1292177 •九、發明說明:广^ 【發明所屬技術領域】 . . . . . ； . ... .......... . . . ，發明係有關於一種蝕刻液之脫泡裝置，特別是指〆 種在謂蝴賴度的麵巾，騎抽取的綱液樣本進 行脫泡之裝置’以提高量測侧液濃度之精確度。 【先前技術】 在TFT—LCD的各種不同的製程中，濕式蝕刻製程主要 1的為歸金屬薄膜層，_刻_度的控制在敍刻製程 ’相當重要地位，__液濃度關鋼金屬薄膜雜 又糊在-定哺_，使_液濃度可崎持一定之濃 度故可提升金屬薄膜層之品質與良率。 、、在控制蝕刻液濃度襄 ^厚之方法’但不外乎必須抽取一定量之侧 測。亥，本之痕度以作為控制蝕刻液濃度之依據，請參閱圖 二所示’其係為習知之控制餘刻液濃度裝置，糊液濃度 衣置其主要4置包括.一钕刻液槽6工j、一製程栗浦612、 —循環泵浦613、—濃度調整裝[614、-濃度量測襄置 巧、-濃度控制線616、複數條侧液管路711、一製程 管路731以及一循環管路721「 ^中第-金屬層之金屬薄膜。製程泵浦612係利用_制二 勉731與該侧賴相連接，並抽取其巾之飯^ 1292177 對金屬规進行_反應，反應後之_液則透過_泵 浦613抽回，經過循環管路721送回蝕刻液槽61丨中^ 再利甩。濃度調整裝置614與蝕刻液槽611之間係利用 蝕刻液管路711相連接，該濃度調整裝置614可利用掂 幫浦613抽取-定量之關液樣本，並調整該飯刻液 環 樣本 穩 並 使其濃度均勻端，經過紐控制線⑽將樣本維持在 疋的濃度下，輸送至濃度量測裝置615進行濃度量測。 1^£ 615+5 ^ ^ _液罝亚回補該侧液使餃刻液槽中的濃度維持穩定。 然雨’在控制蝕刻液裝置當中由於必須抽取—定旦之 _液樣本作為檢測以及透過__決定翻補多^的 蝕刻液濃度使飿刻液槽之濃度維持穩定。但在抽取該蝕刻 ΐίΓΓ液與大氣接觸會夹雜多餘的氣泡 問題泡的產生便會造成量測時的 一輸送管5。 明】閱圖—所示’其係為習知之控制顧彳液濃度聲置 之抽轉刻液管路線圖，該管路裝置由複數個切換閥^ 複數個管路所構成，其一般的管路設計皆會有-遂料營路 1、-洗淨管路2、-取樣f路3、—返回管路4以及一第 —以市面上所設計辭路裝置因切換闕開關的方式不 導致闕液流向羽，而翻不_目的。導贿刻液( 1292177 姓!^流經進料管路1由於_m打開所⑽刻液合二 5 ^ i12 鸾篇_後_^ 田中取樣蝕刻液（缽參照圖四所示），主要目的為引導赖 m^^tXMeas^ ^入後由於PA閥lu打開而c閥ιΐ2打開故該_液合 奴經進料管路1再經第—輸送管5最後流至取樣管路3; 取樣出口處。清洗侧液_圖· 路使蝕刻液不殘留於管路中，由洗淨口進水此時β 取樣出口以清洗管路，避免蝕刻液殘留。 另外於取樣出口處外面尚S古拔Λχν „> y, 留—1Λ〜 处外囬向为有接一官路裝置稱為量測 桌至10 (MeasureCell)(請參閱圖六所示），主要目的為 ，入少量輸刻液樣本做方便職刻液濃度的檢測，直 吕務k置包括-樣本管路ii、滴定管路12、稀释管路13、 Ϊΐ 14以及一第二輸送管15， 關的方式不同導致侧液流向不同，而達成不同的目的。 ^咖刻液(請參閱圖七所示)，主要功能為流除不新鮮的 虫刻液，，於由取樣出口流人_赚—開始可能不是新 、、丰液、t叙如間的排除银刻液才擷取該餘刻液樣 本以提高測量時的精確度。切換閥作動方式，即211打_ 與E間212以及D閥213關閉所以_液會流經樣本管^ 1292177 ’ π與第二輸送管m最後至溢流管路14流出溢流口。稀釋 藥液（請參閱圖八所示)，主要功能為稀釋藥液使其樣^ 刻液體積變大方便機器量測，由於在量測巢室 Cell)中的侧紐積都非常的小大約不到lc c所以必須 使細轉釋才觀量測。侧齡流經_段日細护 _鮮藥液)將.PB閥犯關閉，_ 而在同時E閥212以及D閥213打開，侧^ 口）〃推人_ ’ _釋管路13再流至第二輪送管15最後 ―知而，由於習知技術的管路設計方式容易導致氣泡跟 隨者侧液流人整㈣錄置#中，造成檢酿刻液時濃 度時的準確度降低’例如抽取)c c _刻液但可能有 0. 38 C. C _泡跟隨著該_液’如此夾雜著氣泡便會造 成以下缺點：1292177 • Nine, invention description: Guang ^ [Technical field of the invention] . . . . . . . . . . . . . . . . . . . . . . . In particular, it refers to the device that is used to defoam a sample of the extracted liquid sample on the face towel, so as to improve the accuracy of measuring the concentration of the side liquid. [Prior Art] In various processes of TFT-LCD, the main process of the wet etching process is to return to the metal thin film layer, and the control of the _ _ degree is quite important in the etch process, __ liquid concentration The film is mixed with the paste, so that the concentration of the liquid can be maintained at a certain concentration, so that the quality and yield of the metal film layer can be improved. In the method of controlling the concentration of the etching solution 但 ^ thickness, but it is necessary to extract a certain amount of side measurement. Hai, the trace of this is used as the basis for controlling the concentration of the etching solution. Please refer to the figure shown in Figure 2, which is a conventional control solution for the concentration of the solution. The concentration of the paste is set to be the main 4 set. 6 work j, one process Lipu 612, - circulating pump 613, - concentration adjustment device [614, - concentration measurement, set - concentration control line 616, multiple side liquid line 711, a process line 731 And a metal film of the first-metal layer in the circulation line 721" ^. The process pump 612 is connected to the side by means of the 勉 勉 731, and extracts the rice of the towel ^ 1292177 to react with the metal gauge. After the reaction, the liquid is pumped back through the pump 613, and sent back to the etching liquid tank 61 through the circulation line 721. The concentration adjusting device 614 and the etching liquid tank 611 are separated by an etching liquid line 711. When connected, the concentration adjusting device 614 can extract and quantify the liquid sample by using the gong 613, and adjust the sample of the rice ring to stabilize and make the concentration uniform, and maintain the sample at the concentration of the sputum through the control line (10). Next, it is sent to the concentration measuring device 615 for concentration measurement. 1^£ 615+5 ^ ^ _ The liquid helium sub-replenishes the side liquid to keep the concentration in the dumpling tank stable. However, in the control of the etching liquid device, it is necessary to extract the liquid sample of the Dingdan as the detection and the __ decision to overfill the ^ The concentration of the etching solution keeps the concentration of the etching tank stable. However, the extraction of the etching solution and the contact with the atmosphere may entrap the excess bubble problem, which may cause a delivery tube 5 during the measurement. The following is a schematic diagram of the conventionally controlled pumping engraving tube for controlling the concentration of the sputum liquid. The pipeline device is composed of a plurality of switching valves and a plurality of pipelines, and the general piping design will be - 遂料营路1, - Washing pipeline 2, - sampling f road 3, - returning pipeline 4 and a first - the design of the resignation device on the market does not cause the sputum to flow to the feather due to the way of switching the switch. The result is not _ purpose. Guide bribery engraving (1292177 surname! ^ flow through the feed line 1 due to _m open (10) engraved two 5 ^ i12 鸾 _ post _ ^ Tanzhong sampling etchant (钵 see Figure 4 Shown), the main purpose is to guide the Lai ^ ^ tXMeas ^ ^ after the opening of the PA valve lu and the c valve ι ΐ 2 open The _ liquid combined slave feed line 1 is finally passed through the first conveying pipe 5 to the sampling line 3; the sampling outlet is provided. The cleaning side liquid _ map · the road so that the etching liquid does not remain in the pipeline, is washed At the mouth of the mouth, the β sampling outlet is used to clean the pipeline to avoid the etchant residue. In addition, outside the sampling outlet, there is still S Λχ Λχ „ gt; y, leaving -1 Λ ~ returning outward is a device connected to the official road For the measurement table to 10 (MeasureCell) (please refer to Figure 6), the main purpose is to enter a small amount of infusion sample to do the inspection of the concentration of the convenient solution, and the straight line contains the - sample line ii, burette The road 12, the dilution line 13, the crucible 14 and the second delivery tube 15 are closed in different ways to cause different side flow directions to achieve different purposes. ^Ca engraving liquid (please refer to Figure 7), the main function is to remove the non-fresh insect engraving liquid, and the flow of the person from the sampling exit _ earning - may not be new, the liquid, the exclusion The silver engraving liquid takes the residual liquid sample to improve the accuracy of the measurement. The switching valve actuation mode, that is, the 211 _ and E intervals 212 and the D valve 213 are closed, so that the liquid flows through the sample tube ^ 1292177 ' π and the second delivery tube m and finally flows out of the overflow line from the overflow line 14 . Diluting the liquid (see Figure 8), the main function is to dilute the liquid to make the sample volume larger and convenient for machine measurement, because the side product in the measurement cell is very small. Less than lc c, it is necessary to make a fine release to measure. Side-age flow through _ segment day care _ fresh liquid) will close the .PB valve, _ while at the same time E valve 212 and D valve 213 open, side ^ mouth) push people _ ' _ release line 13 reflow Finally, the second round feed pipe 15 is known, because the pipeline design method of the prior art is easy to cause the bubble follower side liquid flow to be completely (four) recorded #, resulting in a decrease in the accuracy of the concentration when the brewing liquid is inspected' For example, extracting cc _ engraving but there may be 0. 38 C. C _ bubble followed by the _ liquid' so mixed with air bubbles will cause the following disadvantages:
1.檢測飯刻液時由於夾雜氣泡導致測量時準確度降低。 2’準確度降低必會導致整個蝕刻液濃度控制的不精確。 3.該飿刻液濃度控_不精雜導致侧液濃度的不 均勻而使該_液與物件的化學反應造成效果不彰的结 果0 因此對於從事該相關行業的人員而言，莫不致力於立 液濃度穩定度之改良，以期能對習知技術之缺點 出改善之：1^。 1292177 ί發明内容】 ^ 本發明之主要目的在於提供一種可使蝕刻液脫泡的 I置’其可以使控制蝕刻液濃度裝置在抽取蝕刻液量測時 所夾雜多餘的氣泡脫除已提高測量時準確度。 本發明之另一百的在於提供一種可使蝕刻液脫泡的裝 置，其可以提高準確度使餘刻液濃度控制更精確。 置，其可以將蝕刻液濃度控制精確將使蝕刻液濃度均勻穩 定而使該蝕刻液輿金屬薄膜造成良好的蝕刻效果。 八口以及一取樣出口）、一洗淨管路、，返回管路、一第三 ^达官、二攝本管路、一滴定管路、一稀釋管路、一溢流 資^、二第坪輪送管路、—第五輸送管路一第一三通閥、 壓方’利用該閥的_ 向’以達成餞刻液流自所需之目的地。 管路功能為使該蝕刻液流通之外另外有其他功能： _ 1·本發明之官路在部分管路刻意加長，由於加長型 〖路♦紐氣柿著於轉之上，可碰祕刻液脫除氣 泡。 、2'本發明之管路部分管路刻意製作成L型 ，其目的 為細液_帶崎泡錄料__減，利用此原 1292177 3·本發明之管路刻意將取樣入口的水位高度係低於 $亥出料口’使敍刻液流動方向為向下流動，因為氣泡有浮 力的關係’利用浮力原理敍刻液往下流動造成氣泡往上浮 升以造成脫泡的效果。 Λ 【實施方式】 本發明係揭露一種蝕刻液脫泡的裝置，其可以使控制 蝕刻液濃度裝置在抽取蝕刻液量測時不夹雜多餘的氣泡以 利量測時的精準度與精密性以達到維持蝕刻液濃度的穩定 性，本發明之最隹實施例以及其相關實施方式將透過以下 内容做一詳細說明。 示展圖’该兹刻液脫泡的裝置係由一進料管路2 1 (包括一 入料口以及一出料口）、一取樣管路22(包括一取樣入口 以及一取樣出口）、一洗淨管路23、一返回管路以^^^ 一辑ill 25、一樣本管路31、一滴定管路32、一稀釋管 =33、一溢流管路34、一第四輸送管路3^… &路36 一第一二通閥37、一第二三通閥38以及複數値切 換閥所構成’該切換閥是以氣壓方式控制，利用該間的開 蝕刻液脫泡的裝置主要脫泡管路線以及閥的切換方 10 1292177 式·· *取樣蝕刻液(請參照圖十所示)，主要目的心,、# (Measure Celi^ 30 t 開，H閥】^广口進入後由於㈣31㈤ 2 嶋流經進料管路 處^25最韻雖鮮路22至取樣出口 下产遍^ 水位高度係低於該崎口韻刻液為向 果^及第-乂骑力原理，氣泡會往上浮起造成脫泡的效 連接賴 .._... ._..... .... .. , ' . . . ...'.. .... _ . . . ..... ..: f不f鮮的侧液，由於取樣出口流入_刻液一開始可 能不_鮮_難’經—段賴賴除綱液才摘^該 蝕刻疼樣本#提高測量時的精確度，乃分為兩階段脫泡: a·第四輸送管35路與該取樣出口之間係成一彎角連 接由於氣泡易堆積於彎角故可使氣泡脫除。 b·而餘刻液流經第四輪送管35與第五輸送管路％由 於兩盲路可以设计特別長，故氣泡易附著於管壁上使氣泡 切換閥開關方式，Μ閥411、N閥412、〇閥413以 閥414全打開其切換閥由於量測巢室3〇中的管路非常的窄 小(Measure Cell内的體積約為0· 785 c· c)所以|虫刻液 的流動必須靠著於溢流口外的真空泵（圖中来顯示）吸附 才有辦法流動，故Μ閥411、N閥412、〇閥413以及p閥 1292177 41^王打f心不錄軸顺流向崎液猶η或者滴定 3i ^ ^ w|titt^ 35 ^ ==_36«及_料34域溢流π將不要的敍 ... 凉曲^由於其上的脫泡方式，我們可以連到使控制飿! 置在抽取酬液量測時所夾雜多餘的氣泡脫除 量時準確度、由於提高準確度使侧液濃铜 ___控制精確將聽 使忒蝕刻液與金屬薄膜造成良好的蝕刻效果。 其^路與切換閥主要功能，導回侧液(請參 新鲜II的’就是使侧液經一段時間的循環可以獲得拳 |鮮_娜蝕刻液導入繼^ 進料管路21由於㈣如 94而1和J閥314關閉所以該蝕刻液會流至返回管馬 來昭#賊液槽611當令。清洗侧_ ^二所7")’錢目的為清洗管路賴液不殘留於f 》，由洗淨口進水此時轉311以及『瞻 ^閥、、打開所以水的流向為經第洗淨管路23 以^^ —輸达官25最後流經第取樣管路22到取樣出口 以切冼官路，避免;蝕刻液殘留。 12 1292177 於量測巢室30中稀釋藥液（請參閱圖十四所示），主 要功能為稀釋餘刻液使其該蝕刻液樣本體積變大方便機器 量測，由於在量測巢室（Measure Cell)中的蝕刻液體^ 都非常的小大約不到lc. c所以必須使飯刻液稀释才可以、 量測。蝕刻液在流經一段時間後（擷取新鮮蝕刻液乂將噴 閥411以及P閥，414關閉，將該蝕刻液鎖住於管内，而在 同時將N閥412以及0閥413打開，蝕刻液稀釋口（孤口 ) 推入液體’經稀釋管路33再流至第五輸送管36最後流經 > 滴定管路36抵達滴定口以稀釋蝕刻液，由於滴定管路^· 設於第四輪送管路35與第五輸送管路36之間已經過良好 的脫泡程序’故所擷取的蝕刻液樣本為不帶氣泡的蝕刻液。 當然，以上所述僅為本發明之姓刻液脫泡的裝置較佳 |豐’並非用以限制本發明之實施範圍，任何熟習該項 技j者再喊f稀明之撕賴之屬於本發明 之範圍’因此本發明之保護範圍當以下所列所述之申諳真 利範圍作為依據。 ^ 【圖示簡單說明】 圖 係為習知之控制蝕刻液濃度裝置示意圖； ^圖二係為習知之控制_液濃度裝置之抽取酬液 官路線圖示意圖广^ ^ ^ ^ ^ 、 圖 ϋ為白知之餘刻液管路線蚀刻液返回链刻槽示 意圖; ；：；；： ；.., .：, ；：. 厂::......::...:..:.：. _係麵知之㈣好_取侧酿示意圖； si f ； 圖六鱗！知之制巢室管轉裝置轉圖; 圖七係為習知之蝕刻液管路線排放姓刻液示意圖〆 圖八係為習知之蝕刻液管路線稀釋蝕刻液示意圖乂 ,^ 圖九係為本發明之蝕刻液脫泡的裝置示意圖； 圖十-係為本發明之蝕刻液管路線排放敍刻液示意 /:圖；、....: .-；. ..' ' .-'... -'.. ....... ； ...— .- -.-., 匕: . I . . . ： . L.. ... ' 示:意圖:；，.厂 .. \ . . . . - . : , 圖十三係為本發明之蝕刻液管路線洗淨示意圖;以及 | ^1十四係為本發明之蝕刻液管路線蝕刻液稀釋示意 ° - - . - :- .. . - - - . . - . . .... ..... .- . . 【主要元件符號說明】 A〜取樣入口; B〜取樣出口； C〜洗淨d;D〜入料口; f 口 ； 91〜取樣出口; 92〜滴定^ 流口 611_蝕刻液槽 ^ ^ ^ 612 —製程泵浦 14 12921771. When the rice broth is detected, the accuracy is reduced due to the inclusion of air bubbles. 2' reduction in accuracy will inevitably lead to inaccuracies in the overall etchant concentration control. 3. The concentration control of the engraving liquid _ the result of the inconsistency of the concentration of the side liquid, which causes the chemical reaction of the liquid and the object to have an ineffective effect. Therefore, it is not dedicated to the personnel engaged in the related industry. The improvement of liquid concentration stability is expected to improve the shortcomings of the prior art: 1^. 1292177 ί 内容 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 可使 可使 可使 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻 蚀刻Accuracy. Another aspect of the present invention is to provide an apparatus for defoaming an etching solution which can improve accuracy and make the remaining liquid concentration control more precise. The etchant concentration can be accurately controlled to make the etchant concentration uniform and stabilize the etchant liquid metal film to cause a good etching effect. Eight and one sampling outlet), one washing pipeline, return pipeline, one third ^ Daguan, two camera pipeline, one titration pipeline, one dilution pipeline, one overflow flow ^, two first flat wheel The delivery line, the fifth delivery line, a first three-way valve, and the pressure side 'utilize the 'direction' of the valve to achieve the desired flow of the entrained liquid. The function of the pipeline is to have other functions in addition to the circulation of the etching liquid: _ 1· The official road of the invention deliberately lengthens in part of the pipeline, and because of the lengthening type, the road ♦ the new gas persimmon is turned on the top, and the secret can be touched. The liquid removes air bubbles. 2' The pipe part of the pipe of the present invention is deliberately made into an L-shape, the purpose of which is to use a fine liquid_with a smudge recording __ minus, using the original 1292177 3. The pipe of the present invention deliberately takes the water level of the sampling inlet The system is lower than the $hai discharge port to make the flow direction of the engraving liquid flow downward, because the bubble has a buoyancy relationship. 'The buoyancy principle is used to describe the downward flow of the liquid to cause the bubble to rise upward to cause defoaming effect. Λ [Embodiment] The present invention discloses a device for defoaming an etching solution, which can make the device for controlling the concentration of the etching liquid not to be filled with excess bubbles during the measurement of the extraction etching liquid, so as to accurately measure the precision and precision. To achieve the stability of maintaining the concentration of the etching solution, the final embodiment of the present invention and related embodiments will be described in detail below. The apparatus for degassing the drawing is composed of a feed line 2 1 (including an inlet port and a discharge port), a sampling line 22 (including a sampling inlet and a sampling outlet), a cleaning pipeline 23, a return pipeline to ^^^ a series ill 25, the same pipeline 31, a titration pipeline 32, a dilution pipe = 33, an overflow pipeline 34, a fourth delivery pipeline 3^... & road 36 a first two-way valve 37, a second three-way valve 38, and a plurality of sigma switching valves constitute 'the switching valve is controlled by air pressure, and the device is defoamed by the etching liquid Main defoaming tube route and valve switching side 10 1292177 Type·· *Sampling etching solution (please refer to Figure 10), main purpose, # (Measure Celi^ 30 t open, H valve) ^ After wide mouth entry Because (4) 31 (5) 2 嶋 flow through the feeding line ^ 25 the most rhyme, although the fresh road 22 to the sampling outlet under the production ^ water level is lower than the Saki mouth rhyme for the fruit and the first - 乂 riding principle, bubbles Will rise up to cause defoaming effect.. _... ._..... ....., ' . . . ...'.. .... _ . . . . .... ..: f not f fresh side liquid, due to sampling Inflow _ 刻 液 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初 初The angle between the 35-way and the sampling outlet is a corner connection. Since the air bubbles are easily accumulated in the corners, the air bubbles can be removed. b. The residual liquid flows through the fourth-round feeding tube 35 and the fifth conveying line. The blind road can be designed to be particularly long, so the bubble is easy to adhere to the pipe wall to make the bubble switching valve switch mode. The Μ valve 411, the N valve 412, and the 〇 valve 413 are fully opened by the valve 414. The switching valve is measured by the measuring chamber 3 The pipeline is very narrow (the volume in the Measure Cell is about 0·785 c·c). Therefore, the flow of the insect engraving must be carried by the vacuum pump (shown in the figure) outside the overflow port. Μ valve 411, N valve 412, 〇 valve 413 and p valve 1292177 41 ^ Wang hit f heart does not record the axis downstream to the sputum liquid or titration 3i ^ ^ w|titt^ 35 ^ ==_36« and _ material 34 domain The overflow π will not be described... The cool song ^ Due to the defoaming method on it, we can connect to make the control 饳! Accuracy of bubble removal, due to improved accuracy, the side liquid concentrated copper ___ control will accurately make the etchant and metal film cause good etching effect. The main function of the circuit and switching valve, lead back side liquid (Please refer to the fresh II' is to make the side liquid through a period of cycle to get the punch | fresh _ Na etchant is introduced after the ^ feed line 21 due to (four) such as 94 and 1 and J valve 314 is closed, so the etchant will flow To return to the tube Ma Lai Zhao # thief tank 611 ordered. Cleaning side _ ^ two 7 ") 'the purpose of the money is to clean the pipeline does not remain in the f", from the washing port into the water at this time turn 311 and "view the valve, open, so the flow of water is the first wash The net line 23 is passed through the first sampling line 22 to the sampling outlet to cut off the official road, and the etching liquid remains. 12 1292177 Diluting the liquid in the measuring chamber 30 (see Figure 14), the main function is to dilute the residual liquid to make the etchant sample volume larger for the machine to measure, due to the measurement of the cell ( The etching liquid in the Measure Cell is very small and less than about lc. c. Therefore, the rice engraving solution must be diluted before it can be measured. After the etchant has flowed for a period of time (take fresh etchant, the spray valve 411 and the P valve, 414 are closed, the etchant is locked in the tube, and the N valve 412 and the 0 valve 413 are simultaneously opened, the etchant Dilution port (orificate) Pushing in the liquid 'passing the dilution line 33 and then flowing to the fifth delivery tube 36 and finally flowing through> The titration line 36 reaches the titration port to dilute the etching solution, since the titration line is set in the fourth round There is a good defoaming procedure between the line 35 and the fifth delivery line 36. Therefore, the etchant sample taken is an etchant without bubbles. Of course, the above is only the name of the present invention. The present invention is not limited to the scope of the present invention. The scope of the application is based on the scope of the application. ^ [Simple description of the diagram] The diagram is a schematic diagram of the conventional control of the concentration of the etching solution; ^ Figure 2 is a schematic diagram of the conventional control of the liquid concentration device ^ ^ ^ ^ ^ , Figure is the white matter Diagram of liquid pipe route etching liquid return chain groove; ;:;;: ;.., .:, ;:. Factory::...::...:..:.:. _Face Knowing (four) good _ take the side brewing diagram; si f; Figure six scales! Know the nesting chamber tube transfer device map; Figure VII is the conventional etched liquid pipe route discharge name engraved liquid diagram 〆 Figure 8 is the conventional etchant Schematic diagram of tube route dilution etching solution ^, Fig. 9 is a schematic diagram of the apparatus for defoaming the etching liquid of the present invention; Fig. 10 is a schematic diagram of the etchant liquid tube route discharge engraving liquid of the present invention:: Fig., .... : .-;. ..' ' .-'... -'.. ....... ; ...— .- -.-., 匕: . I . . . : . L.. ... ' Show: Intent:;,. Factory.. \ . . . - . : , Figure 13 is a schematic diagram of the etching of the etching liquid pipe of the present invention; and | ^1 is the invention Etching liquid pipe route etching solution dilution ° - - . - :- .. . - - - . . - . . .... ..... .- . . [Main component symbol description] A ~ sampling inlet; B~ sampling outlet; C~washing d; D~ inlet port; f port; 91~ sampling outlet; 92~ titration ^ orifice 611_etching tank ^ ^ ^ 612 - process pump 14 1292177
613—循環泵浦 615 —濃度量测裝置 7Π—蝕刻液管路 721—循環管路 2 —洗淨管路 4一返回管路 10—量測巢室 12 —滴定管路 14—溢流管路 21—進料管路 23—洗淨管路 25 —第三輸送管路 31 —樣本管路 33—稀釋管路 35—第四輸送管路 36 —第五輸送管路 38—第二三通閥 112 一 C 闕 211- PB 閥 212- D 閥 614 —濃度調整裝置 616 —濃度控制線 731 —製程管路 I 一進料管路 3—取樣管路 5—第一輸送管 II 一樣本管路 13—稀釋管路 15—第二輸送管 22 —取樣管路 24—返回管路 30-量測巢室 '32 —滴定管路 34—溢流管路 37-第一三通閥 111-PA 閥 113-B 閥 212—E 闕 311 —G 閥 312-H ^ 313-1 m 314—J 閥 ^ ^ ^ ^ ^ ^ ^ ^ ^ 4Π—Μ 閥 412 — N 閥 ^ ^ ^ ^ ^ ^ 413 — 0 閥 414—P 閥 15613 - Circulating pump 615 - Concentration measuring device 7 - Etching liquid line 721 - Circulating line 2 - Washing line 4 - Return line 10 - Measuring chamber 12 - Titration line 14 - Overflow line 21 - Feed line 23 - Wash line 25 - Third transfer line 31 - Sample line 33 - Dilution line 35 - Fourth transfer line 36 - Fifth transfer line 38 - Second three-way valve 112 A C 阙 211 - PB valve 212 - D valve 614 - concentration adjustment device 616 - concentration control line 731 - process line I - a feed line 3 - sampling line 5 - first delivery tube II a sample line 13 - Dilution line 15 - second delivery pipe 22 - sampling line 24 - return line 30 - measuring cell '32 - titration line 34 - overflow line 37 - first three way valve 111 - PA valve 113-B Valve 212—E 阙311—G Valve 312-H ^ 313-1 m 314—J Valve ^ ^ ^ ^ ^ ^ ^ ^ ^ 4Π—Μ Valve 412 — N Valve ^ ^ ^ ^ ^ ^ 413 — 0 Valve 414 — P valve 15