TWI267106B - Structure for electron emission source of field emission display and the fabrication method thereof - Google Patents

Structure for electron emission source of field emission display and the fabrication method thereof

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Publication number
TWI267106B
TWI267106B TW93113949A TW93113949A TWI267106B TW I267106 B TWI267106 B TW I267106B TW 93113949 A TW93113949 A TW 93113949A TW 93113949 A TW93113949 A TW 93113949A TW I267106 B TWI267106 B TW I267106B
Authority
TW
Taiwan
Prior art keywords
emission source
electron emission
cavities
cathode
electron
Prior art date
Application number
TW93113949A
Other languages
Chinese (zh)
Other versions
TW200539222A (en
Inventor
Kuei-Wen Jeng
Jiun-Yan Shiau
Yu-An Li
Jin-Lung Tsai
Original Assignee
Teco Nanotech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teco Nanotech Co Ltd filed Critical Teco Nanotech Co Ltd
Priority to TW93113949A priority Critical patent/TWI267106B/en
Publication of TW200539222A publication Critical patent/TW200539222A/en
Application granted granted Critical
Publication of TWI267106B publication Critical patent/TWI267106B/en

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Abstract

The present invention relates to a structure for electron emission source of field emission display and the fabrication method thereof, which includes: providing a first substrate with cathode formed thereon; employing screen-printing or lithography etching technique to form a cathode electrode layer containing cavities on the first substrate, and onto the surface of cathode electrode layer is produced with photoresist protection layer through lithography process; employing low viscosity carbon nanotube solution to spray on the photoresist protection layer and deposit in the cavities; and, employing vacuum sintering and etching technique to strip off the photoresist protection layer and form the electron emission source layer in the cavities with a flat surface. Compared with the conventional process, the present invention could provide better flatness, increase the uniformity for image and brightness, and increase the density of carbon nanotube for improving the electron density of electron beam. The structure for electron emission source comprises a cathode formed on the first substrate, a cathode electrode layer formed on the surface of the cathode containing cavities, and an electron emission source layer deposited in the cavities in high density through etching, developing and vacuum sintering to form a flat surface.
TW93113949A 2004-05-18 2004-05-18 Structure for electron emission source of field emission display and the fabrication method thereof TWI267106B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93113949A TWI267106B (en) 2004-05-18 2004-05-18 Structure for electron emission source of field emission display and the fabrication method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93113949A TWI267106B (en) 2004-05-18 2004-05-18 Structure for electron emission source of field emission display and the fabrication method thereof

Publications (2)

Publication Number Publication Date
TW200539222A TW200539222A (en) 2005-12-01
TWI267106B true TWI267106B (en) 2006-11-21

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ID=38191756

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93113949A TWI267106B (en) 2004-05-18 2004-05-18 Structure for electron emission source of field emission display and the fabrication method thereof

Country Status (1)

Country Link
TW (1) TWI267106B (en)

Also Published As

Publication number Publication date
TW200539222A (en) 2005-12-01

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