TWI328231B - Methods and device for improved program-verify operations in non-volatile memories - Google Patents

Methods and device for improved program-verify operations in non-volatile memories Download PDF

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TWI328231B
TWI328231B TW095150107A TW95150107A TWI328231B TW I328231 B TWI328231 B TW I328231B TW 095150107 A TW095150107 A TW 095150107A TW 95150107 A TW95150107 A TW 95150107A TW I328231 B TWI328231 B TW I328231B
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memory
group
memory cells
threshold voltage
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TW095150107A
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Chinese (zh)
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TW200746151A (en
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Siu-Lung Chan
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Sandisk Corp
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Priority claimed from US11/323,596 external-priority patent/US7224614B1/en
Priority claimed from US11/323,577 external-priority patent/US7310255B2/en
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/3454Arrangements for verifying correct programming or for detecting overprogrammed cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/3454Arrangements for verifying correct programming or for detecting overprogrammed cells
    • G11C16/3459Circuits or methods to verify correct programming of nonvolatile memory cells

Description

1328231 九、發明說明: 【發明所屬之技術領域】 本發明大體而言係關於諸如電可擦除可程式化唯讀記憶 體(EEPROM)及快閃EEPROM之非揮發性半導體記憶體二 且具體言之係關於在程式化驗證操作期間實施省時特徵的 非揮發性半導體記憶體。 【先前技術】 能夠非揮發性地儲存電荷之固態記憶體,尤其以封裝為 小型式因子(small f0rm factor)卡之eepr〇m及快閃 EEPROM形式的固態記憶體近來已變為多種行動及手持裝 置(尤其為資訊設備及消費型電子產品)中的精選儲存裝 置。不同於亦為固態記憶體之RAM(隨機存取記憶體),快 閃記憶體係非揮發性的,且即使在切斷電源之後仍保持其 已儲存之資料。儘管成本較高,但快閃記憶體正日益用於 大量儲存應用中。基於諸如硬驅動機及軟性磁碟之旋轉磁 性媒體的習知大量儲存裝置並不適合於行動及手持環境。 此係由於磁碟驅動機傾向於較為龐大,且易於造成機械故 障且具有高潛時及高功率要求。此等不良屬性使得基於磁 碟之儲存在大多數行動及攜帶型應用中不實用。另一方 面’嵌入式與以可移除卡之形式的快閃記憶體由於其較小 之大小、低功率消耗、高速度及高可靠性特徵而理想地適 合於行動及手持環境中。 EEPR0M及電可程式化唯讀記憶體(EPROM)為可被擦除 之非揮發性記憶體且使新資料寫入或"程式化"至其記憶體 117671.doc 1328231 單元中。該兩者皆利用以場效電晶體結構之浮動(未連接) 導電閉極’其位於半導體基板中之通道區域上於源極與及 極區域之間。控制閘極隨後提供於該浮動閘極上。電晶體 之臨限電壓特性係由保持於浮動閘極上之電荷的數量加以 控制。亦即,對於浮動閘極上電荷之給定位準,存在著必 須於”接通"電晶體以許其源極與汲極區域之間的傳導之前 施加至控制閘極的對應電壓(臨限值)。 浮動閘極可保持一電荷範圍且因此可被程式化至臨限電 壓窗(threshold voltage window)内之任何臨限電壓位準。 臨限電壓窗之大小係由裝置之最小及最大臨限位準加以定 界’裝置之最小及最大臨限位準又對應於可程式化至浮動 閘極上之電荷的範圍。臨限窗通常取決於記憶體裝置之特 性、操作條件及歷史。窗内之每一相異、可解析臨限電壓 位準範圍原則上可用以表示單元之確定記憶狀態。 充當记憶體單元之電晶體通常係由兩個機制中之一者而 程式化至"已程式化"狀態〇在"熱電子注入"中,施加至汲 極之高電壓加速電子越過基板通道區域。同時,施加至控 制閘極之高電壓將熱電子牽拉穿過一薄閘極介電質至浮動 閘極上。在"穿隧注入"中,相對於基板施加高電壓至控制 閘極。以此方式,將電子自基板牽拉至插入之浮動閘極。 可藉由眾多機制而擦除記憶體裝置。對於EPR〇M而 5 ’可藉由使用紫外線輻射自浮動閘極移除電荷而大量地 擦除記憶體。對於EEPROM而言,可藉由相對於控制閘極 將咼電壓施加至基板以便使浮動閘極中之電子經由一薄氧 117671.doc 1328231 化物穿隧至基板通道區域(亦即,福勒_諾德輪姆穿隧 (Fowler-Nordheim tunneling))而電擦除記憶體單元。通 常,可逐位元組地擦除EEPR〇M。對於快閃EEPr〇m而 言,可—次性全部或—次擦除—或多個區塊地電擦除記憶 體,其中一區塊可由記憶體之5 12個位元組或更多位元組 組成。 非揮發性記憶體單元之實例 記憶體裝置通t包括T安裝於一卡上之一或多個記憶體 晶片。每一記憶體晶片包括由諸如解碼器及擦除、寫入及 讀取電路之周邊電路支援的記憶體單元之一陣列。更複雜 之記憶體裝置亦具有一執行智慧型及更高階記憶操作及介 接的控制器。存在著現今所使用的許多商業上成功之非揮 發性固態記憶體裝置。此等記憶體裝置可採用不同類型之 記憶體單元,每一類型具有一或多個電荷儲存元件。 圓1A至1E示意性地說明非揮發性記憶體單元之不同實 例0 困1A示意性地說明以EEPROM單元之形式的具有用於儲 存電荷之浮動閘極的非揮發性記憶體。電可擦除及可程式 化唯讀記憶體(EEPROM)具有與EPROM類似之結構,但額 外地提供用於在施加適當電壓之後便電性地自其浮動閉極 載入及移除電荷而無需曝露至UV輻射的機制。美國專利 第5,5 95,924號中給出該等單元之實例及製造其之方法。 囷1B示意性地說明具有選擇閘極與控制或引導閘極之快 閃EEPROM單元。記憶體單元10具有在源極14與汲極“擴 117671.doc 散之間的分裂通道"12。一單无将 早το係有效地形成有串聯之兩 個電晶體MT2。T1充當具有浮動間極20及控制閉極30 之記憶電晶體。該浮動閘極能夠儲存可選數量之電荷。可 H T1之通道部分的電流數量取決於控制閉極3 0上之電壓 及駐留於插入浮動閘極20上之電荷的數量。丁2充當具有選 擇閘極40之選擇電晶體。#Τ2係藉由選擇閘極倾之電壓 接通時’其允許T1之通道部分中的電流在源極與没極之間 穿過、選擇電體獨立於控制閉極處之電麼而沿源極汲 極-通道提供一開目。一優點為其可用卩切斷歸因於單元 在浮動閘極處之電荷空乏(正)而在零控制閘極電壓時仍傳 導的彼等單元。另-優點為其允許更容易地實施源極側注 入程式化。 分裂通道記憶體單元之一簡單實施例為如圖1]3中所示由 點線示意性指示的,選擇閘極及控制閘極連接至同一字 線。此係藉由使電荷儲存元件(浮動閘極)位於通道之一部 分上及控制閘極結構(其為字線之部分)位於另一通道部分 上以及位於該電荷儲存元件上而實現。此有效地形成具有 串聯之兩個電晶體的單元,其中一電晶體(記憶電晶體)以 電荷儲存元件上之電荷數量及字線上之電壓的組合來控制 可流經其通道部分之電流的數量,且另一電晶體(選擇電 晶體)使字線單獨充當其閘極。美國專利第5 070,032、 5’095’344、5,315,541、5,343,063 及 5,661〇53 號中給出該 等單元之實例'其在記憶體系統中之使用及製造其的方 法。 117671.doc 1328231 之一更改進實施例為選擇閘極 及控制閘極彼此獨立且不由其之間的點線而連接時…實 施使單元陣列中之—行控制閘極連接至垂直於字線之控制 (或引導)線。效應在於將字線自在讀取或程式化選定單元 時須同時執行兩個功能解除。彼兩個功能為:⑴充當選擇 電晶體之閑極’因此需要適當電壓來接通及切斷選擇電晶1328231 IX. Description of the Invention: [Technical Field] The present invention relates generally to non-volatile semiconductor memory such as electrically erasable programmable read only memory (EEPROM) and flash EEPROM. It relates to non-volatile semiconductor memory that implements time-saving features during stylized verification operations. [Prior Art] Solid-state memory capable of storing charges non-volatilely, especially solid-state memory in the form of eepr〇m and flash EEPROM packaged as a small factor (small f0rm factor) card has recently become a variety of actions and handheld Selected storage devices in devices, especially information devices and consumer electronics. Unlike RAM (Random Access Memory), which is also a solid-state memory, the flash memory system is non-volatile and retains its stored data even after the power is turned off. Despite the higher cost, flash memory is increasingly being used in mass storage applications. Conventional mass storage devices based on rotating magnetic media such as hard drives and flexible disks are not suitable for mobile and handheld environments. This is due to the fact that the disk drive tends to be bulky and prone to mechanical failure and has high latency and high power requirements. These undesirable attributes make disk-based storage impractical in most mobile and portable applications. On the other hand, embedded and flash memory in the form of removable cards are ideally suited for mobile and handheld environments due to their small size, low power consumption, high speed and high reliability. EEPR0M and electrically programmable read-only memory (EPROM) are non-volatile memory that can be erased and new data is written or "programmed" into its memory 117671.doc 1328231 unit. Both of these utilize a floating (unconnected) conductive closed end of the field effect transistor structure which is located between the source and the gate regions on the channel region in the semiconductor substrate. A control gate is then provided on the floating gate. The threshold voltage characteristics of the transistor are controlled by the amount of charge held on the floating gate. That is, for the positioning of the charge on the floating gate, there is a corresponding voltage (probability) that must be applied to the control gate before the conduction of the transistor to the conduction between the source and the drain region. The floating gate maintains a range of charge and can therefore be programmed to any threshold voltage level within the threshold voltage window. The size of the threshold voltage window is determined by the minimum and maximum threshold levels of the device. Delimitation 'The minimum and maximum threshold levels of the device correspond to the range of charge that can be programmed onto the floating gate. The threshold window usually depends on the characteristics, operating conditions and history of the memory device. A distinct, resolvable threshold voltage level range can in principle be used to represent a determined memory state of a cell. A transistor that acts as a memory cell is typically programmed by one of two mechanisms to "programmed" The state is in "hot electron injection", the high voltage applied to the drain accelerates electrons across the substrate channel region. At the same time, the high voltage applied to the control gate pulls the hot electrons Passing a thin gate dielectric to the floating gate. In the "tunneling injection", a high voltage is applied to the substrate relative to the substrate. In this way, electrons are pulled from the substrate to the inserted floating gate. The memory device can be erased by a number of mechanisms. For EPR 〇M, 5' can erase memory in large quantities by removing the charge from the floating gate using ultraviolet radiation. For EEPROM, A threshold voltage is applied to the substrate at the control gate to tunnel electrons in the floating gate to the substrate channel region via a thin oxygen 117671.doc 1328231 (ie, Fowler-Nordheim tunneling (Fowler-Nordheim) Tunneling)) electrically erases the memory cell. Typically, the EEPR〇M can be erased bit by bit. For flash EEPr〇m, all or one of the erasures—or multiple blocks The ground erases the memory, wherein one block can be composed of 5 12 bytes or more of the memory. The example memory device of the non-volatile memory unit includes T installed on a card. One or more memory chips. Each memory chip package An array of memory cells supported by peripheral circuits such as decoders and erase, write and read circuits. More complex memory devices also have a controller that performs intelligent and higher order memory operations and interfaces. There are many commercially successful non-volatile solid state memory devices used today. These memory devices can employ different types of memory cells, each type having one or more charge storage elements. Circles 1A through 1E indicate Illustratively illustrating different examples of non-volatile memory cells. A sleepy 1A schematically illustrates a non-volatile memory having a floating gate for storing charge in the form of an EEPROM cell. Electrically erasable and programmable The read memory (EEPROM) has a similar structure to the EPROM, but additionally provides a mechanism for electrically loading and removing charges from its floating closed end without exposure to UV radiation after application of an appropriate voltage. Examples of such units and methods of making the same are given in U.S. Patent No. 5,5,95,924.囷1B schematically illustrates a flash EEPROM cell having a select gate and a control or pilot gate. The memory cell 10 has a split channel "12 between the source 14 and the drain "expanded 117671.doc. A single unconnected early τ system is effectively formed with two transistors MT2 in series. T1 acts as a float The interpole 20 and the memory transistor controlling the closed end 30. The floating gate can store an optional amount of charge. The amount of current in the channel portion of the H T1 depends on the voltage on the control closed-pole 30 and resides in the inserted floating gate. The number of charges on the pole 20. D2 acts as the selective transistor with the selected gate 40. #Τ2 is selected by the gate bias voltage when it is turned on 'it allows the current in the channel portion of T1 to be at the source The passage between the poles and the selection of the electrical body independently of the control of the electricity at the closed pole provides an opening along the source drain-channel. One advantage is that it can be used to cut off the charge attributed to the cell at the floating gate. Depletion (positive) and their conduction at zero control gate voltage. Another advantage is that it allows for easier implementation of source side injection stylization. A simple embodiment of a split channel memory cell is shown in Figure 1. Illustrated by the dotted line as shown in Fig. 3, the selection gate The pole and the control gate are connected to the same word line by placing the charge storage element (floating gate) on one of the channels and the control gate structure (which is part of the word line) on the other channel portion and located The charge storage element is implemented. This effectively forms a cell having two transistors in series, wherein a transistor (memory transistor) controls the flowable by a combination of the amount of charge on the charge storage element and the voltage on the word line. The number of currents through its channel portion, and another transistor (selective transistor) causes the word line to act as its gate alone. U.S. Patent Nos. 5,070,032, 5'095'344, 5,315,541, 5,343,063 and 5,661,53 An example of such a unit's use in a memory system and a method of manufacturing the same. 117671.doc 1328231 A more improved embodiment is to select the gate and the control gate independently of each other and not between the dotted lines When connected...implements the connection of the row control gates in the cell array to the control (or steering) lines perpendicular to the word lines. The effect is to read or program the word lines freely. Two functions must be performed simultaneously at the same time. The two functions are: (1) acting as the idle electrode of the selection transistor. Therefore, an appropriate voltage is required to turn on and off the selected transistor.

圊1B中所示分裂通道單元 體;及經由麵合於字線與電荷儲存元件之間的電場(電 容性)而將電荷儲存元件之電壓驅動至所要位準。通常難 以使用單電壓以最佳方式執行此等功能中之兩者。在對控 制間極及選擇閘極進行獨立控制的情況下,字線僅需執行 功能(1),同時,添加之控制線執行功能(2)。此能力允許 «X计較同效能程式化,其中使程式化電壓適合目標資料。 在快閃EEPROM陣列巾對獨立控制(或引導)閘極之使用係 描述於(例如)美國專利第5,313,421及6,222,762號中。 圊ICtf意性地說明具有雙浮動閘極及獨立選擇及控制閘 極的另一快閃EEPR0M單元。記憶體單元1〇除有效地具有 串聯之二個電晶體之外類似於囷1B之記憶體單元。在此類 型之單疋中’兩個儲存元件(亦即,T1_左儲存元件及T1_ 右儲存元件)包含於源極與汲極擴散之間的其通道上且在 其之間具有選擇電晶體Th記憶電晶體分別具有浮動閘極 20及20以及控制閘極3〇及3〇,。選擇電晶體τ2係由選擇閘 極40加以控制。在任一時間,僅存取該對記憶電晶體中之 者以進行讀取或寫入。當正存取儲存單元T1左時,接 通T2與T1-右以允許τι·左之通道部分中的電流在源極與汲 H7671.doc 1328231 極之間穿過》類似地,當正存取儲存單元T1•右時,接通 T2及Τ1 -左。猎由使選擇閘極多晶石夕之一部分極接近浮動 閘極且將實質正電壓(例如,20V)施加至選擇閘極以使得 儲存於浮動閘極内之電子可穿隧至選擇閘極多晶矽而實現 擦除。 囷1D示意性地說明組織入反及(NAND)單元中之一串記 憶體單元。NAND單元50由一系列記憶電晶體m、 M2、…Μη (η = 4、8、16或更高)組成,該等記憶電晶體係 由其源極及》及極而菊鍵(daisy-chained)。一對選擇電晶體 SI、S2控制記憶電晶體鏈經由NAND單元之源極端子54及 汲極端子5 6而至外部的連接。在一記憶體陣列中,當接通 源極選擇電晶體S1時,源極端子耦合至源極線。類似地, 當接通汲極選擇電晶體S2時,NAND單元之汲極端子搞合 至記憶體陣列之位元線。鏈中之每一記憶電晶體具有一電 荷儲存元件以儲存給定數量之電荷以便表示預期記憶狀 態。每一記憶電晶體之控制閘極對讀取及寫入操作提供控 制。選擇電晶體S1、S2中每一者之控制閘極提供分別經由 NAND單元之源極端子54及汲極端子56而對NAND單元的 控制存取。 當在程式化期間讀取及驗證NAND單元内之已定址記憶 電晶體時’以適當電壓供應其控制閘極。同時,NAND單 元5〇中之剩餘非定址記憶電晶體係藉由在其控制閘極上施 加充分電壓而完全接通。以此方式,自個別記憶電晶體之 源極至NAND單元之源極端子54且同樣自個別記憶電晶體 117671.doc -10- 1328231 之没極至單元之汲極端子56而有效地產生導電路徑。具有 該等NAND單元結構之記憶體裝置係描述於美國專利第 5,570,315、5,903,495、6,046,935號中。 圖1E示意性地說明具有用於儲存電荷之介電層的非揮發 性記憶體。使用介電層,來代替較早描述之導電浮動閘極 元件。利用介電儲存元件之該等記憶體裝置已由Eitan等人The split channel unit body shown in 圊1B; and driving the voltage of the charge storage element to a desired level via an electric field (capacitance) between the word line and the charge storage element. It is often difficult to perform both of these functions in an optimal manner using a single voltage. In the case of independent control of the control interpole and the selection gate, the word line only needs to perform the function (1), and at the same time, the added control line performs the function (2). This ability allows the «X to compare the performance of the program, which makes the stylized voltage suitable for the target data. The use of a flash EEPROM array to independently control (or direct) the gate is described in, for example, U.S. Patent Nos. 5,313,421 and 6,222,762.圊ICtf is an illustrative representation of another flash EEPROM module with dual floating gates and independent selection and control gates. The memory cell 1 eliminates a memory cell similar to 囷1B except that it effectively has two transistors in series. In this type of unit, 'two storage elements (ie, T1_left storage element and T1_right storage element) are included on their channels between the source and the drain diffusion with a selective transistor between them The Th memory transistors have floating gates 20 and 20 and control gates 3 and 3, respectively. The selection of the transistor τ2 is controlled by the selection gate 40. At any one time, only the pair of memory transistors are accessed for reading or writing. When accessing the storage unit T1 to the left, turn on T2 and T1-right to allow the current in the channel portion of the τι·left to pass between the source and the 汲H7671.doc 1328231 pole. Similarly, when accessing When the storage unit T1 • is right, turn on T2 and Τ1 - left. One of the gates of the selected gate polysilicon is very close to the floating gate and a substantially positive voltage (eg, 20V) is applied to the selected gate so that electrons stored in the floating gate can tunnel to the selective gate polysilicon And achieve erasure.囷1D schematically illustrates a string of memory cells organized into a reverse (NAND) cell. The NAND cell 50 is composed of a series of memory transistors m, M2, ... Μη (η = 4, 8, 16 or higher) which are derived from their source and daisy-chained ). A pair of selection transistors SI, S2 control the connection of the memory transistor chain to the outside via the source terminal 54 and the terminal terminal 56 of the NAND cell. In a memory array, when the source select transistor S1 is turned on, the source terminal is coupled to the source line. Similarly, when the drain select transistor S2 is turned on, the drain terminal of the NAND cell is coupled to the bit line of the memory array. Each memory transistor in the chain has a charge storage element to store a given amount of charge to represent the desired memory state. The control gate of each memory transistor provides control over read and write operations. The control gates of each of the selected transistors S1, S2 provide controlled access to the NAND cells via source terminal 54 and gate terminal 56 of the NAND cell, respectively. When the addressed memory transistor in the NAND cell is read and verified during the stylization, its control gate is supplied at an appropriate voltage. At the same time, the remaining unaddressed memory cell system in the NAND cell 5 is fully turned on by applying a sufficient voltage across its control gate. In this way, the conductive path is effectively generated from the source of the individual memory transistor to the source terminal 54 of the NAND cell and also from the gate of the individual memory transistor 117671.doc -10- 1328231 to the gate terminal 56 of the cell. . A memory device having the NAND cell structure is described in U.S. Patent Nos. 5,570,315, 5,903,495, 6,046,935. Figure 1E schematically illustrates a non-volatile memory having a dielectric layer for storing charge. A dielectric layer is used in place of the electrically conductive floating gate elements described earlier. Such memory devices utilizing dielectric storage elements have been used by Eitan et al.

在"NROM: A Novel Localized Trapping,2-Bit Nonvolatile Memory Cell," ’ IEEE Electron Device Letters,2000年 U 月’第11期,第21卷,第543至545頁中進行描述。〇1^〇介 電層在源極與汲極擴散之間的通道上延伸。用於一資料位 元之電荷位於鄰近汲極之介電層中,且用於另一資料位元 之電荷位於鄰近源極之介電層中。舉例而言,美國專利第 5,768,192及6,011,725號揭示具有夾於兩個二氧化矽層之間 的捕集介電質之非揮發性記憶體單元。藉由獨立地讀取介 電質内空間分離之電荷儲存區域的二進位狀態而實施多狀 態資料儲存。 記憶體陣列 a己憶體裝置通常包括以列及行配置的且可由字線及位元 線定址之記憶體單元的二維陣列。可根據反或(N〇R)型或 NAND型架構而形成該陣列。 NOR陣列 囷2說明§己憶體單元之n〇R陣列之一實例。已以圓1 b或 1C中所說明之類型的單元實施了具有n〇r型架構之記憶體 裝置。每一列記憶體單元係由其源極及汲極以菊鏈方式而 117671.doc IJ28231 連接。有時將此設計稱作虛接地設計。每一記憶體單元ι〇 : 具有源極14'沒極16、控制閘極30及選擇間極40。一列中 : 《單兀使其選擇閘極連接至字線42。-行中之單元使其源 極及及極刀別連接至選定位元線34及36 ^在記憶體單元使 其控制閘極及選擇閘極獨立受控的一些實施例中,引導線 36亦連接一行中之單元的控制閘極。 許多快閃EEPROM裝置係以記憶體單元而實施,其中該 鲁 #記憶體單元中每一者以其控制閘極及選擇閘極連接在一 起而形成》在此狀況下,無需引導線且一字線簡單地連接 每列之單元的所有控制閘極及選擇閘極。此等設計之 實例係揭示於美國專利第5,172,338及5,418,752號中。在此 等设计中,該字線基本上執行兩個功能:列選擇及將控制 閘極電壓供應至列中之所有單元以用於讀取或程式化。 N AND陣列 囷3說明記憶體單元之NAND陣列之一實例,諸如囷id • 中所示。沿NAND鏈之每一行,一位元線耦合至每一 NAND鏈之汲極端子56。沿nanD鏈之每一列,一源極線 可連接該NAND單元之所有源極端子54。而且,沿一列之 NAND鏈之控制閘極連接至一系列對應字線。可藉由經相 連字線以控制閘極上之適當電壓接通選擇電晶體對(參見 - 囷1D)而定址一整列naND鏈。當正讀取NAND鏈内表示記 . 憶體單元的記憶電晶體時,該鏈中之剩餘記憶電晶體經由 其相關聯字線而困難地接通以使得流將該鏈之電流基本上 取決於儲存於所讀取之單元中的電荷之位準。NAND架構 117671.doc -12- 1328231 陣列之一實例及其作為記憶體系統之部分的操作係發現於 美國專利第 5,570,315、5,774,397 及 6,〇46,935號中。 程式化及程式化抑制 在程式化反及記憶體之狀況下’將—程式化電壓脈衝施 加至連接至一選定記憶體單元之頁的字線。在該頁内,待 程式化之彼等記憶體單元使其位元線電壓設定為〇V同時未 待程式化之其他記憶體單元使其位元線電壓設定為系統電 源電壓Vdd以便抑制程式化。將位元線設定為vdd將在反 及鏈之汲極側有效地切斷選擇電晶體並導致浮動之通道。 在程式化期間’該浮動通道處之電壓將以高字線電壓而升 壓。此將有效地減小該通道與電荷儲存單元之間的電位 差’藉此阻止將電子自通道牵拉至電荷儲存單元以實現程 式化。 區塊擦除 電荷儲存記憶體裝置之程式化僅可導致將更多電荷添力 至其電荷儲存元件。因此,在程式操作之前,須移除 擦除)電荷儲存元件中之現有電荷。提供擦除電路(未圖示 以擦除記憶體單元之一或多個區塊。當一起(亦即,在_ 瞬間)電擦除單元之一整個陣列的單元或該陣列之顯著君 之單元時,諸如EEPROM之非揮發性記憶體係稱作,,衫 閃"EEPRQM。—旦被擦除’便隨後對該群單元進行再泰 式化。可一起被擦除之單元的群可由一或多個可定址擦時 單元組成。擦除單元或區塊通常儲存一或多胃f料頁令 程式化及讀取之單位,禮營可为霞 ^ , ’ <早位在早一刼作中程式化或讀卑 117671.doc -13· -個以上頁。每-頁通常儲存一或多個扇區 ; 大小係由Φ4 ^ ^ .動—“機統加以界定° —實例為具有遵循對磁碟驅 、 i之標準的512位元組使用者資料加上關於使用 貝料及/或儲存有該使用者f料之區塊的某數目位元組 附加資訊的扇區。 讀取/寫入電路 在通常之二狀SEEPR0M^中,建立至少—電流斷點 • ^以便將傳導窗(C〇nduction window)分割為兩個區域。 藉由施加預疋、固定電壓而讀取一單元時,其源極,汲 極電流係藉由與該斷點位準(或參考電流w)比較而解析 =記,狀態。若電流讀數高於斷點位準之電流讀數,則判 定該單元處於一邏輯狀態(例如’ ”零"狀態)。另一方面, 若電流小於斷點位準之電流,則判定單元處於另一邏輯狀 態(例如,"一"狀態)。因此,該二狀態單元儲存一位元之 數位資訊。經常提供-可外部程式化之參考電流源作為記 • 憶體系統之部分以產生斷點位準電流。 為了增加記憶體容量,隨半導體技術之狀態發展,快閃 EEPROM裝置正被製造成具有愈來愈高之密度。用於増加 儲存容量之另一方法為使每一記憶體單元儲存兩個以上狀 態。 - 對於多狀態或多位準EEPROM記憶體單元而言,藉由一 個以上斷點將傳導窗分割為兩個以上區域以致每一單元能 夠儲存一個以上位元之資料。—給定EEPR〇M陣列可儲存 之資訊因此隨每一單元可儲存之狀態的數目而增加。具有 117671.doc 1328231 多狀態或多位準記憶體單元之EEPR〇M或快閃eepr〇m已 : 描述於美國專利第5,172,338號中。 : 。實務上’通常藉由在將參考電壓施加至控制閘極時感測 早元之源電極及汲電極上之傳導電流而讀取單元的記憶狀 態。因此,對於單元之浮動閘極上的每一給定電荷而言, 可偵測關於固定參考控制閘極電壓之對應傳導電流。類似 地,可程式化至㈣閘極上之電荷&範圍界定一對應臨限 _ 電壓窗或一對應傳導電流窗。 或者,代替偵測經分割電流窗中之傳導電流,可在控制 閘極處設定用於在測試中之給定記憶狀態的臨限電壓並偵 測傳導電流是低於還是高於臨限電流。在一實施中,藉由 檢查傳導電流對位元線之電容完全放電之速率而實現^相 對於臨限電流之傳導電流的偵測。 囷4說明對於浮動閘極在任一時間可選擇性地進行儲存 之四個*同1荷Q1至Q4,源極-汲極電流ID與控制閘極電 • 壓VCG之間的關係。四個對VCG實線曲線表示可在記憶體 單元之浮動閘極上程式化的四個可能電荷位準,其分別對 應於四個可旎之§己憶狀態。作為一實例,一單元群體之臨 限電壓窗可在請至3.5¥之範圍内。可藉由將臨限窗分割 為五個區域、每-區域間隔0.5 乂而對六個記憶狀態進行 • 分界(demarcate)。舉例而言,若如圖所示使用2 μΑ之參考 電流(lREF),則可將以Q1程式化之單元視為在記憶狀態 ”1" ’由於其曲線與iREF相交於由乂⑶=〇 5¥及丨0V分界之 臨限窗區域中。類似地,Q4處於記憶狀態”5"。 II7671.doc 15 如可自以上描述看出的,使記憶體單元儲存的狀態愈 多’其臨限窗分割地愈精細。此在程式化及讀取操作時將 需要更高精度以便能夠達成所需解析度。 美國專利第4,357,685號揭示程式化2狀態EPROM之方 法’其中當將一單元程式化至給定狀態時,該單元經受連 續程式化電壓脈衝,每一次將遞增之電荷添加至浮動閘 極。在脈衝之間,讀回或驗證該單元以判定其相對於斷點 位準之源極-沒極電流。當已將電流狀態驗證為達到所要 狀態時’程式化停止。所使用之程式化脈衝串可具有增加 之週期或振幅》 先前技術程式化電路僅施加程式化脈衝以將臨限窗自已 擦除或接地狀態單步調試(step through)直至達到目標狀態 為止。實際上,為允許充足的解析度,每一經分割或分界 之區域將需要至少約五個程式化步驟進行橫向。該效能對 於2狀態記憶體單元而言係可接受的。然而,對於多狀態 單元而言’所需步驟數目隨分割區數目而增加且因此,須 增加程式化精度或解析度。舉例而言,丨6狀態單元可需要 平均至少40個程式化脈衝以程式化至目標狀態。 圊5示意性地說明具有記憶體陣列1〇〇之典型配置的記憶 體裝置,該記憶體陣列1 〇〇可由讀取/寫入電路丨7〇經列解 碼器130及行解碼器160而存取。如關於圓2及3所述的,記 憶體陣列1〇〇中之記憶體單元的記憶電晶體係可經由—組 選定字線及位7L線而定址。列解碼器13〇選擇一或多個字 線且行解碼器160選擇一或多個位元線以便將適當電壓施 117671.doc ·16· 1328231 加至已定址記憶電晶體的各別閘極。提供讀取/寫入電路 170以讀取或寫入(程式化)已定址記憶電晶體之記憶狀態。 讀取/寫入電路Π0包括可經由位元線而連接至陣列中之記 憶體元件的眾多讀取/寫入模組。 影響讀取/寫入效能及準確度之因素 為了改良讀取及程式化效能,並列讀取或程式化一陣列 中之多個電荷儲存元件或記憶電晶體。因此,一起讀取或 程式化一邏輯π頁"之記憶體元件。在現有記憶體架構中, 一列通常含有若干交錯頁。將一起讀取或程式化一頁之所 有記憶體元件。行解碼器將選擇性地將該等交錯頁中每一 者連接至對應數目之讀取/寫入模組。舉例而言,在一實 施中,記憶體陣列經設計以具有532位元組(5 12位元組加 上附加之20位兀組)的頁大小。若每一行含有一汲極位元 線且每列存在兩個交錯頁,則此達到85 12行其中每一頁 與4256打相關聯》將存在4256個感測模組,其為可連接的 以並列讀取或寫入所有偶數位元線或奇數位元線。以此方 式,自記憶體元件之頁讀取—頁並列4256位元(亦即,532 位元組)之資肖或將㉟等資料程式化至記憶冑元件之頁 中。形成讀取/寫入電路170之讀取/寫入模組可配置成各種 如上文所提及的,習知記憶體裝置藉由以整體並列之方 ^一次對所有偶數或所有奇數位元線進行操作而改良讀取 禮寫入#作〜由㈣交錯頁组叙列之此,,交替位元線”架 有助於減輕裝配讀取/寫入電路之區塊的問題。1亦 I17671.docIt is described in "NROM: A Novel Localized Trapping, 2-Bit Nonvolatile Memory Cell, " IEEE Electron Device Letters, U.S. U.S.A., Vol. 21, pp. 543-545. The dielectric layer extends over the channel between the source and the drain diffusion. The charge for one data bit is located in the dielectric layer adjacent to the drain and the charge for the other data bit is located in the dielectric layer adjacent the source. For example, U.S. Patent Nos. 5,768,192 and 6,011,725 disclose non-volatile memory cells having a dielectric sandwiched between two ceria layers. Multi-state data storage is performed by independently reading the binary state of the charge storage region separated by a space within the dielectric. Memory Array A memory device typically includes a two-dimensional array of memory cells arranged in columns and rows and addressable by word lines and bit lines. The array can be formed according to an inverse (N〇R) type or a NAND type architecture. NOR Array 囷 2 illustrates an example of a n〇R array of § recalled cells. A memory device having an n〇r type architecture has been implemented in a cell of the type illustrated in the circle 1 b or 1C. Each column of memory cells is daisy-chained by its source and drain 117671.doc IJ28231. This design is sometimes referred to as a virtual ground design. Each memory cell ι〇 has a source 14' poleless 16, a control gate 30 and a selection pole 40. In one column: "Single 兀 makes its selection gate connected to word line 42. - the cells in the row have their source and poles connected to the selected positioning elements 34 and 36. In some embodiments in which the memory cells have their control gates and select gates independently controlled, the guide lines 36 are also Connect the control gates of the cells in a row. Many flash EEPROM devices are implemented in a memory cell in which each of the Lu# memory cells is formed with their control gates and select gates connected together. In this case, no guide lines are needed and a word is needed. The line simply connects all of the control gates and select gates of the cells in each column. Examples of such designs are disclosed in U.S. Patent Nos. 5,172,338 and 5,418,752. In these designs, the word line basically performs two functions: column selection and supplying the control gate voltage to all cells in the column for reading or programming. N AND Array 囷3 illustrates an example of a NAND array of memory cells, such as shown in 囷id •. Along the NAND chain, one bit line is coupled to the 汲 terminal 56 of each NAND chain. Along each column of the nanD chain, a source line can connect all of the source terminals 54 of the NAND cell. Moreover, the control gates of the NAND chain along a column are connected to a series of corresponding word lines. An entire column of naND chains can be addressed by turning on the selected transistor pair (see - 囷1D) via the associated word line to control the appropriate voltage on the gate. When a memory transistor representing a memory cell in the NAND chain is being read, the remaining memory transistors in the chain are difficult to turn on via their associated word lines such that the current of the chain is substantially dependent on The level of charge stored in the unit being read. NAND architecture 117671.doc -12- 1328231 An example of an array and its operating system as part of a memory system are found in U.S. Patent Nos. 5,570,315, 5,774,397 and 6, 〇 46,935. Stylization and Stylization Suppression In the case of stylization against memory, a stylized voltage pulse is applied to the word line connected to the page of a selected memory cell. In this page, the memory cells to be programmed are set to other memory cells whose bit line voltage is set to 〇V and not yet to be programmed, so that the bit line voltage is set to the system power supply voltage Vdd to suppress stylization. . Setting the bit line to vdd effectively cuts off the selected transistor and causes the floating channel on the opposite side of the chain. During stylization, the voltage at the floating channel will rise with a high word line voltage. This will effectively reduce the potential difference between the channel and the charge storage unit' thereby preventing electrons from being pulled from the channel to the charge storage unit for programming. Block Erase The stylization of a charge storage memory device can only result in more charge being added to its charge storage element. Therefore, the existing charge in the erased charge storage element must be removed prior to program operation. Providing an erase circuit (not shown to erase one or more blocks of memory cells. When together (ie, at _ instant) one of the entire array of cells or a significant unit of the array When a non-volatile memory system such as EEPROM is called, the EEPROM flashes "EEPRQM. Once erased, then the group unit is re-thailed. The group of units that can be erased together can be one or A plurality of addressable erasing units are formed. The erasing unit or block usually stores one or more stomach f-pages to program and read the unit, and the camp can be Xia ^, ' < early in the early morning Stylized or read 117671.doc -13· - more than one page. Each page usually stores one or more sectors; the size is determined by Φ4 ^ ^. Disk drive, i's standard 512-bit user data plus sectors for additional information on the number of bytes used for the batting and/or the block in which the user f is stored. Read/Write The circuit establishes at least - current breakpoint ^ in the usual two-shaped SEEPR0M^ to conduct the conduction window (C〇 Nduction window) is divided into two regions. When a cell is read by applying a pre-charged, fixed voltage, its source and drain current are resolved by comparison with the breakpoint level (or reference current w) = State, if the current reading is higher than the current reading of the breakpoint level, then the unit is determined to be in a logic state (eg 'zero' state). On the other hand, if the current is less than the current at the breakpoint level, then The decision unit is in another logic state (eg, "one" state.) Therefore, the two state unit stores one bit of digital information. A reference current source that can be externally programmed is often provided as a memory system. Partly to generate a breakpoint level current. In order to increase the memory capacity, as the state of semiconductor technology develops, flash EEPROM devices are being manufactured to have ever higher density. Another method for adding storage capacity is to make each A memory cell stores more than two states. - For a multi-state or multi-bit quasi-EEPROM memory cell, the conduction window is split into more than two regions by more than one breakpoint so that each The unit can store more than one bit of data.—The information that can be stored in a given EEPR〇M array is therefore increased with the number of states that each unit can store. It has 117671.doc 1328231 multi-state or multi-bit quasi-memory unit EEPR〇M or flash eepr〇m has been described in U.S. Patent No. 5,172,338. In practice, 'the source electrode and the 汲 electrode of the early element are typically sensed by applying a reference voltage to the control gate. The upper state conducts the current to read the memory state of the cell. Therefore, for each given charge on the floating gate of the cell, the corresponding conduction current with respect to the fixed reference control gate voltage can be detected. Similarly, the charge & range that can be programmed to the (iv) gate defines a corresponding threshold _ voltage window or a corresponding conduction current window. Alternatively, instead of detecting the conduction current in the split current window, a threshold voltage for a given memory state in the test can be set at the control gate and the conduction current is detected below or above the threshold current. In one implementation, the detection of the conduction current relative to the threshold current is achieved by examining the rate at which the conduction current completely discharges the capacitance of the bit line.囷4 illustrates the relationship between the source-drain current ID and the control gate voltage VCG for the four*-one loads Q1 to Q4 that the floating gate can selectively store at any one time. The four pairs of VCG solid lines represent four possible charge levels that can be programmed on the floating gate of the memory cell, which correspond to four § 己 recall states, respectively. As an example, the threshold voltage window of a unit group can be in the range of up to 3.5 yen. The six memory states can be demarcate by dividing the threshold window into five regions with a spacing of 0.5 每 per region. For example, if a reference current (lREF) of 2 μΑ is used as shown, the unit stylized with Q1 can be considered to be in the memory state “1" 'because its curve intersects iREF at 乂(3)=〇5 ¥ and 丨0V demarcation in the threshold window area. Similarly, Q4 is in memory state "5". II7671.doc 15 As can be seen from the above description, the more states the memory cells are stored, the finer the threshold window is. This will require more precision in stylization and read operations to achieve the desired resolution. U.S. Patent No. 4,357,685 discloses a method of staging a 2-state EPROM' wherein when a unit is programmed to a given state, the unit is subjected to a continuous stylized voltage pulse, each time adding an increasing charge to the floating gate. Between pulses, the cell is read back or verified to determine its source-no-pole current relative to the breakpoint level. Stylized stop when the current state has been verified to have reached the desired state. The stylized bursts used can have an increased period or amplitude. Previous prior art stylized circuits only applied stylized pulses to step through the erased window from the erased or grounded state until the target state was reached. In fact, to allow for sufficient resolution, each segmented or demarcated region will require at least about five stylized steps to be landscaped. This performance is acceptable for 2-state memory cells. However, for multi-state cells, the number of steps required increases with the number of partitions and, therefore, must increase stylized precision or resolution. For example, a 丨6 state unit may require an average of at least 40 stylized pulses to be programmed to a target state.圊5 schematically illustrates a memory device having a typical configuration of a memory array, which can be stored by a read/write circuit 〇7, a column decoder 130, and a row decoder 160. take. As described with respect to circles 2 and 3, the memory cell system of the memory cells in memory array 1 can be addressed via a set of selected word lines and bit 7L lines. Column decoder 13 selects one or more word lines and row decoder 160 selects one or more bit lines to apply the appropriate voltage 117671.doc ·16·1328231 to the respective gates of the addressed memory transistor. A read/write circuit 170 is provided to read or write (program) the memory state of the addressed memory transistor. The read/write circuit Π0 includes a plurality of read/write modules connectable to the memory elements in the array via bit lines. Factors Affecting Read/Write Performance and Accuracy To improve read and program performance, parallel read or program multiple charge storage elements or memory transistors in an array. Therefore, a logical π page" memory component is read or programmed together. In existing memory architectures, a column typically contains a number of interlaced pages. All memory elements of a page will be read or programmed together. The row decoder will selectively connect each of the interlaced pages to a corresponding number of read/write modules. For example, in one implementation, the memory array is designed to have a page size of 532 bytes (5 12 bytes plus an additional 20-bit group). If each row contains a 汲-bit line and there are two interlaced pages per column, then this reaches 85 12 rows, each of which is associated with 4256 ticks. There will be 4256 sensing modules that are connectable. Read or write all even or odd bit lines in parallel. In this way, the page is read from the page of the memory element—the page is parallelized with 4256 bits (ie, 532 bytes) or the 35 data is programmed into the page of the memory element. The read/write module forming the read/write circuit 170 can be configured in various ways as mentioned above, by conventionally juxtaposed squares for all even or all odd bit lines. Performing the operation and improving the read write write #作~ By (four) interleaved page group, the alternate bit line" frame helps to alleviate the problem of assembling the read/write circuit block. 1 also I17671. Doc

-17- 係藉由考慮控制位元線至位元線電容性耦合而指定。區塊 解碼器用以將讀取/寫入模組之組多路傳輸至偶數頁或奇 數頁°以此方式,每當讀取或程式化一組位元線時,便可 將父錯組接地以最小化直接相鄰位元線搞合。 然而’交錯頁架構在至少三個方面為不利的。第一,其 需要額外多工電路。第二,其在效能方面緩慢。為完成由 一子線連接或連接於一列中之記憶體單元的讀取或程式 化’需要兩個讀取或兩個程式化操作。第三,其在處理其 他干擾效應方面亦並非最佳的,該等其他干擾效應諸如在 於不同時間(諸如在奇數及偶數頁中獨立地)程式化兩個相 鄰電荷儲存元件時,在浮動閘極位準處該相鄰電荷儲存元 件之間的場耦合。 美國專利公開案第2004_0057318_A1號揭示了允許並列 感測複數個相連記憶體單元之記憶體裝置及其之方法。舉 例而言,將共用相同字線的沿一列之所有記憶體單元作為 一頁而一起讀取或程式化。此"全位元線"架構使"交替位 元線架構之效能加倍同時最小化由相鄰干擾效應引起的 誤差。然而,感測所有位元線確實引起了相鄰位元線之間 由於其互電容而感應之電流所導致的串擾之問題β藉由當 感測每一鄰近對位元線之傳導電流時,使每一鄰近對位元 線之間的電壓差實質上獨立於時間而處理此問題。當強加 此條件時’歸因於各種位S線之電容的所有位移電流降 落,由於其皆取決於時變電壓差。耦接至每一位元線之感 測電路在該位元線上具有一電壓鉗制(voltage clamp)以使 117671.doc 18· 1328231 不執行第二子循環直至已驗證該群中任 第一臨限值為止。 在-較佳實施財,在第-切環結束時執行_被稱作 "一位元㈣"("OBP")之操作,以便為該事件檢查是否已 將該群中任—記憶體單元程式化得超過第-臨限位準。在 彼事件中,後續驗證循環將不再需要〇Bp但將包含第二子 循環。-17- is specified by considering the capacitive coupling of the control bit line to the bit line. The block decoder is used to multiplex the group of read/write modules to even or odd pages. In this way, the parent error group can be grounded each time a group of bit lines is read or programmed. Minimize the direct adjacent bit lines. However, the 'interlaced page architecture' is disadvantageous in at least three respects. First, it requires additional multiplexed circuits. Second, it is slow in terms of performance. Two reads or two stylization operations are required to complete the reading or programming of a memory cell connected by a sub-line or connected to a column. Third, it is also not optimal in dealing with other interference effects, such as floating gates when programming two adjacent charge storage elements at different times (such as independently in odd and even pages). The polar level is the field coupling between adjacent charge storage elements. U.S. Patent Publication No. 2004_0057318-A1 discloses a memory device that allows parallel sensing of a plurality of connected memory cells and a method thereof. For example, all memory cells along a column that share the same word line are read or programmed together as one page. This "full bit line" architecture doubles the performance of the alternate bit line architecture while minimizing errors caused by adjacent interference effects. However, sensing all bit lines does cause crosstalk problems caused by currents induced between adjacent bit lines due to their mutual capacitance. By sensing the conduction current of each adjacent bit line, This problem is addressed by making the voltage difference between each adjacent bit line substantially independent of time. When this condition is imposed, all the displacement currents due to the capacitance of the various bit S lines are dropped, since they all depend on the time varying voltage difference. A sensing circuit coupled to each bit line has a voltage clamp on the bit line such that 117671.doc 18· 1328231 does not perform the second sub-loop until the first threshold in the group has been verified The value is up. In the preferred implementation, the operation of _ is called "one-bit (four)"("OBP") is performed at the end of the first-cutting ring to check whether the group has any memory in the group. The unit is programmed to exceed the first-threshold level. In the event, the subsequent verification loop will no longer require 〇Bp but will contain the second sub-cycle.

$己憶體單元超過 自對本發明之較佳實施例的以下描述將瞭解本發明之額 外特徵及優點,應結合隨附圖式進行該描述。 【實施方式】The additional features and advantages of the present invention will become apparent from the following description of the preferred embodiments of the invention. [Embodiment]

囷6A示意性地說明具有一組讀取/寫入電路之緊密記憶 體裝置,其提供實施本發明之情形。該記憶體裝置包含纪 憶體單元之二維陣列300、控制電路31〇及讀取/寫入電路 370。記憶體陣列300可由字線經列解碼器33〇及由位元線 經行解碼器360而定址。讀取/寫入電路37〇係實施為一組囷 6A schematically illustrates a compact memory device having a set of read/write circuits that provides a scenario for practicing the present invention. The memory device includes a two-dimensional array 300 of memory cells, a control circuit 31A, and a read/write circuit 370. The memory array 300 can be addressed by a word line through a column decoder 33 and by a bit line via a row decoder 360. The read/write circuit 37 is implemented as a group

之記憶體單元。在一較佳實施例中,頁係由相連列之記憶 體單元構成。在一列記憶體單元分割為多個區塊或頁之另 一實施例中,提供區塊多工器350以將讀取/寫入電路37〇 多路傳輸至個別區塊。 控制電路310與讀取/寫入電路370合作以對記憶體陣列 300執行記憶操作。控制電路310包含狀態機312、晶片上 位址解碼器314及功率控制模組316。狀態機312提供對記 憶操作之晶片級控制。晶片上位址解碼器314將由主機或 117671.doc -20· 1328231 〇己憶體控制器^ # μ > μ & 7 更用之位址之間的位址介面提供至解瑪器 及36〇所使用之硬體位址。功率控制模組3 16控制在記 : 憶操作期間供應至字線及位元線之功率及電壓。 圓6Β說明囷“中所示緊密記憶體裝置之較佳配置。以 對稱方式在陣列之相對側上實施由各種周邊電路對記憶體 車列300之存取,以使得每一側上之存取線及電路減少一 半因此,列解碼器分裂為列解碼器330Α及330Β,且行 • 解碼器分裂為行解碼器360Α及360Β。在將一列記憶體單 元分割為多個區塊之實施例中,區塊多工器35〇分裂為區 塊多工器350Α及350Β»類似地’讀取/寫入電路分裂為自 底部連接至位元線之讀取/寫入電路37〇Α及自陣列3〇〇之頂 部連接至位元線的讀取/寫入電路37〇Β。以此方式,讀取/ 寫入模組之密度及因此該組感測模組480之密度基本上減 小―·半 〇 並列操作之整組ρ個感測模組4 8 0允許並列地讀取或程式 I 化沿一列之一區塊(或頁)的Ρ個單元。一實例記憶體陣列 可具有ρ = 512位元組(5 12x8位元)。在較佳實施例中,區 塊為一連串整列單元。在另一實施例中,區塊為列中之一 子組單元。舉例而言’該子組之單元可為整列之一半或整 列之四分之一 ^該子組之單元可為一連串相連單元或每隔 一個之單元或每隔預定數目之單元。每一感測模組包含一 用於感測記憶體單元之傳導電流的感測放大器。 囷6C說明若干感測模組至讀取/寫入堆疊之較佳分組。 讀取/寫入堆疊490允許以提取出(factor out)圓6Α中所示之 H7671.doc -21- =感測模組之共同組件的空間有效方式而實施該等感測 模組。 圖6D不意性地說明圖6(:所示讀取/寫人堆疊中之基本組 件的總體配置。螬& @ λ 晶μ^ ' 讀取/寫入堆疊490包括用於感測k個位元 線之感測放大器212之一堆疊、一用於經由1/〇匯流排231 ㈣人或輸出資料之17◦模組44G、用於儲存輸人或輪出資 科之資料鎖存11430的-堆疊、—在讀取/寫人堆疊49〇中 處理及儲存資料之共同處理器5⑽,及_用於在堆疊組件 之間通信的堆疊匯流排421。讀取/寫入電路37〇中之堆疊 匯流排控制器經由線411而提供控制及定時信號以用於: 制讀取/寫人堆疊中的各種組件。共同處理器包含用於在 處理期間臨時儲存資料的一或多個暫存器或鎖存器52〇。 較佳讀取/寫入堆疊已揭示於在2004年12月29日申請之 美國專利申請案第U/026,536號中…較佳感測放大器係 揭示於美國專利公開案第2004_0109357_A1號中。前述兩 個文獻皆在此以引用的方式併入本文中。 用於多狀態記憶體之讀取及程式化之實例 圓7A至7E、8人至8£、从至把分別說明樣態記憶體之 多位兀編碼的三個實例。在4狀態記憶體單元中,可由兩 個位元表示四個狀態。一現有技術為使用2路徑程式化來 程式化該記憶體。由第一路徑程式化第—位元(下頁位 元)。隨後,在第二路徑中程式化同一單元以表示所要之 第一路& (上頁位元)。為了在第二回合令不改變第一位元 之值,使第二位元之記憶狀態表示取決於第一位元的值。 117671.doc -22- 1328231 囷7A至7E說明以習知2位元格雷碼(Gray code)編碼之4 狀態記憶體的程式化及讀取。將記憶體單元之可程式化臨 限電壓的範圍(臨限窗)分割為四個區域,表示一未經程式 化"U"狀態及三個其他愈加程式化之狀態"A"、"B"及"c"。 該四個區域係分別藉由分界臨限電壓DA、db及Dc而分 圓7A說明當每一記憶體單元使用習知格雷碼儲存兩個位 元之資料時,4狀態記憶體陣列之臨限電壓分佈。四個分 佈表示四個記憶狀態,,U”,"A" ’ "B"及"C"之群體。在程式 化記憶體單元之前’首先將其擦除至其"U"或"未經程式化 ”狀態。當記憶體單元變得愈加程式化時,逐漸地到達記 憶狀態"A”,"B"及"C"。格雷碼使用(上位元,下位元)將 ’’U”表示為(1,1) ’將"A"表示為(1,〇),將,,B"表示為(〇,〇) 且將"C"表示為(〇, 1)。 囷7B說明使用格雷碼以現有、2路徑程式化機制進行的 下頁程式化。對於待並列程式化之一頁單元而言,上位元 及下位元將引起兩個邏輯頁:由下位元組成之邏輯下頁及 由上位元組成之邏輯上頁。第一程式化路徑僅程式化邏輯 下頁位元。藉由適當之編碼,對同一頁單元之後續、第二 程式化路徑將程式化邏輯上頁位元而不會重設邏輯下頁位 兀。格雷碼為常用碼,其中在轉變至鄰近狀態時僅—位元 改變。因此,由於僅涉及一位元,故此碼具有對誤差校正 具有較少需求之優點。 使用格雷碼時的一般機制為使"表示"未程式化"條件。Memory unit. In a preferred embodiment, the pages are comprised of memory cells in contiguous columns. In another embodiment in which a column of memory cells is divided into a plurality of blocks or pages, a block multiplexer 350 is provided to multiplex the read/write circuits 37 至 to individual blocks. Control circuit 310 cooperates with read/write circuit 370 to perform a memory operation on memory array 300. Control circuit 310 includes state machine 312, on-wafer address decoder 314, and power control module 316. State machine 312 provides wafer level control of the memory operation. The on-wafer address decoder 314 supplies the address interface between the host or the address used by the host or the 117671.doc -20· 1328231 〇 忆 控制器 controller ^ # μ > μ & 7 to the hacker and 36 〇 The hardware address used. The power control module 3 16 controls the power and voltage supplied to the word lines and bit lines during the memory operation. The preferred arrangement of the compact memory device shown in Figure 6 illustrates the access to the memory array 300 by various peripheral circuits on opposite sides of the array in a symmetrical manner to enable access on each side. The line and circuit are reduced by half. Therefore, the column decoder is split into column decoders 330Α and 330Β, and the row/decoder is split into row decoders 360Α and 360Β. In an embodiment in which a column of memory cells is divided into a plurality of blocks, the region The block multiplexer 35〇 splits into a block multiplexer 350Α and 350Β»similarly, the read/write circuit is split into a read/write circuit 37 from the bottom to the bit line and from the array 3〇. The top of the crucible is connected to the read/write circuit 37 of the bit line. In this way, the density of the read/write module and thus the density of the set of sensing modules 480 is substantially reduced - half The entire set of ρ sensing modules 480 in parallel operation allows parallel reading or programming of one cell along a column (or page) of a column. An example memory array can have ρ = 512 bits Tuple (5 12x8 bits). In the preferred embodiment, the block is a series of whole In another embodiment, the block is a subgroup of cells in the column. For example, the unit of the subgroup may be one half of the entire column or one quarter of the entire column. The unit of the subgroup may be a series of Connected units or every other unit or every predetermined number of units. Each sensing module includes a sense amplifier for sensing the conduction current of the memory unit. 囷6C illustrates several sensing modules to read / Write to the preferred grouping of the stack. The read/write stack 490 allows implementation in a space efficient manner of factoring out the common components of the H7671.doc -21- = sensing module shown in the circle 6Α Figure 6D is an unintentional illustration of the overall configuration of the basic components in the read/write stack shown in Figure 6: 螬 & @ λ crystal μ^ 'read/write stack 490 includes A stack of sense amplifiers 212 for sensing k bit lines, a 17-inch module 44G for storing or inputting data via a 1/〇 bus bar 231 (4) person or output data Data latch 11430 - stacking - processing and storing data in the read / write stack 49 a processor 5 (10), and a stack bus 421 for communicating between the stacked components. The stack bus controller in the read/write circuit 37 provides control and timing signals via line 411 for: The various components in the stack are fetched/written. The coprocessor includes one or more registers or latches 52 for temporarily storing data during processing. A preferred read/write stack has been disclosed in 2004. A preferred sense amplifier is disclosed in U.S. Patent Application Publication No. 2004-109357357A, the entire disclosure of which is incorporated herein by reference. . Examples of Reading and Styling for Multi-State Memory Circles 7A through 7E, 8 to 8 £, and from the top to the three examples of multi-bit encoding of the state memory. In a 4-state memory cell, four states can be represented by two bits. One prior art is to program the memory using 2-path stylization. The first bit (the next page bit) is stylized by the first path. Subsequently, the same unit is programmed in the second path to indicate the desired first & (top page bit). In order to not change the value of the first bit in the second round, the memory state representation of the second bit depends on the value of the first bit. 117671.doc -22- 1328231 囷7A to 7E illustrate the stylization and reading of 4-state memory encoded by the conventional 2-bit Gray code. Dividing the range of programmable threshold voltages (the threshold window) of the memory unit into four regions, representing an unprogrammed "U" state and three other increasingly stylized states"A", &quot ;B" and "c". The four regions are divided by the boundary threshold voltages DA, db, and Dc, respectively. 7A illustrates the threshold of the 4-state memory array when each memory cell stores the data of two bits using the conventional Gray code. Voltage distribution. The four distributions represent the four memory states, U", "A" ' "B" and "C" groups. Before stylizing the memory unit, 'first erase it to its "U" or "unstylized" status. As the memory unit becomes more and more stylized, it gradually reaches the memory state "A","B" and "C". Gray code uses (upper, lower) to represent ''U' as (1) , 1) 'Express "A" is expressed as (1, 〇), will,, B" is expressed as (〇, 〇) and "C" is expressed as (〇, 1).囷7B shows the next page stylization using Gray code with the existing, 2-path stylization mechanism. For a page unit to be staggered, the upper and lower bits will cause two logical pages: a logical lower page consisting of lower bits and a logical upper page composed of upper bits. The first stylized path only stylizes the next page bit. With proper encoding, the subsequent, second stylized path to the same page unit will program the logical upper page bit without resetting the logical lower page bit. The Gray code is a commonly used code in which only the bit changes when transitioning to the adjacent state. Therefore, since only one bit is involved, this code has the advantage of having less demand for error correction. The general mechanism when using Gray code is to make "represent "unprogrammed" conditions.

117671.doc -23· 因此,由(上頁位元,下頁位元)= 表示已擦除記憶狀 態"u" »在程式化邏輯下頁之第一路徑中,儲存位元"〇"之 任何單元將因此使其邏輯狀態自(χ,〇轉變為(χ,〇),其中 X"表示上位元之"無關"值。然而,由於尚未程式化上位 兀,故為一致起見,亦可由"i "標記"χ"。藉由將單元程式 化至記憶狀態"A"而表示(丨,0)邏輯狀態。亦即,在第二程 式化路桎之前,由記憶狀態"A”表示下位元值"〇„。 囷7C說明使用格雷碼以現有、2路徑程式化機制進行的 上頁程式化。執行第二路徑程式化以儲存邏輯上頁之位 元。將僅程式化需要上頁位元值"〇"的彼等單元。在第— 路徑之後’該頁中之單元處於邏輯狀態(1,丨)或(1,〇)。為 了在第二路徑中保留下頁之值,需要區分下位元值或 1 。對於自(1,0)至(〇,〇)之轉變’將所考慮之記憶體單元 程式化為記憶狀態"B"。對於自(1,1)至(〇,〖)之轉變而言, 將所談論之記憶體單元程式化至記憶狀態"c„。以此方 式’在瀆取期間’藉由判定在一單元中程式化之記憶狀 態,可解碼下頁位元與上頁位元。 藉由父替地將程式化脈衝施加至並列之一頁記憶體單元 接著對該等單元中每一者進行感測或程式化驗證以判定其 任一者是否已被程式化為其目標狀態而實現程式化,每當 已程式化驗證一單元時,即使當繼續施加程式化脈衝以完 成該群中其他單元之程式化時,該單元仍被鎖定或程式化 抑制以免受進一步程式化。自圊7B及7C可看出,在下頁 程式化期間,需相對於具有分界臨限電壓Da之狀態"A"執 117671.doc •24· 1328231 行程式化驗證(由"驗證A"表示)。然❿,對於上頁程式化 而言’需相對於狀態"B”及” c"執行程式化驗證。因此,上 頁驗證將需要分別相對於分界臨限電壓Db及%之2路徑驗 證:”驗證B”及"驗證C"。 囷7D說明辨別以格雷碼编碼之*狀態記憶體之下位元所 需的讀取操作。由於由(U)編碼之記憶狀態” A"及由(〇,〇) 編碼之"B ’丨皆且"〇'丨你;^甘丁 ^ 八作為其下位兀,故每當將記憶體單元程 式化至狀態”W時,將偵測下位元T。相反地,每 當記憶體單元在狀態"U"處未被程式化或程式化至狀離、"c" 時,將偵測下位元"r。因此,下頁讀取將需要分別相對 於分界臨限電壓DA&Dci2路徑讀取:讀取A及讀取C。 囷7E說明辨別以格雷碼編碼之4狀態記憶體之上位元所 需的讀取操作。其將需要相對於分界臨限電壓〇^之讀取路 徑:讀取B。以此方式,將偵測具有小於%之已程式化臨 限電壓的任何單元使其處於記憶狀態"丨",且反之亦然。 當第二路徑程式化錯誤時,格雷碼、2路徑程式化機制 可變為一問題。舉例而言,當下位元處於"〗"時上頁位元 至"〇"之程式化將引起自(1,丨)至(〇, υ之轉變。此需要記情 體單元自"U"經由"Α"及"Β"逐漸地程式化至"c、若在完^ 程式化之前存在停電,則記憶體單元可終止於轉變記憶狀 態中之一者(例如,"A")。當讀取記憶體單元時,會將"A" 解碼為邏輯狀態(1,〇)。此給出上位元與下位 +正確 結果,由於其應為(0,1)。類似地,若在到達"B" 式化’則其將對應於(0, 0) ^當上位元現正確時, 卜位元 H7671.doc -25· 1328231 仍為錯誤的。此外’由於自未經程式化狀態"u" 一路到達 : (a11 the way t〇)最程式化之狀態”c”的可能之轉變,故此碼 • 機制具有加重在不同時間程式化之鄰近單元的電荷位準之 間的電位差之效應。因此,其亦加重鄰近浮動閘極之間的 場效應耦合("Yupin效應'·)。 圖8A至8E說明以另一邏輯碼("LM„碼)編碼之4狀態記憶 體的程式化及5買取。此碼提供更多容錯(fault_t〇leranee)且 φ 減輕歸因於YuPin效應之相鄰單元耦合。圖8A說明當每一 δ己憶體單元使用LM碼儲存兩位元之資料時,4狀態記憶體 陣列的臨限電壓分佈^ LM編碼與囷7Α中所示習知格雷碼 的不同之處在於:上位元及下位元對於狀態"Α"及„c"而言 為反向的。"LM"碼已揭示於美國專利第6,657,891號中且 其有利之處在於藉由避免需要較大電荷改變之程式化操作 而減少鄰近浮動閘極之間的場效應耦合。 圖8B說明使用LM碼以現有、2回合程式化機制進行的下 • 頁程式化。容錯LM碼基本上避免了任何上頁程式化經由 任何中間狀態而轉變。因此,第一回合下頁程式化使邏輯 狀態(1,1)轉變至某中間狀態(X’ 0),如藉由將"未經程式 化"記憶狀態"U”程式化至由(X,〇)表示的"中間"狀態所表示 的,該"中間”狀態具有在廣泛分佈中的大於Da但小於Dei 已程式化臨限電壓。 圓8C說明使用LM碼以現有、2回合程式化機制進行的上 頁程式化。在將上頁位元程式化至之第二回合中,若 下頁位兀處於"1 ",則如藉由將"未經程式化”記憶狀態" 117671.doc •26· 〔s; 1328231 程式化至"A"所表示的,邏輯狀態(1,丨)轉變至(〇,丨)。若下 : 頁位兀處於··〇",則藉由自"中間"狀態程式化至"Β"而獲得 : 邏輯狀態(〇, 0)。類似地,若上頁保持於"1",則當已將下 頁程式化至"0"時,其將需要如藉由將“中間,,狀態程式 化至"C"所表示的,自,,中間"狀態轉變至(1,0)。由於上頁 程式化僅涉及程式化至下一鄰近記憶狀態,故自一回合至 另一回合無大量電荷改變β自"U"至粗略"中間"狀態之下 φ 頁程式化經设计以節省時間。然而,此將導致"LM"碼在 上頁程式化期間同樣地易受上頁程式化誤差或停電損壞。 舉例而言,狀態"Α"可移至不能與,,中間”狀態相區分之臨 限電壓》 圓8D說明辨別以LM碼編碼之4狀態記憶體之下位元所需 的讀取操作。解碼將取決於是否已程式化上頁。若已程式 化上頁’則讀取下頁將需要相對於分界臨限電壓%之讀取 路徑:讀取B。另一方面,若尚未程式化上頁,則將下頁 • 程式化至"中間•’狀態(囫8B),且讀取B將引起誤差。相 反,讀取下頁將需要相對於分界臨限電壓Da之讀取路徑: 讀取A。為了區分該兩個狀況,當正程式化上頁時,在上 頁中寫入一旗標("LM"旗標)。在讀取期間,將首先假定已 程式化上頁且因此將執行讀取]3操作。若讀取^^旗標,則 該假定為正確的且進行讀取操作。另一方面,若第一讀取 並未產生旗標,則其將指示尚未程式化上頁且因此將必須 藉由讀取A操作來讀取下頁。 囷8E說明辨別以LM碼編碼之4狀態記憶體之上位元所需 117671.doc •27· c S ) 1328231 的讀取操作。如自該圖清晰可見的,丨頁讀取將需要分別 相對於分界臨限電壓!)八及〇(:之2路徑讀取:讀取A及讀取 C。類似地,若尚未程式化上頁,則亦可藉由"中間"狀態 而混淆上頁之解碼。再一次地,LM旗標將指示是否已程 式化上頁。若未程式化上頁,則會將讀取資料重設至,,^" 以指示未程式化上頁資料。 LM碼在支援部分頁程式化之記憶體中亦可變為一問 題。當並列程式化或讀取一頁記憶體單元時,部分頁程式 化允許在一路徑中程式化該頁之一部分且在後續路徑中程 式化未經程式化的剩餘部分^ LM碼在一僅以資料部分地 填充上頁之程式化操作中呈現一問題。在_完成部分未經 填充之頁的後續上頁程式化中,可將資料程式化至錯誤狀 態。藉由慣例,1 '位元表示"無程式化"條件,且因此下位 元與上位元最初在未經程式化"U"狀態中預設為"丨"。上頁 位元應為"1" ’其表示未經填充部分中之單元。若未經填 充部分中之單元下頁位元偶然為"丨",則所得邏輯狀態 (1,1)將使該單元保持於’,u"。然而,若下頁位元為, 則其將導致邏輯狀態(1, 0),該邏輯狀態將使得單元被程 式化至最程式化(最高臨限電壓)之"c"狀態。一完成未經填 充部分之後續程式化路徑可不再考慮到達(0, 0)或"B"狀態 之可能性,因為可自"C"返回至較不程式化之狀態。 囷9A至9E說明以較佳邏輯碼(《LM新"碼)編碼之4狀態記 憶體的程式化及讀取。LM新碼類似於lm碼但不具有上述 缺點。圚9A說明當每一記憶體單元使新碼儲存兩個 117671.doc •28· 1328231 位元之資料時,4狀態記憶體陣列的臨限電壓分佈^ LM新 碼已揭示於Li等人之題為"NON-VOLATILE MEMORY AND CONTROL WITH IMPROVED PARTIAL PAGE PROGRAM CAPABILITY"的曰期為2005年10月27曰之美國專利公開案 第2005-0237814 A1號中。該碼與圖8A中所示LM碼的不同 之處在於:對於狀態”B"及"C"之邏輯編碼為互換的。因 此,對於"U"之(上位元,下位元)為(1, 1),對於"A"之(上 位元,下位元)為(〇,1),對於"B"之(上位元,下位元)為 (1,0),且對於"C"之(上位元,下位元)為(0, Ο)»此編碼避 免在上述LM碼中之部分頁程式化的問題,因為當下位元 處於"0"時,現將部分未經填充之上頁程式化至"Β"狀態。 部分未經填充部分之後續程式化將允許自(1,0)程式化至 (0, 0)邏輯狀態,其對應於自"Β”程式化至"C”狀態。 囷9Β說明使用LM新碼以現有、2路徑程式化機制進行的 下頁程式化。容錯LM新碼基本上避免了任何上頁程式化 經任何中間狀態之轉變。因此,第一路徑下頁程式化使邏 輯狀態(1,1)轉變至某中間狀態(X,〇),如藉由將"未經程式 化"記憶狀態"U”程式化至由(X,0)表示的”中間"狀態而表示 的,該"中間"狀態具有大於DA但小於Dc之已程式化臨限電 壓。 圖9C說明使用LM新碼以現有、2路徑程式化機制進行的 上頁程式化。在將上頁位元程式化至"0"之第二路徑中, 若下頁位元處於"1 ",則如藉由將"未經程式化"記憶狀態 "ΙΓ程式化至"A"所表示的,邏輯狀態(1,1)轉變至(0,1)。 117671.doc •29- 1328231 右下頁位π處於"ο”,則藉由自,,中間"狀態程式化至"c"而 獲得邏輯狀態(G,類似地,若上頁保持於”,·,則當已 將下頁程式化至"0"時,纟冑需要如藉由將"中間"狀態程式 化至"B"所表示的自Μ中間,,狀態轉變至(1,〇)。 +囷91)說明辨別以LM新碼編碼之4狀態記憶體之下位元所 需的讀取操作。如對於LM碼之狀況-般,相同之考慮適 用於此處。首先執行讀取6操作以判定是否可讀取1^]^旗 標若可讀取LM旗標,貝,j已程式化上頁且讀取_作將正 確地產生下頁資料。另—方面,#尚未程式化上頁,則將 藉由讀取A操作來讀取下頁資料。 圓9E說明辨別以LM新碼編碼之4狀態記憶體之上位元所 需的°賣取操作。如自該圖清晰可見的,上頁讀取將需要分 別相對於分界臨限電壓Da、Db及Dc之3路徑讀取:讀取 A、5賣取B及讀取C。上頁之解碼具有關於以上LM碼之LM 旗標所述的相同考慮。 對用於實例4狀態記憶體之以上各種碼的論述展示,讀 取操作可涉及如"讀取B"中之單一感測路徑,其將已程式 臨限電壓與分界臨限電壓DB進行比較。讀取b操作適 用於在S知格雷碼下讀取上頁或在LM碼下讀取下頁或在 LM新崎下讀取下頁。 讀取操作亦可涉及如在習知格雷碼下讀取下頁或在LM 碼下項取上頁的2路徑讀取:讀取A及讀取C。 讀取操作亦可涉及如在LM新碼下讀取上頁的3路徑讀 取.讀取A、讀取B及讀取c。 I17671.doc -30· 1328231 囷10更詳細地示意性說明囷6A中所示適合於感測所述記 - 憶體之感測模組。感測模組480經由經耦接之位元線36而 : 感測反及鏈50中之記憶體單元的傳導電流。其具有一可選 擇性耦接至一位元線之感測節點481、一感測放大器600或 一讀出匯流排499。最初,隔離電晶體482在被信號BLS致 能時將位元線36連接至感測節點481。感測放大器600感測 該感測節點48 1。感測放大器包含預充電/箝制電路64〇、 鲁 單元電流鑑別器650及鎖存器660。 感測模組4 8 0使得能夠感測反及鍵中選定記憶體單元之 傳導電流。在感測之前’須經由適當之字線及位元線而設 疋至選定記憶體單元之閘極的電壓。如稍後將更詳細描述 的,對於考慮中之給定記憶狀態而言,預充電操作以未選 定字線充電至電壓Vread接著將選定字線充電至預定臨限 電壓vT(i)而開始。隨後預充電電路64〇使位元線電壓達到 適於感測之預定汲極電壓。此將感應出源極_汲極傳導電 • 流在反及鏈50中之選定記憶體單元中流動,自反及鏈之通 道經由耦接之位元線36而偵測該源極·汲極傳導電流。當 在記憶體單元之源極與汲極之間存在標稱電壓差時,該傳 導電流為程式化至記憶體單元中之電荷及所施加%⑴的函 數。 • 當Vt⑴電壓穩定時,可經由耦接之位元線36經由使用信 號XXL加以閘控之電晶體63〇而感測選定記憶體單元的傳 導電流或已程式化臨限電壓。單元電流鑑別器65〇充當電 流位準之鑑別器或比較器。其輕接至感測節點以感測記憶 117671.doc -31 - 體單元中之傳導電流。當藉由如信號HHL所控制之電晶體 632切斷預充電時,感測開始。傳導電流將隨後對單元電 . 流鑑別器6 5 0中之來者雷交访* 木_ 疋筝考電奋放電。當早兀以切斷電晶體630 之:號XXL而去輕時,預定放電週期結束。所感測之傳導 電二的量值係由在此週期結束時參考電容器之電壓放電的 數量加以反映,且在由選通信號STB控制該結果時,將此 結果鎖存入鎖存器66〇中。單元電流鑑別器65〇有效地判定 φ 單兀之傳導電流高於還是低於給定分界電流值IG(j)。若其 較高,則以信號INV=1(高)將鎖存器66〇設定為預定狀態。 回應於將信號INV設定為"高”之鎖存器66〇而啟動下拉電 路^此將感測節點481及因此使經連接之位元線邗下拉 至接地電壓》此將抑制記憶體單元1〇中之傳導電流而無論 控制閘極電壓如何,因為在該單元之源極與汲極之間將不 存在電壓差。 般而σ ’將存在由對應數目之多路徑感測模組4 8 〇操 φ 作之一頁記憶體單元。頁控制器498向該等感測模組中每 一者供應控制及定時信號。頁控制器498使多路徑感測模 組480中每一者經預定數目之路徑ϋ = 1至Ν)而循環且亦為 每一路徑供應預定分界電流值Ι()ϋ)β如此等技術中所熟知 的,亦可將分界電流值實施為分界臨限電壓或供感測之時 間週期。在最後路徑之後,頁控制器498以信號]^(:〇致能 傳送閘488以將感測節點481之狀態作為已感測資料而讀取 至讀出匯流排499。總而言之,將自所有多路徑模組48〇讀 出一頁感測資料。類似感測模組已揭示於Cernea等人之題117671.doc -23· Therefore, by (top page, next page bit) = indicates that the erased memory state "u" » in the first path of the stylized logic page, the storage bit " Any unit of " will therefore change its logical state from (χ,〇 to (χ,〇), where X" denotes the upper-level "unrelated" value. However, since it has not been programmed, it is consistent For example, the "i "tag"χ" can be expressed by (s, 0) logic state by stylizing the unit to the memory state "A". That is, before the second stylized path The memory state "A" indicates the lower bit value "〇. 囷7C illustrates the upper page stylization using the Gray code with the existing, 2-path stylization mechanism. The second path is programmed to store the logical upper page. Bits. Only those units that require the previous page bit value "〇" will be programmed. After the first path, the cell in the page is in a logical state (1, 丨) or (1, 〇). Keep the value of the next page in the second path, you need to distinguish the lower bit value or 1. For the transition from (1,0) to (〇,〇) to the stylized memory unit considered as memory state "B" for the transition from (1,1) to (〇, 〖) In this way, the memory unit in question is programmed to the memory state "c„. In this way, during the retrieval period, the memory of the next page can be decoded by determining the memory state programmed in a unit. Page bit. The stylized pulse is applied to the side-by-side memory unit by the parent, and then each of the units is sensed or programmed to determine whether any of them have been programmed into Stylized with its target state, each time a programmatically validates a unit, even when the stylized pulse continues to be applied to complete the stylization of other units in the group, the unit is locked or programmed to be protected from further programs. As can be seen from 7B and 7C, during the next page of stylization, it is necessary to verify the status of the stroke with respect to the state of the demarcation threshold voltage Da <A" 117671.doc •24· 1328231 (by "Verification A&quot ; indicated). Then, for For page stylization, 'need to perform stylized verification against state "B" and "c" Therefore, the previous page verification will require 2 path verifications relative to the threshold threshold voltage Db and %: "Verification B" and "Verify C". 囷7D describes the read operation required to distinguish the bits under the * state memory encoded by Gray code. Because of the memory state encoded by (U) "A" and by (〇,〇) encoding The "B '丨 all and "〇'丨 you; ^甘丁^ 八 as its lower position, so whenever the memory unit is programmed to the state "W, the lower bit T will be detected. Conversely, whenever the memory unit is not stylized or stylized in the state "U", "c", the lower bit "r will be detected. Therefore, the next page read will need to be read relative to the demarcation threshold voltage DA&Dci2 path: read A and read C, respectively.囷 7E illustrates the read operation required to distinguish the bits above the 4-state memory encoded in Gray code. It will need to read the path relative to the threshold threshold voltage: read B. In this way, any cell with a programmed threshold voltage of less than % is detected to be in a memory state "" and vice versa. When the second path is stylized, the Gray code, 2 path stylization mechanism can become a problem. For example, when the next bit is in "〗", the stylization of the previous page bit to "〇" will cause a change from (1,丨) to (〇, υ. This requires the case unit to self "U" is gradually programmed to "c via "Α" and "Β", and if there is a power outage before the stylization, the memory unit can terminate in one of the transition memory states (for example, "A"). When reading a memory unit, it will decode "A" into a logical state (1, 〇). This gives the upper and lower + correct result, since it should be (0, 1) Similarly, if it reaches "B", it will correspond to (0, 0) ^ When the upper bit is correct, the bit H7671.doc -25· 1328231 is still wrong. Since the unstylized state "u" all the way: (a11 the way t〇) the most stylized state "c" possible change, so this code • mechanism has the charge position of the adjacent cells stylized at different times The effect of the potential difference between the quasi-ops. Therefore, it also increases the field between adjacent floating gates. Effect coupling ("Yupin effect'·). Figures 8A through 8E illustrate the stylization and 5 buy of 4 state memory encoded with another logic code ("LM codes). This code provides more fault tolerance (fault_t〇 Leranee) and φ mitigate adjacent element coupling due to YuPin effect. Figure 8A illustrates the threshold voltage distribution of a 4-state memory array when each δ-recall unit uses LM code to store two-bit data. The difference between the code and the conventional Gray code shown in 囷7Α is that the upper and lower bits are reversed for the states "Α" and „c". The LM" code has been disclosed in the US patent No. 6,657,891 and it is advantageous to reduce field effect coupling between adjacent floating gates by avoiding stylized operations that require large charge changes. Figure 8B illustrates the use of LM code in an existing, 2-round stylized mechanism. The next page is stylized. The fault-tolerant LM code basically prevents any previous page stylization from transitioning through any intermediate state. Therefore, the first round of the next page stylizes the logical state (1, 1) to an intermediate state (X' 0), if by "Unstylized "memory state"U is stylized to the "intermediate" state represented by (X,〇), which has a greater than Da in the widely distributed state Less than Dei has programmed threshold voltage. Circle 8C shows the previous page stylization using the LM code with the existing, 2-round stylization mechanism. In the second round of stylizing the previous page, if the next page is at "1 ", then by "unprogrammed" memory state" 117671.doc •26· s; 1328231 Stylized to "A", the logical state (1, 丨) is changed to (〇, 丨). If the following: Page 兀 is in ··〇", then by "middle" The state is stylized to "Β" and gets: Logic state (〇, 0). Similarly, if the previous page is kept at "1", then when the next page is programmed to "0", it will It is necessary to change the state, self, and intermediate state to (1, 0) by stylizing "intermediate, state" to "C". Since the previous page stylization only involves stylization to the next adjacent memory state, there is no large amount of charge change from one round to another round. From the "U" to the rough "intermediate" state, the φ page is programmed. To save time. However, this will cause the "LM" code to be equally susceptible to stylized errors or power outages during the previous page stylization. For example, the state "Α" can be moved to a threshold voltage that cannot be distinguished from the "middle" state. Circle 8D illustrates the read operation required to identify the bit below the 4-state memory encoded with the LM code. Decoding It will depend on whether the previous page has been programmed. If the previous page has been programmed, then reading the next page will require a read path relative to the threshold threshold voltage: read B. On the other hand, if the previous page has not been programmed , then the next page • is stylized to the "intermediate•' state (囫8B), and reading B will cause an error. Conversely, reading the next page will require a read path relative to the demarcation threshold voltage Da: Read A. In order to distinguish between the two conditions, when the upper page is being programmed, a flag ("LM"flag) is written in the previous page. During the reading, the upper page is first assumed to be stylized and thus The read]3 operation will be performed. If the ^^ flag is read, the assumption is correct and the read operation is performed. On the other hand, if the first read does not generate a flag, it will indicate that it has not been programmed. The previous page and therefore will have to read the next page by reading the A operation. 囷8E Description Discrimination The read operation of 117671.doc •27· c S ) 1328231 is required for the OM code to encode the upper level of the 4 state memory. As can be clearly seen from the figure, the page read will need to be separately relative to the threshold threshold voltage! ) 8 and 〇 (: 2 path read: read A and read C. Similarly, if the previous page has not been programmed, the decoding of the previous page can be confused by the "intermediate" state. Again The LM flag will indicate whether the previous page has been programmed. If the previous page is not programmed, the read data will be reset to , ^" to indicate that the previous page is not programmed. LM code is in the support page Stylized memory can also become a problem. When staging or reading a page of memory cells, partial page stylization allows one part of the page to be programmed in a path and not programmed in subsequent paths. The stylized remainder of the LM code presents a problem in a stylized operation that only partially fills the previous page with data. In the subsequent upper page stylization of the _completed unfilled page, the data can be stylized. To the wrong state. By convention, 1 'bit representation " none The "condition, and therefore the lower and upper elements are initially set to "丨" in the uncompiled "U" state. The previous page should be "1" 'which means unfilled The unit in the section. If the next page bit in the unfilled part is accidentally "丨", the resulting logic state (1,1) will keep the unit in ',u". However, if the next page If the bit is , it will result in a logic state (1, 0) that will cause the unit to be programmed to the most stylized (highest threshold voltage) "c" state. The possibility of reaching the (0, 0) or "B" state is no longer considered as soon as the subsequent stylized path of the unfilled portion is completed, as it can be returned from the "C" to a less stylized state.囷9A to 9E illustrate the stylization and reading of the 4-state memory with the preferred logic code ("LM New" code). The LM new code is similar to the lm code but does not have the above disadvantages.圚9A shows that when each memory unit causes the new code to store two 117671.doc • 28· 1328231 bits of data, the threshold voltage distribution of the 4-state memory array ^ LM new code has been revealed in Li et al. U.S. Patent Publication No. 2005-0237814 A1, which is incorporated herein by reference. This code differs from the LM code shown in Figure 8A in that the logical codes for the states "B" and "C" are interchangeable. Therefore, for "U" (superordinate, lower bit) is ( 1, 1), for "A" (superordinate, lower) is (〇, 1), for "B" (superordinate, lower) is (1,0), and for "C&quot (upper bit, lower bit) is (0, Ο)» This code avoids the problem of partial page stylization in the above LM code, because when the lower bit is at "0", it will now be partially unfilled. The previous page is stylized to the "Β" state. Subsequent stylization of partially unfilled parts will allow stylization from (1,0) to (0, 0) logic state, which corresponds to stylized from "Β" "C" state. 囷9Β illustrates the next page stylization using the LM new code with the existing, 2-path stylization mechanism. The fault-tolerant LM new code basically avoids any previous page stylization through any intermediate state transition. The next page of the first path is stylized to transition the logic state (1, 1) to an intermediate state (X, 〇), By stating "unprogrammed"memory state"U to the "intermediate" state represented by (X,0), the "intermediate" state has greater than DA but less than Dc The programmed threshold voltage. Figure 9C illustrates the upper page stylization using the LM new code with the existing, 2-path stylization mechanism. In the second path of the "0" The next page bit is at "1 ", as indicated by the stylized "unprogrammed"memory state" to "A", the logical state (1,1) is changed to ( 0,1). 117671.doc •29- 1328231 The lower right page π is at "ο, and the logic state is obtained by stylizing from the middle, & intermediate state to "c" (G, similarly, If the previous page remains at ", ·, then when the next page has been programmed to "0", you need to programmatically convert the "intermediate" state to the middle of the "B" , the state transitions to (1, 〇). +囷91) Describes the read required to distinguish the bits under the 4-state memory encoded by the LM new code. Take the operation. As for the status of the LM code, the same considerations apply here. First, the read 6 operation is performed to determine whether the 1^]^ flag can be read. If the LM flag can be read, the bay has been read. Styling the previous page and reading _ will correctly generate the next page of information. On the other hand, ## has not been programmed on the previous page, the next page will be read by reading the A operation. Circle 9E illustrates the ° selling operation required to identify the bit above the 4-state memory encoded in the LM new code. As can be clearly seen from the figure, the previous page read will need to be read in 3 paths relative to the threshold threshold voltages Da, Db and Dc: read A, 5 sell B and read C. The decoding of the previous page has the same considerations as described with respect to the LM flag of the above LM code. A discussion of the various codes used above for the example 4 state memory shows that the read operation may involve a single sensing path in "Read B" that compares the programmed threshold voltage to the threshold threshold voltage DB . The read b operation is suitable for reading the upper page under the S-Gray code or reading the next page under the LM code or reading the next page under LM Shinsaki. The read operation may also involve a 2-path read such as reading the next page under the conventional Gray code or taking the upper page under the LM code: read A and read C. The read operation may also involve reading the 3-path read of the previous page as in the LM new code. Read A, Read B, and Read c. I17671.doc -30· 1328231 囷10 schematically illustrates in more detail the sensing module shown in FIG. 6A suitable for sensing the memory. The sensing module 480 senses the conduction current of the memory cells in the chain 50 via the coupled bit line 36. It has a sensing node 481 that is selectively coupled to a bit line, a sense amplifier 600, or a read bus 499. Initially, isolation transistor 482 connects bit line 36 to sense node 481 when enabled by signal BLS. The sense amplifier 600 senses the sense node 48 1 . The sense amplifier includes a precharge/clamp circuit 64A, a RC cell current discriminator 650, and a latch 660. The sensing module 480 enables sensing of the conduction current of the selected memory cell in the reverse key. Before sensing, the voltage to the gate of the selected memory cell must be set via the appropriate word line and bit line. As will be described in more detail later, for a given memory state under consideration, the precharge operation begins by charging the unselected word line to voltage Vread and then charging the selected word line to a predetermined threshold voltage vT(i). The precharge circuit 64 then causes the bit line voltage to reach a predetermined threshold voltage suitable for sensing. This will induce the source _ 汲 传导 • • 流 • • • • • • • • 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测 侦测Conduct current. When there is a nominal voltage difference between the source and the drain of the memory cell, the conduction current is a function of the charge in the memory cell and the applied %(1). • When the Vt(1) voltage is stable, the conducted current or programmed threshold voltage of the selected memory cell can be sensed via the coupled bit line 36 via the transistor 63 that is gated using the signal XXL. The cell current discriminator 65A acts as a discriminator or comparator for the current level. It is lightly connected to the sensing node to sense the conduction current in the memory unit 117671.doc -31 - body unit. When the pre-charging is cut off by the transistor 632 as controlled by the signal HHL, the sensing starts. The conduction current will be subsequently charged to the unit. The flow discriminator 6 5 0 comes from the visitor * wood _ 疋 考 test electric discharge. When the light is lightened by cutting off the number XXL of the transistor 630, the predetermined discharge period ends. The magnitude of the sensed conduction power is reflected by the amount of voltage discharge of the reference capacitor at the end of the cycle, and when the result is controlled by the strobe signal STB, the result is latched into the latch 66〇 . The cell current discriminator 65 〇 effectively determines whether the conduction current of φ single turns is higher or lower than a given boundary current value IG(j). If it is high, the latch 66 is set to a predetermined state with a signal INV = 1 (high). In response to setting the signal INV to the "high" latch 66, the pull-down circuit is activated, which senses the node 481 and thus the connected bit line 邗 to the ground voltage. This will inhibit the memory unit 1 The conduction current in the 而 regardless of the control gate voltage, because there will be no voltage difference between the source and the drain of the cell. Generally, σ ' will exist by the corresponding number of multi-path sensing modules 4 8 〇 The page controller 498 supplies control and timing signals to each of the sensing modules. The page controller 498 causes each of the multipath sensing modules 480 to pass a predetermined number. The path ϋ = 1 to Ν) and the cycle also supplies a predetermined demarcation current value for each path Ι() ϋ) β. As is well known in the art, the boundary current value can also be implemented as a threshold voltage or a sense of supply. The time period is measured. After the last path, the page controller 498 reads to the read bus 499 with the signal [^] enabling the transfer gate 488 to use the state of the sense node 481 as sensed data. Will read a page from all multipath modules 48〇 Data Similar sensing module has been disclosed in Cernea, who's title

117671.doc -32- ·: S 1328231 為"IMPROVED MEMORY SENSING CIRCUIT AND METHOD FOR LOW VOLTAGE OPERATION"的日期為 2005年8月4日之美國專利公開案第2005-0169082-A1號 中。美國專利公開案第2005-0169082-A1號之全部揭示以 引用的方式併入本文中。 智慧型省時程式化驗證 非揮發性記憶體之效能中之一重要態樣為程式化速度。 此段論述改良多狀態非揮發性記憶體之程式化效能的方 法。具體言之,以省時程式化驗證來實施經改良之程式化 操作。 快速路徑寫入("QPW") 較佳程式化操作係稱為”快速路徑寫入”(或"QPW”),其 已揭示於美國專利第6,643,188號中,且該案之全文在此以 引用的方式併入本文中。 程式化記憶體之目的為快速但精確地寫入資料。在二進 位記憶體中,僅有必要使用一分界臨限位準來區分兩個記 憶狀態。當以高於該分界臨限位準之臨限值來程式化記憶 體單元時,將其視為處於"已程式化"狀態,否則其保持於 ”未經程式化"狀態。或者,對於給定閘極電壓,較少程式 化之單元將具有較多傳導電流。因此,當將分界臨限電壓 施加至記憶體單元之閘極時,將存在對應之分界傳導電 流。若一單元具有高於分界傳導電流之傳導電流,則將其 視為處於未經程式化狀態;否則其處於已程式化狀態。 在多狀態記憶體中,由於對於每一中間狀態,在兩個分 117671.doc -33· 界臨限位準之間進行分界,故情況更複雜。當程式化至中 門狀怂時,須以一在兩個分界位準之間的臨限值來程式化 早兀。因此,其必須位於第一分界位準之上,但無需高出 太多否則其將超越第二分界位準。因此,需要進行準確 程式化。在程式化記憶體單元之群體方面,其達到使該單 70群體在分界位準之間緊密叢集(參見囷7至囷8)。程式化 之任何不準確性將導致給定狀態之分佈誤展開超過其分界 位準即使分佈在邊界内但展開至極限,其仍將歸因於程 式化干擾或其他環境效應而易於造成誤差。此問題隨狀態 之數目增加而劣化或在可用臨限窗減小時劣化,或在該兩 者時劣化。 一使狀態分佈緊密之技術係藉由多次程式化相同資料。 一實例為描述於美國專利第6,738,289號中之粗-精程式化 方法’該案在此以引用的方式併入本文中。 圖11展示具有給定已程式化記憶狀態之記憶體單元的兩 個分佈,其中較展開之分佈係由一在VL位準驗證之單路 徑程式化產生,且較緊密之分佈係由一在VH位準驗證第 二路徑的二路徑程式化產生。在第一路徑中,已以一使用 第一、較低驗證位準VL之程式化波形PW1寫入單元,從而 產生分佈1301 ^該程式化波形隨後以較低值開始用於第二 路徑。在第二路徑中,程式化波形PW2使用第二、較高驗 證位準VH以將此移位至分佈1303。此允許第一路經將單 元置放入粗分佈中,該粗分佈隨後在第二路徑中變緊密。 圖12展示二路徑程式化波形之一實例。在每一程式化脈 117671.doc -34· 1328231 衝之間為用於在最後程式化脈衝之後感測記憶體單元之狀 • 態的較小閘極電壓位準。第一階梯PW1 1401使用較低驗證 位準VL ’同時pW2使用較高驗證位準vh。如美國專利第 6,738,289號中所述,第二路徑(pW2 14〇3)可使用較小步 長,但除不同驗證位準以外,該等過程相同。此方法之缺 點為每一程式化序列需要兩個路徑:程式化波形須經過全 部階梯中之兩者’從而執行14〇1且隨後以14〇3開始。 φ 圈13為用於二路徑程式化操作之驗證操作中進行感測之 時序圖。首先,預充電字線WL。此後預充電位元線bL。 當經預充電之電壓穩定時,第一選通STB將感測記憶體單 元之高傳導狀態並對其進行鎖存。將此等高傳導狀態之位 兀•線鎖存至接地以防止其將源極偏壓誤差引入至後續感 測。在位元線中之電壓已恢復至穩定狀態之後,於第二選 通STB中感測記憶體單元。其後,字線得以放電且準備好 用於設置至下一程式化脈衝。當確定SCAN信號時,將已 # 感測資料轉移至資料鎖存器。在二路徑程式化操作中,驗 證操作使WL在第一路徑期間設定於VL且隨後在第二路徑 期間設定於VH。 若可使用具有程式化脈衝之單一階梯的單一路徑,從而 允許分佈經受基於較低驗證VLi初始程式化階段但一 • 旦達到此初始位準仍能夠減慢過程並使用較高驗證VH來 &進分佈,則可更快速地執行寫人。此可經由—使用位元 線偏壓在用於程式化波形之單一階梯序列中進行程式化的 ”快速路控寫人"而達成。此演算法可達成與二路經寫入之 •35· 117671.doc 1328231 效應類似的效應且美國專利第6,643,188號中對其進行了更 詳細描述。 圖14展示快速路徑寫入之單路徑程式化波形。除驗證操 作係執行於VL位準與VH位準(參見每一程式化脈衝之間的 較小二級脈衝)之外,程式化波形QPW 1501類似於二路徑 演算法之恰好第一階段。然而,一旦在VL之驗證出現, 階梯便繼續。而非重新啟動階梯波形,但在階梯繼續時升 高位元線電壓以減緩程式化速率直至單元在VH驗證為 止。此允許程式化波形之脈衝單調地不降低以及顯著縮短 程式化/驗證循環。 圓15為用於在一路徑qPW程式化操作之驗證操作中進行 感測的時序圖。首先’將字線WL預充電至VL。此後預充 電位元線BL»當經預充電之電壓穩定時,vl選通STB將 感測記憶體單元並對其進行鎖存。當喊定第一 SCan信號 時,將感測VL資料轉移至資料鎖存器。已在VI^成功驗證 之彼等單元將使其位元線設定至將減慢程式化之電壓。隨 後將字線升尚至位準VH。在經預充電之電壓已變得穩定 之後,第一 VH選通STB將感測記憶體單元且識別記憶體單 7L之向傳導狀態並對其進行鎖存。將此等高傳導狀態之位 元線鎖存至接地以防止其將源極偏壓誤差引入至後續感 測。在位元線中之電壓已恢復至穩定狀態之後,於第二 VH選通STB中感測記憶體單元。其後,字線得以放電並準 備好用於设置至下一程式化脈衝。當確定第二scAN信號 時,將已感測之VH資料轉移至資料鎖存器。117671.doc -32- ·: S 1328231 is "IMPROVED MEMORY SENSING CIRCUIT AND METHOD FOR LOW VOLTAGE OPERATION" is dated August 4, 2005, U.S. Patent Publication No. 2005-0169082-A1. The entire disclosure of U.S. Patent Publication No. 2005-0169082-A1 is incorporated herein by reference. Smart, time-saving, stylized verification One of the important aspects of non-volatile memory performance is stylized speed. This section discusses ways to improve the stylized performance of multi-state non-volatile memory. Specifically, improved stylized operations are implemented with time-saving stylized verification. Fast Path Write ("QPW") The preferred stylized operation is referred to as "fast path write" (or "QPW"), which is disclosed in U.S. Patent No. 6,643,188, the entire disclosure of which is here It is incorporated herein by reference. The purpose of stylized memory is to write data quickly but accurately. In binary memory, it is only necessary to use a threshold threshold to distinguish between two memory states. When the memory unit is stylized above the threshold of the threshold, it is considered to be in the "programmed" state, otherwise it remains in the "unprogrammed" state. Alternatively, for a given gate voltage, less programmed cells will have more conduction current. Therefore, when a threshold threshold voltage is applied to the gate of the memory cell, there will be a corresponding demarcation conduction current. If a cell has a conduction current higher than the demarcation conduction current, it is considered to be in an unprogrammed state; otherwise it is in a programmed state. In multi-state memory, the situation is more complicated because the boundary is divided between two points 117671.doc - 33 · boundary level for each intermediate state. When stylized to a central squat, the early squat must be programmed with a threshold between the two demarcation levels. Therefore, it must be above the first demarcation level, but it does not need to be too high or it will exceed the second demarcation level. Therefore, accurate stylization is required. In terms of the population of stylized memory units, this achieves a close clustering of the single 70 population between the demarcation levels (see 囷7 to 囷8). Any inaccuracy in stylization will cause the distribution of a given state to mis-expand beyond its demarcation level. Even if it is spread within the boundary but spread to the limit, it will still be attributable to programmatic interference or other environmental effects that are prone to errors. This problem deteriorates as the number of states increases or deteriorates when the available threshold window decreases, or deteriorates in both cases. A technique that tightly distributes the state by programming the same data multiple times. An example is a coarse-final stylized method as described in U.S. Patent No. 6,738,289, which is incorporated herein by reference. Figure 11 shows two distributions of memory cells with a given programmed memory state, where the more developed distribution is generated by a single path stylized in VL level verification, and the tighter distribution is from one VH The level verification verifies that the second path of the second path is generated. In the first path, the unit is written to the unit using a stylized waveform PW1 of the first, lower verify level VL, thereby producing a distribution 1301. The programmed waveform then begins with a lower value for the second path. In the second path, the stylized waveform PW2 uses the second, higher verify level VH to shift this to the distribution 1303. This allows the first pass to place the unit into the coarse distribution, which then becomes tighter in the second path. Figure 12 shows an example of a two-path stylized waveform. Between each stylized pulse 117671.doc -34· 1328231 is the smaller gate voltage level used to sense the state of the memory cell after the last programmed pulse. The first step PW1 1401 uses a lower verify level VL ' while pW2 uses a higher verify level vh. As described in U.S. Patent No. 6,738,289, the second path (pW2 14〇3) can use a smaller step size, but the processes are the same except for different verification levels. The disadvantage of this method is that each stylized sequence requires two paths: the stylized waveform has to go through both of the full steps to perform 14〇1 and then start at 14〇3. The φ circle 13 is a timing chart for sensing in the verification operation of the two-path stylization operation. First, the word line WL is precharged. Thereafter, the bit line bL is precharged. When the precharged voltage is stable, the first strobe STB senses the high conduction state of the memory cell and latches it. These high conduction state bits are latched to ground to prevent them from introducing source bias errors to subsequent sensing. After the voltage in the bit line has returned to a steady state, the memory cell is sensed in the second strobe STB. Thereafter, the word line is discharged and ready for setting to the next stylized pulse. When the SCAN signal is determined, the # sense data is transferred to the data latch. In the two-path stylization operation, the verify operation causes WL to be set to VL during the first path and then to VH during the second path. If a single path with a single staircase of stylized pulses can be used, allowing the distribution to undergo an initial stylization phase based on lower verification VLi, but once this initial level is reached, the process can be slowed down and a higher verify VH is used & By entering the distribution, the writer can be executed more quickly. This can be achieved by using a bit line bias to "program the fast-paced writer" programmed in a single sequence of sequences for the stylized waveform. This algorithm can be achieved with two paths written. 117671.doc 1328231 A similar effect is described in more detail in U.S. Patent No. 6,643,188. Figure 14 shows a single path stylized waveform for fast path writing, except that the verify operation is performed at the VL level and the VH bit. In addition to the quasi (see the smaller secondary pulses between each stylized pulse), the stylized waveform QPW 1501 is similar to the first phase of the two-path algorithm. However, once the verification at VL occurs, the ladder continues. Rather than restarting the staircase waveform, the bit line voltage is raised as the ladder continues to slow down the stylized rate until the cell is verified at VH. This allows the pulse of the stylized waveform to monotonically not decrease and significantly shorten the stylization/verification loop. 15 is a timing diagram for sensing in a verify operation of a path qPW stylized operation. First 'precharge the word line WL to VL. Thereafter the precharge bit line BL» When the precharge voltage is stable, the vl strobe STB will sense the memory cell and latch it. When the first SCan signal is asserted, the sense VL data is transferred to the data latch. Verifying that their units will set their bit lines to a voltage that will slow down the stylization. The word line is then raised to the level VH. After the precharged voltage has stabilized, the first VH strobe STB The memory cell will be sensed and the memory conduction state of the memory bank 7L will be latched and latched. The bit lines of such high conduction state are latched to ground to prevent it from introducing the source bias error to the subsequent sense. After the voltage in the bit line has returned to a steady state, the memory cell is sensed in the second VH strobe STB. Thereafter, the word line is discharged and ready for setting to the next stylized pulse. When the second scAN signal is determined, the sensed VH data is transferred to the data latch.

117671.doc •36· 至步驟712中之下一程式化脈衝。 相對於第二臨限值之第二驗證子循環 步驟730 : 修改已驗證單元之位元線電壓以減慢程 式化。 步驟740 : 將字線預充電至第二臨限電壓,將相對 於該第二臨限電壓而執行感測。 步驟742 : 並列感測該群記憶體單元。 步驟744 : 若已相對於第二臨限電壓而成功驗證任 何單元,則進行至步驟750,否則進行至步驟712中之下 一程式化脈衝。 步驟750 : 若已成功驗證該群中需相對於第二臨限 值而驗證之所有彼等單元,則進行至步驟760,否則進 行至步驟752。 步驟752 : 抑制剛剛驗證之單元被程式化且進行至 步驟712中之下一程式化脈衝。 步驟760 : 關於相對於第二臨限電壓之驗證而進行 程式化。 此處之重要特徵為在第一 VL驗證子循環結束時,若群 中無單元超過VL,則第二VH驗證子循環將為多餘的。無 需浪費時間對VH資料進行感測、選通及掃描。因此,只 要群中無單元超過VL,便可跳過第二VH驗證子循環,藉 此實現一些時間節省。一般而言,記憶體單元分割的位準 愈多,對於精確程式化之需求將愈多,且本SQPW驗證機 制將更有益。 117671.doc •39· 1328231 在一較佳實施例中,本SQPW驗證在VL資料之感測及選 通之後使用一位元超過(OBP)掃描操作來偵測超過VL的任 何位元。若無位元超過VL,則其將直接轉至下一程式化 脈衝。若任何位元超過VL,則其將返回至正常VL掃描且 如正常QPW—般進行剩餘操作。在下一驗證脈衝中,將跳 過OBP掃描操作。 圖17為在任何位元超過VL之前SQPW驗證的時序圖。可 將其視為SPQW驗證之縮短之循環表現,且每.當該群單元 中無位元已超過VL時,其皆為適用的。其基本上為圖15 所示QPW之VL子循環,但具有對任一位元是否超過VL之 額外判定或具有(OBP)掃描操作。如用於SCAN信號之OBP 波形所示的,OBP掃描操作在VL子循環完結時及在VH子 循環開始時發生。其基本上藉由對於並列程式化之該群單 元檢查相對於VL之感測結果而偵測任一位元是否超過 VL。 用於圖17中所示縮短之循環的序列如下: 階段1 : 將選定字線WL預充電至VL。 階段2 : 將位元線BL預充電至適於感測之電壓。 階段3 : 感測及選通(VL選通)STB。 階段4 : 將字線WL之電壓自VL改變至VH,在已恢復位 元線電壓之後,執行OBP(—位元超過)以判定是否已在VL 處驗證任一位元。 若OBP掃描操作判定無位元已超過VL,則在對字線放電 及下一程式化脈衝之後發生縮短之循環。若在此縮短之循117671.doc • 36· Go to step 712 for a stylized pulse. Second Verification Sub-Cycle with respect to the Second Threshold Step 730: Modify the bit line voltage of the verified unit to slow down the programming. Step 740: Precharging the word line to a second threshold voltage, the sensing will be performed with respect to the second threshold voltage. Step 742: Sense the group memory unit in parallel. Step 744: If any of the cells have been successfully verified with respect to the second threshold voltage, proceed to step 750, otherwise proceed to the next stylized pulse in step 712. Step 750: If all of the units in the group that need to be verified against the second threshold value have been successfully verified, proceed to step 760, otherwise proceed to step 752. Step 752: Suppress the unit that has just been verified to be programmed and proceed to the next stylized pulse in step 712. Step 760: Stylize with respect to verification of the second threshold voltage. An important feature here is that at the end of the first VL verification sub-loop, if no cells in the group exceed VL, the second VH verification sub-loop will be redundant. No need to waste time sensing, strobing and scanning VH data. Therefore, as long as no cells in the group exceed VL, the second VH verification sub-loop can be skipped, thereby achieving some time savings. In general, the more bits are segmented by the memory unit, the more demanding it will be for precise stylization, and the SQPW verification mechanism will be more beneficial. 117671.doc • 39· 1328231 In a preferred embodiment, the SQPW verifies the use of an over-element (OBP) scan operation to detect any bit that exceeds VL after sensing and gating of the VL data. If no bit exceeds VL, it will go directly to the next stylized pulse. If any bit exceeds VL, it will return to the normal VL scan and perform the remaining operations as normal QPW. In the next verify pulse, the OBP scan operation will be skipped. Figure 17 is a timing diagram of SQPW verification before any bit exceeds VL. It can be considered as a shortened cyclical performance of SPQW verification, and it is applicable when there are no bits in the group unit that have exceeded VL. It is essentially a VL sub-cycle of QPW as shown in Figure 15, but with an additional decision or an (OBP) scan operation for whether any of the bits exceeds VL. As shown by the OBP waveform for the SCAN signal, the OBP scan operation occurs at the end of the VL sub-loop and at the beginning of the VH sub-cycle. It basically detects whether any of the bits exceeds VL by checking the sensed result relative to the VL for the side-programmed group of cells. The sequence for the shortened cycle shown in Figure 17 is as follows: Phase 1: The selected word line WL is precharged to VL. Stage 2: The bit line BL is precharged to a voltage suitable for sensing. Phase 3: Sensing and strobing (VL gating) STB. Stage 4: The voltage of word line WL is changed from VL to VH. After the bit line voltage has been restored, OBP (-bit over) is performed to determine if any bit has been verified at VL. If the OBP scan operation determines that no bit has exceeded VL, then a shortened cycle occurs after the word line is discharged and the next stylized pulse. If shortened here

117671.doc -40- 1328231 環中任何位元超過VL,則循環將擴展以變為亦具有在VH 位準之驗證的完全循環。 圖18為剛剛已出現位元超過VL之第一情況的SQPW驗證 之時序圖。可將其視為SPQW驗證之擴展之循環表現,且 其適用於第一次出現該群單元中之一位元超過VL驗證 時。其基本上為VL子循環,其後為OBP掃描操作且隨後進 一步以圖15中所示QPW之VH子循環擴展。 用於圖18中所示擴展之循環的序列如下: 階段1至4 : 與圖17中所示縮短之循環的階段1至4相同。117671.doc -40- 1328231 If any bit in the ring exceeds VL, the loop will expand to become a full loop that also has verification at the VH level. Figure 18 is a timing diagram of SQPW verification for the first case where the bit has exceeded VL. It can be considered as an extended loop performance of SPQW verification, and it is suitable for the first occurrence of one of the group elements over VL verification. It is essentially a VL sub-cycle followed by an OBP scan operation and then further expanded with the VH sub-cycle of QPW shown in Figure 15. The sequence for the extended cycle shown in Fig. 18 is as follows: Stages 1 to 4: The same as stages 1 to 4 of the shortened cycle shown in Fig. 17.

階段5 : 將已感測之VL資料轉移至資料鎖存器(VL SCAN(VL掃描))。由於開始於階段4中之WL充電需要相對 較長之時間,故需要在OBP偵測到任何位元超過VL之後立 即對同一驗證序列執行VL SCAN以節省時間。 階段6 : 感測及選通(VH第一選通)。在較佳實施例 中,此為一用於偵測高電流狀態以使得其可被切斷從而不 干擾子序列感測的初步快速感測。 階段7 : 允許位元線BL恢復至適當電壓。 階段8 : 感測及選通(VH第二選通)。 階段9 : 對字線WL放電。Phase 5: Transfer the sensed VL data to the data latch (VL SCAN (VL scan)). Since the WL charging started in phase 4 takes a relatively long time, it is necessary to perform VL SCAN on the same verification sequence immediately after the OBP detects that any bit exceeds VL to save time. Stage 6: Sensing and strobing (VH first strobe). In the preferred embodiment, this is a preliminary fast sensing for detecting a high current state such that it can be severed without interfering with subsequence sensing. Phase 7: Allow bit line BL to return to the appropriate voltage. Stage 8: Sensing and strobing (VH second strobe). Stage 9: Discharge the word line WL.

階段10 : 將已感測之VH資料轉移至資料鎖存器(VH SCAN(VH掃描))。 圊19為在於恰好在至少一位元已超過VL之後的循環之 後的後續循環中之SQPW驗證的時序圖。可將其視為 SPQW驗證之正常循環表現且其適用於在該群單元中至少Phase 10: Transfer the sensed VH data to the data latch (VH SCAN (VH Scan)).圊19 is a timing diagram of SQPW verification in a subsequent cycle just after the cycle after at least one bit has exceeded VL. Think of it as a normal loop of SPQW verification and it applies to at least the group unit

117671.doc -41 - 1328231 一位元已超過VL之循環之後的後續驗證循環中。其基本 : 上為具有如圖15中所示之VL子循環與VH子循環的正常快 . 速路徑寫入驗證。 階段1 : 將選定字線WL預充電至VL。 階段2 : 將位元線BL預充電至適於感測之電壓。 階段3 : 感測及選通(VL選通)STB。 階段4 : 將字線WL之電壓自VL改變至VH,且將已感測 I 之VL資料轉移至資料鎖存器(VL SCAN)。 階段5 : 感測及選通(VH第一選通)。在較佳實施例中, 此為一用於偵測實質上低於VH位準之高電流狀態以使得 其可被切斷從而不干擾子序列感測的初步快速感測。 階段6 : 允許位元線BL恢復至適當電壓。 階段7 :對於已感測之VH資料進行感測及選通(Vh第二 選通)》 階段8 : 對字線WL放電。 φ 階段9 .將已感測之VH資料轉移至資料鎖存器(vjj SCAN(VH掃描))。 使用SQPW之A-B-C驗證之實例 較早對於SQWP之描述係指關於給定臨限位準之程式化 驗證。若存在待驗證之一個以上臨限位準,則相同之原理 基本上為適用的。此可出現在程式化多位準記憶體(諸如 由三個臨限位準VA、VB及VC分界之2位元或4狀態記憶體) 中。舉例而言,如圊9C中所示使用LM新碼對上頁之程式 化將需要關於所有三個臨限位準進行程式化驗證。 C. S ) 117671.doc -42- 1328231 在較佳實施例中,可以自較低至較高字線WL電壓之連 續感測而連續進行關於三個臨限位準中每一者的驗證操 作。程式化驗證最初僅相對於VA,亦即,驗證A。隨著程 式化繼續進行,當至少一位元已程式化得超過VA時,程 式化驗證將具有驗證A與驗證B。類似地,若至少一位元 已程式化得超過VB,則程式化驗證將以驗證A、驗證B及 驗證C檢查所有三個臨限位準。類似智慧型驗證機制已揭 示於美國專利公開案第2004-0109362-A1號中。此公開案 之全部揭示以引用的方式併入本文中。 圓20A為涉及三個臨限位準之SQPW的時序圖且展示僅 涉及驗證A之初始程式化階段。在任何位元超過VAL之 前,圊17中所示縮短之循環以分別由VAL及VAH替代之VL 及VH而適用。在OBP操作之後,一位元超過VAL之第一情 況時,隨後序列與圖18中所示擴展之循環相同。其後,圖 19之正常循環適用。SQPW所節省之時間將為在縮短之循 環有效時,其為已縮短循環之次數(正常循環之持續時間 減去已縮短循環之持續時間)及OBP與VL掃描之間的掃描 時間差。117671.doc -41 - 1328231 A sub-quantity has passed the subsequent verification loop after the VL loop. The basics are as follows: normal fast speed write verification with VL sub-cycle and VH sub-cycle as shown in Figure 15. Phase 1: The selected word line WL is precharged to VL. Stage 2: The bit line BL is precharged to a voltage suitable for sensing. Phase 3: Sensing and strobing (VL gating) STB. Phase 4: The voltage of word line WL is changed from VL to VH, and the VL data of sensed I is transferred to the data latch (VL SCAN). Stage 5: Sensing and strobing (VH first strobe). In the preferred embodiment, this is a preliminary fast sensing for detecting a high current state substantially below the VH level such that it can be severed without interfering with subsequence sensing. Phase 6: Allow bit line BL to return to the appropriate voltage. Phase 7: Sensing and strobing the sensed VH data (Vh second strobe) Phase 8: Discharge the word line WL. φ Stage 9. Transfer the sensed VH data to the data latch (vjj SCAN (VH scan)). An example of A-B-C verification using SQPW The earlier description of SQWP refers to stylized verification for a given threshold level. The same principle is basically applicable if there is more than one threshold level to be verified. This can occur in stylized multi-bit memory (such as 2-bit or 4-state memory bounded by three threshold levels VA, VB, and VC). For example, the use of the LM new code for the stylization of the previous page as shown in 圊9C would require stylized verification for all three threshold levels. C. S) 117671.doc -42- 1328231 In a preferred embodiment, verification operations for each of the three threshold levels can be continuously performed from successive sensing of lower to higher word line WL voltages . Stylized verification is initially only relative to VA, ie, verification A. As the programming continues, when at least one bit has been programmed to exceed VA, the program verification will have verification A and verification B. Similarly, if at least one element has been programmed to exceed VB, the stylized verification will check all three threshold levels with Verification A, Verification B, and Verification C. A similar smart verification mechanism has been disclosed in U.S. Patent Publication No. 2004-0109362-A1. The entire disclosure of this disclosure is incorporated herein by reference. Circle 20A is a timing diagram for SQPW involving three threshold levels and shows an initial stylization phase involving only verification A. The shortened cycle shown in 圊17 applies to VL and VH, which are replaced by VAL and VAH, respectively, before any bit exceeds VAL. After the OBP operation, when the one-bit exceeds the first condition of VAL, the subsequent sequence is the same as the extended cycle shown in FIG. Thereafter, the normal cycle of Figure 19 applies. The time saved by SQPW will be the number of cycles that have been shortened (the duration of the normal cycle minus the duration of the shortened cycle) and the scan time difference between the OBP and VL scans when the cycle is shortened.

圖20B為涉及三個臨限位準之SQPW的時序圖且展示在 除驗證A之外開始驗證B時的中間程式化階段。由於在此 階段至少一位元已超過VAL,故無需OBP操作來檢查此事 件。於VAL及VAH之感測僅遵循如圖19中所示之正常QPW 驗證循環。 於VBL之感測最初將可能為如圊17中所示的已縮短循 117671.doc -43 - 1328231 環。此外,若在OBP之後任何位元超過VBL,則VB驗證類 似於圊18中所示擴展之循環。而且,在下一感測循環中, 類似於圖19中所示循環的正常循環將重新開始。將以類似 於對於VA之方式計算SQPW用於在VB位準進行驗證所節省 及浪費的時間。 圊20C為涉及三個臨限位準之SQPW的時序圖且展示在 除驗證A及驗證B之外開始驗證C時的最終程式化階段。由 於在此階段至少一位元已超過VAL,故無需OBP操作來檢 查此事件。此外,若在OBP之後任何位元超過VCL,則VC 驗證類似於圖18中所示擴展之循環。而且,在下一感測循 環中,類似於圓19中所示之循環的正常循環將重新開始。 將以類似於對於在任何位元超過VAL之前僅涉及驗證A之 程式化驗證之初始階段的方式計算SQPW用於在VC位準進 行驗證所節省及浪費之時間。 雖然已關於某些實施例描述了本發明之各種態樣,但應 瞭解,在附加申請專利範圍之完整範疇内給予本發明以保 護。 【圖式簡單說明】 圖1A至1E示意性地說明非揮發性記憶體單元之不同實 例。 圖2說明記憶體單元之NOR陣列之一實例。 圖3說明記憶體單元之NAND陣列的一實例,諸如圖1D 中所示之NAND單元。 圖4說明對於浮動閘極在任一時間可儲存之四個不同電 117671.doc -44 - 1328231 荷Q1至Q4,源極-汲極電流與控制閘極電壓之間的關係。 圖5示意性地說明可由讀取/寫入電路經列及行解碼器而 存取之記憶體陣列的典型配置。 圖6A示意性地說明具有一組讀取/寫入電路之緊密記憶 體裝置’其提供實施本發明之情形。 圖6B說明圖6A中所示緊密記憶體裝置之較佳配置。 圖6C說明若干感測模組至讀取/寫入堆疊之較佳分組。 圖6D示意性地說明圖6C中所示之讀取/寫入堆疊中之基 本組件的總體配置。 圖7A說明當每一記憶體單元使用習知格雷碼儲存兩個位 元之資料時’ 4狀態記憶體陣列的臨限電壓分佈。 圖7B說明使用格雷碼以現有、2路徑程式化機制進行的 下頁程式化。 圖7C說明使用格雷碼以現有、2路徑程式化機制進行的 上頁程式化》 圖7D說明辨別以格雷碼編碼之4狀態記憶體之下位元所 需的讀取操作。 圖7E說明辨別以格雷碼編碼之4狀態記憶體之上位元所 需的讀取操作。 圖8A說明當每一記憶體單元使用LM碼儲存兩個位元之 資料時,4狀態記憶體陣列的臨限電壓分佈。 圖8B說明使用LM碼以現有、2路徑程式化機制進行的下 頁程式化。 圖8C說明使用LM碼以現有、2路徑程式化機制進行的上 117671.doc • 45· 1328231 頁程式化。 圖8D說明辨別以LM碼編碼之4狀態記憶體之下位元所需 的讀取操作。 圖8E說明辨別以LM碼編碼之4狀態記憶體之上位元所需 的讀取操作。 圖9A說明當每一記憶體單元使用LM新碼儲存兩個位-之資料時,4狀態記憶體陣列的臨限電壓分佈。 圖9B說明使用LM新碼以現有、2路徑程式化機制進行的 下頁程式化。 圖9C說明使用LM新碼以現有、2路徑程式化機制進行的 上頁程式化。 圖9D說明辨別以LM新碼編碼之4狀態記憶體之了位元所 需的讀取操作。 圖9E說明辨別以LM新碼编碼之4狀態記憶體之上位元所 需的讀取操作。 圖10更詳細地示意性說明圖6A中所示的適合於感測所述 記憶體之感測模組。 圖11展示具有給定已程式化記憶狀態之記憶體單元的兩 個分佈,其中較展開之分佈係由在VL位準處驗證之單路 徑程式化而產生,且較緊密之分佈係由一具有在VH位準 處驗證之第二路徑的二路徑程式化而產生。 圖12展示二路徑程式化波形之一實例。 圖13為用於一路徑程式化操作之驗證操作中進行感測的 時序圖。 117671.doc • 46- 圖14展示快速路徑寫入之單路徑程式化波形。 圖15為用於在一路徑QPW程式化操作之驗證操作中進行 感測的時序圖。 圖16為根據本發明之經改良程式化驗證操作的流程圖。 圖17為在任何位元超過VL之前的SQPW驗證之時序圖》 可將其視為SPQW驗證之縮短之循環表現且每當該群單元 中無位元已超過VL時其皆為適用的。 圖18為剛已出現一位元超過VL之第一情況的SQPW驗證 之時序圖。 圖19為在於恰好在至少一位元已超過VL之後的循環之 後的後續循環中之SQPW驗證的時序圖。 圖20A為涉及三個臨限位準之SQPW的時序圖且展示僅 涉及驗證A之初始程式化階段。 圖20B為涉及三個臨限位準之SQPW的時序圖且展示在 除驗證A之外開始驗證B時的中間程式化階段。 圖20C為涉及三個臨限位準之SQPW的時序圖且展示在 除驗證A及驗證B之外開始驗證C時的最終程式化階段。 【主要元件符號說明】 10 記憶體單元 12 分裂通道 14 源極 16 汲極 20 浮動閘極 20' 浮動閘極 117671.doc -47- 1328231Figure 20B is a timing diagram for SQPW involving three threshold levels and shows an intermediate stylization phase when verifying B is initiated in addition to Verification A. Since at least one bit has exceeded VAL at this stage, no OBP operation is required to check for this event. The sensing at VAL and VAH follows only the normal QPW verification cycle as shown in Figure 19. The sensing of the VBL will initially be a shortened circa 117671.doc -43 - 1328231 ring as shown in 圊17. Furthermore, if any bit after the OBP exceeds VBL, the VB verification is similar to the extended loop shown in 圊18. Moreover, in the next sensing cycle, a normal loop similar to the loop shown in Figure 19 will restart. The time saved and wasted by the SQPW for verification at the VB level will be calculated in a manner similar to that for VA.圊20C is a timing diagram for SQPWs involving three threshold levels and shows the final stylization phase when C is verified in addition to Verification A and Verification B. Since at least one element has exceeded VAL at this stage, no OBP operation is required to check for this event. Furthermore, if any bit after the OBP exceeds VCL, the VC verification is similar to the extended loop shown in Figure 18. Moreover, in the next sensing cycle, a normal cycle similar to the one shown in circle 19 will resume. The time saved and wasted by the SQPW for verification at the VC level will be calculated in a manner similar to the initial phase of stylized verification involving only Verification A before any bit exceeds VAL. While the invention has been described with respect to the specific embodiments thereof, it should be understood that BRIEF DESCRIPTION OF THE DRAWINGS Figures 1A to 1E schematically illustrate different examples of non-volatile memory cells. Figure 2 illustrates an example of a NOR array of memory cells. Figure 3 illustrates an example of a NAND array of memory cells, such as the NAND cells shown in Figure 1D. Figure 4 illustrates the relationship between the source-drain current and the control gate voltage for four different energies 117671.doc -44 - 1328231 charge Q1 to Q4 that can be stored at any time for the floating gate. Figure 5 schematically illustrates a typical configuration of a memory array accessible by a read/write circuit via a column and row decoder. Figure 6A schematically illustrates a compact memory device having a set of read/write circuits' which provides a scenario for practicing the present invention. Figure 6B illustrates a preferred configuration of the compact memory device shown in Figure 6A. Figure 6C illustrates a preferred grouping of several sensing modules to a read/write stack. Fig. 6D schematically illustrates the overall configuration of the basic components in the read/write stack shown in Fig. 6C. Figure 7A illustrates the threshold voltage distribution of a '4 state memory array when each memory cell stores data for two bits using a conventional Gray code. Figure 7B illustrates the next page stylization using Gray code with an existing, 2-path stylization mechanism. Figure 7C illustrates the previous page stylization using the Gray code with the existing, 2-path stylization mechanism. Figure 7D illustrates the read operation required to identify the lower bits of the 4-state memory encoded in Gray code. Figure 7E illustrates the read operation required to distinguish the bits above the 4-state memory encoded in Gray code. Figure 8A illustrates the threshold voltage distribution of a 4-state memory array when each memory cell stores data for two bits using the LM code. Figure 8B illustrates the next page stylization using the LM code with an existing, 2-path stylization mechanism. Figure 8C illustrates the stylization of the upper 117671.doc • 45· 1328231 page using the LM code with the existing, 2-path stylization mechanism. Figure 8D illustrates the read operation required to identify the lower bits of the 4-state memory encoded in the LM code. Figure 8E illustrates the read operation required to distinguish the bits above the 4-state memory encoded in the LM code. Figure 9A illustrates the threshold voltage distribution of a 4-state memory array when each memory cell stores two bits of data using the LM new code. Figure 9B illustrates the next page stylization using the LM new code with the existing, 2-path stylization mechanism. Figure 9C illustrates the upsizing of the previous page using the LM new code with the existing, 2-path stylization mechanism. Figure 9D illustrates the read operation required to distinguish the bits of the 4-state memory encoded with the LM new code. Figure 9E illustrates the read operation required to distinguish the bits above the 4-state memory encoded with the LM new code. Figure 10 schematically illustrates in more detail the sensing module shown in Figure 6A suitable for sensing the memory. Figure 11 shows two distributions of memory cells with a given programmed memory state, where the more developed distribution is generated by a single path stylized at the VL level, and the tighter distribution is one with The two paths of the second path verified at the VH level are stylized. Figure 12 shows an example of a two-path stylized waveform. Figure 13 is a timing diagram for sensing in a verify operation for a path stylized operation. 117671.doc • 46- Figure 14 shows a single path stylized waveform for fast path writing. Figure 15 is a timing diagram for sensing in a verify operation of a path QPW stylization operation. Figure 16 is a flow diagram of an improved stylized verification operation in accordance with the present invention. Figure 17 is a timing diagram of SQPW verification before any bit exceeds VL. It can be considered as a shortened cyclic performance of SPQW verification and is applicable whenever no bits in the group unit have exceeded VL. Figure 18 is a timing diagram of SQPW verification for the first case where a bit exceeds VL. Figure 19 is a timing diagram of SQPW verification in a subsequent cycle just after the cycle after at least one bit has exceeded VL. Figure 20A is a timing diagram for SQPW involving three threshold levels and shows an initial stylization phase involving only verification A. Figure 20B is a timing diagram for SQPW involving three threshold levels and shows an intermediate stylization phase when verifying B is initiated in addition to Verification A. Figure 20C is a timing diagram of SQPW involving three threshold levels and shows the final stylization phase when C is verified in addition to Verification A and Verification B. [Main component symbol description] 10 Memory unit 12 Split channel 14 Source 16 Deuterium 20 Floating gate 20' Floating gate 117671.doc -47- 1328231

30 控制閘極 30' 控制閘極 34 源極線 36 位元線/引導線 40 選擇閘極 42 字線 50 反及單元/反及鏈 54 源極端子 56 汲極端子 100 記憶體陣列 130 列解碼器 160 行解碼器 170 讀取/寫入電路 212 感測放大 231 I/O匯流排 300 記憶體單元之二維陣列 310 控制電路 312 狀態機 314 晶片上位址解碼器 316 功率控制模組 330 列解碼器 330A 列解碼器 330B 列解碼器 350 區塊多工器 117671.doc •48- 1328231 350A 區塊多工器 350B 區塊多工器 360 行解碼器 360A 行解碼器 360B 行解碼器 370 讀取/寫入電路 370A 讀取/寫入電路 370B 讀取/寫入電路 ® 411 線 421 堆疊匯流排 430 資料鎖存器 440 I/O模組 480 感測模組 481 感測節點 482 隔離電晶體 • 486 下拉電路 488 傳送閘 490 讀取/寫入堆疊 498 頁控制器 499 讀出匯流排 500 共同處理器 520 鎖存器 600 感測放大器 610 位元線電壓鉗制 117671.doc -49- 1328231 630 電晶體 632 電晶體 640 預充電/箝制電路 647 節點 650 單元電流鑑別器 651 節點SEN 660 鎖存器 1301 分佈 1303 分佈 1401 第一階梯PW1 1403 第二路徑PW2 1501 程式化波形QPW BL 位元線 Ml 記憶電晶體 M2 記憶電晶體 Μη 記憶電晶體 PW1 程式化波形 PW2 程式化波形 Q1 電荷 Q2 電荷 Q3 電荷 Q4 電荷 SI 源極選擇電晶體 S2 汲極選擇電晶體 117671.doc -50- 1328231 τι Τ2 ΤΙ - left ΤΙ - right WL 記憶電晶體 選擇電晶體 健存單元 儲存單元 字線30 Control Gate 30' Control Gate 34 Source Line 36 Bit Line/Guide Line 40 Select Gate 42 Word Line 50 Reverse Unit/Reverse Chain 54 Source Terminal 56 汲 Extreme 100 Memory Array 130 Column Decoding 160 row decoder 170 read/write circuit 212 sense amplification 231 I/O bus bar 300 two-dimensional array of memory cells 310 control circuit 312 state machine 314 on-chip address decoder 316 power control module 330 column decoding 330A Column Decoder 330B Column Decoder 350 Block Multiplexer 117671.doc • 48- 1328231 350A Block Multiplexer 350B Block Multiplexer 360 Line Decoder 360A Line Decoder 360B Line Decoder 370 Read / Write Circuit 370A Read/Write Circuit 370B Read/Write Circuit® 411 Line 421 Stack Bus 430 Data Latch 440 I/O Module 480 Sensing Module 481 Sensing Node 482 Isolation Transistor • 486 Pull-down circuit 488 Transfer gate 490 Read/write stack 498 page controller 499 Read bus 500 Common processor 520 Latch 600 Sense amplifier 610 Bit line voltage clamp 117671 .doc -49- 1328231 630 Transistor 632 Transistor 640 Precharge/Clamp Circuit 647 Node 650 Unit Current Discriminator 651 Node SEN 660 Latch 1301 Distribution 1303 Distribution 1401 First Step PW1 1403 Second Path PW2 1501 Stylized Waveform QPW BL bit line Ml memory transistor M2 memory transistor Μ memory transistor PW1 stylized waveform PW2 stylized waveform Q1 charge Q2 charge Q3 charge Q4 charge SI source select transistor S2 drain select transistor 117671.doc -50 - 1328231 τι Τ2 ΤΙ - left ΤΙ - right WL memory transistor selection transistor memory cell storage unit word line

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Claims (1)

1328231 月日汶正本 第095150107號專利申請案 '中文申請專利範圍替換本(99年3月) ‘ 十、申請專利範圍: 1 · 一種相對於一分界臨限電壓而並列程式化一經4 ^ J狂八亿群圮憶體單 元之方法,其包括: (a) 將一程式化脈衝施加至該群記憶體單元. (b) 相對於一在一低於一分界臨限電壓之邊限之預定邊 限處之第一參考臨限電壓而驗證該群記憶體單元. ⑷重複⑷至(b)直至已相對於該第—參考臨限電壓而 驗證該群記憶體單元中之一第一記憶體單元為止; 鲁 ⑷修改一已關於該第一參考臨限電壓而被驗證之該第 一記憶體單元的一程式化設置以減慢該第一記憶體單元 之後續程式化的速度; 0)將一程式化脈衝施加至該群記憶體單元; (f)相對於該第一參考臨限電壓而驗證該群記憶體單 元; (g) 修改已關於該第一參考臨限電壓而被驗證之另一記 隐體單70的程式化設置以減慢該另一記憶體單元之後續 程式化的速度; (h) 相對於該分界臨限電壓而驗證該群記憶體單元; ⑴抑制一已相對於該分界臨限電壓而被驗證之該群記 憶體單元中任一者的進一步程式化;及 G)重複(e)至⑴直至已相對於該分界臨限電壓而程式化 驗證該群記憶體單元中所有記憶體單元為止。 2.如請求項1之方法,其進一步包括: 措由相關聯之位元線而存取該群記憶體單元;且其中 117671-990311.doc 3. =修改—程式化設置之步驟包含升高已關於該第一參 …。限電壓而被驗證之該第一記憶體單元或另一記憶體 早二之錢7L線上的—電壓以減緩該程式化之速度。 如凊求項1之方法,其進一步包括: 藉由相關聯之位元線而存取該群記憶體單元; 提供一電源電壓;且其中 / P制以相關於該分界臨限電壓而被驗證之該記憶體 ^群中任—者的進—步程式化之步驟包含將與該記憶體 單-相關%之忒等位元線實質上升高至該電源電壓,同時 4. 未丈抑制的多個單元使其位元線在實質上為零之電壓。 如請求項1之方法,#中該程式化脈衝以每一脈衝單調 地增加。 5_如請求項丨之方法,其中該群記憶體單元為一快閃 EEPROM之一部分。 6.如請求項丨之方法,纟中該群記憶體單元係體現於一記 憶卡中。 一種相對於一分界臨限電壓而並列程式化一群記憶體單 元之方法,其包括: 對於並列之該群記憶體單元,交替地施加一程式化脈 衝及驗證程式化結果; 5玄驗證進一步包括: 一第一驗證,其係相對於一在一低於該分界臨限電 壓之邊限之一預定邊限處的第一參考臨限電壓; 減緩已相對於該第一參考臨限電壓而驗證之該群記 117671-990311.doc -2· 1328231 憶體單元中一記憶體單元的程式化速度; —第二驗證,其係相對於該分界臨限電壓;及 抑制已相對於該分界臨限電壓而被驗證之該記憶體 單元的進一步程式化;且其中: 不執行該第二驗證直至已相對於該第—參考臨限電 壓而驗證該群記憶體單元中的至少一第一者為止。 8. 如請求項7之方法,其進一步包括: 0 藉由相關聯之位元線而存取該群記憶體單元;且其中 該修改一程式化設置包含升高已關於該第一參考臨限 電壓而被驗證之該記憶體單元之該位元線上的一電壓以 減緩該程式化之速度。 9. 如請求項7之方法,其進一步包括: 藉由相關聯之位元線而存取該群記憶體單元; 提供—電源電壓;且其中 X抑制忒C憶體單元的進一步程式化之步驟包含將與 Φ Λ ^隐體單兀相關聯之該等位元線實質上升高至該電源 電[時將該群記憶體單元中未受抑制的記憶體單元 使其位7C線在實質上為零之電壓。 10·如請求項^ 、万法,其♦該程式化脈衝正以每一脈衝單 調地增加。 11.如請求項7之#丄 、芡方法’其中該群記憶體單元為一快閃 EEPROM之一部分。 12 _如請求項7之士_^ , 、万法,其中該群記憶體單元係體現於一記 憶卡中》 II7671-99031l.doc 1328231 13. 如請求項!至12 t任一項之方法,i由 乃凌具中該辟記憶體單元 中之個別記憶體單/0各自可程式化至兩個狀態中之一者 且該分界臨限電壓用於對該兩個狀態進行分界。 14. 如請求項中任一項之方法’纟中該群記憶體單元 中之個別記憶體單元各自可程式化至兩個以上狀態中之 一者’且該分界臨限電壓為用於對該_以上狀態進行 分界之多個分界臨限電壓中的一者。 15. 如請求項!4之方法,其進_步包括相對於該多個分界臨 限電壓中每一者而重複該等步驟。 16. —種非揮發性記憶體,其包括: 待相對於一分界臨限電壓而程式化之一群記憶體單 元; 一程式化電路,其用於將一程式化脈衝施加至該群記 憶體單元; 具有一第一組態之感測電路,其相對於一在一低於 該分界臨限電壓之邊限之一預定邊限處的第一參考臨限 電壓而驗證該群記憶體單元; 一記憶體控制器; 該控制器交替地控制該程式化電路及具有該第一組態 之該感測電路的操作直至已相對於該第一參考臨限電壓 而驗證該群記憶體單元中之一者為止; 一程式化延遲電路,其用於減慢一已相對於該第一參 考臨限電壓而被驗證之該群記憶體單元中任一記憶體單 元的後續程式化的速度; JJ767J-9903H.doc -程式化抑制電路,其用於抑制一已相對於該分界臨 限電壓而被驗證之該群記憶體單元中任-記憶體單元的 進—步程式化;且 /玄控制器交替地控制該程式化電路之該操作及該感測 電路,該操作以相對於該第—參考臨限電壓而驗證該群 2的省等單兀,接著相對於該分界臨限電壓而進行驗 直至已相對於該分界臨限電壓而程式化驗證該群 憶體單元中之所有記憶體單元為止。 ° 如叫求項16之非揮發性記憶體,其進一步包括: 藉由相關聯之位元線而存取該群記憶體單元;且其中 該修改-程式化設置之步驟包含升高已關於該第—參 考臨限電壓而被驗證之該任—記憶體單元之該位元線^ 的一電壓以減緩該程式化之速度。 18. 如請求項16之非揮發性記憶體,其進一步包括: 藉由相關聯之位元線而存取該群記憶體單元;且其中 該程式化抑制電路包含升高與受抑制之該記憶體單元 相關聯的該位元線,以將其實質上升高至一電源電壓, 同時未受抑制的多個單元使其位元線在實質上為零之電 壓。 19. 如請求項16之非揮發性記憶體,其中該程式化脈衝正以 每一脈衝單調地增加。 20. 如請求項丨6之非揮發性記憶體,其中該群記憶體單元為 一快閃EEPROM之一部分。 21. 如請求項16之非揮發性記憶體,其中該群記憶體單元係 117671-990311.doc 1328231 體現於一記憶卡中。 22. 如請求項16至21中任一項之非揮發性記憶體,其中該群 記憶體單元中之個別記憶體單元各自可程式化至兩個狀 態中之一者且該分界臨限電壓用於對該兩個狀態進行分 界。 23. 如請求項16至21中任一項之非揮發性記憶體,其中個別 記憶體單元各自可程式化至兩個以上狀態中之一者,且 該刀界L限電壓為用於對該兩個以上狀態進行分界之多 個分界臨限電壓中的一者。 24. —種非揮發性記憶體,其包括: 待相對於一分界臨限電壓而程式化之一群記憶體單 元; 一程式化電路,其用於將—程式化脈衝施加至該群記 憶體單元; 一具有一第一組態之感測電路,其相對於一在一低於 該分界臨限電壓之邊限之—預㈣限處的第—參考臨限 電壓而驗證該群記憶體單元; 4憶體控制盗對於並列之該_記憶體單元交替 地施加一程式化脈衝及驗證程式化結果; 該驗證進一步包括: 一第一驗證,其係相對於—在一低於該分界臨限電 壓之邊限之一預定邊限處的第一參考臨限電壓; 減緩已相對於該第-參考臨限㈣而被驗證之該群 記憶體單元中-記憶體單元的該程式化之速度; 117671-990311.doc -6 - 利一其係相對於該分界臨限電壓;及 供D式化抑制電路抑制已相對於該分界臨限電壤 而驗也之任何記憶體單 早兀的進—步程式化;且其中: 不執行該第二驗今登吉5 口上 。直至已相對於該第一參考臨限電 壓而驗證該群記,1*咅科错- … …思體早兀中的至少-第-者為止。 25.如4求項24之非揮發性記憶體,其進—步包括: 藉由相關‘之位凡線而存取該群記憶體單元;且其中 文&式化攻置之步驟包含升高已關於該第—表 考臨限電壓而被驗證之該記憶體單元之該位元線上的三 電壓以減緩該程式化之速度。 26.如請求項24之非揮發性記憶體其進一步包括: 藉由相關聯之位元線而存取該群記憶體單元;且其中 «亥紅式化抑制電路包含升高與該受抑制之該記憶體單 元相關聯之該位元線,以將其實質上升高至一電源電 壓,同時將該群記憶體單以未受抑制的記憶體單元使 其位元線在實質上為零之電壓。 27.如請求項24之非揮發性記憶體,其中該程式化脈衝以每 一脈衝單調地增加。 28. 如請求項24之非揮發性記憶體,其中該群記憶體單元為 一快閃EEPROM之一部分。 29. 如請求項24之非揮發性記憶體,其中該群記憶體單元係 體現於一記憶卡中。 30.如清求項24至29中任一項之非揮發性記憶體,其中該群 記憶體單元中之個別記憶體單元各自可程式化至兩個狀 H7671-990311.doc 1328231 態中之一者且該分界臨限電壓係用於對該兩個狀雖進 分界。 3 I如請求項24至29中任一項之非揮發性記憶體,其中該群 記憶體單元中之個別記憶體單元各自可程式化至兩個以 上狀態中之一者且該分界臨限電壓為用於對該兩個以上 狀態進行分界之多個分界臨限電壓中的一者。 32. —種非揮發性記憶體,其包括: 待相對於一分界臨限電壓而程式化之一群記憶體單 元; 一程式化電路,其用於將一程式化脈衝施加至一群記 憶體單元; 一具有一第一組態之感测電路,其相對於一在一低於 該分界臨限電壓之邊限之一預定邊限處的第一參考臨限 電壓而驗證該群記憶體單元; 一構件,其用於對於並列之該群記憶體單元交替地施 加一程式化脈衝及驗證程式化結果; §亥驗證進一步包括: …第驗,其係相對於一在一低於該分界臨限電 壓之邊限之—預定邊限處的第-參考臨限電壓; 咸緩已相對於遠第-參考臨限電壓而被驗證之該群 °己憶體早元中—兮?情魏置-ϋ 。己IS體早TL的該程式化之速度; 一第二驗證,其係相對於該分界臨限電壓;及 二制已相對於該分界臨限電壓而被驗證之任一記憶 體單凡的進—步程式化;且其中: 117671-990311.doc \ C'.- 1328231 不執行該第二驗證直至已相對於該第一參考臨限電 壓而驗證該群記憶體單元中的至少一第一者為止。 3 3.如凊求項3 2之非揮發性記憶體,其中該群記憶體單元中 之個別記憶體單元各自可程式化至兩個狀態中之一者且 該分界臨限電壓係用於對該兩個狀態進行分界。 3 4.如請求項3 2之非揮發性記憶體,其中該群記憶體單元中 之個別δ己憶體單元各自可程式化至兩個以上狀蘇中之一 者’且該分界臨限電壓為用於對該兩個以上狀態進行八 界之多個分界臨限電壓中的一者。1328231, the Japanese patent application No. 095150107, the patent application for the replacement of the Chinese patent application scope (March 99) 'X. The scope of the patent application: 1 · A parallelization of the threshold voltage and a stylized 4 ^ J madness A method for a group of 800 million memory cells, comprising: (a) applying a stylized pulse to the group of memory cells. (b) a predetermined edge relative to a margin below a threshold threshold voltage Verifying the group of memory cells by the first reference threshold voltage. (4) repeating (4) to (b) until one of the first memory cells in the group of memory cells has been verified with respect to the first reference threshold voltage Lu (4) modifies a stylized setting of the first memory unit that has been verified with respect to the first reference threshold voltage to slow down the subsequent stylized speed of the first memory unit; 0) a programmed pulse is applied to the group of memory cells; (f) verifying the group of memory cells relative to the first reference threshold voltage; (g) modifying another one that has been verified with respect to the first reference threshold voltage Remember the course of the hidden body 70 Setting to slow down the subsequent stylization of the other memory unit; (h) verifying the group of memory cells relative to the threshold threshold voltage; (1) suppressing a verification that has been verified against the threshold threshold voltage Further programming of any of the group of memory cells; and G) repeating (e) through (1) until all memory cells in the group of memory cells have been programmatically verified with respect to the threshold threshold voltage. 2. The method of claim 1, further comprising: accessing the group of memory cells by means of associated bit lines; and wherein the step of 117671-990311.doc 3. = modifying - stylizing settings comprises increasing Already about this first reference... The voltage of the first memory unit or another memory that is verified by the voltage is reduced by the voltage of the 7L line to slow down the stylized speed. The method of claim 1, further comprising: accessing the group memory unit by an associated bit line; providing a power supply voltage; and wherein the /P system is verified with respect to the boundary threshold voltage The steps of the step-by-step programming of the memory group include substantially increasing the bit line of the memory-single-equivalent to the power supply voltage, and at the same time 4. The cells have their bit lines at a voltage that is essentially zero. As in the method of claim 1, the stylized pulses in # are monotonically increasing with each pulse. 5_ The method of claim 1, wherein the group of memory cells is part of a flash EEPROM. 6. In the method of requesting the item, the group memory unit is embodied in a memory card. A method for juxtaposed staging a group of memory cells relative to a threshold threshold voltage, comprising: alternately applying a stylized pulse and verifying a stylized result for the group of memory cells that are juxtaposed; a first verification that is relative to a first reference threshold voltage at a predetermined margin below a threshold of the threshold threshold voltage; the mitigation has been verified against the first reference threshold voltage The group record 117671-990311.doc -2· 1328231 remembers the stylized speed of a memory unit in the body unit; - the second verification, which is relative to the threshold voltage; and suppresses the threshold voltage relative to the boundary And verifying further programming of the memory unit; and wherein: the second verification is not performed until at least a first one of the group of memory units has been verified with respect to the first reference threshold voltage. 8. The method of claim 7, further comprising: 0 accessing the group of memory cells by the associated bit line; and wherein the modifying a stylized setting comprises raising the first reference threshold The voltage is verified by a voltage on the bit line of the memory cell to slow down the stylized speed. 9. The method of claim 7, further comprising: accessing the group of memory cells by associated bit lines; providing - a supply voltage; and wherein X is further stabilizing steps of the 忆C memory unit Included that the bit line associated with the Φ 隐 ^ hidden body 实质上 is substantially raised to the power source [when the memory cell in the group memory cell is unsuppressed, the bit 7C line is substantially Zero voltage. 10. If the request item ^, Wanfa, ♦ the stylized pulse is increasing monotonically with each pulse. 11. The #丄,芡 method of claim 7 wherein the group of memory cells is part of a flash EEPROM. 12 _ If the request item 7 _ ^, , Wanfa, where the group of memory units are reflected in a memory card" II7671-99031l.doc 1328231 13. If requested! The method of any one of 12 t, i can be programmed into one of two states by the individual memory single/0 in the memory unit of the device, and the boundary threshold voltage is used for the two The state is demarcated. 14. The method of any of the claims, wherein each of the individual memory cells in the group of memory cells is programmable to one of two or more states and the threshold threshold voltage is used to The above state is one of a plurality of boundary threshold voltages that are demarcated. 15. As requested! The method of 4, wherein the step comprises repeating the steps relative to each of the plurality of boundary threshold voltages. 16. A non-volatile memory, comprising: a program group of memory cells to be programmed with respect to a threshold threshold voltage; a stylized circuit for applying a stylized pulse to the group of memory cells a sensing circuit having a first configuration for verifying the group of memory cells with respect to a first reference threshold voltage at a predetermined margin below a threshold of the threshold threshold voltage; a memory controller; the controller alternately controls operation of the programming circuit and the sensing circuit having the first configuration until one of the group of memory cells has been verified with respect to the first reference threshold voltage So far; a stylized delay circuit for slowing down the subsequent stylized speed of any one of the memory cells of the group of memory cells that have been verified with respect to the first reference threshold voltage; JJ767J-9903H .doc - a stylized suppression circuit for suppressing a step-by-step programming of a memory cell in the group of memory cells that has been verified with respect to the threshold threshold voltage; and control The operation of the stylized circuit and the sensing circuit, the operation verifying the province 1 of the group 2 with respect to the first reference threshold voltage, and then performing the test with respect to the threshold threshold voltage until All memory cells in the group of memory cells are programmed to verify relative to the threshold threshold voltage. The non-volatile memory of claim 16, further comprising: accessing the group of memory cells by the associated bit line; and wherein the step of modifying-staging the setting comprises raising the The first - the voltage of the bit line ^ of the memory cell is verified with reference to the threshold voltage to slow down the stylized speed. 18. The non-volatile memory of claim 16, further comprising: accessing the group of memory cells by associated bit lines; and wherein the stylized suppression circuit includes the memory of rising and suppressed The bit line associated with the body cell is substantially raised to a supply voltage while the unconstrained plurality of cells have their bit line at a substantially zero voltage. 19. The non-volatile memory of claim 16, wherein the stylized pulse is monotonically increasing with each pulse. 20. The non-volatile memory of claim 6, wherein the group of memory cells is part of a flash EEPROM. 21. The non-volatile memory of claim 16, wherein the group of memory cells 117671-990311.doc 1328231 is embodied in a memory card. 22. The non-volatile memory of any one of claims 16 to 21, wherein each of the individual memory cells in the group of memory cells is programmable to one of two states and the threshold voltage is used The two states are demarcated. 23. The non-volatile memory of any one of claims 16 to 21, wherein each of the individual memory cells is each programmable to one of two or more states, and the knife boundary L voltage is used to One of a plurality of boundary threshold voltages that are delimited by two or more states. 24. A non-volatile memory, comprising: a program group of memory cells to be programmed with respect to a threshold threshold voltage; a stylized circuit for applying a stylized pulse to the group of memory cells a sensing circuit having a first configuration for verifying the group of memory cells with respect to a first reference threshold voltage at a pre-(four) limit below a threshold of the threshold threshold voltage; 4 Recalling the pirate for the parallel _ memory unit alternately applying a stylized pulse and verifying the stylized result; the verification further comprising: a first verification, which is relative to - at a threshold voltage below the threshold a first reference threshold voltage at a predetermined margin; mitigating the stylized velocity of the memory unit in the group of memory cells that have been verified relative to the first reference threshold (four); 117671 -990311.doc -6 - Lee is the threshold voltage relative to the boundary; and the D-type suppression circuit suppresses any memory that has been tested against the boundary of the threshold. Stylized; and where The second test is not performed on this Dengji 5. Until the group record has been verified with respect to the first reference threshold voltage, at least - the first one of the body. 25. The non-volatile memory of claim 24, wherein the step of: comprising: accessing the group of memory cells by a related line; and the step of Chinese & The three voltages on the bit line of the memory cell that have been verified for the first-level test threshold voltage are slowed down to slow down the stylized speed. 26. The non-volatile memory of claim 24, further comprising: accessing the group of memory cells by associated bit lines; and wherein the "red-red suppression" circuit includes an increase and the suppression The bit line associated with the memory cell to substantially raise it to a supply voltage while the group of memory is monotonically unsuppressed by the memory cell such that its bit line is substantially zero voltage . 27. The non-volatile memory of claim 24, wherein the stylized pulses increase monotonically with each pulse. 28. The non-volatile memory of claim 24, wherein the group of memory cells is part of a flash EEPROM. 29. The non-volatile memory of claim 24, wherein the group of memory cells is embodied in a memory card. 30. The non-volatile memory of any one of claims 24 to 29, wherein each of the individual memory cells in the group of memory cells is programmable to one of two states H7671-990311.doc 1328231 And the boundary threshold voltage is used to divide the two shapes. The non-volatile memory of any one of claims 24 to 29, wherein each of the individual memory cells in the group of memory cells is programmable to one of two or more states and the threshold voltage is One of a plurality of demarcation threshold voltages for demarcating the two or more states. 32. A non-volatile memory, comprising: a program group of memory cells to be programmed with respect to a threshold threshold voltage; a stylized circuit for applying a stylized pulse to a group of memory cells; a sensing circuit having a first configuration for verifying the group of memory cells with respect to a first reference threshold voltage at a predetermined margin below a threshold of the threshold threshold voltage; a member for alternately applying a stylized pulse to the parallel group of memory cells and verifying the stylized result; wherein the verification further comprises: ...the first test, which is relative to a threshold voltage lower than the boundary The margin of the limit - the first reference threshold voltage at the predetermined margin; the salt mitigation has been verified relative to the far-reference threshold voltage of the group of the memory of the early memory - 兮? Love Wei set - ϋ. The stylized speed of the early TL of the IS body; a second verification, which is relative to the threshold voltage of the boundary; and the memory of any memory that has been verified against the threshold voltage of the second system. Step stylized; and wherein: 117671-990311.doc \ C'.- 1328231 does not perform the second verification until at least one of the first group of memory cells has been verified with respect to the first reference threshold voltage until. 3 3. The non-volatile memory of claim 3, wherein each of the individual memory cells in the group of memory cells is programmable to one of two states and the threshold voltage is used for The two states are demarcated. 3 4. The non-volatile memory of claim 3, wherein each of the individual δ-resonant units in the group of memory cells can be programmed to one of two or more sulcus' and the threshold threshold voltage One of a plurality of demarcation threshold voltages for performing eight boundaries for the two or more states. 117671-990311.doc117671-990311.doc
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