!3〇3351 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種感光性組成物以及用來製作此减光 性組成物之色膏，且此感光性組成物特別適用於製作彩色液晶 顯示器之彩色濾光片。 【先前技術】 用於彩色濾光片之顏料型感光性組成物包含形成黑框防止 混光之黑色感光樹脂和濾光用之紅、綠、藍三色彩色光阻，其中 彩色光阻必須有好的光穿透度及飽和度，過去彩色濾光片中使 用染料，可達高穿透性及色飽和度的要求·但染料的耐光性與耐 熱性不良。為克服此問題’顏料分散法光阻材料已取代染料法 成為主流。 一般適用於彩色薄膜電晶體液晶顯示器之彩色濾光片製造 用之黑色感光樹脂需要對玻璃基板有好的接著性，高感度，好 的光遮蔽性和耐化學性，為滿足這些特性需求，通常使用負型 光阻成份。 在製造彩色薄膜電晶體液晶顯示器之彩色濾光片其主要步 驟係以旋轉或狹縫刮刀塗佈方式將黑色負型光阻塗佈在透明基 板上經預烘烤，再經以特定圖案之光罩進行曝光，曝光部份因化 學交聯而在後面鹼液顯影中保留，未曝光部份則被鹼液洗去， 保留之圖案經水洗與吹乾後再以高溫硬烤即完成黑色矩陣層步 驟’在後重覆此步驟並依序施以紅色、綠色、藍色光阻及對應 之光罩圖案及可完成彩色濾光片製作。 前述之感光性組成物一般係以顏料分散於負型感光性樹脂 系統而成’此感光性樹脂系統通常含有（a)含酸基如甲基丙烯酸 0178-A20742TWF1 (N2)；P05930025TW；esmond 6 1303351 或丙烯酸之高分子；（b)具有兩個以上雙鍵以進行交聯反應形成 網狀結構之多官能基單體，例如：異戊四醇三甲基丙烯酸酯 (Pentaerythritol trimethacrylate);和（c)光起始劑。由於光起始劑 在寬帶波長之UV曝光下，能釋放出自由基以進行交聯反應之 有機物，未曝光部份則可在鹼液顯影中洗去，產生圖案化。 然而，傳統的負型顏料型光阻成份在形成濾光片時通常會 有以下問題產生··（1)非曝光區在顯影過後容易有光阻殘留（scum) 問題。（2)曝光區之表面塗膜粗糙化，導致散光；（3)曝光區在顯 影過程中被驗液侵银造成膜厚損失，導致對比不足。 因此，習知的顏料型感光組成物很難形成具有高解析度與 高對比的像素陣列，業界亟需針對上述缺點提出改良。 【發明内容】 本發明的目的之一就是提供一種感光組成物，其有極佳的 顯影性，在非曝光區經顯影後不易有光阻殘留的問題。 本發明的目的之二就是提供一種感光組成物，其在曝光區 具有較強之表面結構，不易有粗糙化導致散光的問題。 本發明的目的之三就是提供一種感光組成物，其在顯影過 程中，在鹼液下不易受到侵蝕造成膜厚損失，因而可提供較佳 之對比〇 為達上述與其他目的，本發明之感光組成物主要利用一 可光反應之兩性分子作為顏料之改質劑，此兩性分子其中一端 為親油基可有效吸附於顏料表面；另一端則含有一親水基使其 具有好的顧影性、可降低殘留；再者，由於此分子具有光反應 性，因此在曝光區有好的表面交聯而沒有膜表面侵蝕問題，非 曝光區因具有親油親水兩性性質的分子，可有效去除殘留物。 0178-A20742TWF1 (N2)；P05930025TW；esmond 7 1303351 一本發明之感光組成物主要包括：感光性樹脂系統；顏料； 可光反應之兩性分子；以及溶劑。 本發明之另一目的在於提供一種可製作上述感光組成物之 其主要包括：上述顏料與可光反應之兩性分子。 【實施方式】 之感光組成物主要包括：（A)感光性樹脂系統；（B) 本發明 顏料’（C)可光反應之兩性分子；以及（D)溶劑。以下將針對每個 成分一—作詳細說明。 本發明之感光組成物包括一感光性樹脂系統（A)。此樹脂系 統較佳係包括：（1)鹼可溶樹脂，通常為含有一含酸基如甲基丙 稀酸或丙烯酸之高分子；（2)多官能基單體，其具有兩個以上可 聚合之乙烯化不飽和鍵以進行交聯反應形成網狀結構；及光 起始”彳’其在曝光時可產生起始交聯反應之活性物質（包括但不 限於·自由基）。感光性樹脂系統(A)較佳約占整個感光組成物總 重之 4-12wt%，較佳 6_10wt%。 前述之鹼可溶樹脂較佳為（a)含酸基如甲基丙烯酸或丙烯酸 之乙烯化不飽和單體與（b)其他乙烯化不飽合共聚合單體之共聚 合物。前述之共聚合單體主要為乙烯化不飽合單體，可用之單 體包含熟悉之曱基丙烯酸酯類如甲基丙烯酸甲酯（methyl (meth)acrylate)、甲基丙烯酸苯甲酯（benzyl (meth)acrylate)、曱 基丙烯酸乙酷（ethyl (meth)acrylate)、甲基丙浠酸2_經基乙6旨 (2-hydroxyethyl (meth)acrylate)、曱基丙浠酸經基丙酯 (hydroxylpropyl (meth)acrylate)、甲基丙浠酸異丁酯（isobutyl (meth)acrylate)等；或丙烯酸酯類如丙烯酸甲酯（methyl acrylate)、丙稀酸苯甲酯（benzyl acrylate)、丙烯酸乙酯（ethyl 0178-A20742TWF1 (N2)；P05930025TW；esmond 8 1303351 acrylate)、丙烯酸 2-經基乙醋（2-hydroxyethyl acrylate)、丙稀酸 經基丙酉旨（hydroxylpropyl acrylate)、丙烯酸異丁酯（isobutyl acrylate)等 〇 上述之不飽和單體可以單獨使用或者兩個以上共同使用， 其中含酸基單體莫耳比例可為10%〜50%，較佳為20〜40%，共 聚合物重量平均分子量為1000〜100,000，較佳的範圍是 6,000〜20,000 ° 前述之感光性樹脂系統（A)更包括一多官能基單體，其具有 兩個以上可聚合之乙烯化不飽和鍵以進行交聯反應形成網狀結 構。適用於本發明的多官能基單體，包括但不限於：乙二醇二 甲基丙烯酸醋（ethylene glycol dimethacrylate)、1，4_ 丁二醇二丙 烯酸酯（l，4-butanediol diacrylate)、二乙二醇二丙烯酸酯 (diethylene glycol diacrylate)、異戊四醇三甲基丙烯酸酯 (pentaerythritol triacrylate)、乙氧基化三甲基丙烧三丙烯酸酯 (ethoxylated trimethylpropane triacrylate)、二異戊四醇五丙稀酸 酉旨(dipentaerythritol pentaacrylate)、乙氧基化》異戊四醇四丙稀酸 酉旨（ethoxylated pentaerythritol tetraacrylate)、異戊四醇四丙稀酸 酉旨（Pentaerythritol tetraacrylate)、二異戊四醇六丙烯酸西旨 (dipentaerythritol hexaacrylate)。上述之多官能基單體可以單獨 使用或者兩個以上併用。 前述之感光性樹脂系統（A)更包括光起始劑，其在照射能量 時（如可見光、紫外光、深紫外光、電子束、或X射線時），可 產生起始交聯反應之活性物質（例如，自由基、陽離子或陰離子 等>。較佳之光起始劑可選自在寬帶波長之UV曝光下，能釋放 出自由基以進行交聯反應之有機物，特別是在400nm以下有相 對較高效率的光起始劑。 0178-A20742TWF1(N2)；P05930025TW；esmond 9 1303351 較佳之光起始劑包括：苯乙酮類（Acetophenone)、安息香類 (benzoin)、二苯甲酮類（benzophenone)、硫雜蒽酮類 (Thioxanthone)、蒽醒類（anthraquinone)。苯乙酮類光起始劑例 如 是 ： 2-Methyl-1 -(4-(methylthio)phenyl)-2-morpholino-propane-1、1，經基環己基苯基酮（1-Hydroxy cyclohexyl phenyl ketone)、二乙氧基苯乙酮（Diethoxy acetophenone)、2-經基-2-曱 基 _1_ 苯 基 - 丙 烧 -1- 酮 (2-Hydroxy-2-methyl-1 -phenyl-propane-1 -one) 、 2-Benzyl-2-(dimethylamino)-1 - [4-(4-morpholinyl)phenyl]-1 -buta none。安息香類光起始劑例如是：安息香（Benzoin)、安息香甲 基醚（Benzoin methyl ether)、苯甲基二甲基酮縮醇（Benzyl dimethyl ketal)。二苯甲酮類光起始劑例如是：二苯甲酮 (Benzophenone)、4-苯基二苯甲酮（4-Phenyl benzophenone)、經 基二苯甲酮（Hydroxyl benzophenone)。硫雜蒽酮類光起始劑例如 是··異丙基硫雜蒽酮（Isopropylthioxanthone)、2-氯硫雜蒽酮 (2_Chlorothioxanthone)。蒽艦類光起始劑例如是：2-乙基蒽酉昆 (2-ethylanthraquinone) 〇 前述光起始劑除可單一使用外亦可混合使用，如異丙基硫 雜蒽酮 （Isopropylthioxanthone) 混 合 2-Benzyl-2-(dimethylamino)-l-[4-(4-morpholinyl)phenyl]-l-buta none可得高的感光速度。 本發明之感光組成物更包括一顏料（B)。此處所使用之顏料 並不限定一特定顏色，可依實際所欲形成的彩色濾光片選擇適 當的種類，而且可以是有機顏料或無機顏料。 有機顏料例如是依Color Index編號如紅色顏料有Pigment Red 122，Pigment Red 202，Pigment Red 206，Pigment Red 209， 0178-A20742TWF1 (N2)；P05930025TW；esmond 10 1303351!3〇3351 IX. Description of the Invention: [Technical Field] The present invention relates to a photosensitive composition and a color paste for producing the light-reducing composition, and the photosensitive composition is particularly suitable for production Color filters for color LCD displays. [Prior Art] The pigment-type photosensitive composition for a color filter includes a black photosensitive resin which forms a black frame to prevent light mixing and a red, green and blue color resist for filtering, wherein the color resist must have a good color Light transmittance and saturation. In the past, dyes were used in color filters to achieve high penetration and color saturation. However, dyes have poor light resistance and heat resistance. To overcome this problem, the pigment dispersion method photoresist material has replaced the dye method as the mainstream. A black photosensitive resin generally used for color filter manufacturing of color thin film transistor liquid crystal displays requires good adhesion to a glass substrate, high sensitivity, good light shielding property and chemical resistance, and is usually required to meet these characteristics. Use a negative photoresist component. In the color filter for manufacturing a color thin film transistor liquid crystal display, the main step is to apply a black negative photoresist on a transparent substrate by spin or slit blade coating, pre-baking, and then passing a specific pattern of light. The cover is exposed, the exposed portion is retained in the subsequent lye development due to chemical crosslinking, and the unexposed portion is washed away by the lye. The retained pattern is washed with water and dried, and then the black matrix layer is completed by high temperature hard baking. Step 'Repeat this step afterwards and apply red, green, blue photoresist and corresponding mask pattern in sequence to complete the color filter production. The photosensitive composition described above is generally formed by dispersing a pigment in a negative photosensitive resin system. This photosensitive resin system usually contains (a) an acid group such as methacrylic acid 0178-A20742TWF1 (N2); P05930025TW; esmond 6 1303351 Or a polymer of acrylic acid; (b) a polyfunctional monomer having two or more double bonds to carry out a crosslinking reaction to form a network structure, for example, Pentaerythritol trimethacrylate; and (c ) Photoinitiator. Since the photoinitiator is capable of releasing free radicals for crosslinking reaction under UV exposure at a broadband wavelength, the unexposed portion can be washed away in lye development to produce a pattern. However, the conventional negative-type pigment-type photoresist component usually has the following problems in forming a filter. (1) The non-exposed area is liable to have a problem of scum after development. (2) The surface of the exposed area is roughened, resulting in astigmatism; (3) The exposure area is damaged by the intrusion of silver by the test liquid during the development process, resulting in insufficient contrast. Therefore, the conventional pigment type photosensitive composition is difficult to form a pixel array having high resolution and high contrast, and the industry needs to improve the above disadvantages. SUMMARY OF THE INVENTION One object of the present invention is to provide a photosensitive composition which has excellent developability and which is less likely to have a photoresist residue after development in a non-exposed area. Another object of the present invention is to provide a photosensitive composition which has a strong surface structure in an exposed region and which is less prone to roughening and causes astigmatism. A third object of the present invention is to provide a photosensitive composition which is less susceptible to erosion under alkali liquor and which causes loss of film thickness during development, thereby providing a preferred contrast ratio for the above and other purposes, the photosensitive composition of the present invention. The material mainly utilizes a photoreactive amphiphile as a modifier of the pigment. One of the amphiphilic molecules is oleophilic at one end and can be effectively adsorbed on the surface of the pigment; the other end contains a hydrophilic group to make it have good properties. Further, since the molecule has photoreactivity, there is good surface cross-linking in the exposed region without the problem of film surface erosion, and the non-exposed area can effectively remove the residue due to molecules having lipophilic and hydrophilic properties. 0178-A20742TWF1 (N2); P05930025TW; esmond 7 1303351 A photosensitive composition of the present invention mainly comprises: a photosensitive resin system; a pigment; a photoreactive amphiphilic molecule; and a solvent. Another object of the present invention is to provide a photosensitive composition which can be produced mainly comprising: the above-mentioned pigment and a photoreactive amphiphile. [Embodiment] The photosensitive composition mainly comprises: (A) a photosensitive resin system; (B) a pigment (C) photoreactive amphiphilic molecule of the present invention; and (D) a solvent. A detailed description will be given below for each component. The photosensitive composition of the present invention comprises a photosensitive resin system (A). Preferably, the resin system comprises: (1) an alkali-soluble resin, usually a polymer containing an acid group such as methyl acrylate or acrylic acid; (2) a polyfunctional monomer having two or more The polymerized ethylenically unsaturated bond is subjected to a crosslinking reaction to form a network structure; and the photoinitiator "彳" is an active material (including but not limited to a radical) which initiates a crosslinking reaction upon exposure. The resin system (A) preferably accounts for 4 to 12% by weight, preferably 6 to 10% by weight based on the total weight of the entire photosensitive composition. The above-mentioned alkali-soluble resin is preferably (a) an ethyl group containing an acid group such as methacrylic acid or acrylic acid. a copolymer of an unsaturated monomer and (b) another ethylenically unsaturated copolymerized monomer. The aforementioned copolymerized monomer is mainly an ethylenically unsaturated monomer, and the usable monomer comprises a familiar thiol acrylate. Such as methyl (meth) acrylate, benzyl (meth) acrylate, ethyl (meth) acrylate, methyl propyl methacrylate 2-hydroxyethyl (meth)acrylate, mercaptopropionate, propyl Roxylpropyl (meth)acrylate), isobutyl (meth)acrylate, etc.; or acrylates such as methyl acrylate, benzyl acrylate, acrylic acid B Ester (ethyl 0178-A20742TWF1 (N2); P05930025TW; esmond 8 1303351 acrylate), 2-hydroxyethyl acrylate, hydroxylpropyl acrylate, isobutyl acrylate (acrylic acid) Isobutyl acrylate) may be used alone or in combination of two or more, wherein the molar ratio of the acid group-containing monomer may be from 10% to 50%, preferably from 20 to 40%, based on the weight of the copolymer. The average molecular weight is from 1000 to 100,000, preferably in the range of 6,000 to 20,000 °. The photosensitive resin system (A) described above further includes a polyfunctional monomer having two or more polymerizable ethylenically unsaturated bonds for crosslinking. The reaction forms a network structure. Polyfunctional monomers suitable for use in the present invention include, but are not limited to, ethylene glycol dimethacrylate, 1,4-butanediol diacrylate 1,4-butanediol diacrylate), diethylene glycol diacrylate, pentaerythritol triacrylate, ethoxylated trimethylpropane Triacrylate), dipentaerythritol pentaacrylate, ethoxylated pentaerythritol tetraacrylate, pentaerythritol tetrapropyl acid (Pentaerythritol tetraacrylate), dipentaerythritol hexaacrylate. The above polyfunctional monomers may be used singly or in combination of two or more. The aforementioned photosensitive resin system (A) further includes a photoinitiator which can generate an activity of initiating a crosslinking reaction upon irradiation of energy such as visible light, ultraviolet light, deep ultraviolet light, electron beam, or X-ray. Substance (for example, radical, cation or anion, etc.). Preferably, the photoinitiator can be selected from organic substances capable of releasing free radicals for crosslinking reaction under UV exposure at a broadband wavelength, especially at 400 nm or less. Higher efficiency photoinitiator. 0178-A20742TWF1 (N2); P05930025TW; esmond 9 1303351 Preferred photoinitiators include: acetophenone, benzoin, benzophenone ), Thioxanthone, anthraquinone, etc. The acetophenone photoinitiator is, for example: 2-Methyl-1 -(4-(methylthio)phenyl)-2-morpholino-propane- 1,1, 1-Hydroxy cyclohexyl phenyl ketone, Diethoxy acetophenone, 2-carbyl-2-mercapto-1_phenyl-propanone-1 - 2-Hydroxy-2-methyl-1 -phenyl-propane-1 -one, 2-Benzyl -2-(dimethylamino)-1 - [4-(4-morpholinyl)phenyl]-1 -buta none. Benzoin photoinitiators such as: Benzoin, Benzoin methyl ether, Benzene Benzyl dimethyl ketal. The benzophenone photoinitiator is, for example, Benzophenone, 4-Phenyl benzophenone, Hydroxyl benzophenone. The thioxanthone photoinitiator is, for example, Isopropylthioxanthone or 2-Chlorothioxanthone. The starting agent is, for example, 2-ethylanthraquinone. The above photoinitiators may be used in combination with a single use, such as Isopropylthioxanthone, 2-Benzyl-2. -(dimethylamino)-l-[4-(4-morpholinyl)phenyl]-l-buta none gives high photospeed. The photosensitive composition of the present invention further comprises a pigment (B). The pigment used herein is not limited to a specific color, and an appropriate type can be selected depending on the color filter actually formed, and it can be an organic pigment or an inorganic pigment. The organic pigment is, for example, numbered according to Color Index such as red pigment, Pigment Red 122, Pigment Red 202, Pigment Red 206, Pigment Red 209, 0178-A20742TWF1 (N2); P05930025TW; esmond 10 1303351
Pigment Red 177，Pigment Red 254 ;黃色顏料有 Pigment Yellow 13 ? Pigment Yellow 55 5 Pigment Yellow 119，Pigment Yellow 138，Pigment Yellow 139，Pigment Yellow 168 ;綠色顏料有 Pigment Green 7，Pigment Green 36 ;藍色顏料有 Pigment Blue 15:3，Pigment Blue 15:4, Pigment Blue 15:6;黑色顏料有 Pigment Black 1，Pigment Black 7。 無機顏料例如是氧化鈦、硫酸鋇、碳酸鈣、氧化辞、氮化 鈦、硫酸船、鉛黃（yellow lead)、辞黃（zinc yellow)、氧化鐵紅 (Red Iron Oxide III)、編紅（cadmium red)、群青（Ultramarine blue)、普藍（Prussian Blue)、氧化鉻綠（chromium oxide green)、 始綠（cobalt green)、號拍（amber)、鈥黑（titanium black)、合成鐵 黑（synthetic iron black)、碳黑（carbon black)等。 黑色無機顏料中又以碳黑較佳，因其有優良之光遮蔽性， 可用的有三菱化學生產商品名為LFF_MA7，LFF-MA100， HCF-#2650，MCF-88，德固薩生產商品名為3卩6(^14入，？\¥_18, 卡伯特生產商品名為S90B，Mogul L，哥倫比亞生產商品名為 RAVEN1200，RAVEN2000。黑色顏料之主要功能是提供遮光 性，從研究得知其粒徑控制是非常重要的，粒徑太大則穩定性 不足，光學密度低下，粒徑太小會造成黏度上升，也會因光穿 透度增加而降低光學密度。因此，一般粒徑需控制在0.050〜0.5 微米，較佳的是控制在0·08〜0.15微米，在有效的控制粒徑分佈 下，可以達最高之光學密度與配方儲存穩定性。 顏料通常為有效的控制粒徑分佈控制與增加與感光樹脂之 相容性，可先以分散劑進行分散，可用的分散劑可為陰離子型、 陽離子型或非離子型的界面活性劑，但在本發明較佳的是使用 高分子型分散劑。 0178-A20742TWF1 (N2)；P〇5930025TW；esmond 11 1303351 本發明之感光組成物更包括一可光反應之兩性分子（c)作 為顏料之改質劑，其結構式如下：Pigment Red 177, Pigment Red 254; yellow pigments are Pigment Yellow 13 ? Pigment Yellow 55 5 Pigment Yellow 119, Pigment Yellow 138, Pigment Yellow 139, Pigment Yellow 168; green pigments are Pigment Green 7, Pigment Green 36; blue pigments have Pigment Blue 15:3, Pigment Blue 15:4, Pigment Blue 15:6; black pigments are Pigment Black 1, Pigment Black 7. Inorganic pigments are, for example, titanium oxide, barium sulfate, calcium carbonate, oxidized words, titanium nitride, sulfuric acid vessels, yellow lead, zinc yellow, red iron Oxide III, braided red ( Cadmium red), Ultramarine blue, Prussian Blue, chromium oxide green, cobalt green, amber, titanium black, synthetic iron black ( Synthetic iron black), carbon black, etc. Among the black inorganic pigments, carbon black is preferred. Because of its excellent light shielding properties, Mitsubishi Chemical produces the trade names LFF_MA7, LFF-MA100, HCF-#2650, MCF-88, and Degussa. It is 3卩6(^14入,?\¥_18, Cabot is manufactured under the trade name S90B, Mogul L, and Colombia is produced under the trade name RAVEN1200, RAVEN2000. The main function of black pigment is to provide light shielding, which is known from research. Particle size control is very important. If the particle size is too large, the stability is insufficient, the optical density is low, the particle size is too small, the viscosity will increase, and the optical density will decrease due to the increase of light transmittance. Therefore, the general particle size needs to be controlled. At 0.050~0.5 microns, it is preferably controlled from 0. 08 to 0.15 microns. Under the effective particle size distribution, the highest optical density and formulation storage stability can be achieved. Pigments are usually effective in controlling particle size distribution control. The compatibility with the photosensitive resin may be first dispersed by a dispersing agent, and the usable dispersing agent may be an anionic, cationic or nonionic surfactant, but in the present invention, a polymer is preferably used. Type dispersant 0178-A20742TWF1 (N2); P〇5930025TW; esmond 11 1303351 The photosensitive composition of the present invention further comprises a photoreactive amphiphilic molecule (c) as a pigment modifier, and the structural formula is as follows:
X-HB-HL 其中，X為不飽和基數1-6之光反應基，HB為親油基，HL 為親水基。在理想狀況下，親油基HB可提供對顏料的親合力， 使改質劑有效吸附於顏料表面，而親水基HL·可增加感光組合物 的顯影性，避免在非曝光區產生殘留。另一方面，光反應基X 在曝光區中則可與樹脂反應形成交聯結構，如此可增加成膜表 面的結構強度，以避免顯影液侵蝕造成表面粗糙化或損失膜 厚。根據本發明，可光反應之兩性分子的含量較佳為〇·5-20重 量份，0.5-10重量份更佳，以100重量份的顏料為基準。 在前述中，親油基ΗΒ可以是含碳數6-18之芳基或烷基。 碳數6-18之芳基例如是··苯基、萘基或蒽基，其中又以萘基、 蒽基尤佳。碳數6-18之烷基例如是：己烷、辛烷、十二烷、十 八烷，其中又以十二烷、十八烷較佳。親水基HL例如是羧基、 羥基、或磺酸基，其中又以羧基較佳。光反應基X可包含一或 多個光反應基，較佳為1-3乙烯化不飽和基，例如丙烯酸或甲 基丙烯酸。 本發明之可光反應之兩性分子（C)可由芳基或烷基酸酐 (anhydride)與含經基(hydroxyl group)之不飽和曱基丙烯酸酉旨或 丙烯酸S旨之單體反應而成。例如，在反應器中力口入1 〇〇重量比 之溶劑與10〜30重量比之芳基或烷基酸酐（anhydride)，加熱溶 解後，加入等當量之含經基(hydroxyl group)之不飽和曱基丙烯 酸酯或丙烯酸酯之單體，再加入0.5〜5重量比之三乙基胺為反 應觸媒後，反應4小時可得具光反應性之兩性分子，反應溫度 可為50〜80QC，較佳的是50〜60QC。 0178-A20742TWF1 (N2)；P05930025TW；esmond 12 1303351 前述之光反應性之兩性分子製備反應中之溶劑可使用四氫 呋喃、甲乙酮、甲基異丁酮、環己酮，較佳的是甲乙酮。前述 之光反應性之兩性分子製備反應中之芳基酸酐（anhydride)，可為 酞酐、1，8-萘二曱酸酐、蒽-1，9-二曱酸酐，較佳的是1，8-萘二 甲酸酐，蒽-1，9-二甲酸酐。前述之光反應性之兩性分子製備反 應中之炫基酸if (anhydride)，可為己院二酸if、辛院二酸Sf、癸 烷二酸酐、十二烷二酸酐、硬脂酸酐，較佳的是辛烷二酸酐、 癸烷二酸酐、十二烷二酸酐。前述之光反應性之兩性分子製備 反應中之含經基（hydroxyl group)之不飽和單體可為單官能基之 2-羥基-乙基-甲基丙烯酸酯、2-羥基-丙基-甲基丙烯酸酯、2-羥 基-丁基-曱基丙烯酸酯、2-羥基-乙基-丙烯酸酯、2-羥基-丙基-丙烯酸酯、2-羥基-丁基-丙烯酸酯；雙官能基之異戊四醇二丙烯 酸酉旨（Pentaerythritol diacrylate);三官能基之異戊四醇三丙烯酸 酉旨（Pentaerythritol triacrylate)等。 本發明之感光性組成物更包括一溶劑（D)。溶劑的選擇並無 特別限制，只要可以溶解或分散上述組成物之成分，不會與這 些成分反應，而且有適當的揮發性即可。較佳的溶劑例如有環 己酮、乙二醇醚、乙二醇乙醚、乙二醇丁醚、丙二醇甲醚乙酸 酯、乙基-2-乙氧基乙醇乙酸酯等。這些溶劑可以單獨使用或者 兩個以上併用。 除此之外，本發明之感光性組成物為增進塗料性質可視需 要添加其他成份如：界面活性劑、顏料分散劑、平坦劑、消泡 劑、或接著助劑等。這些添加劑的功能跟含量乃為此技藝人士 所熟知，故在此不予贅述。 本發明之感光性組成物之固含量可為10%〜40%，並依塗佈 方式與膜厚不同控制其固含量在，基本上若欲以旋轉塗佈方式 0178 - A20742TWF1 (N2);P05930025TW;esmond 13 1303351 控制膜厚在1〜1.5微米，固含量最好調整在18〜28%。下表說明 感光性組成物中各成份較佳比例： 成分 重量份 驗可溶樹脂 6-10 多官能基單體 3-10 光起始劑 0.5-5 顏料 6-16 分散劑 0.8-10 可光反應兩性分子 0.01-5 溶劑 60-90 配方加工方式可先將顏料以分散劑分散，再添加反應性兩 性分子混合均勻，最後將其他成份加入以高速攪拌均勻後使用。 本發明之感光性組成物可在應甩在製造彩色濾光片，其主 要步驟係以旋轉塗佈方式將黑色感光性組成物塗佈在透明玻璃 基板上預烘烤，再經紫外光源以特定圖案之光罩進行曝光，曝 光部份因化學交聯，接著以鹼液顯影，未曝光部份則被鹼液洗 去，保留之圖案經水洗與吹乾後再以高溫硬烤，即完成黑色矩 陣層步驟。往後重覆此步驟並依序施以紅色、綠色、藍色其他 光阻及對應之光罩圖案及可完成彩色濾光片之製作。 上述中，預烘烤較佳在60-110°C下進行0.5-5分鐘，高溫 硬烤較佳在180-220°C下進行0.2-1小時。紫外光照射的能量較 佳在80-300mJ/cm2。顯影用的鹼液較佳為碳酸鈉、氫氧化鈉、 氫氧化鉀之水溶液。 本發明之色膏主要係包括前述顏料與可光反應兩性分子之 0178-A20742TWF1 (N2)；P05930025TW；esmond 14 1303351 此口，擇性地更包括—分散劑。在製備感光性組成物時，係 利用刀散裝備將上述色膏分散在感光樹脂系統中，例如是球 磨機:砂磨機、三輥軋磨機、高速衝擊式粉碎機、或一般的授 摔機等。 ^為讓本發明之上述和其他目的、特徵、和優點能更明顯易 it，下文特舉出較佳實施例，並配合所附圖式，作詳細說明如 下·· 【製備例一：光反應性兩性分子】 在25〇三頸反應器中配製冷凝管、攪拌器，加入1〇〇g之甲 乙酮’合劑’25§之1，8-萘二甲酸酐（八以〇3，分子量=198.18)，加熱 至50 C攪拌溶解後，加入等當量之2_羥基_乙基-甲基丙烯酸酯 16_4g，再加入3g之三乙基胺為反應觸媒後，反應4小時可得具 光反應性之兩性分子，固含量=30.1%。 【製備例二：光反應性兩性分子】 同製備例一，但更換單官能基之2-羥基-乙基-甲基丙烯酸 酯為三官能基之異戊四醇三丙烯酸酯37 6g，反應後測得固含量 =39.5% ° 【製備例三：光反應性兩性分子】 同製備例一，但更換1,8-萘二甲酸酐為蒽_159_二甲酸酐 31.3g，反應後測得固含量=32.5%。 【製備例四：光反應性兩性分子】 同製備一，但更換1，8-桌^一甲酸酐為十二烧二酸酐33.6g， 反應後測得固含量=34.0%。 【製備例五：樹脂合成】 取1公升四頸反應瓶裝置冷凝管，通氮氣氣將287.69g丙二 醇單甲醚乙酸酯（PGMEA)由入料口置入，加熱至9〇〇c恆溫， 0178-A20742TWF1 (N2)；P05930025TW；esmond 15 1303351 攪拌速度250rpm，將預先混合之偶氮二異丁晴（AIBN)1.68g，十 二烧基硫醇（dodecanethiol)1.68g，甲基丙烯酸苯曱酉旨 (BzMA)177.62g，曱基丙烯酸（MAA)38_33g，甲基丙烯酸2-羥基 乙酯（2-HEMA)29.51g，PGMEA 82.92g 以約 3cc/min 滴入反應 瓶中，2〜2.5小時内加完滴完後再反應1小時，完成反應，經酸 價測定為102.1，固含量為39.98%。 【實施例一】 取250ml的PE磨罐加入1/2磨罐體積之1mm直徑錯球， 加入 25g 石炭黑（Degussa，Special 4A)，85g PGMEA 和 12.5g 分散 劑（ΒΥΚ，ΒΥΚ·163,有效成份45%)，以紅魔鬼研磨機分散4小 時，加入6.0g製備例一之光反應性之兩性分子繼續分散10分 鐘，過濾磨珠取出分散液，並取樣以粒徑分析儀 (ELS-800,OTSUKA製）測試其粒徑，結果見表一。再將分散液放 置於500ml三頸反應器中，氮氣環境下攪拌下逐漸加入預先混 合之製備例五樹脂溶液20g，反應性單體二異戊四醇六丙烯酸酯 (dipentaerythritol hexaacrylate)6g， 起 始 劑 2-Benzyl-2-(dimethylamino)-l-[4-(4-morpholinyl) phenyl]-1 -butanone (1369) 4.5g，起始劑異丙基硫雜蒽嗣 (Isopropylthioxanthone ; ITX) 0.5g，溶劑 PGMEA 96.7g 戶斤成之 感光樹脂。加完持續攪拌2小時完成感光性黑色矩陣樹脂配製。 將配製好之感光性黑色矩陣樹脂以轉速600rpm、15秒， 900rpm、20秒旋轉塗佈在透明玻璃基板上經90QC預烘烤2分 鐘，以膜厚計測試其顯影前膜厚（F0)，再經能量150mJ/cm2的 紫外光源配以光罩進行曝光，接著以0·5%ΚΟΗ鹼液顯影，未曝 光部份則被鹼液洗去，保留之圖案經水洗與吹乾後，以膜厚計 測試其顯影厚膜厚（F1)，再以230°C高溫硬烤1小時，即完成 0178-A20742TWF1 (N2)；P05930025TW；esmond 16 1303351 黑色矩陣層，其顯影效果可以100倍顯微鏡觀察曝光與未曝光 部份，其中未曝光部份完全洗淨，顯影性則評為優，有少數黑 點(小於1微米）未洗淨則評為尚可，若有多數黑點或黑塊（大於 於1微米）則評為不良，若未能洗開則評為劣，同時黑色矩陣 層可以光學密度計進行量測，以上結果見表一。 【實施例二】 同實施例一，其中光反應性之兩性分子以4.8g製備例二之 光反應性兩性分子取代製備例一。所得結果見表一。 【實施例三】 同實施例一，其中光反應性之兩性分子以5.8g製備例三之 光反應性兩性分子取代製備例一。所得結果見表一。 【實施例四】 同實施例一，其中光反應性之兩性分子以5.7g製備例四之 光反應性兩性分子取代製備例一。所得結果見表一。 【實施例五】 同實施例一，其中顏料以25g Pigment Red 254 (Ciba)取代 碳黑，分散劑以l〇g BYK-2001 (BYK，有效成份52%)取代。 將配製好之感光性組成物以轉速600rpm、15秒，900rpm、 20秒旋轉塗佈在透明玻璃基板上經90°C預烘烤2分鐘，以膜厚 計測試其顯影前膜厚（F0)，再經能量100mJ/cm2的紫外光源配以 光罩進行曝光，接著以〇·5%ΚΟΗ鹼液顯影，未曝光部份則被鹼 液洗去，保留之圖案經水洗與吹乾後，以膜厚計測試其顯影厚 膜厚（F1)，再以230°C高溫硬烤1小時，即完成彩色濾光層， 其顯影效果可以1〇〇倍顯微鏡觀察曝光與未曝光部份，其中未 曝光部份完全洗淨，顯影性則評為優，有少數色點（小於1微米） 未洗淨則評為尚可，若有多數色點或色塊（大於於1微米）則評 0178-A20742TWF1 (N2)；P05930025TW；esmond 17 1303351 為不良，若未能洗開則評為劣，以上結果見表一。 【實施例六】 同實施例五，其中顏料以25g Pigment Green 36 (BASF)取 代 Pigment Red 254，分散劑以 l〇g BYK-2150 (BYK，有效成份 52%)取代。所得結果見表一。 【實施例七】 同實施例五，其中顏料以25g Pigment Blue 15:6 (BASF)取 代 Pigment Red 254，分散劑以 l〇g BYK-2150 (BYK，有效成份 52%)取代。所得結果見表一。 【比較例一】 同實施例一，惟不加光反應性之兩性分子，所得結果見表 〇 【比較例二】 同實施例一，其中製備例一光反應性之兩性分子以丨·5 g 無光反應之1-萘乙酸取代，所得結果見表一。 【比較例三】 同實施例一，其中製備例一光反應性之兩性分子以I_6g無 光反應之9-蒽甲酸取代。 0178-A20742TWF1 (N2);P05930025TW；esmond 18 1303351 表一 粒徑(μπι) 顯影性 Γ1/Τ0(μιιι/μιη) 光學密度(OD/μιη) 實施例1 0.135 優 1.40/1.45 3.12 實施例2 0.141 優 1.51/1.54 3.23 實施例3 0.122 優 1.38/1.43 3.25 實施例4 0.150 尚可 1.48/1.56 2.95 實施例5 0.102 優 1.29/1,35 - 實施例6 0.134 尚可 1.36/1.46 - 實施例7 0.115 優 1.30/1.38 - 比較例1 0.195 劣 1.42/1.6 2.75 比較例2 0.152 優 0.8/1.48 2.0 比較例3 0.156 優 0.9/1.54 2.2 由表一可知，相較於比較例，本發明之感光性組成物在非 曝光區具有優良的顯影性，不會有光阻殘留的問題，而且在曝 光區對顯影液具有較佳的抵抗力，比較不會產生膜表面侵蝕與 粗糙化的問題。 雖然本發明已以數個較佳實施例揭露如上，然其並非用以 限定本發明，任何熟習此技藝者，在不脫離本發明之精神和範 圍内，當可作任意之更動與潤飾，因此本發明之保護範圍當視 後附之申請專利範圍所界定者為準。 19 0178-A20742TWF1 (N2) ；P05930025TW；esmond 1303351 【圖式簡單說明】 無。 【主要元件符號說明】 無0 0178-A20742TWF1(N2)；P05930025TW；esmondX-HB-HL wherein X is a photoreactive group having an unsaturation of from 1 to 6, HB is a lipophilic group, and HL is a hydrophilic group. Under ideal conditions, the lipophilic group HB can provide an affinity for the pigment to effectively adsorb the modifier on the surface of the pigment, while the hydrophilic group HL· can increase the developability of the photosensitive composition and avoid residue in the non-exposed area. On the other hand, the photoreactive group X can react with the resin to form a crosslinked structure in the exposed region, so that the structural strength of the film-forming surface can be increased to prevent surface roughening or loss of film thickness due to developer etching. According to the present invention, the content of the photoreactive amphiphilic molecule is preferably from 5 to 20 parts by weight, more preferably from 0.5 to 10 parts by weight, based on 100 parts by weight of the pigment. In the foregoing, the lipophilic oxime may be an aryl or alkyl group having a carbon number of 6-18. The aryl group having 6 to 18 carbon atoms is, for example, a phenyl group, a naphthyl group or an anthracenyl group, and particularly preferably a naphthyl group or a fluorenyl group. The alkyl group having 6 to 18 carbon atoms is, for example, hexane, octane, dodecane or octadecane, and among them, dodecane or octadecane is preferred. The hydrophilic group HL is, for example, a carboxyl group, a hydroxyl group, or a sulfonic acid group, and among them, a carboxyl group is preferred. The photoreactive group X may comprise one or more photoreactive groups, preferably 1-3 ethylenically unsaturated groups such as acrylic acid or methacrylic acid. The photoreactive amphiphilic molecule (C) of the present invention can be formed by reacting an aryl group or an alkyl anhydride with a monomer having a hydroxyl group-containing unsaturated mercapto acrylate or an acrylic acid. For example, in the reactor, a solvent of 1 〇〇 by weight and an aryl or alkyl anhydride of 10 to 30 by weight are added, and after heating and dissolving, an equivalent amount of a hydroxyl group is added. Saturated methacrylate or acrylate monomer, after adding 0.5~5 by weight of triethylamine as reaction catalyst, reacting for 4 hours to obtain photoreactive amphiphilic molecules, the reaction temperature can be 50~80QC Preferably, it is 50 to 60 QC. 0178-A20742TWF1 (N2); P05930025TW; esmond 12 1303351 The solvent used in the photoreactive amphiphile preparation reaction described above may be tetrahydrofuran, methyl ethyl ketone, methyl isobutyl ketone or cyclohexanone, preferably methyl ethyl ketone. The aryl anhydride in the photoreactive amphiphilic preparation reaction may be phthalic anhydride, 1,8-naphthalene dicarboxylic anhydride or cerium-1,9-diphthalic anhydride, preferably 1,8. - Naphthalic anhydride, hydrazine-1,9-dicarboxylic anhydride. The sulfonic acid if (anhydride) in the photoreactive amphiphilic preparation reaction may be hexamethylene diacid, citric acid diacid Sf, decane dianhydride, dodecane dianhydride, stearic anhydride, Preferred are octane dianhydride, decane dianhydride, and dodecane dianhydride. The hydroxyl group-containing unsaturated monomer in the photoreactive amphiphilic preparation reaction described above may be a monofunctional 2-hydroxy-ethyl-methacrylate or 2-hydroxy-propyl-methyl group. Acrylate, 2-hydroxy-butyl-mercapto acrylate, 2-hydroxy-ethyl-acrylate, 2-hydroxy-propyl-acrylate, 2-hydroxy-butyl-acrylate; difunctional Pentaerythritol diacrylate; trifunctional pentaerythritol triacrylate or the like. The photosensitive composition of the present invention further comprises a solvent (D). The solvent is not particularly limited as long as it can dissolve or disperse the components of the above composition, does not react with these components, and has appropriate volatility. Preferred solvents are, for example, cyclohexanone, glycol ether, ethylene glycol diethyl ether, ethylene glycol butyl ether, propylene glycol methyl ether acetate, ethyl-2-ethoxyethanol acetate, and the like. These solvents may be used singly or in combination of two or more. In addition, the photosensitive composition of the present invention may be added with other ingredients such as a surfactant, a pigment dispersant, a flat agent, a defoaming agent, or a bonding aid, etc., in order to improve the properties of the coating. The function and content of these additives are well known to those skilled in the art and will not be further described herein. The photosensitive composition of the present invention may have a solid content of 10% to 40%, and the solid content thereof is controlled depending on the coating method and the film thickness, and substantially is to be subjected to spin coating method 0178 - A20742TWF1 (N2); P05930025TW ;esmond 13 1303351 Control film thickness is 1~1.5 microns, and the solid content is preferably adjusted at 18~28%. The following table shows the preferred ratio of each component in the photosensitive composition: Component weight by weight Solvent resin 6-10 Polyfunctional monomer 3-10 Photoinitiator 0.5-5 Pigment 6-16 Dispersant 0.8-10 Light Reactive amphiphilic 0.01-5 Solvent 60-90 Formulation method: The pigment can be dispersed as a dispersing agent, and then the reactive amphiphilic molecules are uniformly mixed. Finally, other components are added and stirred at a high speed for uniform use. The photosensitive composition of the present invention can be used in the manufacture of a color filter, and the main step is to apply a black photosensitive composition on a transparent glass substrate by spin coating, and then pre-bake through a UV light source. The mask of the pattern is exposed, the exposed portion is chemically cross-linked, and then developed with an alkali solution, and the unexposed portion is washed away by the alkali solution, and the retained pattern is washed with water and dried, and then baked at a high temperature, that is, black is completed. Matrix layer steps. Repeat this step and apply red, green, and blue photoresists and corresponding mask patterns in sequence to complete the color filter. In the above, the prebaking is preferably carried out at 60 to 110 ° C for 0.5 to 5 minutes, and the high temperature hard baking is preferably carried out at 180 to 220 ° C for 0.2 to 1 hour. The energy of ultraviolet light irradiation is preferably 80-300 mJ/cm2. The alkali solution for development is preferably an aqueous solution of sodium carbonate, sodium hydroxide or potassium hydroxide. The color paste of the present invention mainly comprises the above-mentioned pigment and photoreactive amphiphilic group 0178-A20742TWF1 (N2); P05930025TW; esmond 14 1303351, which optionally includes a dispersing agent. In the preparation of the photosensitive composition, the above-mentioned color paste is dispersed in a photosensitive resin system by using a knife-dispersing device, such as a ball mill: a sand mill, a three-roll mill, a high-speed impact mill, or a general weight-reducing machine. Wait. The above and other objects, features, and advantages of the present invention will become more apparent from the aspects of the invention. Sexual amphiphile] Prepare a condenser tube and a stirrer in a 25-inch three-neck reactor, and add 1 〇〇g of methyl ethyl ketone' mixture '25 § 1,8-naphthalic anhydride (eight 〇 3, molecular weight = 198.18) After heating to 50 C for stirring and dissolving, an equivalent amount of 2-hydroxyl-ethyl-methacrylate 16_4 g is added, and after adding 3 g of triethylamine as a reaction catalyst, the reaction is carried out for 4 hours to obtain photoreactivity. Amphiphilic, solid content = 30.1%. [Preparation Example 2: Photoreactive Amphoteric Molecule] Same as Preparation Example 1, except that the monofunctional 2-hydroxy-ethyl-methacrylate was changed to a trifunctional isopentenyl alcohol triacrylate 37 6 g, after the reaction The measured solid content = 39.5% ° [Preparation Example 3: Photoreactive amphiphile] Same as Preparation Example 1, but the replacement of 1,8-naphthalic anhydride was 31.3 g of hydrazine _159-dicarboxylic anhydride, and the solid was measured after the reaction. Content = 32.5%. [Preparation Example 4: Photoreactive Amphoteric Molecule] The same procedure as in Preparation 1, but the replacement of 1,8-tablene monocarboxylic anhydride was 33.6 g of dodecyl dianhydride, and the solid content = 34.0% was measured after the reaction. [Preparation Example 5: Resin Synthesis] Take a 1 liter four-neck reaction flask device condensing tube, and place 287.69 g of propylene glycol monomethyl ether acetate (PGMEA) through the inlet port through a nitrogen gas, and heat to a constant temperature of 9 〇〇c. 0178-A20742TWF1 (N2); P05930025TW; esmond 15 1303351 Stirring speed 250 rpm, premixed azobisisobutyl aceto (AIBN) 1.68 g, dodecanethiol 1.68 g, phenyl methacrylate (BzMA) 177.62g, methacrylic acid (MAA) 38_33g, 2-hydroxyethyl methacrylate (2-HEMA) 29.51g, PGMEA 82.92g dropped into the reaction flask at about 3cc/min, within 2~2.5 hours After the completion of the dropwise addition, the reaction was further carried out for 1 hour, and the reaction was completed. The acid value was determined to be 102.1, and the solid content was 39.98%. [Example 1] A 250 ml PE mill jar was added to a 1/2 mill volume of 1 mm diameter wrong sphere, and 25 g of carbon black (Degussa, Special 4A), 85 g of PGMEA and 12.5 g of dispersant (ΒΥΚ, ΒΥΚ·163, effective) were added. Ingredients 45%), disperse for 4 hours in a red devil grinder, add 6.0 g of the photoreactive amphiphile of Preparation Example 1 and continue to disperse for 10 minutes, filter the beads to remove the dispersion, and sample the particle size analyzer (ELS-800). , OTSUKA system) tested its particle size, the results are shown in Table 1. The dispersion was placed in a 500 ml three-necked reactor, and 20 g of the pre-mixed preparation solution 5 resin solution was gradually added under stirring in a nitrogen atmosphere, and the reactive monomer dipentaerythritol hexaacrylate 6 g was started. 2-Benzyl-2-(dimethylamino)-l-[4-(4-morpholinyl)phenyl]-1 -butanone (1369) 4.5g, the initiator isopropylthioxanthene (ITX) 0.5g , solvent PGMEA 96.7g of the photosensitive resin. The photosensitive black matrix resin was prepared by continuously stirring for 2 hours. The prepared photosensitive black matrix resin was spin-coated on a transparent glass substrate at a rotation speed of 600 rpm, 15 seconds, 900 rpm, and 20 seconds, and prebaked at 90 QC for 2 minutes, and the film thickness (F0) before development was tested by a film thickness meter. Then, the ultraviolet light source with an energy of 150 mJ/cm 2 is irradiated with a reticle for exposure, and then developed with 0.5% cerium alkali solution, and the unexposed portion is washed away by the alkali solution, and the retained pattern is washed with water and dried to form a film. The thickness gauge is tested for thick film thickness (F1), and then baked at a high temperature of 230 ° C for 1 hour to complete 0178-A20742TWF1 (N2); P05930025TW; esmond 16 1303351 black matrix layer, the development effect can be 100 times microscope exposure And the unexposed part, in which the unexposed part is completely washed, the developability is rated as excellent, and a few black spots (less than 1 micron) are not considered as acceptable, if there are many black spots or black blocks (greater than At 1 micron), it is rated as bad. If it is not washed, it is rated as inferior. At the same time, the black matrix layer can be measured by optical densitometer. The above results are shown in Table 1. [Example 2] In the same manner as in the first embodiment, the photoreactive amphiphile was substituted with 4.8 g of the photoreactive amphiphile of Preparation Example 2. The results obtained are shown in Table 1. [Example 3] In the same manner as in the first embodiment, the photoreactive amphiphile was substituted with 5.8 g of the photoreactive amphiphile of Preparation Example 3. The results obtained are shown in Table 1. [Embodiment 4] In the same manner as in the first embodiment, the photoreactive amphiphile was substituted with 5.7 g of the photoreactive amphiphile of Preparation Example 4. The results obtained are shown in Table 1. [Embodiment 5] As in the first embodiment, in which the pigment was substituted for carbon black with 25 g of Pigment Red 254 (Ciba), the dispersing agent was replaced with 10 g of BYK-2001 (BYK, active ingredient 52%). The prepared photosensitive composition was spin-coated on a transparent glass substrate at a rotation speed of 600 rpm, 15 seconds, 900 rpm, 20 seconds, and prebaked at 90 ° C for 2 minutes, and the film thickness before development (F0) was tested by a film thickness meter. Then, the ultraviolet light source with an energy of 100 mJ/cm 2 is irradiated with a reticle for exposure, then developed with 〇·5% citrate solution, and the unexposed portion is washed away by the lye, and the retained pattern is washed with water and dried, The film thickness tester tests the thickness of the film (F1), and then hard-bakes it at a high temperature of 230 ° C for 1 hour to complete the color filter layer. The development effect can be observed by microscope observation of the exposed and unexposed portions. The exposed part is completely washed, and the developability is rated as excellent. There are a few color points (less than 1 micron). If it is not washed, it is considered acceptable. If there are many color points or color blocks (greater than 1 micron), then 0178- A20742TWF1 (N2); P05930025TW; esmond 17 1303351 is bad. If it is not washed, it is rated as inferior. The above results are shown in Table 1. [Embodiment 6] In the same manner as in the fifth embodiment, the pigment was substituted with Pigment Red 254 by 25 g of Pigment Green 36 (BASF), and the dispersant was replaced by l〇g BYK-2150 (BYK, active ingredient 52%). The results obtained are shown in Table 1. [Seventh embodiment] In the same manner as in the fifth embodiment, the pigment was substituted with Pigment Red 254 at 25 g of Pigment Blue 15:6 (BASF), and the dispersant was replaced with l〇g BYK-2150 (BYK, active ingredient 52%). The results obtained are shown in Table 1. [Comparative Example 1] The same as Example 1, except that no photoreactive amphiphilic molecules were obtained, and the obtained results are shown in Table [Comparative Example 2] The same as Example 1, wherein the photoreactive amphiphile of Preparation Example 1 was 丨·5 g. The 1-naphthaleneacetic acid was replaced by a photoless reaction, and the results are shown in Table 1. [Comparative Example 3] In the same manner as in Example 1, in which the photoreactive amphiphilic molecule of Preparation Example 1 was substituted with I_6g of photo-reactive 9-indolecarboxylic acid. 0178-A20742TWF1 (N2); P05930025TW; esmond 18 1303351 Table 1 Particle Size (μπι) Developability Γ 1 / Τ 0 (μιιι / μιη) Optical Density (OD / μιη) Example 1 0.135 Excellent 1.40/1.45 3.12 Example 2 0.141 Excellent 1.51/1.54 3.23 Example 3 0.122 Excellent 1.38/1.43 3.25 Example 4 0.150 is still 1.48/1.56 2.95 Example 5 0.102 Excellent 1.29/1, 35 - Example 6 0.134 is still 1.36/1.46 - Example 7 0.115 Excellent 1.30 /1.38 - Comparative Example 1 0.195 Inferior 1.42/1.6 2.75 Comparative Example 2 0.152 Excellent 0.8/1.48 2.0 Comparative Example 3 0.156 Excellent 0.9/1.54 2.2 As can be seen from Table 1, the photosensitive composition of the present invention is inferior to the comparative example. The exposed area has excellent developability, has no problem of residual photoresist, and has better resistance to the developer in the exposed area, and does not cause problems of erosion and roughening of the film surface. While the invention has been described above in terms of several preferred embodiments, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims. 19 0178-A20742TWF1 (N2) ; P05930025TW; esmond 1303351 [Simple description of the diagram] None. [Main component symbol description] No 0 0178-A20742TWF1 (N2); P05930025TW; esmond