CN206573811U - Fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system - Google Patents

Fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system Download PDF

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Publication number
CN206573811U
CN206573811U CN201720287973.7U CN201720287973U CN206573811U CN 206573811 U CN206573811 U CN 206573811U CN 201720287973 U CN201720287973 U CN 201720287973U CN 206573811 U CN206573811 U CN 206573811U
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China
Prior art keywords
switch
buffer pool
magnetic valve
fluid infusion
float
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Active
Application number
CN201720287973.7U
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Chinese (zh)
Inventor
陈亮
李欣
曹顺有
臧鹏
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Nanjing Climb Nord Automation Equipment Co Ltd
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Nanjing Climb Nord Automation Equipment Co Ltd
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Priority to CN201720287973.7U priority Critical patent/CN206573811U/en
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Abstract

The utility model discloses fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system, including input duct, drain pipe road, magnetic valve, flowmeter, float, switch and the buffer pool provided with inlet and liquid outlet, the connection corresponding with the inlet and liquid outlet of buffer pool respectively of the input duct and drain pipe road, magnetic valve and flowmeter are all connected on drain pipe road, and magnetic valve is located between buffer pool and flowmeter, switch is on the inwall of buffer pool, and switch is connected by wire with magnetic valve, float is in buffer pool, and one end of float is connected to switch above and opens switch, then so that magnetic valve is opened, liquid level declines in buffer pool, float is down and away from switch, switch closes and causes closed electromagnetic valve.The utility model can effectively prevent the bubble in buffer pool from entering flowmeter, save the decoction drained because of air-discharging, it is ensured that fluid infusion precision.

Description

Fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system
Technical field:
The utility model, which is related in a kind of liquid crystal panel etching system, prevents fluid infusion bubble backflow mechanism.
Background technology:
Liquid crystal panel need to often be placed in decoction cell body in production and perform etching processing by the liquid crystal panel of display, should Decoction cell body is connected with fluid infusion bucket, and existing fluid infusion bucket easily produces bubble during fluid infusion, and the bubble is with fluid infusion bucket Interior liquid level, which declines, can enter flowmeter, flowmeter can be caused to detect that false alarm or fluid infusion precision are inaccurate, so as to cause Liquid crystal panel etching is uneven, causes display defect, ultimately results in monoblock substrate and scrap.
Therefore, it is necessory to be improved to prior art to solve the deficiency of prior art.
The content of the invention:
The utility model is to provide a kind of liquid crystal panel etching system to solve the problem of above-mentioned prior art is present In prevent fluid infusion bubble flow back mechanism.
The technical scheme that the utility model is used has:Fluid infusion bubble return current machine is prevented in a kind of liquid crystal panel etching system Structure, including input duct, drain pipe road, magnetic valve, flowmeter, float, switch and the buffering provided with inlet and liquid outlet The connection corresponding with the inlet and liquid outlet of buffer pool respectively of pond, the input duct and drain pipe road, magnetic valve and flowmeter It is all connected on drain pipe road, and magnetic valve is located between buffer pool and flowmeter, switch is opened on the inwall of buffer pool Pass is connected by wire with magnetic valve, and float is in buffer pool, and one end of float is connected to switch above and opens switch, Then so that magnetic valve is opened, liquid level declines in buffer pool, and float is down and away from switch, and switch closes and magnetic valve is closed Close.
Further, the inwall of the buffer pool is provided with chute, and the switch is located at the top of the chute.
Further, the inwall of the chute is provided with stopper slot.
Further, the float includes base, support bar, adjusting rod and sliding block, and the support bar is perpendicularly fixed at bottom On seat, one end of adjusting rod is by bolted splice on support bar, and the other end is fixedly connected with a slide block.
Further, the side wall of the sliding block is provided with the spacer pin being adapted with the stopper slot.
Further, convex point pressing is pressed in the upper surface of the sliding block provided with hemispherical.
Further, it is enclosed with water proof rubber on the switch.
The utility model has the advantages that:
The utility model can effectively prevent the bubble in buffer pool from entering flowmeter, and saving is drained because of air-discharging Decoction, it is ensured that fluid infusion precision.
Brief description of the drawings:
Fig. 1 is the utility model structure chart.
Fig. 2 is the structure chart of float in the utility model.
Fig. 3 is attachment structure figure of the float on buffer pool in the utility model.
Embodiment:
The utility model is further described below in conjunction with the accompanying drawings.
As shown in Figure 1 to Figure 3, fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system of the utility model, Including input duct 11, drain pipe road 12, magnetic valve 13, flowmeter 14, float 15, switch and provided with inlet and liquid outlet Buffer pool 16, the connection corresponding with the inlet and liquid outlet of buffer pool 16, electromagnetism respectively of input duct 11 and drain pipe road 12 Valve 13 and flowmeter 14 are all connected on drain pipe road 12, and magnetic valve 13 is located between buffer pool 16 and flowmeter 14.Switch On the inwall of buffer pool 16, and switch is connected by wire with magnetic valve 13, and float 15 is in buffer pool 16, and float 15 one end is connected to switch above and opens switch.
Chute 160 is provided with the inwall of buffer pool 16, one end of float 15 is slidably connected in the chute 160.Switch Located at the top of the chute 160.
For preferably float 15 is defined in chute 160, stopper slot 161 is provided with the inwall of chute 160.
Float 15 in the utility model includes base 151, support bar 152, adjusting rod 153 and sliding block 154, support bar 152 are perpendicularly fixed on base 151, one end of adjusting rod 153 by bolted splice on support bar 152, the other end and sliding block 154 are fixedly connected.Sliding block 154 is slided in chute 160, is provided with and is mutually fitted with the stopper slot 161 on the side wall of sliding block 154 The spacer pin 155 matched somebody with somebody.
Drain pipe road 12 in the utility model is connected with cleaning the shower nozzle of glass substrate, and liquid crystal panel is placed under shower nozzle Processing is performed etching in the decoction cell body of side, when in use, fluid infusion, buffer pool are carried out into buffer pool 16 by input duct 11 Liquid surface level in 16 is high, and float 15 is floated on liquid level, and the one end of float 15 is connected to switch above and opens switch, now electric Magnet valve 13 is opened, and the liquid in buffer pool 16 enters in drain pipe road 12, and the bubble produced during fluid infusion can float over liquid table Face, will not enter in flowmeter;When the decoction in buffer pool 16 declines, float 15 sinks and away from switch, switch closure is simultaneously So that magnetic valve 13 is closed, prevent from floating over the bubble of ullage because liquid level declines and enters in flowmeter.
The utility model is for ease of preferably pressing on sliding block 154 on switch, provided with half on the upper surface of sliding block 154 Spherical presses convex point pressing 156.
Switch in the utility model switchs for non-self-lock-ing, to prevent the liquid in buffer pool 16 from drenching switch, in switch On be enclosed with water proof rubber.
The supply voltage of magnetic valve 13 in the utility model is 24V, connection circuit between magnetic valve 13 and switch and The folding of switch control magnetic valve 13 is prior art, therefore the utility model is repeated no more.
Described above is only preferred embodiment of the present utility model, it is noted that for the common skill of the art For art personnel, some improvement can also be made on the premise of the utility model principle is not departed from, these improvement also should be regarded as Protection domain of the present utility model.

Claims (7)

1. fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system, it is characterised in that:Including input duct(11)、 Drain pipe road(12), magnetic valve(13), flowmeter(14), float(15), switch and the buffering provided with inlet and liquid outlet Pond(16), the input duct(11)With drain pipe road(12)Respectively with buffer pool(16)Inlet corresponding with liquid outlet connect Connect, magnetic valve(13)And flowmeter(14)It is all connected to drain pipe road(12)On, and magnetic valve(13)Positioned at buffer pool(16)With Flowmeter(14)Between, switch is located at buffer pool(16)Inwall on, and switch pass through wire and magnetic valve(13)It is connected, float (15)Located at buffer pool(16)It is interior, and float(15)To be connected to switch upper and open switch for one end, then cause magnetic valve (13)Open, buffer pool(16)Interior liquid level declines, float(15)Down and away from switch, switch closes and causes magnetic valve(13) Close.
2. fluid infusion bubble backflow mechanism is prevented in liquid crystal panel etching system as claimed in claim 1, it is characterised in that:It is described Buffer pool(16)Inwall be provided with chute(160), the switch is located at the chute(160)Top.
3. fluid infusion bubble backflow mechanism is prevented in liquid crystal panel etching system as claimed in claim 2, it is characterised in that:It is described Chute(160)Inwall be provided with stopper slot(161).
4. fluid infusion bubble backflow mechanism is prevented in liquid crystal panel etching system as claimed in claim 3, it is characterised in that:It is described Float(15)Including base(151), support bar(152), adjusting rod(153)And sliding block(154), the support bar(152)Vertically It is fixed on base(151)On, adjusting rod(153)One end by bolted splice in support bar(152)On, the other end and sliding block (154)It is fixedly connected.
5. fluid infusion bubble backflow mechanism is prevented in liquid crystal panel etching system as claimed in claim 4, it is characterised in that:It is described Sliding block(154)Side wall be provided with and the stopper slot(161)The spacer pin being adapted(155).
6. fluid infusion bubble backflow mechanism is prevented in liquid crystal panel etching system as claimed in claim 4, it is characterised in that:It is described Sliding block(154)Upper surface press convex point pressing provided with hemispherical(156).
7. fluid infusion bubble backflow mechanism is prevented in liquid crystal panel etching system as claimed in claim 1, it is characterised in that:It is described Water proof rubber is enclosed with switch.
CN201720287973.7U 2017-03-23 2017-03-23 Fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system Active CN206573811U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720287973.7U CN206573811U (en) 2017-03-23 2017-03-23 Fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720287973.7U CN206573811U (en) 2017-03-23 2017-03-23 Fluid infusion bubble backflow mechanism is prevented in a kind of liquid crystal panel etching system

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CN206573811U true CN206573811U (en) 2017-10-20

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110002392A (en) * 2018-04-02 2019-07-12 广东厨邦食品有限公司 Flat-bottom tank Liquid Residue automatic recycling device and its system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110002392A (en) * 2018-04-02 2019-07-12 广东厨邦食品有限公司 Flat-bottom tank Liquid Residue automatic recycling device and its system
CN110002392B (en) * 2018-04-02 2020-08-21 广东厨邦食品有限公司 Automatic recovery unit of flat bottom jar residual liquid and system thereof

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