TWI287370B - A wave division de-multiplexer - Google Patents

A wave division de-multiplexer Download PDF

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TWI287370B
TWI287370B TW94134545A TW94134545A TWI287370B TW I287370 B TWI287370 B TW I287370B TW 94134545 A TW94134545 A TW 94134545A TW 94134545 A TW94134545 A TW 94134545A TW I287370 B TWI287370 B TW I287370B
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light
wavelength demultiplexer
light diffraction
wavelength
optical
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TW94134545A
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TW200715744A (en
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Seng-Hsiung Chang
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Far East College
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Abstract

The present invention discloses a wave division de-multiplexer (WDDM). It comprises a multiplexer, used for receiving the lights with different wavelengths from the fiber; and a diffraction optical element (DOE), attached on the output port of the multiplexer. The WDDM according to the present invention can effectively filter the lights from the fiber system and improve the efficiency.

Description

1287370 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種波長解多工器,其特別有關於 一種使用光繞射元件(diffraction optical element,DOE) 之波長解多工器。 【先前技術】 f 在現今光纖通訊領域不斷快速蓬勃發展的潮流 中,快速且高容量的通訊傳輸需求日益殷切。而多波長 /多通道(channel)傳輸功能的高密度分波多工器,既可 提升傳輸容量,且不需另埋設新光纖,節省挖埋架設費 用及工時等多項優勢。為了要有效的利用光纖放大器所 提供之光放大頻帶範圍,就必須將波長通道間距 (channel spacing )縮小。當通道間距小至2nm以下, 通道數以4、8、16…等倍數增加時,稱此系統為波長 多工(wavelength division multiplexing,WDM)系統。 請參照第1圖,該圖所示為一習知之波長多工網 路1〇之方塊圖。該波長多工網路ίο之工作原理乃是使 用不同波長來對應不同的感測器。由光纖11·導入頻譜 範圍寬廣的光波,經該波長多工/解多工器12將不同波 長分入多根光纖11以送至不同的感測元件13 ;而後感 測元件13返回的光波,經光纖耦合器14耦合在一起, 經光纖11輸出以進入該波長多工/解多工器12。不同波 長再被分開,光的強度為排列式檢光器所偵知。目前發1287370 IX. Description of the Invention: [Technical Field] The present invention relates to a wavelength demultiplexer, and more particularly to a wavelength demultiplexer using a diffraction optical element (DOE). [Prior Art] f In the current fast-growing trend in the field of optical fiber communication, the demand for fast and high-capacity communication transmission is increasing. The multi-wavelength/multi-channel (channel) transmission function of the high-density demultiplexer not only increases the transmission capacity, but also eliminates the need to embed new fibers, saving the cost of erection and man-hours. In order to effectively utilize the optical amplification band range provided by the fiber amplifier, it is necessary to reduce the channel spacing. When the channel spacing is as small as 2 nm or less, and the number of channels is increased by multiples of 4, 8, 16, ..., the system is called a wavelength division multiplexing (WDM) system. Please refer to Fig. 1, which is a block diagram of a conventional wavelength multiplexing network. The wavelength multiplex network works by using different wavelengths to correspond to different sensors. A wide-spectrum light wave is introduced from the optical fiber 11·, and different wavelengths are divided into a plurality of optical fibers 11 through the wavelength multiplexing/demultiplexing unit 12 to be sent to different sensing elements 13; and then the light waves returned by the sensing element 13 are Coupled together by fiber coupler 14, output via fiber 11 to enter the wavelength multiplexer/demultiplexer 12. The different wavelengths are then separated and the intensity of the light is detected by the array of detectors. Current issue

5 FE007-P432-TW 1287370 展該波長多工/解多工器12主要採取三種模式··薄膜濾 光鏡(thin film filter,TTF )、陣列波導光柵(array waveguide grating,AWG)與光纖光栅(fiber bragg grating, FBG) 〇 薄膜濾光鎿的原理是採鍍膜的方式,以氣相沉積 的原理,將所需膜層一層層鍍在薄平板玻璃基板(glass substrate)上製作而成,當光線通過不同種的濾波片 後,不同的波長便被分別濾出,達到分波的效果 。由於 薄膜滤光鏡製作方式是以光學玻璃基板,職相沉積的 方式鍍上高低折射率材料(Si〇2與观),不斷地鍛至 土板上土板上面的折射材料總厚度就會越來越厚,預 了百層以上的·,材料附著在基板上的吸附力量 可能不足以支撐整個結構,容易造成折射材料的剝落, =形,的限制,也造成要往更窄的二距發 展的一項障礙。 陣歹,光栅原理是利用波導的物理特性將不同 分ΐ,技術能-次分出較多通道。不 ΐ好的絕錢的影響’在大量商業化前需完成 ^技術障:也是現今陣列波導光栅原理最困難 干涉目位鮮上所產生的 生不同折射率的週期性光纖而成為布拉格 射光柵。利用光學繞射㈣…# ?、b agg)境 射的特性將不同波長的光訊號分5 FE007-P432-TW 1287370 This wavelength multiplexer/demultiplexer 12 mainly adopts three modes: thin film filter (TTF), array waveguide grating (AWG) and fiber grating ( Fiber bragg grating, FBG) The principle of 〇 film filter 是 is the way of coating film, by the principle of vapor deposition, the desired film layer is layered on a thin glass substrate, when the light After different kinds of filters, different wavelengths are filtered out to achieve the effect of splitting. Since the film filter is produced by optical glass substrate and high-low refractive index material (Si〇2 and Guan) by means of phase deposition, the total thickness of the refractive material continuously pressed onto the soil plate on the soil plate will be more The thicker, the more than one hundred layers, the adsorption force of the material attached to the substrate may not be enough to support the entire structure, which easily causes the peeling of the refractive material, the limitation of the shape, and also the development of a narrower distance. An obstacle. The principle of grating is that the physical properties of the waveguide are different, and the technology can divide more channels. The impact of not good money can be completed before a large number of commercializations. ^Technical barrier: It is also the most difficult problem of the current arrayed waveguide grating. Interfering with the periodic fiber with different refractive index generated by the target position becomes a Bragg grating. Using optical diffraction (four)...#?, b agg) characteristics of the light source of different wavelengths

FE007-P432-TW 1287370 出,故可分出光訊號比薄膜濾光鏡方式較窄。不過為避 免用於繞射的光纖光柵因溫度而影響輸出。 波長多工/解多工器的分光能力以及光纖本身在不 同波段的損耗都限制了感測元件的數目。特別是在 WDDM系統中,需要將光纖中不同光波長的訊號分別 解析出來。傳統上,若要增加光纖的傳輸效率在以往都 是提昇光纖11的傳輸速度。但僅提昇光纖11上妁速 度,總會有到極限的時候。 綜上所述,習知之波長解多工器的分光效率低是最 大的缺點。因此,為了解決這個問題,有需要提供一種 具選擇性分光功能之波長解多工器从克服先前技術的 缺點。 【發明内容】 本發明之目的在提供一種波長解多工器,其係使用 光繞射元件於該波長解多工器之光信號輸入端,可有效 的將光纖中不同光波長的訊號分別解析出來,以增進該 波長多工器之分光效率。 為達上述目的,本發明提出一種波長解多工器,其 包含一多工器與一光繞射元件。該多工器用於接收來在 光纖之頻譜範圍寬廣的光波,且該光繞射元件配置於該 多工器之一光信號輸出端,用以將不同光波長的訊號分 別解析出來。該光繞射元件更包含複數個光繞射單元晶 格,其具有厚度呈複數階週期性變化之幾何形狀。FE007-P432-TW 1287370 is out, so the optical signal can be separated narrower than the thin film filter. However, in order to avoid the fiber grating used for diffraction, the output is affected by temperature. The splitting power of the wavelength multiplex/demultiplexer and the loss of the fiber itself in different bands limit the number of sensing elements. Especially in the WDDM system, it is necessary to separately analyze the signals of different optical wavelengths in the optical fiber. Traditionally, it has been conventional to increase the transmission speed of the optical fiber 11 in order to increase the transmission efficiency of the optical fiber. However, only increasing the speed of the fiber 11 will always reach the limit. In summary, the low spectral efficiency of the conventional wavelength demultiplexer is the biggest drawback. Therefore, in order to solve this problem, it is necessary to provide a wavelength demultiplexer having a selective spectroscopic function from overcoming the disadvantages of the prior art. SUMMARY OF THE INVENTION The object of the present invention is to provide a wavelength demultiplexer that uses an optical diffraction element at an optical signal input end of the wavelength demultiplexer to effectively resolve signals of different optical wavelengths in the optical fiber. Come out to improve the splitting efficiency of the wavelength multiplexer. To achieve the above object, the present invention provides a wavelength demultiplexer comprising a multiplexer and a light diffractive element. The multiplexer is configured to receive light waves having a wide spectral range in the optical fiber, and the optical diffractive component is disposed at an optical signal output end of the multiplexer for separately analyzing signals of different optical wavelengths. The light diffractive element further comprises a plurality of light diffractive element crystals having a geometric shape having a thickness that varies in a complex order.

FE007-P432-TW 1287370 元晶袼長解多卫器之一特徵,該光繞射單 根據的整數倍階數。 程製作,係可用以將=之/長解多卫器係以微機電製 出來,達到解多工纖肀不同光波長的訊號分別解析 明顯=本^^迷和其他目的、特徵、和優點能更 式,作詳細說明如個較佳實施例,並配合所附圖 【實施方式】 雖然本發明可矣租β 示者及於下文㈣j為不同形式之實施例,但附圖所 請了解本文所揭;者以2明,之較佳實施例’並 = 發明限制於圖^及/或所描述之特定實施 q明參照第2圖’以說明根據本發明之該波長解多工 器120之結構示意圖。該圖所示為該波長解多工器12〇 之結構。該波長解多工器12〇係包含一多工器12ι與一 光繞射元件123。其中該多工器121係用於接收來在光 纖之頻譜範圍寬廣的光波,其係作為該波長解多工器 120之本體。該多工器121之位置如同第1圖基本功能 圖中之該波長多工/解多工器12。該光繞射元件 (diffraction optics element,簡稱 DOE) 123 係配置於 sFE007-P432-TW 1287370 is a feature of one of the long-range multi-guards, which is an integer multiple of the order of the light diffraction. Cheng production, can be used to make = / long solution multi-guard system to micro-electromechanical system, to achieve the resolution of multi-fiber fiber different wavelengths of light separately resolved significantly = this ^ ^ fans and other purposes, features, and advantages DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT As a preferred embodiment, and in conjunction with the accompanying drawings [Embodiment] Although the present invention can be used to rent a beta and the following (d) j is a different form of embodiment, but the drawings please understand this article DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT(B) </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; schematic diagram. The figure shows the structure of the wavelength demultiplexer 12A. The wavelength demultiplexer 12 includes a multiplexer 12i and a light diffractive element 123. The multiplexer 121 is for receiving light waves having a wide spectral range in the optical fiber, and is used as the body of the wavelength demultiplexer 120. The multiplexer 121 is positioned as the wavelength multiplexer/demultiplexer 12 in the basic functional diagram of Fig. 1. The diffraction optics element (DOE) 123 is configured in s

FE007-P432-TW 1287370 :二Πί 端,用以將不同光波長的訊 號刀别解析出來。該光繞射元件123之基板係為玻璃基 板、銦錫氧化物厚膜與透明光阻中之—種材料,且該 123係以微機電或半導體製程所製作之:小 為清楚本發明之波長解多^之原理與特徵 參照第3圖’該圖顯示為用於本發明之光繞射元件123 和光折射S件在功能和外型上之差別。光繞射元件 微光學的-個重要的應用。對光折射元件(她active optics element,R0E) *言’繞射現象只會發生 孔徑上,即繞射現象對穿透光學元件並沒有調製的功 能二,f兀:的光學品質會受到繞射的限制 (Dlffr她on Llmlt),這種在繞射上的限制X其在微小 的鏡片陣列(micro_lensarray)特別顯著。 接著請參照第知與第4b圖,以說明第3圖之該光 繞射元件123之分光原理。在第4a圖中,當一 ^ 前形狀不是平面波時,可由傅氏轉換數學運^,得此 -波前可由許許多多不同強度的平面波所組成。在第 4b圖中,當-平打光射入該光繞射元件123時,波前 產生改變。當控制光繞射元件123的表面形狀(即刻 時,就可控制不同入射波的行進方向。 ; 由於基板介質的折射率n跟厚度的關係會影 波長出來的快慢,因此可用來設計影響該波長的前進方 向’進-步由不同方向前進的波長來解出我們所需要的FE007-P432-TW 1287370: Two-terminal end, used to resolve signal pulses of different wavelengths of light. The substrate of the light diffraction element 123 is a material of a glass substrate, a thick film of indium tin oxide and a transparent photoresist, and the 123 is made by a microelectromechanical or semiconductor process: small to understand the wavelength of the present invention The principle and characteristics of the solution are shown in Fig. 3, which shows the difference in function and appearance between the light diffractive element 123 and the light refraction S piece used in the present invention. Light diffraction elements Micro-optical - an important application. For the active optics element (R0E) * the 'diffraction phenomenon only occurs on the aperture, that is, the diffraction phenomenon does not have the function of modulating the penetrating optical element. The optical quality of f兀: is diffracted. The limitation (Dlffr she on Llmlt), this limitation on diffraction X is particularly noticeable in tiny lens arrays (micro_lensarray). Next, please refer to the above description and Fig. 4b for explaining the principle of splitting of the optical diffraction element 123 of Fig. 3. In Fig. 4a, when the shape of a ^ front is not a plane wave, it can be mathematically performed by Fourier transform, and this - the wavefront can be composed of many plane waves of different intensities. In Fig. 4b, when the flat light is incident on the light diffractive element 123, the wavefront changes. When controlling the surface shape of the light diffractive element 123 (immediately, the traveling direction of different incident waves can be controlled. Since the refractive index n of the substrate medium and the thickness will affect the wavelength, the design can affect the wavelength. The direction of advancement 'step-by-step wavelengths from different directions to solve what we need

FE007-P432-TW 1287370 信號,而不想要解出的波長將不受該光繞射元件123 的影響而是直接穿透。 請參照第5圖,該圖所示為光繞射元件之詳細結構 側視圖。該光繞射元件123更包含複數個光繞射單元晶 格124,其中該複數個光繞射單元晶格124之厚度呈複 數階週期性變化之幾何形狀。該光繞射元件123的基本 原理是以相位調制的方式,利用純量繞射理論或向量繞 射理論,經過計算後得到表面輪廓之變化。全像術 (holography)發明後,更進一步的將繞射光學的概念與 原理應用在微光學元件上;如分光器與微小透鏡組 (Lenslets)。光繞射元件123的基本設計流程係首先計算 出特定波前的干涉圖形,即為電腦全像片 (computer-generated hologram,CGH)。再由數位繪圖機 輸出計算模擬後的干涉圖形,最後微縮影到底片。藉由 表面輪廓之變化調制入射面光場的相位,控制出射面光 場的相位,得到預定出射光空間能量的分布。該光繞射 元件123之設計法則大致分為四種架構:第一種是光程 差法(optical path method);第二種是純量波繞射理論 (scalar diffraction theory);第三種是嚴格耦合波傳理論 (rigorous coupled wave theory);第四種是等效介質理論 (effective medium theory)。在本發明之的光繞射元件 123較佳係採用純量波繞射法設計9純量波繞射法係以 光的波動現象為基礎來描述光的繞射現象。又稱為傅氏 光學(fourier optics)。光的波動說認為波前(wavefront)The FE007-P432-TW 1287370 signal, which is not intended to be resolved, will be directly penetrated by the light diffractive element 123. Please refer to Fig. 5, which is a side view showing the detailed structure of the light diffraction element. The light diffractive element 123 further includes a plurality of light diffraction unit cells 124, wherein the thickness of the plurality of light diffraction unit cells 124 is in a complex order periodically varying geometry. The basic principle of the light diffractive element 123 is phase modulation, using scalar diffraction theory or vector diffraction theory, which is calculated to obtain a change in surface profile. After the invention of holography, the concept and principle of diffractive optics were further applied to micro-optical components; such as beam splitters and Lenslets. The basic design flow of the light diffractive element 123 is to first calculate the interference pattern of a particular wavefront, which is a computer-generated hologram (CGH). Then, the digital plotter output calculates the simulated interference pattern, and finally the miniature image is the final film. The phase of the light field on the incident surface is modulated by the change of the surface profile, and the phase of the exiting light field is controlled to obtain a distribution of the spatial energy of the predetermined outgoing light. The design rule of the light diffractive element 123 is roughly divided into four structures: the first is an optical path method; the second is a scalar diffraction theory; the third is Rigorous coupled wave theory; the fourth is effective medium theory. The light diffractive element 123 of the present invention is preferably designed by a scalar wave diffraction method. The 9-quantity wave diffraction method describes the diffraction phenomenon of light based on the fluctuation of light. Also known as fourier optics. The wave of light says that the wavefront

ίο FE007-P432-TW 1287370 上的母—點料以視為一個次級的(sec〇ndary)球 源’即所有新波源的波包會組成新的波前。該光/ 件123係根據人射/出射光之波長與基板之折射^來咬 計經光繞射元件123後光線之前進方向。繞射效率與ς 光繞射元件123上之複數個光繞射單元晶格124之婁^ 有關。需注意的是,該複數個光繞射單元晶格124之數 目係具有2的整數倍階數且具有4階厚度之週期性變 化;該複數個光繞射單元晶格124之長度係以16um為 一週期。該複數個光繞射單元晶格丨2 4之介質厚度係二 定其入射光波前之繞射方向。該複數個光繞射單元晶格 124係用於分散為複數束不同方向與角度之光線以達 到能量均勻分佈。該複數個光繞射單元晶格124之表面 夤厚度不大於1 Oum。该複數個光繞射單元晶格124 之繞射角度不大於90度。 根據本發明所揭示之波長解多工器120,其中該光 繞射元件123(DOE)之設計步驟係為: (1)找出不影響波前形狀之表面介質厚度,若光波長為 λΐ,則當表面介質厚度= 時,通過此材料 之光波波前形狀不改變。舉例來說,使用下列3 種通訊波長λΐ、λ2與λ3來設計,分別為850nm、 1310nm、1550nm。其介質之拆射率為η=ι·5,計算 不影響波前行進方向之表面介質厚度Dn(x),公式Ίο FE007-P432-TW 1287370 The mother-point material is considered to be a secondary (sec〇ndary) ball source, ie the wave packets of all new wave sources will form a new wavefront. The light/piece 123 bites the forward direction of the light passing through the light diffraction element 123 in accordance with the wavelength of the human/external light and the refraction of the substrate. The diffraction efficiency is related to the plurality of light diffraction unit cells 124 on the diffractive diffraction element 123. It should be noted that the number of the plurality of light diffraction unit cells 124 has an integer multiple of 2 and has a periodic variation of the fourth-order thickness; the length of the plurality of light diffraction unit cells 124 is 16 μm. For a cycle. The dielectric thickness of the plurality of light diffraction unit lattices 二 24 determines the diffraction direction of the incident light wavefront. The plurality of light diffraction unit lattices 124 are used to disperse light of a plurality of beams in different directions and angles to achieve uniform energy distribution. The surface of the plurality of light diffraction unit cells 124 has a thickness of no more than 1 Oum. The diffraction angle of the plurality of light diffraction unit cells 124 is no more than 90 degrees. According to the wavelength demultiplexer 120 disclosed in the present invention, the design steps of the light diffraction element 123 (DOE) are as follows: (1) Find the thickness of the surface medium that does not affect the shape of the wavefront, and if the wavelength of the light is λΐ, Then, when the surface medium thickness =, the wavefront shape of the light passing through the material does not change. For example, the following three communication wavelengths λ ΐ, λ 2 and λ 3 are used, which are 850 nm, 1310 nm, and 1550 nm, respectively. The disassembly rate of the medium is η=ι·5, and the surface dielectric thickness Dn(x) which does not affect the traveling direction of the wavefront is calculated.

II FE007-P432-TW 1287370 為故〇) = 7 义]-',故不影響 850nm、1310nm、1550nm 通訊波長的各別厚度分別為Di(x) = L7um、D2(x)= 2.62um 與 D3(x) = 3.1um。 (2) 請參照第6a圖,計算出不會影響λΐ與λ3之波前 之表面介質厚度,即D3(x)、DJx)的最小公倍數 m31=5.27um。其中,經設計計算後,以m31為階 層厚度,使λ2之光波長偏折,而λΐ與λ3之光波 • 長不偏折,其DOE之表面介質厚度為DKx)。 (3) 請參照第6b圖,計算出不會影響λ2與λ3之波前 之介質厚度,即D2(x)、D3(x)的最小公倍數 m32=8.12um。其中,表面介質厚度為Di(x)。 (4) 請參照第6c圖,若將步驟(2)與(3)合併可分別均勻 解析出λΐ、λ2與λ3三種光線。其中,表面介質厚 度為 Di(x) + D2(x)。 請參考第7圖,其顯示為光繞射元件123之設計流 φ 程。首先計算出射光之繞射效率與繞射角度,經程式分 析以決定光繞射單元晶格124之結構、表面介質厚度與 週期。該光繞射單元晶格124較佳實施例係為步階式週 期性結構、表面介質厚度約為5um以下與8階週期以下。 再次配合第5圖以說明DOE之製程上。DOE的製 造方法大至上有三種:全像紀錄、光罩微影(黃光微影) 製程和直接紀錄。本發明較佳實施例係採用但不限於為 光罩微影(黃光微影)製程。在透明之基板,如石英,玻II FE007-P432-TW 1287370 is 〇) = 7 meaning]-', so the respective thicknesses of the communication wavelengths of 850nm, 1310nm and 1550nm are not affected, respectively Di(x) = L7um, D2(x) = 2.62um and D3 (x) = 3.1um. (2) Refer to Figure 6a to calculate the minimum common multiple of the surface dielectric thickness of the wavefront that does not affect λΐ and λ3, ie D3(x), DJx) m31=5.27um. Among them, after design calculation, the wavelength of λ2 is deflected by m31 as the layer thickness, while the wavelength of λΐ and λ3 is not deflected, and the surface dielectric thickness of DOE is DKx). (3) Refer to Figure 6b to calculate the thickness of the medium that does not affect the wavefront of λ2 and λ3, that is, the least common multiple of D2(x) and D3(x) m32=8.12um. Wherein, the thickness of the surface medium is Di(x). (4) Please refer to Figure 6c. If you combine steps (2) and (3), you can evenly resolve the three light rays λΐ, λ2 and λ3. Among them, the surface medium thickness is Di(x) + D2(x). Please refer to Fig. 7, which shows the design flow of the light diffractive element 123. First, the diffraction efficiency and the diffraction angle of the emitted light are calculated, and the structure of the light diffraction unit cell 124, the thickness and the period of the surface medium are determined by a program analysis. The preferred embodiment of the light diffraction unit cell 124 is a stepped periodic structure having a surface dielectric thickness of about 5 um or less and an 8th order period. Again with Figure 5 to illustrate the DOE process. There are three types of DOE manufacturing methods: hologram recording, mask lithography (yellow lithography), and direct recording. The preferred embodiment of the invention employs, but is not limited to, a reticle lithography (yellow lithography) process. On a transparent substrate, such as quartz, glass

ία FE007-P432-TW 1287370 璃基板、銦錫氧化物厚膜(IT0)或透明光阻,以傳統光 職影(黃光微影)製程製作。為了製作不同深度之複數 個光繞射單s晶格124,可採用多次黃光微影與侧製 程。或者使用灰階光I,由於光阻在灰階光罩不同顏色 ,度下有不同曝光深度,因此可達到不同較之光繞射 單元晶格124。該光阻係採用但不限於八2正光阻系列 與SU:8負光阻系列,其他厚膜光阻亦可實施。 另一方面,由於檄機電製程(MEMS)技術的快速 修發展^元件微小化的需求,光繞射元件123的複數個光 繞射單元晶格124製程亦可使用類微微機電之U(}A製 転’亦即是先於矽基版利用上半導體製程做出類似複數 ,光繞射單元晶格124之母模。再披覆一層透明的聚矽 氧烷類高分子聚合物PDMS或其相似物,待烘烤過後 脫模即可得到表面介質厚度約為5um左右之光繞射元 ^ 件123。該光繞射元件123之複數個光繞射單元晶格124 係具有2的整數倍階數,其較佳實施例係為4階。 • 、紅上所述,為了突破光纖傳輪上的瓶頸並解決傳統 多工/解多工器之缺點,本發明揭示一種波長解多 工器120係用以增加光纖傳輸的速度,以及增加發射光 ,個數和讀取光的個數,進而提昇讀取資料的流量達到 W亥波長解多工器讀取的倍數。根據本發明之使用DOE 凡件之波長解多工器120可有效的將光纖中不同光波 長的訊號分別解析出來,以增進該波長多工器之分光效 率。Ία FE007-P432-TW 1287370 Glass substrate, indium tin oxide thick film (IT0) or transparent photoresist, produced by the traditional photochrome (yellow lithography) process. In order to produce a plurality of light diffraction single s lattices 124 of different depths, multiple yellow lithography and side processes can be employed. Or, using gray scale light I, since the photoresist has different exposure depths in different colors of the gray scale mask, different light diffraction unit cells 124 can be achieved. The photoresist is used but not limited to the eight 2 positive photoresist series and the SU: 8 negative photoresist series. Other thick film photoresists can also be implemented. On the other hand, due to the rapid development of the electromechanical process (MEMS) technology, the need for miniaturization of components, the plurality of light diffraction unit lattices 124 of the light diffraction element 123 can also use U-like micro-electromechanical The system is based on the use of the upper semiconductor process to make a similar complex number, the diffraction mode of the unit 124 of the cell, and then a layer of transparent polyoxyalkylene polymer PDMS or similar The material, after being baked, is demolded to obtain a light diffraction element 123 having a surface medium thickness of about 5 um. The plurality of light diffraction unit lattices 124 of the light diffraction element 123 have an integer multiple of 2 The preferred embodiment is a fourth order. • In the red, in order to break through the bottleneck on the fiber transmission wheel and solve the shortcomings of the conventional multiplexer/demultiplexer, the present invention discloses a wavelength demultiplexer 120. It is used to increase the speed of fiber transmission, and increase the number of emitted light, the number of readings and the number of reading lights, thereby increasing the flow rate of reading data to a multiple of the reading of the multiplex wavelength multiplexer. The DOE is used according to the present invention. The wavelength resolution multiplexer 120 of the piece can effectively Different fiber length of the light wave signals are parsed, to improve the spectral efficiency of the wavelength multiplexer.

FE007-P432-TW -!28737〇 用以:二ί發明已以前述較佳實施例揭示,然其並非 本發明,任何熟習此技藝者,在不脫離本發日】 =神和範圍内’當可作各種之更動與修改。如上述的 =掉都可以作各型式的修正與變化,科會破壞 ,的精神。因此本發明之賴_當視後附之巾請專利 乾圍所界定者為準。 【圖式簡單說明】{ • 為了讓本發明之上述和其他目的、特徵、和優點能 更明顯’下文特舉本發明較佳貫施例,並配合所附圖 示,作詳細說明如下: 第1圖顯示為習知之波長多工網路之方塊圖; 第2圖顯示為根據本發明之波長解多工器; 第3圖顯示為繞射光學元件123和折射光學元件在 功能和外型上的差別; 第4a圖顯示為將平面光經傅氏轉換得到許多不同方 # 向與強度之示意圖; ,4b圖說明第3圖之該光繞射元件123之分光原理; 第5圖顯不為光繞射元件之詳細結構側視圖; f 6a圖顯示為介質厚度為D2(x)時之繞射光路徑; ,6b圖顯示為介質厚度為Dl(x)時之繞射光路徑; 第6C圖顯示為介質厚度為Dl(x)+D2(x)時之繞射光 路徑;以及 第7圖顯示為光繞射元件之設計流程。FE007-P432-TW -!28737〇: The invention has been disclosed in the foregoing preferred embodiments, but it is not the invention, and anyone skilled in the art can Can make a variety of changes and modifications. If the above = off can be used to make corrections and changes of various types, the division will destroy the spirit. Therefore, the invention of the present invention is subject to the definition of the patent attached to the patent. BRIEF DESCRIPTION OF THE DRAWINGS The above and other objects, features, and advantages of the present invention will become more apparent. 1 is a block diagram of a conventional wavelength multiplexing network; FIG. 2 is a wavelength demultiplexer in accordance with the present invention; and FIG. 3 is shown in a functional and external form of the diffractive optical element 123 and the refractive optical element. The difference is shown in Fig. 4a as a schematic diagram of a plurality of different directions and intensity obtained by Fourier transform of plane light; and Fig. 4b illustrates the principle of splitting of the light diffraction element 123 of Fig. 3; Fig. 5 is not Side view of the detailed structure of the light diffraction element; f 6a shows the diffracted light path when the medium thickness is D2(x); 6b shows the diffracted light path when the medium thickness is Dl(x); Figure 6C shows It is a diffracted light path when the medium thickness is Dl(x)+D2(x); and Fig. 7 shows the design flow of the light diffractive element.

1# FE007-P432-TW 1287370 【主要元件符號說明】 100習知之波長多工網路 110光纖 120波長解多工器 121波長多工器 122波長解多工器 123光繞射元件 f 124光繞射單元晶格1# FE007-P432-TW 1287370 [Major component symbol description] 100 conventional wavelength multiplex network 110 fiber 120 wavelength demultiplexer 121 wavelength multiplexer 122 wavelength solution multiplexer 123 light diffraction element f 124 light winding Shot element lattice

15 FE007-P432-TW15 FE007-P432-TW

Claims (1)

1287370 十、申請專利範圍: 1. 一種波長解多工器,其包含: 一多工器,用於接收來在光纖之頻譜範圍寬廣的光 波;以及 一光繞射元件,係配置於該多工器之一光信號輸出 端,用以將不同光波長的訊號分別解析出來; 其中該光繞射元件更包含複數個光繞射單元晶格,其 具有厚度呈複數階適期性變化之幾何形狀。 2. 如專利申請範圍第1項之波長解多工器,其中該光繞 射元件之基板係選自玻璃基板、銦錫氧化物厚膜與透 明光阻中之一種材料。 3. 如專利申請範圍第1項之波長解多工器,其中該光繞 射元件係以微機電製程所製作。 4. 如專利申請範圍第1項之波長解多工器,其中該光繞 射單元晶格之數目係具有2的整數倍階數。 5. 如專利申請範圍第4項之波長解多工器,其中該光繞 射單元晶格係為4階厚度之週期性變化。 6. 如專利申請範SI第4項之波長解多工器,其中該光繞 射單元晶格之長度係以16um為一週期。 \(&gt; FE007-P432-TW Λ 1287370 7. 如專利申請範圍第1項之波長解多工器,其中該光繞 射單元晶格之介質厚度與折射率決定其入射光波前 之繞射方向。 8. 如專利申請範圍第2項之波長解多工器,其中該複數 個光繞射單元晶格之厚度不大於l〇um。 9. 如專利申請範圍第2項之波長解多工器,其中該複數 個光繞射單元晶格之繞射角度不大於90度。1287370 X. Patent Application Range: 1. A wavelength demultiplexer comprising: a multiplexer for receiving a wide range of light waves in a spectral range of an optical fiber; and a light diffractive element disposed in the multiplex The optical signal output end of the device is configured to separately parse signals of different optical wavelengths; wherein the optical diffractive element further comprises a plurality of optical diffractive element crystal lattices having a geometric shape having a thickness of a plurality of stages. 2. The wavelength demultiplexer of claim 1, wherein the substrate of the light diffraction element is selected from the group consisting of a glass substrate, a thick film of indium tin oxide, and a transparent photoresist. 3. The wavelength demultiplexer of claim 1, wherein the light diffraction element is fabricated by a microelectromechanical process. 4. The wavelength demultiplexer of claim 1, wherein the number of lattices of the light diffraction unit has an integer multiple of two. 5. The wavelength demultiplexer of claim 4, wherein the light diffraction unit lattice is a periodic variation of a fourth order thickness. 6. The wavelength demultiplexer of claim 4, wherein the length of the light diffraction unit lattice is 16 um. The invention relates to a wavelength demultiplexer according to claim 1, wherein the dielectric thickness and refractive index of the light diffraction unit lattice determine the diffraction direction of the incident light wavefront. 8. The wavelength demultiplexer according to item 2 of the patent application, wherein the thickness of the plurality of light diffraction unit crystal lattices is not more than l〇um. 9. The wavelength demultiplexer according to item 2 of the patent application scope. , wherein the diffraction angle of the plurality of light diffraction unit lattices is no more than 90 degrees. 17 FE007-P432-TW17 FE007-P432-TW
TW94134545A 2005-10-03 2005-10-03 A wave division de-multiplexer TWI287370B (en)

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