TWI249176B - Plasma discharging device - Google Patents

Plasma discharging device Download PDF

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Publication number
TWI249176B
TWI249176B TW93119141A TW93119141A TWI249176B TW I249176 B TWI249176 B TW I249176B TW 93119141 A TW93119141 A TW 93119141A TW 93119141 A TW93119141 A TW 93119141A TW I249176 B TWI249176 B TW I249176B
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Taiwan
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discharge device
chamber
plasma discharge
plasma
electrode
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TW93119141A
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Chinese (zh)
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TW200601368A (en
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Yih-Ming Shyu
Liang-Chun Wang
Ji-Yung Li
Yan-Gen Chen
Chun-Chin Chen
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Creating Nano Technologies Inc
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Abstract

A plasma-discharging device is disclosed in the present invention. The plasma-discharging device comprises an outer electrode, a partition, an insulator layer, and a discharging electrode. The outer electrode is tubular, and the partition is set on the cross-section of the outer electrode to separate the outer electrode into a first cavity and a second cavity, wherein the partition has a hole in the center. The insulator layer covers the inner wall of the outer electrode and the surface of the partition. The discharging electrode is put in the first cavity to send out plasma column towards the end opening of the outer electrode through the hole of the partition and the second cavity. The diameter of the hole of the partition covered by the insulator layer is 0.01 to 0.99 times of the inner diameter of the outer electrode covered by the insulator layer.

Description

1249176 _案號93119141_年月曰 修正_ 五、發明說明(1) 【發明所屬之技術領域】 本發明是有關於一種放電裝置,且特別是有關於一種電漿 放電裝置。 【先前技術】 電漿的組成包括有電子、離子以及電中性粒子。在電漿 中,正負電荷的數目大致相等,故一般可視為呈電中性, 且受電磁場影響。電漿的形成可經由高能量粒子、電磁波 (如宇宙射線、紫外線、X射線等)對氣體撞擊,或對氣體 施予高溫,或對氣體施予外加電場來形成。一般電漿產生 的方式,是將所需之氣體通入一容器内,於某一氣壓下, 加入直流電源、射頻(Radio Frequency)或微波 (Microwave)能量來源,利用電容式(Capacitive)、電感 式(Inductive)或粒子與波交互作用的方式,使氣體崩潰 (Breakdown)游離,即為電漿。簡而言之,電漿的產生乃 是將能量施於氣體,使其受激電離。 電漿炬(Plasma Torch)是一種常見的常壓電漿,其原理係 將電漿能量聚集在一小的體積範圍内,將漩流工作氣體部 份離子化,使工作氣體能產生活化反應,提高反應性。為 了延長電極的使用壽命,通常會使用耐高溫金屬(如鎢或 鎢摻雜氧化钍)作放電電極,且將工作氣體以漩渦流動 (Swirling Flow)的方式導入放電電極之間,以使電漿柱 (Plasma Column)能穩定在電漿通道的中央,進而減少能 量散失到管壁,並能造成電漿柱的收縮,以提高電漿溫度 及工作氣體的游離程度。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a discharge device, and more particularly to a plasma discharge device. [Prior Art] The composition of the plasma includes electrons, ions, and electrically neutral particles. In plasma, the number of positive and negative charges is approximately equal, so it is generally considered to be electrically neutral and affected by the electromagnetic field. The formation of the plasma can be formed by impinging on the gas by high-energy particles, electromagnetic waves (such as cosmic rays, ultraviolet rays, X-rays, etc.), or applying a high temperature to the gas, or applying an applied electric field to the gas. Generally, the plasma is generated by passing the required gas into a container, and adding a DC power source, a radio frequency (Radio Frequency) or a microwave (Microwave) energy source under a certain pressure, using a capacitive (capacitive), an inductor. Inductive or the way particles interact with waves, causing the gas to collapse, which is a plasma. In short, the generation of plasma is to apply energy to the gas, causing it to be excited and ionized. Plasma Torch (Plasma Torch) is a common normal piezoelectric slurry. The principle is to concentrate the plasma energy in a small volume range, and ionize the swirling working gas to make the working gas generate an activation reaction. Improve reactivity. In order to prolong the service life of the electrode, a high temperature resistant metal (such as tungsten or tungsten doped yttrium oxide) is usually used as the discharge electrode, and the working gas is introduced into the discharge electrode in a swirling flow to make the plasma The Plasma Column can be stabilized in the center of the plasma channel, thereby reducing the energy loss to the tube wall and causing the plasma column to shrink, thereby increasing the plasma temperature and the freeness of the working gas.

1249176 _案號93119141_年月日 修正_ 五、發明說明(2) 請參照第1圖,第1圖係繪示習知之電漿放電裝置示意圖。 習知之電漿放電裝置1 0 0會由放電電極1 0 7射出一電漿柱 115,通過電漿通道120,解離外電極101末端開口處的工 作氣體1 1 9。然而,在工作氣體1 1 9的流量改變時,往往會 使電漿柱1 1 5的長度改變。此外,當工作氣體11 9的渦旋不 順時,亦容易使電漿柱1 1 5未達外電極1 0 1的末端開口即已 接觸管壁,使末端開口處的工作氣體1 1 9的游離程度下 降,亦將使末端開口處的電漿強度無法處於穩定狀態。 有 具中 , 道 置通 裝漿 放在 漿限 電侷 Uttul UL 種柱 一漿 供電 提之 在出 是射 就極 的電 目電 的放 1明將 容發可 内本, 明,板 發此隔。 ί因一央 本發明的另一目的就是在提供一種電漿放電裝置,電漿柱 的長度不會改變。 本發明的又一目的就是在提供一種電漿放電裝置,不會使 電漿柱未達出口即已接觸管壁。 根據本發明之上述目的,提出一種電漿放電裝置,適用於 接近一大氣壓或高於一大氣壓之壓力範圍。上述之電梁放 電裝置至少包括一外電極、一隔板、一絕緣體層以及一放 電電極。外電極係為一管狀,其末端開口内縮。隔板係置 於外電極之截面上,可將外電極之内部分為一第一腔室與 一第二腔室,其中隔板在其中心具有一孔洞。絕緣體層覆 蓋於外電極之内壁及隔板之表面上。放電電極則置於第一 腔室中,可射出一電漿柱通過隔板的中心孔洞與第二腔1249176 _ Case No. 93119141_年月日日 Revision _ V. Description of the invention (2) Please refer to Fig. 1, which is a schematic view of a conventional plasma discharge device. The conventional plasma discharge device 100 emits a plasma column 115 from the discharge electrode 107, and dissociates the working gas 1 1 9 at the opening of the outer electrode 101 through the plasma passage 120. However, when the flow rate of the working gas 1 19 is changed, the length of the plasma column 1 15 is often changed. In addition, when the vortex of the working gas 11 9 is not smooth, it is also easy for the plasma column 1 15 to reach the end opening of the outer electrode 110, that is, the tube wall has been contacted, so that the working gas at the end opening is free. The degree of decline will also prevent the strength of the plasma at the end opening from being stable. There is a medium, the road is placed in the pulp discharge station Uttul UL seed column, a pulp power supply is in the out of the pole, the electric power of the electricity will be released, the Ming will be able to send the inside, Ming, the board issued this Separate. Another object of the present invention is to provide a plasma discharge device in which the length of the plasma column does not change. It is a further object of the present invention to provide a plasma discharge apparatus that does not allow the plasma column to contact the tube wall without reaching the outlet. In accordance with the above object of the present invention, a plasma discharge device is proposed which is suitable for a pressure range close to one atmosphere or above one atmosphere. The above-described electric beam discharge device comprises at least an outer electrode, a partition, an insulator layer and a discharge electrode. The outer electrode is a tubular shape with its end opening constricted. The separator is disposed on the cross section of the outer electrode, and the inner portion of the outer electrode can be divided into a first chamber and a second chamber, wherein the partition has a hole in the center thereof. The insulator layer covers the inner wall of the outer electrode and the surface of the spacer. The discharge electrode is placed in the first chamber to emit a plasma column through the central hole and the second cavity of the separator

第10頁 1249176 _案號93119141_年月日_ 五、發明說明(3) 室,至位於第二腔室之末端開口。 依照本發明之較佳實施例,第一腔室更包括一平板,可固 定放電電極於第一腔室中,且平板上具有複數個輸入口, 可輸入工作氣體。覆蓋絕緣體層後之隔板孔洞的内徑與覆 蓋絕緣體層後之外電極的内徑的比值約介於0 . 0 1至0 . 9 9之 間。隔板的材質可與外電極的材質相同,或與絕緣體層的 材質相同,其中隔板與外電極連結處厚度較厚。 根據本發明之另一目的,提出一種電漿放電裝置之外電極 結構,至少包括一導體管體、一隔板以及一絕緣體層。隔 板置於導體管體之截面上,可將導體管體之内部分為一第 一腔室與一第二腔室,其中隔板具有一孔洞。絕緣體層覆 蓋於導體管體之内壁及隔板之表面。其中,導體管體適用 於將一放電電極置於第一腔室中,可射出一電漿柱通過孔 洞與第二腔室,至位於第二腔室之一開口。 依照本發明之較佳實施例,第一腔室更包括一平板,且平 板上具有複數個輸入口 ,可輸入工作氣體,而第二腔室開 口端之導體管體内縮。覆蓋絕緣體層後之隔板的孔洞的内 徑與覆蓋絕緣體層後之外電極的内徑的比值約介於0 . 0 1至 0 . 9 9之間。隔板的材質可與外電極的材質相同,或與絕緣 體層的材質相同,其中隔板與外電極連結處之厚度較厚。Page 10 1249176 _ Case No. 93119141_年月日日_5, invention description (3) Room, to the end of the second chamber opening. According to a preferred embodiment of the present invention, the first chamber further includes a flat plate for fixing the discharge electrode in the first chamber, and the plate has a plurality of input ports for inputting the working gas. The ratio of the inner diameter of the spacer hole covering the insulator layer to the inner diameter of the outer electrode after covering the insulator layer is between about 0.01 and 0.99. The material of the separator may be the same as the material of the outer electrode or the material of the insulator layer, wherein the thickness of the joint between the separator and the outer electrode is thick. According to another object of the present invention, an electrode structure other than a plasma discharge device is provided, comprising at least a conductor body, a separator, and an insulator layer. The partition plate is placed on the cross section of the conductor tube body, and the inside of the conductor tube body can be divided into a first chamber and a second chamber, wherein the partition has a hole. The insulator layer covers the inner wall of the conductor body and the surface of the spacer. Wherein, the conductor tube body is adapted to place a discharge electrode in the first chamber, and a plasma column can be emitted through the hole and the second chamber to an opening in the second chamber. According to a preferred embodiment of the present invention, the first chamber further includes a flat plate, and the flat plate has a plurality of input ports for inputting working gas, and the conductor tube of the open end of the second chamber is internally contracted. The ratio of the inner diameter of the pores of the separator after covering the insulator layer to the inner diameter of the outer electrode after covering the insulator layer is between about 0.01 and 0.99. The material of the separator may be the same as the material of the outer electrode or the material of the insulator layer, wherein the thickness of the joint between the separator and the outer electrode is thick.

1249176 _案號 93119141_年月日__ 五、發明說明(4) 放電裝置示意圖。本發明實施例之電漿放電裝置適用於接 近一大氣壓或高於一大氣壓之壓力範圍。電漿放電裝置 2 0 0至少包括一外電極2 0 1、一隔板2 0 3、一絕緣體層2 0 5以 及一放電電極2 0 7。外電極2 0 1係為管狀,其末端開口内 縮。隔板2 0 3係置於外電極2 0 1之截面上,可將外電極2 0 1 之内部分為一第一腔室20 9與一第二腔室211,其中隔板 2 0 3在其中心具有一孔洞2 1 3。絕緣體層2 0 5覆蓋於外電極 2 0 1之内壁及隔板2 0 3之表面上,而覆蓋絕緣體層2 0 5後之 第一腔室2 0 9、孔洞2 1 3與第二腔室2 1 1便形成一電漿通道 2 2 0。放電電極2 0 7則置於第一腔室2 0 9中,可射出一電漿 柱2 1 5通過電漿通道2 2 0,至位於第二腔室2 1 1之末端開 v 。 在電漿放電裝置20 0中,第一腔室20 9更包括一平板217, 可固定放電電極2 0 7於第一腔室2 0 9中,且平板2 1 7上有複 數個輸入口,可輸入工作氣體2 1 9,使電漿柱2 1 5能穩定在 電漿通道22 0中央。 由於隔板2 0 3可縮小部份之外電極2 0 1的截面積,且隔板 2 0 3的中央孔洞2 1 3會把電漿柱2 1 5侷限在電漿通道2 2 0中 央,如此一來,便可以使工作氣體2 1 9流動時,電弧不會 偏向管壁,進而可使電孤散失於管壁的能量變少。隔板 2 0 3的材質可與外電極2 0 1的材質相同,或與絕緣體層2 0 5 的材質相同。覆蓋絕緣體層2 0 5後之隔板2 0 3的孔洞2 1 3的 内徑與覆蓋絕緣體層2 0 5後之外電極2 0 1的内徑的比值約介 於0. 01至0. 9 9之間。 因此,由上述本發明之實施例可知,應用本發明至少具有1249176 _ Case No. 93119141_年月日日__ V. Description of invention (4) Schematic diagram of the discharge device. The plasma discharge device of the embodiment of the present invention is suitable for use in a pressure range of approximately one atmosphere or more than one atmosphere. The plasma discharge device 200 includes at least an outer electrode 2 0 1 , a separator 2 0 3 , an insulator layer 2 0 5 , and a discharge electrode 2 0 7 . The outer electrode 210 is tubular and its end opening is constricted. The separator 2 0 3 is disposed on the cross section of the outer electrode 210, and the inner portion of the outer electrode 210 is divided into a first chamber 20 9 and a second chamber 211, wherein the partition 2 0 3 is Its center has a hole 2 1 3 . The insulator layer 205 covers the inner wall of the outer electrode 210 and the surface of the spacer 203, and covers the first chamber 209 after the insulator layer 205, the hole 2 1 3 and the second chamber. 2 1 1 forms a plasma channel 2 2 0. The discharge electrode 2 0 7 is placed in the first chamber 209 to emit a plasma column 2 1 5 through the plasma channel 2 2 0 to the end of the second chamber 2 1 1 to open v. In the plasma discharge device 20, the first chamber 20 9 further includes a flat plate 217, the discharge electrode 207 can be fixed in the first chamber 209, and the plurality of input ports on the flat plate 2 17 The working gas 2 1 9 can be input to stabilize the plasma column 2 15 in the center of the plasma channel 22 0 . Since the separator 203 can reduce the cross-sectional area of the portion of the electrode 2 0 1 , and the central hole 2 1 3 of the separator 203 confines the plasma column 2 1 5 to the center of the plasma channel 2 2 0, In this way, when the working gas 2 19 flows, the arc does not deviate toward the pipe wall, and the energy of the electric solute to the pipe wall is reduced. The material of the separator 203 may be the same as the material of the outer electrode 205 or the same material as the insulator layer 205.至9. 9之间。 The ratio of the inner diameter of the outer layer of the outer layer of the outer layer of the outer layer of the outer layer of the outer layer of the outer layer Between 9. Therefore, it is apparent from the above embodiments of the present invention that the application of the present invention has at least

第12頁 1249176 _案號93119141_年月曰 修正_ 五、發明說明(5) 下列優點。由於本發明之電漿放電裝置具有一隔板,可將 電漿柱侷限在電漿通道中央,因此,不會使電漿柱未達外 電極的末端開口即已接觸管壁,而影響末端開口處的工作 氣體游離程度。 雖然本發明已以一較佳實施例揭露如上,然其並非用以限 定本發明,任何熟習此技藝者,在不脫離本發明之精神和 範圍内,當可作各種之更動與潤飾,因此本發明之保護範 圍當視後附之申請專利範圍所界定者為準。Page 12 1249176 _ Case No. 93119141_ Year Month 修正 Amendment _ V. Invention Description (5) The following advantages. Since the plasma discharge device of the present invention has a partition plate, the plasma column can be confined to the center of the plasma channel, so that the plasma column does not reach the end opening of the outer electrode, that is, it has contacted the pipe wall, and the end opening is affected. The degree of free work gas at the place. Although the present invention has been described above in terms of a preferred embodiment, it is not intended to limit the invention, and it is obvious to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

第13頁 1249176 _案號 93119141_年月日__ 圖式簡單說明 【圖式簡單說明】 為讓本發明之上述和其他目的、特徵、和優點能更明顯易 懂,下文特舉一較佳實施例,並配合所附圖式,作詳細說 明如下: 第1圖係繪示習知之電漿放電裝置示意圖。 第2圖係繪示根據本發明之一實施例之電漿放電裝置示意 圖。 【元件代表符號簡單說明】 100 電 漿 放 電裝 置 101 : 外 電 極 105 絕 緣 體 層 107 : 放 電 電 極 115 電 漿 柱 117: 平 板 119 工 作 氣 體 120 : 電 漿 通 道 200 電 漿 放 電裝 置 201 : 外 電 極 203 隔 板 20 5 : 絕 緣 體 層 207 放 電 電 極 2 0 9 : 第 —一 腔 室 211 第 一 腔 室 213 : 孔 洞 215 電 漿 柱 217 ·· 平 板 219 工 作 氣 體 2 2 0 : 電 漿 通 道Page 13 1249176 _ Case No. 93119141_年月日日__ BRIEF DESCRIPTION OF THE DRAWINGS [BRIEF DESCRIPTION OF THE DRAWINGS] The above and other objects, features, and advantages of the present invention will become more apparent and understood. The embodiments are described in detail with reference to the accompanying drawings. FIG. 1 is a schematic view showing a conventional plasma discharge device. Fig. 2 is a schematic view showing a plasma discharge device according to an embodiment of the present invention. [Simplified description of component symbol] 100 Plasma discharge device 101: External electrode 105 Insulator layer 107: Discharge electrode 115 Plasma column 117: Plate 119 Working gas 120: Plasma channel 200 Plasma discharge device 201: External electrode 203 Separator 20 5 : Insulator layer 207 Discharge electrode 2 0 9 : First chamber 211 First chamber 213 : Hole 215 Plasma column 217 ·· Plate 219 Working gas 2 2 0 : Plasma channel

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Claims (1)

1249176 _案號93119141_年月日__ 六、申請專利範圍 1. 一種電漿放電裝置,適用於接近一大氣壓或高於一大氣 壓之壓力範圍,該電漿放電裝置至少包括: 一外電極,該外電極係為管狀; 一隔板置於該外電極之截面上,可將該外電極之内部分為 一第一腔室與一第二腔室,其中該隔板具有一孔洞; 一絕緣體層覆蓋於該外電極之内壁及該隔板之表面;以及 一放電電極置於該第一腔室中,可射出一電漿柱通過該孔 洞與該第二腔室,至位於該第二腔室之一開口。 2 .如申請專利範圍第1項所述之電漿放電裝置,其中該開 口端之該外電極内縮。 3. 如申請專利範圍第1項所述之電漿放電裝置,其中該第 一腔室更包括一平板,具有複數個輸入口,可輸入氣體。 4. 如申請專利範圍第1項所述之電漿放電裝置,其中覆蓋 該絕緣體層後之該孔洞的内徑與覆蓋該絕緣體層後之該外 電極的内徑的比值約介於0 . 0 1至0 . 9 9之間。 5. 如申請專利範圍第1項所述之電漿放電裝置,其中該隔 板的材質可與該外電極的材質相同。 6. 如申請專利範圍第1項所述之電漿放電裝置,其中該隔 板的材質可與該絕緣體層的材質相同。1249176 _ Case No. 93119141_年月日日__ VI. Patent application scope 1. A plasma discharge device suitable for a pressure range close to one atmosphere or above one atmosphere, the plasma discharge device comprising at least: an external electrode, The outer electrode is tubular; a partition is disposed on the cross section of the outer electrode, and the inner portion of the outer electrode is divided into a first chamber and a second chamber, wherein the partition has a hole; an insulator a layer covering the inner wall of the outer electrode and the surface of the spacer; and a discharge electrode disposed in the first chamber to emit a plasma column through the hole and the second chamber to the second chamber One of the rooms is open. 2. The plasma discharge device of claim 1, wherein the outer electrode of the open end is retracted. 3. The plasma discharge device of claim 1, wherein the first chamber further comprises a flat plate having a plurality of input ports for inputting gas. 4. The plasma discharge device according to claim 1, wherein a ratio of an inner diameter of the hole covering the insulator layer to an inner diameter of the outer electrode covering the insulator layer is about 0. 0. Between 1 and 0. 9 9 . 5. The plasma discharge device of claim 1, wherein the spacer is made of the same material as the outer electrode. 6. The plasma discharge device of claim 1, wherein the spacer is made of the same material as the insulator layer. 第15頁 1249176 _案號93119141_年月日__ 六、申請專利範圍 7 ·如申請專利範圍第1項所述之電漿放電裝置,其中該隔 板與該外電極連結處厚度較厚。 8. —種電漿放電裝置之外電極結構,至少包括: 一導體管體; 一隔板置於該導體管體之截面上,可將該導體管體之内部 分為一第一腔室與一第二腔室,其中該隔板具有一孔洞; 以及。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 8. An electrode structure other than the plasma discharge device, comprising at least: a conductor tube; a spacer disposed on a cross section of the conductor tube, the interior of the conductor tube being divided into a first chamber and a second chamber, wherein the partition has a hole; 一絕緣體層覆蓋於該導體管體之内壁及該隔板之表面; 其中,該導體管體適用於將一放電電極置於該第一腔室 中,可射出一電漿柱通過該孔洞與該第二腔室,至位於該 第二腔室之一開口。 9. 如申請專利範圍第8項所述之電漿放電裝置之外電極結 構,其中該開口端之該導體管體内縮。An insulator layer covers the inner wall of the conductor tube and the surface of the spacer; wherein the conductor tube is adapted to place a discharge electrode in the first chamber, and a plasma column is emitted through the hole and the hole The second chamber is open to one of the second chambers. 9. The electrode structure of the plasma discharge device of claim 8, wherein the conductor end of the open end is shrunk. 1 0 .如申請專利範圍第8項所述之電漿放電裝置之外電極結 構,其中該第一腔室更包括一平板,具有複數個輸入口, 可輸入氣體。 1 1.如申請專利範圍第8項所述之電漿放電裝置之外電極結 構,其中覆蓋該絕緣體層後之該孔洞的内徑與覆蓋該絕緣 體層後之該導體管體的内徑的比值約介於0 . 0 1至0 . 9 9之The electrode structure of the plasma discharge device of claim 8, wherein the first chamber further comprises a flat plate having a plurality of input ports for inputting gas. 1 . The electrode structure other than the plasma discharge device of claim 8 , wherein an inner diameter of the hole covering the insulator layer and a ratio of an inner diameter of the conductor body after covering the insulator layer About 0. 0 1 to 0. 9 9 第16頁 1249176 _案號 93119141_年月日__ 六、申請專利範圍 間。 1 2 ·如申請專利範圍第8項所述之電漿放電裝置之外電極結 構,其中該隔板的材質可與該導體管體的材質相同。 1 3 ·如申請專利範圍第8項所述之電漿放電裝置之外電極結 構,其中該隔板的材質可與該絕緣體層的材質相同。 1 4.如申請專利範圍第8項所述之電漿放電裝置之外電極Page 16 1249176 _ Case No. 93119141_年月日日__ VI. Scope of application for patents. 1 2 The external electrode structure of the plasma discharge device according to claim 8, wherein the material of the separator is the same as the material of the conductor tube. The external electrode structure of the plasma discharge device of claim 8, wherein the material of the separator is the same as the material of the insulator layer. 1 4. The electrode other than the plasma discharge device described in claim 8 第17頁Page 17
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