TWI289241B - Manufacturing method of a cavity of a light guide plate - Google Patents

Abstract

The present invention relates to a manufacturing method of a cavity of a light guide plate. The method includes following steps: providing a substrate which comprises V-cut; forming a photo-resist layer on the substrate; exposing the photo-resist layer with a photo-mask and developing the photo-resist layer to form a photo-resist projection; sputtering a metal film on the substrate and the photo-resist projection; conducting electroless plating and forming a metal layer on the surface of the metal film; removing the substrate and the metal layer and forming a cavity with a structure to expel gas.

Description

1289241 V. INSTRUCTION DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention ^ ′X Ming is a method for manufacturing a mold core, and more particularly to a method for manufacturing a light guide plate mold for liquid crystal display. [Prior Art]

In recent years, with the liquid 曰#-E field more extensive, such as the colorization and large-scale of the pen, its application 1.0,%-w/DI electric shame, various desktop computers, LCD TV temple liquid is not showing day by day. To use a light source system as a liquid helium '/, not to emit light' (Backught M〇duler K, the light source of the device, such as a backlight module), to guide the light source疒出: In the first-plate backlight module, the important element or point source is converted into a surface light source, ς. The direction of the first-line transmission wheel, the general light guide plate of the line source includes at least one smooth surface, in order to improve the light emission 5 and a /, the bottom surface of the opposite surface micro-structure, such as V-type two sentence courtesy, generally set the uniformity of the bottom surface of the light guide plate, and then enhance the ^ Zheng shot to enhance the light guide plate exit beam a _, The overall performance of the board of the first month of the month. 目刚' ¥ 微 微 微 微 系 系 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : And photoresist lithography mold light, developed on a substrate to form a micro-structured plate, light After molding, the mold core is formed by exposure, and then the model light guide plate is electroformed. (4) Refer to the first figure for the injection or hot pressing of the plastic. For the 20 02, report No. 5 1 4766 Revealing the method of manufacturing the light guide plate mold core of Taiwan Patent Publication No. 21

Page 6 1289241 -----———————————— V. Description of the invention 〖(2) includes: cold exposure & resist exposure development on a flat substrate to form a photoresist (S801); The light plate and the plurality of photoresist patterns are λ = light = case (S8 ° 2) on the plane of the planar substrate surface 4; layer; seed crystal (10) ... by electroforming the substrate surface is detached = (S804 The mold core is combined with (S8 0 6 ). The copper seed crystal on the surface of the weight is etched and removed, and the light guide plate is formed by the method of the manufacturing method or the hot pressing method, and the kernel is passed through the plastic. The structure of the slotting is small, generally the v-type temperature, pressure and exhaust of the light guide plate made of 50~1 〇7, and the second factor; =. The model can't accurately obtain the required V-type when shooting or hot pressing. On the contrary: the groove structure is not easy to be the light-emitting efficiency of the plate, and the VW is used to affect the whole light guide. This system provides a v-type manufacturing method that can obtain a high light-emitting efficiency. The present invention aims to provide a method for manufacturing a light guide plate mold having a precision structure. Ό t 槽 结 ^ The invention provides a light guide plate mold manufacturing method comprising: a substrate having a V-groove structure; on the substrate::: a uniform sentence photoresist layer; using a predetermined pattern of the mask to the center 2 Coating-lighting, and then developing, so that the V-shaped groove structure of the substrate is exposed to the structure; on the substrate and the protruding structure, the mineral-metal is formed into a dog shape and the metal layer is peeled off from the substrate to obtain a Exhaust structure

1289241

Compared with the prior art, the metal 'light plate barn obtained by the mold manufacturing method of the invention has an exhaust structure, and when the light guide plate is formed by plastic injection or hot pressing, the mold core can be smoothly The gas between the light guide plates is smoothly discharged, so that the surface of the mold core is completely adhered to the surface of the light guide plate, and the light guide plate groove structure is easily formed by controlling the appropriate mold temperature and pressure, that is, the V-shaped groove structure with precise precision is provided. In order to ensure the light extraction efficiency of the entire light guide plate. [Embodiment] The second drawing is a manufacturing process of a method for manufacturing a light guide plate mold of the present invention, which comprises the following steps: providing a substrate having a V-groove structure (S901); and a v-groove on the substrate Structurally coating a uniform photoresist layer (S9 0 2 ); θ exposure of the photoresist layer by using a mask with a predetermined pattern, and then developing, so that a protruding photoresist is formed on the V-groove structure of the substrate a structure (S90 3 ); plating a metal thin film layer on the substrate and the protruding structure (S904), forming a metal layer on the surface of the metal thin film layer by electro-tungsten (S9 0 5 ) · 'the metal thin film layer and metal The layer is peeled off from the substrate, and the metal light guide plate mold (S 9 〇 6 ) of an exhaust structure is used. Please refer to the third figure to provide a substrate 10 having a ν-type groove structure, wherein the substrate 10 is polymethyl methacrylate (p〇iy Met).

Meth Acrylate, PMMA), can also use other materials such as glass 10 has a V-groove structure 11, the V-shaped groove community]] total mountain you ^ ~, ° ° structure 11 by the traditional screen printing, Hesha and etching type, mechanical processing type. Or 氺^ ^ ^ 戎 戎 nine resistance first casting mode etc. 1288241

V. Description of the invention In the fourth method, use the normal method to form a layer of resistive layer, and to expose the light through the substrate to form a photoresist, which is also a value. The liquid can be dried by the V-type scorpion medium 1 1 V of the optical substrate. h cloth-uniform photoresist layer 2〇, "^ ^ 2 : The photoresist layer 20 is an organic photoresist material, which can be used to remove the photoresist. The coating method of the photoresist layer 20 may be carried out by other methods such as a spraying method.

Referring to the fifth figure, the light is contracted by a reticle of a predetermined pattern and then developed so that the v-shaped groove structure 11 of the substrate has a projecting photoresist structure 20a. Expose the mask (not shown) to the substrate (4). Wherein, the light source for exposure is ultraviolet light, and is exposed by a light-emitting technique, that is, the mask is parallel to the substrate 丨〇. The optical system (not shown) emitted by the light source is irradiated onto the coated photoresist reed by the reticle, and the photo-resistance of the light-irradiated photoresist is photosensitive. After development and development, the photo-resistance of the photosensitive reaction is not dissolved, forming a sudden process. = Structure 20a. The protrusion-shaped photoresist structure 2〇a has a thickness of i micrometers to 1 〇. The developer can be sulfhydryl isobutyl ketone according to the requirements of mold temperature and pressure during molding of the light guide plate, and sprayed on the substrate rafter. The development " substrate is in a static state for 30 seconds to 6 seconds, so that it is fully reacted, and the pattern of the % mask is transferred to the substrate 1Q.

As shown in Fig. 6, a metal thin film layer 30 is plated on the substrate and the photoresist protrusion structure 2A. The developed substrate 1 is placed in a cavity of a sputtering machine (not shown), the working pressure is set to 〇5 t〇rr, the substrate 10 is heated to 150 C, and the plasma reaction gas is introduced to control the reaction time. Depositing a metal thin film layer 3 0 ' on the surface of the substrate 丨〇 and the photoresist protrusion structure 20a to a thickness of 2 〇〇 500 500 Å. The metal thin film layer 3 〇 may also be obtained by other deposition methods such as evaporation, and the metal thin film is Copper or other metal. 〆

1289241 V. Invention Description (5) "One"------- As shown in the seventh figure, the metal layer 40 is electroformed on the metal thin film layer 3. The substrate 10 is placed in an electroforming liquid to perform electrodeless electricity formation to form a metal layer 40. Wherein, the electroforming solution provides a metal ion: a mixture of a hypophosphite and an accelerator. Providing metal ions = Luo liquid 'neutralized nickel solution, may also be other solutions such as nickel sulfate or nickel vaporization'. Phosphorus is an alkali metal halide. In addition, the electroforming solution may further include a PH = section = a wetting agent, a glossing agent, etc. to enhance the electroforming effect. The electroforming solution is acidic or moist and can also be an alkaline solution. The substrate 1 is placed in the electroforming solution at a time dependent on the thickness of the metal layer 40. The thickness of the metal layer 4 of the present embodiment can be 0.4 mm to 2 mm, and the metal layer is formed on the film layer 30 by the electroless casting. The light is thin as shown in the eighth figure. The metal thin film layer 30 and the metal layer 4 are separated from each other, and a metal light guide plate mold having a venting structure is obtained. The metal thin film layer 3 and the metal layer 40 and the substrate 10 and the photoresist protrusion are: 20 a stripping, a metal structure model obtained by integrating the metal thin film layer 3 〇 and the metal layer 4 ,, the model is the mold core 6 〇, the mold core 6 〇 has a row of 5 surname 50, the exhaust structure The depth of 50 is the strictness and the degree of the protrusion-like photoresist structure 2〇a, and may be decomposed according to the requirements of the mold temperature and the pressure during the molding of the light guide plate. The metal light guide plate mold has a gas structure, and when the light guide plate is formed by plastic injection or hot pressing, the gas between the mold core and the light guide plate is smoothly discharged, so that the surface of the mold core completely conforms to the surface of the light guide plate, and passes through Control the proper mold temperature and pressure, and the V-groove structure of the light guide plate is easy to form. The type, that is, the high precision ν = 1289241_ five, the invention description (6) structure, thereby ensuring the light-emitting efficiency of the entire light guide plate. In summary, the invention meets the requirements of the invention patent, and patent application is filed according to law. The present invention is only a preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art will be included in the following claims.

Page 11 1289241 BRIEF DESCRIPTION OF THE DRAWINGS The first figure is a flow chart of a prior art method of manufacturing a light guide plate mold. The second figure is a flow chart of a method for manufacturing a light guide plate mold of the present invention. The third figure is a schematic view of a substrate having a v-groove structure of the present invention. The fourth figure is a schematic diagram of photoresist coating of the method for producing a light guide plate mold of the present invention. The fifth drawing is a schematic view of a substrate obtained by exposing and developing the method for manufacturing a light guide plate mold of the present invention. Fig. 6 is a schematic view showing a deposited metal thin mold layer of the method for producing a light guide plate mold of the present invention. The seventh drawing is a schematic view of electroforming of the method for manufacturing a light guide plate mold of the present invention. The eighth drawing is a schematic view of a light guide plate mold obtained by the method for manufacturing a light guide plate mold of the present invention. [Main component symbol description] Substrate 10 V-groove structure 11 Photoresist layer 20 Projected photoresist structure 20a Metal film thin layer 30 Metal layer 40 Exhaust structure 50 Mould 60

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Claims (1)

1289241 ------_ Liu Shenqing patent scope provides 3 $ laren manufacturing method, which includes the following steps: a substrate with a μ-shaped groove structure; a lower photoresist is coated with a uniform photoresist a photosensitive mask of the pattern is exposed, and then a V-shaped groove structure of the substrate is formed to form a protrusion-like light protrusion structure on the metal-metal film layer. A metal layer is formed on the surface of the binder layer, and the metallized substrate of the structure is peeled off, and a method for manufacturing a light guide plate mold of a gas 3 is obtained, wherein the method for manufacturing the light guide plate mold of the first item is described. The two structural systems are made by machining. Shenzhong:: The groove structure is made of photoresist: the patent scope is the first ΙΜ == method, where the photoresist layer is the daddy; Wan L is as claimed in the third paragraph of the patent application: mining, spinning W 'if applying for patent 2 / method using spraying method. Xuan, such as the scope of patent application 〗 IS material. Contains, where the first limit of coating Negatively the first light guide plate mold manufacturer / negative resistance material. $ 13 page 128 9241 VI. Application for patents 9. If the application is for the case of 10. If the application is for that 1 1. If the application is for that 1 2. If the application is for that 1 3. If the application is for that 1 4. If the application is for the 1 5 If you apply for it, 1 6. If you apply for this liquid. 1 7. If you apply for it The method for manufacturing a light guide plate mold according to the first aspect of the invention, wherein the protruding photoresist structure has a thickness of 1 micrometer to 10 micrometers. The method for manufacturing a light guide plate mold according to the first aspect of the patent, the method for depositing a metal thin film layer is an evaporation method. The method for manufacturing a light guide plate mold according to the first aspect of the patent, the method for depositing a metal thin film layer is a sputtering method. The method for manufacturing a light guide plate mold according to the first aspect of the invention, wherein the metal film layer material is copper. The method for manufacturing a light guide plate mold according to the first aspect of the invention, wherein the electroplating solution used in the electroforming step is an acidic solution. The method for manufacturing a light guide plate mold according to the first aspect of the invention, wherein the electroplating solution used in the electroforming step is an alkaline solution. The method for manufacturing a light guide plate mold according to the first aspect of the invention, wherein the electro-mineral solution used in the electroforming step is a nickel-filled solution. The method for manufacturing a light guide plate mold according to the first aspect of the invention, wherein the electroplating solution is a method for manufacturing a light guide plate mold according to the first aspect of the patent of the nickel sulfate or the vaporized nickel solution, wherein the thickness of the metal layer is 0.4mm to 2mm. Page 14