TWI265571B - Valve device and heat-treating device - Google Patents

Valve device and heat-treating device Download PDF

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Publication number
TWI265571B
TWI265571B TW91133065A TW91133065A TWI265571B TW I265571 B TWI265571 B TW I265571B TW 91133065 A TW91133065 A TW 91133065A TW 91133065 A TW91133065 A TW 91133065A TW I265571 B TWI265571 B TW I265571B
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Taiwan
Prior art keywords
valve
heat treatment
main
bypass passage
auxiliary
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TW91133065A
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Chinese (zh)
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TW200407437A (en
Inventor
Hiroyuki Matsuura
Satoru Koike
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Tokyo Electron Ltd
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Priority claimed from JP2001142881A external-priority patent/JP3543963B2/en
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200407437A publication Critical patent/TW200407437A/en
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Publication of TWI265571B publication Critical patent/TWI265571B/en

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Abstract

This invention is to improve maintenance operability by simplifying the piping of an exhaustion system. The heat-treating equipment is provided with a main valve 18, a 1st auxiliary valve 30, and a 2nd auxiliary valve 31 for a pipe 13 of the exhaustion system 12 of a heat-treating furnace 1, Further, the equipment has two bypass passages 32 and 33 which link the side of an entrance and the side of an exit to each other are formed in a main body 21 which forms the exterior of the main valve 18, and the main body 21 of the main valve 18 is provided with the 1st auxiliary valve 30 which opens and closes one bypass passage 32 and the 2nd auxiliary valve 31 which opens and closes the other bypass passage 33. The main valve 18 is fixed onto the frame body 14 of the heat-treating device by bolts and nuts with the use of a fixation plate 54 disposed on the main valve 18.

Description

1265571 A7 B7 五、發明説明(1 ) 【技術領域】 本發明是關於熱處理裝置,特別是關於其排氣系統所 適用的閥裝置,及具備了該閥裝置的熱處理裝置。 【發明背景】 在半導體裝置的製造流程,爲了要在半導體晶圓等的 被處理體實施c V D (化學氣相沉積)等的熱處理,而使用熱 處理裝置。該熱處理裝置,是具備有:用來收容晶圓的熱 處理爐、將處理氣體等的氣體供給到熱處理爐內的氣體供 給系統、以及用來將熱處理爐內減壓排氣的排氣系統。 在這種熱處理裝置中,當將爐內進行真空抽氣時,爲 了不捲起粒子,在真空抽氣初期是進行將吸引流量控制得 很低的所謂的慢速真空抽氣。爲了該目的,排氣系統是作 成如第6圖所示。排氣系統1 2是具有預定的管徑例如三 英吋的配管1 3,在該配管1 3,是依序設置有:由角閥 所構成的主閥(主開關閥)1 8、由蝶形閥所構成的主壓力控 制閥(沒有圖示)、以及減壓泵浦(沒有圖示)。在配管1 3是 連接有用來將主閥1 8予以旁流的1 / 4英吋左右的小直 徑的旁通管6 0。在旁通管6 0,是並列地設置有第一輔 助閥6 1及第二輔助閥6 2。在旁通管6 0,是與第二輔 助閥6 2串聯地設置有流量調整用的針閥6 3。 當要將爐內從大氣壓力減壓到預定的處理壓力時,首 先會將用來進行慢速真空抽氣的主閥1 8及第一輔助閥 6 1關閉,將第二輔助閥6 2開啓,開始進行以針閥6 3 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智慧財產局員工消費合作社印製 -5- 經濟部智慧財產局員工消費合作社印製 1265571 A7 —_____B7 五、發明説明(2) 所設定的些微流量的真空抽氣。接著,會依序開啓第一輔 助閥6 2、主閥6 1 ,在該狀態真空抽氣到預定的處理壓 力。 可是,在上述以往的熱處理裝置,是將旁通管6 〇連 接到配管1. 3來設置第一及第二輔助閥6 1、6 2等,不 只是需要很大的空間S a (參照第6圖(b )),配管1 3周圍 的構造會變的很複雜,而會有維修作業性會變得很差的問 題。 而爲了要將主閥1 8固定到預定位置,而需要將主閥 1 8的上流側或下流側的配管1 3經由固定接頭7 0固定 到熱處理裝置的筐體1 4。這樣會讓配管1 3周圍的構造 更複雜。不只如此,當配管是加溫配管時,熱量會從固定 接頭7 0散逸,而會有在配管1 3內產生反應副生成物的 問題。 【發明揭示】 _ 本發明,考慮到上述的情況,其目的是藉由將輔助閥_ 及旁流通路與主閥一體化,來讓閥裝置簡化。本發明的其 他目的,是藉由使用這種簡化的閥裝置,來將熱處理裝置 的排氣系統的配管周圍的構造簡化。 _ 爲了達成上述目的,本發明,是具備有··熱處理爐、 連接到上述熱處理爐用來排出上述熱處理爐內的爐氣的排 氣管、以及中介安裝於上述排氣管的主閥,也就是具有形 成了入口孔與出口孔及連接上述入口孔及出口孔的主通路 本紙張尺度適用中國國家標準(CNS ) A4規格(210 X297公釐) I---------裝丨·--^---訂------線 (請先閲讀背面之注意事項再填寫本頁) -6 - 1265571 A7 B7 五、發明説明(3) 的閥箱、及設置在上述閥箱用來將上述主通路開閉的閥體 的主閥之熱處理裝置,其特徵爲··在上述主閥的箱,是 - 、 並列形成有用來連通上述入口孔及出口孔的第一旁通路及 第二旁通路,在上述主閥的閥箱,是設置有:用來開閉上 述第一旁通路的第一輔助閥、與用來開閉上述第二旁通路 的第二輔助閥。 在較佳的實施型態,上述第一及第二旁通路,是形成 在上述閥箱的壁體的孔部。 在較佳的實施型態,上述第二輔助閥是作成可調整流 量的。 在較佳的實施型態,在上述主閥的閥箱是設置有固定 構件’是經由該固定構件來將上述主閥固定到該熱處理裝 置的筐體。 藉由本發明的第二觀點,是提供一種閥裝置,是具備 有:形成有入口孔與出口孔與用來連接上述入口孔與出口 孔的主通路的閥箱、以及設置在上述閥箱用來開閉上述主 通路的閥體之閥裝置,是具備有:形成於上述閥箱,迂迴 於上述閥體能讓上述入口孔與出口孔連通的第一旁通路、 與上述第一旁通路並列地形成於上述閥箱,迂迴於上述閥 體能讓上述入口孔與出口孔連通的第二旁通路、用來開閉 上述第一旁通路的第一輔助閥、以及用來開閉上述第二旁 通路的第二輔助閥。 本發明的特徵及優點,可以參照附圖且就由下述的實 施型態的說明可以更加了解。 本紙張尺度適用中國國家榡準(CNS ) A4規格(210 X 297公釐) ----—澤-- (請先閲讀背面之注意事項再填寫本頁) 、τ 經濟部智慧財產局員工消費合作社印製 -7- 1265571 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(4) 【發明實施型態】 以下根據附圖來詳細敘述本發明的實施型態。 在第1圖是顯示熱處理裝置的槪略構造,圖號1是收 容著半導體晶圓W來進行預定的熱處理例如C V ;〇處理的 熱處理爐。在圖示的實施型態中,熱處理爐1是批量式的 縱型爐。熱處理爐1,是具備有:石英製的處理容器(反應 管)2、以及圍繞處理容器2設置在處理容器2的周圍的圓 筒狀的加熱器3。 處理容器2,雖然在圖示的實施型態中是作成具有內 管2 a及外管2 b的雙重管構造,而作成單管構造也可以 。處理容器2的下端是開口著。在處理容器2的下端,是 氣密性地連接著具有:用來將處理氣體等的氣體導入處理 容器2內的氣體導入部4、與用來將處理容器2內的爐氣 排出的排氣部5的圓環狀的歧管6。歧管6的下端是作爲 爐口 7而開口著。在爐口 7的下方,是設置有氣密性地封 閉住爐口 7的蓋體8。蓋體8是藉由升降機構9而升降來 將爐口 7開閉。在蓋體8上,是經由保溫筒1 1而載置著 在上下方向隔著預定間隔搭載著複數枚例如1 5 0枚晶圓 W的石英製的晶舟1 〇 (基板保持具)。是藉由升降機構9來 將晶舟1 0搬出搬入於處理容器2內。 在氣體導入部4是連接著連通到氣體供給源的沒有圖 示的氣體供給系統的配管,在排氣部5是連接有排氣系統 1 2的配管(也稱作排氣管)1 3。熱處理爐1是設置在熱處 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -8- 1265571 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(5) 理裝置的筐體1 4內(參照第5圖)。在筐體14內是設置有 具有可將處理容器2從下方插通的開口的基板1 5 °在基 板1 5是經由安裝接頭(沒有圖示)而安裝有歧管6。在基板 1 5上,是設置有加熱器3。在基板1 5的更下方,是設 置有用來將晶舟1 0進行裝載/卸載的作業區域也就是裝 載區域。 排氣系統1 2的配管Γ 3,是從筐體1 4內牽出到筐 體1 4外,是被連接到位於下方的減壓泵浦1 7。在排氣 系統1 2的配管1 3,是從上流側開始依序設置有:由角 閥所構成的主閥1 8、由蝶形閥所構成的壓力控制閥1 9 、及用來捕捉副生成物的捕集器2 0。排氣系統1 2,是 藉由:配管1 3、設置於該配管1 3的主閥1 8、壓力控 制閥1 9、減壓泵浦1 7、及捕集器2 0所構成。 接下來,參照第2圖〜第4圖,針對主閥1 8及其附 屬機構來加以說明。主閥1 8,是具有閥箱2 1 (閥主體)、 與設置於閥箱2 1的內部的閥體2 6。在閥箱2 1的側部 及下部,是分別設置有可進行凸緣連接的入口孔2 2及出 口孔23。如第3圖所示,在閥箱21內,是形成有用來 將兩孔部2 2、2 3連通的主通路2 4。在主通路2 4內 設置有閥座2 5 ,當主閥1 8閉閥時,閥體2 6會安置定 位於閥座2 5。 在閥箱2 1的上部,是設置有會經由閥桿2 7來使閥 體2 6朝上下方向移動來進行主閥1 8的開閉的致動器 2 8。閥桿2 7是藉由波形管2 9所包圍,波形管2 9的 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐1 一 -9 - (請先閲讀背面之注意事項再填寫本頁) -裝· 、^τ 1265571 A7 B7 五、發明説明(6) 上端是連接到閥箱2 1 ,波形管2 9的下端是連接到閥體 2 6的上面部。波形管2 9是用來保護致動器2 8免於腐 蝕性氣體的腐蝕。 在主閥1 8的閥箱2 1 ,是並列地設置有用來連通入 D孔2 2與出口孔2 3的互相分離獨立的第一旁通路3 2 及第二旁通路33。這些旁通路32、33,是形成於閥 箱2 1的壁體的孔部。在閥箱2 1的側面,是設置有:用 來開閉第一旁通路3 2的第一輔助閥3 0、及用來開閉第 二旁通路3 3的第二輔助閥3 1。第一及第二旁通路3 2 ' 3 3 ’不會使流體通過主通路2 4的閥座2 5與閥體 2 6之間的部分,而能夠讓流體從入口孔2 2流到出口孔 2 3° 如第3圖所示,第一旁通路32,在其途中,是開口 於閥箱2 1的側面。第一旁通路3 2的開口端周圍的閥箱 21的側面是成爲閥座34。第一輔助閥30,是具有: 安裝於閥箱2 1的側部的閥箱3 6、以及設置於閥箱3 6 內的藉由沒有圖示的彈簧被彈壓向開閥方向的閥體3 7。 在閥箱3 6,爲了要抵抗彈簧的彈壓力來將閥體3 7朝向 開閥方向(離開閥座3 4的方向),是連接有用來供給壓縮空 氣的空氣壓力供給系統的配管3 8。當沒有供給空氣壓力 時,第一輔助閥3 0的閥體3 7,會安置定位於閥座3 4 來隔斷第一旁通路3 2,當有供給壓縮空氣時,會從閥座 3 4離開而讓第一旁通路3 2導通。 如第4圖所示,第二旁通路3 3,在其途中,是開口 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ---------$ — I (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製1265571 A7 B7 V. Technical Description [Technical Field] The present invention relates to a heat treatment apparatus, and more particularly to a valve apparatus applicable to an exhaust system thereof, and a heat treatment apparatus including the valve apparatus. [Background of the Invention] In the manufacturing process of a semiconductor device, a heat treatment device is used in order to perform heat treatment such as c V D (chemical vapor deposition) on a substrate to be processed such as a semiconductor wafer. The heat treatment apparatus includes a heat treatment furnace for storing a wafer, a gas supply system for supplying a gas such as a processing gas into the heat treatment furnace, and an exhaust system for decompressing and decompressing the inside of the heat treatment furnace. In such a heat treatment apparatus, when vacuum evacuation is performed in the furnace, in order to prevent the particles from being rolled up, so-called slow vacuum evacuation in which the suction flow rate is controlled to be low is performed at the initial stage of vacuum evacuation. For this purpose, the exhaust system is made as shown in Fig. 6. The exhaust system 12 is a pipe 13 having a predetermined pipe diameter, for example, three inches, and the pipe 13 is provided with a main valve (main switch valve) composed of an angle valve. A main pressure control valve (not shown) consisting of a valve and a decompression pump (not shown). The piping 13 is connected to a bypass pipe 60 having a small diameter of about 1⁄4 inch for bypassing the main valve 18. In the bypass pipe 60, a first auxiliary valve 61 and a second auxiliary valve 6 2 are provided in parallel. In the bypass pipe 60, a needle valve 63 for flow rate adjustment is provided in series with the second auxiliary valve 620. When the furnace is to be depressurized from atmospheric pressure to a predetermined treatment pressure, the main valve 18 and the first auxiliary valve 6 1 for performing slow vacuum pumping are first turned off, and the second auxiliary valve 6 2 is turned on. Start with needle valve 6 3 This paper scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the note on the back and fill out this page) - Installed and subscribed to Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative Printing-5- Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1265571 A7 —_____B7 V. Invention Description (2) The vacuum flow of some micro-flows set. Next, the first auxiliary valve 6 and the main valve 6 1 are sequentially opened, and in this state, the vacuum is evacuated to a predetermined processing pressure. However, in the above-described conventional heat treatment apparatus, the bypass pipe 6 is connected to the pipe 1.3 to provide the first and second auxiliary valves 6 1 and 6 2, and the like, not only requires a large space S a (refer to 6 (b)), the structure around the pipe 1 3 becomes complicated, and there is a problem that maintenance workability becomes poor. In order to fix the main valve 18 to a predetermined position, it is necessary to fix the pipe 13 of the upstream side or the downstream side of the main valve 18 to the casing 14 of the heat treatment apparatus via the fixed joint 70. This will make the construction around the pipe 1 3 more complicated. In addition, when the piping is a heating pipe, heat is dissipated from the fixed joint 70, and there is a problem that a reaction by-product is generated in the pipe 13. SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object thereof is to simplify a valve device by integrating an auxiliary valve _ and a bypass passage with a main valve. Another object of the present invention is to simplify the configuration around the piping of the exhaust system of the heat treatment apparatus by using such a simplified valve device. In order to achieve the above object, the present invention provides a heat treatment furnace, an exhaust pipe connected to the heat treatment furnace for discharging furnace gas in the heat treatment furnace, and a main valve interposed to the exhaust pipe. It is the main path that forms the inlet and outlet holes and connects the inlet and outlet holes. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X297 mm) I--------- ·--^---booking ------ line (please read the note on the back and fill out this page) -6 - 1265571 A7 B7 5. The valve box of the invention (3) and the valve set above a heat treatment device for a main valve of a valve body for opening and closing the main passage, wherein the main valve box is formed with a first bypass passage for communicating the inlet hole and the outlet hole, and The second bypass passage is provided with a first auxiliary valve for opening and closing the first bypass passage and a second auxiliary valve for opening and closing the second bypass passage in the valve box of the main valve. In a preferred embodiment, the first and second bypass passages are formed in the hole of the wall of the valve casing. In a preferred embodiment, the second auxiliary valve is of an adjustable rectification amount. In a preferred embodiment, the valve box of the main valve is provided with a fixing member' which is a housing for fixing the main valve to the heat treatment apparatus via the fixing member. According to a second aspect of the present invention, there is provided a valve device comprising: a valve box formed with an inlet hole and an outlet hole and a main passage for connecting the inlet hole and the outlet hole; and a valve box provided in the valve box The valve device for opening and closing the valve body of the main passage includes a first bypass passage formed in the valve casing and bypassing the valve body to allow the inlet hole and the outlet hole to communicate with each other, and is formed in parallel with the first bypass passage The valve box, the second bypass passage for bypassing the inlet body and the outlet hole, the first auxiliary valve for opening and closing the first bypass passage, and the second auxiliary for opening and closing the second bypass passage valve. The features and advantages of the invention will be apparent from the description and appended claims. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ----- Ze-- (please read the notes on the back and fill out this page), τ Ministry of Economic Affairs Intellectual Property Office staff consumption Cooperatives Printed -7- 1265571 A7 B7 Ministry of Economic Affairs Intellectual Property Office Employees Consumer Cooperatives Printed V. Illustrated (4) [Embodiment of the Invention] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Fig. 1 is a schematic structural view showing a heat treatment apparatus, and Fig. 1 is a heat treatment furnace which accommodates a semiconductor wafer W to perform a predetermined heat treatment such as C V or helium treatment. In the illustrated embodiment, the heat treatment furnace 1 is a batch type vertical furnace. The heat treatment furnace 1 is provided with a processing container (reaction tube) 2 made of quartz, and a cylindrical heater 3 provided around the processing container 2 around the processing container 2. The treatment container 2 may have a double tube structure having an inner tube 2a and an outer tube 2b in the illustrated embodiment, and a single tube structure may be used. The lower end of the processing container 2 is open. At the lower end of the processing container 2, a gas introduction portion 4 for introducing a gas such as a processing gas into the processing container 2 and an exhaust gas for discharging the furnace gas in the processing container 2 are airtightly connected. The annular manifold 6 of the portion 5. The lower end of the manifold 6 is opened as a furnace opening 7. Below the furnace opening 7, a lid body 8 is provided which hermetically seals the furnace opening 7. The lid body 8 is lifted and lowered by the elevating mechanism 9 to open and close the furnace opening 7. In the lid body 8, a quartz wafer boat 1 (substrate holder) in which a plurality of, for example, 150 wafers W are mounted at predetermined intervals in the vertical direction is placed via the heat insulating tube 1 1 . The wafer boat 10 is carried out and carried into the processing container 2 by the elevating mechanism 9. The gas introduction unit 4 is a pipe to which a gas supply system (not shown) that communicates with the gas supply source is connected, and the exhaust unit 5 is a pipe (also referred to as an exhaust pipe) 13 to which the exhaust system 1 2 is connected. Heat treatment furnace 1 is set in the heat (please read the back of the note first and then fill out this page) This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) -8- 1265571 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employees Printed by the Consumer Cooperatives. 5. Description of the Invention (5) Inside the casing 1 of the device (see Figure 5). A substrate 1 having an opening through which the processing container 2 can be inserted from below is provided in the casing 14. The manifold 6 is attached to the substrate 15 via a mounting joint (not shown). On the substrate 15, a heater 3 is provided. Further below the substrate 15, there is provided a work area, i.e., a loading area, for loading/unloading the boat 10. The piping Γ 3 of the exhaust system 1 2 is taken out from the casing 14 to the outside of the casing 14 and is connected to the decompression pump 17 located below. In the piping 13 of the exhaust system 12, a main valve 18 composed of an angle valve, a pressure control valve 19 composed of a butterfly valve, and a pair of capture valves are provided in this order from the upstream side. The trap of the product 20. The exhaust system 1 2 is composed of a pipe 13 , a main valve 18 provided in the pipe 13 , a pressure control valve 19 , a pressure reducing pump 17 , and a trap 20 . Next, the main valve 18 and its attached mechanism will be described with reference to Figs. 2 to 4 . The main valve 18 has a valve body 21 (valve body) and a valve body 26 provided inside the valve box 21. In the side portion and the lower portion of the valve casing 21, an inlet hole 2 2 and an outlet hole 23 which are flanged are provided, respectively. As shown in Fig. 3, in the valve casing 21, a main passage 24 for connecting the two hole portions 2, 2, 3 is formed. A valve seat 25 is provided in the main passage 24, and when the main valve 18 is closed, the valve body 26 is seated at the valve seat 25. In the upper portion of the valve casing 21, an actuator 28 that opens and closes the main valve 18 by moving the valve body 26 in the vertical direction via the valve stem 27 is provided. The valve stem 27 is surrounded by the corrugated tube 29. The paper size of the corrugated tube 29 is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm 1 -9 - (please read the back note first and then fill in This page) - Loading ·, ^τ 1265571 A7 B7 V. Inventive Note (6) The upper end is connected to the valve box 2 1 , and the lower end of the corrugated tube 2 9 is connected to the upper surface of the valve body 26. The corrugated tube 2 9 is It is used to protect the actuator 2 from corrosive gas corrosion. The valve box 2 1 of the main valve 18 is provided in parallel with the independent separation of the D hole 2 2 and the outlet hole 2 3 . a bypass passage 3 2 and a second bypass passage 33. These bypass passages 32 and 33 are hole portions formed in the wall of the valve casing 21, and are provided on the side surface of the valve casing 21 for opening and closing the first a first auxiliary valve 30 of the bypass passage 3 2 and a second auxiliary valve 31 for opening and closing the second bypass passage 33. The first and second bypass passages 3 2 ' 3 3 ' do not pass fluid through the main passage a portion between the valve seat 2 5 and the valve body 26, and allowing fluid to flow from the inlet port 2 2 to the outlet port 2 3° as shown in Fig. 3, the first bypass passage 32 on the way The side of the valve box 21 around the open end of the first bypass passage 32 is a valve seat 34. The first auxiliary valve 30 has: a side portion mounted to the valve box 21 The valve box 36 and the valve body 36 are spring-loaded into the valve body 37 in the valve opening direction by a spring (not shown). In the valve box 3 6, the valve is to be pressed against the spring pressure of the spring. The body 3 7 faces the valve opening direction (the direction away from the valve seat 34), and is a pipe 38 to which an air pressure supply system for supplying compressed air is connected. When the air pressure is not supplied, the valve body of the first auxiliary valve 30 3, 7 will be positioned at the valve seat 34 to block the first bypass passage 3 2, when there is compressed air, it will leave the valve seat 34 and let the first bypass passage 3 2 conduct. As shown in Fig. 4 The second bypass passage 3 3, on the way, is the opening of the paper scale applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) ---------$ — I (please read the back note first) Matters fill out this page) Printed by the Intellectual Property Office of the Ministry of Economic Affairs

-10 - 1265571 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(7) 於閥箱2 1的側面。第一旁通路3 2的開口端周圍的閥箱 2 1的側面是成爲閥座3 5。第二輔助閥3 1 ,是具有: 安裝於閥箱2 1的側部的閥箱3 9、以及設置於閥箱3 6 內的藉由彈簧4 0被彈壓向閉閥方向(安置定位於閥座3 5 的方向)的閥體4 1。在閥箱3 9,爲了要抵抗彈簧4 0的 彈壓力來將閥體4 1朝向開閥方向(離開閥座3 5的方向), 是連接有用來供給壓縮空氣的空氣壓力供給系統的配管 4 2。當沒有供給空氣壓力時,第一輔助閥3 1的閥體 4 1,會安置定位於閥座3 5來隔斷第二旁通路3 3,當 有供給壓縮空氣時,會從閥座3 5離開而讓第二旁通路 3 3導通。 在閥體4 1是經由閥桿4 3而連結著活塞4 4,該活 塞4 4是可滑動地嵌插於形成於閥箱3 9的氣缸4 5內。 在氣缸室4 5內的其中一端是內藏有用來將活塞4 4朝向 閉閥方向彈壓的彈簧4 0,在氣缸室4 5內的另一端是形 成有用來以壓縮空氣將活塞4 4朝向開閥方向驅動的壓力 室4 6。在活塞4 4,是形成有用來將壓縮空氣從空氣壓 力供給系統的配管4 2導入到上述壓力室4 6的導入通路 4 7。導入通路4 7,是沿著活塞4 4的軸線延伸而開口 於壓力室4 6。 在第二輔助閥3 1的閥箱3 9的前端部,是設置有流 量調整旋鈕4 8。在該流量調整旋鈕4 8的內周面形成有 螺紋,會螺合於形成在閥箱3 9的前端部的外周的公螺紋 部4 9。在流量調整旋鈕4 8是設置有用來限制活塞4 4 (請先閱讀背面之注意事項再填寫本頁) •裝‘-10 - 1265571 A7 B7 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, the Consumer Cooperatives. V. Inventive Note (7) on the side of the valve box 2 1. The side surface of the valve box 2 1 around the open end of the first bypass passage 3 2 is the valve seat 35. The second auxiliary valve 3 1 has a valve box 39 that is attached to the side of the valve box 21, and a spring chamber 40 that is placed in the valve box 36 to be biased toward the valve closing direction (positioned to the valve) The valve body 4 1 in the direction of the seat 3 5 ). In the valve casing 3 9, in order to prevent the valve body 41 from facing the valve opening direction (the direction away from the valve seat 35) against the spring pressure of the spring 40, a pipe 4 to which an air pressure supply system for supplying compressed air is connected is connected. 2. When no air pressure is supplied, the valve body 4 1 of the first auxiliary valve 3 1 is disposed to be positioned at the valve seat 35 to block the second bypass passage 3 3 , and will leave the valve seat 3 5 when compressed air is supplied. The second bypass path 3 3 is turned on. The valve body 4 1 is coupled to the piston 4 4 via a valve stem 43, and the piston 4 4 is slidably inserted into the cylinder 45 formed in the valve casing 39. One end of the cylinder chamber 45 is provided with a spring 40 for biasing the piston 44 toward the valve closing direction, and the other end of the cylinder chamber 45 is formed for opening the piston 44 with compressed air. Pressure chamber 46 driven in the valve direction. The piston 44 is formed with an introduction passage 47 for introducing compressed air from the piping 4 2 of the air pressure supply system to the pressure chamber 46. The introduction passage 47 is extended along the axis of the piston 44 and opened to the pressure chamber 46. At the front end portion of the valve casing 39 of the second auxiliary valve 31, a flow rate adjustment knob 48 is provided. A thread is formed on the inner peripheral surface of the flow rate adjusting knob 48, and is screwed to the male screw portion 49 formed on the outer periphery of the front end portion of the valve box 39. The flow adjustment knob 4 8 is provided to limit the piston 4 4 (please read the back of the note first and then fill in the page) • Install ‘

、1T 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -11- 1265571 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(8) 的移動範圍(也就是閥體的升程量)d的套筒5 〇。套筒5 〇 是設置成與活塞4 4同軸,在套筒5 0內是可滑動地嵌插 有設置於活塞4 4的前端的軸部5 1。於是,藉由使流量 調整旋鈕4 8旋轉則可以變更閥體4 1的升程量d,藉此 就可以調節流動於第二旁通路3 3的流體的流量。 第二輔助閥3 1 ’在可調整流量方面,是與流量固定 形式的第一輔助閥3 0不同。也就是說,第一輔助閥3 0 ’可以用第二輔助閥3 1除去關於流量調整功能的構件來 形成。 再次參照第1圖,在排氣系統1 2的配管1 3的主閥 1 8的更上流側,是設置有用來檢測配管1 3內的壓力的 壓力感應器5 2。壓力感應器5 2的檢測訊號會被輸入到 控制器5 3。控制器5 3會根據預先設定的控制程式,來 進行主閥18、壓力控制閥19、及第一、第二輔助閥 3 0、3 1的開閉控制,來調整排氣系統1 2內及熱處理 爐1內的壓力。 在主閥1 8的閥箱2 1 ,是設置有固定板5 4,是經 由該固定板5 4來把主閥1 8的閥箱2 1固定到裝置的筐 體1 4。固定板5 4,是以適當的固定手段例如螺栓5 5 而被安裝在主閥18的閥箱21。在固定板54,是設置 有用來將該固定板5 4以螺栓固定到適當的支承構件的孔 部5 6。例如,如第5圖所示,是將托架5 7安裝到熱處 理裝置的筐體1 4,是藉由以螺栓及螺母來將固定板5 4 固定到該托架5 7,則可確實地將主閥1 8固定到熱處理 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) •裝· 、?! 線 -12 - 1265571 A7 B7 五、發明説明(9) 經濟部智慧財產局員工消費合作社印製 裝置的筐體1 4。 接下來,針對熱處理裝置的作用,針對將熱處理爐1 內從大氣壓力減壓到預定的處理壓力時來加以說明。如果 進行急劇的減壓(也就是大流量的減壓),則處理容器2內的 反應副生成物會飛揚起來,且晶舟1 〇上的半導體晶圓W 有可能會產生偏移。於是,首先,會將主閥1 8及第一輔 助閥3 0關閉,將第二輔助閥3 1開啓,驅動減壓泵浦 1 7,以些微的流量來開始進行真空抽氣(慢速真空抽氣)。 此時的流量,可以用流量調整旋鈕4 8來設定成適當的値 。熱處理爐1內的爐氣,會通過設置於歧管6的排氣部5 的排氣管及排氣系統1 2的配管1 3,且通過主閥1 8的 第二旁通路3 3而被排出。 當熱處理爐1內完成預定的減壓的話,會將第一輔助 閥3 0開啓,通過第一及第二旁通路3 2、3 3來進行增 加流量或真空抽氣。當熱處理爐內完成第二預定減壓時’ 則會將主閥2 4開啓,,以大流量通過第一及第二旁通路 3 2、3 3以及主閥1 8的主通路2 4來進行真空抽氣’ 來真空抽氣到所需要的最終壓力。 藉由上述實施型態,由於是將_用來旁通主閥 ---------- " 路組裝到主閥1 8的閥箱2 1 ,所以不需要管 - . - -η. ν — m-— 其他的旁通路用的配管。因此,可以將排氣系統1 2的管 路簡化,可以節省空間且提昇維修的作業性。針對節省空 間,來比較參照第5圖(b )的S b、與第6圖的(b )的S a 。而由於第二輔助閥3 1具備有流量調整機能,所以不謂 (請先閱讀背面之注意事項再填寫本頁) 裝· 、1T- 線 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -13- 1265571 Α7 Β7 經濟部智慧財產局員工消費合作社印製 五、發明说明( 要另外設置具有流量調整機能的閥例如針閥。因此,可以 更簡化排氣系統1 2的構造。 由於是藉由固定板5 4來把主閥1 8的閥箱2 1固定 到裝置的筐體1 4,色以不需要以固定塗.ϋ固定主閥 1 8的前後的配管_1._^。因此可以讓配管1 3及其附近的 — —— ’— 構造更簡化。由於不使用配管1 3的固定接頭,所以即使 配管1 3爲加溫配管,熱量也不會散逸,可以抑制配管 1 3內的反應副生成物的產生。由這個觀點看來,固定板 5 4是設置在較偏離閥箱2 1內的主通路2 4的位置較佳 。在圖示的實施型態中,固定板5 4是設置成接近偏離主 通路2 4的致動器2 8。 以上,雖然藉由圖面來詳細敘述本發明的實施型態, 而本發明並不限定爲上述實施型態,可在不脫離本發明的 主旨的範圍作各種設計變更。例如作爲熱處理爐,不限定 爲縱式的,也可以是橫式的,而不限定爲批量式的,也可 以是單片式。而熱處理除了 C V D以外,氧化、擴散、退 火等處理也可以。作爲被處理體,除了半導體晶圓以外, 例如玻璃基板或L C D基板等也可以。 【圖面說明】 第1圖是本發明的熱處理裝置的一種實施型態的槪略 構造的顯示圖。 第2圖是第1圖所顯示的主閥的立體圖。 第3圖是第2圖所示的主閥的主要部分剖面圖。 ---------澤-- (請先閱讀背面之注意事項再填寫本頁) -i-t», 1T This paper scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) -11- 1265571 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (8) moving range (that is, valve body The amount of lift) d sleeve 5 〇. The sleeve 5 〇 is disposed coaxially with the piston 4 4, and a shaft portion 51 provided at the front end of the piston 44 is slidably fitted in the sleeve 50. Thus, by rotating the flow rate adjusting knob 48, the lift amount d of the valve body 4 1 can be changed, whereby the flow rate of the fluid flowing through the second bypass passage 33 can be adjusted. The second auxiliary valve 3 1 ' is different from the first auxiliary valve 30 in the form of a fixed flow rate in terms of adjustable flow rate. That is, the first auxiliary valve 3 0 ' can be formed by removing the member relating to the flow adjustment function by the second auxiliary valve 31. Referring again to Fig. 1, a pressure sensor 52 for detecting the pressure in the pipe 13 is provided on the upper side of the main valve 18 of the pipe 13 of the exhaust system 1 2 . The detection signal of the pressure sensor 52 is input to the controller 53. The controller 53 performs opening and closing control of the main valve 18, the pressure control valve 19, and the first and second auxiliary valves 30 and 31 according to a preset control program to adjust the exhaust system 1 2 and heat treatment. The pressure inside the furnace 1. The valve box 2 1 of the main valve 18 is provided with a fixing plate 514 for fixing the valve box 21 of the main valve 18 to the casing 14 of the apparatus via the fixing plate 504. The fixing plate 514 is attached to the valve box 21 of the main valve 18 by a suitable fixing means such as a bolt 5 5 . In the fixing plate 54, there is provided a hole portion 56 for fixing the fixing plate 54 to a suitable supporting member by bolts. For example, as shown in Fig. 5, the bracket 57 is attached to the casing 14 of the heat treatment apparatus, and the fixing plate 5 4 is fixed to the bracket 5 7 by bolts and nuts. Fixing the main valve 18 to the heat treatment paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the notes on the back and fill out this page) • Install ·, ?! Line -12 - 1265571 A7 B7 V. INSTRUCTIONS (9) The housing of the printing device of the employee's consumer cooperative of the Intellectual Property Office of the Ministry of Economic Affairs. Next, the action of the heat treatment apparatus will be described with respect to the time when the inside of the heat treatment furnace 1 is depressurized from the atmospheric pressure to a predetermined treatment pressure. If a rapid decompression (i.e., a large flow rate of pressure reduction) is performed, the reaction by-products in the processing container 2 will fly, and the semiconductor wafer W on the wafer boat 1 may be displaced. Therefore, first, the main valve 18 and the first auxiliary valve 30 are closed, the second auxiliary valve 31 is opened, and the decompression pump 17 is driven to start vacuum evacuation with a slight flow rate (slow vacuum) Pumping). The flow rate at this time can be set to an appropriate value by using the flow adjustment knob 48. The furnace gas in the heat treatment furnace 1 passes through the exhaust pipe provided in the exhaust portion 5 of the manifold 6 and the piping 13 of the exhaust system 12, and is passed through the second bypass passage 3 of the main valve 18. discharge. When the predetermined decompression is completed in the heat treatment furnace 1, the first auxiliary valve 30 is opened, and the flow rate or vacuum pumping is performed through the first and second bypass passages 3 2, 3 3 . When the second predetermined decompression is completed in the heat treatment furnace, the main valve 24 is opened, and the large flow rate is passed through the first and second bypass passages 3 2, 3 3 and the main passage 24 of the main valve 18 Vacuum pumping ' to evacuate the vacuum to the desired final pressure. With the above embodiment, since the _ is used to bypass the main valve ----- " the road is assembled to the valve box 2 1 of the main valve 18, the tube is not required - . η. ν — m-— Other piping for bypass. Therefore, the piping of the exhaust system 12 can be simplified, saving space and improving the workability of maintenance. For the space saving, the S b of Fig. 5(b) and the S a of Fig. 6(b) are compared. Since the second auxiliary valve 31 has a flow adjustment function, it is not necessary (please read the back note first and then fill in the page). ···1T-line paper size applies to the Chinese National Standard (CNS) A4 specification (210X297) -13- 1265571 Α7 Β7 Ministry of Economic Affairs Intellectual Property Bureau Employees Consumption Cooperative Printed 5. Inventive Note (An additional valve with flow adjustment function such as a needle valve is required. Therefore, the construction of the exhaust system 12 can be simplified. Since the valve box 2 1 of the main valve 18 is fixed to the casing 14 of the apparatus by the fixing plate 5 4, the color of the main valve 18 is not required to be fixed. Therefore, it is possible to simplify the structure of the piping 1 3 and its adjacent -. '-. Since the fixed joint of the piping 13 is not used, even if the piping 13 is a heating piping, heat is not dissipated, and piping can be suppressed. The generation of the reaction by-product in 1-3. From this point of view, it is preferable that the fixing plate 54 is disposed at a position farther from the main passage 24 in the valve casing 21. In the illustrated embodiment, The fixing plate 5 4 is disposed close to the main path 2 Actuator of the fourth embodiment of the present invention. The present invention is not limited to the above-described embodiments, and various designs can be made without departing from the gist of the present invention. For example, the heat treatment furnace is not limited to a vertical type, and may be a horizontal type, and is not limited to a batch type, and may be a single piece type. In addition to CVD, oxidation, diffusion, annealing, and the like are also performed in the heat treatment. In addition to the semiconductor wafer, for example, a glass substrate or an LCD substrate may be used as the object to be processed. Fig. 1 is a schematic view showing a schematic configuration of an embodiment of the heat treatment apparatus of the present invention. Fig. 2 is a perspective view of the main valve shown in Fig. 1. Fig. 3 is a cross-sectional view showing the main part of the main valve shown in Fig. 2. --------- Ze-- (Please read the back first) Note on this page again -it»

本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) -14- 1265571 A7 B7 五、發明説明(1) 第4圖是第2圖所示的第二輔助閥的放大剖面圖,是 沿著第3圖的I V — I V線的剖面的顯示圖。 第5圖是主閥周圍的零件配置的顯示圖,(a )是側面圖 ,(b )是平面圖。 第6圖是習知技術的主閥周圍的零件配置的顯示圖,( a )是側面圖,(b )是平面圖。 【圖號說明】 1:熱處理爐 2 /·處理容器 2 a :內管 2 b :外管 3 :加熱器 4 :氣體導入部 5 :排氣部 6 :歧管 7 :爐口 8 :蓋體 9 :升降機構 1 0 :晶舟 1 1 :保溫筒 1 2 :排氣系統 1 3 :配管 1 7 :減壓泵浦 本紙張尺度適用中國國家標準(CNS ) A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製This paper scale applies to the Chinese National Standard (CNS) Α4 specification (210Χ297 mm) -14- 1265571 A7 B7 5. Inventive Note (1) Figure 4 is an enlarged cross-sectional view of the second auxiliary valve shown in Figure 2, A diagram showing a section along the line IV-IV of Fig. 3. Fig. 5 is a view showing the arrangement of parts around the main valve, (a) is a side view, and (b) is a plan view. Fig. 6 is a view showing the arrangement of parts around the main valve of the prior art, (a) is a side view, and (b) is a plan view. [Description of the figure] 1: Heat treatment furnace 2 /·Processing container 2 a : Inner tube 2 b : Outer tube 3 : Heater 4 : Gas introduction part 5 : Exhaust part 6 : Manifold 7 : Furnace 8 : Cover 9 : Lifting mechanism 1 0 : Crystal boat 1 1 : Insulation cylinder 1 2 : Exhaust system 1 3 : Piping 1 7 : Decompression pumping This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) (Please read the notes on the back and fill out this page.) Printed by the Consumer Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs.

-15- 1265571 A7 B7 閥 閥閥 器 d 制 助助 應 圓 { 控器輔輔 感器晶 明 閥力集一二鈕力制體 ^ 主壓捕第第旋壓控導 ····»·· · · ··· · · ·· . 一一 _ 發 89001823 : 、 1123 3 455W 五 (請先閱讀背面之注意事項再填寫本頁) -裝·-15- 1265571 A7 B7 valve valve valve d system assisted circle { controller auxiliary auxiliary sensor Jingming valve force set one or two button force body ^ main pressure catching first spinning control ····» · · · ··· · · ·······························································

、1T 線 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -16-, 1T line Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) -16-

Claims (1)

1265571 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 六、申請專利範圍 t 1、 一種熱處理裝置,是具備有: 熱處理爐、 連接到上述熱處理爐用來排出上述熱處理爐內的爐氣 的排氣管、· 以及中介安裝於上述排氣管的主閥,也就是具有:形 成了入口孔與出口孔及連接上述入口孔及出口孔的主通路 的閥箱、及設置在上述閥箱用來將上述主通路開閉的閥體 的主閥之熱處理裝置,其特徵爲: 在上述主閥的閥箱,曼並列形成有用來連通上述入口 孔及出口孔的第一旁通路及第二旁通路, 在上述主閥的閥箱,是設置有:用來開閉上述第一旁 通路的第一輔助閥、與用來開閉上述第二旁通路的第二輔 助閥。 2、 如申請專利範圍第1項的熱處理裝置,其中上述 第一及第二旁通路,是形成在上述閥箱的壁體的孔部。 3、 如申請專利範圍第1項的熱處理裝置,其中上述 第二輔助閥是作成可調整流量。 _ 4、 如申請專利範圍第1項的熱處理裝置,其中在上 述主閥的閥箱是設置有固定構件,是經由該固定構件來將 上述主閥固定到該熱處理裝置的筐體.。 5、 一種閥裝置,是具備有:形成有入口孔與出口孔 與用來連接上述入口孔與出口孔的主通路的閥箱、以及設 置在上述閥箱用來開閉上述主通路的閥體之閥裝置,其特 徵爲: ¾-- (請先閱讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 1265571 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 八、申請專利範圍 2 還具備有: 形成於上述閥箱,迂迴於上述閥體能讓上述入□孔與 出口孔連通的第一旁通路、 與上述第一旁通路並列地形成於上述閥箱,迂迴於上 述閥體能讓上述入口孔與出口孔連通的第二旁通路、 用來開閉上述第一旁通路的第一輔助閥、 以及用來開閉上述第二旁通路的第二輔助閥。 6、 如申請專利範圍第5項的閥裝置,其中上述第— 及第二旁通路,是形成在上述閥箱的壁體的孔部。 7、 如申請專利範圍第5項的閥裝置,其中上述第二 輔助閥是作成可調整流量。 8、 一種熱處理裝置,其特徵爲: 是具備有: 熱處理爐、 連接在上述熱處理爐用來排出上述熱處理爐內的爐氣 的排氣管' 以及中介安裝於上述排氣管的申請專利範圍5、6.或 7項所記載的閥裝置。 (請先閱讀背面之注意事項再填寫本頁) 裝‘ 訂 線· 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -18-1265571 A8 B8 C8 D8 Printed by the Intellectual Property Office of the Ministry of Economic Affairs, Employees' Consumption Cooperatives. VI. Patent application scope t 1. A heat treatment device is provided with: a heat treatment furnace connected to the heat treatment furnace for discharging the furnace gas in the heat treatment furnace. An exhaust pipe, and a main valve that is interposed to the exhaust pipe, that is, a valve box having an inlet hole and an outlet hole, and a main passage connecting the inlet hole and the outlet hole, and a valve box provided in the valve box A heat treatment device for a main valve of a valve body that opens and closes the main passage, wherein: in the valve box of the main valve, a first bypass passage and a second bypass passage for connecting the inlet hole and the outlet hole are formed in parallel The valve box of the main valve is provided with a first auxiliary valve for opening and closing the first bypass passage and a second auxiliary valve for opening and closing the second bypass passage. 2. The heat treatment apparatus according to claim 1, wherein the first and second bypass passages are hole portions formed in a wall of the valve casing. 3. The heat treatment apparatus of claim 1, wherein the second auxiliary valve is configured to have an adjustable flow rate. 4. The heat treatment apparatus according to claim 1, wherein the valve box of the main valve is provided with a fixing member, and the main valve is fixed to the housing of the heat treatment apparatus via the fixing member. A valve device comprising: a valve box formed with an inlet hole and an outlet hole and a main passage for connecting the inlet hole and the outlet hole; and a valve body provided in the valve box for opening and closing the main passage Valve device, which is characterized by: 3⁄4-- (Please read the note on the back and fill out this page) The standard paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 1265571 A8 B8 C8 D8 Ministry of Economics intellectual property The employee's consumer cooperative printing system 8. The patent application scope 2 further includes: a first bypass passage formed in the valve box and bypassing the valve body to allow the inlet hole and the outlet hole to communicate, juxtaposed with the first bypass passage a second bypass passage formed in the valve casing, bypassing the valve body to allow the inlet hole to communicate with the outlet hole, a first auxiliary valve for opening and closing the first bypass passage, and a second opening and closing passage for opening and closing the second bypass passage Two auxiliary valves. 6. The valve device of claim 5, wherein the first and second bypass passages are hole portions formed in a wall of the valve casing. 7. The valve device of claim 5, wherein the second auxiliary valve is configured to have an adjustable flow rate. A heat treatment apparatus comprising: a heat treatment furnace, an exhaust pipe connected to the furnace furnace for discharging the furnace gas in the heat treatment furnace; and an application patent range 5 in which the exhaust pipe is interposed The valve device described in item 6. or 7. (Please read the precautions on the back and fill out this page.) 装 订 订 · This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) -18-
TW91133065A 2001-05-14 2002-11-11 Valve device and heat-treating device TWI265571B (en)

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