1310488 九、發明說明： 【發明所屬之技術領域】 特別係有關於一種能控制 本發明係有關於-種顯影系統 顯影液中光阻濃度的顯影系統。 【先前技#$】 在顧影製程t，顯影液中的光八 :案上所洗出的光阻材料）與顯影液二影^光哩 係。當顯影液中的光阻濃度過 、果有直接的關 而無法準確的顯影出光阻圖案。果會降低， 光阻圖案均不盡相同，且由於顯影：理的 影過程令從光阻圖案上所洗出的光阻材料，因：：=於顯 =影液光阻濃度會隨著光阻圖案的不同而變化=程中 ?介:：㈣之光阻圖案時’由於介層孔(…)的光：圖 =，洗出的光阻材料極少，因此，在此製程中‘案間 分將會過低，進而影響顯影效果。 ’、p的光阻成 【發明内容】 而提供—種顯 、—連通管以 —第—顯影液 该第一顯影槽 第—顯影液循 。第二顯影機 第二廢液管以 一顯影液循環 第二廢液控制 本發明即為了欲解決上述習知技術之問題， 影系統’包括-第一顯影機台、一第二顯影機么 及-廢液槽。第一顯影機台包括_第一顯影槽： 循環槽、-第-廢液管以及_第_廢液控制閥， 連通該第一顯影液循環槽，該第一廢液管連接該 環槽，該第一廢液控制閥設於該第一廢液管之二 台包括一第二顯影槽、一第二顯影液循環槽、一 及一第二廢液控制閥，該第二顯影槽連通該第 槽，該第二廢液管連接該第二顯影液循環槽，該 5 〇632-A5〇585TWf/AU〇5〇6o〇2/Lemon .1310488 t廢液!之上。連通管連通該第一顯影液循環槽以 卜 曰&仗心運接5亥弟—廢液管以及該第二 廢液管。 應用本發明’可簡便的控制顯影機台中顯影液的光阻濃 度，因此能維持顯影機台的顯影效果，提昇產品的良率。 【實施方式】 參照第1圖，其係顯示本發明之顯影系統i，包括一第 繼丄00以及一第二顯影機台200。第—顯影機台職括： 弟顯衫槽11 〇、一第一顯影液收集管丨丨2 槽12。、、-第一顯影液供給管121、一第—幫浦122、一 :且;農錢，器123、一第一廢液管131以及_第一廢液控制閥 Γιι 200 22Γ/—Γ二 影液猶環槽220、一第二顯影液供給管 一、甫222、一第二光阻濃度感應器223、一第二廢 液官231以及一第二廢液控制閥232。 —第一顯影槽110透過底部的第一顯影液收集管⑴連通今 ==環請。第—顯影液供給管i2i從該第一顯影二 二 部延伸至該第-顯影槽110的上方，第-幫浦 12 2 s史於該第一顯影液供仏營〗^l 心…… 之上，以將該第-顯影液循環 ^中的—液加塵送入該第一顯影槽n〇之中，對基板⑻ 上的先阻㈣進行顯H廢液f 131 環槽120以及一廢液_ 30。笛广、" 弟液循 液管⑶之上，第二控制間132設於該第-廢 度感應器伸人^ § 131的流路。第—光阻濃 顯影液循環槽12〇中的顯^ 一弟 i, 132^Τ 及该弟一先阻濃度感應器123,並根 〇632-A5〇585TWf/AU〇5〇6〇〇2/Lem〇n 6 1310488 據該第一光阻濃度感應器123 閥132。 果開閉该弟一廢液控制 第-顯⑨二:槽210透過底部的第二顯影液收集管211連通該 弟-顯衫液猶環槽220。第二顯影液供給I 〆 循環槽220的底部延伸至該 :弟了貝衫液 999 ^ 頌衫槽210的上方，第二幫浦 ==二顯影液供給管221之上，以將該第二顯影液循環 I的US，加厂堅送入該第二顯影槽210之中，對基板謝 影。第二廢液f 231連通該第二顯影液循 衣槽220以及廢液槽30。第二廢液於制關2S? < |營 &夜徑制閥232设於該第二廢液 ，以開閉該第二廢液管231的流路。第二光阻濃 感應器223伸入嗜篦-4強旦；、六# m 1甲入.亥弟一顯影液循環槽22〇之 =循的顯影液濃度。-第二控制器二； =-廢液控制閥232以及該第二光阻濃度感應器挪 弟二光阻濃度感應器223的檢測結果開閉該第二廢液控制閱 第一顯影液循環槽120以及第二顯影液循環槽22〇之間以 連通管20接通。連通管2〇±設有—第一連通間21以及—第二 連通閥22，其中，第一連通閥21以及第二連通閥22係處於常 開狀態。 參照第2a圖，當第一光阻濃度感應器123檢測出該第 影液循環槽120中之顯影液的光阻濃度過低時，該第一控制器 開啟該第-廢液控制閥132，而使該第—顯影液循環槽12〇中的 顯影液流入廢液槽30之中。同時，由於連通管原理，第二奸 液循環槽2 2 0中的顯影液則通過連通管2 〇流入第一顯影液循環 槽120之中，以藉此提高第一顯影液循環槽12〇中顯影液 阻濃度。 例如，當第一顯影機台100用於顯影介層孔（via)之光阻圖 〇632-A5〇585TWf/AU〇5〇6o〇2/Lem〇n 7 1310488 坌一而第—顯影機台’用於顯影其他較複 士 一顯影液循環槽220中顯影液的光阻、、農声4 Ξ ”日丁， 循環槽12。中顯影液的光阻濃度-顯影液 將第二顯影液循環槽22" ==通官設計’可 槽12。之中，而提高第一顯影液循上;=二；影液循環 度，進而控制第-顯影機台⑽的顯影效果。^的先阻濃 參照第2b圖，同樣的，當第二弁 該第二顯影液循产# 99n + n先1^ /辰度感應器223檢測出 心液料槽22〇中之顯影液的光阻濃度過 侧第二廢液控制間232，而使該第二顯影液循二二 — 的顯影液流入廢液槽30之中。同時，由其衣曰 第-顯影液循環槽12 ”的顯影液則通管二：理’ 影液循環槽22〇之中，以萨此接古〇机入弟二顯 影液的光阻濃度。#此“第—_液循環槽220中顯 雖然在上述實施例之中，係以第—顯影機台_ 顯影機台為例，說明本發明的實施方式，然其並未^ 發！。ί發明亦可連通三台以上(複數台)的顯影機台，：互、甫 调即該等顯影機台之顯影液的光阻濃度（可調節任—旦^ 台之顯影液的光阻濃度）。 口颂心機 在第-顯影液循環槽120中的顯影液水位下降之後 可透過第-顯影液補充f u補充第—顯影液循環槽⑶ 广T，在第二顯影液循環槽220中的顯影液水 下降之後，耗端U)可透過第二顯影液補充管 顯影液循環槽220中的顯影液。 用兄弟一 廠務端10所補充的顯影液，其成分係包含四甲基氣氧化胺 (tetramethyl amm〇nium hydr〇xide，ΤΜΑΗ)，其濃度可以 至30%之間。 參照第3圖 ’第一顯影機台1 〇 〇可更包括一第 廢液管 〇632-A5〇5S5wi/AU〇5〇6o〇2/Lem〇： 8 131.0488 141，連通該第一顯影液循環槽12〇以及該廢液槽3〇，該第三廢 液官141上設有一第一廢液排放閥〗42，處於常閉狀態。第二顯 影機台200可更包括一第四廢液管241，連通該第二顯影液循環 槽220以及該廢液槽30，該第四廢液管241上設有—第二廢液 排放閥242，處於常閉狀態。 Χ 參照第4a圖，當欲清空第一顯影液循環槽】2〇中的顯影液 時，操作人員關閉第一連通閥21’並開啟第一廢液排放閥142， 因此，第一顯影液循環槽12〇中的顯影液通過該第三廢液管 而流入該廢液槽30之中。接著，參照第4b圖，操作人員關閉 參第一廢液排放閥142 ,並開啟第一連通閥21，此時由於連通管 原理，第二顯影液循環槽220中的顯影液通過連通管2〇流入第 一顯影液循環槽120之中，以藉此對第一顯影液循環槽^ 供顯影液的光阻成分。 & 參照第5a圖，當欲清空第二顯影液循環槽22〇中的 時，操作人員關閉第二連通閱2 2，並開啟第二廢液排放間如， 因此，第二顯影液循環槽220中的顯影液通過該第四廢液管241 =流=該廢液槽30之中。接著，參照第_，操作人員 弟二廢液排放閥242’並開啟第二連通閥22，此時由於 原理，第-顯影液循環肖！中的顯影 = 二顯影液循環槽220之中，以藉此斜笛一机入第 供顯影液的光阻成分。 ㈣弟-顯4#%槽22〇提 應用本發明，可簡便的控制顯影機台中顯影液 度，因此能維持顯影機台的顯影效果，提昇產品的良率。辰 雖然本發明已以具體之較佳杂1310488 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to a developing system capable of controlling the concentration of photoresist in a developing solution of the developing system. [Previous technique #$] In the film production process t, the light in the developing solution: the photoresist material washed out on the case) and the developing solution are two-image. When the photoresist concentration in the developer is too high, the photoresist pattern is not accurately developed. If the film is lowered, the photoresist patterns are not the same, and due to the development: the photo-resisting process causes the photoresist material to be washed out from the photoresist pattern, because::=================================================== The pattern of the resistance changes. In the process of the film: when the photoresist pattern of the interlayer hole (...) is light, the light-resistance material is very small. Therefore, in this process, the case is The score will be too low, which will affect the development effect. The light resistance of the 'p' is provided as follows. The invention provides a display, a communication tube, a first developer solution, a first developer tank, and a developer solution. The second developing machine second waste liquid pipe is controlled by a developing liquid to circulate the second waste liquid. In order to solve the above problems of the prior art, the shadow system includes a first developing machine and a second developing machine. - Waste tank. The first developing machine includes a first developing tank: a circulation tank, a - a waste liquid pipe, and a__ waste liquid control valve, connected to the first developer circulating tank, the first waste liquid pipe connecting the ring groove, The first waste liquid control valve is disposed in the second waste liquid pipe, and includes a second developing tank, a second developing liquid circulating tank, and a second waste liquid control valve, wherein the second developing tank communicates with the second waste liquid control tank. In the first tank, the second waste liquid pipe is connected to the second developer circulating tank, and the 5 〇 632-A5 〇 585 TWf / AU 〇 5 〇 6 〇 2 / Lemon . 1310488 t waste liquid! The communication tube communicates with the first developer circulation tank to transport the 5th-deep liquid waste pipe and the second waste liquid pipe. By applying the present invention, the photoresist concentration of the developing solution in the developing machine can be easily controlled, so that the developing effect of the developing machine can be maintained and the yield of the product can be improved. [Embodiment] Referring to Fig. 1, there is shown a developing system i of the present invention comprising a second step 00 and a second developing unit 200. The first-developer machine includes: a younger body slot 11 一, a first developer collection tube 丨丨 2 slot 12. , a first developer supply pipe 121, a first pump 122, a: and; agricultural money, a device 123, a first waste liquid pipe 131, and a first waste liquid control valve Γιι 200 22Γ / - Γ The liquid liquid loop 220, a second developer supply tube 1, the crucible 222, a second photoresist concentration sensor 223, a second waste liquid 231, and a second waste liquid control valve 232. - The first developing tank 110 is connected to the first developing liquid collecting pipe (1) at the bottom to communicate with the current == ring. The first developing solution supply pipe i2i extends from the first developing unit 2 to the upper side of the first developing tank 110, and the first pump 12 2 s is in the first developing liquid supply chamber In the above, the liquid-liquid dust in the first developer circulation is sent into the first developing tank n〇, and the first resistance (four) on the substrate (8) is subjected to the display H waste liquid f 131 ring groove 120 and a waste. Liquid _ 30. On the above, the second control room 132 is disposed on the flow path of the first-waste sensor extending the § 131. The first-light-reducing developer liquid circulation tank 12 显 in the display of a brother i, 132 ^ Τ and the brother a first resistance concentration sensor 123, and root 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 /Lem〇n 6 1310488 According to the first photoresist concentration sensor 123 valve 132. The opening and closing of the younger brother a waste liquid control - the second display 9: the trough 210 is connected to the younger liquid tank through the second developer collecting pipe 211 at the bottom. The second developer supply I 〆 the bottom of the circulation tank 220 extends to the top of the shirt tank 999 ^ 颂 槽 210, the second pump == two developer supply tube 221, to the second The US of the developer circulation I is sent to the second developing tank 210 to give a thank-you to the substrate. The second waste liquid f 231 is connected to the second developer liquid circulating tank 220 and the waste liquid tank 30. The second waste liquid is supplied to the second waste liquid pipe 231 to open and close the flow path of the second waste liquid pipe 231. The second photo-resistance sensor 223 extends into the eosin--4 strong den;; the six #m1 in. The celite-developing solution circulation tank 22 〇 = the developer concentration. - second controller 2; = - waste liquid control valve 232 and the second photoresist concentration sensor No. 2 photoresist concentration sensor 223 detection result opening and closing the second waste liquid control first developer circulation tank 120 And the second developing solution circulation groove 22 is connected by the communication pipe 20. The communication pipe 2 is provided with a first communication chamber 21 and a second communication valve 22, wherein the first communication valve 21 and the second communication valve 22 are normally open. Referring to FIG. 2a, when the first photoresist concentration sensor 123 detects that the photoresist concentration of the developer in the dichroic liquid circulation tank 120 is too low, the first controller turns on the first waste liquid control valve 132. The developer in the first developer circulation tank 12 is caused to flow into the waste tank 30. At the same time, due to the principle of the communication tube, the developer in the second rape liquid circulation tank 220 flows into the first developer circulation tank 120 through the communication tube 2, thereby increasing the first developer circulation tank 12 Developer concentration. For example, when the first developing machine 100 is used to develop a via of a via hole 〇 632-A5 〇 585 TWf / AU 〇 5 〇 6 o 〇 2 / Lem 〇 n 7 1310488 坌 而 - - - - - - - - 'Used to develop other photoresists in the developer-developing solution circulation tank 220, the agricultural sound 4 Ξ 日, the circulation tank 12. The photoresist concentration of the developing solution - the developer circulates the second developer The groove 22" == is officially designed to be grooved 12. Among them, the first developing solution is increased; the second; the liquid circulation degree, and thus the development effect of the first developing machine (10) is controlled. Referring to FIG. 2b, in the same manner, when the second developing solution of the second developing solution is used, the first photoresist is detected by the #99n + n first detecting device 223, and the photoresist concentration of the developing solution in the cardiac chamber 22 is detected. The second waste liquid control room 232 allows the developer of the second developer to flow into the waste liquid tank 30. At the same time, the developer liquid of the coat-developer circulation tank 12" is passed through the tube II: In the 22's of the shadow liquid circulation tank, the photoresist concentration of the developer is the same as that of the second machine. In the above-mentioned embodiment, the first embodiment of the first embodiment of the present invention will be described with reference to the first embodiment of the present invention, but the embodiment of the present invention will be described. The invention can also connect three or more (multiple sets) of developing machine sets, and the mutual resistance and the enthalpy adjustment are the photoresist concentration of the developing solution of the developing machine (the photoresist concentration of the developing solution can be adjusted) After the liquid level of the developer in the first developer circulation tank 120 is lowered, the first developer solution can be replenished with the developer solution circulation tank (3), and the developer in the second developer circulation tank 220 can be replenished. After the water is lowered, the end portion U) can replenish the developer in the developing solution circulation tank 220 through the second developer. The developer supplemented by the Brothers 10 is composed of tetramethylamine oxide ( Tetramethyl amm〇nium hydr〇xide, ΤΜΑΗ), its concentration can be between 30%. Refer to Figure 3 'The first developing machine 1 〇〇 can also include a waste liquid tube 〇 632-A5 〇 5S5wi / AU 〇 5〇6o〇2/Lem〇: 8 131.0488 141, connecting the first developer circulation tank 12〇 and The waste liquid tank 3 is provided with a first waste liquid discharge valve 42 in a normally closed state. The second developing machine 200 may further include a fourth waste liquid pipe 241, which communicates with the first waste liquid pipe 241 The second developing solution circulating tank 220 and the waste liquid tank 30 are provided with a second waste liquid discharge valve 242 in a normally closed state. Χ Referring to FIG. 4a, when the first developing liquid is to be emptied When circulating the developer in the tank, the operator closes the first communication valve 21' and opens the first waste liquid discharge valve 142, so that the developer in the first developer circulation tank 12 is passed through the third waste. The liquid pipe flows into the waste liquid tank 30. Next, referring to Fig. 4b, the operator closes the first waste liquid discharge valve 142 and opens the first communication valve 21, at which time the second development is due to the principle of the communication pipe. The developer in the liquid circulation tank 220 flows into the first developer circulation tank 120 through the communication tube 2, thereby supplying the photoresist component of the developer to the first developer circulation tank. Referring to Fig. 5a, When the second developer circulation tank 22 is to be emptied, the operator closes the second communication 2 2 and The second waste liquid discharge chamber is opened, for example, the developer in the second developer circulation tank 220 passes through the fourth waste liquid pipe 241 = flow = the waste liquid tank 30. Next, referring to the _, the operator The second waste liquid discharge valve 242' opens the second communication valve 22, and at this time, due to the principle, the developing solution in the first developing solution is in the developing solution = the developing solution circulating tank 220, thereby using the oblique flute to enter the first supply. The photoresist component of the developing solution. (4) The application of the present invention can easily control the developing liquid level in the developing machine, thereby maintaining the developing effect of the developing machine and improving the yield of the product. Although the invention has been specifically adapted
、 住a知例揭露如上，缺复卄非E 以限定本發明，任何熟習此項 並非月 和乾圍内，仍可作必許的更動鱼 3之精7 當視後附之申請專利範圍所界定者為準。 I保4耗i 〇632-A5〇585TWf/AU〇5〇6o〇2/Lemon 9 ‘1310488 【圖式簡單說明】 第1圖係顯示本發明之顯影系統； 第2 a圖係顯示補充第一顯影液循環槽中顯影液之光阻成分 的情形； 第2b圖係顯示補充第二顯影液循環槽中顯影液之光阻成分 的情形； 第3圖係顯示本發明之顯影系統設置有第三廢液管以及第 四廢液管的情形； 第4a圖係顯示清空第一顯影液循環槽的情形； • 第4b圖係顯示清空第一顯影液循環槽後，對第一顯影液循 環槽補充顯影液的情形； 第5a圖係顯示清空第二顯影液循環槽的情形； 第5b圖係顯示清空第二顯影液循環槽後，對第二顯影液循 環槽補充顯影液的情形。 【主要元件符號說明】 1〜顯影系統；10〜廠務端；11〜第一顯影液補充管；12〜第二顯影液 補充管；20〜連通管；21〜第一連通閥；22〜第二連通閥；30〜廢液槽； P 100〜第一顯影機台；101〜基板；110〜第一顯影槽；111〜第一顯影液收 集管；120〜第一顯影液循環槽；121〜第一顯影液供給管；122〜第一幫浦； 123〜第一光阻濃度感應器；131〜第一廢液管；132〜第一廢液控制閥；141 〜第三廢液管；142〜第一廢液排放閥；200〜第二顯影機台；201〜基板； 210〜第二顯影槽；211〜第二顯影液收集管；220〜第二顯影液循環槽；221 〜第二顯影液供給管；222〜第二幫浦；223〜第二光阻濃度感應器；231〜 第二廢液管；232〜第二廢液控制閥；241〜第四廢液管；242〜第二廢液排 放閥。 o632-A5〇585TWf/AU〇5〇6o〇2/Lemon 10住 a knowing the above disclosure, lack of 卄 卄 E 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 , , , 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何 任何The definition is subject to change. I Bao 4 consumption i 〇 632-A5 〇 585TWf / AU 〇 5 〇 6o 〇 2 / Lemon 9 '1310488 [Simplified description of the drawings] Figure 1 shows the development system of the present invention; Figure 2 a shows the first supplement a case where the photoresist component of the developer in the developer circulation tank; FIG. 2b shows a case where the photoresist component of the developer in the second developer circulation tank is replenished; and FIG. 3 shows that the development system of the present invention is provided with the third component. The waste liquid pipe and the fourth waste liquid pipe; Figure 4a shows the case of emptying the first developer circulation tank; • Figure 4b shows the first developer liquid circulation tank after emptying the first developer circulation tank In the case of the developer; Fig. 5a shows the case where the second developer circulation tank is emptied; and Fig. 5b shows the case where the developer solution is replenished to the second developer circulation tank after the second developer circulation tank is emptied. [Description of main components] 1~ developing system; 10~ factory side; 11~ first developer replenishing tube; 12~ second developing solution replenishing tube; 20~ communicating tube; 21~ first communicating valve; a second communication valve; 30 to a waste liquid tank; P 100 to a first developing machine; 101 to a substrate; 110 to a first developing tank; 111 to a first developing liquid collecting tube; 120 to a first developing liquid circulating tank; ~ first developer supply tube; 122 ~ first pump; 123 ~ first photoresist concentration sensor; 131 ~ first waste liquid tube; 132 ~ first waste liquid control valve; 141 ~ third waste liquid tube; 142~first waste liquid discharge valve; 200~second developing machine table; 201~substrate; 210~second developing tank; 211~second developing liquid collecting tube; 220~second developing solution circulating tank; 221~second Developer supply tube; 222~second pump; 223~second photoresist concentration sensor; 231~ second waste liquid tube; 232~second waste liquid control valve; 241~four waste liquid tube; 242~ Two waste liquid discharge valve. o632-A5〇585TWf/AU〇5〇6o〇2/Lemon 10