TWI321839B - Multi-chip stacked structure - Google Patents

Multi-chip stacked structure Download PDF

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Publication number
TWI321839B
TWI321839B TW094131227A TW94131227A TWI321839B TW I321839 B TWI321839 B TW I321839B TW 094131227 A TW094131227 A TW 094131227A TW 94131227 A TW94131227 A TW 94131227A TW I321839 B TWI321839 B TW I321839B
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TW
Taiwan
Prior art keywords
wafer
active surface
wires
pads
peripheral region
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Application number
TW094131227A
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Chinese (zh)
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TW200711100A (en
Inventor
Chen Jung Tsai
Chih Wen Lin
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Macronix Int Co Ltd
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Priority to TW094131227A priority Critical patent/TWI321839B/en
Publication of TW200711100A publication Critical patent/TW200711100A/en
Application granted granted Critical
Publication of TWI321839B publication Critical patent/TWI321839B/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/4826Connecting between the body and an opposite side of the item with respect to the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06555Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
    • H01L2225/06562Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking at least one device in the stack being rotated or offset

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  • Wire Bonding (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

二違編號:TW2042PA 九、發明說明: 【發明所屬之技術領域】 發明是有關於—種多晶片堆疊式封裝結構,且特別 =種能純供兩個或兩個以上堆疊“,以減少整體堆義 構…以增加晶片封裝密度與整合度的多晶片堆疊式封裝: 【先前技術】 ) 由於對電子設備小型化且具備多功能的需求,對於 封裝對外觀影響的需求也逐漸增加 技術,是:半i體:度。目前能夠滿足這樣要心 起。牛導體阳粒或曰曰片,經由.彼此堆疊的方式封裝在一 多晶片封裝技術是使用在封裝兩 在-個封裝單元内,使單一封梦置、"“夕的牛導體晶卷 儲存能力。例如,記二:::能夠提供更多功能物 種封裝方式讓單一記心":己憶晶片’就是採用發 ,為了、心 句提供更多的資料儲存能力。 線架鏈中的-個與其他f路’晶_接在—個導 鏈包含-連串彼此連接的導線架,例如+個Hi朴導線架 標準導線架的晶粒連結承座比s 、·次水連成一列。 導線接師並且承座被 此可以—個接-個地財線作業的方心的連接墊因 接於導線㈣上。接著將—保護層覆蓋在·㈣或細銘锋連 以及部分的晶粒所接觸到的導線架封' 面,使晶粒 内’導線架鏈中其他的晶粒/導線架組合^ 樹脂材科 '、?、辦理.。修飾成形 1321839II. Violation number: TW2042PA Nine, invention description: [Technical field of invention] The invention relates to a multi-wafer stacked package structure, and in particular, the type can be purely for two or more stacks to reduce the overall stack Multi-wafer stacked package with increased chip package density and integration: [Prior Art] Due to the miniaturization and versatility of electronic devices, the demand for the influence of packaging on the appearance is gradually increasing. Semi-i body: degree. At present, it can satisfy such a heart. The bull-conductor granules or cymbals are packaged by stacking each other in a multi-chip package technology which is used in the package two-package unit to make a single Feng Meng set, " "The eve of the cattle conductor crystal volume storage capacity. For example, note 2::: can provide more functional material packaging methods so that a single mind "quote: the memory of the chip" is to use hair, in order to provide more data storage capabilities. One of the wire frame chains and the other f roads are connected to each other. The guide chain includes a series of lead frames connected to each other, for example, the die connection ratio s of the + standard lead frame standard lead frame. The secondary water is connected in a row. The wire is connected to the socket and the socket is connected to the wire (4) of the center of the work. Then, the protective layer is covered by the (4) or the fine Ming Feng and the part of the lead frame that the grain is in contact with, so that the other crystal/lead frame in the wire carrier chain is replaced by the resin material. ',?, handle. Retouching 1321839

ί達編號:TW2042PA 作業中,將完㈣連接料物分離,並將各 成想要的形式。 J导踝奏曲 -般封裝多晶片常碰到的問題,特別是在使用導線 裝方式時,内部的電性連接,晶粒間訊號的傳導 封裝件輸A/輸人端關的訊號㈣會受到限制。在 = 令,這些點包含導線架的導線,這些導線與晶粒上接塾的= ::相對較少,因此,導線架上的多晶片封裝形式中,晶粒盘 導線的連接-般會受限於採用簡單的扇出(fan,t),而晶粒^ 間的連接以及訊號傳遞也會受到很大的限制。需 粒間連接以及訊號傳遞能力的多晶粒封裝已經可以用較貴的^曰 層封裝方式完成,例如球形陣列封裝〇^11耵比打1^%;8(5々。夕 其他一般多晶粒封裝會遭遇到的問題,特別是導線架形式 的封裝,是晶粒連接可用面積以及整體封裝高度的限制β因^ 必須提供一種多晶片堆疊式封裝結構,能夠提供兩個或兩個以 上堆疊晶片以減少堆疊厚度,藉以增加晶片封裝密度以及整人 性。 α 【發明内容】 根據本發明的目的據以實施並做廣泛地描述,提出一種多 晶片堆疊式封裝結構,包括至少一第一晶片,具有一第一主動 表面以及一第一背面,第一主動表面包括一中央區域以及—周 邊區域’第一主動表面之周邊區域上具有多個第一接塾;一導 線架包括多個導線以及一晶片承座,晶片承座具有至少一第一 黏接面以及一第二黏接面,第一黏接面黏接第一主動表面,並 露出第一接墊於晶片承座之邊緣外。其中導線包括多個第一導 線及多個第二導線,第一導線及第二導線分別位於晶片承座的 7ί达号: TW2042PA In the operation, the (4) connecting materials are separated and will be in the desired form. J Guided Acoustic - The problem often encountered in multi-chip packaging, especially when using the wire mounting method, the internal electrical connection, the inter-die signal conduction package, the A/input terminal signal (4) will restricted. In the = order, these points contain the leads of the lead frame, which are relatively less than the ::= on the die. Therefore, in the multi-chip package form on the lead frame, the connection of the die-disk wires is generally affected. Limited to the use of simple fanout (fan, t), and the connection between the die and signal transmission is also very limited. Multi-die packages requiring inter-granular connections and signal transfer capabilities can already be completed in a more expensive package, such as a spherical array package 〇^11耵1%%; 8(5々. Other general polycrystalline The problem that the grain package will encounter, especially the package in the form of lead frame, is the limitation of the available area of the die connection and the height of the overall package. Therefore, it is necessary to provide a multi-wafer stacked package structure capable of providing two or more stacks. The wafer is used to reduce the thickness of the stack, thereby increasing the density of the package and the whole humanity. α [Abstract] According to the object of the present invention, a multi-wafer stacked package structure including at least one first wafer is proposed and widely described. Having a first active surface and a first back surface, the first active surface includes a central region and a peripheral region having a plurality of first interfaces on a peripheral region of the first active surface; a lead frame includes a plurality of wires and a a wafer holder having at least a first bonding surface and a second bonding surface, the first bonding surface being bonded to the first active surface, Exposing the first pad to the outer edge of the wafer seat which comprises a plurality of first conductor lines and a plurality of second conductive wires, the first wires and second wires are positioned in the wafer seat 7

三達編號:TW2042PA 相對兩側或相鄰兩侧;至少一第二晶片’具有一第二主動表面 以及第一为面,第二主動表面包括一中央區域以及一周邊區 域,第二主動表面之周邊區域上具有多個第二接墊。第二主動 表面黏接於導線架之第二黏接面’並露出第二接墊於晶片承座 之邊緣外;以及多條金線,其中部分金線電性連接第一接墊與 第一導線,而部分金線電性連接第二接墊與第二導線。 根據本發明的目的,再提出一種多晶片堆疊式封裝結構, 包括:至少-第一晶片堆疊組,至少包括兩晶[第一晶片堆 I、’且包括.一第一晶片,具有一第一主動表面以及一第一背面, 第-主動表面包括一中央區域以及一周邊區域,第一主動表面 之周邊區域具有多個第一接塾;一第二晶片,具有一第二主動 =面以及一第一背面’第二主動表面包括一中央區域以及一周 邊區域,第二主動表面之周邊區域具有多個第二接塾。第二背 =黏接第-主動表面,並露出第―接塾;_導線架,包括多 條導線以及-晶片承座’晶片承座具有一第一黏接面以及一第 j接面’第-黏接面黏接於第二晶片之第二主動表面,並露 =一=及第二接墊於晶片承座之邊緣外。其中導線包括多 導線及多個第二導線,第—導線及第二導線分別位於晶 月承座的相對兩側或相鄰兩側; ^弟一日曰片堆疊組,至少 晶片堆疊組包括:―第三晶片,具有-第三 _周硌以及第二月面’第三主動表面包括-中央區域以及 區域,第三主動表面之周邊區域具有多 第四晶片,具有一第四主叙矣Ώ 面勺紅 表面以及一第四背面,第四主動表 匕括一中央區域以及一周邊區, 且古夕加时 ^第四主動表面之周邊區域 一有夕個第四接墊。第四背面係 二姐拙吐 饮乐一王勁表面,並露出第 一接墊,第四主動表面黏接於導線架之第二黏接面,並露出第 8 1321839Sanda number: TW2042PA opposite sides or adjacent sides; at least one second wafer 'haves a second active surface and a first surface, the second active surface includes a central area and a peripheral area, and the second active surface There are a plurality of second pads on the peripheral area. The second active surface is adhered to the second bonding surface of the lead frame and exposes the second pad outside the edge of the wafer holder; and a plurality of gold wires, wherein some of the gold wires are electrically connected to the first pad and the first a wire, and a part of the gold wire is electrically connected to the second pad and the second wire. According to an object of the present invention, a multi-wafer stacked package structure is further provided, comprising: at least a first wafer stack set comprising at least two crystals [first wafer stack I, 'and including a first wafer having a first The active surface and a first back surface, the first active surface includes a central region and a peripheral region, the peripheral region of the first active surface has a plurality of first interfaces; a second wafer having a second active surface and a The first back surface 'the second active surface includes a central area and a peripheral area, and the peripheral area of the second active surface has a plurality of second ports. The second back=bonds the first active surface and exposes the first contact; the lead frame includes a plurality of wires and the wafer carrier has a first bonding surface and a j-th junction The bonding surface is adhered to the second active surface of the second wafer, and the exposed pad = a = and the second pad is outside the edge of the wafer holder. The wire comprises a plurality of wires and a plurality of second wires, wherein the first wire and the second wire are respectively located on opposite sides or adjacent sides of the crystal moon socket; a third wafer having a -third_perimeter and a second moon surface, the third active surface comprising - a central region and a region, the peripheral region of the third active surface having a plurality of fourth wafers having a fourth main narration The red surface of the dough spoon and the fourth back surface, the fourth active table includes a central area and a peripheral area, and the peripheral area of the fourth active surface is provided with a fourth mat. The fourth back system is the second sister who vomits and drinks the surface of the king, and exposes the first pad. The fourth active surface is adhered to the second bonding surface of the lead frame, and the 8 13 13839 is exposed.

三號:TW2042PA 三接墊及第四接墊於晶片承座之邊緣外;以及多條金線,其中 部分金線電性連接第一接墊與至少部分第一導線,部分金線電 性連接第二接墊與至少部分第一導線,部分金線電性連接第三 接墊與至少部分第二導線,而部分金線電性連接第四 少部分第二導線。 ~ 其餘本發明的特徵與優點將於以下描述,藉由描述及本發 明之實施方式可更凸顯及得知其餘本發明的特徵與優點。本發 明之目的與其他優點將藉由以下描述以及專利申請範圍,以及 所附圖示所指出之半導體結構與製造方法,加以實現達成。 需要明白上列之一般性描述與下列之詳細描述為本發明 之示範與解釋之用,是為了提供本發明專射請範圍的進一牛 解釋。 乂 【實施方式】 本發明之實施例之詳細標示,請參照所附之圖示範例。其 。中所有圖示中標示相同或類似之部分者,採用相同或相似之標No. 3: TW2042PA three pads and fourth pads are outside the edge of the wafer holder; and a plurality of gold wires, wherein some of the gold wires are electrically connected to the first pads and at least part of the first wires, and some of the gold wires are electrically connected The second pad is electrically connected to the at least part of the first wire, the part of the gold wire is electrically connected to the third pad and the at least part of the second wire, and the part of the gold wire is electrically connected to the fourth part of the second wire. The features and advantages of the present invention will be more apparent from the following description of the embodiments of the invention. The object and other advantages of the invention will be realized and attained by the description and the appended claims. It is to be understood that the following general description and the following detailed description of the present invention are intended to provide an explanation of the scope of the present invention.实施 [Embodiment] For a detailed indication of the embodiments of the present invention, please refer to the attached example. Its. Where the same or similar parts are indicated in all the figures, the same or similar

本發明之實施例,係提供 -----1王穴为网個驭旯多之晶片堆疊 結構之導線架薄型封裝結構。本發明之封裝結構藉由將兩個或 更多晶片,堆疊在一薄型小尺寸封聚邮smaU 〇utline pack tsop)結構之區域内,以減少堆疊厚度。本發明係應用於辦加 晶片封裝密度並整合㈣功能於—封裝中,例如域卡技術曰。 第1圖繪示本發明之實施例之多晶片堆疊式封裝結構100 之剖面圖》多晶片堆疊式封裝結構1〇〇包括至少—第 110。第一晶片11〇具有一第一 日日 ^ U弟主動表面115以及-第—背面 第-主動表面115包括一中央區域,以及一具有多個第一 9In the embodiment of the present invention, a lead frame thin package structure of a wafer stack structure of a plurality of layers is provided. The package structure of the present invention reduces stack thickness by stacking two or more wafers in the area of a thin, small-sized package. The present invention is applied to the processing of chip package density and integration (4) functions in a package, such as a domain card technology. 1 is a cross-sectional view of a multi-wafer stacked package structure 100 of an embodiment of the present invention. The multi-wafer stacked package structure 1 includes at least a 110th. The first wafer 11 has a first day and a second active surface 115 and the first-back first-active surface 115 includes a central area, and a plurality of first

三達編號:TW2042PA 接藝125之周邊區域。客s ^夕日曰片堆豐式封裝結構100也包括一導 線架130。導線架130包括多條導線134以及一晶片承座刚, 晶片承座140具有至少一笛一孝秘 第黏接面145以及一第二黏接面 15〇。第一黏接面145黏接第一主動表面u5並露出第一接塾 125於晶片承座140之邊緣外。導線包括第-導線"5及第二 導線136。其中,第—導線135及第二導線136分別位於晶片 承座140的相對兩側或相鄰兩側,第i圖中係以第-導線135 及第二導線136分別位於晶片承座14〇的相對兩側做說明。 —再參照第1圖’多晶片堆疊式封裝結構1〇〇包括至少一第 曰曰片155第-曰曰片155具有-第二主動表面160以及一第 二背面165,第二主動表面⑽包括—中央區域,以及一具有 夕個第一接墊170之周邊區域。第二主動表面16〇黏接晶片承 座140上之第二黏接面15〇,並露出第二接塾17〇於晶片承座 M0之邊緣外^多條金,線175連接第—㈣125與第二接塾 170,其中部分金線175電性連接第—接塾125與第—導線135, 而部分金線175電性連接第二接墊17〇與第二導線136。 一再參照第!圖,第一黏接面145、第一主動表面ιΐ5、第 黏接面150 ί·乂及第一主動表自16〇,可以非導電之固態谬體 或液態璆體黏接。-般係採用液態膠體,例如非導電銀夥;或 者固態膠體,例如非導電薄膜。另外可以一封# 18〇包覆多晶 片堆疊式封裝結構100,係覆蓋導線架13〇、第一晶片11〇、第 二晶片155’以及多條金線175。封膠18〇可以是塑膠或樹脂材 料。 第2圖繪示本發明之實施例之另一多晶片堆疊式封裝結構 之剖面圖。本發明之多晶片堆疊式封裝結構2〇〇至少包括一第 一晶片210。第一晶片210具有一第一主動表面215以及一第Sanda number: TW2042PA The area around the art 125. The guest package 100 also includes a wire guide 130. The lead frame 130 includes a plurality of wires 134 and a wafer carrier, and the wafer holder 140 has at least one flute-filial adhesive surface 145 and a second adhesive surface 15A. The first bonding surface 145 is bonded to the first active surface u5 and exposes the first interface 125 outside the edge of the wafer holder 140. The wire includes a first wire "5 and a second wire 136. The first wire 135 and the second wire 136 are respectively located on opposite sides or adjacent sides of the wafer holder 140. In the first drawing, the first wire 135 and the second wire 136 are respectively located on the wafer holder 14〇. Explain the opposite sides. - Referring again to Figure 1, the multi-wafer stacked package structure 1 includes at least one second sheet 155, the first sheet 155 has a second active surface 160 and a second back surface 165, and the second active surface (10) includes a central area, and a peripheral area having a first pad 170. The second active surface 16 〇 is bonded to the second bonding surface 15 上 on the wafer holder 140 , and exposes the second interface 17 to be outside the edge of the wafer holder M0. The line 175 is connected to the first (four) 125 and The second interface 170 is electrically connected to the first via 125 and the first conductive line 135, and the partial gold wire 175 is electrically connected to the second pad 17 and the second wire 136. Repeatedly refer to the first! The first bonding surface 145, the first active surface ΐ5, the first bonding surface 150, and the first active surface are 16 〇, and can be bonded to a non-conductive solid body or a liquid body. Typically, liquid colloids are used, such as non-conductive silver hulls; or solid colloids, such as non-conductive films. Alternatively, a polysilicon stacked package structure 100 may be coated with a #18, covering the lead frame 13A, the first wafer 11A, the second wafer 155', and a plurality of gold wires 175. The sealant 18 can be a plastic or resin material. Figure 2 is a cross-sectional view showing another multi-wafer stacked package structure in accordance with an embodiment of the present invention. The multi-wafer stacked package structure 2 of the present invention includes at least a first wafer 210. The first wafer 210 has a first active surface 215 and a first

三麵號:TW2042PA 、負面220,第一主動表面215包括一中央區域以及一周邊區 域,第一主動表面215之周邊區域具有多個第一接墊225。多 s曰片堆^:式封裝結構2〇〇也包括一導線架23〇。導線架23〇包 括多條導線234以及一晶片承座24〇,晶片承座24〇具有至少 一第一黏接面245以及一第二黏接面25〇。第一黏接面245黏 接於第一主動表面215並露出第一接墊225於晶片承座24〇之 邊緣外。導線包括第一導線235及第二導線236。其中,第— 導線235及第二導線236分別位於晶片承座24〇的相對兩側或 φ 相鄰兩侧’第2圖中係以第一導線235及第二導線236分別位 於晶片承座240的相對兩側做說明。 再參照第2圖,多晶片堆疊式封裝結構2〇〇包括至少一第 二晶片255。第二晶片255具有一第二主動表面26〇以及一第 二背面265,第二主動表面26〇包括一中央區域以及一周邊區 ' 域,第二主動表面260之周邊區域具有多個第二接墊270,第 二主動表面260黏接於晶片承座24〇之第二黏接面25〇,並露 出第二接墊270於晶片承座24〇之邊緣外。多條金線275連接 於第一接墊225以及第二接墊27〇 ,其中部分金線275電性連 鲁接第-接塾225與第一導線235,部分金線275電性連接第二 接墊27〇以及第二導線236。 再參照第2圖,第一黏接面245、第一主動表面215、第 一黏接面250以及第二主動表面26〇,可以固態膠體或液態膠 體黏接。多晶片堆疊式封裝結構2〇〇可以一封膠28〇包覆多晶 片堆疊式封裝結構200,係覆蓋導線架23〇、部分第一晶片21〇、 部分第二晶片255、多條金線275,以及露出至少第一背面22〇 之部分285及第二背面265之部分290。 第3A圖繪示第1圖中之多晶片堆疊式封裝結構1〇〇之平 11 1321839The three-sided number: TW2042PA, negative 220, the first active surface 215 includes a central area and a peripheral area, and the peripheral area of the first active surface 215 has a plurality of first pads 225. The multi-schip stack ^: package structure 2 〇〇 also includes a lead frame 23 〇. The lead frame 23 includes a plurality of wires 234 and a wafer holder 24, and the wafer holder 24 has at least a first bonding surface 245 and a second bonding surface 25A. The first bonding surface 245 is adhered to the first active surface 215 and exposes the first pad 225 outside the edge of the wafer holder 24. The wire includes a first wire 235 and a second wire 236. The first wire 235 and the second wire 236 are respectively located on opposite sides of the wafer holder 24 或 or adjacent sides of the φ. In the second figure, the first wire 235 and the second wire 236 are respectively located on the wafer holder 240. The opposite sides are explained. Referring again to FIG. 2, the multi-wafer stacked package structure 2 includes at least one second wafer 255. The second wafer 255 has a second active surface 26A and a second back surface 265. The second active surface 26 includes a central region and a peripheral region. The peripheral region of the second active surface 260 has a plurality of second pads. 270, the second active surface 260 is adhered to the second bonding surface 25A of the wafer holder 24, and exposes the second pad 270 outside the edge of the wafer holder 24. A plurality of gold wires 275 are connected to the first pads 225 and the second pads 27A, wherein a portion of the gold wires 275 are electrically connected to the first port 225 and the first wires 235, and a portion of the gold wires 275 are electrically connected to the second portion. The pad 27〇 and the second wire 236. Referring again to Fig. 2, the first bonding surface 245, the first active surface 215, the first bonding surface 250, and the second active surface 26A may be bonded by a solid colloid or a liquid colloid. The multi-wafer stacked package structure 2 can cover the multi-wafer stacked package structure 200 with a glue 28, covering the lead frame 23〇, a portion of the first wafer 21〇, a portion of the second wafer 255, and a plurality of gold lines 275. And exposing at least a portion 285 of the first back surface 22 and a portion 290 of the second back surface 265. FIG. 3A is a diagram showing the multi-wafer stacked package structure in FIG. 1

三達編號:TW2042PA 面圖。更明確地’第3A圖繪示第一晶片11〇位於導線架13〇 下面’第一晶片110被多條第一導線135及第二導線136包圍, 並移除第二晶片15 5。根據本實施例,圖示中位於導線架13 〇 左側之第一接墊125,可以僅分佈於第一晶片11〇之第一主動 表面Π5之周邊區域之一邊緣。這種設計可以讓其他導線335 有空間接觸第二晶片155而不會干擾(結構方面或電性方面) 第二接墊170。 根據上述實施例,當第二晶片155設置在導線架13〇及第Sanda number: TW2042PA. More specifically, FIG. 3A shows that the first wafer 11 is located under the lead frame 13'. The first wafer 110 is surrounded by the plurality of first wires 135 and the second wires 136, and the second wafer 15 is removed. According to the present embodiment, the first pads 125 on the left side of the lead frame 13 图示 in the illustration may be distributed only at one edge of the peripheral region of the first active surface Π 5 of the first wafer 11 . This design allows the other wires 335 to have spatial contact with the second wafer 155 without interfering (structuralally or electrically) the second pads 170. According to the above embodiment, when the second wafer 155 is disposed on the lead frame 13 and

一晶片110上面(如第3B圖所示),可以產生如第i圖中之多晶 片堆疊式封裝結構100或第2圖中之多晶片堆疊式封裝結構 200。如第3B圖所示,苐二晶片155之兩邊緣對齊第一晶片11〇 之兩邊緣。所產生之多晶片堆疊式封裝結構具有比習知結構總 厚度較少的優點,適用於標準導線架以及表面黏著技術幼 mount technology,SMT)製程。其中,第一導線135及第二導線 136分別位於晶片承座14〇的相對兩側。 第3C圖為第1圖中之部分多晶片堆疊式封裝結構1〇〇之 平面圖》更明確地,第3C圖繪示第一晶片位於導線架I% 下面,第一晶片11〇被多條第一導線135及第二導線136包圍, 而第二晶片155被移除。根據本實施例,第一接墊125可以分 佈於第-晶片11G之第-主動表面115之周邊區域之兩相鄰之 邊緣上。這種設計可以讓導線335 (位於第3圖中第一晶月11〇 之對角線上)¾•空間接觸第一晶片m而不會干擾(機械方面 或電性方面)到位於第一晶# 11〇之第一主動表面ιΐ5之周邊 區域之兩相鄰之任一邊緣上之第,125。類似地,如第3 ,中之第二晶片155,可以具有第二接墊170 (繪示於第3D圖 中之弟二晶片Η5之下面),第二接墊17〇位於第二晶片155之 12 1321839Above a wafer 110 (as shown in Fig. 3B), a multi-chip stacked package structure 100 as in Fig. i or a multi-wafer stacked package structure 200 in Fig. 2 can be produced. As shown in Fig. 3B, the two edges of the second wafer 155 are aligned with the two edges of the first wafer 11'. The resulting multi-wafer stacked package structure has the advantage of having a smaller total thickness than conventional structures, and is suitable for standard lead frame and surface mount technology (SMT) processes. The first wire 135 and the second wire 136 are respectively located on opposite sides of the wafer holder 14A. 3C is a plan view of a portion of the multi-wafer stacked package structure in FIG. 1. More specifically, FIG. 3C shows that the first wafer is located under the lead frame I%, and the first wafer 11 is 多A wire 135 and a second wire 136 are surrounded, and the second wafer 155 is removed. According to this embodiment, the first pads 125 may be disposed on two adjacent edges of the peripheral region of the first active surface 115 of the first wafer 11G. This design allows the wire 335 (on the diagonal of the first lens 11〇 in Figure 3) to spatially contact the first wafer m without interfering (mechanically or electrically) to the first crystal# The first of the two adjacent edges of the first active surface ιΐ5 is the first, 125. Similarly, the second wafer 155, as in the third, may have a second pad 170 (shown below the second chip 5 in FIG. 3D), and the second pad 17 is located on the second wafer 155. 12 1321839

三達編號:TW2042PA 第二主動表面16〇之周邊區域之兩相鄰之邊緣。這種設計讓其 他導線355有空間可以接觸第二晶片155而不會干擾(結構^ 面或電性方面)第二接墊170。 根據上述之實施例,當第二晶片155設置於導線架130及 第-晶片110 (如第3D圖所示)上面時,可以產生如第1圖中 之多晶片堆叠式封裝結構100或第2圖中之多晶片堆疊式封 結構200。如第3D圖所示,第一晶片11〇及第二晶片155之對 角線相對齊,使得第二晶片155沿第一晶片11〇之對角線相對 平移。所產生之多晶片堆疊式封裝結構也具有比習知結構總厚 度較少的優點’適用於標準導線架以及表面黏著技術(謝邊 程。其中,第-導線135及第二導線136分別位於晶片承座_ 的相對兩侧或相鄰兩側。 請參照第3E圖,再繪示第i圖令之部分多晶片堆疊式封 裝結構100之平面圖。更明確地,第3D圖繪示第丨曰曰曰片HO 位於導線架130下面,第1晶片11〇被多條第一導線出所包 圍。根據本實施例,第一接塾125可以分佈於第一晶片ιι〇之 第一主動表面115之周邊區域之兩相對之邊緣上。為了描緣方 便,第則中之部分金線175連接第一接塾125以及第一導線 135。這種設計讓其他導線335 (位於第3f圖中第二晶片⑸ t對角線上)冑空間可以接觸第二晶片⑸而不會干擾(結構 =或電性方面)第二接墊17〇。如第3F圖所示,第一導線135 及第一導線136分別位於晶片承座14〇的相鄰兩側。 根據上述之實施例,當第二晶片155設置在導線架⑽以 2 一晶片U〇 (如第3F圖所示)上面時,可產生如第i圖中 ^晶片堆疊式封裝結構1〇〇或第2圖中之多晶片堆疊式封裝 2GG。所產生之多晶片堆衫封裝結構也具有比習知結構 13 適用於標準導線架以及表面黏著技術(SMT) 在圖3Α〜3F的任一結構中,所產生之多晶片堆疊 結構可以一封膠18〇(如第1圖所示)覆蓋,或是-封夥· (如第2圖所示)覆蓋’並露出第一背面12〇之部分如以及 第二背面165之部分290。 其他本發明替代之封膠結構4〇〇'41〇'42〇及43〇如第々A 〜4D圖所示。這些結構類似於第1及第2圖中之結構,讓導線 可位於任-晶片上之兩相對之邊緣上,如第3£及第㈣所示。 因此,各結構400、410、42〇及43〇包括至少一第一晶片々Μ , 至少一苐二晶片434 ’以及-導線架436設置在第一晶片432 及第二晶片434之間。在第4Β圖及第4D圖中,第一晶片432 具有一第一主動表面438 ’第一主動表面438包括多個第一接 墊44〇。在第4Α圖及第化圓中,第二晶片具有一第二主 動表面442,第二主動表面442包括多個第二接墊44扣導線架 436包括多個第—導線446或第二導線447,並分別以金線帽 連接第一接墊440、第二接墊444。 ❿ 三達編號:TW2042PA 總厚度較少的優點 製程。 第5圖繪示本發明之多晶片堆叠式封裝結構5〇〇之剖面 圖多a曰片堆疊式封裝結構500包括至少—第一晶片堆疊組 51〇,第-晶片堆疊組51〇至少包括兩晶片,至少兩晶片包括— 第3曰曰片515。第一晶片515具有一第一主動表面516與一第 一背面517,第-主動表面516包括一中央區域以及一周邊區 域,第一主動表面516之周邊區域具有多個第一接墊518。第 b曰片堆疊組510也包括一第二晶片520,第二晶片52〇具有 一第二主動表面521以及一第二背面522。第二主動表面521 包括一中央區域以及一周邊區域,第二主動表面521之周邊區 1321839 'j- t · • ,Sanda number: TW2042PA Two adjacent edges of the peripheral area of the second active surface 16〇. This design allows the other wires 355 to have room to contact the second wafer 155 without interfering with (secondarily or electrically) the second pads 170. According to the above embodiment, when the second wafer 155 is disposed on the lead frame 130 and the first wafer 110 (as shown in FIG. 3D), the multi-wafer stacked package structure 100 or the second one in FIG. 1 can be produced. The multi-wafer stacked package structure 200 in the figure. As shown in Fig. 3D, the diagonal lines of the first wafer 11 and the second wafer 155 are aligned such that the second wafer 155 is relatively translated along the diagonal of the first wafer 11''. The resulting multi-wafer stacked package structure also has the advantage of less than the total thickness of the conventional structure 'suitable for standard lead frame and surface adhesion technology (where the first wire 135 and the second wire 136 are respectively located on the wafer) The opposite sides or adjacent sides of the socket _. Referring to FIG. 3E, a plan view of a portion of the multi-wafer stacked package structure 100 of the i-th diagram is further illustrated. More specifically, FIG. 3D shows the third The cymbal sheet HO is located under the lead frame 130, and the first wafer 11 is surrounded by a plurality of first lead wires. According to the embodiment, the first lands 125 may be distributed around the first active surface 115 of the first wafer ιι. On the opposite edges of the region, for convenience of drawing, a portion of the gold wire 175 in the first portion is connected to the first interface 125 and the first wire 135. This design allows the other wires 335 (located in the second wafer (5) in Figure 3f) The diagonal space can contact the second wafer (5) without interfering with (structure = or electrical) the second pad 17A. As shown in FIG. 3F, the first wire 135 and the first wire 136 are respectively located Adjacent sides of the wafer holder 14〇. According to the above embodiment, when the second wafer 155 is disposed on the lead frame (10) on the surface of the wafer U (as shown in FIG. 3F), a wafer stacked package structure as shown in FIG. The multi-wafer stacked package 2GG is shown in Fig. 2. The resulting multi-wafer package structure also has a structure similar to the conventional structure 13 for standard lead frame and surface adhesion technology (SMT) in any of the structures of Figures 3A to 3F. The resulting multi-wafer stack structure can be covered by a glue 18 〇 (as shown in Figure 1), or - a cover (as shown in Figure 2) covering 'and exposing the first back 12 如And a portion 290 of the second back surface 165. Other alternative sealing structures 4 〇〇 '41 〇 '42 〇 and 43 本 according to the present invention are shown in Figures A to 4D. These structures are similar to those in Figures 1 and 2 The structure is such that the wires can be located on the opposite edges of the any-wafer as shown in the third and fourth (fourth). Therefore, each of the structures 400, 410, 42 and 43 includes at least one first wafer, At least one of the two wafers 434' and the lead frame 436 are disposed between the first wafer 432 and the second wafer 434. In the fourth drawing And in FIG. 4D, the first wafer 432 has a first active surface 438. The first active surface 438 includes a plurality of first pads 44. In the fourth and second circles, the second wafer has a second The active surface 442, the second active surface 442 includes a plurality of second pads 44. The lead frame 436 includes a plurality of first wires 446 or second wires 447, and the first pads 440 and the second wires are respectively connected by a gold wire cap. Pad 444. ❿ Sanda number: TW2042PA The process of the total thickness is less. Figure 5 is a cross-sectional view of the multi-wafer stacked package structure of the present invention. The multi-chip stacked package structure 500 includes at least - A wafer stack group 51, the first wafer stack 51 includes at least two wafers, and at least two wafers include a third wafer 515. The first wafer 515 has a first active surface 516 and a first back surface 517. The first active surface 516 includes a central region and a peripheral region. The peripheral region of the first active surface 516 has a plurality of first pads 518. The b-th stack stack 510 also includes a second wafer 520 having a second active surface 521 and a second back surface 522. The second active surface 521 includes a central area and a peripheral area, and the peripheral area of the second active surface 521 is 1321839 'j-t · •

三達編號:TW2042PA 域具有多個第二接墊523。在符合本實施例之條件下,第二背 面522可以黏接於第一主動表面516,並露出第一接墊 再參照第5圖’多晶片堆疊式封裝結構5〇〇也包括一導線 架530 ’導線架530包括多條導線535以及一晶片承座532。晶 片承座532具有一第一黏接面533以及一第二黏接面544,第 一黏接面533黏接於第二晶片52〇之第二主動表面521,並露 出第一接墊518及第二接墊523於晶片承座532之邊緣外。多 條導線535包括第一導線531及第二導線534,分別位於晶片 承座532的相鄰兩侧或相對兩側。第5圖中係以第一導線531 及第二導線534分別位於晶片承座532的相對兩側做說明。 多晶片堆疊式封裝結構500更包括至少一第二晶片堆疊組 540,第二晶片堆疊組540包括至少兩晶片,至少兩晶片包括一 • 第三晶片545。第三晶片5斗5具有一第三主動表面546以及一 ·. 第三背面547,第三主動表面546包括一中央區域以及一周邊 區域’第三主動表面546之周邊區域具有多個第三接墊548。 第二晶片堆疊組540還包括一第四晶片550,第四晶片550具 有一第四主動表面551及一第四背面552 »第四主動表面551 φ 可以黏接於晶片承座532之第二黏接面544,並露出第三接塾 548及第四接墊553於晶片承座532之邊緣外。 第5圖中還有多條金線560,其中部分金線560電性連接 第一接墊518以及至少部分第一導線531,部分金線560電性 連接第一接塾523以及至少部分第一導線53 1。部分金線560 電性連接第三接墊548以及少部分第二導線534,而部分金線 560電性連接第四接墊553以及至少部分第二導線534。 再參照第5圖,第一黏接面533、第一主動表面516、第 二黏接面544以及第二主動表面521,可以固態膠體或液態膠 15 三達編號:TW2042PA 片堆義弋二:1堆$式封裝結構5〇。可以-封膠58〇包覆多晶 日日片堆豐組540,以及多條金線56〇。 交第曰圖為本發明之另一多晶片堆疊式封裝結構_之剖面 。夕Ba片堆疊式封裝結構_包括至少—第—晶片堆疊乡且 ’曰第-晶片堆疊組61〇包括至少兩晶片,至少兩晶片包括一 :曰片615。第一晶片615具有一第一主動表面㈣以及一 ^ 17第主動表面616包括一中央區域以及一周邊Sanda number: The TW2042PA domain has multiple second pads 523. Under the condition of the embodiment, the second back surface 522 can be adhered to the first active surface 516 and expose the first pad. Referring to FIG. 5, the multi-wafer stacked package structure 5 also includes a lead frame 530. The lead frame 530 includes a plurality of wires 535 and a wafer holder 532. The first substrate 532 has a first bonding surface 533 and a second bonding surface 544. The first bonding surface 533 is adhered to the second active surface 521 of the second wafer 52, and the first pad 518 is exposed. The second pad 523 is outside the edge of the wafer holder 532. The plurality of wires 535 include a first wire 531 and a second wire 534 which are respectively located on adjacent sides or opposite sides of the wafer holder 532. In Fig. 5, the first wire 531 and the second wire 534 are respectively located on opposite sides of the wafer holder 532. The multi-wafer stacked package structure 500 further includes at least one second wafer stack 540, the second wafer stack 540 includes at least two wafers, and at least two wafers include a third wafer 545. The third wafer 5 bucket 5 has a third active surface 546 and a third back surface 547. The third active surface 546 includes a central region and a peripheral region. The peripheral region of the third active surface 546 has a plurality of third connections. Pad 548. The second wafer stack 540 further includes a fourth wafer 550 having a fourth active surface 551 and a fourth back surface 552. The fourth active surface 551 φ can be adhered to the second adhesive of the wafer holder 532. The junction 544 is exposed, and the third interface 548 and the fourth pad 553 are exposed outside the edge of the wafer holder 532. In FIG. 5, there are a plurality of gold wires 560, wherein a portion of the gold wires 560 are electrically connected to the first pads 518 and at least a portion of the first wires 531. The portion of the gold wires 560 are electrically connected to the first pads 523 and at least partially first. Wire 53 1. A portion of the gold wire 560 is electrically connected to the third pad 548 and a portion of the second wire 534, and a portion of the gold wire 560 is electrically connected to the fourth pad 553 and at least a portion of the second wire 534. Referring again to FIG. 5, the first bonding surface 533, the first active surface 516, the second bonding surface 544, and the second active surface 521 may be solid colloid or liquid glue. The number is TW2042PA. 1 stack of $-package structure 5〇. It can be coated with polystyrene 58 多, and a number of gold wires 56 〇. The cross-sectional view is a cross-section of another multi-wafer stacked package structure of the present invention. The BaBa chip stacked package structure includes at least a first wafer stack and the 曰 first wafer stack 61 includes at least two wafers, and at least two wafers include a ruthenium 615. The first wafer 615 has a first active surface (four) and a first active surface 616 including a central region and a perimeter

區域’第-主動表面616之周邊區域具有多個第一接墊618。 第:晶片堆疊組610還包括一第二晶片62〇,第二晶“2〇具 有一第二主動表面621以及一第二背面622,第二主動表面621The peripheral region of the region 'the first active surface 616 has a plurality of first pads 618. The first wafer stack 610 further includes a second wafer 62, the second crystal "2" has a second active surface 621 and a second back surface 622, and the second active surface 621

包括-中央區域以及一周邊區域,第二主動表面621之周邊區 域具有多個第二接墊623 ^在符合本實施例之前提下,第二背 面622可以黏接於第一主動表面616並露出第一接墊618。 再參照第6圖,多晶片堆疊式封裝結構6〇〇也包括一導線 架630,導線架630包括多條導線635以及一晶片承座632。晶 片承座632具有一第一黏接面633及一第二黏接面644,第一 黏接面633黏接於第二晶片620之第二主動表面621,並露出 第接塾618及第一接塾623於晶片承座632之邊緣外。多條 導線635包括第一導線631及第二導線634,分別位於晶片承 座632的相鄰兩侧或相對兩侧。第6圖中係以第一導線631及 第一導線634分別位於晶片承座632的相對兩側做說明。 多晶片堆疊式封裝結構600更包括至少一第二晶片堆整組 640 ’包括至少兩晶片,至少兩晶片包括一第三晶片645。第三 晶片645具有一第三主動表面646以及一第三背面647,第三 主動表面646包括一中央區域及一周邊區域,第三主動表面646 16 1321839Including a central region and a peripheral region, the peripheral region of the second active surface 621 has a plurality of second pads 623. The second back surface 622 can be adhered to the first active surface 616 and exposed before conforming to the embodiment. The first pad 618. Referring again to Fig. 6, the multi-wafer stacked package structure 6A also includes a lead frame 630 including a plurality of wires 635 and a wafer holder 632. The wafer holder 632 has a first bonding surface 633 and a second bonding surface 644. The first bonding surface 633 is adhered to the second active surface 621 of the second wafer 620, and the first connection 618 and the first surface are exposed. The pad 623 is outside the edge of the wafer holder 632. The plurality of wires 635 include a first wire 631 and a second wire 634 which are respectively located on adjacent sides or opposite sides of the wafer holder 632. In Fig. 6, the first wire 631 and the first wire 634 are respectively located on opposite sides of the wafer holder 632. The multi-wafer stacked package structure 600 further includes at least one second wafer stack 640' including at least two wafers, and at least two wafers including a third wafer 645. The third wafer 645 has a third active surface 646 and a third back surface 647. The third active surface 646 includes a central region and a peripheral region, and the third active surface is 646 16 1321839

三额號:TW2042PA 之周邊區域具有多個第三接墊648。第二晶片堆疊組640還包 括一第四晶片650,第四晶片650具有一第四主動表面651以 及一第四背面052,第四主動表面651包括一中央區域及一周 邊區域,第四主動表面651之周邊區域具有多個第四接墊653。 在符合本實施例之前提下,第四背面652也可以黏接於第三主 動表面646並露出第三接墊648。第四主動表面651可以黏接 於晶片承座632之第二黏接面644,並露出第三接墊6牝及第 四接墊653於晶片承座632之邊緣外。 第6圖中還有多條金線66〇,其中部分金線66〇電性連接 第接墊618以及至少部分第一導線63丨。部分金線66〇電性 連接第二接墊623以及至少部分第一導線631。部分金線66〇 電性連接第三接墊648以及至少部分第二導線634。以及部分 金線660電性連接第四接墊653以及至少部分第二導線634。 再參照第6圖,第一黏接面633、第一主動表面616、第 黏接面644以及第二主動表面621,可以一固態膠體或液態 ,體黏接。多晶片堆疊式封裝結構_可以一封膠_包覆多 晶片堆疊式封裝結構600,係覆蓋導線架63〇、部分第一晶片堆 疊組610、部分第二晶片堆疊組64〇,以及多條金線^但是 露出第一背面617之部分685以及第三背面647之部分690。 一 第7Α圖繪示第5圓之部分多晶片堆疊式封裝結構5〇〇之 平面圖°更明確地’第Α圖繪示第一晶片堆疊組别在導線架 530下=,第—晶片堆疊組510被多條第一導線531所包圍, 而第一晶片堆疊組54〇被移除。根據本實施例,繪示於導線架 530一 1左側之第一接墊518及第二接墊⑵,可以各自僅分佈於 第曰曰片之第一主動表面516及第二晶片52〇之第二主動 表面521之周邊區域之一邊緣。這種設計可以讓其他導線 731 17 1321839The three-numbered area: the peripheral area of the TW2042PA has a plurality of third pads 648. The second wafer stack 640 further includes a fourth wafer 650 having a fourth active surface 651 and a fourth back surface 052. The fourth active surface 651 includes a central region and a peripheral region, and the fourth active surface The peripheral area of 651 has a plurality of fourth pads 653. The fourth back surface 652 can also be bonded to the third main surface 646 and expose the third pad 648 before being conformed to the present embodiment. The fourth active surface 651 can be adhered to the second bonding surface 644 of the wafer holder 632 and expose the third pad 6 牝 and the fourth pad 653 outside the edge of the wafer holder 632. In Fig. 6, there are also a plurality of gold wires 66, some of which are electrically connected to the pads 618 and at least a portion of the first wires 63A. A portion of the gold wire 66 electrically connects the second pad 623 and at least a portion of the first wire 631. A portion of the gold wire 66 is electrically connected to the third pad 648 and at least a portion of the second wire 634. And a portion of the gold wire 660 is electrically connected to the fourth pad 653 and at least a portion of the second wire 634. Referring to FIG. 6, the first bonding surface 633, the first active surface 616, the first bonding surface 644, and the second active surface 621 may be bonded to each other in a solid colloid or a liquid state. The multi-wafer stacked package structure can be a glue-coated multi-wafer stacked package structure 600, covering the lead frame 63〇, a portion of the first wafer stack group 610, a portion of the second wafer stack group 64〇, and a plurality of gold The line ^ exposes a portion 685 of the first back side 617 and a portion 690 of the third back side 647. A seventh drawing shows a plan view of a portion of the multi-wafer stacked package structure of the fifth circle. More specifically, the first wafer stack is shown under the lead frame 530 =, the first wafer stack The 510 is surrounded by a plurality of first wires 531, and the first wafer stack 54 is removed. According to the present embodiment, the first pads 518 and the second pads (2), which are shown on the left side of the lead frame 530-1, may be distributed only on the first active surface 516 and the second wafer 52 of the second die. One of the peripheral regions of the active surface 521 is an edge. This design allows other wires to be 731 17 1321839

三賴號=TW2042PA三赖号=TW2042PA

有空間接觸第一晶片515及第二晶片520之任一,或兩者同時, 而不會干擾(結構方面或電性方面)第一接墊518及第二接塾 523。類似地,如第7B圖中之第二晶片堆疊組54〇,可以具有 如導線架530之右側之第三接墊548及第四接墊553 (分別位 於第7B圖中第三晶片545及第四晶片550的下面),也僅各自 分佈於第三晶片545第三主動表面546及第四晶片550之第四 主動表面551之周邊區域之一邊緣。這種設計可以讓其他導線 731有空間接觸第一晶片515、第二晶片520、第三晶片545, 及第四晶片550之任一或全部,而不會干擾(結構方面或電性 方面)第三接墊548及第四接墊553。 根據上述之實施例,當第二晶片堆疊組54〇設置於導線架 530以及第一晶片堆疊組51〇 (如第7Β圖所示)上面時,可以 產生如第5圊中之多晶片堆疊式封裝結構500或第6圖中之多 晶片堆疊式封裝結構600β如第7Β圖所示,第二晶片堆疊組54〇 之兩邊緣對齊第一晶片堆疊組51〇之兩邊緣。所產生之多晶片 =疊式封裝結構也具有比習知結構總厚度較少的優點,適用於 才丁準導線采以及表面黏者技術也叫价techn〇i〇gy,sMT) 製程’、中’第一導線531及第二導線534分別位於晶片承座 532的相對兩側。 楚s m參Γ、、第7<:圖’其緣示多晶片堆疊式封裝結構500 (如 所示)之平面圖。更明確地,第7C圖繪示第一晶片堆昼 Π在導線架530下面,被多條導線531所包圍,而第二晶 塾523、、且540被移除。根據本實_,第一接墊518及第二接 可以分佈於第 之第二主叙 日日片〗5之第一主動表面516及第二晶片520 表面521之周邊區域之相鄰之兩邊緣上。這種設計 18 1321839 1 ,There is a space to contact either of the first wafer 515 and the second wafer 520, or both, without interfering (structuralally or electrically) the first pads 518 and the second interfaces 523. Similarly, the second wafer stack 54 〇 in FIG. 7B may have a third pad 548 and a fourth pad 553 on the right side of the lead frame 530 (the third wafer 545 and the first in FIG. 7B respectively) The undersides of the four wafers 550 are also only distributed on one of the peripheral regions of the third active surface 546 of the third wafer 545 and the fourth active surface 551 of the fourth wafer 550. This design allows the other wires 731 to have spatial contact with any or all of the first wafer 515, the second wafer 520, the third wafer 545, and the fourth wafer 550 without interfering with (structural or electrical) Three pads 548 and fourth pads 553. According to the above embodiment, when the second wafer stack 54 is disposed on the lead frame 530 and the first wafer stack 51 (as shown in FIG. 7), a wafer stack as in the fifth stack can be generated. The package structure 500 or the multi-wafer stacked package structure 600β of FIG. 6 is as shown in FIG. 7 , and the two edges of the second wafer stack 54 are aligned with the two edges of the first wafer stack 51 . The resulting multi-wafer = stacked package structure also has the advantage of less than the total thickness of the conventional structure, which is suitable for the use of the wire and the surface adhesive technology is also called techn〇i〇gy, sMT) process ', medium' The first wire 531 and the second wire 534 are respectively located on opposite sides of the wafer holder 532. A schematic view of the multi-wafer stacked package structure 500 (shown in the drawing) is shown in FIG. More specifically, FIG. 7C illustrates that the first wafer stack is under the lead frame 530, surrounded by a plurality of wires 531, and the second wafers 523, 540, and 540 are removed. According to the present invention, the first pad 518 and the second connection may be distributed on the adjacent two edges of the first active surface 516 of the second main snippet 510 and the peripheral area of the surface 521 of the second wafer 520. on. This design 18 1321839 1 ,

三達編號:TW2042PA 可以讓其他導線731 (如第7C圖中所示在第一晶片堆疊組51〇 之對角線上)有空間接觸第一晶片515及第二晶片520之任一, 或兩者同時’而不會干擾(結構方面或電性方面)第一接墊518 及第二接墊523。類似地,如第7D圖中之第二晶片堆疊組54〇 , 第三接墊548及第四接墊553可以各自分佈於第三晶片545之 第二主動表面546及第四晶片550之第四主動表面551之周邊 區域之兩相鄰之邊緣。類似地,這種設計可以讓其他導線丄 有空間接觸第一晶片515、第二晶片52〇、第三晶/片545\及第 四晶片550之任一或全部,而不會干擾(結構方面或電性方面) W 第三接墊548及第四接墊553。Sanda number: TW2042PA allows other wires 731 (on the diagonal of the first wafer stack 51 〇 as shown in FIG. 7C) to have spatial contact with either of the first wafer 515 and the second wafer 520, or both At the same time 'without interference (physical or electrical) first pad 518 and second pad 523. Similarly, the second pad stack 54 〇, the third pad 548 and the fourth pad 553 in FIG. 7D may be respectively distributed on the second active surface 546 of the third wafer 545 and the fourth wafer 550. Two adjacent edges of the peripheral region of the active surface 551. Similarly, this design allows other conductors to have spatial contact with any or all of the first wafer 515, the second wafer 52, the third wafer 545, and the fourth wafer 550 without interference (structural aspects) Or electrical aspects) W third pad 548 and fourth pad 553.

根據上述之實施例,當第二晶片堆疊組54〇設置於導線架 530以及第-晶片堆疊組51〇(如第7D圖所示)上面時,可以 產生如第5圖中之多晶片堆疊式封裝結構或第6圖中之多 晶片堆叠式封裝㈣600。如第7D圖所示,第二晶片堆疊組 540與第-晶片堆疊組51〇之對角線相對齊,使得第二晶片堆 疊組540沿對角線相對於第—晶片堆疊組別平移。所產生之 多曰曰片堆叠式封裝結構也具有比f知結構總厚度較少的優點, 適用於標準導線架以及表面黏著技術Cface _nt technology SMT)製程。如第7D圖所示,第一導線53i及第二導線別分 別位於晶片承座532的相對兩側或相鄰兩侧。 ㈣2 7A〜第7D圖中之任""結構,所產生之多晶片堆叠式 以—封膠580 (如第5圖所示)覆蓋,或是一封膠 m 6圖所示)覆蓋’並露出第一背面617之部分685以 及第二是面647之部分69〇。 19 1321839According to the above embodiment, when the second wafer stack 54 is disposed on the lead frame 530 and the first wafer stack 51 (as shown in FIG. 7D), the wafer stacking pattern as shown in FIG. 5 can be generated. The package structure or the multi-wafer stacked package (4) 600 in FIG. As shown in Fig. 7D, the second wafer stack 540 is aligned with the diagonal of the first wafer stack 51, such that the second wafer stack 540 is translated diagonally relative to the first wafer stack. The resulting multi-slice stacked package structure also has the advantage of less total thickness than the known structure, and is suitable for the standard lead frame and surface mount technology Cface _nt technology SMT) process. As shown in Fig. 7D, the first wire 53i and the second wire are located on opposite sides or adjacent sides of the wafer holder 532, respectively. (d) 2 7A ~ 7D diagram of the "quote" structure, the resulting multi-stack stacking is covered with - sealant 580 (as shown in Figure 5), or a glue m 6 figure) cover ' A portion 685 of the first back surface 617 and a second portion 69 of the surface 647 are exposed. 19 1321839

三號:TW2042PA 架上面及下面的晶片數量不需相同。 綜上所述,雖然本發明已以一較佳實施例揭露如上,然其 並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之 精神和範圍内,當可作各種之更動與潤飾,因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。 20 費 ^ 三達編號:TW2042PA 【圖式簡單說明】 所附圖示包合& 4··^ 内容,用以描述本明書 '並且亦為本說明書之部分 發明之特徵、優點,以及^例^、文字描述—起用以解釋本 之剖面第圖1Γ圖繪示本發明之實施例之多晶片堆疊式封裝結構No. 3: The number of wafers above and below the TW2042PA rack does not need to be the same. In view of the above, the present invention has been described above in terms of a preferred embodiment, and is not intended to limit the invention, and various modifications may be made without departing from the spirit and scope of the invention. And the scope of the present invention is defined by the scope of the appended claims. 20 Fees ^ Sanda Number: TW2042PA [Simple Description of the Drawings] The attached graphic contains & 4··^ content, which is used to describe this book' and is also part of the invention's features, advantages, and ^ BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing a multi-wafer stacked package structure according to an embodiment of the present invention.

第3A〜3B圖繪示第丄〜 堆疊式封裝結構之平面圖; 第3C〜3D圖繪示第 堆疊式封裝結構之平面圖; 第3E〜3F圖繪示第ι〜2 疊式封裝結構之平面圖; 2圖中本發明之實施例的多 2圖中本發明之實施例的多 圖中本發明之實施例的多晶 晶片 晶片 片堆 第4A〜4D圖繪示本發明之實施例的另一 裝結構; 〜6圖繪示本發明進一步實施例的多晶片堆疊式封裝 結構之剖面圖; 、3A to 3B are plan views of the first to the stacked package structure; 3C to 3D are plan views of the first stacked package structure; and 3E to 3F are plan views of the first to 12th package structure; 2, FIG. 4A to 4D of a polycrystalline wafer wafer stack of an embodiment of the present invention in a plurality of drawings of an embodiment of the present invention, showing another embodiment of the present invention. Structures; FIG. 6 is a cross-sectional view showing a multi-wafer stacked package structure according to a further embodiment of the present invention;

多晶片堆疊式封 第 第7A〜7B圖繪示第5〜6圖中本發明之實施例的多晶片 堆疊式封裝結構之平面圖;以及 第7C〜7D圖繪示第5〜6圖中本發明之實施例的多晶片 堆疊式封裝結構之平面圖。 【主要元件符號說明】 100、200、400、410、420、430、500、600 :多晶片堆叠 式封裝結構 110、210、432、515、615 :第一晶片 115、215、438、516、616 :第一主動表面 21 1321839Multi-wafer stacked package Nos. 7A to 7B are plan views showing a multi-wafer stacked package structure of an embodiment of the present invention in FIGS. 5 to 6; and FIGS. 7C to 7D are diagrams showing the present invention in FIGS. 5 to 6 A plan view of a multi-wafer stacked package structure of an embodiment. [Major component symbol description] 100, 200, 400, 410, 420, 430, 500, 600: multi-wafer stacked package structure 110, 210, 432, 515, 615: first wafer 115, 215, 438, 516, 616 : First active surface 21 1321839

三達編號:TW2042PA 120、220、517、617 :第一背面 125、225、440、518、618 :第一接墊 130、230、436、530、630 :導線架 134、 234、335、535、635、731 :導線 135、 235、446、531、631 :第一導線 136、 236、447、534、634 :第二導線 140、240、532、632 :晶片承座 145、245、533、633 :第一黏接面 150、250、544、644 :第二黏接面 155、255、434、520、620 :第二晶片 160、260、521、621 :第二主動表面 165、265、522、622 :第二背面 170、270、444、523、623 :第二接墊 175、275、448、560 :金線 180、280、580、680 :封膠 285、685 :第一背面之部分 290、690 :第二背面之部分 510、610 :第一晶片堆疊組 540、640 :第二晶片堆疊組 545、 645 :第三晶片 546、 646 :第三主動表面 547、 647 :第三背面 548、 648 :第三接墊 550、 650 :第四晶片 551、 651 :第四主動表面 552、 652 :第四背面 22 1321839Sanda number: TW2042PA 120, 220, 517, 617: first back surface 125, 225, 440, 518, 618: first pads 130, 230, 436, 530, 630: lead frame 134, 234, 335, 535, 635, 731: wires 135, 235, 446, 531, 631: first wires 136, 236, 447, 534, 634: second wires 140, 240, 532, 632: wafer holders 145, 245, 533, 633: First bonding surface 150, 250, 544, 644: second bonding surface 155, 255, 434, 520, 620: second wafer 160, 260, 521, 621: second active surface 165, 265, 522, 622 : second back surface 170, 270, 444, 523, 623: second pads 175, 275, 448, 560: gold wires 180, 280, 580, 680: sealant 285, 685: portions 290, 690 of the first back face The second back portion 510, 610: the first wafer stack 540, 640: the second wafer stack 545, 645: the third wafer 546, 646: the third active surface 547, 647: the third back 548, 648: Third pads 550, 650: fourth wafer 551, 651: fourth active surface 552, 652: fourth back surface 22 1321839

三達編號:TW2〇42PA 553 ' 653 :第四接墊 23Sanda number: TW2〇42PA 553 '653: fourth pad 23

Claims (1)

三達編號:TW2042PA *---- 十、申請專利範圍: 月碎曰修(氣)正本 1. 一種多晶片堆疊式封裴結構,包括: 至少一第一晶片,具有—第一主動表面以及一第一背面, 該第一主動表面包括一中央區域以及一周邊區域,該第一主動 表面之該周邊區域上具有複數個第一接墊; 一導線架,包括複數個導線以及一晶片承座,該晶片承座 具有至少一第一黏接面以及一第二黏接面,該第一黏接面黏接 該第一主動表面,並露出該些第一接墊於該晶片承座之邊緣 外,其中該些導線包括複數個第一導線及複數個第二導線,該 些第一導線及該些第二導線分別位於該晶片承座的相對兩側或 相鄰兩側; / 至少一第二晶片,具有一第二主動表面以及一第二背面, 該第一主動表面包括一中央區域以及一周邊區域,該第二主動 表面之該周邊區域上具有複數個第二接墊,該第二主動表面黏 接於該導線架之該第二黏接面,並露出該些第二接墊於該晶片 承座之邊緣外; M I複數條金線,其中部分該些金線電性連接該些第一接墊與 至}該些s-導線,而部分該些金線錄連接該些第 該些第二導線;以及 蛩興 封移’係覆蓋於該導線架。 =2.如申請專利範圍第i項所述之結構其中該第一黏接 面、該第-主動表面、該第二黏接面以及該第二主動 一非導電之固態膠體或液態膠體黏接。 μ 3· 請專利範圍第」項所述之結構,其 ==少,第-晶片上之該第-主動表面之該周ί區Ξ 工I 透緣。 24 1321839 1 I 三達編號:TW2042PA 4.如申請專利範圍第1項所述之結構,其中該些第二接 塾分佈於至少一該第二晶片上之該第二主動表面之該周邊區域 上之一邊緣。 5. 如申請專利範圍第1項所述之結構,其中該些第一接 墊係刀佈於至少一該第一晶片上之該第一主動表面之該周邊區 域上之兩相鄰之邊緣。 6. 如申請專利範圍第1項所述之結構,其中該些第二接 塾係刀佈於至少—該第二晶片上之該第二主動表面之該周邊區 域上之兩相鄰之邊緣。 7.如申請專利範圍第1項所述之結構,其中該些第 墊係刀佈於至少一該第一晶片上之該第一主動表面之該周邊區 域上之兩相對之邊緣。 8·如申請專利範圍第i項所述之結構,其中該些第二接 墊係刀佈於至該第二晶片上之該第二主動表面之該周邊區 域上之兩相對之邊緣。 9.如巾請專利範圍第丨項所述之結構其中該封膠係覆 ;至乂該第一晶片、至少一該第二晶片以及該些金線。 Mw I Μ#專利範圍第1項所述之結構,其中該封膠係覆 蓋於至少一該第一曰 始._ lj 曰曰片、刀之至少一該第二晶片以及該些導 線’並露出至少部分之马_笛 炙这第一背面以及至少部份之該第二背面。 -種多晶片堆疊式封裝結構包括: 至少一第一晶片堆疊袓 疊組包括: 至;包括兩晶片,該第一晶片堆 宵 曰日片,具有一第一主動表面以及一第一 主動表面包括—中央區域以及-周邊區域,該第 之該周邊區域具有複數個第一接墊; 25 1321839 三達編號:TW2042PA 一第二晶片’具有一第二主動表面以及一第二背 面’該第二主動表面包括—中央區域以及-周邊區域,該第二 主動表面之該周邊區域具有複數個第二接墊; 其中,該第二背面係黏接該第一主動表面,並露出 該些第一接墊; 一導線架,包括複數條導線以及一晶片承座,該晶片承座 具有:第-黏接©以及—第二黏接面’該第—黏接面黏接於該 第二晶片之該第二主動表面’並露出該些第—接塾及該些第二 接墊於該晶片承座之邊緣外,其中該些導線包括複數個第一導 線,複數個第二導線’該些第—導線及該些第二導線分別位於 該晶片承座的相對兩側或相鄰兩側; 至少一第二晶片堆疊組,至少包括兩晶片,該第二晶片堆 疊組包括: 第二晶片,具有一第三主動表面以及一第三背 面,該第二主動表面包括一中央區域以及一周邊區域該第三 主動表面之該周邊區域具有複數個第三接墊; 一第四晶片,具有一第四主動表面以及一第四背 面’該第四主動纟©包括一中央區$以及一周邊區_,該第四 主動表面之該周邊區域具有複數個第四接墊; = -其中,該第四背面係黏接該第三主動表面,並露出 該些第三接墊,該第四主動表面黏接於該導線架之該第二黏接 面,並露出該些第三接墊及該些第四接墊於該晶片承座之 外; ,立複數條金線,其中部分該些金線電性連接該些第一接墊與 至^ ^分該些第一導線,部分該些金線電性連接該些第二接墊 /、至夕部分該些第一導線,部分該些金線電性連接該些第三接 26 1321839 « ♦ 三達編號:TW2042PA 塾與至少部分該些第二導線,而部分該些金線電性連接該些第 四接墊與至少部分該些第二導線;以及 一封膠’係覆蓋於該導線架。 12. 如申請專利範圍第u項所述之結構,其中該第一黏 接面、該第二主動表面、該第二背面、該第一主動表面、該第 -黏接面、該第四主動表面、該第四背面,以及該第三主動表 面係以一非導電之固態膠體或液態膠體黏接。 13. 如申請專利範圍第u項所述之結構其中該些第一 接墊分佈於至少-該第一晶片上之該第一主動表面之該周邊區 域上之一邊緣。 14. 如申請專利範圍第u項所述之結構其中該些第二 接塾分佈於至少一該第二晶片上之該第二主動表面之該i邊區 域上之一邊緣。 15. 如申請專利範圍第u項所述之結構,其中該些第三 接塾分佈於至少-該第三晶片上之該第三主動表面之該周邊^ 域上之一邊緣。 16. 如申請專利範圍第u項所述之結構,其中該些第四 接塾刀佈於至J-該第四晶片上之該第四主動表面之該周邊區 域上之一邊緣。 17. 如申請專利範圍第u項所述之結構其中該些第一 接墊係分佈於至少-該第一晶片上之該第一主動表面之該周邊 區域上之兩相鄰之邊緣。 18·如申請專利範圍第u項所述之結構,其中該些第二 接塾係分佈於至少一該第二晶片上之該第二主動表面之該周邊 區域上之兩相鄰之邊緣。 19·如申請專利範圍第u項所述之結構,其中該些第三 27 1321839 三達編號:TW2042PA 接墊係分佈於至少一該第三晶片上之該第三主動表面之該周邊 區域上之兩相鄰之邊緣。 20·如申請專利範圍第u項所述之結構,其中該些第四 接塾係分佈於至少一該筮四s g μ### . + _ 成弟四日曰月上之邊第四主動表面之該周邊 區域上之兩相鄰之邊緣。 2 1.如申請專利範圍第11 覆蓋於至少一該第一晶片堆疊組 以及該些金線。 項所述之結構,其中該封膠係 至少一該第二晶片堆疊組, 甲靖專利範圍帛U項所 覆蓋於至少-該第一晶片堆疊„其中違峨 及咳此導緩,并命山 ^ —該第一晶片堆疊組 及涊二導線並路出至少部分 第三背面。 刀之該第一背面以及至少部份之自 28Sanda number: TW2042PA *---- X. Patent application scope: 月 曰 repair (gas) original 1. A multi-wafer stacked sealing structure, comprising: at least a first wafer having a first active surface and a first back surface, the first active surface includes a central area and a peripheral area, the peripheral area of the first active surface has a plurality of first pads; a lead frame comprising a plurality of wires and a wafer holder The wafer holder has at least one first bonding surface and a second bonding surface. The first bonding surface is adhered to the first active surface, and the first pads are exposed on the edge of the wafer holder. The wire includes a plurality of first wires and a plurality of second wires, the first wires and the second wires are respectively located on opposite sides or adjacent sides of the wafer holder; / at least one The second wafer has a second active surface and a second back surface, the first active surface includes a central area and a peripheral area, and the peripheral area of the second active surface has a plurality of second pads thereon. The active surface is adhered to the second bonding surface of the lead frame, and the second pads are exposed outside the edge of the wafer holder; the MI plurality of gold wires, wherein some of the gold wires are electrically connected The first pads are connected to the s-wires, and some of the gold wires are connected to the second wires; and the 蛩 封 ' cover covers the lead frames. The structure of claim 1, wherein the first bonding surface, the first active surface, the second bonding surface, and the second active non-conductive solid colloid or liquid colloid are bonded. . μ 3· Please refer to the structure described in the scope of the patent, which has == less, the circumference of the first active surface of the first wafer on the first wafer. The structure of claim 1, wherein the second interfaces are distributed on the peripheral region of the second active surface on at least one of the second wafers One of the edges. 5. The structure of claim 1, wherein the first pads are disposed on two adjacent edges of the peripheral region of the first active surface on at least one of the first wafers. 6. The structure of claim 1, wherein the second knives are disposed on at least two adjacent edges of the peripheral region of the second active surface on the second wafer. 7. The structure of claim 1, wherein the plurality of linings are disposed on opposite edges of the peripheral region of the first active surface on at least one of the first wafers. 8. The structure of claim i, wherein the second pads are disposed on opposite edges of the peripheral region of the second active surface on the second wafer. 9. The structure of claim 2, wherein the sealant is coated; to the first wafer, at least one of the second wafer, and the gold wires. The structure of the first aspect of the invention, wherein the sealant covers at least one of the first starter, the at least one of the second wafer, and the wires are exposed At least a portion of the horse's first back and at least a portion of the second back. The multi-wafer stacked package structure comprises: at least one first wafer stack stack comprising: to; comprising two wafers, the first wafer stacking day, having a first active surface and a first active surface comprising a central region and a peripheral region, the first peripheral region having a plurality of first pads; 25 1321839 Sanda number: TW2042PA a second wafer 'having a second active surface and a second back surface' The surface includes a central region and a peripheral region, the peripheral region of the second active surface having a plurality of second pads; wherein the second back surface is adhered to the first active surface, and the first pads are exposed a lead frame comprising a plurality of wires and a wafer holder having: a first bonding layer and a second bonding surface, wherein the first bonding surface is adhered to the second wafer The second active surface ′ and exposing the plurality of first contacts and the second pads outside the edge of the wafer holder, wherein the wires comprise a plurality of first wires, and the plurality of second wires are - the wire and the second wire are respectively located on opposite sides or adjacent sides of the wafer holder; at least one second wafer stack group comprising at least two wafers, the second wafer stack group comprising: a second wafer having a third active surface and a third back surface, the second active surface comprising a central region and a peripheral region, the peripheral region of the third active surface having a plurality of third pads; a fourth wafer having a fourth The active surface and a fourth back surface 'the fourth active 纟© includes a central area $ and a peripheral area _, the peripheral area of the fourth active surface having a plurality of fourth pads; = - wherein the fourth back side Bonding the third active surface and exposing the third pads, the fourth active surface is adhered to the second bonding surface of the lead frame, and the third pads and the fourth connections are exposed Padded on the outside of the wafer holder; a plurality of gold wires, wherein some of the gold wires are electrically connected to the first pads and to the first wires, and some of the gold wires are electrically connected The second pads /, the evening Dividing the first wires, the plurality of gold wires electrically connecting the third wires 26 1321839 « ♦ Sanda number: TW2042PA 塾 and at least some of the second wires, and some of the gold wires are electrically connected to the wires a fourth pad and at least a portion of the second wires; and an adhesive layer covering the lead frame. 12. The structure of claim 5, wherein the first bonding surface, the second active surface, the second back surface, the first active surface, the first bonding surface, and the fourth active The surface, the fourth back surface, and the third active surface are bonded by a non-conductive solid colloid or liquid colloid. 13. The structure of claim 5, wherein the first pads are distributed over at least one edge of the peripheral region of the first active surface on the first wafer. 14. The structure of claim 5, wherein the second interfaces are distributed over one edge of the i-side region of the second active surface on at least one of the second wafers. 15. The structure of claim 5, wherein the third junctions are distributed over at least one edge of the perimeter region of the third active surface on the third wafer. 16. The structure of claim 5, wherein the fourth knives are disposed on an edge of the peripheral region of the fourth active surface on the J-fourth wafer. 17. The structure of claim 5, wherein the first pads are distributed on at least two adjacent edges of the peripheral region of the first active surface on the first wafer. 18. The structure of claim 5, wherein the second interfaces are distributed on two adjacent edges of the peripheral region of the second active surface on at least one of the second wafers. 19. The structure of claim 5, wherein the third 27 1321839 Sanda number: TW2042PA pads are distributed over the peripheral region of the third active surface on at least one of the third wafers Two adjacent edges. 20. The structure of claim 5, wherein the fourth interface is distributed over at least one of the four sg μ###. + _ the fourth active surface of the fourth day of the dynasty Two adjacent edges on the peripheral region. 2 1. The patent application scope 11 covers at least one of the first wafer stack and the gold wires. The structure of the item, wherein the sealant is at least one of the second wafer stacking group, and the scope of the patent application is covered by at least the first wafer stack „ which is illegal and coughing, and ^ - the first wafer stack and the second wire and at least a portion of the third back. The first back of the knife and at least part of the 28
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