TWI292435B - Slurry composition for polishing color filter - Google Patents

Description

F.doc/006 IX. Description of the Invention: [Technical Field] The present invention relates to a polishing liquid, and more particularly to a polishing liquid composition for polishing a color filter. [Prior Art] With the dramatic advancement of computer performance and the high level of Internet and multimedia technology, the transmission of uranium image information has mostly changed from analog to digital transmission. ^ In order to cope with modern lifestyle, video or video equipment The volume is also becoming thinner and thinner. The traditional cathode ray display (CRT), although still has its advantages, but due to the structure of the internal electron cavity, the display is bulky and takes up space, and there are still problems such as round-ray damage to the eye. Therefore, the flat panel display (FlatPanelDisplay) developed by optoelectronic technology and semiconductor dream and technology, such as display (LCD), organic light-emitting display (〇LED) or plasma display = (PlasmaDisplaypand, PDP), has gradually Become a monitor: mainstream. At present, the liquid crystal display is developing towards full color, large size and high riding. The liquid crystal display must have color filters (c〇1〇rFilter, CF) to give the color image function of the liquid crystal display TFlf. . The color filter not only affects the color of the display panel, but also affects the panel (4) ratio (CQntrast), Luminance, surface reflection and other properties. The liquid crystal can not display color images, mainly relying on color filters; and the color filters are coated with red, green and blue light-blocking photoresists. The back source passes through the liquid crystal and drives the 1C lion to become a gray-scale light source. The light source then passes through the color and blue light, and finally mixes in the human eye to form a color shadow i. The color filter is the main 12924]3⁄4 twf.doc/006 component of the Thin-Film Transistor (TFT) panel. In terms of material cost, the color filter is the largest part of the panel cost. The component is higher than the backlight module and drive 1C. FIG. 1 is a schematic structural view of a conventional color filter. As shown in FIG. 1 , the basic structure of the color filter is a glass substrate (Giass Substrate), a black matrix (BlackMatrix) 102, a color layer 104a to 104c, and a protective layer (OverCoat). 106 and an indium tin oxide (ιτο) transparent conductive film 108. At present, the thickness of the glass substrate 100 has been gradually reduced to 0.63 mm or 〇.55 mm to reduce the weight of the large-sized LCD module. The black matrix 102 is mainly for isolating the three colors of the color layers i〇4a~l〇4c (RGB), and is the key to improving the color contrast. Black matrix 102 generally requires low reflection, the lower the reflection, the better the color performance. The black matrix 1〇2 material is chrome and bismuth. There are more than ten methods for manufacturing color filters. The more commonly used techniques are pigment dispersion method, dyeing method, printing method and electro-drawing method. Among them, the pigment dispersion method has high 4 Lu Lai, 咼 resolution, and resistance. Good characteristics such as temperature and temperature are widely used by the industry. The basic composition of the photoresist ink (also known as color photoresist) used for color filter production by pigment dispersion is in addition to pigments, dispersants, additives, bonding resins and reactive diluents, and includes photopolymerization. Starter and solvent. The photoresist ink of the red, green and blue primary color-colored materials is generally a negative photoresist of alkaline development. At present, the mainstream manufacturing method of color filters is a pigment dispersion method, and the materials used are mainly pigmentary compounds, and the structure of the pigments is azo, cyanine organic pigments, and various kinds of mixtures. Multi-ring systems use different mixtures from different characteristics, product functions and process considerations. Color filter manufacturing project of pigment dispersion method, including black matrix engineering, 5 129243 each ^ / 〇〇 6 RGB engineering and post engineering. First, the black matrix project is to use a low-reflection two-layer film of chromium oxide/cobalt on a non-alkaline boron glass substrate covered with a protective layer of ruthenium oxynitride as a substrate. This low-reflection two-layer film is called a metal black. Then, a positive photoresist is formed on the light shielding metal layer by spin coating. Then, after irradiating ultraviolet rays through the mask pattern of the black matrix, exposing and developing the photoresist, the light-shielding metal layer is etched to form a color matrix pattern. After the pattern of the black matrix is formed, RGB engineering is performed next; the RGB project is a process of forming R, G, and B three-color patterns in the opening. = First apply a color resist that is colored red (R) by spin coating, pass a pattern mask with r, and then use a material with a wavelength less than 248 nm, _exposure exposure, and then use an alkaline developer. The exposed portion is removed, and the r pattern for the first color is formed and then applied to the post-baked baking at 200 degrees Celsius or more to make the pattern have a good resistance. Next, the red (R) photo-resistance is replaced with a green (G) color photoresist or a blue (B) color photoresist, and the same G pattern and B pattern as in the case of forming the R pattern are repeated. There is a black matrix between each pattern. This is to increase the contrast and avoid the generation of variegated light. In the end, the IT0 transparent electrode layer of the electrode of the TFT auxiliary board is formed, and the color filter is completed. In order to achieve the same effect of optical conversion such as reflectivity and spectral transmittance on the surface of the color filter, the brain filter is completed: Po' ί is flattened (usually using chemical mechanical polishing y 're-entry层 ITOit layer of the electrode layer. As shown in Figure 2, after the R, m it pattern is formed, there is a black matrix between each pattern. According to different specifications, the height of the peak after grinding, ie m , R2, twf.doc/006 B, B2, G1, G2 must be below 5 。. The position of the bottom R, B, G, the amount of grinding after grinding (called rgb i〇ss) must Control is less than 500 A. Λ However, when the color filter is planarized by chemical mechanical polishing, the compound used in the polishing liquid will cause the chemical change in the material in the filter during the polishing process. After that, there is still room for improvement. /, [Summary of the Invention] In view of the above, the object of the present invention is to provide a color filter liquid composition in the grinding process to reduce the material of the light film; The color filter thus produced is reliable And it has good productivity and yield. Earth pays in chemical surface compensation method to flatten color (four) light and more into - cattle 1 She uses hardness higher than - oxygen;

The ancestors did not discretion and reduced the effects of chemistry. VJ The present invention proposes a color grading sheet, a buffer solution, and an addition of 30. The composition of σ = 疋 is a mixture of abrasive nitrogen compounds. The nitrogen compounds in the composition of rabbit compounds, diamonds, and polishing liquids are hunger, tantalum carbide, carbonized town, carbonized straight, day =, carbonized, and carbon slurry composition t. #选=卜的群群. Chemicals, disfigured titanium, nitriding knows the self-sounding, carbon nitride, nitrogen, grinding liquid, new people slamming, the composition of this compound. The main particle size of the rice is: the particle size distribution of the mouth is less than that of .尔钱蝴蝶 1292 pole twfl.doc / 〇〇 6 96-2-16 to 45 ^ ° percentage, a preferred concentration of 2 to 25 weight percent. Buffer is used to adjust the pH and as a buffered pH solution.纟 纟 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机'Organic acid such as hydrochloric acid or nitric acid can be selected from Gan

The face that has been turned over can be added with the addition of Yang Potassium. The test _ can be hydrogen oxyhydroxide, potassium hydroxide or the like. The additive of the liquid composition contains an interfacial surfactant, and the surfactant is used for the interface potential of the composition to enhance the particle's specific enthalpy value to the extent of ΓΓ, to the mosquito slurry composition. The surfactant is selected from the group consisting of self-emulsified, alkoxy 33 or a mixture thereof, or one of the selected ones, the ammonium salt of Donovan, the salt of the test, and the aliphatic compound. The content of the surfactant in the color calenders, liquid, and 5 is from G 3 to 1 G by weight. The sub-quantity is from 1000 to 5 Torr. According to the choice of the abrasive material, the additive of the polishing liquid composition can be used for the N-methyl coffee, the butyl alcohol, the methyl acrylate, and the n_^ = ratio. The composition, or is selected from the group consisting of thioglycol broth, mono-methylenebispropionamide, polyethylene glycol dimethacrylate, methyl glycol monomethacrylic acid, and Proportionally mixed composition, with a polishing rate and polishing quality. The polishing liquid composition of the present invention is suitable for use in a polishing filter, and in particular, for the color filter Mwfiltei*), it has a good rate of research and development speed rf.doc/006. Further, the color filter polishing liquid composition of the present invention can reduce the reaction with the photoresist material during the grinding process and finely grind due to the addition of the abrasive, thereby causing unnecessary erosion problems. For example, the reliability of the pattern of the color filter can be increased, and the optical components with excellent dimensional accuracy and optical characteristics, and high reliability have the above and other purposes, features and advantages of I Tian Huaming. The 4-inch cattle-best embodiment is described in detail below with reference to the drawings. [Embodiment] The color filter #grinding residue of the present invention refers to a chemical auxiliary agent whose peak assists in grinding. Such a color filter polishing composition can have at least one or a ceraminate composition selected from the group consisting of carbon compounds, diamonds, nitrogen compounds or complexes. If the abrasive is selected from a carbon compound, it may be a group of carbon carbide, boron carbide, stone aging, titanium carbide, tungsten carbide, carbonization, or a mixture thereof. The above abrasives may still be selected from diamonds. If the above-mentioned pureness is selected from a nitrided object, it may be a group of nitrided, carbon nitride, nitrided, titanium nitride, or nitrided. The particle diameter is about 5 nanometers to 5 micrometers, and the concentration of the inventive material in the color filter, light > 5 to 45 weight percent, preferably containing from 2 to 25 weight percent of the abrasive. Due to the strict demand for the purity of the abrasive material due to the manufacture of color filters, 1292 is always lacking. _ Codification, "valve" means from Ρ _ _ ^ such as raw material mis-f and trace treatment of pollutants) less than 100 its performance and use H low training · W _ in pollution to avoid the impact of eight materials is good with The aqueous dispersion of water-based medium f (for example, deionized water) and used as a feed of water can be prepared by using a conventional technique to add a compound to a suitable medium, and the mixture is poured into a suitable medium. And the formation of a suspension state of the dispersion of the positive = the positive value of the liquid, so that the dispersion of the training has a good liquid. The light-receiving sheet-liquid composition includes at least a buffer solution which is used to adjust the color filter group liquid group value, and /Wto sputum or its salt composition is different depending on the abrasive material. The choice of Yiji acid case rounding solution can be 廿-疋 疋 酉夂, hydrochloric acid, nitric acid and so on. The organic acid is 族ί formic acid, acetic acid, propionic acid, malic acid, citric acid, succinic acid and the group of the two groups. For cultivation, the organic acid may be added with potassium nitrate, broken (4) machine-purchased, inorganic salts or a mixture thereof. The buffer solution is more:; the second sub-test can be sodium hydroxide, potassium hydroxide or the like. The content of the cmtti slurry composition is, for example, from ==9. The main value is 2 to 10, more preferably adjusted to pH 5, except that the above-mentioned constituent additives disclosed in the present invention can also be transferred to the present invention to find the polishing liquid composition. These 10 1292435 14649twfl.doc/〇〇6 96 -2-16 Additives include surfactants. The color-cutting filter (4) listening composition includes at least one kind of additive, the length, the ri gamma is stable, the (four) grinding liquid is grinded under the impurity condition, the surface area of the particle is stabilized, and the surface of the slurry is preserved under acidic conditions. The molecular weight of the active agent may be selected from the group consisting of polycarboxylic acids, ammonium salts of polycarboxylic acids, and basic salt group polymers having a molecular weight of, for example, 1 to 5 mm/percent. Fat, the above addition _ can be selected from the N_f buckle ratio,

Dienyl ketone and its composition in a ratiowise ratio, S k from methyl propylamine, N, N, · T-based di-propyl _, polyethylene methoxy polyethylene glycol monomethyl The purpose of the propylene coffee is as follows: the color filter color filter polishing method of the invention is supplied on the surface of the color filter mounted on the polishing table, and the relative motion is made. Grinded. During the grinding process, the surface of the polishing pad and the polishing surface of the substrate are continuously supplied by the pump to be cleaned. (10) After the completion of the color filter in February, the color filter (4) grinding liquid composition, due to the addition of special grinding into a towel, the reliability of the light-receiving material color filter of the money and light material, and then made refined, Accurately sized and $:wf.doc/006 Color dimming module with excellent characteristics and high reliability. The following are the experimental examples m to the experimental example 9, ° ^, J 1 9 ;; and as shown in Table 1. When the polishing liquids of Experimental Example 1 to Experimental Example 9 were prepared, the prepared color filter samples were ground. The polishing results of Experimental Example 1 to Test Example 8 are shown in Table 2.

First of all, it is necessary to measure and record the height of the peaks and valleys of the three colors of RGB 'measured after grinding' to verify the effect of the polishing liquid. Under the premise that RGB Loss must be controlled under 500 people, for the polishing liquid The removal rate is discussed. The experimental conditions of this experiment are as follows: Pressure under the grinding machine 〇·〇3 psi or 0.08 psi Grinding table speed=20 rpm Grinding time=20 sec Grouting flow rate=60ml/min

Then, the polishing rate was calculated by dividing the difference in film thickness between the polishing and the polishing before the polishing time. Among them, the film thickness was measured using a KLATencor P15 surface profiler. , AhG, and AhB represent the average amount of R, G, and B color photoresists, respectively. Next, Experimental Example 1 to Experimental Example 9 and test results will be described. 12 1292 pole twf.doc/006 Table 1 1292 pole twf.doc/006

Table II

Experimental Example pH psi Average Abrasion △hR A/20 sec △hG A/20 sec △he A/20 sec 1 5.0 0.05 259 383 206 2 7.0 0.05 154 211 160 3 9.0 0.05 473 580 384 4 7.0 0.08 1673 2239 1770 5 4.3 0.05 1288 1275 1604 6 5.0 0.05 3686 4697 4258 7 7.0 0.05 2707 3610 2852 8 9.0 0.05 3616 4217 3610 9 5.0 0.03 2674 3128 2828 Experimental example Abrasive buffer solution and interface active agent name, particle size content pH Name 1 Diamond, ~50 nm 0.5 wt% 5.0 Hydrochloric acid 0.01~0.05 wt% or potassium hydroxide 0.01~0.05 wt% and 0.3~1.0 wt% of surfactant · 2 diamonds, ~50 nm 0.5 wt% 7.0 3 diamonds, ~50 Nm 0.5 wt% 9.0 4 diamond, ~50 nm 5 wt% 7.0 5 (new) diamond, ~100 nm 10 wt% 4.3 6 carbonized ground, 0.65 um 20 wt% 5.0 7 carbonized stone, 0.65 um 20 wt% 7.0 8 Carbonization, 0.65 um 20 wt% 9.0 9 (new) Nitriding, 0.65 um 10 wt% 5.0 Experimental Example 1 to 3 13 006 I2924 [^twf.d〇c/ as shown in Table 1 and Table 2: Experimental Example 1 to 3 is a slurry prepared by using 〇·5 wt% of diamond (particle size of about 50 nm) as an abrasive (pH values are 5 〇, 7 〇, 9 分别, respectively) At a pressure of square-〇5 psi (down force), the average amount of grinding 2〇 seconds although other low 'Experimental Example of Production 1 and 3 are required to meet the color of the light sheet process. Figure 3 depicts a scanning electron micrograph (SEM) photo of diamond abrasive particles (0.50 um). 4A and 4B are SEM photographs of the color filter after polishing, using a color filter polishing liquid composition using diamond (50 nm) as an abrasive. As shown in Fig. 4A and Fig. 4B, the polished color filter has hot scratches on the surface and has excellent flatness and extremely low surface roughness. Experimental Example 4 As shown in Table 1 and Table 1: In Test Example 4, a 5 wt% diamond (particle size of about 50 nm) was used as an abrasive to prepare a slurry (ρΗ=7·0) under 〇.〇8pSi. Under the pressure (d〇wn force), the amount of ΔΙ^/ΔΙκϊ/ΔΙιβ was reduced by 20 seconds, which was better than that of Experimental Example 2. Experimental Example 5 As shown in Table 1 and Table 2: Experimental Example 5 is an abrasive of 1% by weight of diamond (having a particle diameter of about 100 nm), and the manufacture and shape of the diamond abrasive are different from those of Experimental Examples 1 to 4, Grinding solution (pH=4.3) 'Under 0.05 psi down force, 20 seconds of ΔΙ^/ΔΙιο/ΔΙιβ grinding amount can meet the requirements of color rate film production. Compared with Experimental Example 1, there was a better performance. Experimental Examples 6 to 8 As shown in Tables 1 and 2, Experimental Examples 6 to 8 were prepared by using 20 wt% of niobium carbide (grain 14 1292 low doc/006 diameter about 0.65 // m) as an abrasive. 5 〇, 7 〇, 9 〇), under the O.OJpsi downforce (d_force), the average 焉/bird gas removal of 2 〇 seconds! It can meet the requirements of color rate film production. The SEM photograph of the carbon stone fossil granules (0.65 um) is shown in Fig. 5, and the shape of the abrasive grains is a sharp polygonal shape, which exhibits excellent cutting force. Fig. 6 is a view showing the color filter sheet after polishing. The figure ' uses a color filter polishing liquid composition having carbonized particles _ as abrasive grains. As shown in Fig. 6, the polished color filter has no scratches on the surface and has better flatness. t Test Example 9 is shown in Table 1 and Table 2: Experimental Example 9 is a 1% wt% cubic nitride stone (CBN 'Cub1CB_Nitride, particle size about 65.65 (4)) as abrasive, abrasive grain thorn j sharp multi-trace , showing the extreme reading power. Prepare the slurry (four) value is not 5.0) 'under the 堡.03 psi of the lower fort force (d〇wn, 2 〇 second level

AhRMhGMhB _ quantity can meet the requirements of color (4) if it is touched. It can be seen from the experimental results that the color filter of the present invention, the grinding test compound, e = the friction between the abrasive and the component, can reduce the process in the process and the photoresist, and the resistance can be turned over, and then the panel can be turned over. The use of brothers. At the same time, the filter can be prevented from being over-grinded, and the brightness is high, the size is precise, and the optical characteristics are excellent. The 3f color filter of the present invention is the slave and the activity of the grinding ship composition grinding period. The color (4) light film 15 129243⁄4 twf.doc/006 is good, and has good productivity and yield. Although the present invention has been fully described above, the present invention, and those skilled in the art, have a few modifications and refinements, and therefore, the scope of the patent application of the present invention is defined.阗田视视 [A brief description of the drawings] Fig. 1 is a schematic view showing the structure of a conventional color filter. FIG. 2 is a schematic structural view of a conventional color filter. Figure 3 is a scanning electron micrograph (SEM) photograph of a diamond abrasive grain (〇·5〇 um). 4A and 4B show a SEM photograph of a color filter after polishing. A color filter slurry composition using diamond (50 nm) as an abrasive grain is used. Figure 5 is a sem photograph of a cerium carbide abrasive grain (〇_65 um). Fig. 6 is a view showing a color filter optical microscope (0M) photograph after polishing. A color filter polishing liquid composition using ruthenium carbide (〇·65 um) as an abrasive grain is used. [Description of main component symbols] 100 · Glass Substrate 102, BM: Black matrix (BiackMatrix) 104a to 104c: ColorLayer 106: Protective layer (〇verCoat) 108: Transparent conductive film R, R1, R2 , B, Bl, B2, G, Gl, G2 ··Location 16

Claims (1)

1292435 14649twfl.doc/006 96-2-16 X. Patent application scope: repair (more) original! 1. Color filter, light film polishing liquid composition, including. New H grinding = the 1 abrasive is selected from It is selected from the group consisting of carbon compounds, diamonds, and ί: : J5, which is composed of the carbon compounds, or a mixture thereof: II. I. Qinhua carbonized crane, aluminum carbide, nitrided, carbon nitride, nitrogen The nucleus is selected from the group consisting of nitriding titanium arsenide, a nitride button or a mixture thereof. The η abrasive is included in the color filter polishing composition to include 0.5 to 45 weight percent; 'It is used to adjust the enthalpy value. The buffer solution is selected from the group consisting of Yi 2 2 and the mixture and its mixture or its salt. The slow liquid level filter is used to grind the content of the synthetic towel. ~ set percentage; and · to additive 'made to correct the surface of the particle at a specific pH, the additive includes an interfacial active agent, and the amount is 0.3 to 1.0 weight percent. (4) 3 of 2 Gan If the application is as specified in item 】, the consumption is as follows = Naikaka = = in the chemical polishing composition The sub-particle size ^ 5 〇 nanometer to _ nanometer. — 』. The primary particle size includes the liquid combination amount, which is 17 1292435 14649 twfl .doc / 006 96-2-16 2 to 25 weight percent 5. The color filter polishing composition as described in claim 1, wherein the color filter polishing composition has a pH of 2 to 6. as described in claim i. The color slab polishing liquid composition, wherein the color filter polishing liquid composition has a pH of 5 to 9. 2. The color ray polishing liquid composition as described in claim i. The inorganic acid is selected from the group consisting of sulfuric acid, hydrochloric acid, impurities, and mixtures thereof. The organic acid is selected from the group consisting of gansu, formic acid, acetic acid, and the like. a group of propionic acid, acid, and butyl sulphate and a mixture thereof. The color smear polishing liquid composition according to item 1 of the patent scope: organic or inorganic salts containing m iron Compound filtration? Rehydration group salt, fat county compound female fox (4), inspection , Eds knife was set in a polishing liquid to swallow ear 1000-5000 = amine group, N • two ethylene group, methoxy polyethylene glycol monomethyl Propylene Nakajima mixture: 18