1282867 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種光學元件，且特別是有關於一種 用於霧化光源及聚光的光學元件。 【先前技術】 受限於光源或發光元件製造上的限制，例如產生點光 源的發光一極體或產生線光源的冷陰極管，常常無法形成 亮度均一的平面光源。傳統上，在需要產生平面光源的產 品中’會在光源的出光處加上一片能將光源霧化的光學元 件，以將光源均勻化，並且在出光處再加上一片有聚光功 能的光學元件’以增加正向的亮度。典型的例子如液晶顯 示面板，光源至少必須透過液晶顯示面板之背光模組中的 擴散片及聚光片兩片光學元件後，才能使得正向的出光均 勻且亮度增加。 但疋’光學元件本身會吸收光線，當光源必須透過數 個光學元件使其均勻和聚光時，所發出的光線無法完全通 過光學元件，因此常常降低了光源的利用率。再者，光學 元件吸收光線之後會有老化的問題，會使穿透光的光學性 貝改變進而影響光線的色彩度。所以，如果能減少光學元 件的使用數目，將能大大改善上述問題。 【發明内容】 因此，本發明的目的之一就是在提供一種光學元件， 5 1282867 單一光學7L件即可達成傳統上必須由兩個光學元件才能達 成的效果。 更詳細而言’本發明提供一種可以霧化光源及聚光的 光學70件，其係包含光學基板及位於光學基板上的多個角 錐犬起。這些角錐突起是微米級以下的四角錐體，其中角 錐突起與光學基板較佳是一體成型的。 依照一較佳實施例，本發明用以霧化光源及聚光的光 學元件所包含之多個角錐突起的排列是規則的。 依妝一較佳實施例，本發明用以霧化光源及聚光的光 學元件所包含之多個角錐突起的排列是不規則的。 依照一較佳實施例，本發明用以霧化光源及聚光的光 學元件所包含之多個角錐突起的尺寸是相同的。 依照一較佳實施例，本發明用以霧化光源及聚光的光 學元件所包含之多個角錐突起的尺寸是不同的。 依照一較佳實施例，本發明用以霧化光源及聚光的光 學元件所包含之多個角錐突起的尺寸在5微米以下。 依照一較佳實施例，本發明用以霧化光源及聚光的光 學元件所包含之多個角錐突起的頂端是曲面的。 藉由本發明之光學元件，可以將不均勻的光源（例如但 不限於點光源或線光源）均勻化，形成亮度均一的平面光 源，且又具有聚光的功能，能夠增加正向的亮度。再者， 因為使用本發明的光學元件可以減少光學元件的使用數 目，因此可以減低光線被光學材料吸收的情況，維持光線 的色彩度並增加光源的利用率。 6 1282867 【實施方式】 本發明之較佳實施例將在此詳細地討論。然而，應注 思的疋’本發明提供了許多可實行的概念，並且可以根據 特定的組合、變化來具體化此概念。以下所討論的幾個實 施例僅僅是以特定的方式來闡述本發明的使用與製造，實 施例並不限制本發明的範圍。 φ 请參照第1 A圖，其繪示依照本發明之光學元件的一較 佳實施例之俯視圖，第1B圖為第1A圖之側視圖。光學元 件120包含光學基板100及位於光學基板1〇()上的尖頂角 錐突起110,其中尖頂角錐突起11〇與光學基板1〇〇是一體 成型的。上述之光學元件的材料較佳為於可見光處透光性 量好的材料，例如玻璃，聚酯材料等。而尖頂角錐突起11〇 是微米級以下的四角錐體，較佳為5微米以下的四角錐體。 雖然在第1A-1B圖所繪之尖頂角錐突起11〇為大小均 • 一且規則排列，但是尖頂角錐突起110的尺寸與排列方式 亦可為不規則的形式，並不受第1A_1B圖所繪之尖頂角錐 突起110的限制。請參照第1<::圖，其繪示本發明之一較佳 實施例之大頂角錐突起110為尺寸相同但排列方式不規則 的光學元件俯視圖。請參照第1£>圖，其繪示本發明之另一 較佳實施例之尖頂角錐突起110為尺寸不同且排列方式不 規則的光學元件俯視圖。 請參照第2A圖，其繪示依照本發明之光學元件的另一 較佳實施例之俯視圖，第2B圖為第2A圖之側視圖。光學 7 1282867 元件220包含光學基板200及位於光學基板200上的多個 頂端為曲面的角錐突起210,其中頂端為曲面的角錐突起 210與光學基板2〇〇是一體成型的。上述之光學元件的材料 較佳亦為於可見光處透光性量好的材料，例如玻璃，聚酯 材料等。而頂端為曲面的角錐突起210的大小是微米級以 下且頂端為曲面的四角錐體，較佳為5微米以下的頂端為 曲面的四角錐體。 雖然在第2A-2B圖所繪之頂端為曲面的角錐突起21〇 為大小均一且規則排列，但是頂端為曲面的角錐突起21〇 的尺寸與排列方式亦可為不規則的形式，並不受第2A_2b1282867 IX. Description of the Invention: [Technical Field] The present invention relates to an optical element, and more particularly to an optical element for atomizing a light source and collecting light. [Prior Art] Limited to the manufacture of light sources or light-emitting elements, such as a light-emitting diode that produces a point source or a cold cathode tube that produces a line source, it is often impossible to form a planar light source of uniform brightness. Traditionally, in products that require a planar light source, 'an optical element that atomizes the light source is added to the light source to homogenize the light source, and a light-concentrating optics is added to the light exit. Element ' to increase the brightness of the forward direction. A typical example is a liquid crystal display panel. The light source must pass through at least two of the diffuser and the concentrating sheet in the backlight module of the liquid crystal display panel to achieve uniform light emission and increased brightness. However, the optical element itself absorbs light. When the light source must pass through several optical elements to make it uniform and condensed, the emitted light cannot pass through the optical element completely, thus often reducing the utilization of the light source. Furthermore, the optical component absorbs light and has an aging problem that changes the optical shell of the transmitted light and affects the color of the light. Therefore, if the number of optical components used can be reduced, the above problems can be greatly improved. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide an optical component, 5 1282867 single optical 7L, which achieves the effect that has traditionally been achieved by two optical components. More specifically, the present invention provides an optical 70 that can atomize a light source and condense, comprising an optical substrate and a plurality of pyramid dogs on the optical substrate. These pyramidal projections are quadrangular pyramids of the order of micrometers or less, wherein the pyramidal projections are preferably integrally formed with the optical substrate. In accordance with a preferred embodiment, the arrangement of the plurality of pyramidal projections included in the atomizing source and the concentrating optical component of the present invention is regular. According to a preferred embodiment of the invention, the arrangement of the plurality of pyramidal projections included in the atomizing source and the concentrating optical element of the present invention is irregular. In accordance with a preferred embodiment, the plurality of pyramidal projections included in the atomizing source and the concentrating optical component of the present invention are the same in size. According to a preferred embodiment, the plurality of pyramidal projections included in the atomizing source and the concentrating optical component of the present invention are different in size. In accordance with a preferred embodiment, the plurality of pyramidal projections included in the atomizing source and the concentrating optical component of the present invention have a size of less than 5 microns. According to a preferred embodiment, the tips of the plurality of pyramidal projections included in the atomizing source and the concentrating optical component of the present invention are curved. With the optical element of the present invention, a non-uniform light source (such as, but not limited to, a point source or a line source) can be homogenized to form a planar light source of uniform brightness, and has a function of collecting light, which can increase the forward brightness. Furthermore, since the use of the optical element of the present invention can reduce the number of uses of the optical element, it is possible to reduce the absorption of light by the optical material, maintain the color of the light, and increase the utilization of the light source. 6 1282867 [Embodiment] A preferred embodiment of the present invention will be discussed in detail herein. However, the present invention provides a number of implementable concepts and can be embodied in terms of specific combinations and variations. The following examples are merely illustrative of the use and manufacture of the present invention in a particular manner, and the embodiments are not intended to limit the scope of the invention. φ Referring to Fig. 1A, there is shown a plan view of a preferred embodiment of an optical component in accordance with the present invention, and Fig. 1B is a side view of Fig. 1A. The optical element 120 includes an optical substrate 100 and a apex pyramid protrusion 110 on the optical substrate 1 ,, wherein the apex pyramid protrusion 11 〇 is integrally formed with the optical substrate 1 。. The material of the above optical element is preferably a material having a good light transmittance at visible light, such as glass, polyester material or the like. The apex pyramidal projection 11 〇 is a quadrangular pyramid having a micron order or less, preferably a quadrangular pyramid having a diameter of 5 μm or less. Although the apex pyramidal projections 11 绘 depicted in FIGS. 1A-1B are of uniform size and arranged regularly, the size and arrangement of the apex pyramidal projections 110 may be irregular and are not drawn by the first drawing. The limitation of the apex pyramidal protrusions 110. Referring to the first <:: figure, there is shown a top view of an optical element having the same size but irregular arrangement of the large top pyramidal protrusions 110 in accordance with a preferred embodiment of the present invention. Referring to FIG. 1A, there is shown a plan view of an apex pyramidal protrusion 110 of a different preferred embodiment of the present invention having optical elements of different sizes and irregular arrangements. Referring to Figure 2A, there is shown a plan view of another preferred embodiment of the optical component in accordance with the present invention, and Figure 2B is a side view of Figure 2A. Optics 7 1282867 The component 220 includes an optical substrate 200 and a plurality of pyramidal protrusions 210 having a curved top end on the optical substrate 200. The pyramidal protrusions 210 having a curved top end are integrally formed with the optical substrate 2A. The material of the above optical element is preferably a material having a good light transmittance at visible light, such as glass, polyester material or the like. The pyramidal projection 210 having a curved top end is a quadrangular pyramid having a diameter of less than micrometers and a curved top end, and preferably a quadrangular pyramid having a curved top end of 5 micrometers or less. Although the pyramidal projections 21 having the curved surface at the top of FIG. 2A-2B are uniform in size and regularly arranged, the size and arrangement of the pyramidal projections 21 having the curved top end may also be irregular and not subject to 2A_2b
圖所繪之頂端為曲面的角錐突起21〇的限制。請參照第2C 圖，其繪示本發明之一較佳實施例之頂端為曲面的角錐突 起210為尺寸相同但排列方式不規則的光學元件俯視圖。 晴參照第2D圖，其繪示本發明之另—較佳實施例之頂端為 曲面的角錐犬起21〇為尺寸不同且排列方式不規則的光學 元件俯視圖。 ^下面舉例說明本發明光學元件的製造方法，製造方法 係用以說明而非用以限定本發明之範圍。 佳實^ 3A圖至第3E圖，其騎示依據本發明一較 士也•一種具有不同大小角錐突起之光學元件之製造 >瓜程的剖面結構示意圖。 n曰庙*曰μ， 盲先，在第3Α圖中，提供一適當 值之日日0 300,此晶圓_可以是Ν+型或是ρ+型的半導 8 1282867 體晶圓。依照本發明較佳實施例，其係使用米勒指數為 <100>之矽晶圓300。 在第3B圖中’將石夕晶圓300表面之氧化物去除後，利 用非等向性蝕刻溶液來進行矽晶圓30〇之非等向性蝕刻。 由於非等向性蝕刻溶液對<1〇〇>面矽之蝕刻速率比<;111>面 之钱刻速率還快，因此在停止蝕刻後會自然形成四角錐形 溝槽320,而讓矽晶圓300轉變成母模31〇。因為於蝕刻前 並未於矽晶圓300之表面上覆蓋任何具有規則圖案之罩幕 層’因此蝕刻後會於矽晶圓300之表面上形成高低且大小 不同之四角錐形溝槽320。藉由調整蝕刻的參數（例如蝕刻 的時間、蝕刻時的溫度、蝕刻液的濃度或蝕刻液的種類）， 可以得到曲面的或尖的溝槽底部。上述之非等向性蝕刻 液，例如可為氫氧化鉀（KOH)溶液、氫氧化四曱銨 (Tetramethyl Ammonium Hydroxide ; TMAH)溶液或乙二胺 兒余紛（Ethylene Diamine Pyrocatechol ; EDP)溶液。 第3C圖係繪示利用模鑄方式複製母模31〇上的圖案來 製作金屬模具330。為使母模310得以導電以進行電鑄，因 此會先利用濺鍍或蒸鍍之方式，在母模310上先形成導電 層312，其材料可為任何導電性良好之金屬物質。最後，再 將母模3 10浸入電解槽中，以習知之電鑄技術將蝕刻好之 圖案進行翻鑄，並進行脫模，以形成金屬模具33〇。 在第3D圖中，係利用金屬模具330，以習知之方式製 造模具340。再以熱壓或射出成型方式，利用模具34〇來大 量複製出第3E圖之光學元件350。 9 1282867The top of the figure is the limit of the pyramidal protrusion 21〇 of the curved surface. Referring to Figure 2C, there is shown a plan view of an optical element having the same size but irregular arrangement of pyramidal protrusions 210 having a curved top end in accordance with a preferred embodiment of the present invention. Referring to Fig. 2D, there is shown a plan view of an optical element having a different size and irregular arrangement in the pyramidal dog with a curved top end according to another preferred embodiment of the present invention. The following is a description of the manufacturing method of the optical element of the present invention, which is intended to illustrate and not to limit the scope of the present invention. Fig. 3A to Fig. 3E are schematic diagrams showing the cross-sectional structure of a meristor according to the present invention, an optical element having pyramid pyramid protrusions of different sizes. n曰 Temple*曰μ, blind first, in the third diagram, provide an appropriate value of day 0 300, this wafer _ can be Ν+ or ρ+ type semi-conductive 8 1282867 body wafer. In accordance with a preferred embodiment of the present invention, a wafer 300 having a Miller index of <100> is used. After removing the oxide on the surface of the Shihua wafer 300 in Fig. 3B, the anisotropic etching of the tantalum wafer 30 is performed using the anisotropic etching solution. Since the etching rate of the non-isotropic etching solution to the <1〇〇> face is faster than the rate of the <;111> face, the quadrangular pyramid groove 320 is naturally formed after the etching is stopped, and The silicon wafer 300 is transformed into a master mold 31. Since the mask layer of the regular pattern is not covered on the surface of the germanium wafer 300 before etching, a quadrangular pyramid groove 320 having a height and a different size is formed on the surface of the germanium wafer 300 after etching. By adjusting the parameters of the etching (e.g., etching time, temperature during etching, concentration of etching solution, or type of etching liquid), a curved or pointed groove bottom can be obtained. The above anisotropic etching solution may be, for example, a potassium hydroxide (KOH) solution, a Tetramethyl Ammonium Hydroxide (TMAH) solution or an Ethylene Diamine Pyrocatechol (EPP) solution. Fig. 3C is a view showing that the metal mold 330 is produced by copying the pattern on the mother die 31 by a die casting method. In order to make the master mold 310 conductive for electroforming, the conductive layer 312 is first formed on the master mold 310 by sputtering or evaporation, and the material thereof may be any metal material with good conductivity. Finally, the master mold 3 10 is immersed in an electrolytic bath, and the etched pattern is cast-cast by a conventional electroforming technique, and demolded to form a metal mold 33. In the 3D drawing, the mold 340 is manufactured in a conventional manner by using a metal mold 330. Further, the optical element 350 of Fig. 3E is largely reproduced by a hot press or injection molding method using a mold 34. 9 1282867
π參閱第4A圖至第4G圖’其係料依據本發明一較 佳實施例之-種具有相同大小角錐突起之光學元件之製造 流程的剖面結構示意圖。首先，如第4A圖所述，提供一適 田P值之Ba圓以本發明之較佳實施例，係使用米勒指數π Referring to Figs. 4A to 4G' are schematic cross-sectional views showing a manufacturing process of an optical element having the same size pyramid protrusions in accordance with a preferred embodiment of the present invention. First, as shown in Fig. 4A, a Ba circle having a P value is provided. In a preferred embodiment of the present invention, the Miller index is used.
為<100>之⑦晶圓_。接著，以熱氧化法或其他習知之製 程’於碎晶圓働上形成氧切層彻。接著，利用旋轉塗 伟或其他習知之方式，於氧化梦層彻上形成光阻層， 並對此光阻層進仃曝光以及顯影製程，來形成圖案化 層 420 〇 接著如第4B圖所示，以此圖案化光阻層為姓刻罩 1 2乳化石夕層41G進行姓刻，其钱刻方式可使用濕姓刻 2钱刻法。以本實施例而言，係使用氟化胺和氫氣酸溶 、文、氣化梦層41G進行祕刻，來將圖案化姐層42〇上 ^圖案轉移至氧化⑦層41()，在氧切層彻之間形成開口 43U 0 钟同時參考nc圖與第5圖，第5圖為第4c圖的俯 見圖。於_完成後’以習知之方法來移除圖案化光 1且下圖案化之氧㈣層4lG。由於本實施例係用以形 :厂:目同大小四角錐體結構模具，因此圖案化之氧化石夕層 3在晶圓表面上隔出等面積之四角形開口 43〇，如第5 莫請參見第仍圖’以此圖案化之氧化石夕層410 為钱刻罩幕，时晶圓働進行祕刻。以本實施例而言， !282867 其係使用KOH溶液來進行石夕晶圓400之非等向性触刻，以 於石夕晶圓400之表面上形成四角錐形溝槽45〇。而於其他實 施例中亦可使用如TMAH溶液或EDP溶液等非等向性蝕刻 液來進行姓刻。雖然第4D圖所緣示之四角錐形溝槽450 之底部為尖的，但是可藉由調整餘刻的參數（例如餘刻的時 間、餘刻時的溫度、钱刻液的濃度或钱刻液的種類），亦可 讓四角錐形溝槽450之底部為曲面的。最後移除圖樣化之 氧化矽層410，形成母模440。 請參考第4Ε圖，當母模440完成後，即可利用如上所 述之方法，先於母模440上利用濺鍍或蒸鍍之方式形成導 電層465後’再以習知之電鑄技術將母模440之圖案進行 翻鑄’來形成金屬模具460。請同時參見第6圖，其係為第 4Ε圖中金屬模具460之俯視圖。由於本實施例之鍅刻罩幕 (即第5圖所繪示圖案化之氧化矽層41〇)定義出等面積之開 口 430的圖案，所以蝕刻完成後，會在矽晶圓之表面形成 具相同大小之四角錐形溝槽。因此，於翻鑄成金屬模具46〇 後’金屬模具460表面上將具有如第6圖所示之矩陣狀排 列的多個四角錐體結構470。如前述第4D圖所討論的，若 在第4D圖之步驟中所形成之四角錐形溝槽45〇為尖底，則 四角錐體470的頂端為尖的；若在第4d圖之步驟中所形成 之四角錐形溝槽450為曲面的，則四角錐體470的頂端為 曲面的。 1282867 請參照第4F圖，接著即可利用此金屬模具46〇，以習 知之方式製造模具480。再以熱壓或射出成型方式，利用模 具480，大量複製出第4G圖之光學元件"ο。 上述之方法，僅為多種實施例中之一部分，本發明亦 可搭配其他半導體製程，來於半導體晶圓上形成不同結構 之母模。 ° 讓藉由上述方法所製成之具有角錐突起的光學元件進 行測試’結果其霧度為71%，增亮效果為15〇%。上述之「霧 度」一辭係指透過光學元件而偏離入射光（光源）方向的散射 光通量與透射光通量之比，用百分數來表示。因此，本發 明較佳實施例所提供之光學元件，可讓高達71%之入射光 散射至別處。而入射光之亮度也增強為原來之1.5倍。 根據上述，藉由本發明之光學元件不僅可以將不均勻 的入射光（例如但不限於點光源或線光源）均勻化，還能夠增 加入射光的亮度。由此可證明，本發明的單一光學元件即 可以達成傳統上必須由兩個光學元件才能達成的效果，亦 即本發明的光學元件可以同時具有霧化光源及聚光的功 能。 雖然本發明已以一較佳實施例揭露如上，然其並非用 以限定本發明，任何熟習此技藝者，在不脫離本發明之精 神和範圍内，當可作各種之更動與潤飾，因此本發明之保 護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 127 wafers of <100>. Next, an oxygen cut layer is formed on the wafer crucible by thermal oxidation or other conventional processes. Next, using a spin coating or other conventional method, a photoresist layer is formed on the oxidized dream layer, and the photoresist layer is exposed and developed to form a patterned layer 420, as shown in FIG. 4B. In this way, the patterned photoresist layer is engraved with a surname of 1 2 emulsified Shixia layer 41G, and the money engraving method can use the wet surname to engrave 2 money engraving. In this embodiment, the fluorinated amine and hydrogen acid solution, the text, gasification dream layer 41G is used for secret engraving, to transfer the patterned layer 42 to the oxide layer 7 (), in oxygen The opening 43U is formed between the slit layers while referring to the nc map and the fifth graph, and the fifth graph is a top view of the fourth graph. After the completion of _, the patterned light 1 and the patterned oxygen (tetra) layer 4lG are removed by a conventional method. Since the embodiment is used for the shape: the factory: the same size quadrangular pyramid structure mold, the patterned oxidized stone layer 3 is separated from the surface of the wafer by an equilateral square opening 43〇, as shown in the fifth. At the same time, the patterned oxidized stone layer 410 is used as a money mask, and the wafer crucible is secretly engraved. In the present embodiment, !282867 uses a KOH solution to perform an anisotropic lithography of the lithographic wafer 400 to form a quadrangular pyramidal groove 45 on the surface of the lithographic wafer 400. In other embodiments, an anisotropic etching solution such as a TMAH solution or an EDP solution may be used for the surname. Although the bottom of the quadrangular pyramid groove 450 as shown in FIG. 4D is pointed, it can be adjusted by adjusting the parameters of the remaining time (for example, the time of the moment, the temperature in the remaining time, the concentration of the money engraving or the money engraving). The type of liquid) can also make the bottom of the quadrangular pyramid groove 450 curved. Finally, the patterned ruthenium oxide layer 410 is removed to form a master mold 440. Referring to FIG. 4, when the master mold 440 is completed, the conductive layer 465 can be formed by sputtering or vapor deposition on the master mold 440 by the method as described above. The pattern of the master mold 440 is turned over to form a metal mold 460. Please also refer to Fig. 6, which is a plan view of the metal mold 460 in Fig. 4 . Since the etch mask of the embodiment (ie, the patterned ruthenium oxide layer 41 第 shown in FIG. 5) defines a pattern of openings 430 of equal area, after the etching is completed, a surface is formed on the surface of the ruthenium wafer. A quadrangular pyramid groove of the same size. Therefore, after being cast into a metal mold 46, the surface of the metal mold 460 will have a plurality of quadrangular pyramid structures 470 arranged in a matrix as shown in Fig. 6. As discussed in the aforementioned FIG. 4D, if the quadrangular pyramid groove 45 formed in the step of FIG. 4D is a pointed bottom, the tip end of the quadrangular pyramid 470 is pointed; if in the step of FIG. 4d The formed quadrangular pyramid groove 450 is curved, and the tip end of the quadrangular pyramid 470 is curved. 1282867 Referring to Figure 4F, the mold 480 can then be fabricated in a conventional manner using this mold 46. Further, the optical element of the 4Gth image is reproduced in a large number by heat pressing or injection molding using the mold 480. The above method is only one of a plurality of embodiments, and the present invention can be combined with other semiconductor processes to form a mother mold of a different structure on a semiconductor wafer. ° The optical element having the pyramidal projection made by the above method was tested. As a result, the haze was 71%, and the brightening effect was 15%. The term "haze" as used above refers to the ratio of the scattered light flux to the transmitted light flux that is deflected away from the incident light (light source) through the optical element, and is expressed as a percentage. Thus, the optical component of the preferred embodiment of the present invention allows up to 71% of incident light to be scattered elsewhere. The brightness of the incident light is also increased by 1.5 times. According to the above, the optical element of the present invention can not only uniformize uneven incident light (for example, but not limited to, a point source or a line source), but also increase the brightness of the emitted light. From this it can be demonstrated that the single optical element of the present invention achieves the effect that has traditionally been achieved by two optical elements, i.e., the optical element of the present invention can simultaneously have the function of atomizing the light source and collecting light. Although the present invention has been described above in terms of a preferred embodiment, it is not intended to limit the invention, and it is obvious to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims. [Simple description of the diagram] 12
第4Α圖至第4G 施例之一種具有相同 的剖面結構示意圖。 1282867 第1A圖所示為根據本發明一實施例的光學元件俯視 圖，其中光學基板上的角錐突起具有相同的大小且是規則 排列的。 第1B圖是第1A圖的側視圖。 第1C圖，其繪示本發明之一較佳實施例之尖頂角錐突 起110為尺寸相同但排列方式不規則的光學元件俯視圖。 第1D圖，其繪示本發明之另一較佳實施例之尖頂角錐 突起110為尺寸不同且排列方式不規則的光學元件俯視圖。 第2A圖所示為根據本發明另一實施例的光學元件俯 現圖’其中光學基板上的角錐突起為頂端為曲面的四角錐 體，其具有相同的大小，且是規則的排列在光學基板上。 第2B圖是第2A圖的側視圖。 第2C圖，其繪示本發明之—較佳實施例之頂端為曲面 的角錐突起210為尺寸相同但排列方式不規則的光學元件 二认么^其繪不本發明之另一較佳實施例之頂端為曲 突起210為尺寸不同且排列方式不規則的光學元 -插目士 _至第3Ε圖係緣不依據本發明—較佳實施例之 一禋具有不同大小角錐風— 結構示意圖。 ^之先予讀之製造流程的剖面 圖，其係繪示依據本發明另一較佳實 大小角錐突起之光學元件之製造流程 13 1282867 第5圖為第4C圖的俯視圖。 第6圖為第4E圖之金屬模具460的俯視圖。 【元件代表符號簡單說明】 100、200 :光學基板 110、210 :角錐突起 120、220、350、490 :光學元件 300、400 ··晶圓 310、440 :母模 312、465 :導電層 320、450 ··四角錐形溝槽 330、460 ·•金屬模具 340、480 ··模具 410 :氧化矽層 420 :光阻層 430 ··開口 470 :四角錐體結構 14A schematic diagram of the same cross-sectional structure from the fourth to fourth embodiments. 1282867 Fig. 1A is a top plan view of an optical element in accordance with an embodiment of the present invention, wherein the pyramidal projections on the optical substrate are of the same size and are regularly arranged. Fig. 1B is a side view of Fig. 1A. 1C is a top plan view of an optical element having the same size but irregular arrangement in accordance with a preferred embodiment of the present invention. Fig. 1D is a plan view showing the apex pyramidal projections 110 of different preferred embodiments of the present invention in optical elements having different sizes and irregular arrangement. 2A is a perspective view of an optical element according to another embodiment of the present invention, in which a pyramidal projection on an optical substrate has a tip-shaped quadrangular pyramid having the same size and regularly arranged on an optical substrate. on. Fig. 2B is a side view of Fig. 2A. FIG. 2C is a view showing an optical element having the same shape but irregular arrangement of the pyramidal protrusions 210 having a curved top end according to the preferred embodiment of the present invention, which is not a preferred embodiment of the present invention. The top end of the curved protrusion 210 is a different size and irregular arrangement of optical elements - the plug-in to the third picture is not according to the present invention - one of the preferred embodiments - has a different size of pyramidal wind - structural schematic. BRIEF DESCRIPTION OF THE DRAWINGS The cross-sectional view of the manufacturing process, which is read first, shows the manufacturing process of an optical element of another preferred size pyramidal protrusion according to the present invention. 13 1282867 Fig. 5 is a plan view of Fig. 4C. Fig. 6 is a plan view of the metal mold 460 of Fig. 4E. [Simplified Description of Component Symbols] 100, 200: Optical Substrates 110, 210: Pyramid Protrusions 120, 220, 350, 490: Optical Elements 300, 400 · Wafers 310, 440: Mother Modes 312, 465: Conductive Layer 320, 450 · Four-corner tapered grooves 330, 460 · Metal molds 340, 480 · Mold 410: yttria layer 420: Photoresist layer 430 · Opening 470: Tetragonal pyramid structure 14