1296613 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種多色光電鍍膜製程及其產品，尤指 一種利用藥劑蝕刻來形成多色光電鍍膜的製程，其概應隸 屬於光電鍍膜之應用，運用於光學產品之技術領域範疇。 【先前技術】1296613 IX. Description of the Invention: [Technical Field] The present invention relates to a multi-color electroplating film process and a product thereof, and more particularly to a process for forming a multi-color photo-plating film by using a chemical etching, which is generally pertaining to a photo-plating film. Application, used in the technical field of optical products. [Prior Art]
從肥皂泡沫表面、玻璃表面間空隙及水面上浮油反射 出來的顏色等現象的發現，使得薄膜光學已成為一門被研 九t牟問且卩通著一十世紀的真空技術、電腦、控制技術 及材料技術的進步，使得多層薄膜的製作已成為可行之事 貫並且進一步成為商業用途。在現今的光電科技領域中， 光學薄膜技術巳儼然成為控制光束光譜的工具，其能有效 改复及桉制光束在光電系統中的光譜特性，此外尚有消除 鬼〜色彩平衡調整及鏡面保護等等功能。 而在光學薄膜的應用上，由於技術本身是屬於泛用性 勺車乂難以某一單一產品為載具來界定，故從光學元件相 關市w來#抵更可看出其附加價值及在日常生活中佔的比 、> s幻士·用於抗反射膜的製品主要有照相機及眼鏡，而 雜s的又傷有如·傳真機、雷射印表機、雷射唱盤及影碟 :等’另外液晶顯示器中所需的導電透明薄膜以及照明、 ::用之冷光燈、雷射鏡片、干涉濾光鏡、分色鏡、攝錄 =幾、，射計測、電腦護目鏡、醫療照明等等。其他如： 電池、低損耗f射鏡、抛物面鏡遮板與美國哈伯 二望遠鏡等也都屬於薄膜光學的應用。 5 1296613 而不同於微電子電路應用的z c薄膜或以化學方式製作 的薄膜，光學薄膜大部分屬於多層設計的結構，其中形成 薄膜的鍍膜技術可分為液態成膜法與氣態成膜法兩種，前 著大多涉及化學變化，後著有些是利用化學作用，有些則 是屬於物理作用，而由於基材的蒸鍍批次量產的需求，故 一般以氣態成膜法中的物理蒸鍍（Physical Deposition ; PVD)方式為主，其他則根據不同的用途尚有 •化學蒸鍍（Chemical Vapor Deposition ; CVD )、雷射輔助 加熱蒸鍍（Laser Assisted Deposition ; LAD )及電漿聚人 沈積（Plasma Polymerization Deposition ; PPD)等方式。 其中在基材例如玻璃等的表面上利用產生薄膜的方 式，使基材的表面因薄膜而產生圖案的效果，則將其產生 圖案的產品稱之為「GOBO」，而一般GOBO製作常用的 方法有兩種，其分別為雷射雕刻（Laser Etching )和藥劑 14刻（Etching)兩種，其中： _ ( 1 )雷射雕刻（Laser Etching ):主要是藉由二氧 、 化碳（c〇2)雷射光（1〇·6/zm)經過透鏡聚焦而產生的高 熱，將鍍膜材料熔解氣化後，使鍍膜材料吸附且沉積在基 材上，而使基材產生薄膜進而形成所需的圖案，而一般的 鍍膜材料如二氧化鈦（Ti〇2)的熔點（ 200(TC )及二氧化 石夕（Si〇2)的溶點（1 700°C )，都比基材如玻璃的溶點（7〇〇 °C )來得高，因此當藉由雷射光使鍍膜材料產生汽化的同 時，對於玻璃的表面也會產生損傷，進而使基材上的圖案 產生模糊霧化及透光性不佳的現象，且雕刻處與未雕刻處 6 1296613 的邊緣會使薄臈的附著力 生脫落，使製造的G0B0品；下在：溫使用時會使薄膜產 要缺點，加上一次僅可針對單:二這也是雷射雕刻的主 =率:：？若要形成多色的_，則需將多片: 率=Γ，Γ使用？合材料對於―的穿透From the discovery of the surface of soap foam, the gap between the glass surface and the color reflected by the oil on the water surface, the film optics has become a vacuum technology, computer and control technology that has been studied and used in the tenth century. Advances in materials technology have made the fabrication of multilayer films a viable and further commercial use. In the field of optoelectronic technology today, optical thin film technology has become a tool for controlling the beam spectrum, which can effectively modify and control the spectral characteristics of the beam in the photoelectric system, in addition to eliminating ghost-color balance adjustment and mirror protection. And other functions. In the application of optical film, since the technology itself is a general-purpose scoop, it is difficult to define a single product for the vehicle. Therefore, from the optical component related city, the added value can be seen in the daily value. The ratio of life, > s, the products used for anti-reflection film mainly include cameras and glasses, and the miscellaneous s are like fax machines, laser printers, laser discs and DVDs, etc. In addition, the conductive transparent film and illumination required in the liquid crystal display, the cold light, the laser lens, the interference filter, the dichroic mirror, the video recording, the recording, the computer goggles, the medical lighting, etc. . Others such as: batteries, low-loss f-mirrors, parabolic mirrors and the US Haber II telescope are also applications of thin film optics. 5 1296613 Unlike zc films or chemically produced films for microelectronic circuit applications, optical films are mostly of multi-layer design. The film-forming technology for film formation can be divided into liquid film formation method and gas film formation method. Most of the former involves chemical changes, some of which use chemical action, some of which are physical effects, and due to the demand for mass production of vapor deposition batches of substrates, physical vapor deposition in gaseous film formation is generally used ( Physical Deposition; PVD) is the main method. Others are based on different applications: Chemical Vapor Deposition (CVD), Laser Assisted Deposition (LAD) and Plasma Deposition (Plasma). Polymerization Deposition; PPD). In the case where a film is formed on the surface of a substrate such as glass or the like, and the surface of the substrate is patterned by the film, the product which is patterned is referred to as "GOBO", and a general method for producing GOBO is generally used. There are two kinds, which are Laser Etching and Etching, among which: _ ( 1 ) Laser Etching: mainly by dioxins and carbon (c〇 2) The high heat generated by the laser light (1〇·6/zm) is focused by the lens, and the coating material is melted and vaporized, so that the coating material is adsorbed and deposited on the substrate, and the substrate is formed into a film to form a desired film. Pattern, and the general melting point of the coating material such as titanium dioxide (Ti〇2) (200 (TC) and the melting point of the dioxide dioxide (Si〇2) (1 700 ° C), are more melting point than the substrate such as glass (7〇〇°C) is high, so when the coating material is vaporized by the laser light, the surface of the glass is also damaged, which causes the pattern on the substrate to be fogged and poorly transmitted. Phenomenon, and the side of the engraving and the uncarved place 6 1296613 Will cause the adhesion of the thin sputum to fall off, so that the G0B0 product can be manufactured; the following: when the temperature is used, the film will have shortcomings, plus one can only be used for single: two is also the main rate of laser engraving::? To form a multi-colored _, you need to take multiple pieces: rate = Γ, Γ use the material for the penetration of
相對地力大a且夕上進仃多片玻璃膠合，其所需的治具也 生偏差夕片玻璃膠合的方式對於圖案的定位會產 ’而藉由膠合所產生的多色圖案片在高功率燈光的 吏用下會有脫落的情形產生，再者雷射雕刻的設備較貴， 下ί成本最高’因此雖然只要有相關雷射蝕刻的設 器即能製作GOBO產品，但由於製作成本高且易損傷 =，所以雖能製作出G0B0效果的產品，但卻無法做出 鬲口口質的GOBO 〇 (2 )藥劑蝕刻（Etching) ··這是目前業界一般最常 使用的方法，此種方法主要是藉由藥劑(氫氟酸；Η。會熔 解鍍膜材料如二氧化鈦（TiQ2)及：氧切（Si〇2)等而 無法炫解印刷油料的性質而製作A咖〇,由於採用腐敍 的方式，其功率無法如同—般鍍膜的條件，必需採用較低 之輸出功率’而低功率的輸出會造成所形成的薄膜其緻密 !·生不足’會產生熱飄移的現象，所使用的藥劑如氣氣酸對 7基材如玻璃亦會產生侵蝕，因此當蝕刻的溫度、濃度及 柃間等參數控制不好時對於玻璃基材會產生霧化的現象， 使未鍍膜的區域透光性不佳，雖然藥劑蝕刻所需的成本較 低，但文限於薄膜的品質，當薄膜的緻密性較低時，藥劑 7 1296613 ' 雖較容易在晶片上蝕刻出圖案，但在晶片的使用上則會有 ^ 熱飄移的現象，而當薄膜的緻密性較佳時，氫氟酸熔解鍍 膜材料的困難度會提高，雖所蝕刻的晶片在使用上沒有熱 飄移的現象，但因不易蝕刻所以容易使基材受損，進而使 薄膜在高溫使用時，會有膜層脫落的現象，因此藥劑蝕刻 最大的困難在於如何控制氫氟酸只熔解鍍膜材料而不侵蝕 到玻璃，再者氫氟酸屬強酸易對人體及環境造成傷害，另 Φ 外右要形成多色的圖案片·，亦需將多片的玻璃進行膠合， 而使用的黏合材料對於G0B0片的穿透率會有所影響，加 上進行多片玻璃膠合，其所需的治具也相對地加大，且多 片玻璃膠合的方式對於圖案的定位亦會產生偏差，而藉由 膠合所產生的多色圖案片在高功率燈光的使用下亦有脫落 的情形產生。 【發明内容】 因此，本發明人有鑑於上述兩種鍍膜技術的缺失與不 _足對於GOBO片的製造及品質的維持上有所困難，因此 無法符合-般業界的需求，特經過不斷的研究與試驗，終 於务展出一種能改進現有缺失之本發明。 本表明之主要目的係在於提供一種多色光電鍍膜製 私其可直接在單-晶片上呈現多種顏色的圖案，並且所 製作的GOBO片除了穿透性及膜層緻密性提高外，且不會 有，飄移的情形及膠合的問題，使G〇B〇片的品質能有效 工&進而提升產品的品質’可達到提高光電鍍膜片（ 片）的使用性及功能性之目的。 1296613 為達到上述目的，本發明係提供一種多色光電鍍膜製 程，其包括： (一）基材清洗：將在基材上的雜質清除，使基材在 清洗後係具有乾淨之表面，以利於基材在下一流程的進 行； (二）製版印刷：將經由清洗過的基材，藉由製版印 刷的定位方式將所需的圖案反白印刷在基材上，使所需的 _ 圖案藉由印刷的方式而覆蓋於印刷油料下； (二）鍍膜··將經製版印刷後的基材放置於鍍膜機中， 並經由鍍膜方式在基材上鍍上所需顏色的膜層；以及 (四）印刷油料清洗：在經由鍍膜後的基材上進行印 刷油料的清洗，使覆蓋在印刷油料下的圖案經清洗後能產 生GOBO的效果。 經由上述之製程即可得單一顏色的G〇b〇片，而重複 第（一）、（二）及（四）的流程可在單一基材上得到多 鲁色之GOBO效果。 經由上述的流程所製造出的單色G〇b〇片晶或多色 GOBO片，其鍍膜的強度穩定不會有熱飄移現象產生且穿 透率高，且因在單一基材上得到多色效果的圖案，可避免 需藉由多片玻璃膠合方式所造成的膠合與遇熱脫落之問題 與缺失，且本發明的製造方式能大幅降低對環境的污染及 作業人員的傷害，另本發明之產品不單只應用在舞台燈光 技術上，在光電工業元件上也有應用空間像投影機元件， 掃瞄器元件等，有助於降低成本並提升合成產率，提升業 1296613 界產量之可行性，具有極大之產業利用價值。 - 【實施方式】 本發明中使用之名詞「GOBO」意指一種成型於玻璃 專基材上的圖案產品’本發明係關於一^種多色光電鑛膜製 程及其產品。而光學薄膜應用於彩色晶、片方面，係主要的 技術是藉由顏色疊加的性質，如第五圖所示者，使印刷的 二原色（CMY )中的青綠色（Cyan )、品紅色（Magenta ) φ 及黃色（Yell〇w)的疊加方式以產生其他不同的顏色，例 如藉由青綠色（Cyan )與品紅色（Magenta )的疊合可產 生藍色（Blue) (C+M=B)、而青綠色（Cyan)與黃色 (Yellow)的疊合可產生綠色（Green) (c+Y=G)及黃 色（Yellow )與品紅色（Magenta )的疊加會產生紅色（Red ) (Y+M=R)，其中紅色（Red)、綠色（Green) Green 及藍色（Blue )即為光的三原色（RGB )，而本發明係基 於顏色疊加的特性進行應用，本發明係關於一種多色光電 φ 鍵膜製程以及經由其製程所產生的成品，為能詳細瞭解本 創作的技術特徵及實用功效，並可依照說明書的内容來實 施’玆進一步以圖式（如第一至四圖）所示的較佳實施例， '詳細說明如后： 該多色光電鍍膜製程係其主要係包含： (一）基材清洗：主要係欲將在基材上的雜質清除， 而本發明主要係藉由超音波震盪的方式對基材進行清洗， 使吸附在基材上的雜質經由超音波的震盪’使雜質能脫離 基材的表面，又基材在清洗後係具有乾淨之表面，以利於 1296613 其中本發明所使用之超音波清洗 限公司所生產的HC-7206F型的 基材在下一流程的進行， 儀器可為兆同企業股份有 超音波洗淨器； (二）製版印刷：將經由超音波清洗過的基材，藉由 製版印刷的方式將所需的圖案反白印刷在基材…經由The relative force is large and a plurality of pieces of glass are glued on the eve, and the required fixtures are also biased. The way of glazing glass bonding is to produce a pattern of 'patterns' and the multi-color pattern sheets produced by gluing are at high power. The use of the light will fall off under the use of the light, and the laser engraving equipment is more expensive, and the cost is the highest. Therefore, although the GOBO product can be produced as long as the relevant laser etching device is available, the production cost is high. Easy to damage =, so although it can produce G0B0 effect products, but can not make mouthwash GOBO 〇 (2) agent etching (Etching) · This is the most commonly used method in the industry, this method Mainly by the chemical (hydrofluoric acid; Η. will melt coating materials such as titanium dioxide (TiQ2) and: oxygen cut (Si〇2) and so on can not dazzle the nature of the printing oil to make A curry, due to the use of rot The way, the power can't be the same as the coating condition, the lower output power must be used' and the low power output will cause the formed film to be dense! The lack of heat will cause the phenomenon of heat transfer. gas Acid can also cause corrosion to 7 substrates such as glass. Therefore, when the parameters such as etching temperature, concentration, and daytime are not well controlled, the glass substrate will be atomized, and the uncoated region will be poorly transmissive. Although the cost of chemical etching is relatively low, the text is limited to the quality of the film. When the compactness of the film is low, the drug 7 1296613 'is easier to etch the pattern on the wafer, but the use of the wafer will be ^ The phenomenon of heat drift, and when the denseness of the film is better, the difficulty of melting the coating material of hydrofluoric acid is improved, and although the etched wafer has no heat drifting in use, it is easy to make the substrate because it is difficult to etch. Damaged, and then the film will fall off when the film is used at high temperature. Therefore, the biggest difficulty in the etching of the drug is how to control the hydrofluoric acid to melt only the coating material without eroding the glass, and the hydrofluoric acid is easy to be The human body and the environment cause damage, and the Φ outside should form a multi-color pattern sheet. It is also necessary to glue multiple pieces of glass, and the adhesive material used will have a shadow on the G0B0 film. In addition, when multiple sheets of glass are glued, the required fixtures are relatively enlarged, and the manner in which multiple sheets of glass are glued also deviates from the positioning of the pattern, and the multicolor pattern sheet produced by gluing is high. Therefore, the inventors of the present invention have difficulty in manufacturing and maintaining the quality of the GOBO sheet in view of the lack of the above two coating techniques. In line with the needs of the industry, after continuous research and experimentation, the invention has finally been developed to improve the existing defects. The main purpose of this indication is to provide a multi-color optical plating film which can be directly used in single-wafer. The pattern of the multi-color is presented, and the produced GOBO sheet has the advantages of penetrability and denseness of the film layer, and there is no problem of drifting and gluing, so that the quality of the G〇B sheet can be effectively worked & And further improve the quality of the product's purpose of improving the usability and functionality of the photo-plated film (sheet). 1296613 In order to achieve the above object, the present invention provides a multi-color electroplating film process, comprising: (1) substrate cleaning: removing impurities on the substrate, so that the substrate has a clean surface after cleaning, thereby facilitating The substrate is processed in the next process; (2) Plate-making: the desired pattern is printed on the substrate by the positioning method of the plate-printing through the cleaned substrate, so that the desired pattern is used. Printing is carried out under the printing oil; (2) Coating · The plated substrate is placed in a coating machine, and the substrate is coated with a film of a desired color by coating; and (four Printing oil cleaning: The printing oil is cleaned on the substrate after coating, so that the pattern covered under the printing oil can be cleaned to produce GOBO. A single color G〇b wafer can be obtained by the above process, and the processes of (1), (2) and (4) can be repeated to obtain a multi-lude GOBO effect on a single substrate. The monochromatic G〇b〇 platelet or multicolor GOBO film produced through the above process has stable coating strength without heat drift and high transmittance, and is multicolor on a single substrate. The effect of the pattern can avoid the problems and lack of glue and heat loss caused by the multi-piece glass bonding method, and the manufacturing method of the invention can greatly reduce the pollution to the environment and the injury of the worker, and the invention The products are not only used in stage lighting technology, but also in the optoelectronic industrial components, such as projector components, scanner components, etc., which help to reduce costs and improve the synthesis yield, and improve the feasibility of the industry's 1296613 production. Great industrial use value. - [Embodiment] The term "GOBO" as used in the present invention means a pattern product formed on a glass substrate. The present invention relates to a multicolor photoelectric film process and a product thereof. While the optical film is applied to color crystals and films, the main technique is to use the color superposition property, as shown in the fifth figure, to make the cyan and magenta in the printed two primary colors (CMY). Magenta ) φ and yellow (Yell〇w) are superimposed to produce other different colors, for example, by superposing Cyan and Magenta to produce blue (C+M=B) ), and the combination of Cyan and Yellow produces green (c+Y=G) and yellow (Yellow) and magenta (Magenta) superimposed to produce red (Y) (Y) +M=R), wherein red, green, and blue are the three primary colors (RGB) of light, and the present invention is applied based on the characteristics of color superposition, and the present invention relates to a multi-color The color photoelectric φ key film process and the finished products produced by the process, in order to understand the technical features and practical functions of the creation in detail, and can be implemented according to the contents of the manual. Further drawing (such as the first to fourth figures) The preferred embodiment shown, 'detailed description as follows: the polychromatic light The coating process mainly includes: (1) Substrate cleaning: mainly to remove impurities on the substrate, and the present invention mainly cleans the substrate by ultrasonic vibration to adsorb on the substrate. The impurities on the upper surface of the substrate can be separated from the surface of the substrate by ultrasonic vibration, and the substrate has a clean surface after cleaning to facilitate 1296613, wherein the HC-7206F produced by the ultrasonic cleaning company used in the present invention is used. The type of substrate is carried out in the next process, and the instrument can be an ultrasonic cleaner for the company of Siutong; (2) Plate-printing: the substrate to be cleaned via ultrasonic, which will be required by plate printing The pattern is printed in reverse on the substrate... via
印刷的方式係將印刷油料覆蓋於所需的圖案上，並藉由對 基材以4點疋位的方式進行印刷，故可有效地且準確在所 需的圖案上進行印刷油料的印刷與m中印刷油料可 边、、丄密 · (二）鍍膜：在基材上鍍膜的方法很多，一般可分為 液悲成膜法及氣態成膜法兩種，其中氣態成膜法主要可分 為化學蒸鍍（Chemical Vapor Deposition ; CVD)與物理蒸 鍍（Physical Vapor Deposition ; PVD)等方式，其中為配 合批次量的生產，所以一般常利用物理蒸鍍的方式進行鍍 膜’其中物理蒸鍍的方式有熱蒸發蒸鍍法（Thermai • EvaP〇ration DeP〇siti〇n)、電漿濺鍍法（Plasma Sputtering Deposition )及離子束錢鍍法（i〇n Beam SputteringThe printing method covers the printing pattern on the desired pattern, and by printing the substrate in a 4-point position, the printing of the printing oil can be efficiently and accurately performed on the desired pattern. The printing oil can be edged and smeared. (2) Coating: There are many methods for coating on the substrate. Generally, it can be divided into two methods: liquid sorrow film formation and gas film formation. The gas film formation method can be mainly divided into two. Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD), etc., in order to match the batch production, it is usually carried out by physical vapor deposition. The methods include thermal evaporation (Thermai • EvaP〇ration DeP〇siti〇n), plasma sputtering (Plasma Sputtering Deposition) and ion beam deposition (i〇n Beam Sputtering).
Deposition )三大類，本發明係以能更進一步改善膜質的 離子助鍍（Ion assisted Deposition ; IAD )的鍍膜方式進 行鍍膜’此種鍍膜方式係藉由離子使鍍膜材料的原子（分 子）沉積在基材表面時能提高膜層的緻密性，使基材上所 形成膜的品質提高，首先係將經製版印刷後的基材放置於 鍍膜機中，並經由離子助鐘（Ion assisted Deposition ; IAD ) 的方式在基材上鍍上所需顏色的膜層，其膜層的厚度在〇· 1296613 2〜Ο . 3 # m之間，而圖案因覆蓋在印刷油料下，所以在 -鍍膜的過程中不會有鍍膜的情形；以及 (四）印刷油料清洗··此方法主要是應用特殊油料和 基材之間假性附著的特性，在經由鍍膜後的基材上進行印 刷油料的清洗，使覆蓋在印刷油料下的圖案經清洗後能產 生GOBO的效果，而且在清洗時只需用一般的水即可，所 以膜層和基材不會因清洗而產生損傷現象，如此一來可避 Φ 免雷射雕刻法及藥劑蝕刻法對基材所造成模糊的現象。 經由上述的（一）、（二）、（三）及（四）的流程 後可在基材上形成單一的顏色的GOBO片。 若將上述（二）、（三）及（四）的流程重複製作， 即可在單一的基材上製作出多色的Gobo效果。 下列實施例用於示範說明本發明。這些實施例不以任 何方式意欲限制本發明之範圍，只用以指示如何實施本發 明的製程與方法。 # 實施例一：單色圖案片（1 0 )之製作（如第一 A圖、 第一B圖及第二圖所示） 第一步··將基材（1 1 )以超音波方式清洗乾淨。 苐一步··將所需要的圖案（1 3)反白印刷在基材（1 1 )上。 ’ 第二步··以IAD鍍膜方式在基材（1 1)上鍍上所需 顏色（1 2 )(如青綠色（Cyan))。 第四步：清洗印刷在基材（1 1 )上的印刷油料。 實施例二··多色圖案片（2 0 )之製作（如第三A圖、 12 1296613 第三B圖及第四圖所示） 第一步··將基材（2 1 )以超音波方式清洗乾淨； 第二步：將基材（2 1 )上欲形成品紅色（Magenta)、 (Red )等顏色的位置上，以油料 黃色（Yellow )及紅色 印刷覆蓋； 第三步：以IAD方式鍍上所需顏色（2 2 )(如青綠 色（Cyan)) φ 第四步··將印刷油料清洗乾淨； 第五步··將基材（2 1 )上欲形成藍色（Blue )、青 綠色（Cyan )及品紅色（Magenta )等顏色的位置上，以 印刷油料印刷覆蓋； 第六步：以IAD方式鍍上所需顏色（2 3 )(如黃色 (Yellow )) 第七步：將印刷油料清洗乾淨； 第八步··將基材（2 1 )上欲形成黃色（Yellow)、 • 青綠色（Cyan)及綠色（Green)等顏色的位置上，以油 料印刷覆蓋； 第九步··以IAD方式鍍上所需顏色（2 4 )(如品紅 色（Magenta )); 第十步··將印刷油料清洗乾淨。 而經由上述的流程所製作出的G〇B〇片，係具有下列 的優點： 1·可提同生產篁。（以Dia.27為例，一鍋可生產 816PCS。），且高功率之離子輔助蒸鍍（IAD)所形成的 13 1296613 薄膜緻密性佳，不會有熱飄移現象產生，且鍍膜時不會對 膜層有所損傷，所以膜層不會脫落的現象。 2 ·以往業界所使用的GOBO >|，僅可呈現單一顏色， 而本發明可在單一圖案片上以局部方式呈現不同的顏色， 使舞台燈光的應用上更能呈現生命力及活力，且在單一基 材上錢以多種顏色，是製程穩定度的表現。 3·因將多種顏色鍍於單一的基材（如玻璃）上，與一 _ 般藉由膠合的GOBO片相比其成本可降低，且G〇B〇片在 高功率的燈光下使用不會有脫落的現象。 4 ·環境測試之各項項目，經工研院量測中心試驗，試 驗片之結果皆良好未受損。 5 ·本發明的製造流程，可減少以往製造方式所產生的 環境污染及作業人員的作業過程傷害。 6 ·所生產的GOBO多色圖案片不單只應用在舞台燈光 技術上，在*電工業元件上也有應用㈣像投影機元件， _掃晦器元件等，有助於降低成本並提升合成產率，提升業 界產量之可行性，具有極大之產業利用價值。 事實上，在實施本發明之已述模式方自，而根據本發 明所作之不同修正及變化對於熟習該項技術者而言，均顯 然=會偏離本發明的範圍與精神，亦被涵蓋於下列申請專 利範圍之内’雖然本發明已敘述特定的較佳具體事實，必 須瞭解的是本發明不應被不當地限制於該等特定具體事實 上而本文中所引述之文獻均以參考資料的方式併入本 14 1296613 【圖式簡單說明】 第一 A圖係本發明單色晶片之平面圖。 第- B圖係本發明之單色晶片樣品之製作流程圖。 第二圖係本發明之單色晶片沿2·2線之側視剖面圖。 第三Α圖係本發明多色晶片之平面圖。 第三B圖係本發明之多色晶片樣品之製作流程圖。 第四圖係本發明之多色晶片沿4_4線之側視剖面圖。Deposition) In the three categories, the present invention is applied by means of an ion-assisted plating (IAD) coating method which can further improve the film quality. This coating method is to deposit atoms (molecules) of the coating material on the substrate by ions. When the surface of the material is used, the density of the film layer can be improved, and the quality of the film formed on the substrate is improved. First, the plated substrate is placed in a coater and passed through an Ion assisted Deposition (IAD). The method is to apply a film of the desired color on the substrate, the thickness of the film layer is between 〇·1296613 2~Ο. 3 # m, and the pattern is covered under the printing oil, so in the process of coating There is no case of coating; and (4) Printing oil cleaning · This method is mainly to apply the characteristics of pseudo-adhesion between special oil and substrate, and to clean the printing oil on the substrate after coating. The pattern under the printing oil can be cleaned to produce GOBO effect, and only ordinary water can be used for cleaning, so the film layer and the substrate are not damaged by cleaning, so One can avoid the phenomenon that the Φ-free laser engraving method and the chemical etching method cause blurring on the substrate. A single color GOBO sheet can be formed on the substrate via the above-described processes (1), (2), (3), and (4). If the processes of (2), (3), and (4) above are repeated, a multi-color Gobo effect can be produced on a single substrate. The following examples are intended to illustrate the invention. These examples are not intended to limit the scope of the invention in any way, but are merely intended to indicate how the process and method of the invention can be practiced. #Example 1: Production of monochrome pattern sheet (10) (as shown in Figure A, Figure B and Figure 2) Step 1 · Ultrasonic cleaning of the substrate (1 1 ) clean. Further, the desired pattern (1 3) is reversely printed on the substrate (1 1 ). 'Step 2 · Apply the desired color (1 2 ) (such as Cyan) to the substrate (1 1) by IAD coating. The fourth step: cleaning the printing oil printed on the substrate (1 1 ). Example 2··Production of multicolor pattern sheet (20) (as shown in Fig. 3A, 12 1296613, Fig. 3 and Fig. 4) Step 1·Using the substrate (2 1 ) as an ultrasonic wave The method is cleaned; the second step is to place the substrate (2 1 ) on the position of magenta (Magenta), (Red) and the like, and cover with yellow (Yellow) and red printing; Step 3: IAD The desired color is plated (2 2 ) (such as Cyan) φ The fourth step · Clean the printing oil; Step 5 · Make the blue (Blue) on the substrate (2 1 ) In the positions of colors such as Cyan and Magenta, printed with printing oil; Step 6: IAB is applied with the desired color (2 3 ) (such as yellow). : Clean the printing oil; Step 8 · Cover the substrate (2 1 ) with yellow (Yellow), • Cyan and Green (Green) colors, and cover with oil; Nine steps · Ion plated with the required color (2 4 ) (such as magenta (Magenta)); Step 10 · Wash the printing oil. The G〇B 制作 film produced through the above process has the following advantages: 1. It can be produced in the same manner. (In the case of Dia.27, 816PCS can be produced in one pot.), and 13 1296613 film formed by high-power ion assisted vapor deposition (IAD) has good compactness, no heat drift, and will not be coated. There is damage to the film layer, so the film layer does not fall off. 2 · GOBO >| used in the industry can only present a single color, and the present invention can present different colors in a local manner on a single pattern sheet, so that the application of stage lighting can be more vital and vital, and in a single The money on the substrate is in a variety of colors and is a manifestation of process stability. 3. Due to the plating of multiple colors on a single substrate (such as glass), the cost can be reduced compared to a GOGO sheet that is glued, and the G〇B sheet is not used under high power lighting. There is a phenomenon of falling off. 4 · The various items of the environmental test were tested by the Institute of Engineering and Measurement Center, and the results of the test were good and intact. 5. The manufacturing process of the present invention can reduce environmental pollution caused by conventional manufacturing methods and workmanship damage of workers. 6 · The GOBO multi-color pattern film produced is not only used in stage lighting technology, but also in *Electronic industrial components (4) like projector components, _broom components, etc., which helps to reduce costs and improve the synthesis yield. To enhance the feasibility of the industry's output, with great industrial utilization value. In fact, the various modifications and variations of the present invention are apparent to those skilled in the art of the present invention. Within the scope of the patent application, although the present invention has been described in terms of specific preferred specific embodiments, it is to be understood that the invention should not be construed as being limited to the specific details. Incorporation 14 1296613 [Simple Description of the Drawings] The first A is a plan view of a monochrome wafer of the present invention. Figure-B is a flow chart for the fabrication of a monochrome wafer sample of the present invention. The second drawing is a side cross-sectional view of the monochromatic wafer of the present invention taken along line 2·2. The third drawing is a plan view of the multicolor wafer of the present invention. The third B is a flow chart for the fabrication of the multicolor wafer sample of the present invention. The fourth drawing is a side cross-sectional view of the multicolor wafer of the present invention taken along line 4-4.
第五圖係顏色疊加性質圖。 附件一、二及五係為本發明之多色光電鍍臈製作流程 及應用原理示意圖。 【主要元件符號說明】 (1 〇)單色圖案片 (11) 基材 (12) 鍍膜層（青綠色（Cyan)) (1 3 )圖案 (2 〇 )多色圖案片 (21) 基材 (22) 鍍膜層（青綠色（cyan)) (2 3 )鍍膜層（黃色（Yeilow)) (24)鍍膜層（品紅色（Magenta)) 15The fifth figure is a color superposition property map. Annexes 1, 2 and 5 are schematic diagrams of the production process and application principle of the multi-color electroplating crucible of the present invention. [Main component symbol description] (1 〇) Monochrome pattern sheet (11) Substrate (12) Coating layer (Cyan) (1 3 ) Pattern (2 〇) Multicolor pattern sheet (21) Substrate ( 22) Coating layer (cyan) (2 3 ) Coating layer (Yeilow) (24) Coating layer (Magenta) 15