TWI262356B - Development machine with edge bean remove device - Google Patents
Development machine with edge bean remove device Download PDFInfo
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- TWI262356B TWI262356B TW93102122A TW93102122A TWI262356B TW I262356 B TWI262356 B TW I262356B TW 93102122 A TW93102122 A TW 93102122A TW 93102122 A TW93102122 A TW 93102122A TW I262356 B TWI262356 B TW I262356B
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1262356 五、發明說明(2) 除此六種製程,以完成整個陣列製程。 示一典型之光阻塗佈製程。首先,,顯 目7^ 輸迗玻璃基板1 0進入朵 阻塗佈機台2,並放置於載台20上。隨後,喷麗 於玻璃基板10上表面。接著,採用旋塗(Spln coatl夜 t方式,旋轉此玻璃基板i。,利用離心力使光阻 % 塗佈於玻璃基板10上。然後,透過幫浦4直空抽氣 勺勻 (Vacuum Dry ),去除光阻溶液中具有高揮發性之溶 (solvent)成分,使光阻溶液硬化’形成一光阻層\ 於玻璃基板10上表面。 4 請參照第二A圖,在旋塗過程中,玻璃基板1〇係放 於一載台20,並經由載台20的轉動,帶動玻璃基板1〇旋 轉,使基板10上之光阻溶液12受到離心力作用,逐漸往 璃基板1 0之邊緣散佈,同時,多餘之光阻溶液丨2亦經由此 離心力作用,由此玻璃基板1 〇之邊緣向外排除。然而,言主 同時參照第二B圖,在玻璃基板10邊緣之光阻溶液12,除巧 了文到光阻溶液1 2與玻璃基板1 〇間之界面摩擦力F丨,卩且严 光阻溶液1 2之流動外,光阻溶液丨2表面之表面張力F 2亦Z 礙了離心力F 3驅使多餘之光阻溶液丨2向外排除,因而導致 光阻溶液1 2累積在玻璃基板1 〇之邊緣形成突起1 4。 此外,由於玻璃基板1 〇之邊緣常製作連接導線,以作 為液晶驅動電路輸出控制信號至薄膜電晶體陣列間之通 道’因此’此塗佈累積於玻璃基板1 Q邊緣之光阻溶液突起 1 4,必須設法加以去除,以免對後續導線佈線之製程造 妨礙。1262356 V. INSTRUCTIONS (2) In addition to these six processes, the entire array process is completed. A typical photoresist coating process is shown. First, the display glass substrate 10 enters the drag coating machine 2 and is placed on the stage 20. Subsequently, the film is sprayed on the upper surface of the glass substrate 10. Next, spin coating (Spln coatl night t method, rotating the glass substrate i. The photoresist is applied to the glass substrate 10 by centrifugal force. Then, through the pump 4, vacuum drying, The solvent component having high volatility in the photoresist solution is removed, and the photoresist solution is hardened to form a photoresist layer on the upper surface of the glass substrate 10. 4 Referring to Figure 2A, during the spin coating process, the glass is coated. The substrate 1 is placed on a stage 20, and the glass substrate 1 is rotated by the rotation of the stage 20, so that the photoresist solution 12 on the substrate 10 is subjected to centrifugal force, and is gradually spread to the edge of the glass substrate 10. The excess photoresist solution 丨2 is also subjected to the centrifugal force, whereby the edge of the glass substrate 1 is removed outward. However, the main reference to the second B diagram, the photoresist solution 12 at the edge of the glass substrate 10, The surface frictional force F 丨 between the photoresist solution 12 and the glass substrate 1 丨, and the flow of the photoresist solution 12, the surface tension F 2 of the surface of the photoresist solution 碍 2 is also impeded by the centrifugal force F 3 The excess photoresist solution 丨2 is excluded, thus The photoresist solution 12 accumulates on the edge of the glass substrate 1 to form the protrusions 14. 4. In addition, since the edges of the glass substrate 1 are often made of connecting wires, the liquid crystal driving circuit outputs a control signal to the channel between the thin film transistor arrays. Therefore, the coating of the photoresist solution 14 accumulated on the edge of the glass substrate 1 Q must be removed to avoid hindering the subsequent wiring process.
1262356 五、發明說明(3) 一般而言,為了去除此累積於玻璃基板邊緣之光阻層 材料,在真空抽氣硬化光阻溶液後,使形成一光阻層1 3於 玻璃基板10後,通常加入一道洗邊(Edge Bean Remove, EBR )之步驟。請參照第三圖,顯示典型之洗邊製程。在 此洗邊製程中,係採用特殊之洗邊溶液1 6,直接以喷嘴3 〇 喷灑在玻璃基板的邊緣之洗邊區域1 5。此洗邊溶液1 6係利 用化學反應直接溶解光阻材料,以達到洗邊之目的,同 時,此喷嘴3 0係沿著玻璃基板1 0之邊緣移動,以去除玻璃 基板1 0邊緣洗邊區域1 5表面之光阻材料。 然而,如上所述,在光阻塗佈製程中加入洗邊的步 驟’除了增加整個光阻塗佈機台之成本與體積,同時,也 增加破璃基板完成整道光阻塗佈製程所需之時間,而導致 製作成本之提高與時間之延誤。除此之外,為了洗除多餘 之光阻材料,在洗邊步驟中,又必須耗費大量之洗邊溶、 液’更導致生產成本之增加。 有鑑於此,本發明提出一種顯影機台,直接利用顯麥 =進行洗邊製程,因而不需使用特殊之洗邊溶液,而仍; 可以達到洗邊之目的。 …、 發明内容: 本發明之目的係提供一種顯影機台,具有洗邊裝置 以直接對玻璃基板進行洗邊動作。 本發明之另-目的係利用顯影液取代洗邊溶液的功1262356 V. INSTRUCTION DESCRIPTION (3) In general, in order to remove the photoresist layer material accumulated on the edge of the glass substrate, after the vacuum evacuation of the photoresist solution, a photoresist layer 13 is formed on the glass substrate 10, Usually add an Edge Bean Remove (EBR) step. Please refer to the third figure for a typical edge washing process. In this edge-washing process, a special edge washing solution 16 is used to directly spray the edge-washing region 15 of the edge of the glass substrate with the nozzle 3 〇. The edge washing solution 16 directly dissolves the photoresist material by a chemical reaction to achieve the purpose of edge washing, and at the same time, the nozzle 30 moves along the edge of the glass substrate 10 to remove the edge washing area of the glass substrate 10 1 5 surface photoresist material. However, as described above, the step of adding the edge washing in the photoresist coating process 'in addition to increasing the cost and volume of the entire photoresist coating machine, and also increasing the need for the glass substrate to complete the entire photoresist coating process. Time, which leads to increased production costs and time delays. In addition, in order to wash away the excess photoresist material, in the step of washing the edge, it is necessary to consume a large amount of washing liquid, and the liquid is more likely to cause an increase in production cost. In view of this, the present invention proposes a developing machine that directly uses the aging bar = to perform the edge washing process, thereby eliminating the need for a special edge washing solution, and still achieving the purpose of edge washing. SUMMARY OF THE INVENTION The object of the present invention is to provide a developing machine having a side washing device for directly performing a washing operation on a glass substrate. Another object of the present invention is to replace the work of the edge washing solution with a developing solution.
1262356 五、發明說明(4) 能’以節省洗邊溶液之使用量。 本發明係揭露一種架構有洗邊裝置之顯影機台,利用 一輸送帶,傳送玻璃基板浸入位於顯影槽内之顯影液中, 以對玻璃基板表面之光阻層進行顯影製程。此顯影機台具 有一洗邊滾輪,設置於輸送帶之側邊,以接觸方式滚動剝 除位於玻璃基板上表面邊緣處之光阻層。 關於本發明之優點與精神可以藉由以下的發明詳述及 所附圖式得到進一步的瞭解。1262356 V. Description of the invention (4) Energy can be used to save the amount of use of the edge washing solution. The present invention discloses a developing machine having a scrubbing device. The conveying glass is immersed in a developing solution located in the developing tank by a conveying belt to develop a photoresist layer on the surface of the glass substrate. The developing machine has a side washing roller disposed on the side of the conveyor belt to roll-contact the photoresist layer at the edge of the upper surface of the glass substrate in a contact manner. The advantages and spirit of the present invention will be further understood from the following detailed description of the invention.
實施方式: 相較於傳統技術將洗邊步驟加入光阻塗佈製程中’本 發明提出一種顯影機台,結合了洗邊的功能,藉以將洗邊 步驟併入顯影製程中,以簡化洗邊所需耗費之時間與裝置 成本。Embodiment: The edge washing step is added to the photoresist coating process compared with the conventional technology. The present invention provides a developing machine platform, which combines the functions of edge washing, thereby incorporating the edge washing step into the developing process to simplify the washing process. The time and equipment cost required.
請參照第四圖,顯示一典型顯影機台,包括一顯影槽 400與一輸送帶200。玻璃基板3 〇〇係放置於輸送帶200上, 並且透過輸送帶2 0 0之傳輸,傳送玻璃基板3 0 0依序浸入顯 影槽40 0之顯影液402中,同時,亦藉由輸送帶2 0 0之傳 輸’將顯影後之玻璃基板3〇〇移出顯影槽40 0,藉以完成對 玻璃基板3 0 0表面光阻層進行顯影之製程。 请參照第五A與B圖,顯示本發明架構於上述顯影機台 之洗邊裝置。此洗邊裝置包括一對洗邊滾輪4 1 〇與馬達 420。洗邊滾輪41 0係設置於輸送帶2 〇〇之上方兩侧,利用Referring to the fourth drawing, a typical developing machine platform including a developing tank 400 and a conveyor belt 200 is shown. The glass substrate 3 is placed on the conveyor belt 200, and transmitted through the conveyor belt 200, and the conveying glass substrate 300 is sequentially immersed in the developing solution 402 of the developing tank 40, and also by the conveyor belt 2. The transmission of 0 0 removes the developed glass substrate 3 from the developing tank 40 0, thereby completing the process of developing the surface resist layer of the glass substrate 300. Referring to Figures 5A and B, the edge washing apparatus of the present invention is constructed. The edge washing device includes a pair of side washing rollers 4 1 and a motor 420. The side washing roller 41 0 is disposed on both sides of the conveyor belt 2 ,, and utilizes
第8頁 1262356 五、、發明說明(5) 接觸方式剝除玻璃基板3 〇 〇上表面邊緣處之光阻層。而馬 達4 2 0係透過一傳動皮帶43 0,帶動此洗邊滚輪41〇,以充 作洗邊滾輪4 1 0之動力來源。 請參照第六圖,顯示本發明洗邊滾輪4 1 〇以接觸方式 剝除光阻層3 1 0之示意圖。如圖中所示,此洗邊滾輪4 1 〇之 下緣位置係接觸到玻璃基板3 0 0之上表面,因此,此位於 玻璃基板3 0 0上表面之光阻層31 〇,將被洗邊滾輪41 〇以滾 動之方式’自玻璃基板3 〇 〇之表面剝除。就一較佳實施例 而言,為了避免洗邊滾輪410對玻璃基板30〇造成傷害,此 洗邊滾輪410應選用較為軟性,之材質,例如:海綿。同 時’為了確保洗邊滾輪4 1 〇可以徹底剝除不必要之光阻層 31〇 ’此洗邊滾輪410係擠壓於玻璃基板3〇()之上表面,以 提供足夠之摩擦力剝除光阻層3 1 〇。 另一方面’就一較佳實施例而言,請參照第七圖,此 ^邊滾輪4 1 0可連接至一高度控制裝置4 5 〇。而此高度控制 衣置4 5 0係利用螺桿4 5 2調整此洗邊滾輪4 1 〇相對應至玻璃 基板3 0 0上表面之垂直距離,換言之,亦改變洗邊滾輪41 〇 也加於玻辦基板3 0 0之壓力,以及洗邊滾輪4 1 〇施加於光阻 層310之摩擦力。同時,洗邊滾輪41〇之位置亦可以配合不 同玻璃基板3 0 0之厚度,以及所欲剝除光阻層之深度,相 應進行調整。 其次,請參照第八圖,此洗邊滾輪4丨〇亦可連接至一 彈力構件46 0。此彈力構件460之一端固定,而另一端係伸 展連接至洗邊滾輪410,並藉由彈簧的恢復力對洗邊滚輪Page 8 1262356 V. INSTRUCTIONS (5) Stripping the glass substrate 3 接触 光 The photoresist layer at the edge of the upper surface. The motorized 4200 is driven by a drive belt 43 0 to drive the edge washer roller 41 to serve as a power source for the edge washer roller 410. Referring to the sixth figure, the schematic diagram of the stripping roller 3 1 本 of the present invention stripping the photoresist layer 310 in a contact manner is shown. As shown in the figure, the position of the lower edge of the edge-washing roller 4 1 接触 contacts the upper surface of the glass substrate 300, so that the photoresist layer 31 on the upper surface of the glass substrate 300 will be washed. The side roller 41 is peeled off from the surface of the glass substrate 3 by rolling. In a preferred embodiment, in order to prevent the edge roller 410 from injuring the glass substrate 30, the edge roller 410 should be made of a soft material such as a sponge. At the same time, in order to ensure that the edge roller 4 1 〇 can completely remove the unnecessary photoresist layer 31 〇 'This edge roller 410 is pressed on the upper surface of the glass substrate 3 〇 () to provide sufficient friction stripping The photoresist layer 3 1 〇. On the other hand, in the case of a preferred embodiment, please refer to the seventh figure, which can be connected to a height control device 45 〇. And the height control clothes set 450 is adjusted by the screw 4 5 2 to the vertical distance of the edge washing roller 4 1 〇 corresponding to the upper surface of the glass substrate 300, in other words, the edge washing roller 41 is also added to the glass. The pressure of the substrate 300 and the frictional force applied to the photoresist layer 310 by the edge roller 4 1 。 are performed. At the same time, the position of the edge washing roller 41 can also be adjusted according to the thickness of the different glass substrate 300 and the depth of the photoresist layer to be stripped. Next, referring to the eighth figure, the edge washing roller 4 can also be connected to an elastic member 46 0 . One end of the elastic member 460 is fixed, and the other end is extended and connected to the edge washing roller 410, and the washing wheel is supported by the restoring force of the spring.
1262356 五、發明說明(6) 410產生一向下之拉力。此向下之拉力即是洗邊滾輪41〇施 力口&破璃基板3 0 0上之壓力。 $外,為了配合不同玻璃基板3 0 0尺寸,以及不同之 洗邊I度◦請參照第九圖’此洗邊滾輪4 1 0連接有一洗邊 見度控制裝置4 4 〇。而此洗邊寬度控制裝置4 4 〇係利用螺桿 442,調整洗邊滾輪4 10在垂直於輸送帶2〇〇輸送方向之位 置。 除此之外,亦可以配合輸送帶2 〇 〇之傳送速度與傳送 方向以及光阻層3 1 〇之厚度與材質等相關參數,調整馬達 420之轉速與轉動方向,以決定洗邊滾輪41〇的轉速與轉動 方向’而能獲致較佳之洗邊效果。一般而言,當洗邊滾輪 之轉動方向與輸送帶2 00之帶動方向相反時,可以獲得 較南效率之洗邊效果。 另外’洗邊滾輪4 1 〇在剝除光阻層3 1 〇之過程會沾附光 阻於其上。為了避免光阻反沾回玻璃基板3 〇 〇,而影響洗 ,f,之進行,可在洗邊滾輪4 1 0上方或側邊設置喷灑式 巧潔裝置(未圖示)或其他種類的清潔裝置,定期清潔洗 邊滚輪4 1 〇上所沾附的光阻,以獲致較佳之洗邊效果。 一、纟示上所述,由於洗邊製程係採用接觸剝除之方式進 ^ ’因此’除了必須避免對玻璃基板3 0 0與其上方具有顯 〜圖案之光阻層造成傷害,亦必須避免玻璃基板3 0 0被洗 邊/袞輪4 1 0 ▼動而產生位移。同時,在洗邊製程中又必須 確保位於玻璃基板3 00邊緣不必要之光阻層可以完全被剝 除。因此’在進行洗邊製程時,一則必須調整上述洗邊寬1262356 V. INSTRUCTIONS (6) 410 produces a downward pulling force. This downward pulling force is the pressure on the edge-washing roller 41, the force applying port, and the glass substrate 300. In addition, in order to match the different glass substrate 300 size, and the different edge washing degree I, please refer to the ninth figure'. This edge washing roller 4 1 0 is connected with a side washing visibility control device 4 4 〇. Further, the edge washing width controlling device 44 adjusts the position of the side washing roller 4 10 in the conveying direction perpendicular to the conveying belt 2 by the screw 442. In addition, the rotation speed and the rotation direction of the motor 420 can be adjusted in accordance with the conveying speed and the conveying direction of the conveyor belt 2 and the thickness and material of the photoresist layer 3 1 to determine the side washing wheel 41〇. The speed of rotation and the direction of rotation' can achieve a better edge washing effect. In general, when the direction of rotation of the edge-washing roller is opposite to that of the conveyor belt 200, a more efficient edge-washing effect can be obtained. In addition, the side washing roller 4 1 沾 will adhere to the photoresist during the process of stripping the photoresist layer 3 1 〇. In order to prevent the photoresist from being returned to the glass substrate 3 〇〇, and affecting the washing, f, it is possible to provide a spray-type cleaning device (not shown) or other kind above or to the side of the edge washing roller 4 1 0. Clean the device and regularly clean the photoresist attached to the edge roller 4 1 to obtain a better edge-washing effect. 1. As indicated in the above description, since the edge-washing process is carried out by means of contact stripping, it is necessary to avoid damage to the glass substrate 300 and the photoresist layer having the visible pattern on the top of the glass substrate. The substrate 300 is washed and the wheel 4 1 0 is moved to generate displacement. At the same time, in the edge-washing process, it must be ensured that the unnecessary photoresist layer on the edge of the glass substrate 300 can be completely stripped. Therefore, when performing the edge washing process, one must adjust the above-mentioned edge width
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度控制裝置440,以控制所 亦必須調整上述高度之光阻層寬度,其次, 度調整洗邊滾輪410施加於^/450以及彈力構件4 6 0,以適 要調整馬達42 0之轉轉;5离基板3 0 0之壓力,同時,也 輸送帶42。之移動速度丄以控制衰輪41〇相對於 件。 ^付合上述洗邊製程的限制條 相較於傳統方法在光阻塗佈製程中加入洗邊製程,本 舍明直接利用顯影機台進行洗邊製程具有下列優點: 、一、本發明直接使用舊有之顯影機台,搭配簡單之洗 邊I置,即可達到洗邊之目的,因此,可以降低進行洗邊 製程所需增加之成本。 二、本發明在顯影機台中加入洗邊裝置,並且直接利 用顯影液搭配洗邊滾輪41 〇剝除玻璃基板3 〇 〇邊緣之光阻 層。可以免除洗邊溶液之使用,因而可以降低製程成本。 二、本發明之洗邊製程,係在對玻璃基板進行顯影製 程時同時進行,因此,可以節省洗邊製程所需消耗之時^ 成本,以提高生產效率。 、 以上所述係利用較佳實施例詳細說明本發明,而非限 制本發明之範圍,而且熟知此類技藝人士皆能明瞭,適^ 而作些被的改變及調整’仍將不失本發明之要義所在,亦 不脫離本發明之精神和範圍。The control device 440 controls the width of the photoresist layer of the height to be adjusted, and secondly, the degree adjusting edge roller 410 is applied to the ^/450 and the elastic member 460 to adjust the rotation of the motor 42 0; 5, the pressure from the substrate 300, and at the same time, the conveyor belt 42. The moving speed 丄 is to control the fader 41 〇 relative to the piece. ^The restriction strip of the above-mentioned edge-washing process is added to the edge-washing process in the photoresist coating process compared with the conventional method. The direct use of the developing machine for the edge-washing process has the following advantages: 1. The invention is directly used. The old developing machine, with a simple side wash I, can achieve the purpose of edge washing, thus reducing the cost of the edge washing process. 2. The present invention adds a side washing device to the developing machine table, and directly strips the photoresist layer on the edge of the glass substrate 3 with the developing solution and the edge washing roller 41. The use of the edge washing solution can be dispensed with, thereby reducing the process cost. 2. The edge-washing process of the present invention is carried out simultaneously in the development process of the glass substrate, thereby saving the cost of the edge-washing process and increasing the production efficiency. The above description of the present invention will be described in detail by the preferred embodiments of the present invention, and the scope of the invention is not limited thereto, and it is understood by those skilled in the art that the invention may be modified and adjusted. The essence of the invention is not deviated from the spirit and scope of the invention.
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1262356 圖式簡單說明 圖示簡單說明: 第一圖係一典型光阻塗佈製程之示意圖。 第二A與B圖係在旋塗光阻溶液之步驟中,因光阻溶液表面 張力,導致位於玻璃基板邊緣之光阻溶液產生突起。 第三圖係一典型搭配光阻塗佈製程之洗邊製程的示意圖。 第四圖係一典型顯影機台之示意圖。 第五A與B圖係本發明架構於顯影機台之洗邊裝置,一較佳 實施例之示意圖。 第六圖係本發明洗邊裝置之洗邊滾輪,利用接觸方式剝除 光阻層之示意圖。 第七圖係本發明高度控制裝置一較佳實施例之示意圖。 第八圖係本發明彈力構件一較佳實施例之示意圖。 第九圖係本發明洗邊寬度控制裝置一較佳實施例之示意 圖。 圖號說明: 幫浦4 光阻溶液1 2 光阻層1 3 洗邊區域1 5 輸送帶200 顯影槽4 0 0 光阻塗佈機台2 玻璃基板1 0 光阻溶液突起1 4 洗邊溶液1 6 喷嘴3 0 玻璃基板3 0 01262356 Brief description of the diagram Brief description of the diagram: The first diagram is a schematic diagram of a typical photoresist coating process. The second A and B diagrams are in the step of spin coating the photoresist solution, and the photoresist solution at the edge of the glass substrate generates protrusions due to the surface tension of the photoresist solution. The third figure is a schematic diagram of a typical edge-washing process with a photoresist coating process. The fourth figure is a schematic view of a typical developing machine. 5A and B are schematic views of a preferred embodiment of the edge washing apparatus of the present invention. Fig. 6 is a schematic view showing the stripping roller of the edge washing device of the present invention, which is stripped of the photoresist layer by contact. Figure 7 is a schematic view of a preferred embodiment of the height control device of the present invention. Figure 8 is a schematic view of a preferred embodiment of the resilient member of the present invention. Figure 9 is a schematic view of a preferred embodiment of the edge washing width control device of the present invention. Description of the figure: Pump 4 photoresist solution 1 2 Photoresist layer 1 3 Washing area 1 5 Conveyor belt 200 Developing tank 4 0 0 Photoresist coating machine 2 Glass substrate 1 0 Photoresist solution protrusion 1 4 Washing solution 1 6 nozzle 3 0 glass substrate 3 0 0
第12頁 1262356 圖式簡單說明 顯影液4 02 洗邊滾輪41 0 馬達420 傳動皮帶43 0 光阻層310 高度控制裝置4 5 0 彈力構件4 60 洗邊寬度控制裝置44 0 螺桿44 2, 452Page 12 1262356 Brief description of the diagram Developing solution 4 02 Washing roller 41 0 Motor 420 Drive belt 43 0 Photoresist layer 310 Height control device 4 5 0 Elastic member 4 60 Washing width control device 44 0 Screw 44 2, 452
第13頁Page 13
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TW93102122A TWI262356B (en) | 2004-01-30 | 2004-01-30 | Development machine with edge bean remove device |
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TW93102122A TWI262356B (en) | 2004-01-30 | 2004-01-30 | Development machine with edge bean remove device |
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