TWI270124B - Method for manufacturing transparent electrode board - Google Patents

Method for manufacturing transparent electrode board Download PDF

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Publication number
TWI270124B
TWI270124B TW90131951A TW90131951A TWI270124B TW I270124 B TWI270124 B TW I270124B TW 90131951 A TW90131951 A TW 90131951A TW 90131951 A TW90131951 A TW 90131951A TW I270124 B TWI270124 B TW I270124B
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Taiwan
Prior art keywords
transparent
electrode plate
transparent electrode
manufacturing
substrate
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TW90131951A
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Chinese (zh)
Inventor
Mao-Kuo Wei
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Ritdisplay Corp
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Priority to TW90131951A priority Critical patent/TWI270124B/en
Priority to US10/322,726 priority patent/US6918807B2/en
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Publication of TWI270124B publication Critical patent/TWI270124B/en

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Abstract

Disclosed is a method for manufacturing a transparent electrode board, wherein the transparent electrode board comprises a transparent substrate, a plurality of transparent anodes and an insulation layer. The method comprises the following steps: a step of forming transparent anodes, a step of forming an insulation layer and a step of curing. In the step of forming transparent anodes, a plurality of separated transparent anodes is formed on the transparent substrate. In the step of forming an insulation layer, the insulation layer is formed around the transparent anodes by using ink-jet printing. In the step of curing, the insulation layer is cured to thereby form the transparent electrode board.

Description

1270124 五、發明說明(1) 【發明領域】 本發明係關於一種透明電極板製造方法,特別是利用 喷墨印刷來製作透明電極板之絕緣層的透明電極板製造方 法。 、 【習知技術】 ,光 越來 在 在光電產業中,隨著電子產品曰益追求輕薄短 電元件也朝微縮的方向發展。為了符合目前的趨勢 越要求元件内部的精準度來減少空間的浪費。 由於透明電極板同時具有透光性質與導電性所 LED、EL及LCD產業中扮演重要的角色。如圖^斤示貝,一般 作為顯示器用之透明電極板2之元件結構包括j 、複數個透明陽極22以及一絕緣層23。在透明電極土 中,絕緣層2 3的主要特徵和目的有二,_ 光源區,另一係避免在透明陽極22 :邊緣 場,進而延長透明電極板之壽命。、、生不均勻的電 目前透明電極板2的製造方法如圖 圖2A中,首先提供一透明基抓,在圖%所不。在 :透明陽極層22。接著,利用微 J 2板21上鍍上 (如圖2Β所示)。再下來,以具有言,作^陽極圖案 作絕緣層材料旋轉塗佈於其上,7 、且的高分子材料當 絕緣層23圖案(如圖2c所示)。 < 再以微影方式製作出 其中,絕緣層23結構製作方法 高分子溶液當作絕緣層材料,種係使用 九、烤方式在透明基板21上製作腔係以旋轉塗佈、 層溥膜,接著依序以曝 五、發明說明(2) 供烤方式在透明美柄 光、烘烤、顯影二及烘烤緣層薄膜’接著依序以曝 用非光阻型之$八it作出絕緣層結構。第二種係使 佈、烘烤方式在透明λ柘μ:f緣層材枓’其係以旋轉塗 九阻塗佈、烘烤、曝 賴#者依序以 及烘烤製作出絕缘緣層蝕刻、光阻去除以 和感光型/非减光型0硬°化二第二種則為使用網版印刷方式 其方法乃將具有特定硬:^ π付疋圖案的網版置於其 、 和固化(曝光/加熱)方式製、' ,以印刷方式 前二種絕緣層23的製程使=出;邑二層:構。由此可知’ 步驟繁複耗時、使用機^ f電極板2的製造方法 !〇%) ^ 法快速,但其絕緣層結構之解析度;:二;早、製造: 清洗網版,環保考量上處理不易更而使用大里的有機溶劑 【發明概要】 承亡所述,本發明之目的係提供一種成本低、時 間紐、節省能源以及減少環保問題的透明電極板方 法。 、 本ίΐ上ΐ:Γ本發明提供"'種透明電極板製造方 法’其中,透明電極板包含一透明基板、複數個透明陽極 以及一絕緣層,該透明電極板之製造方法包含下列步驟:1270124 V. INSTRUCTION DESCRIPTION OF THE INVENTION (1) Field of the Invention The present invention relates to a method of manufacturing a transparent electrode plate, and more particularly to a method of manufacturing a transparent electrode plate using an ink jet printing to form an insulating layer of a transparent electrode plate. [Practical technology], light is increasingly in the optoelectronic industry, as electronic products pursue the pursuit of light and thin short-circuit components in the direction of miniaturization. In order to comply with the current trend, the more precision inside the component is required to reduce the waste of space. The transparent electrode plate plays an important role in the LED, EL and LCD industries due to its both light transmissive properties and electrical conductivity. As shown in the figure, the element structure of the transparent electrode plate 2 for display is generally composed of j, a plurality of transparent anodes 22, and an insulating layer 23. In the transparent electrode soil, the main features and purposes of the insulating layer 23 are two, the light source region, and the other is avoided in the transparent anode 22: the edge field, thereby prolonging the life of the transparent electrode plate. Non-uniform electric current The manufacturing method of the transparent electrode plate 2 is as shown in Fig. 2A. First, a transparent base is provided, which is not shown in the figure. In: transparent anode layer 22. Next, it is plated on the micro J 2 plate 21 (as shown in Fig. 2A). Further, the polymer material is spin-coated on the insulating layer material, and the polymer material is patterned as the insulating layer 23 (as shown in Fig. 2c). < Manufactured by lithography, the method of fabricating the insulating layer 23 is a polymer solution as an insulating layer material, and the seed system is formed on the transparent substrate 21 by spin coating to spin coating and laminating the film. Then, in order to expose the five, the invention description (2) for the baking method in the transparent beauty handle light, baking, developing two and baking the edge film 'substitute sequentially to expose the non-resistive type of $ eight to make the insulation layer structure. The second type is to make the cloth and baking method in the transparent λ柘μ:f edge layer 枓', which is coated with an insulating layer by spin coating, baking, and aging. , the photoresist removal and the photosensitive/non-dimming type 0 hardening 2, the second method is to use the screen printing method, the method is to place a screen with a specific hard: ^ π 疋 pattern, and curing (Exposure/heating) method, ', the printing process of the first two kinds of insulating layer 23 process = =; 邑 two layers: structure. Therefore, it can be seen that the 'step is complicated and time-consuming, the manufacturing method of the machine electrode plate 2 is used! 〇%) ^ The method is fast, but the resolution of the insulation layer structure is: 2; early, manufacturing: cleaning the screen, environmental considerations The organic solvent which is difficult to handle and which is difficult to use is summarized. [In summary of the invention] The object of the present invention is to provide a transparent electrode plate method which is low in cost, time-saving, energy-saving, and environmentally-friendly. The present invention provides a method for manufacturing a transparent electrode plate, wherein the transparent electrode plate comprises a transparent substrate, a plurality of transparent anodes, and an insulating layer, and the method for manufacturing the transparent electrode plate comprises the following steps:

1270124 五、發明說明(3) 一透明陽極形 驟。其中,於 複數個相互分 墨印刷方式在 中,係將絕緣 與習知技 透明基板上形 光罩或網版、 (developer) 減少製程中所 成步驟、一絕緣層形成步 透明陽極形成步驟中,係 離之透明陽極;於絕緣層 透明陽極周圍形成絕緣層 層固化,據以形成透明電 術相比’在本發明中係主 成一絕緣層,其係減少製 降低製造時間與成本,以 與去光阻劑(stripper) 產生的環保問題。詳細之 驟以及一固化步 於透明基板上形成 形成步驟中係以噴 ;而於固化步驟 極板。 要利用噴墨印刷在 程步驟、不需使用 及不需利用顯影劑 等有機溶劑,可 比較如下表所示。1270124 V. INSTRUCTIONS (3) A transparent anode shape. Wherein, in the plurality of mutual ink-discharging printing methods, the step of forming a transparent anodic forming step in the process of reducing the process of forming a mask or a screen on a transparent substrate on a transparent substrate; a transparent anode which is separated from the transparent anode; and an insulating layer is formed around the transparent anode of the insulating layer to form a transparent electroscopy. In contrast, in the present invention, the insulating layer is formed into an insulating layer, which reduces the manufacturing time and cost, and The environmental problem caused by going to the stripper. Detailed steps and a curing step are performed on the transparent substrate to form a step in the forming step, and in the curing step. To use inkjet printing processes, no use, and no need to use organic solvents such as developer, compare them to the table below.

1270124 五、發明說明(4) ' 【較佳實施例之詳細說明】 以下將參照相關圖式,說明依據本發明實施例之一種 透明電極板製造方法。其中相同的元件將以相同的參照符 號表示。1270124 V. DESCRIPTION OF THE INVENTION (4) 'Detailed Description of Preferred Embodiments Hereinafter, a method of manufacturing a transparent electrode plate according to an embodiment of the present invention will be described with reference to the related drawings. The same elements will be denoted by the same reference symbols.

如圖3所示’本發明之第一實施例的透明電極板製造 方法係包含:一透明陽極形成步驟(s〇 i )、一絕緣層形 成步驟(S02 )以及一固化步驟(s〇3 )。其中,於透明陽 極形成步驟中,係於透明基板丨丨上形成複數個相互分離之 透^陽極1 2,於絕緣層形成步驟中係以喷墨印刷方式在透 月陽極1 2周圍形成絕緣層1 3,而於固化步驟中,係將絕緣 層1 3固化,據以形成透明電極板1。 如圖4A所示,於步驟s〇i中,係在透明基板丨丨上利用 濺鍍(sputtering)或是離子電鍍(i〇n plating)的方 式鍍上一透明陽極層丨2,再使用微影方法製作出相互分離 的透明陽極1 2,當然,複數個相互分離的透明陽極丨2亦可 為長條型的透明陽極12,如圖4B所示。透明陽極12的材質 可為氧化銦錫(ΙΤ0 )或是氧化鋁鋅(AZ〇 ),且其厚度在 約5 0 0翼:以上。As shown in FIG. 3, the transparent electrode plate manufacturing method of the first embodiment of the present invention comprises: a transparent anode forming step (s〇i), an insulating layer forming step (S02), and a curing step (s〇3). . Wherein, in the transparent anode forming step, a plurality of mutually separated transparent anodes 1 2 are formed on the transparent substrate, and an insulating layer is formed around the moon-passing anode 1 by inkjet printing in the insulating layer forming step. 1 3, and in the curing step, the insulating layer 13 is cured to form the transparent electrode plate 1. As shown in FIG. 4A, in step s〇i, a transparent anode layer 丨2 is plated on the transparent substrate by sputtering or ion plating, and then micro-application is used. The shadow method produces a transparent anode 12 which is separated from each other. Of course, a plurality of transparent anodes 2 separated from each other may also be elongated anodes 12, as shown in Fig. 4B. The material of the transparent anode 12 may be indium tin oxide (ΙΤ0) or aluminum zinc oxide (AZ〇), and its thickness is about 50,000 wings or more.

在此’透明基板11可為一玻璃基板、一塑膠 (plastic)基板、以及一柔性(f iexible)基板。其中,塑 膠基板或柔性基板可為一聚碳酸酯(p〇lycarb〇n/ate,pc ) 基板、一聚醋(polyester, PET )基板、一環烯共聚物Here, the transparent substrate 11 may be a glass substrate, a plastic substrate, and a flexible substrate. The plastic substrate or the flexible substrate may be a polycarbonate (p〇lycarb〇n/ate, pc) substrate, a polyester (PET) substrate, a cycloolefin copolymer.

第7頁 1270124 五、發明說明(5) (cyclic olefi 物基材一環稀共 olefin 接 驟係以 板特定 方式, 上之喷 一絕緣 請 不需使 意印刷 圖案, 且可大 統的絕 步驟才 其 成,其 陽極12 命。在 1 06ohm 以上。 copolym 下來,如 噴墨印刷 位置之對 係於對準 墨頭噴出 層1 3或基 參照圖5B 用光罩或 成所需的 此等圖案 幅度地縮 緣層形成 能達到相 中,絕緣 用以定義 邊緣所產 此,絕緣 〜cm以上 n cop〇lymer,C0C)基板以及一金屬鉻合 聚物(metallocene- based cyclic er,mCOC )基板。 圖5A所示,於步驟s〇2中,絕緣層形成步 方式在透明陽極12周圍形成絕緣層13或基 準圖案。於絕緣層形成步驟中之喷墨印刷 該等透明陽極1 2周圍區域後,使用一個以 絕緣材料,而於該等透明陽極丨2周圍形成 板特定位置之對準圖案。 ’利用喷墨印刷形成絕緣層的優點之一係 網版,僅需進行單一步驟即可將絕緣層任 圖案’如文字或是不規則圖形等較複雜的 使传透明電極板的應用範圍更加廣泛,並 短產品從設計到製造所需的周期,然而傳 方法則必須利用光罩或網版、以及繁複的 同的效果。 層1 3係以感光型高分子的絕緣材料所形 光源區的大小和區域,以及用來避免透明 生不均勻的電場,而影響到元件的使用壽 層13的厚度大於〇 微米,其體阻值在 ’且其特徵尺寸(線寬/線距)在2〇微米Page 7 1270124 V. INSTRUCTIONS (5) (The cyclic olefiar substrate is a plate-specific olefinic connection in a plate-specific manner, and the spray on the insulation is not required to be printed, and it can be a step-by-step process. The result is that the anode is 12 volts. Above 106 ohms. Copolym down, such as the inkjet printing position, is aligned with the ink head ejection layer 13 or the base is replaced with a mask or the desired pattern width. The formation of the reductive layer can reach the phase, the insulation is used to define the edge, the insulation is more than cm, and the substrate is a metallocene-based cyclic er (mCOC) substrate. As shown in Fig. 5A, in the step s2, the insulating layer forming step forms an insulating layer 13 or a reference pattern around the transparent anode 12. After ink-jet printing of the regions around the transparent anodes 1 in the insulating layer forming step, an alignment pattern is formed around the transparent anodes 2 by using an insulating material to form a specific position of the plates. 'One of the advantages of using inkjet printing to form an insulating layer is a screen, which can be used in a single step to make the insulating layer have a more extensive pattern of applications such as text or irregular patterns. And short products from design to manufacturing cycle, but the method must use the mask or screen, and the same effect. The layer 13 is a size and a region of the light source region shaped by the insulating material of the photosensitive polymer, and an electric field for avoiding the unevenness of the transparent generation, which affects the thickness of the use layer 13 of the element is larger than 〇 micron, and the body resistance thereof The value is 'and its feature size (line width / line spacing) is 2 〇 micron

1270124 五、發明說明(6) 等有所不同。所使用的對準方式亦隨著絕緣層圖案所 精準度而改變,例如:機械對準其對準精準度在Μ微米以 上,而光學對準其對準精準度在1微米以上。 在本實施例中,感光型高分子的絕緣材料可為感光性 聚亞醢胺(photosensitive polyimide,PSPI), 聚亞醯胺的主體結構中導入感光基,讓聚亞酿胺同時擁有 絕緣層以及光阻的特性。;^忠从取rrt: 感先性聚亞醯胺依其分子结構及 反應型式可分為開環負型的PSPI (Ring n Type PSPI)、閉環負型的pspi Type PSPI )、開環正型的pspT (p T PQ……一的讣1 (Rlng 〇Pened Positive Type PSPI)以及閉j展正型的ρςρτ「 τ ηοητ Λ 士圳 i的PSPI (Ring Close Positive1270124 V. Inventions (6) are different. The alignment used is also a function of the accuracy of the insulation pattern, for example, mechanical alignment with an alignment accuracy of more than Μ micron and optical alignment with an alignment accuracy of more than 1 micron. In this embodiment, the insulating material of the photosensitive polymer may be a photosensitive polyimide (PSPI), and a photosensitive group is introduced into the main structure of the polyamidamide, so that the polystyrene has both an insulating layer and The characteristics of the photoresist. ^^忠从罗rt: Sensitive polytheneamine can be divided into open-loop negative PSPI (Ring n Type PSPI), closed-loop negative pspi Type PSPI), open-loop positive type PSP (Pl P ......Pened Positive Type PSPI) and ρςρτ " τ ηοητ Λ 士 圳 i P P (Ring Close Positive)

Type PSPI ),在製程 φ 處 ffiDCDT π ,上 η μ , T 干應用PSPI可鈿短製程的步驟,以 及郎省光阻材料與光阻製程,對 s 本都有助益。 私對於如升製程良率及降低成 又士圖6所示’於步驟s 〇 3中係用以固化絕緣層1 3。 由於絕緣材料具有感光性,名 伞綠这k 』η 在進订絕緣層固化步驟時係以 )^ ^ ^ ^^ 中係利用適當的光線(如UV光等 )和適當的劑置照射加以♦ ^ Μ處理,猎以固化絕緣層1 3。 以下係本發明之另_眚竑加 士人丄# 丄 ^ ^ 1 q ^ ^ L ' 貝轭例,於本實施例中,除了絕 f13係以非感光型高分子的絕緣材料形成之外,其餘之 几件及特徵皆與第一實施彳丨4 、 ^ ^ 一只施例相冋。如圖7所示,由於絕緣 層1 3為一非感光型咼分子 仆半,取士〆 , 于的絕緣材料,在進行絕緣層1 3固 B± BO , ^ U化 其中,係利用適當的溫度和 、曰°,、、、處 精以固化絕緣層13而形成透明電極板1。Type PSPI), ffiDCDT π at the process φ, upper η μ , T dry PSPI can be used to shorten the process steps, as well as Lang's photoresist material and photoresist process, which is helpful for s. The private process is used to cure the insulating layer 13 in step s 〇 3 for the process of the process and the reduction of the process. Since the insulating material is photosensitive, the k η η is used in the curing step of the insulating layer, and is irradiated with appropriate light (such as UV light) and appropriate agent. ^ Μ Processing, hunting to cure the insulation layer 13. In the following, in addition to the insulating material of the non-photosensitive polymer, the f13 is formed by the insulating material of the non-photosensitive polymer in the present embodiment. The remaining parts and features are contrary to the first implementation 彳丨4, ^^ one example. As shown in Fig. 7, since the insulating layer 13 is a non-photosensitive type 咼 molecular servant half, the insulating material is taken from the insulating material, and the insulating layer 13 is fixed B±BO, ^ U is used therein, and the appropriate The transparent electrode plate 1 is formed by curing the insulating layer 13 at a temperature of 和, 曰, , , , .

1270124 五、發明說明(7) 本發明係利用喷墨印刷方式在透明基板上形成絕緣 層,只需進行對準、喷墨印刷以及固化三個簡單的步驟, 即可形成透明電極板之絕緣層’而不需使用微影製程中 顯影劑與去光阻劑,可減少環保問題的產生;又,啥 之 刷方式可將絕緣層製成實際所需的任意圖案,如把墨印 案、文字以及不規則圖案,不需進行繁複的 ^圖 可降低生產成本及時間。 v驟,亦 上述僅為舉例性,而非為限 明之精神與範疇,而對其進行之性者。任何未脫離本發 含於後附之申請專利範圍中。 效修改或變更,均應包1270124 V. INSTRUCTION DESCRIPTION (7) The present invention uses an inkjet printing method to form an insulating layer on a transparent substrate, and only requires three steps of alignment, inkjet printing, and curing to form an insulating layer of the transparent electrode plate. 'Without the use of developer and photoresist in the lithography process, it can reduce the occurrence of environmental problems; in addition, the brush can be used to make the insulation layer into any pattern that is actually needed, such as ink printing, text As well as irregular patterns, it is not necessary to carry out complicated drawings to reduce production costs and time. v. The above is also an example only, and is not intended to limit the spirit and scope of the invention. Any departure from the scope of this patent application is hereby incorporated by reference. Modifications or changes should be packaged

第10頁 1270124 圖式簡單說明 【圖式之簡單說明】 圖1係習知之透明電極板之元件結構的示意圖。 圖2A到圖2C係習知之透明電極板製造方法的示意圖。 圖3係本發明第一實施例之透明電極板製造方法的方 塊圖。 圖4A及圖4B係本發明第一實施例之透明陽極形成步驟 的示意圖。 圖5A及圖5B係本發明第一實施例之絕緣層形成步驟的 不意圖。 圖6係本發明第一實施例之固化步驟的示意圖。 圖7係本發明另一實施例之絕緣層固化步驟的示意 圖0 【圖 式符 號 說 明 ] 1 透 明 電 極 板 11 透 明 基 板 12 透 明 陽 極 13 絕 緣 層 2 透 明 電 極 板 21 透 明 基 板 22 透 明 陽 極 23 絕 緣 層Page 10 1270124 Brief description of the drawings [Simplified description of the drawings] Fig. 1 is a schematic view showing the structure of a conventional transparent electrode plate. 2A to 2C are schematic views showing a conventional method of manufacturing a transparent electrode plate. Fig. 3 is a block diagram showing a method of manufacturing a transparent electrode plate according to a first embodiment of the present invention. 4A and 4B are schematic views showing a transparent anode forming step of the first embodiment of the present invention. Figs. 5A and 5B are views showing the steps of forming the insulating layer of the first embodiment of the present invention. Figure 6 is a schematic illustration of the curing step of the first embodiment of the present invention. Fig. 7 is a schematic view showing the step of curing the insulating layer according to another embodiment of the present invention. Fig. 0 [Illustration of the symbol] 1 transparent electrode plate 11 transparent substrate 12 transparent anode 13 insulating layer 2 transparent electrode plate 21 transparent substrate 22 transparent anode 23 insulating layer

第11頁Page 11

Claims (1)

12701241270124 、申請專利範圍 美種透明電極板製造方法,其中透明電極板包含一透明 二f三複數個透明陽極以及一絕緣層,該透明電極板製造 方法2含下列步驟: ;ι:Β ^、透明陽極形成步驟’係於該透明基板上形成複數個 相互之透明陽極; 、’、邑緣層形成步驟,係以喷墨印刷方式在該透明 周圍形成該絕緣層; 及 據以形成一透明電 一固化步驟,係將該絕緣層固化 極板。 中如申睛專利範圍第1項所述之透明電極板製造方法,其 ,,絕緣層形成步驟中之喷墨印刷方式,係於對準該 一透明陽極周圍區域或基板特定位置之對準圖案後,使^ 個以上之喷墨頭噴出絕緣材料,而於該等透明陽極周圍 形成一絕緣層。 3·如申請專利範圍第1項所述之透明電極板製造方法,立 中 〆、 該透明基板係為一玻璃基板。 4·如申請專利範圍第丨項所述之透明電極板製造方法,其The invention discloses a method for manufacturing a transparent electrode plate, wherein the transparent electrode plate comprises a transparent two f-three transparent anodes and an insulating layer, and the transparent electrode plate manufacturing method 2 comprises the following steps: ; ι: Β ^, transparent anode Forming step 'forming a plurality of mutually transparent anodes on the transparent substrate; ', a rim edge layer forming step of forming the insulating layer around the transparent by inkjet printing; and forming a transparent electric curing In the step, the insulating layer is cured by the insulating layer. The method for manufacturing a transparent electrode plate according to the first aspect of the invention, wherein the inkjet printing method in the step of forming the insulating layer is an alignment pattern that is aligned with a region around the transparent anode or a specific position of the substrate. Thereafter, more than one of the ink jet heads are ejected from the insulating material, and an insulating layer is formed around the transparent anodes. 3. The method of manufacturing a transparent electrode plate according to claim 1, wherein the transparent substrate is a glass substrate. 4. The method for manufacturing a transparent electrode plate according to the above application of the patent application, 第12頁 1270124 六、申請專利範圍 該透明基板係為〜塑膠基板。 ,其 如申請專利範圍第丨項所述之透明電極板製造方涑 該透明基板係為〜柔性基板。 漆 6·如申清專利範圍第4或5項所述之透明電極板製造方 其中 ' 該透明基板係為〜聚碳酸酯基板。 7.如申請專利棘圍第4或5斤述之透明電極板製造方法, 其中 ' 該透明基板係為―聚酯基板。 其中 如申請專利||目第4或^項所述之透明電極板製造方法, A透明基板係為—I缚共聚物基板 9其;申請專利範圍第4或5項所述之透明電極板製造方法, X透月基板係為〜金屬鉻合物基材—環烯共聚物基 1 0 ·如申請專利範圚势 圍第1項所述之透明電極板製造方法,其 I m Μ i 第13貢 ----- 物陽極 其中 1270124 六、申請專利範圍 中 該等透明陽極係為導電之金屬氧化 11.如申請專利範圍第1〇項所述之透明電極板製造方法, 其_ / 該等透明陽極係為氧化銦錫陽極 1 2·如申請專利範圍第丨〇項所述之透明電極 • 1造方法, 該等透明陽極係為氧化鋁鋅陽極 1 3 ·如申請專利範圍第1項所述之透明電極板淘I&方法, _ 中 該等透明陽極之製造方法為濺鍍法 其 14·如申請專利範圍第1項所述之透明電極板製、生 中 ^ ^ 該等透明陽極之製造方法為離子電鍍法。 其 1 5 ·如申請專利範圍第1項所述之透明電極板製造 中 該等透明陽極之厚度為50 〇遽以上。Page 12 1270124 VI. Scope of Application The transparent substrate is a plastic substrate. The transparent electrode plate manufacturing method as described in the scope of the patent application is the flexible substrate. Paint 6: The transparent electrode plate manufacturer according to the fourth or fifth aspect of the patent application, wherein the transparent substrate is a polycarbonate substrate. 7. The method for manufacturing a transparent electrode plate according to the fourth or fifth jin of the patent application, wherein 'the transparent substrate is a polyester substrate. The method for manufacturing a transparent electrode plate according to the fourth or the fourth aspect of the invention, the transparent substrate is a conjugated substrate, and the transparent electrode plate is manufactured according to claim 4 or 5. The method, the X-pervaporation substrate is a metal chromium composite substrate-cycloolefin copolymer base 1 0. The transparent electrode plate manufacturing method according to the first aspect of the patent application, the I m Μ i 13th贡----- The object anode 1270124 6. In the patent application, the transparent anodes are electrically conductive metal oxides. 11. The transparent electrode plate manufacturing method according to the first aspect of the patent application, _ / The transparent anode is an indium tin oxide anode 1 2 · The transparent electrode 1 according to the scope of the patent application, the transparent anode is an alumina zinc anode 1 3 · as claimed in claim 1 The method for manufacturing the transparent anodes is a sputtering method. The transparent electrode plate is made according to the first aspect of the patent application, and the transparent anode is formed. Manufacturing method is ion plating . In the manufacture of a transparent electrode plate as described in claim 1, the thickness of the transparent anode is 50 Å or more. 第14頁 1270124Page 14 1270124 1 6 ·如申睛專利範圍第1項戶斤述之透明電極板製遠方法,其 中 ' '、 該絕緣層之材質為一感光型高分子。 17.如申請專利範圍第1項所述之透明電極板製造方法,复 中 ' '、 該絕緣層之材質為一 #感光型高分子。 1 8.如申請專利範圍第丨項所述之透明電極板製造方法,農 中 ' '、 該絕緣層之厚度為〇· 〇5微米以上。 1 9 ·如申請專利範圍第1項所述之透明電極板製造方法,盆 中 ' '、 ϋ亥絕緣層之體阻值為1 〇6 〇 h m _ c m以上。 2=·如申請專利範圍第1項所述之透明電極板製造方法,其 忒絕緣層之特徵尺寸(線寬/線距)為20微米以上。 中申月專利範圍第2項所述之透明電極板製造方法,其 /準係為機械對準’其對準精準度在5 〇微米以上。1 6 · For example, the method of the transparent electrode plate of the first item of the scope of the patent application is as follows. The material of the insulating layer is a photosensitive polymer. 17. The method of manufacturing a transparent electrode plate according to claim 1, wherein the material of the insulating layer is a photosensitive polymer. 1 8. The method for producing a transparent electrode plate according to the invention of claim 2, wherein the thickness of the insulating layer is 〇·〇5 μm or more. 1 9 · The method for manufacturing a transparent electrode plate according to claim 1, wherein the body resistance of the '', and the insulating layer in the basin is 1 〇6 〇 h m _ c m or more. 2: The method for producing a transparent electrode plate according to claim 1, wherein the insulating layer has a feature size (line width/line distance) of 20 μm or more. The method for manufacturing a transparent electrode plate according to item 2 of the patent application scope of the Japanese patent is that the mechanical alignment is greater than 5 〇 micrometers. 第15頁 1270124 六、申請專利範圍 2 2.如申請專利範圍第2項所述之透明電極板製造方法,其 中 該對準係為光學對準,其對準精準度在1微米以上。 2 3.如申請專利範圍第2項所述之透明電極板製造方法,其 中 該喷墨頭包含一個以上之喷墨嘴。 2 4.如申請專利範圍第1 6項所述之透明電極板製造方法, 其中Page 15 1270124 VI. Scope of Application 2 2. The method of manufacturing a transparent electrode plate according to claim 2, wherein the alignment is optical alignment with an alignment accuracy of 1 micron or more. 2. The method of manufacturing a transparent electrode plate according to claim 2, wherein the ink jet head comprises one or more ink jet nozzles. 2. The method for manufacturing a transparent electrode plate according to claim 16, wherein 於固化步驟中係以光線曝光方式固化。 2 5.如申請專利範圍第1 7項所述之透明電極板製造方法, 其中 於固化步驟中係以加熱方式固化。It is cured by light exposure during the curing step. The method for producing a transparent electrode plate according to the above aspect of the invention, wherein the curing step is performed by heating in a curing step. 第16頁Page 16
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