TWI298026B - Method, apparatus, and system for bi-solvent based cleaning of precision components - Google Patents

Description

1298026 IX. Description of invention: [Technical field to which the invention belongs] This is the priority of the sixth line of the application (4) application No. 6Q/623, 847, which was proposed on October 29, 2004, for the purpose of the application of Hg Γ, η 疋Ώ The heading "Methods for cleaning precision components based on non-volatile organic compounds" and the apparatus and households are not referred to in this disclosure. (V) In-Down-Non-Incorporated Scope The present invention is generally oriented to a solvent-based cleaning system for precision (four) parts. In particular, this _ day $ # ”, ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Technology] Precision cleaning and dry material system is a typical solution containing solvents, detergents, or other aqueous mixtures. This system, (4) stay and red money, various devices or parts, instruments, wafers , PC boards, hybrid circuits, magnetic barriers, precision mechanical or electromechanical components, or the like. Many prior art systems utilize solvents classified as voc or volatile organic compounds. VOC is an organic chemical with high vapor pressure, so Xia can easily form vapor at ambient temperature and pressure. Although voc can be successfully used in concentrate cleaning systems, it is generated due to exposure and / or emissions from VQC. The use and disposal of the harmful environment and health effects are highly regulated. [Abstract] 326XP/Invention Manual (Supplement)/95-02/94] 3 7800 5 1298026 One of the objects of the present invention Produces an appropriate cleaning system and appropriate cleaning method for cleaning precision components while using solvent re-manufacturing procedures to reduce solvent emissions while recovering solvents for use and/or disposal. The present invention includes a use of two solvents for migration. Decontamination and other contaminants for " cleaning of precision components in a dual solvent design. In a representative embodiment, the two solvents may include a first solvent that does not contain V0C and a second solvent that does not contain v〇c, The solvent containing no V0C is roughly equivalent to the voc solvent.—The control module includes cleaning the precision components in the first solvent without vocal to remove any substances, particulate matter, grease, loose matter or other contaminants. The precision component is then rinsed in a second tank containing a second solvent free of voc' to remove any film remaining on the precision group from the VOC-free first solvent: in this mode of operation The cleaning and rinsing steps may each include an L-cavitation that allows the precision components to undergo oscillation and ultrasonic induction in the relevant solvent to further facilitate cleaning and rinsing. The formula comprises separating the first Ru solvent containing no v〇c from the second solvent without V0C, which is removed as part of the rinsing step. In a representative specific example, the second solvent containing no VOC may be less The first solvent containing v〇c is more than 贝, so that the second solvent containing no v〇c is recovered and reused for reuse, and the first solvent containing no VOC and any solvent not containing voc can be used. The contaminants within are properly disposed of. 4 In some representative embodiments, the disclosure illustrates a method of cleaning precision components using a dual solvent cleaning system having a solvent reconstitution system. In some representative embodiments, the disclosure illustrates a use. Double solvent cleaning 326XP/invention manual (supplement)/95-02/94137800 6 1298026 cleaning system for cleaning and cleaning of components. In some representative embodiments, the disclosure describes a cleaning apparatus that includes a tank and associated tubing to facilitate cleaning of precision components using a dual solvent cleaning system having a solvent recovery system. In some representative embodiments, the disclosure illustrates a method of treating a first solvent that does not contain VOC and a second k solvent that does not contain vqc using a dual solvent cleaning system. The term "dissolving 10 doses of V〇c" as used throughout this disclosure is defined to include the United States Environmental Protection Agency (United States).

Environmental Protection Agency) has negligible photochemical reactivity and is clearly stated in the United States Code of Federal Regulations 40 CFR 51·100(s), which is incorporated herein by reference. Organic compound. The above summary of the various embodiments of the invention is not intended to The specific examples are more specifically illustrated in the accompanying drawings in the following detailed description. [Embodiment] &gt; The two-solvent cleaning system disclosed in Figs. 1 and 2 will be described. The Dual Solvent Cleaning System 10 is designed and suitable for cleaning such as, for example, medical devices, optical instruments, wafers, PC boards, hybrid circuits, E-disc components, precision mechanical or electromechanical components, or The precision of the analog is a piece. In the presently preferred embodiment, the dual solvent cleaning system 100 includes a complete single integrated system such that substantial interconnection between components of the dual solvent cleaning system is not required. For example, the dual solvent cleaning system I can be placed on a single 326XP/invention manual (supplement)/95-02/94137800 7 1298026 skid or frame and/or housed in a single housing, container or compartment. Medium 0 As illustrated in FIGS. 1 and 2, the dual solvent cleaning system 100 can include a system housing 102, a cleaning portion 104, a rinsing portion 106, and a solvent recovery portion 108. The various components including the cleaning portion 104, the rinsing portion 106, and the solvent recovery portion 108 can be operatively interconnected within the system housing 102 such that a single joint structure can be tested, tested, transported, and installed. The cleaning portion 104 generally includes a cleaning tank 110, a first solvent 112, and a first recirculation loop 114. The cleaning tank 110 may comprise an open trough made of a suitable material such as stainless steel, tantalum, titanium, quartz or a polymer such as PEEK and other suitable materials. The cleaning tank 110 can further include at least one ultrasonic transducer 116 for facilitating a cleaning procedure. The ultrasonic energy causes an alternating pattern of low pressure and high pressure phases in the first solvent 112. In the low pressure phase, bubbles or vacuum vacuoles are formed. In the high pressure phase, the bubbles violently rupture inward. The process of bubble generation and inward rupture is generally referred to as cavitation. The empty bubble now produces a strong scrubbing process along the surface of the precision component, which causes any particles to be removed from the part. The bubbles generated in the cavitation phenomenon are so small that they can penetrate microscopic gaps to provide enhanced cleaning compared to simple soaking or agitation cleaning procedures. In a representative embodiment, the ultrasonic transducer 116 is a Crest Ultrasonic Corp. ceramic boost converter that provides ultrasonic energy at an appropriate frequency between 28 KHz and 2.5 MHz. The ultrasonic transducer 116 can be directly bonded to the outside of the cleaning bath 110 by an adhesive such as an epoxy adhesive. The first recirculation loop 114 includes a flow system in which the first solvent 326XP / invention specification (supplement) / 95-02 / 94137800 8 1298026 112 + is recirculated through the first filter system 118 to be used when cleaning precision components The introduced particles are removed. The filter system 1 可 8 may include one or more suitable transitioner configurations for removing such particles. The filter system can include a pre-assembled filter comprising a filter media that can remove particles having a size as small as 0.03 microns, such as polyethersulfone, Teflon 8, PVDF, polyester, or polypropylene; The first recirculation loop further includes a crucible 119 and a ' recirculation pump 120. Valve 119 may include an automatic valve such as, for example, an electro-magnetic valve, or a hand-actuated manual valve. The first recirculation pump may continuously recirculate the first agent 112 through the first filter system 118. The first recirculation of the % loop 114 may include, when the first solvent 112 is reintroduced to the cleaning unit, the first heat exchanger 122 for continuously heating it. By use, the hot parent exchanger 122 can maintain the cleaning bath 110 at a continuous temperature due to the thermal energy loss via conduction, convection, and light loss. In a presently preferred embodiment, the first solvent 112 may comprise a solvent-free solvent having a solvent that is removable to remove contaminants such as dirt particles, oils, and greases. . For example, the first solvent 112 can have a value of about 6G of card T_aributanGl). In the representative example, the first bath 112 contains a soybean-based solvent containing no v〇c, such as, for example, from AgEnVlronmentalPr〇ducts〇f〇maha, a stagnation point of 333 ° C S〇yclear 15GG. The first solvent 310 is biodegradable and/or non-hazardous. Advantages of Soybean Matrix Solvent One (10) ent) These types of solvents are generally inexpensive because of their readily available properties. Further, for example, when the content of oil and/or grease in the cleaning tank 11 is at a high enough value, the first solvent ιΐ2 is disposed and further 326XP/invention specification (supplement)/95-02/94137800 〇1298026, Generally no special and/or expensive disposal equipment is required and /: "Disposal of large denier matrix solvents. Soy matric solvents can be treated using conventional people" such as, for example, burning in incinerators or heating with oil 5 The steel furnace is used as a fuel logistics source. The medium washing 4 knife 106 generally includes a flushing tank i 24, a second solvent i 26 and a recovery circuit 128. In addition to the second melting U26, the flushing tank 124 may also include '=, Second, the film on the fine component is introduced into the residual amount of the rinsing tank by 1%. The granule 112. The rinsing tank 124 may include a material that is just the same as or similar to the first cleaning tank (for example, a suitable material such as An open tank of stainless steel, button, titanium, quartz or polymer such as ugly and other suitable for use. The flushing tank 124 can further include at least one for inducing cavitation in the flushing tank 124 to further facilitate cleaning. The program's ultrasonic conversion is crying 116. ..., recycled back The path 128 includes a flow system in which the second solvent 126 and the remaining first solvent 112 are recirculated through the second filter system 130 to urge the particles to be removed from the rinse tank 124. The second filter system 13 can include a Or a suitable filter configuration for removing such particles. Recovery circuit 128 further includes a plurality of valves 131a, 131b, 131c, 131d and a second recirculation pump 132. Valves 131a, 131b, 131c, 131d may include An automatic valve such as, for example, a solenoid valve or a manually actuated manual valve. The second resuscitation pump 132 can selectively pump the appropriate liquid based on the operating mode and operating state of the valves 131a, 131b, 131c, 131d. The recovery circuit 128 can further include a second heat exchanger 134 for cooling the second solvent 126 and the remaining solvent n2. 326 Thanks for the description (supplement) / 95·02/94 丨 37800 10 1298026 In a presently preferred embodiment, the second solvent 126 can comprise a suitable VOC-free solvent having any of the characteristics of the film that enhances the removal of any of the first solvent Π2 remaining on the precision component. In terms of The second solvent 126 can have a caributanol value of between about 10 and about 150. In a representative embodiment, the second solvent 126 comprises an engineering solvent such as, for example, 3M C(10) pany(R) from the United States. f St. Paul, Li) purchased Novec Engineered Fluid HFE-7200. HFE-7200 has a boiling point of 61 C and a wide liquid range from -135 ° C to 61 t, making it an excellent solvent for vapor degreasing applications. . In addition, HFE_72 does not consume ozone, has a very low global warming capacity, and provides reduced greenhouse gas emissions. V0C is recognized by the US Environmental Protection Agency's Significant New Alternatives Pr〇gram. Limiter. The solvent recovery portion 108 may include a recovery tank 136, a recovery heater 138, a condensing screw 139, and a waste tank 140. The recovery tank 136 may comprise a material that is the same as or similar to the first cleaning tank 100 and the rinsing tank 124 (eg, a suitable material such as stainless steel, button, titanium, quartz, or a polymer such as a shin and other suitable materials). Open slot. The recovery tank 136 is substantially connected and separated from the rinsing tank 124 by an overflow weir 142. Therefore, the recovery tank 136 and the rinsing tank 124 share a common vapor blanket of 1 μ. When fully assembled and integrated, the dual solvent cleaning system (10) can be configured for automatic, semi-automatic or manual operation. In addition to the foregoing and illustrated implantable two-solvent cleaning system, the steps include: moving the precision part between the cleaning tank and the flushing tank 124 by placing the part in the bracket or basket 143. j26XP/Inventive Manual ( Replenishment) /95-02/94丨37800 11 1298026 Dynamic precision component processing system. The precision component handling system can include a manual system 'where the operator simply places the precision components in the correct slots, or it can include an automated part processing system for moving the basket 143 from the cleaning tank 110 to the flushing tank 124. In addition, the dual solvent cleaning system 100 can include suitable light sources, buttons, and switches for manually operating the dual solvent cleaning system. Alternatively, the dual solvent cleaning system 100 can be automated, such as, for example, operated and controlled by a microprocessor, personal computer, programmable logic controller (PLC). In a preferred embodiment, the dual solvent cleaning system 100 is fully contained within the system housing 102, such as, for example, a cabinet-like housing to provide a sleek, aesthetic appearance. In this cabinet system, the user only needs to provide the first solvent 112, the second solvent 126, the precision components to be cleaned, and the source. During operation, the dual solvent cleaning system 100 can operate in one of two modes, the first mode being used for normal operation, wherein the cleaning and rinsing precision components are illustrated in Figure i; and the second mode includes The multi-step procedure illustrated in Figure 2 is for separating the first solvent and the second agent 126 first, then removing the first solvent 112 and making possible disposal, and reconstituting the second solvent 126 for reuse. In the double solvent cleaning system 1〇〇. Regarding the operation of the second rinsing assembly (10) and the retracting assembly 108 in the first mode and the second mode, reference is made in particular to Fig. 3-1, which will be further described below.乂 σ <Normal operation> As shown in Figures 3 and 4, the 326ΧΡ/inventive specification (supplement)/95-02/94137800 η 1298026 is started by starting the two-solvent cleaning system.

2 soil and heating part to achieve the desired (four) parameters, (four) the beginning of the double operation. In the cleaning portion 104, the first J 112 is pumped through the first-recirculation circuit 114, so that the first heat exchanger can add thermal energy to the first solvent 112, and thus heat the cleaning tank 11〇. During operation, for SQyclear listening, the cleaning bath will be at a substantially constant temperature such as, say, about 赃. It is well known to those skilled in the art that the cleaning tank 11G and the recirculation loop 114 may include suitable sensors, measuring instruments and alarms so as to be monitored during the cleaning process; and maintain proper temperature, flow rate, pressure and Other process variables.

As illustrated in Figure 3, the rinse tank 124 and the recovery tank 136 each contain a second solvent 126 when the dual solvent cleaning system is initially started. The recovery heater 138 is priming to heat the recovery #136 to the boiling point of the second solvent 126, or 61 in the case of HFE-7200. At the same time, the condensing coil 139 is operated at about 5 ° C so that a vapor blanket 1 - 44 containing the vapor of the second solvent 126 is formed directly above the rinsing tank 124 and the recovery tank 136. The condensing solenoid 139 condenses the vapor of the second solvent 126 such that the pure distillate of the first/mixer 126 continuously flows down the wall into the rinsing tank 1. When the pure distillate of the second solvent 126 is passed to the rinsing tank 24, the level of the second solvent 126 in the rinsing tank 124 rises until it reaches the overflow in which the second solvent 126 overflows into the recovery tank 136. The liquid level of 堰142 is up. During normal operation, the valves 131a, 131c are open while the valves 131b, 131d are closed 'so that the second recirculation pump 132 pumps the contents of the flushing tank 124 through the second filter system 13A to place the flushing tank 124 therein. Any particles are filtered and removed. By continuously adding a second solvent 126 distillate and 326XP / invention specification (supplement) / 95-02 / 94137800 13 1298026 from the recirculation pump 132 to add pump energy 5l 〇 C. The temperature of the rinsing tank 12 4 is maintained at about

In the normal cleaning and flushing mode illustrated in Figure 1, the precision components are placed in the cleaning tank 11G, for example by placing precision components in the basket (4). The blue 143 is immersed in the first solvent 112 π so that any particulate matter, loss/oily ruthenium and other contaminants can be removed from the precision component and suspended in the /City 112. When the animal is inspected 143 and thus the precision component is immersed in the first solvent 112, the ultrasonic transducer 116 can be induced in the first solvent ι 2 to further enhance the removal of the contaminant from the precision component. When the basket 143 is used as part of an automated processing system, the basket 143 can be continuously oscillated in a /down and/or side/side manner to further facilitate the removal of contaminants from the precision components. The first solvent 112 is continuously recycled through the first recirculation, circuit 114, wherein any suspended particles introduced by the synthesis, assembly can be removed from the first solvent 112 using the first filter system 118. After the particles of the precision assembly are removed in the cleaning tank 11 ,, the precision assembly is moved to the rinsing tank 124 using the basket 143. When placed in the rinse tank 124, a small amount of the first solvent 112 remains on the precision components. The second solvent 126 rinses away any remaining particles and dissolves the first solvent 112 from the precision component. This flushing can be further effected in the flushing tank 24 by using the ultrasonic wave conversion in the flushing tank 124 to cause cavitation. Additionally, the basket 143 can oscillate up/down and/or side/side to further facilitate the removal of contaminants from the precision components. After cleaning, the basket 143 is removed from the rinse tank 124 where the vapor blanket 144 dries the precision components so that they are free of film or residue. The precision assembly is then prepared for further processing or use in the 326 ΧΡ/invention specification (supplement)/95-02/94137800 14 1298026. During the flushing 4曰124, the level of the solvent 126 is maintained at a steady state value such that there is a constant overflow through the weir 142 and into the recovery tank 136 =. When the precision component is flushed in the rinse tank 124, the second solvent 0126 is continuously contaminated with the dissolved amount of the first solvent 112 and any other > dyeables present on the precision components. Thus, as illustrated in Figure 4, the solvent mixture 146 of the first solvent 112, the second solvent 126, and any other contaminants is introduced into the recovery tank 136 into the recovery tank 136. Since the first solvent 112 is selected to have a higher boiling point than the second solvent 126 (and so much is high), the second solvent 126 is continuously boiled from the solvent mixture, which leads to the first over time. The amount of solvent 112 accumulates and increases in the recovery tank 136. The concentration of the first solvent 112 in the recovery tank 136 is eventually increased to the point where the boiling point of the solvent mixture &amp; i 4 6 4 is increased, and the most solvent mixture 146 is separated. <Separation and Disposal Operation> # Figure 2 and Table 10 illustrate the solvent disposal and return mode of the two-solvent cleaning system. As illustrated in Figure 4, the continuous operation of the two-solvent cleaning system 100, the concentration of the first solvent ii2 in the recovery tank i36 is unacceptable as evidenced by the increase in boiling point of the compound 146. The extent of the priest ~ analogy. Children's increased by 1〇C or more. The separation of the solvent mixture 146 (including any of the keratin dyes) is achieved by forming the cold portion of the solvent mixture 146 to 5 Torr in the recovery tank (10) so as to form two distinct liquid levels, wherein the first agent Portion 148 includes a first solvent 112 (including any soil 5 wood) and a first solvent portion 15A comprising a second solvent 126. The first solvent j26XP/invention specification (supplement)/95-〇2/94]3?fine 1298026 part 148 and the second solvent portion 15〇 can generally be visually distinguished by the naked eye. The cooling in the recovery tank 136 is closed by the recovery heater 138, the condenser coil 139 is closed to cause the vapor blanket 144 to disappear, and the liquid is recovered by opening the valves 131b, 131d while closing the valves 131a, 131c. The tank 136 is recirculated through the recovery loop 128 such that the liquid can be achieved by a second heat exchange 134 cooling. When the solvent mixture 146 is cooled, the second solvent I26 is no longer boiling away from the solvent mixture 146, so that the pure solvent of the second solvent 126 stops condensing on the condenser coil 139 and is no longer filled with the rinse tank 124 so that the rinse The level of the second solvent 126 in the tank 124 drops to the level of the weir 142 and no longer overflows into the recovery tank 136, as illustrated in Figures 4, 5 and 6. It will be apparent to those skilled in the art that the rinsing tank %, recovery tank 136, and recovery circuit 128 may include appropriate sensors, gauges, and alarm stomachs to monitor and maintain proper temperature, flow rate, pressure, and other conditions during the cleaning process. Process variables. When the recovery tank is cooled to 5 〇. When ruthenium, the solvent mixture 146 is separated into a first solvent portion 148 and a second solvent portion 150, as illustrated in FIG. Once the first solvent portion 148 and the second solvent portion 15 are formed, the valves 131a, 131d are closed while the valves 131a, 131d are closed, so that the second solvent 126 in the flushing 124 is pumped to the recovery tank, so that The amount of the two solvent portion 150 is increased. As illustrated in Figure 8, as the second solvent portion 150 increases, the first solvent portion 148 rises until it reaches a recovery overflow, 152 where the first solvent portion 148 containing the first solvent 112 and any soil contaminants overflows. To the waste tank 140. Recovery tank 136 326XP / invention specification (supplement) / 95 · 〇 2 / 94] 3780 〇 \ r 1298026 package = viewing port 154 set relative to the recovery overflow 152, so that when the first solvent portion 148 overflows recycling When the weir 152 is overflowed, it is better for the operator to observe it. When the level of the second solvent worker 26 in the recovery #! 3 6 increases, the second solvent portion 15〇t eventually approaches the recovery overflow 152, as illustrated in FIG. At this point, most of the first solvent portion 丨48 has been introduced into the waste tank 140 so that the valves 131a, 131, and 11 and I3ld are placed in the normal operation position, and the remaining components can be re-started. Normal operating state, as illustrated in Figure 1〇. Or 'transparently mounted, a suitable optical sensor such as, for example, a light eye or a camera, to visually distinguish between the first portion 148 and the second solvent portion 15 ,, while the first solvent portion 148 Overflow automation. For a successful two-solvent cleaning system, it is not necessary to remove all of the first solvent 112 from the recovery tank 136, but only to lower the boiling point of the solvent mixture 146 to the boiling point of the second solvent 丨26. The first solvent 112 (including any dissolved particles and contaminants) in the waste tank 140 can then be suitably recycled, recycled or disposed of. The first solvent 112 is a VOC-free solvent such that it can be incinerated or used as a fuel stream source. As already stated, in the case where the unit price of the second solvent 126 is greater than the unit price of the first solvent 112, the dual solvent cleaning system 丨 may be particularly economically advantageous. It is to be understood that the invention is not intended to be limited to the particular embodiments and examples disclosed herein. Although the invention is susceptible to various modifications and alternative forms, the details are described and described in detail in the drawings, 326 XP/Inventive Specification (Repair)/95-02/94137800 !298026. However, it should be clear that it is not specific to specific examples. To the contrary, the spirit and scope of the invention, which is defined by the scope of the claims, is intended to be modified, equivalent, and substitute. BRIEF DESCRIPTION OF THE DRAWINGS The present invention is more fully understood by the detailed description of the above example of the cut (four) test, wherein: °) is a schematic diagram of the cleaning system of the present disclosure, showing the cleaning and punching Fig. 1 Schematic diagram of the cleaning system' shows solvent recovery and waste soilFig. 3 is an eight-figure diagram of the flushing tank and the recovery tank of the cleaning system in the startup mode. Figure 4 is a schematic diagram of the clearing (4), the timely flushing tank and the timely tank. ~ month your style, 5 series Figure 1 clear weaving tank rinse tank in time slot in the first step of solvent recovery. Fig. 6 is a schematic view showing the second step of the solvent recovery of the flushing tank and the recovery tank of the cleaning system of Fig. 1. Figure 7 is a schematic diagram of the third step of the flushing tank and the recovery tank of the Qingchun system in the solvent recovery mode. Figure 8 4 Figure 1 Schematic diagram of the four steps of the flushing tank and recovery tank of the Qingchun system in the solvent recovery module. Figure 9 is a schematic illustration of the fifth step of the flushing tank and recovery tank of the cleaning system of Figure 1 in a solvent recovery mode of the invention (Supplement) / 95-02/94 ] 37800 18 1298026. Fig. 10 is a schematic view showing the flushing tank and the recovery tank of the cleaning system of Fig. 1 returning to the operation mode. [Main component symbol description]

100 Dual Solvent Cleaning System 102 System Housing 104 Cleaning Section 106 Flushing Section 108 Solvent Recovery Section 110 Cleaning Tank 112 First Solvent 114 First Recirculation Loop 116 Ultrasonic Converter 118 First Filter System 119 Valve 120 First Recirculation Pump 122 first heat exchanger 124 flushing tank 126 second solvent 128 recovery circuit 130 second filter system 131a valve 131b valve 131c valve 326XP / invention manual (supplement) / 95-02 / 94137800 19 1298026 131d valve 132 second Circulating pump 134 second heat exchanger 136 recovery tank 138 recovery heater 139 condensing coil 140 waste tank 142 overflow weir 143 basket 144 vapor blanket 146 solvent mixture 148 first solvent portion 150 second solvent portion 152 recovery overflow weir 154 viewing port

326XP/Invention Manual (supplement)/95-02/94137800 20

Claims (1)

1298026 X. Patent Application Range: 1. A method of cleaning a precision component, comprising: placing a precision component in a cleaning tank filled with a first solvent for removing contaminants from a precision component to clean the precision component; Flushing the precision component in a rinse tank filled with a second solvent, wherein any residual amount of the first solvent on the precision component is removed by the second solvent to form a solvent mixture; and by cooling the solvent mixture The solvent mixture is separated into a first solvent portion and a second solvent portion in a recovery tank such that the first solvent portion is located at the top of the second solvent portion, and the first solvent portion and the second solvent portion are visually visible to the naked eye. The difference is made, and wherein the first solvent portion can be removed from the recovery tank. 2. The method of claim 1, wherein the removing the first solvent portion from the recovery tank comprises pumping the solvent mixture from the rinse tank to the recovery tank such that the first solvent portion reaches the recovery helium and overflows to the disposal In the slot. 3. The method of claim 2, wherein the self-flushing tank pumps the solvent mixture when the second solvent portion is near the recovery enthalpy. 4. The method of claim 2, further comprising: disposing the first solvent portion in the disposal tank. 5. The method of claim 1, wherein the solvent mixture is necessary when the boiling point of the solvent portion in the recovery tank exceeds the boiling point of the second solvent by at least 1 °C. 6. The method of claim 1, wherein cleaning the precision component comprises causing cavitation in the first solvent. 326XP / invention manual (supplement) / 95-02/94137800 1298026 two please ί:; the method of the first item 'which cleans the precision components 匕 于 弟 & &gt; two::? The method of claim 1, wherein rinsing the precision component is included in the mash mixture to cause cavitation. 9. The method of claim 5, wherein the rinsing of the precision component comprises oscillating the precision component in a solvent mixture. A dual solvent cleaning system for removing contaminants from precision components, including: ", ', a cleaning portion having a cleaning tank for containing a first solvent; having a rinse tank for containing a second solvent a rinsing portion, the second solvent having a boiling point of a second solvent lower than the first solvent by at least WGt, the first agent dissolving any first solvent remaining on the precision component from the cleaning tank, and further comprising the first solvent in the rinsing tank a condensate snail above the solvent and a solvent recovery portion having a back-receiving tank for accommodating the solvent mixture of the first solvent and the second solvent, the recovery tank being separated from the rinsing tank by an overflow raft, the recovery tank is - The step includes a heat source and a cooling source, wherein the heat source is generated above the flushing tank and the recovery tank to generate a common second/corner helium blanket', so that the pure distillate of the second solvent is condensed on the condensing coil and the machine is inserted Up to the rinsing tank, the liquid level of the second solvent is raised until it overflows the weir and enters the recovery tank, wherein the concentration of the first solvent in the recovery tank increases with time, resulting in dissolution The boiling point of the compound exceeds the boiling point of the second solvent by at least about 10. 〇, such that the solvent mixture needs to be separated, and 326 XP / invention specification (supplement) / 95_〇 2 / 94137800 22 1298026 wherein the cooling source cools the solvent mixture in the recovery tank, Forming a first solvent portion and a second solvent portion that are visually distinguishable from each of the available naked eyes such that the first solvent portion is removed from the recovery tank. 11. The dual solvent cleaning system of claim 10, wherein the solvent The recovery portion includes a disposal tank separated from the recovery tank by a recovery overflow, the first solvent partially flowing through the recovery overflow weir and entering the disposal tank. 12. 12. Double solvent cleaning as in claim 10 The system wherein at least one of the first solvent and the second solvent comprises a VOC-free solvent. 13. The dual solvent cleaning system of claim 12, wherein the first solvent comprises a soy-based solvent (soy-based) Solvent 14. The dual solvent cleaning system of claim 10, further comprising a basket for transporting the precision components from the cleaning tank to the rinse tank. A dual solvent cleaning system according to claim 10, wherein the cleaning tank comprises at least one super-sonic transducer for generating cavitation in the first solvent. 16. The double solvent as claimed in claim 10 a cleaning system, wherein the rinsing tank comprises at least one ultrasonic transducer for creating a cavitation in a solvent mixture. 17. The dual solvent cleaning system of claim 10, wherein the cleaning portion comprises a cleaning recirculation a circuit having a cleaning pump, a cleaning filter, and a cleaning heater, the cleaning pump recirculating the first solvent through the cleaning filter to remove particulate matter, and the cleaning pump recirculating the first solvent through the cleaning heating To heat the first solvent. 326XP/Inventive Manual (Replenishment)/95-02/94137800 1298026 18. As claimed in the first paragraph of the patent application, the flushing part includes a flush, a first cycle, and a mixture of m, wherein the wash, ^ Γ road It has a flushing pump and a kneading agent mixture recycled through the flushing filter to remove particulate matter. 19. The dual solvent cleaning system of claim 18, wherein the flushing recirculation circuit is fluidly connected to the recovery tank, and wherein the flushing f pumps the solvent mixture through a cooling source to separate the solvent mixture into Brother> the gluten portion and the second solvent portion. 20. The dual solvent cleaning system of claim 1, wherein the recovery tank comprises a viewing window for viewing with the naked eye when the first solvent portion is removed from the recovery tank. 326XP/Invention Manual (supplement)/95-02/94丨37800 24