TWI262356B - Development machine with edge bean remove device - Google Patents

Abstract

There is provided a development machine constructed with an edge bean remove (EBR) device, which uses a transmission belt to transfer a glass substrate and immerse the same into developer disposed in a development tank for developing the photoresist layer on the surface of the glass substrate. The development machine has an edge bean remove wheel configured on the side of the transmission belt for stripping off the photoresist layer formed at the edge of the upper surface of the glass substrate by contacting and rolling.

Description

1262356

1262356 V. INSTRUCTIONS (2) In addition to these six processes, the entire array process is completed. A typical photoresist coating process is shown. First, the display glass substrate 10 enters the drag coating machine 2 and is placed on the stage 20. Subsequently, the film is sprayed on the upper surface of the glass substrate 10. Next, spin coating (Spln coatl night t method, rotating the glass substrate i. The photoresist is applied to the glass substrate 10 by centrifugal force. Then, through the pump 4, vacuum drying, The solvent component having high volatility in the photoresist solution is removed, and the photoresist solution is hardened to form a photoresist layer on the upper surface of the glass substrate 10. 4 Referring to Figure 2A, during the spin coating process, the glass is coated. The substrate 1 is placed on a stage 20, and the glass substrate 1 is rotated by the rotation of the stage 20, so that the photoresist solution 12 on the substrate 10 is subjected to centrifugal force, and is gradually spread to the edge of the glass substrate 10. The excess photoresist solution 丨2 is also subjected to the centrifugal force, whereby the edge of the glass substrate 1 is removed outward. However, the main reference to the second B diagram, the photoresist solution 12 at the edge of the glass substrate 10, The surface frictional force F 丨 between the photoresist solution 12 and the glass substrate 1 丨, and the flow of the photoresist solution 12, the surface tension F 2 of the surface of the photoresist solution 碍 2 is also impeded by the centrifugal force F 3 The excess photoresist solution 丨2 is excluded, thus The photoresist solution 12 accumulates on the edge of the glass substrate 1 to form the protrusions 14. 4. In addition, since the edges of the glass substrate 1 are often made of connecting wires, the liquid crystal driving circuit outputs a control signal to the channel between the thin film transistor arrays. Therefore, the coating of the photoresist solution 14 accumulated on the edge of the glass substrate 1 Q must be removed to avoid hindering the subsequent wiring process.

1262356 V. INSTRUCTION DESCRIPTION (3) In general, in order to remove the photoresist layer material accumulated on the edge of the glass substrate, after the vacuum evacuation of the photoresist solution, a photoresist layer 13 is formed on the glass substrate 10, Usually add an Edge Bean Remove (EBR) step. Please refer to the third figure for a typical edge washing process. In this edge-washing process, a special edge washing solution 16 is used to directly spray the edge-washing region 15 of the edge of the glass substrate with the nozzle 3 〇. The edge washing solution 16 directly dissolves the photoresist material by a chemical reaction to achieve the purpose of edge washing, and at the same time, the nozzle 30 moves along the edge of the glass substrate 10 to remove the edge washing area of the glass substrate 10 1 5 surface photoresist material. However, as described above, the step of adding the edge washing in the photoresist coating process 'in addition to increasing the cost and volume of the entire photoresist coating machine, and also increasing the need for the glass substrate to complete the entire photoresist coating process. Time, which leads to increased production costs and time delays. In addition, in order to wash away the excess photoresist material, in the step of washing the edge, it is necessary to consume a large amount of washing liquid, and the liquid is more likely to cause an increase in production cost. In view of this, the present invention proposes a developing machine that directly uses the aging bar = to perform the edge washing process, thereby eliminating the need for a special edge washing solution, and still achieving the purpose of edge washing. SUMMARY OF THE INVENTION The object of the present invention is to provide a developing machine having a side washing device for directly performing a washing operation on a glass substrate. Another object of the present invention is to replace the work of the edge washing solution with a developing solution.

1262356 V. Description of the invention (4) Energy can be used to save the amount of use of the edge washing solution. The present invention discloses a developing machine having a scrubbing device. The conveying glass is immersed in a developing solution located in the developing tank by a conveying belt to develop a photoresist layer on the surface of the glass substrate. The developing machine has a side washing roller disposed on the side of the conveyor belt to roll-contact the photoresist layer at the edge of the upper surface of the glass substrate in a contact manner. The advantages and spirit of the present invention will be further understood from the following detailed description of the invention.

Embodiment: The edge washing step is added to the photoresist coating process compared with the conventional technology. The present invention provides a developing machine platform, which combines the functions of edge washing, thereby incorporating the edge washing step into the developing process to simplify the washing process. The time and equipment cost required.

Referring to the fourth drawing, a typical developing machine platform including a developing tank 400 and a conveyor belt 200 is shown. The glass substrate 3 is placed on the conveyor belt 200, and transmitted through the conveyor belt 200, and the conveying glass substrate 300 is sequentially immersed in the developing solution 402 of the developing tank 40, and also by the conveyor belt 2. The transmission of 0 0 removes the developed glass substrate 3 from the developing tank 40 0, thereby completing the process of developing the surface resist layer of the glass substrate 300. Referring to Figures 5A and B, the edge washing apparatus of the present invention is constructed. The edge washing device includes a pair of side washing rollers 4 1 and a motor 420. The side washing roller 41 0 is disposed on both sides of the conveyor belt 2 ,, and utilizes

Page 8 1262356 V. INSTRUCTIONS (5) Stripping the glass substrate 3 接触 光 The photoresist layer at the edge of the upper surface. The motorized 4200 is driven by a drive belt 43 0 to drive the edge washer roller 41 to serve as a power source for the edge washer roller 410. Referring to the sixth figure, the schematic diagram of the stripping roller 3 1 本 of the present invention stripping the photoresist layer 310 in a contact manner is shown. As shown in the figure, the position of the lower edge of the edge-washing roller 4 1 接触 contacts the upper surface of the glass substrate 300, so that the photoresist layer 31 on the upper surface of the glass substrate 300 will be washed. The side roller 41 is peeled off from the surface of the glass substrate 3 by rolling. In a preferred embodiment, in order to prevent the edge roller 410 from injuring the glass substrate 30, the edge roller 410 should be made of a soft material such as a sponge. At the same time, in order to ensure that the edge roller 4 1 〇 can completely remove the unnecessary photoresist layer 31 〇 'This edge roller 410 is pressed on the upper surface of the glass substrate 3 〇 () to provide sufficient friction stripping The photoresist layer 3 1 〇. On the other hand, in the case of a preferred embodiment, please refer to the seventh figure, which can be connected to a height control device 45 〇. And the height control clothes set 450 is adjusted by the screw 4 5 2 to the vertical distance of the edge washing roller 4 1 〇 corresponding to the upper surface of the glass substrate 300, in other words, the edge washing roller 41 is also added to the glass. The pressure of the substrate 300 and the frictional force applied to the photoresist layer 310 by the edge roller 4 1 。 are performed. At the same time, the position of the edge washing roller 41 can also be adjusted according to the thickness of the different glass substrate 300 and the depth of the photoresist layer to be stripped. Next, referring to the eighth figure, the edge washing roller 4 can also be connected to an elastic member 46 0 . One end of the elastic member 460 is fixed, and the other end is extended and connected to the edge washing roller 410, and the washing wheel is supported by the restoring force of the spring.

1262356 V. INSTRUCTIONS (6) 410 produces a downward pulling force. This downward pulling force is the pressure on the edge-washing roller 41, the force applying port, and the glass substrate 300. In addition, in order to match the different glass substrate 300 size, and the different edge washing degree I, please refer to the ninth figure'. This edge washing roller 4 1 0 is connected with a side washing visibility control device 4 4 〇. Further, the edge washing width controlling device 44 adjusts the position of the side washing roller 4 10 in the conveying direction perpendicular to the conveying belt 2 by the screw 442. In addition, the rotation speed and the rotation direction of the motor 420 can be adjusted in accordance with the conveying speed and the conveying direction of the conveyor belt 2 and the thickness and material of the photoresist layer 3 1 to determine the side washing wheel 41〇. The speed of rotation and the direction of rotation' can achieve a better edge washing effect. In general, when the direction of rotation of the edge-washing roller is opposite to that of the conveyor belt 200, a more efficient edge-washing effect can be obtained. In addition, the side washing roller 4 1 沾 will adhere to the photoresist during the process of stripping the photoresist layer 3 1 〇. In order to prevent the photoresist from being returned to the glass substrate 3 〇〇, and affecting the washing, f, it is possible to provide a spray-type cleaning device (not shown) or other kind above or to the side of the edge washing roller 4 1 0. Clean the device and regularly clean the photoresist attached to the edge roller 4 1 to obtain a better edge-washing effect. 1. As indicated in the above description, since the edge-washing process is carried out by means of contact stripping, it is necessary to avoid damage to the glass substrate 300 and the photoresist layer having the visible pattern on the top of the glass substrate. The substrate 300 is washed and the wheel 4 1 0 is moved to generate displacement. At the same time, in the edge-washing process, it must be ensured that the unnecessary photoresist layer on the edge of the glass substrate 300 can be completely stripped. Therefore, when performing the edge washing process, one must adjust the above-mentioned edge width

1262356

The control device 440 controls the width of the photoresist layer of the height to be adjusted, and secondly, the degree adjusting edge roller 410 is applied to the ^/450 and the elastic member 460 to adjust the rotation of the motor 42 0; 5, the pressure from the substrate 300, and at the same time, the conveyor belt 42. The moving speed 丄 is to control the fader 41 〇 relative to the piece. ^The restriction strip of the above-mentioned edge-washing process is added to the edge-washing process in the photoresist coating process compared with the conventional method. The direct use of the developing machine for the edge-washing process has the following advantages: 1. The invention is directly used. The old developing machine, with a simple side wash I, can achieve the purpose of edge washing, thus reducing the cost of the edge washing process. 2. The present invention adds a side washing device to the developing machine table, and directly strips the photoresist layer on the edge of the glass substrate 3 with the developing solution and the edge washing roller 41. The use of the edge washing solution can be dispensed with, thereby reducing the process cost. 2. The edge-washing process of the present invention is carried out simultaneously in the development process of the glass substrate, thereby saving the cost of the edge-washing process and increasing the production efficiency. The above description of the present invention will be described in detail by the preferred embodiments of the present invention, and the scope of the invention is not limited thereto, and it is understood by those skilled in the art that the invention may be modified and adjusted. The essence of the invention is not deviated from the spirit and scope of the invention.

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1262356 Brief description of the diagram Brief description of the diagram: The first diagram is a schematic diagram of a typical photoresist coating process. The second A and B diagrams are in the step of spin coating the photoresist solution, and the photoresist solution at the edge of the glass substrate generates protrusions due to the surface tension of the photoresist solution. The third figure is a schematic diagram of a typical edge-washing process with a photoresist coating process. The fourth figure is a schematic view of a typical developing machine. 5A and B are schematic views of a preferred embodiment of the edge washing apparatus of the present invention. Fig. 6 is a schematic view showing the stripping roller of the edge washing device of the present invention, which is stripped of the photoresist layer by contact. Figure 7 is a schematic view of a preferred embodiment of the height control device of the present invention. Figure 8 is a schematic view of a preferred embodiment of the resilient member of the present invention. Figure 9 is a schematic view of a preferred embodiment of the edge washing width control device of the present invention. Description of the figure: Pump 4 photoresist solution 1 2 Photoresist layer 1 3 Washing area 1 5 Conveyor belt 200 Developing tank 4 0 0 Photoresist coating machine 2 Glass substrate 1 0 Photoresist solution protrusion 1 4 Washing solution 1 6 nozzle 3 0 glass substrate 3 0 0

Page 12 1262356 Brief description of the diagram Developing solution 4 02 Washing roller 41 0 Motor 420 Drive belt 43 0 Photoresist layer 310 Height control device 4 5 0 Elastic member 4 60 Washing width control device 44 0 Screw 44 2, 452

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Claims (1)

1262356 VI. Scope of Application Patent Application: 1. A developing machine equipped with a side washing device, comprising: a developing tank containing a developing solution; a conveyor belt disposed in the developing tank for conveying the glass The substrate is immersed in the developing solution to develop the photoresist layer on the surface of the glass substrate; a side washing roller is disposed on the side of the conveyor belt, and the photoresist layer at the edge of the upper surface of the glass substrate is stripped in a contact manner And an elastic member for controlling the pressure applied by the edge washing roller to the photoresist layer. 2. The developing machine of claim 1 of the patent scope further includes a speed control device for controlling the rotation speed and steering of the edge washing roller. 3. The developing machine of claim 1 further includes a height control device for controlling the vertical position of the edge washing roller. 4. The developing machine of claim 1, wherein the height control device controls the #直 position of the edge washing roller by means of a screw. 5. The developing machine of claim 1, further comprising a edge width control device for controlling the width of the photoresist layer to be stripped. 6. The developing machine of claim 1, wherein the edge width control device controls the width of the photoresist layer by a screw to control the edge roller. 7. The developing machine of claim 1, further comprising a motor coupled to the edge washing roller via a belt to drive the edge washing wheel to rotate. 8. The developing machine of claim 1, wherein the direction of rotation of the edge washing roller is opposite to the conveying direction of the conveyor belt. 9. The developing machine of claim 1 of the patent scope, the washing wheel is a sea Page 14 1262356 (4)::t:JJian: Yan i ^_I_____________ ... one.xW'' one..."Qingdi I VI, the scope of application for patent L--.............. ........... Cotton material. 1 0. A kind of edge washing device, which is constructed on a developing machine, and comprises: a conveyor belt for conveying the glass substrate to be immersed in the developing solution; and two side washing rollers disposed on both sides of the conveyor belt, having The conveying belt conveys the opposite direction of rotation to peel off the photoresist layer at the edge of the upper surface of the glass substrate; and an elastic member for controlling the pressure applied by the edge washing roller to the photoresist layer. 11. The edge washing device of claim 10, further comprising a speed control device for controlling the rotation speed and steering of the two side washing rollers. 1 2. The edge-washing device of claim 10, further comprising a height control device for controlling the vertical position of the edge-washing roller. 1 3. The edge washing device of claim 10, wherein the height control device controls the vertical position of the edge washing roller by means of a screw. 14. The edge-washing device of claim 10, further comprising a milling edge 1: degree control device for controlling the width of the photoresist layer to be stripped by the edge-washing roller. 1 5 . The edge-washing device of claim 10, wherein the edge-washing width control device controls the width of the photoresist layer by using a screw to control the edge-washing roller. 16. The edge-washing device of claim 10, further comprising a motor coupled to the edge-washing rollers via a drive belt to drive the edge-washing rollers to rotate. 1 7. The edge washing device of claim 10, wherein the edge washing roller is made of a sponge. Page 15