TWI294044B - Method for manufacturing color filter - Google Patents

Description

1294044 _ __ __ ........................... - -"" V. Description of invention (1) [Technical field to which the invention belongs The present invention relates to a method of fabricating a color filter, and more particularly to a method of fabricating a color filter having a multilayer film interference structure. [Prior Art] A liquid crystal display is a passive display device. In order to achieve the effect of color display, it is required to provide a color filter, which converts the passed white light into red, green and blue primary color beams, and cooperates with the thin film. Other elements such as a Thin Film Transistor (TFT) layer and a liquid crystal between them are used to achieve the effect of displaying different color images. The color filter is generally disposed between the upper substrate and the indium tin oxide (ITO) electrode, and mainly includes a black matrix and a colored layer. At present, the processes for manufacturing color filters mainly include the following methods: Dyeing, Etching, pigment dispersion, electrophotography, printing, and dry film transfer. 'Color method and residual method are based on dyes as the main light-transmitting material. The dyes have many advantages such as various types, uniform hue, high dyeing power, high color saturation and high penetration. But the light resistance and heat resistance are not good. These two methods have been gradually replaced by pigment dispersion and electrophoresis using pigment as the main filter material.匕 ☆ The material of the pigment dispersion method is a pigment photoresist formed by mixing the pigment dispersion after polishing with a photosensitive resin solution, and the pigment dispersion method utilizes lithography to achieve silly technology to achieve high resolution and free configuration of pixels. The light resistance and heat of the pigment are preferred, but the flatness and uniformity are not easily controlled, and the production cost is high. The electrophoresis method is to pass an aqueous solution of an ionic resin and a pigment to an electrophoresis side.

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The electric current is deposited on the substrate, and the surface flatness method is freely arranged for the halogen. ‘But it’s limited by the electrode. There is no printing method to print the ink on the money substrate by screen printing, lithography, and direct printing. The cost is low, and the plate or gravure is not good. - Insufficient accuracy, flatness, fat solution, coating on plastic, hard baking, etc. The dry film transfer method is applied to a pigment-containing photosensitive film, dried to form a dry film, and exposed, monochromatic pattern. ~ Industry into the center wave case, the three intervals. After changing the dry-through and reflection than the above-mentioned recovery rate and better, the water vapor is collected slowly, and it is also proposed that the thermal evaporation length is the red, green and blue primary color multi-layer interference filter pattern. The color filter function of the color filter controls the characteristics of the film and the thickness of the film to achieve the effect of the light. The color purity of the color filter made of the color pigment is better than that of the above-mentioned prior art. The substrate is limited to the glass substrate, and its optical characteristics are changed. Splashing on ionized charging may cause multiple layers of misalignment of discharge breakdown or sputtering. It is possible to use a multi-layer interference sheet of different wavelengths to have heat resistance and thermal evaporation, and the plating method of the coating film is easy to use on the substrate. The shape interference filter and the black matrix interfere with the principle, and the light passing through the color filter of the incident light penetrates the color reproducibility. The method needs to be loose at high temperature, and it is easy to absorb. The film formation speed is lower than that of the film surface.

SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a multilayer film color filter which can be used under low temperature conditions.

1294044 V. INSTRUCTION DESCRIPTION (3) A method for manufacturing a color filter, comprising the steps of: providing a substrate and a mask having a pre-pattern, forming a black mask layer on the substrate; providing a predetermined a second mask of the pattern, the first multilayer film interference layer is formed on the substrate by an ion beam electron evaporation method; a third mask having a predetermined pattern is formed on the substrate by ion beam electron evaporation method a second multilayer film interference layer; a fourth mask having a predetermined pattern is provided, and a third multilayer film interference layer is formed on the substrate by an ion beam electron evaporation method. Compared with the prior art, the method for manufacturing a color filter of the present invention uses an ion beam electron evaporation method to form a multilayer film interference filter pattern on a substrate, and the ion beam electron evaporation method uses an electron source to emit an electron pair coating material. The vapor deposition is performed and the coated substrate is irradiated by an ion beam to improve the coating quality. The method can be carried out in a low temperature environment, and the color filter and the light substrate of the display are advanced toward the optical plastic, and the discharge damage is not generated due to the neutralization of the plating ions and electrons. [Embodiment] Please refer to the first figure for a schematic diagram of the structure of an ion beam electron vapor deposition coating machine. The ion beam electron vapor deposition coating machine mainly comprises a vacuum chamber 1 , an electron source 12 , an ion source 14 , a coating material placing device 16 , a substrate placing device 18 , a quartz oscillation device 13 and a wavelength interference device 15 . Under the vacuum strip, the electron source 12 emits electrons by accelerating the impact and heating the coating material 192 of the coating material placing device 16 to convert it from a solid phase to oxygen and deposit it on the substrate placing device 18. The substrate 17 and the ion=worker ions illuminate the growing film to improve the film quality by collision.

Page 7 1294044 V. INSTRUCTION DESCRIPTION (4) -- The quartz oscillator 13 and the wavelength interference device 15 are used to monitor the thickness of the coating. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The method for manufacturing the color filter of the present invention is as follows: Referring to the first and second figures, a substrate 6 is provided, which may be made of glass or plastic. First, the substrate 6 is cleaned to remove inorganic or organic substances on the surface; then a mask 21 is provided, and the mask 21 has a designed pattern, and the mask 21 is aligned with the substrate 6〇, The ion beam electron vapor deposition is carried out in an ion beam electron evaporation key coating machine. The target used in this step is chromium, and the electrons are generated by a hot electron source. The energy of the beans is 5 15 Kt^# (eV), and the energy can be 50-150 eV. Vacuum to 1 0 6 Torr (T〇rr). During the evaporation process, the temperature inside the vacuum chamber can be maintained at 35-85 degrees Celsius (°c). For the case of using a glass substrate, the temperature is lower than the transition temperature of the glass. After the coating is completed, a black matrix layer 31 is formed on the surface of the substrate 60. Referring to the first and third figures, a predetermined pattern of the photomask 23' is arranged to be aligned with the substrate 6', wherein the opening area of the mask is aligned with the surface of the specific area of the substrate 60, The unopened region of the mask 23 conceals the black matrix layer 31. The ion beam electron evaporation step is performed. At this time, the selected dry material is cerium oxide (Si〇2), and the coating thickness is pre-according to the optical The theoretical data obtained by the quasi-obtained data is formed by a quartz oscillator device 丨3 or a wavelength interference device. The coating rate is 〇·5 nm/s, and a specific Μ is formed on the surface of the substrate 6: ^ ^ . X < The difference between the layer thickness of the oxidized stone layer and the theoretical data is less than that of the soil 3〇/〇°. The selected material is replaced by bismuth pentoxide (1^2〇5), and the coating rate is

Page 8 1294044 V. Description of invention (5) 0. 7 n in / s, Ion gold mine JZL 'ψ /〇_ ^ ^ . ^ t After the evaporation of the scorpion, another surface is formed on the surface of the cerium oxide layer. , B layer. The above two operations are repeated, and the dielectric layers having a specific thickness are sequentially formed on the substrate μ, and the film thicknesses of the first-multilayer film interference two-ice-multilayer film interference layer 33 are different. According to the principle of ^ 0 and /y, after the light is incident, only the light line of the red light band can be transmitted: the color area of the color filter can be displayed. Referring to the first and fourth figures, a reticle with a predetermined pattern is provided to be aligned with the substrate 60, wherein the open area of the reticle 25 is aligned with a specific area of the surface of the substrate 60. The unopened area of the mask 25 blocks the black matrix layer 31 and the first multilayer film interference layer 33. Performing an ion beam electronization step 'The operation process of the ion beam electron evaporation step is the same as the above-described formation, the sputtering step of the color filter showing the red region is the same, and after the evaporation is completed, the vapor deposited film layer constitutes the first The two-layered film interference layer 35, by controlling the number of coating layers and the thickness of the coating film, transmits only the light of the green light band, which is a green region of the color light-receiving sheet. Referring to the first and fifth figures, a predetermined pattern of the mask 27 is provided to be aligned with the substrate 6〇, wherein the opening area of the mask 27 is aligned with a specific area of the surface of the substrate 60. The unopened region of the mask 27 blocks the black matrix layer 31 and the first multilayer film interference layer 33 and the second multilayer film interference layer 35. Performing an ion beam electron evaporation step, which is the same as the vapor deposition step of forming the red region in the color filter described above, and the vapor deposited thin film layer constitutes the third multilayer film interference layer 37 after the completion of the distillation. By controlling the number of coating layers and the thickness of the coating, only the light in the blue light band is transmitted, which is a blue color region of the color filter.

1294044 V. INSTRUCTION DESCRIPTION (6) The above-described method for producing a color filter of the present invention. In the method of manufacturing a color light-receiving sheet, the film layer is layered on the substrate 60 by two methods, and the layer 35 is spaced apart from the first step, and the black matrix 31 is spaced apart. According to the number of layers of the multilayer film, it is possible to obtain a film with a good transparency of the optical soil M si: and a coating film of the multilayer film + M & daylight film, after the light is incident, the red layer can be displayed in the interference layer of the layer film. Green and blue light. The method for manufacturing the separate color filter is not limited to the above-mentioned embodiment or nitrogen: the material may be an oxidized material of the turn or both, and the lithography and the method are used; Different materials (2); into; film: quality only need to be used, can also use titanium dioxide (spear \ five emulsified button and dioxide film material. 2) or bismuth pentoxide (Nb2 〇 5) and other plating system The invention is in accordance with the application. However, the above mentioned:: Patent requirements, the scope of the inventions proposed in accordance with the law is not implemented as above;: The preferred implementation of the Ming, the person of the 'in the case of the aid of the case is limited to the case Skills!· It should be included in the following application; equivalent modifications or changes are made on page 10, 1294044. Brief Description of the Drawings - Figure is a schematic diagram of the structure of the ion beam electron evaporation coating machine of the present invention. The first discussion system is a method for manufacturing a color filter and a light film to evaporate a black matrix layer. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing a method of manufacturing a color light-passing sheet of the present invention, a first multilayer film interference layer, and a fourth aspect of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 3 is a schematic diagram of a third region of vapor deposition of a color filter of the present invention. [Main component symbol description] Vacuum chamber 10 Electron source 12 Quartz oscillation device 13 Ion source 14 Wavelength interference device 15 Bond film material placement device 16 Substrate placement device 18 Coating material 19 Photomask 21, '23, ^ 25 , 27 Black matrix layer 31 First multilayer film interference layer 33 Second multilayer film interference layer 35 Multilayer film interference layer 37 Substrate 17, 60

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Claims (1)

1294044 6. Patent application scope 1 · A method for manufacturing a color filter, comprising the steps of: providing a substrate and a first mask having a predetermined pattern, forming a black matrix layer on the substrate; providing a predetermined pattern a second mask, the first multilayer film interference layer is formed on the substrate by an ion beam electron evaporation method; a third mask having a predetermined pattern is provided, and an ion beam electron evaporation method is used to form a first layer on the substrate a two-layer film interference layer; a fourth mask having a predetermined pattern is provided, and a third multilayer film interference layer is formed on the substrate by an ion beam electron evaporation method. 2. The method of producing a color filter according to claim 1, wherein the substrate is a glass substrate. The method of manufacturing a color filter according to claim 2, wherein the vacuum chamber temperature of the ion beam electron evaporation method is lower than a transition point temperature of the glass substrate. 4. The method of manufacturing a color filter according to claim 1, wherein the substrate is a plastic substrate. 5. The method of producing a color filter according to claim 4, wherein the ion beam electron evaporation method has a vacuum chamber temperature of 3 5 to 8 5 t:. The method of manufacturing a color filter according to claim 1, wherein the first, second, and third multilayer film interference layers are red, green, and blue band pass interference filter layers, respectively. The method of manufacturing a color filter according to claim 1, wherein the first, second, and third multilayer film interference layers are staggered 1294044. The patent application scope is separated from each other by a black matrix. 8. The method of manufacturing a color filter according to claim 1, wherein the coating thickness of the multilayer film interference layer is monitored by a quartz oscillation method. The method of fabricating a color filter according to claim 1, wherein the coating thickness of the multilayer film interference layer is monitored by an optical interference method. 10. The method of producing a color filter according to claim 1, wherein the difference between the coating thickness of the multilayer film interference layer and the theoretical data does not exceed ± 3%. The manufacturing material of the color filter according to the invention of claim 2, wherein the multilayer film interference layer comprises at least two kinds of refractive indices different from each other. The manufacturing method of the sheet 1 wherein the multilayer film interference layer is made of f-type bismuth and pentoxide Fashen! ίli, the coating rate of the ruthenium dioxide produced by the 12th item of the color smear of the escaping film is 0.5nm/s, and the bismuth pentoxide is 14匕;:: rate is °.Ws' The rate of forging film is determined by the quartz vibration i4.m range of the color light film described in item 11 of the square light, the multilayer film dry, the material of the f layer is titanium dioxide, and the oxidation is 1. 5. Any combination of at least two of Wuhuahua. ^ 1 Manufacturer of the color filter described in item 1 1294044 6. The patent application scope method, wherein the black matrix layer is produced by an ion beam electron evaporation process. The method of manufacturing the color filter of claim 15, wherein the black matrix layer is made of one of chromium, molybdenum, chromium oxide, molybdenum oxide, chromium nitride or molybdenum nitride. . The method of producing a color filter according to claim 1, wherein the black matrix layer is produced by a lithography process. The method of producing a color filter according to claim 17, wherein the material of the black matrix layer is a black photosensitive resin material. The method of producing a color filter according to claim 1, wherein the steps of forming the first, second, and third multilayer film interference layers are performed in a vacuum chamber. The method of manufacturing a color filter according to claim 19, wherein the vacuum chamber of the ion beam electron evaporation method has a vacuum of 10-6 Torr. 21. As described in claim 1 A method of manufacturing a color filter, wherein the electrons of the ion beam electron evaporation method are generated by a hot electron source. 22. The method of producing a color filter according to claim 21, wherein the electron energy of the ion beam electron evaporation method is 5K-15KeV. The method of producing a color filter according to claim 1, wherein the ion beam of the ion beam electron evaporation method is one of or a mixture of argon ions and oxygen ions. The method of manufacturing a color filter according to claim 23, wherein the ion beam electron evaporation method has an ion beam energy of 50-150 eV. II··