1271550 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種光學元件的製造方法’特別是指 一種微型光栅的製造方法。 曰 【先如技術】 參閱圖1，一般，微型光栅丨是在—尺寸極小、材料為 例如玻璃或是金屬薄片的剛性基板u上，形成由許多等間 距週期性分布的細小溝槽121所形成的分光部12， 的光學元件。 \ 當光100通過由此些細小溝槽121所形成的分光部12 時，遵循多狹縫繞射的基本光學原理產生繞射，而沿不同 角度產生多數繞射階光束·，而在光學系統中提供例如分 光、濾光、聚光或是偏折等功能。 般U型光柵1的製作，是在例如玻璃的剛性基板U 上，以機械方式精密地刻晝出該些相間隔的細小溝槽121 以形成分光部12，即完成微型光柵丨的製備。而，此製作 方式由於具有微細加工性、量產性的優點，而可以大量製 備出微型光柵1，進而運用在例如⑶讀取頭、⑽鏡頭、 LCD的背光板··等等各式目前的光學系統中。 大體來說，以機械方式確實能大量且精密地生產微型 光栅1，而供應用於目前已量產的各式光學系統或是光學產 品中 ° 然而，上述的光學系統或是光學產品都是剛性、不可 變形的，因此，以玻璃等剛性材料所製成的微型光柵i雖 1271550 然可以*無問題地直接應用；但是隨著例如類紙顯示器（ P—ke display)等可以收折、捲屈的光學系統或是光學 產品的研發，顯然，目前以機械方式量產、且以剛性材料 所製成的微型光柵1’無法直接適用於此等仍在研發的光學 系統或是光學產品中。 此外’以玻璃、石英等剛性材料所製造的微型光柵卜 在遇到外力作用時往往即行碎裂報廢，也會造成使用上的 不便。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an optical element, and more particularly to a method of manufacturing a micro-grating.曰 [First as technology] Referring to Fig. 1, in general, the micro-grating yoke is formed on a rigid substrate u having a very small size and a material such as glass or metal foil, formed by a plurality of fine grooves 121 periodically distributed at equal intervals. The optical element of the beam splitting portion 12. When the light 100 passes through the light splitting portion 12 formed by the small grooves 121, the diffraction is followed by the basic optical principle of multi-slit diffraction, and a plurality of diffraction orders are generated at different angles, and in the optical system. Provide functions such as splitting, filtering, concentrating or deflecting. The U-shaped grating 1 is fabricated by precisely engraving the spaced fine trenches 121 on a rigid substrate U such as glass to form the beam splitting portion 12, that is, completing the preparation of the micro-grating. However, this manufacturing method can produce a large number of micro-gratings 1 due to the advantages of fine workability and mass productivity, and can be applied to, for example, (3) read heads, (10) lenses, LCD backlights, etc. In the optical system. In general, the micro-grating 1 can be produced in large quantities and precisely by mechanical means, and is supplied to various optical systems or optical products that have been mass-produced at present. However, the above optical system or optical product is rigid. It is not deformable. Therefore, the micro-grating i made of a rigid material such as glass can be directly applied without problems, but it can be folded and curled with, for example, a P-ke display. In the development of optical systems or optical products, it is clear that micro-gratings 1' which are currently mass-produced mechanically and made of rigid materials cannot be directly applied to optical systems or optical products still under development. In addition, the micro-gratings made of rigid materials such as glass and quartz tend to be scrapped and scrapped when they encounter an external force, which may cause inconvenience in use.
因此，研發新的製造方法製造可以在受力時產生形變 的,型光栅，以適用於未來新的可以“收折的光學系統 或是光學產品巾，或以本身形變避免裂碎，提昇自身使用 範圍、方式，是學界、業界努力的方向之一。 【發明内容】 因此，本發明之目的，即在提供一種微型光柵的製造 方法，以大量且低成本地生產可以因應外力產生可回復地 形變的微型光柵。 於是，本發明一種微型光柵的製造方法，包含下列步 驟： . (a) 以半導體製程在一透明基板表面向下形成一成型 空間。 (b) 添注一透明且可固化之液態成型材，使該成型材 填容滿該成型空間，並自該成型空間及該透明基板表面更 向上形成一預定厚度。 (c) 待該成型材固化後即成一微型先栅。 1271550 ⑷將該微型光#與該透明基板相分離。 【貫施方式】 、有關本發明之前述及其他技術内容、特點與功效，在 以下配合茶考圖式之—個較佳實施例的詳細說明中，將可 清楚的呈現。 θ參閱圖2，本發明微型光柵的製造方法之-較佳實施例 、:疋可以製備出如圖3所示的微型光柵3，而可應用於一般 光予系、”充或光學產品中’且於受到外力以形變抵消外力作 用而不裂碎’或是未來新的可以捲屈收折的光學系統或是 光學產品中提供例如分光、遽光、聚光或是偏折等功能。 一先參閱圖2,首先進行步驟21，將一玻璃基板Μ清洗 办乎後’在玻璃基板41表面以電漿增強式化學氣相沉積成 f 一層非晶矽薄膜，作為第-遮覆層42。由於玻璃基板41 可透光，而無法直接應用曝光、顯影等微影製程，因此， 必須先成長第一遮覆層42以利後績製程。 接著進行步驟22，以光阻塗佈、曝光、顯影、钮刻之 過在《第_遮覆層42上定義出—具有預定圖像並遮覆 該第-遮覆層42部分預定區域的第二遮覆層43。在此，第 二遮覆層―43之預定圖像為多數等間隔排列之扁長條立方體 ’而使第-遮覆層42對應地顯露多數等間隔排列之狹長矩 形區域。 然後進行步驟23，以感應耦合電漿進行非等向性蝕刻 ’移除第-遮覆層42未被第二遮覆層43遮覆之對應區域 ’直到玻璃基板41之對應區域裸露。 7 1271550 以丙酮去除以光阻為材料的第二遮覆 然後進行步驟25,以留存之第一遮覆層42為遮罩 Mask)，以务备μ ^ 風虱馱自玻璃基板41表面向下蝕刻預定深度後 形成一Therefore, the development of new manufacturing methods can produce deformation-type gratings when subjected to force, so as to be suitable for future new "offset optical systems or optical products, or to deform themselves to avoid cracking and enhance their own use. Scope and manner are one of the directions of academics and industry efforts. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a method for manufacturing a micro-grating that can produce reversible topography in response to external forces by mass and low cost production. The micro-grating method of the present invention comprises the following steps: (a) forming a molding space downward on a surface of a transparent substrate by a semiconductor process. (b) adding a transparent and curable liquid The molding material is filled into the molding space, and a predetermined thickness is formed upward from the molding space and the surface of the transparent substrate. (c) After the molding material is cured, a micro-first grid is formed. 1271550 (4) The micro-light # is separated from the transparent substrate. [Comprehensive method], the foregoing and other technical contents, features and effects of the present invention, The following detailed description of a preferred embodiment of the tea reference pattern will be apparent. θ Referring to FIG. 2, a method for fabricating the micro-grating of the present invention - a preferred embodiment, can be prepared as shown in FIG. The micro-grating 3 shown in Fig. 3 can be applied to general optical systems, "charged or optical products" and subjected to external forces to resist deformation by external forces without cracking' or future new opticals that can be folded and folded. Functions such as splitting, illuminating, concentrating or deflecting are provided in the system or in the optical product. Referring first to FIG. 2, first, step 21 is performed to clean a glass substrate, and then plasma-enhanced chemical vapor deposition on the surface of the glass substrate 41 into a layer of amorphous germanium film as the first cladding layer 42. . Since the glass substrate 41 can transmit light, and the lithography process such as exposure and development cannot be directly applied, the first covering layer 42 must be grown first to facilitate the subsequent process. Next, in step 22, the photoresist coating, exposure, development, and buttoning are defined on the "the first covering layer 42" - having a predetermined image and covering a predetermined portion of the first covering layer 42 Two cover layers 43. Here, the predetermined image of the second covering layer - 43 is a plurality of flat elongated cubes arranged at equal intervals, and the first covering layer 42 correspondingly exposes a plurality of elongated rectangular regions arranged at equal intervals. Then, step 23 is performed to inductively couple the plasma for anisotropic etching to remove the corresponding region of the first cladding layer 42 which is not covered by the second cladding layer 43 until the corresponding region of the glass substrate 41 is exposed. 7 1271550 Remove the second mask with photoresist as the material with acetone and then proceed to step 25 to leave the first covering layer 42 as a mask, in order to prepare the μ ^ wind from the surface of the glass substrate 41 downward. Forming a predetermined depth after etching
i二間44，由於作為遮罩的第一遮覆層42是使玻 3基板41以多數等間隔之長矩形區域裸露，因此，該成型 工間44對應的具有複數等間隔且彼此平行的長條部441， 且母一長條部441的橫截面成一矩形。 、接著進仃步驟26，以氫氧化鉀去除以非晶矽為材料形 成的第-遮覆層42，此時，玻璃基板41表面向下形成成型 工間44，而可以作為母模使用，以便後續大量且低成本地 以翻模方式製備微型光柵3。Since the first cover layer 42 as the mask is such that the glass substrate 41 is exposed at a plurality of equally spaced rectangular regions, the molding station 44 has a plurality of equal intervals and are parallel to each other. The strip portion 441 has a rectangular cross section of the parent strip portion 441. Then, in step 26, the first-covering layer 42 formed of the amorphous germanium material is removed by using potassium hydroxide. At this time, the surface of the glass substrate 41 is formed downward to form the molding chamber 44, and can be used as a master mold, so that The micro-grating 3 is subsequently prepared in a large number and at low cost in a mold-over manner.
再進行步驟24 層43。 接著進行步驟27，選用一可固化，且固化後透明、並 在受外力作用時產生可回復地形變的液態成型材45，例如 聚對苯二甲酸稀丙脂，填注入玻璃基板41之成型空間44 中使4成型材45填容滿成型空間44，且更自成型空間 44及玻璃基板41表面向上形成一預定厚度。 然後進行步驟28，水平靜置一段時間，待成型材45固 化成型。 最後進行步驟29，將固化成型之成型材45與透明基板 41相分離（即一般所謂的脫模），所得到之固化成型的成型 材45即為圖3所示的微型光栅3。 本發明主要的創作概念是希望可以大量、快速、低成 本的製備出微型光柵，因此，本發明微型光栅的製造方法 1271550 ’是以目前極為成熟的半導體製程，自步驟21依序進行至 步驟26，而在玻璃基板41表面向下成型出成型空間44作 為母模使用，再以後續的步驟，大量、快速、且低成本的 製備出微型光栅。 茶閱圖3’以上述本發明微型光柵的製造方法所製得的 微型光柵3與習知的微型光柵丨相似，包含一形成有分光 口F 32之本體31，由於本體31是以對苯二甲酸稀丙脂為材Step 24 is performed on layer 24. Next, in step 27, a liquid molding material 45 which is curable and transparent after curing and which generates a recoverable topography when subjected to an external force, for example, polybutylene terephthalate, is used to fill the molding space of the glass substrate 41. In the 44, the molding material 45 is filled in the molding space 44, and a predetermined thickness is formed from the surface of the molding space 44 and the glass substrate 41 upward. Then, step 28 is carried out, and the mixture is allowed to stand horizontally for a while, and the material to be molded 45 is solidified. Finally, in step 29, the cured molded article 45 is separated from the transparent substrate 41 (i.e., generally referred to as demolding), and the obtained cured molded article 45 is the micro-grating 3 shown in Fig. 3. The main creative concept of the present invention is to prepare a micro-grating in a large amount, fast, and low-cost. Therefore, the manufacturing method 1281550 of the micro-grating of the present invention is based on the currently very mature semiconductor process, and proceeds from step 21 to step 26 sequentially. On the surface of the glass substrate 41, the molding space 44 is formed downward as a master mold, and the micro-grating is prepared in a large number, fast, and low cost in a subsequent step. The micro-grating 3 produced by the above-described micro-grating method of the present invention is similar to the conventional micro-grating ,, and comprises a body 31 formed with a light-distributing port F 32, since the body 31 is a terephthalic acid Sodium formate
料製成，因此受外力作用時產生可回復地形變，因此在遇 J卜力作用時，可作適度的撓屈、捲折，以抵消外力而不 石τ裂報廢，同時也可適用於未來新的可以捲屈收折的光學 系統或是光學產品中。 刀光邰3 2由複數許多等間距分布的細小溝槽3 21所形 成，使光100通過時遵循多狹縫繞射的基本光學原理產生 ,射二而形成複數繞射階光束2〇〇,配合參閱圖4,特別的 是’當本體31受外力作用而形變時，每一繞射階光束· 可：應地改變相位、能量密度，以及與能量分布，劃 曲^ :以改變分光後每-繞射階光纟2GG ；&此間的間^ 、或是每一繞射接力束2〇〇成像在一平面時的&布態樣。 ^在此要特別說明的是，上述僅以母模的成型空間44 a 形成具有複數等間隔且彼此平行的長條部441，且每一長料 刚面成一矩形態樣為例說明。事實上，當：翻 ^程製備作為基板的母模時，只要欲製造之微型光栅且 =光面可以製作成型，即因本身製程的再現性， 可以簡早翻製出成型空間態樣較為複雜，例如橫截面是 1271550 主P白梯狀、非對稱階梯狀等態樣的母模，i%而供後續大量 =速的翻製出供不同的光學應用的微型光栅；❿以半導體 製程進行母模的製備時，則在選擇性地重複進行 明之步驟，並配入〜#山 ^ I配ό疋義出不同圖像的遮覆層後，亦可以同 樣也衣備出較複雜形狀，例如非對稱之階梯狀、相對對稱 一；弟狀等等的成型空間態樣，而供大量翻製出供不同的 ，子^用的U型光栅。由於微型光柵分光部的態樣種類眾 多，當然在製作作為對應母模時也必須作對應改變，在此 不再 多加舉例贅述。 由上述沉明可知，本發明主要是利用半導體製程製備 出士母模，再選用可固化，且固化後透明、並在受外力作用 時產生可回復地形變的液態成型材45進行灌模、脫膜，以 大里、快速、低成本地製造微型光柵3，同時，由於選用的 成型材45固化後在受外力作用時仍可產生可回復地形變， 因此’製備完成的微型光栅3本身即不易在受到外力作用 時裂碎，而以本身材質具有的可以撓曲、捲折的特性，不 但可適用於目前的例如CD讀取頭、⑽鏡頭、lcd的背 光板.·等等各式光學系統或光學產品中，更可以應用在未來 新的可以捲屈收折的光學系統或是光學產品中，確實達到 本發明之創作目的。 惟以上所述者，僅為本發明之較佳實施例而已，當不 能以此限定本發明實施之範圍，即大凡依本發明申請^利 範圍及說明書内容所作之簡單的等效變化與修飾，皆仍屬 本發明專利涵蓋之範圍内。 10 1271550 【圖式簡單說明】 圖1是一示意圖，說明一光柵的構造，以及光通過時 產生繞射的情形； 圖2是一流程圖，說明本發明微型光柵的製造方法之 一較佳實施例； 圖3是一示意圖，說明以圖2之製造方法所製備的微 型光柵；及 圖4是一示意圖，說明圖3之微型光柵受力形變時， 光通過產生繞射也相對的改變。 1271550 【主要元件符號說明】 100 ·.·. .…光 29…·· …·步驟 200… •…繞射階光束 3…… •…微型光栅 1 ....... —被型光拇 31 "… …·本體 11…… 基板 32…·· …·分光部 12…… •…分光部 321… …·溝槽 121 ··· •…溝槽 41••… •…玻璃基板 21…… •…步驟 42···.. •…弟遮覆層 22…… •…步驟· 43···.· …·第二遮覆層 23…… •…步驟 44···.· •…成型空間 24…… •…步驟 441… —長條部 25…… …·步驟 45 成型材 26…… …·步驟 27…… …·步驟 28…… •…步驟 12It is made of material, so it can be recovered by external force. Therefore, when it is affected by J force, it can be used for moderate flexion and bending to offset the external force without scrapping the stone. It can also be applied to the future. New optical systems or optical products that can be folded and folded. The knife aperture 3 2 is formed by a plurality of fine grooves 3 21 of a plurality of equally spaced distributions, such that the light 100 passes through the basic optical principle of multi-slit diffraction, and the second diffraction beam 2 形成 is formed. Referring to FIG. 4, in particular, when the body 31 is deformed by an external force, each of the diffraction order beams can: change the phase, the energy density, and the energy distribution, and bend the ^: to change the spectroscopic - a diffracted order pupil 2GG; & between the sum ^, or each of the diffractive relay beams 2 〇〇 imaged in a plane & It is to be noted that the above-described forming space 44a of the mother mold is formed by forming a plurality of strips 441 which are equally spaced and parallel to each other, and each of the long straight faces is formed into a rectangular shape as an example. In fact, when the mastering method is used as the master of the substrate, as long as the micro-grating to be fabricated and the smooth surface can be formed, that is, due to the reproducibility of the process itself, it is complicated to reproduce the molding space. For example, the cross-section is 1271550 main P white ladder-shaped, asymmetric step-like isoforms, i% for subsequent large-scale = speed conversion of micro-gratings for different optical applications; In the preparation of the mold, the steps of the Ming are selectively repeated, and the masks of different images are arranged in the vicinity of the mold, and the complex shapes can also be prepared, for example, non- Symmetrical step-like, relatively symmetrical one; the shape of the shape of the disciform, etc., and for a large number of U-shaped gratings for different use. Since there are many types of micro-grating spectroscopic parts, of course, the corresponding changes must be made when making the corresponding master mold, and no further details are given here. It can be seen from the above-mentioned Shen Ming that the present invention mainly uses a semiconductor process to prepare a master mold, and then selects a liquid molding material 45 which is curable and transparent after curing, and which can generate a reversible topography when subjected to an external force, for filling and removing. The membrane is used to manufacture the micro-grating 3 in a large, fast and low-cost manner. At the same time, since the selected molding material 45 is cured, it can still generate a recoverable topography when it is subjected to an external force, so that the prepared micro-grating 3 itself is not easy to be When it is subjected to external force, it is broken, and its own material has the characteristics of flexing and folding. It can be applied not only to current optical reading systems such as CD reading heads, (10) lenses, lcd, etc. In optical products, it can be applied to new optical systems or optical products that can be folded and folded in the future, and indeed achieves the creative purpose of the present invention. However, the above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, that is, the simple equivalent changes and modifications made by the present application and the contents of the specification are All remain within the scope of the invention patent. 10 1271550 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing a configuration of a grating and a diffraction process when light passes through; FIG. 2 is a flow chart showing a preferred embodiment of a method for fabricating the micro-grating of the present invention. 3 is a schematic view showing the micro-grating prepared by the manufacturing method of FIG. 2; and FIG. 4 is a schematic view showing the relative change of the light by the generation of diffraction when the micro-grating of FIG. 3 is deformed by force. 1271550 [Description of main component symbols] 100 ···. ....Light 29...····Step 200... •...Distance beam 3...•...Micro-grating 1 ....... —Shaded by light 31 "...body 11...substrate 32...···light splitting unit 12...•...light splitting unit 321...·trench 121 ····...groove 41••...•...glass substrate 21... ... •...Step 42···.. •...Development layer 22... •...Steps·43·······Second cover layer 23... •...Step 44···.· •... Molding space 24... • Step 441... - strip portion 25... Step 45 Molding material 26... Step 27: ... Step 28... • Step 12