TWI252841B - A system and method for delivering electron acceptors and/or electron donors to contaminated aquifer - Google Patents

Abstract

A system and method for delivering electron acceptors and/or electron donors to contaminated aquifer. The invention contains a main line of a large diameter and numerous reduced-diameter lines branching from the main lines in parallel array. The method is to inject electron acceptors and/or electron donors in gas or vapor state pneumatically through the system into contaminated aquifer. Delivering electron acceptors and/or electron donors in gas or vapor state provides effective mixing with microorganisms and the contaminants in aquifer. This invention is capable to deliver electron acceptors and donors to contaminated aquifer with radius of influence greater than vertical and horizontal wells. Also, by delivering electron acceptors and/or electron donors in gas or vapor state avoids potential clogging near the injection points due to excessive microbial growth.

Description

1252841 玖, invention description: [Technical field of invention] Petroleum hydrocarbons and organic compounds are the most common organic pollutants in groundwater and soil. These compounds are often dissolved in drinking water sources causing serious national health problems. Because groundwater is a drinking water source used in many parts of the world, it is very important and meaningful to develop economic and effective remediation methods. Known remediation methods include extraction, stripping, and soil gas extraction. Natural degradation has also been shown to degrade the concentration of organic pollutants in soil and groundwater. But natural degradation is usually slow. Local bioremediation is often used to remediate soils and groundwater contaminated with petroleum carbonaceous compounds and gas-containing organic matter. Most of the research and development and on-site applications of local bioremediation technologies focus on on-site investigations, strain screening domestication, or application of nutrients, electronic recipients, and/or electron suppliers. Few research developments have noted improvements in the injection of electronic receivers and/or electron suppliers into the system and the increased efficiency of hybrid contact between the electron receiver and/or the electron supplier in the subsurface. Local bioremediation is an important engineering bottleneck in the absence of proven methods to inject electron recipients and/or electron donors into the ground and effectively mix with contaminants and microorganisms. The effectiveness of local bioremediation technology is not as good as that of the laboratory. This shows the importance of improving the electronic recipient and/or electron supplier injection system. [Prior Art] 1252841 Stripping method uses air as an electron acceptor to inject a saturated layer. Based on 3 I mold data, Mariey et al. (1995) reported that the effective radius of the stripping process is about 3 to 8 meters. A c omb et al. (1 9 9 5 ) reported a maximum remediation radius of about 4 · 5 m at the gas injection rate of 4 5 〇 liters per minute under steady turbulent flow according to field tests. L u η d e g a r d et al. (2 〇 〇 1 ) reported by the field test that the gas injection effective distance of the gas injection well can reach 15 meters. Η 〇 p k i n s and M cCarty (1995) report aspiration and toluene as the main matrix for aerobic co-metabolism of trichloroethylene and chloroolefins. McCarty et al. (1998) used oxygen and barium peroxide as electron acceptors, and benzene as the main substrate to remediate sites contaminated with trichloroethylene. The above electron acceptors and main substrates are injected into the underground aquifer by the injection well after mixing with the surface and water. M c c a r t y et al. (1 9 9 8 ) reported that the in-situ operation of the injection well found that the electron acceptor and the main substrate injected into the aquifer did not mix well with the contaminant; the microbial overgrowth near the injection well caused the well screen to clog. Μ cCarty et al. (1998) used pulse injection to help more uniform distribution of toluene in the aquifer, but the effective radius was also within 1 metre. SUMMARY OF THE INVENTION A vertical or horizontal well is used to inject an electron acceptor and/or an electron donor into a contaminated aquifer to degrade organic contaminants. The above conventional methods have difficulty in effectively distributing electron acceptors and/or electron donors in the aquifer, and most of them are confined to the vicinity of the injection well. SUMMARY OF THE INVENTION The present invention provides a method and system for injecting an electron acceptor and/or an electron supplier into a contaminated aquifer. The method can effectively and evenly distribute the electronic 1252841 recipient and/or electron supplier in the aquifer, and the effective injection radius is larger than the conventional vertical or horizontal well. The /introgress system of the present invention is first started by a large-caliber gas injection main pipe, and then a plurality of small-diameter gas injection branch pipes are branched in parallel through the gas injection main pipe, and finally enter the aquifer. The large mouth from which the system can inject electron receivers and/or electron donors to a long distance without excessive pressure drop. The parallel gas injection manifolds are each equipped with a flow control device and a porous limited outflow gas pipe to effectively control the distribution of electron acceptors and/or electron suppliers in the aquifer. The present invention pneumatically injects an electron acceptor and/or an electron donor into a contaminated aquifer in a gaseous state. Injecting an electron acceptor and/or an electron supplier in a gaseous state provides a sufficiently effective mixing with microorganisms and contaminants in the aquifer. The present invention has an effective range for injecting an electron acceptor and/or an electron supplier into an aquifer greater than conventional vertical and horizontal well methods. In addition, the present invention effectively injects the electron acceptor and/or the electron supplier into the aquifer in a gaseous state, thereby effectively avoiding the problem that the microorganisms in the vicinity of the injection well block the well screen. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In order to make the technical means, the features of the invention, the objects, and the functions of the present invention are readily understood, the detailed description of the specific embodiments, the drawings and the drawings are as follows: An example of air injected into an aquifer for an electron receiver): Figure 1 is a schematic diagram of a parallel air injection method and system of the present invention having a large diameter for injecting air (5 1 ) into the inlet (3) at the inlet. Injecting main pipe (1), and gas injecting main pipe (1) respectively, 1252841 parallel type of small-diameter gas injection pipe branch (2), gas injection pipe branch (2) each equipped with flow control device (4) and limited outflow pipe ( 3). Ben: Ming 2 gas: tube (2) and each outflow trachea (3) parallel row. Fig. 1 is a schematic diagram of the series of outflow trachea (3) connected by gas injection pipe (complex). Figure 3 compares the parallel air distribution of the present invention with the pressure distribution of the (4) type field, and the i-force is the main house force minus the static pressure of the water column. Figure 4 compares the flow distribution of the parallel air injection system of the present invention with the flow distribution of the series air injection system. It can be seen from Fig. 3 that the injection distance of the parallel line injection system of the present invention is at least 2 Q meters, which is much larger than the tandem air injection system, and is also much larger than the conventional vertical or horizontal injection wells. It can be seen from Fig. 4 that the parallel air injection system of the present invention can uniformly inject air into the aquifer more than the series type. Among them, the gas injection main pipe (i) of the present invention can be injected into the electron acceptor and/or the electron supplier, the electron acceptor can be oxygen, and the electron donor can be gaseous toluene or the like. DETAILED DESCRIPTION OF THE SECOND PREFERRED EMBODIMENT (An example of injecting toluene vapor (electron supplier) by air as an electron acceptor through a venturi): Figure 5 is an air carrying toluene vapor through the venturi of the present invention. Parallel injection method and system schematic. First, inject air (5 1 ) into the venturi (6) with a gas injector (5), vaporize a toluene solution (71) in the vessel (7) with the venturi (6), and carry toluene. The steam (72) enters the large-diameter gas injection main pipe (1), and then the gas injection main pipe (1) enters the small-diameter gas injection branch pipe (2) in parallel; the gas injection support (2) is equipped with a flow control device ( 4) and limited effluent gas 1252841 two untwisted ί into the aquifer (8) 'the upper layer of the aquifer (8) η Figure 6 is the benzene vapor parallel injection dtrj concentration distribution map. The distribution of the hexamethylbenzene concentration can be quickly obtained by the present invention with air (electron acceptor) carrying (four) benzene = the green of the county is a uniform aquifer. In addition, the embodiment of the needle (four) five, under the operating conditions and less

A is connected to the venturi (1) at the inlet of the gas injection (1), the inlet (6) is connected to the inlet of the venturi (6), and the bottom side of the venturi (6) is connected with a toluene solution (71). The container (7); the gas injection main pipe (1) is sealed at the other end, and a plurality of gas injection pipe branches (2) are connected in parallel, and a flow rate is connected between the inlet end of each gas injection branch pipe (2) and the gas injection main pipe (work) The control device (4), the aeration end of the gas injection branch pipe (2) is connected to a limited outflow gas pipe (3); the limited outlet gas pipe (3) may be a porous pipe made of stainless steel; wherein the gas injection branch pipe (2) is extended To the polluted aquifer (8), the restricted outflow pipe (3) also extends to the polluted aquifer (8). B. Inject air (5 1) into the venturi (6) by means of a gas injection machine to (7) The solution of the stupid solution (7 1 ) is volatilized into a stupid vapor (72) by a low pressure effect, and is drawn into the venturi (6) and mixed with the air squeezed by the gas injection machine (5); Then, the mixed gas enters the gas injection main pipe (1), and sequentially enters each gas injection branch pipe (2), wherein the flow control device (4) is used to control the opening of the gas injection main pipe (1) and the gas injection branch pipe (2). Area Note 1252841 The pressure of the gas branch pipe (2) is similar to the flow rate; the gas injection branch pipe (2) can guide the benzene vapor (7 2 ) and release it into the polluted aquifer via the restricted gas pipe (3) (8) Thereby, the carried mixed gas is evenly distributed to the polluted aquifer (8) due to mass conversion, and is utilized by the microorganism. In summary, the embodiment of the present invention can achieve the intended use effect, and the disclosed The specific structure has not only been seen in similar products, nor has it been disclosed before the application. Cheng has fully complied with the requirements and requirements of the Patent Law, and has filed an application for invention patents according to law, so please review the application and grant the patent. 10 1252841 [Simple diagram of the diagram] Figure 1 Schematic diagram of the parallel air injection method and system of the present invention - string & type air injection method and system diagram FIG. 3 pressure distribution of the parallel air injection system of the invention Comparison of pressure distribution of air injection systemFig.4 Comparison of flow distribution of parallel air injection system and flow distribution of series air injection system of the present invention Schematic diagram of system and system for parallel injection of gas carrying toluene vapor through venturi tubeFig. 6 Distribution of benzene concentration in aquifer of benzene-benzene vapor parallel injection system of the present invention [Description of main components] (1) Gas injection supervisor (2) Gas injection Branch pipe (3) Outflow pipe (4) Flow control device (5) Gas injection machine (51) Air (6) Venturi tube (7) Container (71) Toluene solution (72) Toluene vapor (8) Aquifer (9 Unsaturated layer (11) gas injection pipe

Claims (1)

Weng Guangyue / ί /J252841 Picking up, applying for patent scope: 1. A system for injecting electron donors into a contaminated aquifer, which consists of a large-caliber gas injection supervisor, and then a plurality of small calibers are branched by the gas injection supervisor in parallel. The gas injection branch pipe, the large diameter injection system can squeeze the electron supplier to a long distance without excessive pressure drop, and the parallel gas injection branch pipe can be assembled to control the flow area of the gas injection pipe and the gas injection pipe opening area. The device and a porous outlet flow out of the gas tube to control the distribution of the electron supplier in the aquifer. 2. Inject the electron supplier into the system of the contaminated aquifer as described in item 1 of the scope of the patent application, the injecting main inlet for the injected electron donor, which is gaseous toluene. 3. Inject the electron supplier into the system of contaminated aquifer as described in item 1 of the scope of the patent application, which limits the flow of the trachea to the porous tube. 4. Inject the electron supplier into the system of the contaminated aquifer as described in item 1 of the patent application, the gas injection main inlet being connected to the gas injection machine for gas injection. 5. A system for injecting an electron supplier into a contaminated aquifer as described in claim 1 of the patent application, wherein the gas injection main inlet is connected to a venturi, and the bottom side of the venturi is connected to a container containing a liquid electron supplier. 6. Inject the electron supplier into the system of contaminated aquifer as described in item 5 of the patent application, the venturi inlet being connected to the gas injector. 7. A system for injecting an electron supplier into a contaminated aquifer as described in item 5 of the scope of the patent application, the liquid electron supplier being a terpene solution. 8. A system for injecting electron donors into contaminated aquifers, 12 1252841 The large-caliber gas injection main pipe is connected in parallel by the gas injection main pipe to a plurality of small-diameter gas injection branch pipes. The large-diameter injection system can push the electron receiver to a long distance without excessive pressure drop. The gas injection branch pipes are respectively assembled with a flow control device for controlling the opening area of the gas injection pipe and the gas injection pipe branch and a porous limit outlet gas pipe to control the distribution of the electron acceptor in the aquifer. 9. A system for injecting an electron acceptor into a contaminated aquifer as described in claim 8 of the scope of the patent application, the gas inlet main inlet for the electronic connection of the injection It is oxygen. 10. A system for injecting an electron acceptor into a contaminated aquifer as described in Section 8 of the patent application, which exits the tracheal system. 11. Inject the electron acceptor into the system of contaminated aquifer as described in item 8 of the patent application, the gas injection main inlet being connected to the gas injection machine for gas injection. 12. A system for injecting electron acceptors and electron suppliers into a contaminated aquifer, comprising a large-caliber gas injection main pipe, and then a plurality of small-diameter gas injection branch pipes are branched in parallel by the gas injection mains, and a large diameter g The injection system can push the electronic receiver and the electron supplier to a long distance without the need of a pressure drop. The parallel gas injection branch is assembled to control the flow area of the gas injection main pipe and the gas injection branch opening area. The device and a porous outlet flow out of the trachea to control the distribution of electron acceptors and electron donors in the aquifer. 13. A system for injecting an electron acceptor and an electron supplier into a contaminated aquifer as described in claim 12, the gas supply mains inlet for injecting electrons, which is gaseous toluene. 13 1252841 14. Injecting an electronic receiver and an electron supplier into a system of contaminated aquifers as described in claim 12, the injecting mains inlet is oxygen for injection. 15. A system for injecting an electron acceptor and an electron supplier into a contaminated aquifer as described in claim 12, which limits the flow of the trachea to the porous tube. 16. A system for injecting an electronic recipient and an electronic supplier into a contaminated aquifer as described in claim 12, the gas injection main inlet being connected to a gas injection device for gas injection. 17. A system for injecting an electron acceptor and an electron supplier into a contaminated aquifer as described in claim 12, wherein the gas injection main inlet is connected to the venturi, and the bottom side of the venturi is connected to a container, the liquid is filled in the container Electronic supplier. 18. A system for injecting an electronic receiver and an electronic supplier into a contaminated aquifer as described in claim 16 of the patent application, the venturi inlet being connected to the gas injector. 19. A system for injecting an electron acceptor and an electron supplier into a contaminated aquifer as described in claim 16 of the patent application, the liquid electron supplier being a toluene solution. 20· A method for injecting an electron supplier into a contaminated aquifer, the steps of which are as follows: A. A plurality of gas injection branches are connected in parallel with a gas injection main pipe at one end, and an inlet end of each gas injection branch pipe and a gas injection main pipe Connected to a flow control device, the aeration end of the gas injection branch is connected to a limited outlet gas pipe; wherein, the gas injection branch pipe extends to the polluted aquifer, and the 14 1252841 restricted gas flow pipe also extends to the polluted aquifer; B. The electron supplier Injecting the gas injecting main pipe, and sequentially entering each gas injecting branch pipe; wherein, the flow control device is used to control the opening area of the gas injecting main pipe and the gas injecting pipe branch, so that the pressure and the flow rate of each gas injecting pipe branch are similar; the gas injecting pipe branch can be The electron supplier directs and releases it evenly into the contaminated aquifer via a restricted outflow tube for use by the microorganism. 21. A method of injecting an electron supplier into a contaminated aquifer as described in claim 20, the gas supply mains inlet for injecting an electron donor, gaseous toluene. 22. A method of injecting an electron supplier into a contaminated aquifer as described in claim 20, which exits the trachea porous tube. 23. A method of injecting an electron supplier into a contaminated aquifer as described in claim 20, wherein the gas injection main inlet is connected to the gas injection device for gas injection. 24. A method of injecting an electron supplier into a contaminated aquifer as described in claim 20, wherein the gas injection main inlet is connected to a venturi, and the bottom side of the venturi is connected to a container containing a liquid electron supplier. 25. A method of injecting an electron supplier into a contaminated aquifer as described in claim 24, the venturi inlet being connected to the gas injector. 26. A method of injecting an electron donor into a contaminated aquifer as described in claim 24, the liquid electron supplier being a toluene solution. 27·—A method of injecting an electron acceptor into a contaminated aquifer, the step 15 1252841 is a · A. 2: end: a closed gas injection main pipe is connected in parallel with a plurality of gas injection branches; two! Injecting main pipe connection-flow total. The aeration end of the milking branch pipe is connected to a limited outflow gas. The second leg of the pipe is extended to the polluted aquifer, and the restricted flow B is also extended to the polluted aquifer; The electronic receiver, + person, 士> + ^ / into the main officer, so that they enter each note n: 1 2 'using the flow control device to control the gas injection pipe 2 = the opening area of the branch pipe' The dusting force of each gas injection branch pipe is similar to that of the second gas; the gas injection branch pipe can guide the electron supplier and release it into the polluted aquifer by the outflow gas pipe to be utilized by the microorganism. - The method of injecting an electron acceptor into a water receiving layer as described in item 27 of the patent scope'. The electron injector for the injection main inlet is oxygen. 29. A method of injecting an electron acceptor into a layer of 30 water as described in claim 27, the restricted watershed (iv) porous tube. ., , - = 凊 凊 凊 凊 将 将 将 将 将 将 将 将 将 将 将 将 将 将 将 将 将 将 将 将 电子 电子 电子 电子 电子 电子 电子 电子 电子 电子 电子 电子 电子 电子 电子31. A method for injecting an electron acceptor and a t-supplier into a contaminated aquifer, the steps of which are: the end of the gas injection pipe is connected to the gas inlet pipe of the gas injection pipe and the gas injection pipe The main pipe is connected to the first-class control device, and the aeration end of the gas injection pipe is connected with a limited flow of gas 16 1252841; wherein the gas injection branch pipe extends to the polluted aquifer, and the outflow gas pipe extends to the polluted aquifer; The electron receiver and the electron supplier inject the gas injection main pipe into the gas injection branch pipes in sequence; wherein the flow control device is used to control the opening area of the gas injection main pipe and the gas injection branch pipe, so that the pressure of each gas injection branch pipe is close to the flow rate The gas injection branch can guide the electron supplier and release it evenly into the polluted aquifer via the outflow pipe to be utilized by the microorganism. 32. A method of injecting an electron acceptor into a φ contaminated aquifer as described in claim 31, wherein the gas injection main inlet is supplied to the electron donor, which is gaseous toluene. 33. In the method of injecting an electron acceptor into a contaminated aquifer as described in claim 31, the electron injecting port of the gas injection main inlet is oxygen. 34. A method of injecting an electron acceptor into a contaminated aquifer as described in claim 31, which exits the tracheal porous tube. 35. A method of injecting an electron acceptor into a φ contaminated aquifer as described in claim 31, the gas injection main inlet is connected to a venturi, and the bottom side of the venturi is connected to a container containing a liquid electron supplier . 3G. A method of injecting an electron acceptor into a contaminated aquifer as described in claim 35, the venturi inlet being connected to the gas injector. 37. A method of injecting an electron acceptor into a contaminated aquifer as described in claim 35, the liquid electron supplier being a toluene solution. 17 1252841 1252841 i· 91 Π . 9 "ΙΊΊΊΙΊΙ I ΤΙ TnHLI Ί OO OOVO inch CNr"H〇〇Vs〇 inch CN,.〇〇〇〇 • «攀击 j « · · · oooo oooo (疆鲜) 1252841 91 mining) calendar wnYfti dish II Ό 1 1 Ο 1252841 1252841 mm IgSSYtti dish CNI IIOI 6COA 910 inch He® mmm 〇〇〇〇〇〇〇 ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο CO CO CO CO CN r-H