TWI256699B - Methods and structures for critical dimension and profile measurement - Google Patents

Methods and structures for critical dimension and profile measurement

Info

Publication number
TWI256699B
TWI256699B TW094100553A TW94100553A TWI256699B TW I256699 B TWI256699 B TW I256699B TW 094100553 A TW094100553 A TW 094100553A TW 94100553 A TW94100553 A TW 94100553A TW I256699 B TWI256699 B TW I256699B
Authority
TW
Taiwan
Prior art keywords
structures
profile measurement
methods
critical dimension
substrate
Prior art date
Application number
TW094100553A
Other languages
English (en)
Other versions
TW200611360A (en
Inventor
Jyu-Horng Shieh
Wen-Chih Chiou
Peng-Fu Hsu
Baw-Ching Perng
Hun-Jan Tao
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Publication of TW200611360A publication Critical patent/TW200611360A/zh
Application granted granted Critical
Publication of TWI256699B publication Critical patent/TWI256699B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
TW094100553A 2004-09-24 2005-01-07 Methods and structures for critical dimension and profile measurement TWI256699B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/949,037 US7208331B2 (en) 2004-09-24 2004-09-24 Methods and structures for critical dimension and profile measurement

Publications (2)

Publication Number Publication Date
TW200611360A TW200611360A (en) 2006-04-01
TWI256699B true TWI256699B (en) 2006-06-11

Family

ID=36126067

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094100553A TWI256699B (en) 2004-09-24 2005-01-07 Methods and structures for critical dimension and profile measurement

Country Status (2)

Country Link
US (1) US7208331B2 (zh)
TW (1) TWI256699B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7354779B2 (en) * 2006-03-10 2008-04-08 International Business Machines Corporation Topography compensated film application methods
CN100459087C (zh) * 2006-07-21 2009-02-04 中芯国际集成电路制造(上海)有限公司 确定半导体特征的方法和用于制造集成电路的方法
US7919335B2 (en) * 2009-04-20 2011-04-05 Taiwan Semiconductor Manufacturing Co., Ltd. Formation of shallow trench isolation using chemical vapor etch

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6358854B1 (en) * 1999-04-21 2002-03-19 Sandia Corporation Method to fabricate layered material compositions
US6773939B1 (en) * 2001-07-02 2004-08-10 Advanced Micro Devices, Inc. Method and apparatus for determining critical dimension variation in a line structure
US6684172B1 (en) * 2001-12-27 2004-01-27 Advanced Micro Devices, Inc. Sensor to predict void free films using various grating structures and characterize fill performance
US6771356B1 (en) * 2002-01-16 2004-08-03 Advanced Micro Devices, Inc. Scatterometry of grating structures to monitor wafer stress
US6967349B2 (en) * 2002-09-20 2005-11-22 Texas Instruments Incorporated Method for fabricating a multi-level integrated circuit having scatterometry test structures stacked over same footprint area
US6934032B1 (en) * 2002-09-30 2005-08-23 Advanced Micro Devices, Inc. Copper oxide monitoring by scatterometry/ellipsometry during nitride or BLOK removal in damascene process
SG120958A1 (en) * 2002-11-01 2006-04-26 Asml Netherlands Bv Inspection method and device manufacturing method

Also Published As

Publication number Publication date
US7208331B2 (en) 2007-04-24
TW200611360A (en) 2006-04-01
US20060073620A1 (en) 2006-04-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees