1269892 、 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種彩色濾光片結構與補償方 法’而且特別關於在黑色矩陣區域具有數個突出區域 以補正彩色濾光片的晝素失真現象。 【先前技術】 因為薄形及平面顯示器具有高對比、省電及體 積小的優點，因此平面顯示器廣泛使用於電腦產品及 消費性產品。平面顯示器中，又以主動式薄膜電晶體 液晶顯示器（TFT-LCD)為主要的產品。其中，彩色濾 光片（color filter)為液晶顯示器的關鍵零組件之一。 薄膜液晶顯示器係藉由彩色濾光片將來自背光模組 (backlight module)的光線變成所需要的色彩。 液日日顯示斋為提南開口率（aperture rati〇)，所以 彩色濾光片之彩色畫素（pixel)需採用無黑色矩陣（BM Less)设计以提高開口率（aperture rati〇)。 清參閱第1圖。第1圖顯示習知無黑色矩陣（bm Less)的光罩设什。光罩圖案係包含數個平行的黑色 矩陣11與數個彩色畫素12。為提高開口率，設計光 罩圖案時’將鄰近的彩色晝素係以一長條部分13相 重疊。此後，使用習知微影製程（Lith〇graphy)，例如 曝光、顯影、#刻等製程而將此光罩圖案複製到玻璃 基板上。如第2圖所顯示者，數個平行的黑色矩陣 21與數個彩色晝素22。再者，這些彩色晝素22中， 1269892 每個彩色晝素皆I„ 疊。然而，因兔奋近的彩色晝素具有一部份重 A # ^ t Λ ^曝光程序時，光線的繞射效應造 素的轉折處產生失真的現象。一缺口…系 =在兩個相鄰的彩色晝素。間，以至於產生漏光 色二此，丄為解決上述漏光現象，需要-種用於彩 ^片之光單與其補正方法，以改善習知技術的缺 【發明内容】 象。/、貝/，用於有效解決彩色晝素間的漏光現 根據本發明，一種彩色濾光片結構，至少包含： 數個平行的黑色矩陣區域， 愛 係具有一個黑色矩陣與數個突出區域/.而色且矩耗域 數個彩色畫素區域’相鄰彩 份相互重疊而且產线㈣口； 、係口ρ 域所遊其蔽中。每個缺口係由黑色矩陣區域的相對突出區 為了能使本發明特徵及技術内容更為清楚，請 ί僅發明之詳細說明與附圖’然而所附圖 &供參考與說明用，並非用來限制本發明。 【實施方式】 1269892 以下描述的本發明之實施例係與薄膜電晶體基 板之玻璃基板相關。然而，本發明可適用於所有平面 顯示為產品’包括素基板（bare substrate)、電漿電視 基板（Plasma Display Panel substrate)與有機發光二極 體顯示器基板（OLED substrate)等有關製造平面顯示 裝置之基板。然而，適用範圍不限於此。 第3圖係顯示本發明的彩色濾光片結構。如第3 圖所顯示者，本發明係包括數個平行的黑色矩陣區域 31與數個晝素區域32。黑色矩陣區域31係依照習知 微影製程產生在玻璃基板3上。再者，晝素區域Μ 則依照習知製程產生在黑色矩陣區域31與玻璃基板 3上。例如，顏料分散法。其中，每個黑色矩陣區域 31係具有一個黑色矩陣33與數個突出區域34。數個 黑色矩陣33係相互平行設置，而鸡個突出區域％ ==可為矩形、長條形、圓形、三角形、梯形或 二邊n突出區域34的形狀不侷限於此。 =34的面積是小於或等於i〇〇〇w。再 魏域32係_部份相互重疊 ^ = 1缺ϋ 35。每個缺口35係由黑色矩陣區 " 的相對犬出區域34所遮蔽。 大圖。气二圖:圖 明參閱苐4圖，突出區域34沿著χ -古 長長度為心而且沿著¥軸有另；：：，有：邊 ㈣長度dl與d2係小於或者等於1⑼ 者，大出區域34的面積係小於或等於1〇〇〇〇 1269892 //m。1269892, IX, invention description: [Technical field of the invention] The present invention relates to a color filter structure and compensation method 'and particularly relates to having a plurality of protruding regions in a black matrix region to correct the pixel distortion of the color filter phenomenon. [Prior Art] Flat-panel displays are widely used in computer products and consumer products because of their high contrast, power saving, and small size. In the flat panel display, an active thin film transistor liquid crystal display (TFT-LCD) is the main product. Among them, the color filter is one of the key components of the liquid crystal display. A thin film liquid crystal display converts light from a backlight module into a desired color by a color filter. The liquid display shows the aperture rata〇, so the color pixels of the color filter need to be designed with a black matrix (BM Less) to increase the aperture ratio (aperture rati〇). See Figure 1 for details. Figure 1 shows a conventional mask with no black matrix (bm Less). The reticle pattern contains a plurality of parallel black matrices 11 and a plurality of color pixels 12 . In order to increase the aperture ratio, the adjacent color elements are overlapped by a long strip portion 13 when the mask pattern is designed. Thereafter, the mask pattern is copied onto the glass substrate using a conventional lithography process such as exposure, development, and engraving. As shown in Fig. 2, a plurality of parallel black matrices 21 and a plurality of colored pixels 22 are shown. Furthermore, among these colored alizarins 22, 1269892 each color element is I stacked. However, because the rabbit color element has a partial weight A # ^ t Λ ^ exposure program, the diffraction of light The phenomenon of distortion occurs in the turning point of the effector. A gap... is in the case of two adjacent color elements, so that the light leakage color is generated, and in order to solve the above-mentioned light leakage phenomenon, it is necessary to use - for color ^ The light sheet and its correction method are used to improve the conventional technology. [Abstract] Image, /, /, for effectively solving the light leakage between the color elements. According to the present invention, a color filter structure, at least : Several parallel black matrix areas, the love system has a black matrix and several protruding areas /. The color and the moment consumption area are several color pixel areas 'the adjacent color parts overlap each other and the production line (four) mouth; The ρ field is hidden by the cover. Each of the notches is made up of a relatively protruding area of the black matrix area. To make the features and technical contents of the present invention clearer, please refer to the detailed description of the invention and the accompanying drawings. For reference and explanation, not The present invention is limited to the embodiment of the present invention. The embodiment of the present invention described below is related to a glass substrate of a thin film transistor substrate. However, the present invention is applicable to all of the planes as a product including a bare substrate, A plasma display panel substrate and an organic light emitting diode display substrate (OLED substrate) are used to manufacture a substrate of a flat display device. However, the scope of application is not limited thereto. Fig. 3 shows the color filter of the present invention. Sheet structure. As shown in Fig. 3, the present invention includes a plurality of parallel black matrix regions 31 and a plurality of halogen regions 32. The black matrix regions 31 are produced on the glass substrate 3 in accordance with a conventional lithography process. The halogen region 产生 is produced on the black matrix region 31 and the glass substrate 3 according to a conventional process. For example, a pigment dispersion method in which each black matrix region 31 has a black matrix 33 and a plurality of protruding regions 34. A plurality of black matrices 33 are arranged in parallel with each other, and the chicken protruding area % == can be a rectangle, a long strip, a circle, a triangle, The shape of the shape or the two-sided n-protrusion region 34 is not limited thereto. The area of =34 is less than or equal to i 〇〇〇 w. The wei domain 32-series overlaps each other ^ = 1 is missing 35. Each notch 35 It is obscured by the relative dog-out area 34 of the black matrix area. Larger picture. Gas diagram: Figure 苐4, the protrusion area 34 is along the χ-ancient length and the other along the ¥ axis; ::, there are: side (four) length dl and d2 system is less than or equal to 1 (9), the area of the large out area 34 is less than or equal to 1 〇〇〇〇 1269892 / / m.
-與相鄰突出區=!:二t:圖中，畫素區域 與B2及虛線Cl* c ^且而產生由虛線I 重疊區域。虛後B * 別為Dl與〇2的 ^ 虛1與Cl係表示晝素區域32與突出 區域34的内側邊長交 Γ筏本-+主 又又之位置。然而，虛線B2與 2係表1不晝素區域32的邊長之位置。 光圖。帛5圖係顯示本發明的彩色遽 先片結構的補償方法之流程圖。 步驟5〇1:補償方法之流程開始。 步驟502:產生黑色矩陣區域31於玻璃基板3 ί二ΐ母個黑色矩陣區域31係包含-黑色矩陣33 與數個突出區域34。本流程進行至步驟5〇3。 nf^5G3 :將晝素區域32產生在玻璃基板3而 郴近…、色矩陣區域31的空間。接著，本流程進行 至步驟504。 步驟504 :假如Di或D2大於突出區域34的邊 長長度4，則本流程返回步驟5〇3進行重工 Cork)。意即，調整晝素區域32相對於黑色矩陣區 域31的突出區域34之位置。假如仏或込小於突出 區域34的邊長長度dl ’則本流程進行至步驟⑽。 步驟505:假如Dl<D2,則本流程返回步驟5〇3。 調整該晝素區域32並且朝向_方向平行移動。假 如DpD2，則本流程返回步驟5〇3。調整該畫 1269892 32應該朝向D2的方向平行移動。假如Di=D2，則本 "丨l程進行至步驟5〇6 〇 步驟506 :本流程結束。 ，^上所述，雖然本發明已以較佳實施例揭露如 上然其並非用以限定本發明，任何熟習此技藝者， 在不脫離本發明之精神和範圍内，當可作各種之更動 與潤飾’因此本發明之保護範圍當視後附之中請專利 範圍所界定者為準。 【圖式簡單說明】 第1圖係顯示習知無黑色矩陣（BMLess)的光罩 設計； 第2圖係顯示習知無黑色矩陣（BMLess)的晝素 排列； —” 第3圖係顯示本發明的彩色濾光片結構； 第4圖係顯示第3圖中箭號a所指出區域的放 大圖；以及 第5圖係顯示本發明的彩色濾光片結構的補償 方法之流程圖。 【主要元件符號說明】 12 彩 色晝素 21 愛 色矩陣 23 缺 U 31 黑 色矩陣區域 33 黑 色矩陣 11黑色矩陣 13 長條部分 22彩色晝素 3 玻璃基板 32晝素區域 1269892 缺口 34 突出區域 35- with the adjacent protruding area =!: two t: in the figure, the pixel area and B2 and the dotted line Cl* c ^ and the overlapping area by the dotted line I. After the virtual B* is D1 and 〇2, the imaginary 1 and the Cl system indicate that the halogen region 32 intersects the inner side of the protruding region 34 and the --+ main and the other positions. However, the broken lines B2 and 2 are the positions of the side lengths of the non-alloy region 32. Light map. Fig. 5 is a flow chart showing a method of compensating the color enamel structure of the present invention. Step 5: 1: The process of the compensation method begins. Step 502: The black matrix region 31 is generated on the glass substrate 3, and the black matrix region 31 includes a black matrix 33 and a plurality of protruding regions 34. This flow proceeds to step 5〇3. Nf^5G3 : A space in which the halogen region 32 is formed on the glass substrate 3 and close to the color matrix region 31. Then, the flow proceeds to step 504. Step 504: If Di or D2 is greater than the length 4 of the length of the protruding area 34, the flow returns to step 5〇3 for rework Cork). That is, the position of the pixel region 32 with respect to the protruding region 34 of the black matrix region 31 is adjusted. If 仏 or 込 is smaller than the side length dl ' of the protruding area 34, the flow proceeds to step (10). Step 505: If D1 < D2, the flow returns to step 5〇3. The halogen region 32 is adjusted and moved in parallel toward the _ direction. If DpD2, the flow returns to step 5〇3. Adjust the picture 1269892 32 should move parallel to the direction of D2. If Di=D2, then the process proceeds to step 5〇6. Step 506: This process ends. The present invention has been described with reference to the preferred embodiments of the present invention, and is not intended to limit the invention, and various modifications may be made without departing from the spirit and scope of the invention. Retouching 'Therefore, the scope of protection of the present invention is subject to the definition of patent scope. [Simple description of the drawing] Fig. 1 shows a mask design of a conventional black matrix (BMLess); Fig. 2 shows a pixel arrangement of a conventional black matrix (BMLess); - "Fig. 3 shows the present The color filter structure of the invention; Fig. 4 is an enlarged view showing a region indicated by an arrow a in Fig. 3; and Fig. 5 is a flow chart showing a method for compensating the color filter structure of the present invention. Component Symbol Description] 12 Color Element 21 Color Matrix 23 Missing U 31 Black Matrix Area 33 Black Matrix 11 Black Matrix 13 Strip Section 22 Color Alizarin 3 Glass Substrate 32 Alizarin Area 1268892 Notch 34 Projection Area 35
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