外，用來連接面板内部積 體電路與外部載板線路的複數個金屬接合墊522,則不再設置於矽 背板52的較長邊上，而改設置在在矽背板52的較短邊上。 根據本發明，内間隔牆62與外間隔牆64係在矽背板52的製 •造流程的最後再利用半導體製程，如化學氣相沈積烛⑽㈤vap〇r deposition ’ CVD)製程、化學機械研磨(chemicai mechanjcai 卩〇触， CMP)製程、微影(iith〇graphy)以及侧(etching)等技術，在顯示主 動區域54周圍定義而成。根據本發明之較佳實施例，内間隔牆62 與外間隔騰64皆為二氧解⑽等介電材料構成，但並不賺此。 本發明以内間隔牆62與外間隔牆64所組成的雙間隔牆結構作 為矽月板52與玻璃前板56之間的支撐，由於内間隔牆62與外間 ^牆64係以半導體製程所製作而成的，因此其高度誤差範圍非常 13292.17 小，能精準地控制與定義石夕背板52與玻璃前板兄之間的間隙， 因此，不需要再使用習知技藝中的塑性珠或破璃珠做為間隔體， 也可聽f知技藝中關隔體狗勻分佈，鱗致在間隔體群聚 處，顯不品質日聰下降現象，且基__大小也不會不一致。 i本發明可節省下以塑性珠或玻璃珠做為間_的成本。而 利用本發明隔牆結構的另—伽在於_ 7()的寬度可以由原 _先的設計尺寸約為2_微米㈣’縮小至約5〇〇微米左右，如此 一來’即可以縮小單-面板的面積，而使得每—牌晶圓的面板 產出數量增加。 請參考第5圖至第9圖’其繪示的是本發明實施例矽基液晶面 板的製作方法剖面示意圖。如第5圖所示，一石夕基板m2表面具 有一顯不主動區域154’其中，顯示主動區域154内包含有控制電 _路、與該控制電路相電連的複數個電極以及金屬反射鏡(圖未示）。 其中該控制電路包含有複數個陣列式排列的電晶體，例如M〇s電 晶體，用來控制並驅動該複數個電極。 在完成前述之顯示主動區域154的製作之後，利用化學氣相沈 積製程在矽基板152表面上沈積一層二氧化矽層112,並隨後在二 氧化矽層112上形成光阻遮罩圖案114,其定義出即將形成在二氧 化石夕層112中的雙間隔牆的形狀與位置。在沈積二氧化矽層U2 之前，矽基板152表面上可預先沈積一保護層或配向膜(圖未示）。 13292.17 如第6圖所示，接著利用一钱刻製程，以光阻遮罩ιΐ4作為银 2硬遮罩，去除未被光阻遮罩114覆蓋的二氧切層112，直到暴 露出石夕基板152絲’如此即形成圍繞在顯示主動區域154周圍 的雙間隔牆結構16G ’包括内_牆162與外間隔牆164。然後， •再去除光阻遮罩醜114。根據本發明之較佳實施例，内間隔牆 • 162與外間隔牆⑹皆為連續的長條型突起結構，環繞在顯示主動 區域154週邊，而且無斷口或切σ。如此一來，可以藉由内間隔 _牆162將封膠與液晶的接觸面積減至最小，甚至完全阻隔避免 了液晶的污染或變質的可能。 且’如前所述，由於内間隔牆162與外間隔牆164係以半導體 製程所製作喊的’耻料度誤絲_常小，騎準地控制 與定義絲板152與玻璃前板之間的間隙。而内間隔牆162與外 間隔牆164之間為-溝槽166，可用來容納封膠，並增加石夕背板 110與封膠的接觸面積。 隨後，如第7圖所示，進行—滴下注入(〇nediOpfiii，〇阳製 程。所謂㈣製程係、於灌晶過程中，先形成_關隔牆162邊框 内的石夕基底110上’滴入數滴液晶158，藉以取代習知技藝中以真 空吸注(vae_ suetio咐式進行液晶充填。滴下狀(GDF)製程的 優點在於可㈣魏晶料，㈣免習知絲液晶顯示面板作法 在後續真空吸注液晶時，流轉的液晶無法隨使狀問題。 請參考第8圖，接著再於真空環境中或者低壓下，於間隔牆 162與外間隔牆164之間的溝槽〗66内塗佈封膠17〇，其中封膠1兀 的體積略大於溝槽丨66的體積。根據本發明較佳實施例，封膠17〇 可以採用光硬化封膠或者是熱硬化封膠材料。 最後，將一玻璃前板156平行設置於矽背板152上方，並藉由 封膠170使玻璃前板156與矽基板152黏合在一起，如第9圖所 不。接著，進行一固化(curing)製程，以紫外光加以照射，或者以 加熱方式，使封膠170硬化。附帶一提的是，本發明矽基液晶面 板的製作係在晶圓尺寸等級(waferscale)下進行，在晶圓尚未切割 之前即將液晶利用滴下注入(0DF)技術點在矽基板表面上，然後以 封膠將玻璃如板與石夕基板結合起來，然後才進行切割製程，形成 各個面板。 相較於先前技術中，每片八吋晶圓僅能產出約89個面板晶 片，本發明採用雙間隔牆設計，同時將接合墊設置於面板的較短 邊之後，可使每片八吋晶圓的產能明顯提昇(每片八吋晶圓僅能產 出約150個面板晶片），再加上利用滴下注入(〇DF)製程，更能節 省許多製造成本。 以上所述僅為本發明之較佳實施例’凡依本發明申請專利範圍 所做之均等變化與修飾，皆應屬本發明之涵蓋範圍。 13 1329217 【圖式簡單說明】 第1圖繪示的是習知矽基液晶顯示面板之上視圖。 第2圖是第1圖中矽絲_晶顯示面板沿著切線14之剖面示意圖。 第3圖繪示的是本發明較佳實施例之石夕基液晶顯示面板上視圖。 . 第4圖是第3圖中矽絲晶顯示面板沿著切線M之剖面示意圖。 第5圖至第9圖繪示的是本發明實施例石夕基液晶面板的製作方 法剖面示意圖。 Φ13292.17 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a liquid crystal (LiquidCrystal) panel structure, in particular, a 矽-based liquid crystal (four) cannon designed with a partition wall (duai spacer waU). Coffee 'LCoS) display panel structure and its manufacturing method, with a smaller 'single single wafer area, can reduce the glue width and liquid crystal loss, no need to reserve liquid crystal injection port (with drop injection technology) and no need to spray on the enamel substrate Ball spacers and many other advantages. • [Prior Art] Shi Xiji liquid crystal microdisplay is the key technology of reflective LC〇s projector and rear projection television (rear_pr〇jecti〇nteievisi〇n). The biggest advantage of LCoS microdisplays is that they can significantly reduce panel production cost, small size, high resolution and low power. Different from the thin film transistor-liquid crystal display (TFT-LCD), the upper and lower sides of the TFT-LCD are made of glass as a substrate, but LC〇s only - The substrate underneath the glass is based on semiconductor materials. Therefore, the LC〇s process is a combination of LCD and semiconductor complementary semiconductor-xide semiconductor (CMOS) processes. Please refer to FIG. 1 and FIG. 2 , wherein FIG. 1 is a top view of a conventional germanium-based liquid crystal display panel 10, and FIG. 2 is a tangent-based liquid crystal display panel 1 in FIG. Schematic diagram of the section. As shown in Fig. 1 and Fig. 2, the conventional 矽 base liquid 6 1329217 surface (four) 咐 material (four), the _ main secret domain 4 is provided with an array of arsenic electrodes (not shown), - The front panel of the glass is set in parallel; the upper layer of the moonlight board 12 is filled with the liquid crystal layer 18 on the stone backing plate η and the glass front plate% b 1 in addition to the plurality of stone slabs 12 and the glass front plate 16 Spherical spacer 22. The 'backplane 丨 2 includes a plurality of fine semiconductor semiconductor MOS devices for driving the respective halogen electrodes, and the longer sides of the tree back plate 12 are usually provided with a plurality of metal bonding pads ( Bondingp_22. In order to obtain the lack of quality, the thickness of the liquid crystal layer 18, or the gap (4) gap), that is, the transparent conductive button and the semi-conducting county paste must be precisely controlled at the solid value. In the process of the conventional liquid crystal display panel device, in order to maintain the gap, plastic beads (four) coffee bead or glass beads are placed between the upper and lower substrates as the ball type spacers 22. Therefore, the gap size is determined by the diameter of the spherical spacer. In the conventional process, the spherical spacer 22 is dispersed on the Shi Xi•back plate 12 in the manner of spraying spray. However, if the spray is unevenly distributed, where the spherical spacers are clustered, The display quality is significantly degraded and may also result in inconsistent gap sizes of the substrates. In addition, the use of plastic beads or glass beads as a spacer is also costly. In addition, the conventional method of applying the liquid crystal display panel 10 is to first apply a plastic frame 20 around the active area 14 of the back cover 12, and the width of the plastic frame is about 2 micrometers (μπι). At the time of the frame 20, a liquid crystal injection port (not shown) is reserved, and the visibility of the liquid crystal injection port is about 500 micrometers. Therefore, the area of the conventional liquid crystal display panel is relatively large. Moreover, the practice of the Shishiji liquid crystal display panel 10 generally consumes a portion of the liquid crystal when the subsequent vacuum 13292.17 sucks the liquid crystal, and the lost liquid crystal cannot be recycled, which is also the reason why the panel cost cannot be reduced. One. Moreover, after the liquid crystal is injected, the liquid crystal may react with the contacted plastic frame 20, causing contamination or deterioration of the liquid crystal. It can be seen from the above that the structure and practice of the conventional liquid crystal display panel 10 are not perfect, and there is still room for further improvement. The object of the present invention is to further integrate the LC〇s display process to effectively improve the yield and reduce the production. cost. SUMMARY OF THE INVENTION Accordingly, it is a primary object of the present invention to provide a novel structure and a manufacturing method of a Shiyake-based liquid crystal display panel to solve the above-mentioned problems of the prior art. According to a preferred embodiment of the present disclosure, the present invention discloses a liquid crystal panel including a first substrate having a display active area thereon, and an inner partition wall disposed on the first substrate. a chamber of the active area; an outer space _, disposed on the outer side of the inner partition wall of the first substrate, and forming a rubber groove between the inner partition wall and the outer partition wall and the outer partition wall The height is approximately equal; a glue is coated with 2 rhyme money; the second substrate is covered by the partition wall and the outer partition wall: 'and the __' makes the first substrate and the second The substrate is sealed and fixed, and the first substrate, the second substrate and the partition wall (four)-chamber; and the overnight crystal layer are filled with the chamber. The present invention further discloses a method for manufacturing a liquid crystal panel, and the package 13292.17 comprises the steps of: providing a --substrate on which a display active region is formed; and a chemical on the surface of the first substrate The vapor deposition method forms a dielectric layer; using a lithography and a surname process, a portion of the dielectric layer is removed, exposing the display main-moving region' and forming a height scale-interval in the _shirt region a wall and an outer partition wall' and a gap between the inner partition wall and the outer partition wall; a glue is applied in the seal groove; _ a person is injected (0_ a process in which a plurality of liquid crystals are inserted into the __, and the second substrate is covered on the first plate of the first plate, so that the second substrate contacts the sealant, and the second substrate is aged Lai Qiqi obtains a branch; and cures the sealant. In order to enable the examiner to further understand the features and techniques of the present invention, please refer to the following detailed description and drawings relating to the present invention. However, the drawings are for reference only and are not intended to limit the invention. [Embodiment] Please refer to FIG. 3 and FIG. 4, wherein FIG. 3 is a top view of the Shiyake liquid crystal display panel 50 according to a preferred embodiment of the present invention. FIG. 4 is the third embodiment of the present invention. Schematic diagram of the XI XI LCD panel 50 along the tangential line ΙΙ-ΙΙ. The Shihki liquid crystal display panel 50 of the present invention comprises a stone back plate 52, which is provided with a display active area (display active - regi〇n) 54 A plurality of matrix electrodes (not shown) arranged in an array, a glass 13292.17 glass front plate 56 are disposed in parallel above the chopping plate 52, and a liquid crystal layer 58 is filled between the back plate 52 and the glass front plate 56. The t-back plate 52 includes a plurality of metal oxide semiconductor (MOS) devices fabricated by standard semiconductor processes for driving the respective pixel electrodes. The main technical feature of the present invention is that the active region 54 of the back plate 52 is formed around Double spacer wall ('丨 spacerr wall) design, in which the inner partition wall (such as ^ spacer _ 丨) 62 is approximately equal to the height of the outer partition wall (〇1^^& 〇£^), and the inner partition wall There is a groove 66 between the 62# and the outer partition wall 64, which can be used to accommodate the sealant 7〇 And increasing the contact area of the backing plate 52 with the sealant 70. The inner partition wall 62 and the outer partition wall 64 respectively have a flat upper surface 62a and 64a. In addition, for connecting the inner integrated circuit of the panel and the external carrier circuit The plurality of metal bond pads 522 are no longer disposed on the longer sides of the back cover 52 and are instead disposed on the shorter sides of the back cover 52. According to the present invention, the inner partition wall 62 and the outer partition wall The 64 series utilizes a semiconductor process at the end of the manufacturing process of the back plate 52, such as a chemical vapor deposition candle (10) (f) vap〇r deposition 'CVD process, chemical mechanical polishing (chemicai mechanjcai contact, CMP) process, lithography Techniques such as (iith〇graphy) and etching are defined around the display active area 54. According to a preferred embodiment of the present invention, both the inner partition wall 62 and the outer spacer 64 are composed of a dielectric material such as dioxygen (10), but this is not earned. In the present invention, the double partition wall structure composed of the inner partition wall 62 and the outer partition wall 64 serves as a support between the moon plate 52 and the glass front plate 56, since the inner partition wall 62 and the outer wall 64 are made by a semiconductor process. Therefore, its height error range is very small, 13292.17, which can precisely control and define the gap between the stone back plate 52 and the glass front plate brother. Therefore, it is no longer necessary to use plastic beads or glass beads in the conventional technique. For the spacer, you can also listen to the knowledge of the art. The dog is evenly distributed. The scales are in the cluster of the spacers, and the quality is not degraded, and the size of the base is not inconsistent. i The invention can save the cost of using plastic beads or glass beads as a medium. However, the width of the partition wall structure of the present invention is that the width of the _7() can be reduced from about 2 micrometers (four) to about 5 micrometers, so that the size can be reduced. - The area of the panel, resulting in an increase in the number of panels produced per wafer. Please refer to FIG. 5 to FIG. 9 for a schematic cross-sectional view showing a method of fabricating a bismuth-based liquid crystal panel according to an embodiment of the present invention. As shown in FIG. 5, a surface of the substrate ii has a display active region 154'. The active region 154 includes a plurality of electrodes, a plurality of electrodes electrically connected to the control circuit, and a metal mirror. The figure is not shown). The control circuit includes a plurality of arrayed transistors, such as M〇s transistors, for controlling and driving the plurality of electrodes. After the fabrication of the display active region 154 is completed, a layer of germanium dioxide 112 is deposited on the surface of the germanium substrate 152 by a chemical vapor deposition process, and then a photoresist mask pattern 114 is formed on the germanium dioxide layer 112. The shape and location of the double spacer walls to be formed in the dioxide layer 112 are defined. A protective layer or an alignment film (not shown) may be preliminarily deposited on the surface of the germanium substrate 152 before depositing the germanium dioxide layer U2. 13292.17 As shown in FIG. 6, the dioxing layer 112 not covered by the photoresist mask 114 is removed by using a photoresist engraving process with a photoresist mask ι 4 as a silver 2 hard mask until the lithium substrate 152 is exposed. The wire 'is thus formed to surround the double partition wall structure 16G' around the display active area 154 including the inner wall 162 and the outer partition wall 164. Then, • Remove the photoresist mask ugly 114 again. In accordance with a preferred embodiment of the present invention, the inner partition wall 162 and the outer partition wall (6) are continuous elongated projection structures that surround the periphery of the display active region 154 without fracture or sigma. In this way, the contact area between the sealant and the liquid crystal can be minimized by the inner spacer _wall 162, and even the complete blockage avoids the possibility of contamination or deterioration of the liquid crystal. And as mentioned above, since the inner partition wall 162 and the outer partition wall 164 are made by a semiconductor process, the squeaky smear is often small, and the rider controls and defines between the silk plate 152 and the glass front plate. Clearance. Between the inner partition wall 162 and the outer partition wall 164 is a groove 166 for accommodating the sealant and increasing the contact area between the stone back plate 110 and the sealant. Subsequently, as shown in Fig. 7, performing a drip-injection (〇nediOpfiii, a 〇阳process. The so-called (four) process system, in the process of crystallization, first forming a _off partition wall 162 in the frame of the Shixi base 110 A few drops of liquid crystal 158, in order to replace the conventional technique of vacuum filling (vae_suetio咐 liquid crystal filling. Dropping (GDF) process has the advantage of (four) Wei Jing material, (four) free of the silk screen display method in the follow-up When the liquid crystal is vacuum-injected, the flowing liquid crystal cannot be caused by the problem. Please refer to Fig. 8, and then apply the coating in the groove 66 between the partition wall 162 and the outer partition wall 164 in a vacuum environment or a low pressure. The sealant is 17 〇, wherein the sealant has a volume slightly larger than the volume of the groove 丨 66. According to a preferred embodiment of the invention, the sealant 17 〇 may be a photo-curing sealant or a heat-curing sealant material. A glass front plate 156 is disposed in parallel above the back cover plate 152, and the glass front plate 156 and the base plate 152 are bonded together by the sealant 170, as shown in Fig. 9. Then, a curing process is performed, Irradiated with ultraviolet light or heated In the formula, the sealant 170 is hardened. Incidentally, the fabrication of the liquid crystal based panel of the present invention is performed under wafer scale, and the liquid crystal is dropped (0DF) technology before the wafer is cut. On the surface of the ruthenium substrate, the glass is then combined with the shixi substrate by a sealant, and then the dicing process is performed to form each panel. Compared with the prior art, each gossip wafer can only produce about 89. The panel wafer, the invention adopts a double partition wall design, and the bonding pad is disposed on the shorter side of the panel, so that the productivity of each gossip wafer can be significantly improved (only about 150 wafers per wafer) The panel wafer), together with the drop-injection (〇DF) process, can save a lot of manufacturing costs. The above is only a preferred embodiment of the present invention, and the average variation of the patent application scope of the present invention is Modifications should be within the scope of the present invention. 13 1329217 [Simple description of the drawings] Fig. 1 is a top view of a conventional 矽-based liquid crystal display panel. Fig. 2 is a 矽丝_晶 display in the first figure. Panel along FIG. 3 is a top view of the Shiyake liquid crystal display panel of the preferred embodiment of the present invention. FIG. 4 is a cross-sectional view of the silk crystal display panel along the tangential line M in FIG. 5 to 9 are schematic cross-sectional views showing a manufacturing method of a Shiyake liquid crystal panel according to an embodiment of the present invention.
【主要元件符號說明】 10 矽基液晶顯示面板 12 矽背板 14 顯示主動區域 16 玻璃前板 18 液晶層 20 膠框 22 球型間隔體 122 金屬接合墊 50 矽基液晶顯示面板 52 矽背板 54 顯示主動區域 56 玻璃別板 58 液晶層 62 内間隔壁 62a 上表面 64 外間隔壁 64a 上表面 66 溝槽 70 封膠 522 金屬接合墊 112 介電層 114 光阻遮罩圖案 14 13292.17 152 碎基板 154 顯示主動區域 156 玻璃基板 158 液晶 160 雙間隔牆 162 内間隔牆 164 外間隔牆 166 溝渠 170 封膠[Main component symbol description] 10 矽-based liquid crystal display panel 12 矽 back plate 14 display active area 16 glass front plate 18 liquid crystal layer 20 plastic frame 22 spherical spacer 122 metal bonding pad 50 矽-based liquid crystal display panel 52 矽 back plate 54 Display active area 56 glass plate 58 liquid crystal layer 62 inner partition wall 62a upper surface 64 outer partition wall 64a upper surface 66 groove 70 sealant 522 metal bond pad 112 dielectric layer 114 photoresist mask pattern 14 13292.17 152 broken substrate 154 display Active area 156 Glass substrate 158 Liquid crystal 160 Double partition wall 162 Inner partition wall 164 External partition wall 166 Ditch 170 Sealing